id	sid	tid	token	lemma	pos
fumecheng-10949	1	1	10949	10949	NUM
fumecheng-10949	1	2	facta	facta	PROPN
fumecheng-10949	1	3	universitatis	universitatis	PROPN
fumecheng-10949	1	4	series	series	NOUN
fumecheng-10949	1	5	:	:	PUNCT
fumecheng-10949	1	6	mechanical	mechanical	ADJ
fumecheng-10949	1	7	engineering	engineering	NOUN
fumecheng-10949	1	8	vol	vol	NOUN
fumecheng-10949	1	9	.	.	PROPN
fumecheng-10949	1	10	20	20	NUM
fumecheng-10949	1	11	,	,	PUNCT
fumecheng-10949	1	12	no	no	DET
fumecheng-10949	1	13	3	3	NUM
fumecheng-10949	1	14	,	,	PUNCT
fumecheng-10949	1	15	2022	2022	NUM
fumecheng-10949	1	16	,	,	PUNCT
fumecheng-10949	1	17	pp	pp	ADJ
fumecheng-10949	1	18	.	.	PUNCT
fumecheng-10949	2	1	553	553	NUM
fumecheng-10949	2	2	560	560	NUM
fumecheng-10949	2	3	https://doi.org/10.22190/fume220730040h	https://doi.org/10.22190/fume220730040h	NOUN
fumecheng-10949	2	4	©	©	ADP
fumecheng-10949	2	5	2022	2022	NUM
fumecheng-10949	2	6	by	by	ADP
fumecheng-10949	2	7	university	university	PROPN
fumecheng-10949	2	8	of	of	ADP
fumecheng-10949	2	9	niš	niš	PROPN
fumecheng-10949	2	10	,	,	PUNCT
fumecheng-10949	2	11	serbia	serbia	PROPN
fumecheng-10949	2	12	|	|	ADV
fumecheng-10949	2	13	creative	creative	ADJ
fumecheng-10949	2	14	commons	common	NOUN
fumecheng-10949	2	15	license	license	NOUN
fumecheng-10949	2	16	:	:	PUNCT
fumecheng-10949	2	17	cc	cc	VERB
fumecheng-10949	2	18	by	by	ADP
fumecheng-10949	2	19	-	-	PUNCT
fumecheng-10949	2	20	nc	nc	VERB
fumecheng-10949	2	21	-	-	PUNCT
fumecheng-10949	2	22	nd	nd	ADV
fumecheng-10949	2	23	original	original	ADJ
fumecheng-10949	2	24	scientific	scientific	ADJ
fumecheng-10949	2	25	paper	paper	NOUN
fumecheng-10949	2	26	bending	bend	VERB
fumecheng-10949	2	27	fatigue	fatigue	NOUN
fumecheng-10949	2	28	behavior	behavior	NOUN
fumecheng-10949	2	29	of	of	ADP
fumecheng-10949	2	30	ag	ag	PROPN
fumecheng-10949	2	31	nanowire	nanowire	PROPN
fumecheng-10949	2	32	/	/	SYM
fumecheng-10949	2	33	cu	cu	PROPN
fumecheng-10949	2	34	thin	thin	ADJ
fumecheng-10949	2	35	-	-	PUNCT
fumecheng-10949	2	36	film	film	NOUN
fumecheng-10949	2	37	hybrid	hybrid	ADJ
fumecheng-10949	2	38	interconnects	interconnect	NOUN
fumecheng-10949	2	39	for	for	ADP
fumecheng-10949	2	40	wearable	wearable	ADJ
fumecheng-10949	2	41	electronics	electronic	NOUN
fumecheng-10949	2	42	byungil	byungil	NOUN
fumecheng-10949	2	43	hwang1	hwang1	PROPN
fumecheng-10949	2	44	,	,	PUNCT
fumecheng-10949	2	45	yurim	yurim	PROPN
fumecheng-10949	2	46	han1	han1	PROPN
fumecheng-10949	2	47	,	,	PUNCT
fumecheng-10949	2	48	paolo	paolo	PROPN
fumecheng-10949	2	49	matteini2	matteini2	PROPN
fumecheng-10949	3	1	1school	1school	CCONJ
fumecheng-10949	3	2	of	of	ADP
fumecheng-10949	3	3	integrative	integrative	ADJ
fumecheng-10949	3	4	engineering	engineering	NOUN
fumecheng-10949	3	5	,	,	PUNCT
fumecheng-10949	3	6	chung	chung	PROPN
fumecheng-10949	3	7	-	-	PUNCT
fumecheng-10949	3	8	ang	ang	PROPN
fumecheng-10949	3	9	university	university	PROPN
fumecheng-10949	3	10	,	,	PUNCT
fumecheng-10949	3	11	republic	republic	NOUN
fumecheng-10949	3	12	of	of	ADP
fumecheng-10949	3	13	korea	korea	PROPN
fumecheng-10949	3	14	2institute	2institute	NUM
fumecheng-10949	3	15	of	of	ADP
fumecheng-10949	3	16	applied	applied	ADJ
fumecheng-10949	3	17	physics	physics	NOUN
fumecheng-10949	3	18	“	"	PUNCT
fumecheng-10949	3	19	nello	nello	PROPN
fumecheng-10949	3	20	carrara	carrara	PROPN
fumecheng-10949	3	21	”	"	PUNCT
fumecheng-10949	3	22	,	,	PUNCT
fumecheng-10949	3	23	national	national	PROPN
fumecheng-10949	3	24	research	research	PROPN
fumecheng-10949	3	25	council	council	PROPN
fumecheng-10949	3	26	,	,	PUNCT
fumecheng-10949	3	27	italy	italy	PROPN
fumecheng-10949	3	28	abstract	abstract	NOUN
fumecheng-10949	3	29	.	.	PUNCT
fumecheng-10949	4	1	enhancing	enhance	VERB
fumecheng-10949	4	2	the	the	DET
fumecheng-10949	4	3	mechanical	mechanical	ADJ
fumecheng-10949	4	4	reliability	reliability	NOUN
fumecheng-10949	4	5	of	of	ADP
fumecheng-10949	4	6	metal	metal	NOUN
fumecheng-10949	4	7	interconnects	interconnect	NOUN
fumecheng-10949	4	8	is	be	AUX
fumecheng-10949	4	9	important	important	ADJ
fumecheng-10949	4	10	for	for	ADP
fumecheng-10949	4	11	achieving	achieve	VERB
fumecheng-10949	4	12	highly	highly	ADV
fumecheng-10949	4	13	reliable	reliable	ADJ
fumecheng-10949	4	14	flexible	flexible	ADJ
fumecheng-10949	4	15	/	/	SYM
fumecheng-10949	4	16	wearable	wearable	ADJ
fumecheng-10949	4	17	electronic	electronic	ADJ
fumecheng-10949	4	18	devices	device	NOUN
fumecheng-10949	4	19	.	.	PUNCT
fumecheng-10949	5	1	in	in	ADP
fumecheng-10949	5	2	this	this	DET
fumecheng-10949	5	3	study	study	NOUN
fumecheng-10949	5	4	,	,	PUNCT
fumecheng-10949	5	5	ag	ag	PROPN
fumecheng-10949	5	6	nanowire	nanowire	NOUN
fumecheng-10949	5	7	and	and	CCONJ
fumecheng-10949	5	8	cu	cu	NOUN
fumecheng-10949	5	9	thin	thin	ADJ
fumecheng-10949	5	10	-	-	PUNCT
fumecheng-10949	5	11	film	film	NOUN
fumecheng-10949	5	12	hybrid	hybrid	ADJ
fumecheng-10949	5	13	interconnects	interconnect	NOUN
fumecheng-10949	5	14	were	be	AUX
fumecheng-10949	5	15	explored	explore	VERB
fumecheng-10949	5	16	as	as	ADP
fumecheng-10949	5	17	a	a	DET
fumecheng-10949	5	18	novel	novel	ADJ
fumecheng-10949	5	19	concept	concept	NOUN
fumecheng-10949	5	20	to	to	PART
fumecheng-10949	5	21	enhance	enhance	VERB
fumecheng-10949	5	22	mechanical	mechanical	ADJ
fumecheng-10949	5	23	reliability	reliability	NOUN
fumecheng-10949	5	24	under	under	ADP
fumecheng-10949	5	25	bending	bend	VERB
fumecheng-10949	5	26	fatigue	fatigue	NOUN
fumecheng-10949	5	27	.	.	PUNCT
fumecheng-10949	6	1	bending	bend	VERB
fumecheng-10949	6	2	fatigue	fatigue	NOUN
fumecheng-10949	6	3	tests	test	NOUN
fumecheng-10949	6	4	were	be	AUX
fumecheng-10949	6	5	conducted	conduct	VERB
fumecheng-10949	6	6	on	on	ADP
fumecheng-10949	6	7	the	the	DET
fumecheng-10949	6	8	cu	cu	PROPN
fumecheng-10949	6	9	thin	thin	ADJ
fumecheng-10949	6	10	films	film	NOUN
fumecheng-10949	6	11	and	and	CCONJ
fumecheng-10949	6	12	cu	cu	PROPN
fumecheng-10949	6	13	/	/	SYM
fumecheng-10949	6	14	ag	ag	PROPN
fumecheng-10949	6	15	nanowire	nanowire	NOUN
fumecheng-10949	6	16	/	/	SYM
fumecheng-10949	6	17	polyimide	polyimide	NOUN
fumecheng-10949	6	18	(	(	PUNCT
fumecheng-10949	6	19	cap	cap	NOUN
fumecheng-10949	6	20	)	)	PUNCT
fumecheng-10949	6	21	interconnects	interconnect	NOUN
fumecheng-10949	6	22	.	.	PUNCT
fumecheng-10949	7	1	the	the	DET
fumecheng-10949	7	2	increase	increase	NOUN
fumecheng-10949	7	3	in	in	ADP
fumecheng-10949	7	4	resistance	resistance	NOUN
fumecheng-10949	7	5	was	be	AUX
fumecheng-10949	7	6	larger	large	ADJ
fumecheng-10949	7	7	for	for	ADP
fumecheng-10949	7	8	the	the	DET
fumecheng-10949	7	9	cu	cu	PROPN
fumecheng-10949	7	10	thin	thin	ADJ
fumecheng-10949	7	11	films	film	NOUN
fumecheng-10949	7	12	than	than	ADP
fumecheng-10949	7	13	for	for	ADP
fumecheng-10949	7	14	the	the	DET
fumecheng-10949	7	15	cap	cap	NOUN
fumecheng-10949	7	16	.	.	PUNCT
fumecheng-10949	8	1	the	the	DET
fumecheng-10949	8	2	single	single	ADJ
fumecheng-10949	8	3	-	-	PUNCT
fumecheng-10949	8	4	component	component	NOUN
fumecheng-10949	8	5	cu	cu	NOUN
fumecheng-10949	8	6	electrodes	electrode	NOUN
fumecheng-10949	8	7	showed	show	VERB
fumecheng-10949	8	8	multiple	multiple	ADJ
fumecheng-10949	8	9	crack	crack	NOUN
fumecheng-10949	8	10	initiation	initiation	NOUN
fumecheng-10949	8	11	and	and	CCONJ
fumecheng-10949	8	12	propagation	propagation	NOUN
fumecheng-10949	8	13	due	due	ADP
fumecheng-10949	8	14	to	to	ADP
fumecheng-10949	8	15	bending	bend	VERB
fumecheng-10949	8	16	strain	strain	NOUN
fumecheng-10949	8	17	,	,	PUNCT
fumecheng-10949	8	18	which	which	PRON
fumecheng-10949	8	19	degraded	degrade	VERB
fumecheng-10949	8	20	the	the	DET
fumecheng-10949	8	21	electrical	electrical	ADJ
fumecheng-10949	8	22	conductivity	conductivity	NOUN
fumecheng-10949	8	23	.	.	PUNCT
fumecheng-10949	9	1	in	in	ADP
fumecheng-10949	9	2	cap	cap	NOUN
fumecheng-10949	9	3	,	,	PUNCT
fumecheng-10949	9	4	however	however	ADV
fumecheng-10949	9	5	,	,	PUNCT
fumecheng-10949	9	6	no	no	DET
fumecheng-10949	9	7	long	long	ADJ
fumecheng-10949	9	8	-	-	PUNCT
fumecheng-10949	9	9	range	range	NOUN
fumecheng-10949	9	10	cracks	crack	NOUN
fumecheng-10949	9	11	were	be	AUX
fumecheng-10949	9	12	observed	observe	VERB
fumecheng-10949	9	13	,	,	PUNCT
fumecheng-10949	9	14	even	even	ADV
fumecheng-10949	9	15	after	after	ADP
fumecheng-10949	9	16	300,000	300,000	NUM
fumecheng-10949	9	17	cycles	cycle	NOUN
fumecheng-10949	9	18	of	of	ADP
fumecheng-10949	9	19	bending	bend	VERB
fumecheng-10949	9	20	,	,	PUNCT
fumecheng-10949	9	21	although	although	SCONJ
fumecheng-10949	9	22	a	a	DET
fumecheng-10949	9	23	wavy	wavy	ADJ
fumecheng-10949	9	24	structure	structure	NOUN
fumecheng-10949	9	25	was	be	AUX
fumecheng-10949	9	26	observed	observe	VERB
fumecheng-10949	9	27	,	,	PUNCT
fumecheng-10949	9	28	probably	probably	ADV
fumecheng-10949	9	29	due	due	ADP
fumecheng-10949	9	30	to	to	ADP
fumecheng-10949	9	31	the	the	DET
fumecheng-10949	9	32	delamination	delamination	NOUN
fumecheng-10949	9	33	of	of	ADP
fumecheng-10949	9	34	the	the	DET
fumecheng-10949	9	35	ag	ag	PROPN
fumecheng-10949	9	36	nanowires	nanowire	NOUN
fumecheng-10949	9	37	under	under	ADP
fumecheng-10949	9	38	repeated	repeat	VERB
fumecheng-10949	9	39	bending	bending	NOUN
fumecheng-10949	9	40	.	.	PUNCT
fumecheng-10949	10	1	our	our	PRON
fumecheng-10949	10	2	study	study	NOUN
fumecheng-10949	10	3	confirms	confirm	VERB
fumecheng-10949	10	4	that	that	SCONJ
fumecheng-10949	10	5	flexible	flexible	ADJ
fumecheng-10949	10	6	ag	ag	PROPN
fumecheng-10949	10	7	nanowire	nanowire	NOUN
fumecheng-10949	10	8	and	and	CCONJ
fumecheng-10949	10	9	metal	metal	NOUN
fumecheng-10949	10	10	thin	thin	ADJ
fumecheng-10949	10	11	-	-	PUNCT
fumecheng-10949	10	12	film	film	NOUN
fumecheng-10949	10	13	hybrids	hybrid	NOUN
fumecheng-10949	10	14	can	can	AUX
fumecheng-10949	10	15	enhance	enhance	VERB
fumecheng-10949	10	16	the	the	DET
fumecheng-10949	10	17	mechanical	mechanical	ADJ
fumecheng-10949	10	18	reliability	reliability	NOUN
fumecheng-10949	10	19	of	of	ADP
fumecheng-10949	10	20	metal	metal	NOUN
fumecheng-10949	10	21	thin	thin	ADJ
fumecheng-10949	10	22	-	-	PUNCT
fumecheng-10949	10	23	film	film	NOUN
fumecheng-10949	10	24	interconnects	interconnect	NOUN
fumecheng-10949	10	25	under	under	ADP
fumecheng-10949	10	26	bending	bend	VERB
fumecheng-10949	10	27	fatigue	fatigue	NOUN
fumecheng-10949	10	28	.	.	PUNCT
fumecheng-10949	11	1	key	key	ADJ
fumecheng-10949	11	2	words	word	NOUN
fumecheng-10949	11	3	:	:	PUNCT
fumecheng-10949	11	4	thin	thin	ADJ
fumecheng-10949	11	5	film	film	NOUN
fumecheng-10949	11	6	,	,	PUNCT
fumecheng-10949	11	7	stability	stability	NOUN
fumecheng-10949	11	8	,	,	PUNCT
fumecheng-10949	11	9	bending	bending	NOUN
fumecheng-10949	11	10	,	,	PUNCT
fumecheng-10949	11	11	ag	ag	PROPN
fumecheng-10949	11	12	nanowire	nanowire	NOUN
fumecheng-10949	11	13	,	,	PUNCT
fumecheng-10949	11	14	flexibility	flexibility	NOUN
fumecheng-10949	11	15	1	1	NUM
fumecheng-10949	11	16	.	.	PUNCT
fumecheng-10949	11	17	introduction	introduction	NOUN
fumecheng-10949	11	18	with	with	ADP
fumecheng-10949	11	19	the	the	DET
fumecheng-10949	11	20	progress	progress	NOUN
fumecheng-10949	11	21	in	in	ADP
fumecheng-10949	11	22	the	the	DET
fumecheng-10949	11	23	field	field	NOUN
fumecheng-10949	11	24	of	of	ADP
fumecheng-10949	11	25	flexible	flexible	ADJ
fumecheng-10949	11	26	/	/	SYM
fumecheng-10949	11	27	wearable	wearable	ADJ
fumecheng-10949	11	28	electronics	electronic	NOUN
fumecheng-10949	11	29	,	,	PUNCT
fumecheng-10949	11	30	there	there	PRON
fumecheng-10949	11	31	are	be	VERB
fumecheng-10949	11	32	increasing	increase	VERB
fumecheng-10949	11	33	demands	demand	NOUN
fumecheng-10949	11	34	for	for	ADP
fumecheng-10949	11	35	flexible	flexible	ADJ
fumecheng-10949	11	36	interconnects	interconnect	NOUN
fumecheng-10949	11	37	that	that	PRON
fumecheng-10949	11	38	are	be	AUX
fumecheng-10949	11	39	reliable	reliable	ADJ
fumecheng-10949	11	40	under	under	ADP
fumecheng-10949	11	41	repeated	repeat	VERB
fumecheng-10949	11	42	bending	bend	VERB
fumecheng-10949	11	43	deformation	deformation	NOUN
fumecheng-10949	11	44	[	[	X
fumecheng-10949	11	45	17	17	NUM
fumecheng-10949	11	46	]	]	PUNCT
fumecheng-10949	11	47	.	.	PUNCT
fumecheng-10949	12	1	metal	metal	NOUN
fumecheng-10949	12	2	thin	thin	ADJ
fumecheng-10949	12	3	films	film	NOUN
fumecheng-10949	12	4	are	be	AUX
fumecheng-10949	12	5	the	the	DET
fumecheng-10949	12	6	most	most	ADV
fumecheng-10949	12	7	commonly	commonly	ADV
fumecheng-10949	12	8	used	use	VERB
fumecheng-10949	12	9	materials	material	NOUN
fumecheng-10949	12	10	for	for	ADP
fumecheng-10949	12	11	flexible	flexible	ADJ
fumecheng-10949	12	12	interconnects	interconnect	NOUN
fumecheng-10949	12	13	due	due	ADP
fumecheng-10949	12	14	to	to	ADP
fumecheng-10949	12	15	their	their	PRON
fumecheng-10949	12	16	high	high	ADJ
fumecheng-10949	12	17	electrical	electrical	ADJ
fumecheng-10949	12	18	conductivity	conductivity	NOUN
fumecheng-10949	12	19	and	and	CCONJ
fumecheng-10949	12	20	compliant	compliant	ADJ
fumecheng-10949	12	21	nature	nature	NOUN
fumecheng-10949	12	22	[	[	X
fumecheng-10949	12	23	8	8	NUM
fumecheng-10949	12	24	,	,	PUNCT
fumecheng-10949	12	25	9	9	NUM
fumecheng-10949	12	26	]	]	PUNCT
fumecheng-10949	12	27	.	.	PUNCT
fumecheng-10949	13	1	metal	metal	NOUN
fumecheng-10949	13	2	electrodes	electrode	NOUN
fumecheng-10949	13	3	can	can	AUX
fumecheng-10949	13	4	work	work	VERB
fumecheng-10949	13	5	as	as	ADP
fumecheng-10949	13	6	flexible	flexible	ADJ
fumecheng-10949	13	7	electrodes	electrode	NOUN
fumecheng-10949	13	8	for	for	ADP
fumecheng-10949	13	9	devices	device	NOUN
fumecheng-10949	13	10	that	that	PRON
fumecheng-10949	13	11	undergo	undergo	VERB
fumecheng-10949	13	12	strain	strain	NOUN
fumecheng-10949	13	13	under	under	ADP
fumecheng-10949	13	14	the	the	DET
fumecheng-10949	13	15	elastic	elastic	ADJ
fumecheng-10949	13	16	limit	limit	NOUN
fumecheng-10949	13	17	.	.	PUNCT
fumecheng-10949	14	1	however	however	ADV
fumecheng-10949	14	2	,	,	PUNCT
fumecheng-10949	14	3	actual	actual	ADJ
fumecheng-10949	14	4	electronic	electronic	ADJ
fumecheng-10949	14	5	devices	device	NOUN
fumecheng-10949	14	6	can	can	AUX
fumecheng-10949	14	7	undergo	undergo	VERB
fumecheng-10949	14	8	more	more	ADJ
fumecheng-10949	14	9	than	than	ADP
fumecheng-10949	14	10	300,000	300,000	NUM
fumecheng-10949	14	11	cycles	cycle	NOUN
fumecheng-10949	14	12	of	of	ADP
fumecheng-10949	14	13	bending	bend	VERB
fumecheng-10949	14	14	deformation	deformation	NOUN
fumecheng-10949	14	15	in	in	ADP
fumecheng-10949	14	16	their	their	PRON
fumecheng-10949	14	17	lifetime	lifetime	NOUN
fumecheng-10949	14	18	of	of	ADP
fumecheng-10949	14	19	operation	operation	NOUN
fumecheng-10949	14	20	[	[	X
fumecheng-10949	14	21	10	10	NUM
fumecheng-10949	14	22	]	]	PUNCT
fumecheng-10949	14	23	.	.	PUNCT
fumecheng-10949	15	1	this	this	PRON
fumecheng-10949	15	2	causes	cause	VERB
fumecheng-10949	15	3	fatigue	fatigue	NOUN
fumecheng-10949	15	4	damage	damage	NOUN
fumecheng-10949	15	5	on	on	ADP
fumecheng-10949	15	6	the	the	DET
fumecheng-10949	15	7	metal	metal	NOUN
fumecheng-10949	15	8	thin	thin	ADJ
fumecheng-10949	15	9	film	film	NOUN
fumecheng-10949	15	10	even	even	ADV
fumecheng-10949	15	11	though	though	SCONJ
fumecheng-10949	15	12	the	the	DET
fumecheng-10949	15	13	strain	strain	NOUN
fumecheng-10949	15	14	is	be	AUX
fumecheng-10949	15	15	under	under	ADP
fumecheng-10949	15	16	the	the	DET
fumecheng-10949	15	17	elastic	elastic	ADJ
fumecheng-10949	15	18	limit	limit	NOUN
fumecheng-10949	15	19	.	.	PUNCT
fumecheng-10949	16	1	schwaiger	schwaig	ADJ
fumecheng-10949	16	2	et	et	PROPN
fumecheng-10949	16	3	al	al	PROPN
fumecheng-10949	16	4	.	.	PROPN
fumecheng-10949	16	5	reported	report	VERB
fumecheng-10949	16	6	that	that	SCONJ
fumecheng-10949	16	7	the	the	DET
fumecheng-10949	16	8	dislocation	dislocation	NOUN
fumecheng-10949	16	9	received	receive	VERB
fumecheng-10949	16	10	:	:	PUNCT
fumecheng-10949	16	11	july	july	PROPN
fumecheng-10949	16	12	30	30	NUM
fumecheng-10949	16	13	,	,	PUNCT
fumecheng-10949	16	14	2022	2022	NUM
fumecheng-10949	16	15	/	/	SYM
fumecheng-10949	16	16	accepted	accept	VERB
fumecheng-10949	16	17	september	september	PROPN
fumecheng-10949	16	18	28	28	NUM
fumecheng-10949	16	19	,	,	PUNCT
fumecheng-10949	16	20	2022	2022	NUM
fumecheng-10949	16	21	corresponding	correspond	VERB
fumecheng-10949	16	22	author	author	NOUN
fumecheng-10949	16	23	:	:	PUNCT
fumecheng-10949	16	24	byungil	byungil	PROPN
fumecheng-10949	16	25	hwang	hwang	PROPN
fumecheng-10949	16	26	school	school	PROPN
fumecheng-10949	16	27	of	of	ADP
fumecheng-10949	16	28	integrative	integrative	ADJ
fumecheng-10949	16	29	engineering	engineering	NOUN
fumecheng-10949	16	30	,	,	PUNCT
fumecheng-10949	16	31	chung	chung	PROPN
fumecheng-10949	16	32	-	-	PUNCT
fumecheng-10949	16	33	ang	ang	PROPN
fumecheng-10949	16	34	university	university	NOUN
fumecheng-10949	16	35	,	,	PUNCT
fumecheng-10949	16	36	84	84	NUM
fumecheng-10949	16	37	heukseok	heukseok	NOUN
fumecheng-10949	16	38	-	-	PUNCT
fumecheng-10949	16	39	ro	ro	NOUN
fumecheng-10949	16	40	,	,	PUNCT
fumecheng-10949	16	41	dongjak	dongjak	PROPN
fumecheng-10949	16	42	-	-	PUNCT
fumecheng-10949	16	43	gu	gu	NOUN
fumecheng-10949	16	44	,	,	PUNCT
fumecheng-10949	16	45	seoul	seoul	PROPN
fumecheng-10949	16	46	06974	06974	NUM
fumecheng-10949	16	47	,	,	PUNCT
fumecheng-10949	16	48	republic	republic	NOUN
fumecheng-10949	16	49	of	of	ADP
fumecheng-10949	16	50	korea	korea	PROPN
fumecheng-10949	16	51	e	e	PROPN
fumecheng-10949	16	52	-	-	NOUN
fumecheng-10949	16	53	mail	mail	NOUN
fumecheng-10949	16	54	:	:	PUNCT
fumecheng-10949	17	1	bihwang@cau.ac.kr	bihwang@cau.ac.kr	PROPN
fumecheng-10949	17	2	554	554	NUM
fumecheng-10949	17	3	b.	b.	PROPN
fumecheng-10949	17	4	hwang	hwang	PROPN
fumecheng-10949	17	5	,	,	PUNCT
fumecheng-10949	17	6	y.	y.	PROPN
fumecheng-10949	17	7	han	han	PROPN
fumecheng-10949	17	8	,	,	PUNCT
fumecheng-10949	17	9	p.	p.	NOUN
fumecheng-10949	17	10	matteini	matteini	NOUN
fumecheng-10949	17	11	accumulation	accumulation	NOUN
fumecheng-10949	17	12	at	at	ADP
fumecheng-10949	17	13	the	the	DET
fumecheng-10949	17	14	interface	interface	NOUN
fumecheng-10949	17	15	between	between	ADP
fumecheng-10949	17	16	a	a	DET
fumecheng-10949	17	17	metal	metal	NOUN
fumecheng-10949	17	18	thin	thin	ADJ
fumecheng-10949	17	19	film	film	NOUN
fumecheng-10949	17	20	and	and	CCONJ
fumecheng-10949	17	21	polymer	polymer	NOUN
fumecheng-10949	17	22	substrate	substrate	NOUN
fumecheng-10949	17	23	occurs	occur	VERB
fumecheng-10949	17	24	under	under	ADP
fumecheng-10949	17	25	many	many	ADJ
fumecheng-10949	17	26	cycles	cycle	NOUN
fumecheng-10949	17	27	of	of	ADP
fumecheng-10949	17	28	bending	bending	NOUN
fumecheng-10949	17	29	,	,	PUNCT
fumecheng-10949	17	30	which	which	PRON
fumecheng-10949	17	31	leads	lead	VERB
fumecheng-10949	17	32	to	to	ADP
fumecheng-10949	17	33	the	the	DET
fumecheng-10949	17	34	formation	formation	NOUN
fumecheng-10949	17	35	of	of	ADP
fumecheng-10949	17	36	voids	voids	NOUN
fumecheng-10949	17	37	at	at	ADP
fumecheng-10949	17	38	the	the	DET
fumecheng-10949	17	39	interfaces	interface	NOUN
fumecheng-10949	17	40	[	[	X
fumecheng-10949	17	41	11	11	NUM
fumecheng-10949	17	42	,	,	PUNCT
fumecheng-10949	17	43	12	12	NUM
fumecheng-10949	17	44	]	]	PUNCT
fumecheng-10949	17	45	.	.	PUNCT
fumecheng-10949	18	1	with	with	ADP
fumecheng-10949	18	2	repeated	repeat	VERB
fumecheng-10949	18	3	bending	bending	NOUN
fumecheng-10949	18	4	,	,	PUNCT
fumecheng-10949	18	5	such	such	ADJ
fumecheng-10949	18	6	accumulated	accumulate	VERB
fumecheng-10949	18	7	voids	void	NOUN
fumecheng-10949	18	8	create	create	VERB
fumecheng-10949	18	9	protrusions	protrusion	NOUN
fumecheng-10949	18	10	at	at	ADP
fumecheng-10949	18	11	the	the	DET
fumecheng-10949	18	12	surface	surface	NOUN
fumecheng-10949	18	13	of	of	ADP
fumecheng-10949	18	14	the	the	DET
fumecheng-10949	18	15	metal	metal	NOUN
fumecheng-10949	18	16	thin	thin	ADJ
fumecheng-10949	18	17	film	film	NOUN
fumecheng-10949	18	18	,	,	PUNCT
fumecheng-10949	18	19	where	where	SCONJ
fumecheng-10949	18	20	the	the	DET
fumecheng-10949	18	21	imposed	impose	VERB
fumecheng-10949	18	22	stress	stress	NOUN
fumecheng-10949	18	23	is	be	AUX
fumecheng-10949	18	24	localized	localize	VERB
fumecheng-10949	18	25	,	,	PUNCT
fumecheng-10949	18	26	resulting	result	VERB
fumecheng-10949	18	27	in	in	ADP
fumecheng-10949	18	28	the	the	DET
fumecheng-10949	18	29	failure	failure	NOUN
fumecheng-10949	18	30	of	of	ADP
fumecheng-10949	18	31	the	the	DET
fumecheng-10949	18	32	electrodes	electrode	NOUN
fumecheng-10949	18	33	.	.	PUNCT
fumecheng-10949	19	1	the	the	DET
fumecheng-10949	19	2	cracks	crack	NOUN
fumecheng-10949	19	3	block	block	VERB
fumecheng-10949	19	4	the	the	DET
fumecheng-10949	19	5	electrical	electrical	ADJ
fumecheng-10949	19	6	current	current	ADJ
fumecheng-10949	19	7	flow	flow	NOUN
fumecheng-10949	19	8	,	,	PUNCT
fumecheng-10949	19	9	which	which	PRON
fumecheng-10949	19	10	can	can	AUX
fumecheng-10949	19	11	cause	cause	VERB
fumecheng-10949	19	12	malfunctioning	malfunctioning	NOUN
fumecheng-10949	19	13	of	of	ADP
fumecheng-10949	19	14	the	the	DET
fumecheng-10949	19	15	devices	device	NOUN
fumecheng-10949	19	16	using	use	VERB
fumecheng-10949	19	17	the	the	DET
fumecheng-10949	19	18	metal	metal	NOUN
fumecheng-10949	19	19	thin	thin	ADJ
fumecheng-10949	19	20	-	-	PUNCT
fumecheng-10949	19	21	film	film	NOUN
fumecheng-10949	19	22	electrodes	electrode	NOUN
fumecheng-10949	19	23	.	.	PUNCT
fumecheng-10949	20	1	to	to	PART
fumecheng-10949	20	2	enhance	enhance	VERB
fumecheng-10949	20	3	mechanical	mechanical	ADJ
fumecheng-10949	20	4	reliability	reliability	NOUN
fumecheng-10949	20	5	,	,	PUNCT
fumecheng-10949	20	6	several	several	ADJ
fumecheng-10949	20	7	alternatives	alternative	NOUN
fumecheng-10949	20	8	have	have	AUX
fumecheng-10949	20	9	been	be	AUX
fumecheng-10949	20	10	studied	study	VERB
fumecheng-10949	20	11	,	,	PUNCT
fumecheng-10949	20	12	including	include	VERB
fumecheng-10949	20	13	graphene	graphene	NOUN
fumecheng-10949	20	14	,	,	PUNCT
fumecheng-10949	20	15	carbon	carbon	NOUN
fumecheng-10949	20	16	nanotube	nanotube	NOUN
fumecheng-10949	20	17	,	,	PUNCT
fumecheng-10949	20	18	metal	metal	NOUN
fumecheng-10949	20	19	nanowire	nanowire	NOUN
fumecheng-10949	20	20	,	,	PUNCT
fumecheng-10949	20	21	metal	metal	NOUN
fumecheng-10949	20	22	/	/	SYM
fumecheng-10949	20	23	graphene	graphene	NOUN
fumecheng-10949	20	24	hybrid	hybrid	NOUN
fumecheng-10949	20	25	system	system	NOUN
fumecheng-10949	20	26	,	,	PUNCT
fumecheng-10949	20	27	or	or	CCONJ
fumecheng-10949	20	28	holey	holey	NOUN
fumecheng-10949	20	29	metal	metal	NOUN
fumecheng-10949	20	30	thin	thin	ADJ
fumecheng-10949	20	31	-	-	PUNCT
fumecheng-10949	20	32	film	film	NOUN
fumecheng-10949	20	33	electrodes	electrode	NOUN
fumecheng-10949	20	34	[	[	PUNCT
fumecheng-10949	20	35	9	9	NUM
fumecheng-10949	20	36	,	,	PUNCT
fumecheng-10949	20	37	13	13	NUM
fumecheng-10949	20	38	,	,	PUNCT
fumecheng-10949	20	39	14	14	NUM
fumecheng-10949	20	40	]	]	PUNCT
fumecheng-10949	20	41	.	.	PUNCT
fumecheng-10949	21	1	graphene	graphene	NOUN
fumecheng-10949	21	2	,	,	PUNCT
fumecheng-10949	21	3	carbon	carbon	NOUN
fumecheng-10949	21	4	nanotube	nanotube	NOUN
fumecheng-10949	21	5	,	,	PUNCT
fumecheng-10949	21	6	and	and	CCONJ
fumecheng-10949	21	7	metal	metal	NOUN
fumecheng-10949	21	8	nanowire	nanowire	NOUN
fumecheng-10949	21	9	are	be	AUX
fumecheng-10949	21	10	highly	highly	ADV
fumecheng-10949	21	11	flexible	flexible	ADJ
fumecheng-10949	21	12	and	and	CCONJ
fumecheng-10949	21	13	transparent	transparent	ADJ
fumecheng-10949	21	14	in	in	ADP
fumecheng-10949	21	15	the	the	DET
fumecheng-10949	21	16	visible	visible	ADJ
fumecheng-10949	21	17	range	range	NOUN
fumecheng-10949	21	18	,	,	PUNCT
fumecheng-10949	21	19	but	but	CCONJ
fumecheng-10949	21	20	their	their	PRON
fumecheng-10949	21	21	conductivity	conductivity	NOUN
fumecheng-10949	21	22	is	be	AUX
fumecheng-10949	21	23	insufficient	insufficient	ADJ
fumecheng-10949	21	24	for	for	ADP
fumecheng-10949	21	25	interconnects	interconnect	NOUN
fumecheng-10949	21	26	.	.	PUNCT
fumecheng-10949	22	1	metal	metal	NOUN
fumecheng-10949	22	2	-	-	PUNCT
fumecheng-10949	22	3	graphene	graphene	NOUN
fumecheng-10949	22	4	hybrid	hybrid	NOUN
fumecheng-10949	22	5	systems	system	NOUN
fumecheng-10949	22	6	have	have	AUX
fumecheng-10949	22	7	shown	show	VERB
fumecheng-10949	22	8	better	well	ADJ
fumecheng-10949	22	9	reliability	reliability	NOUN
fumecheng-10949	22	10	under	under	ADP
fumecheng-10949	22	11	repeated	repeat	VERB
fumecheng-10949	22	12	bending	bend	VERB
fumecheng-10949	22	13	deformation	deformation	NOUN
fumecheng-10949	22	14	,	,	PUNCT
fumecheng-10949	22	15	but	but	CCONJ
fumecheng-10949	22	16	the	the	DET
fumecheng-10949	22	17	scale	scale	NOUN
fumecheng-10949	22	18	-	-	PUNCT
fumecheng-10949	22	19	up	up	NOUN
fumecheng-10949	22	20	of	of	ADP
fumecheng-10949	22	21	the	the	DET
fumecheng-10949	22	22	electrode	electrode	NOUN
fumecheng-10949	22	23	is	be	AUX
fumecheng-10949	22	24	limited	limit	VERB
fumecheng-10949	22	25	due	due	ADP
fumecheng-10949	22	26	to	to	ADP
fumecheng-10949	22	27	the	the	DET
fumecheng-10949	22	28	size	size	NOUN
fumecheng-10949	22	29	of	of	ADP
fumecheng-10949	22	30	graphene	graphene	NOUN
fumecheng-10949	22	31	[	[	X
fumecheng-10949	22	32	15	15	NUM
fumecheng-10949	22	33	]	]	PUNCT
fumecheng-10949	22	34	.	.	PUNCT
fumecheng-10949	23	1	in	in	ADP
fumecheng-10949	23	2	addition	addition	NOUN
fumecheng-10949	23	3	,	,	PUNCT
fumecheng-10949	23	4	the	the	DET
fumecheng-10949	23	5	fabrication	fabrication	NOUN
fumecheng-10949	23	6	process	process	NOUN
fumecheng-10949	23	7	using	use	VERB
fumecheng-10949	23	8	multiple	multiple	ADJ
fumecheng-10949	23	9	transfers	transfer	NOUN
fumecheng-10949	23	10	is	be	AUX
fumecheng-10949	23	11	complex	complex	ADJ
fumecheng-10949	23	12	,	,	PUNCT
fumecheng-10949	23	13	which	which	PRON
fumecheng-10949	23	14	significantly	significantly	ADV
fumecheng-10949	23	15	increases	increase	VERB
fumecheng-10949	23	16	the	the	DET
fumecheng-10949	23	17	processing	processing	NOUN
fumecheng-10949	23	18	cost	cost	NOUN
fumecheng-10949	23	19	.	.	PUNCT
fumecheng-10949	24	1	the	the	DET
fumecheng-10949	24	2	mechanical	mechanical	ADJ
fumecheng-10949	24	3	reliability	reliability	NOUN
fumecheng-10949	24	4	of	of	ADP
fumecheng-10949	24	5	metal	metal	NOUN
fumecheng-10949	24	6	interconnects	interconnect	NOUN
fumecheng-10949	24	7	is	be	AUX
fumecheng-10949	24	8	enhanced	enhance	VERB
fumecheng-10949	24	9	by	by	ADP
fumecheng-10949	24	10	forming	form	VERB
fumecheng-10949	24	11	holes	hole	NOUN
fumecheng-10949	24	12	on	on	ADP
fumecheng-10949	24	13	the	the	DET
fumecheng-10949	24	14	metal	metal	NOUN
fumecheng-10949	24	15	thin	thin	ADJ
fumecheng-10949	24	16	films	film	NOUN
fumecheng-10949	24	17	[	[	X
fumecheng-10949	24	18	16	16	NUM
fumecheng-10949	24	19	]	]	PUNCT
fumecheng-10949	24	20	.	.	PUNCT
fumecheng-10949	25	1	crack	crack	VERB
fumecheng-10949	25	2	propagation	propagation	NOUN
fumecheng-10949	25	3	is	be	AUX
fumecheng-10949	25	4	blocked	block	VERB
fumecheng-10949	25	5	by	by	ADP
fumecheng-10949	25	6	the	the	DET
fumecheng-10949	25	7	holes	hole	NOUN
fumecheng-10949	25	8	,	,	PUNCT
fumecheng-10949	25	9	which	which	PRON
fumecheng-10949	25	10	reduces	reduce	VERB
fumecheng-10949	25	11	long	long	ADJ
fumecheng-10949	25	12	-	-	PUNCT
fumecheng-10949	25	13	range	range	NOUN
fumecheng-10949	25	14	crack	crack	NOUN
fumecheng-10949	25	15	densities	density	NOUN
fumecheng-10949	25	16	on	on	ADP
fumecheng-10949	25	17	metal	metal	NOUN
fumecheng-10949	25	18	thin	thin	ADJ
fumecheng-10949	25	19	films	film	NOUN
fumecheng-10949	25	20	during	during	ADP
fumecheng-10949	25	21	repeated	repeat	VERB
fumecheng-10949	25	22	deformations	deformation	NOUN
fumecheng-10949	25	23	.	.	PUNCT
fumecheng-10949	26	1	however	however	ADV
fumecheng-10949	26	2	,	,	PUNCT
fumecheng-10949	26	3	a	a	DET
fumecheng-10949	26	4	complex	complex	ADJ
fumecheng-10949	26	5	patterning	patterning	NOUN
fumecheng-10949	26	6	process	process	NOUN
fumecheng-10949	26	7	is	be	AUX
fumecheng-10949	26	8	required	require	VERB
fumecheng-10949	26	9	to	to	PART
fumecheng-10949	26	10	form	form	VERB
fumecheng-10949	26	11	the	the	DET
fumecheng-10949	26	12	holes	hole	NOUN
fumecheng-10949	26	13	,	,	PUNCT
fumecheng-10949	26	14	which	which	PRON
fumecheng-10949	26	15	increases	increase	VERB
fumecheng-10949	26	16	the	the	DET
fumecheng-10949	26	17	fabrication	fabrication	NOUN
fumecheng-10949	26	18	costs	cost	NOUN
fumecheng-10949	26	19	.	.	PUNCT
fumecheng-10949	27	1	to	to	PART
fumecheng-10949	27	2	overcome	overcome	VERB
fumecheng-10949	27	3	the	the	DET
fumecheng-10949	27	4	limitations	limitation	NOUN
fumecheng-10949	27	5	of	of	ADP
fumecheng-10949	27	6	the	the	DET
fumecheng-10949	27	7	previously	previously	ADV
fumecheng-10949	27	8	reported	report	VERB
fumecheng-10949	27	9	technologies	technology	NOUN
fumecheng-10949	27	10	,	,	PUNCT
fumecheng-10949	27	11	hybrid	hybrid	ADJ
fumecheng-10949	27	12	systems	system	NOUN
fumecheng-10949	27	13	of	of	ADP
fumecheng-10949	27	14	flexible	flexible	ADJ
fumecheng-10949	27	15	materials	material	NOUN
fumecheng-10949	27	16	and	and	CCONJ
fumecheng-10949	27	17	metal	metal	NOUN
fumecheng-10949	27	18	thin	thin	ADJ
fumecheng-10949	27	19	films	film	NOUN
fumecheng-10949	27	20	are	be	AUX
fumecheng-10949	27	21	a	a	DET
fumecheng-10949	27	22	promising	promising	ADJ
fumecheng-10949	27	23	option	option	NOUN
fumecheng-10949	27	24	.	.	PUNCT
fumecheng-10949	28	1	by	by	ADP
fumecheng-10949	28	2	integrating	integrate	VERB
fumecheng-10949	28	3	a	a	DET
fumecheng-10949	28	4	flexible	flexible	ADJ
fumecheng-10949	28	5	material	material	NOUN
fumecheng-10949	28	6	(	(	PUNCT
fumecheng-10949	28	7	which	which	PRON
fumecheng-10949	28	8	can	can	AUX
fumecheng-10949	28	9	be	be	AUX
fumecheng-10949	28	10	simply	simply	ADV
fumecheng-10949	28	11	formed	form	VERB
fumecheng-10949	28	12	on	on	ADP
fumecheng-10949	28	13	the	the	DET
fumecheng-10949	28	14	polymer	polymer	NOUN
fumecheng-10949	28	15	substrates	substrate	NOUN
fumecheng-10949	28	16	)	)	PUNCT
fumecheng-10949	28	17	with	with	ADP
fumecheng-10949	28	18	a	a	DET
fumecheng-10949	28	19	metal	metal	NOUN
fumecheng-10949	28	20	thin	thin	ADJ
fumecheng-10949	28	21	film	film	NOUN
fumecheng-10949	28	22	,	,	PUNCT
fumecheng-10949	28	23	both	both	DET
fumecheng-10949	28	24	high	high	ADJ
fumecheng-10949	28	25	conductivity	conductivity	NOUN
fumecheng-10949	28	26	and	and	CCONJ
fumecheng-10949	28	27	flexibility	flexibility	NOUN
fumecheng-10949	28	28	can	can	AUX
fumecheng-10949	28	29	be	be	AUX
fumecheng-10949	28	30	achieved	achieve	VERB
fumecheng-10949	28	31	.	.	PUNCT
fumecheng-10949	29	1	considering	consider	VERB
fumecheng-10949	29	2	this	this	PRON
fumecheng-10949	29	3	,	,	PUNCT
fumecheng-10949	29	4	in	in	ADP
fumecheng-10949	29	5	this	this	DET
fumecheng-10949	29	6	study	study	NOUN
fumecheng-10949	29	7	,	,	PUNCT
fumecheng-10949	29	8	ag	ag	PROPN
fumecheng-10949	29	9	nanowire	nanowire	NOUN
fumecheng-10949	29	10	and	and	CCONJ
fumecheng-10949	29	11	cu	cu	NOUN
fumecheng-10949	29	12	thin	thin	ADJ
fumecheng-10949	29	13	-	-	PUNCT
fumecheng-10949	29	14	film	film	NOUN
fumecheng-10949	29	15	hybrid	hybrid	ADJ
fumecheng-10949	29	16	interconnects	interconnect	NOUN
fumecheng-10949	29	17	were	be	AUX
fumecheng-10949	29	18	investigated	investigate	VERB
fumecheng-10949	29	19	.	.	PUNCT
fumecheng-10949	30	1	ag	ag	PROPN
fumecheng-10949	30	2	nanowires	nanowire	NOUN
fumecheng-10949	30	3	are	be	AUX
fumecheng-10949	30	4	highly	highly	ADV
fumecheng-10949	30	5	flexible	flexible	ADJ
fumecheng-10949	30	6	because	because	SCONJ
fumecheng-10949	30	7	of	of	ADP
fumecheng-10949	30	8	their	their	PRON
fumecheng-10949	30	9	nanoscale	nanoscale	NOUN
fumecheng-10949	30	10	dimensions	dimension	NOUN
fumecheng-10949	30	11	and	and	CCONJ
fumecheng-10949	30	12	network	network	NOUN
fumecheng-10949	30	13	structure	structure	NOUN
fumecheng-10949	30	14	;	;	PUNCT
fumecheng-10949	30	15	in	in	ADP
fumecheng-10949	30	16	addition	addition	NOUN
fumecheng-10949	30	17	,	,	PUNCT
fumecheng-10949	30	18	their	their	PRON
fumecheng-10949	30	19	mass	mass	ADJ
fumecheng-10949	30	20	production	production	NOUN
fumecheng-10949	30	21	is	be	AUX
fumecheng-10949	30	22	possible	possible	ADJ
fumecheng-10949	30	23	via	via	ADP
fumecheng-10949	30	24	the	the	DET
fumecheng-10949	30	25	polyol	polyol	NOUN
fumecheng-10949	30	26	reduction	reduction	NOUN
fumecheng-10949	30	27	process	process	NOUN
fumecheng-10949	30	28	[	[	X
fumecheng-10949	30	29	17	17	NUM
fumecheng-10949	30	30	-	-	SYM
fumecheng-10949	30	31	23	23	NUM
fumecheng-10949	30	32	]	]	PUNCT
fumecheng-10949	30	33	.	.	PUNCT
fumecheng-10949	31	1	the	the	DET
fumecheng-10949	31	2	coating	coating	NOUN
fumecheng-10949	31	3	process	process	NOUN
fumecheng-10949	31	4	is	be	AUX
fumecheng-10949	31	5	a	a	DET
fumecheng-10949	31	6	very	very	ADV
fumecheng-10949	31	7	simple	simple	ADJ
fumecheng-10949	31	8	solution	solution	NOUN
fumecheng-10949	31	9	-	-	PUNCT
fumecheng-10949	31	10	based	base	VERB
fumecheng-10949	31	11	process	process	NOUN
fumecheng-10949	31	12	using	use	VERB
fumecheng-10949	31	13	a	a	DET
fumecheng-10949	31	14	spray	spray	NOUN
fumecheng-10949	31	15	or	or	CCONJ
fumecheng-10949	31	16	doctor	doctor	NOUN
fumecheng-10949	31	17	blade	blade	NOUN
fumecheng-10949	31	18	system	system	NOUN
fumecheng-10949	31	19	.	.	PUNCT
fumecheng-10949	32	1	in	in	ADP
fumecheng-10949	32	2	this	this	DET
fumecheng-10949	32	3	study	study	NOUN
fumecheng-10949	32	4	,	,	PUNCT
fumecheng-10949	32	5	ag	ag	PROPN
fumecheng-10949	32	6	nanowires	nanowire	NOUN
fumecheng-10949	32	7	were	be	AUX
fumecheng-10949	32	8	coated	coat	VERB
fumecheng-10949	32	9	on	on	ADP
fumecheng-10949	32	10	polyimide	polyimide	NOUN
fumecheng-10949	32	11	(	(	PUNCT
fumecheng-10949	32	12	pi	pi	NOUN
fumecheng-10949	32	13	)	)	PUNCT
fumecheng-10949	32	14	substrates	substrate	NOUN
fumecheng-10949	32	15	using	use	VERB
fumecheng-10949	32	16	a	a	DET
fumecheng-10949	32	17	doctor	doctor	NOUN
fumecheng-10949	32	18	blade	blade	NOUN
fumecheng-10949	32	19	.	.	PUNCT
fumecheng-10949	33	1	cu	cu	PROPN
fumecheng-10949	33	2	thin	thin	ADJ
fumecheng-10949	33	3	films	film	NOUN
fumecheng-10949	33	4	were	be	AUX
fumecheng-10949	33	5	deposited	deposit	VERB
fumecheng-10949	33	6	on	on	ADP
fumecheng-10949	33	7	the	the	DET
fumecheng-10949	33	8	ag	ag	PROPN
fumecheng-10949	33	9	nanowire	nanowire	NOUN
fumecheng-10949	33	10	/	/	SYM
fumecheng-10949	33	11	pi	pi	NOUN
fumecheng-10949	33	12	samples	sample	NOUN
fumecheng-10949	33	13	via	via	ADP
fumecheng-10949	33	14	a	a	DET
fumecheng-10949	33	15	magnetron	magnetron	NOUN
fumecheng-10949	33	16	sputtering	sputter	VERB
fumecheng-10949	33	17	system	system	NOUN
fumecheng-10949	33	18	.	.	PUNCT
fumecheng-10949	34	1	the	the	DET
fumecheng-10949	34	2	reliability	reliability	NOUN
fumecheng-10949	34	3	of	of	ADP
fumecheng-10949	34	4	the	the	DET
fumecheng-10949	34	5	cu	cu	PROPN
fumecheng-10949	34	6	/	/	SYM
fumecheng-10949	34	7	ag	ag	PROPN
fumecheng-10949	34	8	nanowire	nanowire	PROPN
fumecheng-10949	34	9	/	/	SYM
fumecheng-10949	34	10	pi	pi	NOUN
fumecheng-10949	34	11	(	(	PUNCT
fumecheng-10949	34	12	cap	cap	NOUN
fumecheng-10949	34	13	)	)	PUNCT
fumecheng-10949	34	14	interconnects	interconnect	NOUN
fumecheng-10949	34	15	was	be	AUX
fumecheng-10949	34	16	examined	examine	VERB
fumecheng-10949	34	17	using	use	VERB
fumecheng-10949	34	18	a	a	DET
fumecheng-10949	34	19	bending	bend	VERB
fumecheng-10949	34	20	fatigue	fatigue	NOUN
fumecheng-10949	34	21	tester	tester	NOUN
fumecheng-10949	34	22	.	.	PUNCT
fumecheng-10949	35	1	our	our	PRON
fumecheng-10949	35	2	study	study	NOUN
fumecheng-10949	35	3	showed	show	VERB
fumecheng-10949	35	4	that	that	SCONJ
fumecheng-10949	35	5	the	the	DET
fumecheng-10949	35	6	cap	cap	NOUN
fumecheng-10949	35	7	had	have	VERB
fumecheng-10949	35	8	better	well	ADJ
fumecheng-10949	35	9	reliability	reliability	NOUN
fumecheng-10949	35	10	than	than	ADP
fumecheng-10949	35	11	cu	cu	PROPN
fumecheng-10949	35	12	thinfilm	thinfilm	NOUN
fumecheng-10949	35	13	interconnects	interconnect	NOUN
fumecheng-10949	35	14	.	.	PUNCT
fumecheng-10949	36	1	2	2	X
fumecheng-10949	36	2	.	.	X
fumecheng-10949	36	3	materials	material	NOUN
fumecheng-10949	36	4	and	and	CCONJ
fumecheng-10949	36	5	methods	method	NOUN
fumecheng-10949	36	6	2.1	2.1	NUM
fumecheng-10949	36	7	.	.	PUNCT
fumecheng-10949	37	1	sample	sample	NOUN
fumecheng-10949	37	2	preparation	preparation	NOUN
fumecheng-10949	37	3	and	and	CCONJ
fumecheng-10949	37	4	characterization	characterization	NOUN
fumecheng-10949	37	5	for	for	ADP
fumecheng-10949	37	6	this	this	DET
fumecheng-10949	37	7	study	study	NOUN
fumecheng-10949	37	8	,	,	PUNCT
fumecheng-10949	37	9	0.1	0.1	NUM
fumecheng-10949	37	10	wt%	wt%	ADJ
fumecheng-10949	37	11	ag	ag	PROPN
fumecheng-10949	37	12	nanowire	nanowire	ADJ
fumecheng-10949	37	13	suspension	suspension	NOUN
fumecheng-10949	37	14	in	in	ADP
fumecheng-10949	37	15	ethanol	ethanol	NOUN
fumecheng-10949	37	16	was	be	AUX
fumecheng-10949	37	17	purchased	purchase	VERB
fumecheng-10949	37	18	from	from	ADP
fumecheng-10949	37	19	sg	sg	ADP
fumecheng-10949	37	20	flexio	flexio	PROPN
fumecheng-10949	37	21	(	(	PUNCT
fumecheng-10949	37	22	south	south	PROPN
fumecheng-10949	37	23	korea	korea	PROPN
fumecheng-10949	37	24	)	)	PUNCT
fumecheng-10949	37	25	and	and	CCONJ
fumecheng-10949	37	26	used	use	VERB
fumecheng-10949	37	27	as	as	SCONJ
fumecheng-10949	37	28	received	receive	VERB
fumecheng-10949	37	29	.	.	PUNCT
fumecheng-10949	38	1	fig	fig	NOUN
fumecheng-10949	38	2	.	.	PUNCT
fumecheng-10949	39	1	1	1	NUM
fumecheng-10949	39	2	shows	show	VERB
fumecheng-10949	39	3	the	the	DET
fumecheng-10949	39	4	schematic	schematic	ADJ
fumecheng-10949	39	5	illustration	illustration	NOUN
fumecheng-10949	39	6	of	of	ADP
fumecheng-10949	39	7	fabrication	fabrication	NOUN
fumecheng-10949	39	8	process	process	NOUN
fumecheng-10949	39	9	of	of	ADP
fumecheng-10949	39	10	cap	cap	NOUN
fumecheng-10949	39	11	interconnects	interconnect	NOUN
fumecheng-10949	39	12	.	.	PUNCT
fumecheng-10949	40	1	first	first	ADV
fumecheng-10949	40	2	,	,	PUNCT
fumecheng-10949	40	3	a	a	DET
fumecheng-10949	40	4	125-m	125-m	NUM
fumecheng-10949	40	5	-	-	PUNCT
fumecheng-10949	40	6	thick	thick	ADJ
fumecheng-10949	40	7	pi	pi	NOUN
fumecheng-10949	40	8	substrate	substrate	NOUN
fumecheng-10949	40	9	(	(	PUNCT
fumecheng-10949	40	10	dupont	dupont	NOUN
fumecheng-10949	40	11	,	,	PUNCT
fumecheng-10949	40	12	kepton	kepton	PROPN
fumecheng-10949	40	13	e	e	NOUN
fumecheng-10949	40	14	)	)	PUNCT
fumecheng-10949	40	15	was	be	AUX
fumecheng-10949	40	16	sequentially	sequentially	ADV
fumecheng-10949	40	17	cleaned	clean	VERB
fumecheng-10949	40	18	with	with	ADP
fumecheng-10949	40	19	ipa	ipa	PROPN
fumecheng-10949	40	20	,	,	PUNCT
fumecheng-10949	40	21	ethanol	ethanol	NOUN
fumecheng-10949	40	22	,	,	PUNCT
fumecheng-10949	40	23	and	and	CCONJ
fumecheng-10949	40	24	di	di	NOUN
fumecheng-10949	40	25	water	water	NOUN
fumecheng-10949	40	26	in	in	ADP
fumecheng-10949	40	27	an	an	DET
fumecheng-10949	40	28	ultrasonic	ultrasonic	ADJ
fumecheng-10949	40	29	bath	bath	NOUN
fumecheng-10949	40	30	.	.	PUNCT
fumecheng-10949	41	1	each	each	DET
fumecheng-10949	41	2	cleaning	cleaning	NOUN
fumecheng-10949	41	3	step	step	NOUN
fumecheng-10949	41	4	was	be	AUX
fumecheng-10949	41	5	carried	carry	VERB
fumecheng-10949	41	6	out	out	ADP
fumecheng-10949	41	7	for	for	ADP
fumecheng-10949	41	8	5	5	NUM
fumecheng-10949	41	9	min	min	NOUN
fumecheng-10949	41	10	.	.	PROPN
fumecheng-10949	41	11	next	next	ADV
fumecheng-10949	41	12	,	,	PUNCT
fumecheng-10949	41	13	ag	ag	PROPN
fumecheng-10949	41	14	nanowires	nanowire	NOUN
fumecheng-10949	41	15	were	be	AUX
fumecheng-10949	41	16	coated	coat	VERB
fumecheng-10949	41	17	on	on	ADP
fumecheng-10949	41	18	the	the	DET
fumecheng-10949	41	19	pi	pi	NOUN
fumecheng-10949	41	20	substrate	substrate	NOUN
fumecheng-10949	41	21	using	use	VERB
fumecheng-10949	41	22	a	a	DET
fumecheng-10949	41	23	mayer	mayer	PROPN
fumecheng-10949	41	24	bar	bar	NOUN
fumecheng-10949	41	25	(	(	PUNCT
fumecheng-10949	41	26	#	#	SYM
fumecheng-10949	41	27	rd	rd	NOUN
fumecheng-10949	41	28	6	6	NUM
fumecheng-10949	41	29	)	)	PUNCT
fumecheng-10949	41	30	.	.	PUNCT
fumecheng-10949	42	1	third	third	ADJ
fumecheng-10949	42	2	,	,	PUNCT
fumecheng-10949	42	3	the	the	DET
fumecheng-10949	42	4	ag	ag	PROPN
fumecheng-10949	42	5	nanowire	nanowire	NOUN
fumecheng-10949	42	6	networks	network	NOUN
fumecheng-10949	42	7	were	be	AUX
fumecheng-10949	42	8	air	air	NOUN
fumecheng-10949	42	9	-	-	PUNCT
fumecheng-10949	42	10	dried	dry	VERB
fumecheng-10949	42	11	at	at	ADP
fumecheng-10949	42	12	80	80	NUM
fumecheng-10949	42	13	°	°	NUM
fumecheng-10949	42	14	c	c	NOUN
fumecheng-10949	42	15	for	for	ADP
fumecheng-10949	42	16	10	10	NUM
fumecheng-10949	42	17	min	min	NOUN
fumecheng-10949	42	18	using	use	VERB
fumecheng-10949	42	19	a	a	DET
fumecheng-10949	42	20	hot	hot	ADJ
fumecheng-10949	42	21	plate	plate	NOUN
fumecheng-10949	42	22	to	to	PART
fumecheng-10949	42	23	evaporate	evaporate	VERB
fumecheng-10949	42	24	a	a	DET
fumecheng-10949	42	25	remaining	remain	VERB
fumecheng-10949	42	26	solvent	solvent	NOUN
fumecheng-10949	42	27	.	.	PUNCT
fumecheng-10949	43	1	lastly	lastly	ADV
fumecheng-10949	43	2	,	,	PUNCT
fumecheng-10949	43	3	a	a	DET
fumecheng-10949	43	4	cu	cu	PROPN
fumecheng-10949	43	5	thin	thin	ADJ
fumecheng-10949	43	6	film	film	NOUN
fumecheng-10949	43	7	was	be	AUX
fumecheng-10949	43	8	deposited	deposit	VERB
fumecheng-10949	43	9	on	on	ADP
fumecheng-10949	43	10	the	the	DET
fumecheng-10949	43	11	pi	pi	NOUN
fumecheng-10949	43	12	substrate	substrate	NOUN
fumecheng-10949	43	13	using	use	VERB
fumecheng-10949	43	14	dc	dc	PROPN
fumecheng-10949	43	15	magnetron	magnetron	NOUN
fumecheng-10949	43	16	sputtering	sputtering	NOUN
fumecheng-10949	43	17	at	at	ADP
fumecheng-10949	43	18	100	100	NUM
fumecheng-10949	43	19	w	w	NOUN
fumecheng-10949	43	20	at	at	ADP
fumecheng-10949	43	21	room	room	NOUN
fumecheng-10949	43	22	temperature	temperature	NOUN
fumecheng-10949	43	23	for	for	ADP
fumecheng-10949	43	24	15	15	NUM
fumecheng-10949	43	25	min	min	NOUN
fumecheng-10949	43	26	.	.	PROPN
fumecheng-10949	43	27	thickness	thickness	NOUN
fumecheng-10949	43	28	of	of	ADP
fumecheng-10949	43	29	cu	cu	PROPN
fumecheng-10949	43	30	thin	thin	ADJ
fumecheng-10949	43	31	film	film	NOUN
fumecheng-10949	43	32	was	be	AUX
fumecheng-10949	43	33	~400	~400	PUNCT
fumecheng-10949	43	34	nm	nm	X
fumecheng-10949	43	35	.	.	PUNCT
fumecheng-10949	44	1	the	the	DET
fumecheng-10949	44	2	microstructures	microstructure	NOUN
fumecheng-10949	44	3	of	of	ADP
fumecheng-10949	44	4	cap	cap	NOUN
fumecheng-10949	44	5	and	and	CCONJ
fumecheng-10949	44	6	cu	cu	PROPN
fumecheng-10949	44	7	thin	thin	ADJ
fumecheng-10949	44	8	film	film	NOUN
fumecheng-10949	44	9	were	be	AUX
fumecheng-10949	44	10	analyzed	analyze	VERB
fumecheng-10949	44	11	using	use	VERB
fumecheng-10949	44	12	field	field	NOUN
fumecheng-10949	44	13	-	-	PUNCT
fumecheng-10949	44	14	emission	emission	NOUN
fumecheng-10949	44	15	scanning	scanning	NOUN
fumecheng-10949	44	16	electron	electron	NOUN
fumecheng-10949	44	17	microscopy	microscopy	NOUN
fumecheng-10949	44	18	(	(	PUNCT
fumecheng-10949	44	19	fe	fe	NOUN
fumecheng-10949	44	20	-	-	ADJ
fumecheng-10949	44	21	sem	sem	NOUN
fumecheng-10949	44	22	,	,	PUNCT
fumecheng-10949	44	23	sigma	sigma	PROPN
fumecheng-10949	44	24	,	,	PUNCT
fumecheng-10949	44	25	carl	carl	PROPN
fumecheng-10949	44	26	zeiss	zeiss	PROPN
fumecheng-10949	44	27	)	)	PUNCT
fumecheng-10949	44	28	.	.	PUNCT
fumecheng-10949	45	1	x	x	X
fumecheng-10949	45	2	-	-	PUNCT
fumecheng-10949	45	3	ray	ray	NOUN
fumecheng-10949	45	4	diffraction	diffraction	NOUN
fumecheng-10949	45	5	(	(	PUNCT
fumecheng-10949	45	6	new	new	ADJ
fumecheng-10949	45	7	d8	d8	PROPN
fumecheng-10949	45	8	-	-	PUNCT
fumecheng-10949	45	9	advance	advance	NOUN
fumecheng-10949	45	10	,	,	PUNCT
fumecheng-10949	45	11	bruker	bruker	PROPN
fumecheng-10949	45	12	-	-	PUNCT
fumecheng-10949	45	13	axs	axs	PROPN
fumecheng-10949	45	14	,	,	PUNCT
fumecheng-10949	45	15	usa	usa	PROPN
fumecheng-10949	45	16	)	)	PUNCT
fumecheng-10949	45	17	bending	bend	VERB
fumecheng-10949	45	18	fatigue	fatigue	NOUN
fumecheng-10949	45	19	behavior	behavior	NOUN
fumecheng-10949	45	20	of	of	ADP
fumecheng-10949	45	21	ag	ag	PROPN
fumecheng-10949	45	22	nanowire	nanowire	PROPN
fumecheng-10949	45	23	/	/	SYM
fumecheng-10949	45	24	cu	cu	PROPN
fumecheng-10949	45	25	thin	thin	ADJ
fumecheng-10949	45	26	-	-	PUNCT
fumecheng-10949	45	27	film	film	NOUN
fumecheng-10949	45	28	hybrid	hybrid	ADJ
fumecheng-10949	45	29	interconnects	interconnect	NOUN
fumecheng-10949	45	30	for	for	ADP
fumecheng-10949	45	31	wearable	wearable	ADJ
fumecheng-10949	45	32	electronics	electronic	NOUN
fumecheng-10949	45	33	555	555	NUM
fumecheng-10949	45	34	was	be	AUX
fumecheng-10949	45	35	used	use	VERB
fumecheng-10949	45	36	to	to	PART
fumecheng-10949	45	37	analyze	analyze	VERB
fumecheng-10949	45	38	the	the	DET
fumecheng-10949	45	39	crystallographic	crystallographic	ADJ
fumecheng-10949	45	40	orientation	orientation	NOUN
fumecheng-10949	45	41	.	.	PUNCT
fumecheng-10949	46	1	cu	cu	PROPN
fumecheng-10949	46	2	κα	κα	INTJ
fumecheng-10949	46	3	(	(	PUNCT
fumecheng-10949	46	4	λ	λ	X
fumecheng-10949	46	5	=	=	X
fumecheng-10949	46	6	0.154	0.154	NUM
fumecheng-10949	46	7	nm	nm	NOUN
fumecheng-10949	46	8	)	)	PUNCT
fumecheng-10949	46	9	radiation	radiation	NOUN
fumecheng-10949	46	10	was	be	AUX
fumecheng-10949	46	11	used	use	VERB
fumecheng-10949	46	12	for	for	ADP
fumecheng-10949	46	13	xrd	xrd	NOUN
fumecheng-10949	46	14	analysis	analysis	NOUN
fumecheng-10949	46	15	in	in	ADP
fumecheng-10949	46	16	the	the	DET
fumecheng-10949	46	17	2θ	2θ	NUM
fumecheng-10949	46	18	range	range	NOUN
fumecheng-10949	46	19	between	between	ADP
fumecheng-10949	46	20	30º	30º	NOUN
fumecheng-10949	46	21	and	and	CCONJ
fumecheng-10949	46	22	100º.	100º.	NUM
fumecheng-10949	46	23	fig	fig	NOUN
fumecheng-10949	46	24	.	.	PUNCT
fumecheng-10949	47	1	1	1	NUM
fumecheng-10949	47	2	schematic	schematic	ADJ
fumecheng-10949	47	3	illustration	illustration	NOUN
fumecheng-10949	47	4	of	of	ADP
fumecheng-10949	47	5	a	a	DET
fumecheng-10949	47	6	fabrication	fabrication	NOUN
fumecheng-10949	47	7	process	process	NOUN
fumecheng-10949	47	8	of	of	ADP
fumecheng-10949	47	9	cap	cap	NOUN
fumecheng-10949	47	10	film	film	NOUN
fumecheng-10949	47	11	2.2	2.2	NUM
fumecheng-10949	47	12	.	.	PUNCT
fumecheng-10949	48	1	cyclic	cyclic	ADJ
fumecheng-10949	48	2	bending	bend	VERB
fumecheng-10949	48	3	fatigue	fatigue	NOUN
fumecheng-10949	48	4	test	test	NOUN
fumecheng-10949	48	5	bending	bend	VERB
fumecheng-10949	48	6	fatigue	fatigue	NOUN
fumecheng-10949	48	7	tests	test	NOUN
fumecheng-10949	48	8	were	be	AUX
fumecheng-10949	48	9	conducted	conduct	VERB
fumecheng-10949	48	10	using	use	VERB
fumecheng-10949	48	11	a	a	DET
fumecheng-10949	48	12	cyclic	cyclic	ADJ
fumecheng-10949	48	13	bending	bend	VERB
fumecheng-10949	48	14	fatigue	fatigue	NOUN
fumecheng-10949	48	15	tester	tester	NOUN
fumecheng-10949	48	16	(	(	PUNCT
fumecheng-10949	48	17	south	south	PROPN
fumecheng-10949	48	18	korea	korea	PROPN
fumecheng-10949	48	19	,	,	PUNCT
fumecheng-10949	48	20	ck	ck	PROPN
fumecheng-10949	48	21	trading	trading	PROPN
fumecheng-10949	48	22	co.	co.	PROPN
fumecheng-10949	48	23	ltd	ltd	PROPN
fumecheng-10949	48	24	.	.	PROPN
fumecheng-10949	48	25	)	)	PUNCT
fumecheng-10949	48	26	,	,	PUNCT
fumecheng-10949	48	27	which	which	PRON
fumecheng-10949	48	28	can	can	AUX
fumecheng-10949	48	29	measure	measure	VERB
fumecheng-10949	48	30	electrical	electrical	ADJ
fumecheng-10949	48	31	resistance	resistance	NOUN
fumecheng-10949	48	32	in	in	ADP
fumecheng-10949	48	33	situ	situ	NOUN
fumecheng-10949	48	34	with	with	ADP
fumecheng-10949	48	35	a	a	DET
fumecheng-10949	48	36	resolution	resolution	NOUN
fumecheng-10949	48	37	of	of	ADP
fumecheng-10949	48	38	~0.003	~0.003	PROPN
fumecheng-10949	48	39	ω	ω	PROPN
fumecheng-10949	48	40	.	.	PUNCT
fumecheng-10949	48	41	fig	fig	NOUN
fumecheng-10949	48	42	.	.	PUNCT
fumecheng-10949	49	1	2	2	NUM
fumecheng-10949	49	2	presents	present	VERB
fumecheng-10949	49	3	the	the	DET
fumecheng-10949	49	4	mechanism	mechanism	NOUN
fumecheng-10949	49	5	of	of	ADP
fumecheng-10949	49	6	a	a	DET
fumecheng-10949	49	7	bending	bend	VERB
fumecheng-10949	49	8	fatigue	fatigue	NOUN
fumecheng-10949	49	9	tester	tester	NOUN
fumecheng-10949	49	10	.	.	PUNCT
fumecheng-10949	50	1	the	the	DET
fumecheng-10949	50	2	samples	sample	NOUN
fumecheng-10949	50	3	were	be	AUX
fumecheng-10949	50	4	mounted	mount	VERB
fumecheng-10949	50	5	between	between	ADP
fumecheng-10949	50	6	the	the	DET
fumecheng-10949	50	7	two	two	NUM
fumecheng-10949	50	8	horizontal	horizontal	ADJ
fumecheng-10949	50	9	plates	plate	NOUN
fumecheng-10949	50	10	,	,	PUNCT
fumecheng-10949	50	11	and	and	CCONJ
fumecheng-10949	50	12	both	both	DET
fumecheng-10949	50	13	ends	end	NOUN
fumecheng-10949	50	14	of	of	ADP
fumecheng-10949	50	15	the	the	DET
fumecheng-10949	50	16	samples	sample	NOUN
fumecheng-10949	50	17	were	be	AUX
fumecheng-10949	50	18	fixed	fix	VERB
fumecheng-10949	50	19	to	to	ADP
fumecheng-10949	50	20	the	the	DET
fumecheng-10949	50	21	plates	plate	NOUN
fumecheng-10949	50	22	with	with	ADP
fumecheng-10949	50	23	screw	screw	NOUN
fumecheng-10949	50	24	bolts	bolt	NOUN
fumecheng-10949	50	25	.	.	PUNCT
fumecheng-10949	51	1	the	the	DET
fumecheng-10949	51	2	resistance	resistance	NOUN
fumecheng-10949	51	3	was	be	AUX
fumecheng-10949	51	4	measured	measure	VERB
fumecheng-10949	51	5	in	in	ADP
fumecheng-10949	51	6	situ	situ	NOUN
fumecheng-10949	51	7	across	across	ADP
fumecheng-10949	51	8	the	the	DET
fumecheng-10949	51	9	two	two	NUM
fumecheng-10949	51	10	ends	end	NOUN
fumecheng-10949	51	11	of	of	ADP
fumecheng-10949	51	12	the	the	DET
fumecheng-10949	51	13	samples	sample	NOUN
fumecheng-10949	51	14	that	that	PRON
fumecheng-10949	51	15	were	be	AUX
fumecheng-10949	51	16	in	in	ADP
fumecheng-10949	51	17	contact	contact	NOUN
fumecheng-10949	51	18	with	with	ADP
fumecheng-10949	51	19	the	the	DET
fumecheng-10949	51	20	metal	metal	NOUN
fumecheng-10949	51	21	pads	pad	NOUN
fumecheng-10949	51	22	.	.	PUNCT
fumecheng-10949	52	1	the	the	DET
fumecheng-10949	52	2	value	value	NOUN
fumecheng-10949	52	3	of	of	ADP
fumecheng-10949	52	4	the	the	DET
fumecheng-10949	52	5	imposed	impose	VERB
fumecheng-10949	52	6	strain	strain	NOUN
fumecheng-10949	52	7	was	be	AUX
fumecheng-10949	52	8	calculated	calculate	VERB
fumecheng-10949	52	9	using	use	VERB
fumecheng-10949	52	10	ε	ε	PROPN
fumecheng-10949	52	11	=	=	PUNCT
fumecheng-10949	52	12	y/2r	y/2r	PROPN
fumecheng-10949	52	13	,	,	PUNCT
fumecheng-10949	52	14	where	where	SCONJ
fumecheng-10949	52	15	ε	ε	PROPN
fumecheng-10949	52	16	,	,	PUNCT
fumecheng-10949	52	17	y	y	PROPN
fumecheng-10949	52	18	,	,	PUNCT
fumecheng-10949	52	19	and	and	CCONJ
fumecheng-10949	52	20	r	r	NOUN
fumecheng-10949	52	21	are	be	AUX
fumecheng-10949	52	22	the	the	DET
fumecheng-10949	52	23	imposed	impose	VERB
fumecheng-10949	52	24	strain	strain	NOUN
fumecheng-10949	52	25	value	value	NOUN
fumecheng-10949	52	26	,	,	PUNCT
fumecheng-10949	52	27	the	the	DET
fumecheng-10949	52	28	distance	distance	NOUN
fumecheng-10949	52	29	from	from	ADP
fumecheng-10949	52	30	the	the	DET
fumecheng-10949	52	31	neutral	neutral	ADJ
fumecheng-10949	52	32	axis	axis	NOUN
fumecheng-10949	52	33	,	,	PUNCT
fumecheng-10949	52	34	and	and	CCONJ
fumecheng-10949	52	35	the	the	DET
fumecheng-10949	52	36	radius	radius	NOUN
fumecheng-10949	52	37	,	,	PUNCT
fumecheng-10949	52	38	respectively	respectively	ADV
fumecheng-10949	52	39	.	.	PUNCT
fumecheng-10949	53	1	by	by	ADP
fumecheng-10949	53	2	adjusting	adjust	VERB
fumecheng-10949	53	3	the	the	DET
fumecheng-10949	53	4	distance	distance	NOUN
fumecheng-10949	53	5	between	between	ADP
fumecheng-10949	53	6	the	the	DET
fumecheng-10949	53	7	two	two	NUM
fumecheng-10949	53	8	plates	plate	NOUN
fumecheng-10949	53	9	,	,	PUNCT
fumecheng-10949	53	10	the	the	DET
fumecheng-10949	53	11	value	value	NOUN
fumecheng-10949	53	12	of	of	ADP
fumecheng-10949	53	13	r	r	NOUN
fumecheng-10949	53	14	varies	varie	NOUN
fumecheng-10949	53	15	,	,	PUNCT
fumecheng-10949	53	16	which	which	PRON
fumecheng-10949	53	17	results	result	VERB
fumecheng-10949	53	18	in	in	ADP
fumecheng-10949	53	19	the	the	DET
fumecheng-10949	53	20	change	change	NOUN
fumecheng-10949	53	21	of	of	ADP
fumecheng-10949	53	22	bending	bend	VERB
fumecheng-10949	53	23	strain	strain	NOUN
fumecheng-10949	53	24	imposed	impose	VERB
fumecheng-10949	53	25	on	on	ADP
fumecheng-10949	53	26	the	the	DET
fumecheng-10949	53	27	samples	sample	NOUN
fumecheng-10949	53	28	.	.	PUNCT
fumecheng-10949	54	1	during	during	ADP
fumecheng-10949	54	2	bending	bend	VERB
fumecheng-10949	54	3	tests	test	NOUN
fumecheng-10949	54	4	,	,	PUNCT
fumecheng-10949	54	5	the	the	DET
fumecheng-10949	54	6	lower	low	ADJ
fumecheng-10949	54	7	plates	plate	NOUN
fumecheng-10949	54	8	move	move	VERB
fumecheng-10949	54	9	forward	forward	ADV
fumecheng-10949	54	10	and	and	CCONJ
fumecheng-10949	54	11	backward	backward	ADV
fumecheng-10949	54	12	repeatedly	repeatedly	ADV
fumecheng-10949	54	13	in	in	ADP
fumecheng-10949	54	14	the	the	DET
fumecheng-10949	54	15	horizontal	horizontal	ADJ
fumecheng-10949	54	16	direction	direction	NOUN
fumecheng-10949	54	17	,	,	PUNCT
fumecheng-10949	54	18	thereby	thereby	ADV
fumecheng-10949	54	19	imposing	impose	VERB
fumecheng-10949	54	20	many	many	ADJ
fumecheng-10949	54	21	cycles	cycle	NOUN
fumecheng-10949	54	22	of	of	ADP
fumecheng-10949	54	23	bending	bend	VERB
fumecheng-10949	54	24	.	.	PUNCT
fumecheng-10949	55	1	by	by	ADP
fumecheng-10949	55	2	measuring	measure	VERB
fumecheng-10949	55	3	the	the	DET
fumecheng-10949	55	4	resistance	resistance	NOUN
fumecheng-10949	55	5	change	change	NOUN
fumecheng-10949	55	6	in	in	ADP
fumecheng-10949	55	7	situ	situ	NOUN
fumecheng-10949	55	8	during	during	ADP
fumecheng-10949	55	9	the	the	DET
fumecheng-10949	55	10	bending	bend	VERB
fumecheng-10949	55	11	tests	test	NOUN
fumecheng-10949	55	12	,	,	PUNCT
fumecheng-10949	55	13	the	the	DET
fumecheng-10949	55	14	crack	crack	NOUN
fumecheng-10949	55	15	evolution	evolution	NOUN
fumecheng-10949	55	16	in	in	ADP
fumecheng-10949	55	17	the	the	DET
fumecheng-10949	55	18	samples	sample	NOUN
fumecheng-10949	55	19	can	can	AUX
fumecheng-10949	55	20	be	be	AUX
fumecheng-10949	55	21	evaluated	evaluate	VERB
fumecheng-10949	55	22	.	.	PUNCT
fumecheng-10949	56	1	fig	fig	NOUN
fumecheng-10949	56	2	.	.	PUNCT
fumecheng-10949	57	1	2	2	NUM
fumecheng-10949	57	2	schematic	schematic	ADJ
fumecheng-10949	57	3	of	of	ADP
fumecheng-10949	57	4	a	a	DET
fumecheng-10949	57	5	bending	bend	VERB
fumecheng-10949	57	6	fatigue	fatigue	NOUN
fumecheng-10949	57	7	testing	testing	NOUN
fumecheng-10949	57	8	system	system	NOUN
fumecheng-10949	57	9	3	3	NUM
fumecheng-10949	57	10	.	.	PUNCT
fumecheng-10949	57	11	results	result	VERB
fumecheng-10949	57	12	3.1	3.1	NUM
fumecheng-10949	57	13	.	.	PUNCT
fumecheng-10949	58	1	crystallographic	crystallographic	ADJ
fumecheng-10949	58	2	analysis	analysis	NOUN
fumecheng-10949	58	3	using	use	VERB
fumecheng-10949	58	4	xrd	xrd	PROPN
fumecheng-10949	58	5	fig	fig	NOUN
fumecheng-10949	58	6	.	.	PUNCT
fumecheng-10949	59	1	3	3	NUM
fumecheng-10949	59	2	shows	show	VERB
fumecheng-10949	59	3	xrd	xrd	NOUN
fumecheng-10949	59	4	patterns	pattern	NOUN
fumecheng-10949	59	5	of	of	ADP
fumecheng-10949	59	6	single	single	ADJ
fumecheng-10949	59	7	cu	cu	PROPN
fumecheng-10949	59	8	and	and	CCONJ
fumecheng-10949	59	9	cap	cap	NOUN
fumecheng-10949	59	10	films	film	NOUN
fumecheng-10949	59	11	.	.	PUNCT
fumecheng-10949	60	1	similar	similar	ADJ
fumecheng-10949	60	2	xrd	xrd	NOUN
fumecheng-10949	60	3	patterns	pattern	NOUN
fumecheng-10949	60	4	were	be	AUX
fumecheng-10949	60	5	observed	observe	VERB
fumecheng-10949	60	6	for	for	ADP
fumecheng-10949	60	7	both	both	PRON
fumecheng-10949	60	8	cu	cu	PROPN
fumecheng-10949	60	9	and	and	CCONJ
fumecheng-10949	60	10	cap	cap	NOUN
fumecheng-10949	60	11	films	film	NOUN
fumecheng-10949	60	12	,	,	PUNCT
fumecheng-10949	60	13	where	where	SCONJ
fumecheng-10949	60	14	typical	typical	ADJ
fumecheng-10949	60	15	(	(	PUNCT
fumecheng-10949	60	16	111	111	NUM
fumecheng-10949	60	17	)	)	PUNCT
fumecheng-10949	60	18	peaks	peak	NOUN
fumecheng-10949	60	19	at	at	ADP
fumecheng-10949	60	20	43.71º	43.71º	PROPN
fumecheng-10949	60	21	and	and	CCONJ
fumecheng-10949	60	22	43.69º	43.69º	PROPN
fumecheng-10949	60	23	were	be	AUX
fumecheng-10949	60	24	strongly	strongly	ADV
fumecheng-10949	60	25	indicated	indicate	VERB
fumecheng-10949	60	26	with	with	ADP
fumecheng-10949	60	27	weak	weak	ADJ
fumecheng-10949	60	28	(	(	PUNCT
fumecheng-10949	60	29	200	200	NUM
fumecheng-10949	60	30	)	)	PUNCT
fumecheng-10949	60	31	texture	texture	NOUN
fumecheng-10949	60	32	at	at	ADP
fumecheng-10949	60	33	50.44º	50.44º	PROPN
fumecheng-10949	60	34	and	and	CCONJ
fumecheng-10949	60	35	50.28º	50.28º	NUM
fumecheng-10949	60	36	,	,	PUNCT
fumecheng-10949	60	37	respectively	respectively	ADV
fumecheng-10949	60	38	as	as	SCONJ
fumecheng-10949	60	39	shown	show	VERB
fumecheng-10949	60	40	in	in	ADP
fumecheng-10949	60	41	fig	fig	NOUN
fumecheng-10949	60	42	.	.	PUNCT
fumecheng-10949	61	1	3a	3a	NUM
fumecheng-10949	61	2	,	,	PUNCT
fumecheng-10949	61	3	b.	b.	PROPN
fumecheng-10949	62	1	the	the	DET
fumecheng-10949	62	2	observed	observe	VERB
fumecheng-10949	62	3	peaks	peak	NOUN
fumecheng-10949	62	4	at	at	ADP
fumecheng-10949	62	5	diffraction	diffraction	NOUN
fumecheng-10949	62	6	angle	angle	NOUN
fumecheng-10949	62	7	below	below	ADP
fumecheng-10949	62	8	40º	40º	NOUN
fumecheng-10949	62	9	was	be	AUX
fumecheng-10949	62	10	noise	noise	NOUN
fumecheng-10949	62	11	as	as	SCONJ
fumecheng-10949	62	12	can	can	AUX
fumecheng-10949	62	13	be	be	AUX
fumecheng-10949	62	14	seen	see	VERB
fumecheng-10949	62	15	in	in	ADP
fumecheng-10949	62	16	xrd	xrd	NOUN
fumecheng-10949	62	17	pattern	pattern	NOUN
fumecheng-10949	62	18	of	of	ADP
fumecheng-10949	62	19	pi	pi	NOUN
fumecheng-10949	62	20	in	in	ADP
fumecheng-10949	62	21	fig	fig	NOUN
fumecheng-10949	62	22	.	.	PUNCT
fumecheng-10949	63	1	3c	3c	NUM
fumecheng-10949	63	2	.	.	PUNCT
fumecheng-10949	64	1	there	there	PRON
fumecheng-10949	64	2	were	be	VERB
fumecheng-10949	64	3	no	no	DET
fumecheng-10949	64	4	peak	peak	NOUN
fumecheng-10949	64	5	shifts	shift	NOUN
fumecheng-10949	64	6	at	at	ADP
fumecheng-10949	64	7	each	each	DET
fumecheng-10949	64	8	peak	peak	NOUN
fumecheng-10949	64	9	,	,	PUNCT
fumecheng-10949	64	10	which	which	PRON
fumecheng-10949	64	11	confirmed	confirm	VERB
fumecheng-10949	64	12	cu	cu	PROPN
fumecheng-10949	64	13	556	556	NUM
fumecheng-10949	64	14	b.	b.	PROPN
fumecheng-10949	64	15	hwang	hwang	PROPN
fumecheng-10949	64	16	,	,	PUNCT
fumecheng-10949	64	17	y.	y.	PROPN
fumecheng-10949	64	18	han	han	PROPN
fumecheng-10949	64	19	,	,	PUNCT
fumecheng-10949	64	20	p.	p.	NOUN
fumecheng-10949	64	21	matteini	matteini	PROPN
fumecheng-10949	64	22	and	and	CCONJ
fumecheng-10949	64	23	cap	cap	NOUN
fumecheng-10949	64	24	films	film	NOUN
fumecheng-10949	64	25	had	have	VERB
fumecheng-10949	64	26	the	the	DET
fumecheng-10949	64	27	same	same	ADJ
fumecheng-10949	64	28	texture	texture	NOUN
fumecheng-10949	64	29	.	.	PUNCT
fumecheng-10949	65	1	in	in	ADP
fumecheng-10949	65	2	addition	addition	NOUN
fumecheng-10949	65	3	,	,	PUNCT
fumecheng-10949	65	4	the	the	DET
fumecheng-10949	65	5	grain	grain	NOUN
fumecheng-10949	65	6	size	size	NOUN
fumecheng-10949	65	7	is	be	AUX
fumecheng-10949	65	8	calculated	calculate	VERB
fumecheng-10949	65	9	according	accord	VERB
fumecheng-10949	65	10	to	to	ADP
fumecheng-10949	65	11	the	the	DET
fumecheng-10949	65	12	scherrer	scherrer	ADJ
fumecheng-10949	65	13	equation	equation	NOUN
fumecheng-10949	65	14	:	:	PUNCT
fumecheng-10949	65	15	cos	cos	NUM
fumecheng-10949	65	16			ADJ
fumecheng-10949	65	17			ADJ
fumecheng-10949	65	18			PROPN
fumecheng-10949	65	19	=	=	SYM
fumecheng-10949	65	20	k	k	PROPN
fumecheng-10949	65	21	d	d	X
fumecheng-10949	65	22	(	(	PUNCT
fumecheng-10949	65	23	1	1	NUM
fumecheng-10949	65	24	)	)	PUNCT
fumecheng-10949	65	25	where	where	SCONJ
fumecheng-10949	65	26	d	d	NOUN
fumecheng-10949	65	27	,	,	PUNCT
fumecheng-10949	65	28	κ	κ	NOUN
fumecheng-10949	65	29	,	,	PUNCT
fumecheng-10949	65	30	λ	λ	PROPN
fumecheng-10949	65	31	,	,	PUNCT
fumecheng-10949	65	32	β	β	X
fumecheng-10949	65	33	and	and	CCONJ
fumecheng-10949	65	34	θ	θ	PROPN
fumecheng-10949	65	35	are	be	AUX
fumecheng-10949	65	36	the	the	DET
fumecheng-10949	65	37	grain	grain	NOUN
fumecheng-10949	65	38	size	size	NOUN
fumecheng-10949	65	39	,	,	PUNCT
fumecheng-10949	65	40	the	the	DET
fumecheng-10949	65	41	shape	shape	NOUN
fumecheng-10949	65	42	factor	factor	NOUN
fumecheng-10949	65	43	,	,	PUNCT
fumecheng-10949	65	44	the	the	DET
fumecheng-10949	65	45	wavelength	wavelength	NOUN
fumecheng-10949	65	46	,	,	PUNCT
fumecheng-10949	65	47	the	the	DET
fumecheng-10949	65	48	full	full	ADJ
fumecheng-10949	65	49	width	width	NOUN
fumecheng-10949	65	50	at	at	ADP
fumecheng-10949	65	51	half	half	ADJ
fumecheng-10949	65	52	maximum	maximum	ADJ
fumecheng-10949	65	53	(	(	PUNCT
fumecheng-10949	65	54	fwhm	fwhm	NOUN
fumecheng-10949	65	55	)	)	PUNCT
fumecheng-10949	65	56	,	,	PUNCT
fumecheng-10949	65	57	and	and	CCONJ
fumecheng-10949	65	58	the	the	DET
fumecheng-10949	65	59	diffraction	diffraction	NOUN
fumecheng-10949	65	60	angle	angle	NOUN
fumecheng-10949	65	61	,	,	PUNCT
fumecheng-10949	65	62	respectively	respectively	ADV
fumecheng-10949	65	63	.	.	PUNCT
fumecheng-10949	66	1	here	here	ADV
fumecheng-10949	66	2	,	,	PUNCT
fumecheng-10949	66	3	κ	κ	PROPN
fumecheng-10949	66	4	is	be	AUX
fumecheng-10949	66	5	0.9	0.9	NUM
fumecheng-10949	66	6	for	for	ADP
fumecheng-10949	66	7	typical	typical	ADJ
fumecheng-10949	66	8	cu	cu	PROPN
fumecheng-10949	66	9	and	and	CCONJ
fumecheng-10949	66	10	λ	λ	PROPN
fumecheng-10949	66	11	is	be	AUX
fumecheng-10949	66	12	0.154	0.154	NUM
fumecheng-10949	66	13	nm	nm	NOUN
fumecheng-10949	66	14	.	.	PUNCT
fumecheng-10949	67	1	the	the	DET
fumecheng-10949	67	2	fwhm	fwhm	PROPN
fumecheng-10949	67	3	was	be	AUX
fumecheng-10949	67	4	evaluated	evaluate	VERB
fumecheng-10949	67	5	for	for	ADP
fumecheng-10949	67	6	the	the	DET
fumecheng-10949	67	7	(	(	PUNCT
fumecheng-10949	67	8	111	111	NUM
fumecheng-10949	67	9	)	)	PUNCT
fumecheng-10949	67	10	peak	peak	NOUN
fumecheng-10949	67	11	of	of	ADP
fumecheng-10949	67	12	cu	cu	PROPN
fumecheng-10949	67	13	and	and	CCONJ
fumecheng-10949	67	14	cap	cap	NOUN
fumecheng-10949	67	15	films	film	NOUN
fumecheng-10949	67	16	,	,	PUNCT
fumecheng-10949	67	17	which	which	PRON
fumecheng-10949	67	18	were	be	AUX
fumecheng-10949	67	19	0.56	0.56	NUM
fumecheng-10949	67	20	and	and	CCONJ
fumecheng-10949	67	21	0.55	0.55	NUM
fumecheng-10949	67	22	,	,	PUNCT
fumecheng-10949	67	23	respectively	respectively	ADV
fumecheng-10949	67	24	.	.	PUNCT
fumecheng-10949	68	1	with	with	ADP
fumecheng-10949	68	2	those	those	DET
fumecheng-10949	68	3	parameters	parameter	NOUN
fumecheng-10949	68	4	,	,	PUNCT
fumecheng-10949	68	5	the	the	DET
fumecheng-10949	68	6	grain	grain	NOUN
fumecheng-10949	68	7	sizes	size	NOUN
fumecheng-10949	68	8	are	be	AUX
fumecheng-10949	68	9	calculated	calculate	VERB
fumecheng-10949	68	10	as	as	ADP
fumecheng-10949	68	11	15.3	15.3	NUM
fumecheng-10949	68	12	nm	nm	NOUN
fumecheng-10949	68	13	and	and	CCONJ
fumecheng-10949	68	14	15.5	15.5	NUM
fumecheng-10949	68	15	nm	nm	NOUN
fumecheng-10949	68	16	for	for	ADP
fumecheng-10949	68	17	cu	cu	PROPN
fumecheng-10949	68	18	and	and	CCONJ
fumecheng-10949	68	19	cap	cap	NOUN
fumecheng-10949	68	20	films	film	NOUN
fumecheng-10949	68	21	,	,	PUNCT
fumecheng-10949	68	22	respectively	respectively	ADV
fumecheng-10949	68	23	.	.	PUNCT
fumecheng-10949	69	1	therefore	therefore	ADV
fumecheng-10949	69	2	,	,	PUNCT
fumecheng-10949	69	3	the	the	DET
fumecheng-10949	69	4	crystallinity	crystallinity	NOUN
fumecheng-10949	69	5	of	of	ADP
fumecheng-10949	69	6	cu	cu	PROPN
fumecheng-10949	69	7	and	and	CCONJ
fumecheng-10949	69	8	cap	cap	NOUN
fumecheng-10949	69	9	films	film	NOUN
fumecheng-10949	69	10	was	be	AUX
fumecheng-10949	69	11	confirmed	confirm	VERB
fumecheng-10949	69	12	to	to	PART
fumecheng-10949	69	13	be	be	AUX
fumecheng-10949	69	14	similar	similar	ADJ
fumecheng-10949	69	15	;	;	PUNCT
fumecheng-10949	69	16	artifacts	artifact	NOUN
fumecheng-10949	69	17	that	that	PRON
fumecheng-10949	69	18	can	can	AUX
fumecheng-10949	69	19	be	be	AUX
fumecheng-10949	69	20	resulted	result	VERB
fumecheng-10949	69	21	from	from	ADP
fumecheng-10949	69	22	the	the	DET
fumecheng-10949	69	23	different	different	ADJ
fumecheng-10949	69	24	crystallinity	crystallinity	NOUN
fumecheng-10949	69	25	is	be	AUX
fumecheng-10949	69	26	minuscule	minuscule	ADJ
fumecheng-10949	69	27	,	,	PUNCT
fumecheng-10949	69	28	especially	especially	ADV
fumecheng-10949	69	29	for	for	ADP
fumecheng-10949	69	30	understanding	understanding	NOUN
fumecheng-10949	69	31	of	of	ADP
fumecheng-10949	69	32	deformation	deformation	NOUN
fumecheng-10949	69	33	behavior	behavior	NOUN
fumecheng-10949	69	34	under	under	ADP
fumecheng-10949	69	35	bending	bend	VERB
fumecheng-10949	69	36	fatigue	fatigue	NOUN
fumecheng-10949	69	37	.	.	PUNCT
fumecheng-10949	70	1	(	(	PUNCT
fumecheng-10949	70	2	a	a	X
fumecheng-10949	70	3	)	)	PUNCT
fumecheng-10949	70	4	(	(	PUNCT
fumecheng-10949	70	5	b	b	X
fumecheng-10949	70	6	)	)	PUNCT
fumecheng-10949	70	7	(	(	PUNCT
fumecheng-10949	70	8	c	c	X
fumecheng-10949	70	9	)	)	PUNCT
fumecheng-10949	70	10	fig	fig	NOUN
fumecheng-10949	70	11	.	.	PUNCT
fumecheng-10949	71	1	3	3	NUM
fumecheng-10949	71	2	xrd	xrd	NOUN
fumecheng-10949	71	3	analysis	analysis	NOUN
fumecheng-10949	71	4	results	result	NOUN
fumecheng-10949	71	5	of	of	ADP
fumecheng-10949	71	6	(	(	PUNCT
fumecheng-10949	71	7	a	a	X
fumecheng-10949	71	8	)	)	PUNCT
fumecheng-10949	71	9	cu	cu	PROPN
fumecheng-10949	71	10	thin	thin	ADJ
fumecheng-10949	71	11	film	film	NOUN
fumecheng-10949	71	12	,	,	PUNCT
fumecheng-10949	71	13	(	(	PUNCT
fumecheng-10949	71	14	b	b	NOUN
fumecheng-10949	71	15	)	)	PUNCT
fumecheng-10949	71	16	cap	cap	NOUN
fumecheng-10949	71	17	film	film	NOUN
fumecheng-10949	71	18	,	,	PUNCT
fumecheng-10949	71	19	and	and	CCONJ
fumecheng-10949	71	20	(	(	PUNCT
fumecheng-10949	71	21	c	c	NOUN
fumecheng-10949	71	22	)	)	PUNCT
fumecheng-10949	71	23	polyimide	polyimide	ADJ
fumecheng-10949	71	24	substrate	substrate	NOUN
fumecheng-10949	71	25	3.2	3.2	NUM
fumecheng-10949	71	26	.	.	PUNCT
fumecheng-10949	72	1	cyclic	cyclic	ADJ
fumecheng-10949	72	2	bending	bend	VERB
fumecheng-10949	72	3	fatigue	fatigue	NOUN
fumecheng-10949	72	4	test	test	NOUN
fumecheng-10949	72	5	results	result	VERB
fumecheng-10949	72	6	fig	fig	NOUN
fumecheng-10949	72	7	.	.	PUNCT
fumecheng-10949	73	1	4a	4a	PROPN
fumecheng-10949	73	2	shows	show	VERB
fumecheng-10949	73	3	the	the	DET
fumecheng-10949	73	4	resistance	resistance	NOUN
fumecheng-10949	73	5	change	change	NOUN
fumecheng-10949	73	6	of	of	ADP
fumecheng-10949	73	7	cap	cap	NOUN
fumecheng-10949	73	8	and	and	CCONJ
fumecheng-10949	73	9	cu	cu	PROPN
fumecheng-10949	73	10	thin	thin	ADJ
fumecheng-10949	73	11	film	film	NOUN
fumecheng-10949	73	12	as	as	ADP
fumecheng-10949	73	13	a	a	DET
fumecheng-10949	73	14	function	function	NOUN
fumecheng-10949	73	15	of	of	ADP
fumecheng-10949	73	16	bending	bend	VERB
fumecheng-10949	73	17	cycles	cycle	NOUN
fumecheng-10949	73	18	under	under	ADP
fumecheng-10949	73	19	bending	bend	VERB
fumecheng-10949	73	20	radius	radius	NOUN
fumecheng-10949	73	21	of	of	ADP
fumecheng-10949	73	22	3	3	NUM
fumecheng-10949	73	23	mm	mm	NOUN
fumecheng-10949	73	24	.	.	PUNCT
fumecheng-10949	74	1	the	the	DET
fumecheng-10949	74	2	y	y	NOUN
fumecheng-10949	74	3	-	-	PUNCT
fumecheng-10949	74	4	axis	axis	NOUN
fumecheng-10949	74	5	represents	represent	VERB
fumecheng-10949	74	6	the	the	DET
fumecheng-10949	74	7	normalized	normalize	VERB
fumecheng-10949	74	8	resistance	resistance	NOUN
fumecheng-10949	74	9	change	change	NOUN
fumecheng-10949	74	10	calculated	calculate	VERB
fumecheng-10949	74	11	by	by	ADP
fumecheng-10949	74	12	dividing	divide	VERB
fumecheng-10949	74	13	the	the	DET
fumecheng-10949	74	14	resistance	resistance	NOUN
fumecheng-10949	74	15	gap	gap	NOUN
fumecheng-10949	74	16	between	between	ADP
fumecheng-10949	74	17	the	the	DET
fumecheng-10949	74	18	measured	measure	VERB
fumecheng-10949	74	19	resistance	resistance	NOUN
fumecheng-10949	74	20	and	and	CCONJ
fumecheng-10949	74	21	the	the	DET
fumecheng-10949	74	22	initial	initial	ADJ
fumecheng-10949	74	23	resistance	resistance	NOUN
fumecheng-10949	74	24	value	value	NOUN
fumecheng-10949	74	25	with	with	ADP
fumecheng-10949	74	26	the	the	DET
fumecheng-10949	74	27	initial	initial	ADJ
fumecheng-10949	74	28	resistance	resistance	NOUN
fumecheng-10949	74	29	value	value	NOUN
fumecheng-10949	74	30	,	,	PUNCT
fumecheng-10949	74	31	and	and	CCONJ
fumecheng-10949	74	32	the	the	DET
fumecheng-10949	74	33	x	x	NOUN
fumecheng-10949	74	34	-	-	NOUN
fumecheng-10949	74	35	axis	axis	NOUN
fumecheng-10949	74	36	represents	represent	VERB
fumecheng-10949	74	37	the	the	DET
fumecheng-10949	74	38	number	number	NOUN
fumecheng-10949	74	39	of	of	ADP
fumecheng-10949	74	40	bending	bend	VERB
fumecheng-10949	74	41	cycles	cycle	NOUN
fumecheng-10949	74	42	.	.	PUNCT
fumecheng-10949	75	1	to	to	PART
fumecheng-10949	75	2	confirm	confirm	VERB
fumecheng-10949	75	3	the	the	DET
fumecheng-10949	75	4	reliability	reliability	NOUN
fumecheng-10949	75	5	under	under	ADP
fumecheng-10949	75	6	severe	severe	ADJ
fumecheng-10949	75	7	conditions	condition	NOUN
fumecheng-10949	75	8	,	,	PUNCT
fumecheng-10949	75	9	up	up	ADP
fumecheng-10949	75	10	to	to	PART
fumecheng-10949	75	11	300,000	300,000	NUM
fumecheng-10949	75	12	cycles	cycle	NOUN
fumecheng-10949	75	13	bending	bend	VERB
fumecheng-10949	75	14	cycles	cycle	NOUN
fumecheng-10949	75	15	were	be	AUX
fumecheng-10949	75	16	imposed	impose	VERB
fumecheng-10949	75	17	on	on	ADP
fumecheng-10949	75	18	the	the	DET
fumecheng-10949	75	19	samples	sample	NOUN
fumecheng-10949	75	20	.	.	PUNCT
fumecheng-10949	76	1	for	for	ADP
fumecheng-10949	76	2	the	the	DET
fumecheng-10949	76	3	cu	cu	PROPN
fumecheng-10949	76	4	thin	thin	ADJ
fumecheng-10949	76	5	film	film	NOUN
fumecheng-10949	76	6	,	,	PUNCT
fumecheng-10949	76	7	the	the	DET
fumecheng-10949	76	8	resistance	resistance	NOUN
fumecheng-10949	76	9	increased	increase	VERB
fumecheng-10949	76	10	rapidly	rapidly	ADV
fumecheng-10949	76	11	up	up	ADP
fumecheng-10949	76	12	to	to	PART
fumecheng-10949	76	13	40,000	40,000	NUM
fumecheng-10949	76	14	cycles	cycle	NOUN
fumecheng-10949	76	15	of	of	ADP
fumecheng-10949	76	16	bending	bending	NOUN
fumecheng-10949	76	17	and	and	CCONJ
fumecheng-10949	76	18	then	then	ADV
fumecheng-10949	76	19	showed	show	VERB
fumecheng-10949	76	20	a	a	DET
fumecheng-10949	76	21	transient	transient	ADJ
fumecheng-10949	76	22	point	point	NOUN
fumecheng-10949	76	23	,	,	PUNCT
fumecheng-10949	76	24	where	where	SCONJ
fumecheng-10949	76	25	a	a	DET
fumecheng-10949	76	26	slower	slow	ADJ
fumecheng-10949	76	27	increase	increase	NOUN
fumecheng-10949	76	28	in	in	ADP
fumecheng-10949	76	29	resistance	resistance	NOUN
fumecheng-10949	76	30	was	be	AUX
fumecheng-10949	76	31	observed	observe	VERB
fumecheng-10949	76	32	until	until	ADP
fumecheng-10949	76	33	the	the	DET
fumecheng-10949	76	34	end	end	NOUN
fumecheng-10949	76	35	of	of	ADP
fumecheng-10949	76	36	the	the	DET
fumecheng-10949	76	37	bending	bend	VERB
fumecheng-10949	76	38	cycles	cycle	NOUN
fumecheng-10949	76	39	.	.	PUNCT
fumecheng-10949	77	1	at	at	ADP
fumecheng-10949	77	2	the	the	DET
fumecheng-10949	77	3	end	end	NOUN
fumecheng-10949	77	4	of	of	ADP
fumecheng-10949	77	5	the	the	DET
fumecheng-10949	77	6	bending	bend	VERB
fumecheng-10949	77	7	tests	test	NOUN
fumecheng-10949	77	8	,	,	PUNCT
fumecheng-10949	77	9	the	the	DET
fumecheng-10949	77	10	resistance	resistance	NOUN
fumecheng-10949	77	11	increased	increase	VERB
fumecheng-10949	77	12	by	by	ADP
fumecheng-10949	77	13	300	300	NUM
fumecheng-10949	77	14	%	%	NOUN
fumecheng-10949	77	15	compared	compare	VERB
fumecheng-10949	77	16	to	to	ADP
fumecheng-10949	77	17	the	the	DET
fumecheng-10949	77	18	initial	initial	ADJ
fumecheng-10949	77	19	resistance	resistance	NOUN
fumecheng-10949	77	20	.	.	PUNCT
fumecheng-10949	78	1	meanwhile	meanwhile	ADV
fumecheng-10949	78	2	,	,	PUNCT
fumecheng-10949	78	3	the	the	DET
fumecheng-10949	78	4	resistance	resistance	NOUN
fumecheng-10949	78	5	of	of	ADP
fumecheng-10949	78	6	cap	cap	NOUN
fumecheng-10949	78	7	increased	increase	VERB
fumecheng-10949	78	8	faster	fast	ADV
fumecheng-10949	78	9	than	than	ADP
fumecheng-10949	78	10	that	that	PRON
fumecheng-10949	78	11	of	of	ADP
fumecheng-10949	78	12	the	the	DET
fumecheng-10949	78	13	cu	cu	PROPN
fumecheng-10949	78	14	thin	thin	ADJ
fumecheng-10949	78	15	films	film	NOUN
fumecheng-10949	78	16	in	in	ADP
fumecheng-10949	78	17	the	the	DET
fumecheng-10949	78	18	initial	initial	ADJ
fumecheng-10949	78	19	period	period	NOUN
fumecheng-10949	78	20	of	of	ADP
fumecheng-10949	78	21	the	the	DET
fumecheng-10949	78	22	bending	bend	VERB
fumecheng-10949	78	23	cycles	cycle	NOUN
fumecheng-10949	78	24	.	.	PUNCT
fumecheng-10949	79	1	the	the	DET
fumecheng-10949	79	2	transient	transient	ADJ
fumecheng-10949	79	3	point	point	NOUN
fumecheng-10949	79	4	,	,	PUNCT
fumecheng-10949	79	5	where	where	SCONJ
fumecheng-10949	79	6	the	the	DET
fumecheng-10949	79	7	trend	trend	NOUN
fumecheng-10949	79	8	of	of	ADP
fumecheng-10949	79	9	resistance	resistance	NOUN
fumecheng-10949	79	10	increase	increase	NOUN
fumecheng-10949	79	11	changed	change	VERB
fumecheng-10949	79	12	from	from	ADP
fumecheng-10949	79	13	rapid	rapid	ADJ
fumecheng-10949	79	14	increase	increase	NOUN
fumecheng-10949	79	15	to	to	ADP
fumecheng-10949	79	16	gradual	gradual	ADJ
fumecheng-10949	79	17	increase	increase	NOUN
fumecheng-10949	79	18	,	,	PUNCT
fumecheng-10949	79	19	was	be	AUX
fumecheng-10949	79	20	observed	observe	VERB
fumecheng-10949	79	21	at	at	ADP
fumecheng-10949	79	22	20,000	20,000	NUM
fumecheng-10949	79	23	cycles	cycle	NOUN
fumecheng-10949	79	24	of	of	ADP
fumecheng-10949	79	25	bending	bending	NOUN
fumecheng-10949	79	26	,	,	PUNCT
fumecheng-10949	79	27	which	which	PRON
fumecheng-10949	79	28	is	be	AUX
fumecheng-10949	79	29	smaller	small	ADJ
fumecheng-10949	79	30	than	than	ADP
fumecheng-10949	79	31	that	that	PRON
fumecheng-10949	79	32	observed	observe	VERB
fumecheng-10949	79	33	for	for	ADP
fumecheng-10949	79	34	cu	cu	PROPN
fumecheng-10949	79	35	thin	thin	ADJ
fumecheng-10949	79	36	films	film	NOUN
fumecheng-10949	79	37	(	(	PUNCT
fumecheng-10949	79	38	fig	fig	NOUN
fumecheng-10949	79	39	.	.	PUNCT
fumecheng-10949	79	40	2b	2b	NUM
fumecheng-10949	79	41	)	)	PUNCT
fumecheng-10949	79	42	.	.	PUNCT
fumecheng-10949	80	1	however	however	ADV
fumecheng-10949	80	2	,	,	PUNCT
fumecheng-10949	80	3	the	the	DET
fumecheng-10949	80	4	amount	amount	NOUN
fumecheng-10949	80	5	of	of	ADP
fumecheng-10949	80	6	resistance	resistance	NOUN
fumecheng-10949	80	7	increase	increase	NOUN
fumecheng-10949	80	8	at	at	ADP
fumecheng-10949	80	9	the	the	DET
fumecheng-10949	80	10	transient	transient	ADJ
fumecheng-10949	80	11	point	point	NOUN
fumecheng-10949	80	12	was	be	AUX
fumecheng-10949	80	13	smaller	small	ADJ
fumecheng-10949	80	14	for	for	ADP
fumecheng-10949	80	15	the	the	DET
fumecheng-10949	80	16	cap	cap	NOUN
fumecheng-10949	80	17	than	than	ADP
fumecheng-10949	80	18	for	for	ADP
fumecheng-10949	80	19	the	the	DET
fumecheng-10949	80	20	cu	cu	PROPN
fumecheng-10949	80	21	thin	thin	ADJ
fumecheng-10949	80	22	films	film	NOUN
fumecheng-10949	80	23	.	.	PUNCT
fumecheng-10949	81	1	a	a	DET
fumecheng-10949	81	2	~113	~113	NUM
fumecheng-10949	81	3	%	%	NOUN
fumecheng-10949	81	4	increase	increase	NOUN
fumecheng-10949	81	5	in	in	ADP
fumecheng-10949	81	6	resistance	resistance	NOUN
fumecheng-10949	81	7	was	be	AUX
fumecheng-10949	81	8	observed	observe	VERB
fumecheng-10949	81	9	for	for	ADP
fumecheng-10949	81	10	the	the	DET
fumecheng-10949	81	11	cap	cap	NOUN
fumecheng-10949	81	12	film	film	NOUN
fumecheng-10949	81	13	at	at	ADP
fumecheng-10949	81	14	the	the	DET
fumecheng-10949	81	15	transient	transient	ADJ
fumecheng-10949	81	16	point	point	NOUN
fumecheng-10949	81	17	,	,	PUNCT
fumecheng-10949	81	18	whereas	whereas	SCONJ
fumecheng-10949	81	19	a	a	DET
fumecheng-10949	81	20	~151	~151	NUM
fumecheng-10949	81	21	%	%	NOUN
fumecheng-10949	81	22	increase	increase	NOUN
fumecheng-10949	81	23	in	in	ADP
fumecheng-10949	81	24	resistance	resistance	NOUN
fumecheng-10949	81	25	was	be	AUX
fumecheng-10949	81	26	observed	observe	VERB
fumecheng-10949	81	27	for	for	ADP
fumecheng-10949	81	28	the	the	DET
fumecheng-10949	81	29	cu	cu	PROPN
fumecheng-10949	81	30	thin	thin	ADJ
fumecheng-10949	81	31	films	film	NOUN
fumecheng-10949	81	32	.	.	PUNCT
fumecheng-10949	82	1	in	in	ADP
fumecheng-10949	82	2	addition	addition	NOUN
fumecheng-10949	82	3	,	,	PUNCT
fumecheng-10949	82	4	the	the	DET
fumecheng-10949	82	5	increase	increase	NOUN
fumecheng-10949	82	6	in	in	ADP
fumecheng-10949	82	7	resistance	resistance	NOUN
fumecheng-10949	82	8	at	at	ADP
fumecheng-10949	82	9	the	the	DET
fumecheng-10949	82	10	end	end	NOUN
fumecheng-10949	82	11	of	of	ADP
fumecheng-10949	82	12	the	the	DET
fumecheng-10949	82	13	bending	bend	VERB
fumecheng-10949	82	14	cycles	cycle	NOUN
fumecheng-10949	82	15	was	be	AUX
fumecheng-10949	82	16	smaller	small	ADJ
fumecheng-10949	82	17	for	for	ADP
fumecheng-10949	82	18	the	the	DET
fumecheng-10949	82	19	cap	cap	NOUN
fumecheng-10949	82	20	than	than	ADP
fumecheng-10949	82	21	for	for	ADP
fumecheng-10949	82	22	the	the	DET
fumecheng-10949	82	23	cu	cu	PROPN
fumecheng-10949	82	24	thin	thin	ADJ
fumecheng-10949	82	25	films	film	NOUN
fumecheng-10949	82	26	.	.	PUNCT
fumecheng-10949	83	1	these	these	DET
fumecheng-10949	83	2	results	result	NOUN
fumecheng-10949	83	3	confirm	confirm	VERB
fumecheng-10949	83	4	that	that	PRON
fumecheng-10949	83	5	cap	cap	NOUN
fumecheng-10949	83	6	is	be	AUX
fumecheng-10949	83	7	more	more	ADV
fumecheng-10949	83	8	reliable	reliable	ADJ
fumecheng-10949	83	9	under	under	ADP
fumecheng-10949	83	10	large	large	ADJ
fumecheng-10949	83	11	numbers	number	NOUN
fumecheng-10949	83	12	of	of	ADP
fumecheng-10949	83	13	bending	bend	VERB
fumecheng-10949	83	14	cycles	cycle	NOUN
fumecheng-10949	83	15	compared	compare	VERB
fumecheng-10949	83	16	to	to	ADP
fumecheng-10949	83	17	single	single	ADJ
fumecheng-10949	83	18	cu	cu	PROPN
fumecheng-10949	83	19	thin	thin	ADJ
fumecheng-10949	83	20	films	film	NOUN
fumecheng-10949	83	21	.	.	PUNCT
fumecheng-10949	84	1	bending	bend	VERB
fumecheng-10949	84	2	fatigue	fatigue	NOUN
fumecheng-10949	84	3	behavior	behavior	NOUN
fumecheng-10949	84	4	of	of	ADP
fumecheng-10949	84	5	ag	ag	PROPN
fumecheng-10949	84	6	nanowire	nanowire	PROPN
fumecheng-10949	84	7	/	/	SYM
fumecheng-10949	84	8	cu	cu	PROPN
fumecheng-10949	84	9	thin	thin	ADJ
fumecheng-10949	84	10	-	-	PUNCT
fumecheng-10949	84	11	film	film	NOUN
fumecheng-10949	84	12	hybrid	hybrid	ADJ
fumecheng-10949	84	13	interconnects	interconnect	NOUN
fumecheng-10949	84	14	for	for	ADP
fumecheng-10949	84	15	wearable	wearable	ADJ
fumecheng-10949	84	16	electronics	electronic	NOUN
fumecheng-10949	84	17	557	557	NUM
fumecheng-10949	84	18	(	(	PUNCT
fumecheng-10949	84	19	a	a	NOUN
fumecheng-10949	84	20	)	)	PUNCT
fumecheng-10949	84	21	(	(	PUNCT
fumecheng-10949	84	22	b	b	X
fumecheng-10949	84	23	)	)	PUNCT
fumecheng-10949	84	24	fig	fig	NOUN
fumecheng-10949	84	25	.	.	PUNCT
fumecheng-10949	85	1	4	4	NUM
fumecheng-10949	85	2	(	(	PUNCT
fumecheng-10949	85	3	a	a	NOUN
fumecheng-10949	85	4	)	)	PUNCT
fumecheng-10949	85	5	normalized	normalize	VERB
fumecheng-10949	85	6	resistance	resistance	NOUN
fumecheng-10949	85	7	changes	change	NOUN
fumecheng-10949	85	8	in	in	ADP
fumecheng-10949	85	9	cap	cap	NOUN
fumecheng-10949	85	10	and	and	CCONJ
fumecheng-10949	85	11	cu	cu	PROPN
fumecheng-10949	85	12	thin	thin	ADJ
fumecheng-10949	85	13	films	film	NOUN
fumecheng-10949	85	14	as	as	ADP
fumecheng-10949	85	15	a	a	DET
fumecheng-10949	85	16	function	function	NOUN
fumecheng-10949	85	17	of	of	ADP
fumecheng-10949	85	18	the	the	DET
fumecheng-10949	85	19	number	number	NOUN
fumecheng-10949	85	20	of	of	ADP
fumecheng-10949	85	21	bending	bend	VERB
fumecheng-10949	85	22	cycles	cycle	NOUN
fumecheng-10949	85	23	,	,	PUNCT
fumecheng-10949	85	24	and	and	CCONJ
fumecheng-10949	85	25	(	(	PUNCT
fumecheng-10949	85	26	b	b	NOUN
fumecheng-10949	85	27	)	)	PUNCT
fumecheng-10949	85	28	replotted	replotte	VERB
fumecheng-10949	85	29	results	result	NOUN
fumecheng-10949	85	30	in	in	ADP
fumecheng-10949	85	31	the	the	DET
fumecheng-10949	85	32	early	early	ADJ
fumecheng-10949	85	33	stage	stage	NOUN
fumecheng-10949	85	34	of	of	ADP
fumecheng-10949	85	35	bending	bend	VERB
fumecheng-10949	85	36	cycles	cycle	NOUN
fumecheng-10949	85	37	,	,	PUNCT
fumecheng-10949	85	38	30,000	30,000	NUM
fumecheng-10949	85	39	cycles	cycle	NOUN
fumecheng-10949	85	40	to	to	PART
fumecheng-10949	85	41	investigate	investigate	VERB
fumecheng-10949	85	42	the	the	DET
fumecheng-10949	85	43	mechanism	mechanism	NOUN
fumecheng-10949	85	44	of	of	ADP
fumecheng-10949	85	45	enhanced	enhanced	ADJ
fumecheng-10949	85	46	reliability	reliability	NOUN
fumecheng-10949	85	47	of	of	ADP
fumecheng-10949	85	48	cap	cap	NOUN
fumecheng-10949	85	49	under	under	ADP
fumecheng-10949	85	50	bending	bend	VERB
fumecheng-10949	85	51	fatigue	fatigue	NOUN
fumecheng-10949	85	52	,	,	PUNCT
fumecheng-10949	85	53	sem	sem	NOUN
fumecheng-10949	85	54	images	image	NOUN
fumecheng-10949	85	55	were	be	AUX
fumecheng-10949	85	56	taken	take	VERB
fumecheng-10949	85	57	for	for	ADP
fumecheng-10949	85	58	the	the	DET
fumecheng-10949	85	59	cap	cap	NOUN
fumecheng-10949	85	60	and	and	CCONJ
fumecheng-10949	85	61	cu	cu	PROPN
fumecheng-10949	85	62	thin	thin	ADJ
fumecheng-10949	85	63	films	film	NOUN
fumecheng-10949	85	64	after	after	ADP
fumecheng-10949	85	65	imposing	impose	VERB
fumecheng-10949	85	66	300,000	300,000	NUM
fumecheng-10949	85	67	cycles	cycle	NOUN
fumecheng-10949	85	68	of	of	ADP
fumecheng-10949	85	69	bending	bending	NOUN
fumecheng-10949	85	70	,	,	PUNCT
fumecheng-10949	85	71	as	as	SCONJ
fumecheng-10949	85	72	shown	show	VERB
fumecheng-10949	85	73	in	in	ADP
fumecheng-10949	85	74	fig	fig	NOUN
fumecheng-10949	85	75	.	.	PUNCT
fumecheng-10949	86	1	3	3	X
fumecheng-10949	86	2	.	.	X
fumecheng-10949	86	3	the	the	DET
fumecheng-10949	86	4	cu	cu	PROPN
fumecheng-10949	86	5	thin	thin	PROPN
fumecheng-10949	86	6	films	film	NOUN
fumecheng-10949	86	7	showed	show	VERB
fumecheng-10949	86	8	multiple	multiple	ADJ
fumecheng-10949	86	9	cracks	crack	NOUN
fumecheng-10949	86	10	on	on	ADP
fumecheng-10949	86	11	the	the	DET
fumecheng-10949	86	12	entire	entire	ADJ
fumecheng-10949	86	13	film	film	NOUN
fumecheng-10949	86	14	area	area	NOUN
fumecheng-10949	86	15	.	.	PUNCT
fumecheng-10949	87	1	the	the	DET
fumecheng-10949	87	2	enlarged	enlarge	VERB
fumecheng-10949	87	3	image	image	NOUN
fumecheng-10949	87	4	of	of	ADP
fumecheng-10949	87	5	the	the	DET
fumecheng-10949	87	6	cracks	crack	NOUN
fumecheng-10949	87	7	shows	show	VERB
fumecheng-10949	87	8	extrusion	extrusion	ADJ
fumecheng-10949	87	9	formation	formation	NOUN
fumecheng-10949	87	10	(	(	PUNCT
fumecheng-10949	87	11	fig	fig	NOUN
fumecheng-10949	87	12	.	.	PUNCT
fumecheng-10949	87	13	3a	3a	NUM
fumecheng-10949	87	14	)	)	PUNCT
fumecheng-10949	87	15	.	.	PUNCT
fumecheng-10949	88	1	on	on	ADP
fumecheng-10949	88	2	the	the	DET
fumecheng-10949	88	3	contrary	contrary	NOUN
fumecheng-10949	88	4	,	,	PUNCT
fumecheng-10949	88	5	there	there	PRON
fumecheng-10949	88	6	was	be	VERB
fumecheng-10949	88	7	no	no	DET
fumecheng-10949	88	8	clear	clear	ADJ
fumecheng-10949	88	9	crack	crack	NOUN
fumecheng-10949	88	10	formation	formation	NOUN
fumecheng-10949	88	11	in	in	ADP
fumecheng-10949	88	12	the	the	DET
fumecheng-10949	88	13	cap	cap	NOUN
fumecheng-10949	88	14	,	,	PUNCT
fumecheng-10949	88	15	as	as	SCONJ
fumecheng-10949	88	16	seen	see	VERB
fumecheng-10949	88	17	in	in	ADP
fumecheng-10949	88	18	fig	fig	NOUN
fumecheng-10949	88	19	.	.	PUNCT
fumecheng-10949	89	1	3b	3b	NUM
fumecheng-10949	89	2	.	.	PUNCT
fumecheng-10949	90	1	wavy	wavy	ADJ
fumecheng-10949	90	2	traces	trace	NOUN
fumecheng-10949	90	3	were	be	AUX
fumecheng-10949	90	4	observed	observe	VERB
fumecheng-10949	90	5	in	in	ADP
fumecheng-10949	90	6	the	the	DET
fumecheng-10949	90	7	cap	cap	NOUN
fumecheng-10949	90	8	after	after	ADP
fumecheng-10949	90	9	imposing	impose	VERB
fumecheng-10949	90	10	300,000	300,000	NUM
fumecheng-10949	90	11	cycles	cycle	NOUN
fumecheng-10949	90	12	of	of	ADP
fumecheng-10949	90	13	bending	bend	VERB
fumecheng-10949	90	14	(	(	PUNCT
fumecheng-10949	90	15	the	the	DET
fumecheng-10949	90	16	lower	low	ADJ
fumecheng-10949	90	17	inset	inset	NOUN
fumecheng-10949	90	18	of	of	ADP
fumecheng-10949	90	19	fig	fig	NOUN
fumecheng-10949	90	20	.	.	PUNCT
fumecheng-10949	91	1	3b	3b	NUM
fumecheng-10949	91	2	)	)	PUNCT
fumecheng-10949	91	3	.	.	PUNCT
fumecheng-10949	92	1	fig	fig	NOUN
fumecheng-10949	92	2	.	.	PUNCT
fumecheng-10949	93	1	5	5	NUM
fumecheng-10949	93	2	sem	sem	NOUN
fumecheng-10949	93	3	images	image	NOUN
fumecheng-10949	93	4	of	of	ADP
fumecheng-10949	93	5	(	(	PUNCT
fumecheng-10949	93	6	a	a	X
fumecheng-10949	93	7	)	)	PUNCT
fumecheng-10949	93	8	cu	cu	PROPN
fumecheng-10949	93	9	thin	thin	ADJ
fumecheng-10949	93	10	films	film	NOUN
fumecheng-10949	93	11	and	and	CCONJ
fumecheng-10949	93	12	(	(	PUNCT
fumecheng-10949	93	13	b	b	NOUN
fumecheng-10949	93	14	)	)	PUNCT
fumecheng-10949	93	15	cap	cap	NOUN
fumecheng-10949	93	16	after	after	ADP
fumecheng-10949	93	17	300,000	300,000	NUM
fumecheng-10949	93	18	bending	bend	VERB
fumecheng-10949	93	19	cycles	cycle	NOUN
fumecheng-10949	93	20	4	4	NUM
fumecheng-10949	93	21	.	.	PUNCT
fumecheng-10949	93	22	discussion	discussion	NOUN
fumecheng-10949	93	23	the	the	DET
fumecheng-10949	93	24	enhanced	enhanced	ADJ
fumecheng-10949	93	25	mechanical	mechanical	ADJ
fumecheng-10949	93	26	reliability	reliability	NOUN
fumecheng-10949	93	27	for	for	ADP
fumecheng-10949	93	28	cap	cap	NOUN
fumecheng-10949	93	29	film	film	NOUN
fumecheng-10949	93	30	can	can	AUX
fumecheng-10949	93	31	be	be	AUX
fumecheng-10949	93	32	attributed	attribute	VERB
fumecheng-10949	93	33	to	to	ADP
fumecheng-10949	93	34	two	two	NUM
fumecheng-10949	93	35	factors	factor	NOUN
fumecheng-10949	93	36	:	:	PUNCT
fumecheng-10949	93	37	(	(	PUNCT
fumecheng-10949	93	38	1	1	X
fumecheng-10949	93	39	)	)	PUNCT
fumecheng-10949	93	40	stress	stress	NOUN
fumecheng-10949	93	41	relaxation	relaxation	NOUN
fumecheng-10949	93	42	by	by	ADP
fumecheng-10949	93	43	forming	form	VERB
fumecheng-10949	93	44	wavy	wavy	ADJ
fumecheng-10949	93	45	structure	structure	NOUN
fumecheng-10949	93	46	and	and	CCONJ
fumecheng-10949	93	47	(	(	PUNCT
fumecheng-10949	93	48	2	2	X
fumecheng-10949	93	49	)	)	PUNCT
fumecheng-10949	93	50	reduced	reduced	ADJ
fumecheng-10949	93	51	strain	strain	NOUN
fumecheng-10949	93	52	by	by	ADP
fumecheng-10949	93	53	the	the	DET
fumecheng-10949	93	54	relocation	relocation	NOUN
fumecheng-10949	93	55	of	of	ADP
fumecheng-10949	93	56	neutral	neutral	ADJ
fumecheng-10949	93	57	plain	plain	NOUN
fumecheng-10949	93	58	due	due	ADP
fumecheng-10949	93	59	to	to	ADP
fumecheng-10949	93	60	the	the	DET
fumecheng-10949	93	61	addition	addition	NOUN
fumecheng-10949	93	62	of	of	ADP
fumecheng-10949	93	63	ag	ag	PROPN
fumecheng-10949	93	64	nanowires	nanowire	NOUN
fumecheng-10949	93	65	.	.	PUNCT
fumecheng-10949	94	1	as	as	SCONJ
fumecheng-10949	94	2	shown	show	VERB
fumecheng-10949	94	3	in	in	ADP
fumecheng-10949	94	4	the	the	DET
fumecheng-10949	94	5	upper	upper	ADJ
fumecheng-10949	94	6	inset	inset	NOUN
fumecheng-10949	94	7	of	of	ADP
fumecheng-10949	94	8	fig	fig	NOUN
fumecheng-10949	94	9	.	.	PUNCT
fumecheng-10949	95	1	3a	3a	NUM
fumecheng-10949	95	2	,	,	PUNCT
fumecheng-10949	95	3	cu	cu	PROPN
fumecheng-10949	95	4	thin	thin	ADJ
fumecheng-10949	95	5	films	film	NOUN
fumecheng-10949	95	6	showed	show	VERB
fumecheng-10949	95	7	no	no	DET
fumecheng-10949	95	8	cracks	crack	NOUN
fumecheng-10949	95	9	before	before	ADP
fumecheng-10949	95	10	bending	bend	VERB
fumecheng-10949	95	11	.	.	PUNCT
fumecheng-10949	96	1	under	under	ADP
fumecheng-10949	96	2	repeated	repeat	VERB
fumecheng-10949	96	3	bending	bending	NOUN
fumecheng-10949	96	4	,	,	PUNCT
fumecheng-10949	96	5	dislocation	dislocation	NOUN
fumecheng-10949	96	6	accumulation	accumulation	NOUN
fumecheng-10949	96	7	occurred	occur	VERB
fumecheng-10949	96	8	at	at	ADP
fumecheng-10949	96	9	the	the	DET
fumecheng-10949	96	10	interface	interface	NOUN
fumecheng-10949	96	11	between	between	ADP
fumecheng-10949	96	12	the	the	DET
fumecheng-10949	96	13	thin	thin	ADJ
fumecheng-10949	96	14	film	film	NOUN
fumecheng-10949	96	15	and	and	CCONJ
fumecheng-10949	96	16	substrate	substrate	NOUN
fumecheng-10949	96	17	(	(	PUNCT
fumecheng-10949	96	18	fig	fig	NOUN
fumecheng-10949	96	19	.	.	PUNCT
fumecheng-10949	97	1	6a	6a	NOUN
fumecheng-10949	97	2	)	)	PUNCT
fumecheng-10949	97	3	,	,	PUNCT
fumecheng-10949	97	4	which	which	PRON
fumecheng-10949	97	5	resulted	result	VERB
fumecheng-10949	97	6	in	in	ADP
fumecheng-10949	97	7	extrusion	extrusion	ADJ
fumecheng-10949	97	8	formation	formation	NOUN
fumecheng-10949	97	9	(	(	PUNCT
fumecheng-10949	97	10	the	the	DET
fumecheng-10949	97	11	lower	low	ADJ
fumecheng-10949	97	12	inset	inset	NOUN
fumecheng-10949	97	13	of	of	ADP
fumecheng-10949	97	14	fig	fig	NOUN
fumecheng-10949	97	15	.	.	PUNCT
fumecheng-10949	98	1	3a	3a	NUM
fumecheng-10949	98	2	)	)	PUNCT
fumecheng-10949	98	3	.	.	PUNCT
fumecheng-10949	99	1	with	with	ADP
fumecheng-10949	99	2	the	the	DET
fumecheng-10949	99	3	progression	progression	NOUN
fumecheng-10949	99	4	of	of	ADP
fumecheng-10949	99	5	bending	bend	VERB
fumecheng-10949	99	6	fatigue	fatigue	NOUN
fumecheng-10949	99	7	,	,	PUNCT
fumecheng-10949	99	8	the	the	DET
fumecheng-10949	99	9	stress	stress	NOUN
fumecheng-10949	99	10	localized	localize	VERB
fumecheng-10949	99	11	on	on	ADP
fumecheng-10949	99	12	the	the	DET
fumecheng-10949	99	13	extrusion	extrusion	NOUN
fumecheng-10949	99	14	,	,	PUNCT
fumecheng-10949	99	15	which	which	PRON
fumecheng-10949	99	16	led	lead	VERB
fumecheng-10949	99	17	to	to	ADP
fumecheng-10949	99	18	the	the	DET
fumecheng-10949	99	19	generation	generation	NOUN
fumecheng-10949	99	20	of	of	ADP
fumecheng-10949	99	21	cracks	crack	NOUN
fumecheng-10949	99	22	(	(	PUNCT
fumecheng-10949	99	23	fig	fig	NOUN
fumecheng-10949	99	24	.	.	PUNCT
fumecheng-10949	100	1	6a	6a	NOUN
fumecheng-10949	100	2	)	)	PUNCT
fumecheng-10949	100	3	.	.	PUNCT
fumecheng-10949	101	1	the	the	DET
fumecheng-10949	101	2	crack	crack	NOUN
fumecheng-10949	101	3	formation	formation	NOUN
fumecheng-10949	101	4	degraded	degrade	VERB
fumecheng-10949	101	5	the	the	DET
fumecheng-10949	101	6	electrical	electrical	ADJ
fumecheng-10949	101	7	conductivity	conductivity	NOUN
fumecheng-10949	101	8	of	of	ADP
fumecheng-10949	101	9	the	the	DET
fumecheng-10949	101	10	metal	metal	NOUN
fumecheng-10949	101	11	thin	thin	ADJ
fumecheng-10949	101	12	films	film	NOUN
fumecheng-10949	101	13	.	.	PUNCT
fumecheng-10949	102	1	as	as	SCONJ
fumecheng-10949	102	2	shown	show	VERB
fumecheng-10949	102	3	in	in	ADP
fumecheng-10949	102	4	the	the	DET
fumecheng-10949	102	5	upper	upper	ADJ
fumecheng-10949	102	6	inset	inset	NOUN
fumecheng-10949	102	7	of	of	ADP
fumecheng-10949	102	8	fig	fig	NOUN
fumecheng-10949	102	9	.	.	PUNCT
fumecheng-10949	103	1	3b	3b	NUM
fumecheng-10949	103	2	,	,	PUNCT
fumecheng-10949	103	3	the	the	DET
fumecheng-10949	103	4	cap	cap	NOUN
fumecheng-10949	103	5	showed	show	VERB
fumecheng-10949	103	6	no	no	DET
fumecheng-10949	103	7	wavy	wavy	ADJ
fumecheng-10949	103	8	structure	structure	NOUN
fumecheng-10949	103	9	before	before	ADP
fumecheng-10949	103	10	bending	bend	VERB
fumecheng-10949	103	11	.	.	PUNCT
fumecheng-10949	104	1	the	the	DET
fumecheng-10949	104	2	wavy	wavy	ADJ
fumecheng-10949	104	3	structure	structure	NOUN
fumecheng-10949	104	4	could	could	AUX
fumecheng-10949	104	5	be	be	AUX
fumecheng-10949	104	6	attributed	attribute	VERB
fumecheng-10949	104	7	to	to	ADP
fumecheng-10949	104	8	the	the	DET
fumecheng-10949	104	9	delamination	delamination	NOUN
fumecheng-10949	104	10	of	of	ADP
fumecheng-10949	104	11	the	the	DET
fumecheng-10949	104	12	thin	thin	ADJ
fumecheng-10949	104	13	film	film	NOUN
fumecheng-10949	104	14	from	from	ADP
fumecheng-10949	104	15	the	the	DET
fumecheng-10949	104	16	558	558	NUM
fumecheng-10949	104	17	b.	b.	PROPN
fumecheng-10949	104	18	hwang	hwang	PROPN
fumecheng-10949	104	19	,	,	PUNCT
fumecheng-10949	104	20	y.	y.	PROPN
fumecheng-10949	104	21	han	han	PROPN
fumecheng-10949	104	22	,	,	PUNCT
fumecheng-10949	104	23	p.	p.	NOUN
fumecheng-10949	104	24	matteini	matteini	NOUN
fumecheng-10949	104	25	substrate	substrate	NOUN
fumecheng-10949	104	26	owing	owe	VERB
fumecheng-10949	104	27	to	to	ADP
fumecheng-10949	104	28	the	the	DET
fumecheng-10949	104	29	weak	weak	ADJ
fumecheng-10949	104	30	adhesion	adhesion	NOUN
fumecheng-10949	104	31	of	of	ADP
fumecheng-10949	104	32	ag	ag	PROPN
fumecheng-10949	104	33	nanowires	nanowire	NOUN
fumecheng-10949	104	34	with	with	ADP
fumecheng-10949	104	35	the	the	DET
fumecheng-10949	104	36	pi	pi	NOUN
fumecheng-10949	104	37	substrate	substrate	NOUN
fumecheng-10949	104	38	(	(	PUNCT
fumecheng-10949	104	39	fig	fig	NOUN
fumecheng-10949	104	40	.	.	PUNCT
fumecheng-10949	104	41	6b	6b	NOUN
fumecheng-10949	104	42	)	)	PUNCT
fumecheng-10949	104	43	.	.	PUNCT
fumecheng-10949	105	1	in	in	ADP
fumecheng-10949	105	2	the	the	DET
fumecheng-10949	105	3	cap	cap	NOUN
fumecheng-10949	105	4	,	,	PUNCT
fumecheng-10949	105	5	cu	cu	PROPN
fumecheng-10949	105	6	was	be	AUX
fumecheng-10949	105	7	attached	attach	VERB
fumecheng-10949	105	8	to	to	ADP
fumecheng-10949	105	9	the	the	DET
fumecheng-10949	105	10	substrate	substrate	NOUN
fumecheng-10949	105	11	with	with	ADP
fumecheng-10949	105	12	relatively	relatively	ADV
fumecheng-10949	105	13	high	high	ADJ
fumecheng-10949	105	14	bonding	bonding	NOUN
fumecheng-10949	105	15	forces	force	NOUN
fumecheng-10949	105	16	,	,	PUNCT
fumecheng-10949	105	17	whereas	whereas	SCONJ
fumecheng-10949	105	18	the	the	DET
fumecheng-10949	105	19	ag	ag	PROPN
fumecheng-10949	105	20	nanowires	nanowire	NOUN
fumecheng-10949	105	21	were	be	AUX
fumecheng-10949	105	22	weakly	weakly	ADV
fumecheng-10949	105	23	attached	attach	VERB
fumecheng-10949	105	24	by	by	ADP
fumecheng-10949	105	25	physical	physical	ADJ
fumecheng-10949	105	26	bonding	bonding	NOUN
fumecheng-10949	105	27	forces	force	NOUN
fumecheng-10949	105	28	,	,	PUNCT
fumecheng-10949	105	29	such	such	ADJ
fumecheng-10949	105	30	as	as	ADP
fumecheng-10949	105	31	van	van	PROPN
fumecheng-10949	105	32	der	der	NOUN
fumecheng-10949	105	33	waals	waal	NOUN
fumecheng-10949	105	34	or	or	CCONJ
fumecheng-10949	105	35	electrostatic	electrostatic	ADJ
fumecheng-10949	105	36	forces	force	NOUN
fumecheng-10949	105	37	.	.	PUNCT
fumecheng-10949	106	1	under	under	ADP
fumecheng-10949	106	2	the	the	DET
fumecheng-10949	106	3	cyclic	cyclic	ADJ
fumecheng-10949	106	4	bending	bending	NOUN
fumecheng-10949	106	5	,	,	PUNCT
fumecheng-10949	106	6	the	the	DET
fumecheng-10949	106	7	weak	weak	ADJ
fumecheng-10949	106	8	interface	interface	NOUN
fumecheng-10949	106	9	resulted	result	VERB
fumecheng-10949	106	10	from	from	ADP
fumecheng-10949	106	11	ag	ag	PROPN
fumecheng-10949	106	12	nanowires	nanowire	NOUN
fumecheng-10949	106	13	can	can	AUX
fumecheng-10949	106	14	cause	cause	VERB
fumecheng-10949	106	15	delamination	delamination	NOUN
fumecheng-10949	106	16	or	or	CCONJ
fumecheng-10949	106	17	interfacial	interfacial	NOUN
fumecheng-10949	106	18	sliding	sliding	NOUN
fumecheng-10949	106	19	of	of	ADP
fumecheng-10949	106	20	thin	thin	ADJ
fumecheng-10949	106	21	films	film	NOUN
fumecheng-10949	106	22	,	,	PUNCT
fumecheng-10949	106	23	forming	form	VERB
fumecheng-10949	106	24	the	the	DET
fumecheng-10949	106	25	wavy	wavy	ADJ
fumecheng-10949	106	26	structure	structure	NOUN
fumecheng-10949	106	27	.	.	PUNCT
fumecheng-10949	107	1	such	such	ADJ
fumecheng-10949	107	2	wavy	wavy	ADJ
fumecheng-10949	107	3	structure	structure	NOUN
fumecheng-10949	107	4	might	might	AUX
fumecheng-10949	107	5	have	have	AUX
fumecheng-10949	107	6	induced	induce	VERB
fumecheng-10949	107	7	micro	micro	NOUN
fumecheng-10949	107	8	-	-	NOUN
fumecheng-10949	107	9	cracks	crack	NOUN
fumecheng-10949	107	10	,	,	PUNCT
fumecheng-10949	107	11	which	which	PRON
fumecheng-10949	107	12	were	be	AUX
fumecheng-10949	107	13	not	not	PART
fumecheng-10949	107	14	observed	observe	VERB
fumecheng-10949	107	15	in	in	ADP
fumecheng-10949	107	16	the	the	DET
fumecheng-10949	107	17	sem	sem	NOUN
fumecheng-10949	107	18	images	image	NOUN
fumecheng-10949	107	19	because	because	SCONJ
fumecheng-10949	107	20	the	the	DET
fumecheng-10949	107	21	cracks	crack	NOUN
fumecheng-10949	107	22	were	be	AUX
fumecheng-10949	107	23	closed	close	VERB
fumecheng-10949	107	24	in	in	ADP
fumecheng-10949	107	25	the	the	DET
fumecheng-10949	107	26	no	no	DET
fumecheng-10949	107	27	-	-	PUNCT
fumecheng-10949	107	28	strain	strain	NOUN
fumecheng-10949	107	29	state	state	NOUN
fumecheng-10949	107	30	(	(	PUNCT
fumecheng-10949	107	31	fig	fig	NOUN
fumecheng-10949	107	32	.	.	PUNCT
fumecheng-10949	107	33	6b	6b	NUM
fumecheng-10949	107	34	)	)	PUNCT
fumecheng-10949	107	35	.	.	PUNCT
fumecheng-10949	108	1	because	because	SCONJ
fumecheng-10949	108	2	of	of	ADP
fumecheng-10949	108	3	the	the	DET
fumecheng-10949	108	4	micro	micro	NOUN
fumecheng-10949	108	5	-	-	NOUN
fumecheng-10949	108	6	cracks	crack	NOUN
fumecheng-10949	108	7	,	,	PUNCT
fumecheng-10949	108	8	an	an	DET
fumecheng-10949	108	9	increase	increase	NOUN
fumecheng-10949	108	10	in	in	ADP
fumecheng-10949	108	11	resistance	resistance	NOUN
fumecheng-10949	108	12	was	be	AUX
fumecheng-10949	108	13	observed	observe	VERB
fumecheng-10949	108	14	in	in	ADP
fumecheng-10949	108	15	the	the	DET
fumecheng-10949	108	16	cap	cap	NOUN
fumecheng-10949	108	17	.	.	PUNCT
fumecheng-10949	109	1	however	however	ADV
fumecheng-10949	109	2	,	,	PUNCT
fumecheng-10949	109	3	there	there	PRON
fumecheng-10949	109	4	were	be	VERB
fumecheng-10949	109	5	no	no	DET
fumecheng-10949	109	6	long	long	ADJ
fumecheng-10949	109	7	-	-	PUNCT
fumecheng-10949	109	8	range	range	NOUN
fumecheng-10949	109	9	cracks	crack	NOUN
fumecheng-10949	109	10	in	in	ADP
fumecheng-10949	109	11	the	the	DET
fumecheng-10949	109	12	cap	cap	NOUN
fumecheng-10949	109	13	,	,	PUNCT
fumecheng-10949	109	14	unlike	unlike	ADP
fumecheng-10949	109	15	in	in	ADP
fumecheng-10949	109	16	the	the	DET
fumecheng-10949	109	17	cu	cu	PROPN
fumecheng-10949	109	18	thin	thin	ADJ
fumecheng-10949	109	19	films	film	NOUN
fumecheng-10949	109	20	;	;	PUNCT
fumecheng-10949	109	21	thus	thus	ADV
fumecheng-10949	109	22	,	,	PUNCT
fumecheng-10949	109	23	the	the	DET
fumecheng-10949	109	24	increase	increase	NOUN
fumecheng-10949	109	25	in	in	ADP
fumecheng-10949	109	26	resistance	resistance	NOUN
fumecheng-10949	109	27	was	be	AUX
fumecheng-10949	109	28	smaller	small	ADJ
fumecheng-10949	109	29	for	for	ADP
fumecheng-10949	109	30	the	the	DET
fumecheng-10949	109	31	cap	cap	NOUN
fumecheng-10949	109	32	than	than	ADP
fumecheng-10949	109	33	for	for	ADP
fumecheng-10949	109	34	the	the	DET
fumecheng-10949	109	35	cu	cu	PROPN
fumecheng-10949	109	36	thin	thin	ADJ
fumecheng-10949	109	37	films	film	NOUN
fumecheng-10949	109	38	.	.	PUNCT
fumecheng-10949	110	1	in	in	ADP
fumecheng-10949	110	2	the	the	DET
fumecheng-10949	110	3	initial	initial	ADJ
fumecheng-10949	110	4	stage	stage	NOUN
fumecheng-10949	110	5	of	of	ADP
fumecheng-10949	110	6	bending	bend	VERB
fumecheng-10949	110	7	,	,	PUNCT
fumecheng-10949	110	8	however	however	ADV
fumecheng-10949	110	9	,	,	PUNCT
fumecheng-10949	110	10	the	the	DET
fumecheng-10949	110	11	cap	cap	NOUN
fumecheng-10949	110	12	underwent	undergo	VERB
fumecheng-10949	110	13	the	the	DET
fumecheng-10949	110	14	deformation	deformation	NOUN
fumecheng-10949	110	15	by	by	ADP
fumecheng-10949	110	16	forming	form	VERB
fumecheng-10949	110	17	wavy	wavy	ADJ
fumecheng-10949	110	18	structure	structure	NOUN
fumecheng-10949	110	19	,	,	PUNCT
fumecheng-10949	110	20	which	which	PRON
fumecheng-10949	110	21	was	be	AUX
fumecheng-10949	110	22	earlier	early	ADJ
fumecheng-10949	110	23	than	than	ADP
fumecheng-10949	110	24	the	the	DET
fumecheng-10949	110	25	point	point	NOUN
fumecheng-10949	110	26	where	where	SCONJ
fumecheng-10949	110	27	the	the	DET
fumecheng-10949	110	28	crack	crack	NOUN
fumecheng-10949	110	29	formation	formation	NOUN
fumecheng-10949	110	30	and	and	CCONJ
fumecheng-10949	110	31	propagation	propagation	NOUN
fumecheng-10949	110	32	of	of	ADP
fumecheng-10949	110	33	single	single	ADJ
fumecheng-10949	110	34	cu	cu	PROPN
fumecheng-10949	110	35	thin	thin	ADJ
fumecheng-10949	110	36	films	film	NOUN
fumecheng-10949	110	37	occurred	occur	VERB
fumecheng-10949	110	38	.	.	PUNCT
fumecheng-10949	111	1	during	during	ADP
fumecheng-10949	111	2	which	which	PRON
fumecheng-10949	111	3	,	,	PUNCT
fumecheng-10949	111	4	short	short	ADJ
fumecheng-10949	111	5	range	range	NOUN
fumecheng-10949	111	6	of	of	ADP
fumecheng-10949	111	7	micro	micro	ADJ
fumecheng-10949	111	8	cracks	crack	NOUN
fumecheng-10949	111	9	can	can	AUX
fumecheng-10949	111	10	be	be	AUX
fumecheng-10949	111	11	formed	form	VERB
fumecheng-10949	111	12	at	at	ADP
fumecheng-10949	111	13	the	the	DET
fumecheng-10949	111	14	wavy	wavy	ADJ
fumecheng-10949	111	15	structure	structure	NOUN
fumecheng-10949	111	16	of	of	ADP
fumecheng-10949	111	17	cap	cap	NOUN
fumecheng-10949	111	18	;	;	PUNCT
fumecheng-10949	111	19	thus	thus	ADV
fumecheng-10949	111	20	,	,	PUNCT
fumecheng-10949	111	21	the	the	DET
fumecheng-10949	111	22	resistance	resistance	NOUN
fumecheng-10949	111	23	can	can	AUX
fumecheng-10949	111	24	be	be	AUX
fumecheng-10949	111	25	slightly	slightly	ADV
fumecheng-10949	111	26	increased	increase	VERB
fumecheng-10949	111	27	.	.	PUNCT
fumecheng-10949	112	1	the	the	DET
fumecheng-10949	112	2	micro	micro	ADJ
fumecheng-10949	112	3	cracks	crack	NOUN
fumecheng-10949	112	4	are	be	AUX
fumecheng-10949	112	5	difficult	difficult	ADJ
fumecheng-10949	112	6	to	to	PART
fumecheng-10949	112	7	observe	observe	VERB
fumecheng-10949	112	8	in	in	ADP
fumecheng-10949	112	9	sem	sem	NOUN
fumecheng-10949	112	10	or	or	CCONJ
fumecheng-10949	112	11	tem	tem	PROPN
fumecheng-10949	112	12	because	because	SCONJ
fumecheng-10949	112	13	the	the	DET
fumecheng-10949	112	14	cracks	crack	NOUN
fumecheng-10949	112	15	are	be	AUX
fumecheng-10949	112	16	closed	closed	ADJ
fumecheng-10949	112	17	.	.	PUNCT
fumecheng-10949	113	1	thus	thus	ADV
fumecheng-10949	113	2	,	,	PUNCT
fumecheng-10949	113	3	the	the	DET
fumecheng-10949	113	4	resistance	resistance	NOUN
fumecheng-10949	113	5	increase	increase	NOUN
fumecheng-10949	113	6	of	of	ADP
fumecheng-10949	113	7	cap	cap	NOUN
fumecheng-10949	113	8	in	in	ADP
fumecheng-10949	113	9	the	the	DET
fumecheng-10949	113	10	initial	initial	ADJ
fumecheng-10949	113	11	stage	stage	NOUN
fumecheng-10949	113	12	was	be	AUX
fumecheng-10949	113	13	higher	high	ADJ
fumecheng-10949	113	14	than	than	ADP
fumecheng-10949	113	15	those	those	PRON
fumecheng-10949	113	16	of	of	ADP
fumecheng-10949	113	17	single	single	ADJ
fumecheng-10949	113	18	cu	cu	PROPN
fumecheng-10949	113	19	thin	thin	ADJ
fumecheng-10949	113	20	films	film	NOUN
fumecheng-10949	113	21	.	.	PUNCT
fumecheng-10949	114	1	(	(	PUNCT
fumecheng-10949	114	2	a	a	X
fumecheng-10949	114	3	)	)	PUNCT
fumecheng-10949	114	4	(	(	PUNCT
fumecheng-10949	114	5	b	b	X
fumecheng-10949	114	6	)	)	PUNCT
fumecheng-10949	114	7	fig	fig	NOUN
fumecheng-10949	114	8	.	.	PUNCT
fumecheng-10949	115	1	6	6	NUM
fumecheng-10949	115	2	illustration	illustration	NOUN
fumecheng-10949	115	3	of	of	ADP
fumecheng-10949	115	4	failure	failure	NOUN
fumecheng-10949	115	5	mechanism	mechanism	NOUN
fumecheng-10949	115	6	of	of	ADP
fumecheng-10949	115	7	(	(	PUNCT
fumecheng-10949	115	8	a	a	PRON
fumecheng-10949	115	9	)	)	PUNCT
fumecheng-10949	115	10	cu	cu	NOUN
fumecheng-10949	115	11	and	and	CCONJ
fumecheng-10949	115	12	(	(	PUNCT
fumecheng-10949	115	13	b	b	NOUN
fumecheng-10949	115	14	)	)	PUNCT
fumecheng-10949	115	15	cap	cap	NOUN
fumecheng-10949	115	16	films	film	NOUN
fumecheng-10949	115	17	under	under	ADP
fumecheng-10949	115	18	cyclic	cyclic	ADJ
fumecheng-10949	115	19	bending	bending	NOUN
fumecheng-10949	115	20	second	second	ADJ
fumecheng-10949	115	21	,	,	PUNCT
fumecheng-10949	115	22	the	the	DET
fumecheng-10949	115	23	relocation	relocation	NOUN
fumecheng-10949	115	24	of	of	ADP
fumecheng-10949	115	25	neutral	neutral	ADJ
fumecheng-10949	115	26	plane	plane	NOUN
fumecheng-10949	115	27	position	position	NOUN
fumecheng-10949	115	28	by	by	ADP
fumecheng-10949	115	29	the	the	DET
fumecheng-10949	115	30	addition	addition	NOUN
fumecheng-10949	115	31	of	of	ADP
fumecheng-10949	115	32	ag	ag	PROPN
fumecheng-10949	115	33	nanowires	nanowire	NOUN
fumecheng-10949	115	34	can	can	AUX
fumecheng-10949	115	35	vary	vary	VERB
fumecheng-10949	115	36	the	the	DET
fumecheng-10949	115	37	strain	strain	NOUN
fumecheng-10949	115	38	imposed	impose	VERB
fumecheng-10949	115	39	on	on	ADP
fumecheng-10949	115	40	the	the	DET
fumecheng-10949	115	41	metal	metal	NOUN
fumecheng-10949	115	42	thin	thin	ADJ
fumecheng-10949	115	43	film	film	NOUN
fumecheng-10949	115	44	as	as	SCONJ
fumecheng-10949	115	45	shown	show	VERB
fumecheng-10949	115	46	in	in	ADP
fumecheng-10949	115	47	fig	fig	NOUN
fumecheng-10949	115	48	.	.	PUNCT
fumecheng-10949	116	1	7	7	X
fumecheng-10949	116	2	.	.	X
fumecheng-10949	116	3	the	the	DET
fumecheng-10949	116	4	imposed	impose	VERB
fumecheng-10949	116	5	bending	bending	NOUN
fumecheng-10949	116	6	strain	strain	NOUN
fumecheng-10949	116	7	is	be	AUX
fumecheng-10949	116	8	calculated	calculate	VERB
fumecheng-10949	116	9	by	by	ADP
fumecheng-10949	116	10	the	the	DET
fumecheng-10949	116	11	equation	equation	NOUN
fumecheng-10949	116	12	:	:	PUNCT
fumecheng-10949	116	13	2	2	NUM
fumecheng-10949	116	14	2	2	NUM
fumecheng-10949	116	15	1	1	NUM
fumecheng-10949	116	16	0	0	NUM
fumecheng-10949	116	17	1	1	NUM
fumecheng-10949	116	18	0	0	NUM
fumecheng-10949	116	19	(	(	PUNCT
fumecheng-10949	116	20	)	)	PUNCT
fumecheng-10949	116	21	2	2	NUM
fumecheng-10949	116	22	(	(	PUNCT
fumecheng-10949	116	23	)	)	PUNCT
fumecheng-10949	116	24	n	n	CCONJ
fumecheng-10949	116	25	i	i	PRON
fumecheng-10949	116	26	i	i	PRON
fumecheng-10949	117	1	i	i	VERB
fumecheng-10949	117	2	i	i	PRON
fumecheng-10949	118	1	n	n	VERB
fumecheng-10949	119	1	i	i	PRON
fumecheng-10949	120	1	i	i	PRON
fumecheng-10949	121	1	i	i	PRON
fumecheng-10949	122	1	i	i	VERB
fumecheng-10949	123	1	b	b	VERB
fumecheng-10949	123	2	y	y	VERB
fumecheng-10949	123	3	y	y	PROPN
fumecheng-10949	123	4	s	s	PROPN
fumecheng-10949	123	5	b	b	PROPN
fumecheng-10949	123	6	y	y	PROPN
fumecheng-10949	123	7	y	y	PROPN
fumecheng-10949	123	8	+	+	CCONJ
fumecheng-10949	123	9	=	=	PUNCT
fumecheng-10949	124	1	+	+	NUM
fumecheng-10949	124	2	=	=	SYM
fumecheng-10949	124	3	−	−	PROPN
fumecheng-10949	124	4	=	=	SYM
fumecheng-10949	124	5	−	−	PROPN
fumecheng-10949	124	6			X
fumecheng-10949	124	7			X
fumecheng-10949	124	8	(	(	PUNCT
fumecheng-10949	124	9	2	2	X
fumecheng-10949	124	10	)	)	PUNCT
fumecheng-10949	124	11	where	where	SCONJ
fumecheng-10949	124	12	s	s	ADP
fumecheng-10949	124	13	,	,	PUNCT
fumecheng-10949	124	14	b	b	NOUN
fumecheng-10949	124	15	and	and	CCONJ
fumecheng-10949	124	16	y(i+1	y(i+1	NUM
fumecheng-10949	124	17	)	)	PUNCT
fumecheng-10949	125	1	−	−	PROPN
fumecheng-10949	125	2	y1	y1	INTJ
fumecheng-10949	125	3	(	(	PUNCT
fumecheng-10949	125	4	δy	δy	NOUN
fumecheng-10949	125	5	)	)	PUNCT
fumecheng-10949	125	6	are	be	AUX
fumecheng-10949	125	7	the	the	DET
fumecheng-10949	125	8	neutral	neutral	ADJ
fumecheng-10949	125	9	plane	plane	NOUN
fumecheng-10949	125	10	position	position	NOUN
fumecheng-10949	125	11	,	,	PUNCT
fumecheng-10949	125	12	the	the	DET
fumecheng-10949	125	13	biaxial	biaxial	ADJ
fumecheng-10949	125	14	modulus	modulus	NOUN
fumecheng-10949	125	15	and	and	CCONJ
fumecheng-10949	125	16	the	the	DET
fumecheng-10949	125	17	thickness	thickness	NOUN
fumecheng-10949	125	18	of	of	ADP
fumecheng-10949	125	19	each	each	DET
fumecheng-10949	125	20	layer	layer	NOUN
fumecheng-10949	125	21	,	,	PUNCT
fumecheng-10949	125	22	respectively	respectively	ADV
fumecheng-10949	125	23	[	[	X
fumecheng-10949	125	24	14	14	NUM
fumecheng-10949	125	25	,	,	PUNCT
fumecheng-10949	125	26	24	24	NUM
fumecheng-10949	125	27	]	]	PUNCT
fumecheng-10949	125	28	.	.	PUNCT
fumecheng-10949	126	1	the	the	DET
fumecheng-10949	126	2	biaxial	biaxial	ADJ
fumecheng-10949	126	3	modulus	modulus	NOUN
fumecheng-10949	126	4	,	,	PUNCT
fumecheng-10949	126	5	b	b	NOUN
fumecheng-10949	126	6	,	,	PUNCT
fumecheng-10949	126	7	is	be	AUX
fumecheng-10949	126	8	calculated	calculate	VERB
fumecheng-10949	126	9	by	by	ADP
fumecheng-10949	126	10	the	the	DET
fumecheng-10949	126	11	equation	equation	NOUN
fumecheng-10949	126	12	:	:	PUNCT
fumecheng-10949	126	13	bending	bend	VERB
fumecheng-10949	126	14	fatigue	fatigue	NOUN
fumecheng-10949	126	15	behavior	behavior	NOUN
fumecheng-10949	126	16	of	of	ADP
fumecheng-10949	126	17	ag	ag	PROPN
fumecheng-10949	126	18	nanowire	nanowire	PROPN
fumecheng-10949	126	19	/	/	SYM
fumecheng-10949	126	20	cu	cu	PROPN
fumecheng-10949	126	21	thin	thin	ADJ
fumecheng-10949	126	22	-	-	PUNCT
fumecheng-10949	126	23	film	film	NOUN
fumecheng-10949	126	24	hybrid	hybrid	ADJ
fumecheng-10949	126	25	interconnects	interconnect	NOUN
fumecheng-10949	126	26	for	for	ADP
fumecheng-10949	126	27	wearable	wearable	ADJ
fumecheng-10949	126	28	electronics	electronic	NOUN
fumecheng-10949	126	29	559	559	NUM
fumecheng-10949	126	30	ν1−	ν1−	NOUN
fumecheng-10949	126	31	=	=	SYM
fumecheng-10949	126	32	e	e	PROPN
fumecheng-10949	126	33	b	b	PROPN
fumecheng-10949	126	34	(	(	PUNCT
fumecheng-10949	126	35	3	3	NUM
fumecheng-10949	126	36	)	)	PUNCT
fumecheng-10949	126	37	where	where	SCONJ
fumecheng-10949	126	38	e	e	NOUN
fumecheng-10949	126	39	is	be	AUX
fumecheng-10949	126	40	the	the	DET
fumecheng-10949	126	41	elastic	elastic	ADJ
fumecheng-10949	126	42	modulus	modulus	NOUN
fumecheng-10949	126	43	and	and	CCONJ
fumecheng-10949	126	44	ν	ν	PROPN
fumecheng-10949	126	45	is	be	AUX
fumecheng-10949	126	46	poisson	poisson	NOUN
fumecheng-10949	126	47	’s	’s	PART
fumecheng-10949	126	48	ratio	ratio	NOUN
fumecheng-10949	126	49	.	.	PUNCT
fumecheng-10949	127	1	table	table	NOUN
fumecheng-10949	127	2	1	1	NUM
fumecheng-10949	127	3	shows	show	VERB
fumecheng-10949	127	4	parameters	parameter	NOUN
fumecheng-10949	127	5	used	use	VERB
fumecheng-10949	127	6	for	for	ADP
fumecheng-10949	127	7	the	the	DET
fumecheng-10949	127	8	calculation	calculation	NOUN
fumecheng-10949	127	9	of	of	ADP
fumecheng-10949	127	10	neutral	neutral	ADJ
fumecheng-10949	127	11	plane	plane	NOUN
fumecheng-10949	127	12	position	position	NOUN
fumecheng-10949	127	13	.	.	PUNCT
fumecheng-10949	128	1	with	with	ADP
fumecheng-10949	128	2	those	those	DET
fumecheng-10949	128	3	parameters	parameter	NOUN
fumecheng-10949	128	4	,	,	PUNCT
fumecheng-10949	128	5	the	the	DET
fumecheng-10949	128	6	calculated	calculated	ADJ
fumecheng-10949	128	7	neutral	neutral	ADJ
fumecheng-10949	128	8	positions	position	NOUN
fumecheng-10949	128	9	were	be	AUX
fumecheng-10949	128	10	69.3	69.3	NUM
fumecheng-10949	128	11	and	and	CCONJ
fumecheng-10949	128	12	71.2	71.2	NUM
fumecheng-10949	128	13	µm	µm	NOUN
fumecheng-10949	128	14	for	for	ADP
fumecheng-10949	128	15	the	the	DET
fumecheng-10949	128	16	cu	cu	PROPN
fumecheng-10949	128	17	and	and	CCONJ
fumecheng-10949	128	18	cap	cap	NOUN
fumecheng-10949	128	19	films	film	NOUN
fumecheng-10949	128	20	,	,	PUNCT
fumecheng-10949	128	21	respectively	respectively	ADV
fumecheng-10949	128	22	.	.	PUNCT
fumecheng-10949	129	1	therefore	therefore	ADV
fumecheng-10949	129	2	,	,	PUNCT
fumecheng-10949	129	3	the	the	DET
fumecheng-10949	129	4	imposed	impose	VERB
fumecheng-10949	129	5	strains	strain	NOUN
fumecheng-10949	129	6	on	on	ADP
fumecheng-10949	129	7	the	the	DET
fumecheng-10949	129	8	cu	cu	PROPN
fumecheng-10949	129	9	and	and	CCONJ
fumecheng-10949	129	10	cap	cap	NOUN
fumecheng-10949	129	11	films	film	NOUN
fumecheng-10949	129	12	are	be	AUX
fumecheng-10949	129	13	calculated	calculate	VERB
fumecheng-10949	129	14	as	as	ADP
fumecheng-10949	129	15	2.8	2.8	NUM
fumecheng-10949	129	16	%	%	NOUN
fumecheng-10949	129	17	and	and	CCONJ
fumecheng-10949	129	18	2.7	2.7	NUM
fumecheng-10949	129	19	%	%	NOUN
fumecheng-10949	129	20	,	,	PUNCT
fumecheng-10949	129	21	respectively	respectively	ADV
fumecheng-10949	129	22	.	.	PUNCT
fumecheng-10949	130	1	the	the	DET
fumecheng-10949	130	2	difference	difference	NOUN
fumecheng-10949	130	3	between	between	ADP
fumecheng-10949	130	4	the	the	DET
fumecheng-10949	130	5	calculated	calculate	VERB
fumecheng-10949	130	6	imposed	impose	VERB
fumecheng-10949	130	7	strain	strain	NOUN
fumecheng-10949	130	8	values	value	NOUN
fumecheng-10949	130	9	was	be	AUX
fumecheng-10949	130	10	~0.1	~0.1	NOUN
fumecheng-10949	130	11	%	%	NOUN
fumecheng-10949	130	12	.	.	PUNCT
fumecheng-10949	131	1	although	although	SCONJ
fumecheng-10949	131	2	the	the	DET
fumecheng-10949	131	3	strain	strain	NOUN
fumecheng-10949	131	4	value	value	NOUN
fumecheng-10949	131	5	itself	itself	PRON
fumecheng-10949	131	6	is	be	AUX
fumecheng-10949	131	7	not	not	PART
fumecheng-10949	131	8	significant	significant	ADJ
fumecheng-10949	131	9	;	;	PUNCT
fumecheng-10949	131	10	this	this	DET
fumecheng-10949	131	11	small	small	ADJ
fumecheng-10949	131	12	value	value	NOUN
fumecheng-10949	131	13	can	can	AUX
fumecheng-10949	131	14	make	make	VERB
fumecheng-10949	131	15	a	a	DET
fumecheng-10949	131	16	reasonable	reasonable	ADJ
fumecheng-10949	131	17	change	change	NOUN
fumecheng-10949	131	18	in	in	ADP
fumecheng-10949	131	19	the	the	DET
fumecheng-10949	131	20	results	result	NOUN
fumecheng-10949	131	21	of	of	ADP
fumecheng-10949	131	22	cyclic	cyclic	ADJ
fumecheng-10949	131	23	bending	bending	NOUN
fumecheng-10949	131	24	tests	test	NOUN
fumecheng-10949	131	25	where	where	SCONJ
fumecheng-10949	131	26	more	more	ADJ
fumecheng-10949	131	27	than	than	ADP
fumecheng-10949	131	28	300,000	300,000	NUM
fumecheng-10949	131	29	cycles	cycle	NOUN
fumecheng-10949	131	30	of	of	ADP
fumecheng-10949	131	31	bending	bending	NOUN
fumecheng-10949	131	32	is	be	AUX
fumecheng-10949	131	33	imposed	impose	VERB
fumecheng-10949	131	34	.	.	PUNCT
fumecheng-10949	132	1	fig	fig	NOUN
fumecheng-10949	132	2	.	.	PUNCT
fumecheng-10949	133	1	7	7	NUM
fumecheng-10949	133	2	illustration	illustration	NOUN
fumecheng-10949	133	3	of	of	ADP
fumecheng-10949	133	4	change	change	NOUN
fumecheng-10949	133	5	in	in	ADP
fumecheng-10949	133	6	imposed	impose	VERB
fumecheng-10949	133	7	strain	strain	NOUN
fumecheng-10949	133	8	on	on	ADP
fumecheng-10949	133	9	metal	metal	NOUN
fumecheng-10949	133	10	thin	thin	ADJ
fumecheng-10949	133	11	film	film	NOUN
fumecheng-10949	133	12	by	by	ADP
fumecheng-10949	133	13	the	the	DET
fumecheng-10949	133	14	relocation	relocation	NOUN
fumecheng-10949	133	15	of	of	ADP
fumecheng-10949	133	16	neutral	neutral	ADJ
fumecheng-10949	133	17	plane	plane	NOUN
fumecheng-10949	133	18	position	position	NOUN
fumecheng-10949	133	19	5	5	NUM
fumecheng-10949	133	20	.	.	PUNCT
fumecheng-10949	133	21	conclusion	conclusion	NOUN
fumecheng-10949	133	22	in	in	ADP
fumecheng-10949	133	23	this	this	DET
fumecheng-10949	133	24	study	study	NOUN
fumecheng-10949	133	25	,	,	PUNCT
fumecheng-10949	133	26	cu	cu	PROPN
fumecheng-10949	133	27	/	/	SYM
fumecheng-10949	133	28	ag	ag	PROPN
fumecheng-10949	133	29	nanowire	nanowire	PROPN
fumecheng-10949	133	30	/	/	SYM
fumecheng-10949	133	31	pi	pi	NOUN
fumecheng-10949	133	32	(	(	PUNCT
fumecheng-10949	133	33	cap	cap	NOUN
fumecheng-10949	133	34	)	)	PUNCT
fumecheng-10949	133	35	interconnects	interconnect	NOUN
fumecheng-10949	133	36	were	be	AUX
fumecheng-10949	133	37	explored	explore	VERB
fumecheng-10949	133	38	as	as	ADP
fumecheng-10949	133	39	a	a	DET
fumecheng-10949	133	40	novel	novel	ADJ
fumecheng-10949	133	41	concept	concept	NOUN
fumecheng-10949	133	42	to	to	PART
fumecheng-10949	133	43	improve	improve	VERB
fumecheng-10949	133	44	the	the	DET
fumecheng-10949	133	45	mechanical	mechanical	ADJ
fumecheng-10949	133	46	reliability	reliability	NOUN
fumecheng-10949	133	47	of	of	ADP
fumecheng-10949	133	48	single	single	ADJ
fumecheng-10949	133	49	-	-	PUNCT
fumecheng-10949	133	50	component	component	NOUN
fumecheng-10949	133	51	cu	cu	NOUN
fumecheng-10949	133	52	electrodes	electrode	NOUN
fumecheng-10949	133	53	.	.	PUNCT
fumecheng-10949	134	1	bending	bend	VERB
fumecheng-10949	134	2	fatigue	fatigue	NOUN
fumecheng-10949	134	3	tests	test	NOUN
fumecheng-10949	134	4	were	be	AUX
fumecheng-10949	134	5	conducted	conduct	VERB
fumecheng-10949	134	6	for	for	ADP
fumecheng-10949	134	7	the	the	DET
fumecheng-10949	134	8	cap	cap	NOUN
fumecheng-10949	134	9	and	and	CCONJ
fumecheng-10949	134	10	cu	cu	PROPN
fumecheng-10949	134	11	thin	thin	ADJ
fumecheng-10949	134	12	films	film	NOUN
fumecheng-10949	134	13	while	while	SCONJ
fumecheng-10949	134	14	monitoring	monitor	VERB
fumecheng-10949	134	15	the	the	DET
fumecheng-10949	134	16	resistance	resistance	NOUN
fumecheng-10949	134	17	in	in	ADP
fumecheng-10949	134	18	situ	situ	NOUN
fumecheng-10949	134	19	.	.	PUNCT
fumecheng-10949	135	1	the	the	DET
fumecheng-10949	135	2	resistance	resistance	NOUN
fumecheng-10949	135	3	change	change	NOUN
fumecheng-10949	135	4	reflected	reflect	VERB
fumecheng-10949	135	5	the	the	DET
fumecheng-10949	135	6	crack	crack	NOUN
fumecheng-10949	135	7	or	or	CCONJ
fumecheng-10949	135	8	failure	failure	NOUN
fumecheng-10949	135	9	evolution	evolution	NOUN
fumecheng-10949	135	10	in	in	ADP
fumecheng-10949	135	11	the	the	DET
fumecheng-10949	135	12	thin	thin	ADJ
fumecheng-10949	135	13	films	film	NOUN
fumecheng-10949	135	14	during	during	ADP
fumecheng-10949	135	15	the	the	DET
fumecheng-10949	135	16	bending	bend	VERB
fumecheng-10949	135	17	tests	test	NOUN
fumecheng-10949	135	18	.	.	PUNCT
fumecheng-10949	136	1	the	the	DET
fumecheng-10949	136	2	results	result	NOUN
fumecheng-10949	136	3	of	of	ADP
fumecheng-10949	136	4	the	the	DET
fumecheng-10949	136	5	bending	bend	VERB
fumecheng-10949	136	6	fatigue	fatigue	NOUN
fumecheng-10949	136	7	test	test	NOUN
fumecheng-10949	136	8	showed	show	VERB
fumecheng-10949	136	9	that	that	SCONJ
fumecheng-10949	136	10	the	the	DET
fumecheng-10949	136	11	cap	cap	NOUN
fumecheng-10949	136	12	exhibited	exhibit	VERB
fumecheng-10949	136	13	better	well	ADJ
fumecheng-10949	136	14	mechanical	mechanical	ADJ
fumecheng-10949	136	15	reliability	reliability	NOUN
fumecheng-10949	136	16	compared	compare	VERB
fumecheng-10949	136	17	to	to	ADP
fumecheng-10949	136	18	the	the	DET
fumecheng-10949	136	19	cu	cu	PROPN
fumecheng-10949	136	20	thin	thin	ADJ
fumecheng-10949	136	21	films	film	NOUN
fumecheng-10949	136	22	,	,	PUNCT
fumecheng-10949	136	23	with	with	ADP
fumecheng-10949	136	24	a	a	DET
fumecheng-10949	136	25	lower	low	ADJ
fumecheng-10949	136	26	increase	increase	NOUN
fumecheng-10949	136	27	in	in	ADP
fumecheng-10949	136	28	resistance	resistance	NOUN
fumecheng-10949	136	29	after	after	ADP
fumecheng-10949	136	30	300,000	300,000	NUM
fumecheng-10949	136	31	cycles	cycle	NOUN
fumecheng-10949	136	32	of	of	ADP
fumecheng-10949	136	33	bending	bend	VERB
fumecheng-10949	136	34	.	.	PUNCT
fumecheng-10949	137	1	microstructural	microstructural	ADJ
fumecheng-10949	137	2	analysis	analysis	NOUN
fumecheng-10949	137	3	through	through	ADP
fumecheng-10949	137	4	sem	sem	NOUN
fumecheng-10949	137	5	showed	show	VERB
fumecheng-10949	137	6	a	a	DET
fumecheng-10949	137	7	high	high	ADJ
fumecheng-10949	137	8	density	density	NOUN
fumecheng-10949	137	9	of	of	ADP
fumecheng-10949	137	10	long	long	ADJ
fumecheng-10949	137	11	-	-	PUNCT
fumecheng-10949	137	12	range	range	NOUN
fumecheng-10949	137	13	cracks	crack	NOUN
fumecheng-10949	137	14	in	in	ADP
fumecheng-10949	137	15	cu	cu	PROPN
fumecheng-10949	137	16	thin	thin	ADJ
fumecheng-10949	137	17	films	film	NOUN
fumecheng-10949	137	18	after	after	ADP
fumecheng-10949	137	19	imposing	impose	VERB
fumecheng-10949	137	20	300,000	300,000	NUM
fumecheng-10949	137	21	cycles	cycle	NOUN
fumecheng-10949	137	22	of	of	ADP
fumecheng-10949	137	23	bending	bending	NOUN
fumecheng-10949	137	24	;	;	PUNCT
fumecheng-10949	137	25	cap	cap	NOUN
fumecheng-10949	137	26	showed	show	VERB
fumecheng-10949	137	27	no	no	DET
fumecheng-10949	137	28	such	such	ADJ
fumecheng-10949	137	29	long	long	ADJ
fumecheng-10949	137	30	-	-	PUNCT
fumecheng-10949	137	31	range	range	NOUN
fumecheng-10949	137	32	cracks	crack	NOUN
fumecheng-10949	137	33	but	but	CCONJ
fumecheng-10949	137	34	exhibited	exhibit	VERB
fumecheng-10949	137	35	a	a	DET
fumecheng-10949	137	36	wavy	wavy	ADJ
fumecheng-10949	137	37	structure	structure	NOUN
fumecheng-10949	137	38	,	,	PUNCT
fumecheng-10949	137	39	probably	probably	ADV
fumecheng-10949	137	40	due	due	ADP
fumecheng-10949	137	41	to	to	ADP
fumecheng-10949	137	42	the	the	DET
fumecheng-10949	137	43	delamination	delamination	NOUN
fumecheng-10949	137	44	of	of	ADP
fumecheng-10949	137	45	ag	ag	PROPN
fumecheng-10949	137	46	nanowires	nanowire	NOUN
fumecheng-10949	137	47	by	by	ADP
fumecheng-10949	137	48	the	the	DET
fumecheng-10949	137	49	bending	bend	VERB
fumecheng-10949	137	50	strain	strain	NOUN
fumecheng-10949	137	51	.	.	PUNCT
fumecheng-10949	138	1	our	our	PRON
fumecheng-10949	138	2	study	study	NOUN
fumecheng-10949	138	3	confirms	confirm	VERB
fumecheng-10949	138	4	that	that	SCONJ
fumecheng-10949	138	5	flexible	flexible	ADJ
fumecheng-10949	138	6	ag	ag	PROPN
fumecheng-10949	138	7	nanowires	nanowire	NOUN
fumecheng-10949	138	8	and	and	CCONJ
fumecheng-10949	138	9	metal	metal	NOUN
fumecheng-10949	138	10	thin	thin	ADJ
fumecheng-10949	138	11	-	-	PUNCT
fumecheng-10949	138	12	films	film	NOUN
fumecheng-10949	138	13	hybrids	hybrid	NOUN
fumecheng-10949	138	14	can	can	AUX
fumecheng-10949	138	15	enhance	enhance	VERB
fumecheng-10949	138	16	the	the	DET
fumecheng-10949	138	17	mechanical	mechanical	ADJ
fumecheng-10949	138	18	reliability	reliability	NOUN
fumecheng-10949	138	19	of	of	ADP
fumecheng-10949	138	20	metal	metal	NOUN
fumecheng-10949	138	21	thin	thin	ADJ
fumecheng-10949	138	22	-	-	PUNCT
fumecheng-10949	138	23	film	film	NOUN
fumecheng-10949	138	24	interconnects	interconnect	NOUN
fumecheng-10949	138	25	under	under	ADP
fumecheng-10949	138	26	bending	bend	VERB
fumecheng-10949	138	27	fatigue	fatigue	NOUN
fumecheng-10949	138	28	.	.	PUNCT
fumecheng-10949	139	1	acknowledgement	acknowledgement	NOUN
fumecheng-10949	139	2	:	:	PUNCT
fumecheng-10949	139	3	this	this	DET
fumecheng-10949	139	4	work	work	NOUN
fumecheng-10949	139	5	was	be	AUX
fumecheng-10949	139	6	supported	support	VERB
fumecheng-10949	139	7	by	by	ADP
fumecheng-10949	139	8	a	a	DET
fumecheng-10949	139	9	national	national	PROPN
fumecheng-10949	139	10	research	research	PROPN
fumecheng-10949	139	11	foundation	foundation	PROPN
fumecheng-10949	139	12	of	of	ADP
fumecheng-10949	139	13	korea	korea	PROPN
fumecheng-10949	139	14	(	(	PUNCT
fumecheng-10949	139	15	nrf	nrf	NOUN
fumecheng-10949	139	16	)	)	PUNCT
fumecheng-10949	139	17	grant	grant	NOUN
fumecheng-10949	139	18	funded	fund	VERB
fumecheng-10949	139	19	by	by	ADP
fumecheng-10949	139	20	the	the	DET
fumecheng-10949	139	21	korean	korean	ADJ
fumecheng-10949	139	22	government	government	NOUN
fumecheng-10949	139	23	(	(	PUNCT
fumecheng-10949	139	24	msit	msit	PROPN
fumecheng-10949	139	25	)	)	PUNCT
fumecheng-10949	139	26	(	(	PUNCT
fumecheng-10949	139	27	no	no	INTJ
fumecheng-10949	139	28	.	.	PUNCT
fumecheng-10949	139	29	nrf-2019k1a3a1a25000230	nrf-2019k1a3a1a25000230	NUM
fumecheng-10949	139	30	)	)	PUNCT
fumecheng-10949	139	31	.	.	PUNCT
fumecheng-10949	140	1	this	this	DET
fumecheng-10949	140	2	research	research	NOUN
fumecheng-10949	140	3	was	be	AUX
fumecheng-10949	140	4	supported	support	VERB
fumecheng-10949	140	5	by	by	ADP
fumecheng-10949	140	6	the	the	DET
fumecheng-10949	140	7	chung	chung	PROPN
fumecheng-10949	140	8	-	-	PUNCT
fumecheng-10949	140	9	ang	ang	PROPN
fumecheng-10949	140	10	university	university	NOUN
fumecheng-10949	140	11	graduate	graduate	NOUN
fumecheng-10949	140	12	research	research	NOUN
fumecheng-10949	140	13	scholarship	scholarship	NOUN
fumecheng-10949	140	14	in	in	ADP
fumecheng-10949	140	15	2022	2022	NUM
fumecheng-10949	140	16	.	.	PUNCT
fumecheng-10949	141	1	references	reference	NOUN
fumecheng-10949	141	2	1	1	NUM
fumecheng-10949	141	3	.	.	PUNCT
fumecheng-10949	142	1	hwang	hwang	PROPN
fumecheng-10949	142	2	,	,	PUNCT
fumecheng-10949	142	3	b.	b.	PROPN
fumecheng-10949	142	4	,	,	PUNCT
fumecheng-10949	142	5	an	an	PRON
fumecheng-10949	142	6	,	,	PUNCT
fumecheng-10949	142	7	y.	y.	PROPN
fumecheng-10949	142	8	,	,	PUNCT
fumecheng-10949	142	9	lee	lee	PROPN
fumecheng-10949	142	10	,	,	PUNCT
fumecheng-10949	142	11	h.	h.	PROPN
fumecheng-10949	142	12	,	,	PUNCT
fumecheng-10949	142	13	lee	lee	PROPN
fumecheng-10949	142	14	,	,	PUNCT
fumecheng-10949	142	15	e.	e.	PROPN
fumecheng-10949	142	16	,	,	PUNCT
fumecheng-10949	142	17	becker	becker	PROPN
fumecheng-10949	142	18	,	,	PUNCT
fumecheng-10949	142	19	s.	s.	PROPN
fumecheng-10949	142	20	,	,	PUNCT
fumecheng-10949	142	21	kim	kim	PROPN
fumecheng-10949	142	22	,	,	PUNCT
fumecheng-10949	142	23	y.-h	y.-h	PROPN
fumecheng-10949	142	24	.	.	PROPN
fumecheng-10949	142	25	,	,	PUNCT
fumecheng-10949	142	26	kim	kim	PROPN
fumecheng-10949	142	27	,	,	PUNCT
fumecheng-10949	142	28	h.	h.	PROPN
fumecheng-10949	142	29	,	,	PUNCT
fumecheng-10949	142	30	2017	2017	NUM
fumecheng-10949	142	31	,	,	PUNCT
fumecheng-10949	142	32	highly	highly	ADV
fumecheng-10949	142	33	flexible	flexible	ADJ
fumecheng-10949	142	34	and	and	CCONJ
fumecheng-10949	142	35	transparent	transparent	ADJ
fumecheng-10949	142	36	ag	ag	PROPN
fumecheng-10949	142	37	nanowire	nanowire	ADJ
fumecheng-10949	142	38	electrode	electrode	NOUN
fumecheng-10949	142	39	encapsulated	encapsulate	VERB
fumecheng-10949	142	40	with	with	ADP
fumecheng-10949	142	41	ultra	ultra	ADJ
fumecheng-10949	142	42	-	-	ADJ
fumecheng-10949	142	43	thin	thin	ADJ
fumecheng-10949	142	44	al2o3	al2o3	NOUN
fumecheng-10949	142	45	:	:	PUNCT
fumecheng-10949	142	46	thermal	thermal	ADJ
fumecheng-10949	142	47	,	,	PUNCT
fumecheng-10949	142	48	ambient	ambient	NOUN
fumecheng-10949	142	49	,	,	PUNCT
fumecheng-10949	142	50	and	and	CCONJ
fumecheng-10949	142	51	mechanical	mechanical	ADJ
fumecheng-10949	142	52	stabilities	stability	NOUN
fumecheng-10949	142	53	,	,	PUNCT
fumecheng-10949	142	54	scientific	scientific	ADJ
fumecheng-10949	142	55	reports	report	NOUN
fumecheng-10949	142	56	,	,	PUNCT
fumecheng-10949	142	57	7(1	7(1	NUM
fumecheng-10949	142	58	)	)	PUNCT
fumecheng-10949	142	59	,	,	PUNCT
fumecheng-10949	142	60	41336	41336	NUM
fumecheng-10949	142	61	.	.	PUNCT
fumecheng-10949	143	1	2	2	X
fumecheng-10949	143	2	.	.	X
fumecheng-10949	143	3	kim	kim	PROPN
fumecheng-10949	143	4	,	,	PUNCT
fumecheng-10949	143	5	d.	d.	PROPN
fumecheng-10949	143	6	,	,	PUNCT
fumecheng-10949	143	7	kim	kim	PROPN
fumecheng-10949	143	8	,	,	PUNCT
fumecheng-10949	143	9	s.-h	s.-h	NOUN
fumecheng-10949	143	10	.	.	PROPN
fumecheng-10949	143	11	,	,	PUNCT
fumecheng-10949	143	12	kim	kim	PROPN
fumecheng-10949	143	13	,	,	PUNCT
fumecheng-10949	143	14	j.h	j.h	PROPN
fumecheng-10949	143	15	.	.	PROPN
fumecheng-10949	143	16	,	,	PUNCT
fumecheng-10949	143	17	lee	lee	PROPN
fumecheng-10949	143	18	,	,	PUNCT
fumecheng-10949	143	19	j.-c	j.-c	PROPN
fumecheng-10949	143	20	.	.	PUNCT
fumecheng-10949	143	21	,	,	PUNCT
fumecheng-10949	143	22	ahn	ahn	PROPN
fumecheng-10949	143	23	,	,	PUNCT
fumecheng-10949	143	24	j.-p	j.-p	PROPN
fumecheng-10949	143	25	.	.	PROPN
fumecheng-10949	143	26	,	,	PUNCT
fumecheng-10949	143	27	kim	kim	PROPN
fumecheng-10949	143	28	,	,	PUNCT
fumecheng-10949	143	29	s.w	s.w	PROPN
fumecheng-10949	143	30	.	.	PROPN
fumecheng-10949	143	31	,	,	PUNCT
fumecheng-10949	143	32	2017	2017	NUM
fumecheng-10949	143	33	,	,	PUNCT
fumecheng-10949	143	34	failure	failure	NOUN
fumecheng-10949	143	35	criterion	criterion	NOUN
fumecheng-10949	143	36	of	of	ADP
fumecheng-10949	143	37	silver	silver	ADJ
fumecheng-10949	143	38	nanowire	nanowire	NOUN
fumecheng-10949	143	39	electrodes	electrode	NOUN
fumecheng-10949	143	40	on	on	ADP
fumecheng-10949	143	41	a	a	DET
fumecheng-10949	143	42	polymer	polymer	NOUN
fumecheng-10949	143	43	substrate	substrate	NOUN
fumecheng-10949	143	44	for	for	ADP
fumecheng-10949	143	45	highly	highly	ADV
fumecheng-10949	143	46	flexible	flexible	ADJ
fumecheng-10949	143	47	devices	device	NOUN
fumecheng-10949	143	48	,	,	PUNCT
fumecheng-10949	143	49	scientific	scientific	ADJ
fumecheng-10949	143	50	reports	report	NOUN
fumecheng-10949	143	51	,	,	PUNCT
fumecheng-10949	143	52	7(1	7(1	NUM
fumecheng-10949	143	53	)	)	PUNCT
fumecheng-10949	143	54	,	,	PUNCT
fumecheng-10949	143	55	45903	45903	NUM
fumecheng-10949	143	56	.	.	PUNCT
fumecheng-10949	144	1	560	560	NUM
fumecheng-10949	144	2	b.	b.	PROPN
fumecheng-10949	144	3	hwang	hwang	PROPN
fumecheng-10949	144	4	,	,	PUNCT
fumecheng-10949	144	5	y.	y.	PROPN
fumecheng-10949	144	6	han	han	PROPN
fumecheng-10949	144	7	,	,	PUNCT
fumecheng-10949	144	8	p.	p.	NOUN
fumecheng-10949	144	9	matteini	matteini	NOUN
fumecheng-10949	145	1	3	3	NUM
fumecheng-10949	145	2	.	.	PUNCT
fumecheng-10949	146	1	mastrogiannakis	mastrogiannakis	PROPN
fumecheng-10949	146	2	,	,	PUNCT
fumecheng-10949	146	3	i.	i.	PROPN
fumecheng-10949	146	4	,	,	PUNCT
fumecheng-10949	146	5	vosniakos	vosniakos	INTJ
fumecheng-10949	146	6	,	,	PUNCT
fumecheng-10949	146	7	g.-c	g.-c	NOUN
fumecheng-10949	146	8	.	.	PUNCT
fumecheng-10949	146	9	,	,	PUNCT
fumecheng-10949	146	10	2020	2020	NUM
fumecheng-10949	146	11	,	,	PUNCT
fumecheng-10949	146	12	exploring	explore	VERB
fumecheng-10949	146	13	structural	structural	ADJ
fumecheng-10949	146	14	design	design	NOUN
fumecheng-10949	146	15	of	of	ADP
fumecheng-10949	146	16	the	the	DET
fumecheng-10949	146	17	francis	francis	PROPN
fumecheng-10949	146	18	hydro	hydro	PROPN
fumecheng-10949	146	19	-	-	PUNCT
fumecheng-10949	146	20	turbine	turbine	NOUN
fumecheng-10949	146	21	blades	blade	NOUN
fumecheng-10949	146	22	using	use	VERB
fumecheng-10949	146	23	composite	composite	ADJ
fumecheng-10949	146	24	materials	material	NOUN
fumecheng-10949	146	25	,	,	PUNCT
fumecheng-10949	146	26	facta	facta	PROPN
fumecheng-10949	146	27	universitatis	universitatis	PROPN
fumecheng-10949	146	28	,	,	PUNCT
fumecheng-10949	146	29	series	series	NOUN
fumecheng-10949	146	30	:	:	PUNCT
fumecheng-10949	146	31	mechanical	mechanical	ADJ
fumecheng-10949	146	32	engineering	engineering	NOUN
fumecheng-10949	146	33	,	,	PUNCT
fumecheng-10949	146	34	18(1	18(1	NUM
fumecheng-10949	146	35	)	)	PUNCT
fumecheng-10949	146	36	,	,	PUNCT
fumecheng-10949	147	1	pp	pp	ADP
fumecheng-10949	147	2	.	.	PUNCT
fumecheng-10949	148	1	43	43	NUM
fumecheng-10949	148	2	-	-	SYM
fumecheng-10949	148	3	55	55	NUM
fumecheng-10949	148	4	.	.	PUNCT
fumecheng-10949	149	1	4	4	X
fumecheng-10949	149	2	.	.	X
fumecheng-10949	149	3	sae	sae	PROPN
fumecheng-10949	149	4	-	-	PROPN
fumecheng-10949	149	5	long	long	ADV
fumecheng-10949	149	6	,	,	PUNCT
fumecheng-10949	149	7	w.	w.	PROPN
fumecheng-10949	149	8	,	,	PUNCT
fumecheng-10949	149	9	limkatanyu	limkatanyu	PROPN
fumecheng-10949	149	10	,	,	PUNCT
fumecheng-10949	149	11	s.	s.	PROPN
fumecheng-10949	149	12	,	,	PUNCT
fumecheng-10949	149	13	sukontasukkul	sukontasukkul	NOUN
fumecheng-10949	149	14	,	,	PUNCT
fumecheng-10949	149	15	p.	p.	NOUN
fumecheng-10949	149	16	,	,	PUNCT
fumecheng-10949	149	17	damrongwiriyanupap	damrongwiriyanupap	ADJ
fumecheng-10949	149	18	,	,	PUNCT
fumecheng-10949	149	19	n.	n.	NOUN
fumecheng-10949	149	20	,	,	PUNCT
fumecheng-10949	149	21	rungamornrat	rungamornrat	NOUN
fumecheng-10949	149	22	,	,	PUNCT
fumecheng-10949	149	23	j.	j.	PROPN
fumecheng-10949	149	24	,	,	PUNCT
fumecheng-10949	149	25	prachasaree	prachasaree	PROPN
fumecheng-10949	149	26	,	,	PUNCT
fumecheng-10949	149	27	w.	w.	PROPN
fumecheng-10949	149	28	,	,	PUNCT
fumecheng-10949	149	29	2021	2021	NUM
fumecheng-10949	149	30	,	,	PUNCT
fumecheng-10949	149	31	fourth	fourth	ADJ
fumecheng-10949	149	32	-	-	PUNCT
fumecheng-10949	149	33	order	order	NOUN
fumecheng-10949	149	34	strain	strain	VERB
fumecheng-10949	149	35	gradient	gradient	ADJ
fumecheng-10949	149	36	bar	bar	NOUN
fumecheng-10949	149	37	-	-	PUNCT
fumecheng-10949	149	38	substrate	substrate	NOUN
fumecheng-10949	149	39	model	model	NOUN
fumecheng-10949	149	40	with	with	ADP
fumecheng-10949	149	41	nonlocal	nonlocal	ADJ
fumecheng-10949	149	42	and	and	CCONJ
fumecheng-10949	149	43	surface	surface	NOUN
fumecheng-10949	149	44	effects	effect	NOUN
fumecheng-10949	149	45	for	for	ADP
fumecheng-10949	149	46	the	the	DET
fumecheng-10949	149	47	analysis	analysis	NOUN
fumecheng-10949	149	48	of	of	ADP
fumecheng-10949	149	49	nanowires	nanowire	NOUN
fumecheng-10949	149	50	embedded	embed	VERB
fumecheng-10949	149	51	in	in	ADP
fumecheng-10949	149	52	substrate	substrate	NOUN
fumecheng-10949	149	53	media	medium	NOUN
fumecheng-10949	149	54	,	,	PUNCT
fumecheng-10949	149	55	facta	facta	PROPN
fumecheng-10949	149	56	universitatis	universitatis	PROPN
fumecheng-10949	149	57	,	,	PUNCT
fumecheng-10949	149	58	series	series	NOUN
fumecheng-10949	149	59	:	:	PUNCT
fumecheng-10949	149	60	mechanical	mechanical	ADJ
fumecheng-10949	149	61	engineering	engineering	NOUN
fumecheng-10949	149	62	,	,	PUNCT
fumecheng-10949	149	63	19(4	19(4	PROPN
fumecheng-10949	149	64	)	)	PUNCT
fumecheng-10949	149	65	,	,	PUNCT
fumecheng-10949	150	1	pp	pp	PROPN
fumecheng-10949	150	2	.	.	PUNCT
fumecheng-10949	151	1	657	657	NUM
fumecheng-10949	151	2	-	-	SYM
fumecheng-10949	151	3	680	680	NUM
fumecheng-10949	151	4	.	.	NOUN
fumecheng-10949	152	1	5	5	NUM
fumecheng-10949	152	2	.	.	X
fumecheng-10949	152	3	qaiser	qaiser	NOUN
fumecheng-10949	152	4	,	,	PUNCT
fumecheng-10949	152	5	n.	n.	NOUN
fumecheng-10949	152	6	,	,	PUNCT
fumecheng-10949	152	7	damdam	damdam	ADJ
fumecheng-10949	152	8	,	,	PUNCT
fumecheng-10949	152	9	a.n	a.n	PROPN
fumecheng-10949	152	10	.	.	PROPN
fumecheng-10949	152	11	,	,	PUNCT
fumecheng-10949	152	12	khan	khan	PROPN
fumecheng-10949	152	13	,	,	PUNCT
fumecheng-10949	152	14	s.m	s.m	PROPN
fumecheng-10949	152	15	.	.	PROPN
fumecheng-10949	152	16	,	,	PUNCT
fumecheng-10949	152	17	bunaiyan	bunaiyan	PROPN
fumecheng-10949	152	18	,	,	PUNCT
fumecheng-10949	152	19	s.	s.	PROPN
fumecheng-10949	152	20	,	,	PUNCT
fumecheng-10949	152	21	hussain	hussain	PROPN
fumecheng-10949	152	22	,	,	PUNCT
fumecheng-10949	152	23	m.m	m.m	PROPN
fumecheng-10949	152	24	.	.	PROPN
fumecheng-10949	152	25	,	,	PUNCT
fumecheng-10949	152	26	2021	2021	NUM
fumecheng-10949	152	27	,	,	PUNCT
fumecheng-10949	152	28	design	design	NOUN
fumecheng-10949	152	29	criteria	criterion	NOUN
fumecheng-10949	152	30	for	for	ADP
fumecheng-10949	152	31	horseshoe	horseshoe	ADJ
fumecheng-10949	152	32	and	and	CCONJ
fumecheng-10949	152	33	spiral	spiral	ADJ
fumecheng-10949	152	34	-	-	PUNCT
fumecheng-10949	152	35	based	base	VERB
fumecheng-10949	152	36	interconnects	interconnect	NOUN
fumecheng-10949	152	37	for	for	ADP
fumecheng-10949	152	38	highly	highly	ADV
fumecheng-10949	152	39	stretchable	stretchable	ADJ
fumecheng-10949	152	40	electronic	electronic	ADJ
fumecheng-10949	152	41	devices	device	NOUN
fumecheng-10949	152	42	,	,	PUNCT
fumecheng-10949	152	43	advanced	advanced	ADJ
fumecheng-10949	152	44	functional	functional	ADJ
fumecheng-10949	152	45	materials	material	NOUN
fumecheng-10949	152	46	,	,	PUNCT
fumecheng-10949	152	47	31(7	31(7	NUM
fumecheng-10949	152	48	)	)	PUNCT
fumecheng-10949	152	49	,	,	PUNCT
fumecheng-10949	152	50	2007445	2007445	NUM
fumecheng-10949	152	51	.	.	PUNCT
fumecheng-10949	153	1	6	6	NUM
fumecheng-10949	153	2	.	.	X
fumecheng-10949	153	3	ha	ha	INTJ
fumecheng-10949	153	4	,	,	PUNCT
fumecheng-10949	153	5	h.-b	h.-b	PROPN
fumecheng-10949	153	6	.	.	PROPN
fumecheng-10949	153	7	,	,	PUNCT
fumecheng-10949	153	8	lee	lee	PROPN
fumecheng-10949	153	9	,	,	PUNCT
fumecheng-10949	153	10	b.h	b.h	PROPN
fumecheng-10949	153	11	.	.	PROPN
fumecheng-10949	153	12	,	,	PUNCT
fumecheng-10949	153	13	qaiser	qaiser	PROPN
fumecheng-10949	153	14	,	,	PUNCT
fumecheng-10949	153	15	n.	n.	NOUN
fumecheng-10949	153	16	,	,	PUNCT
fumecheng-10949	153	17	seo	seo	NOUN
fumecheng-10949	153	18	,	,	PUNCT
fumecheng-10949	153	19	y.	y.	PROPN
fumecheng-10949	153	20	,	,	PUNCT
fumecheng-10949	153	21	kim	kim	PROPN
fumecheng-10949	153	22	,	,	PUNCT
fumecheng-10949	153	23	j.	j.	PROPN
fumecheng-10949	153	24	,	,	PUNCT
fumecheng-10949	153	25	koo	koo	PROPN
fumecheng-10949	153	26	,	,	PUNCT
fumecheng-10949	153	27	j.m	j.m	PROPN
fumecheng-10949	153	28	.	.	PROPN
fumecheng-10949	153	29	,	,	PUNCT
fumecheng-10949	153	30	hwang	hwang	PROPN
fumecheng-10949	153	31	,	,	PUNCT
fumecheng-10949	153	32	b.	b.	PROPN
fumecheng-10949	153	33	,	,	PUNCT
fumecheng-10949	153	34	2022	2022	NUM
fumecheng-10949	153	35	,	,	PUNCT
fumecheng-10949	153	36	highly	highly	ADV
fumecheng-10949	153	37	reliable	reliable	ADJ
fumecheng-10949	153	38	anisotropic	anisotropic	NOUN
fumecheng-10949	153	39	interconnection	interconnection	NOUN
fumecheng-10949	153	40	system	system	NOUN
fumecheng-10949	153	41	fabricated	fabricate	VERB
fumecheng-10949	153	42	using	use	VERB
fumecheng-10949	153	43	cu	cu	PROPN
fumecheng-10949	153	44	/	/	SYM
fumecheng-10949	153	45	sn	sn	NOUN
fumecheng-10949	153	46	-	-	PUNCT
fumecheng-10949	153	47	soldered	solder	VERB
fumecheng-10949	153	48	microdumbbell	microdumbbell	NOUN
fumecheng-10949	153	49	arrays	array	NOUN
fumecheng-10949	153	50	and	and	CCONJ
fumecheng-10949	153	51	polyimide	polyimide	NOUN
fumecheng-10949	153	52	films	film	NOUN
fumecheng-10949	153	53	for	for	ADP
fumecheng-10949	153	54	application	application	NOUN
fumecheng-10949	153	55	to	to	ADP
fumecheng-10949	153	56	flexible	flexible	ADJ
fumecheng-10949	153	57	electronics	electronic	NOUN
fumecheng-10949	153	58	,	,	PUNCT
fumecheng-10949	153	59	intermetallics	intermetallic	NOUN
fumecheng-10949	153	60	,	,	PUNCT
fumecheng-10949	153	61	144	144	NUM
fumecheng-10949	153	62	,	,	PUNCT
fumecheng-10949	153	63	107535	107535	NUM
fumecheng-10949	153	64	.	.	PUNCT
fumecheng-10949	154	1	7	7	X
fumecheng-10949	154	2	.	.	X
fumecheng-10949	154	3	qaiser	qaiser	NOUN
fumecheng-10949	154	4	,	,	PUNCT
fumecheng-10949	154	5	n.	n.	NOUN
fumecheng-10949	154	6	,	,	PUNCT
fumecheng-10949	154	7	damdam	damdam	ADJ
fumecheng-10949	154	8	,	,	PUNCT
fumecheng-10949	154	9	a.n	a.n	PROPN
fumecheng-10949	154	10	.	.	PROPN
fumecheng-10949	154	11	,	,	PUNCT
fumecheng-10949	154	12	khan	khan	PROPN
fumecheng-10949	154	13	,	,	PUNCT
fumecheng-10949	154	14	s.m	s.m	PROPN
fumecheng-10949	154	15	.	.	PROPN
fumecheng-10949	154	16	,	,	PUNCT
fumecheng-10949	154	17	elatab	elatab	PROPN
fumecheng-10949	154	18	,	,	PUNCT
fumecheng-10949	154	19	n.	n.	PROPN
fumecheng-10949	154	20	,	,	PUNCT
fumecheng-10949	154	21	hussain	hussain	PROPN
fumecheng-10949	154	22	,	,	PUNCT
fumecheng-10949	154	23	m.m	m.m	PROPN
fumecheng-10949	154	24	.	.	PROPN
fumecheng-10949	154	25	,	,	PUNCT
fumecheng-10949	154	26	2021	2021	NUM
fumecheng-10949	154	27	,	,	PUNCT
fumecheng-10949	154	28	mechanical	mechanical	ADJ
fumecheng-10949	154	29	reliability	reliability	NOUN
fumecheng-10949	154	30	of	of	ADP
fumecheng-10949	154	31	self	self	NOUN
fumecheng-10949	154	32	-	-	PUNCT
fumecheng-10949	154	33	similar	similar	ADJ
fumecheng-10949	154	34	serpentine	serpentine	ADJ
fumecheng-10949	154	35	interconnect	interconnect	NOUN
fumecheng-10949	154	36	for	for	ADP
fumecheng-10949	154	37	fracture	fracture	NOUN
fumecheng-10949	154	38	-	-	PUNCT
fumecheng-10949	154	39	free	free	ADJ
fumecheng-10949	154	40	stretchable	stretchable	ADJ
fumecheng-10949	154	41	electronic	electronic	ADJ
fumecheng-10949	154	42	devices	device	NOUN
fumecheng-10949	154	43	,	,	PUNCT
fumecheng-10949	154	44	journal	journal	NOUN
fumecheng-10949	154	45	of	of	ADP
fumecheng-10949	154	46	applied	applied	ADJ
fumecheng-10949	154	47	physics	physic	NOUN
fumecheng-10949	154	48	,	,	PUNCT
fumecheng-10949	154	49	130(1	130(1	NUM
fumecheng-10949	154	50	)	)	PUNCT
fumecheng-10949	154	51	,	,	PUNCT
fumecheng-10949	154	52	014902	014902	NUM
fumecheng-10949	154	53	.	.	PUNCT
fumecheng-10949	155	1	8	8	NUM
fumecheng-10949	155	2	.	.	X
fumecheng-10949	155	3	park	park	NOUN
fumecheng-10949	155	4	,	,	PUNCT
fumecheng-10949	155	5	m.	m.	NOUN
fumecheng-10949	155	6	,	,	PUNCT
fumecheng-10949	155	7	kim	kim	PROPN
fumecheng-10949	155	8	,	,	PUNCT
fumecheng-10949	155	9	w.	w.	PROPN
fumecheng-10949	155	10	,	,	PUNCT
fumecheng-10949	155	11	hwang	hwang	PROPN
fumecheng-10949	155	12	,	,	PUNCT
fumecheng-10949	155	13	b.	b.	PROPN
fumecheng-10949	155	14	,	,	PUNCT
fumecheng-10949	155	15	han	han	PROPN
fumecheng-10949	155	16	,	,	PUNCT
fumecheng-10949	155	17	s.m	s.m	PROPN
fumecheng-10949	155	18	.	.	PROPN
fumecheng-10949	155	19	,	,	PUNCT
fumecheng-10949	155	20	2019	2019	NUM
fumecheng-10949	155	21	,	,	PUNCT
fumecheng-10949	155	22	effect	effect	NOUN
fumecheng-10949	155	23	of	of	ADP
fumecheng-10949	155	24	varying	vary	VERB
fumecheng-10949	155	25	the	the	DET
fumecheng-10949	155	26	density	density	NOUN
fumecheng-10949	155	27	of	of	ADP
fumecheng-10949	155	28	ag	ag	PROPN
fumecheng-10949	155	29	nanowire	nanowire	NOUN
fumecheng-10949	155	30	networks	network	NOUN
fumecheng-10949	155	31	on	on	ADP
fumecheng-10949	155	32	their	their	PRON
fumecheng-10949	155	33	reliability	reliability	NOUN
fumecheng-10949	155	34	during	during	ADP
fumecheng-10949	155	35	bending	bend	VERB
fumecheng-10949	155	36	fatigue	fatigue	NOUN
fumecheng-10949	155	37	,	,	PUNCT
fumecheng-10949	155	38	scripta	scripta	PROPN
fumecheng-10949	155	39	materialia	materialia	PROPN
fumecheng-10949	155	40	,	,	PUNCT
fumecheng-10949	155	41	161	161	NUM
fumecheng-10949	155	42	,	,	PUNCT
fumecheng-10949	155	43	pp	pp	ADJ
fumecheng-10949	155	44	.	.	PUNCT
fumecheng-10949	156	1	70	70	NUM
fumecheng-10949	156	2	-	-	SYM
fumecheng-10949	156	3	73	73	NUM
fumecheng-10949	156	4	.	.	PUNCT
fumecheng-10949	157	1	9	9	NUM
fumecheng-10949	157	2	.	.	X
fumecheng-10949	158	1	kim	kim	PROPN
fumecheng-10949	158	2	,	,	PUNCT
fumecheng-10949	158	3	t.	t.	PROPN
fumecheng-10949	158	4	,	,	PUNCT
fumecheng-10949	158	5	canlier	canlier	NOUN
fumecheng-10949	158	6	,	,	PUNCT
fumecheng-10949	158	7	a.	a.	NOUN
fumecheng-10949	158	8	,	,	PUNCT
fumecheng-10949	158	9	kim	kim	PROPN
fumecheng-10949	158	10	,	,	PUNCT
fumecheng-10949	158	11	g.h	g.h	PROPN
fumecheng-10949	158	12	.	.	PROPN
fumecheng-10949	158	13	,	,	PUNCT
fumecheng-10949	158	14	choi	choi	PROPN
fumecheng-10949	158	15	,	,	PUNCT
fumecheng-10949	158	16	j.	j.	PROPN
fumecheng-10949	158	17	,	,	PUNCT
fumecheng-10949	158	18	park	park	NOUN
fumecheng-10949	158	19	,	,	PUNCT
fumecheng-10949	158	20	m.	m.	NOUN
fumecheng-10949	158	21	,	,	PUNCT
fumecheng-10949	158	22	han	han	PROPN
fumecheng-10949	158	23	,	,	PUNCT
fumecheng-10949	158	24	s.m	s.m	PROPN
fumecheng-10949	158	25	.	.	PROPN
fumecheng-10949	158	26	,	,	PUNCT
fumecheng-10949	158	27	2013	2013	NUM
fumecheng-10949	158	28	,	,	PUNCT
fumecheng-10949	158	29	electrostatic	electrostatic	ADJ
fumecheng-10949	158	30	spray	spray	NOUN
fumecheng-10949	158	31	deposition	deposition	NOUN
fumecheng-10949	158	32	of	of	ADP
fumecheng-10949	158	33	highly	highly	ADV
fumecheng-10949	158	34	transparent	transparent	ADJ
fumecheng-10949	158	35	silver	silver	ADJ
fumecheng-10949	158	36	nanowire	nanowire	NOUN
fumecheng-10949	158	37	electrode	electrode	NOUN
fumecheng-10949	158	38	on	on	ADP
fumecheng-10949	158	39	flexible	flexible	ADJ
fumecheng-10949	158	40	substrate	substrate	NOUN
fumecheng-10949	158	41	,	,	PUNCT
fumecheng-10949	158	42	acs	acs	PROPN
fumecheng-10949	158	43	applied	apply	VERB
fumecheng-10949	158	44	materials	material	NOUN
fumecheng-10949	158	45	&	&	CCONJ
fumecheng-10949	158	46	interfaces	interface	NOUN
fumecheng-10949	158	47	,	,	PUNCT
fumecheng-10949	158	48	5(3	5(3	NUM
fumecheng-10949	158	49	)	)	PUNCT
fumecheng-10949	158	50	,	,	PUNCT
fumecheng-10949	158	51	pp	pp	ADP
fumecheng-10949	158	52	.	.	PUNCT
fumecheng-10949	159	1	788	788	NUM
fumecheng-10949	159	2	-	-	SYM
fumecheng-10949	159	3	794	794	NUM
fumecheng-10949	159	4	.	.	PUNCT
fumecheng-10949	160	1	10	10	NUM
fumecheng-10949	160	2	.	.	X
fumecheng-10949	161	1	hwang	hwang	PROPN
fumecheng-10949	161	2	,	,	PUNCT
fumecheng-10949	161	3	b.	b.	PROPN
fumecheng-10949	161	4	,	,	PUNCT
fumecheng-10949	161	5	shin	shin	PROPN
fumecheng-10949	161	6	,	,	PUNCT
fumecheng-10949	161	7	h.a.s	h.a.s	NOUN
fumecheng-10949	161	8	.	.	PROPN
fumecheng-10949	161	9	,	,	PUNCT
fumecheng-10949	161	10	kim	kim	PROPN
fumecheng-10949	161	11	,	,	PUNCT
fumecheng-10949	161	12	t.	t.	PROPN
fumecheng-10949	161	13	,	,	PUNCT
fumecheng-10949	161	14	joo	joo	PROPN
fumecheng-10949	161	15	,	,	PUNCT
fumecheng-10949	161	16	y.c	y.c	PROPN
fumecheng-10949	161	17	.	.	PROPN
fumecheng-10949	161	18	,	,	PUNCT
fumecheng-10949	161	19	han	han	PROPN
fumecheng-10949	161	20	,	,	PUNCT
fumecheng-10949	161	21	s.m	s.m	PROPN
fumecheng-10949	161	22	.	.	PROPN
fumecheng-10949	161	23	,	,	PUNCT
fumecheng-10949	161	24	2014	2014	NUM
fumecheng-10949	161	25	,	,	PUNCT
fumecheng-10949	161	26	highly	highly	ADV
fumecheng-10949	161	27	reliable	reliable	ADJ
fumecheng-10949	161	28	ag	ag	PROPN
fumecheng-10949	161	29	nanowire	nanowire	ADJ
fumecheng-10949	161	30	flexible	flexible	ADJ
fumecheng-10949	161	31	transparent	transparent	ADJ
fumecheng-10949	161	32	electrode	electrode	NOUN
fumecheng-10949	161	33	with	with	ADP
fumecheng-10949	161	34	mechanically	mechanically	ADV
fumecheng-10949	161	35	welded	weld	VERB
fumecheng-10949	161	36	junctions	junction	NOUN
fumecheng-10949	161	37	,	,	PUNCT
fumecheng-10949	161	38	small	small	ADJ
fumecheng-10949	161	39	,	,	PUNCT
fumecheng-10949	161	40	10(16	10(16	NUM
fumecheng-10949	161	41	)	)	PUNCT
fumecheng-10949	161	42	,	,	PUNCT
fumecheng-10949	161	43	pp	pp	ADP
fumecheng-10949	161	44	.	.	PUNCT
fumecheng-10949	162	1	3397	3397	NUM
fumecheng-10949	162	2	-	-	SYM
fumecheng-10949	162	3	3404	3404	NUM
fumecheng-10949	162	4	.	.	PUNCT
fumecheng-10949	163	1	11	11	NUM
fumecheng-10949	163	2	.	.	X
fumecheng-10949	164	1	schwaiger	schwaiger	PROPN
fumecheng-10949	164	2	,	,	PUNCT
fumecheng-10949	164	3	r.	r.	PROPN
fumecheng-10949	164	4	,	,	PUNCT
fumecheng-10949	164	5	kraft	kraft	NOUN
fumecheng-10949	164	6	,	,	PUNCT
fumecheng-10949	164	7	o.	o.	PROPN
fumecheng-10949	164	8	,	,	PUNCT
fumecheng-10949	164	9	1999	1999	NUM
fumecheng-10949	164	10	,	,	PUNCT
fumecheng-10949	164	11	high	high	ADJ
fumecheng-10949	164	12	cycle	cycle	NOUN
fumecheng-10949	164	13	fatigue	fatigue	NOUN
fumecheng-10949	164	14	of	of	ADP
fumecheng-10949	164	15	thin	thin	ADJ
fumecheng-10949	164	16	silver	silver	NOUN
fumecheng-10949	164	17	films	film	NOUN
fumecheng-10949	164	18	investigated	investigate	VERB
fumecheng-10949	164	19	by	by	ADP
fumecheng-10949	164	20	dynamic	dynamic	ADJ
fumecheng-10949	164	21	microbeam	microbeam	NOUN
fumecheng-10949	164	22	deflection	deflection	NOUN
fumecheng-10949	164	23	,	,	PUNCT
fumecheng-10949	164	24	scripta	scripta	PROPN
fumecheng-10949	164	25	materialia	materialia	PROPN
fumecheng-10949	164	26	,	,	PUNCT
fumecheng-10949	164	27	41(8	41(8	PROPN
fumecheng-10949	164	28	)	)	PUNCT
fumecheng-10949	164	29	,	,	PUNCT
fumecheng-10949	164	30	pp	pp	PROPN
fumecheng-10949	164	31	.	.	PUNCT
fumecheng-10949	165	1	823	823	NUM
fumecheng-10949	165	2	-	-	SYM
fumecheng-10949	165	3	829	829	NUM
fumecheng-10949	165	4	.	.	PUNCT
fumecheng-10949	166	1	12	12	NUM
fumecheng-10949	166	2	.	.	PUNCT
fumecheng-10949	167	1	schwaiger	schwaiger	PROPN
fumecheng-10949	167	2	,	,	PUNCT
fumecheng-10949	167	3	r.	r.	PROPN
fumecheng-10949	167	4	,	,	PUNCT
fumecheng-10949	167	5	kraft	kraft	NOUN
fumecheng-10949	167	6	,	,	PUNCT
fumecheng-10949	167	7	o.	o.	PROPN
fumecheng-10949	167	8	,	,	PUNCT
fumecheng-10949	167	9	2003	2003	NUM
fumecheng-10949	167	10	,	,	PUNCT
fumecheng-10949	167	11	size	size	NOUN
fumecheng-10949	167	12	effects	effect	NOUN
fumecheng-10949	167	13	in	in	ADP
fumecheng-10949	167	14	the	the	DET
fumecheng-10949	167	15	fatigue	fatigue	NOUN
fumecheng-10949	167	16	behavior	behavior	NOUN
fumecheng-10949	167	17	of	of	ADP
fumecheng-10949	167	18	thin	thin	PROPN
fumecheng-10949	167	19	ag	ag	PROPN
fumecheng-10949	167	20	films	film	NOUN
fumecheng-10949	167	21	,	,	PUNCT
fumecheng-10949	167	22	acta	acta	PROPN
fumecheng-10949	167	23	materialia	materialia	PROPN
fumecheng-10949	167	24	,	,	PUNCT
fumecheng-10949	167	25	51(1	51(1	NUM
fumecheng-10949	167	26	)	)	PUNCT
fumecheng-10949	167	27	,	,	PUNCT
fumecheng-10949	167	28	pp	pp	ADP
fumecheng-10949	167	29	.	.	PUNCT
fumecheng-10949	168	1	195206	195206	NUM
fumecheng-10949	168	2	.	.	PUNCT
fumecheng-10949	169	1	13	13	NUM
fumecheng-10949	169	2	.	.	X
fumecheng-10949	170	1	hwang	hwang	PROPN
fumecheng-10949	170	2	,	,	PUNCT
fumecheng-10949	170	3	b.	b.	PROPN
fumecheng-10949	170	4	,	,	PUNCT
fumecheng-10949	170	5	park	park	NOUN
fumecheng-10949	170	6	,	,	PUNCT
fumecheng-10949	170	7	m.	m.	NOUN
fumecheng-10949	170	8	,	,	PUNCT
fumecheng-10949	170	9	kim	kim	PROPN
fumecheng-10949	170	10	,	,	PUNCT
fumecheng-10949	170	11	t.	t.	PROPN
fumecheng-10949	170	12	,	,	PUNCT
fumecheng-10949	170	13	han	han	PROPN
fumecheng-10949	170	14	,	,	PUNCT
fumecheng-10949	170	15	s.	s.	PROPN
fumecheng-10949	170	16	,	,	PUNCT
fumecheng-10949	170	17	2016	2016	NUM
fumecheng-10949	170	18	,	,	PUNCT
fumecheng-10949	170	19	effect	effect	NOUN
fumecheng-10949	170	20	of	of	ADP
fumecheng-10949	170	21	rgo	rgo	PROPN
fumecheng-10949	170	22	deposition	deposition	NOUN
fumecheng-10949	170	23	on	on	ADP
fumecheng-10949	170	24	chemical	chemical	ADJ
fumecheng-10949	170	25	and	and	CCONJ
fumecheng-10949	170	26	mechanical	mechanical	ADJ
fumecheng-10949	170	27	reliability	reliability	NOUN
fumecheng-10949	170	28	of	of	ADP
fumecheng-10949	170	29	ag	ag	PROPN
fumecheng-10949	170	30	nanowire	nanowire	ADJ
fumecheng-10949	170	31	flexible	flexible	ADJ
fumecheng-10949	170	32	transparent	transparent	ADJ
fumecheng-10949	170	33	electrode	electrode	NOUN
fumecheng-10949	170	34	,	,	PUNCT
fumecheng-10949	170	35	rsc	rsc	PROPN
fumecheng-10949	170	36	advances	advance	NOUN
fumecheng-10949	170	37	,	,	PUNCT
fumecheng-10949	170	38	6(71	6(71	NUM
fumecheng-10949	170	39	)	)	PUNCT
fumecheng-10949	170	40	,	,	PUNCT
fumecheng-10949	170	41	pp	pp	ADJ
fumecheng-10949	170	42	.	.	PUNCT
fumecheng-10949	171	1	67389	67389	NUM
fumecheng-10949	171	2	-	-	SYM
fumecheng-10949	171	3	67395	67395	NUM
fumecheng-10949	171	4	.	.	PUNCT
fumecheng-10949	172	1	14	14	NUM
fumecheng-10949	172	2	.	.	PUNCT
fumecheng-10949	173	1	lee	lee	PROPN
fumecheng-10949	173	2	,	,	PUNCT
fumecheng-10949	173	3	c.	c.	PROPN
fumecheng-10949	173	4	,	,	PUNCT
fumecheng-10949	173	5	kim	kim	PROPN
fumecheng-10949	173	6	,	,	PUNCT
fumecheng-10949	173	7	h.	h.	PROPN
fumecheng-10949	173	8	,	,	PUNCT
fumecheng-10949	173	9	hwang	hwang	PROPN
fumecheng-10949	173	10	,	,	PUNCT
fumecheng-10949	173	11	b.	b.	PROPN
fumecheng-10949	173	12	,	,	PUNCT
fumecheng-10949	173	13	2019	2019	NUM
fumecheng-10949	173	14	,	,	PUNCT
fumecheng-10949	173	15	fracture	fracture	NOUN
fumecheng-10949	173	16	behavior	behavior	NOUN
fumecheng-10949	173	17	of	of	ADP
fumecheng-10949	173	18	metal	metal	NOUN
fumecheng-10949	173	19	oxide	oxide	NOUN
fumecheng-10949	173	20	/	/	SYM
fumecheng-10949	173	21	silver	silver	NOUN
fumecheng-10949	173	22	nanowire	nanowire	ADJ
fumecheng-10949	173	23	composite	composite	ADJ
fumecheng-10949	173	24	electrodes	electrode	NOUN
fumecheng-10949	173	25	under	under	ADP
fumecheng-10949	173	26	cyclic	cyclic	ADJ
fumecheng-10949	173	27	bending	bending	NOUN
fumecheng-10949	173	28	,	,	PUNCT
fumecheng-10949	173	29	journal	journal	NOUN
fumecheng-10949	173	30	of	of	ADP
fumecheng-10949	173	31	alloys	alloy	NOUN
fumecheng-10949	173	32	and	and	CCONJ
fumecheng-10949	173	33	compounds	compound	NOUN
fumecheng-10949	173	34	,	,	PUNCT
fumecheng-10949	173	35	773	773	NUM
fumecheng-10949	173	36	,	,	PUNCT
fumecheng-10949	173	37	pp	pp	ADJ
fumecheng-10949	173	38	.	.	PUNCT
fumecheng-10949	174	1	361	361	NUM
fumecheng-10949	174	2	-	-	SYM
fumecheng-10949	174	3	366	366	NUM
fumecheng-10949	174	4	.	.	PUNCT
fumecheng-10949	175	1	15	15	NUM
fumecheng-10949	175	2	.	.	PUNCT
fumecheng-10949	176	1	hwang	hwang	PROPN
fumecheng-10949	176	2	,	,	PUNCT
fumecheng-10949	176	3	b.	b.	PROPN
fumecheng-10949	176	4	,	,	PUNCT
fumecheng-10949	176	5	kim	kim	PROPN
fumecheng-10949	176	6	,	,	PUNCT
fumecheng-10949	176	7	w.	w.	PROPN
fumecheng-10949	176	8	,	,	PUNCT
fumecheng-10949	176	9	kim	kim	PROPN
fumecheng-10949	176	10	,	,	PUNCT
fumecheng-10949	176	11	j.	j.	PROPN
fumecheng-10949	176	12	,	,	PUNCT
fumecheng-10949	176	13	lee	lee	PROPN
fumecheng-10949	176	14	,	,	PUNCT
fumecheng-10949	176	15	s.	s.	PROPN
fumecheng-10949	176	16	,	,	PUNCT
fumecheng-10949	176	17	lim	lim	PROPN
fumecheng-10949	176	18	,	,	PUNCT
fumecheng-10949	176	19	s.	s.	PROPN
fumecheng-10949	176	20	,	,	PUNCT
fumecheng-10949	176	21	kim	kim	PROPN
fumecheng-10949	176	22	,	,	PUNCT
fumecheng-10949	176	23	s.	s.	PROPN
fumecheng-10949	176	24	,	,	PUNCT
fumecheng-10949	176	25	oh	oh	INTJ
fumecheng-10949	176	26	,	,	PUNCT
fumecheng-10949	176	27	s.h	s.h	PROPN
fumecheng-10949	176	28	.	.	PROPN
fumecheng-10949	176	29	,	,	PUNCT
fumecheng-10949	176	30	ryu	ryu	PROPN
fumecheng-10949	176	31	,	,	PUNCT
fumecheng-10949	176	32	s.	s.	PROPN
fumecheng-10949	176	33	,	,	PUNCT
fumecheng-10949	176	34	han	han	PROPN
fumecheng-10949	176	35	,	,	PUNCT
fumecheng-10949	176	36	s.m	s.m	PROPN
fumecheng-10949	176	37	.	.	PROPN
fumecheng-10949	176	38	,	,	PUNCT
fumecheng-10949	176	39	2017	2017	NUM
fumecheng-10949	176	40	,	,	PUNCT
fumecheng-10949	176	41	role	role	NOUN
fumecheng-10949	176	42	of	of	ADP
fumecheng-10949	176	43	graphene	graphene	NOUN
fumecheng-10949	176	44	in	in	ADP
fumecheng-10949	176	45	reducing	reduce	VERB
fumecheng-10949	176	46	fatigue	fatigue	NOUN
fumecheng-10949	176	47	damage	damage	NOUN
fumecheng-10949	176	48	in	in	ADP
fumecheng-10949	176	49	cu	cu	PROPN
fumecheng-10949	176	50	/	/	SYM
fumecheng-10949	176	51	gr	gr	PROPN
fumecheng-10949	176	52	nanolayered	nanolayered	ADJ
fumecheng-10949	176	53	composite	composite	NOUN
fumecheng-10949	176	54	,	,	PUNCT
fumecheng-10949	176	55	nano	nano	NOUN
fumecheng-10949	176	56	letters	letter	NOUN
fumecheng-10949	176	57	,	,	PUNCT
fumecheng-10949	176	58	17(8	17(8	NUM
fumecheng-10949	176	59	)	)	PUNCT
fumecheng-10949	176	60	,	,	PUNCT
fumecheng-10949	176	61	pp	pp	ADJ
fumecheng-10949	176	62	.	.	PUNCT
fumecheng-10949	177	1	4740	4740	NUM
fumecheng-10949	177	2	-	-	PUNCT
fumecheng-10949	177	3	4745	4745	NUM
fumecheng-10949	177	4	.	.	PUNCT
fumecheng-10949	178	1	16	16	NUM
fumecheng-10949	178	2	.	.	PUNCT
fumecheng-10949	179	1	kim	kim	PROPN
fumecheng-10949	179	2	,	,	PUNCT
fumecheng-10949	179	3	b.-j	b.-j	PROPN
fumecheng-10949	179	4	.	.	PROPN
fumecheng-10949	179	5	,	,	PUNCT
fumecheng-10949	179	6	cho	cho	PROPN
fumecheng-10949	179	7	,	,	PUNCT
fumecheng-10949	179	8	y.	y.	PROPN
fumecheng-10949	179	9	,	,	PUNCT
fumecheng-10949	179	10	jung	jung	PROPN
fumecheng-10949	179	11	,	,	PUNCT
fumecheng-10949	179	12	m.-s	m.-s	PROPN
fumecheng-10949	179	13	.	.	PROPN
fumecheng-10949	179	14	,	,	PUNCT
fumecheng-10949	179	15	shin	shin	NOUN
fumecheng-10949	179	16	,	,	PUNCT
fumecheng-10949	179	17	h.-a.-s	h.-a.-s	PROPN
fumecheng-10949	179	18	.	.	PROPN
fumecheng-10949	179	19	,	,	PUNCT
fumecheng-10949	179	20	moon	moon	PROPN
fumecheng-10949	179	21	,	,	PUNCT
fumecheng-10949	179	22	m.-w	m.-w	PROPN
fumecheng-10949	179	23	.	.	PROPN
fumecheng-10949	179	24	,	,	PUNCT
fumecheng-10949	179	25	han	han	PROPN
fumecheng-10949	179	26	,	,	PUNCT
fumecheng-10949	179	27	h.n	h.n	PROPN
fumecheng-10949	179	28	.	.	PROPN
fumecheng-10949	179	29	,	,	PUNCT
fumecheng-10949	179	30	nam	nam	PROPN
fumecheng-10949	179	31	,	,	PUNCT
fumecheng-10949	179	32	k.t	k.t	PROPN
fumecheng-10949	179	33	.	.	PROPN
fumecheng-10949	179	34	,	,	PUNCT
fumecheng-10949	179	35	joo	joo	PROPN
fumecheng-10949	179	36	,	,	PUNCT
fumecheng-10949	179	37	y.-c	y.-c	PROPN
fumecheng-10949	179	38	.	.	PUNCT
fumecheng-10949	179	39	,	,	PUNCT
fumecheng-10949	179	40	choi	choi	NOUN
fumecheng-10949	179	41	,	,	PUNCT
fumecheng-10949	179	42	i.-s	i.-	NOUN
fumecheng-10949	179	43	.	.	PUNCT
fumecheng-10949	179	44	,	,	PUNCT
fumecheng-10949	179	45	2012	2012	NUM
fumecheng-10949	179	46	,	,	PUNCT
fumecheng-10949	179	47	fatigue	fatigue	NOUN
fumecheng-10949	179	48	-	-	PUNCT
fumecheng-10949	179	49	free	free	ADJ
fumecheng-10949	179	50	,	,	PUNCT
fumecheng-10949	179	51	electrically	electrically	ADV
fumecheng-10949	179	52	reliable	reliable	ADJ
fumecheng-10949	179	53	copper	copper	NOUN
fumecheng-10949	179	54	electrode	electrode	NOUN
fumecheng-10949	179	55	with	with	ADP
fumecheng-10949	179	56	nanohole	nanohole	NOUN
fumecheng-10949	179	57	array	array	NOUN
fumecheng-10949	179	58	,	,	PUNCT
fumecheng-10949	179	59	small	small	ADJ
fumecheng-10949	179	60	,	,	PUNCT
fumecheng-10949	179	61	8(21	8(21	NUM
fumecheng-10949	179	62	)	)	PUNCT
fumecheng-10949	179	63	,	,	PUNCT
fumecheng-10949	179	64	pp	pp	PROPN
fumecheng-10949	179	65	.	.	PUNCT
fumecheng-10949	179	66	3300	3300	NUM
fumecheng-10949	179	67	-	-	SYM
fumecheng-10949	179	68	3306	3306	NUM
fumecheng-10949	179	69	.	.	PUNCT
fumecheng-10949	180	1	17	17	NUM
fumecheng-10949	180	2	.	.	PUNCT
fumecheng-10949	180	3	hu	hu	PROPN
fumecheng-10949	180	4	,	,	PUNCT
fumecheng-10949	180	5	l.	l.	PROPN
fumecheng-10949	180	6	,	,	PUNCT
fumecheng-10949	180	7	kim	kim	PROPN
fumecheng-10949	180	8	,	,	PUNCT
fumecheng-10949	180	9	h.s	h.s	PROPN
fumecheng-10949	180	10	.	.	PROPN
fumecheng-10949	180	11	,	,	PUNCT
fumecheng-10949	180	12	lee	lee	PROPN
fumecheng-10949	180	13	,	,	PUNCT
fumecheng-10949	180	14	j.-y	j.-y	PROPN
fumecheng-10949	180	15	.	.	PUNCT
fumecheng-10949	180	16	,	,	PUNCT
fumecheng-10949	180	17	peumans	peuman	NOUN
fumecheng-10949	180	18	,	,	PUNCT
fumecheng-10949	180	19	p.	p.	NOUN
fumecheng-10949	180	20	,	,	PUNCT
fumecheng-10949	180	21	cui	cui	PROPN
fumecheng-10949	180	22	,	,	PUNCT
fumecheng-10949	180	23	y.	y.	PROPN
fumecheng-10949	180	24	,	,	PUNCT
fumecheng-10949	180	25	2010	2010	NUM
fumecheng-10949	180	26	,	,	PUNCT
fumecheng-10949	180	27	scalable	scalable	ADJ
fumecheng-10949	180	28	coating	coating	NOUN
fumecheng-10949	180	29	and	and	CCONJ
fumecheng-10949	180	30	properties	property	NOUN
fumecheng-10949	180	31	of	of	ADP
fumecheng-10949	180	32	transparent	transparent	ADJ
fumecheng-10949	180	33	,	,	PUNCT
fumecheng-10949	180	34	flexible	flexible	ADJ
fumecheng-10949	180	35	,	,	PUNCT
fumecheng-10949	180	36	silver	silver	ADJ
fumecheng-10949	180	37	nanowire	nanowire	NOUN
fumecheng-10949	180	38	electrodes	electrode	NOUN
fumecheng-10949	180	39	,	,	PUNCT
fumecheng-10949	180	40	acs	acs	PROPN
fumecheng-10949	180	41	nano	nano	NOUN
fumecheng-10949	180	42	,	,	PUNCT
fumecheng-10949	180	43	4(5	4(5	PROPN
fumecheng-10949	180	44	)	)	PUNCT
fumecheng-10949	180	45	,	,	PUNCT
fumecheng-10949	180	46	pp	pp	PROPN
fumecheng-10949	180	47	.	.	PUNCT
fumecheng-10949	180	48	2955	2955	NUM
fumecheng-10949	180	49	-	-	SYM
fumecheng-10949	180	50	2963	2963	NUM
fumecheng-10949	180	51	.	.	PUNCT
fumecheng-10949	181	1	18	18	NUM
fumecheng-10949	181	2	.	.	PUNCT
fumecheng-10949	181	3	lee	lee	PROPN
fumecheng-10949	181	4	,	,	PUNCT
fumecheng-10949	181	5	j.	j.	PROPN
fumecheng-10949	181	6	,	,	PUNCT
fumecheng-10949	181	7	lee	lee	PROPN
fumecheng-10949	181	8	,	,	PUNCT
fumecheng-10949	181	9	i.	i.	PROPN
fumecheng-10949	181	10	,	,	PUNCT
fumecheng-10949	181	11	kim	kim	PROPN
fumecheng-10949	181	12	,	,	PUNCT
fumecheng-10949	181	13	t.s	t.s	PROPN
fumecheng-10949	181	14	.	.	PROPN
fumecheng-10949	181	15	,	,	PUNCT
fumecheng-10949	181	16	lee	lee	PROPN
fumecheng-10949	181	17	,	,	PUNCT
fumecheng-10949	181	18	j.y	j.y	PROPN
fumecheng-10949	181	19	.	.	PROPN
fumecheng-10949	181	20	,	,	PUNCT
fumecheng-10949	181	21	2013	2013	NUM
fumecheng-10949	181	22	,	,	PUNCT
fumecheng-10949	181	23	efficient	efficient	ADJ
fumecheng-10949	181	24	welding	welding	NOUN
fumecheng-10949	181	25	of	of	ADP
fumecheng-10949	181	26	silver	silver	NOUN
fumecheng-10949	181	27	nanowire	nanowire	ADJ
fumecheng-10949	181	28	networks	network	NOUN
fumecheng-10949	181	29	without	without	ADP
fumecheng-10949	181	30	post‐processing	post‐processe	VERB
fumecheng-10949	181	31	,	,	PUNCT
fumecheng-10949	181	32	small	small	ADJ
fumecheng-10949	181	33	,	,	PUNCT
fumecheng-10949	181	34	9(17	9(17	NUM
fumecheng-10949	181	35	)	)	PUNCT
fumecheng-10949	181	36	,	,	PUNCT
fumecheng-10949	181	37	pp	pp	PROPN
fumecheng-10949	181	38	.	.	PUNCT
fumecheng-10949	181	39	2887	2887	NUM
fumecheng-10949	181	40	-	-	SYM
fumecheng-10949	181	41	2894	2894	NUM
fumecheng-10949	181	42	.	.	PUNCT
fumecheng-10949	182	1	19	19	NUM
fumecheng-10949	182	2	.	.	PUNCT
fumecheng-10949	183	1	liu	liu	PROPN
fumecheng-10949	183	2	,	,	PUNCT
fumecheng-10949	183	3	c.-h	c.-h	PROPN
fumecheng-10949	183	4	.	.	PROPN
fumecheng-10949	183	5	,	,	PUNCT
fumecheng-10949	183	6	yu	yu	PROPN
fumecheng-10949	183	7	,	,	PUNCT
fumecheng-10949	183	8	x.	x.	NOUN
fumecheng-10949	183	9	,	,	PUNCT
fumecheng-10949	183	10	2011	2011	NUM
fumecheng-10949	183	11	,	,	PUNCT
fumecheng-10949	183	12	silver	silver	NOUN
fumecheng-10949	183	13	nanowire	nanowire	NOUN
fumecheng-10949	183	14	-	-	PUNCT
fumecheng-10949	183	15	based	base	VERB
fumecheng-10949	183	16	transparent	transparent	ADJ
fumecheng-10949	183	17	,	,	PUNCT
fumecheng-10949	183	18	flexible	flexible	ADJ
fumecheng-10949	183	19	,	,	PUNCT
fumecheng-10949	183	20	and	and	CCONJ
fumecheng-10949	183	21	conductive	conductive	ADJ
fumecheng-10949	183	22	thin	thin	ADJ
fumecheng-10949	183	23	film	film	NOUN
fumecheng-10949	183	24	,	,	PUNCT
fumecheng-10949	183	25	nanoscale	nanoscale	NOUN
fumecheng-10949	183	26	research	research	NOUN
fumecheng-10949	183	27	letters	letter	NOUN
fumecheng-10949	183	28	,	,	PUNCT
fumecheng-10949	183	29	6(1	6(1	NUM
fumecheng-10949	183	30	)	)	PUNCT
fumecheng-10949	183	31	,	,	PUNCT
fumecheng-10949	183	32	pp	pp	ADP
fumecheng-10949	183	33	.	.	PUNCT
fumecheng-10949	184	1	1	1	NUM
fumecheng-10949	184	2	-	-	SYM
fumecheng-10949	184	3	8	8	NUM
fumecheng-10949	184	4	.	.	NOUN
fumecheng-10949	184	5	20	20	NUM
fumecheng-10949	184	6	.	.	PUNCT
fumecheng-10949	185	1	liu	liu	PROPN
fumecheng-10949	185	2	,	,	PUNCT
fumecheng-10949	185	3	r.	r.	PROPN
fumecheng-10949	185	4	,	,	PUNCT
fumecheng-10949	185	5	tan	tan	PROPN
fumecheng-10949	185	6	,	,	PUNCT
fumecheng-10949	185	7	m.	m.	NOUN
fumecheng-10949	185	8	,	,	PUNCT
fumecheng-10949	185	9	zhang	zhang	PROPN
fumecheng-10949	185	10	,	,	PUNCT
fumecheng-10949	185	11	x.	x.	PROPN
fumecheng-10949	185	12	,	,	PUNCT
fumecheng-10949	185	13	xu	xu	PROPN
fumecheng-10949	185	14	,	,	PUNCT
fumecheng-10949	185	15	l.	l.	PROPN
fumecheng-10949	185	16	,	,	PUNCT
fumecheng-10949	185	17	chen	chen	PROPN
fumecheng-10949	185	18	,	,	PUNCT
fumecheng-10949	185	19	j.	j.	PROPN
fumecheng-10949	185	20	,	,	PUNCT
fumecheng-10949	185	21	chen	chen	PROPN
fumecheng-10949	185	22	,	,	PUNCT
fumecheng-10949	185	23	y.	y.	PROPN
fumecheng-10949	185	24	,	,	PUNCT
fumecheng-10949	185	25	tang	tang	PROPN
fumecheng-10949	185	26	,	,	PUNCT
fumecheng-10949	185	27	x.	x.	PROPN
fumecheng-10949	185	28	,	,	PUNCT
fumecheng-10949	185	29	wan	wan	PROPN
fumecheng-10949	185	30	,	,	PUNCT
fumecheng-10949	185	31	l.	l.	PROPN
fumecheng-10949	185	32	,	,	PUNCT
fumecheng-10949	185	33	2018	2018	NUM
fumecheng-10949	185	34	,	,	PUNCT
fumecheng-10949	185	35	solution	solution	NOUN
fumecheng-10949	185	36	-	-	PUNCT
fumecheng-10949	185	37	processed	process	VERB
fumecheng-10949	185	38	composite	composite	ADJ
fumecheng-10949	185	39	electrodes	electrode	NOUN
fumecheng-10949	185	40	composed	compose	VERB
fumecheng-10949	185	41	of	of	ADP
fumecheng-10949	185	42	silver	silver	NOUN
fumecheng-10949	185	43	nanowires	nanowire	NOUN
fumecheng-10949	185	44	and	and	CCONJ
fumecheng-10949	185	45	aluminum	aluminum	NOUN
fumecheng-10949	185	46	-	-	PUNCT
fumecheng-10949	185	47	doped	dope	VERB
fumecheng-10949	185	48	zinc	zinc	NOUN
fumecheng-10949	185	49	oxide	oxide	NOUN
fumecheng-10949	185	50	nanoparticles	nanoparticle	NOUN
fumecheng-10949	185	51	for	for	ADP
fumecheng-10949	185	52	thin	thin	ADJ
fumecheng-10949	185	53	-	-	PUNCT
fumecheng-10949	185	54	film	film	NOUN
fumecheng-10949	185	55	solar	solar	ADJ
fumecheng-10949	185	56	cells	cell	NOUN
fumecheng-10949	185	57	applications	application	NOUN
fumecheng-10949	185	58	,	,	PUNCT
fumecheng-10949	185	59	solar	solar	ADJ
fumecheng-10949	185	60	energy	energy	NOUN
fumecheng-10949	185	61	materials	material	NOUN
fumecheng-10949	185	62	and	and	CCONJ
fumecheng-10949	185	63	solar	solar	ADJ
fumecheng-10949	185	64	cells	cell	NOUN
fumecheng-10949	185	65	,	,	PUNCT
fumecheng-10949	185	66	174	174	NUM
fumecheng-10949	185	67	,	,	PUNCT
fumecheng-10949	185	68	pp	pp	ADJ
fumecheng-10949	185	69	.	.	PUNCT
fumecheng-10949	186	1	584	584	NUM
fumecheng-10949	186	2	-	-	SYM
fumecheng-10949	186	3	592	592	NUM
fumecheng-10949	186	4	.	.	PUNCT
fumecheng-10949	187	1	21	21	NUM
fumecheng-10949	187	2	.	.	PUNCT
fumecheng-10949	188	1	zeng	zeng	PROPN
fumecheng-10949	188	2	,	,	PUNCT
fumecheng-10949	188	3	x.y	x.y	PROPN
fumecheng-10949	188	4	.	.	PROPN
fumecheng-10949	188	5	,	,	PUNCT
fumecheng-10949	188	6	zhang	zhang	PROPN
fumecheng-10949	188	7	,	,	PUNCT
fumecheng-10949	188	8	q.k	q.k	PROPN
fumecheng-10949	188	9	.	.	PROPN
fumecheng-10949	188	10	,	,	PUNCT
fumecheng-10949	188	11	yu	yu	PROPN
fumecheng-10949	188	12	,	,	PUNCT
fumecheng-10949	188	13	r.m	r.m	PROPN
fumecheng-10949	188	14	.	.	PROPN
fumecheng-10949	188	15	,	,	PUNCT
fumecheng-10949	188	16	lu	lu	PROPN
fumecheng-10949	188	17	,	,	PUNCT
fumecheng-10949	188	18	c.z	c.z	PROPN
fumecheng-10949	188	19	.	.	PROPN
fumecheng-10949	188	20	,	,	PUNCT
fumecheng-10949	188	21	2010	2010	NUM
fumecheng-10949	188	22	,	,	PUNCT
fumecheng-10949	188	23	a	a	DET
fumecheng-10949	188	24	new	new	ADJ
fumecheng-10949	188	25	transparent	transparent	ADJ
fumecheng-10949	188	26	conductor	conductor	NOUN
fumecheng-10949	188	27	:	:	PUNCT
fumecheng-10949	188	28	silver	silver	ADJ
fumecheng-10949	188	29	nanowire	nanowire	ADJ
fumecheng-10949	188	30	film	film	NOUN
fumecheng-10949	188	31	buried	bury	VERB
fumecheng-10949	188	32	at	at	ADP
fumecheng-10949	188	33	the	the	DET
fumecheng-10949	188	34	surface	surface	NOUN
fumecheng-10949	188	35	of	of	ADP
fumecheng-10949	188	36	a	a	DET
fumecheng-10949	188	37	transparent	transparent	ADJ
fumecheng-10949	188	38	polymer	polymer	NOUN
fumecheng-10949	188	39	,	,	PUNCT
fumecheng-10949	188	40	advanced	advanced	ADJ
fumecheng-10949	188	41	materials	material	NOUN
fumecheng-10949	188	42	,	,	PUNCT
fumecheng-10949	188	43	22(40	22(40	NUM
fumecheng-10949	188	44	)	)	PUNCT
fumecheng-10949	188	45	,	,	PUNCT
fumecheng-10949	188	46	pp	pp	ADP
fumecheng-10949	188	47	.	.	PUNCT
fumecheng-10949	188	48	4484	4484	NUM
fumecheng-10949	188	49	-	-	SYM
fumecheng-10949	188	50	4488	4488	NUM
fumecheng-10949	188	51	.	.	PUNCT
fumecheng-10949	189	1	22	22	NUM
fumecheng-10949	189	2	.	.	X
fumecheng-10949	190	1	zhang	zhang	PROPN
fumecheng-10949	190	2	,	,	PUNCT
fumecheng-10949	190	3	d.	d.	PROPN
fumecheng-10949	190	4	,	,	PUNCT
fumecheng-10949	190	5	ryu	ryu	PROPN
fumecheng-10949	190	6	,	,	PUNCT
fumecheng-10949	190	7	k.	k.	PROPN
fumecheng-10949	190	8	,	,	PUNCT
fumecheng-10949	190	9	liu	liu	PROPN
fumecheng-10949	190	10	,	,	PUNCT
fumecheng-10949	190	11	x.	x.	PROPN
fumecheng-10949	190	12	,	,	PUNCT
fumecheng-10949	190	13	polikarpov	polikarpov	PROPN
fumecheng-10949	190	14	,	,	PUNCT
fumecheng-10949	190	15	e.	e.	PROPN
fumecheng-10949	190	16	,	,	PUNCT
fumecheng-10949	190	17	ly	ly	PROPN
fumecheng-10949	190	18	,	,	PUNCT
fumecheng-10949	190	19	j.	j.	PROPN
fumecheng-10949	190	20	,	,	PUNCT
fumecheng-10949	190	21	tompson	tompson	PROPN
fumecheng-10949	190	22	,	,	PUNCT
fumecheng-10949	190	23	m.e	m.e	PROPN
fumecheng-10949	190	24	.	.	PROPN
fumecheng-10949	190	25	,	,	PUNCT
fumecheng-10949	190	26	zhou	zhou	PROPN
fumecheng-10949	190	27	,	,	PUNCT
fumecheng-10949	190	28	c.	c.	PROPN
fumecheng-10949	190	29	,	,	PUNCT
fumecheng-10949	190	30	2006	2006	NUM
fumecheng-10949	190	31	,	,	PUNCT
fumecheng-10949	190	32	transparent	transparent	ADJ
fumecheng-10949	190	33	,	,	PUNCT
fumecheng-10949	190	34	conductive	conductive	ADJ
fumecheng-10949	190	35	,	,	PUNCT
fumecheng-10949	190	36	and	and	CCONJ
fumecheng-10949	190	37	flexible	flexible	ADJ
fumecheng-10949	190	38	carbon	carbon	NOUN
fumecheng-10949	190	39	nanotube	nanotube	NOUN
fumecheng-10949	190	40	films	film	NOUN
fumecheng-10949	190	41	and	and	CCONJ
fumecheng-10949	190	42	their	their	PRON
fumecheng-10949	190	43	application	application	NOUN
fumecheng-10949	190	44	in	in	ADP
fumecheng-10949	190	45	organic	organic	ADJ
fumecheng-10949	190	46	light	light	ADJ
fumecheng-10949	190	47	-	-	PUNCT
fumecheng-10949	190	48	emitting	emit	VERB
fumecheng-10949	190	49	diodes	diode	NOUN
fumecheng-10949	190	50	,	,	PUNCT
fumecheng-10949	190	51	nano	nano	NOUN
fumecheng-10949	190	52	letters	letter	NOUN
fumecheng-10949	190	53	,	,	PUNCT
fumecheng-10949	190	54	6(9	6(9	NUM
fumecheng-10949	190	55	)	)	PUNCT
fumecheng-10949	190	56	,	,	PUNCT
fumecheng-10949	190	57	pp	pp	ADP
fumecheng-10949	190	58	.	.	PUNCT
fumecheng-10949	191	1	1880	1880	NUM
fumecheng-10949	191	2	-	-	SYM
fumecheng-10949	191	3	1886	1886	NUM
fumecheng-10949	191	4	.	.	PUNCT
fumecheng-10949	192	1	23	23	NUM
fumecheng-10949	192	2	.	.	X
fumecheng-10949	193	1	yang	yang	PROPN
fumecheng-10949	193	2	,	,	PUNCT
fumecheng-10949	193	3	l.	l.	PROPN
fumecheng-10949	193	4	,	,	PUNCT
fumecheng-10949	193	5	zhang	zhang	PROPN
fumecheng-10949	193	6	,	,	PUNCT
fumecheng-10949	193	7	t.	t.	PROPN
fumecheng-10949	193	8	,	,	PUNCT
fumecheng-10949	193	9	zhou	zhou	PROPN
fumecheng-10949	193	10	,	,	PUNCT
fumecheng-10949	193	11	h.	h.	PROPN
fumecheng-10949	193	12	,	,	PUNCT
fumecheng-10949	193	13	price	price	NOUN
fumecheng-10949	193	14	,	,	PUNCT
fumecheng-10949	193	15	s.c	s.c	PROPN
fumecheng-10949	193	16	.	.	PROPN
fumecheng-10949	193	17	,	,	PUNCT
fumecheng-10949	193	18	wiley	wiley	PROPN
fumecheng-10949	193	19	,	,	PUNCT
fumecheng-10949	193	20	b.j	b.j	PROPN
fumecheng-10949	193	21	.	.	PROPN
fumecheng-10949	193	22	,	,	PUNCT
fumecheng-10949	193	23	you	you	PRON
fumecheng-10949	193	24	,	,	PUNCT
fumecheng-10949	193	25	w.	w.	PROPN
fumecheng-10949	193	26	,	,	PUNCT
fumecheng-10949	193	27	2011	2011	NUM
fumecheng-10949	193	28	,	,	PUNCT
fumecheng-10949	193	29	solution	solution	NOUN
fumecheng-10949	193	30	-	-	PUNCT
fumecheng-10949	193	31	processed	process	VERB
fumecheng-10949	193	32	flexible	flexible	ADJ
fumecheng-10949	193	33	polymer	polymer	NOUN
fumecheng-10949	193	34	solar	solar	ADJ
fumecheng-10949	193	35	cells	cell	NOUN
fumecheng-10949	193	36	with	with	ADP
fumecheng-10949	193	37	silver	silver	ADJ
fumecheng-10949	193	38	nanowire	nanowire	ADJ
fumecheng-10949	193	39	electrodes	electrode	NOUN
fumecheng-10949	193	40	,	,	PUNCT
fumecheng-10949	193	41	acs	acs	PROPN
fumecheng-10949	193	42	applied	apply	VERB
fumecheng-10949	193	43	materials	material	NOUN
fumecheng-10949	193	44	&	&	CCONJ
fumecheng-10949	193	45	interfaces	interface	NOUN
fumecheng-10949	193	46	,	,	PUNCT
fumecheng-10949	193	47	3(10	3(10	NUM
fumecheng-10949	193	48	)	)	PUNCT
fumecheng-10949	193	49	,	,	PUNCT
fumecheng-10949	193	50	pp	pp	ADP
fumecheng-10949	193	51	.	.	PUNCT
fumecheng-10949	194	1	4075	4075	NUM
fumecheng-10949	194	2	-	-	SYM
fumecheng-10949	194	3	4084	4084	NUM
fumecheng-10949	194	4	.	.	PUNCT
fumecheng-10949	195	1	24	24	NUM
fumecheng-10949	195	2	.	.	PUNCT
fumecheng-10949	196	1	jing	jing	PROPN
fumecheng-10949	196	2	,	,	PUNCT
fumecheng-10949	196	3	h.	h.	PROPN
fumecheng-10949	196	4	,	,	PUNCT
fumecheng-10949	196	5	gou	gou	PROPN
fumecheng-10949	196	6	,	,	PUNCT
fumecheng-10949	196	7	m.	m.	NOUN
fumecheng-10949	196	8	,	,	PUNCT
fumecheng-10949	196	9	song	song	NOUN
fumecheng-10949	196	10	,	,	PUNCT
fumecheng-10949	196	11	l.	l.	PROPN
fumecheng-10949	196	12	,	,	PUNCT
fumecheng-10949	196	13	2021	2021	NUM
fumecheng-10949	196	14	,	,	PUNCT
fumecheng-10949	196	15	research	research	NOUN
fumecheng-10949	196	16	on	on	ADP
fumecheng-10949	196	17	bending	bend	VERB
fumecheng-10949	196	18	fatigue	fatigue	NOUN
fumecheng-10949	196	19	properties	property	NOUN
fumecheng-10949	196	20	of	of	ADP
fumecheng-10949	196	21	reinforced	reinforce	VERB
fumecheng-10949	196	22	macadam	macadam	NOUN
fumecheng-10949	196	23	foundation	foundation	NOUN
fumecheng-10949	196	24	,	,	PUNCT
fumecheng-10949	196	25	tehnički	tehnički	PROPN
fumecheng-10949	196	26	vjesnik	vjesnik	PROPN
fumecheng-10949	196	27	,	,	PUNCT
fumecheng-10949	196	28	28(4	28(4	NUM
fumecheng-10949	196	29	)	)	PUNCT
fumecheng-10949	196	30	,	,	PUNCT
fumecheng-10949	196	31	pp	pp	PROPN
fumecheng-10949	196	32	.	.	PUNCT
fumecheng-10949	197	1	1211	1211	NUM
fumecheng-10949	197	2	-	-	SYM
fumecheng-10949	197	3	1220	1220	NUM
fumecheng-10949	197	4	.	.	PUNCT