id	author	title	date	pages	extension	mime	words	sentence	flesch	summary	cache	txt
ajtas-2447	Ёркулов Руслан Махаммади угли	COMPOSITION AND STRUCTURE OF THE INTERFACIAL INTERFACE Si/Al(111) AND Si/Cu(111)	2024	3	.pdf	application/pdf	1586	73	60	Thus, the optimal temperature for creating a Si-CuSi-Cu nanoheterostructure is 750-800 K. In the case of Si films with θSi ≥ 25-30 monolayers at a temperature American Journal of Technology and Applied Sciences 30, November - 2024 P a g e | 8 www.americanjournal.org of 900 K, a single-crystal film Si(111) was formed, the composition, structure and properties of which do not differ for massive films (Fig. 1.b). Figures for the thickness curves of Si films in monolayers.	cache/ajtas-2447.pdf	txt/ajtas-2447.txt