id	sid	tid	token	lemma	pos
bibechana-4897	1	1	microsoft	microsoft	PROPN
bibechana-4897	1	2	word	word	PROPN
bibechana-4897	1	3	e.	e.	PROPN
bibechana-4897	1	4	haji	haji	PROPN
bibechana-4897	1	5	-	-	PUNCT
bibechana-4897	1	6	ali	ali	PROPN
bibechana-4897	1	7	-final.doc	-final.doc	PROPN
bibechana-4897	1	8	e.	e.	PROPN
bibechana-4897	1	9	haji	haji	PROPN
bibechana-4897	1	10	-	-	PUNCT
bibechana-4897	1	11	ali	ali	PROPN
bibechana-4897	1	12	/	/	SYM
bibechana-4897	1	13	bibechana	bibechana	PROPN
bibechana-4897	1	14	8	8	NUM
bibechana-4897	1	15	(	(	PUNCT
bibechana-4897	1	16	2012	2012	NUM
bibechana-4897	1	17	)	)	PUNCT
bibechana-4897	1	18	46	46	NUM
bibechana-4897	1	19	-	-	SYM
bibechana-4897	1	20	52	52	NUM
bibechana-4897	1	21	:	:	PUNCT
bibechana-4897	1	22	bmhss	bmhss	PROPN
bibechana-4897	1	23	,	,	PUNCT
bibechana-4897	1	24	p.46	p.46	PROPN
bibechana-4897	1	25	bibechana	bibechana	VERB
bibechana-4897	1	26	a	a	DET
bibechana-4897	1	27	multidisciplinary	multidisciplinary	ADJ
bibechana-4897	1	28	journal	journal	NOUN
bibechana-4897	1	29	of	of	ADP
bibechana-4897	1	30	science	science	NOUN
bibechana-4897	1	31	,	,	PUNCT
bibechana-4897	1	32	technology	technology	NOUN
bibechana-4897	1	33	and	and	CCONJ
bibechana-4897	1	34	mathematics	mathematic	NOUN
bibechana-4897	1	35	issn	issn	VERB
bibechana-4897	1	36	2091	2091	NUM
bibechana-4897	1	37	-	-	SYM
bibechana-4897	1	38	0762	0762	NUM
bibechana-4897	1	39	(	(	PUNCT
bibechana-4897	1	40	online	online	ADJ
bibechana-4897	1	41	)	)	PUNCT
bibechana-4897	1	42	journal	journal	NOUN
bibechana-4897	1	43	homepage	homepage	NOUN
bibechana-4897	1	44	:	:	PUNCT
bibechana-4897	1	45	http://nepjol.info/index.php/bibechana	http://nepjol.info/index.php/bibechana	PROPN
bibechana-4897	1	46	photo	photo	NOUN
bibechana-4897	1	47	and	and	CCONJ
bibechana-4897	1	48	electroluminescence	electroluminescence	NOUN
bibechana-4897	1	49	of	of	ADP
bibechana-4897	1	50	porous	porous	ADJ
bibechana-4897	1	51	silicon	silicon	NOUN
bibechana-4897	1	52	layers	layer	NOUN
bibechana-4897	1	53	e.	e.	PROPN
bibechana-4897	1	54	haji	haji	PROPN
bibechana-4897	1	55	-	-	PUNCT
bibechana-4897	1	56	ali	ali	PROPN
bibechana-4897	1	57	department	department	PROPN
bibechana-4897	1	58	of	of	ADP
bibechana-4897	1	59	physics	physics	PROPN
bibechana-4897	1	60	;	;	PUNCT
bibechana-4897	1	61	imam	imam	PROPN
bibechana-4897	1	62	hussein	hussein	PROPN
bibechana-4897	1	63	university	university	PROPN
bibechana-4897	1	64	;	;	PUNCT
bibechana-4897	1	65	tehran	tehran	PROPN
bibechana-4897	1	66	;	;	PUNCT
bibechana-4897	1	67	iran	iran	PROPN
bibechana-4897	1	68	e	e	PROPN
bibechana-4897	1	69	-	-	NOUN
bibechana-4897	1	70	mail	mail	NOUN
bibechana-4897	1	71	:	:	PUNCT
bibechana-4897	2	1	ehajiali@yahoo.com	ehajiali@yahoo.com	X
bibechana-4897	2	2	article	article	NOUN
bibechana-4897	2	3	history	history	NOUN
bibechana-4897	2	4	:	:	PUNCT
bibechana-4897	2	5	received	receive	VERB
bibechana-4897	2	6	15	15	NUM
bibechana-4897	2	7	june	june	NOUN
bibechana-4897	2	8	,	,	PUNCT
bibechana-4897	2	9	2011	2011	NUM
bibechana-4897	2	10	;	;	PUNCT
bibechana-4897	2	11	accepted	accept	VERB
bibechana-4897	2	12	11	11	NUM
bibechana-4897	2	13	july	july	PROPN
bibechana-4897	2	14	,	,	PUNCT
bibechana-4897	2	15	2011	2011	NUM
bibechana-4897	2	16	abstract	abstract	ADJ
bibechana-4897	2	17	porous	porous	ADJ
bibechana-4897	2	18	silicon	silicon	NOUN
bibechana-4897	2	19	layers	layer	NOUN
bibechana-4897	2	20	were	be	AUX
bibechana-4897	2	21	prepared	prepare	VERB
bibechana-4897	2	22	by	by	ADP
bibechana-4897	2	23	both	both	CCONJ
bibechana-4897	2	24	chemical	chemical	ADJ
bibechana-4897	2	25	and	and	CCONJ
bibechana-4897	2	26	electrochemical	electrochemical	ADJ
bibechana-4897	2	27	methods	method	NOUN
bibechana-4897	2	28	on	on	ADP
bibechana-4897	2	29	nand	nand	NOUN
bibechana-4897	2	30	ptype	ptype	ADJ
bibechana-4897	2	31	si	si	NOUN
bibechana-4897	2	32	substrates	substrate	NOUN
bibechana-4897	2	33	.	.	PUNCT
bibechana-4897	3	1	in	in	ADP
bibechana-4897	3	2	the	the	DET
bibechana-4897	3	3	former	former	ADJ
bibechana-4897	3	4	technique	technique	NOUN
bibechana-4897	3	5	,	,	PUNCT
bibechana-4897	3	6	light	light	ADJ
bibechana-4897	3	7	emission	emission	NOUN
bibechana-4897	3	8	was	be	AUX
bibechana-4897	3	9	obtained	obtain	VERB
bibechana-4897	3	10	from	from	ADP
bibechana-4897	3	11	p	p	NOUN
bibechana-4897	3	12	-	-	PUNCT
bibechana-4897	3	13	type	type	NOUN
bibechana-4897	3	14	and	and	CCONJ
bibechana-4897	3	15	n	n	CCONJ
bibechana-4897	3	16	-	-	PUNCT
bibechana-4897	3	17	type	type	NOUN
bibechana-4897	3	18	samples	sample	NOUN
bibechana-4897	3	19	.	.	PUNCT
bibechana-4897	4	1	it	it	PRON
bibechana-4897	4	2	was	be	AUX
bibechana-4897	4	3	found	find	VERB
bibechana-4897	4	4	that	that	SCONJ
bibechana-4897	4	5	intense	intense	ADJ
bibechana-4897	4	6	light	light	ADJ
bibechana-4897	4	7	illumination	illumination	NOUN
bibechana-4897	4	8	during	during	ADP
bibechana-4897	4	9	the	the	DET
bibechana-4897	4	10	preparation	preparation	NOUN
bibechana-4897	4	11	process	process	NOUN
bibechana-4897	4	12	was	be	AUX
bibechana-4897	4	13	essential	essential	ADJ
bibechana-4897	4	14	for	for	SCONJ
bibechana-4897	4	15	psi	psi	ADJ
bibechana-4897	4	16	formation	formation	NOUN
bibechana-4897	4	17	on	on	ADP
bibechana-4897	4	18	n	n	CCONJ
bibechana-4897	4	19	-	-	PUNCT
bibechana-4897	4	20	type	type	NOUN
bibechana-4897	4	21	substrates.an	substrates.an	NUM
bibechana-4897	4	22	efficient	efficient	ADJ
bibechana-4897	4	23	electrochemical	electrochemical	ADJ
bibechana-4897	4	24	cell	cell	NOUN
bibechana-4897	4	25	with	with	ADP
bibechana-4897	4	26	some	some	DET
bibechana-4897	4	27	useful	useful	ADJ
bibechana-4897	4	28	features	feature	NOUN
bibechana-4897	4	29	was	be	AUX
bibechana-4897	4	30	designed	design	VERB
bibechana-4897	4	31	for	for	ADP
bibechana-4897	4	32	electrochemical	electrochemical	ADJ
bibechana-4897	4	33	etching	etching	NOUN
bibechana-4897	4	34	of	of	ADP
bibechana-4897	4	35	silicon	silicon	NOUN
bibechana-4897	4	36	.	.	PUNCT
bibechana-4897	5	1	various	various	ADJ
bibechana-4897	5	2	preparation	preparation	NOUN
bibechana-4897	5	3	parameters	parameter	NOUN
bibechana-4897	5	4	were	be	AUX
bibechana-4897	5	5	studied	study	VERB
bibechana-4897	5	6	and	and	CCONJ
bibechana-4897	5	7	photoluminescence	photoluminescence	NOUN
bibechana-4897	5	8	emissions	emission	NOUN
bibechana-4897	5	9	ranging	range	VERB
bibechana-4897	5	10	from	from	ADP
bibechana-4897	5	11	dark	dark	ADJ
bibechana-4897	5	12	red	red	NOUN
bibechana-4897	5	13	to	to	ADP
bibechana-4897	5	14	light	light	ADJ
bibechana-4897	5	15	blue	blue	NOUN
bibechana-4897	5	16	were	be	AUX
bibechana-4897	5	17	obtained	obtain	VERB
bibechana-4897	5	18	from	from	ADP
bibechana-4897	5	19	psi	psi	NOUN
bibechana-4897	5	20	samples	sample	NOUN
bibechana-4897	5	21	prepared	prepare	VERB
bibechana-4897	5	22	on	on	ADP
bibechana-4897	5	23	p	p	ADJ
bibechana-4897	5	24	-	-	PUNCT
bibechana-4897	5	25	type	type	NOUN
bibechana-4897	5	26	substrates	substrate	NOUN
bibechana-4897	5	27	.	.	PUNCT
bibechana-4897	6	1	n	n	CCONJ
bibechana-4897	6	2	-	-	PUNCT
bibechana-4897	6	3	type	type	NOUN
bibechana-4897	6	4	samples	sample	NOUN
bibechana-4897	6	5	produced	produce	VERB
bibechana-4897	6	6	emissions	emission	NOUN
bibechana-4897	6	7	ranging	range	VERB
bibechana-4897	6	8	from	from	ADP
bibechana-4897	6	9	dark	dark	ADJ
bibechana-4897	6	10	red	red	NOUN
bibechana-4897	6	11	to	to	ADP
bibechana-4897	6	12	orange	orange	NOUN
bibechana-4897	6	13	-	-	PUNCT
bibechana-4897	6	14	yellow	yellow	NOUN
bibechana-4897	6	15	.	.	PUNCT
bibechana-4897	7	1	electroluminescence	electroluminescence	NOUN
bibechana-4897	7	2	of	of	ADP
bibechana-4897	7	3	porous	porous	ADJ
bibechana-4897	7	4	silicon	silicon	NOUN
bibechana-4897	7	5	samples	sample	NOUN
bibechana-4897	7	6	showed	show	VERB
bibechana-4897	7	7	that	that	SCONJ
bibechana-4897	7	8	the	the	DET
bibechana-4897	7	9	color	color	NOUN
bibechana-4897	7	10	of	of	ADP
bibechana-4897	7	11	the	the	DET
bibechana-4897	7	12	emission	emission	NOUN
bibechana-4897	7	13	was	be	AUX
bibechana-4897	7	14	the	the	DET
bibechana-4897	7	15	same	same	ADJ
bibechana-4897	7	16	as	as	ADP
bibechana-4897	7	17	the	the	DET
bibechana-4897	7	18	photoluminescence	photoluminescence	NOUN
bibechana-4897	7	19	color	color	NOUN
bibechana-4897	7	20	of	of	ADP
bibechana-4897	7	21	the	the	DET
bibechana-4897	7	22	sample	sample	NOUN
bibechana-4897	7	23	,	,	PUNCT
bibechana-4897	7	24	and	and	CCONJ
bibechana-4897	7	25	its	its	PRON
bibechana-4897	7	26	intensity	intensity	NOUN
bibechana-4897	7	27	and	and	CCONJ
bibechana-4897	7	28	duration	duration	NOUN
bibechana-4897	7	29	depended	depend	VERB
bibechana-4897	7	30	on	on	ADP
bibechana-4897	7	31	the	the	DET
bibechana-4897	7	32	current	current	ADJ
bibechana-4897	7	33	density	density	NOUN
bibechana-4897	7	34	passed	pass	VERB
bibechana-4897	7	35	through	through	ADP
bibechana-4897	7	36	the	the	DET
bibechana-4897	7	37	sample	sample	NOUN
bibechana-4897	7	38	.	.	PUNCT
bibechana-4897	8	1	the	the	DET
bibechana-4897	8	2	effects	effect	NOUN
bibechana-4897	8	3	of	of	ADP
bibechana-4897	8	4	exposure	exposure	NOUN
bibechana-4897	8	5	of	of	ADP
bibechana-4897	8	6	samples	sample	NOUN
bibechana-4897	8	7	to	to	ADP
bibechana-4897	8	8	air	air	NOUN
bibechana-4897	8	9	,	,	PUNCT
bibechana-4897	8	10	storage	storage	NOUN
bibechana-4897	8	11	in	in	ADP
bibechana-4897	8	12	vacuum	vacuum	NOUN
bibechana-4897	8	13	,	,	PUNCT
bibechana-4897	8	14	and	and	CCONJ
bibechana-4897	8	15	heat	heat	NOUN
bibechana-4897	8	16	-	-	PUNCT
bibechana-4897	8	17	treatment	treatment	NOUN
bibechana-4897	8	18	in	in	ADP
bibechana-4897	8	19	air	air	NOUN
bibechana-4897	8	20	on	on	ADP
bibechana-4897	8	21	luminescence	luminescence	NOUN
bibechana-4897	8	22	intensity	intensity	NOUN
bibechana-4897	8	23	of	of	ADP
bibechana-4897	8	24	the	the	DET
bibechana-4897	8	25	samples	sample	NOUN
bibechana-4897	8	26	and	and	CCONJ
bibechana-4897	8	27	preparation	preparation	NOUN
bibechana-4897	8	28	of	of	ADP
bibechana-4897	8	29	patterned	pattern	VERB
bibechana-4897	8	30	porous	porous	ADJ
bibechana-4897	8	31	layers	layer	NOUN
bibechana-4897	8	32	were	be	AUX
bibechana-4897	8	33	also	also	ADV
bibechana-4897	8	34	studied	study	VERB
bibechana-4897	8	35	keywords	keyword	NOUN
bibechana-4897	8	36	:	:	PUNCT
bibechana-4897	8	37	porous	porous	ADJ
bibechana-4897	8	38	silicon	silicon	NOUN
bibechana-4897	8	39	layers	layer	NOUN
bibechana-4897	8	40	;	;	PUNCT
bibechana-4897	8	41	photoluminescence	photoluminescence	NOUN
bibechana-4897	8	42	;	;	PUNCT
bibechana-4897	8	43	electroluminescence	electroluminescence	NOUN
bibechana-4897	8	44	1	1	NUM
bibechana-4897	8	45	.	.	PUNCT
bibechana-4897	9	1	introduction	introduction	NOUN
bibechana-4897	9	2	silicon	silicon	NOUN
bibechana-4897	9	3	is	be	AUX
bibechana-4897	9	4	the	the	DET
bibechana-4897	9	5	most	most	ADV
bibechana-4897	9	6	important	important	ADJ
bibechana-4897	9	7	material	material	NOUN
bibechana-4897	9	8	in	in	ADP
bibechana-4897	9	9	microelectronics	microelectronic	NOUN
bibechana-4897	9	10	technology	technology	NOUN
bibechana-4897	9	11	.	.	PUNCT
bibechana-4897	10	1	however	however	ADV
bibechana-4897	10	2	,	,	PUNCT
bibechana-4897	10	3	it	it	PRON
bibechana-4897	10	4	has	have	VERB
bibechana-4897	10	5	a	a	DET
bibechana-4897	10	6	major	major	ADJ
bibechana-4897	10	7	shortcoming	shortcoming	NOUN
bibechana-4897	10	8	that	that	PRON
bibechana-4897	10	9	prevents	prevent	VERB
bibechana-4897	10	10	development	development	NOUN
bibechana-4897	10	11	of	of	ADP
bibechana-4897	10	12	large	large	ADJ
bibechana-4897	10	13	-	-	PUNCT
bibechana-4897	10	14	scale	scale	NOUN
bibechana-4897	10	15	fabrication	fabrication	NOUN
bibechana-4897	10	16	of	of	ADP
bibechana-4897	10	17	fully	fully	ADV
bibechana-4897	10	18	-	-	PUNCT
bibechana-4897	10	19	integrated	integrate	VERB
bibechana-4897	10	20	optoelectronic	optoelectronic	ADJ
bibechana-4897	10	21	circuits	circuit	NOUN
bibechana-4897	10	22	based	base	VERB
bibechana-4897	10	23	on	on	ADP
bibechana-4897	10	24	silicon	silicon	NOUN
bibechana-4897	10	25	.	.	PUNCT
bibechana-4897	11	1	the	the	DET
bibechana-4897	11	2	origin	origin	NOUN
bibechana-4897	11	3	of	of	ADP
bibechana-4897	11	4	this	this	DET
bibechana-4897	11	5	drawback	drawback	NOUN
bibechana-4897	11	6	is	be	AUX
bibechana-4897	11	7	the	the	DET
bibechana-4897	11	8	indirect	indirect	ADJ
bibechana-4897	11	9	energy	energy	NOUN
bibechana-4897	11	10	band	band	NOUN
bibechana-4897	11	11	gap	gap	NOUN
bibechana-4897	11	12	of	of	ADP
bibechana-4897	11	13	silicon	silicon	NOUN
bibechana-4897	11	14	,	,	PUNCT
bibechana-4897	11	15	which	which	PRON
bibechana-4897	11	16	leads	lead	VERB
bibechana-4897	11	17	to	to	ADP
bibechana-4897	11	18	very	very	ADV
bibechana-4897	11	19	low	low	ADJ
bibechana-4897	11	20	quantum	quantum	ADJ
bibechana-4897	11	21	efficiencies	efficiency	NOUN
bibechana-4897	11	22	for	for	ADP
bibechana-4897	11	23	photoluminescence	photoluminescence	NOUN
bibechana-4897	11	24	(	(	PUNCT
bibechana-4897	11	25	pl	pl	NOUN
bibechana-4897	11	26	)	)	PUNCT
bibechana-4897	11	27	and	and	CCONJ
bibechana-4897	11	28	electroluminescence	electroluminescence	NOUN
bibechana-4897	11	29	(	(	PUNCT
bibechana-4897	11	30	el	el	NOUN
bibechana-4897	11	31	)	)	PUNCT
bibechana-4897	11	32	processes	process	NOUN
bibechana-4897	11	33	in	in	ADP
bibechana-4897	11	34	silicon	silicon	NOUN
bibechana-4897	11	35	.	.	PUNCT
bibechana-4897	12	1	furthermore	furthermore	ADV
bibechana-4897	12	2	,	,	PUNCT
bibechana-4897	12	3	si	si	PROPN
bibechana-4897	12	4	has	have	VERB
bibechana-4897	12	5	a	a	DET
bibechana-4897	12	6	relatively	relatively	ADV
bibechana-4897	12	7	small	small	ADJ
bibechana-4897	12	8	(	(	PUNCT
bibechana-4897	12	9	~1.1	~1.1	X
bibechana-4897	12	10	ev	ev	X
bibechana-4897	12	11	)	)	PUNCT
bibechana-4897	12	12	band	band	NOUN
bibechana-4897	12	13	gap	gap	NOUN
bibechana-4897	12	14	.	.	PUNCT
bibechana-4897	13	1	therefore	therefore	ADV
bibechana-4897	13	2	,	,	PUNCT
bibechana-4897	13	3	the	the	DET
bibechana-4897	13	4	band	band	NOUN
bibechana-4897	13	5	-	-	PUNCT
bibechana-4897	13	6	to	to	ADP
bibechana-4897	13	7	band	band	NOUN
bibechana-4897	13	8	luminescence	luminescence	NOUN
bibechana-4897	13	9	of	of	ADP
bibechana-4897	13	10	bulk	bulk	ADJ
bibechana-4897	13	11	si	si	X
bibechana-4897	13	12	occurs	occur	VERB
bibechana-4897	13	13	in	in	ADP
bibechana-4897	13	14	the	the	DET
bibechana-4897	13	15	near	near	ADV
bibechana-4897	13	16	-	-	PUNCT
bibechana-4897	13	17	infrared	infrared	ADJ
bibechana-4897	13	18	(	(	PUNCT
bibechana-4897	13	19	nir	nir	NOUN
bibechana-4897	13	20	)	)	PUNCT
bibechana-4897	13	21	part	part	NOUN
bibechana-4897	13	22	of	of	ADP
bibechana-4897	13	23	the	the	DET
bibechana-4897	13	24	spectrum	spectrum	NOUN
bibechana-4897	13	25	.	.	PUNCT
bibechana-4897	14	1	this	this	PRON
bibechana-4897	14	2	makes	make	VERB
bibechana-4897	14	3	si	si	PROPN
bibechana-4897	14	4	unsuitable	unsuitable	ADJ
bibechana-4897	14	5	for	for	ADP
bibechana-4897	14	6	optical	optical	ADJ
bibechana-4897	14	7	display	display	NOUN
bibechana-4897	14	8	applications	application	NOUN
bibechana-4897	14	9	.	.	PUNCT
bibechana-4897	15	1	consequently	consequently	ADV
bibechana-4897	15	2	,	,	PUNCT
bibechana-4897	15	3	si	si	PROPN
bibechana-4897	15	4	was	be	AUX
bibechana-4897	15	5	regarded	regard	VERB
bibechana-4897	15	6	as	as	ADP
bibechana-4897	15	7	an	an	DET
bibechana-4897	15	8	unsuitable	unsuitable	ADJ
bibechana-4897	15	9	material	material	NOUN
bibechana-4897	15	10	for	for	ADP
bibechana-4897	15	11	optical	optical	ADJ
bibechana-4897	15	12	applications	application	NOUN
bibechana-4897	15	13	for	for	ADP
bibechana-4897	15	14	many	many	ADJ
bibechana-4897	15	15	years	year	NOUN
bibechana-4897	15	16	.	.	PUNCT
bibechana-4897	16	1	on	on	ADP
bibechana-4897	16	2	the	the	DET
bibechana-4897	16	3	other	other	ADJ
bibechana-4897	16	4	hand	hand	NOUN
bibechana-4897	16	5	,	,	PUNCT
bibechana-4897	16	6	gaas	gaas	NOUN
bibechana-4897	16	7	which	which	PRON
bibechana-4897	16	8	has	have	VERB
bibechana-4897	16	9	a	a	DET
bibechana-4897	16	10	direct	direct	ADJ
bibechana-4897	16	11	band	band	NOUN
bibechana-4897	16	12	gap	gap	NOUN
bibechana-4897	16	13	and	and	CCONJ
bibechana-4897	16	14	can	can	AUX
bibechana-4897	16	15	emit	emit	VERB
bibechana-4897	16	16	light	light	NOUN
bibechana-4897	16	17	rather	rather	ADV
bibechana-4897	16	18	efficiently	efficiently	ADV
bibechana-4897	16	19	is	be	AUX
bibechana-4897	16	20	expensive	expensive	ADJ
bibechana-4897	16	21	and	and	CCONJ
bibechana-4897	16	22	not	not	PART
bibechana-4897	16	23	compatible	compatible	ADJ
bibechana-4897	16	24	with	with	ADP
bibechana-4897	16	25	the	the	DET
bibechana-4897	16	26	highly	highly	ADV
bibechana-4897	16	27	developed	develop	VERB
bibechana-4897	16	28	microelectronics	microelectronic	NOUN
bibechana-4897	16	29	technologies	technology	NOUN
bibechana-4897	16	30	,	,	PUNCT
bibechana-4897	16	31	which	which	PRON
bibechana-4897	16	32	are	be	AUX
bibechana-4897	16	33	based	base	VERB
bibechana-4897	16	34	on	on	ADP
bibechana-4897	16	35	silicon	silicon	NOUN
bibechana-4897	16	36	.	.	PUNCT
bibechana-4897	17	1	in	in	ADP
bibechana-4897	17	2	1990	1990	NUM
bibechana-4897	17	3	canham	canham	NOUN
bibechana-4897	17	4	[	[	X
bibechana-4897	17	5	1	1	X
bibechana-4897	17	6	]	]	PUNCT
bibechana-4897	17	7	reported	report	VERB
bibechana-4897	17	8	emission	emission	NOUN
bibechana-4897	17	9	of	of	ADP
bibechana-4897	17	10	visible	visible	ADJ
bibechana-4897	17	11	light	light	NOUN
bibechana-4897	17	12	from	from	ADP
bibechana-4897	17	13	highly	highly	ADV
bibechana-4897	17	14	porous	porous	ADJ
bibechana-4897	17	15	silicon	silicon	NOUN
bibechana-4897	17	16	(	(	PUNCT
bibechana-4897	17	17	psi	psi	NOUN
bibechana-4897	17	18	)	)	PUNCT
bibechana-4897	17	19	samples	sample	NOUN
bibechana-4897	17	20	.	.	PUNCT
bibechana-4897	18	1	since	since	SCONJ
bibechana-4897	18	2	then	then	ADV
bibechana-4897	18	3	the	the	DET
bibechana-4897	18	4	interest	interest	NOUN
bibechana-4897	18	5	on	on	ADP
bibechana-4897	18	6	psi	psi	NOUN
bibechana-4897	18	7	has	have	AUX
bibechana-4897	18	8	greatly	greatly	ADV
bibechana-4897	18	9	intensified	intensify	VERB
bibechana-4897	18	10	,	,	PUNCT
bibechana-4897	18	11	and	and	CCONJ
bibechana-4897	18	12	during	during	ADP
bibechana-4897	18	13	the	the	DET
bibechana-4897	18	14	last	last	ADJ
bibechana-4897	18	15	five	five	NUM
bibechana-4897	18	16	years	year	NOUN
bibechana-4897	18	17	considerable	considerable	ADJ
bibechana-4897	18	18	research	research	NOUN
bibechana-4897	18	19	has	have	AUX
bibechana-4897	18	20	been	be	AUX
bibechana-4897	18	21	done	do	VERB
bibechana-4897	18	22	on	on	ADP
bibechana-4897	18	23	psi	psi	NOUN
bibechana-4897	18	24	.	.	PUNCT
bibechana-4897	19	1	these	these	PRON
bibechana-4897	19	2	have	have	AUX
bibechana-4897	19	3	been	be	AUX
bibechana-4897	19	4	aimed	aim	VERB
bibechana-4897	19	5	at	at	ADP
bibechana-4897	19	6	both	both	CCONJ
bibechana-4897	19	7	understanding	understand	VERB
bibechana-4897	19	8	the	the	DET
bibechana-4897	19	9	phenomenon	phenomenon	NOUN
bibechana-4897	19	10	from	from	ADP
bibechana-4897	19	11	the	the	DET
bibechana-4897	19	12	basic	basic	ADJ
bibechana-4897	19	13	science	science	NOUN
bibechana-4897	19	14	point	point	NOUN
bibechana-4897	19	15	of	of	ADP
bibechana-4897	19	16	view	view	NOUN
bibechana-4897	19	17	,	,	PUNCT
bibechana-4897	19	18	and	and	CCONJ
bibechana-4897	19	19	also	also	ADV
bibechana-4897	19	20	exploring	explore	VERB
bibechana-4897	19	21	possible	possible	ADJ
bibechana-4897	19	22	optoelectronics	optoelectronic	NOUN
bibechana-4897	19	23	applications	application	NOUN
bibechana-4897	19	24	of	of	ADP
bibechana-4897	19	25	this	this	DET
bibechana-4897	19	26	material	material	NOUN
bibechana-4897	19	27	.	.	PUNCT
bibechana-4897	20	1	due	due	ADP
bibechana-4897	20	2	to	to	ADP
bibechana-4897	20	3	a	a	DET
bibechana-4897	20	4	very	very	ADV
bibechana-4897	20	5	large	large	ADJ
bibechana-4897	20	6	surface	surface	NOUN
bibechana-4897	20	7	area	area	NOUN
bibechana-4897	20	8	,	,	PUNCT
bibechana-4897	20	9	psi	psi	NOUN
bibechana-4897	20	10	layers	layer	NOUN
bibechana-4897	20	11	are	be	AUX
bibechana-4897	20	12	highly	highly	ADV
bibechana-4897	20	13	reactive	reactive	ADJ
bibechana-4897	20	14	and	and	CCONJ
bibechana-4897	20	15	can	can	AUX
bibechana-4897	20	16	be	be	AUX
bibechana-4897	20	17	oxidized	oxidize	VERB
bibechana-4897	20	18	at	at	ADP
bibechana-4897	20	19	low	low	ADJ
bibechana-4897	20	20	temperatures	temperature	NOUN
bibechana-4897	20	21	.	.	PUNCT
bibechana-4897	21	1	furthermore	furthermore	ADV
bibechana-4897	21	2	,	,	PUNCT
bibechana-4897	21	3	psi	psi	PROPN
bibechana-4897	21	4	has	have	VERB
bibechana-4897	21	5	a	a	DET
bibechana-4897	21	6	higher	high	ADJ
bibechana-4897	21	7	resistivity	resistivity	NOUN
bibechana-4897	21	8	than	than	ADP
bibechana-4897	21	9	a	a	DET
bibechana-4897	21	10	comparable	comparable	ADJ
bibechana-4897	21	11	sio2	sio2	NOUN
bibechana-4897	21	12	layer	layer	NOUN
bibechana-4897	21	13	.	.	PUNCT
bibechana-4897	22	1	utilizing	utilize	VERB
bibechana-4897	22	2	e.	e.	PROPN
bibechana-4897	22	3	haji	haji	PROPN
bibechana-4897	22	4	-	-	PUNCT
bibechana-4897	22	5	ali	ali	PROPN
bibechana-4897	22	6	/	/	SYM
bibechana-4897	22	7	bibechana	bibechana	PROPN
bibechana-4897	22	8	8	8	NUM
bibechana-4897	22	9	(	(	PUNCT
bibechana-4897	22	10	2012	2012	NUM
bibechana-4897	22	11	)	)	PUNCT
bibechana-4897	22	12	46	46	NUM
bibechana-4897	22	13	-	-	SYM
bibechana-4897	22	14	52	52	NUM
bibechana-4897	22	15	:	:	PUNCT
bibechana-4897	22	16	bmhss	bmhss	PROPN
bibechana-4897	22	17	,	,	PUNCT
bibechana-4897	22	18	p.47	p.47	ADP
bibechana-4897	22	19	these	these	DET
bibechana-4897	22	20	properties	property	NOUN
bibechana-4897	22	21	,	,	PUNCT
bibechana-4897	22	22	"	"	PUNCT
bibechana-4897	22	23	silicon	silicon	NOUN
bibechana-4897	22	24	-	-	PUNCT
bibechana-4897	22	25	on	on	ADP
bibechana-4897	22	26	-	-	PUNCT
bibechana-4897	22	27	insulator	insulator	NOUN
bibechana-4897	22	28	"	"	PUNCT
bibechana-4897	22	29	(	(	PUNCT
bibechana-4897	22	30	soi	soi	NOUN
bibechana-4897	22	31	)	)	PUNCT
bibechana-4897	22	32	and	and	CCONJ
bibechana-4897	22	33	"	"	PUNCT
bibechana-4897	22	34	fully	fully	ADV
bibechana-4897	22	35	-	-	PUNCT
bibechana-4897	22	36	isolated	isolate	VERB
bibechana-4897	22	37	-	-	PUNCT
bibechana-4897	22	38	porous	porous	ADJ
bibechana-4897	22	39	-	-	PUNCT
bibechana-4897	22	40	oxided	oxide	VERB
bibechana-4897	22	41	-	-	PUNCT
bibechana-4897	22	42	silicon	silicon	NOUN
bibechana-4897	22	43	"	"	PUNCT
bibechana-4897	22	44	(	(	PUNCT
bibechana-4897	22	45	fipos	fipos	NOUN
bibechana-4897	22	46	)	)	PUNCT
bibechana-4897	22	47	processes	process	NOUN
bibechana-4897	22	48	have	have	AUX
bibechana-4897	22	49	used	use	VERB
bibechana-4897	22	50	psi	psi	NOUN
bibechana-4897	22	51	for	for	ADP
bibechana-4897	22	52	device	device	NOUN
bibechana-4897	22	53	isolation	isolation	NOUN
bibechana-4897	22	54	in	in	ADP
bibechana-4897	22	55	si	si	X
bibechana-4897	22	56	integrated	integrate	VERB
bibechana-4897	22	57	circuits	circuit	NOUN
bibechana-4897	22	58	.	.	PUNCT
bibechana-4897	23	1	crystalline	crystalline	PROPN
bibechana-4897	23	2	si	si	PROPN
bibechana-4897	23	3	can	can	AUX
bibechana-4897	23	4	be	be	AUX
bibechana-4897	23	5	made	make	VERB
bibechana-4897	23	6	porous	porous	ADJ
bibechana-4897	23	7	by	by	ADP
bibechana-4897	23	8	partial	partial	ADJ
bibechana-4897	23	9	dissolution	dissolution	NOUN
bibechana-4897	23	10	in	in	ADP
bibechana-4897	23	11	aqueous	aqueous	ADJ
bibechana-4897	23	12	hydrofluoric	hydrofluoric	NOUN
bibechana-4897	23	13	(	(	PUNCT
bibechana-4897	23	14	hf	hf	NOUN
bibechana-4897	23	15	)	)	PUNCT
bibechana-4897	23	16	acid	acid	NOUN
bibechana-4897	23	17	.	.	PUNCT
bibechana-4897	24	1	psi	psi	NOUN
bibechana-4897	24	2	layers	layer	NOUN
bibechana-4897	24	3	have	have	AUX
bibechana-4897	24	4	been	be	AUX
bibechana-4897	24	5	prepared	prepare	VERB
bibechana-4897	24	6	by	by	ADP
bibechana-4897	24	7	both	both	CCONJ
bibechana-4897	24	8	chemical	chemical	ADJ
bibechana-4897	24	9	and	and	CCONJ
bibechana-4897	24	10	electrochemical	electrochemical	ADJ
bibechana-4897	24	11	methods	method	NOUN
bibechana-4897	24	12	.	.	PUNCT
bibechana-4897	25	1	in	in	ADP
bibechana-4897	25	2	electrochemical	electrochemical	ADJ
bibechana-4897	25	3	technique	technique	NOUN
bibechana-4897	25	4	,	,	PUNCT
bibechana-4897	25	5	the	the	DET
bibechana-4897	25	6	hf	hf	PROPN
bibechana-4897	25	7	solution	solution	NOUN
bibechana-4897	25	8	etches	etch	VERB
bibechana-4897	25	9	an	an	DET
bibechana-4897	25	10	array	array	NOUN
bibechana-4897	25	11	of	of	ADP
bibechana-4897	25	12	holes	hole	NOUN
bibechana-4897	25	13	(	(	PUNCT
bibechana-4897	25	14	pores	pore	NOUN
bibechana-4897	25	15	)	)	PUNCT
bibechana-4897	25	16	into	into	ADP
bibechana-4897	25	17	the	the	DET
bibechana-4897	25	18	surface	surface	NOUN
bibechana-4897	25	19	of	of	ADP
bibechana-4897	25	20	the	the	DET
bibechana-4897	25	21	si	si	NOUN
bibechana-4897	25	22	substrate	substrate	NOUN
bibechana-4897	25	23	,	,	PUNCT
bibechana-4897	25	24	when	when	SCONJ
bibechana-4897	25	25	an	an	DET
bibechana-4897	25	26	electrical	electrical	ADJ
bibechana-4897	25	27	current	current	NOUN
bibechana-4897	25	28	passes	pass	VERB
bibechana-4897	25	29	through	through	ADP
bibechana-4897	25	30	the	the	DET
bibechana-4897	25	31	cell	cell	NOUN
bibechana-4897	25	32	.	.	PUNCT
bibechana-4897	26	1	the	the	DET
bibechana-4897	26	2	result	result	NOUN
bibechana-4897	26	3	is	be	AUX
bibechana-4897	26	4	an	an	DET
bibechana-4897	26	5	array	array	NOUN
bibechana-4897	26	6	of	of	ADP
bibechana-4897	26	7	pores	pore	NOUN
bibechana-4897	26	8	that	that	PRON
bibechana-4897	26	9	are	be	AUX
bibechana-4897	26	10	a	a	DET
bibechana-4897	26	11	few	few	ADJ
bibechana-4897	26	12	nanometers	nanometer	NOUN
bibechana-4897	26	13	wide	wide	ADJ
bibechana-4897	26	14	and	and	CCONJ
bibechana-4897	26	15	,	,	PUNCT
bibechana-4897	26	16	in	in	ADP
bibechana-4897	26	17	some	some	DET
bibechana-4897	26	18	cases	case	NOUN
bibechana-4897	26	19	,	,	PUNCT
bibechana-4897	26	20	microns	micron	NOUN
bibechana-4897	26	21	long	long	ADV
bibechana-4897	26	22	.	.	PUNCT
bibechana-4897	27	1	the	the	DET
bibechana-4897	27	2	si	si	PROPN
bibechana-4897	27	3	skeleton	skeleton	NOUN
bibechana-4897	27	4	that	that	PRON
bibechana-4897	27	5	is	be	AUX
bibechana-4897	27	6	left	leave	VERB
bibechana-4897	27	7	behind	behind	ADV
bibechana-4897	27	8	consists	consist	NOUN
bibechana-4897	27	9	of	of	ADP
bibechana-4897	27	10	columnlike	columnlike	NOUN
bibechana-4897	27	11	structures	structure	NOUN
bibechana-4897	27	12	(	(	PUNCT
bibechana-4897	27	13	a	a	DET
bibechana-4897	27	14	few	few	ADJ
bibechana-4897	27	15	nm	nm	ADV
bibechana-4897	27	16	wide	wide	ADJ
bibechana-4897	27	17	)	)	PUNCT
bibechana-4897	27	18	and	and	CCONJ
bibechana-4897	27	19	many	many	ADJ
bibechana-4897	27	20	si	si	PROPN
bibechana-4897	27	21	microcrystals	microcrystal	NOUN
bibechana-4897	27	22	(	(	PUNCT
bibechana-4897	27	23	with	with	ADP
bibechana-4897	27	24	sizes	size	NOUN
bibechana-4897	27	25	ranging	range	VERB
bibechana-4897	27	26	from	from	ADP
bibechana-4897	27	27	~	~	PUNCT
bibechana-4897	27	28	3	3	NUM
bibechana-4897	27	29	–	–	SYM
bibechana-4897	27	30	20	20	NUM
bibechana-4897	27	31	nm	nm	NOUN
bibechana-4897	27	32	)	)	PUNCT
bibechana-4897	27	33	that	that	PRON
bibechana-4897	27	34	are	be	AUX
bibechana-4897	27	35	not	not	PART
bibechana-4897	27	36	connected	connect	VERB
bibechana-4897	27	37	with	with	ADP
bibechana-4897	27	38	the	the	DET
bibechana-4897	27	39	columnlike	columnlike	NOUN
bibechana-4897	27	40	structures	structure	NOUN
bibechana-4897	27	41	.	.	PUNCT
bibechana-4897	28	1	both	both	PRON
bibechana-4897	28	2	of	of	ADP
bibechana-4897	28	3	these	these	DET
bibechana-4897	28	4	columnlike	columnlike	NOUN
bibechana-4897	28	5	and	and	CCONJ
bibechana-4897	28	6	particlelike	particlelike	ADJ
bibechana-4897	28	7	structures	structure	NOUN
bibechana-4897	28	8	have	have	AUX
bibechana-4897	28	9	been	be	AUX
bibechana-4897	28	10	observed	observe	VERB
bibechana-4897	28	11	by	by	ADP
bibechana-4897	28	12	tem	tem	PROPN
bibechana-4897	28	13	and	and	CCONJ
bibechana-4897	28	14	sem	sem	NOUN
bibechana-4897	28	15	studies	study	NOUN
bibechana-4897	28	16	[	[	X
bibechana-4897	28	17	2	2	NUM
bibechana-4897	28	18	]	]	PUNCT
bibechana-4897	28	19	.	.	PUNCT
bibechana-4897	29	1	the	the	DET
bibechana-4897	29	2	columnlike	columnlike	NOUN
bibechana-4897	29	3	si	si	PROPN
bibechana-4897	29	4	structures	structure	NOUN
bibechana-4897	29	5	that	that	PRON
bibechana-4897	29	6	are	be	AUX
bibechana-4897	29	7	sometimes	sometimes	ADV
bibechana-4897	29	8	referred	refer	VERB
bibechana-4897	29	9	to	to	ADP
bibechana-4897	29	10	as	as	ADP
bibechana-4897	29	11	"	"	PUNCT
bibechana-4897	29	12	quantum	quantum	ADJ
bibechana-4897	29	13	wires	wire	NOUN
bibechana-4897	29	14	"	"	PUNCT
bibechana-4897	29	15	are	be	AUX
bibechana-4897	29	16	highly	highly	ADV
bibechana-4897	29	17	strained	strained	ADJ
bibechana-4897	29	18	,	,	PUNCT
bibechana-4897	29	19	but	but	CCONJ
bibechana-4897	29	20	retain	retain	VERB
bibechana-4897	29	21	the	the	DET
bibechana-4897	29	22	crystallinity	crystallinity	NOUN
bibechana-4897	29	23	of	of	ADP
bibechana-4897	29	24	the	the	DET
bibechana-4897	29	25	substrate	substrate	NOUN
bibechana-4897	29	26	.	.	PUNCT
bibechana-4897	30	1	theoretical	theoretical	ADJ
bibechana-4897	30	2	considerations	consideration	NOUN
bibechana-4897	30	3	(	(	PUNCT
bibechana-4897	30	4	based	base	VERB
bibechana-4897	30	5	on	on	ADP
bibechana-4897	30	6	quantum	quantum	ADJ
bibechana-4897	30	7	confinement	confinement	NOUN
bibechana-4897	30	8	model	model	NOUN
bibechana-4897	30	9	)	)	PUNCT
bibechana-4897	30	10	show	show	VERB
bibechana-4897	30	11	that	that	SCONJ
bibechana-4897	30	12	when	when	SCONJ
bibechana-4897	30	13	the	the	DET
bibechana-4897	30	14	average	average	ADJ
bibechana-4897	30	15	width	width	NOUN
bibechana-4897	30	16	of	of	ADP
bibechana-4897	30	17	the	the	DET
bibechana-4897	30	18	si	si	X
bibechana-4897	30	19	quantum	quantum	NOUN
bibechana-4897	30	20	wires	wire	NOUN
bibechana-4897	30	21	become	become	VERB
bibechana-4897	30	22	smaller	small	ADJ
bibechana-4897	30	23	than	than	ADP
bibechana-4897	30	24	about	about	ADV
bibechana-4897	30	25	4	4	NUM
bibechana-4897	30	26	nm	nm	NOUN
bibechana-4897	30	27	,	,	PUNCT
bibechana-4897	30	28	the	the	DET
bibechana-4897	30	29	psi	psi	NOUN
bibechana-4897	30	30	layer	layer	NOUN
bibechana-4897	30	31	should	should	AUX
bibechana-4897	30	32	emit	emit	VERB
bibechana-4897	30	33	visible	visible	ADJ
bibechana-4897	30	34	light	light	NOUN
bibechana-4897	30	35	at	at	ADP
bibechana-4897	30	36	room	room	NOUN
bibechana-4897	30	37	temperature	temperature	NOUN
bibechana-4897	30	38	[	[	X
bibechana-4897	30	39	3	3	NUM
bibechana-4897	30	40	]	]	PUNCT
bibechana-4897	30	41	.	.	PUNCT
bibechana-4897	31	1	the	the	DET
bibechana-4897	31	2	color	color	NOUN
bibechana-4897	31	3	of	of	ADP
bibechana-4897	31	4	this	this	DET
bibechana-4897	31	5	emission	emission	NOUN
bibechana-4897	31	6	should	should	AUX
bibechana-4897	31	7	vary	vary	VERB
bibechana-4897	31	8	with	with	ADP
bibechana-4897	31	9	change	change	NOUN
bibechana-4897	31	10	in	in	ADP
bibechana-4897	31	11	size	size	NOUN
bibechana-4897	31	12	of	of	ADP
bibechana-4897	31	13	the	the	DET
bibechana-4897	31	14	wires	wire	NOUN
bibechana-4897	31	15	,	,	PUNCT
bibechana-4897	31	16	i.e.	i.e.	X
bibechana-4897	31	17	by	by	ADP
bibechana-4897	31	18	making	make	VERB
bibechana-4897	31	19	smaller	small	ADJ
bibechana-4897	31	20	structures	structure	NOUN
bibechana-4897	31	21	;	;	PUNCT
bibechana-4897	31	22	shorter	short	ADJ
bibechana-4897	31	23	-	-	PUNCT
bibechana-4897	31	24	wavelength	wavelength	NOUN
bibechana-4897	31	25	pl	pl	NOUN
bibechana-4897	31	26	emissions	emission	NOUN
bibechana-4897	31	27	should	should	AUX
bibechana-4897	31	28	be	be	AUX
bibechana-4897	31	29	obtained	obtain	VERB
bibechana-4897	31	30	.	.	PUNCT
bibechana-4897	32	1	these	these	PRON
bibechana-4897	32	2	have	have	AUX
bibechana-4897	32	3	been	be	AUX
bibechana-4897	32	4	confirmed	confirm	VERB
bibechana-4897	32	5	experimentally	experimentally	ADV
bibechana-4897	32	6	;	;	PUNCT
bibechana-4897	32	7	si	si	X
bibechana-4897	32	8	wire	wire	NOUN
bibechana-4897	32	9	dimensions	dimension	NOUN
bibechana-4897	32	10	have	have	AUX
bibechana-4897	32	11	been	be	AUX
bibechana-4897	32	12	varied	varied	ADJ
bibechana-4897	32	13	with	with	ADP
bibechana-4897	32	14	changing	change	VERB
bibechana-4897	32	15	psi	psi	ADJ
bibechana-4897	32	16	formation	formation	NOUN
bibechana-4897	32	17	parameters	parameter	NOUN
bibechana-4897	32	18	.	.	PUNCT
bibechana-4897	33	1	psi	psi	ADJ
bibechana-4897	33	2	pore	pore	ADJ
bibechana-4897	33	3	diameters	diameter	NOUN
bibechana-4897	33	4	are	be	AUX
bibechana-4897	33	5	increased	increase	VERB
bibechana-4897	33	6	with	with	ADP
bibechana-4897	33	7	increasing	increase	VERB
bibechana-4897	33	8	current	current	ADJ
bibechana-4897	33	9	densities	density	NOUN
bibechana-4897	33	10	for	for	ADP
bibechana-4897	33	11	both	both	CCONJ
bibechana-4897	33	12	nand	nand	NOUN
bibechana-4897	33	13	p	p	ADJ
bibechana-4897	33	14	-	-	PUNCT
bibechana-4897	33	15	type	type	NOUN
bibechana-4897	33	16	samples	sample	NOUN
bibechana-4897	33	17	.	.	PUNCT
bibechana-4897	34	1	at	at	ADP
bibechana-4897	34	2	low	low	ADJ
bibechana-4897	34	3	-	-	PUNCT
bibechana-4897	34	4	current	current	ADJ
bibechana-4897	34	5	densities	density	NOUN
bibechana-4897	34	6	the	the	DET
bibechana-4897	34	7	pores	pore	NOUN
bibechana-4897	34	8	are	be	AUX
bibechana-4897	34	9	filamentlike	filamentlike	ADJ
bibechana-4897	34	10	and	and	CCONJ
bibechana-4897	34	11	randomly	randomly	ADV
bibechana-4897	34	12	directed	direct	VERB
bibechana-4897	34	13	.	.	PUNCT
bibechana-4897	35	1	but	but	CCONJ
bibechana-4897	35	2	at	at	ADP
bibechana-4897	35	3	higher	high	ADJ
bibechana-4897	35	4	current	current	ADJ
bibechana-4897	35	5	densities	density	NOUN
bibechana-4897	35	6	,	,	PUNCT
bibechana-4897	35	7	the	the	DET
bibechana-4897	35	8	pores	pore	NOUN
bibechana-4897	35	9	"	"	PUNCT
bibechana-4897	35	10	pipe	pipe	NOUN
bibechana-4897	35	11	"	"	PUNCT
bibechana-4897	35	12	i.e.	i.e.	X
bibechana-4897	35	13	becomes	become	VERB
bibechana-4897	35	14	larger	large	ADJ
bibechana-4897	35	15	and	and	CCONJ
bibechana-4897	35	16	more	more	ADV
bibechana-4897	35	17	cylindrically	cylindrically	ADV
bibechana-4897	35	18	shaped	shape	VERB
bibechana-4897	35	19	[	[	PUNCT
bibechana-4897	35	20	4	4	NUM
bibechana-4897	35	21	]	]	PUNCT
bibechana-4897	35	22	.	.	PUNCT
bibechana-4897	36	1	for	for	ADP
bibechana-4897	36	2	p	p	NOUN
bibechana-4897	36	3	-	-	PUNCT
bibechana-4897	36	4	type	type	NOUN
bibechana-4897	36	5	samples	sample	NOUN
bibechana-4897	36	6	both	both	CCONJ
bibechana-4897	36	7	the	the	DET
bibechana-4897	36	8	pore	pore	ADJ
bibechana-4897	36	9	diameters	diameter	NOUN
bibechana-4897	36	10	and	and	CCONJ
bibechana-4897	36	11	interpore	interpore	ADJ
bibechana-4897	36	12	spacings	spacing	NOUN
bibechana-4897	36	13	are	be	AUX
bibechana-4897	36	14	extremely	extremely	ADV
bibechana-4897	36	15	small	small	ADJ
bibechana-4897	36	16	(	(	PUNCT
bibechana-4897	36	17	~1	~1	X
bibechana-4897	36	18	-	-	SYM
bibechana-4897	36	19	5	5	NUM
bibechana-4897	36	20	nm	nm	NOUN
bibechana-4897	36	21	)	)	PUNCT
bibechana-4897	36	22	with	with	ADP
bibechana-4897	36	23	a	a	DET
bibechana-4897	36	24	highly	highly	ADV
bibechana-4897	36	25	interconnected	interconnected	ADJ
bibechana-4897	36	26	and	and	CCONJ
bibechana-4897	36	27	homogeneous	homogeneous	ADJ
bibechana-4897	36	28	pore	pore	ADJ
bibechana-4897	36	29	network	network	NOUN
bibechana-4897	36	30	.	.	PUNCT
bibechana-4897	37	1	the	the	DET
bibechana-4897	37	2	pore	pore	ADJ
bibechana-4897	37	3	diameters	diameter	NOUN
bibechana-4897	37	4	and	and	CCONJ
bibechana-4897	37	5	also	also	ADV
bibechana-4897	37	6	interpore	interpore	ADJ
bibechana-4897	37	7	spacings	spacing	NOUN
bibechana-4897	37	8	increase	increase	VERB
bibechana-4897	37	9	slightly	slightly	ADV
bibechana-4897	37	10	with	with	ADP
bibechana-4897	37	11	increasing	increase	VERB
bibechana-4897	37	12	dopant	dopant	ADJ
bibechana-4897	37	13	concentration	concentration	NOUN
bibechana-4897	37	14	.	.	PUNCT
bibechana-4897	38	1	for	for	ADP
bibechana-4897	38	2	n	n	NOUN
bibechana-4897	38	3	-	-	PUNCT
bibechana-4897	38	4	type	type	NOUN
bibechana-4897	38	5	si	si	NOUN
bibechana-4897	38	6	the	the	DET
bibechana-4897	38	7	pore	pore	ADJ
bibechana-4897	38	8	diameters	diameter	NOUN
bibechana-4897	38	9	are	be	AUX
bibechana-4897	38	10	considerably	considerably	ADV
bibechana-4897	38	11	larger	large	ADJ
bibechana-4897	38	12	than	than	ADP
bibechana-4897	38	13	p	p	NOUN
bibechana-4897	38	14	-	-	PUNCT
bibechana-4897	38	15	type	type	NOUN
bibechana-4897	38	16	si	si	NOUN
bibechana-4897	38	17	and	and	CCONJ
bibechana-4897	38	18	show	show	VERB
bibechana-4897	38	19	a	a	DET
bibechana-4897	38	20	strong	strong	ADJ
bibechana-4897	38	21	tendency	tendency	NOUN
bibechana-4897	38	22	to	to	PART
bibechana-4897	38	23	form	form	VERB
bibechana-4897	38	24	straight	straight	ADJ
bibechana-4897	38	25	channels	channel	NOUN
bibechana-4897	38	26	at	at	ADP
bibechana-4897	38	27	low	low	ADJ
bibechana-4897	38	28	dopant	dopant	ADJ
bibechana-4897	38	29	concentration	concentration	NOUN
bibechana-4897	38	30	.	.	PUNCT
bibechana-4897	39	1	as	as	SCONJ
bibechana-4897	39	2	the	the	DET
bibechana-4897	39	3	dopant	dopant	ADJ
bibechana-4897	39	4	concentration	concentration	NOUN
bibechana-4897	39	5	is	be	AUX
bibechana-4897	39	6	increased	increase	VERB
bibechana-4897	39	7	,	,	PUNCT
bibechana-4897	39	8	both	both	CCONJ
bibechana-4897	39	9	the	the	DET
bibechana-4897	39	10	pore	pore	ADJ
bibechana-4897	39	11	diameters	diameter	NOUN
bibechana-4897	39	12	and	and	CCONJ
bibechana-4897	39	13	interpore	interpore	ADJ
bibechana-4897	39	14	spacings	spacing	NOUN
bibechana-4897	39	15	are	be	AUX
bibechana-4897	39	16	decreased	decrease	VERB
bibechana-4897	39	17	,	,	PUNCT
bibechana-4897	39	18	to	to	ADP
bibechana-4897	39	19	the	the	DET
bibechana-4897	39	20	point	point	NOUN
bibechana-4897	39	21	where	where	SCONJ
bibechana-4897	39	22	the	the	DET
bibechana-4897	39	23	pore	pore	ADJ
bibechana-4897	39	24	morphologies	morphology	NOUN
bibechana-4897	39	25	and	and	CCONJ
bibechana-4897	39	26	diameters	diameter	NOUN
bibechana-4897	39	27	of	of	ADP
bibechana-4897	39	28	n+	n+	PUNCT
bibechana-4897	39	29	and	and	CCONJ
bibechana-4897	39	30	p+	p+	NOUN
bibechana-4897	39	31	samples	sample	NOUN
bibechana-4897	39	32	become	become	VERB
bibechana-4897	39	33	comparable	comparable	ADJ
bibechana-4897	39	34	[	[	X
bibechana-4897	39	35	4	4	NUM
bibechana-4897	39	36	]	]	PUNCT
bibechana-4897	39	37	.	.	PUNCT
bibechana-4897	40	1	the	the	DET
bibechana-4897	40	2	actual	actual	ADJ
bibechana-4897	40	3	pore	pore	ADJ
bibechana-4897	40	4	formation	formation	NOUN
bibechana-4897	40	5	mechanism	mechanism	NOUN
bibechana-4897	40	6	shows	show	VERB
bibechana-4897	40	7	considerable	considerable	ADJ
bibechana-4897	40	8	anisotropy	anisotropy	NOUN
bibechana-4897	40	9	.	.	PUNCT
bibechana-4897	41	1	for	for	ADP
bibechana-4897	41	2	example	example	NOUN
bibechana-4897	41	3	,	,	PUNCT
bibechana-4897	41	4	it	it	PRON
bibechana-4897	41	5	is	be	AUX
bibechana-4897	41	6	shown	show	VERB
bibechana-4897	41	7	that	that	SCONJ
bibechana-4897	41	8	in	in	ADP
bibechana-4897	41	9	n	n	CCONJ
bibechana-4897	41	10	-	-	PUNCT
bibechana-4897	41	11	type	type	NOUN
bibechana-4897	41	12	si	si	NOUN
bibechana-4897	41	13	,	,	PUNCT
bibechana-4897	41	14	pore	pore	ADJ
bibechana-4897	41	15	formation	formation	NOUN
bibechana-4897	41	16	results	result	NOUN
bibechana-4897	41	17	in	in	ADP
bibechana-4897	41	18	rectangular	rectangular	ADJ
bibechana-4897	41	19	-	-	PUNCT
bibechana-4897	41	20	shaped	shape	VERB
bibechana-4897	41	21	pores	pore	NOUN
bibechana-4897	41	22	[	[	X
bibechana-4897	41	23	4	4	NUM
bibechana-4897	41	24	]	]	PUNCT
bibechana-4897	41	25	.	.	PUNCT
bibechana-4897	42	1	2	2	X
bibechana-4897	42	2	.	.	X
bibechana-4897	42	3	experimental	experimental	ADJ
bibechana-4897	42	4	results	result	NOUN
bibechana-4897	42	5	2.1	2.1	NUM
bibechana-4897	42	6	chemical	chemical	NOUN
bibechana-4897	42	7	method	method	NOUN
bibechana-4897	42	8	psi	psi	NOUN
bibechana-4897	42	9	layers	layer	NOUN
bibechana-4897	42	10	were	be	AUX
bibechana-4897	42	11	prepared	prepare	VERB
bibechana-4897	42	12	by	by	ADP
bibechana-4897	42	13	etching	etch	VERB
bibechana-4897	42	14	of	of	ADP
bibechana-4897	42	15	si	si	PROPN
bibechana-4897	42	16	in	in	ADP
bibechana-4897	42	17	a	a	DET
bibechana-4897	42	18	mixture	mixture	NOUN
bibechana-4897	42	19	of	of	ADP
bibechana-4897	42	20	hf	hf	NOUN
bibechana-4897	42	21	:	:	PUNCT
bibechana-4897	42	22	hno3	hno3	PROPN
bibechana-4897	42	23	:	:	PUNCT
bibechana-4897	42	24	h2o	h2o	PROPN
bibechana-4897	42	25	(	(	PUNCT
bibechana-4897	42	26	with	with	ADP
bibechana-4897	42	27	1:3:5	1:3:5	NUM
bibechana-4897	42	28	ratio	ratio	NOUN
bibechana-4897	42	29	)	)	PUNCT
bibechana-4897	42	30	and	and	CCONJ
bibechana-4897	42	31	a	a	DET
bibechana-4897	42	32	small	small	ADJ
bibechana-4897	42	33	amount	amount	NOUN
bibechana-4897	42	34	of	of	ADP
bibechana-4897	42	35	ethanol	ethanol	NOUN
bibechana-4897	42	36	(	(	PUNCT
bibechana-4897	42	37	~	~	PUNCT
bibechana-4897	42	38	3	3	NUM
bibechana-4897	42	39	%	%	NOUN
bibechana-4897	42	40	)	)	PUNCT
bibechana-4897	42	41	.	.	PUNCT
bibechana-4897	43	1	si	si	PROPN
bibechana-4897	43	2	samples	sample	NOUN
bibechana-4897	43	3	were	be	AUX
bibechana-4897	43	4	first	first	ADV
bibechana-4897	43	5	cleaned	clean	VERB
bibechana-4897	43	6	with	with	ADP
bibechana-4897	43	7	rca1	rca1	NOUN
bibechana-4897	43	8	and	and	CCONJ
bibechana-4897	43	9	rca2	rca2	NOUN
bibechana-4897	43	10	solutions	solution	NOUN
bibechana-4897	43	11	,	,	PUNCT
bibechana-4897	43	12	followed	follow	VERB
bibechana-4897	43	13	by	by	ADP
bibechana-4897	43	14	a	a	DET
bibechana-4897	43	15	dip	dip	NOUN
bibechana-4897	43	16	in	in	ADP
bibechana-4897	43	17	a	a	DET
bibechana-4897	43	18	10	10	NUM
bibechana-4897	43	19	%	%	NOUN
bibechana-4897	43	20	hf	hf	NOUN
bibechana-4897	43	21	solution	solution	NOUN
bibechana-4897	43	22	for	for	ADP
bibechana-4897	43	23	one	one	NUM
bibechana-4897	43	24	minute	minute	NOUN
bibechana-4897	43	25	.	.	PUNCT
bibechana-4897	44	1	samples	sample	NOUN
bibechana-4897	44	2	were	be	AUX
bibechana-4897	44	3	etched	etch	VERB
bibechana-4897	44	4	for	for	ADP
bibechana-4897	44	5	5	5	NUM
bibechana-4897	44	6	minutes	minute	NOUN
bibechana-4897	44	7	and	and	CCONJ
bibechana-4897	44	8	wear	wear	VERB
bibechana-4897	44	9	rinsed	rinse	VERB
bibechana-4897	44	10	in	in	ADP
bibechana-4897	44	11	deionized	deionize	VERB
bibechana-4897	44	12	water	water	NOUN
bibechana-4897	44	13	and	and	CCONJ
bibechana-4897	44	14	dried	dry	VERB
bibechana-4897	44	15	with	with	ADP
bibechana-4897	44	16	n2	n2	ADJ
bibechana-4897	44	17	gas	gas	NOUN
bibechana-4897	44	18	.	.	PUNCT
bibechana-4897	45	1	the	the	DET
bibechana-4897	45	2	etching	etch	VERB
bibechana-4897	45	3	process	process	NOUN
bibechana-4897	45	4	was	be	AUX
bibechana-4897	45	5	performed	perform	VERB
bibechana-4897	45	6	under	under	ADP
bibechana-4897	45	7	bright	bright	ADJ
bibechana-4897	45	8	light	light	ADJ
bibechana-4897	45	9	illumination	illumination	NOUN
bibechana-4897	45	10	.	.	PUNCT
bibechana-4897	46	1	samples	sample	NOUN
bibechana-4897	46	2	emitted	emit	VERB
bibechana-4897	46	3	organe	organe	NOUN
bibechana-4897	46	4	light	light	NOUN
bibechana-4897	46	5	under	under	ADP
bibechana-4897	46	6	uv	uv	NOUN
bibechana-4897	46	7	illumination	illumination	NOUN
bibechana-4897	46	8	.	.	PUNCT
bibechana-4897	47	1	both	both	DET
bibechana-4897	47	2	nand	nand	NOUN
bibechana-4897	47	3	p	p	NOUN
bibechana-4897	47	4	type	type	NOUN
bibechana-4897	47	5	samples	sample	NOUN
bibechana-4897	47	6	showed	show	VERB
bibechana-4897	47	7	light	light	ADJ
bibechana-4897	47	8	emission	emission	NOUN
bibechana-4897	47	9	,	,	PUNCT
bibechana-4897	47	10	but	but	CCONJ
bibechana-4897	47	11	p	p	X
bibechana-4897	47	12	-	-	PUNCT
bibechana-4897	47	13	type	type	NOUN
bibechana-4897	47	14	samples	sample	NOUN
bibechana-4897	47	15	had	have	VERB
bibechana-4897	47	16	pl	pl	X
bibechana-4897	47	17	intensities	intensity	NOUN
bibechana-4897	47	18	greater	great	ADJ
bibechana-4897	47	19	than	than	ADP
bibechana-4897	47	20	that	that	PRON
bibechana-4897	47	21	of	of	ADP
bibechana-4897	47	22	the	the	DET
bibechana-4897	47	23	n	n	CCONJ
bibechana-4897	47	24	-	-	PUNCT
bibechana-4897	47	25	type	type	NOUN
bibechana-4897	47	26	specimens	specimen	NOUN
bibechana-4897	47	27	.	.	PUNCT
bibechana-4897	48	1	however	however	ADV
bibechana-4897	48	2	these	these	DET
bibechana-4897	48	3	intensities	intensity	NOUN
bibechana-4897	48	4	were	be	AUX
bibechana-4897	48	5	significantly	significantly	ADV
bibechana-4897	48	6	lower	low	ADJ
bibechana-4897	48	7	than	than	ADP
bibechana-4897	48	8	that	that	PRON
bibechana-4897	48	9	of	of	ADP
bibechana-4897	48	10	samples	sample	NOUN
bibechana-4897	48	11	prepared	prepare	VERB
bibechana-4897	48	12	by	by	ADP
bibechana-4897	48	13	electrochanical	electrochanical	ADJ
bibechana-4897	48	14	technique	technique	NOUN
bibechana-4897	48	15	.	.	PUNCT
bibechana-4897	49	1	this	this	PRON
bibechana-4897	49	2	is	be	AUX
bibechana-4897	49	3	known	know	VERB
bibechana-4897	49	4	to	to	PART
bibechana-4897	49	5	be	be	AUX
bibechana-4897	49	6	due	due	ADJ
bibechana-4897	49	7	to	to	ADP
bibechana-4897	49	8	the	the	DET
bibechana-4897	49	9	lower	low	ADJ
bibechana-4897	49	10	psi	psi	NOUN
bibechana-4897	49	11	film	film	NOUN
bibechana-4897	49	12	thicknesses	thickness	NOUN
bibechana-4897	49	13	that	that	PRON
bibechana-4897	49	14	are	be	AUX
bibechana-4897	49	15	attainable	attainable	ADJ
bibechana-4897	49	16	by	by	ADP
bibechana-4897	49	17	this	this	DET
bibechana-4897	49	18	preparation	preparation	NOUN
bibechana-4897	49	19	technique	technique	NOUN
bibechana-4897	49	20	.	.	PUNCT
bibechana-4897	50	1	the	the	DET
bibechana-4897	50	2	film	film	NOUN
bibechana-4897	50	3	thickness	thickness	NOUN
bibechana-4897	50	4	in	in	ADP
bibechana-4897	50	5	this	this	DET
bibechana-4897	50	6	process	process	NOUN
bibechana-4897	50	7	is	be	AUX
bibechana-4897	50	8	self	self	NOUN
bibechana-4897	50	9	limiting	limit	VERB
bibechana-4897	50	10	and	and	CCONJ
bibechana-4897	50	11	saturates	saturate	VERB
bibechana-4897	50	12	after	after	ADP
bibechana-4897	50	13	several	several	ADJ
bibechana-4897	50	14	minutes	minute	NOUN
bibechana-4897	50	15	;	;	PUNCT
bibechana-4897	50	16	this	this	PRON
bibechana-4897	50	17	happens	happen	VERB
bibechana-4897	50	18	when	when	SCONJ
bibechana-4897	50	19	dissolution	dissolution	ADJ
bibechana-4897	50	20	rates	rate	NOUN
bibechana-4897	50	21	of	of	ADP
bibechana-4897	50	22	si	si	PROPN
bibechana-4897	50	23	at	at	ADP
bibechana-4897	50	24	the	the	DET
bibechana-4897	50	25	top	top	ADJ
bibechana-4897	50	26	surface	surface	NOUN
bibechana-4897	50	27	and	and	CCONJ
bibechana-4897	50	28	at	at	ADP
bibechana-4897	50	29	the	the	DET
bibechana-4897	50	30	bottom	bottom	ADJ
bibechana-4897	50	31	part	part	NOUN
bibechana-4897	50	32	of	of	ADP
bibechana-4897	50	33	the	the	DET
bibechana-4897	50	34	psi	psi	NOUN
bibechana-4897	50	35	layer	layer	NOUN
bibechana-4897	50	36	are	be	AUX
bibechana-4897	50	37	balanced	balance	VERB
bibechana-4897	50	38	.	.	PUNCT
bibechana-4897	51	1	pt	pt	NOUN
bibechana-4897	51	2	si	si	PROPN
bibechana-4897	51	3	wafer	wafer	PROPN
bibechana-4897	51	4	e.	e.	PROPN
bibechana-4897	51	5	haji	haji	PROPN
bibechana-4897	51	6	-	-	PUNCT
bibechana-4897	51	7	ali	ali	PROPN
bibechana-4897	51	8	/	/	SYM
bibechana-4897	51	9	bibechana	bibechana	PROPN
bibechana-4897	51	10	8	8	NUM
bibechana-4897	51	11	(	(	PUNCT
bibechana-4897	51	12	2012	2012	NUM
bibechana-4897	51	13	)	)	PUNCT
bibechana-4897	51	14	46	46	NUM
bibechana-4897	51	15	-	-	SYM
bibechana-4897	51	16	52	52	NUM
bibechana-4897	51	17	:	:	PUNCT
bibechana-4897	51	18	bmhss	bmhss	PROPN
bibechana-4897	51	19	,	,	PUNCT
bibechana-4897	51	20	p.48	p.48	PRON
bibechana-4897	51	21	it	it	PRON
bibechana-4897	51	22	is	be	AUX
bibechana-4897	51	23	believed	believe	VERB
bibechana-4897	51	24	that	that	SCONJ
bibechana-4897	51	25	in	in	ADP
bibechana-4897	51	26	this	this	DET
bibechana-4897	51	27	case	case	NOUN
bibechana-4897	51	28	the	the	DET
bibechana-4897	51	29	chemical	chemical	NOUN
bibechana-4897	51	30	etching	etch	VERB
bibechana-4897	51	31	is	be	AUX
bibechana-4897	51	32	a	a	DET
bibechana-4897	51	33	two	two	NUM
bibechana-4897	51	34	-	-	PUNCT
bibechana-4897	51	35	step	step	NOUN
bibechana-4897	51	36	process	process	NOUN
bibechana-4897	51	37	,	,	PUNCT
bibechana-4897	51	38	in	in	ADP
bibechana-4897	51	39	which	which	PRON
bibechana-4897	51	40	the	the	DET
bibechana-4897	51	41	si	si	PROPN
bibechana-4897	51	42	surface	surface	NOUN
bibechana-4897	51	43	is	be	AUX
bibechana-4897	51	44	first	first	ADV
bibechana-4897	51	45	oxidized	oxidize	VERB
bibechana-4897	51	46	by	by	ADP
bibechana-4897	51	47	hno3	hno3	PROPN
bibechana-4897	51	48	acid	acid	PROPN
bibechana-4897	51	49	,	,	PUNCT
bibechana-4897	51	50	and	and	CCONJ
bibechana-4897	51	51	then	then	ADV
bibechana-4897	51	52	the	the	DET
bibechana-4897	51	53	oxide	oxide	NOUN
bibechana-4897	51	54	is	be	AUX
bibechana-4897	51	55	reacted	react	VERB
bibechana-4897	51	56	with	with	ADP
bibechana-4897	51	57	hf	hf	NOUN
bibechana-4897	51	58	acid	acid	NOUN
bibechana-4897	51	59	to	to	PART
bibechana-4897	51	60	form	form	VERB
bibechana-4897	51	61	h2sif6	h2sif6	NOUN
bibechana-4897	51	62	which	which	PRON
bibechana-4897	51	63	is	be	AUX
bibechana-4897	51	64	soluble	soluble	ADJ
bibechana-4897	51	65	in	in	ADP
bibechana-4897	51	66	water	water	NOUN
bibechana-4897	51	67	.	.	PUNCT
bibechana-4897	52	1	shih	shih	PROPN
bibechana-4897	52	2	et	et	PROPN
bibechana-4897	52	3	.	.	PUNCT
bibechana-4897	53	1	al	al	PROPN
bibechana-4897	53	2	.	.	PUNCT
bibechana-4897	54	1	[	[	X
bibechana-4897	54	2	5	5	NUM
bibechana-4897	54	3	]	]	PUNCT
bibechana-4897	54	4	have	have	AUX
bibechana-4897	54	5	proposed	propose	VERB
bibechana-4897	54	6	a	a	DET
bibechana-4897	54	7	localized	localized	ADJ
bibechana-4897	54	8	electrochemical	electrochemical	ADJ
bibechana-4897	54	9	process	process	NOUN
bibechana-4897	54	10	for	for	ADP
bibechana-4897	54	11	the	the	DET
bibechana-4897	54	12	above	above	ADJ
bibechana-4897	54	13	psi	psi	NOUN
bibechana-4897	54	14	formation	formation	NOUN
bibechana-4897	54	15	.	.	PUNCT
bibechana-4897	55	1	according	accord	VERB
bibechana-4897	55	2	to	to	ADP
bibechana-4897	55	3	them	they	PRON
bibechana-4897	55	4	,	,	PUNCT
bibechana-4897	55	5	anode	anode	NOUN
bibechana-4897	55	6	and	and	CCONJ
bibechana-4897	55	7	cathode	cathode	NOUN
bibechana-4897	55	8	sites	site	NOUN
bibechana-4897	55	9	are	be	AUX
bibechana-4897	55	10	momentarily	momentarily	ADV
bibechana-4897	55	11	formed	form	VERB
bibechana-4897	55	12	on	on	ADP
bibechana-4897	55	13	the	the	DET
bibechana-4897	55	14	etched	etched	ADJ
bibechana-4897	55	15	surface	surface	NOUN
bibechana-4897	55	16	,	,	PUNCT
bibechana-4897	55	17	and	and	CCONJ
bibechana-4897	55	18	a	a	DET
bibechana-4897	55	19	local	local	ADJ
bibechana-4897	55	20	current	current	ADJ
bibechana-4897	55	21	flow	flow	NOUN
bibechana-4897	55	22	between	between	ADP
bibechana-4897	55	23	them	they	PRON
bibechana-4897	55	24	during	during	ADP
bibechana-4897	55	25	the	the	DET
bibechana-4897	55	26	etching	etch	VERB
bibechana-4897	55	27	process	process	NOUN
bibechana-4897	55	28	.	.	PUNCT
bibechana-4897	56	1	the	the	DET
bibechana-4897	56	2	anodeforming	anodeforme	VERB
bibechana-4897	56	3	reaction	reaction	NOUN
bibechana-4897	56	4	consists	consist	VERB
bibechana-4897	56	5	of	of	ADP
bibechana-4897	56	6	the	the	DET
bibechana-4897	56	7	dissolution	dissolution	NOUN
bibechana-4897	56	8	of	of	ADP
bibechana-4897	56	9	si	si	PROPN
bibechana-4897	56	10	,	,	PUNCT
bibechana-4897	56	11	and	and	CCONJ
bibechana-4897	56	12	the	the	DET
bibechana-4897	56	13	cathode	cathode	NOUN
bibechana-4897	56	14	reaction	reaction	NOUN
bibechana-4897	56	15	is	be	AUX
bibechana-4897	56	16	believed	believe	VERB
bibechana-4897	56	17	to	to	PART
bibechana-4897	56	18	be	be	AUX
bibechana-4897	56	19	a	a	DET
bibechana-4897	56	20	complicated	complicated	ADJ
bibechana-4897	56	21	reduction	reduction	NOUN
bibechana-4897	56	22	of	of	ADP
bibechana-4897	56	23	hno3	hno3	NOUN
bibechana-4897	56	24	that	that	PRON
bibechana-4897	56	25	causes	cause	VERB
bibechana-4897	56	26	holes	hole	NOUN
bibechana-4897	56	27	to	to	PART
bibechana-4897	56	28	be	be	AUX
bibechana-4897	56	29	injected	inject	VERB
bibechana-4897	56	30	in	in	ADP
bibechana-4897	56	31	the	the	DET
bibechana-4897	56	32	si	si	NOUN
bibechana-4897	56	33	.	.	PUNCT
bibechana-4897	57	1	the	the	DET
bibechana-4897	57	2	parameters	parameter	NOUN
bibechana-4897	57	3	involved	involve	VERB
bibechana-4897	57	4	are	be	AUX
bibechana-4897	57	5	:	:	PUNCT
bibechana-4897	57	6	hno3	hno3	ADJ
bibechana-4897	57	7	concentration	concentration	NOUN
bibechana-4897	57	8	in	in	ADP
bibechana-4897	57	9	the	the	DET
bibechana-4897	57	10	enchant	enchant	NOUN
bibechana-4897	57	11	mixture	mixture	NOUN
bibechana-4897	57	12	,	,	PUNCT
bibechana-4897	57	13	reaction	reaction	NOUN
bibechana-4897	57	14	time	time	NOUN
bibechana-4897	57	15	,	,	PUNCT
bibechana-4897	57	16	stirring	stir	VERB
bibechana-4897	57	17	condition	condition	NOUN
bibechana-4897	57	18	,	,	PUNCT
bibechana-4897	57	19	and	and	CCONJ
bibechana-4897	57	20	doping	doping	NOUN
bibechana-4897	57	21	level	level	NOUN
bibechana-4897	57	22	and	and	CCONJ
bibechana-4897	57	23	conductivity	conductivity	NOUN
bibechana-4897	57	24	type	type	NOUN
bibechana-4897	57	25	of	of	ADP
bibechana-4897	57	26	the	the	DET
bibechana-4897	57	27	substrate	substrate	NOUN
bibechana-4897	57	28	.	.	PUNCT
bibechana-4897	58	1	for	for	ADP
bibechana-4897	58	2	stronger	strong	ADJ
bibechana-4897	58	3	stirring	stirring	NOUN
bibechana-4897	58	4	,	,	PUNCT
bibechana-4897	58	5	a	a	DET
bibechana-4897	58	6	thicker	thick	ADJ
bibechana-4897	58	7	final	final	ADJ
bibechana-4897	58	8	film	film	NOUN
bibechana-4897	58	9	is	be	AUX
bibechana-4897	58	10	formed	form	VERB
bibechana-4897	58	11	;	;	PUNCT
bibechana-4897	58	12	shi	shi	PROPN
bibechana-4897	58	13	et	et	PROPN
bibechana-4897	58	14	al	al	PROPN
bibechana-4897	59	1	[	[	X
bibechana-4897	59	2	5	5	NUM
bibechana-4897	59	3	]	]	PUNCT
bibechana-4897	59	4	have	have	AUX
bibechana-4897	59	5	reported	report	VERB
bibechana-4897	59	6	psi	psi	ADJ
bibechana-4897	59	7	formation	formation	NOUN
bibechana-4897	59	8	with	with	ADP
bibechana-4897	59	9	p	p	NOUN
bibechana-4897	59	10	-	-	PUNCT
bibechana-4897	59	11	type	type	NOUN
bibechana-4897	59	12	samples	sample	NOUN
bibechana-4897	59	13	only	only	ADV
bibechana-4897	59	14	.	.	PUNCT
bibechana-4897	60	1	we	we	PRON
bibechana-4897	60	2	also	also	ADV
bibechana-4897	60	3	found	find	VERB
bibechana-4897	60	4	that	that	SCONJ
bibechana-4897	60	5	when	when	SCONJ
bibechana-4897	60	6	the	the	DET
bibechana-4897	60	7	etching	etch	VERB
bibechana-4897	60	8	process	process	NOUN
bibechana-4897	60	9	was	be	AUX
bibechana-4897	60	10	carried	carry	VERB
bibechana-4897	60	11	out	out	ADP
bibechana-4897	60	12	in	in	ADP
bibechana-4897	60	13	dark	dark	ADJ
bibechana-4897	60	14	(	(	PUNCT
bibechana-4897	60	15	or	or	CCONJ
bibechana-4897	60	16	low	low	ADJ
bibechana-4897	60	17	-	-	PUNCT
bibechana-4897	60	18	level	level	NOUN
bibechana-4897	60	19	illumination	illumination	NOUN
bibechana-4897	60	20	)	)	PUNCT
bibechana-4897	60	21	psi	psi	NOUN
bibechana-4897	60	22	did	do	AUX
bibechana-4897	60	23	not	not	PART
bibechana-4897	60	24	from	from	ADP
bibechana-4897	60	25	on	on	ADP
bibechana-4897	60	26	n	n	CCONJ
bibechana-4897	60	27	-	-	PUNCT
bibechana-4897	60	28	type	type	NOUN
bibechana-4897	60	29	samples	sample	NOUN
bibechana-4897	60	30	;	;	PUNCT
bibechana-4897	60	31	however	however	ADV
bibechana-4897	60	32	,	,	PUNCT
bibechana-4897	60	33	psi	psi	ADJ
bibechana-4897	60	34	formation	formation	NOUN
bibechana-4897	60	35	on	on	ADP
bibechana-4897	60	36	n	n	CCONJ
bibechana-4897	60	37	-	-	PUNCT
bibechana-4897	60	38	type	type	NOUN
bibechana-4897	60	39	si	si	NOUN
bibechana-4897	60	40	was	be	AUX
bibechana-4897	60	41	possible	possible	ADJ
bibechana-4897	60	42	under	under	ADP
bibechana-4897	60	43	rather	rather	ADV
bibechana-4897	60	44	high	high	ADJ
bibechana-4897	60	45	illumination	illumination	NOUN
bibechana-4897	60	46	intensities	intensity	NOUN
bibechana-4897	60	47	.	.	PUNCT
bibechana-4897	61	1	2.2	2.2	NUM
bibechana-4897	61	2	electrochemical	electrochemical	ADJ
bibechana-4897	61	3	method	method	NOUN
bibechana-4897	61	4	figure	figure	NOUN
bibechana-4897	61	5	(	(	PUNCT
bibechana-4897	61	6	1	1	X
bibechana-4897	61	7	)	)	PUNCT
bibechana-4897	61	8	shows	show	VERB
bibechana-4897	61	9	schematic	schematic	ADJ
bibechana-4897	61	10	diagram	diagram	NOUN
bibechana-4897	61	11	of	of	ADP
bibechana-4897	61	12	the	the	DET
bibechana-4897	61	13	cell	cell	NOUN
bibechana-4897	61	14	that	that	PRON
bibechana-4897	61	15	was	be	AUX
bibechana-4897	61	16	designed	design	VERB
bibechana-4897	61	17	and	and	CCONJ
bibechana-4897	61	18	made	make	VERB
bibechana-4897	61	19	for	for	ADP
bibechana-4897	61	20	electrochemical	electrochemical	ADJ
bibechana-4897	61	21	etching	etching	NOUN
bibechana-4897	61	22	of	of	ADP
bibechana-4897	61	23	si	si	NOUN
bibechana-4897	61	24	samples	sample	NOUN
bibechana-4897	61	25	.	.	PUNCT
bibechana-4897	62	1	an	an	DET
bibechana-4897	62	2	ultrasonic	ultrasonic	ADJ
bibechana-4897	62	3	vibrator	vibrator	NOUN
bibechana-4897	62	4	is	be	AUX
bibechana-4897	62	5	used	use	VERB
bibechana-4897	62	6	for	for	ADP
bibechana-4897	62	7	prevention	prevention	NOUN
bibechana-4897	62	8	of	of	ADP
bibechana-4897	62	9	gas	gas	NOUN
bibechana-4897	62	10	bubble	bubble	NOUN
bibechana-4897	62	11	formation	formation	NOUN
bibechana-4897	62	12	on	on	ADP
bibechana-4897	62	13	the	the	DET
bibechana-4897	62	14	sample	sample	NOUN
bibechana-4897	62	15	.	.	PUNCT
bibechana-4897	63	1	this	this	DET
bibechana-4897	63	2	cell	cell	NOUN
bibechana-4897	63	3	needs	need	VERB
bibechana-4897	63	4	very	very	ADV
bibechana-4897	63	5	little	little	ADJ
bibechana-4897	63	6	(	(	PUNCT
bibechana-4897	63	7	about	about	ADV
bibechana-4897	63	8	15	15	NUM
bibechana-4897	63	9	cc	cc	NOUN
bibechana-4897	63	10	)	)	PUNCT
bibechana-4897	63	11	etching	etch	VERB
bibechana-4897	63	12	solution	solution	NOUN
bibechana-4897	63	13	for	for	ADP
bibechana-4897	63	14	each	each	DET
bibechana-4897	63	15	sample	sample	NOUN
bibechana-4897	63	16	;	;	PUNCT
bibechana-4897	63	17	and	and	CCONJ
bibechana-4897	63	18	psi	psi	NOUN
bibechana-4897	63	19	layer	layer	NOUN
bibechana-4897	63	20	can	can	AUX
bibechana-4897	63	21	be	be	AUX
bibechana-4897	63	22	prepared	prepare	VERB
bibechana-4897	63	23	under	under	ADP
bibechana-4897	63	24	illumination	illumination	NOUN
bibechana-4897	63	25	(	(	PUNCT
bibechana-4897	63	26	total	total	ADJ
bibechana-4897	63	27	-	-	PUNCT
bibechana-4897	63	28	surface	surface	NOUN
bibechana-4897	63	29	or	or	CCONJ
bibechana-4897	63	30	patterned	pattern	VERB
bibechana-4897	63	31	)	)	PUNCT
bibechana-4897	63	32	,	,	PUNCT
bibechana-4897	63	33	or	or	CCONJ
bibechana-4897	63	34	in	in	ADP
bibechana-4897	63	35	the	the	DET
bibechana-4897	63	36	dark	dark	NOUN
bibechana-4897	63	37	.	.	PUNCT
bibechana-4897	64	1	a	a	DET
bibechana-4897	64	2	si	si	NOUN
bibechana-4897	64	3	wafer	wafer	NOUN
bibechana-4897	64	4	was	be	AUX
bibechana-4897	64	5	first	first	ADV
bibechana-4897	64	6	cleaned	clean	VERB
bibechana-4897	64	7	by	by	ADP
bibechana-4897	64	8	rca	rca	PROPN
bibechana-4897	64	9	1	1	NUM
bibechana-4897	64	10	and	and	CCONJ
bibechana-4897	64	11	rca2	rca2	NOUN
bibechana-4897	64	12	solution	solution	NOUN
bibechana-4897	64	13	followed	follow	VERB
bibechana-4897	64	14	by	by	ADP
bibechana-4897	64	15	dipping	dip	VERB
bibechana-4897	64	16	in	in	ADP
bibechana-4897	64	17	a	a	DET
bibechana-4897	64	18	10	10	NUM
bibechana-4897	64	19	%	%	NOUN
bibechana-4897	64	20	hf	hf	NOUN
bibechana-4897	64	21	solution	solution	NOUN
bibechana-4897	64	22	,	,	PUNCT
bibechana-4897	64	23	rinsing	rinse	VERB
bibechana-4897	64	24	in	in	ADP
bibechana-4897	64	25	deionized	deionize	VERB
bibechana-4897	64	26	water	water	NOUN
bibechana-4897	64	27	,	,	PUNCT
bibechana-4897	64	28	and	and	CCONJ
bibechana-4897	64	29	drying	dry	VERB
bibechana-4897	64	30	by	by	ADP
bibechana-4897	64	31	n2	n2	ADJ
bibechana-4897	64	32	gas	gas	NOUN
bibechana-4897	64	33	.	.	PUNCT
bibechana-4897	65	1	immediately	immediately	ADV
bibechana-4897	65	2	after	after	ADP
bibechana-4897	65	3	cleaning	clean	VERB
bibechana-4897	65	4	,	,	PUNCT
bibechana-4897	65	5	the	the	DET
bibechana-4897	65	6	wafer	wafer	NOUN
bibechana-4897	65	7	was	be	AUX
bibechana-4897	65	8	placed	place	VERB
bibechana-4897	65	9	in	in	ADP
bibechana-4897	65	10	a	a	DET
bibechana-4897	65	11	vacuum	vacuum	NOUN
bibechana-4897	65	12	evaporation	evaporation	NOUN
bibechana-4897	65	13	system	system	NOUN
bibechana-4897	65	14	,	,	PUNCT
bibechana-4897	65	15	and	and	CCONJ
bibechana-4897	65	16	a	a	DET
bibechana-4897	65	17	layer	layer	NOUN
bibechana-4897	65	18	of	of	ADP
bibechana-4897	65	19	ohmic	ohmic	ADJ
bibechana-4897	65	20	contact	contact	NOUN
bibechana-4897	65	21	metal	metal	NOUN
bibechana-4897	65	22	(	(	PUNCT
bibechana-4897	65	23	al	al	PROPN
bibechana-4897	65	24	for	for	ADP
bibechana-4897	65	25	p	p	NOUN
bibechana-4897	65	26	-	-	PUNCT
bibechana-4897	65	27	type	type	NOUN
bibechana-4897	65	28	and	and	CCONJ
bibechana-4897	65	29	ti	ti	NOUN
bibechana-4897	65	30	/	/	SYM
bibechana-4897	65	31	al	al	PROPN
bibechana-4897	65	32	for	for	ADP
bibechana-4897	65	33	n	n	CCONJ
bibechana-4897	65	34	-	-	PUNCT
bibechana-4897	65	35	type	type	NOUN
bibechana-4897	65	36	samples	sample	NOUN
bibechana-4897	65	37	)	)	PUNCT
bibechana-4897	65	38	was	be	AUX
bibechana-4897	65	39	evaporated	evaporate	VERB
bibechana-4897	65	40	on	on	ADP
bibechana-4897	65	41	the	the	DET
bibechana-4897	65	42	back	back	ADJ
bibechana-4897	65	43	side	side	NOUN
bibechana-4897	65	44	of	of	ADP
bibechana-4897	65	45	the	the	DET
bibechana-4897	65	46	wafer	wafer	NOUN
bibechana-4897	65	47	.	.	PUNCT
bibechana-4897	66	1	the	the	DET
bibechana-4897	66	2	wafer	wafer	NOUN
bibechana-4897	66	3	was	be	AUX
bibechana-4897	66	4	then	then	ADV
bibechana-4897	66	5	cut	cut	VERB
bibechana-4897	66	6	into	into	ADP
bibechana-4897	66	7	2	2	NUM
bibechana-4897	66	8	*	*	SYM
bibechana-4897	66	9	2	2	NUM
bibechana-4897	66	10	cm	cm	NOUN
bibechana-4897	66	11	.	.	PUNCT
bibechana-4897	67	1	pieces	piece	NOUN
bibechana-4897	67	2	,	,	PUNCT
bibechana-4897	67	3	and	and	CCONJ
bibechana-4897	67	4	each	each	DET
bibechana-4897	67	5	piece	piece	NOUN
bibechana-4897	67	6	was	be	AUX
bibechana-4897	67	7	attached	attach	VERB
bibechana-4897	67	8	by	by	ADP
bibechana-4897	67	9	silver	silver	NOUN
bibechana-4897	67	10	conducting	conduct	VERB
bibechana-4897	67	11	paint	paint	NOUN
bibechana-4897	67	12	to	to	ADP
bibechana-4897	67	13	a	a	DET
bibechana-4897	67	14	piece	piece	NOUN
bibechana-4897	67	15	of	of	ADP
bibechana-4897	67	16	flatplate	flatplate	ADJ
bibechana-4897	67	17	copper	copper	NOUN
bibechana-4897	67	18	.	.	PUNCT
bibechana-4897	68	1	this	this	DET
bibechana-4897	68	2	assembly	assembly	NOUN
bibechana-4897	68	3	was	be	AUX
bibechana-4897	68	4	not	not	PART
bibechana-4897	68	5	only	only	ADV
bibechana-4897	68	6	strong	strong	ADJ
bibechana-4897	68	7	enough	enough	ADV
bibechana-4897	68	8	to	to	PART
bibechana-4897	68	9	be	be	AUX
bibechana-4897	68	10	put	put	VERB
bibechana-4897	68	11	under	under	ADP
bibechana-4897	68	12	pressure	pressure	NOUN
bibechana-4897	68	13	in	in	ADP
bibechana-4897	68	14	the	the	DET
bibechana-4897	68	15	electrochemical	electrochemical	ADJ
bibechana-4897	68	16	cell	cell	NOUN
bibechana-4897	68	17	,	,	PUNCT
bibechana-4897	68	18	but	but	CCONJ
bibechana-4897	68	19	produced	produce	VERB
bibechana-4897	68	20	a	a	DET
bibechana-4897	68	21	uniform	uniform	ADJ
bibechana-4897	68	22	potential	potential	NOUN
bibechana-4897	68	23	over	over	ADP
bibechana-4897	68	24	the	the	DET
bibechana-4897	68	25	whole	whole	ADJ
bibechana-4897	68	26	surface	surface	NOUN
bibechana-4897	68	27	of	of	ADP
bibechana-4897	68	28	the	the	DET
bibechana-4897	68	29	wafer	wafer	NOUN
bibechana-4897	68	30	under	under	ADP
bibechana-4897	68	31	bias	bias	NOUN
bibechana-4897	68	32	.	.	PUNCT
bibechana-4897	69	1	(	(	PUNCT
bibechana-4897	69	2	this	this	PRON
bibechana-4897	69	3	was	be	AUX
bibechana-4897	69	4	necessary	necessary	ADJ
bibechana-4897	69	5	for	for	ADP
bibechana-4897	69	6	obtaining	obtain	VERB
bibechana-4897	69	7	a	a	DET
bibechana-4897	69	8	uniform	uniform	ADJ
bibechana-4897	69	9	psi	psi	NOUN
bibechana-4897	69	10	thickness	thickness	NOUN
bibechana-4897	69	11	over	over	ADP
bibechana-4897	69	12	the	the	DET
bibechana-4897	69	13	whole	whole	ADJ
bibechana-4897	69	14	area	area	NOUN
bibechana-4897	69	15	of	of	ADP
bibechana-4897	69	16	the	the	DET
bibechana-4897	69	17	substrate	substrate	NOUN
bibechana-4897	69	18	)	)	PUNCT
bibechana-4897	69	19	.	.	PUNCT
bibechana-4897	70	1	the	the	DET
bibechana-4897	70	2	wafer	wafer	NOUN
bibechana-4897	70	3	assembly	assembly	NOUN
bibechana-4897	70	4	was	be	AUX
bibechana-4897	70	5	then	then	ADV
bibechana-4897	70	6	placed	place	VERB
bibechana-4897	70	7	in	in	ADP
bibechana-4897	70	8	the	the	DET
bibechana-4897	70	9	cell	cell	NOUN
bibechana-4897	70	10	.	.	PUNCT
bibechana-4897	71	1	upon	upon	SCONJ
bibechana-4897	71	2	closing	close	VERB
bibechana-4897	71	3	the	the	DET
bibechana-4897	71	4	cell	cell	NOUN
bibechana-4897	71	5	cover	cover	NOUN
bibechana-4897	71	6	,	,	PUNCT
bibechana-4897	71	7	an	an	DET
bibechana-4897	71	8	o	o	NOUN
bibechana-4897	71	9	-	-	NOUN
bibechana-4897	71	10	ring	ring	NOUN
bibechana-4897	71	11	was	be	AUX
bibechana-4897	71	12	pressed	press	VERB
bibechana-4897	71	13	onto	onto	ADP
bibechana-4897	71	14	the	the	DET
bibechana-4897	71	15	surface	surface	NOUN
bibechana-4897	71	16	of	of	ADP
bibechana-4897	71	17	si	si	NOUN
bibechana-4897	71	18	substrate	substrate	NOUN
bibechana-4897	71	19	and	and	CCONJ
bibechana-4897	71	20	isolated	isolated	ADJ
bibechana-4897	71	21	and	and	CCONJ
bibechana-4897	71	22	inner	inner	ADJ
bibechana-4897	71	23	section	section	NOUN
bibechana-4897	71	24	of	of	ADP
bibechana-4897	71	25	the	the	DET
bibechana-4897	71	26	cell	cell	NOUN
bibechana-4897	71	27	,	,	PUNCT
bibechana-4897	71	28	which	which	PRON
bibechana-4897	71	29	was	be	AUX
bibechana-4897	71	30	then	then	ADV
bibechana-4897	71	31	filled	fill	VERB
bibechana-4897	71	32	with	with	ADP
bibechana-4897	71	33	hf	hf	PROPN
bibechana-4897	71	34	solution	solution	NOUN
bibechana-4897	71	35	.	.	PUNCT
bibechana-4897	72	1	the	the	DET
bibechana-4897	72	2	bias	bias	NOUN
bibechana-4897	72	3	was	be	AUX
bibechana-4897	72	4	established	establish	VERB
bibechana-4897	72	5	between	between	ADP
bibechana-4897	72	6	a	a	DET
bibechana-4897	72	7	platinum	platinum	NOUN
bibechana-4897	72	8	wire	wire	NOUN
bibechana-4897	72	9	(	(	PUNCT
bibechana-4897	72	10	as	as	ADP
bibechana-4897	72	11	the	the	DET
bibechana-4897	72	12	cathode	cathode	NOUN
bibechana-4897	72	13	)	)	PUNCT
bibechana-4897	72	14	and	and	CCONJ
bibechana-4897	72	15	the	the	DET
bibechana-4897	72	16	copper	copper	NOUN
bibechana-4897	72	17	base	base	NOUN
bibechana-4897	72	18	plate	plate	NOUN
bibechana-4897	72	19	.	.	PUNCT
bibechana-4897	73	1	the	the	DET
bibechana-4897	73	2	outer	outer	ADJ
bibechana-4897	73	3	section	section	NOUN
bibechana-4897	73	4	of	of	ADP
bibechana-4897	73	5	the	the	DET
bibechana-4897	73	6	cell	cell	NOUN
bibechana-4897	73	7	was	be	AUX
bibechana-4897	73	8	partially	partially	ADV
bibechana-4897	73	9	filled	fill	VERB
bibechana-4897	73	10	with	with	ADP
bibechana-4897	73	11	water	water	NOUN
bibechana-4897	73	12	,	,	PUNCT
bibechana-4897	73	13	so	so	SCONJ
bibechana-4897	73	14	that	that	SCONJ
bibechana-4897	73	15	ultrasonic	ultrasonic	ADJ
bibechana-4897	73	16	vibrations	vibration	NOUN
bibechana-4897	73	17	could	could	AUX
bibechana-4897	73	18	effectively	effectively	ADV
bibechana-4897	73	19	reach	reach	VERB
bibechana-4897	73	20	the	the	DET
bibechana-4897	73	21	inner	inner	ADJ
bibechana-4897	73	22	section	section	NOUN
bibechana-4897	73	23	.	.	PUNCT
bibechana-4897	74	1	fig	fig	NOUN
bibechana-4897	74	2	.	.	PUNCT
bibechana-4897	75	1	1	1	NUM
bibechana-4897	75	2	:	:	PUNCT
bibechana-4897	75	3	schematic	schematic	ADJ
bibechana-4897	75	4	diagram	diagram	NOUN
bibechana-4897	75	5	of	of	ADP
bibechana-4897	75	6	the	the	DET
bibechana-4897	75	7	electrochemical	electrochemical	ADJ
bibechana-4897	75	8	cell	cell	NOUN
bibechana-4897	75	9	used	use	VERB
bibechana-4897	75	10	for	for	ADP
bibechana-4897	75	11	preparation	preparation	NOUN
bibechana-4897	75	12	of	of	ADP
bibechana-4897	75	13	psi	psi	PROPN
bibechana-4897	75	14	layers	layer	NOUN
bibechana-4897	75	15	e.	e.	PROPN
bibechana-4897	75	16	haji	haji	PROPN
bibechana-4897	75	17	-	-	PUNCT
bibechana-4897	75	18	ali	ali	PROPN
bibechana-4897	75	19	/	/	SYM
bibechana-4897	75	20	bibechana	bibechana	PROPN
bibechana-4897	75	21	8	8	NUM
bibechana-4897	75	22	(	(	PUNCT
bibechana-4897	75	23	2012	2012	NUM
bibechana-4897	75	24	)	)	PUNCT
bibechana-4897	75	25	46	46	NUM
bibechana-4897	75	26	-	-	SYM
bibechana-4897	75	27	52	52	NUM
bibechana-4897	75	28	:	:	PUNCT
bibechana-4897	75	29	bmhss	bmhss	PROPN
bibechana-4897	75	30	,	,	PUNCT
bibechana-4897	75	31	p.49	p.49	ADP
bibechana-4897	75	32	at	at	ADP
bibechana-4897	75	33	the	the	DET
bibechana-4897	75	34	end	end	NOUN
bibechana-4897	75	35	of	of	ADP
bibechana-4897	75	36	the	the	DET
bibechana-4897	75	37	anodization	anodization	NOUN
bibechana-4897	75	38	process	process	NOUN
bibechana-4897	75	39	,	,	PUNCT
bibechana-4897	75	40	the	the	DET
bibechana-4897	75	41	sample	sample	NOUN
bibechana-4897	75	42	assembly	assembly	NOUN
bibechana-4897	75	43	was	be	AUX
bibechana-4897	75	44	removed	remove	VERB
bibechana-4897	75	45	from	from	ADP
bibechana-4897	75	46	the	the	DET
bibechana-4897	75	47	cell	cell	NOUN
bibechana-4897	75	48	,	,	PUNCT
bibechana-4897	75	49	washed	wash	VERB
bibechana-4897	75	50	and	and	CCONJ
bibechana-4897	75	51	dried	dry	VERB
bibechana-4897	75	52	(	(	PUNCT
bibechana-4897	75	53	by	by	ADP
bibechana-4897	75	54	n2	n2	ADJ
bibechana-4897	75	55	gas	gas	NOUN
bibechana-4897	75	56	)	)	PUNCT
bibechana-4897	75	57	,	,	PUNCT
bibechana-4897	75	58	and	and	CCONJ
bibechana-4897	75	59	finally	finally	ADV
bibechana-4897	75	60	the	the	DET
bibechana-4897	75	61	si	si	NOUN
bibechana-4897	75	62	substrate	substrate	NOUN
bibechana-4897	75	63	was	be	AUX
bibechana-4897	75	64	removed	remove	VERB
bibechana-4897	75	65	from	from	ADP
bibechana-4897	75	66	the	the	DET
bibechana-4897	75	67	base	base	NOUN
bibechana-4897	75	68	plate	plate	NOUN
bibechana-4897	75	69	by	by	ADP
bibechana-4897	75	70	using	use	VERB
bibechana-4897	75	71	a	a	DET
bibechana-4897	75	72	few	few	ADJ
bibechana-4897	75	73	drops	drop	NOUN
bibechana-4897	75	74	of	of	ADP
bibechana-4897	75	75	acetone	acetone	NOUN
bibechana-4897	75	76	to	to	PART
bibechana-4897	75	77	loosen	loosen	VERB
bibechana-4897	75	78	the	the	DET
bibechana-4897	75	79	silver	silver	ADJ
bibechana-4897	75	80	paint	paint	NOUN
bibechana-4897	75	81	.	.	PUNCT
bibechana-4897	76	1	in	in	ADP
bibechana-4897	76	2	this	this	DET
bibechana-4897	76	3	method	method	NOUN
bibechana-4897	76	4	,	,	PUNCT
bibechana-4897	76	5	the	the	DET
bibechana-4897	76	6	major	major	ADJ
bibechana-4897	76	7	parameters	parameter	NOUN
bibechana-4897	76	8	affecting	affect	VERB
bibechana-4897	76	9	formation	formation	NOUN
bibechana-4897	76	10	and	and	CCONJ
bibechana-4897	76	11	characteristic	characteristic	NOUN
bibechana-4897	76	12	of	of	ADP
bibechana-4897	76	13	psi	psi	NOUN
bibechana-4897	76	14	film	film	NOUN
bibechana-4897	76	15	are	be	AUX
bibechana-4897	76	16	:	:	PUNCT
bibechana-4897	76	17	substrate	substrate	NOUN
bibechana-4897	76	18	conductivity	conductivity	NOUN
bibechana-4897	76	19	type	type	NOUN
bibechana-4897	76	20	,	,	PUNCT
bibechana-4897	76	21	substrate	substrate	NOUN
bibechana-4897	76	22	doping	doping	NOUN
bibechana-4897	76	23	level	level	NOUN
bibechana-4897	76	24	,	,	PUNCT
bibechana-4897	76	25	current	current	ADJ
bibechana-4897	76	26	density	density	NOUN
bibechana-4897	76	27	,	,	PUNCT
bibechana-4897	76	28	anodization	anodization	NOUN
bibechana-4897	76	29	time	time	NOUN
bibechana-4897	76	30	,	,	PUNCT
bibechana-4897	76	31	and	and	CCONJ
bibechana-4897	76	32	hf	hf	ADP
bibechana-4897	76	33	acid	acid	PROPN
bibechana-4897	76	34	concentration	concentration	NOUN
bibechana-4897	76	35	,	,	PUNCT
bibechana-4897	76	36	illumination	illumination	NOUN
bibechana-4897	76	37	level	level	NOUN
bibechana-4897	76	38	during	during	ADP
bibechana-4897	76	39	the	the	DET
bibechana-4897	76	40	process	process	NOUN
bibechana-4897	76	41	,	,	PUNCT
bibechana-4897	76	42	and	and	CCONJ
bibechana-4897	76	43	substrate	substrate	NOUN
bibechana-4897	76	44	crystal	crystal	NOUN
bibechana-4897	76	45	orientation	orientation	NOUN
bibechana-4897	76	46	.	.	PUNCT
bibechana-4897	77	1	the	the	DET
bibechana-4897	77	2	effects	effect	NOUN
bibechana-4897	77	3	of	of	ADP
bibechana-4897	77	4	these	these	DET
bibechana-4897	77	5	parameters	parameter	NOUN
bibechana-4897	77	6	on	on	ADP
bibechana-4897	77	7	psi	psi	NOUN
bibechana-4897	77	8	film	film	NOUN
bibechana-4897	77	9	have	have	AUX
bibechana-4897	77	10	been	be	AUX
bibechana-4897	77	11	thoroughly	thoroughly	ADV
bibechana-4897	77	12	investigated	investigate	VERB
bibechana-4897	77	13	by	by	ADP
bibechana-4897	77	14	other	other	ADJ
bibechana-4897	77	15	workers	worker	NOUN
bibechana-4897	77	16	[	[	X
bibechana-4897	77	17	6	6	NUM
bibechana-4897	77	18	-	-	SYM
bibechana-4897	77	19	10	10	NUM
bibechana-4897	77	20	]	]	PUNCT
bibechana-4897	77	21	.	.	PUNCT
bibechana-4897	78	1	we	we	PRON
bibechana-4897	78	2	also	also	ADV
bibechana-4897	78	3	found	find	VERB
bibechana-4897	78	4	that	that	SCONJ
bibechana-4897	78	5	psi	psi	NOUN
bibechana-4897	78	6	film	film	NOUN
bibechana-4897	78	7	thickness	thickness	NOUN
bibechana-4897	78	8	essentially	essentially	ADV
bibechana-4897	78	9	determined	determine	VERB
bibechana-4897	78	10	by	by	ADP
bibechana-4897	78	11	the	the	DET
bibechana-4897	78	12	amount	amount	NOUN
bibechana-4897	78	13	of	of	ADP
bibechana-4897	78	14	electric	electric	ADJ
bibechana-4897	78	15	charge	charge	NOUN
bibechana-4897	78	16	passed	pass	VERB
bibechana-4897	78	17	through	through	ADP
bibechana-4897	78	18	the	the	DET
bibechana-4897	78	19	cell	cell	NOUN
bibechana-4897	78	20	(	(	PUNCT
bibechana-4897	78	21	per	per	ADP
bibechana-4897	78	22	unit	unit	NOUN
bibechana-4897	78	23	area	area	NOUN
bibechana-4897	78	24	of	of	ADP
bibechana-4897	78	25	the	the	DET
bibechana-4897	78	26	substrate	substrate	NOUN
bibechana-4897	78	27	)	)	PUNCT
bibechana-4897	78	28	during	during	ADP
bibechana-4897	78	29	formation	formation	NOUN
bibechana-4897	78	30	.	.	PUNCT
bibechana-4897	79	1	this	this	DET
bibechana-4897	79	2	charge	charge	NOUN
bibechana-4897	79	3	is	be	AUX
bibechana-4897	79	4	the	the	DET
bibechana-4897	79	5	product	product	NOUN
bibechana-4897	79	6	of	of	ADP
bibechana-4897	79	7	the	the	DET
bibechana-4897	79	8	current	current	ADJ
bibechana-4897	79	9	density	density	NOUN
bibechana-4897	79	10	and	and	CCONJ
bibechana-4897	79	11	anodization	anodization	NOUN
bibechana-4897	79	12	time	time	NOUN
bibechana-4897	79	13	.	.	PUNCT
bibechana-4897	80	1	at	at	ADP
bibechana-4897	80	2	a	a	DET
bibechana-4897	80	3	fixed	fix	VERB
bibechana-4897	80	4	hf	hf	NOUN
bibechana-4897	80	5	concentration	concentration	NOUN
bibechana-4897	80	6	and	and	CCONJ
bibechana-4897	80	7	current	current	ADJ
bibechana-4897	80	8	density	density	NOUN
bibechana-4897	80	9	,	,	PUNCT
bibechana-4897	80	10	psi	psi	ADJ
bibechana-4897	80	11	film	film	NOUN
bibechana-4897	80	12	thickness	thickness	NOUN
bibechana-4897	80	13	increases	increase	VERB
bibechana-4897	80	14	linearly	linearly	ADV
bibechana-4897	80	15	with	with	ADP
bibechana-4897	80	16	anodization	anodization	NOUN
bibechana-4897	80	17	time	time	NOUN
bibechana-4897	80	18	;	;	PUNCT
bibechana-4897	80	19	and	and	CCONJ
bibechana-4897	80	20	again	again	ADV
bibechana-4897	80	21	at	at	ADP
bibechana-4897	80	22	the	the	DET
bibechana-4897	80	23	fixed	fix	VERB
bibechana-4897	80	24	hf	hf	PROPN
bibechana-4897	80	25	concentration	concentration	NOUN
bibechana-4897	80	26	,	,	PUNCT
bibechana-4897	80	27	psi	psi	ADJ
bibechana-4897	80	28	formation	formation	NOUN
bibechana-4897	80	29	rate	rate	NOUN
bibechana-4897	80	30	increases	increase	NOUN
bibechana-4897	80	31	linearly	linearly	ADV
bibechana-4897	80	32	with	with	ADP
bibechana-4897	80	33	current	current	ADJ
bibechana-4897	80	34	density	density	NOUN
bibechana-4897	80	35	.	.	PUNCT
bibechana-4897	81	1	however	however	ADV
bibechana-4897	81	2	,	,	PUNCT
bibechana-4897	81	3	if	if	SCONJ
bibechana-4897	81	4	the	the	DET
bibechana-4897	81	5	anodization	anodization	NOUN
bibechana-4897	81	6	current	current	ADJ
bibechana-4897	81	7	density	density	NOUN
bibechana-4897	81	8	is	be	AUX
bibechana-4897	81	9	increased	increase	VERB
bibechana-4897	81	10	beyond	beyond	ADP
bibechana-4897	81	11	a	a	DET
bibechana-4897	81	12	certain	certain	ADJ
bibechana-4897	81	13	limit	limit	NOUN
bibechana-4897	81	14	,	,	PUNCT
bibechana-4897	81	15	electropolishing	electropolishing	NOUN
bibechana-4897	81	16	of	of	ADP
bibechana-4897	81	17	the	the	DET
bibechana-4897	81	18	si	si	PROPN
bibechana-4897	81	19	surface	surface	NOUN
bibechana-4897	81	20	occurs	occur	VERB
bibechana-4897	81	21	.	.	PUNCT
bibechana-4897	82	1	there	there	PRON
bibechana-4897	82	2	is	be	VERB
bibechana-4897	82	3	a	a	DET
bibechana-4897	82	4	transition	transition	NOUN
bibechana-4897	82	5	region	region	NOUN
bibechana-4897	82	6	between	between	ADP
bibechana-4897	82	7	pore	pore	ADJ
bibechana-4897	82	8	formation	formation	NOUN
bibechana-4897	82	9	and	and	CCONJ
bibechana-4897	82	10	electropolishing	electropolishing	NOUN
bibechana-4897	82	11	domains	domain	NOUN
bibechana-4897	82	12	.	.	PUNCT
bibechana-4897	83	1	at	at	ADP
bibechana-4897	83	2	a	a	DET
bibechana-4897	83	3	fixed	fix	VERB
bibechana-4897	83	4	anodization	anodization	NOUN
bibechana-4897	83	5	time	time	NOUN
bibechana-4897	83	6	,	,	PUNCT
bibechana-4897	83	7	the	the	DET
bibechana-4897	83	8	psi	psi	NOUN
bibechana-4897	83	9	film	film	NOUN
bibechana-4897	83	10	thickness	thickness	NOUN
bibechana-4897	83	11	increases	increase	VERB
bibechana-4897	83	12	with	with	ADP
bibechana-4897	83	13	increasing	increase	VERB
bibechana-4897	83	14	hf	hf	ADP
bibechana-4897	83	15	acid	acid	ADJ
bibechana-4897	83	16	concentration	concentration	NOUN
bibechana-4897	83	17	in	in	ADP
bibechana-4897	83	18	the	the	DET
bibechana-4897	83	19	solution	solution	NOUN
bibechana-4897	83	20	.	.	PUNCT
bibechana-4897	84	1	the	the	DET
bibechana-4897	84	2	etching	etch	VERB
bibechana-4897	84	3	mechanism	mechanism	NOUN
bibechana-4897	84	4	of	of	ADP
bibechana-4897	84	5	si	si	PROPN
bibechana-4897	84	6	is	be	AUX
bibechana-4897	84	7	a	a	DET
bibechana-4897	84	8	two	two	NUM
bibechana-4897	84	9	-	-	PUNCT
bibechana-4897	84	10	step	step	NOUN
bibechana-4897	84	11	process	process	NOUN
bibechana-4897	84	12	:	:	PUNCT
bibechana-4897	84	13	first	first	ADJ
bibechana-4897	84	14	si	si	X
bibechana-4897	84	15	is	be	AUX
bibechana-4897	84	16	oxidized	oxidize	VERB
bibechana-4897	84	17	by	by	ADP
bibechana-4897	84	18	the	the	DET
bibechana-4897	84	19	water	water	NOUN
bibechana-4897	84	20	content	content	NOUN
bibechana-4897	84	21	of	of	ADP
bibechana-4897	84	22	the	the	DET
bibechana-4897	84	23	hf	hf	NOUN
bibechana-4897	84	24	solution	solution	NOUN
bibechana-4897	84	25	;	;	PUNCT
bibechana-4897	84	26	and	and	CCONJ
bibechana-4897	84	27	then	then	ADV
bibechana-4897	84	28	the	the	DET
bibechana-4897	84	29	oxide	oxide	NOUN
bibechana-4897	84	30	is	be	AUX
bibechana-4897	84	31	etched	etch	VERB
bibechana-4897	84	32	away	away	ADV
bibechana-4897	84	33	by	by	ADP
bibechana-4897	84	34	hf	hf	ADJ
bibechana-4897	84	35	acid	acid	NOUN
bibechana-4897	84	36	.	.	PUNCT
bibechana-4897	85	1	it	it	PRON
bibechana-4897	85	2	has	have	AUX
bibechana-4897	85	3	been	be	AUX
bibechana-4897	85	4	suggested	suggest	VERB
bibechana-4897	85	5	that	that	SCONJ
bibechana-4897	85	6	the	the	DET
bibechana-4897	85	7	etching	etch	VERB
bibechana-4897	85	8	rate	rate	NOUN
bibechana-4897	85	9	is	be	AUX
bibechana-4897	85	10	considerably	considerably	ADV
bibechana-4897	85	11	faster	fast	ADJ
bibechana-4897	85	12	than	than	ADP
bibechana-4897	85	13	the	the	DET
bibechana-4897	85	14	oxidation	oxidation	NOUN
bibechana-4897	85	15	rate	rate	NOUN
bibechana-4897	86	1	[	[	X
bibechana-4897	86	2	7	7	NUM
bibechana-4897	86	3	]	]	PUNCT
bibechana-4897	86	4	.	.	PUNCT
bibechana-4897	87	1	therefore	therefore	ADV
bibechana-4897	87	2	,	,	PUNCT
bibechana-4897	87	3	the	the	DET
bibechana-4897	87	4	amount	amount	NOUN
bibechana-4897	87	5	of	of	ADP
bibechana-4897	87	6	the	the	DET
bibechana-4897	87	7	dissolved	dissolve	VERB
bibechana-4897	87	8	si	si	NOUN
bibechana-4897	87	9	is	be	AUX
bibechana-4897	87	10	determined	determine	VERB
bibechana-4897	87	11	by	by	ADP
bibechana-4897	87	12	the	the	DET
bibechana-4897	87	13	oxidation	oxidation	NOUN
bibechana-4897	87	14	reaction	reaction	NOUN
bibechana-4897	87	15	.	.	PUNCT
bibechana-4897	88	1	it	it	PRON
bibechana-4897	88	2	is	be	AUX
bibechana-4897	88	3	also	also	ADV
bibechana-4897	88	4	suggested	suggest	VERB
bibechana-4897	88	5	that	that	SCONJ
bibechana-4897	88	6	the	the	DET
bibechana-4897	88	7	si	si	PROPN
bibechana-4897	88	8	dissolution	dissolution	NOUN
bibechana-4897	88	9	during	during	ADP
bibechana-4897	88	10	anodization	anodization	NOUN
bibechana-4897	88	11	is	be	AUX
bibechana-4897	88	12	caused	cause	VERB
bibechana-4897	88	13	by	by	ADP
bibechana-4897	88	14	two	two	NUM
bibechana-4897	88	15	reactions	reaction	NOUN
bibechana-4897	88	16	:	:	PUNCT
bibechana-4897	88	17	an	an	DET
bibechana-4897	88	18	electrochemical	electrochemical	ADJ
bibechana-4897	88	19	reaction	reaction	NOUN
bibechana-4897	88	20	to	to	PART
bibechana-4897	88	21	form	form	VERB
bibechana-4897	88	22	psi	psi	NOUN
bibechana-4897	88	23	(	(	PUNCT
bibechana-4897	88	24	which	which	PRON
bibechana-4897	88	25	is	be	AUX
bibechana-4897	88	26	proportional	proportional	ADJ
bibechana-4897	88	27	to	to	ADP
bibechana-4897	88	28	anodization	anodization	NOUN
bibechana-4897	88	29	time	time	NOUN
bibechana-4897	88	30	)	)	PUNCT
bibechana-4897	88	31	,	,	PUNCT
bibechana-4897	88	32	and	and	CCONJ
bibechana-4897	88	33	a	a	DET
bibechana-4897	88	34	nonelectrochemical	nonelectrochemical	ADJ
bibechana-4897	88	35	reaction	reaction	NOUN
bibechana-4897	88	36	(	(	PUNCT
bibechana-4897	88	37	which	which	PRON
bibechana-4897	88	38	dissolves	dissolve	VERB
bibechana-4897	88	39	psi	psi	NOUN
bibechana-4897	88	40	)	)	PUNCT
bibechana-4897	89	1	[	[	X
bibechana-4897	89	2	7	7	NUM
bibechana-4897	89	3	]	]	PUNCT
bibechana-4897	89	4	.	.	PUNCT
bibechana-4897	90	1	since	since	SCONJ
bibechana-4897	90	2	presence	presence	NOUN
bibechana-4897	90	3	of	of	ADP
bibechana-4897	90	4	holes	hole	NOUN
bibechana-4897	90	5	is	be	AUX
bibechana-4897	90	6	essential	essential	ADJ
bibechana-4897	90	7	in	in	ADP
bibechana-4897	90	8	psi	psi	ADJ
bibechana-4897	90	9	formation	formation	NOUN
bibechana-4897	90	10	,	,	PUNCT
bibechana-4897	90	11	exposure	exposure	NOUN
bibechana-4897	90	12	of	of	ADP
bibechana-4897	90	13	the	the	DET
bibechana-4897	90	14	si	si	NOUN
bibechana-4897	90	15	substrate	substrate	NOUN
bibechana-4897	90	16	to	to	ADP
bibechana-4897	90	17	light	light	NOUN
bibechana-4897	90	18	(	(	PUNCT
bibechana-4897	90	19	with	with	ADP
bibechana-4897	90	20	photon	photon	NOUN
bibechana-4897	90	21	energies	energy	NOUN
bibechana-4897	90	22	greater	great	ADJ
bibechana-4897	90	23	than	than	ADP
bibechana-4897	90	24	the	the	DET
bibechana-4897	90	25	si	si	PROPN
bibechana-4897	90	26	bandgap	bandgap	PROPN
bibechana-4897	90	27	)	)	PUNCT
bibechana-4897	90	28	during	during	ADP
bibechana-4897	90	29	anodization	anodization	NOUN
bibechana-4897	90	30	process	process	NOUN
bibechana-4897	90	31	increases	increase	VERB
bibechana-4897	90	32	hole	hole	NOUN
bibechana-4897	90	33	concentration	concentration	NOUN
bibechana-4897	90	34	and	and	CCONJ
bibechana-4897	90	35	therefore	therefore	ADV
bibechana-4897	90	36	,	,	PUNCT
bibechana-4897	90	37	increases	increase	VERB
bibechana-4897	90	38	the	the	DET
bibechana-4897	90	39	etching	etch	VERB
bibechana-4897	90	40	rate	rate	NOUN
bibechana-4897	90	41	.	.	PUNCT
bibechana-4897	91	1	light	light	ADJ
bibechana-4897	91	2	exposure	exposure	NOUN
bibechana-4897	91	3	during	during	ADP
bibechana-4897	91	4	the	the	DET
bibechana-4897	91	5	psi	psi	NOUN
bibechana-4897	91	6	formation	formation	NOUN
bibechana-4897	91	7	process	process	NOUN
bibechana-4897	91	8	increased	increase	VERB
bibechana-4897	91	9	the	the	DET
bibechana-4897	91	10	pl	pl	PROPN
bibechana-4897	91	11	emission	emission	NOUN
bibechana-4897	91	12	intensity	intensity	NOUN
bibechana-4897	91	13	and	and	CCONJ
bibechana-4897	91	14	decreased	decrease	VERB
bibechana-4897	91	15	wavelength	wavelength	NOUN
bibechana-4897	91	16	of	of	ADP
bibechana-4897	91	17	the	the	DET
bibechana-4897	91	18	emitted	emitted	ADJ
bibechana-4897	91	19	light	light	NOUN
bibechana-4897	91	20	.	.	PUNCT
bibechana-4897	92	1	application	application	NOUN
bibechana-4897	92	2	of	of	ADP
bibechana-4897	92	3	an	an	DET
bibechana-4897	92	4	electric	electric	ADJ
bibechana-4897	92	5	field	field	NOUN
bibechana-4897	92	6	parallel	parallel	ADJ
bibechana-4897	92	7	to	to	ADP
bibechana-4897	92	8	the	the	DET
bibechana-4897	92	9	surface	surface	NOUN
bibechana-4897	92	10	had	have	VERB
bibechana-4897	92	11	a	a	DET
bibechana-4897	92	12	suppressing	suppress	VERB
bibechana-4897	92	13	effect	effect	NOUN
bibechana-4897	92	14	on	on	ADP
bibechana-4897	92	15	the	the	DET
bibechana-4897	92	16	pl	pl	NOUN
bibechana-4897	92	17	intensity	intensity	NOUN
bibechana-4897	92	18	(	(	PUNCT
bibechana-4897	92	19	which	which	PRON
bibechana-4897	92	20	in	in	ADP
bibechana-4897	92	21	most	most	ADJ
bibechana-4897	92	22	cases	case	NOUN
bibechana-4897	92	23	recovered	recover	VERB
bibechana-4897	92	24	very	very	ADV
bibechana-4897	92	25	slowly	slowly	ADV
bibechana-4897	92	26	when	when	SCONJ
bibechana-4897	92	27	the	the	DET
bibechana-4897	92	28	bias	bias	NOUN
bibechana-4897	92	29	was	be	AUX
bibechana-4897	92	30	removed	remove	VERB
bibechana-4897	92	31	)	)	PUNCT
bibechana-4897	92	32	.	.	PUNCT
bibechana-4897	93	1	3	3	X
bibechana-4897	93	2	.	.	X
bibechana-4897	93	3	photoluminescence	photoluminescence	NOUN
bibechana-4897	93	4	and	and	CCONJ
bibechana-4897	93	5	electroluminescence	electroluminescence	NOUN
bibechana-4897	93	6	results	result	VERB
bibechana-4897	93	7	3.1	3.1	NUM
bibechana-4897	93	8	photoluminescence	photoluminescence	NOUN
bibechana-4897	93	9	emission	emission	NOUN
bibechana-4897	93	10	of	of	ADP
bibechana-4897	93	11	p	p	NOUN
bibechana-4897	93	12	-	-	PUNCT
bibechana-4897	93	13	type	type	NOUN
bibechana-4897	93	14	samples	sample	NOUN
bibechana-4897	93	15	pl	pl	NOUN
bibechana-4897	93	16	emissions	emission	NOUN
bibechana-4897	93	17	with	with	ADP
bibechana-4897	93	18	colors	color	NOUN
bibechana-4897	93	19	ranging	range	VERB
bibechana-4897	93	20	from	from	ADP
bibechana-4897	93	21	dark	dark	ADJ
bibechana-4897	93	22	red	red	NOUN
bibechana-4897	93	23	to	to	ADP
bibechana-4897	93	24	light	light	ADJ
bibechana-4897	93	25	blue	blue	NOUN
bibechana-4897	93	26	were	be	AUX
bibechana-4897	93	27	obtained	obtain	VERB
bibechana-4897	93	28	for	for	ADP
bibechana-4897	93	29	ptype	ptype	ADJ
bibechana-4897	93	30	samples	sample	NOUN
bibechana-4897	93	31	.	.	PUNCT
bibechana-4897	94	1	in	in	ADP
bibechana-4897	94	2	a	a	DET
bibechana-4897	94	3	series	series	NOUN
bibechana-4897	94	4	of	of	ADP
bibechana-4897	94	5	experiments	experiment	NOUN
bibechana-4897	94	6	,	,	PUNCT
bibechana-4897	94	7	the	the	DET
bibechana-4897	94	8	total	total	ADJ
bibechana-4897	94	9	amount	amount	NOUN
bibechana-4897	94	10	of	of	ADP
bibechana-4897	94	11	charge	charge	NOUN
bibechana-4897	94	12	passing	pass	VERB
bibechana-4897	94	13	through	through	ADP
bibechana-4897	94	14	the	the	DET
bibechana-4897	94	15	unit	unit	NOUN
bibechana-4897	94	16	area	area	NOUN
bibechana-4897	94	17	of	of	ADP
bibechana-4897	94	18	the	the	DET
bibechana-4897	94	19	samples	sample	NOUN
bibechana-4897	94	20	was	be	AUX
bibechana-4897	94	21	kept	keep	VERB
bibechana-4897	94	22	constant	constant	ADJ
bibechana-4897	94	23	and	and	CCONJ
bibechana-4897	94	24	the	the	DET
bibechana-4897	94	25	current	current	ADJ
bibechana-4897	94	26	density	density	NOUN
bibechana-4897	94	27	was	be	AUX
bibechana-4897	94	28	varied	varied	ADJ
bibechana-4897	94	29	.	.	PUNCT
bibechana-4897	95	1	the	the	DET
bibechana-4897	95	2	substrates	substrate	NOUN
bibechana-4897	95	3	[	[	X
bibechana-4897	95	4	b	b	X
bibechana-4897	95	5	-	-	PUNCT
bibechana-4897	95	6	doped	dope	VERB
bibechana-4897	95	7	,	,	PUNCT
bibechana-4897	95	8	(	(	PUNCT
bibechana-4897	95	9	100	100	NUM
bibechana-4897	95	10	)	)	PUNCT
bibechana-4897	95	11	,	,	PUNCT
bibechana-4897	95	12	38	38	NUM
bibechana-4897	95	13	-	-	SYM
bibechana-4897	95	14	63	63	NUM
bibechana-4897	95	15	ωcm	ωcm	NOUN
bibechana-4897	95	16	]	]	PUNCT
bibechana-4897	95	17	and	and	CCONJ
bibechana-4897	95	18	the	the	DET
bibechana-4897	95	19	hf	hf	PROPN
bibechana-4897	95	20	concentrations	concentration	NOUN
bibechana-4897	95	21	(	(	PUNCT
bibechana-4897	95	22	39	39	NUM
bibechana-4897	95	23	%	%	NOUN
bibechana-4897	95	24	)	)	PUNCT
bibechana-4897	95	25	were	be	AUX
bibechana-4897	95	26	the	the	DET
bibechana-4897	95	27	same	same	ADJ
bibechana-4897	95	28	for	for	ADP
bibechana-4897	95	29	all	all	DET
bibechana-4897	95	30	the	the	DET
bibechana-4897	95	31	tests	test	NOUN
bibechana-4897	95	32	in	in	ADP
bibechana-4897	95	33	each	each	DET
bibechana-4897	95	34	set	set	NOUN
bibechana-4897	95	35	.	.	PUNCT
bibechana-4897	96	1	table	table	NOUN
bibechana-4897	96	2	(	(	PUNCT
bibechana-4897	96	3	1	1	X
bibechana-4897	96	4	)	)	PUNCT
bibechana-4897	96	5	gives	give	VERB
bibechana-4897	96	6	the	the	DET
bibechana-4897	96	7	color	color	NOUN
bibechana-4897	96	8	of	of	ADP
bibechana-4897	96	9	the	the	DET
bibechana-4897	96	10	pl	pl	PROPN
bibechana-4897	96	11	emission	emission	NOUN
bibechana-4897	96	12	of	of	ADP
bibechana-4897	96	13	the	the	DET
bibechana-4897	96	14	prepared	prepared	ADJ
bibechana-4897	96	15	psi	psi	NOUN
bibechana-4897	96	16	samples	sample	NOUN
bibechana-4897	96	17	under	under	ADP
bibechana-4897	96	18	uv	uv	NOUN
bibechana-4897	96	19	illumination	illumination	NOUN
bibechana-4897	96	20	.	.	PUNCT
bibechana-4897	97	1	table	table	NOUN
bibechana-4897	97	2	(	(	PUNCT
bibechana-4897	97	3	1	1	NUM
bibechana-4897	97	4	):	):	PUNCT
bibechana-4897	97	5	color	color	NOUN
bibechana-4897	97	6	of	of	ADP
bibechana-4897	97	7	pl	pl	NOUN
bibechana-4897	97	8	emission	emission	NOUN
bibechana-4897	97	9	of	of	ADP
bibechana-4897	97	10	psi	psi	NOUN
bibechana-4897	97	11	samples	sample	NOUN
bibechana-4897	97	12	(	(	PUNCT
bibechana-4897	97	13	under	under	ADP
bibechana-4897	97	14	uv	uv	NOUN
bibechana-4897	97	15	illumination	illumination	NOUN
bibechana-4897	97	16	)	)	PUNCT
bibechana-4897	97	17	prepared	prepare	VERB
bibechana-4897	97	18	on	on	ADP
bibechana-4897	97	19	p	p	NOUN
bibechana-4897	97	20	-	-	PUNCT
bibechana-4897	97	21	type	type	NOUN
bibechana-4897	97	22	si	si	NOUN
bibechana-4897	97	23	and	and	CCONJ
bibechana-4897	97	24	under	under	ADP
bibechana-4897	97	25	different	different	ADJ
bibechana-4897	97	26	anodization	anodization	NOUN
bibechana-4897	97	27	times	time	NOUN
bibechana-4897	97	28	.	.	PUNCT
bibechana-4897	98	1	the	the	DET
bibechana-4897	98	2	total	total	ADJ
bibechana-4897	98	3	charge	charge	NOUN
bibechana-4897	98	4	passed	pass	VERB
bibechana-4897	98	5	through	through	ADP
bibechana-4897	98	6	the	the	DET
bibechana-4897	98	7	cell	cell	NOUN
bibechana-4897	98	8	was	be	AUX
bibechana-4897	98	9	constant	constant	ADJ
bibechana-4897	98	10	for	for	ADP
bibechana-4897	98	11	all	all	PRON
bibechana-4897	98	12	of	of	ADP
bibechana-4897	98	13	the	the	DET
bibechana-4897	98	14	cases	case	NOUN
bibechana-4897	98	15	no	no	DET
bibechana-4897	98	16	etching	etch	VERB
bibechana-4897	98	17	time(minutes	time(minute	NOUN
bibechana-4897	98	18	)	)	PUNCT
bibechana-4897	98	19	current(ma	current(ma	PROPN
bibechana-4897	98	20	/	/	SYM
bibechana-4897	98	21	cm2	cm2	NOUN
bibechana-4897	98	22	)	)	PUNCT
bibechana-4897	98	23	pl	pl	NOUN
bibechana-4897	98	24	emission	emission	NOUN
bibechana-4897	98	25	color	color	NOUN
bibechana-4897	98	26	1	1	NUM
bibechana-4897	98	27	60	60	NUM
bibechana-4897	98	28	5	5	NUM
bibechana-4897	98	29	dark	dark	ADV
bibechana-4897	98	30	-	-	PUNCT
bibechana-4897	98	31	red	red	ADJ
bibechana-4897	98	32	2	2	NUM
bibechana-4897	98	33	30	30	NUM
bibechana-4897	98	34	10	10	NUM
bibechana-4897	98	35	red	red	ADJ
bibechana-4897	98	36	-	-	PUNCT
bibechana-4897	98	37	orange	orange	NOUN
bibechana-4897	98	38	3	3	NUM
bibechana-4897	98	39	15	15	NUM
bibechana-4897	98	40	20	20	NUM
bibechana-4897	98	41	orange	orange	NOUN
bibechana-4897	98	42	4	4	NUM
bibechana-4897	98	43	7.5	7.5	NUM
bibechana-4897	98	44	40	40	NUM
bibechana-4897	98	45	orange	orange	ADJ
bibechana-4897	98	46	-	-	PUNCT
bibechana-4897	98	47	yellow	yellow	ADJ
bibechana-4897	98	48	5	5	NUM
bibechana-4897	98	49	3.75	3.75	NUM
bibechana-4897	98	50	80	80	NUM
bibechana-4897	98	51	yellow	yellow	ADJ
bibechana-4897	98	52	-	-	PUNCT
bibechana-4897	98	53	green	green	ADJ
bibechana-4897	98	54	6	6	NUM
bibechana-4897	98	55	3.53	3.53	NUM
bibechana-4897	98	56	85	85	NUM
bibechana-4897	98	57	lightblue	lightblue	NOUN
bibechana-4897	98	58	7	7	NUM
bibechana-4897	98	59	3	3	NUM
bibechana-4897	98	60	100	100	NUM
bibechana-4897	98	61	--	--	PUNCT
bibechana-4897	98	62	e.	e.	PROPN
bibechana-4897	98	63	haji	haji	PROPN
bibechana-4897	98	64	-	-	PUNCT
bibechana-4897	98	65	ali	ali	PROPN
bibechana-4897	98	66	/	/	SYM
bibechana-4897	98	67	bibechana	bibechana	PROPN
bibechana-4897	98	68	8	8	NUM
bibechana-4897	98	69	(	(	PUNCT
bibechana-4897	98	70	2012	2012	NUM
bibechana-4897	98	71	)	)	PUNCT
bibechana-4897	98	72	46	46	NUM
bibechana-4897	98	73	-	-	SYM
bibechana-4897	98	74	52	52	NUM
bibechana-4897	98	75	:	:	PUNCT
bibechana-4897	98	76	bmhss	bmhss	PROPN
bibechana-4897	98	77	,	,	PUNCT
bibechana-4897	98	78	p.50	p.50	PROPN
bibechana-4897	98	79	the	the	DET
bibechana-4897	98	80	samples	sample	NOUN
bibechana-4897	98	81	with	with	ADP
bibechana-4897	98	82	yellow	yellow	ADJ
bibechana-4897	98	83	to	to	ADP
bibechana-4897	98	84	blue	blue	ADJ
bibechana-4897	98	85	pl	pl	PROPN
bibechana-4897	98	86	emissions	emission	NOUN
bibechana-4897	98	87	persisted	persist	VERB
bibechana-4897	98	88	only	only	ADV
bibechana-4897	98	89	for	for	ADP
bibechana-4897	98	90	a	a	DET
bibechana-4897	98	91	short	short	ADJ
bibechana-4897	98	92	duration	duration	NOUN
bibechana-4897	98	93	,	,	PUNCT
bibechana-4897	98	94	and	and	CCONJ
bibechana-4897	98	95	their	their	PRON
bibechana-4897	98	96	pl	pl	NOUN
bibechana-4897	98	97	emission	emission	NOUN
bibechana-4897	98	98	could	could	AUX
bibechana-4897	98	99	only	only	ADV
bibechana-4897	98	100	be	be	AUX
bibechana-4897	98	101	seen	see	VERB
bibechana-4897	98	102	if	if	SCONJ
bibechana-4897	98	103	the	the	DET
bibechana-4897	98	104	samples	sample	NOUN
bibechana-4897	98	105	were	be	AUX
bibechana-4897	98	106	examined	examine	VERB
bibechana-4897	98	107	immediately	immediately	ADV
bibechana-4897	98	108	after	after	ADP
bibechana-4897	98	109	the	the	DET
bibechana-4897	98	110	preparation	preparation	NOUN
bibechana-4897	98	111	.	.	PUNCT
bibechana-4897	99	1	the	the	DET
bibechana-4897	99	2	pl	pl	PROPN
bibechana-4897	99	3	of	of	ADP
bibechana-4897	99	4	samples	sample	NOUN
bibechana-4897	99	5	with	with	ADP
bibechana-4897	99	6	yellow	yellow	ADJ
bibechana-4897	99	7	-	-	PUNCT
bibechana-4897	99	8	green	green	ADJ
bibechana-4897	99	9	emission	emission	NOUN
bibechana-4897	99	10	was	be	AUX
bibechana-4897	99	11	gone	go	VERB
bibechana-4897	99	12	after	after	ADP
bibechana-4897	99	13	about	about	ADV
bibechana-4897	99	14	5	5	NUM
bibechana-4897	99	15	minutes	minute	NOUN
bibechana-4897	99	16	exposure	exposure	NOUN
bibechana-4897	99	17	to	to	ADP
bibechana-4897	99	18	air	air	NOUN
bibechana-4897	99	19	;	;	PUNCT
bibechana-4897	99	20	and	and	CCONJ
bibechana-4897	99	21	the	the	DET
bibechana-4897	99	22	blue	blue	ADJ
bibechana-4897	99	23	emission	emission	NOUN
bibechana-4897	99	24	vanished	vanish	VERB
bibechana-4897	99	25	in	in	ADP
bibechana-4897	99	26	much	much	ADV
bibechana-4897	99	27	shorter	short	ADJ
bibechana-4897	99	28	times	time	NOUN
bibechana-4897	99	29	.	.	PUNCT
bibechana-4897	100	1	on	on	ADP
bibechana-4897	100	2	the	the	DET
bibechana-4897	100	3	other	other	ADJ
bibechana-4897	100	4	hand	hand	NOUN
bibechana-4897	100	5	,	,	PUNCT
bibechana-4897	100	6	the	the	DET
bibechana-4897	100	7	pl	pl	PROPN
bibechana-4897	100	8	intensities	intensity	NOUN
bibechana-4897	100	9	of	of	ADP
bibechana-4897	100	10	samples	sample	NOUN
bibechana-4897	100	11	with	with	ADP
bibechana-4897	100	12	orange	orange	ADJ
bibechana-4897	100	13	or	or	CCONJ
bibechana-4897	100	14	red	red	ADJ
bibechana-4897	100	15	emissions	emission	NOUN
bibechana-4897	100	16	were	be	AUX
bibechana-4897	100	17	not	not	PART
bibechana-4897	100	18	destroyed	destroy	VERB
bibechana-4897	100	19	with	with	ADP
bibechana-4897	100	20	storage	storage	NOUN
bibechana-4897	100	21	of	of	ADP
bibechana-4897	100	22	samples	sample	NOUN
bibechana-4897	100	23	in	in	ADP
bibechana-4897	100	24	room	room	NOUN
bibechana-4897	100	25	air	air	NOUN
bibechana-4897	100	26	(	(	PUNCT
bibechana-4897	100	27	even	even	ADV
bibechana-4897	100	28	for	for	ADP
bibechana-4897	100	29	periods	period	NOUN
bibechana-4897	100	30	of	of	ADP
bibechana-4897	100	31	a	a	DET
bibechana-4897	100	32	year	year	NOUN
bibechana-4897	100	33	or	or	CCONJ
bibechana-4897	100	34	longer	long	ADJ
bibechana-4897	100	35	)	)	PUNCT
bibechana-4897	100	36	.	.	PUNCT
bibechana-4897	101	1	furthermore	furthermore	ADV
bibechana-4897	101	2	,	,	PUNCT
bibechana-4897	101	3	storage	storage	NOUN
bibechana-4897	101	4	of	of	ADP
bibechana-4897	101	5	psi	psi	NOUN
bibechana-4897	101	6	samples	sample	NOUN
bibechana-4897	101	7	with	with	ADP
bibechana-4897	101	8	shorter	short	ADJ
bibechana-4897	101	9	wavelength	wavelength	NOUN
bibechana-4897	101	10	emissions	emission	NOUN
bibechana-4897	101	11	in	in	ADP
bibechana-4897	101	12	vacuum	vacuum	NOUN
bibechana-4897	101	13	did	do	AUX
bibechana-4897	101	14	not	not	PART
bibechana-4897	101	15	diminish	diminish	VERB
bibechana-4897	101	16	their	their	PRON
bibechana-4897	101	17	pl	pl	NOUN
bibechana-4897	101	18	emission	emission	NOUN
bibechana-4897	101	19	intensities	intensity	NOUN
bibechana-4897	101	20	;	;	PUNCT
bibechana-4897	101	21	and	and	CCONJ
bibechana-4897	101	22	even	even	ADV
bibechana-4897	101	23	after	after	ADP
bibechana-4897	101	24	several	several	ADJ
bibechana-4897	101	25	hours	hour	NOUN
bibechana-4897	101	26	,	,	PUNCT
bibechana-4897	101	27	no	no	DET
bibechana-4897	101	28	significant	significant	ADJ
bibechana-4897	101	29	change	change	NOUN
bibechana-4897	101	30	in	in	ADP
bibechana-4897	101	31	the	the	DET
bibechana-4897	101	32	intensities	intensity	NOUN
bibechana-4897	101	33	was	be	AUX
bibechana-4897	101	34	observed	observe	VERB
bibechana-4897	101	35	.	.	PUNCT
bibechana-4897	102	1	the	the	DET
bibechana-4897	102	2	above	above	ADJ
bibechana-4897	102	3	observations	observation	NOUN
bibechana-4897	102	4	can	can	AUX
bibechana-4897	102	5	be	be	AUX
bibechana-4897	102	6	attributed	attribute	VERB
bibechana-4897	102	7	to	to	ADP
bibechana-4897	102	8	the	the	DET
bibechana-4897	102	9	extremely	extremely	ADV
bibechana-4897	102	10	small	small	ADJ
bibechana-4897	102	11	thicknesses	thickness	NOUN
bibechana-4897	102	12	of	of	ADP
bibechana-4897	102	13	si	si	PROPN
bibechana-4897	102	14	wires	wire	NOUN
bibechana-4897	102	15	and	and	CCONJ
bibechana-4897	102	16	microcrystals	microcrystal	NOUN
bibechana-4897	102	17	when	when	SCONJ
bibechana-4897	102	18	the	the	DET
bibechana-4897	102	19	anodization	anodization	NOUN
bibechana-4897	102	20	current	current	ADJ
bibechana-4897	102	21	density	density	NOUN
bibechana-4897	102	22	is	be	AUX
bibechana-4897	102	23	large	large	ADJ
bibechana-4897	102	24	,	,	PUNCT
bibechana-4897	102	25	i.e.	i.e.	X
bibechana-4897	102	26	approaching	approach	VERB
bibechana-4897	102	27	the	the	DET
bibechana-4897	102	28	electropolishing	electropolishing	NOUN
bibechana-4897	102	29	domain	domain	NOUN
bibechana-4897	102	30	.	.	PUNCT
bibechana-4897	103	1	these	these	DET
bibechana-4897	103	2	very	very	ADV
bibechana-4897	103	3	thin	thin	ADJ
bibechana-4897	103	4	wires	wire	NOUN
bibechana-4897	103	5	eventually	eventually	ADV
bibechana-4897	103	6	oxidize	oxidize	VERB
bibechana-4897	103	7	completely	completely	ADV
bibechana-4897	103	8	during	during	ADP
bibechana-4897	103	9	pl	pl	NOUN
bibechana-4897	103	10	emission	emission	NOUN
bibechana-4897	103	11	intensities	intensity	NOUN
bibechana-4897	103	12	;	;	PUNCT
bibechana-4897	103	13	and	and	CCONJ
bibechana-4897	103	14	even	even	ADV
bibechana-4897	103	15	after	after	ADP
bibechana-4897	103	16	several	several	ADJ
bibechana-4897	103	17	hours	hour	NOUN
bibechana-4897	103	18	,	,	PUNCT
bibechana-4897	103	19	no	no	DET
bibechana-4897	103	20	significant	significant	ADJ
bibechana-4897	103	21	change	change	NOUN
bibechana-4897	103	22	in	in	ADP
bibechana-4897	103	23	the	the	DET
bibechana-4897	103	24	intensities	intensity	NOUN
bibechana-4897	103	25	was	be	AUX
bibechana-4897	103	26	observed	observe	VERB
bibechana-4897	103	27	.	.	PUNCT
bibechana-4897	104	1	the	the	DET
bibechana-4897	104	2	above	above	ADJ
bibechana-4897	104	3	observations	observation	NOUN
bibechana-4897	104	4	can	can	AUX
bibechana-4897	104	5	be	be	AUX
bibechana-4897	104	6	attributed	attribute	VERB
bibechana-4897	104	7	to	to	ADP
bibechana-4897	104	8	the	the	DET
bibechana-4897	104	9	extremely	extremely	ADV
bibechana-4897	104	10	small	small	ADJ
bibechana-4897	104	11	thicknesses	thickness	NOUN
bibechana-4897	104	12	of	of	ADP
bibechana-4897	104	13	si	si	PROPN
bibechana-4897	104	14	wires	wire	NOUN
bibechana-4897	104	15	and	and	CCONJ
bibechana-4897	104	16	microcrystals	microcrystal	NOUN
bibechana-4897	104	17	when	when	SCONJ
bibechana-4897	104	18	the	the	DET
bibechana-4897	104	19	anodization	anodization	NOUN
bibechana-4897	104	20	current	current	ADJ
bibechana-4897	104	21	density	density	NOUN
bibechana-4897	104	22	is	be	AUX
bibechana-4897	104	23	large	large	ADJ
bibechana-4897	104	24	,	,	PUNCT
bibechana-4897	104	25	i.e.	i.e.	X
bibechana-4897	104	26	approaching	approach	VERB
bibechana-4897	104	27	the	the	DET
bibechana-4897	104	28	electropolishing	electropolishing	NOUN
bibechana-4897	104	29	domain	domain	NOUN
bibechana-4897	104	30	.	.	PUNCT
bibechana-4897	105	1	these	these	DET
bibechana-4897	105	2	very	very	ADV
bibechana-4897	105	3	thin	thin	ADJ
bibechana-4897	105	4	wires	wire	NOUN
bibechana-4897	105	5	eventually	eventually	ADV
bibechana-4897	105	6	oxidize	oxidize	VERB
bibechana-4897	105	7	completely	completely	ADV
bibechana-4897	105	8	when	when	SCONJ
bibechana-4897	105	9	the	the	DET
bibechana-4897	105	10	psi	psi	NOUN
bibechana-4897	105	11	layer	layer	NOUN
bibechana-4897	105	12	is	be	AUX
bibechana-4897	105	13	exposed	expose	VERB
bibechana-4897	105	14	to	to	ADP
bibechana-4897	105	15	air	air	NOUN
bibechana-4897	105	16	.	.	PUNCT
bibechana-4897	106	1	on	on	ADP
bibechana-4897	106	2	the	the	DET
bibechana-4897	106	3	other	other	ADJ
bibechana-4897	106	4	hand	hand	NOUN
bibechana-4897	106	5	,	,	PUNCT
bibechana-4897	106	6	thick	thick	ADJ
bibechana-4897	106	7	si	si	PROPN
bibechana-4897	106	8	wires	wire	NOUN
bibechana-4897	106	9	do	do	AUX
bibechana-4897	106	10	not	not	PART
bibechana-4897	106	11	oxidize	oxidize	VERB
bibechana-4897	106	12	entirely	entirely	ADV
bibechana-4897	106	13	and	and	CCONJ
bibechana-4897	106	14	a	a	DET
bibechana-4897	106	15	thin	thin	ADJ
bibechana-4897	106	16	sio2	sio2	NOUN
bibechana-4897	106	17	layer	layer	NOUN
bibechana-4897	106	18	,	,	PUNCT
bibechana-4897	106	19	which	which	PRON
bibechana-4897	106	20	forms	form	VERB
bibechana-4897	106	21	on	on	ADP
bibechana-4897	106	22	the	the	DET
bibechana-4897	106	23	outer	outer	ADJ
bibechana-4897	106	24	surface	surface	NOUN
bibechana-4897	106	25	of	of	ADP
bibechana-4897	106	26	the	the	DET
bibechana-4897	106	27	wires	wire	NOUN
bibechana-4897	106	28	,	,	PUNCT
bibechana-4897	106	29	prevents	prevent	VERB
bibechana-4897	106	30	their	their	PRON
bibechana-4897	106	31	further	further	ADJ
bibechana-4897	106	32	oxidation	oxidation	NOUN
bibechana-4897	106	33	.	.	PUNCT
bibechana-4897	107	1	of	of	ADP
bibechana-4897	107	2	course	course	ADV
bibechana-4897	107	3	,	,	PUNCT
bibechana-4897	107	4	if	if	SCONJ
bibechana-4897	107	5	the	the	DET
bibechana-4897	107	6	temperature	temperature	NOUN
bibechana-4897	107	7	is	be	AUX
bibechana-4897	107	8	increased	increase	VERB
bibechana-4897	107	9	,	,	PUNCT
bibechana-4897	107	10	the	the	DET
bibechana-4897	107	11	oxidation	oxidation	NOUN
bibechana-4897	107	12	process	process	NOUN
bibechana-4897	107	13	will	will	AUX
bibechana-4897	107	14	propagate	propagate	VERB
bibechana-4897	107	15	further	far	ADV
bibechana-4897	107	16	until	until	SCONJ
bibechana-4897	107	17	the	the	DET
bibechana-4897	107	18	entire	entire	ADJ
bibechana-4897	107	19	si	si	NOUN
bibechana-4897	107	20	structure	structure	NOUN
bibechana-4897	107	21	is	be	AUX
bibechana-4897	107	22	oxidized	oxidize	VERB
bibechana-4897	107	23	.	.	PUNCT
bibechana-4897	108	1	this	this	PRON
bibechana-4897	108	2	was	be	AUX
bibechana-4897	108	3	actually	actually	ADV
bibechana-4897	108	4	observed	observe	VERB
bibechana-4897	108	5	experimentally	experimentally	ADV
bibechana-4897	108	6	;	;	PUNCT
bibechana-4897	108	7	psi	psi	NOUN
bibechana-4897	108	8	samples	sample	NOUN
bibechana-4897	108	9	with	with	ADP
bibechana-4897	108	10	red	red	ADJ
bibechana-4897	108	11	pl	pl	PROPN
bibechana-4897	108	12	emissions	emission	NOUN
bibechana-4897	108	13	(	(	PUNCT
bibechana-4897	108	14	which	which	PRON
bibechana-4897	108	15	are	be	AUX
bibechana-4897	108	16	normally	normally	ADV
bibechana-4897	108	17	stable	stable	ADJ
bibechana-4897	108	18	)	)	PUNCT
bibechana-4897	108	19	were	be	AUX
bibechana-4897	108	20	heated	heat	VERB
bibechana-4897	108	21	in	in	ADP
bibechana-4897	108	22	air	air	NOUN
bibechana-4897	108	23	.	.	PUNCT
bibechana-4897	109	1	when	when	SCONJ
bibechana-4897	109	2	the	the	DET
bibechana-4897	109	3	temperature	temperature	NOUN
bibechana-4897	109	4	reached	reach	VERB
bibechana-4897	109	5	~	~	PUNCT
bibechana-4897	109	6	60	60	NUM
bibechana-4897	109	7	0	0	NUM
bibechana-4897	109	8	c	c	X
bibechana-4897	109	9	the	the	DET
bibechana-4897	109	10	pl	pl	PROPN
bibechana-4897	109	11	intensity	intensity	NOUN
bibechana-4897	109	12	of	of	ADP
bibechana-4897	109	13	the	the	DET
bibechana-4897	109	14	sample	sample	NOUN
bibechana-4897	109	15	started	start	VERB
bibechana-4897	109	16	to	to	PART
bibechana-4897	109	17	diminish	diminish	VERB
bibechana-4897	109	18	;	;	PUNCT
bibechana-4897	109	19	at	at	ADP
bibechana-4897	109	20	~200	~200	ADP
bibechana-4897	109	21	0	0	NUM
bibechana-4897	109	22	c	c	NOUN
bibechana-4897	109	23	(	(	PUNCT
bibechana-4897	109	24	after	after	ADP
bibechana-4897	109	25	6	6	NUM
bibechana-4897	109	26	minutes	minute	NOUN
bibechana-4897	109	27	total	total	ADJ
bibechana-4897	109	28	heating	heating	NOUN
bibechana-4897	109	29	time	time	NOUN
bibechana-4897	109	30	)	)	PUNCT
bibechana-4897	109	31	the	the	DET
bibechana-4897	109	32	emission	emission	NOUN
bibechana-4897	109	33	was	be	AUX
bibechana-4897	109	34	completely	completely	ADV
bibechana-4897	109	35	destroyed	destroy	VERB
bibechana-4897	109	36	.	.	PUNCT
bibechana-4897	110	1	heating	heat	VERB
bibechana-4897	110	2	similar	similar	ADJ
bibechana-4897	110	3	samples	sample	NOUN
bibechana-4897	110	4	in	in	ADP
bibechana-4897	110	5	boiling	boiling	NOUN
bibechana-4897	110	6	water	water	NOUN
bibechana-4897	110	7	also	also	ADV
bibechana-4897	110	8	showed	show	VERB
bibechana-4897	110	9	the	the	DET
bibechana-4897	110	10	same	same	ADJ
bibechana-4897	110	11	oxidation	oxidation	NOUN
bibechana-4897	110	12	effect	effect	NOUN
bibechana-4897	110	13	.	.	PUNCT
bibechana-4897	111	1	at	at	ADP
bibechana-4897	111	2	current	current	ADJ
bibechana-4897	111	3	densities	density	NOUN
bibechana-4897	111	4	of	of	ADP
bibechana-4897	111	5	100	100	NUM
bibechana-4897	111	6	ma	ma	PROPN
bibechana-4897	111	7	/	/	SYM
bibechana-4897	111	8	cm	cm	NOUN
bibechana-4897	111	9	2	2	NUM
bibechana-4897	111	10	or	or	CCONJ
bibechana-4897	111	11	greater	great	ADJ
bibechana-4897	111	12	(	(	PUNCT
bibechana-4897	111	13	sample	sample	NOUN
bibechana-4897	111	14	no	no	INTJ
bibechana-4897	111	15	.	.	NOUN
bibechana-4897	111	16	7	7	NUM
bibechana-4897	111	17	in	in	ADP
bibechana-4897	111	18	table	table	NOUN
bibechana-4897	111	19	1	1	NUM
bibechana-4897	111	20	)	)	PUNCT
bibechana-4897	111	21	electropolishing	electropolishing	NOUN
bibechana-4897	111	22	process	process	NOUN
bibechana-4897	111	23	takes	take	VERB
bibechana-4897	111	24	place	place	NOUN
bibechana-4897	111	25	and	and	CCONJ
bibechana-4897	111	26	psi	psi	NOUN
bibechana-4897	111	27	is	be	AUX
bibechana-4897	111	28	not	not	PART
bibechana-4897	111	29	formed	form	VERB
bibechana-4897	111	30	.	.	PUNCT
bibechana-4897	112	1	the	the	DET
bibechana-4897	112	2	emission	emission	NOUN
bibechana-4897	112	3	intensities	intensity	NOUN
bibechana-4897	112	4	for	for	ADP
bibechana-4897	112	5	samples	sample	NOUN
bibechana-4897	112	6	2	2	NUM
bibechana-4897	112	7	and	and	CCONJ
bibechana-4897	112	8	3	3	NUM
bibechana-4897	112	9	(	(	PUNCT
bibechana-4897	112	10	table	table	NOUN
bibechana-4897	112	11	1	1	NUM
bibechana-4897	112	12	)	)	PUNCT
bibechana-4897	112	13	were	be	AUX
bibechana-4897	112	14	stronger	strong	ADJ
bibechana-4897	112	15	than	than	ADP
bibechana-4897	112	16	the	the	DET
bibechana-4897	112	17	others	other	NOUN
bibechana-4897	112	18	.	.	PUNCT
bibechana-4897	113	1	the	the	DET
bibechana-4897	113	2	intensities	intensity	NOUN
bibechana-4897	113	3	of	of	ADP
bibechana-4897	113	4	samples	sample	NOUN
bibechana-4897	113	5	5	5	NUM
bibechana-4897	113	6	and	and	CCONJ
bibechana-4897	113	7	6	6	NUM
bibechana-4897	113	8	were	be	AUX
bibechana-4897	113	9	lower	low	ADJ
bibechana-4897	113	10	,	,	PUNCT
bibechana-4897	113	11	though	though	SCONJ
bibechana-4897	113	12	quite	quite	ADV
bibechana-4897	113	13	visible	visible	ADJ
bibechana-4897	113	14	.	.	PUNCT
bibechana-4897	114	1	viewing	view	VERB
bibechana-4897	114	2	the	the	DET
bibechana-4897	114	3	spectrum	spectrum	NOUN
bibechana-4897	114	4	of	of	ADP
bibechana-4897	114	5	the	the	DET
bibechana-4897	114	6	emitted	emitted	ADJ
bibechana-4897	114	7	pl	pl	X
bibechana-4897	114	8	emission	emission	NOUN
bibechana-4897	114	9	of	of	ADP
bibechana-4897	114	10	psi	psi	NOUN
bibechana-4897	114	11	samples	sample	NOUN
bibechana-4897	114	12	by	by	ADP
bibechana-4897	114	13	a	a	DET
bibechana-4897	114	14	spectroscope	spectroscope	NOUN
bibechana-4897	114	15	showed	show	VERB
bibechana-4897	114	16	that	that	SCONJ
bibechana-4897	114	17	the	the	DET
bibechana-4897	114	18	light	light	NOUN
bibechana-4897	114	19	consisted	consist	VERB
bibechana-4897	114	20	of	of	ADP
bibechana-4897	114	21	a	a	DET
bibechana-4897	114	22	range	range	NOUN
bibechana-4897	114	23	of	of	ADP
bibechana-4897	114	24	wavelengths	wavelength	NOUN
bibechana-4897	114	25	,	,	PUNCT
bibechana-4897	114	26	as	as	SCONJ
bibechana-4897	114	27	is	be	AUX
bibechana-4897	114	28	well	well	ADV
bibechana-4897	114	29	documented	document	VERB
bibechana-4897	114	30	in	in	ADP
bibechana-4897	114	31	the	the	DET
bibechana-4897	114	32	literature	literature	NOUN
bibechana-4897	114	33	.	.	PUNCT
bibechana-4897	115	1	3.2	3.2	NUM
bibechana-4897	115	2	photoluminescence	photoluminescence	NOUN
bibechana-4897	115	3	emission	emission	NOUN
bibechana-4897	115	4	of	of	ADP
bibechana-4897	115	5	n	n	CCONJ
bibechana-4897	115	6	-	-	PUNCT
bibechana-4897	115	7	type	type	NOUN
bibechana-4897	115	8	samples	sample	NOUN
bibechana-4897	115	9	under	under	ADP
bibechana-4897	115	10	various	various	ADJ
bibechana-4897	115	11	preparation	preparation	NOUN
bibechana-4897	115	12	conditions	condition	NOUN
bibechana-4897	115	13	,	,	PUNCT
bibechana-4897	115	14	n	n	CCONJ
bibechana-4897	115	15	-	-	PUNCT
bibechana-4897	115	16	type	type	NOUN
bibechana-4897	115	17	samples	sample	NOUN
bibechana-4897	115	18	did	do	AUX
bibechana-4897	115	19	not	not	PART
bibechana-4897	115	20	produce	produce	VERB
bibechana-4897	115	21	any	any	DET
bibechana-4897	115	22	visible	visible	ADJ
bibechana-4897	115	23	pl	pl	NOUN
bibechana-4897	115	24	emission	emission	NOUN
bibechana-4897	115	25	,	,	PUNCT
bibechana-4897	115	26	when	when	SCONJ
bibechana-4897	115	27	samples	sample	NOUN
bibechana-4897	115	28	were	be	AUX
bibechana-4897	115	29	prepared	prepare	VERB
bibechana-4897	115	30	in	in	ADP
bibechana-4897	115	31	the	the	DET
bibechana-4897	115	32	dark	dark	NOUN
bibechana-4897	115	33	.	.	PUNCT
bibechana-4897	116	1	however	however	ADV
bibechana-4897	116	2	,	,	PUNCT
bibechana-4897	116	3	psi	psi	PROPN
bibechana-4897	116	4	was	be	AUX
bibechana-4897	116	5	formed	form	VERB
bibechana-4897	116	6	and	and	CCONJ
bibechana-4897	116	7	strong	strong	ADJ
bibechana-4897	116	8	pl	pl	NOUN
bibechana-4897	116	9	emissions	emission	NOUN
bibechana-4897	116	10	were	be	AUX
bibechana-4897	116	11	observed	observe	VERB
bibechana-4897	116	12	when	when	SCONJ
bibechana-4897	116	13	the	the	DET
bibechana-4897	116	14	anodization	anodization	NOUN
bibechana-4897	116	15	process	process	NOUN
bibechana-4897	116	16	was	be	AUX
bibechana-4897	116	17	done	do	VERB
bibechana-4897	116	18	under	under	ADP
bibechana-4897	116	19	illumination	illumination	NOUN
bibechana-4897	116	20	.	.	PUNCT
bibechana-4897	117	1	this	this	PRON
bibechana-4897	117	2	was	be	AUX
bibechana-4897	117	3	well	well	ADV
bibechana-4897	117	4	observed	observe	VERB
bibechana-4897	117	5	when	when	SCONJ
bibechana-4897	117	6	only	only	ADV
bibechana-4897	117	7	a	a	DET
bibechana-4897	117	8	part	part	NOUN
bibechana-4897	117	9	of	of	ADP
bibechana-4897	117	10	the	the	DET
bibechana-4897	117	11	substrate	substrate	NOUN
bibechana-4897	117	12	was	be	AUX
bibechana-4897	117	13	illuminated	illuminate	VERB
bibechana-4897	117	14	by	by	ADP
bibechana-4897	117	15	a	a	DET
bibechana-4897	117	16	bright	bright	ADJ
bibechana-4897	117	17	light	light	ADJ
bibechana-4897	117	18	source	source	NOUN
bibechana-4897	117	19	.	.	PUNCT
bibechana-4897	118	1	the	the	DET
bibechana-4897	118	2	contrast	contrast	NOUN
bibechana-4897	118	3	between	between	ADP
bibechana-4897	118	4	the	the	DET
bibechana-4897	118	5	two	two	NUM
bibechana-4897	118	6	parts	part	NOUN
bibechana-4897	118	7	was	be	AUX
bibechana-4897	118	8	quite	quite	ADV
bibechana-4897	118	9	evident	evident	ADJ
bibechana-4897	118	10	when	when	SCONJ
bibechana-4897	118	11	the	the	DET
bibechana-4897	118	12	sample	sample	NOUN
bibechana-4897	118	13	was	be	AUX
bibechana-4897	118	14	inspected	inspect	VERB
bibechana-4897	118	15	under	under	ADP
bibechana-4897	118	16	normal	normal	ADJ
bibechana-4897	118	17	or	or	CCONJ
bibechana-4897	118	18	uv	uv	NOUN
bibechana-4897	118	19	illumination	illumination	NOUN
bibechana-4897	118	20	.	.	PUNCT
bibechana-4897	119	1	again	again	ADV
bibechana-4897	119	2	,	,	PUNCT
bibechana-4897	119	3	by	by	ADP
bibechana-4897	119	4	varying	vary	VERB
bibechana-4897	119	5	anodization	anodization	NOUN
bibechana-4897	119	6	current	current	ADJ
bibechana-4897	119	7	densities	density	NOUN
bibechana-4897	119	8	(	(	PUNCT
bibechana-4897	119	9	under	under	ADP
bibechana-4897	119	10	a	a	DET
bibechana-4897	119	11	constant	constant	ADJ
bibechana-4897	119	12	-	-	PUNCT
bibechana-4897	119	13	charge	charge	NOUN
bibechana-4897	119	14	condition	condition	NOUN
bibechana-4897	119	15	)	)	PUNCT
bibechana-4897	119	16	,	,	PUNCT
bibechana-4897	119	17	various	various	ADJ
bibechana-4897	119	18	pl	pl	NOUN
bibechana-4897	119	19	colors	color	NOUN
bibechana-4897	119	20	were	be	AUX
bibechana-4897	119	21	obtained	obtain	VERB
bibechana-4897	119	22	from	from	ADP
bibechana-4897	119	23	these	these	DET
bibechana-4897	119	24	samples	sample	NOUN
bibechana-4897	119	25	.	.	PUNCT
bibechana-4897	120	1	table	table	NOUN
bibechana-4897	120	2	(	(	PUNCT
bibechana-4897	120	3	2	2	X
bibechana-4897	120	4	)	)	PUNCT
bibechana-4897	120	5	shows	show	VERB
bibechana-4897	120	6	the	the	DET
bibechana-4897	120	7	results	result	NOUN
bibechana-4897	120	8	.	.	PUNCT
bibechana-4897	121	1	the	the	DET
bibechana-4897	121	2	samples	sample	NOUN
bibechana-4897	121	3	were	be	AUX
bibechana-4897	121	4	illuminated	illuminate	VERB
bibechana-4897	121	5	by	by	ADP
bibechana-4897	121	6	a	a	DET
bibechana-4897	121	7	150w	150w	NUM
bibechana-4897	121	8	mercury	mercury	NOUN
bibechana-4897	121	9	-	-	PUNCT
bibechana-4897	121	10	vapor	vapor	NOUN
bibechana-4897	121	11	lamp	lamp	NOUN
bibechana-4897	121	12	at	at	ADP
bibechana-4897	121	13	30	30	NUM
bibechana-4897	121	14	cm	cm	NOUN
bibechana-4897	121	15	.	.	PUNCT
bibechana-4897	122	1	distance	distance	NOUN
bibechana-4897	122	2	the	the	DET
bibechana-4897	122	3	psi	psi	NOUN
bibechana-4897	122	4	formation	formation	NOUN
bibechana-4897	122	5	.	.	PUNCT
bibechana-4897	123	1	e.	e.	PROPN
bibechana-4897	123	2	haji	haji	PROPN
bibechana-4897	123	3	-	-	PUNCT
bibechana-4897	123	4	ali	ali	PROPN
bibechana-4897	123	5	/	/	SYM
bibechana-4897	123	6	bibechana	bibechana	PROPN
bibechana-4897	123	7	8	8	NUM
bibechana-4897	123	8	(	(	PUNCT
bibechana-4897	123	9	2012	2012	NUM
bibechana-4897	123	10	)	)	PUNCT
bibechana-4897	123	11	46	46	NUM
bibechana-4897	123	12	-	-	SYM
bibechana-4897	123	13	52	52	NUM
bibechana-4897	123	14	:	:	PUNCT
bibechana-4897	123	15	bmhss	bmhss	PROPN
bibechana-4897	123	16	,	,	PUNCT
bibechana-4897	123	17	p.51	p.51	PROPN
bibechana-4897	123	18	table	table	NOUN
bibechana-4897	123	19	(	(	PUNCT
bibechana-4897	123	20	2	2	NUM
bibechana-4897	123	21	):	):	PUNCT
bibechana-4897	123	22	color	color	NOUN
bibechana-4897	123	23	of	of	ADP
bibechana-4897	123	24	pl	pl	NOUN
bibechana-4897	123	25	emission	emission	NOUN
bibechana-4897	123	26	of	of	ADP
bibechana-4897	123	27	psi	psi	NOUN
bibechana-4897	123	28	samples	sample	NOUN
bibechana-4897	123	29	(	(	PUNCT
bibechana-4897	123	30	under	under	ADP
bibechana-4897	123	31	uv	uv	NOUN
bibechana-4897	123	32	illumination	illumination	NOUN
bibechana-4897	123	33	)	)	PUNCT
bibechana-4897	123	34	prepared	prepare	VERB
bibechana-4897	123	35	on	on	ADP
bibechana-4897	123	36	n	n	CCONJ
bibechana-4897	123	37	-	-	PUNCT
bibechana-4897	123	38	type	type	NOUN
bibechana-4897	123	39	si	si	NOUN
bibechana-4897	123	40	and	and	CCONJ
bibechana-4897	123	41	under	under	ADP
bibechana-4897	123	42	different	different	ADJ
bibechana-4897	123	43	anodization	anodization	NOUN
bibechana-4897	123	44	times	time	NOUN
bibechana-4897	123	45	.	.	PUNCT
bibechana-4897	124	1	the	the	DET
bibechana-4897	124	2	total	total	ADJ
bibechana-4897	124	3	charge	charge	NOUN
bibechana-4897	124	4	passed	pass	VERB
bibechana-4897	124	5	through	through	ADP
bibechana-4897	124	6	the	the	DET
bibechana-4897	124	7	cell	cell	NOUN
bibechana-4897	124	8	was	be	AUX
bibechana-4897	124	9	constant	constant	ADJ
bibechana-4897	124	10	for	for	SCONJ
bibechana-4897	124	11	all	all	PRON
bibechana-4897	124	12	of	of	ADP
bibechana-4897	124	13	the	the	DET
bibechana-4897	124	14	cases	case	NOUN
bibechana-4897	124	15	no	no	DET
bibechana-4897	124	16	etching	etch	VERB
bibechana-4897	124	17	time(minutes	time(minute	NOUN
bibechana-4897	124	18	)	)	PUNCT
bibechana-4897	124	19	current(ma	current(ma	PROPN
bibechana-4897	124	20	/	/	SYM
bibechana-4897	124	21	cm2	cm2	NOUN
bibechana-4897	124	22	)	)	PUNCT
bibechana-4897	124	23	pl	pl	NOUN
bibechana-4897	124	24	emission	emission	NOUN
bibechana-4897	124	25	color	color	NOUN
bibechana-4897	124	26	1	1	NUM
bibechana-4897	124	27	50	50	NUM
bibechana-4897	124	28	4	4	NUM
bibechana-4897	124	29	dark	dark	ADV
bibechana-4897	124	30	-	-	PUNCT
bibechana-4897	124	31	red	red	ADJ
bibechana-4897	124	32	2	2	NUM
bibechana-4897	124	33	34	34	NUM
bibechana-4897	124	34	6	6	NUM
bibechana-4897	124	35	red	red	ADJ
bibechana-4897	124	36	-	-	PUNCT
bibechana-4897	124	37	orange	orange	NOUN
bibechana-4897	124	38	3	3	NUM
bibechana-4897	124	39	25	25	NUM
bibechana-4897	124	40	8	8	NUM
bibechana-4897	124	41	orange	orange	ADJ
bibechana-4897	124	42	-	-	PUNCT
bibechana-4897	124	43	yellow	yellow	ADJ
bibechana-4897	124	44	pattered	pattered	ADJ
bibechana-4897	124	45	psi	psi	NOUN
bibechana-4897	124	46	layers	layer	NOUN
bibechana-4897	124	47	were	be	AUX
bibechana-4897	124	48	generated	generate	VERB
bibechana-4897	124	49	by	by	ADP
bibechana-4897	124	50	two	two	NUM
bibechana-4897	124	51	techniques	technique	NOUN
bibechana-4897	124	52	.	.	PUNCT
bibechana-4897	125	1	first	first	ADV
bibechana-4897	125	2	,	,	PUNCT
bibechana-4897	125	3	a	a	DET
bibechana-4897	125	4	layer	layer	NOUN
bibechana-4897	125	5	of	of	ADP
bibechana-4897	125	6	positive	positive	ADJ
bibechana-4897	125	7	photoresist	photoresist	NOUN
bibechana-4897	125	8	was	be	AUX
bibechana-4897	125	9	patterned	pattern	VERB
bibechana-4897	125	10	by	by	ADP
bibechana-4897	125	11	photolithographic	photolithographic	ADJ
bibechana-4897	125	12	method	method	NOUN
bibechana-4897	125	13	on	on	ADP
bibechana-4897	125	14	the	the	DET
bibechana-4897	125	15	substrate	substrate	NOUN
bibechana-4897	125	16	surface	surface	NOUN
bibechana-4897	125	17	.	.	PUNCT
bibechana-4897	126	1	in	in	ADP
bibechana-4897	126	2	another	another	DET
bibechana-4897	126	3	technique	technique	NOUN
bibechana-4897	126	4	,	,	PUNCT
bibechana-4897	126	5	patternd	patternd	NOUN
bibechana-4897	126	6	illumination	illumination	NOUN
bibechana-4897	126	7	of	of	ADP
bibechana-4897	126	8	the	the	DET
bibechana-4897	126	9	sample	sample	NOUN
bibechana-4897	126	10	(	(	PUNCT
bibechana-4897	126	11	during	during	ADP
bibechana-4897	126	12	the	the	DET
bibechana-4897	126	13	anodization	anodization	NOUN
bibechana-4897	126	14	process	process	NOUN
bibechana-4897	126	15	)	)	PUNCT
bibechana-4897	126	16	was	be	AUX
bibechana-4897	126	17	used	use	VERB
bibechana-4897	126	18	.	.	PUNCT
bibechana-4897	127	1	a	a	DET
bibechana-4897	127	2	mask	mask	NOUN
bibechana-4897	127	3	was	be	AUX
bibechana-4897	127	4	placed	place	VERB
bibechana-4897	127	5	in	in	ADP
bibechana-4897	127	6	the	the	DET
bibechana-4897	127	7	path	path	NOUN
bibechana-4897	127	8	of	of	ADP
bibechana-4897	127	9	light	light	NOUN
bibechana-4897	127	10	(	(	PUNCT
bibechana-4897	127	11	see	see	VERB
bibechana-4897	127	12	fig	fig	NOUN
bibechana-4897	127	13	.	.	PUNCT
bibechana-4897	128	1	2	2	NUM
bibechana-4897	128	2	)	)	PUNCT
bibechana-4897	128	3	,	,	PUNCT
bibechana-4897	128	4	and	and	CCONJ
bibechana-4897	128	5	its	its	PRON
bibechana-4897	128	6	image	image	NOUN
bibechana-4897	128	7	was	be	AUX
bibechana-4897	128	8	optically	optically	ADV
bibechana-4897	128	9	projected	project	VERB
bibechana-4897	128	10	on	on	ADP
bibechana-4897	128	11	the	the	DET
bibechana-4897	128	12	si	si	NOUN
bibechana-4897	128	13	substrate	substrate	NOUN
bibechana-4897	128	14	.	.	PUNCT
bibechana-4897	129	1	however	however	ADV
bibechana-4897	129	2	,	,	PUNCT
bibechana-4897	129	3	due	due	ADP
bibechana-4897	129	4	to	to	ADP
bibechana-4897	129	5	scattering	scatter	VERB
bibechana-4897	129	6	of	of	ADP
bibechana-4897	129	7	light	light	NOUN
bibechana-4897	129	8	in	in	ADP
bibechana-4897	129	9	the	the	DET
bibechana-4897	129	10	solution	solution	NOUN
bibechana-4897	129	11	and	and	CCONJ
bibechana-4897	129	12	body	body	NOUN
bibechana-4897	129	13	of	of	ADP
bibechana-4897	129	14	the	the	DET
bibechana-4897	129	15	cell	cell	NOUN
bibechana-4897	129	16	,	,	PUNCT
bibechana-4897	129	17	pattern	pattern	NOUN
bibechana-4897	129	18	definition	definition	NOUN
bibechana-4897	129	19	was	be	AUX
bibechana-4897	129	20	not	not	PART
bibechana-4897	129	21	as	as	ADV
bibechana-4897	129	22	good	good	ADJ
bibechana-4897	129	23	as	as	ADP
bibechana-4897	129	24	the	the	DET
bibechana-4897	129	25	former	former	ADJ
bibechana-4897	129	26	technique	technique	NOUN
bibechana-4897	129	27	.	.	PUNCT
bibechana-4897	130	1	3.3	3.3	NUM
bibechana-4897	130	2	electroluminescence	electroluminescence	NOUN
bibechana-4897	130	3	results	result	VERB
bibechana-4897	130	4	three	three	NUM
bibechana-4897	130	5	kind	kind	NOUN
bibechana-4897	130	6	of	of	ADP
bibechana-4897	130	7	el	el	PROPN
bibechana-4897	130	8	cells	cell	NOUN
bibechana-4897	130	9	(	(	PUNCT
bibechana-4897	130	10	electrolyte	electrolyte	NOUN
bibechana-4897	130	11	/	/	SYM
bibechana-4897	130	12	psi	psi	NOUN
bibechana-4897	130	13	,	,	PUNCT
bibechana-4897	130	14	au	au	ADJ
bibechana-4897	130	15	/	/	SYM
bibechana-4897	130	16	psi	psi	NOUN
bibechana-4897	130	17	,	,	PUNCT
bibechana-4897	130	18	and	and	CCONJ
bibechana-4897	130	19	ito	ito	PROPN
bibechana-4897	130	20	/	/	SYM
bibechana-4897	130	21	psi	psi	PROPN
bibechana-4897	130	22	)	)	PUNCT
bibechana-4897	130	23	were	be	AUX
bibechana-4897	130	24	made	make	VERB
bibechana-4897	130	25	and	and	CCONJ
bibechana-4897	130	26	studied	study	VERB
bibechana-4897	130	27	.	.	PUNCT
bibechana-4897	131	1	the	the	DET
bibechana-4897	131	2	electrolyte	electrolyte	NOUN
bibechana-4897	131	3	for	for	ADP
bibechana-4897	131	4	the	the	DET
bibechana-4897	131	5	first	first	ADJ
bibechana-4897	131	6	type	type	NOUN
bibechana-4897	131	7	consisted	consist	VERB
bibechana-4897	131	8	of	of	ADP
bibechana-4897	131	9	acid	acid	NOUN
bibechana-4897	131	10	solutions	solution	NOUN
bibechana-4897	131	11	,	,	PUNCT
bibechana-4897	131	12	usually	usually	ADV
bibechana-4897	131	13	hno3	hno3	ADJ
bibechana-4897	131	14	:	:	PUNCT
bibechana-4897	131	15	h2o	h2o	PROPN
bibechana-4897	131	16	(	(	PUNCT
bibechana-4897	131	17	1:5	1:5	NUM
bibechana-4897	131	18	ratios	ratio	NOUN
bibechana-4897	131	19	)	)	PUNCT
bibechana-4897	131	20	.	.	PUNCT
bibechana-4897	132	1	the	the	DET
bibechana-4897	132	2	samples	sample	NOUN
bibechana-4897	132	3	were	be	AUX
bibechana-4897	132	4	placed	place	VERB
bibechana-4897	132	5	in	in	ADP
bibechana-4897	132	6	the	the	DET
bibechana-4897	132	7	same	same	ADJ
bibechana-4897	132	8	cell	cell	NOUN
bibechana-4897	132	9	that	that	PRON
bibechana-4897	132	10	was	be	AUX
bibechana-4897	132	11	used	use	VERB
bibechana-4897	132	12	for	for	ADP
bibechana-4897	132	13	preparation	preparation	NOUN
bibechana-4897	132	14	of	of	ADP
bibechana-4897	132	15	psi	psi	NOUN
bibechana-4897	132	16	samples	sample	NOUN
bibechana-4897	132	17	(	(	PUNCT
bibechana-4897	132	18	see	see	VERB
bibechana-4897	132	19	fig	fig	NOUN
bibechana-4897	132	20	.	.	PUNCT
bibechana-4897	133	1	1	1	NUM
bibechana-4897	133	2	)	)	PUNCT
bibechana-4897	133	3	.	.	PUNCT
bibechana-4897	134	1	the	the	DET
bibechana-4897	134	2	bias	bias	NOUN
bibechana-4897	134	3	was	be	AUX
bibechana-4897	134	4	established	establish	VERB
bibechana-4897	134	5	between	between	ADP
bibechana-4897	134	6	the	the	DET
bibechana-4897	134	7	top	top	ADJ
bibechana-4897	134	8	pt	pt	NOUN
bibechana-4897	134	9	electrode	electrode	NOUN
bibechana-4897	134	10	and	and	CCONJ
bibechana-4897	134	11	the	the	DET
bibechana-4897	134	12	base	base	NOUN
bibechana-4897	134	13	of	of	ADP
bibechana-4897	134	14	the	the	DET
bibechana-4897	134	15	sample	sample	NOUN
bibechana-4897	134	16	,	,	PUNCT
bibechana-4897	134	17	i.e.	i.e.	X
bibechana-4897	134	18	ohmic	ohmic	ADJ
bibechana-4897	134	19	contact	contact	NOUN
bibechana-4897	134	20	with	with	ADP
bibechana-4897	134	21	si	si	NOUN
bibechana-4897	134	22	substrate	substrate	NOUN
bibechana-4897	134	23	.	.	PUNCT
bibechana-4897	135	1	the	the	DET
bibechana-4897	135	2	amount	amount	NOUN
bibechana-4897	135	3	of	of	ADP
bibechana-4897	135	4	gold	gold	NOUN
bibechana-4897	135	5	that	that	PRON
bibechana-4897	135	6	was	be	AUX
bibechana-4897	135	7	thermally	thermally	ADV
bibechana-4897	135	8	evaporated	evaporate	VERB
bibechana-4897	135	9	on	on	ADP
bibechana-4897	135	10	the	the	DET
bibechana-4897	135	11	psi	psi	NOUN
bibechana-4897	135	12	layer	layer	NOUN
bibechana-4897	135	13	in	in	ADP
bibechana-4897	135	14	vacuum	vacuum	NOUN
bibechana-4897	135	15	was	be	AUX
bibechana-4897	135	16	adjusted	adjust	VERB
bibechana-4897	135	17	so	so	SCONJ
bibechana-4897	135	18	that	that	SCONJ
bibechana-4897	135	19	the	the	DET
bibechana-4897	135	20	au	au	ADJ
bibechana-4897	135	21	electrode	electrode	NOUN
bibechana-4897	135	22	acted	act	VERB
bibechana-4897	135	23	as	as	ADP
bibechana-4897	135	24	a	a	DET
bibechana-4897	135	25	semi	semi	ADJ
bibechana-4897	135	26	-	-	ADJ
bibechana-4897	135	27	transparent	transparent	ADJ
bibechana-4897	135	28	electrode	electrode	NOUN
bibechana-4897	135	29	in	in	ADP
bibechana-4897	135	30	au	au	ADJ
bibechana-4897	135	31	/	/	SYM
bibechana-4897	135	32	psi	psi	NOUN
bibechana-4897	135	33	cells	cell	NOUN
bibechana-4897	135	34	.	.	PUNCT
bibechana-4897	136	1	the	the	DET
bibechana-4897	136	2	third	third	ADJ
bibechana-4897	136	3	kind	kind	NOUN
bibechana-4897	136	4	of	of	ADP
bibechana-4897	136	5	el	el	PROPN
bibechana-4897	136	6	cells	cell	NOUN
bibechana-4897	136	7	were	be	AUX
bibechana-4897	136	8	prepared	prepare	VERB
bibechana-4897	136	9	by	by	ADP
bibechana-4897	136	10	deposition	deposition	NOUN
bibechana-4897	136	11	of	of	ADP
bibechana-4897	136	12	an	an	DET
bibechana-4897	136	13	indium	indium	NOUN
bibechana-4897	136	14	oxide	oxide	NOUN
bibechana-4897	136	15	(	(	PUNCT
bibechana-4897	136	16	io	io	NOUN
bibechana-4897	136	17	)	)	PUNCT
bibechana-4897	136	18	or	or	CCONJ
bibechana-4897	136	19	indium	indium	NOUN
bibechana-4897	136	20	-	-	PUNCT
bibechana-4897	136	21	tin	tin	NOUN
bibechana-4897	136	22	-	-	PUNCT
bibechana-4897	136	23	oxide	oxide	NOUN
bibechana-4897	136	24	(	(	PUNCT
bibechana-4897	136	25	ito	ito	NOUN
bibechana-4897	136	26	)	)	PUNCT
bibechana-4897	136	27	layer	layer	NOUN
bibechana-4897	136	28	on	on	ADP
bibechana-4897	136	29	top	top	NOUN
bibechana-4897	136	30	of	of	ADP
bibechana-4897	136	31	the	the	DET
bibechana-4897	136	32	psi	psi	NOUN
bibechana-4897	136	33	samples	sample	NOUN
bibechana-4897	136	34	.	.	PUNCT
bibechana-4897	137	1	since	since	SCONJ
bibechana-4897	137	2	during	during	ADP
bibechana-4897	137	3	the	the	DET
bibechana-4897	137	4	deposition	deposition	NOUN
bibechana-4897	137	5	of	of	ADP
bibechana-4897	137	6	io	io	PROPN
bibechana-4897	137	7	or	or	CCONJ
bibechana-4897	137	8	ito	ito	PROPN
bibechana-4897	137	9	layers	layer	NOUN
bibechana-4897	137	10	(	(	PUNCT
bibechana-4897	137	11	by	by	ADP
bibechana-4897	137	12	reactive	reactive	ADJ
bibechana-4897	137	13	evaporation	evaporation	NOUN
bibechana-4897	137	14	of	of	ADP
bibechana-4897	137	15	in	in	ADP
bibechana-4897	137	16	metal	metal	NOUN
bibechana-4897	137	17	in	in	ADP
bibechana-4897	137	18	partial	partial	ADJ
bibechana-4897	137	19	pressure	pressure	NOUN
bibechana-4897	137	20	of	of	ADP
bibechana-4897	137	21	oxygen	oxygen	NOUN
bibechana-4897	137	22	and	and	CCONJ
bibechana-4897	137	23	spray	spray	NOUN
bibechana-4897	137	24	-	-	PUNCT
bibechana-4897	137	25	hydrolysis	hydrolysis	NOUN
bibechana-4897	137	26	methods	method	NOUN
bibechana-4897	137	27	,	,	PUNCT
bibechana-4897	137	28	respectively	respectively	ADV
bibechana-4897	137	29	)	)	PUNCT
bibechana-4897	137	30	the	the	DET
bibechana-4897	137	31	substrate	substrate	NOUN
bibechana-4897	137	32	needed	need	VERB
bibechana-4897	137	33	to	to	PART
bibechana-4897	137	34	be	be	AUX
bibechana-4897	137	35	heated	heat	VERB
bibechana-4897	137	36	to	to	ADP
bibechana-4897	137	37	several	several	ADJ
bibechana-4897	137	38	hundred	hundred	NUM
bibechana-4897	137	39	degrees	degree	NOUN
bibechana-4897	137	40	celsius	celsius	NOUN
bibechana-4897	137	41	,	,	PUNCT
bibechana-4897	137	42	the	the	DET
bibechana-4897	137	43	psi	psi	NOUN
bibechana-4897	137	44	layer	layer	NOUN
bibechana-4897	137	45	oxidized	oxidize	VERB
bibechana-4897	137	46	during	during	ADP
bibechana-4897	137	47	the	the	DET
bibechana-4897	137	48	transparent	transparent	ADJ
bibechana-4897	137	49	electrode	electrode	NOUN
bibechana-4897	137	50	deposition	deposition	NOUN
bibechana-4897	137	51	,	,	PUNCT
bibechana-4897	137	52	and	and	CCONJ
bibechana-4897	137	53	therefore	therefore	ADV
bibechana-4897	137	54	,	,	PUNCT
bibechana-4897	137	55	no	no	DET
bibechana-4897	137	56	visible	visible	ADJ
bibechana-4897	137	57	el	el	PROPN
bibechana-4897	137	58	emission	emission	NOUN
bibechana-4897	137	59	was	be	AUX
bibechana-4897	137	60	observed	observe	VERB
bibechana-4897	137	61	from	from	ADP
bibechana-4897	137	62	these	these	DET
bibechana-4897	137	63	cells	cell	NOUN
bibechana-4897	137	64	.	.	PUNCT
bibechana-4897	138	1	of	of	ADP
bibechana-4897	138	2	the	the	DET
bibechana-4897	138	3	other	other	ADJ
bibechana-4897	138	4	two	two	NUM
bibechana-4897	138	5	types	type	NOUN
bibechana-4897	138	6	of	of	ADP
bibechana-4897	138	7	el	el	PROPN
bibechana-4897	138	8	cells	cell	NOUN
bibechana-4897	138	9	,	,	PUNCT
bibechana-4897	138	10	only	only	ADV
bibechana-4897	138	11	electrolyte	electrolyte	ADJ
bibechana-4897	138	12	/	/	SYM
bibechana-4897	138	13	psi	psi	NOUN
bibechana-4897	138	14	cells	cell	NOUN
bibechana-4897	138	15	produced	produce	VERB
bibechana-4897	138	16	bright	bright	ADJ
bibechana-4897	138	17	visible	visible	ADJ
bibechana-4897	138	18	el	el	PROPN
bibechana-4897	138	19	emissions	emission	NOUN
bibechana-4897	138	20	.	.	PUNCT
bibechana-4897	139	1	the	the	DET
bibechana-4897	139	2	intensity	intensity	NOUN
bibechana-4897	139	3	of	of	ADP
bibechana-4897	139	4	the	the	DET
bibechana-4897	139	5	emission	emission	NOUN
bibechana-4897	139	6	increased	increase	VERB
bibechana-4897	139	7	with	with	ADP
bibechana-4897	139	8	increasing	increase	VERB
bibechana-4897	139	9	current	current	ADJ
bibechana-4897	139	10	passing	pass	VERB
bibechana-4897	139	11	through	through	ADP
bibechana-4897	139	12	the	the	DET
bibechana-4897	139	13	cells	cell	NOUN
bibechana-4897	139	14	.	.	PUNCT
bibechana-4897	140	1	the	the	DET
bibechana-4897	140	2	color	color	NOUN
bibechana-4897	140	3	of	of	ADP
bibechana-4897	140	4	the	the	DET
bibechana-4897	140	5	emission	emission	NOUN
bibechana-4897	140	6	was	be	AUX
bibechana-4897	140	7	the	the	DET
bibechana-4897	140	8	same	same	ADJ
bibechana-4897	140	9	as	as	ADP
bibechana-4897	140	10	the	the	DET
bibechana-4897	140	11	pl	pl	PROPN
bibechana-4897	140	12	color	color	NOUN
bibechana-4897	140	13	of	of	ADP
bibechana-4897	140	14	the	the	DET
bibechana-4897	140	15	sample	sample	NOUN
bibechana-4897	140	16	.	.	PUNCT
bibechana-4897	141	1	however	however	ADV
bibechana-4897	141	2	,	,	PUNCT
bibechana-4897	141	3	due	due	ADP
bibechana-4897	141	4	to	to	ADP
bibechana-4897	141	5	electrochemical	electrochemical	ADJ
bibechana-4897	141	6	reaction	reaction	NOUN
bibechana-4897	141	7	between	between	ADP
bibechana-4897	141	8	the	the	DET
bibechana-4897	141	9	electrolyte	electrolyte	NOUN
bibechana-4897	141	10	and	and	CCONJ
bibechana-4897	141	11	psi	psi	NOUN
bibechana-4897	141	12	layer	layer	NOUN
bibechana-4897	141	13	(	(	PUNCT
bibechana-4897	141	14	which	which	PRON
bibechana-4897	141	15	dissolves	dissolve	VERB
bibechana-4897	141	16	psi	psi	NOUN
bibechana-4897	141	17	)	)	PUNCT
bibechana-4897	141	18	,	,	PUNCT
bibechana-4897	141	19	the	the	DET
bibechana-4897	141	20	lifetime	lifetime	NOUN
bibechana-4897	141	21	of	of	ADP
bibechana-4897	141	22	these	these	DET
bibechana-4897	141	23	cells	cell	NOUN
bibechana-4897	141	24	was	be	AUX
bibechana-4897	141	25	limited	limit	VERB
bibechana-4897	141	26	to	to	ADP
bibechana-4897	141	27	a	a	DET
bibechana-4897	141	28	few	few	ADJ
bibechana-4897	141	29	minutes	minute	NOUN
bibechana-4897	141	30	;	;	PUNCT
bibechana-4897	141	31	after	after	ADP
bibechana-4897	141	32	which	which	PRON
bibechana-4897	141	33	,	,	PUNCT
bibechana-4897	141	34	the	the	DET
bibechana-4897	141	35	el	el	PROPN
bibechana-4897	141	36	emission	emission	PROPN
bibechana-4897	141	37	sharply	sharply	ADV
bibechana-4897	141	38	reduced	reduce	VERB
bibechana-4897	141	39	to	to	ADP
bibechana-4897	141	40	zero	zero	NUM
bibechana-4897	141	41	.	.	PUNCT
bibechana-4897	142	1	4	4	X
bibechana-4897	142	2	.	.	X
bibechana-4897	142	3	conclusion	conclusion	NOUN
bibechana-4897	142	4	porous	porous	ADJ
bibechana-4897	142	5	silicon	silicon	NOUN
bibechana-4897	142	6	is	be	AUX
bibechana-4897	142	7	fast	fast	ADV
bibechana-4897	142	8	becoming	become	VERB
bibechana-4897	142	9	an	an	DET
bibechana-4897	142	10	important	important	ADJ
bibechana-4897	142	11	research	research	NOUN
bibechana-4897	142	12	subject	subject	NOUN
bibechana-4897	142	13	.	.	PUNCT
bibechana-4897	143	1	this	this	PRON
bibechana-4897	143	2	is	be	AUX
bibechana-4897	143	3	not	not	PART
bibechana-4897	143	4	only	only	ADV
bibechana-4897	143	5	due	due	ADJ
bibechana-4897	143	6	to	to	ADP
bibechana-4897	143	7	its	its	PRON
bibechana-4897	143	8	potential	potential	ADJ
bibechana-4897	143	9	applications	application	NOUN
bibechana-4897	143	10	in	in	ADP
bibechana-4897	143	11	optoelectronic	optoelectronic	ADJ
bibechana-4897	143	12	devices	device	NOUN
bibechana-4897	143	13	and	and	CCONJ
bibechana-4897	143	14	integrated	integrated	ADJ
bibechana-4897	143	15	optics	optic	NOUN
bibechana-4897	143	16	circuits	circuit	NOUN
bibechana-4897	143	17	,	,	PUNCT
bibechana-4897	143	18	but	but	CCONJ
bibechana-4897	143	19	also	also	ADV
bibechana-4897	143	20	because	because	SCONJ
bibechana-4897	143	21	of	of	ADP
bibechana-4897	143	22	its	its	PRON
bibechana-4897	143	23	significance	significance	NOUN
bibechana-4897	143	24	from	from	ADP
bibechana-4897	143	25	the	the	DET
bibechana-4897	143	26	basic	basic	ADJ
bibechana-4897	143	27	solid	solid	ADJ
bibechana-4897	143	28	state	state	NOUN
bibechana-4897	143	29	science	science	NOUN
bibechana-4897	143	30	point	point	NOUN
bibechana-4897	143	31	of	of	ADP
bibechana-4897	143	32	view	view	NOUN
bibechana-4897	143	33	.	.	PUNCT
bibechana-4897	144	1	in	in	ADP
bibechana-4897	144	2	this	this	DET
bibechana-4897	144	3	article	article	NOUN
bibechana-4897	144	4	,	,	PUNCT
bibechana-4897	144	5	we	we	PRON
bibechana-4897	144	6	report	report	VERB
bibechana-4897	144	7	:	:	PUNCT
bibechana-4897	144	8	(	(	PUNCT
bibechana-4897	144	9	1	1	X
bibechana-4897	144	10	)	)	PUNCT
bibechana-4897	144	11	by	by	ADP
bibechana-4897	144	12	shining	shine	VERB
bibechana-4897	144	13	intense	intense	ADJ
bibechana-4897	144	14	light	light	NOUN
bibechana-4897	144	15	on	on	ADP
bibechana-4897	144	16	the	the	DET
bibechana-4897	144	17	sample	sample	NOUN
bibechana-4897	144	18	during	during	ADP
bibechana-4897	144	19	the	the	DET
bibechana-4897	144	20	psi	psi	NOUN
bibechana-4897	144	21	preparation	preparation	NOUN
bibechana-4897	144	22	process	process	NOUN
bibechana-4897	144	23	,	,	PUNCT
bibechana-4897	144	24	it	it	PRON
bibechana-4897	144	25	is	be	AUX
bibechana-4897	144	26	possible	possible	ADJ
bibechana-4897	144	27	to	to	PART
bibechana-4897	144	28	form	form	VERB
bibechana-4897	144	29	psi	psi	ADJ
bibechana-4897	144	30	layer	layer	NOUN
bibechana-4897	144	31	on	on	ADP
bibechana-4897	144	32	n	n	CCONJ
bibechana-4897	144	33	-	-	PUNCT
bibechana-4897	144	34	type	type	NOUN
bibechana-4897	144	35	silicon	silicon	NOUN
bibechana-4897	144	36	substrates	substrate	NOUN
bibechana-4897	144	37	as	as	ADV
bibechana-4897	144	38	well	well	ADV
bibechana-4897	144	39	;	;	PUNCT
bibechana-4897	144	40	(	(	PUNCT
bibechana-4897	144	41	2	2	X
bibechana-4897	144	42	)	)	PUNCT
bibechana-4897	144	43	features	feature	NOUN
bibechana-4897	144	44	of	of	ADP
bibechana-4897	144	45	an	an	DET
bibechana-4897	144	46	efficient	efficient	ADJ
bibechana-4897	144	47	electrochemical	electrochemical	ADJ
bibechana-4897	144	48	cell	cell	NOUN
bibechana-4897	144	49	for	for	ADP
bibechana-4897	144	50	preparation	preparation	NOUN
bibechana-4897	144	51	of	of	ADP
bibechana-4897	144	52	psi	psi	NOUN
bibechana-4897	144	53	samples	sample	NOUN
bibechana-4897	144	54	,	,	PUNCT
bibechana-4897	144	55	which	which	PRON
bibechana-4897	144	56	is	be	AUX
bibechana-4897	144	57	simple	simple	ADJ
bibechana-4897	144	58	to	to	PART
bibechana-4897	144	59	make	make	VERB
bibechana-4897	144	60	,	,	PUNCT
bibechana-4897	144	61	but	but	CCONJ
bibechana-4897	144	62	has	have	VERB
bibechana-4897	144	63	various	various	ADJ
bibechana-4897	144	64	useful	useful	ADJ
bibechana-4897	144	65	capabilities	capability	NOUN
bibechana-4897	144	66	;	;	PUNCT
bibechana-4897	144	67	(	(	PUNCT
bibechana-4897	144	68	3	3	X
bibechana-4897	144	69	)	)	PUNCT
bibechana-4897	144	70	obtaining	obtain	VERB
bibechana-4897	144	71	pl	pl	X
bibechana-4897	144	72	and	and	CCONJ
bibechana-4897	144	73	el	el	PROPN
bibechana-4897	144	74	emissions	emission	NOUN
bibechana-4897	144	75	ranging	range	VERB
bibechana-4897	144	76	from	from	ADP
bibechana-4897	144	77	dark	dark	ADJ
bibechana-4897	144	78	red	red	NOUN
bibechana-4897	144	79	to	to	ADP
bibechana-4897	144	80	light	light	VERB
bibechana-4897	144	81	blue	blue	ADJ
bibechana-4897	144	82	from	from	ADP
bibechana-4897	144	83	psi	psi	NOUN
bibechana-4897	144	84	samples	sample	NOUN
bibechana-4897	144	85	is	be	AUX
bibechana-4897	144	86	possible	possible	ADJ
bibechana-4897	144	87	by	by	ADP
bibechana-4897	144	88	just	just	ADV
bibechana-4897	144	89	changing	change	VERB
bibechana-4897	144	90	the	the	DET
bibechana-4897	144	91	preparation	preparation	NOUN
bibechana-4897	144	92	parameters	parameter	NOUN
bibechana-4897	144	93	during	during	ADP
bibechana-4897	144	94	psi	psi	ADJ
bibechana-4897	144	95	formation	formation	NOUN
bibechana-4897	144	96	process	process	NOUN
bibechana-4897	144	97	(	(	PUNCT
bibechana-4897	144	98	with	with	ADP
bibechana-4897	144	99	no	no	DET
bibechana-4897	144	100	need	need	NOUN
bibechana-4897	144	101	for	for	ADP
bibechana-4897	144	102	post	post	ADJ
bibechana-4897	144	103	-	-	ADJ
bibechana-4897	144	104	deposition	deposition	ADJ
bibechana-4897	144	105	heat	heat	NOUN
bibechana-4897	144	106	-	-	PUNCT
bibechana-4897	144	107	treatment	treatment	NOUN
bibechana-4897	144	108	of	of	ADP
bibechana-4897	144	109	samples	sample	NOUN
bibechana-4897	144	110	in	in	ADP
bibechana-4897	144	111	boiling	boiling	NOUN
bibechana-4897	144	112	water	water	NOUN
bibechana-4897	144	113	)	)	PUNCT
bibechana-4897	144	114	.	.	PUNCT
bibechana-4897	145	1	furthermore	furthermore	ADV
bibechana-4897	145	2	,	,	PUNCT
bibechana-4897	145	3	preparation	preparation	NOUN
bibechana-4897	145	4	and	and	CCONJ
bibechana-4897	145	5	characterization	characterization	NOUN
bibechana-4897	145	6	results	result	NOUN
bibechana-4897	145	7	for	for	ADP
bibechana-4897	145	8	various	various	ADJ
bibechana-4897	145	9	psi	psi	NOUN
bibechana-4897	145	10	samples	sample	NOUN
bibechana-4897	145	11	are	be	AUX
bibechana-4897	145	12	discussed	discuss	VERB
bibechana-4897	145	13	.	.	PUNCT
bibechana-4897	146	1	e.	e.	PROPN
bibechana-4897	146	2	haji	haji	PROPN
bibechana-4897	146	3	-	-	PUNCT
bibechana-4897	146	4	ali	ali	PROPN
bibechana-4897	146	5	/	/	SYM
bibechana-4897	146	6	bibechana	bibechana	PROPN
bibechana-4897	146	7	8	8	NUM
bibechana-4897	146	8	(	(	PUNCT
bibechana-4897	146	9	2012	2012	NUM
bibechana-4897	146	10	)	)	PUNCT
bibechana-4897	146	11	46	46	NUM
bibechana-4897	146	12	-	-	SYM
bibechana-4897	146	13	52	52	NUM
bibechana-4897	146	14	:	:	PUNCT
bibechana-4897	146	15	bmhss	bmhss	PROPN
bibechana-4897	146	16	,	,	PUNCT
bibechana-4897	146	17	p.52	p.52	PROPN
bibechana-4897	146	18	acknowledgement	acknowledgement	NOUN
bibechana-4897	146	19	the	the	DET
bibechana-4897	146	20	author	author	NOUN
bibechana-4897	146	21	would	would	AUX
bibechana-4897	146	22	like	like	VERB
bibechana-4897	146	23	to	to	PART
bibechana-4897	146	24	thank	thank	VERB
bibechana-4897	146	25	dr	dr	PROPN
bibechana-4897	146	26	.	.	PROPN
bibechana-4897	146	27	mahdi	mahdi	PROPN
bibechana-4897	146	28	eshghi	eshghi	PROPN
bibechana-4897	146	29	for	for	ADP
bibechana-4897	146	30	the	the	DET
bibechana-4897	146	31	positive	positive	ADJ
bibechana-4897	146	32	suggestions	suggestion	NOUN
bibechana-4897	146	33	which	which	PRON
bibechana-4897	146	34	helped	help	VERB
bibechana-4897	146	35	to	to	PART
bibechana-4897	146	36	improve	improve	VERB
bibechana-4897	146	37	the	the	DET
bibechana-4897	146	38	present	present	ADJ
bibechana-4897	146	39	work	work	NOUN
bibechana-4897	146	40	.	.	PUNCT
bibechana-4897	147	1	references	reference	NOUN
bibechana-4897	147	2	[	[	X
bibechana-4897	147	3	1	1	NUM
bibechana-4897	147	4	]	]	PUNCT
bibechana-4897	147	5	l.	l.	PROPN
bibechana-4897	147	6	t.	t.	PROPN
bibechana-4897	147	7	canham	canham	PROPN
bibechana-4897	147	8	,	,	PUNCT
bibechana-4897	147	9	appl	appl	PROPN
bibechana-4897	147	10	.	.	PUNCT
bibechana-4897	148	1	phys	phy	NOUN
bibechana-4897	148	2	.	.	PUNCT
bibechana-4897	149	1	lett	lett	PROPN
bibechana-4897	149	2	.	.	PUNCT
bibechana-4897	150	1	57(10	57(10	NUM
bibechana-4897	150	2	)	)	PUNCT
bibechana-4897	150	3	,	,	PUNCT
bibechana-4897	150	4	(	(	PUNCT
bibechana-4897	150	5	1990	1990	NUM
bibechana-4897	150	6	)	)	PUNCT
bibechana-4897	150	7	1046	1046	NUM
bibechana-4897	150	8	.	.	PUNCT
bibechana-4897	151	1	[	[	X
bibechana-4897	151	2	2	2	NUM
bibechana-4897	151	3	]	]	PUNCT
bibechana-4897	151	4	x.	x.	NOUN
bibechana-4897	151	5	wang	wang	PROPN
bibechana-4897	151	6	,	,	PUNCT
bibechana-4897	151	7	modern	modern	ADJ
bibechana-4897	151	8	phys	phy	NOUN
bibechana-4897	151	9	.	.	PUNCT
bibechana-4897	152	1	lett	lett	PROPN
bibechana-4897	152	2	.	.	PUNCT
bibechana-4897	153	1	b	b	X
bibechana-4897	153	2	8	8	NUM
bibechana-4897	153	3	(	(	PUNCT
bibechana-4897	153	4	2	2	NUM
bibechana-4897	153	5	)	)	PUNCT
bibechana-4897	153	6	,	,	PUNCT
bibechana-4897	153	7	69	69	NUM
bibechana-4897	153	8	(	(	PUNCT
bibechana-4897	153	9	1994	1994	NUM
bibechana-4897	153	10	)	)	PUNCT
bibechana-4897	153	11	1597	1597	NUM
bibechana-4897	154	1	[	[	X
bibechana-4897	154	2	3	3	X
bibechana-4897	154	3	]	]	X
bibechana-4897	154	4	l.	l.	PROPN
bibechana-4897	154	5	t.	t.	PROPN
bibechana-4897	154	6	canham	canham	PROPN
bibechana-4897	154	7	,	,	PUNCT
bibechana-4897	154	8	phys	phy	NOUN
bibechana-4897	154	9	.	.	PUNCT
bibechana-4897	155	1	world	world	NOUN
bibechana-4897	155	2	,	,	PUNCT
bibechana-4897	155	3	41(march	41(march	NUM
bibechana-4897	155	4	1992	1992	NUM
bibechana-4897	155	5	)	)	PUNCT
bibechana-4897	155	6	1540	1540	NUM
bibechana-4897	155	7	.	.	PUNCT
bibechana-4897	156	1	[	[	X
bibechana-4897	156	2	4	4	NUM
bibechana-4897	156	3	]	]	PUNCT
bibechana-4897	156	4	r.	r.	PROPN
bibechana-4897	156	5	l.	l.	PROPN
bibechana-4897	156	6	smith	smith	PROPN
bibechana-4897	156	7	and	and	CCONJ
bibechana-4897	156	8	s.	s.	PROPN
bibechana-4897	156	9	d.	d.	PROPN
bibechana-4897	156	10	collins	collins	PROPN
bibechana-4897	156	11	,	,	PUNCT
bibechana-4897	156	12	j.	j.	PROPN
bibechana-4897	156	13	appl	appl	PROPN
bibechana-4897	156	14	.	.	PUNCT
bibechana-4897	157	1	phys	phy	NOUN
bibechana-4897	157	2	.	.	PUNCT
bibechana-4897	158	1	71	71	NUM
bibechana-4897	158	2	(	(	PUNCT
bibechana-4897	158	3	8)	8)	NUM
bibechana-4897	158	4	,	,	PUNCT
bibechana-4897	158	5	r1	r1	PROPN
bibechana-4897	158	6	(	(	PUNCT
bibechana-4897	158	7	1992	1992	NUM
bibechana-4897	158	8	)	)	PUNCT
bibechana-4897	158	9	.	.	PUNCT
bibechana-4897	159	1	[	[	X
bibechana-4897	159	2	5	5	X
bibechana-4897	159	3	]	]	PUNCT
bibechana-4897	159	4	s.	s.	PROPN
bibechana-4897	159	5	shih	shih	PROPN
bibechana-4897	159	6	,	,	PUNCT
bibechana-4897	159	7	et	et	PROPN
bibechana-4897	159	8	al	al	PROPN
bibechana-4897	159	9	.	.	PROPN
bibechana-4897	159	10	,	,	PUNCT
bibechana-4897	159	11	mat	mat	PROPN
bibechana-4897	159	12	.	.	PUNCT
bibechana-4897	159	13	res	res	PROPN
bibechana-4897	159	14	.	.	PUNCT
bibechana-4897	159	15	soc	soc	PROPN
bibechana-4897	159	16	.	.	PUNCT
bibechana-4897	160	1	symp	symp	PROPN
bibechana-4897	160	2	.	.	PUNCT
bibechana-4897	161	1	proc	proc	PROPN
bibechana-4897	161	2	.	.	PUNCT
bibechana-4897	162	1	256	256	NUM
bibechana-4897	162	2	,	,	PUNCT
bibechana-4897	162	3	27	27	NUM
bibechana-4897	162	4	(	(	PUNCT
bibechana-4897	162	5	1992	1992	NUM
bibechana-4897	162	6	)	)	PUNCT
bibechana-4897	162	7	197	197	NUM
bibechana-4897	162	8	.	.	PUNCT
bibechana-4897	163	1	[	[	X
bibechana-4897	163	2	6	6	NUM
bibechana-4897	163	3	]	]	PUNCT
bibechana-4897	163	4	t.	t.	PROPN
bibechana-4897	163	5	asano	asano	PROPN
bibechana-4897	163	6	,	,	PUNCT
bibechana-4897	163	7	et	et	PROPN
bibechana-4897	163	8	al	al	PROPN
bibechana-4897	163	9	.	.	PROPN
bibechana-4897	163	10	,	,	PUNCT
bibechana-4897	163	11	jpn	jpn	PROPN
bibechana-4897	163	12	.	.	PUNCT
bibechana-4897	164	1	j.	j.	PROPN
bibechana-4897	164	2	appl	appl	PROPN
bibechana-4897	164	3	.	.	PUNCT
bibechana-4897	165	1	phys	phy	NOUN
bibechana-4897	165	2	.	.	PUNCT
bibechana-4897	166	1	31	31	NUM
bibechana-4897	166	2	,	,	PUNCT
bibechana-4897	166	3	l373	l373	PROPN
bibechana-4897	166	4	(	(	PUNCT
bibechana-4897	166	5	1992	1992	NUM
bibechana-4897	166	6	)	)	PUNCT
bibechana-4897	166	7	865	865	NUM
bibechana-4897	166	8	.	.	PUNCT
bibechana-4897	167	1	[	[	X
bibechana-4897	167	2	7	7	X
bibechana-4897	167	3	]	]	X
bibechana-4897	167	4	h.	h.	PROPN
bibechana-4897	167	5	unno	unno	PROPN
bibechana-4897	167	6	,	,	PUNCT
bibechana-4897	167	7	k.	k.	PROPN
bibechana-4897	167	8	imai	imai	PROPN
bibechana-4897	167	9	,	,	PUNCT
bibechana-4897	167	10	&	&	CCONJ
bibechana-4897	167	11	s.	s.	PROPN
bibechana-4897	167	12	muramoto	muramoto	PROPN
bibechana-4897	167	13	,	,	PUNCT
bibechana-4897	167	14	j.	j.	PROPN
bibechana-4897	167	15	electrochem	electrochem	PROPN
bibechana-4897	167	16	.	.	PUNCT
bibechana-4897	168	1	soc	soc	PROPN
bibechana-4897	168	2	.	.	PUNCT
bibechana-4897	169	1	s.	s.	PROPN
bibechana-4897	169	2	s.	s.	PROPN
bibechana-4897	169	3	&	&	CCONJ
bibechana-4897	169	4	t	t	PROPN
bibechana-4897	169	5	134	134	NUM
bibechana-4897	169	6	(	(	PUNCT
bibechana-4897	169	7	3	3	NUM
bibechana-4897	169	8	)	)	PUNCT
bibechana-4897	169	9	,	,	PUNCT
bibechana-4897	169	10	645(1987	645(1987	NUM
bibechana-4897	169	11	)	)	PUNCT
bibechana-4897	169	12	645	645	NUM
bibechana-4897	169	13	648	648	NUM
bibechana-4897	169	14	.	.	PUNCT
bibechana-4897	170	1	[	[	X
bibechana-4897	170	2	8	8	X
bibechana-4897	170	3	]	]	X
bibechana-4897	170	4	j.	j.	PROPN
bibechana-4897	170	5	t.	t.	PROPN
bibechana-4897	170	6	lue	lue	PROPN
bibechana-4897	170	7	,	,	PUNCT
bibechana-4897	170	8	et	et	PROPN
bibechana-4897	170	9	al	al	PROPN
bibechana-4897	170	10	.	.	PROPN
bibechana-4897	170	11	,	,	PUNCT
bibechana-4897	170	12	solid	solid	ADJ
bibechana-4897	170	13	state	state	NOUN
bibechana-4897	170	14	commun	commun	PROPN
bibechana-4897	170	15	.	.	PUNCT
bibechana-4897	171	1	86(9	86(9	NUM
bibechana-4897	171	2	)	)	PUNCT
bibechana-4897	171	3	,	,	PUNCT
bibechana-4897	171	4	(	(	PUNCT
bibechana-4897	171	5	1993	1993	NUM
bibechana-4897	171	6	)	)	PUNCT
bibechana-4897	171	7	593	593	NUM
bibechana-4897	171	8	.	.	PUNCT
bibechana-4897	172	1	[	[	X
bibechana-4897	172	2	9	9	NUM
bibechana-4897	172	3	]	]	PUNCT
bibechana-4897	172	4	s.	s.	PROPN
bibechana-4897	172	5	f.	f.	PROPN
bibechana-4897	172	6	chung	chung	PROPN
bibechana-4897	172	7	,	,	PUNCT
bibechana-4897	172	8	s.	s.	PROPN
bibechana-4897	172	9	d.	d.	PROPN
bibechana-4897	172	10	collins	collins	PROPN
bibechana-4897	172	11	,	,	PUNCT
bibechana-4897	172	12	&	&	CCONJ
bibechana-4897	172	13	r.	r.	PROPN
bibechana-4897	172	14	l.	l.	PROPN
bibechana-4897	172	15	smith	smith	PROPN
bibechana-4897	172	16	,	,	PUNCT
bibechana-4897	172	17	appl	appl	PROPN
bibechana-4897	172	18	.	.	PUNCT
bibechana-4897	173	1	phys	phy	NOUN
bibechana-4897	173	2	.	.	PUNCT
bibechana-4897	174	1	lett	lett	PROPN
bibechana-4897	174	2	.	.	PUNCT
bibechana-4897	175	1	55(7	55(7	NUM
bibechana-4897	175	2	)	)	PUNCT
bibechana-4897	175	3	,	,	PUNCT
bibechana-4897	175	4	(	(	PUNCT
bibechana-4897	175	5	1989	1989	NUM
bibechana-4897	175	6	)	)	PUNCT
bibechana-4897	175	7	675	675	NUM
bibechana-4897	175	8	.	.	PUNCT
bibechana-4897	176	1	[	[	X
bibechana-4897	176	2	10	10	NUM
bibechana-4897	176	3	]	]	X
bibechana-4897	176	4	o.	o.	NOUN
bibechana-4897	176	5	teschke	teschke	PROPN
bibechana-4897	176	6	,	,	PUNCT
bibechana-4897	176	7	m.	m.	NOUN
bibechana-4897	176	8	c.	c.	PROPN
bibechana-4897	176	9	goncalves	goncalves	PROPN
bibechana-4897	176	10	,	,	PUNCT
bibechana-4897	176	11	&	&	CCONJ
bibechana-4897	176	12	f.	f.	PROPN
bibechana-4897	176	13	galembeck	galembeck	PROPN
bibechana-4897	176	14	,	,	PUNCT
bibechana-4897	176	15	appl	appl	PROPN
bibechana-4897	176	16	.	.	PUNCT
bibechana-4897	177	1	phys	phy	NOUN
bibechana-4897	177	2	.	.	PUNCT
bibechana-4897	178	1	lett	lett	PROPN
bibechana-4897	178	2	.	.	PUNCT
bibechana-4897	179	1	63(10	63(10	NUM
bibechana-4897	179	2	)	)	PUNCT
bibechana-4897	179	3	,	,	PUNCT
bibechana-4897	179	4	(	(	PUNCT
bibechana-4897	179	5	1993	1993	NUM
bibechana-4897	179	6	)	)	PUNCT
bibechana-4897	179	7	1348	1348	NUM
bibechana-4897	179	8	.	.	PUNCT