ap-6-11.dvi Acta Polytechnica Vol. 51 No. 6/2011 Czech Contribution to Athena R. Hudec, L. Ṕına, V. Marš́ıková, A. Inneman, M. Skulinová, M. Mı́ka Abstract We describe the recent status of the Czech contribution to the ESA Athena space mission, with emphasis on the development of new technologies and test samples of X-ray mirrors with precise surfaces, based on new materials, and their applications in space. In addition, alternativeX-rayoptical arrangements are investigated, suchasKirkpatrick-Baez systems. 1 Introduction Design and development of X-ray optics have a long tradition in the Czech Republic (e.g. Hudec et al., 1991, 1999, 2000, 2001, Inneman et al. 1999, 2000). A range of related technologies have been exploited and investigated, including technologies for future large light-weight X-ray telescopes. Future large space X-ray telescopes (such as Athena, consideredbyESA[16]) requireprecise light- weight X-ray optics based on numerous thin reflect- ing shells. Novel approaches and advanced technolo- gies need to be developed and exploited. In this paper, we refer to Czech efforts in connection with Athena, focusing on the results of test X-ray mirror shells produced by glass thermal forming (GTF) and by shaping Si wafers. Both glass foils and Si wafers are commercially available, have excellent surfacemi- croroughnessofa few0.1nm,and lowweight (thevol- ume density is 2.5 g ·cm−3 for glass and 2.3 g ·cm−3 for Si). Technologies need to be exploited for shaping these substrates to achieve the requiredpreciseX-ray optic geometries without degrading the fine surface microroughness. Although glass and, more recently, silicon wafers have been considered the most promising materials for future advanced large aperture X-ray telescopes, other alternative materials are also worth further study, such as amorphous metals and glassy carbon (Marsch et al., 1997). In order to achieve sub-arsec angular resolutions, the principles of active optics need tobeadopted. TheAthenaX-rayobservatory is a newX-ray telescope of theEuropeanSpaceAgency (ESA). This project supersedes IXO (International X-rayObservatory)aswell asNASA’sConstellation- X concept and also ESA’s XEUS mission concept (White et al., 2009). The spacecraft configuration for the Athena study is a mission featuring two large X-ray telecopes, each with an optical bench with a focal length of approx. 11.5 m and a suite of focal plane instruments. The Athena mission concept was presented and discussed in detail at the 1st Athena science meeting held atMPE inGarching, Germany, in June 2011 [16]. 2 Czech contribution to Athena-related studies At the moment, the Czech contribution to Athena concentrates on: (1) participating in defining sci- entific goals, justification and project preparation, (2) participating in the design and development of mirror technologies. The first author of this paper was delegated as a member of the Athena Telescope Working Group. In mirror development, we focus on supporting ESA ESTEC micropore silicon tech- nology design and also on designing and developing alternative background technologies and designs, as discussed in greater detail below. Originally, these technologieswere studied for theESA/NASA/JAXA IXO project, but we believe that at least some of them might be valuable for Athena. 3 The glass foil option Glass science and technology has a long tradition in the Czech Republic. At the same time, glass tech- nology is one of the most promising technologies for producing mirrors for Athena and/or similar space telescopes, as thevolumedensityof glass ismore than 3 times less than the volumedensity of electroformed nickel layers. Glass foils can be used as flats, or may be shaped or thermally slumped to achieve the re- quired geometry. Thermal forming of glass is not a new technology. It has been used in various sectors of the glass industry and in glass art, as well as in the production of Cherenkov mirrors. However, the application of this technology in X-ray optics is re- lated to the need to improve accuracy significantly andminimize errors. As the first step, small (various sizes typically less than 100 × 100 mm) glass sam- ples of various typesprovidedbyvariousmanufactur- ers were used and thermally shaped. The geometry 28 Acta Polytechnica Vol. 51 No. 6/2011 was either flat or curved (cylindrical or parabolic). The project continued with larger samples (up to 300 × 300 mm) and further profiles. Recent efforts have focused on optimizing the relevant parameters of both glass material and substrates, as well as the parameters of the slumping process. Various approaches have been investigated. We note that these are not quite identical with efforts by other teams (e.g. Zhang et al., 2010, Ghigo et al., 2010). The glass samples were thermally formed at Rigaku, Prague, and also at the Institute ofChemicalTechnology inPrague. For large samples (300×300mm), facilities at theOpticalDevelopment Workshop in Turnov were used. The strategy is to develop a technology suitable for inexpensive mass production of thin X-ray optics shells, i.e., to avoid expensivemandrels and techniques that are not suit- able for mass production, or that are too expensive. Numerous glass samples havebeen shapedand tested in order to find the optimal parameters. The shapes and profiles of both mandrels, as well as the result- ing glass replicas, havebeen carefullymeasuredusing metrological devices. The results show that the qual- ity of the thermal glass replica can be significantly improved by optimizing the material and improving the design of the mandrel, by modifying the thermal forming process, as well as by optimizing the tem- perature. After themodifications and improvements, some of them significant, we obtained the resulting deviation of the thermally formed glass foil from the ideal designed profile to be less than 1 μm (peak to valley value) in the best case. This value is, however, strongly dependent on the exact temperature, so we believe that further improvements are still possible. The fine originalmicroroughness (typically better than 1 nm) of the original float glass foil was found not to be degraded by the thermal forming process. Wenote thatourapproach in thermalglass forming is different from the approaches used by other authors. Recent efforts have been devoted to optimizing the whole process, using and comparingdifferent forming strategies etc., as the final goal is to further improve the forming accuracy to less than 0.1 μmvalues. For the near future, we plan to continue these efforts together with investigations of computer-controlled forming of glass foils (according to the principles of active optics). 4 The silicon wafer option Silicon is a relatively light material and already dur- ing the manufacturing process it is lapped and pol- ished (either onone side or onboth sides) to veryfine smoothness (better than a few 0.1 nm) and thickness homogeneity (of the order of 1 μm). Another obvious option, recently considered as one of most promising for high-precisionX-ray optics for Athena, is the use of X-ray optics based on commercially available sili- con wafers manufactured mainly for the purposes of the semiconductor industry. The main advantages of the application of Si wafers in space X-ray optics are (i) the volume den- sity, which is more than 3 times lower than the elec- troformed nickel used in the past for galvanoplas- tic replication of multiply nested X-ray mirrors, and slightly less than the alternative approach of glass foils, (ii) very high thickness homogeneity, typically less than 1 μm over 100 mm, and (iii) very small surfacemicroroughness either on one side or on both sides (typically of the order of a few 0.1 nm or even less). Silicon wafers were expected to be used in the ESA XEUS and IXO projects, and are still under consideration for the Athena project. The recent baseline optics for the Athena X-ray telescope de- sign is, like XEUS and IXO, based on X-Ray High Precision Pore Optics (X-HPO), a technology cur- rently under development with ESA funding (RD- Opt, RD-HPO), with a view to achieving large effec- tive areas with low mass, reduced telescope length, high stiffness, and a monolithic structure, favoured for handling the thermal environment and for simpli- fying the alignment process (Bavdaz et al. 2010). In addition, due to the higher packing density and the associated shorter mirrors required, conical approx- imation to the Wolter-I geometry becomes possible. X-HPO optics is based on ribbed Si wafers stacked together. The Si wafers for achieving the conical ap- proximation are formed by stacking a large number of plates together using a mandrel. The typical size of the Si wafers is 10×10 cm. There are also alternative X-ray optics arrange- ments with the use of Si wafers. In this paper, we refer to the development of an alternative design of innovative precise X-ray optics based on Si wafers. Our approach is basedon two steps, namely (i) devel- oping dedicated Si wafers with properties optimized for use in space X-ray telescopes, and (ii) precisely shaping the wafers to the optical surfaces (Figure 4). Stacking to achieve nested arrays is performed af- ter the wafers have been shaped. In this approach, Multi FoilOptics (MFO) is thus created from shaped Si wafers. Formore details onMFO, seeHudec et al. (2005). This alternative approach does not require the Si wafers to have a ribbed surface, so problems with transferring any deviation, stress, and/or inaccuracy from one wafer to the neighbouring plates or even to thewhole stackedassemblywill be avoided. However, suitable technologies for precise stacking of optically formed wafers to a multiple array have to be devel- oped. The Si wafers available on the market are de- signed for use mainly in the semiconductor industry. It is obvious that the requirements of this industry 29 Acta Polytechnica Vol. 51 No. 6/2011 are not the same as the requirements of precise space X-ray optics. Si wafers are a monocrystal (single crystal) with some specifics, and this must also be taken into account. Moreover, Si wafers are fragile, and it is very difficult to bend and/or shape them precisely for the thicknesses required for X-ray tele- scopes, i.e. around 0.3–1.0mm. An exception is thin Si wafers below 0.1 mm in thickness. However, these can be hardly used in this type of X-ray optics be- cause of diffraction limits. Also, while their thickness homogeneity is mostly perfect, the same is not true in the case of commercially available wafers for their flatness (note that we refer here to the deviation of the upper surface of a free-standingSiwafer from the ideal plane, while in the semiconductor community flatness is usually represented by a set of parame- ters). In order to achieve the very high accuracy re- quired by ESA for future large space X-ray tele- scopes like Athena, the parameters of the Si wafers need to be optimized (for application in X-ray op- tics) at the production stage. For this purpose we have established and developed a multidisciplinary working group including specialists from the devel- opment department of the Si wafer industry with the goal to design and manufacture Si wafers with improved parameters (mostly flatness) optimized for application in X-ray telescopes. It should be noted that the manufacture of silicon wafers is a compli- cated process with numerous technological steps and with many free parameters that can be modified and optimized to achieve optimal performance. This can also be useful for further improving the quality of X-HPO optics. As we are dealing with high-quality X-ray imaging, the smoothness of the reflecting sur- face is important. The standard microroughness of commercially available Si wafers (we have used the products of ON Semiconductor, Czech Republic) is of the order of 0.1 nm, as confirmed by several inde- pendent measurements using various techniques in- cluding the Atomic Force Microscope (AFM). This is related to the method of chemical polishing used in themanufacture of Si wafers. Themicroroughness of Si wafers exceeds the microroughness of glass foils andmost other alternativemirrormaterials and sub- strates. The flatness (in the sense of the deviation of the upper surface of a free-standing Si wafer from a plane) of commercially available Si wafers was how- ever found not to be optimal for use in high-quality (order of arcsec angular resolutions) X-ray optics. Most Si wafers show deviations from the plane of the order of a few tens of microns. After modify- ing the technological process during Si wafer manu- facture, we were able to reduce this value to just a few microns. Also, the thickness homogeneity was improved. In collaboration with the manufacturer, further steps are planned to improve the flatness (de- viation from an ideal plane) and the thickness homo- geneity of Si wafers. These and planned improve- ments introduced at the Si wafer manufacture stage can also be applied for other designs of Si wafer op- tics including X-HPO, and can play a crucial role in the Athena project. The X-ray optics design for Athena is based on theWolter 1 arrangement, and hence requires curved surfaces. However, due to the material properties of monocrystalline Si, Si wafers (except very thin ones) are extremely difficult to shape. It is obvious thatwe have to overcomethis problem in order to achieve the fine accuracy and stability required for future large X-ray telescopes. The final goal is to provide opti- cally shapedSiwaferswithno or little internal stress. Threedifferent alternative technologies for shapingSi wafers have been designed and tested to achieve pre- cise optical surfaces (Figure 1). The samples shaped and tested were typically 100 to 150 mm large, typ- ically 0.6 to 1.3 mm thick, and were bent to either cylindrical or parabolic test surfaces. Fig. 1: Example of precise silicon wafer shaping. After deposition of poly-Si (thickness 1436 nm at temperature 615◦C) and for wafer thickness 507 μm, a warp of 110 mm (R = 25.6 m) was achieved. Left: Wafer deformation map. Right: Warp profile perpendicular to the facet 30 Acta Polytechnica Vol. 51 No. 6/2011 The development described here is based on a scientific approach, and hence the large number of samples formed with different parameters must be precisely measured and investigated in detail. Es- pecially precise metrology and measurements play a crucial role in this type of experiment. The samples of bentwaferswith the investigatedtechnologieshave been measured, including Taylor-Hobsonmechanical and STILL optical profilometry, aswell as optical in- terferometry (ZYGO) and AFM (Atomic Force Mis- croscope) analyses. It has been confirmed that all these three technologies do not degrade the intrin- sic fine microroughness of the wafer. While the two physical/chemical technologies exploited give peak- to-valley (PV) deviations (of the real surface of the sample compared with the ideal optical surface) of less than 1 to 2 μm over the 150 mm sample length as preliminary values, the deviations of the first ther- mally bent sample are larger, of the order of 10 μm. Taking into account that the applied temperatures, as well as other parameters, were not optimized for this first sample, we anticipate that the PV (peak to valley) value can be further reduced down to the order of 1 μm and perhaps even below. Fine ad- justments of the parameters can also further improve the accuracy of the results for the other two tech- niques. 5 The Kirkpatrick-Baez option Although Wolter systems are generally well-known and widely used, Hans Wolter was not the first to propose X-ray imaging systems based on reflection of X-rays. In fact, the first grazing incidence system to form a real image was proposed by Kirkpatrick and Baez in 1948. This system consists of a set of two orthogonal parabolas of translation (Figure 2). The first reflection focuses to a line, which is focused by the second surface to a point. This was necessary to avoid the extreme astigmatism sufferedby a single mirror, but it still was not free of geometric aberra- tions. Nevertheless, the system is attractive because it is easy to construct the reflecting surfaces. These surfaces can be produced as flat plates and then me- chanically bent to the required curvature. In order to increase the aperture, a number of mirrors can be nested together, but it shouldbenoted that this nest- ing introduces additional aberrations. This configu- ration is used mostly in experiments not requiring a large collecting area (solar, laboratory). The ap- plications in X-ray astronomy and astrophysics were limited in the past, despite initial success on sound- ing rockets (e.g. Gorenstein et al., 1978). Neverthe- less, largemodules ofKirkpatrick-Baez (KB)mirrors based on float glass have also been suggested for stel- lar X-ray experiments (LAMAR experiment in KB configuration designed for the Shuttle experiment, e.g. Fabricant et al. 1988). Fig. 2: Multi Foil Optics (MFO) in the Kirkpatrick-Baez (K-B) arrangement Superior silicon substrates have recently become available that make it possible to consider design- ing large KB modules with this novel material. As mentioned above, Si wafers are difficult to shape, es- pecially to small radii. To overcome this difficulty, anotherX-ray optics arrangement can be considered, namely theKirkpatrick-Baez (KB) system. Then the curvature radii aremuch larger, of the order of a few km,while the imagingperformance is similar. For the same effective area, however, the focal length of the KB system is about twice as large as the focal length of the Wolter system. Nevertheless, KB systems rep- resent a promising alternative to the classicalWolter systems in future large space X-ray telescopes. A very important factor is the ease (and hence the reduced cost) of constructing highly segmented modules basedonmultiply nested thin reflecting sub- strates, in comparisonwith theWolter design. While e.g. the Wolter design for Athena requires the sub- strates to be precisely formed with curvatures as small as 0.25m, the alternativeKBarrangementuses almost flat or only slightly bent sheets. Hence the feasibility of constructing a KB module with the re- quired5 arcsecFWHMatanaffordable cost is higher than for the Wolter arrangement. Advanced KB telescopes are based on the Multi FoilOptics (MFO)approach(X-raygrazing incidence imagingopticsbasedonnumerousthin reflecting sub- strates/foils). The distinction between MFO and other optics using packed or nested mirrors is that MFO is based on numerous very thin (typically less than0.1mm) substrates. TheMFOKBtestmodules were recently designedand constructed atRigaku In- novativeTechnologiesEurope (RITE) inPrague, and 2 modules were tested in full aperture X-ray tests in the test facilityof theUniversityofBoulder,withpre- liminary results of FWHM 26 arcsec for a full stack of 24 standard Si plates at 5 keV, and even better for glass foils and 1D imaging (Figures 3, 4). 31 Acta Polytechnica Vol. 51 No. 6/2011 Fig. 3: Left: Test K-B modules assembled at Rigaku RITE in Prague, Right: The X-ray test facility for full aperture X-ray tests at the University of Colorado in Boulder Fig. 4: Themeasurement results of theK-B1D testmodulewith glass foils, full aperture tests at 5 keV at theUniversity of Colorado at Boulder. The estimated FWHM of 1D focus is 4 arcsec In our opinion, the use of KB design instead of Wolter in Athena might help to retain high perfor- mance (such as effective area) even in the event of a reduced budget for Athena. 6 Conclusion Suitable technologies for future largeX-raytelescopes require extensive researchwork. Twopromising tech- nologies suitable for future large-aperture and fine resolution X-ray telescopes, such as Athena, were exploited and investigated in detail, namely Glass Thermal Forming and Si wafer bending. In both cases, promising results have been achieved, with peak-to-valley deviations of the final profiles from the ideal profiles being of the order of 1 μm in the best cases, with space for further essential improve- ments and optimization. In the Czech Republic, an interdisciplinary team with 10 members is cooperat- ing closely with experienced specialists, including re- searchers from a large company producing Si wafers. Si wafers have been successfully bent to the desired geometry by three different techniques. In the best cases, the accuracy achieved for a 150mmSiwafer is 1–2 μm for deviation from the ideal optical surface. Experiments are continuing in an attempt to further improve the forming accuracy. As an alternative, we have investigated the KB option for Athena, with quite promising results jus- tifying further efforts in this direction. A major ad- vantage of KB is its low cost, as there is no need for bending to small curvatures and/or for theuse of (ex- pensive) mandrels. Less expensive optics can main- tain a high effective area even on a reduced budget. 32 Acta Polytechnica Vol. 51 No. 6/2011 Acknowledgement We acknowledge the support provided by the Grant Agency of the Academy of Sciences of the CzechRe- public, grant IAAX01220701, by theMinistry of Ed- ucation and Youth of the Czech Republic, projects ME918, ME09028 and ME09004. The investigations related to the ESA IXO (now Athena) project were supported by ESA PECS Project No. 98038. We also acknowledge collaboration with Drs. J. Sik and M. Lorenc from ON Semiconductor Czech Republic, and with the team of Prof. Webster Cash from the University of Colorado at Boulder for X-ray tests of KB modules in their X-ray facility. References [1] Hudec, R., Valnicek, B., Cervencl, J., et al.: SPIE, 1343, 162, 1991. [2] Hudec, R., Pina, L., Inneman, A.: SPIE, 3766, 62, 1999. [3] Hudec, R., Pina, L., Inneman, A.: SPIE, 4012, 422, 2000. [4] Hudec, R., Inneman, A., Pina, L.: In Lobster- Eye: Novel X-ray Telescopes for the 21st Cen- tury, New Century of X-ray Astronomy, ASP Conf. Proc., 251, 542, 2001. [5] Hudec, R., Pina, L., Inneman, A. et al.: SPIE, 5900, 276, 2005. [6] Inneman, A., Hudec, R., Pina, L., Goren- stein, P.: SPIE, 3766, 72, 1999. [7] Inneman, A., Hudec, R., Pina, L.: SPIE, 4138, 94, 2000. [8] Kirkpatrick, P., Baez, A. V.: J. Opt. Soc. Am. 38, 766, 1948. [9] Marsch,H., et al.: Introduction to Carbon Tech- nologies, University of Alicante, 1997. [10] White, N. E., Hornschemeier, A. E.: Bulletin of the American Astronomical Society, Vol. 41, 2009, p. 388. [11] White, N.E., Parmar,A., Kunieda,H.: Interna- tional X-ray Observatory Team, 2009, Bulletin of the American Astronomical Society, Vol. 41, p. 357. [12] http://ixo.gsfc.nasa.gov [13] Bavdaz, M., et al.: Proceedings of the SPIE, Vol. 7732, 2010, p. 77321E–77321E-9. [14] Zhang, W. W., et al.: Proceedings of the SPIE, Vol. 7732, 2010, p. 77321G–77321G-8. [15] Ghigo, M., et al.: Proceedings of the SPIE, Vol. 7732, 2010, p. 77320C–77320C-12. [16] http://www.mpe.mpg.de/athena/ home.php?lang=en [17] Gorenstein, P., et al.: Astrophys. J. 224, 718, 1978. [18] Fabricant, D. G., et al.: Applied Optics, 27, No. 8, 1456, 1988. René Hudec E-mail: rhudec@asu.cas.cz Astronomical Institute Academy of Sciences of the Czech Republic 251 65 Ondřejov, Czech Republic Faculty of Electrical Engineering Czech Technical University in Prague Technická 2, 166 27 Prague, Czech Republic Ladislav Ṕına Faculty of Nuclear Engineering Czech Technical University in Prague Břehová 78/7, 110 00 Prague, Czech Republic Veronika Marš́ıková Adolf Inneman Rigaku Innovative Technologies Europe, s.r.o. Novodvorská 994, 142 21, Prague 4, Czech Republic Michaela Skulinová Astronomical Institute Academy of Sciences of the Czech Republic 251 65 Ondřejov, Czech Republic Martin Mı́ka Institute of Chemical Technology Technická 5, 166 28 Prague, Czech Republic 33