id	sid	tid	token	lemma	pos
fumecheng-12767	1	1	12767	12767	NUM
fumecheng-12767	1	2	facta	facta	PROPN
fumecheng-12767	1	3	universitatis	universitatis	PROPN
fumecheng-12767	1	4	series	series	NOUN
fumecheng-12767	1	5	:	:	PUNCT
fumecheng-12767	1	6	mechanical	mechanical	ADJ
fumecheng-12767	1	7	engineering	engineering	NOUN
fumecheng-12767	1	8	vol	vol	NOUN
fumecheng-12767	1	9	.	.	PUNCT
fumecheng-12767	1	10	22	22	NUM
fumecheng-12767	1	11	,	,	PUNCT
fumecheng-12767	1	12	no	no	DET
fumecheng-12767	1	13	4	4	NUM
fumecheng-12767	1	14	,	,	PUNCT
fumecheng-12767	1	15	2024	2024	NUM
fumecheng-12767	1	16	,	,	PUNCT
fumecheng-12767	1	17	pp	pp	ADV
fumecheng-12767	1	18	.	.	PUNCT
fumecheng-12767	2	1	601	601	NUM
fumecheng-12767	2	2	614	614	NUM
fumecheng-12767	2	3	https://doi.org/10.22190/fume240601038c	https://doi.org/10.22190/fume240601038c	PROPN
fumecheng-12767	2	4	©	©	PROPN
fumecheng-12767	2	5	2024	2024	NUM
fumecheng-12767	2	6	by	by	ADP
fumecheng-12767	2	7	university	university	PROPN
fumecheng-12767	2	8	of	of	ADP
fumecheng-12767	2	9	niš	niš	PROPN
fumecheng-12767	2	10	,	,	PUNCT
fumecheng-12767	2	11	serbia	serbia	PROPN
fumecheng-12767	2	12	|	|	ADV
fumecheng-12767	2	13	creative	creative	ADJ
fumecheng-12767	2	14	commons	common	NOUN
fumecheng-12767	2	15	license	license	NOUN
fumecheng-12767	2	16	:	:	PUNCT
fumecheng-12767	2	17	cc	cc	VERB
fumecheng-12767	2	18	by	by	ADP
fumecheng-12767	2	19	-	-	PUNCT
fumecheng-12767	2	20	nc	nc	VERB
fumecheng-12767	2	21	-	-	PUNCT
fumecheng-12767	2	22	nd	nd	ADV
fumecheng-12767	2	23	original	original	ADJ
fumecheng-12767	2	24	scientific	scientific	ADJ
fumecheng-12767	2	25	paper	paper	VERB
fumecheng-12767	2	26	mechanically	mechanically	ADV
fumecheng-12767	2	27	pressed	press	VERB
fumecheng-12767	2	28	polymer	polymer	NOUN
fumecheng-12767	2	29	-	-	PUNCT
fumecheng-12767	2	30	matrix	matrix	NOUN
fumecheng-12767	2	31	composites	composite	NOUN
fumecheng-12767	2	32	with	with	ADP
fumecheng-12767	2	33	3d	3d	NUM
fumecheng-12767	2	34	structured	structured	ADJ
fumecheng-12767	2	35	filler	filler	NOUN
fumecheng-12767	2	36	networks	network	NOUN
fumecheng-12767	2	37	for	for	ADP
fumecheng-12767	2	38	electromagnetic	electromagnetic	ADJ
fumecheng-12767	2	39	interference	interference	NOUN
fumecheng-12767	2	40	shielding	shielding	NOUN
fumecheng-12767	2	41	application	application	NOUN
fumecheng-12767	2	42	chunghyun	chunghyun	NOUN
fumecheng-12767	2	43	choi1	choi1	ADJ
fumecheng-12767	2	44	,	,	PUNCT
fumecheng-12767	2	45	nadeem	nadeem	PROPN
fumecheng-12767	2	46	qaiser2	qaiser2	PROPN
fumecheng-12767	2	47	,	,	PUNCT
fumecheng-12767	2	48	byungil	byungil	NOUN
fumecheng-12767	2	49	hwang3	hwang3	NOUN
fumecheng-12767	3	1	1department	1department	NUM
fumecheng-12767	3	2	of	of	ADP
fumecheng-12767	3	3	intelligent	intelligent	ADJ
fumecheng-12767	3	4	semiconductor	semiconductor	NOUN
fumecheng-12767	3	5	engineering	engineering	NOUN
fumecheng-12767	3	6	,	,	PUNCT
fumecheng-12767	3	7	chung	chung	PROPN
fumecheng-12767	3	8	-	-	PUNCT
fumecheng-12767	3	9	ang	ang	PROPN
fumecheng-12767	3	10	university	university	PROPN
fumecheng-12767	3	11	,	,	PUNCT
fumecheng-12767	3	12	south	south	PROPN
fumecheng-12767	3	13	korea	korea	PROPN
fumecheng-12767	3	14	2material	2material	NUM
fumecheng-12767	3	15	science	science	NOUN
fumecheng-12767	3	16	and	and	CCONJ
fumecheng-12767	3	17	engineering	engineering	NOUN
fumecheng-12767	3	18	,	,	PUNCT
fumecheng-12767	3	19	physical	physical	ADJ
fumecheng-12767	3	20	science	science	NOUN
fumecheng-12767	3	21	and	and	CCONJ
fumecheng-12767	3	22	engineering	engineering	NOUN
fumecheng-12767	3	23	division	division	NOUN
fumecheng-12767	3	24	,	,	PUNCT
fumecheng-12767	3	25	king	king	PROPN
fumecheng-12767	3	26	abdullah	abdullah	PROPN
fumecheng-12767	3	27	university	university	PROPN
fumecheng-12767	3	28	of	of	ADP
fumecheng-12767	3	29	science	science	NOUN
fumecheng-12767	3	30	and	and	CCONJ
fumecheng-12767	3	31	technology	technology	NOUN
fumecheng-12767	3	32	(	(	PUNCT
fumecheng-12767	3	33	kaust	kaust	NOUN
fumecheng-12767	3	34	)	)	PUNCT
fumecheng-12767	3	35	,	,	PUNCT
fumecheng-12767	4	1	saudi	saudi	PROPN
fumecheng-12767	4	2	arabia	arabia	PROPN
fumecheng-12767	4	3	3school	3school	PROPN
fumecheng-12767	4	4	of	of	ADP
fumecheng-12767	4	5	integrative	integrative	ADJ
fumecheng-12767	4	6	engineering	engineering	NOUN
fumecheng-12767	4	7	,	,	PUNCT
fumecheng-12767	4	8	chung	chung	PROPN
fumecheng-12767	4	9	-	-	PUNCT
fumecheng-12767	4	10	ang	ang	PROPN
fumecheng-12767	4	11	university	university	PROPN
fumecheng-12767	4	12	,	,	PUNCT
fumecheng-12767	4	13	south	south	PROPN
fumecheng-12767	4	14	korea	korea	PROPN
fumecheng-12767	4	15	orcid	orcid	PROPN
fumecheng-12767	4	16	ids	ids	PROPN
fumecheng-12767	4	17	:	:	PUNCT
fumecheng-12767	4	18	chunghyun	chunghyun	VERB
fumecheng-12767	4	19	choi	choi	PROPN
fumecheng-12767	4	20	https://orcid.org/0009-0001-7634-9933	https://orcid.org/0009-0001-7634-9933	PROPN
fumecheng-12767	4	21	nadeem	nadeem	PROPN
fumecheng-12767	4	22	qaiser	qaiser	PROPN
fumecheng-12767	4	23	https://orcid.org/0000-0001-7417-9857	https://orcid.org/0000-0001-7417-9857	PROPN
fumecheng-12767	4	24	byungil	byungil	PROPN
fumecheng-12767	4	25	hwang	hwang	PROPN
fumecheng-12767	4	26	https://orcid.org/0000-0001-9270-9014	https://orcid.org/0000-0001-9270-9014	PROPN
fumecheng-12767	4	27	abstract	abstract	ADJ
fumecheng-12767	4	28	.	.	PUNCT
fumecheng-12767	5	1	the	the	DET
fumecheng-12767	5	2	increasing	increase	VERB
fumecheng-12767	5	3	demand	demand	NOUN
fumecheng-12767	5	4	for	for	ADP
fumecheng-12767	5	5	miniaturization	miniaturization	NOUN
fumecheng-12767	5	6	,	,	PUNCT
fumecheng-12767	5	7	high	high	ADJ
fumecheng-12767	5	8	-	-	PUNCT
fumecheng-12767	5	9	power	power	NOUN
fumecheng-12767	5	10	density	density	NOUN
fumecheng-12767	5	11	,	,	PUNCT
fumecheng-12767	5	12	and	and	CCONJ
fumecheng-12767	5	13	highfrequency	highfrequency	NOUN
fumecheng-12767	5	14	electronic	electronic	ADJ
fumecheng-12767	5	15	devices	device	NOUN
fumecheng-12767	5	16	highlights	highlight	VERB
fumecheng-12767	5	17	the	the	DET
fumecheng-12767	5	18	importance	importance	NOUN
fumecheng-12767	5	19	of	of	ADP
fumecheng-12767	5	20	polymer	polymer	NOUN
fumecheng-12767	5	21	composites	composite	NOUN
fumecheng-12767	5	22	with	with	ADP
fumecheng-12767	5	23	high	high	ADJ
fumecheng-12767	5	24	electromagnetic	electromagnetic	ADJ
fumecheng-12767	5	25	interference	interference	NOUN
fumecheng-12767	5	26	(	(	PUNCT
fumecheng-12767	5	27	emi	emi	NOUN
fumecheng-12767	5	28	)	)	PUNCT
fumecheng-12767	5	29	shielding	shielding	NOUN
fumecheng-12767	5	30	.	.	PUNCT
fumecheng-12767	6	1	these	these	DET
fumecheng-12767	6	2	composites	composite	NOUN
fumecheng-12767	6	3	are	be	AUX
fumecheng-12767	6	4	crucial	crucial	ADJ
fumecheng-12767	6	5	to	to	ADP
fumecheng-12767	6	6	maintaining	maintain	VERB
fumecheng-12767	6	7	devices	device	NOUN
fumecheng-12767	6	8	,	,	PUNCT
fumecheng-12767	6	9	reducing	reduce	VERB
fumecheng-12767	6	10	communication	communication	NOUN
fumecheng-12767	6	11	errors	error	NOUN
fumecheng-12767	6	12	,	,	PUNCT
fumecheng-12767	6	13	and	and	CCONJ
fumecheng-12767	6	14	protecting	protect	VERB
fumecheng-12767	6	15	human	human	ADJ
fumecheng-12767	6	16	health	health	NOUN
fumecheng-12767	6	17	.	.	PUNCT
fumecheng-12767	7	1	in	in	ADP
fumecheng-12767	7	2	this	this	DET
fumecheng-12767	7	3	study	study	NOUN
fumecheng-12767	7	4	,	,	PUNCT
fumecheng-12767	7	5	we	we	PRON
fumecheng-12767	7	6	developed	develop	VERB
fumecheng-12767	7	7	a	a	DET
fumecheng-12767	7	8	mechanically	mechanically	ADV
fumecheng-12767	7	9	pressed	press	VERB
fumecheng-12767	7	10	composite	composite	NOUN
fumecheng-12767	7	11	of	of	ADP
fumecheng-12767	7	12	polystyrene	polystyrene	NOUN
fumecheng-12767	7	13	,	,	PUNCT
fumecheng-12767	7	14	mxene	mxene	NOUN
fumecheng-12767	7	15	,	,	PUNCT
fumecheng-12767	7	16	and	and	CCONJ
fumecheng-12767	7	17	boron	boron	NOUN
fumecheng-12767	7	18	nitride	nitride	NOUN
fumecheng-12767	7	19	nanosheets	nanosheet	NOUN
fumecheng-12767	7	20	(	(	PUNCT
fumecheng-12767	7	21	bnnss	bnns	NOUN
fumecheng-12767	7	22	)	)	PUNCT
fumecheng-12767	7	23	with	with	ADP
fumecheng-12767	7	24	a	a	DET
fumecheng-12767	7	25	3d	3d	NUM
fumecheng-12767	7	26	structured	structured	ADJ
fumecheng-12767	7	27	filler	filler	NOUN
fumecheng-12767	7	28	network	network	NOUN
fumecheng-12767	7	29	through	through	ADP
fumecheng-12767	7	30	electrostatic	electrostatic	ADJ
fumecheng-12767	7	31	interactions	interaction	NOUN
fumecheng-12767	7	32	and	and	CCONJ
fumecheng-12767	7	33	the	the	DET
fumecheng-12767	7	34	hot	hot	ADV
fumecheng-12767	7	35	-	-	PUNCT
fumecheng-12767	7	36	pressing	press	VERB
fumecheng-12767	7	37	technique	technique	NOUN
fumecheng-12767	7	38	.	.	PUNCT
fumecheng-12767	8	1	constructing	construct	VERB
fumecheng-12767	8	2	a	a	DET
fumecheng-12767	8	3	3d	3d	NUM
fumecheng-12767	8	4	filler	filler	NOUN
fumecheng-12767	8	5	network	network	NOUN
fumecheng-12767	8	6	within	within	ADP
fumecheng-12767	8	7	the	the	DET
fumecheng-12767	8	8	composite	composite	NOUN
fumecheng-12767	8	9	led	lead	VERB
fumecheng-12767	8	10	to	to	ADP
fumecheng-12767	8	11	a	a	DET
fumecheng-12767	8	12	significant	significant	ADJ
fumecheng-12767	8	13	emi	emi	NOUN
fumecheng-12767	8	14	shielding	shielding	NOUN
fumecheng-12767	8	15	effect	effect	NOUN
fumecheng-12767	8	16	,	,	PUNCT
fumecheng-12767	8	17	particularly	particularly	ADV
fumecheng-12767	8	18	in	in	ADP
fumecheng-12767	8	19	the	the	DET
fumecheng-12767	8	20	low	low	ADJ
fumecheng-12767	8	21	-	-	PUNCT
fumecheng-12767	8	22	frequency	frequency	NOUN
fumecheng-12767	8	23	range	range	NOUN
fumecheng-12767	8	24	.	.	PUNCT
fumecheng-12767	9	1	furthermore	furthermore	ADV
fumecheng-12767	9	2	,	,	PUNCT
fumecheng-12767	9	3	it	it	PRON
fumecheng-12767	9	4	was	be	AUX
fumecheng-12767	9	5	observed	observe	VERB
fumecheng-12767	9	6	that	that	SCONJ
fumecheng-12767	9	7	the	the	DET
fumecheng-12767	9	8	bnnss	bnnss	NOUN
fumecheng-12767	9	9	-	-	PUNCT
fumecheng-12767	9	10	coated	coat	VERB
fumecheng-12767	9	11	sample	sample	NOUN
fumecheng-12767	9	12	contributed	contribute	VERB
fumecheng-12767	9	13	to	to	ADP
fumecheng-12767	9	14	superior	superior	ADJ
fumecheng-12767	9	15	emi	emi	NOUN
fumecheng-12767	9	16	shielding	shielding	NOUN
fumecheng-12767	9	17	effectiveness	effectiveness	NOUN
fumecheng-12767	9	18	compared	compare	VERB
fumecheng-12767	9	19	to	to	ADP
fumecheng-12767	9	20	the	the	DET
fumecheng-12767	9	21	non	non	ADJ
fumecheng-12767	9	22	-	-	ADJ
fumecheng-12767	9	23	coated	coated	ADJ
fumecheng-12767	9	24	sample	sample	NOUN
fumecheng-12767	9	25	.	.	PUNCT
fumecheng-12767	10	1	this	this	PRON
fumecheng-12767	10	2	suggests	suggest	VERB
fumecheng-12767	10	3	that	that	SCONJ
fumecheng-12767	10	4	bnnss	bnns	NOUN
fumecheng-12767	10	5	improve	improve	VERB
fumecheng-12767	10	6	the	the	DET
fumecheng-12767	10	7	emi	emi	NOUN
fumecheng-12767	10	8	shielding	shielding	NOUN
fumecheng-12767	10	9	effectiveness	effectiveness	NOUN
fumecheng-12767	10	10	by	by	ADP
fumecheng-12767	10	11	providing	provide	VERB
fumecheng-12767	10	12	additional	additional	ADJ
fumecheng-12767	10	13	interfaces	interface	NOUN
fumecheng-12767	10	14	within	within	ADP
fumecheng-12767	10	15	the	the	DET
fumecheng-12767	10	16	composite	composite	NOUN
fumecheng-12767	10	17	and	and	CCONJ
fumecheng-12767	10	18	help	help	VERB
fumecheng-12767	10	19	prevent	prevent	VERB
fumecheng-12767	10	20	the	the	DET
fumecheng-12767	10	21	degradation	degradation	NOUN
fumecheng-12767	10	22	of	of	ADP
fumecheng-12767	10	23	mxene	mxene	NOUN
fumecheng-12767	10	24	.	.	PUNCT
fumecheng-12767	11	1	we	we	PRON
fumecheng-12767	11	2	expect	expect	VERB
fumecheng-12767	11	3	our	our	PRON
fumecheng-12767	11	4	study	study	NOUN
fumecheng-12767	11	5	to	to	PART
fumecheng-12767	11	6	provide	provide	VERB
fumecheng-12767	11	7	valuable	valuable	ADJ
fumecheng-12767	11	8	insights	insight	NOUN
fumecheng-12767	11	9	into	into	ADP
fumecheng-12767	11	10	the	the	DET
fumecheng-12767	11	11	development	development	NOUN
fumecheng-12767	11	12	of	of	ADP
fumecheng-12767	11	13	3d	3d	NUM
fumecheng-12767	11	14	structured	structured	ADJ
fumecheng-12767	11	15	filler	filler	NOUN
fumecheng-12767	11	16	networks	network	NOUN
fumecheng-12767	11	17	within	within	ADP
fumecheng-12767	11	18	composites	composite	NOUN
fumecheng-12767	11	19	while	while	SCONJ
fumecheng-12767	11	20	contributing	contribute	VERB
fumecheng-12767	11	21	to	to	ADP
fumecheng-12767	11	22	improvements	improvement	NOUN
fumecheng-12767	11	23	in	in	ADP
fumecheng-12767	11	24	thermal	thermal	ADJ
fumecheng-12767	11	25	conductivity	conductivity	NOUN
fumecheng-12767	11	26	and	and	CCONJ
fumecheng-12767	11	27	emi	emi	NOUN
fumecheng-12767	11	28	shielding	shielding	NOUN
fumecheng-12767	11	29	performance	performance	NOUN
fumecheng-12767	11	30	.	.	PUNCT
fumecheng-12767	12	1	key	key	ADJ
fumecheng-12767	12	2	words	word	NOUN
fumecheng-12767	12	3	:	:	PUNCT
fumecheng-12767	12	4	polymer	polymer	NOUN
fumecheng-12767	12	5	-	-	PUNCT
fumecheng-12767	12	6	matrix	matrix	NOUN
fumecheng-12767	12	7	composites	composite	NOUN
fumecheng-12767	12	8	,	,	PUNCT
fumecheng-12767	12	9	3d	3d	NUM
fumecheng-12767	12	10	structured	structure	VERB
fumecheng-12767	12	11	hybrid	hybrid	ADJ
fumecheng-12767	12	12	fillers	filler	NOUN
fumecheng-12767	12	13	network	network	NOUN
fumecheng-12767	12	14	,	,	PUNCT
fumecheng-12767	12	15	electromagnetic	electromagnetic	ADJ
fumecheng-12767	12	16	interference	interference	NOUN
fumecheng-12767	12	17	shielding	shielding	NOUN
fumecheng-12767	12	18	,	,	PUNCT
fumecheng-12767	12	19	electrical	electrical	ADJ
fumecheng-12767	12	20	insulation	insulation	NOUN
fumecheng-12767	12	21	,	,	PUNCT
fumecheng-12767	12	22	2d	2d	NUM
fumecheng-12767	12	23	materials	material	NOUN
fumecheng-12767	12	24	,	,	PUNCT
fumecheng-12767	12	25	mxene	mxene	NOUN
fumecheng-12767	12	26	,	,	PUNCT
fumecheng-12767	12	27	boron	boron	NOUN
fumecheng-12767	12	28	nitride	nitride	NOUN
fumecheng-12767	12	29	nanosheets	nanosheet	NOUN
fumecheng-12767	12	30	.	.	PUNCT
fumecheng-12767	13	1	received	receive	VERB
fumecheng-12767	13	2	:	:	PUNCT
fumecheng-12767	13	3	june	june	PROPN
fumecheng-12767	13	4	01	01	NUM
fumecheng-12767	13	5	,	,	PUNCT
fumecheng-12767	13	6	2024	2024	NUM
fumecheng-12767	13	7	/	/	SYM
fumecheng-12767	13	8	accepted	accept	VERB
fumecheng-12767	13	9	july	july	PROPN
fumecheng-12767	13	10	27	27	NUM
fumecheng-12767	13	11	,	,	PUNCT
fumecheng-12767	13	12	2024	2024	NUM
fumecheng-12767	13	13	corresponding	correspond	VERB
fumecheng-12767	13	14	author	author	NOUN
fumecheng-12767	13	15	:	:	PUNCT
fumecheng-12767	13	16	byungil	byungil	PROPN
fumecheng-12767	13	17	hwang	hwang	PROPN
fumecheng-12767	13	18	school	school	PROPN
fumecheng-12767	13	19	of	of	ADP
fumecheng-12767	13	20	integrative	integrative	ADJ
fumecheng-12767	13	21	engineering	engineering	NOUN
fumecheng-12767	13	22	,	,	PUNCT
fumecheng-12767	13	23	chung	chung	PROPN
fumecheng-12767	13	24	-	-	PUNCT
fumecheng-12767	13	25	ang	ang	PROPN
fumecheng-12767	13	26	university	university	PROPN
fumecheng-12767	13	27	,	,	PUNCT
fumecheng-12767	13	28	seoul	seoul	PROPN
fumecheng-12767	13	29	06974	06974	NUM
fumecheng-12767	13	30	,	,	PUNCT
fumecheng-12767	13	31	republic	republic	NOUN
fumecheng-12767	13	32	of	of	ADP
fumecheng-12767	13	33	korea	korea	PROPN
fumecheng-12767	13	34	e	e	PROPN
fumecheng-12767	13	35	-	-	NOUN
fumecheng-12767	13	36	mail	mail	NOUN
fumecheng-12767	13	37	:	:	PUNCT
fumecheng-12767	13	38	bihwang@cau.ac.kr	bihwang@cau.ac.kr	PROPN
fumecheng-12767	13	39	https://orcid.org/0009-0001-7634-9933	https://orcid.org/0009-0001-7634-9933	PROPN
fumecheng-12767	13	40	https://orcid.org/0000-0001-7417-9857	https://orcid.org/0000-0001-7417-9857	PROPN
fumecheng-12767	13	41	https://orcid.org/0000-0001-9270-9014	https://orcid.org/0000-0001-9270-9014	NOUN
fumecheng-12767	13	42	602	602	NUM
fumecheng-12767	13	43	c.	c.	NOUN
fumecheng-12767	13	44	choi	choi	NOUN
fumecheng-12767	13	45	,	,	PUNCT
fumecheng-12767	13	46	n.	n.	PROPN
fumecheng-12767	13	47	qaiser	qaiser	PROPN
fumecheng-12767	13	48	,	,	PUNCT
fumecheng-12767	13	49	b.	b.	PROPN
fumecheng-12767	13	50	hwang	hwang	PROPN
fumecheng-12767	14	1	1	1	X
fumecheng-12767	14	2	.	.	PUNCT
fumecheng-12767	15	1	introduction	introduction	NOUN
fumecheng-12767	15	2	owing	owe	VERB
fumecheng-12767	15	3	to	to	ADP
fumecheng-12767	15	4	the	the	DET
fumecheng-12767	15	5	development	development	NOUN
fumecheng-12767	15	6	of	of	ADP
fumecheng-12767	15	7	5	5	NUM
fumecheng-12767	15	8	g	g	NOUN
fumecheng-12767	15	9	wireless	wireless	ADJ
fumecheng-12767	15	10	communication	communication	NOUN
fumecheng-12767	15	11	,	,	PUNCT
fumecheng-12767	15	12	coupled	couple	VERB
fumecheng-12767	15	13	with	with	ADP
fumecheng-12767	15	14	high	high	ADJ
fumecheng-12767	15	15	-	-	PUNCT
fumecheng-12767	15	16	frequency	frequency	NOUN
fumecheng-12767	15	17	and	and	CCONJ
fumecheng-12767	15	18	high	high	ADJ
fumecheng-12767	15	19	-	-	PUNCT
fumecheng-12767	15	20	power	power	NOUN
fumecheng-12767	15	21	density	density	NOUN
fumecheng-12767	15	22	devices	device	NOUN
fumecheng-12767	15	23	,	,	PUNCT
fumecheng-12767	15	24	advanced	advanced	ADJ
fumecheng-12767	15	25	electronic	electronic	ADJ
fumecheng-12767	15	26	devices	device	NOUN
fumecheng-12767	15	27	induce	induce	VERB
fumecheng-12767	15	28	electromagnetic	electromagnetic	ADJ
fumecheng-12767	15	29	waves	wave	NOUN
fumecheng-12767	15	30	,	,	PUNCT
fumecheng-12767	15	31	which	which	PRON
fumecheng-12767	15	32	can	can	AUX
fumecheng-12767	15	33	adversely	adversely	ADV
fumecheng-12767	15	34	impact	impact	VERB
fumecheng-12767	15	35	human	human	ADJ
fumecheng-12767	15	36	health	health	NOUN
fumecheng-12767	15	37	and	and	CCONJ
fumecheng-12767	15	38	the	the	DET
fumecheng-12767	15	39	environment	environment	NOUN
fumecheng-12767	16	1	[	[	X
fumecheng-12767	16	2	1	1	NUM
fumecheng-12767	16	3	-	-	SYM
fumecheng-12767	16	4	6	6	NUM
fumecheng-12767	16	5	]	]	PUNCT
fumecheng-12767	16	6	.	.	PUNCT
fumecheng-12767	17	1	furthermore	furthermore	ADV
fumecheng-12767	17	2	,	,	PUNCT
fumecheng-12767	17	3	due	due	ADP
fumecheng-12767	17	4	to	to	ADP
fumecheng-12767	17	5	the	the	DET
fumecheng-12767	17	6	interference	interference	NOUN
fumecheng-12767	17	7	of	of	ADP
fumecheng-12767	17	8	the	the	DET
fumecheng-12767	17	9	generated	generate	VERB
fumecheng-12767	17	10	electromagnetic	electromagnetic	ADJ
fumecheng-12767	17	11	waves	wave	NOUN
fumecheng-12767	17	12	,	,	PUNCT
fumecheng-12767	17	13	electromagnetic	electromagnetic	ADJ
fumecheng-12767	17	14	interference	interference	NOUN
fumecheng-12767	17	15	(	(	PUNCT
fumecheng-12767	17	16	emi	emi	NOUN
fumecheng-12767	17	17	)	)	PUNCT
fumecheng-12767	17	18	influences	influence	VERB
fumecheng-12767	17	19	the	the	DET
fumecheng-12767	17	20	stability	stability	NOUN
fumecheng-12767	17	21	and	and	CCONJ
fumecheng-12767	17	22	accuracy	accuracy	NOUN
fumecheng-12767	17	23	of	of	ADP
fumecheng-12767	17	24	devices	device	NOUN
fumecheng-12767	17	25	.	.	PUNCT
fumecheng-12767	18	1	this	this	PRON
fumecheng-12767	18	2	poses	pose	VERB
fumecheng-12767	18	3	a	a	DET
fumecheng-12767	18	4	significant	significant	ADJ
fumecheng-12767	18	5	issue	issue	NOUN
fumecheng-12767	18	6	,	,	PUNCT
fumecheng-12767	18	7	especially	especially	ADV
fumecheng-12767	18	8	in	in	ADP
fumecheng-12767	18	9	areas	area	NOUN
fumecheng-12767	18	10	where	where	SCONJ
fumecheng-12767	18	11	devices	device	NOUN
fumecheng-12767	18	12	are	be	AUX
fumecheng-12767	18	13	densely	densely	ADV
fumecheng-12767	18	14	packed	pack	VERB
fumecheng-12767	18	15	or	or	CCONJ
fumecheng-12767	18	16	in	in	ADP
fumecheng-12767	18	17	high	high	ADJ
fumecheng-12767	18	18	-	-	PUNCT
fumecheng-12767	18	19	precision	precision	NOUN
fumecheng-12767	18	20	equipment	equipment	NOUN
fumecheng-12767	18	21	and	and	CCONJ
fumecheng-12767	18	22	sensitive	sensitive	ADJ
fumecheng-12767	18	23	electronic	electronic	ADJ
fumecheng-12767	18	24	systems	system	NOUN
fumecheng-12767	18	25	.	.	PUNCT
fumecheng-12767	19	1	for	for	ADP
fumecheng-12767	19	2	example	example	NOUN
fumecheng-12767	19	3	,	,	PUNCT
fumecheng-12767	19	4	malfunctions	malfunction	NOUN
fumecheng-12767	19	5	due	due	ADP
fumecheng-12767	19	6	to	to	ADP
fumecheng-12767	19	7	emi	emi	PROPN
fumecheng-12767	19	8	in	in	ADP
fumecheng-12767	19	9	medical	medical	ADJ
fumecheng-12767	19	10	equipment	equipment	NOUN
fumecheng-12767	19	11	,	,	PUNCT
fumecheng-12767	19	12	aircraft	aircraft	NOUN
fumecheng-12767	19	13	,	,	PUNCT
fumecheng-12767	19	14	and	and	CCONJ
fumecheng-12767	19	15	military	military	ADJ
fumecheng-12767	19	16	systems	system	NOUN
fumecheng-12767	19	17	can	can	AUX
fumecheng-12767	19	18	lead	lead	VERB
fumecheng-12767	19	19	to	to	ADP
fumecheng-12767	19	20	severe	severe	ADJ
fumecheng-12767	19	21	consequences	consequence	NOUN
fumecheng-12767	19	22	[	[	X
fumecheng-12767	19	23	7	7	NUM
fumecheng-12767	19	24	-	-	SYM
fumecheng-12767	19	25	10	10	NUM
fumecheng-12767	19	26	]	]	PUNCT
fumecheng-12767	19	27	.	.	PUNCT
fumecheng-12767	20	1	polymers	polymer	NOUN
fumecheng-12767	20	2	are	be	AUX
fumecheng-12767	20	3	widely	widely	ADV
fumecheng-12767	20	4	used	use	VERB
fumecheng-12767	20	5	as	as	ADP
fumecheng-12767	20	6	matrices	matrix	NOUN
fumecheng-12767	20	7	to	to	PART
fumecheng-12767	20	8	fabricate	fabricate	VERB
fumecheng-12767	20	9	functional	functional	ADJ
fumecheng-12767	20	10	composites	composite	NOUN
fumecheng-12767	20	11	due	due	ADP
fumecheng-12767	20	12	to	to	ADP
fumecheng-12767	20	13	their	their	PRON
fumecheng-12767	20	14	advantages	advantage	NOUN
fumecheng-12767	20	15	such	such	ADJ
fumecheng-12767	20	16	as	as	ADP
fumecheng-12767	20	17	their	their	PRON
fumecheng-12767	20	18	lightweight	lightweight	ADJ
fumecheng-12767	20	19	nature	nature	NOUN
fumecheng-12767	20	20	,	,	PUNCT
fumecheng-12767	20	21	low	low	ADJ
fumecheng-12767	20	22	cost	cost	NOUN
fumecheng-12767	20	23	,	,	PUNCT
fumecheng-12767	20	24	and	and	CCONJ
fumecheng-12767	20	25	processability	processability	NOUN
fumecheng-12767	20	26	.	.	PUNCT
fumecheng-12767	21	1	however	however	ADV
fumecheng-12767	21	2	,	,	PUNCT
fumecheng-12767	21	3	pure	pure	ADJ
fumecheng-12767	21	4	polymers	polymer	NOUN
fumecheng-12767	21	5	have	have	AUX
fumecheng-12767	21	6	electrically	electrically	ADV
fumecheng-12767	21	7	insulating	insulate	VERB
fumecheng-12767	21	8	properties	property	NOUN
fumecheng-12767	21	9	.	.	PUNCT
fumecheng-12767	22	1	theoretically	theoretically	ADV
fumecheng-12767	22	2	,	,	PUNCT
fumecheng-12767	22	3	to	to	PART
fumecheng-12767	22	4	prepare	prepare	VERB
fumecheng-12767	22	5	composites	composite	NOUN
fumecheng-12767	22	6	with	with	ADP
fumecheng-12767	22	7	outstanding	outstanding	ADJ
fumecheng-12767	22	8	emi	emi	NOUN
fumecheng-12767	22	9	shielding	shielding	NOUN
fumecheng-12767	22	10	effectiveness	effectiveness	NOUN
fumecheng-12767	22	11	(	(	PUNCT
fumecheng-12767	22	12	emi	emi	PROPN
fumecheng-12767	22	13	se	se	X
fumecheng-12767	22	14	)	)	PUNCT
fumecheng-12767	22	15	,	,	PUNCT
fumecheng-12767	22	16	high	high	ADJ
fumecheng-12767	22	17	electrically	electrically	ADV
fumecheng-12767	22	18	conductive	conductive	ADJ
fumecheng-12767	22	19	materials	material	NOUN
fumecheng-12767	22	20	are	be	AUX
fumecheng-12767	22	21	required	require	VERB
fumecheng-12767	22	22	.	.	PUNCT
fumecheng-12767	23	1	therefore	therefore	ADV
fumecheng-12767	23	2	,	,	PUNCT
fumecheng-12767	23	3	fillers	filler	NOUN
fumecheng-12767	23	4	are	be	AUX
fumecheng-12767	23	5	introduced	introduce	VERB
fumecheng-12767	23	6	into	into	ADP
fumecheng-12767	23	7	polymer	polymer	NOUN
fumecheng-12767	23	8	matrices	matrix	NOUN
fumecheng-12767	23	9	to	to	PART
fumecheng-12767	23	10	attain	attain	VERB
fumecheng-12767	23	11	high	high	ADJ
fumecheng-12767	23	12	electrical	electrical	ADJ
fumecheng-12767	23	13	conductivity	conductivity	NOUN
fumecheng-12767	23	14	.	.	PUNCT
fumecheng-12767	24	1	selecting	select	VERB
fumecheng-12767	24	2	an	an	DET
fumecheng-12767	24	3	appropriate	appropriate	ADJ
fumecheng-12767	24	4	filler	filler	NOUN
fumecheng-12767	24	5	is	be	AUX
fumecheng-12767	24	6	a	a	DET
fumecheng-12767	24	7	crucial	crucial	ADJ
fumecheng-12767	24	8	factor	factor	NOUN
fumecheng-12767	24	9	in	in	ADP
fumecheng-12767	24	10	optimizing	optimize	VERB
fumecheng-12767	24	11	the	the	DET
fumecheng-12767	24	12	emi	emi	PROPN
fumecheng-12767	24	13	se	se	X
fumecheng-12767	24	14	of	of	ADP
fumecheng-12767	24	15	composites	composite	NOUN
fumecheng-12767	24	16	.	.	PUNCT
fumecheng-12767	25	1	in	in	ADP
fumecheng-12767	25	2	this	this	DET
fumecheng-12767	25	3	study	study	NOUN
fumecheng-12767	25	4	,	,	PUNCT
fumecheng-12767	25	5	we	we	PRON
fumecheng-12767	25	6	used	use	VERB
fumecheng-12767	25	7	two	two	NUM
fumecheng-12767	25	8	types	type	NOUN
fumecheng-12767	25	9	of	of	ADP
fumecheng-12767	25	10	2d	2d	NOUN
fumecheng-12767	25	11	materials	material	NOUN
fumecheng-12767	25	12	as	as	ADP
fumecheng-12767	25	13	fillers	filler	NOUN
fumecheng-12767	25	14	:	:	PUNCT
fumecheng-12767	25	15	ti3c2tx	ti3c2tx	VERB
fumecheng-12767	25	16	mxene	mxene	NOUN
fumecheng-12767	25	17	and	and	CCONJ
fumecheng-12767	25	18	boron	boron	NOUN
fumecheng-12767	25	19	nitride	nitride	NOUN
fumecheng-12767	25	20	nanosheets	nanosheet	NOUN
fumecheng-12767	25	21	(	(	PUNCT
fumecheng-12767	25	22	bnnss	bnnss	NOUN
fumecheng-12767	25	23	)	)	PUNCT
fumecheng-12767	25	24	.	.	PUNCT
fumecheng-12767	26	1	mxene	mxene	NOUN
fumecheng-12767	26	2	,	,	PUNCT
fumecheng-12767	26	3	an	an	DET
fumecheng-12767	26	4	emerging	emerge	VERB
fumecheng-12767	26	5	2d	2d	NUM
fumecheng-12767	26	6	material	material	NOUN
fumecheng-12767	26	7	for	for	ADP
fumecheng-12767	26	8	emi	emi	NOUN
fumecheng-12767	26	9	shielding	shielding	NOUN
fumecheng-12767	26	10	,	,	PUNCT
fumecheng-12767	26	11	is	be	AUX
fumecheng-12767	26	12	the	the	DET
fumecheng-12767	26	13	general	general	ADJ
fumecheng-12767	26	14	name	name	NOUN
fumecheng-12767	26	15	of	of	ADP
fumecheng-12767	26	16	transition	transition	NOUN
fumecheng-12767	26	17	metal	metal	NOUN
fumecheng-12767	26	18	carbides	carbide	NOUN
fumecheng-12767	26	19	/	/	SYM
fumecheng-12767	26	20	carbonitrides	carbonitride	NOUN
fumecheng-12767	26	21	and	and	CCONJ
fumecheng-12767	26	22	has	have	VERB
fumecheng-12767	26	23	the	the	DET
fumecheng-12767	26	24	general	general	ADJ
fumecheng-12767	26	25	formula	formula	NOUN
fumecheng-12767	26	26	of	of	ADP
fumecheng-12767	26	27	mn+1xntx	mn+1xntx	NOUN
fumecheng-12767	26	28	,	,	PUNCT
fumecheng-12767	26	29	where	where	SCONJ
fumecheng-12767	26	30	m	m	NOUN
fumecheng-12767	26	31	is	be	AUX
fumecheng-12767	26	32	an	an	DET
fumecheng-12767	26	33	early	early	ADJ
fumecheng-12767	26	34	transition	transition	NOUN
fumecheng-12767	26	35	metal	metal	NOUN
fumecheng-12767	26	36	(	(	PUNCT
fumecheng-12767	26	37	e.g.	e.g.	ADV
fumecheng-12767	26	38	,	,	PUNCT
fumecheng-12767	26	39	ti	ti	NOUN
fumecheng-12767	26	40	,	,	PUNCT
fumecheng-12767	26	41	zr	zr	PROPN
fumecheng-12767	26	42	,	,	PUNCT
fumecheng-12767	26	43	v	v	PROPN
fumecheng-12767	26	44	,	,	PUNCT
fumecheng-12767	26	45	nb	nb	PROPN
fumecheng-12767	26	46	,	,	PUNCT
fumecheng-12767	26	47	ta	ta	PROPN
fumecheng-12767	26	48	,	,	PUNCT
fumecheng-12767	26	49	and	and	CCONJ
fumecheng-12767	26	50	mo	mo	NOUN
fumecheng-12767	26	51	)	)	PUNCT
fumecheng-12767	26	52	and	and	CCONJ
fumecheng-12767	26	53	x	x	X
fumecheng-12767	26	54	is	be	AUX
fumecheng-12767	26	55	c	c	PROPN
fumecheng-12767	26	56	or	or	CCONJ
fumecheng-12767	26	57	n.	n.	PROPN
fumecheng-12767	26	58	tx	tx	PROPN
fumecheng-12767	26	59	represents	represent	VERB
fumecheng-12767	26	60	functional	functional	ADJ
fumecheng-12767	26	61	groups	group	NOUN
fumecheng-12767	26	62	such	such	ADJ
fumecheng-12767	26	63	as	as	ADP
fumecheng-12767	26	64	-o	-o	PROPN
fumecheng-12767	26	65	,	,	PUNCT
fumecheng-12767	26	66	-f	-f	NUM
fumecheng-12767	26	67	,	,	PUNCT
fumecheng-12767	26	68	or	or	CCONJ
fumecheng-12767	26	69	-oh	-oh	NOUN
fumecheng-12767	27	1	[	[	X
fumecheng-12767	27	2	11	11	NUM
fumecheng-12767	27	3	]	]	PUNCT
fumecheng-12767	27	4	.	.	PUNCT
fumecheng-12767	28	1	in	in	ADP
fumecheng-12767	28	2	the	the	DET
fumecheng-12767	28	3	mxene	mxene	NOUN
fumecheng-12767	28	4	family	family	NOUN
fumecheng-12767	28	5	,	,	PUNCT
fumecheng-12767	28	6	the	the	DET
fumecheng-12767	28	7	most	most	ADV
fumecheng-12767	28	8	studied	study	VERB
fumecheng-12767	28	9	ti3c2tx	ti3c2tx	NOUN
fumecheng-12767	28	10	has	have	VERB
fumecheng-12767	28	11	a	a	DET
fumecheng-12767	28	12	high	high	ADJ
fumecheng-12767	28	13	specific	specific	ADJ
fumecheng-12767	28	14	surface	surface	NOUN
fumecheng-12767	28	15	area	area	NOUN
fumecheng-12767	28	16	,	,	PUNCT
fumecheng-12767	28	17	high	high	ADJ
fumecheng-12767	28	18	electrical	electrical	ADJ
fumecheng-12767	28	19	conductivity	conductivity	NOUN
fumecheng-12767	28	20	,	,	PUNCT
fumecheng-12767	28	21	and	and	CCONJ
fumecheng-12767	28	22	abundant	abundant	ADJ
fumecheng-12767	28	23	functional	functional	ADJ
fumecheng-12767	28	24	groups	group	NOUN
fumecheng-12767	29	1	[	[	X
fumecheng-12767	29	2	12	12	NUM
fumecheng-12767	29	3	-	-	SYM
fumecheng-12767	29	4	15	15	NUM
fumecheng-12767	29	5	]	]	PUNCT
fumecheng-12767	29	6	.	.	PUNCT
fumecheng-12767	30	1	these	these	DET
fumecheng-12767	30	2	groups	group	NOUN
fumecheng-12767	30	3	make	make	VERB
fumecheng-12767	30	4	mxene	mxene	NOUN
fumecheng-12767	30	5	polar	polar	ADJ
fumecheng-12767	30	6	,	,	PUNCT
fumecheng-12767	30	7	making	make	VERB
fumecheng-12767	30	8	it	it	PRON
fumecheng-12767	30	9	hydrophilic	hydrophilic	VERB
fumecheng-12767	30	10	and	and	CCONJ
fumecheng-12767	30	11	allowing	allow	VERB
fumecheng-12767	30	12	it	it	PRON
fumecheng-12767	30	13	to	to	PART
fumecheng-12767	30	14	disperse	disperse	VERB
fumecheng-12767	30	15	in	in	ADP
fumecheng-12767	30	16	water	water	NOUN
fumecheng-12767	30	17	without	without	ADP
fumecheng-12767	30	18	a	a	DET
fumecheng-12767	30	19	dispersant	dispersant	NOUN
fumecheng-12767	30	20	,	,	PUNCT
fumecheng-12767	30	21	thus	thus	ADV
fumecheng-12767	30	22	making	make	VERB
fumecheng-12767	30	23	it	it	PRON
fumecheng-12767	30	24	easy	easy	ADJ
fumecheng-12767	30	25	to	to	PART
fumecheng-12767	30	26	react	react	VERB
fumecheng-12767	30	27	with	with	ADP
fumecheng-12767	30	28	other	other	ADJ
fumecheng-12767	30	29	materials	material	NOUN
fumecheng-12767	30	30	.	.	PUNCT
fumecheng-12767	31	1	despite	despite	SCONJ
fumecheng-12767	31	2	these	these	DET
fumecheng-12767	31	3	excellent	excellent	ADJ
fumecheng-12767	31	4	properties	property	NOUN
fumecheng-12767	31	5	of	of	ADP
fumecheng-12767	31	6	mxene	mxene	NOUN
fumecheng-12767	31	7	,	,	PUNCT
fumecheng-12767	31	8	it	it	PRON
fumecheng-12767	31	9	is	be	AUX
fumecheng-12767	31	10	known	know	VERB
fumecheng-12767	31	11	to	to	PART
fumecheng-12767	31	12	oxidize	oxidize	VERB
fumecheng-12767	31	13	easily	easily	ADV
fumecheng-12767	31	14	,	,	PUNCT
fumecheng-12767	31	15	which	which	PRON
fumecheng-12767	31	16	is	be	AUX
fumecheng-12767	31	17	a	a	DET
fumecheng-12767	31	18	significant	significant	ADJ
fumecheng-12767	31	19	obstacle	obstacle	NOUN
fumecheng-12767	31	20	for	for	ADP
fumecheng-12767	31	21	practical	practical	ADJ
fumecheng-12767	31	22	use	use	NOUN
fumecheng-12767	31	23	.	.	PUNCT
fumecheng-12767	32	1	this	this	PRON
fumecheng-12767	32	2	deteriorates	deteriorate	VERB
fumecheng-12767	32	3	mxene	mxene	NOUN
fumecheng-12767	32	4	’s	’s	PART
fumecheng-12767	32	5	performance	performance	NOUN
fumecheng-12767	32	6	over	over	ADP
fumecheng-12767	32	7	time	time	NOUN
fumecheng-12767	32	8	,	,	PUNCT
fumecheng-12767	32	9	dramatically	dramatically	ADV
fumecheng-12767	32	10	reducing	reduce	VERB
fumecheng-12767	32	11	the	the	DET
fumecheng-12767	32	12	emi	emi	NOUN
fumecheng-12767	32	13	shielding	shielding	NOUN
fumecheng-12767	32	14	effect	effect	NOUN
fumecheng-12767	32	15	.	.	PUNCT
fumecheng-12767	33	1	bnnss	bnns	NOUN
fumecheng-12767	33	2	,	,	PUNCT
fumecheng-12767	33	3	another	another	DET
fumecheng-12767	33	4	type	type	NOUN
fumecheng-12767	33	5	of	of	ADP
fumecheng-12767	33	6	2d	2d	NOUN
fumecheng-12767	33	7	materials	material	NOUN
fumecheng-12767	33	8	,	,	PUNCT
fumecheng-12767	33	9	have	have	AUX
fumecheng-12767	33	10	gained	gain	VERB
fumecheng-12767	33	11	prominence	prominence	NOUN
fumecheng-12767	33	12	as	as	ADP
fumecheng-12767	33	13	thermally	thermally	ADV
fumecheng-12767	33	14	conductive	conductive	ADJ
fumecheng-12767	33	15	fillers	filler	NOUN
fumecheng-12767	33	16	due	due	ADP
fumecheng-12767	33	17	to	to	ADP
fumecheng-12767	33	18	their	their	PRON
fumecheng-12767	33	19	high	high	ADJ
fumecheng-12767	33	20	thermal	thermal	ADJ
fumecheng-12767	33	21	conductivity	conductivity	NOUN
fumecheng-12767	33	22	,	,	PUNCT
fumecheng-12767	33	23	electrically	electrically	ADV
fumecheng-12767	33	24	insulation	insulation	NOUN
fumecheng-12767	33	25	properties	property	NOUN
fumecheng-12767	33	26	,	,	PUNCT
fumecheng-12767	33	27	high	high	ADJ
fumecheng-12767	33	28	thermal	thermal	ADJ
fumecheng-12767	33	29	stability	stability	NOUN
fumecheng-12767	33	30	,	,	PUNCT
fumecheng-12767	33	31	and	and	CCONJ
fumecheng-12767	33	32	chemical	chemical	ADJ
fumecheng-12767	33	33	resistance	resistance	NOUN
fumecheng-12767	34	1	[	[	X
fumecheng-12767	34	2	16	16	NUM
fumecheng-12767	34	3	,	,	PUNCT
fumecheng-12767	34	4	17	17	NUM
fumecheng-12767	34	5	]	]	PUNCT
fumecheng-12767	34	6	.	.	PUNCT
fumecheng-12767	35	1	notably	notably	ADV
fumecheng-12767	35	2	,	,	PUNCT
fumecheng-12767	35	3	bnnss	bnns	NOUN
fumecheng-12767	35	4	possess	possess	VERB
fumecheng-12767	35	5	the	the	DET
fumecheng-12767	35	6	quality	quality	NOUN
fumecheng-12767	35	7	of	of	ADP
fumecheng-12767	35	8	being	be	AUX
fumecheng-12767	35	9	oxidation	oxidation	NOUN
fumecheng-12767	35	10	-	-	PUNCT
fumecheng-12767	35	11	resistant	resistant	ADJ
fumecheng-12767	35	12	and	and	CCONJ
fumecheng-12767	35	13	inert	inert	ADJ
fumecheng-12767	35	14	to	to	ADP
fumecheng-12767	35	15	most	most	ADJ
fumecheng-12767	35	16	chemical	chemical	ADJ
fumecheng-12767	35	17	reactions	reaction	NOUN
fumecheng-12767	35	18	,	,	PUNCT
fumecheng-12767	35	19	which	which	PRON
fumecheng-12767	35	20	can	can	AUX
fumecheng-12767	35	21	delay	delay	VERB
fumecheng-12767	35	22	the	the	DET
fumecheng-12767	35	23	oxidation	oxidation	NOUN
fumecheng-12767	35	24	of	of	ADP
fumecheng-12767	35	25	mxene	mxene	NOUN
fumecheng-12767	35	26	[	[	X
fumecheng-12767	35	27	18	18	NUM
fumecheng-12767	35	28	,	,	PUNCT
fumecheng-12767	35	29	19	19	NUM
fumecheng-12767	35	30	]	]	PUNCT
fumecheng-12767	35	31	.	.	PUNCT
fumecheng-12767	36	1	therefore	therefore	ADV
fumecheng-12767	36	2	,	,	PUNCT
fumecheng-12767	36	3	we	we	PRON
fumecheng-12767	36	4	expected	expect	VERB
fumecheng-12767	36	5	the	the	DET
fumecheng-12767	36	6	synergistic	synergistic	ADJ
fumecheng-12767	36	7	effects	effect	NOUN
fumecheng-12767	36	8	between	between	ADP
fumecheng-12767	36	9	mxene	mxene	NOUN
fumecheng-12767	36	10	and	and	CCONJ
fumecheng-12767	36	11	bnnss	bnns	NOUN
fumecheng-12767	36	12	to	to	PART
fumecheng-12767	36	13	enhance	enhance	VERB
fumecheng-12767	36	14	emi	emi	PROPN
fumecheng-12767	36	15	se	se	X
fumecheng-12767	36	16	and	and	CCONJ
fumecheng-12767	36	17	oxidation	oxidation	NOUN
fumecheng-12767	36	18	stability	stability	NOUN
fumecheng-12767	36	19	.	.	PUNCT
fumecheng-12767	37	1	to	to	PART
fumecheng-12767	37	2	realize	realize	VERB
fumecheng-12767	37	3	durable	durable	ADJ
fumecheng-12767	37	4	and	and	CCONJ
fumecheng-12767	37	5	outstanding	outstanding	ADJ
fumecheng-12767	37	6	emi	emi	NOUN
fumecheng-12767	37	7	se	se	X
fumecheng-12767	37	8	,	,	PUNCT
fumecheng-12767	37	9	we	we	PRON
fumecheng-12767	37	10	proposed	propose	VERB
fumecheng-12767	37	11	polystyrene	polystyrene	NOUN
fumecheng-12767	37	12	(	(	PUNCT
fumecheng-12767	37	13	ps)@mxene@bnnss	ps)@mxene@bnns	NOUN
fumecheng-12767	37	14	microspheres	microsphere	NOUN
fumecheng-12767	37	15	and	and	CCONJ
fumecheng-12767	37	16	then	then	ADV
fumecheng-12767	37	17	fabricated	fabricate	VERB
fumecheng-12767	37	18	the	the	DET
fumecheng-12767	37	19	composite	composite	NOUN
fumecheng-12767	37	20	with	with	ADP
fumecheng-12767	37	21	a	a	DET
fumecheng-12767	37	22	3d	3d	NUM
fumecheng-12767	37	23	structured	structured	ADJ
fumecheng-12767	37	24	filler	filler	NOUN
fumecheng-12767	37	25	network	network	NOUN
fumecheng-12767	37	26	using	use	VERB
fumecheng-12767	37	27	the	the	DET
fumecheng-12767	37	28	hot	hot	ADV
fumecheng-12767	37	29	-	-	PUNCT
fumecheng-12767	37	30	pressing	press	VERB
fumecheng-12767	37	31	method	method	NOUN
fumecheng-12767	37	32	.	.	PUNCT
fumecheng-12767	38	1	to	to	PART
fumecheng-12767	38	2	prepare	prepare	VERB
fumecheng-12767	38	3	ps@mxene@bnnss	ps@mxene@bnnss	NOUN
fumecheng-12767	38	4	microspheres	microsphere	NOUN
fumecheng-12767	38	5	like	like	ADP
fumecheng-12767	38	6	the	the	DET
fumecheng-12767	38	7	core	core	NOUN
fumecheng-12767	38	8	-	-	PUNCT
fumecheng-12767	38	9	double	double	ADJ
fumecheng-12767	38	10	-	-	PUNCT
fumecheng-12767	38	11	shell	shell	NOUN
fumecheng-12767	38	12	structure	structure	NOUN
fumecheng-12767	38	13	,	,	PUNCT
fumecheng-12767	38	14	we	we	PRON
fumecheng-12767	38	15	introduced	introduce	VERB
fumecheng-12767	38	16	electrostatic	electrostatic	ADJ
fumecheng-12767	38	17	force	force	NOUN
fumecheng-12767	38	18	by	by	ADP
fumecheng-12767	38	19	fabricating	fabricate	VERB
fumecheng-12767	38	20	positivecharged	positivecharge	VERB
fumecheng-12767	38	21	ps	ps	NOUN
fumecheng-12767	38	22	,	,	PUNCT
fumecheng-12767	38	23	negative	negative	ADJ
fumecheng-12767	38	24	-	-	PUNCT
fumecheng-12767	38	25	charged	charge	VERB
fumecheng-12767	38	26	mxene	mxene	NOUN
fumecheng-12767	38	27	via	via	ADP
fumecheng-12767	38	28	various	various	ADJ
fumecheng-12767	38	29	functional	functional	ADJ
fumecheng-12767	38	30	groups	group	NOUN
fumecheng-12767	38	31	,	,	PUNCT
fumecheng-12767	38	32	and	and	CCONJ
fumecheng-12767	38	33	positive	positive	ADJ
fumecheng-12767	38	34	-	-	PUNCT
fumecheng-12767	38	35	charged	charge	VERB
fumecheng-12767	38	36	bnnss	bnns	NOUN
fumecheng-12767	38	37	by	by	ADP
fumecheng-12767	38	38	surface	surface	NOUN
fumecheng-12767	38	39	modification	modification	NOUN
fumecheng-12767	38	40	.	.	PUNCT
fumecheng-12767	39	1	after	after	ADP
fumecheng-12767	39	2	constructing	construct	VERB
fumecheng-12767	39	3	the	the	DET
fumecheng-12767	39	4	3d	3d	NUM
fumecheng-12767	39	5	filler	filler	NOUN
fumecheng-12767	39	6	networks	network	NOUN
fumecheng-12767	39	7	through	through	ADP
fumecheng-12767	39	8	hot	hot	ADJ
fumecheng-12767	39	9	pressing	pressing	NOUN
fumecheng-12767	39	10	,	,	PUNCT
fumecheng-12767	39	11	the	the	DET
fumecheng-12767	39	12	composite	composite	NOUN
fumecheng-12767	39	13	with	with	ADP
fumecheng-12767	39	14	the	the	DET
fumecheng-12767	39	15	3d	3d	NUM
fumecheng-12767	39	16	continuous	continuous	ADJ
fumecheng-12767	39	17	networks	network	NOUN
fumecheng-12767	39	18	exhibited	exhibit	VERB
fumecheng-12767	39	19	excellent	excellent	ADJ
fumecheng-12767	39	20	emi	emi	X
fumecheng-12767	39	21	se	se	X
fumecheng-12767	39	22	.	.	PROPN
fumecheng-12767	40	1	2	2	X
fumecheng-12767	40	2	.	.	X
fumecheng-12767	40	3	materials	material	NOUN
fumecheng-12767	40	4	and	and	CCONJ
fumecheng-12767	40	5	methods	method	NOUN
fumecheng-12767	40	6	2.1	2.1	NUM
fumecheng-12767	40	7	.	.	PUNCT
fumecheng-12767	41	1	synthesis	synthesis	NOUN
fumecheng-12767	41	2	of	of	ADP
fumecheng-12767	41	3	polystyrene	polystyrene	NOUN
fumecheng-12767	41	4	(	(	PUNCT
fumecheng-12767	41	5	ps	ps	NOUN
fumecheng-12767	41	6	)	)	PUNCT
fumecheng-12767	41	7	ps	ps	PROPN
fumecheng-12767	41	8	was	be	AUX
fumecheng-12767	41	9	synthesized	synthesize	VERB
fumecheng-12767	41	10	through	through	ADP
fumecheng-12767	41	11	the	the	DET
fumecheng-12767	41	12	dispersion	dispersion	NOUN
fumecheng-12767	41	13	polymerization	polymerization	NOUN
fumecheng-12767	41	14	reaction	reaction	NOUN
fumecheng-12767	41	15	of	of	ADP
fumecheng-12767	41	16	styrene	styrene	ADJ
fumecheng-12767	41	17	monomer	monomer	NOUN
fumecheng-12767	41	18	(	(	PUNCT
fumecheng-12767	41	19	duksan	duksan	NOUN
fumecheng-12767	41	20	)	)	PUNCT
fumecheng-12767	41	21	.	.	PUNCT
fumecheng-12767	42	1	dispersion	dispersion	NOUN
fumecheng-12767	42	2	polymerization	polymerization	NOUN
fumecheng-12767	42	3	is	be	AUX
fumecheng-12767	42	4	a	a	DET
fumecheng-12767	42	5	type	type	NOUN
fumecheng-12767	42	6	of	of	ADP
fumecheng-12767	42	7	precipitation	precipitation	NOUN
fumecheng-12767	42	8	polymerization	polymerization	NOUN
fumecheng-12767	42	9	where	where	SCONJ
fumecheng-12767	42	10	the	the	DET
fumecheng-12767	42	11	mechanically	mechanically	ADV
fumecheng-12767	42	12	pressed	press	VERB
fumecheng-12767	42	13	polymer	polymer	NOUN
fumecheng-12767	42	14	-	-	PUNCT
fumecheng-12767	42	15	matrix	matrix	NOUN
fumecheng-12767	42	16	composites	composite	NOUN
fumecheng-12767	42	17	with	with	ADP
fumecheng-12767	42	18	3d	3d	NUM
fumecheng-12767	42	19	structured	structured	ADJ
fumecheng-12767	42	20	filler	filler	NOUN
fumecheng-12767	42	21	networks	network	NOUN
fumecheng-12767	42	22	...	...	PUNCT
fumecheng-12767	42	23	603	603	NUM
fumecheng-12767	42	24	monomer	monomer	NOUN
fumecheng-12767	42	25	and	and	CCONJ
fumecheng-12767	42	26	initiator	initiator	NOUN
fumecheng-12767	42	27	are	be	AUX
fumecheng-12767	42	28	entirely	entirely	ADV
fumecheng-12767	42	29	dispersed	disperse	VERB
fumecheng-12767	42	30	[	[	PUNCT
fumecheng-12767	42	31	20	20	NUM
fumecheng-12767	42	32	,	,	PUNCT
fumecheng-12767	42	33	21	21	NUM
fumecheng-12767	42	34	]	]	PUNCT
fumecheng-12767	42	35	.	.	PUNCT
fumecheng-12767	43	1	however	however	ADV
fumecheng-12767	43	2	,	,	PUNCT
fumecheng-12767	43	3	as	as	ADP
fumecheng-12767	43	4	polymerization	polymerization	NOUN
fumecheng-12767	43	5	progresses	progress	NOUN
fumecheng-12767	43	6	and	and	CCONJ
fumecheng-12767	43	7	the	the	DET
fumecheng-12767	43	8	molecular	molecular	ADJ
fumecheng-12767	43	9	weight	weight	NOUN
fumecheng-12767	43	10	of	of	ADP
fumecheng-12767	43	11	the	the	DET
fumecheng-12767	43	12	polymer	polymer	NOUN
fumecheng-12767	43	13	exceeds	exceed	VERB
fumecheng-12767	43	14	a	a	DET
fumecheng-12767	43	15	certain	certain	ADJ
fumecheng-12767	43	16	level	level	NOUN
fumecheng-12767	43	17	,	,	PUNCT
fumecheng-12767	43	18	it	it	PRON
fumecheng-12767	43	19	does	do	AUX
fumecheng-12767	43	20	not	not	PART
fumecheng-12767	43	21	disperse	disperse	VERB
fumecheng-12767	43	22	and	and	CCONJ
fumecheng-12767	43	23	precipitate	precipitate	VERB
fumecheng-12767	43	24	.	.	PUNCT
fumecheng-12767	44	1	first	first	ADV
fumecheng-12767	44	2	,	,	PUNCT
fumecheng-12767	44	3	the	the	DET
fumecheng-12767	44	4	styrene	styrene	NOUN
fumecheng-12767	44	5	monomer	monomer	NOUN
fumecheng-12767	44	6	was	be	AUX
fumecheng-12767	44	7	reacted	react	VERB
fumecheng-12767	44	8	with	with	ADP
fumecheng-12767	44	9	activated	activated	ADJ
fumecheng-12767	44	10	alumina	alumina	NOUN
fumecheng-12767	44	11	(	(	PUNCT
fumecheng-12767	44	12	daejung	daejung	ADJ
fumecheng-12767	44	13	chemical	chemical	NOUN
fumecheng-12767	44	14	)	)	PUNCT
fumecheng-12767	44	15	for	for	ADP
fumecheng-12767	44	16	activation	activation	NOUN
fumecheng-12767	44	17	.	.	PUNCT
fumecheng-12767	45	1	to	to	PART
fumecheng-12767	45	2	prepare	prepare	VERB
fumecheng-12767	45	3	ps	ps	PROPN
fumecheng-12767	45	4	with	with	ADP
fumecheng-12767	45	5	a	a	DET
fumecheng-12767	45	6	positive	positive	ADJ
fumecheng-12767	45	7	surface	surface	NOUN
fumecheng-12767	45	8	charge	charge	NOUN
fumecheng-12767	45	9	,	,	PUNCT
fumecheng-12767	45	10	4	4	NUM
fumecheng-12767	45	11	ml	ml	NOUN
fumecheng-12767	45	12	of	of	ADP
fumecheng-12767	45	13	purified	purified	ADJ
fumecheng-12767	45	14	styrene	styrene	ADJ
fumecheng-12767	45	15	monomer	monomer	NOUN
fumecheng-12767	45	16	,	,	PUNCT
fumecheng-12767	45	17	215.9	215.9	NUM
fumecheng-12767	45	18	mg	mg	NOUN
fumecheng-12767	45	19	of	of	ADP
fumecheng-12767	45	20	polyvinyl	polyvinyl	NOUN
fumecheng-12767	45	21	pyrrolidone	pyrrolidone	NOUN
fumecheng-12767	45	22	(	(	PUNCT
fumecheng-12767	45	23	daejung	daejung	PROPN
fumecheng-12767	45	24	)	)	PUNCT
fumecheng-12767	45	25	,	,	PUNCT
fumecheng-12767	45	26	18.9	18.9	NUM
fumecheng-12767	45	27	mg	mg	NOUN
fumecheng-12767	45	28	of	of	ADP
fumecheng-12767	45	29	2,2	2,2	NUM
fumecheng-12767	45	30	-	-	ADJ
fumecheng-12767	45	31	azobisisobutyronitrile	azobisisobutyronitrile	NOUN
fumecheng-12767	45	32	(	(	PUNCT
fumecheng-12767	45	33	99	99	NUM
fumecheng-12767	45	34	%	%	NOUN
fumecheng-12767	45	35	,	,	PUNCT
fumecheng-12767	45	36	daejung	daejung	PROPN
fumecheng-12767	45	37	)	)	PUNCT
fumecheng-12767	45	38	,	,	PUNCT
fumecheng-12767	45	39	and	and	CCONJ
fumecheng-12767	45	40	0.1	0.1	NUM
fumecheng-12767	45	41	ml	ml	NOUN
fumecheng-12767	45	42	of	of	ADP
fumecheng-12767	45	43	[	[	X
fumecheng-12767	45	44	2-(methacryloyloxy)ethyl]trimethylammonium	2-(methacryloyloxy)ethyl]trimethylammonium	NUM
fumecheng-12767	45	45	chloride	chloride	NOUN
fumecheng-12767	45	46	solution	solution	NOUN
fumecheng-12767	45	47	(	(	PUNCT
fumecheng-12767	45	48	dmc	dmc	PROPN
fumecheng-12767	45	49	,	,	PUNCT
fumecheng-12767	45	50	75	75	NUM
fumecheng-12767	45	51	wt.%	wt.%	ADJ
fumecheng-12767	45	52	,	,	PUNCT
fumecheng-12767	45	53	sigma	sigma	PROPN
fumecheng-12767	45	54	-	-	PUNCT
fumecheng-12767	45	55	aldrich	aldrich	NOUN
fumecheng-12767	45	56	)	)	PUNCT
fumecheng-12767	45	57	were	be	AUX
fumecheng-12767	45	58	dispersed	disperse	VERB
fumecheng-12767	45	59	in	in	ADP
fumecheng-12767	45	60	a	a	DET
fumecheng-12767	45	61	three	three	NUM
fumecheng-12767	45	62	-	-	PUNCT
fumecheng-12767	45	63	necked	neck	VERB
fumecheng-12767	45	64	flask	flask	NOUN
fumecheng-12767	45	65	containing	contain	VERB
fumecheng-12767	45	66	40	40	NUM
fumecheng-12767	45	67	ml	ml	NOUN
fumecheng-12767	45	68	of	of	ADP
fumecheng-12767	45	69	ethanol	ethanol	NOUN
fumecheng-12767	45	70	and	and	CCONJ
fumecheng-12767	45	71	4	4	NUM
fumecheng-12767	45	72	ml	ml	NOUN
fumecheng-12767	45	73	of	of	ADP
fumecheng-12767	45	74	deionized	deionize	VERB
fumecheng-12767	45	75	(	(	PUNCT
fumecheng-12767	45	76	di	di	NOUN
fumecheng-12767	45	77	)	)	PUNCT
fumecheng-12767	45	78	water	water	NOUN
fumecheng-12767	45	79	.	.	PUNCT
fumecheng-12767	46	1	dmc	dmc	PROPN
fumecheng-12767	46	2	provided	provide	VERB
fumecheng-12767	46	3	a	a	DET
fumecheng-12767	46	4	positive	positive	ADJ
fumecheng-12767	46	5	functional	functional	ADJ
fumecheng-12767	46	6	group	group	NOUN
fumecheng-12767	46	7	on	on	ADP
fumecheng-12767	46	8	the	the	DET
fumecheng-12767	46	9	ps	ps	PROPN
fumecheng-12767	46	10	surface	surface	NOUN
fumecheng-12767	46	11	,	,	PUNCT
fumecheng-12767	46	12	making	make	VERB
fumecheng-12767	46	13	the	the	DET
fumecheng-12767	46	14	surface	surface	NOUN
fumecheng-12767	46	15	charge	charge	NOUN
fumecheng-12767	46	16	of	of	ADP
fumecheng-12767	46	17	the	the	DET
fumecheng-12767	46	18	entire	entire	ADJ
fumecheng-12767	46	19	molecule	molecule	NOUN
fumecheng-12767	46	20	positive	positive	ADJ
fumecheng-12767	46	21	.	.	PUNCT
fumecheng-12767	47	1	this	this	DET
fumecheng-12767	47	2	solution	solution	NOUN
fumecheng-12767	47	3	was	be	AUX
fumecheng-12767	47	4	reacted	react	VERB
fumecheng-12767	47	5	at	at	ADP
fumecheng-12767	47	6	70	70	NUM
fumecheng-12767	47	7	degrees	degree	NOUN
fumecheng-12767	47	8	for	for	ADP
fumecheng-12767	47	9	30	30	NUM
fumecheng-12767	47	10	min	min	NOUN
fumecheng-12767	47	11	while	while	SCONJ
fumecheng-12767	47	12	purging	purge	VERB
fumecheng-12767	47	13	with	with	ADP
fumecheng-12767	47	14	nitrogen	nitrogen	NOUN
fumecheng-12767	47	15	and	and	CCONJ
fumecheng-12767	47	16	then	then	ADV
fumecheng-12767	47	17	stirred	stir	VERB
fumecheng-12767	47	18	at	at	ADP
fumecheng-12767	47	19	500	500	NUM
fumecheng-12767	47	20	rpm	rpm	NOUN
fumecheng-12767	47	21	for	for	ADP
fumecheng-12767	47	22	18	18	NUM
fumecheng-12767	47	23	h	h	NOUN
fumecheng-12767	47	24	while	while	SCONJ
fumecheng-12767	47	25	continuously	continuously	ADV
fumecheng-12767	47	26	supplying	supply	VERB
fumecheng-12767	47	27	nitrogen	nitrogen	NOUN
fumecheng-12767	47	28	.	.	PUNCT
fumecheng-12767	48	1	the	the	DET
fumecheng-12767	48	2	resulting	result	VERB
fumecheng-12767	48	3	solution	solution	NOUN
fumecheng-12767	48	4	was	be	AUX
fumecheng-12767	48	5	washed	wash	VERB
fumecheng-12767	48	6	thrice	thrice	NOUN
fumecheng-12767	48	7	with	with	ADP
fumecheng-12767	48	8	ethanol	ethanol	NOUN
fumecheng-12767	48	9	using	use	VERB
fumecheng-12767	48	10	a	a	DET
fumecheng-12767	48	11	centrifuge	centrifuge	NOUN
fumecheng-12767	48	12	.	.	PUNCT
fumecheng-12767	49	1	finally	finally	ADV
fumecheng-12767	49	2	,	,	PUNCT
fumecheng-12767	49	3	it	it	PRON
fumecheng-12767	49	4	was	be	AUX
fumecheng-12767	49	5	dried	dry	VERB
fumecheng-12767	49	6	under	under	ADP
fumecheng-12767	49	7	vacuum	vacuum	NOUN
fumecheng-12767	49	8	at	at	ADP
fumecheng-12767	49	9	50	50	NUM
fumecheng-12767	49	10	degrees	degree	NOUN
fumecheng-12767	49	11	for	for	ADP
fumecheng-12767	49	12	24	24	NUM
fumecheng-12767	49	13	h	h	NOUN
fumecheng-12767	49	14	to	to	PART
fumecheng-12767	49	15	obtain	obtain	VERB
fumecheng-12767	49	16	ps	ps	NOUN
fumecheng-12767	49	17	with	with	ADP
fumecheng-12767	49	18	a	a	DET
fumecheng-12767	49	19	positive	positive	ADJ
fumecheng-12767	49	20	charge	charge	NOUN
fumecheng-12767	49	21	.	.	PUNCT
fumecheng-12767	50	1	2.2	2.2	NUM
fumecheng-12767	50	2	.	.	PUNCT
fumecheng-12767	50	3	synthesis	synthesis	NOUN
fumecheng-12767	50	4	of	of	ADP
fumecheng-12767	50	5	ti3c2tx	ti3c2tx	NOUN
fumecheng-12767	50	6	mxene	mxene	NOUN
fumecheng-12767	50	7	nanosheets	nanosheet	NOUN
fumecheng-12767	50	8	ti3c2tx	ti3c2tx	VERB
fumecheng-12767	50	9	mxene	mxene	NOUN
fumecheng-12767	50	10	can	can	AUX
fumecheng-12767	50	11	be	be	AUX
fumecheng-12767	50	12	obtained	obtain	VERB
fumecheng-12767	50	13	by	by	ADP
fumecheng-12767	50	14	selectively	selectively	ADV
fumecheng-12767	50	15	etching	etch	VERB
fumecheng-12767	50	16	the	the	DET
fumecheng-12767	50	17	al	al	PROPN
fumecheng-12767	50	18	layers	layer	NOUN
fumecheng-12767	50	19	of	of	ADP
fumecheng-12767	50	20	titanium	titanium	NOUN
fumecheng-12767	50	21	aluminum	aluminum	NOUN
fumecheng-12767	50	22	carbide	carbide	NOUN
fumecheng-12767	50	23	(	(	PUNCT
fumecheng-12767	50	24	ti3alc2	ti3alc2	PROPN
fumecheng-12767	50	25	max	max	PROPN
fumecheng-12767	50	26	,	,	PUNCT
fumecheng-12767	50	27	>	>	NOUN
fumecheng-12767	50	28	90	90	NUM
fumecheng-12767	50	29	%	%	NOUN
fumecheng-12767	50	30	,	,	PUNCT
fumecheng-12767	50	31	<	<	X
fumecheng-12767	50	32	40	40	NUM
fumecheng-12767	50	33	µm	µm	ADP
fumecheng-12767	50	34	particle	particle	NOUN
fumecheng-12767	50	35	size	size	NOUN
fumecheng-12767	50	36	,	,	PUNCT
fumecheng-12767	50	37	sigma	sigma	PROPN
fumecheng-12767	50	38	-	-	PUNCT
fumecheng-12767	50	39	aldrich	aldrich	NOUN
fumecheng-12767	50	40	)	)	PUNCT
fumecheng-12767	50	41	.	.	PUNCT
fumecheng-12767	51	1	for	for	ADP
fumecheng-12767	51	2	etching	etch	VERB
fumecheng-12767	51	3	,	,	PUNCT
fumecheng-12767	51	4	acidic	acidic	ADJ
fumecheng-12767	51	5	solutions	solution	NOUN
fumecheng-12767	51	6	of	of	ADP
fumecheng-12767	51	7	fluorides	fluoride	NOUN
fumecheng-12767	51	8	,	,	PUNCT
fumecheng-12767	51	9	such	such	ADJ
fumecheng-12767	51	10	as	as	ADP
fumecheng-12767	51	11	hydrofluoric	hydrofluoric	ADJ
fumecheng-12767	51	12	acid	acid	NOUN
fumecheng-12767	52	1	[	[	X
fumecheng-12767	52	2	22	22	NUM
fumecheng-12767	52	3	]	]	PUNCT
fumecheng-12767	52	4	,	,	PUNCT
fumecheng-12767	52	5	ammonium	ammonium	NOUN
fumecheng-12767	52	6	hydrogen	hydrogen	NOUN
fumecheng-12767	52	7	bifluoride	bifluoride	NOUN
fumecheng-12767	52	8	[	[	X
fumecheng-12767	52	9	23	23	NUM
fumecheng-12767	52	10	]	]	PUNCT
fumecheng-12767	52	11	,	,	PUNCT
fumecheng-12767	52	12	or	or	CCONJ
fumecheng-12767	52	13	a	a	DET
fumecheng-12767	52	14	solution	solution	NOUN
fumecheng-12767	52	15	mixed	mix	VERB
fumecheng-12767	52	16	with	with	ADP
fumecheng-12767	52	17	hydrochloric	hydrochloric	ADJ
fumecheng-12767	52	18	acid	acid	NOUN
fumecheng-12767	52	19	(	(	PUNCT
fumecheng-12767	52	20	hcl	hcl	PROPN
fumecheng-12767	52	21	)	)	PUNCT
fumecheng-12767	52	22	and	and	CCONJ
fumecheng-12767	52	23	lithium	lithium	NOUN
fumecheng-12767	52	24	fluoride	fluoride	NOUN
fumecheng-12767	52	25	(	(	PUNCT
fumecheng-12767	52	26	lif	lif	PROPN
fumecheng-12767	52	27	)	)	PUNCT
fumecheng-12767	53	1	[	[	X
fumecheng-12767	53	2	24	24	NUM
fumecheng-12767	53	3	]	]	PUNCT
fumecheng-12767	53	4	,	,	PUNCT
fumecheng-12767	53	5	are	be	AUX
fumecheng-12767	53	6	used	use	VERB
fumecheng-12767	53	7	.	.	PUNCT
fumecheng-12767	54	1	among	among	ADP
fumecheng-12767	54	2	these	these	PRON
fumecheng-12767	54	3	,	,	PUNCT
fumecheng-12767	54	4	the	the	DET
fumecheng-12767	54	5	hcl	hcl	PROPN
fumecheng-12767	54	6	and	and	CCONJ
fumecheng-12767	54	7	lif	lif	PROPN
fumecheng-12767	54	8	method	method	NOUN
fumecheng-12767	54	9	provides	provide	VERB
fumecheng-12767	54	10	a	a	DET
fumecheng-12767	54	11	high	high	ADJ
fumecheng-12767	54	12	yield	yield	NOUN
fumecheng-12767	54	13	,	,	PUNCT
fumecheng-12767	54	14	is	be	AUX
fumecheng-12767	54	15	safe	safe	ADJ
fumecheng-12767	54	16	,	,	PUNCT
fumecheng-12767	54	17	and	and	CCONJ
fumecheng-12767	54	18	can	can	AUX
fumecheng-12767	54	19	be	be	AUX
fumecheng-12767	54	20	synthesized	synthesize	VERB
fumecheng-12767	54	21	quickly	quickly	ADV
fumecheng-12767	54	22	and	and	CCONJ
fumecheng-12767	54	23	easily	easily	ADV
fumecheng-12767	54	24	.	.	PUNCT
fumecheng-12767	55	1	4.8	4.8	NUM
fumecheng-12767	55	2	g	g	NOUN
fumecheng-12767	55	3	of	of	ADP
fumecheng-12767	55	4	lif	lif	PROPN
fumecheng-12767	55	5	(	(	PUNCT
fumecheng-12767	55	6	fujifilm	fujifilm	PROPN
fumecheng-12767	55	7	)	)	PUNCT
fumecheng-12767	55	8	and	and	CCONJ
fumecheng-12767	55	9	60	60	NUM
fumecheng-12767	55	10	ml	ml	NOUN
fumecheng-12767	55	11	of	of	ADP
fumecheng-12767	55	12	9	9	NUM
fumecheng-12767	55	13	m	m	NOUN
fumecheng-12767	55	14	hcl	hcl	PROPN
fumecheng-12767	55	15	were	be	AUX
fumecheng-12767	55	16	added	add	VERB
fumecheng-12767	55	17	into	into	ADP
fumecheng-12767	55	18	a	a	DET
fumecheng-12767	55	19	teflon	teflon	NOUN
fumecheng-12767	55	20	container	container	NOUN
fumecheng-12767	55	21	and	and	CCONJ
fumecheng-12767	55	22	stirred	stir	VERB
fumecheng-12767	55	23	until	until	SCONJ
fumecheng-12767	55	24	lif	lif	PROPN
fumecheng-12767	55	25	was	be	AUX
fumecheng-12767	55	26	completely	completely	ADV
fumecheng-12767	55	27	dissolved	dissolve	VERB
fumecheng-12767	55	28	.	.	PUNCT
fumecheng-12767	56	1	the	the	DET
fumecheng-12767	56	2	temperature	temperature	NOUN
fumecheng-12767	56	3	of	of	ADP
fumecheng-12767	56	4	the	the	DET
fumecheng-12767	56	5	solution	solution	NOUN
fumecheng-12767	56	6	was	be	AUX
fumecheng-12767	56	7	raised	raise	VERB
fumecheng-12767	56	8	to	to	ADP
fumecheng-12767	56	9	35	35	NUM
fumecheng-12767	56	10	degrees	degree	NOUN
fumecheng-12767	56	11	,	,	PUNCT
fumecheng-12767	56	12	and	and	CCONJ
fumecheng-12767	56	13	3	3	NUM
fumecheng-12767	56	14	g	g	NOUN
fumecheng-12767	56	15	of	of	ADP
fumecheng-12767	56	16	ti3alc2	ti3alc2	PROPN
fumecheng-12767	56	17	was	be	AUX
fumecheng-12767	56	18	slowly	slowly	ADV
fumecheng-12767	56	19	added	add	VERB
fumecheng-12767	56	20	.	.	PUNCT
fumecheng-12767	57	1	then	then	ADV
fumecheng-12767	57	2	,	,	PUNCT
fumecheng-12767	57	3	the	the	DET
fumecheng-12767	57	4	mixture	mixture	NOUN
fumecheng-12767	57	5	was	be	AUX
fumecheng-12767	57	6	reacted	react	VERB
fumecheng-12767	57	7	at	at	ADP
fumecheng-12767	57	8	350	350	NUM
fumecheng-12767	57	9	rpm	rpm	NOUN
fumecheng-12767	57	10	for	for	ADP
fumecheng-12767	57	11	24	24	NUM
fumecheng-12767	57	12	h.	h.	PROPN
fumecheng-12767	57	13	the	the	DET
fumecheng-12767	57	14	reacted	react	VERB
fumecheng-12767	57	15	solution	solution	NOUN
fumecheng-12767	57	16	was	be	AUX
fumecheng-12767	57	17	repeatedly	repeatedly	ADV
fumecheng-12767	57	18	centrifuged	centrifuge	VERB
fumecheng-12767	57	19	at	at	ADP
fumecheng-12767	57	20	8000	8000	NUM
fumecheng-12767	57	21	rpm	rpm	NOUN
fumecheng-12767	57	22	for	for	ADP
fumecheng-12767	57	23	10	10	NUM
fumecheng-12767	57	24	min	min	NOUN
fumecheng-12767	57	25	using	use	VERB
fumecheng-12767	57	26	di	di	NOUN
fumecheng-12767	57	27	water	water	NOUN
fumecheng-12767	57	28	until	until	SCONJ
fumecheng-12767	57	29	the	the	DET
fumecheng-12767	57	30	ph	ph	NOUN
fumecheng-12767	57	31	was	be	AUX
fumecheng-12767	57	32	about	about	ADV
fumecheng-12767	57	33	6	6	NUM
fumecheng-12767	57	34	.	.	PUNCT
fumecheng-12767	58	1	when	when	SCONJ
fumecheng-12767	58	2	the	the	DET
fumecheng-12767	58	3	ph	ph	NOUN
fumecheng-12767	58	4	of	of	ADP
fumecheng-12767	58	5	the	the	DET
fumecheng-12767	58	6	supernatant	supernatant	NOUN
fumecheng-12767	58	7	reached	reach	VERB
fumecheng-12767	58	8	about	about	ADV
fumecheng-12767	58	9	6	6	NUM
fumecheng-12767	58	10	,	,	PUNCT
fumecheng-12767	58	11	unreacted	unreacted	ADJ
fumecheng-12767	58	12	substances	substance	NOUN
fumecheng-12767	58	13	and	and	CCONJ
fumecheng-12767	58	14	impurities	impurity	NOUN
fumecheng-12767	58	15	were	be	AUX
fumecheng-12767	58	16	removed	remove	VERB
fumecheng-12767	58	17	,	,	PUNCT
fumecheng-12767	58	18	and	and	CCONJ
fumecheng-12767	58	19	single	single	ADJ
fumecheng-12767	58	20	-	-	PUNCT
fumecheng-12767	58	21	layer	layer	NOUN
fumecheng-12767	58	22	or	or	CCONJ
fumecheng-12767	58	23	few	few	ADJ
fumecheng-12767	58	24	-	-	PUNCT
fumecheng-12767	58	25	layer	layer	NOUN
fumecheng-12767	59	1	ti3c2tx	ti3c2tx	X
fumecheng-12767	59	2	mxene	mxene	NOUN
fumecheng-12767	59	3	was	be	AUX
fumecheng-12767	59	4	obtained	obtain	VERB
fumecheng-12767	59	5	by	by	ADP
fumecheng-12767	59	6	centrifuging	centrifuge	VERB
fumecheng-12767	59	7	at	at	ADP
fumecheng-12767	59	8	1000	1000	NUM
fumecheng-12767	59	9	g	g	NOUN
fumecheng-12767	59	10	for	for	ADP
fumecheng-12767	59	11	20	20	NUM
fumecheng-12767	59	12	min	min	NOUN
fumecheng-12767	59	13	.	.	PUNCT
fumecheng-12767	60	1	the	the	DET
fumecheng-12767	60	2	supernatant	supernatant	NOUN
fumecheng-12767	60	3	that	that	PRON
fumecheng-12767	60	4	did	do	AUX
fumecheng-12767	60	5	not	not	PART
fumecheng-12767	60	6	settle	settle	VERB
fumecheng-12767	60	7	was	be	AUX
fumecheng-12767	60	8	filtered	filter	VERB
fumecheng-12767	60	9	using	use	VERB
fumecheng-12767	60	10	a	a	DET
fumecheng-12767	60	11	vacuum	vacuum	NOUN
fumecheng-12767	60	12	-	-	PUNCT
fumecheng-12767	60	13	assisted	assist	VERB
fumecheng-12767	60	14	filtration	filtration	NOUN
fumecheng-12767	60	15	device	device	NOUN
fumecheng-12767	60	16	with	with	ADP
fumecheng-12767	60	17	cellulose	cellulose	NOUN
fumecheng-12767	60	18	ester	ester	NOUN
fumecheng-12767	60	19	membrane	membrane	NOUN
fumecheng-12767	60	20	filter	filter	NOUN
fumecheng-12767	60	21	(	(	PUNCT
fumecheng-12767	60	22	mce	mce	NOUN
fumecheng-12767	60	23	,	,	PUNCT
fumecheng-12767	60	24	pore	pore	ADJ
fumecheng-12767	60	25	size	size	NOUN
fumecheng-12767	60	26	:	:	PUNCT
fumecheng-12767	60	27	20	20	NUM
fumecheng-12767	60	28	µm	µm	NOUN
fumecheng-12767	60	29	,	,	PUNCT
fumecheng-12767	60	30	hyundai	hyundai	PROPN
fumecheng-12767	60	31	micro	micro	NOUN
fumecheng-12767	60	32	)	)	PUNCT
fumecheng-12767	60	33	and	and	CCONJ
fumecheng-12767	60	34	dried	dry	VERB
fumecheng-12767	60	35	at	at	ADP
fumecheng-12767	60	36	room	room	NOUN
fumecheng-12767	60	37	temperature	temperature	NOUN
fumecheng-12767	60	38	under	under	ADP
fumecheng-12767	60	39	vacuum	vacuum	NOUN
fumecheng-12767	60	40	for	for	ADP
fumecheng-12767	60	41	36	36	NUM
fumecheng-12767	60	42	h.	h.	NOUN
fumecheng-12767	60	43	the	the	DET
fumecheng-12767	60	44	dried	dry	VERB
fumecheng-12767	60	45	mxene	mxene	NOUN
fumecheng-12767	60	46	was	be	AUX
fumecheng-12767	60	47	mixed	mix	VERB
fumecheng-12767	60	48	with	with	ADP
fumecheng-12767	60	49	di	di	NOUN
fumecheng-12767	60	50	water	water	NOUN
fumecheng-12767	60	51	to	to	PART
fumecheng-12767	60	52	attain	attain	VERB
fumecheng-12767	60	53	a	a	DET
fumecheng-12767	60	54	concentration	concentration	NOUN
fumecheng-12767	60	55	of	of	ADP
fumecheng-12767	60	56	1	1	NUM
fumecheng-12767	60	57	mg	mg	NUM
fumecheng-12767	60	58	/	/	SYM
fumecheng-12767	60	59	ml	ml	NOUN
fumecheng-12767	60	60	.	.	PUNCT
fumecheng-12767	61	1	the	the	DET
fumecheng-12767	61	2	mixed	mixed	ADJ
fumecheng-12767	61	3	solution	solution	NOUN
fumecheng-12767	61	4	was	be	AUX
fumecheng-12767	61	5	purged	purge	VERB
fumecheng-12767	61	6	with	with	ADP
fumecheng-12767	61	7	ar	ar	NOUN
fumecheng-12767	61	8	gas	gas	NOUN
fumecheng-12767	61	9	(	(	PUNCT
fumecheng-12767	61	10	99.99%of	99.99%of	NOUN
fumecheng-12767	61	11	purity	purity	NOUN
fumecheng-12767	61	12	)	)	PUNCT
fumecheng-12767	61	13	for	for	ADP
fumecheng-12767	61	14	over	over	ADP
fumecheng-12767	61	15	30	30	NUM
fumecheng-12767	61	16	min	min	NOUN
fumecheng-12767	61	17	.	.	PROPN
fumecheng-12767	61	18	subsequently	subsequently	ADV
fumecheng-12767	61	19	,	,	PUNCT
fumecheng-12767	61	20	while	while	SCONJ
fumecheng-12767	61	21	continuously	continuously	ADV
fumecheng-12767	61	22	supplying	supply	VERB
fumecheng-12767	61	23	ar	ar	NOUN
fumecheng-12767	61	24	,	,	PUNCT
fumecheng-12767	61	25	it	it	PRON
fumecheng-12767	61	26	was	be	AUX
fumecheng-12767	61	27	put	put	VERB
fumecheng-12767	61	28	into	into	ADP
fumecheng-12767	61	29	an	an	DET
fumecheng-12767	61	30	ultra	ultra	ADJ
fumecheng-12767	61	31	-	-	ADJ
fumecheng-12767	61	32	sonicator	sonicator	NOUN
fumecheng-12767	61	33	filled	fill	VERB
fumecheng-12767	61	34	with	with	ADP
fumecheng-12767	61	35	ice	ice	NOUN
fumecheng-12767	61	36	and	and	CCONJ
fumecheng-12767	61	37	ultrasonically	ultrasonically	PROPN
fumecheng-12767	61	38	treated	treat	VERB
fumecheng-12767	61	39	.	.	PUNCT
fumecheng-12767	62	1	consequently	consequently	ADV
fumecheng-12767	62	2	,	,	PUNCT
fumecheng-12767	62	3	the	the	DET
fumecheng-12767	62	4	al	al	PROPN
fumecheng-12767	62	5	layers	layer	NOUN
fumecheng-12767	62	6	were	be	AUX
fumecheng-12767	62	7	removed	remove	VERB
fumecheng-12767	62	8	,	,	PUNCT
fumecheng-12767	62	9	and	and	CCONJ
fumecheng-12767	62	10	each	each	DET
fumecheng-12767	62	11	layer	layer	NOUN
fumecheng-12767	62	12	of	of	ADP
fumecheng-12767	62	13	the	the	DET
fumecheng-12767	62	14	layered	layered	ADJ
fumecheng-12767	62	15	structure	structure	NOUN
fumecheng-12767	62	16	of	of	ADP
fumecheng-12767	62	17	mxene	mxene	NOUN
fumecheng-12767	62	18	was	be	AUX
fumecheng-12767	62	19	exfoliated	exfoliate	VERB
fumecheng-12767	62	20	.	.	PUNCT
fumecheng-12767	63	1	mxene	mxene	NOUN
fumecheng-12767	63	2	nanosheets	nanosheet	NOUN
fumecheng-12767	63	3	with	with	ADP
fumecheng-12767	63	4	a	a	DET
fumecheng-12767	63	5	negative	negative	ADJ
fumecheng-12767	63	6	surface	surface	NOUN
fumecheng-12767	63	7	charge	charge	NOUN
fumecheng-12767	63	8	were	be	AUX
fumecheng-12767	63	9	thus	thus	ADV
fumecheng-12767	63	10	obtained	obtain	VERB
fumecheng-12767	63	11	.	.	PUNCT
fumecheng-12767	64	1	2.3	2.3	NUM
fumecheng-12767	64	2	.	.	PUNCT
fumecheng-12767	64	3	synthesis	synthesis	NOUN
fumecheng-12767	64	4	of	of	ADP
fumecheng-12767	64	5	boron	boron	NOUN
fumecheng-12767	64	6	nitride	nitride	NOUN
fumecheng-12767	64	7	nanosheets	nanosheet	NOUN
fumecheng-12767	64	8	(	(	PUNCT
fumecheng-12767	64	9	bnnss	bnns	NOUN
fumecheng-12767	64	10	)	)	PUNCT
fumecheng-12767	64	11	1.5	1.5	NUM
fumecheng-12767	64	12	g	g	NOUN
fumecheng-12767	64	13	of	of	ADP
fumecheng-12767	64	14	bulk	bulk	ADJ
fumecheng-12767	64	15	hexagonal	hexagonal	ADJ
fumecheng-12767	64	16	-	-	PUNCT
fumecheng-12767	64	17	boron	boron	NOUN
fumecheng-12767	64	18	nitride	nitride	NOUN
fumecheng-12767	64	19	(	(	PUNCT
fumecheng-12767	64	20	h	h	NOUN
fumecheng-12767	64	21	-	-	PUNCT
fumecheng-12767	64	22	bn	bn	NOUN
fumecheng-12767	64	23	,	,	PUNCT
fumecheng-12767	64	24	98	98	NUM
fumecheng-12767	64	25	%	%	NOUN
fumecheng-12767	64	26	,	,	PUNCT
fumecheng-12767	64	27	sigma	sigma	PROPN
fumecheng-12767	64	28	-	-	PUNCT
fumecheng-12767	64	29	aldrich	aldrich	NOUN
fumecheng-12767	64	30	)	)	PUNCT
fumecheng-12767	64	31	was	be	AUX
fumecheng-12767	64	32	put	put	VERB
fumecheng-12767	64	33	into	into	ADP
fumecheng-12767	64	34	a	a	DET
fumecheng-12767	64	35	solution	solution	NOUN
fumecheng-12767	64	36	mixed	mix	VERB
fumecheng-12767	64	37	with	with	ADP
fumecheng-12767	64	38	150	150	NUM
fumecheng-12767	64	39	ml	ml	NOUN
fumecheng-12767	64	40	of	of	ADP
fumecheng-12767	64	41	di	di	NOUN
fumecheng-12767	64	42	water	water	NOUN
fumecheng-12767	64	43	and	and	CCONJ
fumecheng-12767	64	44	150	150	NUM
fumecheng-12767	64	45	ml	ml	NOUN
fumecheng-12767	64	46	of	of	ADP
fumecheng-12767	64	47	isopropanol	isopropanol	NOUN
fumecheng-12767	64	48	(	(	PUNCT
fumecheng-12767	64	49	ipa	ipa	PROPN
fumecheng-12767	64	50	,	,	PUNCT
fumecheng-12767	64	51	99.8	99.8	NUM
fumecheng-12767	64	52	%	%	NOUN
fumecheng-12767	64	53	,	,	PUNCT
fumecheng-12767	64	54	samchun	samchun	PROPN
fumecheng-12767	64	55	pure	pure	ADJ
fumecheng-12767	64	56	chemicals	chemical	NOUN
fumecheng-12767	64	57	)	)	PUNCT
fumecheng-12767	64	58	and	and	CCONJ
fumecheng-12767	64	59	ultrasonically	ultrasonically	PROPN
fumecheng-12767	64	60	treated	treat	VERB
fumecheng-12767	64	61	for	for	ADP
fumecheng-12767	64	62	12	12	NUM
fumecheng-12767	64	63	h.	h.	PROPN
fumecheng-12767	64	64	h	h	PROPN
fumecheng-12767	64	65	-	-	PUNCT
fumecheng-12767	64	66	bn	bn	NOUN
fumecheng-12767	64	67	exists	exist	VERB
fumecheng-12767	64	68	in	in	ADP
fumecheng-12767	64	69	a	a	DET
fumecheng-12767	64	70	hexagonal	hexagonal	ADJ
fumecheng-12767	64	71	columnar	columnar	NOUN
fumecheng-12767	64	72	layered	layer	VERB
fumecheng-12767	64	73	structure	structure	NOUN
fumecheng-12767	64	74	.	.	PUNCT
fumecheng-12767	65	1	after	after	ADP
fumecheng-12767	65	2	ultrasonication	ultrasonication	NOUN
fumecheng-12767	65	3	,	,	PUNCT
fumecheng-12767	65	4	each	each	DET
fumecheng-12767	65	5	layer	layer	NOUN
fumecheng-12767	65	6	was	be	AUX
fumecheng-12767	65	7	exfoliated	exfoliate	VERB
fumecheng-12767	65	8	to	to	PART
fumecheng-12767	65	9	obtain	obtain	VERB
fumecheng-12767	65	10	thin	thin	ADJ
fumecheng-12767	65	11	layers	layer	NOUN
fumecheng-12767	65	12	of	of	ADP
fumecheng-12767	65	13	bnnss	bnns	NOUN
fumecheng-12767	65	14	.	.	PUNCT
fumecheng-12767	66	1	after	after	ADP
fumecheng-12767	66	2	ultrasonic	ultrasonic	ADJ
fumecheng-12767	66	3	treatment	treatment	NOUN
fumecheng-12767	66	4	,	,	PUNCT
fumecheng-12767	66	5	it	it	PRON
fumecheng-12767	66	6	was	be	AUX
fumecheng-12767	66	7	centrifuged	centrifuge	VERB
fumecheng-12767	66	8	at	at	ADP
fumecheng-12767	66	9	2000	2000	NUM
fumecheng-12767	66	10	rpm	rpm	NOUN
fumecheng-12767	66	11	for	for	ADP
fumecheng-12767	66	12	20	20	NUM
fumecheng-12767	66	13	min	min	NOUN
fumecheng-12767	66	14	,	,	PUNCT
fumecheng-12767	66	15	and	and	CCONJ
fumecheng-12767	66	16	the	the	DET
fumecheng-12767	66	17	supernatant	supernatant	NOUN
fumecheng-12767	66	18	that	that	PRON
fumecheng-12767	66	19	did	do	AUX
fumecheng-12767	66	20	not	not	PART
fumecheng-12767	66	21	settle	settle	VERB
fumecheng-12767	66	22	was	be	AUX
fumecheng-12767	66	23	vacuum	vacuum	NOUN
fumecheng-12767	66	24	-	-	PUNCT
fumecheng-12767	66	25	assisted	assist	VERB
fumecheng-12767	66	26	filtered	filter	VERB
fumecheng-12767	66	27	using	use	VERB
fumecheng-12767	66	28	an	an	DET
fumecheng-12767	66	29	mce	mce	NOUN
fumecheng-12767	66	30	filter	filter	NOUN
fumecheng-12767	66	31	to	to	PART
fumecheng-12767	66	32	obtain	obtain	VERB
fumecheng-12767	66	33	sufficiently	sufficiently	ADV
fumecheng-12767	66	34	exfoliated	exfoliate	VERB
fumecheng-12767	66	35	bnnss	bnns	NOUN
fumecheng-12767	66	36	.	.	PUNCT
fumecheng-12767	67	1	the	the	DET
fumecheng-12767	67	2	filtered	filter	VERB
fumecheng-12767	67	3	bnnss	bnns	NOUN
fumecheng-12767	67	4	were	be	AUX
fumecheng-12767	67	5	dried	dry	VERB
fumecheng-12767	67	6	at	at	ADP
fumecheng-12767	67	7	a	a	DET
fumecheng-12767	67	8	temperature	temperature	NOUN
fumecheng-12767	67	9	of	of	ADP
fumecheng-12767	67	10	100	100	NUM
fumecheng-12767	67	11	degrees	degree	NOUN
fumecheng-12767	67	12	for	for	ADP
fumecheng-12767	67	13	10	10	NUM
fumecheng-12767	67	14	h.	h.	NOUN
fumecheng-12767	67	15	the	the	DET
fumecheng-12767	67	16	surface	surface	NOUN
fumecheng-12767	67	17	of	of	ADP
fumecheng-12767	67	18	the	the	DET
fumecheng-12767	67	19	obtained	obtain	VERB
fumecheng-12767	67	20	bnnss	bnns	NOUN
fumecheng-12767	67	21	had	have	VERB
fumecheng-12767	67	22	a	a	DET
fumecheng-12767	67	23	-oh	-oh	ADJ
fumecheng-12767	67	24	functional	functional	ADJ
fumecheng-12767	67	25	group	group	NOUN
fumecheng-12767	67	26	,	,	PUNCT
fumecheng-12767	67	27	which	which	PRON
fumecheng-12767	67	28	was	be	AUX
fumecheng-12767	67	29	formed	form	VERB
fumecheng-12767	67	30	when	when	SCONJ
fumecheng-12767	67	31	each	each	DET
fumecheng-12767	67	32	layer	layer	NOUN
fumecheng-12767	67	33	was	be	AUX
fumecheng-12767	67	34	separated	separate	VERB
fumecheng-12767	67	35	,	,	PUNCT
fumecheng-12767	67	36	thus	thus	ADV
fumecheng-12767	67	37	lending	lend	VERB
fumecheng-12767	67	38	it	it	PRON
fumecheng-12767	67	39	a	a	DET
fumecheng-12767	67	40	negative	negative	ADJ
fumecheng-12767	67	41	surface	surface	NOUN
fumecheng-12767	67	42	charge	charge	NOUN
fumecheng-12767	67	43	.	.	PUNCT
fumecheng-12767	68	1	to	to	ADP
fumecheng-12767	68	2	604	604	NUM
fumecheng-12767	68	3	c.	c.	NOUN
fumecheng-12767	68	4	choi	choi	NOUN
fumecheng-12767	68	5	,	,	PUNCT
fumecheng-12767	68	6	n.	n.	PROPN
fumecheng-12767	68	7	qaiser	qaiser	PROPN
fumecheng-12767	68	8	,	,	PUNCT
fumecheng-12767	68	9	b.	b.	PROPN
fumecheng-12767	68	10	hwang	hwang	PROPN
fumecheng-12767	68	11	change	change	VERB
fumecheng-12767	68	12	this	this	PRON
fumecheng-12767	68	13	to	to	ADP
fumecheng-12767	68	14	a	a	DET
fumecheng-12767	68	15	positive	positive	ADJ
fumecheng-12767	68	16	charge	charge	NOUN
fumecheng-12767	68	17	,	,	PUNCT
fumecheng-12767	68	18	it	it	PRON
fumecheng-12767	68	19	was	be	AUX
fumecheng-12767	68	20	reacted	react	VERB
fumecheng-12767	68	21	with	with	ADP
fumecheng-12767	68	22	(	(	PUNCT
fumecheng-12767	68	23	3	3	NUM
fumecheng-12767	68	24	-	-	PUNCT
fumecheng-12767	68	25	aminopropyl)triethoxysilane	aminopropyl)triethoxysilane	NOUN
fumecheng-12767	68	26	(	(	PUNCT
fumecheng-12767	68	27	aptes	apte	NOUN
fumecheng-12767	68	28	,	,	PUNCT
fumecheng-12767	68	29	99	99	NUM
fumecheng-12767	68	30	%	%	NOUN
fumecheng-12767	68	31	,	,	PUNCT
fumecheng-12767	68	32	sigma	sigma	PROPN
fumecheng-12767	68	33	-	-	PUNCT
fumecheng-12767	68	34	aldrich	aldrich	NOUN
fumecheng-12767	68	35	)	)	PUNCT
fumecheng-12767	68	36	.	.	PUNCT
fumecheng-12767	69	1	aptes	apte	NOUN
fumecheng-12767	69	2	reacted	react	VERB
fumecheng-12767	69	3	with	with	ADP
fumecheng-12767	69	4	the	the	DET
fumecheng-12767	69	5	-oh	-oh	NOUN
fumecheng-12767	69	6	on	on	ADP
fumecheng-12767	69	7	the	the	DET
fumecheng-12767	69	8	surface	surface	NOUN
fumecheng-12767	69	9	of	of	ADP
fumecheng-12767	69	10	bnnss	bnns	NOUN
fumecheng-12767	69	11	,	,	PUNCT
fumecheng-12767	69	12	and	and	CCONJ
fumecheng-12767	69	13	the	the	DET
fumecheng-12767	69	14	-nh2	-nh2	ADJ
fumecheng-12767	69	15	functional	functional	ADJ
fumecheng-12767	69	16	group	group	NOUN
fumecheng-12767	69	17	at	at	ADP
fumecheng-12767	69	18	the	the	DET
fumecheng-12767	69	19	end	end	NOUN
fumecheng-12767	69	20	changed	change	VERB
fumecheng-12767	69	21	the	the	DET
fumecheng-12767	69	22	surface	surface	NOUN
fumecheng-12767	69	23	charge	charge	NOUN
fumecheng-12767	69	24	to	to	ADP
fumecheng-12767	69	25	positive	positive	ADJ
fumecheng-12767	69	26	[	[	X
fumecheng-12767	69	27	25	25	NUM
fumecheng-12767	69	28	]	]	PUNCT
fumecheng-12767	69	29	.	.	PUNCT
fumecheng-12767	70	1	0.015	0.015	NUM
fumecheng-12767	70	2	g	g	NOUN
fumecheng-12767	70	3	of	of	ADP
fumecheng-12767	70	4	aptes	apte	NOUN
fumecheng-12767	70	5	was	be	AUX
fumecheng-12767	70	6	put	put	VERB
fumecheng-12767	70	7	into	into	ADP
fumecheng-12767	70	8	25	25	NUM
fumecheng-12767	70	9	ml	ml	NOUN
fumecheng-12767	70	10	of	of	ADP
fumecheng-12767	70	11	ethanol	ethanol	NOUN
fumecheng-12767	70	12	and	and	CCONJ
fumecheng-12767	70	13	reacted	react	VERB
fumecheng-12767	70	14	at	at	ADP
fumecheng-12767	70	15	60	60	NUM
fumecheng-12767	70	16	degrees	degree	NOUN
fumecheng-12767	70	17	for	for	ADP
fumecheng-12767	70	18	30	30	NUM
fumecheng-12767	70	19	min	min	NOUN
fumecheng-12767	70	20	.	.	PROPN
fumecheng-12767	70	21	then	then	ADV
fumecheng-12767	70	22	,	,	PUNCT
fumecheng-12767	70	23	0.5	0.5	NUM
fumecheng-12767	70	24	g	g	NOUN
fumecheng-12767	70	25	of	of	ADP
fumecheng-12767	70	26	bnnss	bnns	NOUN
fumecheng-12767	70	27	was	be	AUX
fumecheng-12767	70	28	added	add	VERB
fumecheng-12767	70	29	and	and	CCONJ
fumecheng-12767	70	30	stirred	stir	VERB
fumecheng-12767	70	31	at	at	ADP
fumecheng-12767	70	32	80	80	NUM
fumecheng-12767	70	33	degrees	degree	NOUN
fumecheng-12767	70	34	for	for	ADP
fumecheng-12767	70	35	6	6	NUM
fumecheng-12767	70	36	h.	h.	NOUN
fumecheng-12767	70	37	after	after	ADP
fumecheng-12767	70	38	the	the	DET
fumecheng-12767	70	39	reaction	reaction	NOUN
fumecheng-12767	70	40	,	,	PUNCT
fumecheng-12767	70	41	it	it	PRON
fumecheng-12767	70	42	was	be	AUX
fumecheng-12767	70	43	washed	wash	VERB
fumecheng-12767	70	44	three	three	NUM
fumecheng-12767	70	45	times	time	NOUN
fumecheng-12767	70	46	with	with	ADP
fumecheng-12767	70	47	ethanol	ethanol	NOUN
fumecheng-12767	70	48	to	to	PART
fumecheng-12767	70	49	remove	remove	VERB
fumecheng-12767	70	50	impurities	impurity	NOUN
fumecheng-12767	70	51	.	.	PUNCT
fumecheng-12767	71	1	finally	finally	ADV
fumecheng-12767	71	2	,	,	PUNCT
fumecheng-12767	71	3	it	it	PRON
fumecheng-12767	71	4	was	be	AUX
fumecheng-12767	71	5	dried	dry	VERB
fumecheng-12767	71	6	at	at	ADP
fumecheng-12767	71	7	100	100	NUM
fumecheng-12767	71	8	degrees	degree	NOUN
fumecheng-12767	71	9	for	for	ADP
fumecheng-12767	71	10	12	12	NUM
fumecheng-12767	71	11	h	h	NOUN
fumecheng-12767	71	12	to	to	PART
fumecheng-12767	71	13	obtain	obtain	VERB
fumecheng-12767	71	14	bnnss	bnns	NOUN
fumecheng-12767	71	15	-	-	PUNCT
fumecheng-12767	71	16	aptes	apte	NOUN
fumecheng-12767	71	17	with	with	ADP
fumecheng-12767	71	18	a	a	DET
fumecheng-12767	71	19	positive	positive	ADJ
fumecheng-12767	71	20	surface	surface	NOUN
fumecheng-12767	71	21	charge	charge	NOUN
fumecheng-12767	71	22	.	.	PUNCT
fumecheng-12767	72	1	2.4	2.4	NUM
fumecheng-12767	72	2	.	.	PUNCT
fumecheng-12767	72	3	fabrication	fabrication	NOUN
fumecheng-12767	72	4	of	of	ADP
fumecheng-12767	72	5	polystyrene@mxene@boron	polystyrene@mxene@boron	PUNCT
fumecheng-12767	72	6	nitride	nitride	ADJ
fumecheng-12767	72	7	composite	composite	ADJ
fumecheng-12767	72	8	ps	ps	NOUN
fumecheng-12767	72	9	has	have	VERB
fumecheng-12767	72	10	a	a	DET
fumecheng-12767	72	11	positive	positive	ADJ
fumecheng-12767	72	12	charge	charge	NOUN
fumecheng-12767	72	13	and	and	CCONJ
fumecheng-12767	72	14	mxene	mxene	NOUN
fumecheng-12767	72	15	has	have	VERB
fumecheng-12767	72	16	a	a	DET
fumecheng-12767	72	17	negative	negative	ADJ
fumecheng-12767	72	18	charge	charge	NOUN
fumecheng-12767	72	19	;	;	PUNCT
fumecheng-12767	72	20	therefore	therefore	ADV
fumecheng-12767	72	21	,	,	PUNCT
fumecheng-12767	72	22	when	when	SCONJ
fumecheng-12767	72	23	the	the	DET
fumecheng-12767	72	24	two	two	NUM
fumecheng-12767	72	25	materials	material	NOUN
fumecheng-12767	72	26	react	react	VERB
fumecheng-12767	72	27	,	,	PUNCT
fumecheng-12767	72	28	they	they	PRON
fumecheng-12767	72	29	attract	attract	VERB
fumecheng-12767	72	30	each	each	DET
fumecheng-12767	72	31	other	other	ADJ
fumecheng-12767	72	32	due	due	ADP
fumecheng-12767	72	33	to	to	ADP
fumecheng-12767	72	34	electrostatic	electrostatic	ADJ
fumecheng-12767	72	35	forces	force	NOUN
fumecheng-12767	72	36	.	.	PUNCT
fumecheng-12767	73	1	moreover	moreover	ADV
fumecheng-12767	73	2	,	,	PUNCT
fumecheng-12767	73	3	ps	ps	PROPN
fumecheng-12767	73	4	has	have	VERB
fumecheng-12767	73	5	a	a	DET
fumecheng-12767	73	6	spherical	spherical	ADJ
fumecheng-12767	73	7	3d	3d	NOUN
fumecheng-12767	73	8	structure	structure	NOUN
fumecheng-12767	73	9	and	and	CCONJ
fumecheng-12767	73	10	mxene	mxene	NOUN
fumecheng-12767	73	11	has	have	VERB
fumecheng-12767	73	12	a	a	DET
fumecheng-12767	73	13	planar	planar	ADJ
fumecheng-12767	73	14	2d	2d	NUM
fumecheng-12767	73	15	structure	structure	NOUN
fumecheng-12767	73	16	,	,	PUNCT
fumecheng-12767	73	17	so	so	CCONJ
fumecheng-12767	73	18	mxene	mxene	NOUN
fumecheng-12767	73	19	can	can	AUX
fumecheng-12767	73	20	stick	stick	VERB
fumecheng-12767	73	21	to	to	PART
fumecheng-12767	73	22	ps	ps	VERB
fumecheng-12767	73	23	like	like	ADP
fumecheng-12767	73	24	a	a	DET
fumecheng-12767	73	25	shell	shell	NOUN
fumecheng-12767	73	26	,	,	PUNCT
fumecheng-12767	73	27	resulting	result	VERB
fumecheng-12767	73	28	in	in	ADP
fumecheng-12767	73	29	a	a	DET
fumecheng-12767	73	30	core	core	ADJ
fumecheng-12767	73	31	-	-	PUNCT
fumecheng-12767	73	32	shell	shell	NOUN
fumecheng-12767	73	33	structure	structure	NOUN
fumecheng-12767	73	34	of	of	ADP
fumecheng-12767	73	35	ps@mxene	ps@mxene	NOUN
fumecheng-12767	73	36	.	.	PUNCT
fumecheng-12767	74	1	if	if	SCONJ
fumecheng-12767	74	2	a	a	DET
fumecheng-12767	74	3	sufficient	sufficient	ADJ
fumecheng-12767	74	4	amount	amount	NOUN
fumecheng-12767	74	5	of	of	ADP
fumecheng-12767	74	6	mxene	mxene	NOUN
fumecheng-12767	74	7	reacts	react	VERB
fumecheng-12767	74	8	with	with	ADP
fumecheng-12767	74	9	ps	ps	PROPN
fumecheng-12767	74	10	,	,	PUNCT
fumecheng-12767	74	11	mxene	mxene	NOUN
fumecheng-12767	74	12	covers	cover	VERB
fumecheng-12767	74	13	the	the	DET
fumecheng-12767	74	14	surface	surface	NOUN
fumecheng-12767	74	15	of	of	ADP
fumecheng-12767	74	16	ps	ps	PROPN
fumecheng-12767	74	17	,	,	PUNCT
fumecheng-12767	74	18	giving	give	VERB
fumecheng-12767	74	19	it	it	PRON
fumecheng-12767	74	20	a	a	DET
fumecheng-12767	74	21	negative	negative	ADJ
fumecheng-12767	74	22	surface	surface	NOUN
fumecheng-12767	74	23	charge	charge	NOUN
fumecheng-12767	74	24	.	.	PUNCT
fumecheng-12767	75	1	when	when	SCONJ
fumecheng-12767	75	2	these	these	DET
fumecheng-12767	75	3	ps@mxene	ps@mxene	ADJ
fumecheng-12767	75	4	particles	particle	NOUN
fumecheng-12767	75	5	with	with	ADP
fumecheng-12767	75	6	a	a	DET
fumecheng-12767	75	7	negative	negative	ADJ
fumecheng-12767	75	8	charge	charge	NOUN
fumecheng-12767	75	9	react	react	NOUN
fumecheng-12767	75	10	with	with	ADP
fumecheng-12767	75	11	bnnss	bnns	NOUN
fumecheng-12767	75	12	-	-	PUNCT
fumecheng-12767	75	13	aptes	apte	NOUN
fumecheng-12767	75	14	with	with	ADP
fumecheng-12767	75	15	a	a	DET
fumecheng-12767	75	16	positive	positive	ADJ
fumecheng-12767	75	17	charge	charge	NOUN
fumecheng-12767	75	18	,	,	PUNCT
fumecheng-12767	75	19	the	the	DET
fumecheng-12767	75	20	same	same	ADJ
fumecheng-12767	75	21	electrostatic	electrostatic	ADJ
fumecheng-12767	75	22	forces	force	NOUN
fumecheng-12767	75	23	work	work	VERB
fumecheng-12767	75	24	to	to	PART
fumecheng-12767	75	25	obtain	obtain	VERB
fumecheng-12767	75	26	ps@mxene@bnnss	ps@mxene@bnnss	NOUN
fumecheng-12767	75	27	microspheres	microsphere	NOUN
fumecheng-12767	75	28	with	with	ADP
fumecheng-12767	75	29	a	a	DET
fumecheng-12767	75	30	double	double	ADJ
fumecheng-12767	75	31	-	-	PUNCT
fumecheng-12767	75	32	core	core	NOUN
fumecheng-12767	75	33	-	-	PUNCT
fumecheng-12767	75	34	shell	shell	NOUN
fumecheng-12767	75	35	structure	structure	NOUN
fumecheng-12767	75	36	.	.	PUNCT
fumecheng-12767	76	1	we	we	PRON
fumecheng-12767	76	2	prepared	prepare	VERB
fumecheng-12767	76	3	a	a	DET
fumecheng-12767	76	4	solution	solution	NOUN
fumecheng-12767	76	5	of	of	ADP
fumecheng-12767	76	6	ps	ps	PROPN
fumecheng-12767	76	7	dispersed	disperse	VERB
fumecheng-12767	76	8	in	in	ADP
fumecheng-12767	76	9	di	di	NOUN
fumecheng-12767	76	10	water	water	NOUN
fumecheng-12767	76	11	at	at	ADP
fumecheng-12767	76	12	3	3	NUM
fumecheng-12767	76	13	mg	mg	NUM
fumecheng-12767	76	14	/	/	SYM
fumecheng-12767	76	15	ml	ml	NOUN
fumecheng-12767	76	16	and	and	CCONJ
fumecheng-12767	76	17	a	a	DET
fumecheng-12767	76	18	solution	solution	NOUN
fumecheng-12767	76	19	of	of	ADP
fumecheng-12767	76	20	bnnss	bnns	NOUN
fumecheng-12767	76	21	-	-	PUNCT
fumecheng-12767	76	22	aptes	apte	NOUN
fumecheng-12767	76	23	dispersed	disperse	VERB
fumecheng-12767	76	24	in	in	ADP
fumecheng-12767	76	25	di	di	NOUN
fumecheng-12767	76	26	water	water	NOUN
fumecheng-12767	76	27	at	at	ADP
fumecheng-12767	76	28	5	5	NUM
fumecheng-12767	76	29	mg	mg	NUM
fumecheng-12767	76	30	/	/	SYM
fumecheng-12767	76	31	ml	ml	NOUN
fumecheng-12767	76	32	.	.	PUNCT
fumecheng-12767	77	1	the	the	DET
fumecheng-12767	77	2	previously	previously	ADV
fumecheng-12767	77	3	prepared	prepare	VERB
fumecheng-12767	77	4	mxene	mxene	NOUN
fumecheng-12767	77	5	solution	solution	NOUN
fumecheng-12767	77	6	was	be	AUX
fumecheng-12767	77	7	slowly	slowly	ADV
fumecheng-12767	77	8	added	add	VERB
fumecheng-12767	77	9	to	to	ADP
fumecheng-12767	77	10	the	the	DET
fumecheng-12767	77	11	ps	ps	NOUN
fumecheng-12767	77	12	solution	solution	NOUN
fumecheng-12767	77	13	at	at	ADP
fumecheng-12767	77	14	33.3	33.3	NUM
fumecheng-12767	77	15	ml	ml	NOUN
fumecheng-12767	77	16	with	with	ADP
fumecheng-12767	77	17	varying	vary	VERB
fumecheng-12767	77	18	amounts	amount	NOUN
fumecheng-12767	77	19	(	(	PUNCT
fumecheng-12767	77	20	3	3	NUM
fumecheng-12767	77	21	,	,	PUNCT
fumecheng-12767	77	22	5	5	NUM
fumecheng-12767	77	23	,	,	PUNCT
fumecheng-12767	77	24	7	7	NUM
fumecheng-12767	77	25	,	,	PUNCT
fumecheng-12767	77	26	10	10	NUM
fumecheng-12767	77	27	,	,	PUNCT
fumecheng-12767	77	28	13	13	NUM
fumecheng-12767	77	29	,	,	PUNCT
fumecheng-12767	77	30	15	15	NUM
fumecheng-12767	77	31	wt%	wt%	ADJ
fumecheng-12767	77	32	)	)	PUNCT
fumecheng-12767	77	33	and	and	CCONJ
fumecheng-12767	77	34	then	then	ADV
fumecheng-12767	77	35	stirred	stir	VERB
fumecheng-12767	77	36	at	at	ADP
fumecheng-12767	77	37	500	500	NUM
fumecheng-12767	77	38	rpm	rpm	NOUN
fumecheng-12767	77	39	for	for	ADP
fumecheng-12767	77	40	2	2	NUM
fumecheng-12767	77	41	h.	h.	NOUN
fumecheng-12767	77	42	at	at	ADP
fumecheng-12767	77	43	this	this	DET
fumecheng-12767	77	44	stage	stage	NOUN
fumecheng-12767	77	45	,	,	PUNCT
fumecheng-12767	77	46	ps@mxene	ps@mxene	ADJ
fumecheng-12767	77	47	microspheres	microsphere	NOUN
fumecheng-12767	77	48	were	be	AUX
fumecheng-12767	77	49	formed	form	VERB
fumecheng-12767	77	50	,	,	PUNCT
fumecheng-12767	77	51	and	and	CCONJ
fumecheng-12767	77	52	various	various	ADJ
fumecheng-12767	77	53	mxene	mxene	NOUN
fumecheng-12767	77	54	concentrations	concentration	NOUN
fumecheng-12767	77	55	were	be	AUX
fumecheng-12767	77	56	tested	test	VERB
fumecheng-12767	77	57	to	to	PART
fumecheng-12767	77	58	determine	determine	VERB
fumecheng-12767	77	59	the	the	DET
fumecheng-12767	77	60	sufficient	sufficient	ADJ
fumecheng-12767	77	61	amount	amount	NOUN
fumecheng-12767	77	62	that	that	PRON
fumecheng-12767	77	63	could	could	AUX
fumecheng-12767	77	64	react	react	VERB
fumecheng-12767	77	65	with	with	ADP
fumecheng-12767	77	66	bnnss	bnns	NOUN
fumecheng-12767	77	67	-	-	PUNCT
fumecheng-12767	77	68	aptes	apte	NOUN
fumecheng-12767	77	69	.	.	PUNCT
fumecheng-12767	78	1	subsequently	subsequently	ADV
fumecheng-12767	78	2	,	,	PUNCT
fumecheng-12767	78	3	an	an	DET
fumecheng-12767	78	4	amount	amount	NOUN
fumecheng-12767	78	5	of	of	ADP
fumecheng-12767	78	6	bnnss	bnns	NOUN
fumecheng-12767	78	7	-	-	PUNCT
fumecheng-12767	78	8	aptes	apte	NOUN
fumecheng-12767	78	9	solution	solution	NOUN
fumecheng-12767	78	10	,	,	PUNCT
fumecheng-12767	78	11	equal	equal	ADJ
fumecheng-12767	78	12	to	to	ADP
fumecheng-12767	78	13	the	the	DET
fumecheng-12767	78	14	amount	amount	NOUN
fumecheng-12767	78	15	of	of	ADP
fumecheng-12767	78	16	the	the	DET
fumecheng-12767	78	17	mxene	mxene	NOUN
fumecheng-12767	78	18	solution	solution	NOUN
fumecheng-12767	78	19	,	,	PUNCT
fumecheng-12767	78	20	was	be	AUX
fumecheng-12767	78	21	slowly	slowly	ADV
fumecheng-12767	78	22	added	add	VERB
fumecheng-12767	78	23	and	and	CCONJ
fumecheng-12767	78	24	reacted	react	VERB
fumecheng-12767	78	25	at	at	ADP
fumecheng-12767	78	26	500	500	NUM
fumecheng-12767	78	27	rpm	rpm	NOUN
fumecheng-12767	78	28	for	for	ADP
fumecheng-12767	78	29	2	2	NUM
fumecheng-12767	78	30	h.	h.	NOUN
fumecheng-12767	78	31	after	after	ADP
fumecheng-12767	78	32	the	the	DET
fumecheng-12767	78	33	reaction	reaction	NOUN
fumecheng-12767	78	34	,	,	PUNCT
fumecheng-12767	78	35	the	the	DET
fumecheng-12767	78	36	particles	particle	NOUN
fumecheng-12767	78	37	and	and	CCONJ
fumecheng-12767	78	38	di	di	NOUN
fumecheng-12767	78	39	water	water	NOUN
fumecheng-12767	78	40	were	be	AUX
fumecheng-12767	78	41	separated	separate	VERB
fumecheng-12767	78	42	using	use	VERB
fumecheng-12767	78	43	vacuum	vacuum	NOUN
fumecheng-12767	78	44	filtration	filtration	NOUN
fumecheng-12767	78	45	with	with	ADP
fumecheng-12767	78	46	an	an	DET
fumecheng-12767	78	47	mce	mce	PROPN
fumecheng-12767	78	48	filter	filter	NOUN
fumecheng-12767	78	49	.	.	PUNCT
fumecheng-12767	79	1	when	when	SCONJ
fumecheng-12767	79	2	dried	dry	VERB
fumecheng-12767	79	3	at	at	ADP
fumecheng-12767	79	4	50	50	NUM
fumecheng-12767	79	5	degrees	degree	NOUN
fumecheng-12767	79	6	for	for	ADP
fumecheng-12767	79	7	12	12	NUM
fumecheng-12767	79	8	h	h	NOUN
fumecheng-12767	79	9	,	,	PUNCT
fumecheng-12767	79	10	ps@mxene@bnnss	ps@mxene@bnnss	PROPN
fumecheng-12767	79	11	microspheres	microsphere	NOUN
fumecheng-12767	79	12	were	be	AUX
fumecheng-12767	79	13	obtained	obtain	VERB
fumecheng-12767	79	14	.	.	PUNCT
fumecheng-12767	80	1	a	a	DET
fumecheng-12767	80	2	composite	composite	NOUN
fumecheng-12767	80	3	with	with	ADP
fumecheng-12767	80	4	a	a	DET
fumecheng-12767	80	5	3d	3d	NUM
fumecheng-12767	80	6	structure	structure	NOUN
fumecheng-12767	80	7	of	of	ADP
fumecheng-12767	80	8	filler	filler	NOUN
fumecheng-12767	80	9	network	network	NOUN
fumecheng-12767	80	10	was	be	AUX
fumecheng-12767	80	11	obtained	obtain	VERB
fumecheng-12767	80	12	by	by	ADP
fumecheng-12767	80	13	adding	add	VERB
fumecheng-12767	80	14	0.1	0.1	NUM
fumecheng-12767	80	15	g	g	NOUN
fumecheng-12767	80	16	of	of	ADP
fumecheng-12767	80	17	ps@mxene@bnnss	ps@mxene@bnns	NOUN
fumecheng-12767	80	18	microspheres	microsphere	VERB
fumecheng-12767	80	19	into	into	ADP
fumecheng-12767	80	20	a	a	DET
fumecheng-12767	80	21	mold	mold	NOUN
fumecheng-12767	80	22	for	for	ADP
fumecheng-12767	80	23	hot	hot	ADJ
fumecheng-12767	80	24	pressing	pressing	NOUN
fumecheng-12767	80	25	and	and	CCONJ
fumecheng-12767	80	26	pressing	press	VERB
fumecheng-12767	80	27	at	at	ADP
fumecheng-12767	80	28	a	a	DET
fumecheng-12767	80	29	temperature	temperature	NOUN
fumecheng-12767	80	30	of	of	ADP
fumecheng-12767	80	31	130	130	NUM
fumecheng-12767	80	32	degrees	degree	NOUN
fumecheng-12767	80	33	with	with	ADP
fumecheng-12767	80	34	a	a	DET
fumecheng-12767	80	35	pressure	pressure	NOUN
fumecheng-12767	80	36	of	of	ADP
fumecheng-12767	80	37	10	10	NUM
fumecheng-12767	80	38	mpa	mpa	NOUN
fumecheng-12767	80	39	for	for	ADP
fumecheng-12767	80	40	30	30	NUM
fumecheng-12767	80	41	min	min	NOUN
fumecheng-12767	80	42	.	.	PROPN
fumecheng-12767	80	43	2.5	2.5	NUM
fumecheng-12767	80	44	.	.	PUNCT
fumecheng-12767	81	1	characterization	characterization	NOUN
fumecheng-12767	81	2	the	the	DET
fumecheng-12767	81	3	zeta	zeta	NOUN
fumecheng-12767	81	4	potential	potential	NOUN
fumecheng-12767	81	5	was	be	AUX
fumecheng-12767	81	6	measured	measure	VERB
fumecheng-12767	81	7	with	with	ADP
fumecheng-12767	81	8	a	a	DET
fumecheng-12767	81	9	particle	particle	NOUN
fumecheng-12767	81	10	size	size	NOUN
fumecheng-12767	81	11	and	and	CCONJ
fumecheng-12767	81	12	zeta	zeta	NOUN
fumecheng-12767	81	13	potential	potential	ADJ
fumecheng-12767	81	14	analyzer	analyzer	NOUN
fumecheng-12767	81	15	(	(	PUNCT
fumecheng-12767	81	16	delsa	delsa	VERB
fumecheng-12767	81	17	nano	nano	PROPN
fumecheng-12767	81	18	c	c	PROPN
fumecheng-12767	81	19	particle	particle	NOUN
fumecheng-12767	81	20	analyzer	analyzer	NOUN
fumecheng-12767	81	21	,	,	PUNCT
fumecheng-12767	81	22	beckman	beckman	PROPN
fumecheng-12767	81	23	coulter	coulter	PROPN
fumecheng-12767	81	24	)	)	PUNCT
fumecheng-12767	81	25	to	to	PART
fumecheng-12767	81	26	determine	determine	VERB
fumecheng-12767	81	27	the	the	DET
fumecheng-12767	81	28	change	change	NOUN
fumecheng-12767	81	29	in	in	ADP
fumecheng-12767	81	30	charge	charge	NOUN
fumecheng-12767	81	31	on	on	ADP
fumecheng-12767	81	32	the	the	DET
fumecheng-12767	81	33	material	material	NOUN
fumecheng-12767	81	34	surface	surface	NOUN
fumecheng-12767	81	35	.	.	PUNCT
fumecheng-12767	82	1	x	x	X
fumecheng-12767	82	2	-	-	PUNCT
fumecheng-12767	82	3	ray	ray	NOUN
fumecheng-12767	82	4	photoelectron	photoelectron	NOUN
fumecheng-12767	82	5	spectroscopy	spectroscopy	NOUN
fumecheng-12767	82	6	(	(	PUNCT
fumecheng-12767	82	7	xps	xps	PROPN
fumecheng-12767	82	8	,	,	PUNCT
fumecheng-12767	82	9	k	k	NOUN
fumecheng-12767	82	10	-	-	PUNCT
fumecheng-12767	82	11	alpha+	alpha+	X
fumecheng-12767	82	12	,	,	PUNCT
fumecheng-12767	82	13	thermofisher	thermofisher	ADJ
fumecheng-12767	82	14	scientific	scientific	NOUN
fumecheng-12767	82	15	)	)	PUNCT
fumecheng-12767	82	16	was	be	AUX
fumecheng-12767	82	17	used	use	VERB
fumecheng-12767	82	18	to	to	PART
fumecheng-12767	82	19	confirm	confirm	VERB
fumecheng-12767	82	20	whether	whether	SCONJ
fumecheng-12767	82	21	each	each	DET
fumecheng-12767	82	22	material	material	NOUN
fumecheng-12767	82	23	was	be	AUX
fumecheng-12767	82	24	synthesized	synthesize	VERB
fumecheng-12767	82	25	,	,	PUNCT
fumecheng-12767	82	26	and	and	CCONJ
fumecheng-12767	82	27	surface	surface	NOUN
fumecheng-12767	82	28	modification	modification	NOUN
fumecheng-12767	82	29	was	be	AUX
fumecheng-12767	82	30	performed	perform	VERB
fumecheng-12767	82	31	correctly	correctly	ADV
fumecheng-12767	82	32	.	.	PUNCT
fumecheng-12767	83	1	a	a	DET
fumecheng-12767	83	2	particle	particle	NOUN
fumecheng-12767	83	3	size	size	NOUN
fumecheng-12767	83	4	analyzer	analyzer	NOUN
fumecheng-12767	83	5	(	(	PUNCT
fumecheng-12767	83	6	psa	psa	NOUN
fumecheng-12767	83	7	;	;	PUNCT
fumecheng-12767	83	8	s3500	s3500	NUM
fumecheng-12767	83	9	,	,	PUNCT
fumecheng-12767	83	10	microtrac	microtrac	NOUN
fumecheng-12767	83	11	)	)	PUNCT
fumecheng-12767	83	12	was	be	AUX
fumecheng-12767	83	13	used	use	VERB
fumecheng-12767	83	14	to	to	PART
fumecheng-12767	83	15	confirm	confirm	VERB
fumecheng-12767	83	16	whether	whether	SCONJ
fumecheng-12767	83	17	the	the	DET
fumecheng-12767	83	18	polymerization	polymerization	NOUN
fumecheng-12767	83	19	of	of	ADP
fumecheng-12767	83	20	ps	ps	PROPN
fumecheng-12767	83	21	occurred	occur	VERB
fumecheng-12767	83	22	uniformly	uniformly	ADV
fumecheng-12767	83	23	.	.	PUNCT
fumecheng-12767	84	1	field	field	NOUN
fumecheng-12767	84	2	-	-	PUNCT
fumecheng-12767	84	3	emission	emission	NOUN
fumecheng-12767	84	4	scanning	scanning	NOUN
fumecheng-12767	84	5	electron	electron	NOUN
fumecheng-12767	84	6	microscopy	microscopy	NOUN
fumecheng-12767	84	7	(	(	PUNCT
fumecheng-12767	84	8	fe	fe	NOUN
fumecheng-12767	84	9	-	-	NOUN
fumecheng-12767	84	10	sem	sem	NOUN
fumecheng-12767	84	11	;	;	PUNCT
fumecheng-12767	84	12	sigma	sigma	PROPN
fumecheng-12767	84	13	300	300	NUM
fumecheng-12767	84	14	,	,	PUNCT
fumecheng-12767	84	15	carl	carl	PROPN
fumecheng-12767	84	16	zeiss	zeiss	PROPN
fumecheng-12767	84	17	)	)	PUNCT
fumecheng-12767	84	18	was	be	AUX
fumecheng-12767	84	19	used	use	VERB
fumecheng-12767	84	20	to	to	PART
fumecheng-12767	84	21	analyze	analyze	VERB
fumecheng-12767	84	22	the	the	DET
fumecheng-12767	84	23	surface	surface	NOUN
fumecheng-12767	84	24	morphologies	morphology	NOUN
fumecheng-12767	84	25	of	of	ADP
fumecheng-12767	84	26	all	all	DET
fumecheng-12767	84	27	the	the	DET
fumecheng-12767	84	28	materials	material	NOUN
fumecheng-12767	84	29	.	.	PUNCT
fumecheng-12767	85	1	additionally	additionally	ADV
fumecheng-12767	85	2	,	,	PUNCT
fumecheng-12767	85	3	x	x	ADJ
fumecheng-12767	85	4	-	-	NOUN
fumecheng-12767	85	5	ray	ray	NOUN
fumecheng-12767	85	6	diffraction	diffraction	NOUN
fumecheng-12767	85	7	(	(	PUNCT
fumecheng-12767	85	8	xrd	xrd	NOUN
fumecheng-12767	85	9	;	;	PUNCT
fumecheng-12767	85	10	new	new	ADJ
fumecheng-12767	85	11	d8advance	d8advance	NOUN
fumecheng-12767	85	12	,	,	PUNCT
fumecheng-12767	85	13	bruker	bruker	NOUN
fumecheng-12767	85	14	-	-	PUNCT
fumecheng-12767	85	15	axs	axs	PROPN
fumecheng-12767	85	16	)	)	PUNCT
fumecheng-12767	85	17	was	be	AUX
fumecheng-12767	85	18	utilized	utilize	VERB
fumecheng-12767	85	19	to	to	PART
fumecheng-12767	85	20	analyze	analyze	VERB
fumecheng-12767	85	21	the	the	DET
fumecheng-12767	85	22	mxene	mxene	NOUN
fumecheng-12767	85	23	and	and	CCONJ
fumecheng-12767	85	24	confirm	confirm	VERB
fumecheng-12767	85	25	whether	whether	SCONJ
fumecheng-12767	85	26	the	the	DET
fumecheng-12767	85	27	al	al	PROPN
fumecheng-12767	85	28	layer	layer	NOUN
fumecheng-12767	85	29	in	in	ADP
fumecheng-12767	85	30	the	the	DET
fumecheng-12767	85	31	ti3alc2	ti3alc2	PROPN
fumecheng-12767	85	32	max	max	PROPN
fumecheng-12767	85	33	phase	phase	NOUN
fumecheng-12767	85	34	was	be	AUX
fumecheng-12767	85	35	completely	completely	ADV
fumecheng-12767	85	36	etched	etch	VERB
fumecheng-12767	85	37	.	.	PUNCT
fumecheng-12767	86	1	fourier	fourier	NOUN
fumecheng-12767	86	2	-	-	PUNCT
fumecheng-12767	86	3	transform	transform	VERB
fumecheng-12767	86	4	infrared	infrared	ADJ
fumecheng-12767	86	5	spectrometer	spectrometer	NOUN
fumecheng-12767	86	6	(	(	PUNCT
fumecheng-12767	86	7	ft	ft	PROPN
fumecheng-12767	86	8	-	-	PUNCT
fumecheng-12767	86	9	ir	ir	PROPN
fumecheng-12767	86	10	;	;	PUNCT
fumecheng-12767	86	11	nicolet	nicolet	PROPN
fumecheng-12767	86	12	6700	6700	NUM
fumecheng-12767	86	13	,	,	PUNCT
fumecheng-12767	86	14	thermo	thermo	NOUN
fumecheng-12767	86	15	scientific	scientific	NOUN
fumecheng-12767	86	16	)	)	PUNCT
fumecheng-12767	86	17	was	be	AUX
fumecheng-12767	86	18	used	use	VERB
fumecheng-12767	86	19	to	to	PART
fumecheng-12767	86	20	determine	determine	VERB
fumecheng-12767	86	21	whether	whether	SCONJ
fumecheng-12767	86	22	aptes	apte	NOUN
fumecheng-12767	86	23	worked	work	VERB
fumecheng-12767	86	24	adequately	adequately	ADV
fumecheng-12767	86	25	on	on	ADP
fumecheng-12767	86	26	the	the	DET
fumecheng-12767	86	27	surface	surface	NOUN
fumecheng-12767	86	28	of	of	ADP
fumecheng-12767	86	29	bnnss	bnns	NOUN
fumecheng-12767	86	30	,	,	PUNCT
fumecheng-12767	86	31	and	and	CCONJ
fumecheng-12767	86	32	the	the	DET
fumecheng-12767	86	33	emi	emi	PROPN
fumecheng-12767	86	34	se	se	PROPN
fumecheng-12767	86	35	was	be	AUX
fumecheng-12767	86	36	measured	measure	VERB
fumecheng-12767	86	37	using	use	VERB
fumecheng-12767	86	38	a	a	DET
fumecheng-12767	86	39	vector	vector	NOUN
fumecheng-12767	86	40	network	network	NOUN
fumecheng-12767	86	41	analyzer	analyzer	NOUN
fumecheng-12767	86	42	(	(	PUNCT
fumecheng-12767	86	43	vna	vna	PROPN
fumecheng-12767	86	44	;	;	PUNCT
fumecheng-12767	86	45	8720d	8720d	NUM
fumecheng-12767	86	46	,	,	PUNCT
fumecheng-12767	86	47	hewlett	hewlett	PROPN
fumecheng-12767	86	48	-	-	PUNCT
fumecheng-12767	86	49	packard	packard	PROPN
fumecheng-12767	86	50	,	,	PUNCT
fumecheng-12767	86	51	palo	palo	PROPN
fumecheng-12767	86	52	alto	alto	PROPN
fumecheng-12767	86	53	,	,	PUNCT
fumecheng-12767	86	54	usa	usa	PROPN
fumecheng-12767	86	55	)	)	PUNCT
fumecheng-12767	86	56	.	.	PUNCT
fumecheng-12767	87	1	mechanically	mechanically	ADV
fumecheng-12767	87	2	pressed	press	VERB
fumecheng-12767	87	3	polymer	polymer	NOUN
fumecheng-12767	87	4	-	-	PUNCT
fumecheng-12767	87	5	matrix	matrix	NOUN
fumecheng-12767	87	6	composites	composite	NOUN
fumecheng-12767	87	7	with	with	ADP
fumecheng-12767	87	8	3d	3d	NUM
fumecheng-12767	87	9	structured	structured	ADJ
fumecheng-12767	87	10	filler	filler	NOUN
fumecheng-12767	87	11	networks	network	NOUN
fumecheng-12767	87	12	...	...	PUNCT
fumecheng-12767	87	13	605	605	NUM
fumecheng-12767	87	14	3	3	NUM
fumecheng-12767	87	15	.	.	NOUN
fumecheng-12767	87	16	results	result	NOUN
fumecheng-12767	87	17	and	and	CCONJ
fumecheng-12767	87	18	discussion	discussion	NOUN
fumecheng-12767	87	19	fig	fig	NOUN
fumecheng-12767	87	20	.	.	PUNCT
fumecheng-12767	88	1	1	1	NUM
fumecheng-12767	88	2	illustrates	illustrate	VERB
fumecheng-12767	88	3	the	the	DET
fumecheng-12767	88	4	fabrication	fabrication	NOUN
fumecheng-12767	88	5	process	process	NOUN
fumecheng-12767	88	6	of	of	ADP
fumecheng-12767	88	7	the	the	DET
fumecheng-12767	88	8	ps@mxene@bnnss	ps@mxene@bnns	NOUN
fumecheng-12767	88	9	composite	composite	ADJ
fumecheng-12767	88	10	.	.	PUNCT
fumecheng-12767	89	1	dispersion	dispersion	NOUN
fumecheng-12767	89	2	polymerization	polymerization	NOUN
fumecheng-12767	89	3	was	be	AUX
fumecheng-12767	89	4	used	use	VERB
fumecheng-12767	89	5	to	to	PART
fumecheng-12767	89	6	synthesize	synthesize	VERB
fumecheng-12767	89	7	ps	ps	PROPN
fumecheng-12767	89	8	,	,	PUNCT
fumecheng-12767	89	9	incorporating	incorporate	VERB
fumecheng-12767	89	10	an	an	DET
fumecheng-12767	89	11	initiator	initiator	NOUN
fumecheng-12767	89	12	,	,	PUNCT
fumecheng-12767	89	13	monomer	monomer	NOUN
fumecheng-12767	89	14	,	,	PUNCT
fumecheng-12767	89	15	and	and	CCONJ
fumecheng-12767	89	16	the	the	DET
fumecheng-12767	89	17	positive	positive	ADJ
fumecheng-12767	89	18	agent	agent	NOUN
fumecheng-12767	89	19	dmc	dmc	NOUN
fumecheng-12767	89	20	to	to	PART
fumecheng-12767	89	21	create	create	VERB
fumecheng-12767	89	22	ps	ps	PROPN
fumecheng-12767	89	23	with	with	ADP
fumecheng-12767	89	24	a	a	DET
fumecheng-12767	89	25	positive	positive	ADJ
fumecheng-12767	89	26	surface	surface	NOUN
fumecheng-12767	89	27	charge	charge	NOUN
fumecheng-12767	89	28	.	.	PUNCT
fumecheng-12767	90	1	mxene	mxene	NOUN
fumecheng-12767	90	2	initially	initially	ADV
fumecheng-12767	90	3	exists	exist	VERB
fumecheng-12767	90	4	in	in	ADP
fumecheng-12767	90	5	the	the	DET
fumecheng-12767	90	6	max	max	PROPN
fumecheng-12767	90	7	phase	phase	NOUN
fumecheng-12767	90	8	,	,	PUNCT
fumecheng-12767	90	9	where	where	SCONJ
fumecheng-12767	90	10	mx	mx	PROPN
fumecheng-12767	90	11	layers	layer	NOUN
fumecheng-12767	90	12	alternate	alternate	VERB
fumecheng-12767	90	13	with	with	ADP
fumecheng-12767	90	14	a	a	DET
fumecheng-12767	90	15	layers	layer	NOUN
fumecheng-12767	90	16	.	.	PUNCT
fumecheng-12767	91	1	by	by	ADP
fumecheng-12767	91	2	etching	etch	VERB
fumecheng-12767	91	3	the	the	DET
fumecheng-12767	91	4	al	al	PROPN
fumecheng-12767	91	5	layers	layer	NOUN
fumecheng-12767	91	6	with	with	ADP
fumecheng-12767	91	7	a	a	DET
fumecheng-12767	91	8	lif	lif	PROPN
fumecheng-12767	91	9	/	/	SYM
fumecheng-12767	91	10	hcl	hcl	PROPN
fumecheng-12767	91	11	solution	solution	NOUN
fumecheng-12767	91	12	,	,	PUNCT
fumecheng-12767	91	13	layered	layered	ADJ
fumecheng-12767	91	14	mxene	mxene	NOUN
fumecheng-12767	91	15	was	be	AUX
fumecheng-12767	91	16	obtained	obtain	VERB
fumecheng-12767	91	17	.	.	PUNCT
fumecheng-12767	92	1	delaminating	delaminate	VERB
fumecheng-12767	92	2	these	these	DET
fumecheng-12767	92	3	layers	layer	NOUN
fumecheng-12767	92	4	produced	produce	VERB
fumecheng-12767	92	5	mxene	mxene	NOUN
fumecheng-12767	92	6	flakes	flake	NOUN
fumecheng-12767	92	7	.	.	PUNCT
fumecheng-12767	93	1	bn	bn	PUNCT
fumecheng-12767	93	2	typically	typically	ADV
fumecheng-12767	93	3	exists	exist	VERB
fumecheng-12767	93	4	in	in	ADP
fumecheng-12767	93	5	a	a	DET
fumecheng-12767	93	6	bulk	bulk	ADJ
fumecheng-12767	93	7	layered	layer	VERB
fumecheng-12767	93	8	structure	structure	NOUN
fumecheng-12767	93	9	,	,	PUNCT
fumecheng-12767	93	10	but	but	CCONJ
fumecheng-12767	93	11	bnnss	bnns	NOUN
fumecheng-12767	93	12	was	be	AUX
fumecheng-12767	93	13	produced	produce	VERB
fumecheng-12767	93	14	by	by	ADP
fumecheng-12767	93	15	exfoliating	exfoliate	VERB
fumecheng-12767	93	16	bn	bn	PROPN
fumecheng-12767	93	17	with	with	ADP
fumecheng-12767	93	18	di	di	NOUN
fumecheng-12767	93	19	water	water	NOUN
fumecheng-12767	93	20	and	and	CCONJ
fumecheng-12767	93	21	ipa	ipa	PROPN
fumecheng-12767	93	22	.	.	PUNCT
fumecheng-12767	94	1	these	these	DET
fumecheng-12767	94	2	bnnss	bnns	NOUN
fumecheng-12767	94	3	contain	contain	VERB
fumecheng-12767	94	4	-oh	-oh	ADJ
fumecheng-12767	94	5	groups	group	NOUN
fumecheng-12767	94	6	,	,	PUNCT
fumecheng-12767	94	7	which	which	PRON
fumecheng-12767	94	8	reacted	react	VERB
fumecheng-12767	94	9	with	with	ADP
fumecheng-12767	94	10	aptes	apte	NOUN
fumecheng-12767	94	11	to	to	PART
fumecheng-12767	94	12	yield	yield	VERB
fumecheng-12767	94	13	silanized	silanize	VERB
fumecheng-12767	94	14	bnnss	bnns	NOUN
fumecheng-12767	94	15	-	-	PUNCT
fumecheng-12767	94	16	aptes	apte	NOUN
fumecheng-12767	94	17	.	.	PUNCT
fumecheng-12767	95	1	using	use	VERB
fumecheng-12767	95	2	self	self	NOUN
fumecheng-12767	95	3	-	-	PUNCT
fumecheng-12767	95	4	assembly	assembly	NOUN
fumecheng-12767	95	5	driven	drive	VERB
fumecheng-12767	95	6	by	by	ADP
fumecheng-12767	95	7	surface	surface	NOUN
fumecheng-12767	95	8	charges	charge	NOUN
fumecheng-12767	95	9	,	,	PUNCT
fumecheng-12767	95	10	the	the	DET
fumecheng-12767	95	11	materials	material	NOUN
fumecheng-12767	95	12	were	be	AUX
fumecheng-12767	95	13	sequentially	sequentially	ADV
fumecheng-12767	95	14	assembled	assemble	VERB
fumecheng-12767	95	15	as	as	ADP
fumecheng-12767	95	16	mxene	mxene	NOUN
fumecheng-12767	95	17	and	and	CCONJ
fumecheng-12767	95	18	bnnss	bnns	NOUN
fumecheng-12767	95	19	-	-	PUNCT
fumecheng-12767	95	20	aptes	apte	NOUN
fumecheng-12767	95	21	onto	onto	ADP
fumecheng-12767	95	22	the	the	DET
fumecheng-12767	95	23	ps	ps	NOUN
fumecheng-12767	95	24	microspheres	microsphere	NOUN
fumecheng-12767	95	25	,	,	PUNCT
fumecheng-12767	95	26	forming	form	VERB
fumecheng-12767	95	27	ps@mxene@bnnss	ps@mxene@bnnss	NOUN
fumecheng-12767	95	28	microspheres	microsphere	NOUN
fumecheng-12767	95	29	.	.	PUNCT
fumecheng-12767	96	1	finally	finally	ADV
fumecheng-12767	96	2	,	,	PUNCT
fumecheng-12767	96	3	hot	hot	ADJ
fumecheng-12767	96	4	pressing	press	VERB
fumecheng-12767	96	5	these	these	DET
fumecheng-12767	96	6	microspheres	microsphere	NOUN
fumecheng-12767	96	7	resulted	result	VERB
fumecheng-12767	96	8	in	in	ADP
fumecheng-12767	96	9	the	the	DET
fumecheng-12767	96	10	ps@mxene@bnnss	ps@mxene@bnnss	PROPN
fumecheng-12767	96	11	composite	composite	ADJ
fumecheng-12767	96	12	.	.	PUNCT
fumecheng-12767	97	1	fig	fig	NOUN
fumecheng-12767	97	2	.	.	PUNCT
fumecheng-12767	98	1	1	1	NUM
fumecheng-12767	98	2	schematic	schematic	ADJ
fumecheng-12767	98	3	illustration	illustration	NOUN
fumecheng-12767	98	4	of	of	ADP
fumecheng-12767	98	5	the	the	DET
fumecheng-12767	98	6	fabrication	fabrication	NOUN
fumecheng-12767	98	7	of	of	ADP
fumecheng-12767	98	8	ps@mxene@bnnss	ps@mxene@bnnss	PROPN
fumecheng-12767	98	9	606	606	NUM
fumecheng-12767	98	10	c.	c.	NOUN
fumecheng-12767	98	11	choi	choi	NOUN
fumecheng-12767	98	12	,	,	PUNCT
fumecheng-12767	98	13	n.	n.	PROPN
fumecheng-12767	98	14	qaiser	qaiser	PROPN
fumecheng-12767	98	15	,	,	PUNCT
fumecheng-12767	98	16	b.	b.	PROPN
fumecheng-12767	98	17	hwang	hwang	PROPN
fumecheng-12767	98	18	during	during	ADP
fumecheng-12767	98	19	synthesizing	synthesize	VERB
fumecheng-12767	98	20	ps	ps	PROPN
fumecheng-12767	98	21	,	,	PUNCT
fumecheng-12767	98	22	dmc	dmc	PROPN
fumecheng-12767	98	23	was	be	AUX
fumecheng-12767	98	24	added	add	VERB
fumecheng-12767	98	25	to	to	PART
fumecheng-12767	98	26	change	change	VERB
fumecheng-12767	98	27	the	the	DET
fumecheng-12767	98	28	ps	ps	NOUN
fumecheng-12767	98	29	surface	surface	NOUN
fumecheng-12767	98	30	so	so	SCONJ
fumecheng-12767	98	31	that	that	SCONJ
fumecheng-12767	98	32	it	it	PRON
fumecheng-12767	98	33	could	could	AUX
fumecheng-12767	98	34	be	be	AUX
fumecheng-12767	98	35	positively	positively	ADV
fumecheng-12767	98	36	charged	charge	VERB
fumecheng-12767	98	37	.	.	PUNCT
fumecheng-12767	99	1	the	the	DET
fumecheng-12767	99	2	functional	functional	ADJ
fumecheng-12767	99	3	group	group	NOUN
fumecheng-12767	99	4	-n(ch3)3	-n(ch3)3	PROPN
fumecheng-12767	99	5	+	+	PROPN
fumecheng-12767	99	6	in	in	ADP
fumecheng-12767	99	7	dmc	dmc	PROPN
fumecheng-12767	99	8	imparted	impart	VERB
fumecheng-12767	99	9	a	a	DET
fumecheng-12767	99	10	positive	positive	ADJ
fumecheng-12767	99	11	surface	surface	NOUN
fumecheng-12767	99	12	charge	charge	NOUN
fumecheng-12767	99	13	,	,	PUNCT
fumecheng-12767	99	14	which	which	PRON
fumecheng-12767	99	15	was	be	AUX
fumecheng-12767	99	16	confirmed	confirm	VERB
fumecheng-12767	99	17	through	through	ADP
fumecheng-12767	99	18	xps	xps	ADJ
fumecheng-12767	99	19	analysis	analysis	NOUN
fumecheng-12767	99	20	and	and	CCONJ
fumecheng-12767	99	21	zeta	zeta	VERB
fumecheng-12767	99	22	potential	potential	ADJ
fumecheng-12767	99	23	measurements	measurement	NOUN
fumecheng-12767	99	24	.	.	PUNCT
fumecheng-12767	100	1	fig	fig	NOUN
fumecheng-12767	100	2	.	.	PUNCT
fumecheng-12767	101	1	2(a	2(a	NUM
fumecheng-12767	101	2	)	)	PUNCT
fumecheng-12767	101	3	compares	compare	VERB
fumecheng-12767	101	4	the	the	DET
fumecheng-12767	101	5	zeta	zeta	NOUN
fumecheng-12767	101	6	potential	potential	ADJ
fumecheng-12767	101	7	values	value	NOUN
fumecheng-12767	101	8	of	of	ADP
fumecheng-12767	101	9	the	the	DET
fumecheng-12767	101	10	normal	normal	ADJ
fumecheng-12767	101	11	ps	ps	NOUN
fumecheng-12767	101	12	without	without	ADP
fumecheng-12767	101	13	dmc	dmc	PROPN
fumecheng-12767	101	14	and	and	CCONJ
fumecheng-12767	101	15	the	the	DET
fumecheng-12767	101	16	charged	charge	VERB
fumecheng-12767	101	17	ps	ps	NOUN
fumecheng-12767	101	18	with	with	ADP
fumecheng-12767	101	19	dmc	dmc	PROPN
fumecheng-12767	101	20	.	.	PUNCT
fumecheng-12767	102	1	the	the	DET
fumecheng-12767	102	2	zeta	zeta	PROPN
fumecheng-12767	102	3	potential	potential	NOUN
fumecheng-12767	102	4	represents	represent	VERB
fumecheng-12767	102	5	the	the	DET
fumecheng-12767	102	6	potential	potential	NOUN
fumecheng-12767	102	7	at	at	ADP
fumecheng-12767	102	8	the	the	DET
fumecheng-12767	102	9	slipping	slip	VERB
fumecheng-12767	102	10	plane	plane	NOUN
fumecheng-12767	102	11	of	of	ADP
fumecheng-12767	102	12	a	a	DET
fumecheng-12767	102	13	particle	particle	NOUN
fumecheng-12767	102	14	[	[	X
fumecheng-12767	102	15	26	26	NUM
fumecheng-12767	102	16	]	]	PUNCT
fumecheng-12767	102	17	.	.	PUNCT
fumecheng-12767	103	1	when	when	SCONJ
fumecheng-12767	103	2	charged	charge	VERB
fumecheng-12767	103	3	particles	particle	NOUN
fumecheng-12767	103	4	are	be	AUX
fumecheng-12767	103	5	dispersed	disperse	VERB
fumecheng-12767	103	6	in	in	ADP
fumecheng-12767	103	7	a	a	DET
fumecheng-12767	103	8	solution	solution	NOUN
fumecheng-12767	103	9	,	,	PUNCT
fumecheng-12767	103	10	counterions	counterion	NOUN
fumecheng-12767	103	11	in	in	ADP
fumecheng-12767	103	12	the	the	DET
fumecheng-12767	103	13	solution	solution	NOUN
fumecheng-12767	103	14	adsorb	adsorb	VERB
fumecheng-12767	103	15	onto	onto	ADP
fumecheng-12767	103	16	the	the	DET
fumecheng-12767	103	17	particle	particle	NOUN
fumecheng-12767	103	18	to	to	PART
fumecheng-12767	103	19	neutralize	neutralize	VERB
fumecheng-12767	103	20	the	the	DET
fumecheng-12767	103	21	particle	particle	NOUN
fumecheng-12767	103	22	’s	’s	PART
fumecheng-12767	103	23	charge	charge	NOUN
fumecheng-12767	103	24	,	,	PUNCT
fumecheng-12767	103	25	forming	form	VERB
fumecheng-12767	103	26	an	an	DET
fumecheng-12767	103	27	electrical	electrical	ADJ
fumecheng-12767	103	28	double	double	ADJ
fumecheng-12767	103	29	layer	layer	NOUN
fumecheng-12767	103	30	.	.	PUNCT
fumecheng-12767	104	1	this	this	DET
fumecheng-12767	104	2	double	double	ADJ
fumecheng-12767	104	3	layer	layer	NOUN
fumecheng-12767	104	4	comprises	comprise	VERB
fumecheng-12767	104	5	a	a	DET
fumecheng-12767	104	6	stern	stern	ADJ
fumecheng-12767	104	7	layer	layer	NOUN
fumecheng-12767	104	8	and	and	CCONJ
fumecheng-12767	104	9	a	a	DET
fumecheng-12767	104	10	diffuse	diffuse	NOUN
fumecheng-12767	104	11	charge	charge	NOUN
fumecheng-12767	104	12	layer	layer	NOUN
fumecheng-12767	104	13	.	.	PUNCT
fumecheng-12767	105	1	the	the	DET
fumecheng-12767	105	2	slipping	slip	VERB
fumecheng-12767	105	3	plane	plane	NOUN
fumecheng-12767	105	4	is	be	AUX
fumecheng-12767	105	5	defined	define	VERB
fumecheng-12767	105	6	as	as	ADP
fumecheng-12767	105	7	the	the	DET
fumecheng-12767	105	8	outer	outer	ADJ
fumecheng-12767	105	9	boundary	boundary	NOUN
fumecheng-12767	105	10	where	where	SCONJ
fumecheng-12767	105	11	the	the	DET
fumecheng-12767	105	12	particles	particle	NOUN
fumecheng-12767	105	13	move	move	VERB
fumecheng-12767	105	14	,	,	PUNCT
fumecheng-12767	105	15	and	and	CCONJ
fumecheng-12767	105	16	the	the	DET
fumecheng-12767	105	17	potential	potential	NOUN
fumecheng-12767	105	18	at	at	ADP
fumecheng-12767	105	19	this	this	DET
fumecheng-12767	105	20	plane	plane	NOUN
fumecheng-12767	105	21	is	be	AUX
fumecheng-12767	105	22	known	know	VERB
fumecheng-12767	105	23	as	as	ADP
fumecheng-12767	105	24	the	the	DET
fumecheng-12767	105	25	zeta	zeta	NOUN
fumecheng-12767	105	26	potential	potential	NOUN
fumecheng-12767	105	27	,	,	PUNCT
fumecheng-12767	105	28	indicating	indicate	VERB
fumecheng-12767	105	29	the	the	DET
fumecheng-12767	105	30	electrical	electrical	ADJ
fumecheng-12767	105	31	properties	property	NOUN
fumecheng-12767	105	32	of	of	ADP
fumecheng-12767	105	33	the	the	DET
fumecheng-12767	105	34	interface	interface	NOUN
fumecheng-12767	105	35	.	.	PUNCT
fumecheng-12767	106	1	normal	normal	ADJ
fumecheng-12767	106	2	ps	ps	PROPN
fumecheng-12767	106	3	showed	show	VERB
fumecheng-12767	106	4	a	a	DET
fumecheng-12767	106	5	negative	negative	ADJ
fumecheng-12767	106	6	zeta	zeta	NOUN
fumecheng-12767	106	7	potential	potential	NOUN
fumecheng-12767	106	8	(	(	PUNCT
fumecheng-12767	106	9	-22.94	-22.94	PROPN
fumecheng-12767	106	10	mv	mv	NOUN
fumecheng-12767	106	11	)	)	PUNCT
fumecheng-12767	106	12	,	,	PUNCT
fumecheng-12767	106	13	but	but	CCONJ
fumecheng-12767	106	14	with	with	ADP
fumecheng-12767	106	15	the	the	DET
fumecheng-12767	106	16	addition	addition	NOUN
fumecheng-12767	106	17	of	of	ADP
fumecheng-12767	106	18	dmc	dmc	PROPN
fumecheng-12767	106	19	,	,	PUNCT
fumecheng-12767	106	20	the	the	DET
fumecheng-12767	106	21	charged	charge	VERB
fumecheng-12767	106	22	ps	ps	NOUN
fumecheng-12767	106	23	exhibited	exhibit	VERB
fumecheng-12767	106	24	a	a	DET
fumecheng-12767	106	25	positive	positive	ADJ
fumecheng-12767	106	26	zeta	zeta	NOUN
fumecheng-12767	106	27	potential	potential	NOUN
fumecheng-12767	106	28	(	(	PUNCT
fumecheng-12767	106	29	26.5	26.5	NUM
fumecheng-12767	106	30	mv	mv	NOUN
fumecheng-12767	106	31	)	)	PUNCT
fumecheng-12767	106	32	,	,	PUNCT
fumecheng-12767	106	33	confirming	confirm	VERB
fumecheng-12767	106	34	the	the	DET
fumecheng-12767	106	35	effective	effective	ADJ
fumecheng-12767	106	36	functionalization	functionalization	NOUN
fumecheng-12767	106	37	of	of	ADP
fumecheng-12767	106	38	ps	ps	PROPN
fumecheng-12767	106	39	with	with	ADP
fumecheng-12767	106	40	dmc	dmc	PROPN
fumecheng-12767	106	41	.	.	PROPN
fumecheng-12767	106	42	fig	fig	PROPN
fumecheng-12767	106	43	.	.	PUNCT
fumecheng-12767	107	1	2(b	2(b	NUM
fumecheng-12767	107	2	)	)	PUNCT
fumecheng-12767	107	3	displays	display	VERB
fumecheng-12767	107	4	the	the	DET
fumecheng-12767	107	5	xps	xps	PROPN
fumecheng-12767	107	6	results	result	NOUN
fumecheng-12767	107	7	for	for	ADP
fumecheng-12767	107	8	the	the	DET
fumecheng-12767	107	9	n	n	NUM
fumecheng-12767	107	10	1s	1s	NUM
fumecheng-12767	107	11	region	region	NOUN
fumecheng-12767	107	12	of	of	ADP
fumecheng-12767	107	13	the	the	DET
fumecheng-12767	107	14	charged	charge	VERB
fumecheng-12767	107	15	ps	ps	NOUN
fumecheng-12767	107	16	.	.	PUNCT
fumecheng-12767	108	1	the	the	DET
fumecheng-12767	108	2	peak	peak	NOUN
fumecheng-12767	108	3	intensity	intensity	NOUN
fumecheng-12767	108	4	of	of	ADP
fumecheng-12767	108	5	around	around	ADP
fumecheng-12767	108	6	403	403	NUM
fumecheng-12767	108	7	ev	ev	NOUN
fumecheng-12767	108	8	corresponds	correspond	NOUN
fumecheng-12767	108	9	to	to	ADP
fumecheng-12767	108	10	the	the	DET
fumecheng-12767	108	11	-n(ch3)3	-n(ch3)3	PROPN
fumecheng-12767	108	12	+	+	CCONJ
fumecheng-12767	108	13	functional	functional	ADJ
fumecheng-12767	108	14	group	group	NOUN
fumecheng-12767	108	15	,	,	PUNCT
fumecheng-12767	108	16	which	which	PRON
fumecheng-12767	108	17	is	be	AUX
fumecheng-12767	108	18	the	the	DET
fumecheng-12767	108	19	terminal	terminal	ADJ
fumecheng-12767	108	20	part	part	NOUN
fumecheng-12767	108	21	of	of	ADP
fumecheng-12767	108	22	dmc	dmc	PROPN
fumecheng-12767	108	23	,	,	PUNCT
fumecheng-12767	108	24	confirming	confirm	VERB
fumecheng-12767	108	25	the	the	DET
fumecheng-12767	108	26	presence	presence	NOUN
fumecheng-12767	108	27	of	of	ADP
fumecheng-12767	108	28	dmc	dmc	PROPN
fumecheng-12767	108	29	on	on	ADP
fumecheng-12767	108	30	the	the	DET
fumecheng-12767	108	31	ps	ps	PROPN
fumecheng-12767	108	32	surface	surface	NOUN
fumecheng-12767	108	33	.	.	PUNCT
fumecheng-12767	109	1	psa	psa	VERB
fumecheng-12767	109	2	and	and	CCONJ
fumecheng-12767	109	3	fe	fe	ADJ
fumecheng-12767	109	4	-	-	ADJ
fumecheng-12767	109	5	sem	sem	NOUN
fumecheng-12767	109	6	analyses	analysis	NOUN
fumecheng-12767	109	7	were	be	AUX
fumecheng-12767	109	8	performed	perform	VERB
fumecheng-12767	109	9	to	to	PART
fumecheng-12767	109	10	verify	verify	VERB
fumecheng-12767	109	11	the	the	DET
fumecheng-12767	109	12	uniform	uniform	ADJ
fumecheng-12767	109	13	particle	particle	NOUN
fumecheng-12767	109	14	size	size	NOUN
fumecheng-12767	109	15	of	of	ADP
fumecheng-12767	109	16	the	the	DET
fumecheng-12767	109	17	synthesized	synthesize	VERB
fumecheng-12767	109	18	ps	ps	NOUN
fumecheng-12767	109	19	via	via	ADP
fumecheng-12767	109	20	dispersion	dispersion	NOUN
fumecheng-12767	109	21	polymerization	polymerization	NOUN
fumecheng-12767	109	22	.	.	PUNCT
fumecheng-12767	110	1	fig	fig	NOUN
fumecheng-12767	110	2	.	.	PUNCT
fumecheng-12767	111	1	2(c	2(c	NUM
fumecheng-12767	111	2	)	)	PUNCT
fumecheng-12767	112	1	shows	show	VERB
fumecheng-12767	112	2	the	the	DET
fumecheng-12767	112	3	particle	particle	NOUN
fumecheng-12767	112	4	size	size	NOUN
fumecheng-12767	112	5	distribution	distribution	NOUN
fumecheng-12767	112	6	of	of	ADP
fumecheng-12767	112	7	the	the	DET
fumecheng-12767	112	8	charged	charge	VERB
fumecheng-12767	112	9	ps	ps	NOUN
fumecheng-12767	112	10	measured	measure	VERB
fumecheng-12767	112	11	by	by	ADP
fumecheng-12767	112	12	psa	psa	NOUN
fumecheng-12767	112	13	,	,	PUNCT
fumecheng-12767	112	14	indicating	indicate	VERB
fumecheng-12767	112	15	that	that	SCONJ
fumecheng-12767	112	16	most	most	ADJ
fumecheng-12767	112	17	particles	particle	NOUN
fumecheng-12767	112	18	were	be	AUX
fumecheng-12767	112	19	around	around	ADV
fumecheng-12767	112	20	0.7	0.7	NUM
fumecheng-12767	112	21	µm	µm	NOUN
fumecheng-12767	112	22	in	in	ADP
fumecheng-12767	112	23	size	size	NOUN
fumecheng-12767	112	24	,	,	PUNCT
fumecheng-12767	112	25	with	with	ADP
fumecheng-12767	112	26	a	a	DET
fumecheng-12767	112	27	d50	d50	NOUN
fumecheng-12767	112	28	value	value	NOUN
fumecheng-12767	112	29	of	of	ADP
fumecheng-12767	112	30	0.741	0.741	NUM
fumecheng-12767	112	31	µm	µm	NOUN
fumecheng-12767	112	32	.	.	PUNCT
fumecheng-12767	112	33	fig	fig	NOUN
fumecheng-12767	112	34	.	.	PUNCT
fumecheng-12767	113	1	2(d	2(d	NUM
fumecheng-12767	113	2	)	)	PUNCT
fumecheng-12767	114	1	provides	provide	VERB
fumecheng-12767	114	2	an	an	DET
fumecheng-12767	114	3	fe	fe	ADJ
fumecheng-12767	114	4	-	-	ADJ
fumecheng-12767	114	5	sem	sem	ADJ
fumecheng-12767	114	6	image	image	NOUN
fumecheng-12767	114	7	,	,	PUNCT
fumecheng-12767	114	8	revealing	reveal	VERB
fumecheng-12767	114	9	uniformly	uniformly	ADV
fumecheng-12767	114	10	sized	sized	ADJ
fumecheng-12767	114	11	spherical	spherical	ADJ
fumecheng-12767	114	12	ps	ps	NOUN
fumecheng-12767	114	13	particles	particle	NOUN
fumecheng-12767	114	14	with	with	ADP
fumecheng-12767	114	15	smooth	smooth	ADJ
fumecheng-12767	114	16	surfaces	surface	NOUN
fumecheng-12767	114	17	.	.	PUNCT
fumecheng-12767	115	1	fig	fig	NOUN
fumecheng-12767	115	2	.	.	PUNCT
fumecheng-12767	116	1	2	2	NUM
fumecheng-12767	116	2	characterization	characterization	NOUN
fumecheng-12767	116	3	of	of	ADP
fumecheng-12767	116	4	the	the	DET
fumecheng-12767	116	5	positively	positively	ADV
fumecheng-12767	116	6	charged	charge	VERB
fumecheng-12767	116	7	polystyrene	polystyrene	NOUN
fumecheng-12767	116	8	particles	particle	NOUN
fumecheng-12767	116	9	:	:	PUNCT
fumecheng-12767	116	10	(	(	PUNCT
fumecheng-12767	116	11	a	a	X
fumecheng-12767	116	12	)	)	PUNCT
fumecheng-12767	116	13	zeta	zeta	NOUN
fumecheng-12767	116	14	potential	potential	ADJ
fumecheng-12767	116	15	measurements	measurement	NOUN
fumecheng-12767	116	16	,	,	PUNCT
fumecheng-12767	116	17	(	(	PUNCT
fumecheng-12767	116	18	b	b	X
fumecheng-12767	116	19	)	)	PUNCT
fumecheng-12767	116	20	xps	xps	NOUN
fumecheng-12767	116	21	analysis	analysis	NOUN
fumecheng-12767	116	22	,	,	PUNCT
fumecheng-12767	116	23	(	(	PUNCT
fumecheng-12767	116	24	c	c	X
fumecheng-12767	116	25	)	)	PUNCT
fumecheng-12767	116	26	particle	particle	NOUN
fumecheng-12767	116	27	size	size	NOUN
fumecheng-12767	116	28	distribution	distribution	NOUN
fumecheng-12767	116	29	profile	profile	NOUN
fumecheng-12767	116	30	,	,	PUNCT
fumecheng-12767	116	31	and	and	CCONJ
fumecheng-12767	116	32	(	(	PUNCT
fumecheng-12767	116	33	d	d	X
fumecheng-12767	116	34	)	)	PUNCT
fumecheng-12767	116	35	fesem	fesem	NOUN
fumecheng-12767	116	36	image	image	NOUN
fumecheng-12767	116	37	mechanically	mechanically	ADV
fumecheng-12767	116	38	pressed	press	VERB
fumecheng-12767	116	39	polymer	polymer	NOUN
fumecheng-12767	116	40	-	-	PUNCT
fumecheng-12767	116	41	matrix	matrix	NOUN
fumecheng-12767	116	42	composites	composite	NOUN
fumecheng-12767	116	43	with	with	ADP
fumecheng-12767	116	44	3d	3d	NUM
fumecheng-12767	116	45	structured	structured	ADJ
fumecheng-12767	116	46	filler	filler	NOUN
fumecheng-12767	116	47	networks	network	NOUN
fumecheng-12767	116	48	...	...	PUNCT
fumecheng-12767	117	1	607	607	NUM
fumecheng-12767	117	2	when	when	SCONJ
fumecheng-12767	117	3	the	the	DET
fumecheng-12767	117	4	max	max	PROPN
fumecheng-12767	117	5	phase	phase	NOUN
fumecheng-12767	117	6	transformed	transform	VERB
fumecheng-12767	117	7	into	into	ADP
fumecheng-12767	117	8	the	the	DET
fumecheng-12767	117	9	mxene	mxene	NOUN
fumecheng-12767	117	10	phase	phase	NOUN
fumecheng-12767	117	11	,	,	PUNCT
fumecheng-12767	117	12	the	the	DET
fumecheng-12767	117	13	existing	exist	VERB
fumecheng-12767	117	14	al	al	PROPN
fumecheng-12767	117	15	layers	layer	NOUN
fumecheng-12767	117	16	were	be	AUX
fumecheng-12767	117	17	removed	remove	VERB
fumecheng-12767	117	18	,	,	PUNCT
fumecheng-12767	117	19	and	and	CCONJ
fumecheng-12767	117	20	various	various	ADJ
fumecheng-12767	117	21	functional	functional	ADJ
fumecheng-12767	117	22	groups	group	NOUN
fumecheng-12767	117	23	formed	form	VERB
fumecheng-12767	117	24	,	,	PUNCT
fumecheng-12767	117	25	which	which	PRON
fumecheng-12767	117	26	altered	alter	VERB
fumecheng-12767	117	27	the	the	DET
fumecheng-12767	117	28	surface	surface	NOUN
fumecheng-12767	117	29	characteristics	characteristic	NOUN
fumecheng-12767	117	30	.	.	PUNCT
fumecheng-12767	118	1	these	these	DET
fumecheng-12767	118	2	functional	functional	ADJ
fumecheng-12767	118	3	groups	group	NOUN
fumecheng-12767	118	4	,	,	PUNCT
fumecheng-12767	118	5	such	such	ADJ
fumecheng-12767	118	6	as	as	ADP
fumecheng-12767	118	7	-oh	-oh	NOUN
fumecheng-12767	118	8	and	and	CCONJ
fumecheng-12767	118	9	-f	-f	NUM
fumecheng-12767	118	10	,	,	PUNCT
fumecheng-12767	118	11	carried	carry	VERB
fumecheng-12767	118	12	negative	negative	ADJ
fumecheng-12767	118	13	charges	charge	NOUN
fumecheng-12767	118	14	,	,	PUNCT
fumecheng-12767	118	15	resulting	result	VERB
fumecheng-12767	118	16	in	in	ADP
fumecheng-12767	118	17	the	the	DET
fumecheng-12767	118	18	etched	etch	VERB
fumecheng-12767	118	19	mxene	mxene	NOUN
fumecheng-12767	118	20	having	have	VERB
fumecheng-12767	118	21	a	a	DET
fumecheng-12767	118	22	negatively	negatively	ADV
fumecheng-12767	118	23	charged	charge	VERB
fumecheng-12767	118	24	surface	surface	NOUN
fumecheng-12767	118	25	.	.	PUNCT
fumecheng-12767	119	1	fig	fig	NOUN
fumecheng-12767	119	2	.	.	PUNCT
fumecheng-12767	120	1	3(a	3(a	NUM
fumecheng-12767	120	2	)	)	PUNCT
fumecheng-12767	121	1	shows	show	VERB
fumecheng-12767	121	2	the	the	DET
fumecheng-12767	121	3	zeta	zeta	PROPN
fumecheng-12767	121	4	potential	potential	NOUN
fumecheng-12767	121	5	of	of	ADP
fumecheng-12767	121	6	mxene	mxene	NOUN
fumecheng-12767	121	7	,	,	PUNCT
fumecheng-12767	121	8	measured	measure	VERB
fumecheng-12767	121	9	at	at	ADP
fumecheng-12767	121	10	-52.26	-52.26	PROPN
fumecheng-12767	121	11	mv	mv	PROPN
fumecheng-12767	121	12	,	,	PUNCT
fumecheng-12767	121	13	indicating	indicate	VERB
fumecheng-12767	121	14	a	a	DET
fumecheng-12767	121	15	negative	negative	ADJ
fumecheng-12767	121	16	surface	surface	NOUN
fumecheng-12767	121	17	charge	charge	NOUN
fumecheng-12767	121	18	.	.	PUNCT
fumecheng-12767	122	1	additionally	additionally	ADV
fumecheng-12767	122	2	,	,	PUNCT
fumecheng-12767	122	3	the	the	DET
fumecheng-12767	122	4	zeta	zeta	NOUN
fumecheng-12767	122	5	potential	potential	NOUN
fumecheng-12767	122	6	provides	provide	VERB
fumecheng-12767	122	7	insights	insight	NOUN
fumecheng-12767	122	8	into	into	ADP
fumecheng-12767	122	9	dispersibility	dispersibility	NOUN
fumecheng-12767	122	10	,	,	PUNCT
fumecheng-12767	122	11	suggesting	suggest	VERB
fumecheng-12767	122	12	that	that	SCONJ
fumecheng-12767	122	13	mxene	mxene	NOUN
fumecheng-12767	122	14	has	have	VERB
fumecheng-12767	122	15	good	good	ADJ
fumecheng-12767	122	16	dispersion	dispersion	NOUN
fumecheng-12767	122	17	stability	stability	NOUN
fumecheng-12767	122	18	in	in	ADP
fumecheng-12767	122	19	water	water	NOUN
fumecheng-12767	122	20	.	.	PUNCT
fumecheng-12767	123	1	fig	fig	NOUN
fumecheng-12767	123	2	.	.	PUNCT
fumecheng-12767	124	1	3(b	3(b	NUM
fumecheng-12767	124	2	)	)	PUNCT
fumecheng-12767	124	3	and	and	CCONJ
fumecheng-12767	124	4	3(c	3(c	NUM
fumecheng-12767	124	5	)	)	PUNCT
fumecheng-12767	124	6	demonstrate	demonstrate	VERB
fumecheng-12767	124	7	the	the	DET
fumecheng-12767	124	8	successful	successful	ADJ
fumecheng-12767	124	9	etching	etch	VERB
fumecheng-12767	124	10	from	from	ADP
fumecheng-12767	124	11	the	the	DET
fumecheng-12767	124	12	max	max	PROPN
fumecheng-12767	124	13	phase	phase	NOUN
fumecheng-12767	124	14	to	to	ADP
fumecheng-12767	124	15	the	the	DET
fumecheng-12767	124	16	mxene	mxene	NOUN
fumecheng-12767	124	17	phase	phase	NOUN
fumecheng-12767	124	18	.	.	PUNCT
fumecheng-12767	125	1	figure	figure	NOUN
fumecheng-12767	125	2	3(b	3(b	NUM
fumecheng-12767	125	3	)	)	PUNCT
fumecheng-12767	125	4	presents	present	VERB
fumecheng-12767	125	5	the	the	DET
fumecheng-12767	125	6	max	max	PROPN
fumecheng-12767	125	7	and	and	CCONJ
fumecheng-12767	125	8	mxene	mxene	NOUN
fumecheng-12767	125	9	xps	xps	PROPN
fumecheng-12767	125	10	analysis	analysis	NOUN
fumecheng-12767	125	11	.	.	PUNCT
fumecheng-12767	126	1	the	the	DET
fumecheng-12767	126	2	disappearance	disappearance	NOUN
fumecheng-12767	126	3	of	of	ADP
fumecheng-12767	126	4	the	the	DET
fumecheng-12767	126	5	al	al	PROPN
fumecheng-12767	126	6	peak	peak	NOUN
fumecheng-12767	126	7	after	after	ADP
fumecheng-12767	126	8	transformation	transformation	NOUN
fumecheng-12767	126	9	to	to	ADP
fumecheng-12767	126	10	mxene	mxene	NOUN
fumecheng-12767	126	11	confirms	confirm	VERB
fumecheng-12767	126	12	that	that	SCONJ
fumecheng-12767	126	13	al	al	PROPN
fumecheng-12767	126	14	was	be	AUX
fumecheng-12767	126	15	entirely	entirely	ADV
fumecheng-12767	126	16	etched	etch	VERB
fumecheng-12767	126	17	away	away	ADV
fumecheng-12767	126	18	by	by	ADP
fumecheng-12767	126	19	the	the	DET
fumecheng-12767	126	20	acidic	acidic	ADJ
fumecheng-12767	126	21	solution	solution	NOUN
fumecheng-12767	126	22	.	.	PUNCT
fumecheng-12767	127	1	the	the	DET
fumecheng-12767	127	2	structural	structural	ADJ
fumecheng-12767	127	3	change	change	NOUN
fumecheng-12767	127	4	from	from	ADP
fumecheng-12767	127	5	max	max	PROPN
fumecheng-12767	127	6	to	to	ADP
fumecheng-12767	127	7	mxene	mxene	NOUN
fumecheng-12767	127	8	is	be	AUX
fumecheng-12767	127	9	evident	evident	ADJ
fumecheng-12767	127	10	in	in	ADP
fumecheng-12767	127	11	the	the	DET
fumecheng-12767	127	12	xrd	xrd	NOUN
fumecheng-12767	127	13	patterns	pattern	NOUN
fumecheng-12767	127	14	(	(	PUNCT
fumecheng-12767	127	15	figure	figure	NOUN
fumecheng-12767	127	16	3(c	3(c	NUM
fumecheng-12767	127	17	)	)	PUNCT
fumecheng-12767	127	18	)	)	PUNCT
fumecheng-12767	127	19	.	.	PUNCT
fumecheng-12767	128	1	as	as	SCONJ
fumecheng-12767	128	2	the	the	DET
fumecheng-12767	128	3	transformation	transformation	NOUN
fumecheng-12767	128	4	progressed	progress	VERB
fumecheng-12767	128	5	,	,	PUNCT
fumecheng-12767	128	6	the	the	DET
fumecheng-12767	128	7	al	al	PROPN
fumecheng-12767	128	8	layers	layer	NOUN
fumecheng-12767	128	9	were	be	AUX
fumecheng-12767	128	10	removed	remove	VERB
fumecheng-12767	128	11	by	by	ADP
fumecheng-12767	128	12	lif	lif	PROPN
fumecheng-12767	128	13	/	/	SYM
fumecheng-12767	128	14	hcl	hcl	PROPN
fumecheng-12767	128	15	,	,	PUNCT
fumecheng-12767	128	16	causing	cause	VERB
fumecheng-12767	128	17	the	the	DET
fumecheng-12767	128	18	characteristic	characteristic	ADJ
fumecheng-12767	128	19	peaks	peak	NOUN
fumecheng-12767	128	20	at	at	ADP
fumecheng-12767	128	21	(	(	PUNCT
fumecheng-12767	128	22	101	101	NUM
fumecheng-12767	128	23	)	)	PUNCT
fumecheng-12767	128	24	,	,	PUNCT
fumecheng-12767	128	25	(	(	PUNCT
fumecheng-12767	128	26	103	103	NUM
fumecheng-12767	128	27	)	)	PUNCT
fumecheng-12767	128	28	,	,	PUNCT
fumecheng-12767	128	29	(	(	PUNCT
fumecheng-12767	128	30	104	104	NUM
fumecheng-12767	128	31	)	)	PUNCT
fumecheng-12767	128	32	,	,	PUNCT
fumecheng-12767	128	33	and	and	CCONJ
fumecheng-12767	128	34	(	(	PUNCT
fumecheng-12767	128	35	105	105	NUM
fumecheng-12767	128	36	)	)	PUNCT
fumecheng-12767	128	37	to	to	PART
fumecheng-12767	128	38	disappear	disappear	VERB
fumecheng-12767	128	39	[	[	X
fumecheng-12767	128	40	27	27	NUM
fumecheng-12767	128	41	]	]	PUNCT
fumecheng-12767	128	42	.	.	PUNCT
fumecheng-12767	129	1	the	the	DET
fumecheng-12767	129	2	broadening	broadening	NOUN
fumecheng-12767	129	3	of	of	ADP
fumecheng-12767	129	4	the	the	DET
fumecheng-12767	129	5	(	(	PUNCT
fumecheng-12767	129	6	002	002	NUM
fumecheng-12767	129	7	)	)	PUNCT
fumecheng-12767	129	8	peak	peak	NOUN
fumecheng-12767	129	9	was	be	AUX
fumecheng-12767	129	10	also	also	ADV
fumecheng-12767	129	11	observed	observe	VERB
fumecheng-12767	129	12	,	,	PUNCT
fumecheng-12767	129	13	which	which	PRON
fumecheng-12767	129	14	can	can	AUX
fumecheng-12767	129	15	be	be	AUX
fumecheng-12767	129	16	attributed	attribute	VERB
fumecheng-12767	129	17	to	to	ADP
fumecheng-12767	129	18	the	the	DET
fumecheng-12767	129	19	increased	increase	VERB
fumecheng-12767	129	20	interlayer	interlayer	NOUN
fumecheng-12767	129	21	distance	distance	NOUN
fumecheng-12767	129	22	after	after	ADP
fumecheng-12767	129	23	al	al	PROPN
fumecheng-12767	129	24	removal	removal	PROPN
fumecheng-12767	129	25	.	.	PUNCT
fumecheng-12767	130	1	the	the	DET
fumecheng-12767	130	2	etched	etch	VERB
fumecheng-12767	130	3	mxene	mxene	NOUN
fumecheng-12767	130	4	exhibited	exhibit	VERB
fumecheng-12767	130	5	an	an	DET
fumecheng-12767	130	6	accordion	accordion	NOUN
fumecheng-12767	130	7	-	-	PUNCT
fumecheng-12767	130	8	like	like	ADJ
fumecheng-12767	130	9	layered	layered	ADJ
fumecheng-12767	130	10	structure	structure	NOUN
fumecheng-12767	130	11	,	,	PUNCT
fumecheng-12767	130	12	which	which	PRON
fumecheng-12767	130	13	was	be	AUX
fumecheng-12767	130	14	delaminated	delaminate	VERB
fumecheng-12767	130	15	through	through	ADP
fumecheng-12767	130	16	simple	simple	ADJ
fumecheng-12767	130	17	sonication	sonication	NOUN
fumecheng-12767	130	18	.	.	PUNCT
fumecheng-12767	131	1	this	this	DET
fumecheng-12767	131	2	delaminated	delaminate	VERB
fumecheng-12767	131	3	mxene	mxene	NOUN
fumecheng-12767	131	4	was	be	AUX
fumecheng-12767	131	5	very	very	ADV
fumecheng-12767	131	6	thin	thin	ADJ
fumecheng-12767	131	7	and	and	CCONJ
fumecheng-12767	131	8	flexible	flexible	ADJ
fumecheng-12767	131	9	,	,	PUNCT
fumecheng-12767	131	10	as	as	SCONJ
fumecheng-12767	131	11	shown	show	VERB
fumecheng-12767	131	12	in	in	ADP
fumecheng-12767	131	13	figure	figure	NOUN
fumecheng-12767	131	14	3(d	3(d	NUM
fumecheng-12767	131	15	)	)	PUNCT
fumecheng-12767	131	16	.	.	PUNCT
fumecheng-12767	132	1	fig	fig	NOUN
fumecheng-12767	132	2	.	.	PUNCT
fumecheng-12767	133	1	3	3	NUM
fumecheng-12767	133	2	characterization	characterization	NOUN
fumecheng-12767	133	3	of	of	ADP
fumecheng-12767	133	4	ti3c2tx	ti3c2tx	NOUN
fumecheng-12767	133	5	mxene	mxene	NOUN
fumecheng-12767	133	6	and	and	CCONJ
fumecheng-12767	133	7	ti3alc2	ti3alc2	PROPN
fumecheng-12767	133	8	max	max	PROPN
fumecheng-12767	133	9	:	:	PUNCT
fumecheng-12767	133	10	(	(	PUNCT
fumecheng-12767	133	11	a	a	X
fumecheng-12767	133	12	)	)	PUNCT
fumecheng-12767	133	13	zeta	zeta	NOUN
fumecheng-12767	133	14	potential	potential	ADJ
fumecheng-12767	133	15	measurements	measurement	NOUN
fumecheng-12767	133	16	,	,	PUNCT
fumecheng-12767	133	17	(	(	PUNCT
fumecheng-12767	133	18	b	b	X
fumecheng-12767	133	19	)	)	PUNCT
fumecheng-12767	133	20	xps	xps	NOUN
fumecheng-12767	133	21	analysis	analysis	NOUN
fumecheng-12767	133	22	,	,	PUNCT
fumecheng-12767	133	23	(	(	PUNCT
fumecheng-12767	133	24	c	c	X
fumecheng-12767	133	25	)	)	PUNCT
fumecheng-12767	133	26	xrd	xrd	NOUN
fumecheng-12767	133	27	analysis	analysis	NOUN
fumecheng-12767	133	28	,	,	PUNCT
fumecheng-12767	133	29	and	and	CCONJ
fumecheng-12767	133	30	(	(	PUNCT
fumecheng-12767	133	31	d	d	NOUN
fumecheng-12767	133	32	)	)	PUNCT
fumecheng-12767	133	33	fe	fe	ADJ
fumecheng-12767	133	34	-	-	PUNCT
fumecheng-12767	133	35	sem	sem	NOUN
fumecheng-12767	133	36	image	image	NOUN
fumecheng-12767	133	37	the	the	DET
fumecheng-12767	133	38	layered	layered	ADJ
fumecheng-12767	133	39	structure	structure	NOUN
fumecheng-12767	133	40	of	of	ADP
fumecheng-12767	133	41	bn	bn	ADV
fumecheng-12767	133	42	transitioned	transition	VERB
fumecheng-12767	133	43	to	to	ADP
fumecheng-12767	133	44	bnnss	bnns	NOUN
fumecheng-12767	133	45	as	as	SCONJ
fumecheng-12767	133	46	the	the	DET
fumecheng-12767	133	47	interlayer	interlayer	NOUN
fumecheng-12767	133	48	bonds	bond	NOUN
fumecheng-12767	133	49	broke	break	VERB
fumecheng-12767	133	50	during	during	ADP
fumecheng-12767	133	51	sonication	sonication	NOUN
fumecheng-12767	133	52	in	in	ADP
fumecheng-12767	133	53	a	a	DET
fumecheng-12767	133	54	mixture	mixture	NOUN
fumecheng-12767	133	55	of	of	ADP
fumecheng-12767	133	56	ipa	ipa	PROPN
fumecheng-12767	133	57	and	and	CCONJ
fumecheng-12767	133	58	di	di	NOUN
fumecheng-12767	133	59	water	water	NOUN
fumecheng-12767	133	60	.	.	PUNCT
fumecheng-12767	134	1	during	during	ADP
fumecheng-12767	134	2	this	this	DET
fumecheng-12767	134	3	process	process	NOUN
fumecheng-12767	134	4	,	,	PUNCT
fumecheng-12767	134	5	-oh	-oh	AUX
fumecheng-12767	134	6	functional	functional	ADJ
fumecheng-12767	134	7	groups	group	NOUN
fumecheng-12767	134	8	formed	form	VERB
fumecheng-12767	134	9	on	on	ADP
fumecheng-12767	134	10	the	the	DET
fumecheng-12767	134	11	surface	surface	NOUN
fumecheng-12767	134	12	of	of	ADP
fumecheng-12767	134	13	bnnss	bnns	NOUN
fumecheng-12767	134	14	,	,	PUNCT
fumecheng-12767	134	15	imparting	impart	VERB
fumecheng-12767	134	16	a	a	DET
fumecheng-12767	134	17	negative	negative	ADJ
fumecheng-12767	134	18	charge	charge	NOUN
fumecheng-12767	134	19	.	.	PUNCT
fumecheng-12767	135	1	to	to	PART
fumecheng-12767	135	2	facilitate	facilitate	VERB
fumecheng-12767	135	3	interaction	interaction	NOUN
fumecheng-12767	135	4	with	with	ADP
fumecheng-12767	135	5	ps@mxene	ps@mxene	NOUN
fumecheng-12767	135	6	,	,	PUNCT
fumecheng-12767	135	7	which	which	PRON
fumecheng-12767	135	8	also	also	ADV
fumecheng-12767	135	9	had	have	VERB
fumecheng-12767	135	10	a	a	DET
fumecheng-12767	135	11	negative	negative	ADJ
fumecheng-12767	135	12	charge	charge	NOUN
fumecheng-12767	135	13	,	,	PUNCT
fumecheng-12767	135	14	it	it	PRON
fumecheng-12767	135	15	was	be	AUX
fumecheng-12767	135	16	necessary	necessary	ADJ
fumecheng-12767	135	17	to	to	PART
fumecheng-12767	135	18	change	change	VERB
fumecheng-12767	135	19	the	the	DET
fumecheng-12767	135	20	surface	surface	NOUN
fumecheng-12767	135	21	608	608	NUM
fumecheng-12767	135	22	c.	c.	NOUN
fumecheng-12767	135	23	choi	choi	NOUN
fumecheng-12767	135	24	,	,	PUNCT
fumecheng-12767	135	25	n.	n.	PROPN
fumecheng-12767	135	26	qaiser	qaiser	PROPN
fumecheng-12767	135	27	,	,	PUNCT
fumecheng-12767	135	28	b.	b.	PROPN
fumecheng-12767	135	29	hwang	hwang	PROPN
fumecheng-12767	135	30	charge	charge	VERB
fumecheng-12767	135	31	to	to	ADP
fumecheng-12767	135	32	positive	positive	ADJ
fumecheng-12767	135	33	.	.	PUNCT
fumecheng-12767	136	1	this	this	PRON
fumecheng-12767	136	2	was	be	AUX
fumecheng-12767	136	3	achieved	achieve	VERB
fumecheng-12767	136	4	by	by	ADP
fumecheng-12767	136	5	reacting	react	VERB
fumecheng-12767	136	6	the	the	DET
fumecheng-12767	136	7	-oh	-oh	ADJ
fumecheng-12767	136	8	groups	group	NOUN
fumecheng-12767	136	9	with	with	ADP
fumecheng-12767	136	10	aptes	apte	NOUN
fumecheng-12767	136	11	.	.	PUNCT
fumecheng-12767	137	1	figure	figure	NOUN
fumecheng-12767	137	2	4(a	4(a	NUM
fumecheng-12767	137	3	)	)	PUNCT
fumecheng-12767	137	4	shows	show	VERB
fumecheng-12767	137	5	the	the	DET
fumecheng-12767	137	6	zeta	zeta	NOUN
fumecheng-12767	137	7	potential	potential	ADJ
fumecheng-12767	137	8	measurements	measurement	NOUN
fumecheng-12767	137	9	of	of	ADP
fumecheng-12767	137	10	bnnss	bnns	NOUN
fumecheng-12767	137	11	and	and	CCONJ
fumecheng-12767	137	12	bnnss	bnns	NOUN
fumecheng-12767	137	13	-	-	PUNCT
fumecheng-12767	137	14	aptes	apte	NOUN
fumecheng-12767	137	15	.	.	PUNCT
fumecheng-12767	138	1	bnnss	bnns	NOUN
fumecheng-12767	138	2	had	have	VERB
fumecheng-12767	138	3	a	a	DET
fumecheng-12767	138	4	value	value	NOUN
fumecheng-12767	138	5	of	of	ADP
fumecheng-12767	138	6	-36.7	-36.7	PRON
fumecheng-12767	138	7	mv	mv	PROPN
fumecheng-12767	138	8	,	,	PUNCT
fumecheng-12767	138	9	which	which	PRON
fumecheng-12767	138	10	changed	change	VERB
fumecheng-12767	138	11	to	to	ADP
fumecheng-12767	138	12	+37.1	+37.1	PROPN
fumecheng-12767	138	13	mv	mv	PROPN
fumecheng-12767	138	14	after	after	ADP
fumecheng-12767	138	15	reacting	react	VERB
fumecheng-12767	138	16	with	with	ADP
fumecheng-12767	138	17	aptes	apte	NOUN
fumecheng-12767	138	18	,	,	PUNCT
fumecheng-12767	138	19	indicating	indicate	VERB
fumecheng-12767	138	20	that	that	SCONJ
fumecheng-12767	138	21	the	the	DET
fumecheng-12767	138	22	nh2	nh2	NOUN
fumecheng-12767	138	23	+	+	NUM
fumecheng-12767	138	24	groups	group	NOUN
fumecheng-12767	138	25	of	of	ADP
fumecheng-12767	138	26	aptes	apte	NOUN
fumecheng-12767	138	27	effectively	effectively	ADV
fumecheng-12767	138	28	modified	modify	VERB
fumecheng-12767	138	29	the	the	DET
fumecheng-12767	138	30	surface	surface	NOUN
fumecheng-12767	138	31	of	of	ADP
fumecheng-12767	138	32	bnnss	bnns	NOUN
fumecheng-12767	138	33	to	to	ADP
fumecheng-12767	138	34	a	a	DET
fumecheng-12767	138	35	positive	positive	ADJ
fumecheng-12767	138	36	charge	charge	NOUN
fumecheng-12767	138	37	.	.	PUNCT
fumecheng-12767	139	1	figures	figure	NOUN
fumecheng-12767	139	2	4(b	4(b	NUM
fumecheng-12767	139	3	)	)	PUNCT
fumecheng-12767	139	4	and	and	CCONJ
fumecheng-12767	139	5	4(c	4(c	NUM
fumecheng-12767	139	6	)	)	PUNCT
fumecheng-12767	139	7	present	present	VERB
fumecheng-12767	139	8	the	the	DET
fumecheng-12767	139	9	xps	xps	PROPN
fumecheng-12767	139	10	and	and	CCONJ
fumecheng-12767	139	11	ft	ft	PROPN
fumecheng-12767	139	12	-	-	PUNCT
fumecheng-12767	139	13	ir	ir	PROPN
fumecheng-12767	139	14	results	result	NOUN
fumecheng-12767	139	15	of	of	ADP
fumecheng-12767	139	16	bnnss	bnns	NOUN
fumecheng-12767	139	17	and	and	CCONJ
fumecheng-12767	139	18	bnnss	bnns	NOUN
fumecheng-12767	139	19	-	-	PUNCT
fumecheng-12767	139	20	aptes	apte	NOUN
fumecheng-12767	139	21	,	,	PUNCT
fumecheng-12767	139	22	respectively	respectively	ADV
fumecheng-12767	139	23	.	.	PUNCT
fumecheng-12767	140	1	since	since	SCONJ
fumecheng-12767	140	2	bnnss	bnns	NOUN
fumecheng-12767	140	3	consist	consist	VERB
fumecheng-12767	140	4	of	of	ADP
fumecheng-12767	140	5	boron	boron	NOUN
fumecheng-12767	140	6	and	and	CCONJ
fumecheng-12767	140	7	nitrogen	nitrogen	NOUN
fumecheng-12767	140	8	,	,	PUNCT
fumecheng-12767	140	9	no	no	DET
fumecheng-12767	140	10	si	si	NOUN
fumecheng-12767	140	11	peak	peak	NOUN
fumecheng-12767	140	12	was	be	AUX
fumecheng-12767	140	13	observed	observe	VERB
fumecheng-12767	140	14	.	.	PUNCT
fumecheng-12767	141	1	the	the	DET
fumecheng-12767	141	2	xps	xps	PROPN
fumecheng-12767	141	3	results	result	NOUN
fumecheng-12767	141	4	show	show	VERB
fumecheng-12767	141	5	that	that	SCONJ
fumecheng-12767	141	6	si	si	X
fumecheng-12767	141	7	,	,	PUNCT
fumecheng-12767	141	8	present	present	ADJ
fumecheng-12767	141	9	in	in	ADP
fumecheng-12767	141	10	aptes	apte	NOUN
fumecheng-12767	141	11	,	,	PUNCT
fumecheng-12767	141	12	was	be	AUX
fumecheng-12767	141	13	detectable	detectable	ADJ
fumecheng-12767	141	14	in	in	ADP
fumecheng-12767	141	15	bnnss	bnns	NOUN
fumecheng-12767	141	16	-	-	PUNCT
fumecheng-12767	141	17	aptes	apte	NOUN
fumecheng-12767	141	18	.	.	PUNCT
fumecheng-12767	142	1	additionally	additionally	ADV
fumecheng-12767	142	2	,	,	PUNCT
fumecheng-12767	142	3	the	the	DET
fumecheng-12767	142	4	ft	ft	PROPN
fumecheng-12767	142	5	-	-	PUNCT
fumecheng-12767	142	6	ir	ir	PROPN
fumecheng-12767	142	7	results	result	NOUN
fumecheng-12767	142	8	reveal	reveal	VERB
fumecheng-12767	142	9	a	a	DET
fumecheng-12767	142	10	-ch2	-ch2	ADJ
fumecheng-12767	142	11	-	-	PUNCT
fumecheng-12767	142	12	related	relate	VERB
fumecheng-12767	142	13	peak	peak	NOUN
fumecheng-12767	142	14	,	,	PUNCT
fumecheng-12767	142	15	which	which	PRON
fumecheng-12767	142	16	was	be	AUX
fumecheng-12767	142	17	absent	absent	ADJ
fumecheng-12767	142	18	in	in	ADP
fumecheng-12767	142	19	bnnss	bnns	NOUN
fumecheng-12767	142	20	but	but	CCONJ
fumecheng-12767	142	21	appeared	appear	VERB
fumecheng-12767	142	22	in	in	ADP
fumecheng-12767	142	23	bnnss	bnns	NOUN
fumecheng-12767	142	24	-	-	PUNCT
fumecheng-12767	142	25	aptes	apte	NOUN
fumecheng-12767	142	26	,	,	PUNCT
fumecheng-12767	142	27	further	far	ADV
fumecheng-12767	142	28	confirming	confirm	VERB
fumecheng-12767	142	29	the	the	DET
fumecheng-12767	142	30	presence	presence	NOUN
fumecheng-12767	142	31	of	of	ADP
fumecheng-12767	142	32	aptes	apte	NOUN
fumecheng-12767	142	33	on	on	ADP
fumecheng-12767	142	34	the	the	DET
fumecheng-12767	142	35	bnnss	bnns	NOUN
fumecheng-12767	142	36	surface	surface	NOUN
fumecheng-12767	142	37	[	[	X
fumecheng-12767	142	38	28	28	NUM
fumecheng-12767	142	39	,	,	PUNCT
fumecheng-12767	142	40	29	29	NUM
fumecheng-12767	142	41	]	]	PUNCT
fumecheng-12767	142	42	.	.	PUNCT
fumecheng-12767	143	1	this	this	PRON
fumecheng-12767	143	2	demonstrates	demonstrate	VERB
fumecheng-12767	143	3	that	that	PRON
fumecheng-12767	143	4	aptes	apte	NOUN
fumecheng-12767	143	5	effectively	effectively	ADV
fumecheng-12767	143	6	reacted	react	VERB
fumecheng-12767	143	7	with	with	ADP
fumecheng-12767	143	8	the	the	DET
fumecheng-12767	143	9	surface	surface	NOUN
fumecheng-12767	143	10	of	of	ADP
fumecheng-12767	143	11	bnnss	bnns	NOUN
fumecheng-12767	143	12	,	,	PUNCT
fumecheng-12767	143	13	converting	convert	VERB
fumecheng-12767	143	14	the	the	DET
fumecheng-12767	143	15	surface	surface	NOUN
fumecheng-12767	143	16	charge	charge	NOUN
fumecheng-12767	143	17	from	from	ADP
fumecheng-12767	143	18	negative	negative	ADJ
fumecheng-12767	143	19	to	to	ADP
fumecheng-12767	143	20	positive	positive	ADJ
fumecheng-12767	143	21	.	.	PUNCT
fumecheng-12767	144	1	the	the	DET
fumecheng-12767	144	2	fe	fe	ADJ
fumecheng-12767	144	3	-	-	ADJ
fumecheng-12767	144	4	sem	sem	ADJ
fumecheng-12767	144	5	image	image	NOUN
fumecheng-12767	144	6	(	(	PUNCT
fumecheng-12767	144	7	fig	fig	NOUN
fumecheng-12767	144	8	.	.	PUNCT
fumecheng-12767	144	9	4(d	4(d	NUM
fumecheng-12767	144	10	)	)	PUNCT
fumecheng-12767	144	11	)	)	PUNCT
fumecheng-12767	144	12	also	also	ADV
fumecheng-12767	144	13	shows	show	VERB
fumecheng-12767	144	14	the	the	DET
fumecheng-12767	144	15	well	well	ADV
fumecheng-12767	144	16	-	-	PUNCT
fumecheng-12767	144	17	exfoliated	exfoliate	VERB
fumecheng-12767	144	18	appearance	appearance	NOUN
fumecheng-12767	144	19	of	of	ADP
fumecheng-12767	144	20	bnnss	bnns	NOUN
fumecheng-12767	144	21	-	-	PUNCT
fumecheng-12767	144	22	aptes	apte	NOUN
fumecheng-12767	144	23	,	,	PUNCT
fumecheng-12767	144	24	confirming	confirm	VERB
fumecheng-12767	144	25	successful	successful	ADJ
fumecheng-12767	144	26	exfoliation	exfoliation	NOUN
fumecheng-12767	144	27	.	.	PUNCT
fumecheng-12767	145	1	fig	fig	NOUN
fumecheng-12767	145	2	.	.	PUNCT
fumecheng-12767	146	1	4	4	NUM
fumecheng-12767	146	2	characterization	characterization	NOUN
fumecheng-12767	146	3	of	of	ADP
fumecheng-12767	146	4	boron	boron	NOUN
fumecheng-12767	146	5	nitride	nitride	NOUN
fumecheng-12767	146	6	nanosheets	nanosheet	NOUN
fumecheng-12767	146	7	(	(	PUNCT
fumecheng-12767	146	8	bnnss	bnns	NOUN
fumecheng-12767	146	9	)	)	PUNCT
fumecheng-12767	146	10	and	and	CCONJ
fumecheng-12767	146	11	bnnss	bnns	NOUN
fumecheng-12767	146	12	-	-	PUNCT
fumecheng-12767	146	13	aptes	apte	NOUN
fumecheng-12767	146	14	:	:	PUNCT
fumecheng-12767	146	15	(	(	PUNCT
fumecheng-12767	146	16	a	a	X
fumecheng-12767	146	17	)	)	PUNCT
fumecheng-12767	146	18	zeta	zeta	NOUN
fumecheng-12767	146	19	potential	potential	ADJ
fumecheng-12767	146	20	measurements	measurement	NOUN
fumecheng-12767	146	21	,	,	PUNCT
fumecheng-12767	146	22	(	(	PUNCT
fumecheng-12767	146	23	b	b	X
fumecheng-12767	146	24	)	)	PUNCT
fumecheng-12767	146	25	xps	xps	NOUN
fumecheng-12767	146	26	analysis	analysis	NOUN
fumecheng-12767	146	27	,	,	PUNCT
fumecheng-12767	146	28	(	(	PUNCT
fumecheng-12767	146	29	c	c	NOUN
fumecheng-12767	146	30	)	)	PUNCT
fumecheng-12767	146	31	ft	ft	PROPN
fumecheng-12767	146	32	-	-	PUNCT
fumecheng-12767	146	33	ir	ir	NOUN
fumecheng-12767	146	34	analysis	analysis	NOUN
fumecheng-12767	146	35	,	,	PUNCT
fumecheng-12767	146	36	and	and	CCONJ
fumecheng-12767	146	37	(	(	PUNCT
fumecheng-12767	146	38	d	d	NOUN
fumecheng-12767	146	39	)	)	PUNCT
fumecheng-12767	146	40	fe	fe	ADJ
fumecheng-12767	146	41	-	-	PUNCT
fumecheng-12767	146	42	sem	sem	ADJ
fumecheng-12767	146	43	image	image	NOUN
fumecheng-12767	146	44	in	in	ADP
fumecheng-12767	146	45	this	this	DET
fumecheng-12767	146	46	study	study	NOUN
fumecheng-12767	146	47	,	,	PUNCT
fumecheng-12767	146	48	the	the	DET
fumecheng-12767	146	49	surface	surface	NOUN
fumecheng-12767	146	50	charge	charge	NOUN
fumecheng-12767	146	51	of	of	ADP
fumecheng-12767	146	52	materials	material	NOUN
fumecheng-12767	146	53	was	be	AUX
fumecheng-12767	146	54	adjusted	adjust	VERB
fumecheng-12767	146	55	through	through	ADP
fumecheng-12767	146	56	surface	surface	NOUN
fumecheng-12767	146	57	modification	modification	NOUN
fumecheng-12767	146	58	for	for	ADP
fumecheng-12767	146	59	use	use	NOUN
fumecheng-12767	146	60	in	in	ADP
fumecheng-12767	146	61	the	the	DET
fumecheng-12767	146	62	self	self	NOUN
fumecheng-12767	146	63	-	-	PUNCT
fumecheng-12767	146	64	assembly	assembly	NOUN
fumecheng-12767	146	65	method	method	NOUN
fumecheng-12767	146	66	.	.	PUNCT
fumecheng-12767	147	1	the	the	DET
fumecheng-12767	147	2	adjusted	adjust	VERB
fumecheng-12767	147	3	surface	surface	NOUN
fumecheng-12767	147	4	charge	charge	NOUN
fumecheng-12767	147	5	was	be	AUX
fumecheng-12767	147	6	confirmed	confirm	VERB
fumecheng-12767	147	7	by	by	ADP
fumecheng-12767	147	8	zeta	zeta	NOUN
fumecheng-12767	147	9	potential	potential	ADJ
fumecheng-12767	147	10	measurements	measurement	NOUN
fumecheng-12767	147	11	,	,	PUNCT
fumecheng-12767	147	12	as	as	SCONJ
fumecheng-12767	147	13	shown	show	VERB
fumecheng-12767	147	14	in	in	ADP
fumecheng-12767	147	15	fig	fig	NOUN
fumecheng-12767	147	16	.	.	PUNCT
fumecheng-12767	148	1	5(a	5(a	NUM
fumecheng-12767	148	2	)	)	PUNCT
fumecheng-12767	148	3	.	.	PUNCT
fumecheng-12767	149	1	the	the	DET
fumecheng-12767	149	2	zeta	zeta	PROPN
fumecheng-12767	149	3	potential	potential	NOUN
fumecheng-12767	149	4	of	of	ADP
fumecheng-12767	149	5	ps	ps	PROPN
fumecheng-12767	149	6	was	be	AUX
fumecheng-12767	149	7	measured	measure	VERB
fumecheng-12767	149	8	at	at	ADP
fumecheng-12767	149	9	+26.5	+26.5	PROPN
fumecheng-12767	149	10	mv	mv	PROPN
fumecheng-12767	149	11	,	,	PUNCT
fumecheng-12767	149	12	while	while	SCONJ
fumecheng-12767	149	13	mxene	mxene	NOUN
fumecheng-12767	149	14	exhibited	exhibit	VERB
fumecheng-12767	149	15	a	a	DET
fumecheng-12767	149	16	negative	negative	ADJ
fumecheng-12767	149	17	charge	charge	NOUN
fumecheng-12767	149	18	of	of	ADP
fumecheng-12767	149	19	-52.26	-52.26	ADJ
fumecheng-12767	149	20	mv	mv	PROPN
fumecheng-12767	149	21	.	.	PROPN
fumecheng-12767	149	22	bnnss	bnns	NOUN
fumecheng-12767	149	23	-	-	PUNCT
fumecheng-12767	149	24	aptes	apte	NOUN
fumecheng-12767	149	25	had	have	VERB
fumecheng-12767	149	26	a	a	DET
fumecheng-12767	149	27	positive	positive	ADJ
fumecheng-12767	149	28	charge	charge	NOUN
fumecheng-12767	149	29	of	of	ADP
fumecheng-12767	149	30	+37.1	+37.1	PROPN
fumecheng-12767	149	31	mv	mv	PROPN
fumecheng-12767	149	32	.	.	PUNCT
fumecheng-12767	150	1	these	these	DET
fumecheng-12767	150	2	surface	surface	NOUN
fumecheng-12767	150	3	charges	charge	NOUN
fumecheng-12767	150	4	facilitated	facilitate	VERB
fumecheng-12767	150	5	the	the	DET
fumecheng-12767	150	6	subsequent	subsequent	ADJ
fumecheng-12767	150	7	reactions	reaction	NOUN
fumecheng-12767	150	8	.	.	PUNCT
fumecheng-12767	151	1	initially	initially	ADV
fumecheng-12767	151	2	,	,	PUNCT
fumecheng-12767	151	3	ps	ps	PROPN
fumecheng-12767	151	4	and	and	CCONJ
fumecheng-12767	151	5	mxene	mxene	NOUN
fumecheng-12767	151	6	were	be	AUX
fumecheng-12767	151	7	reacted	react	VERB
fumecheng-12767	151	8	together	together	ADV
fumecheng-12767	151	9	,	,	PUNCT
fumecheng-12767	151	10	with	with	ADP
fumecheng-12767	151	11	sufficient	sufficient	ADJ
fumecheng-12767	151	12	mxene	mxene	NOUN
fumecheng-12767	151	13	added	add	VERB
fumecheng-12767	151	14	to	to	PART
fumecheng-12767	151	15	ensure	ensure	VERB
fumecheng-12767	151	16	a	a	DET
fumecheng-12767	151	17	mechanically	mechanically	ADV
fumecheng-12767	151	18	pressed	press	VERB
fumecheng-12767	151	19	polymer	polymer	NOUN
fumecheng-12767	151	20	-	-	PUNCT
fumecheng-12767	151	21	matrix	matrix	NOUN
fumecheng-12767	151	22	composites	composite	NOUN
fumecheng-12767	151	23	with	with	ADP
fumecheng-12767	151	24	3d	3d	NUM
fumecheng-12767	151	25	structured	structured	ADJ
fumecheng-12767	151	26	filler	filler	NOUN
fumecheng-12767	151	27	networks	network	NOUN
fumecheng-12767	151	28	...	...	PUNCT
fumecheng-12767	151	29	609	609	NUM
fumecheng-12767	151	30	significant	significant	ADJ
fumecheng-12767	151	31	negative	negative	ADJ
fumecheng-12767	151	32	charge	charge	NOUN
fumecheng-12767	151	33	for	for	ADP
fumecheng-12767	151	34	further	further	ADJ
fumecheng-12767	151	35	reaction	reaction	NOUN
fumecheng-12767	151	36	with	with	ADP
fumecheng-12767	151	37	bnnss	bnns	NOUN
fumecheng-12767	151	38	-	-	PUNCT
fumecheng-12767	151	39	aptes	apte	NOUN
fumecheng-12767	151	40	.	.	PUNCT
fumecheng-12767	152	1	the	the	DET
fumecheng-12767	152	2	zeta	zeta	PROPN
fumecheng-12767	152	3	potential	potential	NOUN
fumecheng-12767	152	4	of	of	ADP
fumecheng-12767	152	5	ps@mxene	ps@mxene	NOUN
fumecheng-12767	152	6	,	,	PUNCT
fumecheng-12767	152	7	depending	depend	VERB
fumecheng-12767	152	8	on	on	ADP
fumecheng-12767	152	9	the	the	DET
fumecheng-12767	152	10	mxene	mxene	NOUN
fumecheng-12767	152	11	concentration	concentration	NOUN
fumecheng-12767	152	12	,	,	PUNCT
fumecheng-12767	152	13	is	be	AUX
fumecheng-12767	152	14	depicted	depict	VERB
fumecheng-12767	152	15	in	in	ADP
fumecheng-12767	152	16	fig	fig	NOUN
fumecheng-12767	152	17	.	.	PUNCT
fumecheng-12767	153	1	5(b	5(b	NUM
fumecheng-12767	153	2	)	)	PUNCT
fumecheng-12767	153	3	.	.	PUNCT
fumecheng-12767	154	1	the	the	DET
fumecheng-12767	154	2	zeta	zeta	PROPN
fumecheng-12767	154	3	potential	potential	NOUN
fumecheng-12767	154	4	gradually	gradually	ADV
fumecheng-12767	154	5	decreased	decrease	VERB
fumecheng-12767	154	6	with	with	ADP
fumecheng-12767	154	7	an	an	DET
fumecheng-12767	154	8	increase	increase	NOUN
fumecheng-12767	154	9	in	in	ADP
fumecheng-12767	154	10	the	the	DET
fumecheng-12767	154	11	mxene	mxene	NOUN
fumecheng-12767	154	12	content	content	NOUN
fumecheng-12767	154	13	,	,	PUNCT
fumecheng-12767	154	14	indicating	indicate	VERB
fumecheng-12767	154	15	the	the	DET
fumecheng-12767	154	16	effect	effect	NOUN
fumecheng-12767	154	17	of	of	ADP
fumecheng-12767	154	18	mxene	mxene	NOUN
fumecheng-12767	154	19	on	on	ADP
fumecheng-12767	154	20	the	the	DET
fumecheng-12767	154	21	particle	particle	NOUN
fumecheng-12767	154	22	surface	surface	NOUN
fumecheng-12767	154	23	.	.	PUNCT
fumecheng-12767	155	1	the	the	DET
fumecheng-12767	155	2	zeta	zeta	PROPN
fumecheng-12767	155	3	potential	potential	NOUN
fumecheng-12767	155	4	saturated	saturate	VERB
fumecheng-12767	155	5	around	around	ADP
fumecheng-12767	155	6	10	10	NUM
fumecheng-12767	155	7	wt%	wt%	ADJ
fumecheng-12767	155	8	mxene	mxene	NOUN
fumecheng-12767	155	9	.	.	PUNCT
fumecheng-12767	156	1	ps@mxene	ps@mxene	NOUN
fumecheng-12767	156	2	containing	contain	VERB
fumecheng-12767	156	3	10	10	NUM
fumecheng-12767	156	4	wt%	wt%	ADJ
fumecheng-12767	156	5	mxene	mxene	NOUN
fumecheng-12767	156	6	was	be	AUX
fumecheng-12767	156	7	then	then	ADV
fumecheng-12767	156	8	used	use	VERB
fumecheng-12767	156	9	for	for	ADP
fumecheng-12767	156	10	further	further	ADJ
fumecheng-12767	156	11	modification	modification	NOUN
fumecheng-12767	156	12	.	.	PUNCT
fumecheng-12767	157	1	the	the	DET
fumecheng-12767	157	2	morphology	morphology	NOUN
fumecheng-12767	157	3	of	of	ADP
fumecheng-12767	157	4	ps@mxene	ps@mxene	NOUN
fumecheng-12767	157	5	with	with	ADP
fumecheng-12767	157	6	10	10	NUM
fumecheng-12767	157	7	wt%	wt%	ADJ
fumecheng-12767	157	8	mxene	mxene	NOUN
fumecheng-12767	157	9	is	be	AUX
fumecheng-12767	157	10	shown	show	VERB
fumecheng-12767	157	11	in	in	ADP
fumecheng-12767	157	12	fig	fig	NOUN
fumecheng-12767	157	13	.	.	PUNCT
fumecheng-12767	158	1	5(c	5(c	NUM
fumecheng-12767	158	2	)	)	PUNCT
fumecheng-12767	158	3	.	.	PUNCT
fumecheng-12767	159	1	the	the	DET
fumecheng-12767	159	2	image	image	NOUN
fumecheng-12767	159	3	reveals	reveal	VERB
fumecheng-12767	159	4	that	that	SCONJ
fumecheng-12767	159	5	the	the	DET
fumecheng-12767	159	6	smooth	smooth	ADJ
fumecheng-12767	159	7	surface	surface	NOUN
fumecheng-12767	159	8	of	of	ADP
fumecheng-12767	159	9	ps	ps	PROPN
fumecheng-12767	159	10	was	be	AUX
fumecheng-12767	159	11	uniformly	uniformly	ADV
fumecheng-12767	159	12	covered	cover	VERB
fumecheng-12767	159	13	by	by	ADP
fumecheng-12767	159	14	thin	thin	ADJ
fumecheng-12767	159	15	mxene	mxene	NOUN
fumecheng-12767	159	16	flakes	flake	NOUN
fumecheng-12767	159	17	,	,	PUNCT
fumecheng-12767	159	18	resulting	result	VERB
fumecheng-12767	159	19	in	in	ADP
fumecheng-12767	159	20	a	a	DET
fumecheng-12767	159	21	negative	negative	ADJ
fumecheng-12767	159	22	surface	surface	NOUN
fumecheng-12767	159	23	charge	charge	NOUN
fumecheng-12767	159	24	.	.	PUNCT
fumecheng-12767	160	1	after	after	ADP
fumecheng-12767	160	2	reacting	react	VERB
fumecheng-12767	160	3	with	with	ADP
fumecheng-12767	160	4	bnnss	bnns	NOUN
fumecheng-12767	160	5	-	-	PUNCT
fumecheng-12767	160	6	aptes	apte	NOUN
fumecheng-12767	160	7	,	,	PUNCT
fumecheng-12767	160	8	the	the	DET
fumecheng-12767	160	9	morphology	morphology	NOUN
fumecheng-12767	160	10	is	be	AUX
fumecheng-12767	160	11	shown	show	VERB
fumecheng-12767	160	12	in	in	ADP
fumecheng-12767	160	13	fig	fig	NOUN
fumecheng-12767	160	14	.	.	PUNCT
fumecheng-12767	161	1	5(d	5(d	NUM
fumecheng-12767	161	2	)	)	PUNCT
fumecheng-12767	161	3	.	.	PUNCT
fumecheng-12767	162	1	bnnss	bnns	NOUN
fumecheng-12767	162	2	-	-	PUNCT
fumecheng-12767	162	3	aptes	apte	NOUN
fumecheng-12767	162	4	was	be	AUX
fumecheng-12767	162	5	added	add	VERB
fumecheng-12767	162	6	at	at	ADP
fumecheng-12767	162	7	five	five	NUM
fumecheng-12767	162	8	times	time	NOUN
fumecheng-12767	162	9	the	the	DET
fumecheng-12767	162	10	amount	amount	NOUN
fumecheng-12767	162	11	of	of	ADP
fumecheng-12767	162	12	mxene	mxene	NOUN
fumecheng-12767	162	13	to	to	PART
fumecheng-12767	162	14	ensure	ensure	VERB
fumecheng-12767	162	15	complete	complete	ADJ
fumecheng-12767	162	16	coverage	coverage	NOUN
fumecheng-12767	162	17	of	of	ADP
fumecheng-12767	162	18	ps@mxene	ps@mxene	NOUN
fumecheng-12767	162	19	.	.	PUNCT
fumecheng-12767	163	1	the	the	DET
fumecheng-12767	163	2	final	final	ADJ
fumecheng-12767	163	3	microspheres	microsphere	NOUN
fumecheng-12767	163	4	,	,	PUNCT
fumecheng-12767	163	5	ps@mxene@bnnss	ps@mxene@bnnss	NOUN
fumecheng-12767	163	6	-	-	PUNCT
fumecheng-12767	163	7	aptes	apte	NOUN
fumecheng-12767	163	8	,	,	PUNCT
fumecheng-12767	163	9	show	show	VERB
fumecheng-12767	163	10	bnnss	bnns	NOUN
fumecheng-12767	163	11	-	-	PUNCT
fumecheng-12767	163	12	aptes	apte	NOUN
fumecheng-12767	163	13	uniformly	uniformly	ADV
fumecheng-12767	163	14	covering	cover	VERB
fumecheng-12767	163	15	the	the	DET
fumecheng-12767	163	16	negative	negative	ADV
fumecheng-12767	163	17	-	-	PUNCT
fumecheng-12767	163	18	charged	charge	VERB
fumecheng-12767	163	19	ps@mxene	ps@mxene	NOUN
fumecheng-12767	163	20	particles	particle	NOUN
fumecheng-12767	163	21	.	.	PUNCT
fumecheng-12767	164	1	these	these	DET
fumecheng-12767	164	2	results	result	NOUN
fumecheng-12767	164	3	demonstrate	demonstrate	VERB
fumecheng-12767	164	4	that	that	SCONJ
fumecheng-12767	164	5	surface	surface	NOUN
fumecheng-12767	164	6	charge	charge	NOUN
fumecheng-12767	164	7	modification	modification	NOUN
fumecheng-12767	164	8	enabled	enable	VERB
fumecheng-12767	164	9	straightforward	straightforward	ADJ
fumecheng-12767	164	10	coating	coating	NOUN
fumecheng-12767	164	11	processes	process	NOUN
fumecheng-12767	164	12	using	use	VERB
fumecheng-12767	164	13	surface	surface	NOUN
fumecheng-12767	164	14	charge	charge	NOUN
fumecheng-12767	164	15	-	-	PUNCT
fumecheng-12767	164	16	driven	drive	VERB
fumecheng-12767	164	17	reactions	reaction	NOUN
fumecheng-12767	164	18	.	.	PUNCT
fumecheng-12767	165	1	this	this	DET
fumecheng-12767	165	2	approach	approach	NOUN
fumecheng-12767	165	3	offers	offer	VERB
fumecheng-12767	165	4	a	a	DET
fumecheng-12767	165	5	simple	simple	ADJ
fumecheng-12767	165	6	and	and	CCONJ
fumecheng-12767	165	7	effective	effective	ADJ
fumecheng-12767	165	8	method	method	NOUN
fumecheng-12767	165	9	for	for	ADP
fumecheng-12767	165	10	coating	coat	VERB
fumecheng-12767	165	11	materials	material	NOUN
fumecheng-12767	165	12	through	through	ADP
fumecheng-12767	165	13	self	self	NOUN
fumecheng-12767	165	14	-	-	PUNCT
fumecheng-12767	165	15	assembly	assembly	NOUN
fumecheng-12767	165	16	.	.	PUNCT
fumecheng-12767	166	1	fig	fig	NOUN
fumecheng-12767	166	2	.	.	PUNCT
fumecheng-12767	167	1	5	5	NUM
fumecheng-12767	167	2	(	(	PUNCT
fumecheng-12767	167	3	a	a	X
fumecheng-12767	167	4	)	)	PUNCT
fumecheng-12767	167	5	zeta	zeta	NOUN
fumecheng-12767	167	6	potential	potential	NOUN
fumecheng-12767	167	7	of	of	ADP
fumecheng-12767	167	8	the	the	DET
fumecheng-12767	167	9	charged	charge	VERB
fumecheng-12767	167	10	ps	ps	NOUN
fumecheng-12767	167	11	,	,	PUNCT
fumecheng-12767	167	12	ti3c2tx	ti3c2tx	NOUN
fumecheng-12767	167	13	mxene	mxene	NOUN
fumecheng-12767	167	14	,	,	PUNCT
fumecheng-12767	167	15	and	and	CCONJ
fumecheng-12767	167	16	bnnss	bnns	NOUN
fumecheng-12767	167	17	-	-	PUNCT
fumecheng-12767	167	18	aptes	apte	NOUN
fumecheng-12767	167	19	;	;	PUNCT
fumecheng-12767	167	20	(	(	PUNCT
fumecheng-12767	167	21	b	b	X
fumecheng-12767	167	22	)	)	PUNCT
fumecheng-12767	167	23	zeta	zeta	NOUN
fumecheng-12767	167	24	potential	potential	NOUN
fumecheng-12767	167	25	of	of	ADP
fumecheng-12767	167	26	ps@mxene	ps@mxene	NOUN
fumecheng-12767	167	27	as	as	ADP
fumecheng-12767	167	28	contents	content	NOUN
fumecheng-12767	167	29	of	of	ADP
fumecheng-12767	167	30	mxene	mxene	NOUN
fumecheng-12767	167	31	;	;	PUNCT
fumecheng-12767	167	32	(	(	PUNCT
fumecheng-12767	167	33	c	c	X
fumecheng-12767	167	34	)	)	PUNCT
fumecheng-12767	167	35	fe	fe	ADJ
fumecheng-12767	167	36	-	-	PUNCT
fumecheng-12767	167	37	sem	sem	ADJ
fumecheng-12767	167	38	image	image	NOUN
fumecheng-12767	167	39	of	of	ADP
fumecheng-12767	167	40	ps@mxene	ps@mxene	NOUN
fumecheng-12767	167	41	;	;	PUNCT
fumecheng-12767	167	42	and	and	CCONJ
fumecheng-12767	167	43	(	(	PUNCT
fumecheng-12767	167	44	d	d	NOUN
fumecheng-12767	167	45	)	)	PUNCT
fumecheng-12767	167	46	fe	fe	ADJ
fumecheng-12767	167	47	-	-	PUNCT
fumecheng-12767	167	48	sem	sem	ADJ
fumecheng-12767	167	49	image	image	NOUN
fumecheng-12767	167	50	of	of	ADP
fumecheng-12767	167	51	ps@mxene@bnnss	ps@mxene@bnns	NOUN
fumecheng-12767	167	52	-	-	PUNCT
fumecheng-12767	167	53	aptes	apte	NOUN
fumecheng-12767	167	54	the	the	DET
fumecheng-12767	167	55	initial	initial	ADJ
fumecheng-12767	167	56	electromagnetic	electromagnetic	ADJ
fumecheng-12767	167	57	wave	wave	NOUN
fumecheng-12767	167	58	undergoes	undergo	VERB
fumecheng-12767	167	59	intensity	intensity	NOUN
fumecheng-12767	167	60	modulation	modulation	NOUN
fumecheng-12767	167	61	through	through	ADP
fumecheng-12767	167	62	various	various	ADJ
fumecheng-12767	167	63	mechanisms	mechanism	NOUN
fumecheng-12767	167	64	when	when	SCONJ
fumecheng-12767	167	65	it	it	PRON
fumecheng-12767	167	66	encounters	encounter	VERB
fumecheng-12767	167	67	the	the	DET
fumecheng-12767	167	68	surface	surface	NOUN
fumecheng-12767	167	69	and	and	CCONJ
fumecheng-12767	167	70	interior	interior	NOUN
fumecheng-12767	167	71	of	of	ADP
fumecheng-12767	167	72	a	a	DET
fumecheng-12767	167	73	shield	shield	NOUN
fumecheng-12767	167	74	.	.	PUNCT
fumecheng-12767	168	1	this	this	DET
fumecheng-12767	168	2	phenomenon	phenomenon	NOUN
fumecheng-12767	168	3	arises	arise	VERB
fumecheng-12767	168	4	due	due	ADP
fumecheng-12767	168	5	to	to	ADP
fumecheng-12767	168	6	the	the	DET
fumecheng-12767	168	7	impedance	impedance	NOUN
fumecheng-12767	168	8	and	and	CCONJ
fumecheng-12767	168	9	refractive	refractive	ADJ
fumecheng-12767	168	10	index	index	NOUN
fumecheng-12767	168	11	difference	difference	NOUN
fumecheng-12767	168	12	between	between	ADP
fumecheng-12767	168	13	the	the	DET
fumecheng-12767	168	14	air	air	NOUN
fumecheng-12767	168	15	and	and	CCONJ
fumecheng-12767	168	16	the	the	DET
fumecheng-12767	168	17	shield	shield	NOUN
fumecheng-12767	168	18	material	material	NOUN
fumecheng-12767	168	19	.	.	PUNCT
fumecheng-12767	169	1	as	as	SCONJ
fumecheng-12767	169	2	these	these	DET
fumecheng-12767	169	3	electromagnetic	electromagnetic	ADJ
fumecheng-12767	169	4	waves	wave	NOUN
fumecheng-12767	169	5	pass	pass	VERB
fumecheng-12767	169	6	through	through	ADP
fumecheng-12767	169	7	the	the	DET
fumecheng-12767	169	8	shield	shield	NOUN
fumecheng-12767	169	9	,	,	PUNCT
fumecheng-12767	169	10	they	they	PRON
fumecheng-12767	169	11	are	be	AUX
fumecheng-12767	169	12	attenuated	attenuate	VERB
fumecheng-12767	169	13	,	,	PUNCT
fumecheng-12767	169	14	leading	lead	VERB
fumecheng-12767	169	15	to	to	ADP
fumecheng-12767	169	16	a	a	DET
fumecheng-12767	169	17	decrease	decrease	NOUN
fumecheng-12767	169	18	in	in	ADP
fumecheng-12767	169	19	intensity	intensity	NOUN
fumecheng-12767	169	20	.	.	PUNCT
fumecheng-12767	170	1	the	the	DET
fumecheng-12767	170	2	impedance	impedance	NOUN
fumecheng-12767	170	3	difference	difference	NOUN
fumecheng-12767	170	4	on	on	ADP
fumecheng-12767	170	5	the	the	DET
fumecheng-12767	170	6	shield	shield	NOUN
fumecheng-12767	170	7	’s	’s	PART
fumecheng-12767	170	8	front	front	NOUN
fumecheng-12767	170	9	and	and	CCONJ
fumecheng-12767	170	10	back	back	ADV
fumecheng-12767	170	11	610	610	NUM
fumecheng-12767	170	12	c.	c.	NOUN
fumecheng-12767	170	13	choi	choi	NOUN
fumecheng-12767	170	14	,	,	PUNCT
fumecheng-12767	170	15	n.	n.	PROPN
fumecheng-12767	170	16	qaiser	qaiser	PROPN
fumecheng-12767	170	17	,	,	PUNCT
fumecheng-12767	170	18	b.	b.	PROPN
fumecheng-12767	170	19	hwang	hwang	PROPN
fumecheng-12767	170	20	surfaces	surfaces	PROPN
fumecheng-12767	170	21	induces	induce	VERB
fumecheng-12767	170	22	the	the	DET
fumecheng-12767	170	23	reflection	reflection	NOUN
fumecheng-12767	170	24	of	of	ADP
fumecheng-12767	170	25	electromagnetic	electromagnetic	ADJ
fumecheng-12767	170	26	waves	wave	NOUN
fumecheng-12767	170	27	.	.	PUNCT
fumecheng-12767	171	1	the	the	DET
fumecheng-12767	171	2	degree	degree	NOUN
fumecheng-12767	171	3	to	to	PART
fumecheng-12767	171	4	which	which	PRON
fumecheng-12767	171	5	the	the	DET
fumecheng-12767	171	6	shield	shield	NOUN
fumecheng-12767	171	7	blocks	block	NOUN
fumecheng-12767	171	8	and	and	CCONJ
fumecheng-12767	171	9	reduces	reduce	VERB
fumecheng-12767	171	10	the	the	DET
fumecheng-12767	171	11	initial	initial	ADJ
fumecheng-12767	171	12	electromagnetic	electromagnetic	ADJ
fumecheng-12767	171	13	wave	wave	NOUN
fumecheng-12767	171	14	is	be	AUX
fumecheng-12767	171	15	defined	define	VERB
fumecheng-12767	171	16	as	as	ADP
fumecheng-12767	171	17	emi	emi	PROPN
fumecheng-12767	171	18	se	se	X
fumecheng-12767	171	19	(	(	PUNCT
fumecheng-12767	171	20	set	set	PROPN
fumecheng-12767	171	21	)	)	PUNCT
fumecheng-12767	171	22	,	,	PUNCT
fumecheng-12767	171	23	which	which	PRON
fumecheng-12767	171	24	is	be	AUX
fumecheng-12767	171	25	expressed	express	VERB
fumecheng-12767	171	26	in	in	ADP
fumecheng-12767	171	27	logarithmic	logarithmic	ADJ
fumecheng-12767	171	28	scale	scale	NOUN
fumecheng-12767	171	29	units	unit	NOUN
fumecheng-12767	171	30	and	and	CCONJ
fumecheng-12767	171	31	represents	represent	VERB
fumecheng-12767	171	32	the	the	DET
fumecheng-12767	171	33	reduction	reduction	NOUN
fumecheng-12767	171	34	in	in	ADP
fumecheng-12767	171	35	intensity	intensity	NOUN
fumecheng-12767	171	36	of	of	ADP
fumecheng-12767	171	37	the	the	DET
fumecheng-12767	171	38	transmitted	transmit	VERB
fumecheng-12767	171	39	electromagnetic	electromagnetic	ADJ
fumecheng-12767	171	40	wave	wave	NOUN
fumecheng-12767	171	41	compared	compare	VERB
fumecheng-12767	171	42	to	to	ADP
fumecheng-12767	171	43	the	the	DET
fumecheng-12767	171	44	initial	initial	ADJ
fumecheng-12767	171	45	wave	wave	NOUN
fumecheng-12767	171	46	.	.	PUNCT
fumecheng-12767	172	1	it	it	PRON
fumecheng-12767	172	2	is	be	AUX
fumecheng-12767	172	3	defined	define	VERB
fumecheng-12767	172	4	as	as	SCONJ
fumecheng-12767	172	5	follows	follow	VERB
fumecheng-12767	172	6	:	:	PUNCT
fumecheng-12767	172	7	𝑆𝐸𝑇	𝑆𝐸𝑇	PROPN
fumecheng-12767	172	8	(	(	PUNCT
fumecheng-12767	172	9	𝑑𝐵	𝑑𝐵	PROPN
fumecheng-12767	172	10	)	)	PUNCT
fumecheng-12767	172	11	=	=	PUNCT
fumecheng-12767	173	1	10	10	NUM
fumecheng-12767	173	2	𝑙𝑜𝑔	𝑙𝑜𝑔	NOUN
fumecheng-12767	173	3	𝑃𝑇	𝑃𝑇	PROPN
fumecheng-12767	173	4	𝑃0	𝑃0	NOUN
fumecheng-12767	173	5	=	=	NOUN
fumecheng-12767	173	6	20	20	NUM
fumecheng-12767	173	7	𝑙𝑜𝑔	𝑙𝑜𝑔	NOUN
fumecheng-12767	173	8	𝐸𝑇	𝐸𝑇	PROPN
fumecheng-12767	173	9	𝐸0	𝐸0	NOUN
fumecheng-12767	173	10	(	(	PUNCT
fumecheng-12767	173	11	1	1	NUM
fumecheng-12767	173	12	)	)	PUNCT
fumecheng-12767	173	13	where	where	SCONJ
fumecheng-12767	173	14	p0	p0	NOUN
fumecheng-12767	173	15	and	and	CCONJ
fumecheng-12767	173	16	e0	e0	PROPN
fumecheng-12767	173	17	are	be	AUX
fumecheng-12767	173	18	the	the	DET
fumecheng-12767	173	19	initial	initial	ADJ
fumecheng-12767	173	20	power	power	NOUN
fumecheng-12767	173	21	density	density	NOUN
fumecheng-12767	173	22	and	and	CCONJ
fumecheng-12767	173	23	electric	electric	ADJ
fumecheng-12767	173	24	field	field	NOUN
fumecheng-12767	173	25	strength	strength	NOUN
fumecheng-12767	173	26	,	,	PUNCT
fumecheng-12767	173	27	respectively	respectively	ADV
fumecheng-12767	173	28	,	,	PUNCT
fumecheng-12767	173	29	and	and	CCONJ
fumecheng-12767	173	30	pt	pt	NOUN
fumecheng-12767	173	31	and	and	CCONJ
fumecheng-12767	173	32	et	et	PROPN
fumecheng-12767	173	33	represent	represent	VERB
fumecheng-12767	173	34	those	those	PRON
fumecheng-12767	173	35	of	of	ADP
fumecheng-12767	173	36	the	the	DET
fumecheng-12767	173	37	transmitted	transmit	VERB
fumecheng-12767	173	38	electromagnetic	electromagnetic	ADJ
fumecheng-12767	173	39	waves	wave	NOUN
fumecheng-12767	173	40	.	.	PUNCT
fumecheng-12767	174	1	according	accord	VERB
fumecheng-12767	174	2	to	to	ADP
fumecheng-12767	174	3	the	the	DET
fumecheng-12767	174	4	schelkunoff	schelkunoff	NOUN
fumecheng-12767	174	5	formula[30	formula[30	NOUN
fumecheng-12767	174	6	]	]	PUNCT
fumecheng-12767	174	7	,	,	PUNCT
fumecheng-12767	174	8	the	the	DET
fumecheng-12767	174	9	emi	emi	PROPN
fumecheng-12767	174	10	se	se	PROPN
fumecheng-12767	174	11	occurs	occur	VERB
fumecheng-12767	174	12	through	through	ADP
fumecheng-12767	174	13	three	three	NUM
fumecheng-12767	174	14	mechanisms	mechanism	NOUN
fumecheng-12767	174	15	:	:	PUNCT
fumecheng-12767	174	16	absorption	absorption	NOUN
fumecheng-12767	174	17	loss	loss	NOUN
fumecheng-12767	174	18	(	(	PUNCT
fumecheng-12767	174	19	sea	sea	NOUN
fumecheng-12767	174	20	)	)	PUNCT
fumecheng-12767	174	21	,	,	PUNCT
fumecheng-12767	174	22	reflection	reflection	NOUN
fumecheng-12767	174	23	loss	loss	NOUN
fumecheng-12767	174	24	(	(	PUNCT
fumecheng-12767	174	25	ser	ser	NOUN
fumecheng-12767	174	26	)	)	PUNCT
fumecheng-12767	174	27	,	,	PUNCT
fumecheng-12767	174	28	and	and	CCONJ
fumecheng-12767	174	29	multiple	multiple	ADJ
fumecheng-12767	174	30	reflection	reflection	NOUN
fumecheng-12767	174	31	loss	loss	NOUN
fumecheng-12767	174	32	(	(	PUNCT
fumecheng-12767	174	33	sem	sem	NOUN
fumecheng-12767	174	34	)	)	PUNCT
fumecheng-12767	175	1	[	[	X
fumecheng-12767	175	2	31	31	NUM
fumecheng-12767	175	3	]	]	PUNCT
fumecheng-12767	175	4	.	.	PUNCT
fumecheng-12767	176	1	𝑆𝐸𝑇	𝑆𝐸𝑇	PROPN
fumecheng-12767	176	2	=	=	SYM
fumecheng-12767	176	3	𝑆𝐸𝐴	𝑆𝐸𝐴	PROPN
fumecheng-12767	176	4	+	+	CCONJ
fumecheng-12767	176	5	𝑆𝐸𝑅	𝑆𝐸𝑅	PROPN
fumecheng-12767	176	6	+	+	CCONJ
fumecheng-12767	176	7	𝑆𝐸𝑀	𝑆𝐸𝑀	PROPN
fumecheng-12767	176	8	(	(	PUNCT
fumecheng-12767	176	9	2	2	NUM
fumecheng-12767	176	10	)	)	PUNCT
fumecheng-12767	176	11	as	as	SCONJ
fumecheng-12767	176	12	the	the	DET
fumecheng-12767	176	13	initial	initial	ADJ
fumecheng-12767	176	14	electromagnetic	electromagnetic	ADJ
fumecheng-12767	176	15	wave	wave	NOUN
fumecheng-12767	176	16	passes	pass	VERB
fumecheng-12767	176	17	through	through	ADP
fumecheng-12767	176	18	the	the	DET
fumecheng-12767	176	19	shield	shield	NOUN
fumecheng-12767	176	20	,	,	PUNCT
fumecheng-12767	176	21	it	it	PRON
fumecheng-12767	176	22	is	be	AUX
fumecheng-12767	176	23	absorbed	absorb	VERB
fumecheng-12767	176	24	according	accord	VERB
fumecheng-12767	176	25	to	to	ADP
fumecheng-12767	176	26	the	the	DET
fumecheng-12767	176	27	attenuation	attenuation	NOUN
fumecheng-12767	176	28	constant	constant	ADJ
fumecheng-12767	176	29	α	α	NOUN
fumecheng-12767	176	30	.	.	PUNCT
fumecheng-12767	177	1	the	the	DET
fumecheng-12767	177	2	strength	strength	NOUN
fumecheng-12767	177	3	of	of	ADP
fumecheng-12767	177	4	the	the	DET
fumecheng-12767	177	5	initial	initial	ADJ
fumecheng-12767	177	6	electromagnetic	electromagnetic	ADJ
fumecheng-12767	177	7	wave	wave	NOUN
fumecheng-12767	177	8	decreases	decrease	VERB
fumecheng-12767	177	9	exponentially	exponentially	ADV
fumecheng-12767	177	10	with	with	ADP
fumecheng-12767	177	11	the	the	DET
fumecheng-12767	177	12	shield	shield	NOUN
fumecheng-12767	177	13	thickness	thickness	NOUN
fumecheng-12767	177	14	d	d	NOUN
fumecheng-12767	177	15	,	,	PUNCT
fumecheng-12767	177	16	according	accord	VERB
fumecheng-12767	177	17	to	to	ADP
fumecheng-12767	177	18	α	α	NUM
fumecheng-12767	177	19	,	,	PUNCT
fumecheng-12767	177	20	and	and	CCONJ
fumecheng-12767	177	21	is	be	AUX
fumecheng-12767	177	22	represented	represent	VERB
fumecheng-12767	177	23	through	through	ADP
fumecheng-12767	177	24	the	the	DET
fumecheng-12767	177	25	following	follow	VERB
fumecheng-12767	177	26	formula	formula	NOUN
fumecheng-12767	177	27	:	:	PUNCT
fumecheng-12767	178	1	𝐸	𝐸	NOUN
fumecheng-12767	178	2	=	=	SYM
fumecheng-12767	178	3	𝐸0𝑒−𝛼𝑑	𝐸0𝑒−𝛼𝑑	PROPN
fumecheng-12767	178	4	(	(	PUNCT
fumecheng-12767	178	5	3	3	X
fumecheng-12767	178	6	)	)	PUNCT
fumecheng-12767	178	7	the	the	DET
fumecheng-12767	178	8	attenuation	attenuation	NOUN
fumecheng-12767	178	9	constant	constant	ADJ
fumecheng-12767	178	10	α	α	PROPN
fumecheng-12767	178	11	is	be	AUX
fumecheng-12767	178	12	defined	define	VERB
fumecheng-12767	178	13	as	as	SCONJ
fumecheng-12767	178	14	follows	follow	VERB
fumecheng-12767	178	15	:	:	PUNCT
fumecheng-12767	178	16	𝛼	𝛼	X
fumecheng-12767	178	17	=	=	X
fumecheng-12767	178	18	𝜔√	𝜔√	PRON
fumecheng-12767	178	19	𝜇	𝜇	ADP
fumecheng-12767	178	20	2	2	NUM
fumecheng-12767	178	21	√1	√1	PROPN
fumecheng-12767	178	22	+	+	CCONJ
fumecheng-12767	178	23	(	(	PUNCT
fumecheng-12767	178	24	𝜎	𝜎	NOUN
fumecheng-12767	178	25	𝜔	𝜔	NOUN
fumecheng-12767	178	26	)	)	PUNCT
fumecheng-12767	178	27	2	2	NUM
fumecheng-12767	178	28	−	−	NOUN
fumecheng-12767	178	29	1	1	NUM
fumecheng-12767	178	30	(	(	PUNCT
fumecheng-12767	178	31	4	4	NUM
fumecheng-12767	178	32	)	)	PUNCT
fumecheng-12767	178	33	where	where	SCONJ
fumecheng-12767	178	34	ω	ω	PROPN
fumecheng-12767	178	35	is	be	AUX
fumecheng-12767	178	36	the	the	DET
fumecheng-12767	178	37	angular	angular	ADJ
fumecheng-12767	178	38	frequency	frequency	NOUN
fumecheng-12767	178	39	,	,	PUNCT
fumecheng-12767	178	40	μ	μ	PROPN
fumecheng-12767	178	41	is	be	AUX
fumecheng-12767	178	42	the	the	DET
fumecheng-12767	178	43	magnetic	magnetic	ADJ
fumecheng-12767	178	44	permeability	permeability	NOUN
fumecheng-12767	178	45	,	,	PUNCT
fumecheng-12767	178	46	ε	ε	PROPN
fumecheng-12767	178	47	is	be	AUX
fumecheng-12767	178	48	the	the	DET
fumecheng-12767	178	49	dielectric	dielectric	ADJ
fumecheng-12767	178	50	permittivity	permittivity	NOUN
fumecheng-12767	178	51	,	,	PUNCT
fumecheng-12767	178	52	and	and	CCONJ
fumecheng-12767	178	53	σ	σ	PROPN
fumecheng-12767	178	54	is	be	AUX
fumecheng-12767	178	55	the	the	DET
fumecheng-12767	178	56	electrical	electrical	ADJ
fumecheng-12767	178	57	conductivity	conductivity	NOUN
fumecheng-12767	178	58	.	.	PUNCT
fumecheng-12767	179	1	for	for	ADP
fumecheng-12767	179	2	effective	effective	ADJ
fumecheng-12767	179	3	absorption	absorption	NOUN
fumecheng-12767	179	4	loss	loss	NOUN
fumecheng-12767	179	5	of	of	ADP
fumecheng-12767	179	6	electromagnetic	electromagnetic	ADJ
fumecheng-12767	179	7	waves	wave	NOUN
fumecheng-12767	179	8	,	,	PUNCT
fumecheng-12767	179	9	the	the	DET
fumecheng-12767	179	10	shield	shield	NOUN
fumecheng-12767	179	11	must	must	AUX
fumecheng-12767	179	12	possess	possess	VERB
fumecheng-12767	179	13	a	a	DET
fumecheng-12767	179	14	high	high	ADJ
fumecheng-12767	179	15	electrical	electrical	ADJ
fumecheng-12767	179	16	conductivity	conductivity	NOUN
fumecheng-12767	179	17	,	,	PUNCT
fumecheng-12767	179	18	large	large	ADJ
fumecheng-12767	179	19	dielectric	dielectric	ADJ
fumecheng-12767	179	20	permittivity	permittivity	NOUN
fumecheng-12767	179	21	,	,	PUNCT
fumecheng-12767	179	22	or	or	CCONJ
fumecheng-12767	179	23	high	high	ADJ
fumecheng-12767	179	24	magnetic	magnetic	ADJ
fumecheng-12767	179	25	permeability	permeability	NOUN
fumecheng-12767	179	26	.	.	PUNCT
fumecheng-12767	180	1	most	most	ADJ
fumecheng-12767	180	2	of	of	ADP
fumecheng-12767	180	3	the	the	DET
fumecheng-12767	180	4	absorbed	absorb	VERB
fumecheng-12767	180	5	electromagnetic	electromagnetic	ADJ
fumecheng-12767	180	6	waves	wave	NOUN
fumecheng-12767	180	7	are	be	AUX
fumecheng-12767	180	8	converted	convert	VERB
fumecheng-12767	180	9	into	into	ADP
fumecheng-12767	180	10	thermal	thermal	ADJ
fumecheng-12767	180	11	energy	energy	NOUN
fumecheng-12767	180	12	.	.	PUNCT
fumecheng-12767	181	1	the	the	DET
fumecheng-12767	181	2	absorption	absorption	NOUN
fumecheng-12767	181	3	loss	loss	NOUN
fumecheng-12767	181	4	sea	sea	NOUN
fumecheng-12767	181	5	is	be	AUX
fumecheng-12767	181	6	defined	define	VERB
fumecheng-12767	181	7	by	by	ADP
fumecheng-12767	181	8	the	the	DET
fumecheng-12767	181	9	skin	skin	NOUN
fumecheng-12767	181	10	depth	depth	NOUN
fumecheng-12767	181	11	δ	δ	PROPN
fumecheng-12767	181	12	and	and	CCONJ
fumecheng-12767	181	13	the	the	DET
fumecheng-12767	181	14	shield	shield	NOUN
fumecheng-12767	181	15	thickness	thickness	NOUN
fumecheng-12767	181	16	d	d	PROPN
fumecheng-12767	181	17	as	as	SCONJ
fumecheng-12767	181	18	follows	follow	VERB
fumecheng-12767	181	19	[	[	X
fumecheng-12767	181	20	32	32	NUM
fumecheng-12767	181	21	]	]	SYM
fumecheng-12767	181	22	:	:	PUNCT
fumecheng-12767	181	23	𝑆𝐸𝐴(𝑑𝐵	𝑆𝐸𝐴(𝑑𝐵	NOUN
fumecheng-12767	181	24	)	)	PUNCT
fumecheng-12767	182	1	=	=	SYM
fumecheng-12767	182	2	20	20	NUM
fumecheng-12767	182	3	log	log	NOUN
fumecheng-12767	182	4	𝑒𝛼𝑑	𝑒𝛼𝑑	VERB
fumecheng-12767	182	5	=	=	SYM
fumecheng-12767	182	6	20	20	NUM
fumecheng-12767	182	7	(	(	PUNCT
fumecheng-12767	182	8	𝑑	𝑑	PROPN
fumecheng-12767	182	9	𝛿	𝛿	ADJ
fumecheng-12767	182	10	)	)	PUNCT
fumecheng-12767	182	11	log10	log10	PROPN
fumecheng-12767	182	12	𝑒	𝑒	PROPN
fumecheng-12767	182	13	(	(	PUNCT
fumecheng-12767	182	14	5	5	NUM
fumecheng-12767	182	15	)	)	PUNCT
fumecheng-12767	182	16	skin	skin	NOUN
fumecheng-12767	182	17	depth	depth	NOUN
fumecheng-12767	182	18	δ	δ	PROPN
fumecheng-12767	182	19	is	be	AUX
fumecheng-12767	182	20	the	the	DET
fumecheng-12767	182	21	distance	distance	NOUN
fumecheng-12767	182	22	through	through	ADP
fumecheng-12767	182	23	which	which	PRON
fumecheng-12767	182	24	the	the	DET
fumecheng-12767	182	25	wave	wave	NOUN
fumecheng-12767	182	26	decreases	decrease	VERB
fumecheng-12767	182	27	to	to	ADP
fumecheng-12767	182	28	e-1	e-1	PROPN
fumecheng-12767	182	29	of	of	ADP
fumecheng-12767	182	30	the	the	DET
fumecheng-12767	182	31	original	original	ADJ
fumecheng-12767	182	32	incident	incident	NOUN
fumecheng-12767	182	33	wave	wave	NOUN
fumecheng-12767	182	34	intensity	intensity	NOUN
fumecheng-12767	182	35	.	.	PUNCT
fumecheng-12767	183	1	reflection	reflection	NOUN
fumecheng-12767	183	2	loss	loss	NOUN
fumecheng-12767	183	3	(	(	PUNCT
fumecheng-12767	183	4	ser	ser	NOUN
fumecheng-12767	183	5	)	)	PUNCT
fumecheng-12767	183	6	occurs	occur	VERB
fumecheng-12767	183	7	at	at	ADP
fumecheng-12767	183	8	the	the	DET
fumecheng-12767	183	9	shield	shield	NOUN
fumecheng-12767	183	10	’s	’s	PART
fumecheng-12767	183	11	surface	surface	NOUN
fumecheng-12767	183	12	due	due	ADP
fumecheng-12767	183	13	to	to	ADP
fumecheng-12767	183	14	the	the	DET
fumecheng-12767	183	15	impedance	impedance	NOUN
fumecheng-12767	183	16	or	or	CCONJ
fumecheng-12767	183	17	refractive	refractive	ADJ
fumecheng-12767	183	18	index	index	NOUN
fumecheng-12767	183	19	difference	difference	NOUN
fumecheng-12767	183	20	between	between	ADP
fumecheng-12767	183	21	the	the	DET
fumecheng-12767	183	22	air	air	NOUN
fumecheng-12767	183	23	and	and	CCONJ
fumecheng-12767	183	24	the	the	DET
fumecheng-12767	183	25	shield	shield	NOUN
fumecheng-12767	183	26	material	material	NOUN
fumecheng-12767	183	27	.	.	PUNCT
fumecheng-12767	184	1	this	this	DET
fumecheng-12767	184	2	loss	loss	NOUN
fumecheng-12767	184	3	can	can	AUX
fumecheng-12767	184	4	be	be	AUX
fumecheng-12767	184	5	expressed	express	VERB
fumecheng-12767	184	6	by	by	ADP
fumecheng-12767	184	7	the	the	DET
fumecheng-12767	184	8	fresnel	fresnel	NOUN
fumecheng-12767	184	9	equation	equation	NOUN
fumecheng-12767	184	10	,	,	PUNCT
fumecheng-12767	184	11	which	which	PRON
fumecheng-12767	184	12	involves	involve	VERB
fumecheng-12767	184	13	electric	electric	ADJ
fumecheng-12767	184	14	conductivity	conductivity	NOUN
fumecheng-12767	184	15	σ	σ	PROPN
fumecheng-12767	184	16	,	,	PUNCT
fumecheng-12767	184	17	frequency	frequency	NOUN
fumecheng-12767	184	18	of	of	ADP
fumecheng-12767	184	19	the	the	DET
fumecheng-12767	184	20	electromagnetic	electromagnetic	ADJ
fumecheng-12767	184	21	wave	wave	NOUN
fumecheng-12767	184	22	f	f	X
fumecheng-12767	184	23	,	,	PUNCT
fumecheng-12767	184	24	and	and	CCONJ
fumecheng-12767	184	25	magnetic	magnetic	ADJ
fumecheng-12767	184	26	permeability	permeability	NOUN
fumecheng-12767	184	27	μ	μ	PROPN
fumecheng-12767	184	28	.	.	PUNCT
fumecheng-12767	185	1	𝑆𝐸𝑅	𝑆𝐸𝑅	PROPN
fumecheng-12767	185	2	(	(	PUNCT
fumecheng-12767	185	3	𝑑𝐵	𝑑𝐵	PROPN
fumecheng-12767	185	4	)	)	PUNCT
fumecheng-12767	185	5	=	=	SYM
fumecheng-12767	185	6	20	20	NUM
fumecheng-12767	185	7	log	log	NOUN
fumecheng-12767	185	8	(	(	PUNCT
fumecheng-12767	185	9	𝜂+𝜂0)2	𝜂+𝜂0)2	NOUN
fumecheng-12767	185	10	4𝜂𝜂0	4𝜂𝜂0	NUM
fumecheng-12767	185	11	=	=	PUNCT
fumecheng-12767	186	1	39.5	39.5	NUM
fumecheng-12767	186	2	+	+	CCONJ
fumecheng-12767	186	3	10	10	NUM
fumecheng-12767	186	4	log	log	NOUN
fumecheng-12767	186	5	𝜎	𝜎	PROPN
fumecheng-12767	186	6	2𝜋𝑓𝜇	2𝜋𝑓𝜇	PROPN
fumecheng-12767	186	7	(	(	PUNCT
fumecheng-12767	186	8	6	6	NUM
fumecheng-12767	186	9	)	)	PUNCT
fumecheng-12767	186	10	where	where	SCONJ
fumecheng-12767	186	11	η	η	PROPN
fumecheng-12767	186	12	and	and	CCONJ
fumecheng-12767	186	13	η0	η0	NOUN
fumecheng-12767	186	14	represent	represent	VERB
fumecheng-12767	186	15	the	the	DET
fumecheng-12767	186	16	impedances	impedance	NOUN
fumecheng-12767	186	17	of	of	ADP
fumecheng-12767	186	18	the	the	DET
fumecheng-12767	186	19	shield	shield	NOUN
fumecheng-12767	186	20	and	and	CCONJ
fumecheng-12767	186	21	air	air	NOUN
fumecheng-12767	186	22	,	,	PUNCT
fumecheng-12767	186	23	respectively	respectively	ADV
fumecheng-12767	186	24	.	.	PUNCT
fumecheng-12767	187	1	reflection	reflection	NOUN
fumecheng-12767	187	2	loss	loss	NOUN
fumecheng-12767	187	3	is	be	AUX
fumecheng-12767	187	4	influenced	influence	VERB
fumecheng-12767	187	5	by	by	ADP
fumecheng-12767	187	6	the	the	DET
fumecheng-12767	187	7	impedance	impedance	NOUN
fumecheng-12767	187	8	difference	difference	NOUN
fumecheng-12767	187	9	,	,	PUNCT
fumecheng-12767	187	10	electrical	electrical	ADJ
fumecheng-12767	187	11	conductivity	conductivity	NOUN
fumecheng-12767	187	12	of	of	ADP
fumecheng-12767	187	13	the	the	DET
fumecheng-12767	187	14	shield	shield	NOUN
fumecheng-12767	187	15	,	,	PUNCT
fumecheng-12767	187	16	magnetic	magnetic	ADJ
fumecheng-12767	187	17	permeability	permeability	NOUN
fumecheng-12767	187	18	,	,	PUNCT
fumecheng-12767	187	19	and	and	CCONJ
fumecheng-12767	187	20	the	the	DET
fumecheng-12767	187	21	frequency	frequency	NOUN
fumecheng-12767	187	22	of	of	ADP
fumecheng-12767	187	23	the	the	DET
fumecheng-12767	187	24	incident	incident	NOUN
fumecheng-12767	187	25	electromagnetic	electromagnetic	ADJ
fumecheng-12767	187	26	waves	wave	NOUN
fumecheng-12767	187	27	.	.	PUNCT
fumecheng-12767	188	1	multiple	multiple	ADJ
fumecheng-12767	188	2	reflection	reflection	NOUN
fumecheng-12767	188	3	loss	loss	NOUN
fumecheng-12767	188	4	is	be	AUX
fumecheng-12767	188	5	significantly	significantly	ADV
fumecheng-12767	188	6	affected	affect	VERB
fumecheng-12767	188	7	by	by	ADP
fumecheng-12767	188	8	the	the	DET
fumecheng-12767	188	9	shield	shield	NOUN
fumecheng-12767	188	10	thickness	thickness	NOUN
fumecheng-12767	188	11	.	.	PUNCT
fumecheng-12767	189	1	the	the	DET
fumecheng-12767	189	2	electromagnetic	electromagnetic	ADJ
fumecheng-12767	189	3	wave	wave	NOUN
fumecheng-12767	189	4	reflected	reflect	VERB
fumecheng-12767	189	5	from	from	ADP
fumecheng-12767	189	6	the	the	DET
fumecheng-12767	189	7	shield	shield	NOUN
fumecheng-12767	189	8	’s	’s	PART
fumecheng-12767	189	9	back	back	NOUN
fumecheng-12767	189	10	surface	surface	NOUN
fumecheng-12767	189	11	may	may	AUX
fumecheng-12767	189	12	encounter	encounter	VERB
fumecheng-12767	189	13	the	the	DET
fumecheng-12767	189	14	front	front	ADJ
fumecheng-12767	189	15	surface	surface	NOUN
fumecheng-12767	189	16	again	again	ADV
fumecheng-12767	189	17	,	,	PUNCT
fumecheng-12767	189	18	causing	cause	VERB
fumecheng-12767	189	19	further	further	ADJ
fumecheng-12767	189	20	reflections	reflection	NOUN
fumecheng-12767	189	21	.	.	PUNCT
fumecheng-12767	190	1	the	the	DET
fumecheng-12767	190	2	electromagnetic	electromagnetic	ADJ
fumecheng-12767	190	3	wave	wave	NOUN
fumecheng-12767	190	4	intensity	intensity	NOUN
fumecheng-12767	190	5	decreases	decrease	VERB
fumecheng-12767	190	6	mechanically	mechanically	ADV
fumecheng-12767	190	7	pressed	press	VERB
fumecheng-12767	190	8	polymer	polymer	NOUN
fumecheng-12767	190	9	-	-	PUNCT
fumecheng-12767	190	10	matrix	matrix	NOUN
fumecheng-12767	190	11	composites	composite	NOUN
fumecheng-12767	190	12	with	with	ADP
fumecheng-12767	190	13	3d	3d	NUM
fumecheng-12767	190	14	structured	structured	ADJ
fumecheng-12767	190	15	filler	filler	NOUN
fumecheng-12767	190	16	networks	network	NOUN
fumecheng-12767	190	17	...	...	PUNCT
fumecheng-12767	190	18	611	611	NUM
fumecheng-12767	190	19	progressively	progressively	ADV
fumecheng-12767	190	20	as	as	SCONJ
fumecheng-12767	190	21	these	these	DET
fumecheng-12767	190	22	reflections	reflection	NOUN
fumecheng-12767	190	23	continue	continue	VERB
fumecheng-12767	190	24	between	between	ADP
fumecheng-12767	190	25	the	the	DET
fumecheng-12767	190	26	front	front	ADJ
fumecheng-12767	190	27	and	and	CCONJ
fumecheng-12767	190	28	back	back	NOUN
fumecheng-12767	190	29	surfaces	surface	NOUN
fumecheng-12767	190	30	.	.	PUNCT
fumecheng-12767	191	1	multiple	multiple	ADJ
fumecheng-12767	191	2	reflection	reflection	NOUN
fumecheng-12767	191	3	loss	loss	NOUN
fumecheng-12767	191	4	can	can	AUX
fumecheng-12767	191	5	be	be	AUX
fumecheng-12767	191	6	expressed	express	VERB
fumecheng-12767	191	7	as	as	SCONJ
fumecheng-12767	191	8	follows	follow	VERB
fumecheng-12767	191	9	:	:	PUNCT
fumecheng-12767	191	10	𝑆𝐸𝑀	𝑆𝐸𝑀	PROPN
fumecheng-12767	191	11	=	=	SYM
fumecheng-12767	191	12	20	20	NUM
fumecheng-12767	191	13	log10(1	log10(1	ADJ
fumecheng-12767	191	14	−	−	PROPN
fumecheng-12767	191	15	ℯ−2𝛼𝑑	ℯ−2𝛼𝑑	PROPN
fumecheng-12767	191	16	)	)	PUNCT
fumecheng-12767	192	1	=	=	SYM
fumecheng-12767	192	2	20	20	NUM
fumecheng-12767	192	3	log10(1	log10(1	ADJ
fumecheng-12767	192	4	−	−	PROPN
fumecheng-12767	192	5	ℯ	ℯ	NOUN
fumecheng-12767	192	6	−	−	PROPN
fumecheng-12767	192	7	2𝑑	2𝑑	NOUN
fumecheng-12767	192	8	𝛿	𝛿	X
fumecheng-12767	192	9	)	)	PUNCT
fumecheng-12767	192	10	(	(	PUNCT
fumecheng-12767	192	11	7	7	X
fumecheng-12767	192	12	)	)	PUNCT
fumecheng-12767	192	13	multiple	multiple	ADJ
fumecheng-12767	192	14	reflection	reflection	NOUN
fumecheng-12767	192	15	loss	loss	NOUN
fumecheng-12767	192	16	becomes	become	VERB
fumecheng-12767	192	17	negligible	negligible	ADJ
fumecheng-12767	192	18	if	if	SCONJ
fumecheng-12767	192	19	the	the	DET
fumecheng-12767	192	20	total	total	ADJ
fumecheng-12767	192	21	emi	emi	PROPN
fumecheng-12767	192	22	se	se	X
fumecheng-12767	192	23	exceeds	exceed	VERB
fumecheng-12767	192	24	15	15	NUM
fumecheng-12767	192	25	db	db	NOUN
fumecheng-12767	192	26	or	or	CCONJ
fumecheng-12767	192	27	if	if	SCONJ
fumecheng-12767	192	28	the	the	DET
fumecheng-12767	192	29	shield	shield	NOUN
fumecheng-12767	192	30	thickness	thickness	NOUN
fumecheng-12767	192	31	is	be	AUX
fumecheng-12767	192	32	similar	similar	ADJ
fumecheng-12767	192	33	to	to	ADP
fumecheng-12767	192	34	or	or	CCONJ
fumecheng-12767	192	35	greater	great	ADJ
fumecheng-12767	192	36	than	than	ADP
fumecheng-12767	192	37	the	the	DET
fumecheng-12767	192	38	skin	skin	NOUN
fumecheng-12767	192	39	depth	depth	NOUN
fumecheng-12767	192	40	.	.	PUNCT
fumecheng-12767	193	1	the	the	DET
fumecheng-12767	193	2	total	total	ADJ
fumecheng-12767	193	3	emi	emi	PROPN
fumecheng-12767	193	4	se	se	X
fumecheng-12767	193	5	can	can	AUX
fumecheng-12767	193	6	be	be	AUX
fumecheng-12767	193	7	calculated	calculate	VERB
fumecheng-12767	193	8	from	from	ADP
fumecheng-12767	193	9	the	the	DET
fumecheng-12767	193	10	scattering	scatter	VERB
fumecheng-12767	193	11	parameters	parameter	NOUN
fumecheng-12767	193	12	obtained	obtain	VERB
fumecheng-12767	193	13	from	from	ADP
fumecheng-12767	193	14	two	two	NUM
fumecheng-12767	193	15	ports	port	NOUN
fumecheng-12767	193	16	using	use	VERB
fumecheng-12767	193	17	a	a	DET
fumecheng-12767	193	18	vna	vna	PROPN
fumecheng-12767	193	19	.	.	PUNCT
fumecheng-12767	194	1	s11	s11	PROPN
fumecheng-12767	194	2	represents	represent	VERB
fumecheng-12767	194	3	the	the	DET
fumecheng-12767	194	4	ratio	ratio	NOUN
fumecheng-12767	194	5	of	of	ADP
fumecheng-12767	194	6	the	the	DET
fumecheng-12767	194	7	voltage	voltage	NOUN
fumecheng-12767	194	8	input	input	NOUN
fumecheng-12767	194	9	to	to	PART
fumecheng-12767	194	10	port	port	VERB
fumecheng-12767	194	11	1	1	NUM
fumecheng-12767	194	12	and	and	CCONJ
fumecheng-12767	194	13	the	the	DET
fumecheng-12767	194	14	voltage	voltage	NOUN
fumecheng-12767	194	15	output	output	NOUN
fumecheng-12767	194	16	from	from	ADP
fumecheng-12767	194	17	port	port	NOUN
fumecheng-12767	194	18	1	1	NUM
fumecheng-12767	194	19	,	,	PUNCT
fumecheng-12767	194	20	and	and	CCONJ
fumecheng-12767	194	21	s21	s21	NOUN
fumecheng-12767	194	22	represents	represent	VERB
fumecheng-12767	194	23	the	the	DET
fumecheng-12767	194	24	ratio	ratio	NOUN
fumecheng-12767	194	25	of	of	ADP
fumecheng-12767	194	26	the	the	DET
fumecheng-12767	194	27	voltage	voltage	NOUN
fumecheng-12767	194	28	input	input	NOUN
fumecheng-12767	194	29	to	to	PART
fumecheng-12767	194	30	port	port	VERB
fumecheng-12767	194	31	1	1	NUM
fumecheng-12767	194	32	and	and	CCONJ
fumecheng-12767	194	33	the	the	DET
fumecheng-12767	194	34	voltage	voltage	NOUN
fumecheng-12767	194	35	output	output	NOUN
fumecheng-12767	194	36	from	from	ADP
fumecheng-12767	194	37	port	port	NOUN
fumecheng-12767	194	38	2	2	NUM
fumecheng-12767	194	39	.	.	PUNCT
fumecheng-12767	195	1	similarly	similarly	ADV
fumecheng-12767	195	2	,	,	PUNCT
fumecheng-12767	195	3	s22	s22	NOUN
fumecheng-12767	195	4	and	and	CCONJ
fumecheng-12767	195	5	s12	s12	NOUN
fumecheng-12767	195	6	represent	represent	VERB
fumecheng-12767	195	7	the	the	DET
fumecheng-12767	195	8	reflection	reflection	NOUN
fumecheng-12767	195	9	and	and	CCONJ
fumecheng-12767	195	10	transmission	transmission	NOUN
fumecheng-12767	195	11	parameters	parameter	NOUN
fumecheng-12767	195	12	for	for	ADP
fumecheng-12767	195	13	port	port	NOUN
fumecheng-12767	195	14	2	2	NUM
fumecheng-12767	195	15	,	,	PUNCT
fumecheng-12767	195	16	respectively	respectively	ADV
fumecheng-12767	195	17	.	.	PUNCT
fumecheng-12767	196	1	for	for	ADP
fumecheng-12767	196	2	a	a	DET
fumecheng-12767	196	3	uniform	uniform	ADJ
fumecheng-12767	196	4	shield	shield	NOUN
fumecheng-12767	196	5	,	,	PUNCT
fumecheng-12767	196	6	s11	s11	PROPN
fumecheng-12767	196	7	=	=	PUNCT
fumecheng-12767	196	8	s22	s22	NOUN
fumecheng-12767	196	9	and	and	CCONJ
fumecheng-12767	196	10	s21	s21	NOUN
fumecheng-12767	196	11	=	=	SYM
fumecheng-12767	196	12	s12	s12	PROPN
fumecheng-12767	196	13	.	.	PUNCT
fumecheng-12767	196	14	sea	sea	NOUN
fumecheng-12767	196	15	and	and	CCONJ
fumecheng-12767	196	16	ser	ser	NOUN
fumecheng-12767	196	17	can	can	AUX
fumecheng-12767	196	18	be	be	AUX
fumecheng-12767	196	19	defined	define	VERB
fumecheng-12767	196	20	in	in	ADP
fumecheng-12767	196	21	terms	term	NOUN
fumecheng-12767	196	22	of	of	ADP
fumecheng-12767	196	23	these	these	DET
fumecheng-12767	196	24	scattering	scatter	VERB
fumecheng-12767	196	25	parameters	parameter	NOUN
fumecheng-12767	196	26	as	as	SCONJ
fumecheng-12767	196	27	follows	follow	VERB
fumecheng-12767	196	28	[	[	X
fumecheng-12767	196	29	33	33	NUM
fumecheng-12767	196	30	]	]	X
fumecheng-12767	196	31	:	:	PUNCT
fumecheng-12767	197	1	𝑇	𝑇	PROPN
fumecheng-12767	197	2	=	=	SYM
fumecheng-12767	197	3	|𝑆21|2	|𝑆21|2	X
fumecheng-12767	197	4	(	(	PUNCT
fumecheng-12767	197	5	8)	8)	NUM
fumecheng-12767	197	6	𝑅	𝑅	PROPN
fumecheng-12767	197	7	=	=	PUNCT
fumecheng-12767	197	8	|𝑆11|2	|𝑆11|2	ADJ
fumecheng-12767	197	9	(	(	PUNCT
fumecheng-12767	197	10	9	9	NUM
fumecheng-12767	197	11	)	)	SYM
fumecheng-12767	197	12	1	1	NUM
fumecheng-12767	197	13	=	=	SYM
fumecheng-12767	197	14	𝐴	𝐴	PROPN
fumecheng-12767	197	15	+	+	CCONJ
fumecheng-12767	197	16	𝑅	𝑅	PROPN
fumecheng-12767	197	17	+	+	CCONJ
fumecheng-12767	197	18	𝑇	𝑇	PROPN
fumecheng-12767	197	19	(	(	PUNCT
fumecheng-12767	197	20	10	10	NUM
fumecheng-12767	197	21	)	)	PUNCT
fumecheng-12767	197	22	𝑆𝐸𝐴	𝑆𝐸𝐴	NOUN
fumecheng-12767	197	23	=	=	PRON
fumecheng-12767	197	24	−10	−10	PROPN
fumecheng-12767	197	25	log10	log10	PROPN
fumecheng-12767	197	26	𝑇	𝑇	PROPN
fumecheng-12767	197	27	1−𝑅	1−𝑅	NUM
fumecheng-12767	197	28	(	(	PUNCT
fumecheng-12767	197	29	11	11	NUM
fumecheng-12767	197	30	)	)	PUNCT
fumecheng-12767	197	31	𝑆𝐸𝑅	𝑆𝐸𝑅	PROPN
fumecheng-12767	197	32	=	=	SYM
fumecheng-12767	197	33	−10	−10	PRON
fumecheng-12767	197	34	log10(1	log10(1	ADJ
fumecheng-12767	197	35	−	−	PROPN
fumecheng-12767	197	36	𝑅	𝑅	PROPN
fumecheng-12767	197	37	)	)	PUNCT
fumecheng-12767	197	38	(	(	PUNCT
fumecheng-12767	197	39	12	12	NUM
fumecheng-12767	197	40	)	)	PUNCT
fumecheng-12767	197	41	here	here	ADV
fumecheng-12767	197	42	,	,	PUNCT
fumecheng-12767	197	43	a	a	DET
fumecheng-12767	197	44	,	,	PUNCT
fumecheng-12767	197	45	r	r	NOUN
fumecheng-12767	197	46	,	,	PUNCT
fumecheng-12767	197	47	and	and	CCONJ
fumecheng-12767	197	48	t	t	PROPN
fumecheng-12767	197	49	represent	represent	VERB
fumecheng-12767	197	50	the	the	DET
fumecheng-12767	197	51	absorption	absorption	NOUN
fumecheng-12767	197	52	,	,	PUNCT
fumecheng-12767	197	53	reflection	reflection	NOUN
fumecheng-12767	197	54	,	,	PUNCT
fumecheng-12767	197	55	and	and	CCONJ
fumecheng-12767	197	56	transmission	transmission	NOUN
fumecheng-12767	197	57	power	power	NOUN
fumecheng-12767	197	58	coefficients	coefficient	NOUN
fumecheng-12767	197	59	,	,	PUNCT
fumecheng-12767	197	60	respectively	respectively	ADV
fumecheng-12767	197	61	.	.	PUNCT
fumecheng-12767	198	1	the	the	DET
fumecheng-12767	198	2	total	total	ADJ
fumecheng-12767	198	3	emi	emi	PROPN
fumecheng-12767	198	4	se	se	PROPN
fumecheng-12767	198	5	measured	measure	VERB
fumecheng-12767	198	6	by	by	ADP
fumecheng-12767	198	7	vna	vna	PROPN
fumecheng-12767	198	8	for	for	ADP
fumecheng-12767	198	9	ps@mxene	ps@mxene	NOUN
fumecheng-12767	198	10	and	and	CCONJ
fumecheng-12767	198	11	ps@mxene@bnnss	ps@mxene@bnnss	NOUN
fumecheng-12767	198	12	is	be	AUX
fumecheng-12767	198	13	shown	show	VERB
fumecheng-12767	198	14	in	in	ADP
fumecheng-12767	198	15	fig	fig	NOUN
fumecheng-12767	198	16	.	.	PUNCT
fumecheng-12767	199	1	6	6	NUM
fumecheng-12767	199	2	.	.	PUNCT
fumecheng-12767	200	1	the	the	DET
fumecheng-12767	200	2	composites	composite	NOUN
fumecheng-12767	200	3	were	be	AUX
fumecheng-12767	200	4	fabricated	fabricate	VERB
fumecheng-12767	200	5	through	through	ADP
fumecheng-12767	200	6	hot	hot	ADJ
fumecheng-12767	200	7	pressing	pressing	NOUN
fumecheng-12767	200	8	,	,	PUNCT
fumecheng-12767	200	9	and	and	CCONJ
fumecheng-12767	200	10	the	the	DET
fumecheng-12767	200	11	emi	emi	PROPN
fumecheng-12767	200	12	se	se	PROPN
fumecheng-12767	200	13	of	of	ADP
fumecheng-12767	200	14	these	these	DET
fumecheng-12767	200	15	composites	composite	NOUN
fumecheng-12767	200	16	was	be	AUX
fumecheng-12767	200	17	compared	compare	VERB
fumecheng-12767	200	18	based	base	VERB
fumecheng-12767	200	19	on	on	ADP
fumecheng-12767	200	20	the	the	DET
fumecheng-12767	200	21	coating	coating	NOUN
fumecheng-12767	200	22	of	of	ADP
fumecheng-12767	200	23	bnnss	bnns	NOUN
fumecheng-12767	200	24	-	-	PUNCT
fumecheng-12767	200	25	aptes	apte	NOUN
fumecheng-12767	200	26	.	.	PUNCT
fumecheng-12767	201	1	it	it	PRON
fumecheng-12767	201	2	was	be	AUX
fumecheng-12767	201	3	observed	observe	VERB
fumecheng-12767	201	4	that	that	SCONJ
fumecheng-12767	201	5	in	in	ADP
fumecheng-12767	201	6	all	all	DET
fumecheng-12767	201	7	the	the	DET
fumecheng-12767	201	8	frequency	frequency	NOUN
fumecheng-12767	201	9	ranges	range	NOUN
fumecheng-12767	201	10	,	,	PUNCT
fumecheng-12767	201	11	the	the	DET
fumecheng-12767	201	12	presence	presence	NOUN
fumecheng-12767	201	13	of	of	ADP
fumecheng-12767	201	14	bnnss	bnns	NOUN
fumecheng-12767	201	15	significantly	significantly	ADV
fumecheng-12767	201	16	enhanced	enhance	VERB
fumecheng-12767	201	17	the	the	DET
fumecheng-12767	201	18	performance	performance	NOUN
fumecheng-12767	201	19	.	.	PUNCT
fumecheng-12767	202	1	fig	fig	NOUN
fumecheng-12767	202	2	.	.	PUNCT
fumecheng-12767	203	1	6	6	NUM
fumecheng-12767	203	2	emi	emi	X
fumecheng-12767	203	3	se	se	X
fumecheng-12767	203	4	of	of	ADP
fumecheng-12767	203	5	ps@mxene	ps@mxene	NOUN
fumecheng-12767	203	6	and	and	CCONJ
fumecheng-12767	203	7	ps@mxene@bnnss	ps@mxene@bnns	NOUN
fumecheng-12767	203	8	2	2	NUM
fumecheng-12767	203	9	4	4	NUM
fumecheng-12767	203	10	6	6	NUM
fumecheng-12767	203	11	8	8	NUM
fumecheng-12767	203	12	10	10	NUM
fumecheng-12767	203	13	12	12	NUM
fumecheng-12767	203	14	0	0	NUM
fumecheng-12767	203	15	5	5	NUM
fumecheng-12767	203	16	10	10	NUM
fumecheng-12767	203	17	15	15	NUM
fumecheng-12767	203	18	20	20	NUM
fumecheng-12767	203	19	25	25	NUM
fumecheng-12767	203	20	30	30	NUM
fumecheng-12767	203	21	e	e	NOUN
fumecheng-12767	203	22	m	m	VERB
fumecheng-12767	203	23	i	i	NOUN
fumecheng-12767	203	24	s	s	VERB
fumecheng-12767	203	25	h	h	NOUN
fumecheng-12767	203	26	ie	ie	X
fumecheng-12767	203	27	ld	ld	PROPN
fumecheng-12767	203	28	in	in	ADP
fumecheng-12767	203	29	g	g	PROPN
fumecheng-12767	203	30	e	e	X
fumecheng-12767	203	31	ff	ff	NOUN
fumecheng-12767	203	32	e	e	X
fumecheng-12767	203	33	c	c	NOUN
fumecheng-12767	203	34	ti	ti	X
fumecheng-12767	203	35	v	v	ADP
fumecheng-12767	203	36	e	e	X
fumecheng-12767	203	37	n	n	NOUN
fumecheng-12767	203	38	e	e	NOUN
fumecheng-12767	203	39	s	s	X
fumecheng-12767	203	40	s	s	X
fumecheng-12767	203	41	(	(	PUNCT
fumecheng-12767	203	42	d	d	PROPN
fumecheng-12767	203	43	b	b	PROPN
fumecheng-12767	203	44	)	)	PUNCT
fumecheng-12767	203	45	frequency	frequency	NOUN
fumecheng-12767	203	46	(	(	PUNCT
fumecheng-12767	203	47	ghz	ghz	NOUN
fumecheng-12767	203	48	)	)	PUNCT
fumecheng-12767	203	49	ps@mxene	ps@mxene	VERB
fumecheng-12767	203	50	ps@mxene@bnnss	ps@mxene@bnnss	NOUN
fumecheng-12767	203	51	612	612	NUM
fumecheng-12767	203	52	c.	c.	NOUN
fumecheng-12767	203	53	choi	choi	NOUN
fumecheng-12767	203	54	,	,	PUNCT
fumecheng-12767	203	55	n.	n.	PROPN
fumecheng-12767	203	56	qaiser	qaiser	PROPN
fumecheng-12767	203	57	,	,	PUNCT
fumecheng-12767	203	58	b.	b.	PROPN
fumecheng-12767	203	59	hwang	hwang	PROPN
fumecheng-12767	204	1	this	this	DET
fumecheng-12767	204	2	improvement	improvement	NOUN
fumecheng-12767	204	3	can	can	AUX
fumecheng-12767	204	4	be	be	AUX
fumecheng-12767	204	5	attributed	attribute	VERB
fumecheng-12767	204	6	to	to	ADP
fumecheng-12767	204	7	the	the	DET
fumecheng-12767	204	8	bnnss	bnns	NOUN
fumecheng-12767	204	9	layer	layer	NOUN
fumecheng-12767	204	10	encapsulating	encapsulate	VERB
fumecheng-12767	204	11	the	the	DET
fumecheng-12767	204	12	oxidizing	oxidize	VERB
fumecheng-12767	204	13	mxene	mxene	NOUN
fumecheng-12767	204	14	,	,	PUNCT
fumecheng-12767	204	15	thereby	thereby	ADV
fumecheng-12767	204	16	preventing	prevent	VERB
fumecheng-12767	204	17	its	its	PRON
fumecheng-12767	204	18	oxidation	oxidation	NOUN
fumecheng-12767	204	19	.	.	PUNCT
fumecheng-12767	205	1	additionally	additionally	ADV
fumecheng-12767	205	2	,	,	PUNCT
fumecheng-12767	205	3	the	the	DET
fumecheng-12767	205	4	repeated	repeat	VERB
fumecheng-12767	205	5	interfaces	interface	NOUN
fumecheng-12767	205	6	of	of	ADP
fumecheng-12767	205	7	various	various	ADJ
fumecheng-12767	205	8	materials	material	NOUN
fumecheng-12767	205	9	increased	increase	VERB
fumecheng-12767	205	10	the	the	DET
fumecheng-12767	205	11	emi	emi	PROPN
fumecheng-12767	205	12	se	se	PROPN
fumecheng-12767	205	13	due	due	ADP
fumecheng-12767	205	14	to	to	ADP
fumecheng-12767	205	15	the	the	DET
fumecheng-12767	205	16	impedance	impedance	NOUN
fumecheng-12767	205	17	difference	difference	NOUN
fumecheng-12767	205	18	between	between	ADP
fumecheng-12767	205	19	each	each	DET
fumecheng-12767	205	20	material	material	NOUN
fumecheng-12767	205	21	.	.	PUNCT
fumecheng-12767	206	1	as	as	SCONJ
fumecheng-12767	206	2	seen	see	VERB
fumecheng-12767	206	3	in	in	ADP
fumecheng-12767	206	4	the	the	DET
fumecheng-12767	206	5	initial	initial	ADJ
fumecheng-12767	206	6	part	part	NOUN
fumecheng-12767	206	7	of	of	ADP
fumecheng-12767	206	8	the	the	DET
fumecheng-12767	206	9	graph	graph	NOUN
fumecheng-12767	206	10	,	,	PUNCT
fumecheng-12767	206	11	the	the	DET
fumecheng-12767	206	12	composites	composite	NOUN
fumecheng-12767	206	13	exhibited	exhibit	VERB
fumecheng-12767	206	14	relatively	relatively	ADV
fumecheng-12767	206	15	high	high	ADJ
fumecheng-12767	206	16	emi	emi	NOUN
fumecheng-12767	206	17	se	se	X
fumecheng-12767	206	18	.	.	PUNCT
fumecheng-12767	207	1	considering	consider	VERB
fumecheng-12767	207	2	that	that	SCONJ
fumecheng-12767	207	3	a	a	DET
fumecheng-12767	207	4	shielding	shielding	NOUN
fumecheng-12767	207	5	effectiveness	effectiveness	NOUN
fumecheng-12767	207	6	of	of	ADP
fumecheng-12767	207	7	20	20	NUM
fumecheng-12767	207	8	db	db	NOUN
fumecheng-12767	207	9	or	or	CCONJ
fumecheng-12767	207	10	higher	high	ADJ
fumecheng-12767	207	11	corresponds	correspond	NOUN
fumecheng-12767	207	12	to	to	ADP
fumecheng-12767	207	13	99	99	NUM
fumecheng-12767	207	14	%	%	NOUN
fumecheng-12767	207	15	blockage	blockage	NOUN
fumecheng-12767	207	16	of	of	ADP
fumecheng-12767	207	17	electromagnetic	electromagnetic	ADJ
fumecheng-12767	207	18	waves	wave	NOUN
fumecheng-12767	207	19	,	,	PUNCT
fumecheng-12767	207	20	the	the	DET
fumecheng-12767	207	21	composites	composite	NOUN
fumecheng-12767	207	22	developed	develop	VERB
fumecheng-12767	207	23	in	in	ADP
fumecheng-12767	207	24	this	this	DET
fumecheng-12767	207	25	study	study	NOUN
fumecheng-12767	207	26	demonstrated	demonstrate	VERB
fumecheng-12767	207	27	commendable	commendable	ADJ
fumecheng-12767	207	28	performance	performance	NOUN
fumecheng-12767	207	29	,	,	PUNCT
fumecheng-12767	207	30	particularly	particularly	ADV
fumecheng-12767	207	31	in	in	ADP
fumecheng-12767	207	32	the	the	DET
fumecheng-12767	207	33	low	low	ADJ
fumecheng-12767	207	34	-	-	PUNCT
fumecheng-12767	207	35	frequency	frequency	NOUN
fumecheng-12767	207	36	range	range	NOUN
fumecheng-12767	207	37	.	.	PUNCT
fumecheng-12767	208	1	furthermore	furthermore	ADV
fumecheng-12767	208	2	,	,	PUNCT
fumecheng-12767	208	3	the	the	DET
fumecheng-12767	208	4	thicknesses	thickness	NOUN
fumecheng-12767	208	5	of	of	ADP
fumecheng-12767	208	6	the	the	DET
fumecheng-12767	208	7	fabricated	fabricate	VERB
fumecheng-12767	208	8	composites	composite	NOUN
fumecheng-12767	208	9	were	be	AUX
fumecheng-12767	208	10	relatively	relatively	ADV
fumecheng-12767	208	11	thin	thin	ADJ
fumecheng-12767	208	12	,	,	PUNCT
fumecheng-12767	208	13	at	at	ADP
fumecheng-12767	208	14	just	just	ADV
fumecheng-12767	208	15	0.8	0.8	NUM
fumecheng-12767	208	16	mm	mm	NOUN
fumecheng-12767	208	17	.	.	PUNCT
fumecheng-12767	209	1	since	since	SCONJ
fumecheng-12767	209	2	the	the	DET
fumecheng-12767	209	3	thickness	thickness	NOUN
fumecheng-12767	209	4	of	of	ADP
fumecheng-12767	209	5	the	the	DET
fumecheng-12767	209	6	composite	composite	NOUN
fumecheng-12767	209	7	greatly	greatly	ADV
fumecheng-12767	209	8	influences	influence	VERB
fumecheng-12767	209	9	emi	emi	PROPN
fumecheng-12767	209	10	se	se	PROPN
fumecheng-12767	209	11	,	,	PUNCT
fumecheng-12767	209	12	the	the	DET
fumecheng-12767	209	13	performance	performance	NOUN
fumecheng-12767	209	14	observed	observe	VERB
fumecheng-12767	209	15	in	in	ADP
fumecheng-12767	209	16	this	this	DET
fumecheng-12767	209	17	study	study	NOUN
fumecheng-12767	209	18	can	can	AUX
fumecheng-12767	209	19	be	be	AUX
fumecheng-12767	209	20	considered	consider	VERB
fumecheng-12767	209	21	excellent	excellent	ADJ
fumecheng-12767	209	22	.	.	PUNCT
fumecheng-12767	210	1	4	4	X
fumecheng-12767	210	2	.	.	X
fumecheng-12767	210	3	conclusions	conclusion	NOUN
fumecheng-12767	210	4	in	in	ADP
fumecheng-12767	210	5	this	this	DET
fumecheng-12767	210	6	study	study	NOUN
fumecheng-12767	210	7	,	,	PUNCT
fumecheng-12767	210	8	we	we	PRON
fumecheng-12767	210	9	fabricated	fabricate	VERB
fumecheng-12767	210	10	a	a	DET
fumecheng-12767	210	11	multifunctional	multifunctional	ADJ
fumecheng-12767	210	12	composite	composite	NOUN
fumecheng-12767	210	13	with	with	ADP
fumecheng-12767	210	14	electromagnetic	electromagnetic	ADJ
fumecheng-12767	210	15	wave	wave	NOUN
fumecheng-12767	210	16	shielding	shielding	NOUN
fumecheng-12767	210	17	capabilities	capability	NOUN
fumecheng-12767	210	18	by	by	ADP
fumecheng-12767	210	19	controlling	control	VERB
fumecheng-12767	210	20	the	the	DET
fumecheng-12767	210	21	surface	surface	NOUN
fumecheng-12767	210	22	charge	charge	NOUN
fumecheng-12767	210	23	of	of	ADP
fumecheng-12767	210	24	ps	ps	PROPN
fumecheng-12767	210	25	,	,	PUNCT
fumecheng-12767	210	26	mxene	mxene	NOUN
fumecheng-12767	210	27	,	,	PUNCT
fumecheng-12767	210	28	and	and	CCONJ
fumecheng-12767	210	29	bnnss	bnns	NOUN
fumecheng-12767	210	30	.	.	PUNCT
fumecheng-12767	211	1	it	it	PRON
fumecheng-12767	211	2	is	be	AUX
fumecheng-12767	211	3	crucial	crucial	ADJ
fumecheng-12767	211	4	to	to	PART
fumecheng-12767	211	5	control	control	VERB
fumecheng-12767	211	6	the	the	DET
fumecheng-12767	211	7	surface	surface	NOUN
fumecheng-12767	211	8	charge	charge	NOUN
fumecheng-12767	211	9	of	of	ADP
fumecheng-12767	211	10	each	each	DET
fumecheng-12767	211	11	material	material	NOUN
fumecheng-12767	211	12	precisely	precisely	ADV
fumecheng-12767	211	13	to	to	PART
fumecheng-12767	211	14	achieve	achieve	VERB
fumecheng-12767	211	15	an	an	DET
fumecheng-12767	211	16	optimal	optimal	ADJ
fumecheng-12767	211	17	composite	composite	NOUN
fumecheng-12767	211	18	.	.	PUNCT
fumecheng-12767	212	1	since	since	SCONJ
fumecheng-12767	212	2	mxene	mxene	NOUN
fumecheng-12767	212	3	and	and	CCONJ
fumecheng-12767	212	4	bnnss	bnns	NOUN
fumecheng-12767	212	5	need	need	VERB
fumecheng-12767	212	6	to	to	PART
fumecheng-12767	212	7	bind	bind	VERB
fumecheng-12767	212	8	to	to	ADP
fumecheng-12767	212	9	the	the	DET
fumecheng-12767	212	10	surface	surface	NOUN
fumecheng-12767	212	11	of	of	ADP
fumecheng-12767	212	12	spherical	spherical	ADJ
fumecheng-12767	212	13	ps	ps	NOUN
fumecheng-12767	212	14	particles	particle	NOUN
fumecheng-12767	212	15	,	,	PUNCT
fumecheng-12767	212	16	it	it	PRON
fumecheng-12767	212	17	is	be	AUX
fumecheng-12767	212	18	important	important	ADJ
fumecheng-12767	212	19	to	to	PART
fumecheng-12767	212	20	form	form	VERB
fumecheng-12767	212	21	a	a	DET
fumecheng-12767	212	22	nanosheet	nanosheet	NOUN
fumecheng-12767	212	23	of	of	ADP
fumecheng-12767	212	24	the	the	DET
fumecheng-12767	212	25	2d	2d	NUM
fumecheng-12767	212	26	material	material	NOUN
fumecheng-12767	212	27	.	.	PUNCT
fumecheng-12767	213	1	for	for	ADP
fumecheng-12767	213	2	ps	ps	PROPN
fumecheng-12767	213	3	,	,	PUNCT
fumecheng-12767	213	4	the	the	DET
fumecheng-12767	213	5	surface	surface	NOUN
fumecheng-12767	213	6	was	be	AUX
fumecheng-12767	213	7	initially	initially	ADV
fumecheng-12767	213	8	negatively	negatively	ADV
fumecheng-12767	213	9	charged	charge	VERB
fumecheng-12767	213	10	after	after	ADP
fumecheng-12767	213	11	dispersion	dispersion	NOUN
fumecheng-12767	213	12	polymerization	polymerization	NOUN
fumecheng-12767	213	13	,	,	PUNCT
fumecheng-12767	213	14	but	but	CCONJ
fumecheng-12767	213	15	it	it	PRON
fumecheng-12767	213	16	became	became	AUX
fumecheng-12767	213	17	positively	positively	ADV
fumecheng-12767	213	18	charged	charge	VERB
fumecheng-12767	213	19	with	with	ADP
fumecheng-12767	213	20	the	the	DET
fumecheng-12767	213	21	addition	addition	NOUN
fumecheng-12767	213	22	of	of	ADP
fumecheng-12767	213	23	dmc	dmc	PROPN
fumecheng-12767	213	24	.	.	PUNCT
fumecheng-12767	214	1	this	this	PRON
fumecheng-12767	214	2	allowed	allow	VERB
fumecheng-12767	214	3	us	we	PRON
fumecheng-12767	214	4	to	to	PART
fumecheng-12767	214	5	create	create	VERB
fumecheng-12767	214	6	ps@mxene	ps@mxene	ADJ
fumecheng-12767	214	7	microspheres	microsphere	NOUN
fumecheng-12767	214	8	by	by	ADP
fumecheng-12767	214	9	reacting	react	VERB
fumecheng-12767	214	10	the	the	DET
fumecheng-12767	214	11	positively	positively	ADV
fumecheng-12767	214	12	charged	charge	VERB
fumecheng-12767	214	13	ps	ps	NOUN
fumecheng-12767	214	14	with	with	ADP
fumecheng-12767	214	15	negatively	negatively	ADV
fumecheng-12767	214	16	charged	charge	VERB
fumecheng-12767	214	17	mxene	mxene	NOUN
fumecheng-12767	214	18	.	.	PUNCT
fumecheng-12767	215	1	similarly	similarly	ADV
fumecheng-12767	215	2	,	,	PUNCT
fumecheng-12767	215	3	we	we	PRON
fumecheng-12767	215	4	modified	modify	VERB
fumecheng-12767	215	5	bnns	bnn	NOUN
fumecheng-12767	215	6	(	(	PUNCT
fumecheng-12767	215	7	with	with	ADP
fumecheng-12767	215	8	a	a	DET
fumecheng-12767	215	9	negative	negative	ADJ
fumecheng-12767	215	10	surface	surface	NOUN
fumecheng-12767	215	11	charge	charge	NOUN
fumecheng-12767	215	12	)	)	PUNCT
fumecheng-12767	215	13	with	with	ADP
fumecheng-12767	215	14	aptes	apte	NOUN
fumecheng-12767	215	15	to	to	PART
fumecheng-12767	215	16	impart	impart	VERB
fumecheng-12767	215	17	a	a	DET
fumecheng-12767	215	18	positive	positive	ADJ
fumecheng-12767	215	19	charge	charge	NOUN
fumecheng-12767	215	20	,	,	PUNCT
fumecheng-12767	215	21	enabling	enable	VERB
fumecheng-12767	215	22	the	the	DET
fumecheng-12767	215	23	fabrication	fabrication	NOUN
fumecheng-12767	215	24	of	of	ADP
fumecheng-12767	215	25	ps@mxene@bnnss	ps@mxene@bnns	NOUN
fumecheng-12767	215	26	microspheres	microsphere	VERB
fumecheng-12767	215	27	through	through	ADP
fumecheng-12767	215	28	a	a	DET
fumecheng-12767	215	29	self	self	NOUN
fumecheng-12767	215	30	-	-	PUNCT
fumecheng-12767	215	31	assembly	assembly	NOUN
fumecheng-12767	215	32	reaction	reaction	NOUN
fumecheng-12767	215	33	.	.	PUNCT
fumecheng-12767	216	1	these	these	DET
fumecheng-12767	216	2	microspheres	microsphere	NOUN
fumecheng-12767	216	3	were	be	AUX
fumecheng-12767	216	4	then	then	ADV
fumecheng-12767	216	5	hot	hot	ADV
fumecheng-12767	216	6	-	-	PUNCT
fumecheng-12767	216	7	pressed	pressed	ADJ
fumecheng-12767	216	8	to	to	PART
fumecheng-12767	216	9	form	form	VERB
fumecheng-12767	216	10	the	the	DET
fumecheng-12767	216	11	ps@mxene@bnnss	ps@mxene@bnns	NOUN
fumecheng-12767	216	12	composite	composite	NOUN
fumecheng-12767	216	13	.	.	PUNCT
fumecheng-12767	217	1	the	the	DET
fumecheng-12767	217	2	ps@mxene@bnnss	ps@mxene@bnnss	PROPN
fumecheng-12767	217	3	composite	composite	NOUN
fumecheng-12767	217	4	exhibited	exhibit	VERB
fumecheng-12767	217	5	excellent	excellent	ADJ
fumecheng-12767	217	6	electromagnetic	electromagnetic	ADJ
fumecheng-12767	217	7	wave	wave	NOUN
fumecheng-12767	217	8	shielding	shielding	NOUN
fumecheng-12767	217	9	efficiency	efficiency	NOUN
fumecheng-12767	217	10	in	in	ADP
fumecheng-12767	217	11	the	the	DET
fumecheng-12767	217	12	low	low	ADJ
fumecheng-12767	217	13	-	-	PUNCT
fumecheng-12767	217	14	frequency	frequency	NOUN
fumecheng-12767	217	15	range	range	NOUN
fumecheng-12767	217	16	.	.	PUNCT
fumecheng-12767	218	1	furthermore	furthermore	ADV
fumecheng-12767	218	2	,	,	PUNCT
fumecheng-12767	218	3	it	it	PRON
fumecheng-12767	218	4	consistently	consistently	ADV
fumecheng-12767	218	5	demonstrated	demonstrate	VERB
fumecheng-12767	218	6	higher	high	ADJ
fumecheng-12767	218	7	shielding	shielding	NOUN
fumecheng-12767	218	8	efficiency	efficiency	NOUN
fumecheng-12767	218	9	than	than	ADP
fumecheng-12767	218	10	the	the	DET
fumecheng-12767	218	11	ps@mxene	ps@mxene	ADJ
fumecheng-12767	218	12	composite	composite	NOUN
fumecheng-12767	218	13	,	,	PUNCT
fumecheng-12767	218	14	indicating	indicate	VERB
fumecheng-12767	218	15	the	the	DET
fumecheng-12767	218	16	oxidation	oxidation	NOUN
fumecheng-12767	218	17	prevention	prevention	NOUN
fumecheng-12767	218	18	effect	effect	NOUN
fumecheng-12767	218	19	of	of	ADP
fumecheng-12767	218	20	bnns	bnn	NOUN
fumecheng-12767	218	21	.	.	PUNCT
fumecheng-12767	219	1	given	give	VERB
fumecheng-12767	219	2	that	that	SCONJ
fumecheng-12767	219	3	bnnss	bnns	NOUN
fumecheng-12767	219	4	have	have	AUX
fumecheng-12767	219	5	excellent	excellent	ADJ
fumecheng-12767	219	6	thermal	thermal	ADJ
fumecheng-12767	219	7	conductivity	conductivity	NOUN
fumecheng-12767	219	8	and	and	CCONJ
fumecheng-12767	219	9	completely	completely	ADV
fumecheng-12767	219	10	encapsulate	encapsulate	VERB
fumecheng-12767	219	11	ps	ps	PROPN
fumecheng-12767	219	12	,	,	PUNCT
fumecheng-12767	219	13	the	the	DET
fumecheng-12767	219	14	resulting	result	VERB
fumecheng-12767	219	15	ps@mxene@bnnss	ps@mxene@bnns	NOUN
fumecheng-12767	219	16	composite	composite	NOUN
fumecheng-12767	219	17	is	be	AUX
fumecheng-12767	219	18	also	also	ADV
fumecheng-12767	219	19	expected	expect	VERB
fumecheng-12767	219	20	to	to	PART
fumecheng-12767	219	21	possess	possess	VERB
fumecheng-12767	219	22	high	high	ADJ
fumecheng-12767	219	23	thermal	thermal	ADJ
fumecheng-12767	219	24	conductivity	conductivity	NOUN
fumecheng-12767	219	25	.	.	PUNCT
fumecheng-12767	220	1	therefore	therefore	ADV
fumecheng-12767	220	2	,	,	PUNCT
fumecheng-12767	220	3	the	the	DET
fumecheng-12767	220	4	ps@mxene@bnnss	ps@mxene@bnns	NOUN
fumecheng-12767	220	5	composite	composite	NOUN
fumecheng-12767	220	6	developed	develop	VERB
fumecheng-12767	220	7	in	in	ADP
fumecheng-12767	220	8	this	this	DET
fumecheng-12767	220	9	study	study	NOUN
fumecheng-12767	220	10	shows	show	VERB
fumecheng-12767	220	11	significant	significant	ADJ
fumecheng-12767	220	12	potential	potential	NOUN
fumecheng-12767	220	13	for	for	ADP
fumecheng-12767	220	14	use	use	NOUN
fumecheng-12767	220	15	in	in	ADP
fumecheng-12767	220	16	electronic	electronic	ADJ
fumecheng-12767	220	17	devices	device	NOUN
fumecheng-12767	220	18	requiring	require	VERB
fumecheng-12767	220	19	electromagnetic	electromagnetic	ADJ
fumecheng-12767	220	20	wave	wave	NOUN
fumecheng-12767	220	21	shielding	shielding	NOUN
fumecheng-12767	220	22	.	.	PUNCT
fumecheng-12767	221	1	it	it	PRON
fumecheng-12767	221	2	is	be	AUX
fumecheng-12767	221	3	particularly	particularly	ADV
fumecheng-12767	221	4	suitable	suitable	ADJ
fumecheng-12767	221	5	for	for	ADP
fumecheng-12767	221	6	applications	application	NOUN
fumecheng-12767	221	7	where	where	SCONJ
fumecheng-12767	221	8	insulation	insulation	NOUN
fumecheng-12767	221	9	,	,	PUNCT
fumecheng-12767	221	10	low	low	ADJ
fumecheng-12767	221	11	-	-	PUNCT
fumecheng-12767	221	12	frequency	frequency	NOUN
fumecheng-12767	221	13	electromagnetic	electromagnetic	ADJ
fumecheng-12767	221	14	wave	wave	NOUN
fumecheng-12767	221	15	generation	generation	NOUN
fumecheng-12767	221	16	,	,	PUNCT
fumecheng-12767	221	17	and	and	CCONJ
fumecheng-12767	221	18	thin	thin	ADJ
fumecheng-12767	221	19	material	material	NOUN
fumecheng-12767	221	20	thickness	thickness	NOUN
fumecheng-12767	221	21	are	be	AUX
fumecheng-12767	221	22	essential	essential	ADJ
fumecheng-12767	221	23	.	.	PUNCT
fumecheng-12767	222	1	additionally	additionally	ADV
fumecheng-12767	222	2	,	,	PUNCT
fumecheng-12767	222	3	the	the	DET
fumecheng-12767	222	4	method	method	NOUN
fumecheng-12767	222	5	proposed	propose	VERB
fumecheng-12767	222	6	in	in	ADP
fumecheng-12767	222	7	this	this	DET
fumecheng-12767	222	8	study	study	NOUN
fumecheng-12767	222	9	offers	offer	VERB
fumecheng-12767	222	10	a	a	DET
fumecheng-12767	222	11	solution	solution	NOUN
fumecheng-12767	222	12	for	for	ADP
fumecheng-12767	222	13	both	both	CCONJ
fumecheng-12767	222	14	thermal	thermal	ADJ
fumecheng-12767	222	15	management	management	NOUN
fumecheng-12767	222	16	and	and	CCONJ
fumecheng-12767	222	17	electromagnetic	electromagnetic	ADJ
fumecheng-12767	222	18	wave	wave	NOUN
fumecheng-12767	222	19	shielding	shielding	NOUN
fumecheng-12767	222	20	,	,	PUNCT
fumecheng-12767	222	21	providing	provide	VERB
fumecheng-12767	222	22	a	a	DET
fumecheng-12767	222	23	practical	practical	ADJ
fumecheng-12767	222	24	approach	approach	NOUN
fumecheng-12767	222	25	for	for	ADP
fumecheng-12767	222	26	manufacturing	manufacture	VERB
fumecheng-12767	222	27	a	a	DET
fumecheng-12767	222	28	dual	dual	ADJ
fumecheng-12767	222	29	conduction	conduction	NOUN
fumecheng-12767	222	30	path	path	NOUN
fumecheng-12767	222	31	(	(	PUNCT
fumecheng-12767	222	32	thermal	thermal	ADJ
fumecheng-12767	222	33	and	and	CCONJ
fumecheng-12767	222	34	electrical	electrical	ADJ
fumecheng-12767	222	35	conduction	conduction	NOUN
fumecheng-12767	222	36	)	)	PUNCT
fumecheng-12767	222	37	.	.	PUNCT
fumecheng-12767	223	1	acknowledgement	acknowledgement	NOUN
fumecheng-12767	223	2	:	:	PUNCT
fumecheng-12767	223	3	this	this	DET
fumecheng-12767	223	4	research	research	NOUN
fumecheng-12767	223	5	was	be	AUX
fumecheng-12767	223	6	supported	support	VERB
fumecheng-12767	223	7	by	by	ADP
fumecheng-12767	223	8	grdc	grdc	PROPN
fumecheng-12767	223	9	(	(	PUNCT
fumecheng-12767	223	10	global	global	ADJ
fumecheng-12767	223	11	research	research	PROPN
fumecheng-12767	223	12	development	development	NOUN
fumecheng-12767	223	13	center	center	NOUN
fumecheng-12767	223	14	)	)	PUNCT
fumecheng-12767	223	15	cooperative	cooperative	ADJ
fumecheng-12767	223	16	hub	hub	NOUN
fumecheng-12767	223	17	program	program	NOUN
fumecheng-12767	223	18	through	through	ADP
fumecheng-12767	223	19	the	the	DET
fumecheng-12767	223	20	national	national	PROPN
fumecheng-12767	223	21	research	research	PROPN
fumecheng-12767	223	22	foundation	foundation	PROPN
fumecheng-12767	223	23	of	of	ADP
fumecheng-12767	223	24	korea(nrf	korea(nrf	PROPN
fumecheng-12767	223	25	)	)	PUNCT
fumecheng-12767	223	26	funded	fund	VERB
fumecheng-12767	223	27	by	by	ADP
fumecheng-12767	223	28	the	the	DET
fumecheng-12767	223	29	ministry	ministry	PROPN
fumecheng-12767	223	30	of	of	ADP
fumecheng-12767	223	31	science	science	NOUN
fumecheng-12767	223	32	and	and	CCONJ
fumecheng-12767	223	33	ict(msit	ict(msit	NOUN
fumecheng-12767	223	34	)	)	PUNCT
fumecheng-12767	223	35	(	(	PUNCT
fumecheng-12767	223	36	rs-2023	rs-2023	NOUN
fumecheng-12767	223	37	-	-	PUNCT
fumecheng-12767	223	38	00257595	00257595	NUM
fumecheng-12767	223	39	)	)	PUNCT
fumecheng-12767	223	40	.	.	PUNCT
fumecheng-12767	224	1	mechanically	mechanically	ADV
fumecheng-12767	224	2	pressed	press	VERB
fumecheng-12767	224	3	polymer	polymer	NOUN
fumecheng-12767	224	4	-	-	PUNCT
fumecheng-12767	224	5	matrix	matrix	NOUN
fumecheng-12767	224	6	composites	composite	NOUN
fumecheng-12767	224	7	with	with	ADP
fumecheng-12767	224	8	3d	3d	NUM
fumecheng-12767	224	9	structured	structured	ADJ
fumecheng-12767	224	10	filler	filler	NOUN
fumecheng-12767	224	11	networks	network	NOUN
fumecheng-12767	224	12	...	...	PUNCT
fumecheng-12767	224	13	613	613	NUM
fumecheng-12767	224	14	references	reference	NOUN
fumecheng-12767	224	15	1	1	NUM
fumecheng-12767	224	16	.	.	PUNCT
fumecheng-12767	224	17	shahzad	shahzad	PROPN
fumecheng-12767	224	18	,	,	PUNCT
fumecheng-12767	224	19	f.	f.	PROPN
fumecheng-12767	224	20	,	,	PUNCT
fumecheng-12767	224	21	alhabeb	alhabeb	PROPN
fumecheng-12767	224	22	,	,	PUNCT
fumecheng-12767	224	23	m.	m.	NOUN
fumecheng-12767	224	24	,	,	PUNCT
fumecheng-12767	224	25	hatter	hatter	NOUN
fumecheng-12767	224	26	,	,	PUNCT
fumecheng-12767	224	27	c.b	c.b	PROPN
fumecheng-12767	224	28	.	.	PROPN
fumecheng-12767	224	29	,	,	PUNCT
fumecheng-12767	224	30	anasori	anasori	PROPN
fumecheng-12767	224	31	,	,	PUNCT
fumecheng-12767	224	32	b.	b.	PROPN
fumecheng-12767	224	33	,	,	PUNCT
fumecheng-12767	224	34	man	man	NOUN
fumecheng-12767	224	35	hong	hong	PROPN
fumecheng-12767	224	36	,	,	PUNCT
fumecheng-12767	224	37	s.	s.	PROPN
fumecheng-12767	224	38	,	,	PUNCT
fumecheng-12767	224	39	koo	koo	PROPN
fumecheng-12767	224	40	,	,	PUNCT
fumecheng-12767	224	41	c.m	c.m	PROPN
fumecheng-12767	224	42	.	.	PROPN
fumecheng-12767	224	43	,	,	PUNCT
fumecheng-12767	224	44	gogotsi	gogotsi	PROPN
fumecheng-12767	224	45	,	,	PUNCT
fumecheng-12767	224	46	y.	y.	NOUN
fumecheng-12767	224	47	,	,	PUNCT
fumecheng-12767	224	48	2016	2016	NUM
fumecheng-12767	224	49	,	,	PUNCT
fumecheng-12767	224	50	electromagnetic	electromagnetic	ADJ
fumecheng-12767	224	51	interference	interference	NOUN
fumecheng-12767	224	52	shielding	shielding	NOUN
fumecheng-12767	224	53	with	with	ADP
fumecheng-12767	224	54	2d	2d	NUM
fumecheng-12767	224	55	transition	transition	NOUN
fumecheng-12767	224	56	metal	metal	NOUN
fumecheng-12767	224	57	carbides	carbide	NOUN
fumecheng-12767	224	58	(	(	PUNCT
fumecheng-12767	224	59	mxenes	mxene	NOUN
fumecheng-12767	224	60	)	)	PUNCT
fumecheng-12767	224	61	,	,	PUNCT
fumecheng-12767	224	62	science	science	NOUN
fumecheng-12767	224	63	,	,	PUNCT
fumecheng-12767	224	64	353(6304	353(6304	NUM
fumecheng-12767	224	65	)	)	PUNCT
fumecheng-12767	224	66	,	,	PUNCT
fumecheng-12767	224	67	pp	pp	PROPN
fumecheng-12767	224	68	.	.	PUNCT
fumecheng-12767	224	69	1137	1137	NUM
fumecheng-12767	224	70	-	-	SYM
fumecheng-12767	224	71	1140	1140	NUM
fumecheng-12767	224	72	.	.	PUNCT
fumecheng-12767	225	1	2	2	NUM
fumecheng-12767	225	2	.	.	X
fumecheng-12767	225	3	li	li	PROPN
fumecheng-12767	225	4	,	,	PUNCT
fumecheng-12767	225	5	n.	n.	PROPN
fumecheng-12767	225	6	,	,	PUNCT
fumecheng-12767	225	7	huang	huang	PROPN
fumecheng-12767	225	8	,	,	PUNCT
fumecheng-12767	225	9	y.	y.	PROPN
fumecheng-12767	225	10	,	,	PUNCT
fumecheng-12767	225	11	du	du	PROPN
fumecheng-12767	225	12	,	,	PUNCT
fumecheng-12767	225	13	f.	f.	PROPN
fumecheng-12767	225	14	,	,	PUNCT
fumecheng-12767	225	15	he	he	PRON
fumecheng-12767	225	16	,	,	PUNCT
fumecheng-12767	225	17	x.	x.	PROPN
fumecheng-12767	225	18	,	,	PUNCT
fumecheng-12767	225	19	lin	lin	PROPN
fumecheng-12767	225	20	,	,	PUNCT
fumecheng-12767	225	21	x.	x.	PROPN
fumecheng-12767	225	22	,	,	PUNCT
fumecheng-12767	225	23	gao	gao	PROPN
fumecheng-12767	225	24	,	,	PUNCT
fumecheng-12767	225	25	h.	h.	PROPN
fumecheng-12767	225	26	,	,	PUNCT
fumecheng-12767	225	27	ma	ma	PROPN
fumecheng-12767	225	28	,	,	PUNCT
fumecheng-12767	225	29	y.	y.	PROPN
fumecheng-12767	225	30	,	,	PUNCT
fumecheng-12767	225	31	li	li	PROPN
fumecheng-12767	225	32	,	,	PUNCT
fumecheng-12767	225	33	f.	f.	PROPN
fumecheng-12767	225	34	,	,	PUNCT
fumecheng-12767	225	35	chen	chen	PROPN
fumecheng-12767	225	36	,	,	PUNCT
fumecheng-12767	225	37	y.	y.	PROPN
fumecheng-12767	225	38	,	,	PUNCT
fumecheng-12767	225	39	eklund	eklund	PROPN
fumecheng-12767	225	40	,	,	PUNCT
fumecheng-12767	225	41	p.c	p.c	PROPN
fumecheng-12767	225	42	.	.	PROPN
fumecheng-12767	225	43	,	,	PUNCT
fumecheng-12767	225	44	2006	2006	NUM
fumecheng-12767	225	45	,	,	PUNCT
fumecheng-12767	225	46	electromagnetic	electromagnetic	ADJ
fumecheng-12767	225	47	interference	interference	NOUN
fumecheng-12767	225	48	(	(	PUNCT
fumecheng-12767	225	49	emi	emi	NOUN
fumecheng-12767	225	50	)	)	PUNCT
fumecheng-12767	225	51	shielding	shielding	NOUN
fumecheng-12767	225	52	of	of	ADP
fumecheng-12767	225	53	single	single	ADJ
fumecheng-12767	225	54	-	-	PUNCT
fumecheng-12767	225	55	walled	wall	VERB
fumecheng-12767	225	56	carbon	carbon	NOUN
fumecheng-12767	225	57	nanotube	nanotube	NOUN
fumecheng-12767	225	58	epoxy	epoxy	NOUN
fumecheng-12767	225	59	composites	composite	NOUN
fumecheng-12767	225	60	,	,	PUNCT
fumecheng-12767	225	61	nano	nano	NOUN
fumecheng-12767	225	62	letters	letter	NOUN
fumecheng-12767	225	63	,	,	PUNCT
fumecheng-12767	225	64	6(6	6(6	ADJ
fumecheng-12767	225	65	)	)	PUNCT
fumecheng-12767	225	66	,	,	PUNCT
fumecheng-12767	225	67	pp	pp	ADP
fumecheng-12767	225	68	.	.	PUNCT
fumecheng-12767	225	69	11411145	11411145	NUM
fumecheng-12767	225	70	.	.	PUNCT
fumecheng-12767	226	1	3	3	X
fumecheng-12767	226	2	.	.	X
fumecheng-12767	226	3	al	al	PROPN
fumecheng-12767	226	4	-	-	PUNCT
fumecheng-12767	226	5	saleh	saleh	PROPN
fumecheng-12767	226	6	,	,	PUNCT
fumecheng-12767	226	7	m.h	m.h	PROPN
fumecheng-12767	226	8	.	.	PROPN
fumecheng-12767	226	9	,	,	PUNCT
fumecheng-12767	226	10	saadeh	saadeh	PROPN
fumecheng-12767	226	11	,	,	PUNCT
fumecheng-12767	226	12	w.h	w.h	PROPN
fumecheng-12767	226	13	.	.	PROPN
fumecheng-12767	226	14	,	,	PUNCT
fumecheng-12767	226	15	sundararaj	sundararaj	PROPN
fumecheng-12767	226	16	,	,	PUNCT
fumecheng-12767	226	17	u.	u.	NOUN
fumecheng-12767	226	18	,	,	PUNCT
fumecheng-12767	226	19	2013	2013	NUM
fumecheng-12767	226	20	,	,	PUNCT
fumecheng-12767	226	21	emi	emi	NOUN
fumecheng-12767	226	22	shielding	shielding	NOUN
fumecheng-12767	226	23	effectiveness	effectiveness	NOUN
fumecheng-12767	226	24	of	of	ADP
fumecheng-12767	226	25	carbon	carbon	NOUN
fumecheng-12767	226	26	based	base	VERB
fumecheng-12767	226	27	nanostructured	nanostructure	VERB
fumecheng-12767	226	28	polymeric	polymeric	ADJ
fumecheng-12767	226	29	materials	material	NOUN
fumecheng-12767	226	30	:	:	PUNCT
fumecheng-12767	226	31	a	a	DET
fumecheng-12767	226	32	comparative	comparative	ADJ
fumecheng-12767	226	33	study	study	NOUN
fumecheng-12767	226	34	,	,	PUNCT
fumecheng-12767	226	35	carbon	carbon	NOUN
fumecheng-12767	226	36	,	,	PUNCT
fumecheng-12767	226	37	60	60	NUM
fumecheng-12767	226	38	,	,	PUNCT
fumecheng-12767	226	39	pp	pp	ADJ
fumecheng-12767	226	40	.	.	PUNCT
fumecheng-12767	227	1	146	146	NUM
fumecheng-12767	227	2	-	-	SYM
fumecheng-12767	227	3	156	156	NUM
fumecheng-12767	227	4	.	.	PUNCT
fumecheng-12767	228	1	4	4	X
fumecheng-12767	228	2	.	.	X
fumecheng-12767	228	3	ha	ha	INTJ
fumecheng-12767	228	4	,	,	PUNCT
fumecheng-12767	228	5	h.	h.	PROPN
fumecheng-12767	228	6	,	,	PUNCT
fumecheng-12767	228	7	qaiser	qaiser	PROPN
fumecheng-12767	228	8	,	,	PUNCT
fumecheng-12767	228	9	n.	n.	PROPN
fumecheng-12767	228	10	,	,	PUNCT
fumecheng-12767	228	11	yun	yun	PROPN
fumecheng-12767	228	12	,	,	PUNCT
fumecheng-12767	228	13	t.g	t.g	PROPN
fumecheng-12767	228	14	.	.	PROPN
fumecheng-12767	228	15	,	,	PUNCT
fumecheng-12767	228	16	cheong	cheong	PROPN
fumecheng-12767	228	17	,	,	PUNCT
fumecheng-12767	228	18	j.y	j.y	PROPN
fumecheng-12767	228	19	.	.	PROPN
fumecheng-12767	228	20	,	,	PUNCT
fumecheng-12767	228	21	lim	lim	PROPN
fumecheng-12767	228	22	,	,	PUNCT
fumecheng-12767	228	23	s.	s.	PROPN
fumecheng-12767	228	24	,	,	PUNCT
fumecheng-12767	228	25	hwang	hwang	PROPN
fumecheng-12767	228	26	,	,	PUNCT
fumecheng-12767	228	27	b.	b.	PROPN
fumecheng-12767	228	28	,	,	PUNCT
fumecheng-12767	228	29	2023	2023	NUM
fumecheng-12767	228	30	,	,	PUNCT
fumecheng-12767	228	31	sensing	sense	VERB
fumecheng-12767	228	32	mechanism	mechanism	NOUN
fumecheng-12767	228	33	and	and	CCONJ
fumecheng-12767	228	34	application	application	NOUN
fumecheng-12767	228	35	of	of	ADP
fumecheng-12767	228	36	mechanical	mechanical	ADJ
fumecheng-12767	228	37	strain	strain	NOUN
fumecheng-12767	228	38	sensor	sensor	NOUN
fumecheng-12767	228	39	:	:	PUNCT
fumecheng-12767	228	40	a	a	DET
fumecheng-12767	228	41	mini	mini	NOUN
fumecheng-12767	228	42	-	-	NOUN
fumecheng-12767	228	43	review	review	NOUN
fumecheng-12767	228	44	,	,	PUNCT
fumecheng-12767	228	45	facta	facta	PROPN
fumecheng-12767	228	46	universitatis	universitatis	PROPN
fumecheng-12767	228	47	-	-	PUNCT
fumecheng-12767	228	48	series	series	NOUN
fumecheng-12767	228	49	mechanical	mechanical	ADJ
fumecheng-12767	228	50	engineering	engineering	NOUN
fumecheng-12767	228	51	,	,	PUNCT
fumecheng-12767	228	52	21(4	21(4	NUM
fumecheng-12767	228	53	)	)	PUNCT
fumecheng-12767	228	54	,	,	PUNCT
fumecheng-12767	228	55	pp	pp	ADJ
fumecheng-12767	228	56	.	.	PUNCT
fumecheng-12767	229	1	751	751	NUM
fumecheng-12767	229	2	-	-	SYM
fumecheng-12767	229	3	772	772	NUM
fumecheng-12767	229	4	.	.	NOUN
fumecheng-12767	230	1	5	5	NUM
fumecheng-12767	230	2	.	.	X
fumecheng-12767	230	3	kim	kim	PROPN
fumecheng-12767	230	4	,	,	PUNCT
fumecheng-12767	230	5	h.	h.	PROPN
fumecheng-12767	230	6	,	,	PUNCT
fumecheng-12767	230	7	qaiser	qaiser	PROPN
fumecheng-12767	230	8	,	,	PUNCT
fumecheng-12767	230	9	n.	n.	PROPN
fumecheng-12767	230	10	,	,	PUNCT
fumecheng-12767	230	11	hwang	hwang	PROPN
fumecheng-12767	230	12	,	,	PUNCT
fumecheng-12767	230	13	b.	b.	PROPN
fumecheng-12767	230	14	,	,	PUNCT
fumecheng-12767	230	15	2023	2023	NUM
fumecheng-12767	230	16	,	,	PUNCT
fumecheng-12767	230	17	electro	electro	ADJ
fumecheng-12767	230	18	-	-	PUNCT
fumecheng-12767	230	19	mechanical	mechanical	ADJ
fumecheng-12767	230	20	response	response	NOUN
fumecheng-12767	230	21	of	of	ADP
fumecheng-12767	230	22	stretchable	stretchable	ADJ
fumecheng-12767	230	23	pdms	pdms	NOUN
fumecheng-12767	230	24	composites	composite	NOUN
fumecheng-12767	230	25	with	with	ADP
fumecheng-12767	230	26	a	a	DET
fumecheng-12767	230	27	hybrid	hybrid	ADJ
fumecheng-12767	230	28	filler	filler	NOUN
fumecheng-12767	230	29	system	system	NOUN
fumecheng-12767	230	30	,	,	PUNCT
fumecheng-12767	230	31	facta	facta	PROPN
fumecheng-12767	230	32	universitatis	universitatis	PROPN
fumecheng-12767	230	33	-	-	PUNCT
fumecheng-12767	230	34	series	series	NOUN
fumecheng-12767	230	35	mechanical	mechanical	ADJ
fumecheng-12767	230	36	engineering	engineering	NOUN
fumecheng-12767	230	37	,	,	PUNCT
fumecheng-12767	230	38	21(1	21(1	NUM
fumecheng-12767	230	39	)	)	PUNCT
fumecheng-12767	230	40	,	,	PUNCT
fumecheng-12767	230	41	pp	pp	PROPN
fumecheng-12767	230	42	.	.	PUNCT
fumecheng-12767	230	43	051	051	NUM
fumecheng-12767	230	44	-	-	PUNCT
fumecheng-12767	230	45	061	061	NUM
fumecheng-12767	230	46	.	.	PUNCT
fumecheng-12767	231	1	6	6	NUM
fumecheng-12767	231	2	.	.	X
fumecheng-12767	231	3	choi	choi	NOUN
fumecheng-12767	231	4	,	,	PUNCT
fumecheng-12767	231	5	c.	c.	PROPN
fumecheng-12767	231	6	,	,	PUNCT
fumecheng-12767	231	7	ashby	ashby	PROPN
fumecheng-12767	231	8	,	,	PUNCT
fumecheng-12767	231	9	d.s	d.s	PROPN
fumecheng-12767	231	10	.	.	PROPN
fumecheng-12767	231	11	,	,	PUNCT
fumecheng-12767	231	12	butts	butts	NOUN
fumecheng-12767	231	13	,	,	PUNCT
fumecheng-12767	231	14	d.m	d.m	PROPN
fumecheng-12767	231	15	.	.	PROPN
fumecheng-12767	231	16	,	,	PUNCT
fumecheng-12767	231	17	deblock	deblock	NOUN
fumecheng-12767	231	18	,	,	PUNCT
fumecheng-12767	231	19	r.h	r.h	PROPN
fumecheng-12767	231	20	.	.	PROPN
fumecheng-12767	231	21	,	,	PUNCT
fumecheng-12767	231	22	wei	wei	PROPN
fumecheng-12767	231	23	,	,	PUNCT
fumecheng-12767	231	24	q.	q.	PROPN
fumecheng-12767	231	25	,	,	PUNCT
fumecheng-12767	231	26	lau	lau	PROPN
fumecheng-12767	231	27	,	,	PUNCT
fumecheng-12767	231	28	j.	j.	PROPN
fumecheng-12767	231	29	,	,	PUNCT
fumecheng-12767	231	30	dunn	dunn	PROPN
fumecheng-12767	231	31	,	,	PUNCT
fumecheng-12767	231	32	b.	b.	PROPN
fumecheng-12767	231	33	,	,	PUNCT
fumecheng-12767	231	34	2020	2020	NUM
fumecheng-12767	231	35	,	,	PUNCT
fumecheng-12767	231	36	achieving	achieve	VERB
fumecheng-12767	231	37	high	high	ADJ
fumecheng-12767	231	38	energy	energy	NOUN
fumecheng-12767	231	39	density	density	NOUN
fumecheng-12767	231	40	and	and	CCONJ
fumecheng-12767	231	41	high	high	ADJ
fumecheng-12767	231	42	power	power	NOUN
fumecheng-12767	231	43	density	density	NOUN
fumecheng-12767	231	44	with	with	ADP
fumecheng-12767	231	45	pseudocapacitive	pseudocapacitive	ADJ
fumecheng-12767	231	46	materials	material	NOUN
fumecheng-12767	231	47	,	,	PUNCT
fumecheng-12767	231	48	nature	nature	NOUN
fumecheng-12767	231	49	reviews	review	VERB
fumecheng-12767	231	50	materials	material	NOUN
fumecheng-12767	231	51	,	,	PUNCT
fumecheng-12767	231	52	5(1	5(1	NUM
fumecheng-12767	231	53	)	)	PUNCT
fumecheng-12767	231	54	,	,	PUNCT
fumecheng-12767	231	55	pp	pp	ADJ
fumecheng-12767	231	56	.	.	PUNCT
fumecheng-12767	232	1	5	5	NUM
fumecheng-12767	232	2	-	-	SYM
fumecheng-12767	232	3	19	19	NUM
fumecheng-12767	232	4	.	.	NOUN
fumecheng-12767	232	5	7	7	NUM
fumecheng-12767	232	6	.	.	PUNCT
fumecheng-12767	233	1	asmatulu	asmatulu	VERB
fumecheng-12767	233	2	,	,	PUNCT
fumecheng-12767	233	3	r.	r.	PROPN
fumecheng-12767	233	4	,	,	PUNCT
fumecheng-12767	233	5	bollavaram	bollavaram	PROPN
fumecheng-12767	233	6	,	,	PUNCT
fumecheng-12767	233	7	p.k	p.k	PROPN
fumecheng-12767	233	8	.	.	PROPN
fumecheng-12767	233	9	,	,	PUNCT
fumecheng-12767	233	10	patlolla	patlolla	PROPN
fumecheng-12767	233	11	,	,	PUNCT
fumecheng-12767	233	12	v.r	v.r	PROPN
fumecheng-12767	233	13	.	.	PROPN
fumecheng-12767	233	14	,	,	PUNCT
fumecheng-12767	233	15	alarifi	alarifi	PROPN
fumecheng-12767	233	16	,	,	PUNCT
fumecheng-12767	233	17	i.m	i.m	PROPN
fumecheng-12767	233	18	.	.	PROPN
fumecheng-12767	233	19	,	,	PUNCT
fumecheng-12767	233	20	khan	khan	PROPN
fumecheng-12767	233	21	,	,	PUNCT
fumecheng-12767	233	22	w.s	w.s	PROPN
fumecheng-12767	233	23	.	.	PROPN
fumecheng-12767	233	24	,	,	PUNCT
fumecheng-12767	233	25	2020	2020	NUM
fumecheng-12767	233	26	,	,	PUNCT
fumecheng-12767	233	27	investigating	investigate	VERB
fumecheng-12767	233	28	the	the	DET
fumecheng-12767	233	29	effects	effect	NOUN
fumecheng-12767	233	30	of	of	ADP
fumecheng-12767	233	31	metallic	metallic	ADJ
fumecheng-12767	233	32	submicron	submicron	NOUN
fumecheng-12767	233	33	and	and	CCONJ
fumecheng-12767	233	34	nanofilms	nanofilm	NOUN
fumecheng-12767	233	35	on	on	ADP
fumecheng-12767	233	36	fiber	fiber	NOUN
fumecheng-12767	233	37	-	-	PUNCT
fumecheng-12767	233	38	reinforced	reinforce	VERB
fumecheng-12767	233	39	composites	composite	NOUN
fumecheng-12767	233	40	for	for	ADP
fumecheng-12767	233	41	lightning	lightning	NOUN
fumecheng-12767	233	42	strike	strike	NOUN
fumecheng-12767	233	43	protection	protection	NOUN
fumecheng-12767	233	44	and	and	CCONJ
fumecheng-12767	233	45	emi	emi	NOUN
fumecheng-12767	233	46	shielding	shielding	NOUN
fumecheng-12767	233	47	,	,	PUNCT
fumecheng-12767	233	48	advanced	advanced	ADJ
fumecheng-12767	233	49	composites	composite	NOUN
fumecheng-12767	233	50	and	and	CCONJ
fumecheng-12767	233	51	hybrid	hybrid	ADJ
fumecheng-12767	233	52	materials	material	NOUN
fumecheng-12767	233	53	,	,	PUNCT
fumecheng-12767	233	54	3	3	NUM
fumecheng-12767	233	55	,	,	PUNCT
fumecheng-12767	233	56	pp	pp	ADJ
fumecheng-12767	233	57	.	.	PUNCT
fumecheng-12767	234	1	66	66	NUM
fumecheng-12767	234	2	-	-	SYM
fumecheng-12767	234	3	83	83	NUM
fumecheng-12767	234	4	.	.	NOUN
fumecheng-12767	235	1	8	8	NUM
fumecheng-12767	235	2	.	.	X
fumecheng-12767	236	1	bayat	bayat	PROPN
fumecheng-12767	236	2	,	,	PUNCT
fumecheng-12767	236	3	a.	a.	PROPN
fumecheng-12767	236	4	,	,	PUNCT
fumecheng-12767	236	5	ebrahimi	ebrahimi	PROPN
fumecheng-12767	236	6	,	,	PUNCT
fumecheng-12767	236	7	m.	m.	NOUN
fumecheng-12767	236	8	,	,	PUNCT
fumecheng-12767	236	9	ardekani	ardekani	PROPN
fumecheng-12767	236	10	,	,	PUNCT
fumecheng-12767	236	11	s.r	s.r	PROPN
fumecheng-12767	236	12	.	.	PROPN
fumecheng-12767	236	13	,	,	PUNCT
fumecheng-12767	236	14	iranizad	iranizad	PROPN
fumecheng-12767	236	15	,	,	PUNCT
fumecheng-12767	236	16	e.s	e.s	PROPN
fumecheng-12767	236	17	.	.	PROPN
fumecheng-12767	236	18	,	,	PUNCT
fumecheng-12767	236	19	moshfegh	moshfegh	VERB
fumecheng-12767	236	20	,	,	PUNCT
fumecheng-12767	236	21	a.z	a.z	PROPN
fumecheng-12767	236	22	.	.	PROPN
fumecheng-12767	236	23	,	,	PUNCT
fumecheng-12767	236	24	2021	2021	NUM
fumecheng-12767	236	25	,	,	PUNCT
fumecheng-12767	236	26	extended	extend	VERB
fumecheng-12767	236	27	gibbs	gibbs	PROPN
fumecheng-12767	236	28	free	free	ADJ
fumecheng-12767	236	29	energy	energy	NOUN
fumecheng-12767	236	30	and	and	CCONJ
fumecheng-12767	236	31	laplace	laplace	NOUN
fumecheng-12767	236	32	pressure	pressure	NOUN
fumecheng-12767	236	33	of	of	ADP
fumecheng-12767	236	34	ordered	order	VERB
fumecheng-12767	236	35	hexagonal	hexagonal	ADJ
fumecheng-12767	236	36	close	close	ADV
fumecheng-12767	236	37	-	-	PUNCT
fumecheng-12767	236	38	packed	pack	VERB
fumecheng-12767	236	39	spherical	spherical	ADJ
fumecheng-12767	236	40	particles	particle	NOUN
fumecheng-12767	236	41	:	:	PUNCT
fumecheng-12767	236	42	a	a	DET
fumecheng-12767	236	43	wettability	wettability	NOUN
fumecheng-12767	236	44	study	study	NOUN
fumecheng-12767	236	45	,	,	PUNCT
fumecheng-12767	236	46	langmuir	langmuir	PROPN
fumecheng-12767	236	47	,	,	PUNCT
fumecheng-12767	236	48	37(28	37(28	NOUN
fumecheng-12767	236	49	)	)	PUNCT
fumecheng-12767	236	50	,	,	PUNCT
fumecheng-12767	236	51	pp	pp	ADP
fumecheng-12767	236	52	.	.	PUNCT
fumecheng-12767	237	1	8382	8382	NUM
fumecheng-12767	237	2	-	-	SYM
fumecheng-12767	237	3	8392	8392	NUM
fumecheng-12767	237	4	.	.	PUNCT
fumecheng-12767	238	1	9	9	X
fumecheng-12767	238	2	.	.	X
fumecheng-12767	238	3	choi	choi	NOUN
fumecheng-12767	238	4	,	,	PUNCT
fumecheng-12767	238	5	c.	c.	PROPN
fumecheng-12767	238	6	,	,	PUNCT
fumecheng-12767	238	7	lim	lim	PROPN
fumecheng-12767	238	8	,	,	PUNCT
fumecheng-12767	238	9	s.	s.	PROPN
fumecheng-12767	238	10	,	,	PUNCT
fumecheng-12767	238	11	yun	yun	PROPN
fumecheng-12767	238	12	,	,	PUNCT
fumecheng-12767	238	13	t.g	t.g	PROPN
fumecheng-12767	238	14	.	.	PROPN
fumecheng-12767	238	15	,	,	PUNCT
fumecheng-12767	238	16	marinkovic	marinkovic	PROPN
fumecheng-12767	238	17	,	,	PUNCT
fumecheng-12767	238	18	d.	d.	PROPN
fumecheng-12767	238	19	,	,	PUNCT
fumecheng-12767	238	20	matteini	matteini	PROPN
fumecheng-12767	238	21	,	,	PUNCT
fumecheng-12767	238	22	p.	p.	PROPN
fumecheng-12767	238	23	,	,	PUNCT
fumecheng-12767	238	24	hwang	hwang	PROPN
fumecheng-12767	238	25	,	,	PUNCT
fumecheng-12767	238	26	b.	b.	PROPN
fumecheng-12767	238	27	,	,	PUNCT
fumecheng-12767	238	28	2024	2024	NUM
fumecheng-12767	238	29	,	,	PUNCT
fumecheng-12767	238	30	ag	ag	PROPN
fumecheng-12767	238	31	nanowire	nanowire	NOUN
fumecheng-12767	238	32	-	-	PUNCT
fumecheng-12767	238	33	based	base	VERB
fumecheng-12767	238	34	conductive	conductive	ADJ
fumecheng-12767	238	35	textiles	textile	NOUN
fumecheng-12767	238	36	for	for	ADP
fumecheng-12767	238	37	electronic	electronic	ADJ
fumecheng-12767	238	38	devices	device	NOUN
fumecheng-12767	238	39	:	:	PUNCT
fumecheng-12767	238	40	an	an	DET
fumecheng-12767	238	41	introductory	introductory	ADJ
fumecheng-12767	238	42	review	review	NOUN
fumecheng-12767	238	43	,	,	PUNCT
fumecheng-12767	238	44	nano	nano	NOUN
fumecheng-12767	238	45	,	,	PUNCT
fumecheng-12767	238	46	doi	doi	NOUN
fumecheng-12767	238	47	:	:	PUNCT
fumecheng-12767	238	48	10.1142	10.1142	NUM
fumecheng-12767	238	49	/	/	SYM
fumecheng-12767	238	50	s1793292024300123	s1793292024300123	NOUN
fumecheng-12767	238	51	10	10	NUM
fumecheng-12767	238	52	.	.	PUNCT
fumecheng-12767	239	1	thomassin	thomassin	PROPN
fumecheng-12767	239	2	,	,	PUNCT
fumecheng-12767	239	3	j.-m	j.-m	PROPN
fumecheng-12767	239	4	.	.	PUNCT
fumecheng-12767	239	5	,	,	PUNCT
fumecheng-12767	239	6	jérôme	jérôme	PROPN
fumecheng-12767	239	7	,	,	PUNCT
fumecheng-12767	239	8	c.	c.	PROPN
fumecheng-12767	239	9	,	,	PUNCT
fumecheng-12767	239	10	pardoen	pardoen	NOUN
fumecheng-12767	239	11	,	,	PUNCT
fumecheng-12767	239	12	t.	t.	PROPN
fumecheng-12767	239	13	,	,	PUNCT
fumecheng-12767	239	14	bailly	bailly	ADV
fumecheng-12767	239	15	,	,	PUNCT
fumecheng-12767	239	16	c.	c.	PROPN
fumecheng-12767	239	17	,	,	PUNCT
fumecheng-12767	239	18	huynen	huynen	PROPN
fumecheng-12767	239	19	,	,	PUNCT
fumecheng-12767	239	20	i.	i.	PROPN
fumecheng-12767	239	21	,	,	PUNCT
fumecheng-12767	239	22	detrembleur	detrembleur	PROPN
fumecheng-12767	239	23	,	,	PUNCT
fumecheng-12767	239	24	c.	c.	PROPN
fumecheng-12767	239	25	,	,	PUNCT
fumecheng-12767	239	26	2013	2013	NUM
fumecheng-12767	239	27	,	,	PUNCT
fumecheng-12767	239	28	polymer	polymer	NOUN
fumecheng-12767	239	29	/	/	SYM
fumecheng-12767	239	30	carbon	carbon	NOUN
fumecheng-12767	239	31	based	base	VERB
fumecheng-12767	239	32	composites	composite	NOUN
fumecheng-12767	239	33	as	as	ADP
fumecheng-12767	239	34	electromagnetic	electromagnetic	ADJ
fumecheng-12767	239	35	interference	interference	NOUN
fumecheng-12767	239	36	(	(	PUNCT
fumecheng-12767	239	37	emi	emi	NOUN
fumecheng-12767	239	38	)	)	PUNCT
fumecheng-12767	239	39	shielding	shielding	NOUN
fumecheng-12767	239	40	materials	material	NOUN
fumecheng-12767	239	41	,	,	PUNCT
fumecheng-12767	239	42	materials	material	NOUN
fumecheng-12767	239	43	science	science	NOUN
fumecheng-12767	239	44	and	and	CCONJ
fumecheng-12767	239	45	engineering	engineering	NOUN
fumecheng-12767	239	46	:	:	PUNCT
fumecheng-12767	240	1	r	r	NOUN
fumecheng-12767	240	2	:	:	PUNCT
fumecheng-12767	240	3	reports	report	NOUN
fumecheng-12767	240	4	,	,	PUNCT
fumecheng-12767	240	5	74(7	74(7	NOUN
fumecheng-12767	240	6	)	)	PUNCT
fumecheng-12767	240	7	,	,	PUNCT
fumecheng-12767	240	8	pp	pp	PROPN
fumecheng-12767	240	9	.	.	PUNCT
fumecheng-12767	241	1	211	211	NUM
fumecheng-12767	241	2	-	-	SYM
fumecheng-12767	241	3	232	232	NUM
fumecheng-12767	241	4	.	.	NOUN
fumecheng-12767	242	1	11	11	NUM
fumecheng-12767	242	2	.	.	PUNCT
fumecheng-12767	243	1	naguib	naguib	PROPN
fumecheng-12767	243	2	,	,	PUNCT
fumecheng-12767	243	3	m.	m.	NOUN
fumecheng-12767	243	4	,	,	PUNCT
fumecheng-12767	243	5	mochalin	mochalin	PROPN
fumecheng-12767	243	6	,	,	PUNCT
fumecheng-12767	243	7	v.n	v.n	PROPN
fumecheng-12767	243	8	.	.	PROPN
fumecheng-12767	243	9	,	,	PUNCT
fumecheng-12767	243	10	barsoum	barsoum	PROPN
fumecheng-12767	243	11	,	,	PUNCT
fumecheng-12767	243	12	m.w	m.w	PROPN
fumecheng-12767	243	13	.	.	PROPN
fumecheng-12767	243	14	,	,	PUNCT
fumecheng-12767	243	15	gogotsi	gogotsi	PROPN
fumecheng-12767	243	16	,	,	PUNCT
fumecheng-12767	243	17	y.	y.	NOUN
fumecheng-12767	243	18	,	,	PUNCT
fumecheng-12767	243	19	2014	2014	NUM
fumecheng-12767	243	20	,	,	PUNCT
fumecheng-12767	243	21	25th	25th	ADJ
fumecheng-12767	243	22	anniversary	anniversary	NOUN
fumecheng-12767	243	23	article	article	NOUN
fumecheng-12767	243	24	:	:	PUNCT
fumecheng-12767	243	25	mxenes	mxene	NOUN
fumecheng-12767	243	26	:	:	PUNCT
fumecheng-12767	243	27	a	a	DET
fumecheng-12767	243	28	new	new	ADJ
fumecheng-12767	243	29	family	family	NOUN
fumecheng-12767	243	30	of	of	ADP
fumecheng-12767	243	31	two‐dimensional	two‐dimensional	ADJ
fumecheng-12767	243	32	materials	material	NOUN
fumecheng-12767	243	33	,	,	PUNCT
fumecheng-12767	243	34	advanced	advanced	ADJ
fumecheng-12767	243	35	materials	material	NOUN
fumecheng-12767	243	36	,	,	PUNCT
fumecheng-12767	243	37	26(7	26(7	NOUN
fumecheng-12767	243	38	)	)	PUNCT
fumecheng-12767	243	39	,	,	PUNCT
fumecheng-12767	243	40	pp	pp	ADP
fumecheng-12767	243	41	.	.	PUNCT
fumecheng-12767	244	1	992	992	NUM
fumecheng-12767	244	2	-	-	SYM
fumecheng-12767	244	3	1005	1005	NUM
fumecheng-12767	244	4	.	.	PUNCT
fumecheng-12767	245	1	12	12	NUM
fumecheng-12767	245	2	.	.	PUNCT
fumecheng-12767	246	1	qi	qi	PROPN
fumecheng-12767	246	2	,	,	PUNCT
fumecheng-12767	246	3	f.	f.	PROPN
fumecheng-12767	246	4	,	,	PUNCT
fumecheng-12767	246	5	wang	wang	PROPN
fumecheng-12767	246	6	,	,	PUNCT
fumecheng-12767	246	7	l.	l.	PROPN
fumecheng-12767	246	8	,	,	PUNCT
fumecheng-12767	246	9	zhang	zhang	PROPN
fumecheng-12767	246	10	,	,	PUNCT
fumecheng-12767	246	11	y.	y.	PROPN
fumecheng-12767	246	12	,	,	PUNCT
fumecheng-12767	246	13	ma	ma	PROPN
fumecheng-12767	246	14	,	,	PUNCT
fumecheng-12767	246	15	z.	z.	PROPN
fumecheng-12767	246	16	,	,	PUNCT
fumecheng-12767	246	17	qiu	qiu	PROPN
fumecheng-12767	246	18	,	,	PUNCT
fumecheng-12767	246	19	h.	h.	PROPN
fumecheng-12767	246	20	,	,	PUNCT
fumecheng-12767	246	21	gu	gu	PROPN
fumecheng-12767	246	22	,	,	PUNCT
fumecheng-12767	246	23	j.	j.	PROPN
fumecheng-12767	246	24	,	,	PUNCT
fumecheng-12767	246	25	2021	2021	NUM
fumecheng-12767	246	26	,	,	PUNCT
fumecheng-12767	246	27	robust	robust	ADJ
fumecheng-12767	246	28	ti3c2tx	ti3c2tx	NOUN
fumecheng-12767	246	29	mxene	mxene	NOUN
fumecheng-12767	246	30	/	/	SYM
fumecheng-12767	246	31	starch	starch	NOUN
fumecheng-12767	246	32	derived	derive	VERB
fumecheng-12767	246	33	carbon	carbon	NOUN
fumecheng-12767	246	34	foam	foam	NOUN
fumecheng-12767	246	35	composites	composite	NOUN
fumecheng-12767	246	36	for	for	ADP
fumecheng-12767	246	37	superior	superior	ADJ
fumecheng-12767	246	38	emi	emi	NOUN
fumecheng-12767	246	39	shielding	shielding	NOUN
fumecheng-12767	246	40	and	and	CCONJ
fumecheng-12767	246	41	thermal	thermal	ADJ
fumecheng-12767	246	42	insulation	insulation	NOUN
fumecheng-12767	246	43	,	,	PUNCT
fumecheng-12767	246	44	materials	material	NOUN
fumecheng-12767	246	45	today	today	NOUN
fumecheng-12767	246	46	physics	physics	NOUN
fumecheng-12767	246	47	,	,	PUNCT
fumecheng-12767	246	48	21	21	NUM
fumecheng-12767	246	49	,	,	PUNCT
fumecheng-12767	246	50	100512	100512	NUM
fumecheng-12767	246	51	.	.	PUNCT
fumecheng-12767	247	1	13	13	NUM
fumecheng-12767	247	2	.	.	X
fumecheng-12767	248	1	wang	wang	PROPN
fumecheng-12767	248	2	,	,	PUNCT
fumecheng-12767	248	3	l.	l.	PROPN
fumecheng-12767	248	4	,	,	PUNCT
fumecheng-12767	248	5	qiu	qiu	PROPN
fumecheng-12767	248	6	,	,	PUNCT
fumecheng-12767	248	7	h.	h.	PROPN
fumecheng-12767	248	8	,	,	PUNCT
fumecheng-12767	248	9	song	song	NOUN
fumecheng-12767	248	10	,	,	PUNCT
fumecheng-12767	248	11	p.	p.	PROPN
fumecheng-12767	248	12	,	,	PUNCT
fumecheng-12767	248	13	zhang	zhang	PROPN
fumecheng-12767	248	14	,	,	PUNCT
fumecheng-12767	248	15	y.	y.	PROPN
fumecheng-12767	248	16	,	,	PUNCT
fumecheng-12767	248	17	lu	lu	PROPN
fumecheng-12767	248	18	,	,	PUNCT
fumecheng-12767	248	19	y.	y.	PROPN
fumecheng-12767	248	20	,	,	PUNCT
fumecheng-12767	248	21	liang	liang	PROPN
fumecheng-12767	248	22	,	,	PUNCT
fumecheng-12767	248	23	c.	c.	PROPN
fumecheng-12767	248	24	,	,	PUNCT
fumecheng-12767	248	25	kong	kong	PROPN
fumecheng-12767	248	26	,	,	PUNCT
fumecheng-12767	248	27	j.	j.	PROPN
fumecheng-12767	248	28	,	,	PUNCT
fumecheng-12767	248	29	chen	chen	PROPN
fumecheng-12767	248	30	,	,	PUNCT
fumecheng-12767	248	31	l.	l.	PROPN
fumecheng-12767	248	32	,	,	PUNCT
fumecheng-12767	248	33	gu	gu	PROPN
fumecheng-12767	248	34	,	,	PUNCT
fumecheng-12767	248	35	j.	j.	PROPN
fumecheng-12767	248	36	,	,	PUNCT
fumecheng-12767	248	37	2019	2019	NUM
fumecheng-12767	248	38	,	,	PUNCT
fumecheng-12767	248	39	3d	3d	NUM
fumecheng-12767	248	40	ti3c2tx	ti3c2tx	NOUN
fumecheng-12767	248	41	mxene	mxene	NOUN
fumecheng-12767	248	42	/	/	SYM
fumecheng-12767	248	43	c	c	PROPN
fumecheng-12767	248	44	hybrid	hybrid	ADJ
fumecheng-12767	248	45	foam	foam	NOUN
fumecheng-12767	248	46	/	/	SYM
fumecheng-12767	248	47	epoxy	epoxy	NOUN
fumecheng-12767	248	48	nanocomposites	nanocomposite	NOUN
fumecheng-12767	248	49	with	with	ADP
fumecheng-12767	248	50	superior	superior	ADJ
fumecheng-12767	248	51	electromagnetic	electromagnetic	ADJ
fumecheng-12767	248	52	interference	interference	NOUN
fumecheng-12767	248	53	shielding	shielding	NOUN
fumecheng-12767	248	54	performances	performance	NOUN
fumecheng-12767	248	55	and	and	CCONJ
fumecheng-12767	248	56	robust	robust	ADJ
fumecheng-12767	248	57	mechanical	mechanical	ADJ
fumecheng-12767	248	58	properties	property	NOUN
fumecheng-12767	248	59	,	,	PUNCT
fumecheng-12767	248	60	composites	composite	VERB
fumecheng-12767	248	61	part	part	NOUN
fumecheng-12767	248	62	a	a	DET
fumecheng-12767	248	63	:	:	PUNCT
fumecheng-12767	248	64	applied	apply	VERB
fumecheng-12767	248	65	science	science	NOUN
fumecheng-12767	248	66	and	and	CCONJ
fumecheng-12767	248	67	manufacturing	manufacturing	NOUN
fumecheng-12767	248	68	,	,	PUNCT
fumecheng-12767	248	69	123	123	NUM
fumecheng-12767	248	70	,	,	PUNCT
fumecheng-12767	248	71	pp	pp	ADJ
fumecheng-12767	248	72	.	.	PUNCT
fumecheng-12767	249	1	293	293	NUM
fumecheng-12767	249	2	-	-	SYM
fumecheng-12767	249	3	300	300	NUM
fumecheng-12767	249	4	.	.	PUNCT
fumecheng-12767	250	1	14	14	NUM
fumecheng-12767	250	2	.	.	PUNCT
fumecheng-12767	251	1	wang	wang	PROPN
fumecheng-12767	251	2	,	,	PUNCT
fumecheng-12767	251	3	l.	l.	PROPN
fumecheng-12767	251	4	,	,	PUNCT
fumecheng-12767	251	5	chen	chen	PROPN
fumecheng-12767	251	6	,	,	PUNCT
fumecheng-12767	251	7	l.	l.	PROPN
fumecheng-12767	251	8	,	,	PUNCT
fumecheng-12767	251	9	song	song	NOUN
fumecheng-12767	251	10	,	,	PUNCT
fumecheng-12767	251	11	p.	p.	PROPN
fumecheng-12767	251	12	,	,	PUNCT
fumecheng-12767	251	13	liang	liang	PROPN
fumecheng-12767	251	14	,	,	PUNCT
fumecheng-12767	251	15	c.	c.	PROPN
fumecheng-12767	251	16	,	,	PUNCT
fumecheng-12767	251	17	lu	lu	PROPN
fumecheng-12767	251	18	,	,	PUNCT
fumecheng-12767	251	19	y.	y.	PROPN
fumecheng-12767	251	20	,	,	PUNCT
fumecheng-12767	251	21	qiu	qiu	PROPN
fumecheng-12767	251	22	,	,	PUNCT
fumecheng-12767	251	23	h.	h.	PROPN
fumecheng-12767	251	24	,	,	PUNCT
fumecheng-12767	251	25	zhang	zhang	PROPN
fumecheng-12767	251	26	,	,	PUNCT
fumecheng-12767	251	27	y.	y.	PROPN
fumecheng-12767	251	28	,	,	PUNCT
fumecheng-12767	251	29	kong	kong	PROPN
fumecheng-12767	251	30	,	,	PUNCT
fumecheng-12767	251	31	j.	j.	PROPN
fumecheng-12767	251	32	,	,	PUNCT
fumecheng-12767	251	33	gu	gu	PROPN
fumecheng-12767	251	34	,	,	PUNCT
fumecheng-12767	251	35	j.	j.	PROPN
fumecheng-12767	251	36	,	,	PUNCT
fumecheng-12767	251	37	2019	2019	NUM
fumecheng-12767	251	38	,	,	PUNCT
fumecheng-12767	251	39	fabrication	fabrication	NOUN
fumecheng-12767	251	40	on	on	ADP
fumecheng-12767	251	41	the	the	DET
fumecheng-12767	251	42	annealed	annealed	ADJ
fumecheng-12767	251	43	ti3c2tx	ti3c2tx	NOUN
fumecheng-12767	251	44	mxene	mxene	NOUN
fumecheng-12767	251	45	/	/	SYM
fumecheng-12767	251	46	epoxy	epoxy	NOUN
fumecheng-12767	251	47	nanocomposites	nanocomposite	NOUN
fumecheng-12767	251	48	for	for	ADP
fumecheng-12767	251	49	electromagnetic	electromagnetic	ADJ
fumecheng-12767	251	50	interference	interference	NOUN
fumecheng-12767	251	51	shielding	shielding	NOUN
fumecheng-12767	251	52	application	application	NOUN
fumecheng-12767	251	53	,	,	PUNCT
fumecheng-12767	251	54	composites	composite	VERB
fumecheng-12767	251	55	part	part	NOUN
fumecheng-12767	251	56	b	b	NOUN
fumecheng-12767	251	57	:	:	PUNCT
fumecheng-12767	251	58	engineering	engineering	NOUN
fumecheng-12767	251	59	,	,	PUNCT
fumecheng-12767	251	60	171	171	NUM
fumecheng-12767	251	61	,	,	PUNCT
fumecheng-12767	251	62	pp	pp	ADJ
fumecheng-12767	251	63	.	.	PUNCT
fumecheng-12767	251	64	111	111	NUM
fumecheng-12767	251	65	-	-	SYM
fumecheng-12767	251	66	118	118	NUM
fumecheng-12767	251	67	.	.	NOUN
fumecheng-12767	251	68	15	15	NUM
fumecheng-12767	251	69	.	.	PUNCT
fumecheng-12767	252	1	verma	verma	PROPN
fumecheng-12767	252	2	,	,	PUNCT
fumecheng-12767	252	3	r.	r.	PROPN
fumecheng-12767	252	4	,	,	PUNCT
fumecheng-12767	252	5	thakur	thakur	PROPN
fumecheng-12767	252	6	,	,	PUNCT
fumecheng-12767	252	7	p.	p.	PROPN
fumecheng-12767	252	8	,	,	PUNCT
fumecheng-12767	252	9	chauhan	chauhan	PROPN
fumecheng-12767	252	10	,	,	PUNCT
fumecheng-12767	252	11	a.	a.	PROPN
fumecheng-12767	252	12	,	,	PUNCT
fumecheng-12767	252	13	jasrotia	jasrotia	PROPN
fumecheng-12767	252	14	,	,	PUNCT
fumecheng-12767	252	15	r.	r.	PROPN
fumecheng-12767	252	16	,	,	PUNCT
fumecheng-12767	252	17	thakur	thakur	PROPN
fumecheng-12767	252	18	,	,	PUNCT
fumecheng-12767	252	19	a.	a.	NOUN
fumecheng-12767	252	20	,	,	PUNCT
fumecheng-12767	252	21	2023	2023	NUM
fumecheng-12767	252	22	,	,	PUNCT
fumecheng-12767	252	23	a	a	DET
fumecheng-12767	252	24	review	review	NOUN
fumecheng-12767	252	25	on	on	ADP
fumecheng-12767	252	26	mxene	mxene	NOUN
fumecheng-12767	252	27	and	and	CCONJ
fumecheng-12767	252	28	its	its	PRON
fumecheng-12767	252	29	’	'	PUNCT
fumecheng-12767	252	30	composites	composite	NOUN
fumecheng-12767	252	31	for	for	ADP
fumecheng-12767	252	32	electromagnetic	electromagnetic	ADJ
fumecheng-12767	252	33	interference	interference	NOUN
fumecheng-12767	252	34	(	(	PUNCT
fumecheng-12767	252	35	emi	emi	NOUN
fumecheng-12767	252	36	)	)	PUNCT
fumecheng-12767	252	37	shielding	shielding	NOUN
fumecheng-12767	252	38	applications	application	NOUN
fumecheng-12767	252	39	,	,	PUNCT
fumecheng-12767	252	40	carbon	carbon	NOUN
fumecheng-12767	252	41	,	,	PUNCT
fumecheng-12767	252	42	208	208	NUM
fumecheng-12767	252	43	,	,	PUNCT
fumecheng-12767	252	44	pp	pp	ADJ
fumecheng-12767	252	45	.	.	PUNCT
fumecheng-12767	253	1	170	170	NUM
fumecheng-12767	253	2	-	-	SYM
fumecheng-12767	253	3	190	190	NUM
fumecheng-12767	253	4	.	.	PUNCT
fumecheng-12767	254	1	16	16	NUM
fumecheng-12767	254	2	.	.	PUNCT
fumecheng-12767	255	1	boldrin	boldrin	PROPN
fumecheng-12767	255	2	,	,	PUNCT
fumecheng-12767	255	3	l.	l.	PROPN
fumecheng-12767	255	4	,	,	PUNCT
fumecheng-12767	255	5	scarpa	scarpa	PROPN
fumecheng-12767	255	6	,	,	PUNCT
fumecheng-12767	255	7	f.	f.	PROPN
fumecheng-12767	255	8	,	,	PUNCT
fumecheng-12767	255	9	chowdhury	chowdhury	PROPN
fumecheng-12767	255	10	,	,	PUNCT
fumecheng-12767	255	11	r.	r.	PROPN
fumecheng-12767	255	12	,	,	PUNCT
fumecheng-12767	255	13	adhikari	adhikari	PROPN
fumecheng-12767	255	14	,	,	PUNCT
fumecheng-12767	255	15	s.	s.	PROPN
fumecheng-12767	255	16	,	,	PUNCT
fumecheng-12767	255	17	2011	2011	NUM
fumecheng-12767	255	18	,	,	PUNCT
fumecheng-12767	255	19	effective	effective	ADJ
fumecheng-12767	255	20	mechanical	mechanical	ADJ
fumecheng-12767	255	21	properties	property	NOUN
fumecheng-12767	255	22	of	of	ADP
fumecheng-12767	255	23	hexagonal	hexagonal	ADJ
fumecheng-12767	255	24	boron	boron	NOUN
fumecheng-12767	255	25	nitride	nitride	NOUN
fumecheng-12767	255	26	nanosheets	nanosheet	NOUN
fumecheng-12767	255	27	,	,	PUNCT
fumecheng-12767	255	28	nanotechnology	nanotechnology	NOUN
fumecheng-12767	255	29	,	,	PUNCT
fumecheng-12767	255	30	22(50	22(50	NUM
fumecheng-12767	255	31	)	)	PUNCT
fumecheng-12767	255	32	,	,	PUNCT
fumecheng-12767	255	33	505702	505702	NUM
fumecheng-12767	255	34	.	.	PUNCT
fumecheng-12767	256	1	17	17	NUM
fumecheng-12767	256	2	.	.	PUNCT
fumecheng-12767	257	1	weng	weng	PROPN
fumecheng-12767	257	2	,	,	PUNCT
fumecheng-12767	257	3	q.	q.	PROPN
fumecheng-12767	257	4	,	,	PUNCT
fumecheng-12767	257	5	kvashnin	kvashnin	NOUN
fumecheng-12767	257	6	,	,	PUNCT
fumecheng-12767	257	7	d.g	d.g	PROPN
fumecheng-12767	257	8	.	.	PROPN
fumecheng-12767	257	9	,	,	PUNCT
fumecheng-12767	257	10	wang	wang	PROPN
fumecheng-12767	257	11	,	,	PUNCT
fumecheng-12767	257	12	x.	x.	PROPN
fumecheng-12767	257	13	,	,	PUNCT
fumecheng-12767	257	14	cretu	cretu	PROPN
fumecheng-12767	257	15	,	,	PUNCT
fumecheng-12767	257	16	o.	o.	PROPN
fumecheng-12767	257	17	,	,	PUNCT
fumecheng-12767	257	18	yang	yang	PROPN
fumecheng-12767	257	19	,	,	PUNCT
fumecheng-12767	257	20	y.	y.	PROPN
fumecheng-12767	257	21	,	,	PUNCT
fumecheng-12767	257	22	zhou	zhou	PROPN
fumecheng-12767	257	23	,	,	PUNCT
fumecheng-12767	257	24	m.	m.	NOUN
fumecheng-12767	257	25	,	,	PUNCT
fumecheng-12767	257	26	zhang	zhang	PROPN
fumecheng-12767	257	27	,	,	PUNCT
fumecheng-12767	257	28	c.	c.	PROPN
fumecheng-12767	257	29	,	,	PUNCT
fumecheng-12767	257	30	tang	tang	PROPN
fumecheng-12767	257	31	,	,	PUNCT
fumecheng-12767	257	32	d.m	d.m	PROPN
fumecheng-12767	257	33	.	.	PROPN
fumecheng-12767	257	34	,	,	PUNCT
fumecheng-12767	257	35	sorokin	sorokin	PROPN
fumecheng-12767	257	36	,	,	PUNCT
fumecheng-12767	257	37	p.b	p.b	PROPN
fumecheng-12767	257	38	.	.	PROPN
fumecheng-12767	257	39	,	,	PUNCT
fumecheng-12767	257	40	bando	bando	PROPN
fumecheng-12767	257	41	,	,	PUNCT
fumecheng-12767	257	42	y.	y.	NOUN
fumecheng-12767	257	43	,	,	PUNCT
fumecheng-12767	257	44	2017	2017	NUM
fumecheng-12767	257	45	,	,	PUNCT
fumecheng-12767	257	46	tuning	tuning	NOUN
fumecheng-12767	257	47	of	of	ADP
fumecheng-12767	257	48	the	the	DET
fumecheng-12767	257	49	optical	optical	ADJ
fumecheng-12767	257	50	,	,	PUNCT
fumecheng-12767	257	51	electronic	electronic	ADJ
fumecheng-12767	257	52	,	,	PUNCT
fumecheng-12767	257	53	and	and	CCONJ
fumecheng-12767	257	54	magnetic	magnetic	ADJ
fumecheng-12767	257	55	properties	property	NOUN
fumecheng-12767	257	56	of	of	ADP
fumecheng-12767	257	57	boron	boron	NOUN
fumecheng-12767	257	58	nitride	nitride	NOUN
fumecheng-12767	257	59	nanosheets	nanosheet	NOUN
fumecheng-12767	257	60	with	with	ADP
fumecheng-12767	257	61	oxygen	oxygen	NOUN
fumecheng-12767	257	62	doping	doping	NOUN
fumecheng-12767	257	63	and	and	CCONJ
fumecheng-12767	257	64	functionalization	functionalization	NOUN
fumecheng-12767	257	65	,	,	PUNCT
fumecheng-12767	257	66	advanced	advanced	ADJ
fumecheng-12767	257	67	materials	material	NOUN
fumecheng-12767	257	68	,	,	PUNCT
fumecheng-12767	257	69	29(28	29(28	NUM
fumecheng-12767	257	70	)	)	PUNCT
fumecheng-12767	257	71	,	,	PUNCT
fumecheng-12767	257	72	1700695	1700695	NUM
fumecheng-12767	257	73	.	.	PUNCT
fumecheng-12767	258	1	18	18	NUM
fumecheng-12767	258	2	.	.	X
fumecheng-12767	258	3	biscarat	biscarat	PROPN
fumecheng-12767	258	4	,	,	PUNCT
fumecheng-12767	258	5	j.	j.	PROPN
fumecheng-12767	258	6	,	,	PUNCT
fumecheng-12767	258	7	bechelany	bechelany	ADJ
fumecheng-12767	258	8	,	,	PUNCT
fumecheng-12767	258	9	m.	m.	NOUN
fumecheng-12767	258	10	,	,	PUNCT
fumecheng-12767	258	11	pochat	pochat	NOUN
fumecheng-12767	258	12	-	-	PUNCT
fumecheng-12767	258	13	bohatier	bohatier	ADJ
fumecheng-12767	258	14	,	,	PUNCT
fumecheng-12767	258	15	c.	c.	NOUN
fumecheng-12767	258	16	,	,	PUNCT
fumecheng-12767	258	17	miele	miele	PROPN
fumecheng-12767	258	18	,	,	PUNCT
fumecheng-12767	258	19	p.	p.	NOUN
fumecheng-12767	258	20	,	,	PUNCT
fumecheng-12767	258	21	2015	2015	NUM
fumecheng-12767	258	22	,	,	PUNCT
fumecheng-12767	258	23	graphene	graphene	NOUN
fumecheng-12767	258	24	-	-	PUNCT
fumecheng-12767	258	25	like	like	ADJ
fumecheng-12767	258	26	bn	bn	NOUN
fumecheng-12767	258	27	/	/	SYM
fumecheng-12767	258	28	gelatin	gelatin	NOUN
fumecheng-12767	258	29	nanobiocomposites	nanobiocomposite	NOUN
fumecheng-12767	258	30	for	for	ADP
fumecheng-12767	258	31	gas	gas	NOUN
fumecheng-12767	258	32	barrier	barrier	NOUN
fumecheng-12767	258	33	applications	application	NOUN
fumecheng-12767	258	34	,	,	PUNCT
fumecheng-12767	258	35	nanoscale	nanoscale	NOUN
fumecheng-12767	258	36	,	,	PUNCT
fumecheng-12767	258	37	7(2	7(2	NUM
fumecheng-12767	258	38	)	)	PUNCT
fumecheng-12767	258	39	,	,	PUNCT
fumecheng-12767	258	40	pp	pp	ADP
fumecheng-12767	258	41	.	.	PUNCT
fumecheng-12767	259	1	613	613	NUM
fumecheng-12767	259	2	-	-	SYM
fumecheng-12767	259	3	618	618	NUM
fumecheng-12767	259	4	.	.	PUNCT
fumecheng-12767	260	1	19	19	NUM
fumecheng-12767	260	2	.	.	PUNCT
fumecheng-12767	260	3	meziani	meziani	PROPN
fumecheng-12767	260	4	,	,	PUNCT
fumecheng-12767	260	5	m.j	m.j	PROPN
fumecheng-12767	260	6	.	.	PROPN
fumecheng-12767	260	7	,	,	PUNCT
fumecheng-12767	260	8	song	song	PROPN
fumecheng-12767	260	9	,	,	PUNCT
fumecheng-12767	260	10	w.l	w.l	PROPN
fumecheng-12767	260	11	.	.	PROPN
fumecheng-12767	260	12	,	,	PUNCT
fumecheng-12767	260	13	wang	wang	PROPN
fumecheng-12767	260	14	,	,	PUNCT
fumecheng-12767	260	15	p.	p.	PROPN
fumecheng-12767	260	16	,	,	PUNCT
fumecheng-12767	260	17	lu	lu	PROPN
fumecheng-12767	260	18	,	,	PUNCT
fumecheng-12767	260	19	f.	f.	PROPN
fumecheng-12767	260	20	,	,	PUNCT
fumecheng-12767	260	21	hou	hou	PROPN
fumecheng-12767	260	22	,	,	PUNCT
fumecheng-12767	260	23	z.	z.	PROPN
fumecheng-12767	260	24	,	,	PUNCT
fumecheng-12767	260	25	anderson	anderson	PROPN
fumecheng-12767	260	26	,	,	PUNCT
fumecheng-12767	260	27	a.	a.	PROPN
fumecheng-12767	260	28	,	,	PUNCT
fumecheng-12767	260	29	maimaiti	maimaiti	PROPN
fumecheng-12767	260	30	,	,	PUNCT
fumecheng-12767	260	31	h.	h.	PROPN
fumecheng-12767	260	32	,	,	PUNCT
fumecheng-12767	260	33	sun	sun	PROPN
fumecheng-12767	260	34	,	,	PUNCT
fumecheng-12767	260	35	y.p	y.p	PROPN
fumecheng-12767	260	36	.	.	PROPN
fumecheng-12767	260	37	,	,	PUNCT
fumecheng-12767	260	38	2015	2015	NUM
fumecheng-12767	260	39	,	,	PUNCT
fumecheng-12767	260	40	boron	boron	NOUN
fumecheng-12767	260	41	nitride	nitride	NOUN
fumecheng-12767	260	42	nanomaterials	nanomaterial	NOUN
fumecheng-12767	260	43	for	for	ADP
fumecheng-12767	260	44	thermal	thermal	ADJ
fumecheng-12767	260	45	management	management	NOUN
fumecheng-12767	260	46	applications	application	NOUN
fumecheng-12767	260	47	,	,	PUNCT
fumecheng-12767	260	48	chemphyschem	chemphyschem	NOUN
fumecheng-12767	260	49	,	,	PUNCT
fumecheng-12767	260	50	16(7	16(7	NUM
fumecheng-12767	260	51	)	)	PUNCT
fumecheng-12767	260	52	,	,	PUNCT
fumecheng-12767	260	53	pp	pp	ADP
fumecheng-12767	260	54	.	.	PUNCT
fumecheng-12767	261	1	1339	1339	NUM
fumecheng-12767	261	2	-	-	SYM
fumecheng-12767	261	3	1346	1346	NUM
fumecheng-12767	261	4	.	.	PUNCT
fumecheng-12767	262	1	20	20	NUM
fumecheng-12767	262	2	.	.	PUNCT
fumecheng-12767	263	1	kawaguchi	kawaguchi	PROPN
fumecheng-12767	263	2	,	,	PUNCT
fumecheng-12767	263	3	s.	s.	PROPN
fumecheng-12767	263	4	,	,	PUNCT
fumecheng-12767	263	5	ito	ito	PROPN
fumecheng-12767	263	6	,	,	PUNCT
fumecheng-12767	263	7	k.	k.	PROPN
fumecheng-12767	263	8	,	,	PUNCT
fumecheng-12767	263	9	2005	2005	NUM
fumecheng-12767	263	10	,	,	PUNCT
fumecheng-12767	263	11	dispersion	dispersion	NOUN
fumecheng-12767	263	12	polymerization	polymerization	NOUN
fumecheng-12767	263	13	,	,	PUNCT
fumecheng-12767	263	14	polymer	polymer	NOUN
fumecheng-12767	263	15	particles	particle	NOUN
fumecheng-12767	263	16	,	,	PUNCT
fumecheng-12767	263	17	175	175	NUM
fumecheng-12767	263	18	,	,	PUNCT
fumecheng-12767	263	19	pp	pp	ADJ
fumecheng-12767	263	20	.	.	PUNCT
fumecheng-12767	264	1	299	299	NUM
fumecheng-12767	264	2	-	-	SYM
fumecheng-12767	264	3	328	328	NUM
fumecheng-12767	264	4	.	.	PUNCT
fumecheng-12767	265	1	21	21	NUM
fumecheng-12767	265	2	.	.	PUNCT
fumecheng-12767	265	3	arshady	arshady	PROPN
fumecheng-12767	265	4	,	,	PUNCT
fumecheng-12767	265	5	r.	r.	PROPN
fumecheng-12767	265	6	,	,	PUNCT
fumecheng-12767	265	7	1992	1992	NUM
fumecheng-12767	265	8	,	,	PUNCT
fumecheng-12767	265	9	suspension	suspension	NOUN
fumecheng-12767	265	10	,	,	PUNCT
fumecheng-12767	265	11	emulsion	emulsion	NOUN
fumecheng-12767	265	12	,	,	PUNCT
fumecheng-12767	265	13	and	and	CCONJ
fumecheng-12767	265	14	dispersion	dispersion	NOUN
fumecheng-12767	265	15	polymerization	polymerization	NOUN
fumecheng-12767	265	16	:	:	PUNCT
fumecheng-12767	265	17	a	a	DET
fumecheng-12767	265	18	methodological	methodological	ADJ
fumecheng-12767	265	19	survey	survey	NOUN
fumecheng-12767	265	20	,	,	PUNCT
fumecheng-12767	265	21	colloid	colloid	NOUN
fumecheng-12767	265	22	and	and	CCONJ
fumecheng-12767	265	23	polymer	polymer	NOUN
fumecheng-12767	265	24	science	science	NOUN
fumecheng-12767	265	25	,	,	PUNCT
fumecheng-12767	265	26	270	270	NUM
fumecheng-12767	265	27	,	,	PUNCT
fumecheng-12767	265	28	pp	pp	ADJ
fumecheng-12767	265	29	.	.	PUNCT
fumecheng-12767	266	1	717	717	NUM
fumecheng-12767	266	2	-	-	SYM
fumecheng-12767	266	3	732	732	NUM
fumecheng-12767	266	4	.	.	PUNCT
fumecheng-12767	267	1	22	22	NUM
fumecheng-12767	267	2	.	.	PUNCT
fumecheng-12767	268	1	chu	chu	PROPN
fumecheng-12767	268	2	,	,	PUNCT
fumecheng-12767	268	3	y.z	y.z	PROPN
fumecheng-12767	268	4	.	.	PROPN
fumecheng-12767	268	5	,	,	PUNCT
fumecheng-12767	268	6	hoover	hoover	PROPN
fumecheng-12767	268	7	,	,	PUNCT
fumecheng-12767	268	8	m.	m.	NOUN
fumecheng-12767	268	9	,	,	PUNCT
fumecheng-12767	268	10	ward	ward	NOUN
fumecheng-12767	268	11	,	,	PUNCT
fumecheng-12767	268	12	p.	p.	PROPN
fumecheng-12767	268	13	,	,	PUNCT
fumecheng-12767	268	14	lau	lau	PROPN
fumecheng-12767	268	15	,	,	PUNCT
fumecheng-12767	268	16	k.c	k.c	PROPN
fumecheng-12767	268	17	.	.	PROPN
fumecheng-12767	268	18	,	,	PUNCT
fumecheng-12767	268	19	2024	2024	NUM
fumecheng-12767	268	20	,	,	PUNCT
fumecheng-12767	268	21	first	first	ADJ
fumecheng-12767	268	22	-	-	PUNCT
fumecheng-12767	268	23	principles	principle	NOUN
fumecheng-12767	268	24	study	study	NOUN
fumecheng-12767	268	25	of	of	ADP
fumecheng-12767	268	26	mxene	mxene	NOUN
fumecheng-12767	268	27	properties	property	NOUN
fumecheng-12767	268	28	with	with	ADP
fumecheng-12767	268	29	varying	vary	VERB
fumecheng-12767	268	30	hydrofluoric	hydrofluoric	ADJ
fumecheng-12767	268	31	acid	acid	NOUN
fumecheng-12767	268	32	concentration	concentration	NOUN
fumecheng-12767	268	33	,	,	PUNCT
fumecheng-12767	268	34	iscience	iscience	NOUN
fumecheng-12767	268	35	,	,	PUNCT
fumecheng-12767	268	36	27(2	27(2	NUM
fumecheng-12767	268	37	)	)	PUNCT
fumecheng-12767	268	38	,	,	PUNCT
fumecheng-12767	268	39	108784	108784	NUM
fumecheng-12767	268	40	.	.	PUNCT
fumecheng-12767	269	1	23	23	NUM
fumecheng-12767	269	2	.	.	PUNCT
fumecheng-12767	270	1	pahlevaninezhad	pahlevaninezhad	PROPN
fumecheng-12767	270	2	,	,	PUNCT
fumecheng-12767	270	3	m.	m.	NOUN
fumecheng-12767	270	4	,	,	PUNCT
fumecheng-12767	270	5	sadri	sadri	PROPN
fumecheng-12767	270	6	,	,	PUNCT
fumecheng-12767	270	7	r.	r.	PROPN
fumecheng-12767	270	8	,	,	PUNCT
fumecheng-12767	270	9	momodu	momodu	ADV
fumecheng-12767	270	10	,	,	PUNCT
fumecheng-12767	270	11	d.	d.	PROPN
fumecheng-12767	270	12	,	,	PUNCT
fumecheng-12767	270	13	eisawi	eisawi	PROPN
fumecheng-12767	270	14	,	,	PUNCT
fumecheng-12767	270	15	k.	k.	PROPN
fumecheng-12767	270	16	,	,	PUNCT
fumecheng-12767	270	17	pahlevani	pahlevani	NOUN
fumecheng-12767	270	18	,	,	PUNCT
fumecheng-12767	270	19	m.	m.	NOUN
fumecheng-12767	270	20	,	,	PUNCT
fumecheng-12767	270	21	naguib	naguib	NOUN
fumecheng-12767	270	22	,	,	PUNCT
fumecheng-12767	270	23	m.	m.	NOUN
fumecheng-12767	270	24	,	,	PUNCT
fumecheng-12767	270	25	roberts	roberts	PROPN
fumecheng-12767	270	26	,	,	PUNCT
fumecheng-12767	270	27	e.p	e.p	PROPN
fumecheng-12767	270	28	.	.	PROPN
fumecheng-12767	270	29	,	,	PUNCT
fumecheng-12767	270	30	2024	2024	NUM
fumecheng-12767	270	31	,	,	PUNCT
fumecheng-12767	270	32	ammonium	ammonium	NOUN
fumecheng-12767	270	33	bifluoride‐etched	bifluoride‐etche	VERB
fumecheng-12767	270	34	mxene	mxene	NOUN
fumecheng-12767	270	35	modified	modify	VERB
fumecheng-12767	270	36	electrode	electrode	NOUN
fumecheng-12767	270	37	for	for	ADP
fumecheng-12767	270	38	the	the	DET
fumecheng-12767	270	39	all−	all−	PRON
fumecheng-12767	270	40	vanadium	vanadium	NOUN
fumecheng-12767	270	41	redox	redox	NOUN
fumecheng-12767	270	42	flow	flow	NOUN
fumecheng-12767	270	43	battery	battery	NOUN
fumecheng-12767	270	44	,	,	PUNCT
fumecheng-12767	270	45	batteries	battery	NOUN
fumecheng-12767	270	46	&	&	CCONJ
fumecheng-12767	270	47	supercaps	supercap	NOUN
fumecheng-12767	270	48	,	,	PUNCT
fumecheng-12767	270	49	7(4	7(4	NUM
fumecheng-12767	270	50	)	)	PUNCT
fumecheng-12767	270	51	,	,	PUNCT
fumecheng-12767	270	52	e202300473	e202300473	PROPN
fumecheng-12767	270	53	.	.	PROPN
fumecheng-12767	270	54	24	24	NUM
fumecheng-12767	270	55	.	.	X
fumecheng-12767	271	1	zhang	zhang	PROPN
fumecheng-12767	271	2	,	,	PUNCT
fumecheng-12767	271	3	t.	t.	PROPN
fumecheng-12767	271	4	,	,	PUNCT
fumecheng-12767	271	5	pan	pan	PROPN
fumecheng-12767	271	6	,	,	PUNCT
fumecheng-12767	271	7	l.	l.	PROPN
fumecheng-12767	271	8	,	,	PUNCT
fumecheng-12767	271	9	tang	tang	PROPN
fumecheng-12767	271	10	,	,	PUNCT
fumecheng-12767	271	11	h.	h.	PROPN
fumecheng-12767	271	12	,	,	PUNCT
fumecheng-12767	271	13	du	du	PROPN
fumecheng-12767	271	14	,	,	PUNCT
fumecheng-12767	271	15	f.	f.	PROPN
fumecheng-12767	271	16	,	,	PUNCT
fumecheng-12767	271	17	guo	guo	PROPN
fumecheng-12767	271	18	,	,	PUNCT
fumecheng-12767	271	19	y.	y.	PROPN
fumecheng-12767	271	20	,	,	PUNCT
fumecheng-12767	271	21	qiu	qiu	PROPN
fumecheng-12767	271	22	,	,	PUNCT
fumecheng-12767	271	23	t.	t.	PROPN
fumecheng-12767	271	24	,	,	PUNCT
fumecheng-12767	271	25	yang	yang	PROPN
fumecheng-12767	271	26	,	,	PUNCT
fumecheng-12767	271	27	j.	j.	PROPN
fumecheng-12767	271	28	,	,	PUNCT
fumecheng-12767	271	29	2017	2017	NUM
fumecheng-12767	271	30	,	,	PUNCT
fumecheng-12767	271	31	synthesis	synthesis	NOUN
fumecheng-12767	271	32	of	of	ADP
fumecheng-12767	271	33	two	two	NUM
fumecheng-12767	271	34	-	-	PUNCT
fumecheng-12767	271	35	dimensional	dimensional	ADJ
fumecheng-12767	271	36	ti3c2tx	ti3c2tx	NOUN
fumecheng-12767	271	37	mxene	mxene	NOUN
fumecheng-12767	271	38	using	use	VERB
fumecheng-12767	271	39	hcl+	hcl+	PROPN
fumecheng-12767	271	40	lif	lif	NOUN
fumecheng-12767	271	41	etchant	etchant	NOUN
fumecheng-12767	271	42	:	:	PUNCT
fumecheng-12767	271	43	enhanced	enhance	VERB
fumecheng-12767	271	44	exfoliation	exfoliation	NOUN
fumecheng-12767	271	45	and	and	CCONJ
fumecheng-12767	271	46	delamination	delamination	NOUN
fumecheng-12767	271	47	,	,	PUNCT
fumecheng-12767	271	48	journal	journal	NOUN
fumecheng-12767	271	49	of	of	ADP
fumecheng-12767	271	50	alloys	alloy	NOUN
fumecheng-12767	271	51	and	and	CCONJ
fumecheng-12767	271	52	compounds	compound	NOUN
fumecheng-12767	271	53	,	,	PUNCT
fumecheng-12767	271	54	695	695	NUM
fumecheng-12767	271	55	,	,	PUNCT
fumecheng-12767	271	56	pp	pp	ADJ
fumecheng-12767	271	57	.	.	PUNCT
fumecheng-12767	271	58	818	818	NUM
fumecheng-12767	271	59	-	-	SYM
fumecheng-12767	271	60	826	826	NUM
fumecheng-12767	271	61	.	.	PUNCT
fumecheng-12767	272	1	614	614	NUM
fumecheng-12767	272	2	c.	c.	NOUN
fumecheng-12767	272	3	choi	choi	NOUN
fumecheng-12767	272	4	,	,	PUNCT
fumecheng-12767	272	5	n.	n.	PROPN
fumecheng-12767	272	6	qaiser	qaiser	PROPN
fumecheng-12767	272	7	,	,	PUNCT
fumecheng-12767	272	8	b.	b.	PROPN
fumecheng-12767	272	9	hwang	hwang	PROPN
fumecheng-12767	272	10	25	25	NUM
fumecheng-12767	272	11	.	.	PUNCT
fumecheng-12767	272	12	acres	acre	NOUN
fumecheng-12767	272	13	,	,	PUNCT
fumecheng-12767	272	14	r.g	r.g	PROPN
fumecheng-12767	272	15	.	.	PROPN
fumecheng-12767	272	16	,	,	PUNCT
fumecheng-12767	272	17	ellis	ellis	PROPN
fumecheng-12767	272	18	,	,	PUNCT
fumecheng-12767	272	19	a.v	a.v	PROPN
fumecheng-12767	272	20	.	.	PROPN
fumecheng-12767	272	21	,	,	PUNCT
fumecheng-12767	272	22	alvino	alvino	PROPN
fumecheng-12767	272	23	,	,	PUNCT
fumecheng-12767	272	24	j.	j.	PROPN
fumecheng-12767	272	25	,	,	PUNCT
fumecheng-12767	272	26	lenahan	lenahan	PROPN
fumecheng-12767	272	27	,	,	PUNCT
fumecheng-12767	272	28	c.e	c.e	PROPN
fumecheng-12767	272	29	.	.	PROPN
fumecheng-12767	272	30	,	,	PUNCT
fumecheng-12767	272	31	khodakov	khodakov	PROPN
fumecheng-12767	272	32	,	,	PUNCT
fumecheng-12767	272	33	d.a	d.a	PROPN
fumecheng-12767	272	34	.	.	PROPN
fumecheng-12767	272	35	,	,	PUNCT
fumecheng-12767	272	36	metha	metha	PROPN
fumecheng-12767	272	37	,	,	PUNCT
fumecheng-12767	272	38	g.f	g.f	PROPN
fumecheng-12767	272	39	.	.	PROPN
fumecheng-12767	272	40	,	,	PUNCT
fumecheng-12767	272	41	andersson	andersson	PROPN
fumecheng-12767	272	42	,	,	PUNCT
fumecheng-12767	272	43	g.g	g.g	PROPN
fumecheng-12767	272	44	.	.	PROPN
fumecheng-12767	272	45	,	,	PUNCT
fumecheng-12767	272	46	2012	2012	NUM
fumecheng-12767	272	47	,	,	PUNCT
fumecheng-12767	272	48	molecular	molecular	ADJ
fumecheng-12767	272	49	structure	structure	NOUN
fumecheng-12767	272	50	of	of	ADP
fumecheng-12767	272	51	3	3	NUM
fumecheng-12767	272	52	-	-	PUNCT
fumecheng-12767	272	53	aminopropyltriethoxysilane	aminopropyltriethoxysilane	NOUN
fumecheng-12767	272	54	layers	layer	NOUN
fumecheng-12767	272	55	formed	form	VERB
fumecheng-12767	272	56	on	on	ADP
fumecheng-12767	272	57	silanol	silanol	NOUN
fumecheng-12767	272	58	-	-	PUNCT
fumecheng-12767	272	59	terminated	terminate	VERB
fumecheng-12767	272	60	silicon	silicon	NOUN
fumecheng-12767	272	61	surfaces	surface	NOUN
fumecheng-12767	272	62	,	,	PUNCT
fumecheng-12767	272	63	the	the	DET
fumecheng-12767	272	64	journal	journal	NOUN
fumecheng-12767	272	65	of	of	ADP
fumecheng-12767	272	66	physical	physical	ADJ
fumecheng-12767	272	67	chemistry	chemistry	NOUN
fumecheng-12767	272	68	c	c	NOUN
fumecheng-12767	272	69	,	,	PUNCT
fumecheng-12767	272	70	116(10	116(10	NUM
fumecheng-12767	272	71	)	)	PUNCT
fumecheng-12767	272	72	,	,	PUNCT
fumecheng-12767	272	73	pp	pp	PROPN
fumecheng-12767	272	74	.	.	PUNCT
fumecheng-12767	273	1	6289	6289	NUM
fumecheng-12767	273	2	-	-	SYM
fumecheng-12767	273	3	6297	6297	NUM
fumecheng-12767	273	4	.	.	PUNCT
fumecheng-12767	274	1	26	26	NUM
fumecheng-12767	274	2	.	.	PUNCT
fumecheng-12767	274	3	clogston	clogston	PROPN
fumecheng-12767	274	4	,	,	PUNCT
fumecheng-12767	274	5	j.d	j.d	PROPN
fumecheng-12767	274	6	.	.	PROPN
fumecheng-12767	274	7	,	,	PUNCT
fumecheng-12767	274	8	patri	patri	PROPN
fumecheng-12767	274	9	,	,	PUNCT
fumecheng-12767	274	10	a.k	a.k	PROPN
fumecheng-12767	274	11	.	.	PROPN
fumecheng-12767	274	12	,	,	PUNCT
fumecheng-12767	274	13	2011	2011	NUM
fumecheng-12767	274	14	,	,	PUNCT
fumecheng-12767	274	15	zeta	zeta	PROPN
fumecheng-12767	274	16	potential	potential	ADJ
fumecheng-12767	274	17	measurement	measurement	NOUN
fumecheng-12767	274	18	,	,	PUNCT
fumecheng-12767	274	19	characterization	characterization	NOUN
fumecheng-12767	274	20	of	of	ADP
fumecheng-12767	274	21	nanoparticles	nanoparticle	NOUN
fumecheng-12767	274	22	intended	intend	VERB
fumecheng-12767	274	23	for	for	ADP
fumecheng-12767	274	24	drug	drug	NOUN
fumecheng-12767	274	25	delivery	delivery	NOUN
fumecheng-12767	274	26	,	,	PUNCT
fumecheng-12767	274	27	697	697	NUM
fumecheng-12767	274	28	,	,	PUNCT
fumecheng-12767	274	29	pp	pp	ADJ
fumecheng-12767	274	30	.	.	PUNCT
fumecheng-12767	275	1	63	63	NUM
fumecheng-12767	275	2	-	-	SYM
fumecheng-12767	275	3	70	70	NUM
fumecheng-12767	275	4	.	.	PUNCT
fumecheng-12767	276	1	27	27	NUM
fumecheng-12767	276	2	.	.	PUNCT
fumecheng-12767	277	1	luo	luo	PROPN
fumecheng-12767	277	2	,	,	PUNCT
fumecheng-12767	277	3	j.	j.	PROPN
fumecheng-12767	277	4	,	,	PUNCT
fumecheng-12767	277	5	tao	tao	PROPN
fumecheng-12767	277	6	,	,	PUNCT
fumecheng-12767	277	7	x.	x.	PROPN
fumecheng-12767	277	8	,	,	PUNCT
fumecheng-12767	277	9	zhang	zhang	PROPN
fumecheng-12767	277	10	,	,	PUNCT
fumecheng-12767	277	11	j.	j.	PROPN
fumecheng-12767	277	12	,	,	PUNCT
fumecheng-12767	277	13	xia	xia	PROPN
fumecheng-12767	277	14	,	,	PUNCT
fumecheng-12767	277	15	y.	y.	PROPN
fumecheng-12767	277	16	,	,	PUNCT
fumecheng-12767	277	17	huang	huang	PROPN
fumecheng-12767	277	18	,	,	PUNCT
fumecheng-12767	277	19	h.	h.	PROPN
fumecheng-12767	277	20	,	,	PUNCT
fumecheng-12767	277	21	zhang	zhang	PROPN
fumecheng-12767	277	22	,	,	PUNCT
fumecheng-12767	277	23	l.	l.	PROPN
fumecheng-12767	277	24	,	,	PUNCT
fumecheng-12767	277	25	gan	gan	PROPN
fumecheng-12767	277	26	,	,	PUNCT
fumecheng-12767	277	27	y.	y.	PROPN
fumecheng-12767	277	28	,	,	PUNCT
fumecheng-12767	277	29	liang	liang	PROPN
fumecheng-12767	277	30	,	,	PUNCT
fumecheng-12767	277	31	c.	c.	PROPN
fumecheng-12767	277	32	,	,	PUNCT
fumecheng-12767	277	33	zhang	zhang	PROPN
fumecheng-12767	277	34	,	,	PUNCT
fumecheng-12767	277	35	w.	w.	PROPN
fumecheng-12767	277	36	,	,	PUNCT
fumecheng-12767	277	37	2016	2016	NUM
fumecheng-12767	277	38	,	,	PUNCT
fumecheng-12767	277	39	sn4	sn4	PROPN
fumecheng-12767	277	40	+	+	NOUN
fumecheng-12767	277	41	ion	ion	NOUN
fumecheng-12767	277	42	decorated	decorate	VERB
fumecheng-12767	277	43	highly	highly	ADV
fumecheng-12767	277	44	conductive	conductive	ADJ
fumecheng-12767	277	45	ti3c2	ti3c2	NOUN
fumecheng-12767	277	46	mxene	mxene	NOUN
fumecheng-12767	277	47	:	:	PUNCT
fumecheng-12767	277	48	promising	promise	VERB
fumecheng-12767	277	49	lithium	lithium	NOUN
fumecheng-12767	277	50	-	-	PUNCT
fumecheng-12767	277	51	ion	ion	NOUN
fumecheng-12767	277	52	anodes	anode	NOUN
fumecheng-12767	277	53	with	with	ADP
fumecheng-12767	277	54	enhanced	enhanced	ADJ
fumecheng-12767	277	55	volumetric	volumetric	NOUN
fumecheng-12767	277	56	capacity	capacity	NOUN
fumecheng-12767	277	57	and	and	CCONJ
fumecheng-12767	277	58	cyclic	cyclic	ADJ
fumecheng-12767	277	59	performance	performance	NOUN
fumecheng-12767	277	60	,	,	PUNCT
fumecheng-12767	277	61	acs	acs	PROPN
fumecheng-12767	277	62	nano	nano	NOUN
fumecheng-12767	277	63	,	,	PUNCT
fumecheng-12767	277	64	10(2	10(2	NUM
fumecheng-12767	277	65	)	)	PUNCT
fumecheng-12767	277	66	,	,	PUNCT
fumecheng-12767	277	67	pp	pp	ADJ
fumecheng-12767	277	68	.	.	PUNCT
fumecheng-12767	277	69	2491	2491	NUM
fumecheng-12767	277	70	-	-	SYM
fumecheng-12767	277	71	2499	2499	NUM
fumecheng-12767	277	72	.	.	PUNCT
fumecheng-12767	278	1	28	28	NUM
fumecheng-12767	278	2	.	.	PUNCT
fumecheng-12767	279	1	hou	hou	PROPN
fumecheng-12767	279	2	,	,	PUNCT
fumecheng-12767	279	3	j.	j.	PROPN
fumecheng-12767	279	4	,	,	PUNCT
fumecheng-12767	279	5	li	li	PROPN
fumecheng-12767	279	6	,	,	PUNCT
fumecheng-12767	279	7	g.	g.	PROPN
fumecheng-12767	279	8	,	,	PUNCT
fumecheng-12767	279	9	yang	yang	PROPN
fumecheng-12767	279	10	,	,	PUNCT
fumecheng-12767	279	11	n.	n.	PROPN
fumecheng-12767	279	12	,	,	PUNCT
fumecheng-12767	279	13	qin	qin	PROPN
fumecheng-12767	279	14	,	,	PUNCT
fumecheng-12767	279	15	l.	l.	PROPN
fumecheng-12767	279	16	,	,	PUNCT
fumecheng-12767	279	17	grami	grami	NOUN
fumecheng-12767	279	18	,	,	PUNCT
fumecheng-12767	279	19	m.e	m.e	PROPN
fumecheng-12767	279	20	.	.	PROPN
fumecheng-12767	279	21	,	,	PUNCT
fumecheng-12767	279	22	zhang	zhang	PROPN
fumecheng-12767	279	23	,	,	PUNCT
fumecheng-12767	279	24	q.	q.	PROPN
fumecheng-12767	279	25	,	,	PUNCT
fumecheng-12767	279	26	wang	wang	PROPN
fumecheng-12767	279	27	,	,	PUNCT
fumecheng-12767	279	28	n.	n.	PROPN
fumecheng-12767	279	29	,	,	PUNCT
fumecheng-12767	279	30	qu	qu	PROPN
fumecheng-12767	279	31	,	,	PUNCT
fumecheng-12767	279	32	x.	x.	NOUN
fumecheng-12767	279	33	,	,	PUNCT
fumecheng-12767	279	34	2014	2014	NUM
fumecheng-12767	279	35	,	,	PUNCT
fumecheng-12767	279	36	preparation	preparation	NOUN
fumecheng-12767	279	37	and	and	CCONJ
fumecheng-12767	279	38	characterization	characterization	NOUN
fumecheng-12767	279	39	of	of	ADP
fumecheng-12767	279	40	surface	surface	NOUN
fumecheng-12767	279	41	modified	modify	VERB
fumecheng-12767	279	42	boron	boron	NOUN
fumecheng-12767	279	43	nitride	nitride	ADJ
fumecheng-12767	279	44	epoxy	epoxy	NOUN
fumecheng-12767	279	45	composites	composite	NOUN
fumecheng-12767	279	46	with	with	ADP
fumecheng-12767	279	47	enhanced	enhanced	ADJ
fumecheng-12767	279	48	thermal	thermal	ADJ
fumecheng-12767	279	49	conductivity	conductivity	NOUN
fumecheng-12767	279	50	,	,	PUNCT
fumecheng-12767	279	51	rsc	rsc	PROPN
fumecheng-12767	279	52	advances	advance	NOUN
fumecheng-12767	279	53	,	,	PUNCT
fumecheng-12767	279	54	4(83	4(83	NUM
fumecheng-12767	279	55	)	)	PUNCT
fumecheng-12767	279	56	,	,	PUNCT
fumecheng-12767	279	57	pp	pp	PROPN
fumecheng-12767	279	58	.	.	PUNCT
fumecheng-12767	279	59	44282	44282	NUM
fumecheng-12767	279	60	-	-	SYM
fumecheng-12767	279	61	44290	44290	NUM
fumecheng-12767	279	62	.	.	PUNCT
fumecheng-12767	280	1	29	29	NUM
fumecheng-12767	280	2	.	.	PUNCT
fumecheng-12767	281	1	oh	oh	INTJ
fumecheng-12767	281	2	,	,	PUNCT
fumecheng-12767	281	3	h.	h.	PROPN
fumecheng-12767	281	4	,	,	PUNCT
fumecheng-12767	281	5	kim	kim	PROPN
fumecheng-12767	281	6	,	,	PUNCT
fumecheng-12767	281	7	j.	j.	PROPN
fumecheng-12767	281	8	,	,	PUNCT
fumecheng-12767	281	9	2019	2019	NUM
fumecheng-12767	281	10	,	,	PUNCT
fumecheng-12767	281	11	fabrication	fabrication	NOUN
fumecheng-12767	281	12	of	of	ADP
fumecheng-12767	281	13	polymethyl	polymethyl	PROPN
fumecheng-12767	281	14	methacrylate	methacrylate	PROPN
fumecheng-12767	281	15	composites	composite	NOUN
fumecheng-12767	281	16	with	with	ADP
fumecheng-12767	281	17	silanized	silanize	VERB
fumecheng-12767	281	18	boron	boron	NOUN
fumecheng-12767	281	19	nitride	nitride	NOUN
fumecheng-12767	281	20	by	by	ADP
fumecheng-12767	281	21	in	in	ADP
fumecheng-12767	281	22	-	-	PUNCT
fumecheng-12767	281	23	situ	situ	NOUN
fumecheng-12767	281	24	polymerization	polymerization	NOUN
fumecheng-12767	281	25	for	for	ADP
fumecheng-12767	281	26	high	high	ADJ
fumecheng-12767	281	27	thermal	thermal	ADJ
fumecheng-12767	281	28	conductivity	conductivity	NOUN
fumecheng-12767	281	29	,	,	PUNCT
fumecheng-12767	281	30	composites	composite	VERB
fumecheng-12767	281	31	science	science	NOUN
fumecheng-12767	281	32	and	and	CCONJ
fumecheng-12767	281	33	technology	technology	NOUN
fumecheng-12767	281	34	,	,	PUNCT
fumecheng-12767	281	35	172	172	NUM
fumecheng-12767	281	36	,	,	PUNCT
fumecheng-12767	281	37	pp	pp	ADJ
fumecheng-12767	281	38	.	.	PUNCT
fumecheng-12767	282	1	153	153	NUM
fumecheng-12767	282	2	-	-	SYM
fumecheng-12767	282	3	162	162	NUM
fumecheng-12767	282	4	.	.	PUNCT
fumecheng-12767	283	1	30	30	NUM
fumecheng-12767	283	2	.	.	PUNCT
fumecheng-12767	284	1	schulz	schulz	PROPN
fumecheng-12767	284	2	,	,	PUNCT
fumecheng-12767	284	3	r.b	r.b	PROPN
fumecheng-12767	284	4	.	.	PROPN
fumecheng-12767	284	5	,	,	PUNCT
fumecheng-12767	284	6	plantz	plantz	PROPN
fumecheng-12767	284	7	,	,	PUNCT
fumecheng-12767	284	8	v.	v.	ADV
fumecheng-12767	284	9	,	,	PUNCT
fumecheng-12767	284	10	brush	brush	NOUN
fumecheng-12767	284	11	,	,	PUNCT
fumecheng-12767	284	12	d.	d.	PROPN
fumecheng-12767	284	13	,	,	PUNCT
fumecheng-12767	284	14	1988	1988	NUM
fumecheng-12767	284	15	,	,	PUNCT
fumecheng-12767	284	16	shielding	shielding	NOUN
fumecheng-12767	284	17	theory	theory	NOUN
fumecheng-12767	284	18	and	and	CCONJ
fumecheng-12767	284	19	practice	practice	NOUN
fumecheng-12767	284	20	,	,	PUNCT
fumecheng-12767	284	21	ieee	ieee	NOUN
fumecheng-12767	284	22	transactions	transaction	NOUN
fumecheng-12767	284	23	on	on	ADP
fumecheng-12767	284	24	electromagnetic	electromagnetic	ADJ
fumecheng-12767	284	25	compatibility	compatibility	NOUN
fumecheng-12767	284	26	,	,	PUNCT
fumecheng-12767	284	27	30(3	30(3	NUM
fumecheng-12767	284	28	)	)	PUNCT
fumecheng-12767	284	29	,	,	PUNCT
fumecheng-12767	284	30	pp	pp	ADP
fumecheng-12767	284	31	.	.	PUNCT
fumecheng-12767	285	1	187	187	NUM
fumecheng-12767	285	2	-	-	SYM
fumecheng-12767	285	3	201	201	NUM
fumecheng-12767	285	4	.	.	PUNCT
fumecheng-12767	286	1	31	31	NUM
fumecheng-12767	286	2	.	.	PUNCT
fumecheng-12767	287	1	joshi	joshi	PROPN
fumecheng-12767	287	2	,	,	PUNCT
fumecheng-12767	287	3	a.	a.	PROPN
fumecheng-12767	287	4	,	,	PUNCT
fumecheng-12767	287	5	datar	datar	PROPN
fumecheng-12767	287	6	,	,	PUNCT
fumecheng-12767	287	7	s.	s.	PROPN
fumecheng-12767	287	8	,	,	PUNCT
fumecheng-12767	287	9	2015	2015	NUM
fumecheng-12767	287	10	,	,	PUNCT
fumecheng-12767	287	11	carbon	carbon	NOUN
fumecheng-12767	287	12	nanostructure	nanostructure	NOUN
fumecheng-12767	287	13	composite	composite	NOUN
fumecheng-12767	287	14	for	for	ADP
fumecheng-12767	287	15	electromagnetic	electromagnetic	ADJ
fumecheng-12767	287	16	interference	interference	NOUN
fumecheng-12767	287	17	shielding	shielding	NOUN
fumecheng-12767	287	18	,	,	PUNCT
fumecheng-12767	287	19	pramana	pramana	PROPN
fumecheng-12767	287	20	,	,	PUNCT
fumecheng-12767	287	21	84	84	NUM
fumecheng-12767	287	22	,	,	PUNCT
fumecheng-12767	287	23	pp	pp	ADJ
fumecheng-12767	287	24	.	.	PUNCT
fumecheng-12767	288	1	1099	1099	NUM
fumecheng-12767	288	2	-	-	SYM
fumecheng-12767	288	3	1116	1116	NUM
fumecheng-12767	288	4	.	.	PUNCT
fumecheng-12767	289	1	32	32	NUM
fumecheng-12767	289	2	.	.	PUNCT
fumecheng-12767	290	1	iqbal	iqbal	PROPN
fumecheng-12767	290	2	,	,	PUNCT
fumecheng-12767	290	3	a.	a.	PROPN
fumecheng-12767	290	4	,	,	PUNCT
fumecheng-12767	290	5	sambyal	sambyal	NOUN
fumecheng-12767	290	6	,	,	PUNCT
fumecheng-12767	290	7	p.	p.	PROPN
fumecheng-12767	290	8	,	,	PUNCT
fumecheng-12767	290	9	koo	koo	PROPN
fumecheng-12767	290	10	,	,	PUNCT
fumecheng-12767	290	11	c.m	c.m	PROPN
fumecheng-12767	290	12	.	.	PROPN
fumecheng-12767	290	13	,	,	PUNCT
fumecheng-12767	290	14	2020	2020	NUM
fumecheng-12767	290	15	,	,	PUNCT
fumecheng-12767	290	16	2d	2d	NUM
fumecheng-12767	290	17	mxenes	mxene	NOUN
fumecheng-12767	290	18	for	for	ADP
fumecheng-12767	290	19	electromagnetic	electromagnetic	ADJ
fumecheng-12767	290	20	shielding	shielding	NOUN
fumecheng-12767	290	21	:	:	PUNCT
fumecheng-12767	290	22	a	a	DET
fumecheng-12767	290	23	review	review	NOUN
fumecheng-12767	290	24	,	,	PUNCT
fumecheng-12767	290	25	advanced	advanced	ADJ
fumecheng-12767	290	26	functional	functional	ADJ
fumecheng-12767	290	27	materials	material	NOUN
fumecheng-12767	290	28	,	,	PUNCT
fumecheng-12767	290	29	30(47	30(47	NUM
fumecheng-12767	290	30	)	)	PUNCT
fumecheng-12767	290	31	,	,	PUNCT
fumecheng-12767	290	32	2000883	2000883	NUM
fumecheng-12767	290	33	.	.	PUNCT
fumecheng-12767	291	1	33	33	NUM
fumecheng-12767	291	2	.	.	PUNCT
fumecheng-12767	292	1	xu	xu	INTJ
fumecheng-12767	292	2	,	,	PUNCT
fumecheng-12767	292	3	y.	y.	PROPN
fumecheng-12767	292	4	,	,	PUNCT
fumecheng-12767	292	5	yang	yang	PROPN
fumecheng-12767	292	6	,	,	PUNCT
fumecheng-12767	292	7	y.	y.	PROPN
fumecheng-12767	292	8	,	,	PUNCT
fumecheng-12767	292	9	yan	yan	PROPN
fumecheng-12767	292	10	,	,	PUNCT
fumecheng-12767	292	11	d.-x	d.-x	PROPN
fumecheng-12767	292	12	.	.	PROPN
fumecheng-12767	292	13	,	,	PUNCT
fumecheng-12767	292	14	duan	duan	PROPN
fumecheng-12767	292	15	,	,	PUNCT
fumecheng-12767	292	16	h.	h.	PROPN
fumecheng-12767	292	17	,	,	PUNCT
fumecheng-12767	292	18	zhao	zhao	PROPN
fumecheng-12767	292	19	,	,	PUNCT
fumecheng-12767	292	20	g.	g.	PROPN
fumecheng-12767	292	21	,	,	PUNCT
fumecheng-12767	292	22	liu	liu	PROPN
fumecheng-12767	292	23	,	,	PUNCT
fumecheng-12767	292	24	y.	y.	PROPN
fumecheng-12767	292	25	,	,	PUNCT
fumecheng-12767	292	26	2019	2019	NUM
fumecheng-12767	292	27	,	,	PUNCT
fumecheng-12767	292	28	flexible	flexible	ADJ
fumecheng-12767	292	29	and	and	CCONJ
fumecheng-12767	292	30	conductive	conductive	ADJ
fumecheng-12767	292	31	polyurethane	polyurethane	NOUN
fumecheng-12767	292	32	composites	composite	NOUN
fumecheng-12767	292	33	for	for	ADP
fumecheng-12767	292	34	electromagnetic	electromagnetic	ADJ
fumecheng-12767	292	35	shielding	shielding	NOUN
fumecheng-12767	292	36	and	and	CCONJ
fumecheng-12767	292	37	printable	printable	NOUN
fumecheng-12767	292	38	circuit	circuit	NOUN
fumecheng-12767	292	39	,	,	PUNCT
fumecheng-12767	292	40	chemical	chemical	ADJ
fumecheng-12767	292	41	engineering	engineering	NOUN
fumecheng-12767	292	42	journal	journal	NOUN
fumecheng-12767	292	43	,	,	PUNCT
fumecheng-12767	292	44	360	360	NUM
fumecheng-12767	292	45	,	,	PUNCT
fumecheng-12767	292	46	pp	pp	ADJ
fumecheng-12767	292	47	.	.	PUNCT
fumecheng-12767	293	1	1427	1427	NUM
fumecheng-12767	293	2	-	-	SYM
fumecheng-12767	293	3	1436	1436	NUM
fumecheng-12767	293	4	.	.	PUNCT