Microsoft Word - 5-dokic-ed.doc ETASR - Engineering, Technology & Applied Science Research Vol. 3, �o. 6, 2013, 552-561 552 www.etasr.com Dokic: A Review on Energy Efficient CMOS Digital Logic A Review on Energy Efficient CMOS Digital Logic Branko L. Dokić University of Banja Luka Faculty of Electrical Engineering Patre 5, 78000 Banja Luka Bosnia and Herzegovina bdokic@etfbl.net Abstract— Autonomy of power supply used in portable devices directly depends on energy efficiency of digital logic. This means that digital systems, beside high processing power and very complex functionality, must also have very low power consumption. Power consumption depends on many factors: system architecture, technology, basic cells topology-speed, and accuracy of assigned tasks. In this paper, a review and comparison of CMOS topologies techniques and operating modes is given, as CMOS technology is expected to be the optimum choice in the near future. It is shown that there is a full analogy in the behavior of digital circuits in sub-threshold and strong inversion. Therefore, synthesis of digital circuits is the same for both strong and weak operating modes. Analysis of the influence of the technology, MOS transistor threshold voltage (Vt) and power supply voltage (Vdd) on digital circuit power consumption and speed for both operating modes is given. It is shown that optimal power consumption (minimum power consumption for given speed) depends on optimal choice of threshold, and power supply voltage. Multi Vdd /Vt techniques are analyzed as well. A review and analysis of alternative logical circuit's topologies – pass logic (PL), complementary pass logic (CPL), push-pull pass logic (PPL) and adiabatic logic – is also given. As shown, adiabatic logic is the optimum choice regarding energy efficiency. Keywords: topology; technology; power consumption; logic delay; CMOS; strong and weak inversion; static and dynamic characteristics; pass logic; adiabatic logic; PL; CPL; PPL; ECRL I. INTRODUCTION Designers of digital circuits are confronted with two often conflicting demands: how to achieve higher operating speeds and lower energy consumption. Usually, the same circuit family could not satisfy both demands at the same time, i.e. high-speed circuits have high level of consumption and vice versa. That’s how series of integrated circuits called low-power circuits or high-speed circuits were created. Optimally designed digital system includes a variety of different series of the same integrated circuits' family. Today, as the whole digital system is manufactured as a single integrated circuit, the designing problem is reduced to the choice of a design that can ensure maximum energy efficiency. That implies the design with minimum power consumption inside the specified frequency range or maximum operating speed for a given energy consumption level. The usage of low-power sources of power supply, which collect their primary energy from the environment, has increased lately. Thus, the art of design of low power circuits is brought down to the selection of optimal (intelligent) solutions that will reduce the speed of information processing as much as possible, without violating certain system characteristics. Such an optimal project implies the decomposition of the system architecture, good choice of the circuit topology that will provide the optimal synthesis of different functions in the defined architecture, and good choice of the circuit design technology. This requires the designer to be familiar with components, circuits and systems. Consumption of each system is determined using the following five guidelines of each project: given task, technology, circuit topology, operating speed and accuracy. Since these five guidelines can be placed on the fingers of one hand, they are known as “low-power hand” [1]. Therefore, optimization of energy consumption is a multidimensional problem that requires taking into consideration the level of consumption at each stage of the VLSI integrated circuit design. The biggest savings of electrical energy consumption (10 to 20 times), with least waste of time (at the level of a minute) is done in the early stages of designing, in which the project is presented as a set of abstract communication tasks [2]. The application of optimization techniques and consumption provides an estimation at each project stage, leading to optimal consumption project [3]. At lower levels of the design (transistor, deployment and connectivity), possible energy savings are significantly lower (10 to 20%), and time estimation can last for days, because the project is presented with all detail. Thus, it is necessary to process a very large amount of data [3]. CMOS digital circuits’ technology based on silicon will most likely be dominant for the next twenty years or more [4, 5, 6], with standard low power consumption, technology for reducing the transistor size to a scale of about ten nanometers and operating speed in the GHz domain. During the last ten years, more attention from researchers as well as manufacturer of integrated circuits is paid to digital CMOS circuits operating in the sub-threshold (weak inversion) regime. Supply voltage in this regime is lower than the threshold voltage Vt of MOS transistors (VddVt, where Vt is a MOS transistor’s threshold voltage, transistor is operating in strong inversion regime, and for Vgs / 0 0 1 , 3 , non-saturated area , 3 , saturated area, 1 gs t t ds t gs t t V V n V ds t Dsub V V n ds t I e e V I I e V where ( )µ ϕ= − 20 0 1ox t W I C n L (2) is a drain current on a border between weak and strong inversion. Fig. 1. log Id characteristic as a function of Vgs at a constant Vds and Vsb The meaning of the parameters in (1) and (2) are the following: µ0 is a mobility of major charge carriers (electrons and holes in nMOS to pMOS transistor), Cox = εox / tox is gate capacitance (εox is a dielectric constant, tox is a thickness of the gate oxide), W and L are the width and length of the channel, respectively, φt=kT/q is a thermal potential (φt=26 mV at T=300K), where n=1+Cd /Cox≈1.5 is a gradient factor. For Vds>3φt, drain current is almost independent of the voltage Vds (Figure 2), so that the area analogous to strong inversion regime, can be treated as saturated area. In this area it holds ~ gs V d I e . For Vds<3φt, at Vgs=const., ds V d eI ~ , transistor is in the non-saturated area. Thanks to the analogy in the field of MOS transistor characteristics, there is an appropriate analogy of operation and CMOS logic circuit characteristics [8]. Thus, for example, voltage and current static characteristics in the weak inversion regime (Figure 3) have the same shape as in the strong inversion regime. Even inverter threshold voltage VTsub is ETASR - Engineering, Technology & Applied Science Research Vol. 3, �o. 6, 2013, 552-561 554 www.etasr.com Dokic: A Review on Energy Efficient CMOS Digital Logic obtained in the same way – equating of nMOS and pMOS drain currents in the saturated area of characteristics. Fig. 2. Id(Vgs, Vds) in weak inversion regime It results with inverter threshold voltage VTsub in the sub- threshold regime [8]: ϕ    = −     ln , 2 2 ddsub t on Tsub op V n I V I (3) and maximal current from the voltage source: ϕ − = /2 , ddsub t t V V nop ddMsub on on I I I e I (4) where ϕ < < = =3 t ddsub t tn tp V V V V (5) is a supply voltage, Vtn and Vtp threshold voltages, and Ion and Iop currents on the border between weak and strong inversion of nMOS and pMOS transistors, respectively. For a symmetric inverter (Ion=Iop), threshold voltage is, just like in strong inversion regime, VTsub=Vddsub/2. Minimal supply voltage, according to [7] is Vddmin=3φt=78 mV. For Vddsub>3φt , the Id(Vgs, Vds) characteristic has both saturated and non-saturated areas, which is necessary for satisfying the quality of digital circuit transfer characteristic Vo(Vi). However, logic circuits can operate even at Vdd<3φt. Thus, for example, some authors [9] state constraints Vdd>57 mV, while others [10] claim that Vdd>48 mV. As in strong inversion regime, threshold voltage VTsub and maximal current IddMsub in the sub-threshold regime both depend on nMOS and pMOS transistor geometry (Figure 3), except that IddMsub~(Wn/Wp) -1/2 and VTsub ~ln(Wn /Wp), where Wn and Wp are the channel widths of nMOS and pMOS transistors, respectively. vin1 50mV 100mV 150mV 200mV 250mV ID(Mn) 0A 50pA 100pA 150pA SEL>> V(2) 0V 100mV 200mV 300mV Fig. 3. (a) PSPICE voltage and (b) current transfer characteristic of CMOS inverter in the sub-threshold regime, for channel width ratios Wp /Wn={1, 8/3, 5, 9} at equal channel length (Ln=Lp) and Vddsub = 300 mV Considering the behavior analogy and CMOS inverter characteristics in the weak and strong inversion regime, there is an analogy even at synthesis of more complex circuits. In both regimes, more complex digital circuits consist of dual nMOS and pMOS transistor networks (Figure 4). Duality implies that a serial connection of nMOS transistors is corresponding to a parallel connection of pMOS transistors and vice versa. Fig. 4. Topology of the circuit with logical function +ab c consisted of dual networks: +ab c (nMOS) and +( )a b c (pMOS) In both regimes, logic circuit transfer characteristic depends on the number of inputs and number of active inputs [8]. Figure 5a shows the transfer characteristics of NOR3 logic circuit with all inputs activated, and when the activated input is the one applied to the gate of a pMOS transistor whose source is connected on a power-supply line Vdd . 1 5 9 8/3 9 8/3 5 1 a) b) VTsub IddMsub ETASR - Engineering, Technology & Applied Science Research Vol. 3, �o. 6, 2013, 552-561 555 www.etasr.com Dokic: A Review on Energy Efficient CMOS Digital Logic 0.05 0.1 0.15 0.2 0.25 0 0.05 0.1 0.15 0.2 0.25 0.3 Vin [V] V o u t [V ] 0.05 0.1 0.15 0.2 0.25 0 0.05 0.1 0.15 0.2 0.25 0.3 Vin [V] V o u t [V ] Fig. 5. PSPICE transfer characteristics of (a) NOR3 and (b) NAND2 circuits in the weak inversion regime, with all inputs activated, and when the activated input is the one applied on the gate of a serial transistor whose source connected on power supply line. In NAND circuits, the highest threshold voltage is obtained when all inputs are active, and the lowest when the active input is only the one applied to the gate of nMOS transistors, whose source is connected to the ground (Figure 5b). Optimal transistor geometry of m-input NAND and NOR circuits is the same in both regimes and is defined as follows [12]: µ µ µ µ = = / / / 1 . / pn n p p n pn n p p n W L m W L W L W L m (6) III. CMOS CIRCUIT POWER CONSUMPTION Electric power consumption consists of two components: static and dynamic D DS DD P P P= + . (7) Static consumption is a result of existing MOS transistor currents in static states and is defined as: , DS S dd P I V= (8) where IS represents the static current in total. There are four main sources of static current in CMOS circuits: • Tunneling current through the gate (Ig), • Sub-threshold drain current (Idsub), • Inverse polarized p-n junction current (IDSS), • Hot charge carrier injection gate current (IH). The first three components have dominant influence on CMOS circuit static consumption level. Scaling of the dimensions of MOS transistors decreases oxide thickness below the gate (tox). Therefore, the electric field through gate oxide increases, which leads to the tunneling effect of charge carriers from gate to substrate or from substrate to gate. The gate current has four components: gate-channel (Igc), gate-drain (Igd), gate-source (Igs) and gate-base (Igb) (Fig. 6). The total gate current is: . g gd gb gs gc I I I I I= + + + (9) VDD Igd Igb Igc Igs +VDD Vo=0 +VDD Vo=VDD IsgIbg Icg Idg Fig. 6. Gate leakage currents of (a) nMOS and (b) pMOS transistor Gate currents depend on supply voltage Vdd and on the employed technology (Table I) [11]. Thus, for example, when increasing the supply voltage level from Vdd=0.2 V to Vdd=1.2 V, the gate current increases from Ig ≈1.2 nA to Ig≈1.7 µA. The increase ratio is approximately 1.4·10 3 times. When reducing the transistor dimensions, gate current increases as well. For nMOS transistor, according to Table I, that increase for 45 nm in regard to 65 nm CMOS technology, depending on Vdd, is approximately 7 (at Vdd=1.2 V) to 14 (at Vdd=0.2 V) times. TABLE I. NMOS TRANSISTOR GATE CURRENT AS A FUNCTION OF SUPPLY VOLTAGE FOR TWO DIFFERENT TECHNOLOGIES Ig Vdd [V] 45 nm tech. 65 nm tech. 0.2 1.1996 nA 85.506 pA 0.4 14.258 nA 1.2376 pA 0.6 66.954 nA 6.5488 nA 0.8 225.97 nA 25.244 nA 1.0 647.38 nA 82.378 nA 1.2 1.6811 µA 243.21 nA The nMOS transistor leakage current is greater than in pMOS, because the probability of holes tunneling is greater than the probability of electrons tunneling through the gate oxide. That increase, depending on supply voltage is 40 times [11]. The sub-threshold leakage current is a cutoff transistor (Vgs=0) drain to source current (Figure 7) and it is given as: NIm: NILIm: a) b) V i V i V i “1” V i ETASR - Engineering, Technology & Applied Science Research Vol. 3, �o. 6, 2013, 552-561 556 www.etasr.com Dokic: A Review on Energy Efficient CMOS Digital Logic dd t t V V n ddsub o I I e η ϕ − = (10) where η is the DIBL (Drain–Induced Barrier Lowering) factor [9]. This current values depend on the supply voltage, the dimensions of elements (technology) and the temperature. In Table II, comparative values of gate current and sub-threshold drain current as a function of supply voltage Vdd and temperature are given, for 45 nm technology. It is evident that the dependency of Ig on Vdd and in function of temperature dependency of Idsub is more expressed. On the other hand, at temperature of 25°C it holds Vdd ≤ 0.6 V, Ig0.6 V, Ig >Idsub. Thus, for example, for Vdd =1.2 V holds that Ig≈13Idsub. VDD +VDD 0 +VDD VDD Idnsub Idpsub Fig. 7. Sub-threshold currents of (a) nMOS and (b) pMOS transistors in CMOS inverter TABLE II. GATE AND SUB-THRESHOLD DRAIN CURRENT OF NMOS TRANSISTOR AS A FUNCTION OF VDD AND TEMPERATURE Gate current Ig [nA] Sub-threshold current Idsub [µA] Vdd [V] 25°C 110°C 25°C 110°C 0.2 1.1996 1.2689 40.999 0.88086 0.4 14.258 15.776 56.437 1.1586 0.6 66.954 75.437 72.47 1.4401 0.8 225.97 256.33 89.397 1.7334 1.0 647.38 736.31 107.42 2.0428 1.2 1681.1 1914.3 127.12 2.3785 Inverse saturation current Idss of the p-n junction of a turned off transistor depends on the p-n junction surface and temperature. For 0.25 µm technology, it is between 10 and 100 pA/µm 2 at a 25°C temperature per area unit. In nanometer technologies, this current is less than Ig and Idsub, and can be ignored. Dynamic consumption consists of two components: switching consumption and transition (short-circuits) consumption. Switching consumption is the result of charging and discharging of a load capacitor and in both regimes is defined as: = = 2 , d ddsub L dd P P C V f (11) where CL is the effective output parasite capacitance, and f is the switching state frequency of the CMOS logic circuit. Transition consumption occurs due to conduction of both transistors or transistor networks (nMOS or pMOS) during switching states (transition area) (Figure 3). In strong inversion regime, transition consumption is defined with [12] and is: ( )( )= − +1 2 , 3 dp ddM DD t r f P I V V t t f (12) where ( ) µ µ µ − =    +     2 2 2 2 / 1 / DD tox n ddM n n n n n p p p V VC W I L W L W L (13) is the maximal voltage supply current in transition area, and tr and tf are the rise time and fall time input signals. In sub-threshold regime, dissipation power of transition is defined with [8] : ( )ϕ= +2 ,dpsub t ddMsub r fP n I t t f (14) where IddMsub is defined with (4), and f is an input signal frequency. Usually, dynamic dissipation power is calculated (estimated) in regard to clock frequency. Namely, most number of logic circuits does not change their state during every cycle of clock signal. Therefore, expressions for dynamic consumption have to be multiplied with activity factor α≤1, regarding to clock frequency, so that: ( )( ) ( ) α α α α ϕ = + − + = + + 2 2 , 3 2 . ddM dd c L dd c dd t r f ddsub c L ddsub c t ddMsub r f I P f C V f V V t t P f C V f n I t t (15) Product αfc, where fc is the clock frequency, is the activity of the circuit indicating the number of state changes. Mostly, activity factor is α<0.5. It is determined empirically that static CMOS digital circuits have α ≈ 0.1 [13]. IV. LOW POWER DESIGN TECHNIQUES Optimal project implies a compromise between operating speed and low power, which all design levels take into account [2]. In this section, we will speak about the optimal project considering the choice of transistor threshold voltage Vt and system power supply voltage Vdd. In the previous paragraph, it was shown that both static and dynamic consumptions are decreased with the reduce of Vdd. Dynamic switching consumption in both regimes is proportional to Vdd 2 . Transition consumption in the strong inversion regime is Pdp~(Vdd - Vt) 3 , and in sub-threshold regime /2 ~ dd t V V dpsub P e − . Static currents, depends on supply voltage as well (Tables I and II), so that PS ~Vdd n , where n is usually in the range of 1