id	author	title	date	pages	extension	mime	words	sentence	flesch	summary	cache	txt
eurjchem-1569	Saeed, Sohail; Khan, Nasir; Butcher, Ray; Rashid, Naghmana	Nanostructured thin film of iron tin oxide by aerosol assisted chemical vapour deposition using a new ferrocene containing heterobimetallic complex as single-source precursor	2017	5	.pdf	application/pdf	3463	233	64	ARTICLE INFORMATION ABSTRACT DOI: 10.5155/eurjchem.8.3.224-228.1569 Received: 19 March 2017 Received in revised form: 22 June 2017 Accepted: 26 June 2017 Published online: 30 September 2017 Printed: 30 September 2017   Aerosol assisted chemical vapour deposition (CVD) is a sophisticated, unique and modern technique which is used to deposit coatings, films, and other related structures from thermally unstable or the involatile precursors at laboratory and large scale productions. The AFM image of the thin film shows the growth of closely packed crystallites onto a glass substrate with an average roughness of 4.39 nm. (a) (b) Region Rp‐v, nm Rms rough (Rq), nm Ave rough (Ra), nm Mean Ht, nm Median Ht, nm 1 298.8 13.50 4.393 41.81 40.99 Figure 6. (a) AFM image in 3D view of film deposited at 425 °C; (b) Histogram of thin film deposited at 425 °C showing average roughness and RMS roughness morphology.	cache/eurjchem-1569.pdf	txt/eurjchem-1569.txt