id	author	title	date	pages	extension	mime	words	sentence	flesch	summary	cache	txt
ap-1725	Bordusau, Siarhei; Madveika, Siarhei; Dostanko, Anatolii	The Process of Plasma Chemical Photoresist Film Ashing from the Surface of Silicon Wafers	2013	4	.pdf	application/pdf	2756	132	53	Peculiar features of microwave energy and silicon wafer interaction should be taken into consideration as well as used in developing and their processing in plasma microwave discharge. In order to improve the efficiency of microwave plasma chemical ashing of photoresist films from the surface of silicon wafers a two-stage process of treating was developed.	cache/ap-1725.pdf	txt/ap-1725.txt