id	author	title	date	pages	extension	mime	words	sentence	flesch	summary	cache	txt
ajst-6855	Gong, Ruocheng; Song, Huaping; Yang, Junwei; Liu, Huan	Optimization of SiC Cleaning Process Based on Zeta Potential	2023	5	.pdf	application/pdf	3000	161	54	We analyzed the mechanisms by which the Zeta potential in alkaline (SC1) and acidic (SC2) cleaning solutions affects the adsorption of particles on SiC epitaxial wafers surface. However, in the SiC wafer cleaning process, the pH value of the SC1 cleaning solution is greater than 12, while that of the SC2 cleaning solution is less than 2.	cache/ajst-6855.pdf	txt/ajst-6855.txt