id	author	title	date	pages	extension	mime	words	sentence	flesch	summary	cache	txt
bibechana-26521	Giri, K; Kandel, B	Study of damage profiles and energy calculation of arsenic ions during ion implantation on Germanium	2020	9	.pdf	application/pdf	3867	188	49	Devendra Sir Cover Page copy.jpg BIBECHANA 17 (2020) 96-103 96 BIBECHANA ISSN 2091-0762 (Print), 2382-5340 (Online) Journal homepage: http://nepjol.info/index.php/BIBECHANA Publisher: Department of Physics, Mahendra Morang A.M. Campus, TU, Biratnagar, Nepal Study of damage profiles and energy calculation of arsenic ions during ion implantation on Germanium K. Giri * , B. Kandel Department of Physics, Tri-Chandra Multiple Campus, Kathmandu * Email: karangiri575@gmail.com Article Information Received: July 17, 2019 Accepted: December 2, 2019 Keywords: Implantation Doping Ionization Phonons ABSTRACT Computational calculation of energy loss and damage profiles when implanted by arsenic ions on amorphous germanium during ion implantation had been carried out. Comparatively, ions energy should be increased to energy above 1 MeV for both ions in order to obtain dominance of electronic stopping power over nuclear stopping power that eventually improve the surface hardening and electrical conductivity.	cache/bibechana-26521.pdf	txt/bibechana-26521.txt