id	sid	tid	token	lemma	pos
fumecheng-14015	1	1	14015	14015	NUM
fumecheng-14015	1	2	facta	facta	PROPN
fumecheng-14015	1	3	universitatis	universitatis	PROPN
fumecheng-14015	1	4	series	series	NOUN
fumecheng-14015	1	5	:	:	PUNCT
fumecheng-14015	1	6	mechanical	mechanical	ADJ
fumecheng-14015	1	7	engineering	engineering	NOUN
fumecheng-14015	1	8	vol	vol	NOUN
fumecheng-14015	1	9	.	.	PROPN
fumecheng-14015	1	10	23	23	NUM
fumecheng-14015	1	11	,	,	PUNCT
fumecheng-14015	1	12	no	no	DET
fumecheng-14015	1	13	4	4	NUM
fumecheng-14015	1	14	,	,	PUNCT
fumecheng-14015	1	15	2025	2025	NUM
fumecheng-14015	1	16	,	,	PUNCT
fumecheng-14015	1	17	pp	pp	ADV
fumecheng-14015	1	18	.	.	PUNCT
fumecheng-14015	2	1	921	921	NUM
fumecheng-14015	2	2	943	943	NUM
fumecheng-14015	2	3	https://doi.org/10.22190/fume250830033c	https://doi.org/10.22190/fume250830033c	PROPN
fumecheng-14015	2	4	©	©	PROPN
fumecheng-14015	2	5	2025	2025	NUM
fumecheng-14015	2	6	by	by	ADP
fumecheng-14015	2	7	university	university	PROPN
fumecheng-14015	2	8	of	of	ADP
fumecheng-14015	2	9	niš	niš	PROPN
fumecheng-14015	2	10	,	,	PUNCT
fumecheng-14015	2	11	serbia	serbia	PROPN
fumecheng-14015	2	12	|	|	ADV
fumecheng-14015	2	13	creative	creative	ADJ
fumecheng-14015	2	14	commons	common	NOUN
fumecheng-14015	2	15	license	license	NOUN
fumecheng-14015	2	16	:	:	PUNCT
fumecheng-14015	2	17	cc	cc	VERB
fumecheng-14015	2	18	by	by	ADP
fumecheng-14015	2	19	-	-	PUNCT
fumecheng-14015	2	20	nc	nc	PROPN
fumecheng-14015	2	21	-	-	PUNCT
fumecheng-14015	2	22	nd	nd	NOUN
fumecheng-14015	2	23	review	review	NOUN
fumecheng-14015	2	24	article	article	PROPN
fumecheng-14015	2	25	cu	cu	PROPN
fumecheng-14015	2	26	-	-	PROPN
fumecheng-14015	2	27	cu	cu	PROPN
fumecheng-14015	2	28	mechanical	mechanical	ADJ
fumecheng-14015	2	29	bonding	bonding	NOUN
fumecheng-14015	2	30	for	for	ADP
fumecheng-14015	2	31	3d	3d	NOUN
fumecheng-14015	2	32	integration	integration	NOUN
fumecheng-14015	2	33	of	of	ADP
fumecheng-14015	2	34	the	the	DET
fumecheng-14015	2	35	next	next	ADJ
fumecheng-14015	2	36	generation	generation	NOUN
fumecheng-14015	2	37	electronic	electronic	ADJ
fumecheng-14015	2	38	chips	chip	NOUN
fumecheng-14015	2	39	:	:	PUNCT
fumecheng-14015	2	40	interfacial	interfacial	ADJ
fumecheng-14015	2	41	mechanisms	mechanism	NOUN
fumecheng-14015	2	42	,	,	PUNCT
fumecheng-14015	2	43	surface	surface	NOUN
fumecheng-14015	2	44	engineering	engineering	NOUN
fumecheng-14015	2	45	,	,	PUNCT
fumecheng-14015	2	46	and	and	CCONJ
fumecheng-14015	2	47	emerging	emerge	VERB
fumecheng-14015	2	48	low	low	ADJ
fumecheng-14015	2	49	-	-	PUNCT
fumecheng-14015	2	50	temperature	temperature	NOUN
fumecheng-14015	2	51	strategies	strategy	NOUN
fumecheng-14015	2	52	sooyong	sooyong	NOUN
fumecheng-14015	2	53	choi1	choi1	ADJ
fumecheng-14015	2	54	,	,	PUNCT
fumecheng-14015	2	55	chih	chih	PROPN
fumecheng-14015	2	56	-	-	PUNCT
fumecheng-14015	2	57	ming	ming	PROPN
fumecheng-14015	2	58	chen2	chen2	PROPN
fumecheng-14015	2	59	,	,	PUNCT
fumecheng-14015	2	60	byungil	byungil	NOUN
fumecheng-14015	2	61	hwang3	hwang3	NOUN
fumecheng-14015	3	1	1department	1department	NUM
fumecheng-14015	3	2	of	of	ADP
fumecheng-14015	3	3	intelligent	intelligent	ADJ
fumecheng-14015	3	4	semiconductor	semiconductor	NOUN
fumecheng-14015	3	5	engineering	engineering	NOUN
fumecheng-14015	3	6	,	,	PUNCT
fumecheng-14015	3	7	chung	chung	PROPN
fumecheng-14015	3	8	-	-	PUNCT
fumecheng-14015	3	9	ang	ang	PROPN
fumecheng-14015	3	10	university	university	PROPN
fumecheng-14015	3	11	,	,	PUNCT
fumecheng-14015	3	12	republic	republic	NOUN
fumecheng-14015	3	13	of	of	ADP
fumecheng-14015	3	14	korea	korea	PROPN
fumecheng-14015	4	1	2department	2department	NUM
fumecheng-14015	4	2	of	of	ADP
fumecheng-14015	4	3	chemical	chemical	PROPN
fumecheng-14015	4	4	engineering	engineering	NOUN
fumecheng-14015	4	5	,	,	PUNCT
fumecheng-14015	4	6	national	national	PROPN
fumecheng-14015	4	7	chung	chung	PROPN
fumecheng-14015	4	8	hsing	hsing	PROPN
fumecheng-14015	4	9	university	university	PROPN
fumecheng-14015	4	10	,	,	PUNCT
fumecheng-14015	4	11	taiwan	taiwan	PROPN
fumecheng-14015	4	12	3school	3school	PROPN
fumecheng-14015	4	13	of	of	ADP
fumecheng-14015	4	14	integrative	integrative	ADJ
fumecheng-14015	4	15	engineering	engineering	NOUN
fumecheng-14015	4	16	,	,	PUNCT
fumecheng-14015	4	17	chung	chung	PROPN
fumecheng-14015	4	18	-	-	PUNCT
fumecheng-14015	4	19	ang	ang	PROPN
fumecheng-14015	4	20	university	university	PROPN
fumecheng-14015	4	21	,	,	PUNCT
fumecheng-14015	4	22	republic	republic	NOUN
fumecheng-14015	4	23	of	of	ADP
fumecheng-14015	4	24	korea	korea	PROPN
fumecheng-14015	4	25	orcid	orcid	PROPN
fumecheng-14015	4	26	ids	ids	PROPN
fumecheng-14015	4	27	:	:	PUNCT
fumecheng-14015	4	28	sooyong	sooyong	ADJ
fumecheng-14015	4	29	choi	choi	PROPN
fumecheng-14015	4	30	https://orcid.org/0009-0004-1523-4122	https://orcid.org/0009-0004-1523-4122	PROPN
fumecheng-14015	4	31	chih	chih	PROPN
fumecheng-14015	4	32	-	-	PUNCT
fumecheng-14015	4	33	ming	ming	PROPN
fumecheng-14015	4	34	chen	chen	PROPN
fumecheng-14015	4	35	https://orcid.org/0000-0003-4481-1094	https://orcid.org/0000-0003-4481-1094	PROPN
fumecheng-14015	4	36	byungil	byungil	PROPN
fumecheng-14015	4	37	hwang	hwang	PROPN
fumecheng-14015	4	38	https://orcid.org/0000-0001-9270-9014	https://orcid.org/0000-0001-9270-9014	PROPN
fumecheng-14015	4	39	abstract	abstract	ADJ
fumecheng-14015	4	40	.	.	PUNCT
fumecheng-14015	5	1	three	three	NUM
fumecheng-14015	5	2	-	-	PUNCT
fumecheng-14015	5	3	dimensional	dimensional	ADJ
fumecheng-14015	5	4	integrated	integrated	ADJ
fumecheng-14015	5	5	circuit	circuit	NOUN
fumecheng-14015	5	6	(	(	PUNCT
fumecheng-14015	5	7	3d	3d	PROPN
fumecheng-14015	5	8	ic	ic	NOUN
fumecheng-14015	5	9	)	)	PUNCT
fumecheng-14015	5	10	technology	technology	NOUN
fumecheng-14015	5	11	is	be	AUX
fumecheng-14015	5	12	essential	essential	ADJ
fumecheng-14015	5	13	for	for	ADP
fumecheng-14015	5	14	ultrahigh	ultrahigh	NOUN
fumecheng-14015	5	15	-	-	PUNCT
fumecheng-14015	5	16	density	density	NOUN
fumecheng-14015	5	17	integration	integration	NOUN
fumecheng-14015	5	18	,	,	PUNCT
fumecheng-14015	5	19	and	and	CCONJ
fumecheng-14015	5	20	cu	cu	PROPN
fumecheng-14015	5	21	-	-	PROPN
fumecheng-14015	5	22	cu	cu	PROPN
fumecheng-14015	5	23	direct	direct	ADJ
fumecheng-14015	5	24	mechanical	mechanical	ADJ
fumecheng-14015	5	25	bonding	bonding	NOUN
fumecheng-14015	5	26	has	have	AUX
fumecheng-14015	5	27	emerged	emerge	VERB
fumecheng-14015	5	28	as	as	ADP
fumecheng-14015	5	29	a	a	DET
fumecheng-14015	5	30	promising	promising	ADJ
fumecheng-14015	5	31	alternative	alternative	NOUN
fumecheng-14015	5	32	due	due	ADP
fumecheng-14015	5	33	to	to	ADP
fumecheng-14015	5	34	the	the	DET
fumecheng-14015	5	35	limitations	limitation	NOUN
fumecheng-14015	5	36	of	of	ADP
fumecheng-14015	5	37	traditional	traditional	ADJ
fumecheng-14015	5	38	soldering	soldering	NOUN
fumecheng-14015	5	39	methods	method	NOUN
fumecheng-14015	5	40	.	.	PUNCT
fumecheng-14015	6	1	this	this	DET
fumecheng-14015	6	2	technology	technology	NOUN
fumecheng-14015	6	3	offers	offer	VERB
fumecheng-14015	6	4	excellent	excellent	ADJ
fumecheng-14015	6	5	power	power	NOUN
fumecheng-14015	6	6	efficiency	efficiency	NOUN
fumecheng-14015	6	7	,	,	PUNCT
fumecheng-14015	6	8	high	high	ADJ
fumecheng-14015	6	9	-	-	PUNCT
fumecheng-14015	6	10	density	density	NOUN
fumecheng-14015	6	11	packaging	packaging	NOUN
fumecheng-14015	6	12	,	,	PUNCT
fumecheng-14015	6	13	faster	fast	ADJ
fumecheng-14015	6	14	processing	processing	NOUN
fumecheng-14015	6	15	speeds	speed	NOUN
fumecheng-14015	6	16	,	,	PUNCT
fumecheng-14015	6	17	and	and	CCONJ
fumecheng-14015	6	18	improved	improved	ADJ
fumecheng-14015	6	19	heat	heat	NOUN
fumecheng-14015	6	20	dissipation	dissipation	NOUN
fumecheng-14015	6	21	.	.	PUNCT
fumecheng-14015	7	1	however	however	ADV
fumecheng-14015	7	2	,	,	PUNCT
fumecheng-14015	7	3	existing	exist	VERB
fumecheng-14015	7	4	research	research	NOUN
fumecheng-14015	7	5	has	have	VERB
fumecheng-14015	7	6	limitations	limitation	NOUN
fumecheng-14015	7	7	in	in	ADP
fumecheng-14015	7	8	systematically	systematically	ADV
fumecheng-14015	7	9	analyzing	analyze	VERB
fumecheng-14015	7	10	the	the	DET
fumecheng-14015	7	11	relationship	relationship	NOUN
fumecheng-14015	7	12	between	between	ADP
fumecheng-14015	7	13	key	key	ADJ
fumecheng-14015	7	14	parameters	parameter	NOUN
fumecheng-14015	7	15	affecting	affect	VERB
fumecheng-14015	7	16	cu	cu	PROPN
fumecheng-14015	7	17	-	-	PUNCT
fumecheng-14015	7	18	cu	cu	PROPN
fumecheng-14015	7	19	bonding	bonding	NOUN
fumecheng-14015	7	20	quality	quality	NOUN
fumecheng-14015	7	21	such	such	ADJ
fumecheng-14015	7	22	as	as	ADP
fumecheng-14015	7	23	bonding	bonding	NOUN
fumecheng-14015	7	24	layer	layer	NOUN
fumecheng-14015	7	25	thickness	thickness	NOUN
fumecheng-14015	7	26	,	,	PUNCT
fumecheng-14015	7	27	temperature	temperature	NOUN
fumecheng-14015	7	28	,	,	PUNCT
fumecheng-14015	7	29	grain	grain	NOUN
fumecheng-14015	7	30	size	size	NOUN
fumecheng-14015	7	31	,	,	PUNCT
fumecheng-14015	7	32	and	and	CCONJ
fumecheng-14015	7	33	surface	surface	NOUN
fumecheng-14015	7	34	roughness	roughness	NOUN
fumecheng-14015	7	35	.	.	PUNCT
fumecheng-14015	8	1	a	a	DET
fumecheng-14015	8	2	comprehensive	comprehensive	ADJ
fumecheng-14015	8	3	review	review	NOUN
fumecheng-14015	8	4	,	,	PUNCT
fumecheng-14015	8	5	particularly	particularly	ADV
fumecheng-14015	8	6	under	under	ADP
fumecheng-14015	8	7	the	the	DET
fumecheng-14015	8	8	low	low	ADJ
fumecheng-14015	8	9	-	-	PUNCT
fumecheng-14015	8	10	temperature	temperature	NOUN
fumecheng-14015	8	11	conditions	condition	NOUN
fumecheng-14015	8	12	necessary	necessary	ADJ
fumecheng-14015	8	13	for	for	ADP
fumecheng-14015	8	14	3d	3d	PROPN
fumecheng-14015	8	15	ic	ic	PROPN
fumecheng-14015	8	16	processes	process	NOUN
fumecheng-14015	8	17	,	,	PUNCT
fumecheng-14015	8	18	has	have	AUX
fumecheng-14015	8	19	been	be	AUX
fumecheng-14015	8	20	lacking	lack	VERB
fumecheng-14015	8	21	.	.	PUNCT
fumecheng-14015	9	1	therefore	therefore	ADV
fumecheng-14015	9	2	,	,	PUNCT
fumecheng-14015	9	3	this	this	DET
fumecheng-14015	9	4	review	review	NOUN
fumecheng-14015	9	5	introduces	introduce	VERB
fumecheng-14015	9	6	the	the	DET
fumecheng-14015	9	7	fundamental	fundamental	ADJ
fumecheng-14015	9	8	theory	theory	NOUN
fumecheng-14015	9	9	of	of	ADP
fumecheng-14015	9	10	cu	cu	PROPN
fumecheng-14015	9	11	-	-	PROPN
fumecheng-14015	9	12	cu	cu	PROPN
fumecheng-14015	9	13	bonding	bonding	NOUN
fumecheng-14015	9	14	and	and	CCONJ
fumecheng-14015	9	15	systematically	systematically	ADV
fumecheng-14015	9	16	discusses	discuss	VERB
fumecheng-14015	9	17	the	the	DET
fumecheng-14015	9	18	effects	effect	NOUN
fumecheng-14015	9	19	of	of	ADP
fumecheng-14015	9	20	the	the	DET
fumecheng-14015	9	21	parameters	parameter	NOUN
fumecheng-14015	9	22	on	on	ADP
fumecheng-14015	9	23	bonding	bond	VERB
fumecheng-14015	9	24	quality	quality	NOUN
fumecheng-14015	9	25	.	.	PUNCT
fumecheng-14015	10	1	by	by	ADP
fumecheng-14015	10	2	integrating	integrate	VERB
fumecheng-14015	10	3	these	these	DET
fumecheng-14015	10	4	factors	factor	NOUN
fumecheng-14015	10	5	with	with	ADP
fumecheng-14015	10	6	a	a	DET
fumecheng-14015	10	7	specific	specific	ADJ
fumecheng-14015	10	8	focus	focus	NOUN
fumecheng-14015	10	9	on	on	ADP
fumecheng-14015	10	10	lowtemperature	lowtemperature	PROPN
fumecheng-14015	10	11	cu	cu	PROPN
fumecheng-14015	10	12	-	-	PUNCT
fumecheng-14015	10	13	cu	cu	PROPN
fumecheng-14015	10	14	interfaces	interface	NOUN
fumecheng-14015	10	15	,	,	PUNCT
fumecheng-14015	10	16	this	this	DET
fumecheng-14015	10	17	review	review	NOUN
fumecheng-14015	10	18	aims	aim	VERB
fumecheng-14015	10	19	to	to	PART
fumecheng-14015	10	20	provide	provide	VERB
fumecheng-14015	10	21	a	a	DET
fumecheng-14015	10	22	practical	practical	ADJ
fumecheng-14015	10	23	and	and	CCONJ
fumecheng-14015	10	24	up	up	ADP
fumecheng-14015	10	25	-	-	PUNCT
fumecheng-14015	10	26	to	to	ADP
fumecheng-14015	10	27	-	-	PUNCT
fumecheng-14015	10	28	date	date	NOUN
fumecheng-14015	10	29	guide	guide	NOUN
fumecheng-14015	10	30	on	on	ADP
fumecheng-14015	10	31	cu	cu	PROPN
fumecheng-14015	10	32	-	-	PUNCT
fumecheng-14015	10	33	cu	cu	PROPN
fumecheng-14015	10	34	bonding	bonding	NOUN
fumecheng-14015	10	35	technologies	technology	NOUN
fumecheng-14015	10	36	.	.	PUNCT
fumecheng-14015	11	1	key	key	ADJ
fumecheng-14015	11	2	words	word	NOUN
fumecheng-14015	11	3	:	:	PUNCT
fumecheng-14015	11	4	cu	cu	NOUN
fumecheng-14015	11	5	,	,	PUNCT
fumecheng-14015	11	6	bonding	bonding	NOUN
fumecheng-14015	11	7	,	,	PUNCT
fumecheng-14015	11	8	3d	3d	NUM
fumecheng-14015	11	9	packaging	packaging	NOUN
fumecheng-14015	11	10	,	,	PUNCT
fumecheng-14015	11	11	low	low	ADJ
fumecheng-14015	11	12	-	-	PUNCT
fumecheng-14015	11	13	temperature	temperature	NOUN
fumecheng-14015	11	14	bonding	bonding	NOUN
fumecheng-14015	11	15	1	1	NUM
fumecheng-14015	11	16	.	.	PUNCT
fumecheng-14015	11	17	introduction	introduction	NOUN
fumecheng-14015	11	18	technological	technological	ADJ
fumecheng-14015	11	19	advancements	advancement	NOUN
fumecheng-14015	11	20	in	in	ADP
fumecheng-14015	11	21	computing	computing	NOUN
fumecheng-14015	11	22	and	and	CCONJ
fumecheng-14015	11	23	data	datum	NOUN
fumecheng-14015	11	24	storage	storage	NOUN
fumecheng-14015	11	25	systems	system	NOUN
fumecheng-14015	11	26	have	have	AUX
fumecheng-14015	11	27	driven	drive	VERB
fumecheng-14015	11	28	the	the	DET
fumecheng-14015	11	29	demand	demand	NOUN
fumecheng-14015	11	30	for	for	ADP
fumecheng-14015	11	31	ultra	ultra	ADJ
fumecheng-14015	11	32	-	-	ADJ
fumecheng-14015	11	33	high	high	ADJ
fumecheng-14015	11	34	-	-	PUNCT
fumecheng-14015	11	35	density	density	NOUN
fumecheng-14015	11	36	integrated	integrate	VERB
fumecheng-14015	11	37	circuits	circuit	NOUN
fumecheng-14015	11	38	.	.	PUNCT
fumecheng-14015	12	1	over	over	ADP
fumecheng-14015	12	2	the	the	DET
fumecheng-14015	12	3	past	past	ADJ
fumecheng-14015	12	4	few	few	ADJ
fumecheng-14015	12	5	decades	decade	NOUN
fumecheng-14015	12	6	,	,	PUNCT
fumecheng-14015	12	7	reducing	reduce	VERB
fumecheng-14015	12	8	the	the	DET
fumecheng-14015	12	9	transistor	transistor	NOUN
fumecheng-14015	12	10	size	size	NOUN
fumecheng-14015	12	11	has	have	AUX
fumecheng-14015	12	12	been	be	AUX
fumecheng-14015	12	13	the	the	DET
fumecheng-14015	12	14	primary	primary	ADJ
fumecheng-14015	12	15	focus	focus	NOUN
fumecheng-14015	12	16	of	of	ADP
fumecheng-14015	12	17	research	research	NOUN
fumecheng-14015	12	18	and	and	CCONJ
fumecheng-14015	12	19	development	development	NOUN
fumecheng-14015	12	20	in	in	ADP
fumecheng-14015	12	21	the	the	DET
fumecheng-14015	12	22	high	high	ADJ
fumecheng-14015	12	23	-	-	PUNCT
fumecheng-14015	12	24	density	density	NOUN
fumecheng-14015	12	25	integrated	integrate	VERB
fumecheng-14015	12	26	circuit	circuit	NOUN
fumecheng-14015	12	27	(	(	PUNCT
fumecheng-14015	12	28	ic	ic	NOUN
fumecheng-14015	12	29	)	)	PUNCT
fumecheng-14015	12	30	field	field	NOUN
fumecheng-14015	12	31	.	.	PUNCT
fumecheng-14015	13	1	the	the	DET
fumecheng-14015	13	2	current	current	ADJ
fumecheng-14015	13	3	state	state	NOUN
fumecheng-14015	13	4	-	-	PUNCT
fumecheng-14015	13	5	of	of	ADP
fumecheng-14015	13	6	-	-	PUNCT
fumecheng-14015	13	7	the	the	DET
fumecheng-14015	13	8	-	-	PUNCT
fumecheng-14015	13	9	art	art	NOUN
fumecheng-14015	13	10	scaling	scaling	NOUN
fumecheng-14015	13	11	technologies	technology	NOUN
fumecheng-14015	13	12	have	have	AUX
fumecheng-14015	13	13	achieved	achieve	VERB
fumecheng-14015	13	14	received	receive	VERB
fumecheng-14015	13	15	:	:	PUNCT
fumecheng-14015	13	16	august	august	PROPN
fumecheng-14015	13	17	30	30	NUM
fumecheng-14015	13	18	,	,	PUNCT
fumecheng-14015	13	19	2025	2025	NUM
fumecheng-14015	13	20	/	/	SYM
fumecheng-14015	13	21	accepted	accept	VERB
fumecheng-14015	13	22	november	november	PROPN
fumecheng-14015	13	23	10	10	NUM
fumecheng-14015	13	24	,	,	PUNCT
fumecheng-14015	13	25	2025	2025	NUM
fumecheng-14015	13	26	corresponding	correspond	VERB
fumecheng-14015	13	27	author	author	NOUN
fumecheng-14015	13	28	:	:	PUNCT
fumecheng-14015	13	29	byungil	byungil	PROPN
fumecheng-14015	13	30	hwang	hwang	PROPN
fumecheng-14015	13	31	school	school	PROPN
fumecheng-14015	13	32	of	of	ADP
fumecheng-14015	13	33	integrative	integrative	ADJ
fumecheng-14015	13	34	engineering	engineering	NOUN
fumecheng-14015	13	35	,	,	PUNCT
fumecheng-14015	13	36	chung	chung	PROPN
fumecheng-14015	13	37	-	-	PUNCT
fumecheng-14015	13	38	ang	ang	PROPN
fumecheng-14015	13	39	university	university	PROPN
fumecheng-14015	13	40	,	,	PUNCT
fumecheng-14015	13	41	seoul	seoul	PROPN
fumecheng-14015	13	42	06974	06974	NUM
fumecheng-14015	13	43	,	,	PUNCT
fumecheng-14015	13	44	republic	republic	NOUN
fumecheng-14015	13	45	of	of	ADP
fumecheng-14015	13	46	korea	korea	PROPN
fumecheng-14015	13	47	e	e	PROPN
fumecheng-14015	13	48	-	-	NOUN
fumecheng-14015	13	49	mail	mail	NOUN
fumecheng-14015	13	50	:	:	PUNCT
fumecheng-14015	13	51	bihwang@cau.ac.kr	bihwang@cau.ac.kr	PROPN
fumecheng-14015	13	52	922	922	NUM
fumecheng-14015	13	53	s.	s.	PROPN
fumecheng-14015	13	54	choi	choi	PROPN
fumecheng-14015	13	55	,	,	PUNCT
fumecheng-14015	13	56	c.	c.	PROPN
fumecheng-14015	13	57	chen	chen	PROPN
fumecheng-14015	13	58	,	,	PUNCT
fumecheng-14015	13	59	b.	b.	PROPN
fumecheng-14015	13	60	hwang	hwang	PROPN
fumecheng-14015	13	61	gate	gate	PROPN
fumecheng-14015	13	62	widths	width	NOUN
fumecheng-14015	13	63	in	in	ADP
fumecheng-14015	13	64	the	the	DET
fumecheng-14015	13	65	range	range	NOUN
fumecheng-14015	13	66	of	of	ADP
fumecheng-14015	13	67	just	just	ADV
fumecheng-14015	13	68	a	a	DET
fumecheng-14015	13	69	few	few	ADJ
fumecheng-14015	13	70	nanometers	nanometer	NOUN
fumecheng-14015	14	1	[	[	X
fumecheng-14015	14	2	1	1	NUM
fumecheng-14015	14	3	-	-	SYM
fumecheng-14015	14	4	3	3	NUM
fumecheng-14015	14	5	]	]	PUNCT
fumecheng-14015	14	6	.	.	PUNCT
fumecheng-14015	15	1	however	however	ADV
fumecheng-14015	15	2	,	,	PUNCT
fumecheng-14015	15	3	further	further	ADJ
fumecheng-14015	15	4	size	size	NOUN
fumecheng-14015	15	5	reduction	reduction	NOUN
fumecheng-14015	15	6	presents	present	VERB
fumecheng-14015	15	7	significant	significant	ADJ
fumecheng-14015	15	8	challenges	challenge	NOUN
fumecheng-14015	15	9	owing	owe	VERB
fumecheng-14015	15	10	to	to	ADP
fumecheng-14015	15	11	the	the	DET
fumecheng-14015	15	12	quantum	quantum	ADJ
fumecheng-14015	15	13	mechanical	mechanical	ADJ
fumecheng-14015	15	14	limitations	limitation	NOUN
fumecheng-14015	15	15	of	of	ADP
fumecheng-14015	15	16	these	these	DET
fumecheng-14015	15	17	materials	material	NOUN
fumecheng-14015	15	18	[	[	X
fumecheng-14015	15	19	4	4	NUM
fumecheng-14015	15	20	]	]	PUNCT
fumecheng-14015	15	21	.	.	PUNCT
fumecheng-14015	16	1	consequently	consequently	ADV
fumecheng-14015	16	2	,	,	PUNCT
fumecheng-14015	16	3	the	the	DET
fumecheng-14015	16	4	interest	interest	NOUN
fumecheng-14015	16	5	in	in	ADP
fumecheng-14015	16	6	three	three	NUM
fumecheng-14015	16	7	-	-	PUNCT
fumecheng-14015	16	8	dimensional	dimensional	ADJ
fumecheng-14015	16	9	(	(	PUNCT
fumecheng-14015	16	10	3d	3d	NUM
fumecheng-14015	16	11	)	)	PUNCT
fumecheng-14015	16	12	ic	ic	PROPN
fumecheng-14015	16	13	technology	technology	NOUN
fumecheng-14015	16	14	has	have	AUX
fumecheng-14015	16	15	increased	increase	VERB
fumecheng-14015	16	16	in	in	ADP
fumecheng-14015	16	17	recent	recent	ADJ
fumecheng-14015	16	18	years	year	NOUN
fumecheng-14015	16	19	.	.	PUNCT
fumecheng-14015	17	1	3d	3d	NUM
fumecheng-14015	17	2	ics	ics	PROPN
fumecheng-14015	17	3	maximize	maximize	VERB
fumecheng-14015	17	4	the	the	DET
fumecheng-14015	17	5	chip	chip	NOUN
fumecheng-14015	17	6	density	density	NOUN
fumecheng-14015	17	7	by	by	ADP
fumecheng-14015	17	8	stacking	stack	VERB
fumecheng-14015	17	9	multiple	multiple	ADJ
fumecheng-14015	17	10	chips	chip	NOUN
fumecheng-14015	17	11	vertically	vertically	ADV
fumecheng-14015	17	12	on	on	ADP
fumecheng-14015	17	13	a	a	DET
fumecheng-14015	17	14	limited	limited	ADJ
fumecheng-14015	17	15	substrate	substrate	NOUN
fumecheng-14015	17	16	area	area	NOUN
fumecheng-14015	17	17	,	,	PUNCT
fumecheng-14015	17	18	with	with	ADP
fumecheng-14015	17	19	high	high	ADJ
fumecheng-14015	17	20	bandwidth	bandwidth	ADJ
fumecheng-14015	17	21	memory	memory	NOUN
fumecheng-14015	17	22	(	(	PUNCT
fumecheng-14015	17	23	hbm	hbm	PROPN
fumecheng-14015	17	24	)	)	PUNCT
fumecheng-14015	17	25	being	be	AUX
fumecheng-14015	17	26	a	a	DET
fumecheng-14015	17	27	prime	prime	ADJ
fumecheng-14015	17	28	example	example	NOUN
fumecheng-14015	18	1	[	[	X
fumecheng-14015	18	2	5	5	NUM
fumecheng-14015	18	3	-	-	SYM
fumecheng-14015	18	4	8	8	NUM
fumecheng-14015	18	5	]	]	PUNCT
fumecheng-14015	18	6	.	.	PUNCT
fumecheng-14015	19	1	in	in	ADP
fumecheng-14015	19	2	hbms	hbms	PROPN
fumecheng-14015	19	3	,	,	PUNCT
fumecheng-14015	19	4	16	16	NUM
fumecheng-14015	19	5	-	-	PUNCT
fumecheng-14015	19	6	high	high	ADJ
fumecheng-14015	19	7	stacks	stack	NOUN
fumecheng-14015	19	8	have	have	AUX
fumecheng-14015	19	9	been	be	AUX
fumecheng-14015	19	10	formed	form	VERB
fumecheng-14015	19	11	to	to	PART
fumecheng-14015	19	12	achieve	achieve	VERB
fumecheng-14015	19	13	dynamic	dynamic	ADJ
fumecheng-14015	19	14	random	random	ADJ
fumecheng-14015	19	15	access	access	NOUN
fumecheng-14015	19	16	memories	memory	NOUN
fumecheng-14015	19	17	(	(	PUNCT
fumecheng-14015	19	18	dram	dram	PROPN
fumecheng-14015	19	19	)	)	PUNCT
fumecheng-14015	19	20	with	with	ADP
fumecheng-14015	19	21	32	32	NUM
fumecheng-14015	19	22	gb	gb	NOUN
fumecheng-14015	19	23	capacity	capacity	NOUN
fumecheng-14015	19	24	.	.	PUNCT
fumecheng-14015	20	1	traditionally	traditionally	ADV
fumecheng-14015	20	2	,	,	PUNCT
fumecheng-14015	20	3	chip	chip	NOUN
fumecheng-14015	20	4	-	-	PUNCT
fumecheng-14015	20	5	to	to	ADP
fumecheng-14015	20	6	-	-	PUNCT
fumecheng-14015	20	7	chip	chip	NOUN
fumecheng-14015	20	8	connections	connection	NOUN
fumecheng-14015	20	9	have	have	AUX
fumecheng-14015	20	10	been	be	AUX
fumecheng-14015	20	11	created	create	VERB
fumecheng-14015	20	12	using	use	VERB
fumecheng-14015	20	13	external	external	ADJ
fumecheng-14015	20	14	metal	metal	NOUN
fumecheng-14015	20	15	solder	solder	NOUN
fumecheng-14015	20	16	balls	ball	NOUN
fumecheng-14015	20	17	[	[	X
fumecheng-14015	20	18	9	9	NUM
fumecheng-14015	20	19	-	-	SYM
fumecheng-14015	20	20	18	18	NUM
fumecheng-14015	20	21	]	]	PUNCT
fumecheng-14015	20	22	.	.	PUNCT
fumecheng-14015	21	1	however	however	ADV
fumecheng-14015	21	2	,	,	PUNCT
fumecheng-14015	21	3	in	in	ADP
fumecheng-14015	21	4	3d	3d	PROPN
fumecheng-14015	21	5	ics	ic	NOUN
fumecheng-14015	21	6	,	,	PUNCT
fumecheng-14015	21	7	where	where	SCONJ
fumecheng-14015	21	8	the	the	DET
fumecheng-14015	21	9	gaps	gap	NOUN
fumecheng-14015	21	10	between	between	ADP
fumecheng-14015	21	11	the	the	DET
fumecheng-14015	21	12	interconnections	interconnection	NOUN
fumecheng-14015	21	13	are	be	AUX
fumecheng-14015	21	14	in	in	ADP
fumecheng-14015	21	15	submicron	submicron	NOUN
fumecheng-14015	21	16	scales	scale	NOUN
fumecheng-14015	21	17	,	,	PUNCT
fumecheng-14015	21	18	conventional	conventional	ADJ
fumecheng-14015	21	19	soldering	soldering	NOUN
fumecheng-14015	21	20	techniques	technique	NOUN
fumecheng-14015	21	21	become	become	VERB
fumecheng-14015	21	22	increasingly	increasingly	ADV
fumecheng-14015	21	23	challenging	challenging	ADJ
fumecheng-14015	21	24	.	.	PUNCT
fumecheng-14015	22	1	this	this	PRON
fumecheng-14015	22	2	has	have	AUX
fumecheng-14015	22	3	led	lead	VERB
fumecheng-14015	22	4	to	to	ADP
fumecheng-14015	22	5	a	a	DET
fumecheng-14015	22	6	growing	grow	VERB
fumecheng-14015	22	7	interest	interest	NOUN
fumecheng-14015	22	8	in	in	ADP
fumecheng-14015	22	9	direct	direct	ADJ
fumecheng-14015	22	10	bonding	bonding	NOUN
fumecheng-14015	22	11	technologies	technology	NOUN
fumecheng-14015	22	12	,	,	PUNCT
fumecheng-14015	22	13	where	where	SCONJ
fumecheng-14015	22	14	metal	metal	NOUN
fumecheng-14015	22	15	interconnects	interconnect	NOUN
fumecheng-14015	22	16	are	be	AUX
fumecheng-14015	22	17	bonded	bond	VERB
fumecheng-14015	22	18	without	without	ADP
fumecheng-14015	22	19	the	the	DET
fumecheng-14015	22	20	need	need	NOUN
fumecheng-14015	22	21	for	for	ADP
fumecheng-14015	22	22	external	external	ADJ
fumecheng-14015	22	23	solder	solder	NOUN
fumecheng-14015	22	24	balls	ball	NOUN
fumecheng-14015	22	25	[	[	X
fumecheng-14015	22	26	14	14	NUM
fumecheng-14015	22	27	-	-	SYM
fumecheng-14015	22	28	18	18	NUM
fumecheng-14015	22	29	]	]	PUNCT
fumecheng-14015	22	30	.	.	PUNCT
fumecheng-14015	23	1	among	among	ADP
fumecheng-14015	23	2	the	the	DET
fumecheng-14015	23	3	various	various	ADJ
fumecheng-14015	23	4	interconnect	interconnect	NOUN
fumecheng-14015	23	5	materials	material	NOUN
fumecheng-14015	23	6	such	such	ADJ
fumecheng-14015	23	7	as	as	ADP
fumecheng-14015	23	8	ag	ag	PROPN
fumecheng-14015	23	9	,	,	PUNCT
fumecheng-14015	23	10	au	au	ADP
fumecheng-14015	23	11	,	,	PUNCT
fumecheng-14015	23	12	and	and	CCONJ
fumecheng-14015	23	13	cu	cu	PROPN
fumecheng-14015	23	14	,	,	PUNCT
fumecheng-14015	23	15	cu	cu	PROPN
fumecheng-14015	23	16	-	-	PUNCT
fumecheng-14015	23	17	cu	cu	PROPN
fumecheng-14015	23	18	direct	direct	ADJ
fumecheng-14015	23	19	bonding	bonding	NOUN
fumecheng-14015	23	20	stands	stand	VERB
fumecheng-14015	23	21	out	out	ADP
fumecheng-14015	23	22	because	because	SCONJ
fumecheng-14015	23	23	of	of	ADP
fumecheng-14015	23	24	cu	cu	PROPN
fumecheng-14015	23	25	’s	’s	PART
fumecheng-14015	23	26	exceptional	exceptional	ADJ
fumecheng-14015	23	27	mechanical	mechanical	ADJ
fumecheng-14015	23	28	properties	property	NOUN
fumecheng-14015	23	29	,	,	PUNCT
fumecheng-14015	23	30	superior	superior	ADJ
fumecheng-14015	23	31	electromigration	electromigration	NOUN
fumecheng-14015	23	32	resistance	resistance	NOUN
fumecheng-14015	23	33	,	,	PUNCT
fumecheng-14015	23	34	high	high	ADJ
fumecheng-14015	23	35	electrical	electrical	ADJ
fumecheng-14015	23	36	conductivity	conductivity	NOUN
fumecheng-14015	23	37	,	,	PUNCT
fumecheng-14015	23	38	and	and	CCONJ
fumecheng-14015	23	39	excellent	excellent	ADJ
fumecheng-14015	23	40	thermal	thermal	ADJ
fumecheng-14015	23	41	conductivity	conductivity	NOUN
fumecheng-14015	23	42	.	.	PUNCT
fumecheng-14015	24	1	additionally	additionally	ADV
fumecheng-14015	24	2	,	,	PUNCT
fumecheng-14015	24	3	cu	cu	PROPN
fumecheng-14015	24	4	’s	’s	PART
fumecheng-14015	24	5	cost	cost	NOUN
fumecheng-14015	24	6	-	-	PUNCT
fumecheng-14015	24	7	effectiveness	effectiveness	NOUN
fumecheng-14015	24	8	,	,	PUNCT
fumecheng-14015	24	9	compared	compare	VERB
fumecheng-14015	24	10	with	with	ADP
fumecheng-14015	24	11	that	that	PRON
fumecheng-14015	24	12	of	of	ADP
fumecheng-14015	24	13	au	au	ADP
fumecheng-14015	24	14	and	and	CCONJ
fumecheng-14015	24	15	ag	ag	PROPN
fumecheng-14015	24	16	,	,	PUNCT
fumecheng-14015	24	17	makes	make	VERB
fumecheng-14015	24	18	it	it	PRON
fumecheng-14015	24	19	the	the	DET
fumecheng-14015	24	20	preferred	preferred	ADJ
fumecheng-14015	24	21	choice	choice	NOUN
fumecheng-14015	24	22	in	in	ADP
fumecheng-14015	24	23	industrial	industrial	ADJ
fumecheng-14015	24	24	applications	application	NOUN
fumecheng-14015	24	25	.	.	PUNCT
fumecheng-14015	25	1	consequently	consequently	ADV
fumecheng-14015	25	2	,	,	PUNCT
fumecheng-14015	25	3	cu	cu	PROPN
fumecheng-14015	25	4	-	-	PUNCT
fumecheng-14015	25	5	cu	cu	PROPN
fumecheng-14015	25	6	bonding	bonding	NOUN
fumecheng-14015	25	7	has	have	AUX
fumecheng-14015	25	8	become	become	VERB
fumecheng-14015	25	9	the	the	DET
fumecheng-14015	25	10	most	most	ADV
fumecheng-14015	25	11	widely	widely	ADV
fumecheng-14015	25	12	adopted	adopt	VERB
fumecheng-14015	25	13	technology	technology	NOUN
fumecheng-14015	25	14	for	for	ADP
fumecheng-14015	25	15	packaging	packaging	NOUN
fumecheng-14015	25	16	in	in	ADP
fumecheng-14015	25	17	3d	3d	NUM
fumecheng-14015	25	18	ics	ic	NOUN
fumecheng-14015	25	19	[	[	X
fumecheng-14015	25	20	19	19	NUM
fumecheng-14015	25	21	-	-	SYM
fumecheng-14015	25	22	24	24	NUM
fumecheng-14015	25	23	]	]	PUNCT
fumecheng-14015	25	24	.	.	PUNCT
fumecheng-14015	26	1	in	in	ADP
fumecheng-14015	26	2	cu	cu	PROPN
fumecheng-14015	26	3	-	-	PROPN
fumecheng-14015	26	4	cu	cu	PROPN
fumecheng-14015	26	5	direct	direct	ADJ
fumecheng-14015	26	6	bonding	bonding	NOUN
fumecheng-14015	26	7	,	,	PUNCT
fumecheng-14015	26	8	two	two	NUM
fumecheng-14015	26	9	flat	flat	ADJ
fumecheng-14015	26	10	cu	cu	NOUN
fumecheng-14015	26	11	surfaces	surface	NOUN
fumecheng-14015	26	12	are	be	AUX
fumecheng-14015	26	13	joined	join	VERB
fumecheng-14015	26	14	at	at	ADP
fumecheng-14015	26	15	high	high	ADJ
fumecheng-14015	26	16	temperatures	temperature	NOUN
fumecheng-14015	26	17	by	by	ADP
fumecheng-14015	26	18	applying	apply	VERB
fumecheng-14015	26	19	external	external	ADJ
fumecheng-14015	26	20	pressure	pressure	NOUN
fumecheng-14015	26	21	.	.	PUNCT
fumecheng-14015	27	1	a	a	DET
fumecheng-14015	27	2	bond	bond	NOUN
fumecheng-14015	27	3	is	be	AUX
fumecheng-14015	27	4	formed	form	VERB
fumecheng-14015	27	5	through	through	ADP
fumecheng-14015	27	6	the	the	DET
fumecheng-14015	27	7	diffusion	diffusion	NOUN
fumecheng-14015	27	8	of	of	ADP
fumecheng-14015	27	9	atoms	atom	NOUN
fumecheng-14015	27	10	and	and	CCONJ
fumecheng-14015	27	11	grain	grain	NOUN
fumecheng-14015	27	12	growth	growth	NOUN
fumecheng-14015	27	13	between	between	ADP
fumecheng-14015	27	14	the	the	DET
fumecheng-14015	27	15	surfaces	surface	NOUN
fumecheng-14015	27	16	.	.	PUNCT
fumecheng-14015	28	1	surface	surface	NOUN
fumecheng-14015	28	2	diffusion	diffusion	NOUN
fumecheng-14015	28	3	plays	play	VERB
fumecheng-14015	28	4	a	a	DET
fumecheng-14015	28	5	critical	critical	ADJ
fumecheng-14015	28	6	role	role	NOUN
fumecheng-14015	28	7	in	in	ADP
fumecheng-14015	28	8	facilitating	facilitate	VERB
fumecheng-14015	28	9	cu	cu	PROPN
fumecheng-14015	28	10	-	-	PUNCT
fumecheng-14015	28	11	cu	cu	PROPN
fumecheng-14015	28	12	bonding	bonding	NOUN
fumecheng-14015	28	13	as	as	SCONJ
fumecheng-14015	28	14	cu	cu	PROPN
fumecheng-14015	28	15	atoms	atom	NOUN
fumecheng-14015	28	16	migrate	migrate	VERB
fumecheng-14015	28	17	across	across	ADP
fumecheng-14015	28	18	the	the	DET
fumecheng-14015	28	19	interface	interface	NOUN
fumecheng-14015	28	20	,	,	PUNCT
fumecheng-14015	28	21	forming	form	VERB
fumecheng-14015	28	22	a	a	DET
fumecheng-14015	28	23	bonded	bond	VERB
fumecheng-14015	28	24	structure	structure	NOUN
fumecheng-14015	28	25	.	.	PUNCT
fumecheng-14015	29	1	as	as	SCONJ
fumecheng-14015	29	2	the	the	DET
fumecheng-14015	29	3	process	process	NOUN
fumecheng-14015	29	4	continues	continue	VERB
fumecheng-14015	29	5	,	,	PUNCT
fumecheng-14015	29	6	recovery	recovery	NOUN
fumecheng-14015	29	7	and	and	CCONJ
fumecheng-14015	29	8	grain	grain	NOUN
fumecheng-14015	29	9	growth	growth	NOUN
fumecheng-14015	29	10	at	at	ADP
fumecheng-14015	29	11	both	both	CCONJ
fumecheng-14015	29	12	the	the	DET
fumecheng-14015	29	13	interface	interface	NOUN
fumecheng-14015	29	14	and	and	CCONJ
fumecheng-14015	29	15	interior	interior	NOUN
fumecheng-14015	29	16	of	of	ADP
fumecheng-14015	29	17	cu	cu	PROPN
fumecheng-14015	29	18	further	far	ADV
fumecheng-14015	29	19	enhance	enhance	VERB
fumecheng-14015	29	20	the	the	DET
fumecheng-14015	29	21	bond	bond	NOUN
fumecheng-14015	29	22	[	[	X
fumecheng-14015	29	23	25	25	NUM
fumecheng-14015	29	24	-	-	SYM
fumecheng-14015	29	25	27	27	NUM
fumecheng-14015	29	26	]	]	PUNCT
fumecheng-14015	29	27	.	.	PUNCT
fumecheng-14015	30	1	the	the	DET
fumecheng-14015	30	2	quality	quality	NOUN
fumecheng-14015	30	3	of	of	ADP
fumecheng-14015	30	4	this	this	DET
fumecheng-14015	30	5	bond	bond	NOUN
fumecheng-14015	30	6	is	be	AUX
fumecheng-14015	30	7	primarily	primarily	ADV
fumecheng-14015	30	8	determined	determine	VERB
fumecheng-14015	30	9	by	by	ADP
fumecheng-14015	30	10	the	the	DET
fumecheng-14015	30	11	bonding	bonding	NOUN
fumecheng-14015	30	12	conditions	condition	NOUN
fumecheng-14015	30	13	such	such	ADJ
fumecheng-14015	30	14	as	as	ADP
fumecheng-14015	30	15	time	time	NOUN
fumecheng-14015	30	16	,	,	PUNCT
fumecheng-14015	30	17	temperature	temperature	NOUN
fumecheng-14015	30	18	,	,	PUNCT
fumecheng-14015	30	19	pressure	pressure	NOUN
fumecheng-14015	30	20	,	,	PUNCT
fumecheng-14015	30	21	and	and	CCONJ
fumecheng-14015	30	22	initial	initial	ADJ
fumecheng-14015	30	23	surface	surface	NOUN
fumecheng-14015	30	24	and	and	CCONJ
fumecheng-14015	30	25	microstructural	microstructural	ADJ
fumecheng-14015	30	26	characteristics	characteristic	NOUN
fumecheng-14015	30	27	of	of	ADP
fumecheng-14015	30	28	cu	cu	PROPN
fumecheng-14015	30	29	[	[	X
fumecheng-14015	30	30	28	28	NUM
fumecheng-14015	30	31	]	]	PUNCT
fumecheng-14015	30	32	.	.	PUNCT
fumecheng-14015	31	1	therefore	therefore	ADV
fumecheng-14015	31	2	,	,	PUNCT
fumecheng-14015	31	3	a	a	DET
fumecheng-14015	31	4	thorough	thorough	ADJ
fumecheng-14015	31	5	understanding	understanding	NOUN
fumecheng-14015	31	6	of	of	ADP
fumecheng-14015	31	7	how	how	SCONJ
fumecheng-14015	31	8	these	these	DET
fumecheng-14015	31	9	factors	factor	NOUN
fumecheng-14015	31	10	influence	influence	VERB
fumecheng-14015	31	11	the	the	DET
fumecheng-14015	31	12	bonding	bonding	NOUN
fumecheng-14015	31	13	properties	property	NOUN
fumecheng-14015	31	14	is	be	AUX
fumecheng-14015	31	15	essential	essential	ADJ
fumecheng-14015	31	16	to	to	PART
fumecheng-14015	31	17	achieve	achieve	VERB
fumecheng-14015	31	18	high	high	ADJ
fumecheng-14015	31	19	-	-	PUNCT
fumecheng-14015	31	20	quality	quality	NOUN
fumecheng-14015	31	21	cu	cu	PROPN
fumecheng-14015	31	22	-	-	PUNCT
fumecheng-14015	31	23	cu	cu	PROPN
fumecheng-14015	31	24	bonding	bonding	NOUN
fumecheng-14015	31	25	.	.	PUNCT
fumecheng-14015	32	1	despite	despite	SCONJ
fumecheng-14015	32	2	the	the	DET
fumecheng-14015	32	3	increasing	increase	VERB
fumecheng-14015	32	4	focus	focus	NOUN
fumecheng-14015	32	5	on	on	ADP
fumecheng-14015	32	6	developing	develop	VERB
fumecheng-14015	32	7	reliable	reliable	ADJ
fumecheng-14015	32	8	cu	cu	PROPN
fumecheng-14015	32	9	-	-	PUNCT
fumecheng-14015	32	10	cu	cu	PROPN
fumecheng-14015	32	11	bonding	bonding	NOUN
fumecheng-14015	32	12	technologies	technology	NOUN
fumecheng-14015	32	13	,	,	PUNCT
fumecheng-14015	32	14	comprehensive	comprehensive	ADJ
fumecheng-14015	32	15	reviews	review	NOUN
fumecheng-14015	32	16	that	that	PRON
fumecheng-14015	32	17	address	address	VERB
fumecheng-14015	32	18	the	the	DET
fumecheng-14015	32	19	critical	critical	ADJ
fumecheng-14015	32	20	factors	factor	NOUN
fumecheng-14015	32	21	affecting	affect	VERB
fumecheng-14015	32	22	the	the	DET
fumecheng-14015	32	23	bonding	bonding	NOUN
fumecheng-14015	32	24	reliability	reliability	NOUN
fumecheng-14015	32	25	are	be	AUX
fumecheng-14015	32	26	lacking	lack	VERB
fumecheng-14015	32	27	.	.	PUNCT
fumecheng-14015	33	1	this	this	DET
fumecheng-14015	33	2	review	review	NOUN
fumecheng-14015	33	3	explores	explore	VERB
fumecheng-14015	33	4	the	the	DET
fumecheng-14015	33	5	fundamental	fundamental	ADJ
fumecheng-14015	33	6	mechanisms	mechanism	NOUN
fumecheng-14015	33	7	and	and	CCONJ
fumecheng-14015	33	8	theoretical	theoretical	ADJ
fumecheng-14015	33	9	background	background	NOUN
fumecheng-14015	33	10	of	of	ADP
fumecheng-14015	33	11	cu	cu	PROPN
fumecheng-14015	33	12	-	-	PROPN
fumecheng-14015	33	13	cu	cu	PROPN
fumecheng-14015	33	14	bonding	bonding	NOUN
fumecheng-14015	33	15	under	under	ADP
fumecheng-14015	33	16	various	various	ADJ
fumecheng-14015	33	17	conditions	condition	NOUN
fumecheng-14015	33	18	.	.	PUNCT
fumecheng-14015	34	1	it	it	PRON
fumecheng-14015	34	2	also	also	ADV
fumecheng-14015	34	3	highlights	highlight	VERB
fumecheng-14015	34	4	the	the	DET
fumecheng-14015	34	5	state	state	NOUN
fumecheng-14015	34	6	-	-	PUNCT
fumecheng-14015	34	7	of	of	ADP
fumecheng-14015	34	8	-	-	PUNCT
fumecheng-14015	34	9	the	the	DET
fumecheng-14015	34	10	-	-	PUNCT
fumecheng-14015	34	11	art	art	NOUN
fumecheng-14015	34	12	surface	surface	NOUN
fumecheng-14015	34	13	control	control	NOUN
fumecheng-14015	34	14	technologies	technology	NOUN
fumecheng-14015	34	15	used	use	VERB
fumecheng-14015	34	16	to	to	PART
fumecheng-14015	34	17	achieve	achieve	VERB
fumecheng-14015	34	18	high	high	ADJ
fumecheng-14015	34	19	-	-	PUNCT
fumecheng-14015	34	20	quality	quality	NOUN
fumecheng-14015	34	21	cu	cu	PROPN
fumecheng-14015	34	22	-	-	PUNCT
fumecheng-14015	34	23	cu	cu	PROPN
fumecheng-14015	34	24	bonds	bond	NOUN
fumecheng-14015	34	25	at	at	ADP
fumecheng-14015	34	26	low	low	ADJ
fumecheng-14015	34	27	temperatures	temperature	NOUN
fumecheng-14015	34	28	,	,	PUNCT
fumecheng-14015	34	29	offering	offer	VERB
fumecheng-14015	34	30	a	a	DET
fumecheng-14015	34	31	future	future	ADJ
fumecheng-14015	34	32	perspective	perspective	NOUN
fumecheng-14015	34	33	on	on	ADP
fumecheng-14015	34	34	the	the	DET
fumecheng-14015	34	35	role	role	NOUN
fumecheng-14015	34	36	of	of	ADP
fumecheng-14015	34	37	cu	cu	PROPN
fumecheng-14015	34	38	-	-	PROPN
fumecheng-14015	34	39	cu	cu	PROPN
fumecheng-14015	34	40	bonding	bonding	NOUN
fumecheng-14015	34	41	in	in	ADP
fumecheng-14015	34	42	the	the	DET
fumecheng-14015	34	43	next	next	ADJ
fumecheng-14015	34	44	-	-	PUNCT
fumecheng-14015	34	45	generation	generation	NOUN
fumecheng-14015	34	46	electronic	electronic	ADJ
fumecheng-14015	34	47	packaging	packaging	NOUN
fumecheng-14015	34	48	.	.	PUNCT
fumecheng-14015	35	1	2	2	X
fumecheng-14015	35	2	.	.	NUM
fumecheng-14015	35	3	factors	factor	NOUN
fumecheng-14015	35	4	affecting	affect	VERB
fumecheng-14015	35	5	cu	cu	PROPN
fumecheng-14015	35	6	-	-	PUNCT
fumecheng-14015	35	7	cu	cu	PROPN
fumecheng-14015	35	8	mechanical	mechanical	ADJ
fumecheng-14015	35	9	bonding	bonding	NOUN
fumecheng-14015	35	10	the	the	DET
fumecheng-14015	35	11	grain	grain	NOUN
fumecheng-14015	35	12	size	size	NOUN
fumecheng-14015	35	13	and	and	CCONJ
fumecheng-14015	35	14	surface	surface	NOUN
fumecheng-14015	35	15	roughness	roughness	NOUN
fumecheng-14015	35	16	of	of	ADP
fumecheng-14015	35	17	cu	cu	PROPN
fumecheng-14015	35	18	are	be	AUX
fumecheng-14015	35	19	crucial	crucial	ADJ
fumecheng-14015	35	20	factors	factor	NOUN
fumecheng-14015	35	21	for	for	ADP
fumecheng-14015	35	22	achieving	achieve	VERB
fumecheng-14015	35	23	high	high	ADJ
fumecheng-14015	35	24	-	-	PUNCT
fumecheng-14015	35	25	quality	quality	NOUN
fumecheng-14015	35	26	bonding	bonding	NOUN
fumecheng-14015	35	27	interfaces	interface	NOUN
fumecheng-14015	35	28	[	[	X
fumecheng-14015	35	29	28	28	NUM
fumecheng-14015	35	30	-	-	SYM
fumecheng-14015	35	31	38	38	NUM
fumecheng-14015	35	32	]	]	PUNCT
fumecheng-14015	35	33	.	.	PUNCT
fumecheng-14015	36	1	a	a	DET
fumecheng-14015	36	2	reduction	reduction	NOUN
fumecheng-14015	36	3	in	in	ADP
fumecheng-14015	36	4	the	the	DET
fumecheng-14015	36	5	grain	grain	NOUN
fumecheng-14015	36	6	size	size	NOUN
fumecheng-14015	36	7	decreases	decrease	VERB
fumecheng-14015	36	8	the	the	DET
fumecheng-14015	36	9	likelihood	likelihood	NOUN
fumecheng-14015	36	10	of	of	ADP
fumecheng-14015	36	11	microcracks	microcrack	NOUN
fumecheng-14015	36	12	,	,	PUNCT
fumecheng-14015	36	13	thereby	thereby	ADV
fumecheng-14015	36	14	enhancing	enhance	VERB
fumecheng-14015	36	15	the	the	DET
fumecheng-14015	36	16	shear	shear	NOUN
fumecheng-14015	36	17	strength	strength	NOUN
fumecheng-14015	36	18	.	.	PUNCT
fumecheng-14015	37	1	grain	grain	NOUN
fumecheng-14015	37	2	boundaries	boundary	NOUN
fumecheng-14015	37	3	act	act	VERB
fumecheng-14015	37	4	as	as	ADP
fumecheng-14015	37	5	barriers	barrier	NOUN
fumecheng-14015	37	6	to	to	PART
fumecheng-14015	37	7	crack	crack	VERB
fumecheng-14015	37	8	propagation	propagation	NOUN
fumecheng-14015	37	9	;	;	PUNCT
fumecheng-14015	37	10	therefore	therefore	ADV
fumecheng-14015	37	11	,	,	PUNCT
fumecheng-14015	37	12	smaller	small	ADJ
fumecheng-14015	37	13	grain	grain	NOUN
fumecheng-14015	37	14	sizes	size	NOUN
fumecheng-14015	37	15	at	at	ADP
fumecheng-14015	37	16	the	the	DET
fumecheng-14015	37	17	cu	cu	PROPN
fumecheng-14015	37	18	-	-	PROPN
fumecheng-14015	37	19	cu	cu	PROPN
fumecheng-14015	37	20	bonding	bonding	NOUN
fumecheng-14015	37	21	interface	interface	NOUN
fumecheng-14015	37	22	result	result	NOUN
fumecheng-14015	37	23	in	in	ADP
fumecheng-14015	37	24	stronger	strong	ADJ
fumecheng-14015	37	25	bonds	bond	NOUN
fumecheng-14015	37	26	[	[	X
fumecheng-14015	37	27	39	39	NUM
fumecheng-14015	37	28	]	]	PUNCT
fumecheng-14015	37	29	.	.	PUNCT
fumecheng-14015	38	1	this	this	DET
fumecheng-14015	38	2	relationship	relationship	NOUN
fumecheng-14015	38	3	is	be	AUX
fumecheng-14015	38	4	described	describe	VERB
fumecheng-14015	38	5	by	by	ADP
fumecheng-14015	38	6	the	the	DET
fumecheng-14015	38	7	hall	hall	NOUN
fumecheng-14015	38	8	–	–	PUNCT
fumecheng-14015	38	9	petch	petch	NOUN
fumecheng-14015	38	10	equation	equation	NOUN
fumecheng-14015	38	11	,	,	PUNCT
fumecheng-14015	38	12	50	50	NUM
fumecheng-14015	38	13	0	0	NUM
fumecheng-14015	38	14	.	.	PUNCT
fumecheng-14015	39	1	y	y	PROPN
fumecheng-14015	39	2	,	,	PUNCT
fumecheng-14015	39	3	y	y	PROPN
fumecheng-14015	39	4	kdσσ	kdσσ	PROPN
fumecheng-14015	39	5	−+=	−+=	X
fumecheng-14015	39	6	(	(	PUNCT
fumecheng-14015	39	7	1	1	X
fumecheng-14015	39	8	)	)	PUNCT
fumecheng-14015	39	9	where	where	SCONJ
fumecheng-14015	39	10	σy	σy	NOUN
fumecheng-14015	39	11	is	be	AUX
fumecheng-14015	39	12	the	the	DET
fumecheng-14015	39	13	yield	yield	NOUN
fumecheng-14015	39	14	strength	strength	NOUN
fumecheng-14015	39	15	related	relate	VERB
fumecheng-14015	39	16	to	to	ADP
fumecheng-14015	39	17	the	the	DET
fumecheng-14015	39	18	grain	grain	NOUN
fumecheng-14015	39	19	size	size	NOUN
fumecheng-14015	39	20	,	,	PUNCT
fumecheng-14015	39	21	σy,0	σy,0	PROPN
fumecheng-14015	39	22	is	be	AUX
fumecheng-14015	39	23	the	the	DET
fumecheng-14015	39	24	starting	starting	NOUN
fumecheng-14015	39	25	yield	yield	NOUN
fumecheng-14015	39	26	stress	stress	NOUN
fumecheng-14015	39	27	for	for	ADP
fumecheng-14015	39	28	dislocation	dislocation	NOUN
fumecheng-14015	39	29	movement	movement	NOUN
fumecheng-14015	39	30	,	,	PUNCT
fumecheng-14015	39	31	k	k	PROPN
fumecheng-14015	39	32	is	be	AUX
fumecheng-14015	39	33	a	a	DET
fumecheng-14015	39	34	constant	constant	ADJ
fumecheng-14015	39	35	of	of	ADP
fumecheng-14015	39	36	strengthening	strengthen	VERB
fumecheng-14015	39	37	coefficient	coefficient	NOUN
fumecheng-14015	39	38	,	,	PUNCT
fumecheng-14015	39	39	and	and	CCONJ
fumecheng-14015	39	40	d	d	NOUN
fumecheng-14015	39	41	is	be	AUX
fumecheng-14015	39	42	the	the	DET
fumecheng-14015	39	43	average	average	ADJ
fumecheng-14015	39	44	grain	grain	NOUN
fumecheng-14015	39	45	size	size	NOUN
fumecheng-14015	39	46	[	[	X
fumecheng-14015	39	47	40	40	NUM
fumecheng-14015	39	48	]	]	PUNCT
fumecheng-14015	39	49	.	.	PUNCT
fumecheng-14015	40	1	cu	cu	PROPN
fumecheng-14015	40	2	-	-	PUNCT
fumecheng-14015	40	3	cu	cu	PROPN
fumecheng-14015	40	4	mechanical	mechanical	ADJ
fumecheng-14015	40	5	bonding	bonding	NOUN
fumecheng-14015	40	6	for	for	ADP
fumecheng-14015	40	7	3d	3d	NOUN
fumecheng-14015	40	8	integration	integration	NOUN
fumecheng-14015	40	9	of	of	ADP
fumecheng-14015	40	10	the	the	DET
fumecheng-14015	40	11	next	next	ADJ
fumecheng-14015	40	12	generation	generation	NOUN
fumecheng-14015	40	13	electronic	electronic	ADJ
fumecheng-14015	40	14	chips	chip	NOUN
fumecheng-14015	40	15	...	...	PUNCT
fumecheng-14015	40	16	923	923	NUM
fumecheng-14015	40	17	kao	kao	NOUN
fumecheng-14015	40	18	et	et	PROPN
fumecheng-14015	40	19	al	al	PROPN
fumecheng-14015	40	20	.	.	PUNCT
fumecheng-14015	41	1	[	[	X
fumecheng-14015	41	2	41	41	NUM
fumecheng-14015	41	3	]	]	PUNCT
fumecheng-14015	41	4	confirmed	confirm	VERB
fumecheng-14015	41	5	the	the	DET
fumecheng-14015	41	6	hall	hall	NOUN
fumecheng-14015	41	7	–	–	PUNCT
fumecheng-14015	41	8	petch	petch	NOUN
fumecheng-14015	41	9	relationship	relationship	NOUN
fumecheng-14015	41	10	in	in	ADP
fumecheng-14015	41	11	electrically	electrically	ADV
fumecheng-14015	41	12	plated	plate	VERB
fumecheng-14015	41	13	cu	cu	PROPN
fumecheng-14015	41	14	thin	thin	ADJ
fumecheng-14015	41	15	films	film	NOUN
fumecheng-14015	41	16	.	.	PUNCT
fumecheng-14015	42	1	this	this	PRON
fumecheng-14015	42	2	directly	directly	ADV
fumecheng-14015	42	3	supports	support	VERB
fumecheng-14015	42	4	the	the	DET
fumecheng-14015	42	5	validity	validity	NOUN
fumecheng-14015	42	6	of	of	ADP
fumecheng-14015	42	7	the	the	DET
fumecheng-14015	42	8	premise	premise	NOUN
fumecheng-14015	42	9	that	that	SCONJ
fumecheng-14015	42	10	“	"	PUNCT
fumecheng-14015	42	11	smaller	small	ADJ
fumecheng-14015	42	12	grain	grain	NOUN
fumecheng-14015	42	13	size	size	NOUN
fumecheng-14015	42	14	→	→	SYM
fumecheng-14015	42	15	higher	high	ADJ
fumecheng-14015	42	16	yield	yield	NOUN
fumecheng-14015	42	17	strength	strength	NOUN
fumecheng-14015	42	18	/	/	SYM
fumecheng-14015	42	19	hardness	hardness	NOUN
fumecheng-14015	42	20	of	of	ADP
fumecheng-14015	42	21	the	the	DET
fumecheng-14015	42	22	material	material	NOUN
fumecheng-14015	42	23	itself	itself	PRON
fumecheng-14015	42	24	”	"	PUNCT
fumecheng-14015	42	25	in	in	ADP
fumecheng-14015	42	26	cu	cu	PROPN
fumecheng-14015	42	27	.	.	PUNCT
fumecheng-14015	42	28	grain	grain	NOUN
fumecheng-14015	42	29	size	size	NOUN
fumecheng-14015	42	30	and	and	CCONJ
fumecheng-14015	42	31	mechanical	mechanical	ADJ
fumecheng-14015	42	32	response	response	NOUN
fumecheng-14015	42	33	co	co	NOUN
fumecheng-14015	42	34	-	-	NOUN
fumecheng-14015	42	35	vary	vary	ADJ
fumecheng-14015	42	36	,	,	PUNCT
fumecheng-14015	42	37	and	and	CCONJ
fumecheng-14015	42	38	smaller	small	ADJ
fumecheng-14015	42	39	grains	grain	NOUN
fumecheng-14015	42	40	tend	tend	VERB
fumecheng-14015	42	41	to	to	PART
fumecheng-14015	42	42	accompany	accompany	VERB
fumecheng-14015	42	43	higher	high	ADJ
fumecheng-14015	42	44	yield	yield	NOUN
fumecheng-14015	42	45	stress	stress	NOUN
fumecheng-14015	42	46	.	.	PUNCT
fumecheng-14015	43	1	table	table	NOUN
fumecheng-14015	43	2	1	1	NUM
fumecheng-14015	43	3	shows	show	VERB
fumecheng-14015	43	4	the	the	DET
fumecheng-14015	43	5	electron	electron	NOUN
fumecheng-14015	43	6	backscatter	backscatter	NOUN
fumecheng-14015	43	7	diffraction	diffraction	NOUN
fumecheng-14015	43	8	(	(	PUNCT
fumecheng-14015	43	9	ebsd	ebsd	NOUN
fumecheng-14015	43	10	)	)	PUNCT
fumecheng-14015	43	11	mapping	mapping	NOUN
fumecheng-14015	43	12	and	and	CCONJ
fumecheng-14015	43	13	its	its	PRON
fumecheng-14015	43	14	summary	summary	NOUN
fumecheng-14015	43	15	for	for	ADP
fumecheng-14015	43	16	various	various	ADJ
fumecheng-14015	43	17	cu	cu	PROPN
fumecheng-14015	43	18	electroplated	electroplate	VERB
fumecheng-14015	43	19	samples	sample	NOUN
fumecheng-14015	43	20	with	with	ADP
fumecheng-14015	43	21	different	different	ADJ
fumecheng-14015	43	22	bis-(3	bis-(3	PROPN
fumecheng-14015	43	23	-	-	PUNCT
fumecheng-14015	43	24	sulfopropyl	sulfopropyl	NOUN
fumecheng-14015	43	25	)	)	PUNCT
fumecheng-14015	43	26	disulfide	disulfide	NOUN
fumecheng-14015	43	27	(	(	PUNCT
fumecheng-14015	43	28	sps	sps	NOUN
fumecheng-14015	43	29	)	)	PUNCT
fumecheng-14015	43	30	conditions	condition	NOUN
fumecheng-14015	43	31	.	.	PUNCT
fumecheng-14015	44	1	pc	pc	NOUN
fumecheng-14015	44	2	designates	designate	NOUN
fumecheng-14015	44	3	specimens	specimen	NOUN
fumecheng-14015	44	4	electroplated	electroplate	VERB
fumecheng-14015	44	5	with	with	ADP
fumecheng-14015	44	6	polyethylene	polyethylene	NOUN
fumecheng-14015	44	7	glycol	glycol	NOUN
fumecheng-14015	44	8	(	(	PUNCT
fumecheng-14015	44	9	peg	peg	NOUN
fumecheng-14015	44	10	)	)	PUNCT
fumecheng-14015	44	11	and	and	CCONJ
fumecheng-14015	44	12	chloride	chloride	NOUN
fumecheng-14015	44	13	ions	ion	NOUN
fumecheng-14015	44	14	,	,	PUNCT
fumecheng-14015	44	15	whereas	whereas	SCONJ
fumecheng-14015	44	16	pcs	pc	NOUN
fumecheng-14015	44	17	refers	refer	VERB
fumecheng-14015	44	18	to	to	ADP
fumecheng-14015	44	19	those	those	PRON
fumecheng-14015	44	20	containing	contain	VERB
fumecheng-14015	44	21	sps	sps	NOUN
fumecheng-14015	44	22	as	as	ADP
fumecheng-14015	44	23	an	an	DET
fumecheng-14015	44	24	accelerator	accelerator	NOUN
fumecheng-14015	44	25	in	in	ADP
fumecheng-14015	44	26	addition	addition	NOUN
fumecheng-14015	44	27	to	to	ADP
fumecheng-14015	44	28	the	the	DET
fumecheng-14015	44	29	pc	pc	NOUN
fumecheng-14015	44	30	composition	composition	NOUN
fumecheng-14015	44	31	.	.	PUNCT
fumecheng-14015	45	1	pc	pc	NOUN
fumecheng-14015	45	2	,	,	PUNCT
fumecheng-14015	45	3	pcs0.2	pcs0.2	PROPN
fumecheng-14015	45	4	,	,	PUNCT
fumecheng-14015	45	5	pcs0.5	pcs0.5	PROPN
fumecheng-14015	45	6	,	,	PUNCT
fumecheng-14015	45	7	pcs1.0	pcs1.0	PROPN
fumecheng-14015	45	8	,	,	PUNCT
fumecheng-14015	45	9	and	and	CCONJ
fumecheng-14015	45	10	pcs2.0	pcs2.0	PROPN
fumecheng-14015	45	11	represent	represent	VERB
fumecheng-14015	45	12	samples	sample	NOUN
fumecheng-14015	45	13	with	with	ADP
fumecheng-14015	45	14	increasing	increase	VERB
fumecheng-14015	45	15	sps	sps	NOUN
fumecheng-14015	45	16	concentration	concentration	NOUN
fumecheng-14015	45	17	,	,	PUNCT
fumecheng-14015	45	18	from	from	ADP
fumecheng-14015	45	19	0	0	NUM
fumecheng-14015	45	20	ppm	ppm	NOUN
fumecheng-14015	45	21	(	(	PUNCT
fumecheng-14015	45	22	pc	pc	NOUN
fumecheng-14015	45	23	)	)	PUNCT
fumecheng-14015	45	24	to	to	ADP
fumecheng-14015	45	25	2.0	2.0	NUM
fumecheng-14015	45	26	ppm	ppm	NOUN
fumecheng-14015	45	27	(	(	PUNCT
fumecheng-14015	45	28	pcs2.0	pcs2.0	NOUN
fumecheng-14015	45	29	)	)	PUNCT
fumecheng-14015	45	30	.	.	PUNCT
fumecheng-14015	46	1	the	the	DET
fumecheng-14015	46	2	results	result	NOUN
fumecheng-14015	46	3	indicate	indicate	VERB
fumecheng-14015	46	4	that	that	SCONJ
fumecheng-14015	46	5	pcs0.2	pcs0.2	PROPN
fumecheng-14015	46	6	exhibits	exhibit	VERB
fumecheng-14015	46	7	the	the	DET
fumecheng-14015	46	8	smallest	small	ADJ
fumecheng-14015	46	9	average	average	ADJ
fumecheng-14015	46	10	grain	grain	NOUN
fumecheng-14015	46	11	size	size	NOUN
fumecheng-14015	46	12	(	(	PUNCT
fumecheng-14015	46	13	0.29	0.29	NUM
fumecheng-14015	46	14	μm	μm	NUM
fumecheng-14015	46	15	)	)	PUNCT
fumecheng-14015	46	16	,	,	PUNCT
fumecheng-14015	46	17	while	while	SCONJ
fumecheng-14015	46	18	higher	high	ADJ
fumecheng-14015	46	19	sps	sps	NOUN
fumecheng-14015	46	20	specimens	specimen	NOUN
fumecheng-14015	46	21	show	show	VERB
fumecheng-14015	46	22	larger	large	ADJ
fumecheng-14015	46	23	grains	grain	NOUN
fumecheng-14015	46	24	(	(	PUNCT
fumecheng-14015	46	25	table	table	NOUN
fumecheng-14015	46	26	1	1	NUM
fumecheng-14015	46	27	,	,	PUNCT
fumecheng-14015	46	28	fig	fig	NOUN
fumecheng-14015	46	29	.	.	NOUN
fumecheng-14015	47	1	1	1	NUM
fumecheng-14015	47	2	)	)	PUNCT
fumecheng-14015	47	3	.	.	PUNCT
fumecheng-14015	48	1	consistently	consistently	ADV
fumecheng-14015	48	2	,	,	PUNCT
fumecheng-14015	48	3	tensile	tensile	NOUN
fumecheng-14015	48	4	data	datum	NOUN
fumecheng-14015	48	5	report	report	VERB
fumecheng-14015	48	6	the	the	DET
fumecheng-14015	48	7	highest	high	ADJ
fumecheng-14015	48	8	average	average	ADJ
fumecheng-14015	48	9	yield	yield	NOUN
fumecheng-14015	48	10	stress	stress	NOUN
fumecheng-14015	48	11	for	for	ADP
fumecheng-14015	48	12	pcs0.2	pcs0.2	PROPN
fumecheng-14015	48	13	,	,	PUNCT
fumecheng-14015	48	14	with	with	ADP
fumecheng-14015	48	15	lower	low	ADJ
fumecheng-14015	48	16	values	value	NOUN
fumecheng-14015	48	17	for	for	ADP
fumecheng-14015	48	18	the	the	DET
fumecheng-14015	48	19	coarser	coarser	ADV
fumecheng-14015	48	20	-	-	PUNCT
fumecheng-14015	48	21	grained	grain	VERB
fumecheng-14015	48	22	specimens	specimen	NOUN
fumecheng-14015	48	23	(	(	PUNCT
fumecheng-14015	48	24	table	table	NOUN
fumecheng-14015	48	25	2	2	NUM
fumecheng-14015	48	26	)	)	PUNCT
fumecheng-14015	48	27	,	,	PUNCT
fumecheng-14015	48	28	in	in	ADP
fumecheng-14015	48	29	agreement	agreement	NOUN
fumecheng-14015	48	30	with	with	ADP
fumecheng-14015	48	31	the	the	DET
fumecheng-14015	48	32	hall	hall	NOUN
fumecheng-14015	48	33	–	–	PUNCT
fumecheng-14015	48	34	petch	petch	NOUN
fumecheng-14015	48	35	relation	relation	NOUN
fumecheng-14015	48	36	.	.	PUNCT
fumecheng-14015	49	1	these	these	DET
fumecheng-14015	49	2	results	result	NOUN
fumecheng-14015	49	3	suggest	suggest	VERB
fumecheng-14015	49	4	that	that	SCONJ
fumecheng-14015	49	5	grain	grain	NOUN
fumecheng-14015	49	6	refinement	refinement	NOUN
fumecheng-14015	49	7	likely	likely	ADV
fumecheng-14015	49	8	contributes	contribute	VERB
fumecheng-14015	49	9	to	to	ADP
fumecheng-14015	49	10	boundary	boundary	ADJ
fumecheng-14015	49	11	strengthening	strengthening	NOUN
fumecheng-14015	49	12	and	and	CCONJ
fumecheng-14015	49	13	the	the	DET
fumecheng-14015	49	14	observed	observed	ADJ
fumecheng-14015	49	15	increase	increase	NOUN
fumecheng-14015	49	16	in	in	ADP
fumecheng-14015	49	17	yield	yield	NOUN
fumecheng-14015	49	18	stress	stress	NOUN
fumecheng-14015	49	19	within	within	ADP
fumecheng-14015	49	20	this	this	DET
fumecheng-14015	49	21	dataset	dataset	NOUN
fumecheng-14015	49	22	.	.	PUNCT
fumecheng-14015	50	1	table	table	NOUN
fumecheng-14015	50	2	1	1	NUM
fumecheng-14015	50	3	average	average	ADJ
fumecheng-14015	50	4	grain	grain	NOUN
fumecheng-14015	50	5	sizes	size	NOUN
fumecheng-14015	50	6	of	of	ADP
fumecheng-14015	50	7	various	various	ADJ
fumecheng-14015	50	8	cu	cu	PROPN
fumecheng-14015	50	9	electroplated	electroplate	VERB
fumecheng-14015	50	10	samples	sample	NOUN
fumecheng-14015	50	11	determined	determine	VERB
fumecheng-14015	50	12	by	by	ADP
fumecheng-14015	50	13	the	the	DET
fumecheng-14015	50	14	ebsd	ebsd	NOUN
fumecheng-14015	50	15	grain	grain	NOUN
fumecheng-14015	50	16	mappings	mapping	NOUN
fumecheng-14015	50	17	in	in	ADP
fumecheng-14015	50	18	fig	fig	NOUN
fumecheng-14015	50	19	.	.	PUNCT
fumecheng-14015	51	1	1	1	NUM
fumecheng-14015	51	2	specimens	specimen	NOUN
fumecheng-14015	51	3	pc	pc	NOUN
fumecheng-14015	51	4	pcs0.2	pcs0.2	NOUN
fumecheng-14015	51	5	pcs0.5	pcs0.5	PROPN
fumecheng-14015	51	6	pcs1.0	pcs1.0	PROPN
fumecheng-14015	51	7	pcs2.0	pcs2.0	PROPN
fumecheng-14015	51	8	grain	grain	NOUN
fumecheng-14015	51	9	size	size	NOUN
fumecheng-14015	51	10	(	(	PUNCT
fumecheng-14015	51	11	μm	μm	NOUN
fumecheng-14015	51	12	)	)	PUNCT
fumecheng-14015	51	13	0.55	0.55	NUM
fumecheng-14015	51	14	0.29	0.29	NUM
fumecheng-14015	51	15	1.97	1.97	NUM
fumecheng-14015	51	16	3.79	3.79	NUM
fumecheng-14015	51	17	3.77	3.77	NUM
fumecheng-14015	51	18	fig	fig	NOUN
fumecheng-14015	51	19	.	.	PUNCT
fumecheng-14015	52	1	1	1	NUM
fumecheng-14015	52	2	ebsd	ebsd	NOUN
fumecheng-14015	52	3	grain	grain	NOUN
fumecheng-14015	52	4	mappings	mapping	NOUN
fumecheng-14015	52	5	of	of	ADP
fumecheng-14015	52	6	the	the	DET
fumecheng-14015	52	7	cu	cu	PROPN
fumecheng-14015	52	8	electroplated	electroplate	VERB
fumecheng-14015	52	9	layers	layer	NOUN
fumecheng-14015	52	10	labelled	label	VERB
fumecheng-14015	52	11	as	as	ADP
fumecheng-14015	52	12	(	(	PUNCT
fumecheng-14015	52	13	a	a	PRON
fumecheng-14015	52	14	)	)	PUNCT
fumecheng-14015	52	15	pc	pc	NOUN
fumecheng-14015	52	16	,	,	PUNCT
fumecheng-14015	52	17	(	(	PUNCT
fumecheng-14015	52	18	b	b	X
fumecheng-14015	52	19	)	)	PUNCT
fumecheng-14015	52	20	pcs0.2	pcs0.2	PROPN
fumecheng-14015	52	21	,	,	PUNCT
fumecheng-14015	52	22	(	(	PUNCT
fumecheng-14015	52	23	c	c	NOUN
fumecheng-14015	52	24	)	)	PUNCT
fumecheng-14015	52	25	pcs0.5	pcs0.5	NOUN
fumecheng-14015	52	26	,	,	PUNCT
fumecheng-14015	52	27	(	(	PUNCT
fumecheng-14015	52	28	d	d	X
fumecheng-14015	52	29	)	)	PUNCT
fumecheng-14015	52	30	pcs1.0	pcs1.0	PROPN
fumecheng-14015	52	31	,	,	PUNCT
fumecheng-14015	52	32	and	and	CCONJ
fumecheng-14015	52	33	(	(	PUNCT
fumecheng-14015	52	34	e	e	NOUN
fumecheng-14015	52	35	)	)	PUNCT
fumecheng-14015	52	36	pcs2.0	pcs2.0	NOUN
fumecheng-14015	52	37	.	.	PUNCT
fumecheng-14015	53	1	the	the	DET
fumecheng-14015	53	2	mappings	mapping	NOUN
fumecheng-14015	53	3	are	be	AUX
fumecheng-14015	53	4	created	create	VERB
fumecheng-14015	53	5	by	by	ADP
fumecheng-14015	53	6	orientation	orientation	NOUN
fumecheng-14015	53	7	imaging	imaging	NOUN
fumecheng-14015	53	8	microscopy	microscopy	NOUN
fumecheng-14015	53	9	(	(	PUNCT
fumecheng-14015	53	10	oim	oim	PROPN
fumecheng-14015	53	11	)	)	PUNCT
fumecheng-14015	53	12	analysis	analysis	NOUN
fumecheng-14015	53	13	v8	v8	PROPN
fumecheng-14015	53	14	[	[	X
fumecheng-14015	53	15	41	41	NUM
fumecheng-14015	53	16	]	]	SYM
fumecheng-14015	53	17	924	924	NUM
fumecheng-14015	53	18	s.	s.	PROPN
fumecheng-14015	53	19	choi	choi	PROPN
fumecheng-14015	53	20	,	,	PUNCT
fumecheng-14015	53	21	c.	c.	PROPN
fumecheng-14015	53	22	chen	chen	PROPN
fumecheng-14015	53	23	,	,	PUNCT
fumecheng-14015	53	24	b.	b.	PROPN
fumecheng-14015	53	25	hwang	hwang	PROPN
fumecheng-14015	53	26	table	table	NOUN
fumecheng-14015	53	27	2	2	NUM
fumecheng-14015	53	28	yield	yield	NOUN
fumecheng-14015	53	29	stresses	stress	NOUN
fumecheng-14015	53	30	and	and	CCONJ
fumecheng-14015	53	31	elongations	elongation	NOUN
fumecheng-14015	53	32	of	of	ADP
fumecheng-14015	53	33	various	various	ADJ
fumecheng-14015	53	34	cu	cu	PROPN
fumecheng-14015	53	35	electroplated	electroplate	VERB
fumecheng-14015	53	36	samples	sample	NOUN
fumecheng-14015	53	37	specimens	specimen	NOUN
fumecheng-14015	53	38	pc	pc	NOUN
fumecheng-14015	53	39	pcs0.2	pcs0.2	NOUN
fumecheng-14015	53	40	pcs0.5	pcs0.5	PROPN
fumecheng-14015	53	41	pcs1.0	pcs1.0	PROPN
fumecheng-14015	53	42	pcs2.0	pcs2.0	PROPN
fumecheng-14015	53	43	yield	yield	VERB
fumecheng-14015	53	44	stress	stress	NOUN
fumecheng-14015	53	45	(	(	PUNCT
fumecheng-14015	53	46	mpa	mpa	PROPN
fumecheng-14015	53	47	)	)	PUNCT
fumecheng-14015	53	48	351	351	NUM
fumecheng-14015	53	49	±	±	NUM
fumecheng-14015	53	50	8	8	NUM
fumecheng-14015	53	51	416	416	NUM
fumecheng-14015	53	52	±	±	NUM
fumecheng-14015	53	53	8	8	NUM
fumecheng-14015	53	54	290	290	NUM
fumecheng-14015	53	55	±12	±12	NUM
fumecheng-14015	53	56	261	261	NUM
fumecheng-14015	53	57	±	±	NUM
fumecheng-14015	53	58	5	5	NUM
fumecheng-14015	53	59	248±	248±	NUM
fumecheng-14015	53	60	2	2	NUM
fumecheng-14015	53	61	elongation	elongation	NOUN
fumecheng-14015	53	62	(	(	PUNCT
fumecheng-14015	53	63	%	%	NOUN
fumecheng-14015	53	64	)	)	PUNCT
fumecheng-14015	53	65	2.9	2.9	NUM
fumecheng-14015	53	66	±	±	NUM
fumecheng-14015	53	67	0.2	0.2	NUM
fumecheng-14015	53	68	4.3	4.3	NUM
fumecheng-14015	53	69	±	±	NUM
fumecheng-14015	53	70	0.3	0.3	NUM
fumecheng-14015	53	71	7.2	7.2	NUM
fumecheng-14015	53	72	±	±	NUM
fumecheng-14015	53	73	0.9	0.9	NUM
fumecheng-14015	53	74	9.0	9.0	NUM
fumecheng-14015	53	75	±	±	NUM
fumecheng-14015	53	76	0.7	0.7	NUM
fumecheng-14015	53	77	9.4	9.4	NUM
fumecheng-14015	53	78	±	±	NUM
fumecheng-14015	53	79	0.4	0.4	NUM
fumecheng-14015	53	80	somekawa	somekawa	PROPN
fumecheng-14015	53	81	et	et	PROPN
fumecheng-14015	53	82	al	al	PROPN
fumecheng-14015	53	83	.	.	PUNCT
fumecheng-14015	54	1	[	[	X
fumecheng-14015	54	2	42	42	NUM
fumecheng-14015	54	3	]	]	PUNCT
fumecheng-14015	54	4	studied	study	VERB
fumecheng-14015	54	5	the	the	DET
fumecheng-14015	54	6	effect	effect	NOUN
fumecheng-14015	54	7	of	of	ADP
fumecheng-14015	54	8	grain	grain	NOUN
fumecheng-14015	54	9	size	size	NOUN
fumecheng-14015	54	10	on	on	ADP
fumecheng-14015	54	11	the	the	DET
fumecheng-14015	54	12	shear	shear	NOUN
fumecheng-14015	54	13	strength	strength	NOUN
fumecheng-14015	54	14	,	,	PUNCT
fumecheng-14015	54	15	bonding	bonding	NOUN
fumecheng-14015	54	16	time	time	NOUN
fumecheng-14015	54	17	,	,	PUNCT
fumecheng-14015	54	18	and	and	CCONJ
fumecheng-14015	54	19	bonding	bonding	NOUN
fumecheng-14015	54	20	pressure	pressure	NOUN
fumecheng-14015	54	21	by	by	ADP
fumecheng-14015	54	22	comparing	compare	VERB
fumecheng-14015	54	23	two	two	NUM
fumecheng-14015	54	24	types	type	NOUN
fumecheng-14015	54	25	of	of	ADP
fumecheng-14015	54	26	samples	sample	NOUN
fumecheng-14015	54	27	:	:	PUNCT
fumecheng-14015	54	28	a	a	DET
fumecheng-14015	54	29	fine	fine	ADV
fumecheng-14015	54	30	-	-	PUNCT
fumecheng-14015	54	31	grained	grain	VERB
fumecheng-14015	54	32	sample	sample	NOUN
fumecheng-14015	54	33	with	with	ADP
fumecheng-14015	54	34	an	an	DET
fumecheng-14015	54	35	11	11	NUM
fumecheng-14015	54	36	µm	µm	ADP
fumecheng-14015	54	37	grain	grain	NOUN
fumecheng-14015	54	38	size	size	NOUN
fumecheng-14015	54	39	and	and	CCONJ
fumecheng-14015	54	40	a	a	DET
fumecheng-14015	54	41	coarse	coarse	ADV
fumecheng-14015	54	42	-	-	PUNCT
fumecheng-14015	54	43	grained	grain	VERB
fumecheng-14015	54	44	sample	sample	NOUN
fumecheng-14015	54	45	with	with	ADP
fumecheng-14015	54	46	a	a	DET
fumecheng-14015	54	47	28	28	NUM
fumecheng-14015	54	48	µm	µm	NOUN
fumecheng-14015	54	49	grain	grain	NOUN
fumecheng-14015	54	50	size	size	NOUN
fumecheng-14015	54	51	.	.	PUNCT
fumecheng-14015	55	1	they	they	PRON
fumecheng-14015	55	2	found	find	VERB
fumecheng-14015	55	3	that	that	SCONJ
fumecheng-14015	55	4	,	,	PUNCT
fumecheng-14015	55	5	to	to	PART
fumecheng-14015	55	6	achieve	achieve	VERB
fumecheng-14015	55	7	a	a	DET
fumecheng-14015	55	8	comparable	comparable	ADJ
fumecheng-14015	55	9	shear	shear	NOUN
fumecheng-14015	55	10	strength	strength	NOUN
fumecheng-14015	55	11	,	,	PUNCT
fumecheng-14015	55	12	the	the	DET
fumecheng-14015	55	13	coarse	coarse	ADV
fumecheng-14015	55	14	-	-	PUNCT
fumecheng-14015	55	15	grained	grain	VERB
fumecheng-14015	55	16	sample	sample	NOUN
fumecheng-14015	55	17	required	require	VERB
fumecheng-14015	55	18	thermal	thermal	ADJ
fumecheng-14015	55	19	pressing	press	VERB
fumecheng-14015	55	20	for	for	ADP
fumecheng-14015	55	21	3	3	NUM
fumecheng-14015	55	22	h	h	NOUN
fumecheng-14015	55	23	at	at	ADP
fumecheng-14015	55	24	5	5	NUM
fumecheng-14015	55	25	mpa	mpa	NOUN
fumecheng-14015	55	26	,	,	PUNCT
fumecheng-14015	55	27	whereas	whereas	SCONJ
fumecheng-14015	55	28	the	the	DET
fumecheng-14015	55	29	fine	fine	ADV
fumecheng-14015	55	30	-	-	PUNCT
fumecheng-14015	55	31	grained	grain	VERB
fumecheng-14015	55	32	sample	sample	NOUN
fumecheng-14015	55	33	required	require	VERB
fumecheng-14015	55	34	pressing	press	VERB
fumecheng-14015	55	35	for	for	ADP
fumecheng-14015	55	36	only	only	ADV
fumecheng-14015	55	37	2	2	NUM
fumecheng-14015	55	38	h	h	NOUN
fumecheng-14015	55	39	at	at	ADP
fumecheng-14015	55	40	3	3	NUM
fumecheng-14015	55	41	mpa	mpa	NOUN
fumecheng-14015	55	42	[	[	X
fumecheng-14015	55	43	42	42	NUM
fumecheng-14015	55	44	]	]	PUNCT
fumecheng-14015	55	45	.	.	PUNCT
fumecheng-14015	56	1	this	this	PRON
fumecheng-14015	56	2	indicated	indicate	VERB
fumecheng-14015	56	3	that	that	SCONJ
fumecheng-14015	56	4	finer	fine	ADJ
fumecheng-14015	56	5	grain	grain	NOUN
fumecheng-14015	56	6	sizes	size	NOUN
fumecheng-14015	56	7	contributed	contribute	VERB
fumecheng-14015	56	8	to	to	ADP
fumecheng-14015	56	9	higher	high	ADJ
fumecheng-14015	56	10	bond	bond	NOUN
fumecheng-14015	56	11	strengths	strength	NOUN
fumecheng-14015	56	12	under	under	ADP
fumecheng-14015	56	13	the	the	DET
fumecheng-14015	56	14	same	same	ADJ
fumecheng-14015	56	15	temperature	temperature	NOUN
fumecheng-14015	56	16	,	,	PUNCT
fumecheng-14015	56	17	pressure	pressure	NOUN
fumecheng-14015	56	18	,	,	PUNCT
fumecheng-14015	56	19	and	and	CCONJ
fumecheng-14015	56	20	time	time	NOUN
fumecheng-14015	56	21	conditions	condition	NOUN
fumecheng-14015	56	22	.	.	PUNCT
fumecheng-14015	57	1	in	in	ADP
fumecheng-14015	57	2	general	general	ADJ
fumecheng-14015	57	3	,	,	PUNCT
fumecheng-14015	57	4	in	in	ADP
fumecheng-14015	57	5	cu	cu	PROPN
fumecheng-14015	57	6	,	,	PUNCT
fumecheng-14015	57	7	there	there	PRON
fumecheng-14015	57	8	is	be	VERB
fumecheng-14015	57	9	a	a	DET
fumecheng-14015	57	10	tendency	tendency	NOUN
fumecheng-14015	57	11	for	for	ADP
fumecheng-14015	57	12	“	"	PUNCT
fumecheng-14015	57	13	fine	fine	ADJ
fumecheng-14015	57	14	grains	grain	NOUN
fumecheng-14015	57	15	→	→	SYM
fumecheng-14015	57	16	bonding	bonding	NOUN
fumecheng-14015	57	17	promotion	promotion	NOUN
fumecheng-14015	57	18	.	.	PUNCT
fumecheng-14015	57	19	”	"	PUNCT
fumecheng-14015	58	1	however	however	ADV
fumecheng-14015	58	2	,	,	PUNCT
fumecheng-14015	58	3	locally	locally	ADV
fumecheng-14015	58	4	,	,	PUNCT
fumecheng-14015	58	5	there	there	PRON
fumecheng-14015	58	6	are	be	VERB
fumecheng-14015	58	7	cases	case	NOUN
fumecheng-14015	58	8	where	where	SCONJ
fumecheng-14015	58	9	adhesion	adhesion	NOUN
fumecheng-14015	58	10	weakens	weaken	VERB
fumecheng-14015	58	11	at	at	ADP
fumecheng-14015	58	12	defect	defect	NOUN
fumecheng-14015	58	13	concentration	concentration	NOUN
fumecheng-14015	58	14	points	point	NOUN
fumecheng-14015	58	15	such	such	ADJ
fumecheng-14015	58	16	as	as	ADP
fumecheng-14015	58	17	grain	grain	NOUN
fumecheng-14015	58	18	boundaries	boundary	NOUN
fumecheng-14015	58	19	and	and	CCONJ
fumecheng-14015	58	20	triple	triple	ADJ
fumecheng-14015	58	21	points	point	NOUN
fumecheng-14015	58	22	,	,	PUNCT
fumecheng-14015	58	23	so	so	SCONJ
fumecheng-14015	58	24	we	we	PRON
fumecheng-14015	58	25	must	must	AUX
fumecheng-14015	58	26	be	be	AUX
fumecheng-14015	58	27	cautious	cautious	ADJ
fumecheng-14015	58	28	about	about	ADP
fumecheng-14015	58	29	the	the	DET
fumecheng-14015	58	30	equation	equation	NOUN
fumecheng-14015	58	31	“	"	PUNCT
fumecheng-14015	58	32	many	many	ADJ
fumecheng-14015	58	33	grain	grain	NOUN
fumecheng-14015	58	34	boundaries	boundary	NOUN
fumecheng-14015	58	35	are	be	AUX
fumecheng-14015	58	36	equal	equal	ADJ
fumecheng-14015	58	37	to	to	ADP
fumecheng-14015	58	38	strong	strong	ADJ
fumecheng-14015	58	39	adhesion	adhesion	NOUN
fumecheng-14015	58	40	.	.	PUNCT
fumecheng-14015	58	41	”	"	PUNCT
fumecheng-14015	59	1	as	as	SCONJ
fumecheng-14015	59	2	shown	show	VERB
fumecheng-14015	59	3	in	in	ADP
fumecheng-14015	59	4	fig	fig	NOUN
fumecheng-14015	59	5	.	.	PUNCT
fumecheng-14015	60	1	2	2	NUM
fumecheng-14015	60	2	,	,	PUNCT
fumecheng-14015	60	3	this	this	PRON
fumecheng-14015	60	4	is	be	AUX
fumecheng-14015	60	5	a	a	DET
fumecheng-14015	60	6	regional	regional	ADJ
fumecheng-14015	60	7	property	property	NOUN
fumecheng-14015	60	8	that	that	PRON
fumecheng-14015	60	9	varies	vary	VERB
fumecheng-14015	60	10	significantly	significantly	ADV
fumecheng-14015	60	11	depending	depend	VERB
fumecheng-14015	60	12	on	on	ADP
fumecheng-14015	60	13	location	location	NOUN
fumecheng-14015	60	14	and	and	CCONJ
fumecheng-14015	60	15	microstructure	microstructure	NOUN
fumecheng-14015	60	16	,	,	PUNCT
fumecheng-14015	60	17	so	so	CCONJ
fumecheng-14015	60	18	generalization	generalization	NOUN
fumecheng-14015	60	19	should	should	AUX
fumecheng-14015	60	20	be	be	AUX
fumecheng-14015	60	21	avoided	avoid	VERB
fumecheng-14015	60	22	[	[	PUNCT
fumecheng-14015	60	23	43	43	NUM
fumecheng-14015	60	24	]	]	PUNCT
fumecheng-14015	60	25	.	.	PUNCT
fumecheng-14015	61	1	for	for	ADP
fumecheng-14015	61	2	example	example	NOUN
fumecheng-14015	61	3	,	,	PUNCT
fumecheng-14015	61	4	in	in	ADP
fumecheng-14015	61	5	fig	fig	NOUN
fumecheng-14015	61	6	.	.	PUNCT
fumecheng-14015	62	1	2	2	NUM
fumecheng-14015	62	2	(	(	PUNCT
fumecheng-14015	62	3	d	d	NOUN
fumecheng-14015	62	4	)	)	PUNCT
fumecheng-14015	62	5	,	,	PUNCT
fumecheng-14015	62	6	it	it	PRON
fumecheng-14015	62	7	can	can	AUX
fumecheng-14015	62	8	be	be	AUX
fumecheng-14015	62	9	observed	observe	VERB
fumecheng-14015	62	10	that	that	SCONJ
fumecheng-14015	62	11	the	the	DET
fumecheng-14015	62	12	adhesion	adhesion	NOUN
fumecheng-14015	62	13	strength	strength	NOUN
fumecheng-14015	62	14	at	at	ADP
fumecheng-14015	62	15	the	the	DET
fumecheng-14015	62	16	junction	junction	NOUN
fumecheng-14015	62	17	area	area	NOUN
fumecheng-14015	62	18	is	be	AUX
fumecheng-14015	62	19	significantly	significantly	ADV
fumecheng-14015	62	20	reduced	reduce	VERB
fumecheng-14015	62	21	.	.	PUNCT
fumecheng-14015	63	1	the	the	DET
fumecheng-14015	63	2	surface	surface	NOUN
fumecheng-14015	63	3	roughness	roughness	NOUN
fumecheng-14015	63	4	also	also	ADV
fumecheng-14015	63	5	significantly	significantly	ADV
fumecheng-14015	63	6	affects	affect	VERB
fumecheng-14015	63	7	bond	bond	NOUN
fumecheng-14015	63	8	quality	quality	NOUN
fumecheng-14015	63	9	.	.	PUNCT
fumecheng-14015	64	1	to	to	PART
fumecheng-14015	64	2	achieve	achieve	VERB
fumecheng-14015	64	3	high	high	ADJ
fumecheng-14015	64	4	-	-	PUNCT
fumecheng-14015	64	5	quality	quality	NOUN
fumecheng-14015	64	6	bonding	bonding	NOUN
fumecheng-14015	64	7	,	,	PUNCT
fumecheng-14015	64	8	it	it	PRON
fumecheng-14015	64	9	is	be	AUX
fumecheng-14015	64	10	critical	critical	ADJ
fumecheng-14015	64	11	to	to	PART
fumecheng-14015	64	12	maximize	maximize	VERB
fumecheng-14015	64	13	the	the	DET
fumecheng-14015	64	14	actual	actual	ADJ
fumecheng-14015	64	15	contact	contact	NOUN
fumecheng-14015	64	16	area	area	NOUN
fumecheng-14015	64	17	between	between	ADP
fumecheng-14015	64	18	the	the	DET
fumecheng-14015	64	19	two	two	NUM
fumecheng-14015	64	20	metal	metal	NOUN
fumecheng-14015	64	21	surfaces	surface	NOUN
fumecheng-14015	64	22	.	.	PUNCT
fumecheng-14015	65	1	gui	gui	PROPN
fumecheng-14015	65	2	et	et	PROPN
fumecheng-14015	65	3	al	al	PROPN
fumecheng-14015	65	4	.	.	PUNCT
fumecheng-14015	66	1	[	[	X
fumecheng-14015	66	2	44	44	NUM
fumecheng-14015	66	3	]	]	PUNCT
fumecheng-14015	66	4	demonstrated	demonstrate	VERB
fumecheng-14015	66	5	a	a	DET
fumecheng-14015	66	6	strong	strong	ADJ
fumecheng-14015	66	7	correlation	correlation	NOUN
fumecheng-14015	66	8	between	between	ADP
fumecheng-14015	66	9	the	the	DET
fumecheng-14015	66	10	bonding	bonding	NOUN
fumecheng-14015	66	11	energy	energy	NOUN
fumecheng-14015	66	12	and	and	CCONJ
fumecheng-14015	66	13	actual	actual	ADJ
fumecheng-14015	66	14	contact	contact	NOUN
fumecheng-14015	66	15	area	area	NOUN
fumecheng-14015	66	16	.	.	PUNCT
fumecheng-14015	67	1	excessive	excessive	ADJ
fumecheng-14015	67	2	roughness	roughness	NOUN
fumecheng-14015	67	3	could	could	AUX
fumecheng-14015	67	4	promote	promote	VERB
fumecheng-14015	67	5	void	void	VERB
fumecheng-14015	67	6	formation	formation	NOUN
fumecheng-14015	67	7	,	,	PUNCT
fumecheng-14015	67	8	which	which	PRON
fumecheng-14015	67	9	reduced	reduce	VERB
fumecheng-14015	67	10	the	the	DET
fumecheng-14015	67	11	mechanical	mechanical	ADJ
fumecheng-14015	67	12	strength	strength	NOUN
fumecheng-14015	67	13	[	[	X
fumecheng-14015	67	14	45	45	NUM
fumecheng-14015	67	15	]	]	PUNCT
fumecheng-14015	67	16	.	.	PUNCT
fumecheng-14015	68	1	in	in	ADP
fumecheng-14015	68	2	the	the	DET
fumecheng-14015	68	3	work	work	NOUN
fumecheng-14015	68	4	by	by	ADP
fumecheng-14015	68	5	rebhan	rebhan	PROPN
fumecheng-14015	68	6	et	et	PROPN
fumecheng-14015	68	7	al	al	PROPN
fumecheng-14015	68	8	.	.	PUNCT
fumecheng-14015	69	1	[	[	X
fumecheng-14015	69	2	39	39	NUM
fumecheng-14015	69	3	]	]	PUNCT
fumecheng-14015	69	4	,	,	PUNCT
fumecheng-14015	69	5	the	the	DET
fumecheng-14015	69	6	bonding	bonding	NOUN
fumecheng-14015	69	7	strength	strength	NOUN
fumecheng-14015	69	8	linearly	linearly	ADV
fumecheng-14015	69	9	increased	increase	VERB
fumecheng-14015	69	10	as	as	SCONJ
fumecheng-14015	69	11	the	the	DET
fumecheng-14015	69	12	roughness	roughness	NOUN
fumecheng-14015	69	13	decreased	decrease	VERB
fumecheng-14015	69	14	from	from	ADP
fumecheng-14015	69	15	8.0	8.0	NUM
fumecheng-14015	69	16	to	to	ADP
fumecheng-14015	69	17	1.5	1.5	NUM
fumecheng-14015	69	18	nm	nm	NOUN
fumecheng-14015	69	19	.	.	PUNCT
fumecheng-14015	70	1	shigetou	shigetou	PROPN
fumecheng-14015	70	2	et	et	PROPN
fumecheng-14015	70	3	al	al	PROPN
fumecheng-14015	70	4	.	.	PUNCT
fumecheng-14015	71	1	[	[	X
fumecheng-14015	71	2	46	46	NUM
fumecheng-14015	71	3	]	]	PUNCT
fumecheng-14015	71	4	demonstrated	demonstrate	VERB
fumecheng-14015	71	5	that	that	SCONJ
fumecheng-14015	71	6	chemical	chemical	ADJ
fumecheng-14015	71	7	mechanical	mechanical	ADJ
fumecheng-14015	71	8	polishing	polishing	NOUN
fumecheng-14015	71	9	(	(	PUNCT
fumecheng-14015	71	10	cmp	cmp	NOUN
fumecheng-14015	71	11	)	)	PUNCT
fumecheng-14015	71	12	polished	polished	ADJ
fumecheng-14015	71	13	cu	cu	PROPN
fumecheng-14015	71	14	films	film	NOUN
fumecheng-14015	71	15	with	with	ADP
fumecheng-14015	71	16	a	a	DET
fumecheng-14015	71	17	mean	mean	ADJ
fumecheng-14015	71	18	surface	surface	NOUN
fumecheng-14015	71	19	roughness	roughness	NOUN
fumecheng-14015	71	20	of	of	ADP
fumecheng-14015	71	21	approximately	approximately	ADV
fumecheng-14015	71	22	0.3	0.3	NUM
fumecheng-14015	71	23	nm	nm	NOUN
fumecheng-14015	71	24	could	could	AUX
fumecheng-14015	71	25	be	be	AUX
fumecheng-14015	71	26	directly	directly	ADV
fumecheng-14015	71	27	bonded	bond	VERB
fumecheng-14015	71	28	at	at	ADP
fumecheng-14015	71	29	room	room	NOUN
fumecheng-14015	71	30	temperature	temperature	NOUN
fumecheng-14015	71	31	via	via	ADP
fumecheng-14015	71	32	the	the	DET
fumecheng-14015	71	33	surface	surface	NOUN
fumecheng-14015	71	34	activated	activate	VERB
fumecheng-14015	71	35	bonding	bonding	NOUN
fumecheng-14015	71	36	(	(	PUNCT
fumecheng-14015	71	37	sab	sab	ADJ
fumecheng-14015	71	38	)	)	PUNCT
fumecheng-14015	71	39	method	method	NOUN
fumecheng-14015	71	40	.	.	PUNCT
fumecheng-14015	72	1	under	under	ADP
fumecheng-14015	72	2	a	a	DET
fumecheng-14015	72	3	background	background	NOUN
fumecheng-14015	72	4	vacuum	vacuum	NOUN
fumecheng-14015	72	5	below	below	ADP
fumecheng-14015	72	6	∼3×10⁻³	∼3×10⁻³	PROPN
fumecheng-14015	72	7	pa	pa	PROPN
fumecheng-14015	72	8	,	,	PUNCT
fumecheng-14015	72	9	these	these	DET
fumecheng-14015	72	10	atomically	atomically	ADV
fumecheng-14015	72	11	smooth	smooth	ADJ
fumecheng-14015	72	12	surfaces	surface	NOUN
fumecheng-14015	72	13	achieved	achieve	VERB
fumecheng-14015	72	14	full	full	ADJ
fumecheng-14015	72	15	-	-	PUNCT
fumecheng-14015	72	16	area	area	NOUN
fumecheng-14015	72	17	atomic	atomic	ADJ
fumecheng-14015	72	18	-	-	PUNCT
fumecheng-14015	72	19	level	level	NOUN
fumecheng-14015	72	20	bonding	bonding	NOUN
fumecheng-14015	72	21	between	between	ADP
fumecheng-14015	72	22	cu	cu	PROPN
fumecheng-14015	72	23	grains	grain	NOUN
fumecheng-14015	72	24	with	with	ADP
fumecheng-14015	72	25	shear	shear	NOUN
fumecheng-14015	72	26	strengths	strength	NOUN
fumecheng-14015	72	27	exceeding	exceed	VERB
fumecheng-14015	72	28	50	50	NUM
fumecheng-14015	72	29	mpa	mpa	NOUN
fumecheng-14015	72	30	.	.	PUNCT
fumecheng-14015	73	1	thus	thus	ADV
fumecheng-14015	73	2	,	,	PUNCT
fumecheng-14015	73	3	optimizing	optimize	VERB
fumecheng-14015	73	4	the	the	DET
fumecheng-14015	73	5	surface	surface	NOUN
fumecheng-14015	73	6	roughness	roughness	NOUN
fumecheng-14015	73	7	is	be	AUX
fumecheng-14015	73	8	essential	essential	ADJ
fumecheng-14015	73	9	for	for	ADP
fumecheng-14015	73	10	maximizing	maximize	VERB
fumecheng-14015	73	11	the	the	DET
fumecheng-14015	73	12	bonding	bonding	NOUN
fumecheng-14015	73	13	strength	strength	NOUN
fumecheng-14015	73	14	of	of	ADP
fumecheng-14015	73	15	cu	cu	PROPN
fumecheng-14015	73	16	-	-	PUNCT
fumecheng-14015	73	17	cu	cu	PROPN
fumecheng-14015	73	18	bonding	bonding	NOUN
fumecheng-14015	73	19	.	.	PUNCT
fumecheng-14015	74	1	as	as	SCONJ
fumecheng-14015	74	2	mentioned	mention	VERB
fumecheng-14015	74	3	earlier	early	ADV
fumecheng-14015	74	4	,	,	PUNCT
fumecheng-14015	74	5	the	the	DET
fumecheng-14015	74	6	bonding	bonding	NOUN
fumecheng-14015	74	7	temperature	temperature	NOUN
fumecheng-14015	74	8	,	,	PUNCT
fumecheng-14015	74	9	pressure	pressure	NOUN
fumecheng-14015	74	10	,	,	PUNCT
fumecheng-14015	74	11	and	and	CCONJ
fumecheng-14015	74	12	time	time	NOUN
fumecheng-14015	74	13	determine	determine	VERB
fumecheng-14015	74	14	the	the	DET
fumecheng-14015	74	15	degree	degree	NOUN
fumecheng-14015	74	16	of	of	ADP
fumecheng-14015	74	17	diffusion	diffusion	NOUN
fumecheng-14015	74	18	,	,	PUNCT
fumecheng-14015	74	19	which	which	PRON
fumecheng-14015	74	20	directly	directly	ADV
fumecheng-14015	74	21	affects	affect	VERB
fumecheng-14015	74	22	the	the	DET
fumecheng-14015	74	23	interface	interface	NOUN
fumecheng-14015	74	24	quality	quality	NOUN
fumecheng-14015	74	25	of	of	ADP
fumecheng-14015	74	26	cu	cu	PROPN
fumecheng-14015	74	27	-	-	PUNCT
fumecheng-14015	74	28	cu	cu	PROPN
fumecheng-14015	74	29	joints	joint	NOUN
fumecheng-14015	74	30	.	.	PUNCT
fumecheng-14015	75	1	atoms	atom	NOUN
fumecheng-14015	75	2	in	in	ADP
fumecheng-14015	75	3	solid	solid	ADJ
fumecheng-14015	75	4	metals	metal	NOUN
fumecheng-14015	75	5	vibrate	vibrate	NOUN
fumecheng-14015	75	6	constantly	constantly	ADV
fumecheng-14015	75	7	,	,	PUNCT
fumecheng-14015	75	8	and	and	CCONJ
fumecheng-14015	75	9	their	their	PRON
fumecheng-14015	75	10	kinetic	kinetic	ADJ
fumecheng-14015	75	11	energy	energy	NOUN
fumecheng-14015	75	12	is	be	AUX
fumecheng-14015	75	13	proportional	proportional	ADJ
fumecheng-14015	75	14	to	to	ADP
fumecheng-14015	75	15	the	the	DET
fumecheng-14015	75	16	absolute	absolute	ADJ
fumecheng-14015	75	17	temperature	temperature	NOUN
fumecheng-14015	75	18	[	[	X
fumecheng-14015	75	19	26	26	NUM
fumecheng-14015	75	20	]	]	PUNCT
fumecheng-14015	75	21	.	.	PUNCT
fumecheng-14015	76	1	this	this	DET
fumecheng-14015	76	2	energy	energy	NOUN
fumecheng-14015	76	3	distribution	distribution	NOUN
fumecheng-14015	76	4	allows	allow	VERB
fumecheng-14015	76	5	atoms	atom	NOUN
fumecheng-14015	76	6	to	to	PART
fumecheng-14015	76	7	diffuse	diffuse	VERB
fumecheng-14015	76	8	across	across	ADP
fumecheng-14015	76	9	lattice	lattice	NOUN
fumecheng-14015	76	10	points	point	NOUN
fumecheng-14015	76	11	when	when	SCONJ
fumecheng-14015	76	12	they	they	PRON
fumecheng-14015	76	13	exceed	exceed	VERB
fumecheng-14015	76	14	a	a	DET
fumecheng-14015	76	15	specific	specific	ADJ
fumecheng-14015	76	16	energy	energy	NOUN
fumecheng-14015	76	17	threshold	threshold	NOUN
fumecheng-14015	76	18	.	.	PUNCT
fumecheng-14015	77	1	the	the	DET
fumecheng-14015	77	2	diffusion	diffusion	NOUN
fumecheng-14015	77	3	process	process	NOUN
fumecheng-14015	77	4	can	can	AUX
fumecheng-14015	77	5	be	be	AUX
fumecheng-14015	77	6	described	describe	VERB
fumecheng-14015	77	7	by	by	ADP
fumecheng-14015	77	8	fick	fick	PROPN
fumecheng-14015	77	9	’s	’s	PART
fumecheng-14015	77	10	first	first	ADJ
fumecheng-14015	77	11	law	law	NOUN
fumecheng-14015	78	1	[	[	X
fumecheng-14015	78	2	47	47	NUM
fumecheng-14015	78	3	]	]	PUNCT
fumecheng-14015	78	4	.	.	PUNCT
fumecheng-14015	79	1	from	from	ADP
fumecheng-14015	79	2	an	an	DET
fumecheng-14015	79	3	atomic	atomic	ADJ
fumecheng-14015	79	4	perspective	perspective	NOUN
fumecheng-14015	79	5	,	,	PUNCT
fumecheng-14015	79	6	the	the	DET
fumecheng-14015	79	7	heat	heat	NOUN
fumecheng-14015	79	8	energy	energy	NOUN
fumecheng-14015	79	9	accumulates	accumulate	VERB
fumecheng-14015	79	10	as	as	ADP
fumecheng-14015	79	11	the	the	DET
fumecheng-14015	79	12	temperature	temperature	NOUN
fumecheng-14015	79	13	increases	increase	NOUN
fumecheng-14015	79	14	,	,	PUNCT
fumecheng-14015	79	15	causing	cause	VERB
fumecheng-14015	79	16	the	the	DET
fumecheng-14015	79	17	atoms	atom	NOUN
fumecheng-14015	79	18	to	to	PART
fumecheng-14015	79	19	vibrate	vibrate	VERB
fumecheng-14015	79	20	more	more	ADV
fumecheng-14015	79	21	intensely	intensely	ADV
fumecheng-14015	79	22	.	.	PUNCT
fumecheng-14015	80	1	this	this	DET
fumecheng-14015	80	2	increased	increase	VERB
fumecheng-14015	80	3	vibration	vibration	NOUN
fumecheng-14015	80	4	allows	allow	VERB
fumecheng-14015	80	5	the	the	DET
fumecheng-14015	80	6	atoms	atom	NOUN
fumecheng-14015	80	7	to	to	PART
fumecheng-14015	80	8	move	move	VERB
fumecheng-14015	80	9	more	more	ADV
fumecheng-14015	80	10	easily	easily	ADV
fumecheng-14015	80	11	from	from	ADP
fumecheng-14015	80	12	their	their	PRON
fumecheng-14015	80	13	original	original	ADJ
fumecheng-14015	80	14	positions	position	NOUN
fumecheng-14015	80	15	,	,	PUNCT
fumecheng-14015	80	16	thereby	thereby	ADV
fumecheng-14015	80	17	facilitating	facilitate	VERB
fumecheng-14015	80	18	greater	great	ADJ
fumecheng-14015	80	19	diffusion	diffusion	NOUN
fumecheng-14015	80	20	.	.	PUNCT
fumecheng-14015	81	1	in	in	ADP
fumecheng-14015	81	2	other	other	ADJ
fumecheng-14015	81	3	words	word	NOUN
fumecheng-14015	81	4	,	,	PUNCT
fumecheng-14015	81	5	atomic	atomic	ADJ
fumecheng-14015	81	6	vibration	vibration	NOUN
fumecheng-14015	81	7	is	be	AUX
fumecheng-14015	81	8	proportional	proportional	ADJ
fumecheng-14015	81	9	to	to	ADP
fumecheng-14015	81	10	the	the	DET
fumecheng-14015	81	11	temperature	temperature	NOUN
fumecheng-14015	81	12	;	;	PUNCT
fumecheng-14015	81	13	thus	thus	ADV
fumecheng-14015	81	14	,	,	PUNCT
fumecheng-14015	81	15	higher	high	ADJ
fumecheng-14015	81	16	temperatures	temperature	NOUN
fumecheng-14015	81	17	result	result	VERB
fumecheng-14015	81	18	in	in	ADP
fumecheng-14015	81	19	faster	fast	ADJ
fumecheng-14015	81	20	diffusion	diffusion	NOUN
fumecheng-14015	81	21	and	and	CCONJ
fumecheng-14015	81	22	stronger	strong	ADJ
fumecheng-14015	81	23	bonds	bond	NOUN
fumecheng-14015	81	24	.	.	PUNCT
fumecheng-14015	82	1	therefore	therefore	ADV
fumecheng-14015	82	2	,	,	PUNCT
fumecheng-14015	82	3	increasing	increase	VERB
fumecheng-14015	82	4	the	the	DET
fumecheng-14015	82	5	bonding	bonding	NOUN
fumecheng-14015	82	6	temperature	temperature	NOUN
fumecheng-14015	82	7	enhances	enhance	VERB
fumecheng-14015	82	8	the	the	DET
fumecheng-14015	82	9	diffusion	diffusion	NOUN
fumecheng-14015	82	10	of	of	ADP
fumecheng-14015	82	11	atoms	atom	NOUN
fumecheng-14015	82	12	and	and	CCONJ
fumecheng-14015	82	13	improves	improve	VERB
fumecheng-14015	82	14	the	the	DET
fumecheng-14015	82	15	bond	bond	NOUN
fumecheng-14015	82	16	strength	strength	NOUN
fumecheng-14015	82	17	between	between	ADP
fumecheng-14015	82	18	the	the	DET
fumecheng-14015	82	19	two	two	NUM
fumecheng-14015	82	20	cu	cu	PROPN
fumecheng-14015	82	21	surfaces	surface	NOUN
fumecheng-14015	82	22	.	.	PUNCT
fumecheng-14015	83	1	jang	jang	PROPN
fumecheng-14015	83	2	et	et	PROPN
fumecheng-14015	83	3	al	al	PROPN
fumecheng-14015	83	4	.	.	PUNCT
fumecheng-14015	84	1	[	[	X
fumecheng-14015	84	2	48	48	NUM
fumecheng-14015	84	3	]	]	PUNCT
fumecheng-14015	84	4	studied	study	VERB
fumecheng-14015	84	5	the	the	DET
fumecheng-14015	84	6	effects	effect	NOUN
fumecheng-14015	84	7	of	of	ADP
fumecheng-14015	84	8	bonding	bonding	NOUN
fumecheng-14015	84	9	and	and	CCONJ
fumecheng-14015	84	10	annealing	anneal	VERB
fumecheng-14015	84	11	temperatures	temperature	NOUN
fumecheng-14015	84	12	on	on	ADP
fumecheng-14015	84	13	cu	cu	PROPN
fumecheng-14015	84	14	-	-	PUNCT
fumecheng-14015	84	15	cu	cu	PROPN
fumecheng-14015	84	16	bonding	bonding	NOUN
fumecheng-14015	84	17	.	.	PUNCT
fumecheng-14015	85	1	they	they	PRON
fumecheng-14015	85	2	measured	measure	VERB
fumecheng-14015	85	3	the	the	DET
fumecheng-14015	85	4	interfacial	interfacial	ADJ
fumecheng-14015	85	5	adhesion	adhesion	NOUN
fumecheng-14015	85	6	energy	energy	NOUN
fumecheng-14015	85	7	after	after	ADP
fumecheng-14015	85	8	bonding	bond	VERB
fumecheng-14015	85	9	at	at	ADP
fumecheng-14015	85	10	300	300	NUM
fumecheng-14015	85	11	,	,	PUNCT
fumecheng-14015	85	12	350	350	NUM
fumecheng-14015	85	13	,	,	PUNCT
fumecheng-14015	85	14	and	and	CCONJ
fumecheng-14015	85	15	400	400	NUM
fumecheng-14015	85	16	°	°	NOUN
fumecheng-14015	85	17	c	c	NOUN
fumecheng-14015	85	18	for	for	ADP
fumecheng-14015	85	19	1	1	NUM
fumecheng-14015	85	20	h	h	NOUN
fumecheng-14015	85	21	,	,	PUNCT
fumecheng-14015	85	22	without	without	ADP
fumecheng-14015	85	23	annealing	anneal	VERB
fumecheng-14015	85	24	.	.	PUNCT
fumecheng-14015	86	1	the	the	DET
fumecheng-14015	86	2	interfacial	interfacial	ADJ
fumecheng-14015	86	3	adhesion	adhesion	NOUN
fumecheng-14015	86	4	energy	energy	NOUN
fumecheng-14015	86	5	increased	increase	VERB
fumecheng-14015	86	6	with	with	ADP
fumecheng-14015	86	7	the	the	DET
fumecheng-14015	86	8	bonding	bond	VERB
fumecheng-14015	86	9	cu	cu	PROPN
fumecheng-14015	86	10	-	-	PUNCT
fumecheng-14015	86	11	cu	cu	PROPN
fumecheng-14015	86	12	mechanical	mechanical	ADJ
fumecheng-14015	86	13	bonding	bonding	NOUN
fumecheng-14015	86	14	for	for	ADP
fumecheng-14015	86	15	3d	3d	NOUN
fumecheng-14015	86	16	integration	integration	NOUN
fumecheng-14015	86	17	of	of	ADP
fumecheng-14015	86	18	the	the	DET
fumecheng-14015	86	19	next	next	ADJ
fumecheng-14015	86	20	generation	generation	NOUN
fumecheng-14015	86	21	electronic	electronic	ADJ
fumecheng-14015	86	22	chips	chip	NOUN
fumecheng-14015	86	23	...	...	PUNCT
fumecheng-14015	86	24	925	925	NUM
fumecheng-14015	86	25	temperature	temperature	NOUN
fumecheng-14015	86	26	,	,	PUNCT
fumecheng-14015	86	27	showing	show	VERB
fumecheng-14015	86	28	a	a	DET
fumecheng-14015	86	29	positive	positive	ADJ
fumecheng-14015	86	30	correlation	correlation	NOUN
fumecheng-14015	86	31	.	.	PUNCT
fumecheng-14015	87	1	at	at	ADP
fumecheng-14015	87	2	400	400	NUM
fumecheng-14015	87	3	°	°	NOUN
fumecheng-14015	87	4	c	c	NOUN
fumecheng-14015	87	5	,	,	PUNCT
fumecheng-14015	87	6	a	a	DET
fumecheng-14015	87	7	small	small	ADJ
fumecheng-14015	87	8	error	error	NOUN
fumecheng-14015	87	9	margin	margin	NOUN
fumecheng-14015	87	10	was	be	AUX
fumecheng-14015	87	11	obtained	obtain	VERB
fumecheng-14015	87	12	,	,	PUNCT
fumecheng-14015	87	13	indicating	indicate	VERB
fumecheng-14015	87	14	uniform	uniform	ADJ
fumecheng-14015	87	15	bonding	bonding	NOUN
fumecheng-14015	87	16	across	across	ADP
fumecheng-14015	87	17	the	the	DET
fumecheng-14015	87	18	wafers	wafer	NOUN
fumecheng-14015	87	19	.	.	PUNCT
fumecheng-14015	88	1	the	the	DET
fumecheng-14015	88	2	annealing	anneal	VERB
fumecheng-14015	88	3	temperature	temperature	NOUN
fumecheng-14015	88	4	also	also	ADV
fumecheng-14015	88	5	plays	play	VERB
fumecheng-14015	88	6	a	a	DET
fumecheng-14015	88	7	crucial	crucial	ADJ
fumecheng-14015	88	8	role	role	NOUN
fumecheng-14015	88	9	in	in	ADP
fumecheng-14015	88	10	cu	cu	PROPN
fumecheng-14015	88	11	-	-	PROPN
fumecheng-14015	88	12	cu	cu	PROPN
fumecheng-14015	88	13	bonding	bonding	NOUN
fumecheng-14015	88	14	[	[	X
fumecheng-14015	88	15	28	28	NUM
fumecheng-14015	88	16	,	,	PUNCT
fumecheng-14015	88	17	49	49	NUM
fumecheng-14015	88	18	,	,	PUNCT
fumecheng-14015	88	19	50	50	NUM
fumecheng-14015	88	20	]	]	PUNCT
fumecheng-14015	88	21	.	.	PUNCT
fumecheng-14015	89	1	without	without	ADP
fumecheng-14015	89	2	annealing	annealing	NOUN
fumecheng-14015	89	3	,	,	PUNCT
fumecheng-14015	89	4	voids	void	NOUN
fumecheng-14015	89	5	are	be	AUX
fumecheng-14015	89	6	often	often	ADV
fumecheng-14015	89	7	present	present	ADJ
fumecheng-14015	89	8	at	at	ADP
fumecheng-14015	89	9	the	the	DET
fumecheng-14015	89	10	bonding	bonding	NOUN
fumecheng-14015	89	11	interface	interface	NOUN
fumecheng-14015	89	12	.	.	PUNCT
fumecheng-14015	90	1	however	however	ADV
fumecheng-14015	90	2	,	,	PUNCT
fumecheng-14015	90	3	annealing	anneal	VERB
fumecheng-14015	90	4	at	at	ADP
fumecheng-14015	90	5	higher	high	ADJ
fumecheng-14015	90	6	temperatures	temperature	NOUN
fumecheng-14015	90	7	produces	produce	VERB
fumecheng-14015	90	8	clean	clean	ADJ
fumecheng-14015	90	9	cu	cu	NOUN
fumecheng-14015	90	10	bonding	bonding	NOUN
fumecheng-14015	90	11	layers	layer	NOUN
fumecheng-14015	90	12	.	.	PUNCT
fumecheng-14015	91	1	samples	sample	NOUN
fumecheng-14015	91	2	were	be	AUX
fumecheng-14015	91	3	annealed	anneal	VERB
fumecheng-14015	91	4	at	at	ADP
fumecheng-14015	91	5	200	200	NUM
fumecheng-14015	91	6	,	,	PUNCT
fumecheng-14015	91	7	250	250	NUM
fumecheng-14015	91	8	,	,	PUNCT
fumecheng-14015	91	9	and	and	CCONJ
fumecheng-14015	91	10	300	300	NUM
fumecheng-14015	91	11	°	°	NOUN
fumecheng-14015	91	12	c	c	NOUN
fumecheng-14015	91	13	for	for	ADP
fumecheng-14015	91	14	1	1	NUM
fumecheng-14015	91	15	h	h	NOUN
fumecheng-14015	91	16	in	in	ADP
fumecheng-14015	91	17	an	an	DET
fumecheng-14015	91	18	n₂	n₂	NOUN
fumecheng-14015	91	19	environment	environment	NOUN
fumecheng-14015	91	20	and	and	CCONJ
fumecheng-14015	91	21	the	the	DET
fumecheng-14015	91	22	results	result	NOUN
fumecheng-14015	91	23	of	of	ADP
fumecheng-14015	91	24	interfacial	interfacial	ADJ
fumecheng-14015	91	25	adhesion	adhesion	NOUN
fumecheng-14015	91	26	-	-	PUNCT
fumecheng-14015	91	27	energy	energy	NOUN
fumecheng-14015	91	28	measurements	measurement	NOUN
fumecheng-14015	91	29	were	be	AUX
fumecheng-14015	91	30	compared	compare	VERB
fumecheng-14015	91	31	.	.	PUNCT
fumecheng-14015	92	1	annealing	anneal	VERB
fumecheng-14015	92	2	at	at	ADP
fumecheng-14015	92	3	200	200	NUM
fumecheng-14015	92	4	°	°	NOUN
fumecheng-14015	92	5	c	c	NOUN
fumecheng-14015	92	6	had	have	VERB
fumecheng-14015	92	7	little	little	ADJ
fumecheng-14015	92	8	effect	effect	NOUN
fumecheng-14015	92	9	;	;	PUNCT
fumecheng-14015	92	10	however	however	ADV
fumecheng-14015	92	11	,	,	PUNCT
fumecheng-14015	92	12	annealing	anneal	VERB
fumecheng-14015	92	13	at	at	ADP
fumecheng-14015	92	14	250	250	NUM
fumecheng-14015	92	15	and	and	CCONJ
fumecheng-14015	92	16	300	300	NUM
fumecheng-14015	93	1	°	°	NOUN
fumecheng-14015	93	2	c	c	NOUN
fumecheng-14015	93	3	increased	increase	VERB
fumecheng-14015	93	4	the	the	DET
fumecheng-14015	93	5	adhesion	adhesion	NOUN
fumecheng-14015	93	6	energy	energy	NOUN
fumecheng-14015	93	7	by	by	ADP
fumecheng-14015	93	8	3.1	3.1	NUM
fumecheng-14015	93	9	and	and	CCONJ
fumecheng-14015	93	10	4.3	4.3	NUM
fumecheng-14015	93	11	times	time	NOUN
fumecheng-14015	93	12	,	,	PUNCT
fumecheng-14015	93	13	respectively	respectively	ADV
fumecheng-14015	93	14	[	[	X
fumecheng-14015	93	15	48	48	NUM
fumecheng-14015	93	16	]	]	PUNCT
fumecheng-14015	93	17	.	.	PUNCT
fumecheng-14015	94	1	these	these	DET
fumecheng-14015	94	2	results	result	NOUN
fumecheng-14015	94	3	show	show	VERB
fumecheng-14015	94	4	that	that	SCONJ
fumecheng-14015	94	5	,	,	PUNCT
fumecheng-14015	94	6	beyond	beyond	ADP
fumecheng-14015	94	7	a	a	DET
fumecheng-14015	94	8	certain	certain	ADJ
fumecheng-14015	94	9	threshold	threshold	NOUN
fumecheng-14015	94	10	,	,	PUNCT
fumecheng-14015	94	11	annealing	anneal	VERB
fumecheng-14015	94	12	significantly	significantly	ADV
fumecheng-14015	94	13	improves	improve	VERB
fumecheng-14015	94	14	the	the	DET
fumecheng-14015	94	15	adhesion	adhesion	NOUN
fumecheng-14015	94	16	energy	energy	NOUN
fumecheng-14015	94	17	at	at	ADP
fumecheng-14015	94	18	the	the	DET
fumecheng-14015	94	19	cu	cu	PROPN
fumecheng-14015	94	20	bonding	bonding	NOUN
fumecheng-14015	94	21	interface	interface	NOUN
fumecheng-14015	94	22	when	when	SCONJ
fumecheng-14015	94	23	conditions	condition	NOUN
fumecheng-14015	94	24	such	such	ADJ
fumecheng-14015	94	25	as	as	ADP
fumecheng-14015	94	26	oxygen	oxygen	NOUN
fumecheng-14015	94	27	,	,	PUNCT
fumecheng-14015	94	28	pressure	pressure	NOUN
fumecheng-14015	94	29	,	,	PUNCT
fumecheng-14015	94	30	and	and	CCONJ
fumecheng-14015	94	31	time	time	NOUN
fumecheng-14015	94	32	are	be	AUX
fumecheng-14015	94	33	controlled	control	VERB
fumecheng-14015	94	34	[	[	PUNCT
fumecheng-14015	94	35	48	48	NUM
fumecheng-14015	94	36	]	]	PUNCT
fumecheng-14015	94	37	.	.	PUNCT
fumecheng-14015	95	1	lin	lin	PROPN
fumecheng-14015	95	2	et	et	PROPN
fumecheng-14015	95	3	al	al	PROPN
fumecheng-14015	95	4	.	.	PUNCT
fumecheng-14015	96	1	[	[	X
fumecheng-14015	96	2	51	51	NUM
fumecheng-14015	96	3	]	]	PUNCT
fumecheng-14015	96	4	investigated	investigate	VERB
fumecheng-14015	96	5	low	low	ADJ
fumecheng-14015	96	6	-	-	PUNCT
fumecheng-14015	96	7	temperature	temperature	NOUN
fumecheng-14015	96	8	cu	cu	PROPN
fumecheng-14015	96	9	-	-	PUNCT
fumecheng-14015	96	10	cu	cu	PROPN
fumecheng-14015	96	11	direct	direct	ADJ
fumecheng-14015	96	12	mechanical	mechanical	ADJ
fumecheng-14015	96	13	bonding	bonding	NOUN
fumecheng-14015	96	14	using	use	VERB
fumecheng-14015	96	15	cmp	cmp	NOUN
fumecheng-14015	96	16	highly	highly	ADV
fumecheng-14015	96	17	(	(	PUNCT
fumecheng-14015	96	18	111)-oriented	111)-oriented	PROPN
fumecheng-14015	96	19	nanotwinned	nanotwinned	ADJ
fumecheng-14015	96	20	cu	cu	PROPN
fumecheng-14015	96	21	(	(	PUNCT
fumecheng-14015	96	22	nt	nt	PROPN
fumecheng-14015	96	23	-	-	PUNCT
fumecheng-14015	96	24	cu	cu	NOUN
fumecheng-14015	96	25	)	)	PUNCT
fumecheng-14015	96	26	films	film	NOUN
fumecheng-14015	96	27	in	in	ADP
fumecheng-14015	96	28	the	the	DET
fumecheng-14015	96	29	temperature	temperature	NOUN
fumecheng-14015	96	30	range	range	NOUN
fumecheng-14015	96	31	of	of	ADP
fumecheng-14015	96	32	150	150	NUM
fumecheng-14015	96	33	–	–	PUNCT
fumecheng-14015	96	34	200	200	NUM
fumecheng-14015	96	35	°	°	NOUN
fumecheng-14015	96	36	c	c	NOUN
fumecheng-14015	96	37	,	,	PUNCT
fumecheng-14015	96	38	and	and	CCONJ
fumecheng-14015	96	39	quantitatively	quantitatively	ADV
fumecheng-14015	96	40	evaluated	evaluate	VERB
fumecheng-14015	96	41	the	the	DET
fumecheng-14015	96	42	interfacial	interfacial	ADJ
fumecheng-14015	96	43	void	void	ADJ
fumecheng-14015	96	44	distribution	distribution	NOUN
fumecheng-14015	96	45	by	by	ADP
fumecheng-14015	96	46	cross	cross	ADJ
fumecheng-14015	96	47	-	-	ADJ
fumecheng-14015	96	48	sectional	sectional	ADJ
fumecheng-14015	96	49	focused	focused	ADJ
fumecheng-14015	96	50	ion	ion	NOUN
fumecheng-14015	96	51	beam	beam	NOUN
fumecheng-14015	96	52	(	(	PUNCT
fumecheng-14015	96	53	fib	fib	NOUN
fumecheng-14015	96	54	)	)	PUNCT
fumecheng-14015	96	55	imaging	imaging	NOUN
fumecheng-14015	96	56	.	.	PUNCT
fumecheng-14015	97	1	as	as	SCONJ
fumecheng-14015	97	2	shown	show	VERB
fumecheng-14015	97	3	in	in	ADP
fumecheng-14015	97	4	fig	fig	NOUN
fumecheng-14015	97	5	.	.	PUNCT
fumecheng-14015	98	1	2	2	NUM
fumecheng-14015	98	2	(	(	PUNCT
fumecheng-14015	98	3	a	a	NOUN
fumecheng-14015	98	4	)	)	PUNCT
fumecheng-14015	98	5	,	,	PUNCT
fumecheng-14015	98	6	for	for	ADP
fumecheng-14015	98	7	the	the	DET
fumecheng-14015	98	8	bonding	bonding	NOUN
fumecheng-14015	98	9	condition	condition	NOUN
fumecheng-14015	98	10	of	of	ADP
fumecheng-14015	98	11	150	150	NUM
fumecheng-14015	98	12	°	°	NOUN
fumecheng-14015	98	13	c	c	NOUN
fumecheng-14015	98	14	for	for	ADP
fumecheng-14015	98	15	60	60	NUM
fumecheng-14015	98	16	min	min	NOUN
fumecheng-14015	98	17	,	,	PUNCT
fumecheng-14015	98	18	the	the	DET
fumecheng-14015	98	19	columnar	columnar	ADJ
fumecheng-14015	98	20	microstructure	microstructure	NOUN
fumecheng-14015	98	21	of	of	ADP
fumecheng-14015	98	22	the	the	DET
fumecheng-14015	98	23	nt	nt	PROPN
fumecheng-14015	98	24	-	-	PUNCT
fumecheng-14015	98	25	cu	cu	NOUN
fumecheng-14015	98	26	films	film	NOUN
fumecheng-14015	98	27	remains	remain	VERB
fumecheng-14015	98	28	essentially	essentially	ADV
fumecheng-14015	98	29	intact	intact	ADJ
fumecheng-14015	98	30	,	,	PUNCT
fumecheng-14015	98	31	while	while	SCONJ
fumecheng-14015	98	32	a	a	DET
fumecheng-14015	98	33	small	small	ADJ
fumecheng-14015	98	34	number	number	NOUN
fumecheng-14015	98	35	of	of	ADP
fumecheng-14015	98	36	tiny	tiny	ADJ
fumecheng-14015	98	37	voids	void	NOUN
fumecheng-14015	98	38	are	be	AUX
fumecheng-14015	98	39	still	still	ADV
fumecheng-14015	98	40	present	present	ADJ
fumecheng-14015	98	41	along	along	ADP
fumecheng-14015	98	42	the	the	DET
fumecheng-14015	98	43	bonding	bonding	NOUN
fumecheng-14015	98	44	interface	interface	NOUN
fumecheng-14015	98	45	.	.	PUNCT
fumecheng-14015	99	1	in	in	ADP
fumecheng-14015	99	2	contrast	contrast	NOUN
fumecheng-14015	99	3	,	,	PUNCT
fumecheng-14015	99	4	fig	fig	NOUN
fumecheng-14015	99	5	.	.	NOUN
fumecheng-14015	99	6	2	2	NUM
fumecheng-14015	99	7	(	(	PUNCT
fumecheng-14015	99	8	c	c	X
fumecheng-14015	99	9	,	,	PUNCT
fumecheng-14015	99	10	d	d	NOUN
fumecheng-14015	99	11	)	)	PUNCT
fumecheng-14015	99	12	demonstrates	demonstrate	VERB
fumecheng-14015	99	13	that	that	SCONJ
fumecheng-14015	99	14	,	,	PUNCT
fumecheng-14015	99	15	when	when	SCONJ
fumecheng-14015	99	16	the	the	DET
fumecheng-14015	99	17	same	same	ADJ
fumecheng-14015	99	18	cmp	cmp	NOUN
fumecheng-14015	99	19	nt	nt	PROPN
fumecheng-14015	99	20	-	-	PUNCT
fumecheng-14015	99	21	cu	cu	NOUN
fumecheng-14015	99	22	films	film	NOUN
fumecheng-14015	99	23	are	be	AUX
fumecheng-14015	99	24	bonded	bond	VERB
fumecheng-14015	99	25	at	at	ADP
fumecheng-14015	99	26	200	200	NUM
fumecheng-14015	99	27	°	°	NOUN
fumecheng-14015	99	28	c	c	NOUN
fumecheng-14015	99	29	for	for	ADP
fumecheng-14015	99	30	30	30	NUM
fumecheng-14015	99	31	min	min	NOUN
fumecheng-14015	99	32	,	,	PUNCT
fumecheng-14015	99	33	no	no	DET
fumecheng-14015	99	34	discernible	discernible	ADJ
fumecheng-14015	99	35	voids	void	NOUN
fumecheng-14015	99	36	are	be	AUX
fumecheng-14015	99	37	observed	observe	VERB
fumecheng-14015	99	38	at	at	ADP
fumecheng-14015	99	39	the	the	DET
fumecheng-14015	99	40	cu	cu	PROPN
fumecheng-14015	99	41	-	-	PROPN
fumecheng-14015	99	42	cu	cu	PROPN
fumecheng-14015	99	43	interface	interface	NOUN
fumecheng-14015	99	44	and	and	CCONJ
fumecheng-14015	99	45	a	a	DET
fumecheng-14015	99	46	continuous	continuous	ADJ
fumecheng-14015	99	47	,	,	PUNCT
fumecheng-14015	99	48	flat	flat	ADJ
fumecheng-14015	99	49	bonding	bonding	NOUN
fumecheng-14015	99	50	interface	interface	NOUN
fumecheng-14015	99	51	is	be	AUX
fumecheng-14015	99	52	obtained	obtain	VERB
fumecheng-14015	99	53	.	.	PUNCT
fumecheng-14015	100	1	these	these	DET
fumecheng-14015	100	2	observations	observation	NOUN
fumecheng-14015	100	3	indicate	indicate	VERB
fumecheng-14015	100	4	that	that	SCONJ
fumecheng-14015	100	5	,	,	PUNCT
fumecheng-14015	100	6	under	under	ADP
fumecheng-14015	100	7	identical	identical	ADJ
fumecheng-14015	100	8	surface	surface	NOUN
fumecheng-14015	100	9	roughness	roughness	NOUN
fumecheng-14015	100	10	and	and	CCONJ
fumecheng-14015	100	11	bonding	bonding	NOUN
fumecheng-14015	100	12	pressure	pressure	NOUN
fumecheng-14015	100	13	,	,	PUNCT
fumecheng-14015	100	14	increasing	increase	VERB
fumecheng-14015	100	15	the	the	DET
fumecheng-14015	100	16	bonding	bonding	NOUN
fumecheng-14015	100	17	temperature	temperature	NOUN
fumecheng-14015	100	18	from	from	ADP
fumecheng-14015	100	19	150	150	NUM
fumecheng-14015	100	20	to	to	ADP
fumecheng-14015	100	21	200	200	NUM
fumecheng-14015	100	22	°	°	NOUN
fumecheng-14015	100	23	c	c	NOUN
fumecheng-14015	100	24	together	together	ADV
fumecheng-14015	100	25	with	with	ADP
fumecheng-14015	100	26	a	a	DET
fumecheng-14015	100	27	sufficient	sufficient	ADJ
fumecheng-14015	100	28	bonding	bonding	NOUN
fumecheng-14015	100	29	time	time	NOUN
fumecheng-14015	100	30	effectively	effectively	ADV
fumecheng-14015	100	31	eliminates	eliminate	VERB
fumecheng-14015	100	32	interfacial	interfacial	ADJ
fumecheng-14015	100	33	voids	voids	NOUN
fumecheng-14015	100	34	and	and	CCONJ
fumecheng-14015	100	35	improves	improve	VERB
fumecheng-14015	100	36	the	the	DET
fumecheng-14015	100	37	metallic	metallic	ADJ
fumecheng-14015	100	38	continuity	continuity	NOUN
fumecheng-14015	100	39	across	across	ADP
fumecheng-14015	100	40	the	the	DET
fumecheng-14015	100	41	interface	interface	NOUN
fumecheng-14015	100	42	,	,	PUNCT
fumecheng-14015	100	43	which	which	PRON
fumecheng-14015	100	44	is	be	AUX
fumecheng-14015	100	45	expected	expect	VERB
fumecheng-14015	100	46	to	to	PART
fumecheng-14015	100	47	result	result	VERB
fumecheng-14015	100	48	in	in	ADP
fumecheng-14015	100	49	a	a	DET
fumecheng-14015	100	50	significant	significant	ADJ
fumecheng-14015	100	51	enhancement	enhancement	NOUN
fumecheng-14015	100	52	of	of	ADP
fumecheng-14015	100	53	the	the	DET
fumecheng-14015	100	54	practical	practical	ADJ
fumecheng-14015	100	55	bonding	bonding	NOUN
fumecheng-14015	100	56	quality	quality	NOUN
fumecheng-14015	100	57	and	and	CCONJ
fumecheng-14015	100	58	interfacial	interfacial	ADJ
fumecheng-14015	100	59	adhesion	adhesion	NOUN
fumecheng-14015	100	60	/	/	SYM
fumecheng-14015	100	61	strength	strength	NOUN
fumecheng-14015	100	62	.	.	PUNCT
fumecheng-14015	101	1	furthermore	furthermore	ADV
fumecheng-14015	101	2	,	,	PUNCT
fumecheng-14015	101	3	fig	fig	NOUN
fumecheng-14015	101	4	.	.	NOUN
fumecheng-14015	102	1	2	2	NUM
fumecheng-14015	102	2	(	(	PUNCT
fumecheng-14015	102	3	b	b	NOUN
fumecheng-14015	102	4	)	)	PUNCT
fumecheng-14015	102	5	,	,	PUNCT
fumecheng-14015	102	6	corresponding	correspond	VERB
fumecheng-14015	102	7	to	to	ADP
fumecheng-14015	102	8	the	the	DET
fumecheng-14015	102	9	condition	condition	NOUN
fumecheng-14015	102	10	of	of	ADP
fumecheng-14015	102	11	200	200	NUM
fumecheng-14015	102	12	°	°	NOUN
fumecheng-14015	102	13	c	c	NOUN
fumecheng-14015	102	14	for	for	ADP
fumecheng-14015	102	15	only	only	ADV
fumecheng-14015	102	16	5	5	NUM
fumecheng-14015	102	17	min	min	NOUN
fumecheng-14015	102	18	,	,	PUNCT
fumecheng-14015	102	19	still	still	ADV
fumecheng-14015	102	20	exhibits	exhibit	VERB
fumecheng-14015	102	21	a	a	DET
fumecheng-14015	102	22	noticeable	noticeable	ADJ
fumecheng-14015	102	23	population	population	NOUN
fumecheng-14015	102	24	of	of	ADP
fumecheng-14015	102	25	nanoscale	nanoscale	NOUN
fumecheng-14015	102	26	voids	voids	NOUN
fumecheng-14015	102	27	at	at	ADP
fumecheng-14015	102	28	the	the	DET
fumecheng-14015	102	29	bonding	bonding	NOUN
fumecheng-14015	102	30	interface	interface	NOUN
fumecheng-14015	102	31	,	,	PUNCT
fumecheng-14015	102	32	corroborating	corroborate	VERB
fumecheng-14015	102	33	that	that	SCONJ
fumecheng-14015	102	34	not	not	PART
fumecheng-14015	102	35	only	only	ADV
fumecheng-14015	102	36	temperature	temperature	NOUN
fumecheng-14015	102	37	but	but	CCONJ
fumecheng-14015	102	38	also	also	ADV
fumecheng-14015	102	39	the	the	DET
fumecheng-14015	102	40	overall	overall	ADJ
fumecheng-14015	102	41	thermal	thermal	ADJ
fumecheng-14015	102	42	budget	budget	NOUN
fumecheng-14015	102	43	(	(	PUNCT
fumecheng-14015	102	44	i.e.	i.e.	X
fumecheng-14015	102	45	,	,	PUNCT
fumecheng-14015	102	46	the	the	DET
fumecheng-14015	102	47	temperature	temperature	NOUN
fumecheng-14015	102	48	–	–	PUNCT
fumecheng-14015	102	49	time	time	NOUN
fumecheng-14015	102	50	product	product	NOUN
fumecheng-14015	102	51	)	)	PUNCT
fumecheng-14015	102	52	is	be	AUX
fumecheng-14015	102	53	a	a	DET
fumecheng-14015	102	54	critical	critical	ADJ
fumecheng-14015	102	55	factor	factor	NOUN
fumecheng-14015	102	56	governing	govern	VERB
fumecheng-14015	102	57	void	void	ADJ
fumecheng-14015	102	58	healing	healing	NOUN
fumecheng-14015	102	59	by	by	ADP
fumecheng-14015	102	60	cu	cu	NOUN
fumecheng-14015	102	61	diffusion	diffusion	NOUN
fumecheng-14015	102	62	and	and	CCONJ
fumecheng-14015	102	63	creep	creep	NOUN
fumecheng-14015	102	64	during	during	ADP
fumecheng-14015	102	65	cucu	cucu	NOUN
fumecheng-14015	102	66	bonding	bonding	PROPN
fumecheng-14015	102	67	.	.	PUNCT
fumecheng-14015	103	1	fig	fig	NOUN
fumecheng-14015	103	2	.	.	PUNCT
fumecheng-14015	104	1	2	2	NUM
fumecheng-14015	104	2	cross	cross	ADJ
fumecheng-14015	104	3	-	-	ADJ
fumecheng-14015	104	4	sectional	sectional	ADJ
fumecheng-14015	104	5	fib	fib	ADJ
fumecheng-14015	104	6	image	image	NOUN
fumecheng-14015	104	7	of	of	ADP
fumecheng-14015	104	8	the	the	DET
fumecheng-14015	104	9	typical	typical	ADJ
fumecheng-14015	104	10	cmp	cmp	PROPN
fumecheng-14015	104	11	nt	nt	PROPN
fumecheng-14015	104	12	-	-	PUNCT
fumecheng-14015	104	13	cu	cu	PROPN
fumecheng-14015	104	14	films	film	NOUN
fumecheng-14015	104	15	bonded	bond	VERB
fumecheng-14015	104	16	at	at	ADP
fumecheng-14015	104	17	(	(	PUNCT
fumecheng-14015	104	18	a	a	X
fumecheng-14015	104	19	)	)	PUNCT
fumecheng-14015	104	20	150	150	NUM
fumecheng-14015	104	21	◦	◦	NOUN
fumecheng-14015	104	22	c	c	NOUN
fumecheng-14015	104	23	for	for	ADP
fumecheng-14015	104	24	60	60	NUM
fumecheng-14015	104	25	min	min	NOUN
fumecheng-14015	104	26	and	and	CCONJ
fumecheng-14015	104	27	(	(	PUNCT
fumecheng-14015	104	28	b	b	NOUN
fumecheng-14015	104	29	)	)	PUNCT
fumecheng-14015	104	30	200	200	NUM
fumecheng-14015	104	31	◦	◦	NOUN
fumecheng-14015	104	32	c	c	NOUN
fumecheng-14015	104	33	for	for	ADP
fumecheng-14015	104	34	5	5	NUM
fumecheng-14015	104	35	min	min	NOUN
fumecheng-14015	104	36	.	.	PUNCT
fumecheng-14015	105	1	(	(	PUNCT
fumecheng-14015	105	2	c	c	X
fumecheng-14015	105	3	,	,	PUNCT
fumecheng-14015	105	4	d	d	NOUN
fumecheng-14015	105	5	)	)	PUNCT
fumecheng-14015	105	6	the	the	DET
fumecheng-14015	105	7	typical	typical	ADJ
fumecheng-14015	105	8	cmp	cmp	PROPN
fumecheng-14015	105	9	nt	nt	PROPN
fumecheng-14015	105	10	-	-	PUNCT
fumecheng-14015	105	11	cu	cu	PROPN
fumecheng-14015	105	12	films	film	NOUN
fumecheng-14015	105	13	bonded	bond	VERB
fumecheng-14015	105	14	at	at	ADP
fumecheng-14015	105	15	200	200	NUM
fumecheng-14015	105	16	◦	◦	NOUN
fumecheng-14015	105	17	c	c	NOUN
fumecheng-14015	105	18	for	for	ADP
fumecheng-14015	105	19	30	30	NUM
fumecheng-14015	105	20	min	min	NOUN
fumecheng-14015	106	1	[	[	X
fumecheng-14015	106	2	51	51	NUM
fumecheng-14015	106	3	]	]	SYM
fumecheng-14015	106	4	926	926	NUM
fumecheng-14015	106	5	s.	s.	PROPN
fumecheng-14015	106	6	choi	choi	PROPN
fumecheng-14015	106	7	,	,	PUNCT
fumecheng-14015	106	8	c.	c.	PROPN
fumecheng-14015	106	9	chen	chen	PROPN
fumecheng-14015	106	10	,	,	PUNCT
fumecheng-14015	106	11	b.	b.	PROPN
fumecheng-14015	106	12	hwang	hwang	PROPN
fumecheng-14015	106	13	li	li	PROPN
fumecheng-14015	106	14	et	et	PROPN
fumecheng-14015	106	15	al	al	PROPN
fumecheng-14015	106	16	.	.	PUNCT
fumecheng-14015	107	1	[	[	X
fumecheng-14015	107	2	52	52	NUM
fumecheng-14015	107	3	]	]	PUNCT
fumecheng-14015	107	4	found	find	VERB
fumecheng-14015	107	5	a	a	DET
fumecheng-14015	107	6	proportional	proportional	ADJ
fumecheng-14015	107	7	relationship	relationship	NOUN
fumecheng-14015	107	8	between	between	ADP
fumecheng-14015	107	9	the	the	DET
fumecheng-14015	107	10	bonding	bonding	NOUN
fumecheng-14015	107	11	pressure	pressure	NOUN
fumecheng-14015	107	12	and	and	CCONJ
fumecheng-14015	107	13	shear	shear	NOUN
fumecheng-14015	107	14	strength	strength	NOUN
fumecheng-14015	107	15	in	in	ADP
fumecheng-14015	107	16	cu	cu	PROPN
fumecheng-14015	107	17	nanosolder	nanosolder	PROPN
fumecheng-14015	107	18	paste	paste	NOUN
fumecheng-14015	107	19	bonding	bonding	NOUN
fumecheng-14015	107	20	,	,	PUNCT
fumecheng-14015	107	21	where	where	SCONJ
fumecheng-14015	107	22	higher	high	ADJ
fumecheng-14015	107	23	pressures	pressure	NOUN
fumecheng-14015	107	24	generated	generate	VERB
fumecheng-14015	107	25	stronger	strong	ADJ
fumecheng-14015	107	26	bonds	bond	NOUN
fumecheng-14015	107	27	at	at	ADP
fumecheng-14015	107	28	the	the	DET
fumecheng-14015	107	29	same	same	ADJ
fumecheng-14015	107	30	temperature	temperature	NOUN
fumecheng-14015	107	31	.	.	PUNCT
fumecheng-14015	108	1	these	these	DET
fumecheng-14015	108	2	studies	study	NOUN
fumecheng-14015	108	3	demonstrated	demonstrate	VERB
fumecheng-14015	108	4	that	that	SCONJ
fumecheng-14015	108	5	both	both	CCONJ
fumecheng-14015	108	6	the	the	DET
fumecheng-14015	108	7	bonding	bonding	NOUN
fumecheng-14015	108	8	and	and	CCONJ
fumecheng-14015	108	9	annealing	anneal	VERB
fumecheng-14015	108	10	temperatures	temperature	NOUN
fumecheng-14015	108	11	,	,	PUNCT
fumecheng-14015	108	12	as	as	ADV
fumecheng-14015	108	13	well	well	ADV
fumecheng-14015	108	14	as	as	ADP
fumecheng-14015	108	15	the	the	DET
fumecheng-14015	108	16	bonding	bonding	NOUN
fumecheng-14015	108	17	pressure	pressure	NOUN
fumecheng-14015	108	18	,	,	PUNCT
fumecheng-14015	108	19	significantly	significantly	ADV
fumecheng-14015	108	20	influenced	influence	VERB
fumecheng-14015	108	21	the	the	DET
fumecheng-14015	108	22	quality	quality	NOUN
fumecheng-14015	108	23	and	and	CCONJ
fumecheng-14015	108	24	strength	strength	NOUN
fumecheng-14015	108	25	of	of	ADP
fumecheng-14015	108	26	the	the	DET
fumecheng-14015	108	27	cu	cu	PROPN
fumecheng-14015	108	28	-	-	PROPN
fumecheng-14015	108	29	cu	cu	PROPN
fumecheng-14015	108	30	bonding	bonding	NOUN
fumecheng-14015	108	31	.	.	PUNCT
fumecheng-14015	109	1	voids	voids	NOUN
fumecheng-14015	109	2	at	at	ADP
fumecheng-14015	109	3	the	the	DET
fumecheng-14015	109	4	metal	metal	NOUN
fumecheng-14015	109	5	-	-	PUNCT
fumecheng-14015	109	6	metal	metal	NOUN
fumecheng-14015	109	7	bond	bond	NOUN
fumecheng-14015	109	8	interface	interface	NOUN
fumecheng-14015	109	9	play	play	VERB
fumecheng-14015	109	10	a	a	DET
fumecheng-14015	109	11	critical	critical	ADJ
fumecheng-14015	109	12	role	role	NOUN
fumecheng-14015	109	13	in	in	ADP
fumecheng-14015	109	14	determining	determine	VERB
fumecheng-14015	109	15	the	the	DET
fumecheng-14015	109	16	bonding	bonding	NOUN
fumecheng-14015	109	17	strength	strength	NOUN
fumecheng-14015	109	18	[	[	X
fumecheng-14015	109	19	53	53	NUM
fumecheng-14015	109	20	,	,	PUNCT
fumecheng-14015	109	21	54	54	NUM
fumecheng-14015	109	22	]	]	PUNCT
fumecheng-14015	109	23	.	.	PUNCT
fumecheng-14015	110	1	even	even	ADV
fumecheng-14015	110	2	with	with	ADP
fumecheng-14015	110	3	the	the	DET
fumecheng-14015	110	4	same	same	ADJ
fumecheng-14015	110	5	overall	overall	ADJ
fumecheng-14015	110	6	void	void	ADJ
fumecheng-14015	110	7	fraction	fraction	NOUN
fumecheng-14015	110	8	,	,	PUNCT
fumecheng-14015	110	9	variations	variation	NOUN
fumecheng-14015	110	10	in	in	ADP
fumecheng-14015	110	11	the	the	DET
fumecheng-14015	110	12	void	void	ADJ
fumecheng-14015	110	13	shape	shape	NOUN
fumecheng-14015	110	14	and	and	CCONJ
fumecheng-14015	110	15	distribution	distribution	NOUN
fumecheng-14015	110	16	can	can	AUX
fumecheng-14015	110	17	lead	lead	VERB
fumecheng-14015	110	18	to	to	ADP
fumecheng-14015	110	19	different	different	ADJ
fumecheng-14015	110	20	bonding	bonding	NOUN
fumecheng-14015	110	21	outcomes	outcome	NOUN
fumecheng-14015	110	22	[	[	X
fumecheng-14015	110	23	55	55	NUM
fumecheng-14015	110	24	]	]	PUNCT
fumecheng-14015	110	25	.	.	PUNCT
fumecheng-14015	111	1	therefore	therefore	ADV
fumecheng-14015	111	2	,	,	PUNCT
fumecheng-14015	111	3	understanding	understand	VERB
fumecheng-14015	111	4	how	how	SCONJ
fumecheng-14015	111	5	the	the	DET
fumecheng-14015	111	6	status	status	NOUN
fumecheng-14015	111	7	of	of	ADP
fumecheng-14015	111	8	voids	voids	NOUN
fumecheng-14015	111	9	affects	affect	VERB
fumecheng-14015	111	10	the	the	DET
fumecheng-14015	111	11	strength	strength	NOUN
fumecheng-14015	111	12	of	of	ADP
fumecheng-14015	111	13	cu	cu	PROPN
fumecheng-14015	111	14	-	-	PUNCT
fumecheng-14015	111	15	cu	cu	PROPN
fumecheng-14015	111	16	bonding	bonding	NOUN
fumecheng-14015	111	17	is	be	AUX
fumecheng-14015	111	18	essential	essential	ADJ
fumecheng-14015	111	19	.	.	PUNCT
fumecheng-14015	112	1	voids	void	NOUN
fumecheng-14015	112	2	reduce	reduce	VERB
fumecheng-14015	112	3	the	the	DET
fumecheng-14015	112	4	contact	contact	NOUN
fumecheng-14015	112	5	area	area	NOUN
fumecheng-14015	112	6	between	between	ADP
fumecheng-14015	112	7	the	the	DET
fumecheng-14015	112	8	metal	metal	NOUN
fumecheng-14015	112	9	interfaces	interface	NOUN
fumecheng-14015	112	10	,	,	PUNCT
fumecheng-14015	112	11	which	which	PRON
fumecheng-14015	112	12	in	in	ADP
fumecheng-14015	112	13	turn	turn	NOUN
fumecheng-14015	112	14	decreases	decrease	VERB
fumecheng-14015	112	15	the	the	DET
fumecheng-14015	112	16	bonding	bonding	NOUN
fumecheng-14015	112	17	strength	strength	NOUN
fumecheng-14015	112	18	and	and	CCONJ
fumecheng-14015	112	19	increases	increase	VERB
fumecheng-14015	112	20	the	the	DET
fumecheng-14015	112	21	resistance	resistance	NOUN
fumecheng-14015	112	22	[	[	X
fumecheng-14015	112	23	56	56	NUM
fumecheng-14015	112	24	]	]	PUNCT
fumecheng-14015	112	25	.	.	PUNCT
fumecheng-14015	113	1	oh	oh	INTJ
fumecheng-14015	113	2	et	et	NOUN
fumecheng-14015	113	3	al	al	PROPN
fumecheng-14015	113	4	.	.	PUNCT
fumecheng-14015	114	1	[	[	X
fumecheng-14015	114	2	57	57	NUM
fumecheng-14015	114	3	]	]	PUNCT
fumecheng-14015	114	4	investigated	investigate	VERB
fumecheng-14015	114	5	the	the	DET
fumecheng-14015	114	6	effects	effect	NOUN
fumecheng-14015	114	7	of	of	ADP
fumecheng-14015	114	8	temperature	temperature	NOUN
fumecheng-14015	114	9	and	and	CCONJ
fumecheng-14015	114	10	pressure	pressure	NOUN
fumecheng-14015	114	11	on	on	ADP
fumecheng-14015	114	12	the	the	DET
fumecheng-14015	114	13	formation	formation	NOUN
fumecheng-14015	114	14	of	of	ADP
fumecheng-14015	114	15	local	local	ADJ
fumecheng-14015	114	16	voids	void	NOUN
fumecheng-14015	114	17	during	during	ADP
fumecheng-14015	114	18	cu	cu	PROPN
fumecheng-14015	114	19	-	-	PUNCT
fumecheng-14015	114	20	cu	cu	PROPN
fumecheng-14015	114	21	bonding	bonding	NOUN
fumecheng-14015	114	22	.	.	PUNCT
fumecheng-14015	115	1	their	their	PRON
fumecheng-14015	115	2	results	result	NOUN
fumecheng-14015	115	3	showed	show	VERB
fumecheng-14015	115	4	that	that	SCONJ
fumecheng-14015	115	5	increasing	increase	VERB
fumecheng-14015	115	6	the	the	DET
fumecheng-14015	115	7	pressure	pressure	NOUN
fumecheng-14015	115	8	relative	relative	ADJ
fumecheng-14015	115	9	to	to	ADP
fumecheng-14015	115	10	the	the	DET
fumecheng-14015	115	11	temperature	temperature	NOUN
fumecheng-14015	115	12	significantly	significantly	ADV
fumecheng-14015	115	13	reduced	reduce	VERB
fumecheng-14015	115	14	the	the	DET
fumecheng-14015	115	15	void	void	ADJ
fumecheng-14015	115	16	size	size	NOUN
fumecheng-14015	115	17	.	.	PUNCT
fumecheng-14015	116	1	specifically	specifically	ADV
fumecheng-14015	116	2	,	,	PUNCT
fumecheng-14015	116	3	the	the	DET
fumecheng-14015	116	4	length	length	NOUN
fumecheng-14015	116	5	and	and	CCONJ
fumecheng-14015	116	6	height	height	NOUN
fumecheng-14015	116	7	of	of	ADP
fumecheng-14015	116	8	the	the	DET
fumecheng-14015	116	9	voids	voids	NOUN
fumecheng-14015	116	10	decreased	decrease	VERB
fumecheng-14015	116	11	markedly	markedly	ADV
fumecheng-14015	116	12	when	when	SCONJ
fumecheng-14015	116	13	the	the	DET
fumecheng-14015	116	14	pressure	pressure	NOUN
fumecheng-14015	116	15	was	be	AUX
fumecheng-14015	116	16	increased	increase	VERB
fumecheng-14015	116	17	to	to	ADP
fumecheng-14015	116	18	30	30	NUM
fumecheng-14015	116	19	mpa	mpa	NOUN
fumecheng-14015	116	20	from	from	ADP
fumecheng-14015	116	21	20	20	NUM
fumecheng-14015	116	22	mpa	mpa	NOUN
fumecheng-14015	116	23	.	.	PUNCT
fumecheng-14015	117	1	in	in	ADP
fumecheng-14015	117	2	contrast	contrast	NOUN
fumecheng-14015	117	3	,	,	PUNCT
fumecheng-14015	117	4	increasing	increase	VERB
fumecheng-14015	117	5	the	the	DET
fumecheng-14015	117	6	temperature	temperature	NOUN
fumecheng-14015	117	7	from	from	ADP
fumecheng-14015	117	8	200	200	NUM
fumecheng-14015	117	9	to	to	PART
fumecheng-14015	117	10	300	300	NUM
fumecheng-14015	117	11	°	°	NOUN
fumecheng-14015	117	12	c	c	NOUN
fumecheng-14015	117	13	led	lead	VERB
fumecheng-14015	117	14	to	to	ADP
fumecheng-14015	117	15	only	only	ADJ
fumecheng-14015	117	16	minor	minor	ADJ
fumecheng-14015	117	17	reductions	reduction	NOUN
fumecheng-14015	117	18	in	in	ADP
fumecheng-14015	117	19	the	the	DET
fumecheng-14015	117	20	void	void	ADJ
fumecheng-14015	117	21	size	size	NOUN
fumecheng-14015	117	22	.	.	PUNCT
fumecheng-14015	118	1	void	void	ADJ
fumecheng-14015	118	2	shapes	shape	NOUN
fumecheng-14015	118	3	are	be	AUX
fumecheng-14015	118	4	classified	classify	VERB
fumecheng-14015	118	5	into	into	ADP
fumecheng-14015	118	6	three	three	NUM
fumecheng-14015	118	7	main	main	ADJ
fumecheng-14015	118	8	categories	category	NOUN
fumecheng-14015	118	9	:	:	PUNCT
fumecheng-14015	118	10	oblate	oblate	ADJ
fumecheng-14015	118	11	,	,	PUNCT
fumecheng-14015	118	12	spherical	spherical	ADJ
fumecheng-14015	118	13	,	,	PUNCT
fumecheng-14015	118	14	and	and	CCONJ
fumecheng-14015	118	15	prolate	prolate	ADJ
fumecheng-14015	118	16	[	[	X
fumecheng-14015	118	17	58	58	NUM
fumecheng-14015	118	18	]	]	PUNCT
fumecheng-14015	118	19	.	.	PUNCT
fumecheng-14015	119	1	as	as	SCONJ
fumecheng-14015	119	2	the	the	DET
fumecheng-14015	119	3	pressure	pressure	NOUN
fumecheng-14015	119	4	decreased	decrease	VERB
fumecheng-14015	119	5	,	,	PUNCT
fumecheng-14015	119	6	the	the	DET
fumecheng-14015	119	7	voids	voids	NOUN
fumecheng-14015	119	8	changed	change	VERB
fumecheng-14015	119	9	from	from	ADP
fumecheng-14015	119	10	oblate	oblate	NOUN
fumecheng-14015	119	11	to	to	ADP
fumecheng-14015	119	12	spherical	spherical	ADJ
fumecheng-14015	119	13	.	.	PUNCT
fumecheng-14015	120	1	these	these	DET
fumecheng-14015	120	2	findings	finding	NOUN
fumecheng-14015	120	3	were	be	AUX
fumecheng-14015	120	4	consistent	consistent	ADJ
fumecheng-14015	120	5	with	with	ADP
fumecheng-14015	120	6	that	that	PRON
fumecheng-14015	120	7	of	of	ADP
fumecheng-14015	120	8	other	other	ADJ
fumecheng-14015	120	9	researchers	researcher	NOUN
fumecheng-14015	120	10	who	who	PRON
fumecheng-14015	120	11	used	use	VERB
fumecheng-14015	120	12	both	both	CCONJ
fumecheng-14015	120	13	experimental	experimental	ADJ
fumecheng-14015	120	14	and	and	CCONJ
fumecheng-14015	120	15	simulation	simulation	NOUN
fumecheng-14015	120	16	methods	method	NOUN
fumecheng-14015	120	17	[	[	X
fumecheng-14015	120	18	58	58	NUM
fumecheng-14015	120	19	,	,	PUNCT
fumecheng-14015	120	20	59	59	NUM
fumecheng-14015	120	21	]	]	PUNCT
fumecheng-14015	120	22	.	.	PUNCT
fumecheng-14015	121	1	additionally	additionally	ADV
fumecheng-14015	121	2	,	,	PUNCT
fumecheng-14015	121	3	a	a	DET
fumecheng-14015	121	4	simulation	simulation	NOUN
fumecheng-14015	121	5	study	study	NOUN
fumecheng-14015	121	6	revealed	reveal	VERB
fumecheng-14015	121	7	that	that	SCONJ
fumecheng-14015	121	8	under	under	ADP
fumecheng-14015	121	9	identical	identical	ADJ
fumecheng-14015	121	10	conditions	condition	NOUN
fumecheng-14015	121	11	,	,	PUNCT
fumecheng-14015	121	12	oblate	oblate	ADJ
fumecheng-14015	121	13	voids	voids	NOUN
fumecheng-14015	121	14	grew	grow	VERB
fumecheng-14015	121	15	faster	fast	ADV
fumecheng-14015	121	16	than	than	ADP
fumecheng-14015	121	17	spherical	spherical	ADJ
fumecheng-14015	121	18	voids	void	NOUN
fumecheng-14015	121	19	,	,	PUNCT
fumecheng-14015	121	20	and	and	CCONJ
fumecheng-14015	121	21	spherical	spherical	ADJ
fumecheng-14015	121	22	voids	voids	NOUN
fumecheng-14015	121	23	grew	grow	VERB
fumecheng-14015	121	24	faster	fast	ADV
fumecheng-14015	121	25	than	than	ADP
fumecheng-14015	121	26	prolate	prolate	ADJ
fumecheng-14015	121	27	voids	void	NOUN
fumecheng-14015	121	28	,	,	PUNCT
fumecheng-14015	121	29	during	during	ADP
fumecheng-14015	121	30	the	the	DET
fumecheng-14015	121	31	bonding	bonding	NOUN
fumecheng-14015	121	32	process	process	NOUN
fumecheng-14015	121	33	.	.	PUNCT
fumecheng-14015	122	1	the	the	DET
fumecheng-14015	122	2	study	study	NOUN
fumecheng-14015	122	3	also	also	ADV
fumecheng-14015	122	4	found	find	VERB
fumecheng-14015	122	5	that	that	SCONJ
fumecheng-14015	122	6	the	the	DET
fumecheng-14015	122	7	fracture	fracture	PROPN
fumecheng-14015	122	8	initiation	initiation	NOUN
fumecheng-14015	122	9	toughness	toughness	NOUN
fumecheng-14015	122	10	was	be	AUX
fumecheng-14015	122	11	the	the	DET
fumecheng-14015	122	12	highest	high	ADJ
fumecheng-14015	122	13	when	when	SCONJ
fumecheng-14015	122	14	the	the	DET
fumecheng-14015	122	15	void	void	NOUN
fumecheng-14015	122	16	was	be	AUX
fumecheng-14015	122	17	prolate	prolate	ADJ
fumecheng-14015	122	18	and	and	CCONJ
fumecheng-14015	122	19	lowest	low	ADJ
fumecheng-14015	122	20	when	when	SCONJ
fumecheng-14015	122	21	it	it	PRON
fumecheng-14015	122	22	was	be	AUX
fumecheng-14015	122	23	oblate	oblate	ADJ
fumecheng-14015	122	24	.	.	PUNCT
fumecheng-14015	123	1	in	in	ADP
fumecheng-14015	123	2	other	other	ADJ
fumecheng-14015	123	3	words	word	NOUN
fumecheng-14015	123	4	,	,	PUNCT
fumecheng-14015	123	5	the	the	DET
fumecheng-14015	123	6	bonding	bonding	NOUN
fumecheng-14015	123	7	was	be	AUX
fumecheng-14015	123	8	the	the	DET
fumecheng-14015	123	9	most	most	ADV
fumecheng-14015	123	10	robust	robust	ADJ
fumecheng-14015	123	11	when	when	SCONJ
fumecheng-14015	123	12	the	the	DET
fumecheng-14015	123	13	void	void	NOUN
fumecheng-14015	123	14	was	be	AUX
fumecheng-14015	123	15	prolate	prolate	ADJ
fumecheng-14015	123	16	and	and	CCONJ
fumecheng-14015	123	17	the	the	DET
fumecheng-14015	123	18	weakest	weak	ADJ
fumecheng-14015	123	19	when	when	SCONJ
fumecheng-14015	123	20	it	it	PRON
fumecheng-14015	123	21	was	be	AUX
fumecheng-14015	123	22	oblate	oblate	ADJ
fumecheng-14015	124	1	[	[	X
fumecheng-14015	124	2	58	58	NUM
fumecheng-14015	124	3	]	]	PUNCT
fumecheng-14015	124	4	.	.	PUNCT
fumecheng-14015	125	1	unfortunately	unfortunately	ADV
fumecheng-14015	125	2	,	,	PUNCT
fumecheng-14015	125	3	the	the	DET
fumecheng-14015	125	4	voids	voids	NOUN
fumecheng-14015	125	5	formed	form	VERB
fumecheng-14015	125	6	at	at	ADP
fumecheng-14015	125	7	the	the	DET
fumecheng-14015	125	8	bonding	bonding	NOUN
fumecheng-14015	125	9	interface	interface	NOUN
fumecheng-14015	125	10	are	be	AUX
fumecheng-14015	125	11	usually	usually	ADV
fumecheng-14015	125	12	oblate	oblate	ADJ
fumecheng-14015	125	13	or	or	CCONJ
fumecheng-14015	125	14	spherical	spherical	ADJ
fumecheng-14015	125	15	;	;	PUNCT
fumecheng-14015	125	16	therefore	therefore	ADV
fumecheng-14015	125	17	,	,	PUNCT
fumecheng-14015	125	18	more	more	ADJ
fumecheng-14015	125	19	attention	attention	NOUN
fumecheng-14015	125	20	should	should	AUX
fumecheng-14015	125	21	be	be	AUX
fumecheng-14015	125	22	paid	pay	VERB
fumecheng-14015	125	23	to	to	ADP
fumecheng-14015	125	24	the	the	DET
fumecheng-14015	125	25	void	void	ADJ
fumecheng-14015	125	26	formation	formation	NOUN
fumecheng-14015	125	27	and	and	CCONJ
fumecheng-14015	125	28	evolution	evolution	NOUN
fumecheng-14015	125	29	during	during	ADP
fumecheng-14015	125	30	the	the	DET
fumecheng-14015	125	31	cucu	cucu	NOUN
fumecheng-14015	125	32	direct	direct	ADJ
fumecheng-14015	125	33	bonding	bonding	NOUN
fumecheng-14015	125	34	process	process	NOUN
fumecheng-14015	125	35	[	[	X
fumecheng-14015	125	36	58	58	NUM
fumecheng-14015	125	37	,	,	PUNCT
fumecheng-14015	125	38	61	61	NUM
fumecheng-14015	125	39	-	-	SYM
fumecheng-14015	125	40	63	63	NUM
fumecheng-14015	125	41	]	]	PUNCT
fumecheng-14015	125	42	.	.	PUNCT
fumecheng-14015	126	1	void	void	ADJ
fumecheng-14015	126	2	ripening	ripening	NOUN
fumecheng-14015	126	3	was	be	AUX
fumecheng-14015	126	4	observed	observe	VERB
fumecheng-14015	126	5	at	at	ADP
fumecheng-14015	126	6	the	the	DET
fumecheng-14015	126	7	bonding	bonding	NOUN
fumecheng-14015	126	8	interface	interface	NOUN
fumecheng-14015	126	9	subjected	subject	VERB
fumecheng-14015	126	10	to	to	ADP
fumecheng-14015	126	11	thermal	thermal	ADJ
fumecheng-14015	126	12	annealing	annealing	NOUN
fumecheng-14015	126	13	at	at	ADP
fumecheng-14015	126	14	200	200	NUM
fumecheng-14015	126	15	°	°	NOUN
fumecheng-14015	126	16	c	c	NOUN
fumecheng-14015	126	17	for	for	ADP
fumecheng-14015	126	18	30	30	NUM
fumecheng-14015	126	19	to	to	PART
fumecheng-14015	126	20	120	120	NUM
fumecheng-14015	126	21	min	min	NOUN
fumecheng-14015	126	22	[	[	X
fumecheng-14015	126	23	63	63	NUM
fumecheng-14015	126	24	]	]	PUNCT
fumecheng-14015	126	25	.	.	PUNCT
fumecheng-14015	127	1	the	the	DET
fumecheng-14015	127	2	absence	absence	NOUN
fumecheng-14015	127	3	of	of	ADP
fumecheng-14015	127	4	intergranular	intergranular	NOUN
fumecheng-14015	127	5	coarsening	coarsening	NOUN
fumecheng-14015	127	6	or	or	CCONJ
fumecheng-14015	127	7	interface	interface	NOUN
fumecheng-14015	127	8	breakup	breakup	NOUN
fumecheng-14015	127	9	indicates	indicate	VERB
fumecheng-14015	127	10	that	that	SCONJ
fumecheng-14015	127	11	the	the	DET
fumecheng-14015	127	12	microstructural	microstructural	ADJ
fumecheng-14015	127	13	change	change	NOUN
fumecheng-14015	127	14	is	be	AUX
fumecheng-14015	127	15	dominated	dominate	VERB
fumecheng-14015	127	16	by	by	ADP
fumecheng-14015	127	17	void	void	ADJ
fumecheng-14015	127	18	evolution	evolution	NOUN
fumecheng-14015	127	19	rather	rather	ADV
fumecheng-14015	127	20	than	than	ADP
fumecheng-14015	127	21	bulk	bulk	ADJ
fumecheng-14015	127	22	recrystallization	recrystallization	NOUN
fumecheng-14015	127	23	or	or	CCONJ
fumecheng-14015	127	24	grain	grain	NOUN
fumecheng-14015	127	25	growth	growth	NOUN
fumecheng-14015	127	26	.	.	PUNCT
fumecheng-14015	128	1	concomitantly	concomitantly	ADV
fumecheng-14015	128	2	,	,	PUNCT
fumecheng-14015	128	3	the	the	DET
fumecheng-14015	128	4	void	void	ADJ
fumecheng-14015	128	5	morphology	morphology	NOUN
fumecheng-14015	128	6	evolves	evolve	VERB
fumecheng-14015	128	7	toward	toward	ADP
fumecheng-14015	128	8	more	more	ADJ
fumecheng-14015	128	9	circular	circular	ADJ
fumecheng-14015	128	10	shapes	shape	NOUN
fumecheng-14015	128	11	at	at	ADP
fumecheng-14015	128	12	longer	long	ADJ
fumecheng-14015	128	13	times	time	NOUN
fumecheng-14015	128	14	,	,	PUNCT
fumecheng-14015	128	15	with	with	ADP
fumecheng-14015	128	16	an	an	DET
fumecheng-14015	128	17	apparent	apparent	ADJ
fumecheng-14015	128	18	increase	increase	NOUN
fumecheng-14015	128	19	in	in	ADP
fumecheng-14015	128	20	the	the	DET
fumecheng-14015	128	21	thickness	thickness	NOUN
fumecheng-14015	128	22	dimension	dimension	NOUN
fumecheng-14015	128	23	inferred	infer	VERB
fumecheng-14015	128	24	from	from	ADP
fumecheng-14015	128	25	cross	cross	ADJ
fumecheng-14015	128	26	-	-	ADJ
fumecheng-14015	128	27	sectional	sectional	ADJ
fumecheng-14015	128	28	contrast	contrast	NOUN
fumecheng-14015	128	29	.	.	PUNCT
fumecheng-14015	129	1	such	such	ADJ
fumecheng-14015	129	2	circularization	circularization	NOUN
fumecheng-14015	129	3	and	and	CCONJ
fumecheng-14015	129	4	coarsening	coarsening	NOUN
fumecheng-14015	129	5	of	of	ADP
fumecheng-14015	129	6	a	a	DET
fumecheng-14015	129	7	subset	subset	NOUN
fumecheng-14015	129	8	of	of	ADP
fumecheng-14015	129	9	voids	voids	NOUN
fumecheng-14015	129	10	,	,	PUNCT
fumecheng-14015	129	11	together	together	ADV
fumecheng-14015	129	12	with	with	ADP
fumecheng-14015	129	13	the	the	DET
fumecheng-14015	129	14	reduction	reduction	NOUN
fumecheng-14015	129	15	in	in	ADP
fumecheng-14015	129	16	the	the	DET
fumecheng-14015	129	17	count	count	NOUN
fumecheng-14015	129	18	of	of	ADP
fumecheng-14015	129	19	smaller	small	ADJ
fumecheng-14015	129	20	voids	void	NOUN
fumecheng-14015	129	21	,	,	PUNCT
fumecheng-14015	129	22	is	be	AUX
fumecheng-14015	129	23	the	the	DET
fumecheng-14015	129	24	characteristic	characteristic	ADJ
fumecheng-14015	129	25	fingerprint	fingerprint	NOUN
fumecheng-14015	129	26	of	of	ADP
fumecheng-14015	129	27	curvature	curvature	NOUN
fumecheng-14015	129	28	driven	drive	VERB
fumecheng-14015	129	29	ostwald	ostwald	NOUN
fumecheng-14015	129	30	ripening	ripen	VERB
fumecheng-14015	129	31	at	at	ADP
fumecheng-14015	129	32	the	the	DET
fumecheng-14015	129	33	bonding	bonding	NOUN
fumecheng-14015	129	34	interface	interface	NOUN
fumecheng-14015	129	35	.	.	PUNCT
fumecheng-14015	130	1	the	the	DET
fumecheng-14015	130	2	combined	combine	VERB
fumecheng-14015	130	3	observations	observation	NOUN
fumecheng-14015	130	4	—	—	PUNCT
fumecheng-14015	130	5	decreasing	decrease	VERB
fumecheng-14015	130	6	void	void	ADJ
fumecheng-14015	130	7	count	count	NOUN
fumecheng-14015	130	8	with	with	ADP
fumecheng-14015	130	9	time	time	NOUN
fumecheng-14015	130	10	,	,	PUNCT
fumecheng-14015	130	11	progressive	progressive	ADJ
fumecheng-14015	130	12	circularization	circularization	NOUN
fumecheng-14015	130	13	and	and	CCONJ
fumecheng-14015	130	14	coarsening	coarsening	NOUN
fumecheng-14015	130	15	of	of	ADP
fumecheng-14015	130	16	the	the	DET
fumecheng-14015	130	17	surviving	survive	VERB
fumecheng-14015	130	18	voids	voids	NOUN
fumecheng-14015	130	19	,	,	PUNCT
fumecheng-14015	130	20	and	and	CCONJ
fumecheng-14015	130	21	the	the	DET
fumecheng-14015	130	22	lack	lack	NOUN
fumecheng-14015	130	23	of	of	ADP
fumecheng-14015	130	24	concurrent	concurrent	ADJ
fumecheng-14015	130	25	grain	grain	NOUN
fumecheng-14015	130	26	growth	growth	NOUN
fumecheng-14015	130	27	—	—	PUNCT
fumecheng-14015	130	28	substantiate	substantiate	VERB
fumecheng-14015	130	29	the	the	DET
fumecheng-14015	130	30	claim	claim	NOUN
fumecheng-14015	130	31	that	that	PRON
fumecheng-14015	130	32	void	void	VERB
fumecheng-14015	130	33	ripening	ripening	NOUN
fumecheng-14015	130	34	occurs	occur	VERB
fumecheng-14015	130	35	at	at	ADP
fumecheng-14015	130	36	the	the	DET
fumecheng-14015	130	37	bonding	bonding	NOUN
fumecheng-14015	130	38	interface	interface	NOUN
fumecheng-14015	130	39	during	during	ADP
fumecheng-14015	130	40	annealing	anneal	VERB
fumecheng-14015	130	41	at	at	ADP
fumecheng-14015	130	42	200	200	NUM
fumecheng-14015	130	43	°	°	NOUN
fumecheng-14015	130	44	c	c	NOUN
fumecheng-14015	130	45	for	for	ADP
fumecheng-14015	130	46	30–120	30–120	NUM
fumecheng-14015	130	47	min	min	NOUN
fumecheng-14015	130	48	.	.	PUNCT
fumecheng-14015	131	1	a	a	DET
fumecheng-14015	131	2	kinetic	kinetic	ADJ
fumecheng-14015	131	3	model	model	NOUN
fumecheng-14015	131	4	was	be	AUX
fumecheng-14015	131	5	proposed	propose	VERB
fumecheng-14015	131	6	to	to	PART
fumecheng-14015	131	7	describe	describe	VERB
fumecheng-14015	131	8	the	the	DET
fumecheng-14015	131	9	relationship	relationship	NOUN
fumecheng-14015	131	10	between	between	ADP
fumecheng-14015	131	11	the	the	DET
fumecheng-14015	131	12	void	void	ADJ
fumecheng-14015	131	13	radius	radius	NOUN
fumecheng-14015	131	14	and	and	CCONJ
fumecheng-14015	131	15	annealing	annealing	NOUN
fumecheng-14015	131	16	time	time	NOUN
fumecheng-14015	131	17	.	.	PUNCT
fumecheng-14015	132	1	a	a	DET
fumecheng-14015	132	2	different	different	ADJ
fumecheng-14015	132	3	void	void	ADJ
fumecheng-14015	132	4	evolution	evolution	NOUN
fumecheng-14015	132	5	phenomenon	phenomenon	NOUN
fumecheng-14015	132	6	was	be	AUX
fumecheng-14015	132	7	observed	observe	VERB
fumecheng-14015	132	8	under	under	ADP
fumecheng-14015	132	9	nanocrystalline	nanocrystalline	PROPN
fumecheng-14015	132	10	cu	cu	NOUN
fumecheng-14015	132	11	bonding	bonding	NOUN
fumecheng-14015	132	12	conditions	condition	NOUN
fumecheng-14015	132	13	[	[	X
fumecheng-14015	132	14	64	64	NUM
fumecheng-14015	132	15	]	]	PUNCT
fumecheng-14015	132	16	.	.	PUNCT
fumecheng-14015	133	1	the	the	DET
fumecheng-14015	133	2	high	high	ADJ
fumecheng-14015	133	3	thermal	thermal	ADJ
fumecheng-14015	133	4	instability	instability	NOUN
fumecheng-14015	133	5	of	of	ADP
fumecheng-14015	133	6	nanocrystalline	nanocrystalline	PROPN
fumecheng-14015	133	7	cu	cu	PROPN
fumecheng-14015	133	8	facilitated	facilitate	VERB
fumecheng-14015	133	9	the	the	DET
fumecheng-14015	133	10	grain	grain	NOUN
fumecheng-14015	133	11	growth	growth	NOUN
fumecheng-14015	133	12	and	and	CCONJ
fumecheng-14015	133	13	amalgamation	amalgamation	NOUN
fumecheng-14015	133	14	at	at	ADP
fumecheng-14015	133	15	the	the	DET
fumecheng-14015	133	16	bonding	bonding	NOUN
fumecheng-14015	133	17	interface	interface	NOUN
fumecheng-14015	133	18	at	at	ADP
fumecheng-14015	133	19	low	low	ADJ
fumecheng-14015	133	20	temperatures	temperature	NOUN
fumecheng-14015	133	21	.	.	PUNCT
fumecheng-14015	134	1	however	however	ADV
fumecheng-14015	134	2	,	,	PUNCT
fumecheng-14015	134	3	the	the	DET
fumecheng-14015	134	4	grain	grain	NOUN
fumecheng-14015	134	5	growth	growth	NOUN
fumecheng-14015	134	6	exerted	exert	VERB
fumecheng-14015	134	7	a	a	DET
fumecheng-14015	134	8	force	force	NOUN
fumecheng-14015	134	9	on	on	ADP
fumecheng-14015	134	10	the	the	DET
fumecheng-14015	134	11	voids	voids	NOUN
fumecheng-14015	134	12	,	,	PUNCT
fumecheng-14015	134	13	which	which	PRON
fumecheng-14015	134	14	split	split	VERB
fumecheng-14015	134	15	the	the	DET
fumecheng-14015	134	16	initial	initial	ADJ
fumecheng-14015	134	17	large	large	ADJ
fumecheng-14015	134	18	void	void	NOUN
fumecheng-14015	134	19	into	into	ADP
fumecheng-14015	134	20	numerous	numerous	ADJ
fumecheng-14015	134	21	nanovoids	nanovoid	NOUN
fumecheng-14015	134	22	.	.	PUNCT
fumecheng-14015	135	1	these	these	DET
fumecheng-14015	135	2	factors	factor	NOUN
fumecheng-14015	135	3	such	such	ADJ
fumecheng-14015	135	4	as	as	ADP
fumecheng-14015	135	5	temperature	temperature	NOUN
fumecheng-14015	135	6	and	and	CCONJ
fumecheng-14015	135	7	pressure	pressure	NOUN
fumecheng-14015	135	8	can	can	AUX
fumecheng-14015	135	9	affect	affect	VERB
fumecheng-14015	135	10	the	the	DET
fumecheng-14015	135	11	formation	formation	NOUN
fumecheng-14015	135	12	of	of	ADP
fumecheng-14015	135	13	these	these	DET
fumecheng-14015	135	14	voids	void	NOUN
fumecheng-14015	135	15	,	,	PUNCT
fumecheng-14015	135	16	so	so	ADV
fumecheng-14015	135	17	care	care	NOUN
fumecheng-14015	135	18	must	must	AUX
fumecheng-14015	135	19	be	be	AUX
fumecheng-14015	135	20	taken	take	VERB
fumecheng-14015	135	21	when	when	SCONJ
fumecheng-14015	135	22	joining	join	VERB
fumecheng-14015	135	23	cu	cu	PROPN
fumecheng-14015	135	24	-	-	PUNCT
fumecheng-14015	135	25	cu	cu	PROPN
fumecheng-14015	135	26	interface	interface	NOUN
fumecheng-14015	135	27	.	.	PUNCT
fumecheng-14015	136	1	cu	cu	PROPN
fumecheng-14015	136	2	-	-	PUNCT
fumecheng-14015	136	3	cu	cu	PROPN
fumecheng-14015	136	4	mechanical	mechanical	ADJ
fumecheng-14015	136	5	bonding	bonding	NOUN
fumecheng-14015	136	6	for	for	ADP
fumecheng-14015	136	7	3d	3d	NOUN
fumecheng-14015	136	8	integration	integration	NOUN
fumecheng-14015	136	9	of	of	ADP
fumecheng-14015	136	10	the	the	DET
fumecheng-14015	136	11	next	next	ADJ
fumecheng-14015	136	12	generation	generation	NOUN
fumecheng-14015	136	13	electronic	electronic	ADJ
fumecheng-14015	136	14	chips	chip	NOUN
fumecheng-14015	136	15	...	...	PUNCT
fumecheng-14015	137	1	927	927	NUM
fumecheng-14015	137	2	in	in	ADP
fumecheng-14015	137	3	summary	summary	NOUN
fumecheng-14015	137	4	,	,	PUNCT
fumecheng-14015	137	5	the	the	DET
fumecheng-14015	137	6	reliability	reliability	NOUN
fumecheng-14015	137	7	of	of	ADP
fumecheng-14015	137	8	direct	direct	ADJ
fumecheng-14015	137	9	cu	cu	PROPN
fumecheng-14015	137	10	-	-	PROPN
fumecheng-14015	137	11	cu	cu	PROPN
fumecheng-14015	137	12	bonding	bonding	NOUN
fumecheng-14015	137	13	is	be	AUX
fumecheng-14015	137	14	dictated	dictate	VERB
fumecheng-14015	137	15	by	by	ADP
fumecheng-14015	137	16	the	the	DET
fumecheng-14015	137	17	coupled	couple	VERB
fumecheng-14015	137	18	influence	influence	NOUN
fumecheng-14015	137	19	of	of	ADP
fumecheng-14015	137	20	four	four	NUM
fumecheng-14015	137	21	interdependent	interdependent	ADJ
fumecheng-14015	137	22	factors	factor	NOUN
fumecheng-14015	137	23	—	—	PUNCT
fumecheng-14015	137	24	grain	grain	NOUN
fumecheng-14015	137	25	size	size	NOUN
fumecheng-14015	137	26	,	,	PUNCT
fumecheng-14015	137	27	surface	surface	NOUN
fumecheng-14015	137	28	roughness	roughness	NOUN
fumecheng-14015	137	29	,	,	PUNCT
fumecheng-14015	137	30	thermo	thermo	NOUN
fumecheng-14015	137	31	-	-	PUNCT
fumecheng-14015	137	32	mechanical	mechanical	ADJ
fumecheng-14015	137	33	processing	processing	NOUN
fumecheng-14015	137	34	parameters	parameter	NOUN
fumecheng-14015	137	35	,	,	PUNCT
fumecheng-14015	137	36	and	and	CCONJ
fumecheng-14015	137	37	interfacial	interfacial	ADJ
fumecheng-14015	137	38	void	void	ADJ
fumecheng-14015	137	39	behavior	behavior	NOUN
fumecheng-14015	137	40	.	.	PUNCT
fumecheng-14015	138	1	refinement	refinement	NOUN
fumecheng-14015	138	2	of	of	ADP
fumecheng-14015	138	3	the	the	DET
fumecheng-14015	138	4	copper	copper	NOUN
fumecheng-14015	138	5	grain	grain	NOUN
fumecheng-14015	138	6	structure	structure	NOUN
fumecheng-14015	138	7	activates	activate	VERB
fumecheng-14015	138	8	hall	hall	PROPN
fumecheng-14015	138	9	–	–	PUNCT
fumecheng-14015	138	10	petch	petch	NOUN
fumecheng-14015	138	11	strengthening	strengthening	NOUN
fumecheng-14015	138	12	,	,	PUNCT
fumecheng-14015	138	13	thereby	thereby	ADV
fumecheng-14015	138	14	elevating	elevate	VERB
fumecheng-14015	138	15	interfacial	interfacial	ADJ
fumecheng-14015	138	16	shear	shear	NOUN
fumecheng-14015	138	17	strength	strength	NOUN
fumecheng-14015	138	18	and	and	CCONJ
fumecheng-14015	138	19	suppressing	suppress	VERB
fumecheng-14015	138	20	microcrack	microcrack	NOUN
fumecheng-14015	138	21	propagation	propagation	NOUN
fumecheng-14015	138	22	under	under	ADP
fumecheng-14015	138	23	identical	identical	ADJ
fumecheng-14015	138	24	thermal	thermal	ADJ
fumecheng-14015	138	25	and	and	CCONJ
fumecheng-14015	138	26	pressure	pressure	NOUN
fumecheng-14015	138	27	conditions	condition	NOUN
fumecheng-14015	138	28	.	.	PUNCT
fumecheng-14015	139	1	sub	sub	ADJ
fumecheng-14015	139	2	-	-	ADJ
fumecheng-14015	139	3	nanometer	nanometer	ADJ
fumecheng-14015	139	4	surface	surface	NOUN
fumecheng-14015	139	5	roughness	roughness	NOUN
fumecheng-14015	139	6	maximizes	maximize	VERB
fumecheng-14015	139	7	real	real	ADJ
fumecheng-14015	139	8	contact	contact	NOUN
fumecheng-14015	139	9	area	area	NOUN
fumecheng-14015	139	10	and	and	CCONJ
fumecheng-14015	139	11	therefore	therefore	ADV
fumecheng-14015	139	12	bonding	bond	VERB
fumecheng-14015	139	13	energy	energy	NOUN
fumecheng-14015	139	14	,	,	PUNCT
fumecheng-14015	139	15	yet	yet	CCONJ
fumecheng-14015	139	16	once	once	ADV
fumecheng-14015	139	17	a	a	DET
fumecheng-14015	139	18	critical	critical	ADJ
fumecheng-14015	139	19	roughness	roughness	NOUN
fumecheng-14015	139	20	threshold	threshold	NOUN
fumecheng-14015	139	21	is	be	AUX
fumecheng-14015	139	22	exceeded	exceed	VERB
fumecheng-14015	139	23	,	,	PUNCT
fumecheng-14015	139	24	asperity	asperity	NOUN
fumecheng-14015	139	25	-	-	PUNCT
fumecheng-14015	139	26	induced	induce	VERB
fumecheng-14015	139	27	void	void	ADJ
fumecheng-14015	139	28	formation	formation	NOUN
fumecheng-14015	139	29	offsets	offset	VERB
fumecheng-14015	139	30	these	these	DET
fumecheng-14015	139	31	benefits	benefit	NOUN
fumecheng-14015	139	32	and	and	CCONJ
fumecheng-14015	139	33	degrades	degrade	VERB
fumecheng-14015	139	34	mechanical	mechanical	ADJ
fumecheng-14015	139	35	integrity	integrity	NOUN
fumecheng-14015	139	36	.	.	PUNCT
fumecheng-14015	140	1	because	because	SCONJ
fumecheng-14015	140	2	the	the	DET
fumecheng-14015	140	3	lattice	lattice	PROPN
fumecheng-14015	140	4	diffusion	diffusion	NOUN
fumecheng-14015	140	5	coefficient	coefficient	NOUN
fumecheng-14015	140	6	follows	follow	VERB
fumecheng-14015	140	7	an	an	DET
fumecheng-14015	140	8	arrhenius	arrhenius	NOUN
fumecheng-14015	140	9	relationship	relationship	NOUN
fumecheng-14015	140	10	,	,	PUNCT
fumecheng-14015	140	11	concurrent	concurrent	ADJ
fumecheng-14015	140	12	application	application	NOUN
fumecheng-14015	140	13	of	of	ADP
fumecheng-14015	140	14	moderately	moderately	ADV
fumecheng-14015	140	15	elevated	elevate	VERB
fumecheng-14015	140	16	temperatures	temperature	NOUN
fumecheng-14015	140	17	(	(	PUNCT
fumecheng-14015	140	18	≈	≈	PROPN
fumecheng-14015	140	19	300–400	300–400	NUM
fumecheng-14015	140	20	°	°	ADP
fumecheng-14015	140	21	c	c	NOUN
fumecheng-14015	140	22	)	)	PUNCT
fumecheng-14015	140	23	and	and	CCONJ
fumecheng-14015	140	24	compressive	compressive	ADJ
fumecheng-14015	140	25	stresses	stress	NOUN
fumecheng-14015	140	26	on	on	ADP
fumecheng-14015	140	27	the	the	DET
fumecheng-14015	140	28	order	order	NOUN
fumecheng-14015	140	29	of	of	ADP
fumecheng-14015	140	30	several	several	ADJ
fumecheng-14015	140	31	tens	ten	NOUN
fumecheng-14015	140	32	of	of	ADP
fumecheng-14015	140	33	megapascals	megapascal	NOUN
fumecheng-14015	140	34	accelerates	accelerate	VERB
fumecheng-14015	140	35	interfacial	interfacial	ADJ
fumecheng-14015	140	36	diffusion	diffusion	NOUN
fumecheng-14015	140	37	and	and	CCONJ
fumecheng-14015	140	38	markedly	markedly	ADV
fumecheng-14015	140	39	increases	increase	VERB
fumecheng-14015	140	40	adhesion	adhesion	NOUN
fumecheng-14015	140	41	energy	energy	NOUN
fumecheng-14015	140	42	.	.	PUNCT
fumecheng-14015	141	1	nevertheless	nevertheless	ADV
fumecheng-14015	141	2	,	,	PUNCT
fumecheng-14015	141	3	voids	void	NOUN
fumecheng-14015	141	4	persist	persist	VERB
fumecheng-14015	141	5	as	as	ADP
fumecheng-14015	141	6	dominant	dominant	ADJ
fumecheng-14015	141	7	reliability	reliability	NOUN
fumecheng-14015	141	8	hazards	hazard	NOUN
fumecheng-14015	141	9	;	;	PUNCT
fumecheng-14015	141	10	while	while	SCONJ
fumecheng-14015	141	11	elevated	elevated	ADJ
fumecheng-14015	141	12	temperature	temperature	NOUN
fumecheng-14015	141	13	enhances	enhance	VERB
fumecheng-14015	141	14	atomic	atomic	ADJ
fumecheng-14015	141	15	mobility	mobility	NOUN
fumecheng-14015	141	16	,	,	PUNCT
fumecheng-14015	141	17	empirical	empirical	ADJ
fumecheng-14015	141	18	evidence	evidence	NOUN
fumecheng-14015	141	19	indicates	indicate	VERB
fumecheng-14015	141	20	that	that	SCONJ
fumecheng-14015	141	21	increased	increase	VERB
fumecheng-14015	141	22	external	external	ADJ
fumecheng-14015	141	23	pressure	pressure	NOUN
fumecheng-14015	141	24	more	more	ADV
fumecheng-14015	141	25	effectively	effectively	ADV
fumecheng-14015	141	26	collapses	collapse	VERB
fumecheng-14015	141	27	or	or	CCONJ
fumecheng-14015	141	28	heals	heal	VERB
fumecheng-14015	141	29	voids	void	NOUN
fumecheng-14015	141	30	,	,	PUNCT
fumecheng-14015	141	31	thereby	thereby	ADV
fumecheng-14015	141	32	restoring	restore	VERB
fumecheng-14015	141	33	contact	contact	NOUN
fumecheng-14015	141	34	area	area	NOUN
fumecheng-14015	141	35	and	and	CCONJ
fumecheng-14015	141	36	lowering	lower	VERB
fumecheng-14015	141	37	electrical	electrical	ADJ
fumecheng-14015	141	38	resistance	resistance	NOUN
fumecheng-14015	141	39	.	.	PUNCT
fumecheng-14015	142	1	collectively	collectively	ADV
fumecheng-14015	142	2	,	,	PUNCT
fumecheng-14015	142	3	these	these	DET
fumecheng-14015	142	4	observations	observation	NOUN
fumecheng-14015	142	5	establish	establish	VERB
fumecheng-14015	142	6	a	a	DET
fumecheng-14015	142	7	practical	practical	ADJ
fumecheng-14015	142	8	design	design	NOUN
fumecheng-14015	142	9	framework	framework	NOUN
fumecheng-14015	142	10	—	—	PUNCT
fumecheng-14015	142	11	fine	fine	ADV
fumecheng-14015	142	12	-	-	PUNCT
fumecheng-14015	142	13	grained	grain	VERB
fumecheng-14015	142	14	microstructure	microstructure	NOUN
fumecheng-14015	142	15	,	,	PUNCT
fumecheng-14015	142	16	ultra	ultra	ADJ
fumecheng-14015	142	17	smooth	smooth	ADJ
fumecheng-14015	142	18	surfaces	surface	NOUN
fumecheng-14015	142	19	,	,	PUNCT
fumecheng-14015	142	20	judicious	judicious	ADJ
fumecheng-14015	142	21	thermo	thermo	NOUN
fumecheng-14015	142	22	-	-	PUNCT
fumecheng-14015	142	23	mechanical	mechanical	ADJ
fumecheng-14015	142	24	loading	loading	NOUN
fumecheng-14015	142	25	,	,	PUNCT
fumecheng-14015	142	26	and	and	CCONJ
fumecheng-14015	142	27	proactive	proactive	ADJ
fumecheng-14015	142	28	void	void	ADJ
fumecheng-14015	142	29	mitigation	mitigation	NOUN
fumecheng-14015	142	30	—	—	PUNCT
fumecheng-14015	142	31	through	through	ADP
fumecheng-14015	142	32	which	which	PRON
fumecheng-14015	142	33	high	high	ADJ
fumecheng-14015	142	34	-	-	PUNCT
fumecheng-14015	142	35	integrity	integrity	NOUN
fumecheng-14015	142	36	cucu	cucu	NOUN
fumecheng-14015	142	37	interconnections	interconnection	NOUN
fumecheng-14015	142	38	can	can	AUX
fumecheng-14015	142	39	be	be	AUX
fumecheng-14015	142	40	consistently	consistently	ADV
fumecheng-14015	142	41	achieved	achieve	VERB
fumecheng-14015	142	42	.	.	PUNCT
fumecheng-14015	143	1	3	3	X
fumecheng-14015	143	2	.	.	X
fumecheng-14015	143	3	low	low	ADJ
fumecheng-14015	143	4	-	-	PUNCT
fumecheng-14015	143	5	temperature	temperature	NOUN
fumecheng-14015	143	6	cu	cu	PROPN
fumecheng-14015	143	7	-	-	PROPN
fumecheng-14015	143	8	cu	cu	PROPN
fumecheng-14015	143	9	mechanical	mechanical	ADJ
fumecheng-14015	143	10	bonding	bonding	NOUN
fumecheng-14015	143	11	technologies	technology	NOUN
fumecheng-14015	143	12	3.1	3.1	NUM
fumecheng-14015	143	13	.	.	PUNCT
fumecheng-14015	144	1	surface	surface	NOUN
fumecheng-14015	144	2	activated	activate	VERB
fumecheng-14015	144	3	mechanical	mechanical	ADJ
fumecheng-14015	144	4	bonding	bonding	NOUN
fumecheng-14015	144	5	sab	sab	NOUN
fumecheng-14015	144	6	combines	combine	VERB
fumecheng-14015	144	7	two	two	NUM
fumecheng-14015	144	8	materials	material	NOUN
fumecheng-14015	144	9	by	by	ADP
fumecheng-14015	144	10	leveraging	leverage	VERB
fumecheng-14015	144	11	the	the	DET
fumecheng-14015	144	12	interatomic	interatomic	ADJ
fumecheng-14015	144	13	adhesion	adhesion	NOUN
fumecheng-14015	144	14	of	of	ADP
fumecheng-14015	144	15	atomically	atomically	ADV
fumecheng-14015	144	16	clean	clean	ADJ
fumecheng-14015	144	17	surfaces	surface	NOUN
fumecheng-14015	144	18	in	in	ADP
fumecheng-14015	144	19	an	an	DET
fumecheng-14015	144	20	ultra	ultra	ADJ
fumecheng-14015	144	21	-	-	ADJ
fumecheng-14015	144	22	high	high	ADJ
fumecheng-14015	144	23	vacuum	vacuum	NOUN
fumecheng-14015	144	24	(	(	PUNCT
fumecheng-14015	144	25	uhv	uhv	NOUN
fumecheng-14015	144	26	)	)	PUNCT
fumecheng-14015	144	27	environment	environment	NOUN
fumecheng-14015	144	28	at	at	ADP
fumecheng-14015	144	29	21	21	NUM
fumecheng-14015	144	30	-	-	SYM
fumecheng-14015	144	31	25	25	NUM
fumecheng-14015	144	32	°	°	NUM
fumecheng-14015	144	33	c	c	NOUN
fumecheng-14015	144	34	[	[	X
fumecheng-14015	144	35	60	60	NUM
fumecheng-14015	144	36	-	-	SYM
fumecheng-14015	144	37	64	64	NUM
fumecheng-14015	144	38	]	]	PUNCT
fumecheng-14015	144	39	.	.	PUNCT
fumecheng-14015	145	1	unlike	unlike	ADP
fumecheng-14015	145	2	the	the	DET
fumecheng-14015	145	3	traditional	traditional	ADJ
fumecheng-14015	145	4	bonding	bonding	NOUN
fumecheng-14015	145	5	methods	method	NOUN
fumecheng-14015	145	6	,	,	PUNCT
fumecheng-14015	145	7	sab	sab	PROPN
fumecheng-14015	145	8	achieves	achieve	VERB
fumecheng-14015	145	9	strong	strong	ADJ
fumecheng-14015	145	10	bonds	bond	NOUN
fumecheng-14015	145	11	without	without	ADP
fumecheng-14015	145	12	requiring	require	VERB
fumecheng-14015	145	13	hightemperature	hightemperature	NOUN
fumecheng-14015	145	14	treatments	treatment	NOUN
fumecheng-14015	145	15	,	,	PUNCT
fumecheng-14015	145	16	annealing	annealing	NOUN
fumecheng-14015	145	17	,	,	PUNCT
fumecheng-14015	145	18	or	or	CCONJ
fumecheng-14015	145	19	toxic	toxic	ADJ
fumecheng-14015	145	20	chemical	chemical	NOUN
fumecheng-14015	145	21	cleaning	cleaning	NOUN
fumecheng-14015	145	22	processes	process	NOUN
fumecheng-14015	145	23	.	.	PUNCT
fumecheng-14015	146	1	instead	instead	ADV
fumecheng-14015	146	2	,	,	PUNCT
fumecheng-14015	146	3	a	a	DET
fumecheng-14015	146	4	highly	highly	ADV
fumecheng-14015	146	5	accelerated	accelerate	VERB
fumecheng-14015	146	6	ar	ar	NOUN
fumecheng-14015	146	7	fast	fast	ADJ
fumecheng-14015	146	8	atom	atom	NOUN
fumecheng-14015	146	9	beam	beam	NOUN
fumecheng-14015	146	10	is	be	AUX
fumecheng-14015	146	11	employed	employ	VERB
fumecheng-14015	146	12	to	to	PART
fumecheng-14015	146	13	physically	physically	ADV
fumecheng-14015	146	14	remove	remove	VERB
fumecheng-14015	146	15	contaminants	contaminant	NOUN
fumecheng-14015	146	16	and	and	CCONJ
fumecheng-14015	146	17	oxides	oxide	NOUN
fumecheng-14015	146	18	from	from	ADP
fumecheng-14015	146	19	the	the	DET
fumecheng-14015	146	20	surface	surface	NOUN
fumecheng-14015	146	21	of	of	ADP
fumecheng-14015	146	22	the	the	DET
fumecheng-14015	146	23	wafer	wafer	NOUN
fumecheng-14015	146	24	.	.	PUNCT
fumecheng-14015	147	1	kim	kim	PROPN
fumecheng-14015	147	2	et	et	PROPN
fumecheng-14015	147	3	al	al	PROPN
fumecheng-14015	147	4	.	.	PUNCT
fumecheng-14015	148	1	[	[	X
fumecheng-14015	148	2	60	60	NUM
fumecheng-14015	148	3	]	]	PUNCT
fumecheng-14015	148	4	proposed	propose	VERB
fumecheng-14015	148	5	a	a	DET
fumecheng-14015	148	6	method	method	NOUN
fumecheng-14015	148	7	that	that	PRON
fumecheng-14015	148	8	used	use	VERB
fumecheng-14015	148	9	an	an	DET
fumecheng-14015	148	10	ar	ar	NOUN
fumecheng-14015	148	11	ion	ion	NOUN
fumecheng-14015	148	12	beam	beam	NOUN
fumecheng-14015	148	13	on	on	ADP
fumecheng-14015	148	14	a	a	DET
fumecheng-14015	148	15	cu	cu	NOUN
fumecheng-14015	148	16	surface	surface	NOUN
fumecheng-14015	148	17	in	in	ADP
fumecheng-14015	148	18	a	a	DET
fumecheng-14015	148	19	uhv	uhv	NOUN
fumecheng-14015	148	20	environment	environment	NOUN
fumecheng-14015	148	21	to	to	PART
fumecheng-14015	148	22	eliminate	eliminate	VERB
fumecheng-14015	148	23	the	the	DET
fumecheng-14015	148	24	oxide	oxide	NOUN
fumecheng-14015	148	25	layer	layer	NOUN
fumecheng-14015	148	26	before	before	ADP
fumecheng-14015	148	27	performing	perform	VERB
fumecheng-14015	148	28	sab	sab	VERB
fumecheng-14015	148	29	.	.	PUNCT
fumecheng-14015	149	1	for	for	ADP
fumecheng-14015	149	2	successful	successful	ADJ
fumecheng-14015	149	3	thermo	thermo	NOUN
fumecheng-14015	149	4	-	-	PUNCT
fumecheng-14015	149	5	compression	compression	NOUN
fumecheng-14015	149	6	bonding	bonding	NOUN
fumecheng-14015	149	7	(	(	PUNCT
fumecheng-14015	149	8	tcb	tcb	NOUN
fumecheng-14015	149	9	)	)	PUNCT
fumecheng-14015	149	10	,	,	PUNCT
fumecheng-14015	149	11	the	the	DET
fumecheng-14015	149	12	surface	surface	NOUN
fumecheng-14015	149	13	must	must	AUX
fumecheng-14015	149	14	be	be	AUX
fumecheng-14015	149	15	free	free	ADJ
fumecheng-14015	149	16	of	of	ADP
fumecheng-14015	149	17	contaminants	contaminant	NOUN
fumecheng-14015	149	18	and	and	CCONJ
fumecheng-14015	149	19	have	have	VERB
fumecheng-14015	149	20	a	a	DET
fumecheng-14015	149	21	flat	flat	ADJ
fumecheng-14015	149	22	oxide	oxide	NOUN
fumecheng-14015	149	23	-	-	PUNCT
fumecheng-14015	149	24	free	free	ADJ
fumecheng-14015	149	25	profile	profile	NOUN
fumecheng-14015	149	26	.	.	PUNCT
fumecheng-14015	150	1	cmp	cmp	PROPN
fumecheng-14015	150	2	can	can	AUX
fumecheng-14015	150	3	be	be	AUX
fumecheng-14015	150	4	used	use	VERB
fumecheng-14015	150	5	to	to	PART
fumecheng-14015	150	6	achieve	achieve	VERB
fumecheng-14015	150	7	a	a	DET
fumecheng-14015	150	8	root	root	NOUN
fumecheng-14015	150	9	mean	mean	NOUN
fumecheng-14015	150	10	square	square	ADJ
fumecheng-14015	150	11	(	(	PUNCT
fumecheng-14015	150	12	rms	rm	NOUN
fumecheng-14015	150	13	)	)	PUNCT
fumecheng-14015	150	14	surface	surface	NOUN
fumecheng-14015	150	15	roughness	roughness	NOUN
fumecheng-14015	150	16	of	of	ADP
fumecheng-14015	150	17	1	1	NUM
fumecheng-14015	150	18	nm	nm	NOUN
fumecheng-14015	150	19	or	or	CCONJ
fumecheng-14015	150	20	less	less	ADJ
fumecheng-14015	150	21	;	;	PUNCT
fumecheng-14015	150	22	however	however	ADV
fumecheng-14015	150	23	,	,	PUNCT
fumecheng-14015	150	24	cu	cu	PROPN
fumecheng-14015	150	25	oxidizes	oxidize	VERB
fumecheng-14015	150	26	quickly	quickly	ADV
fumecheng-14015	150	27	,	,	PUNCT
fumecheng-14015	150	28	forming	form	VERB
fumecheng-14015	150	29	an	an	DET
fumecheng-14015	150	30	oxide	oxide	NOUN
fumecheng-14015	150	31	layer	layer	NOUN
fumecheng-14015	150	32	over	over	ADP
fumecheng-14015	150	33	1	1	NUM
fumecheng-14015	150	34	nm	nm	ADV
fumecheng-14015	150	35	thick	thick	ADJ
fumecheng-14015	150	36	within	within	ADP
fumecheng-14015	150	37	just	just	ADV
fumecheng-14015	150	38	1	1	NUM
fumecheng-14015	150	39	h	h	NOUN
fumecheng-14015	150	40	of	of	ADP
fumecheng-14015	150	41	environmental	environmental	ADJ
fumecheng-14015	150	42	exposure	exposure	NOUN
fumecheng-14015	150	43	[	[	X
fumecheng-14015	150	44	60	60	NUM
fumecheng-14015	150	45	]	]	PUNCT
fumecheng-14015	150	46	.	.	PUNCT
fumecheng-14015	151	1	therefore	therefore	ADV
fumecheng-14015	151	2	,	,	PUNCT
fumecheng-14015	151	3	the	the	DET
fumecheng-14015	151	4	removal	removal	NOUN
fumecheng-14015	151	5	of	of	ADP
fumecheng-14015	151	6	this	this	DET
fumecheng-14015	151	7	oxide	oxide	NOUN
fumecheng-14015	151	8	layer	layer	NOUN
fumecheng-14015	151	9	is	be	AUX
fumecheng-14015	151	10	critical	critical	ADJ
fumecheng-14015	151	11	for	for	ADP
fumecheng-14015	151	12	successful	successful	ADJ
fumecheng-14015	151	13	tcb	tcb	PROPN
fumecheng-14015	151	14	.	.	PUNCT
fumecheng-14015	152	1	in	in	ADP
fumecheng-14015	152	2	sab	sab	PROPN
fumecheng-14015	152	3	,	,	PUNCT
fumecheng-14015	152	4	an	an	DET
fumecheng-14015	152	5	ion	ion	NOUN
fumecheng-14015	152	6	or	or	CCONJ
fumecheng-14015	152	7	high	high	ADJ
fumecheng-14015	152	8	-	-	PUNCT
fumecheng-14015	152	9	velocity	velocity	NOUN
fumecheng-14015	152	10	atomic	atomic	ADJ
fumecheng-14015	152	11	beam	beam	NOUN
fumecheng-14015	152	12	is	be	AUX
fumecheng-14015	152	13	used	use	VERB
fumecheng-14015	152	14	to	to	PART
fumecheng-14015	152	15	activate	activate	VERB
fumecheng-14015	152	16	the	the	DET
fumecheng-14015	152	17	bonding	bonding	NOUN
fumecheng-14015	152	18	surfaces	surface	NOUN
fumecheng-14015	152	19	in	in	ADP
fumecheng-14015	152	20	a	a	DET
fumecheng-14015	152	21	uhv	uhv	NOUN
fumecheng-14015	152	22	environment	environment	NOUN
fumecheng-14015	152	23	,	,	PUNCT
fumecheng-14015	152	24	facilitating	facilitate	VERB
fumecheng-14015	152	25	the	the	DET
fumecheng-14015	152	26	formation	formation	NOUN
fumecheng-14015	152	27	of	of	ADP
fumecheng-14015	152	28	chemical	chemical	ADJ
fumecheng-14015	152	29	bonds	bond	NOUN
fumecheng-14015	152	30	between	between	ADP
fumecheng-14015	152	31	cu	cu	PROPN
fumecheng-14015	152	32	surfaces	surface	NOUN
fumecheng-14015	152	33	at	at	ADP
fumecheng-14015	152	34	room	room	NOUN
fumecheng-14015	152	35	temperature	temperature	NOUN
fumecheng-14015	153	1	[	[	X
fumecheng-14015	153	2	62	62	NUM
fumecheng-14015	153	3	]	]	PUNCT
fumecheng-14015	153	4	.	.	PUNCT
fumecheng-14015	154	1	the	the	DET
fumecheng-14015	154	2	sab	sab	PROPN
fumecheng-14015	154	3	setup	setup	NOUN
fumecheng-14015	154	4	(	(	PUNCT
fumecheng-14015	154	5	as	as	SCONJ
fumecheng-14015	154	6	depicted	depict	VERB
fumecheng-14015	154	7	in	in	ADP
fumecheng-14015	154	8	fig	fig	NOUN
fumecheng-14015	154	9	.	.	PUNCT
fumecheng-14015	155	1	3	3	X
fumecheng-14015	155	2	)	)	PUNCT
fumecheng-14015	155	3	consists	consist	VERB
fumecheng-14015	155	4	of	of	ADP
fumecheng-14015	155	5	various	various	ADJ
fumecheng-14015	155	6	chambers	chamber	NOUN
fumecheng-14015	155	7	designed	design	VERB
fumecheng-14015	155	8	for	for	ADP
fumecheng-14015	155	9	processing	processing	NOUN
fumecheng-14015	155	10	,	,	PUNCT
fumecheng-14015	155	11	analysis	analysis	NOUN
fumecheng-14015	155	12	,	,	PUNCT
fumecheng-14015	155	13	heating	heating	NOUN
fumecheng-14015	155	14	,	,	PUNCT
fumecheng-14015	155	15	and	and	CCONJ
fumecheng-14015	155	16	alignment	alignment	NOUN
fumecheng-14015	155	17	.	.	PUNCT
fumecheng-14015	156	1	after	after	ADP
fumecheng-14015	156	2	the	the	DET
fumecheng-14015	156	3	surface	surface	NOUN
fumecheng-14015	156	4	activation	activation	NOUN
fumecheng-14015	156	5	in	in	ADP
fumecheng-14015	156	6	the	the	DET
fumecheng-14015	156	7	process	process	NOUN
fumecheng-14015	156	8	chamber	chamber	NOUN
fumecheng-14015	156	9	,	,	PUNCT
fumecheng-14015	156	10	the	the	DET
fumecheng-14015	156	11	two	two	NUM
fumecheng-14015	156	12	wafers	wafer	NOUN
fumecheng-14015	156	13	are	be	AUX
fumecheng-14015	156	14	brought	bring	VERB
fumecheng-14015	156	15	into	into	ADP
fumecheng-14015	156	16	contact	contact	NOUN
fumecheng-14015	156	17	and	and	CCONJ
fumecheng-14015	156	18	bonded	bond	VERB
fumecheng-14015	156	19	in	in	ADP
fumecheng-14015	156	20	the	the	DET
fumecheng-14015	156	21	bonding	bonding	NOUN
fumecheng-14015	156	22	chamber	chamber	NOUN
fumecheng-14015	156	23	.	.	PUNCT
fumecheng-14015	157	1	this	this	PRON
fumecheng-14015	157	2	enables	enable	VERB
fumecheng-14015	157	3	wafer	wafer	NOUN
fumecheng-14015	157	4	-	-	PUNCT
fumecheng-14015	157	5	level	level	NOUN
fumecheng-14015	157	6	cu	cu	PROPN
fumecheng-14015	157	7	-	-	PUNCT
fumecheng-14015	157	8	cu	cu	PROPN
fumecheng-14015	157	9	bonding	bonding	NOUN
fumecheng-14015	157	10	using	use	VERB
fumecheng-14015	157	11	an	an	DET
fumecheng-14015	157	12	ar	ar	NOUN
fumecheng-14015	157	13	ion	ion	NOUN
fumecheng-14015	157	14	beam	beam	NOUN
fumecheng-14015	157	15	with	with	ADP
fumecheng-14015	157	16	sab	sab	PROPN
fumecheng-14015	157	17	technology	technology	NOUN
fumecheng-14015	157	18	.	.	PUNCT
fumecheng-14015	158	1	the	the	DET
fumecheng-14015	158	2	surface	surface	NOUN
fumecheng-14015	158	3	activated	activate	VERB
fumecheng-14015	158	4	cu	cu	PROPN
fumecheng-14015	158	5	-	-	PUNCT
fumecheng-14015	158	6	cu	cu	PROPN
fumecheng-14015	158	7	bonding	bonding	NOUN
fumecheng-14015	158	8	process	process	NOUN
fumecheng-14015	158	9	involves	involve	VERB
fumecheng-14015	158	10	specialized	specialized	ADJ
fumecheng-14015	158	11	treatments	treatment	NOUN
fumecheng-14015	158	12	that	that	PRON
fumecheng-14015	158	13	remove	remove	VERB
fumecheng-14015	158	14	or	or	CCONJ
fumecheng-14015	158	15	prevent	prevent	VERB
fumecheng-14015	158	16	the	the	DET
fumecheng-14015	158	17	formation	formation	NOUN
fumecheng-14015	158	18	of	of	ADP
fumecheng-14015	158	19	an	an	DET
fumecheng-14015	158	20	oxide	oxide	NOUN
fumecheng-14015	158	21	layer	layer	NOUN
fumecheng-14015	158	22	on	on	ADP
fumecheng-14015	158	23	the	the	DET
fumecheng-14015	158	24	cu	cu	PROPN
fumecheng-14015	158	25	surface	surface	NOUN
fumecheng-14015	158	26	.	.	PUNCT
fumecheng-14015	159	1	this	this	DET
fumecheng-14015	159	2	results	result	VERB
fumecheng-14015	159	3	in	in	ADP
fumecheng-14015	159	4	a	a	DET
fumecheng-14015	159	5	strong	strong	ADJ
fumecheng-14015	159	6	bond	bond	NOUN
fumecheng-14015	159	7	at	at	ADP
fumecheng-14015	159	8	room	room	NOUN
fumecheng-14015	159	9	temperature	temperature	NOUN
fumecheng-14015	159	10	without	without	ADP
fumecheng-14015	159	11	needing	need	VERB
fumecheng-14015	159	12	an	an	DET
fumecheng-14015	159	13	annealing	anneal	VERB
fumecheng-14015	159	14	step	step	NOUN
fumecheng-14015	159	15	to	to	PART
fumecheng-14015	159	16	increase	increase	VERB
fumecheng-14015	159	17	the	the	DET
fumecheng-14015	159	18	bond	bond	NOUN
fumecheng-14015	159	19	strength	strength	NOUN
fumecheng-14015	159	20	.	.	PUNCT
fumecheng-14015	160	1	auger	auger	NOUN
fumecheng-14015	160	2	electron	electron	PROPN
fumecheng-14015	160	3	spectroscopy	spectroscopy	NOUN
fumecheng-14015	160	4	(	(	PUNCT
fumecheng-14015	160	5	aes	aes	NOUN
fumecheng-14015	160	6	)	)	PUNCT
fumecheng-14015	160	7	was	be	AUX
fumecheng-14015	160	8	used	use	VERB
fumecheng-14015	160	9	to	to	PART
fumecheng-14015	160	10	assess	assess	VERB
fumecheng-14015	160	11	the	the	DET
fumecheng-14015	160	12	cleanliness	cleanliness	NOUN
fumecheng-14015	160	13	of	of	ADP
fumecheng-14015	160	14	the	the	DET
fumecheng-14015	160	15	cu	cu	PROPN
fumecheng-14015	160	16	surfaces	surface	NOUN
fumecheng-14015	160	17	prior	prior	ADV
fumecheng-14015	160	18	to	to	ADP
fumecheng-14015	160	19	bonding	bonding	NOUN
fumecheng-14015	160	20	.	.	PUNCT
fumecheng-14015	161	1	following	follow	VERB
fumecheng-14015	161	2	the	the	DET
fumecheng-14015	161	3	ar	ar	NOUN
fumecheng-14015	161	4	ion	ion	NOUN
fumecheng-14015	161	5	beam	beam	NOUN
fumecheng-14015	161	6	treatment	treatment	NOUN
fumecheng-14015	161	7	,	,	PUNCT
fumecheng-14015	161	8	the	the	DET
fumecheng-14015	161	9	transfer	transfer	NOUN
fumecheng-14015	161	10	of	of	ADP
fumecheng-14015	161	11	the	the	DET
fumecheng-14015	161	12	cu	cu	PROPN
fumecheng-14015	161	13	sample	sample	NOUN
fumecheng-14015	161	14	from	from	ADP
fumecheng-14015	161	15	the	the	DET
fumecheng-14015	161	16	process	process	NOUN
fumecheng-14015	161	17	chamber	chamber	NOUN
fumecheng-14015	161	18	to	to	ADP
fumecheng-14015	161	19	the	the	DET
fumecheng-14015	161	20	analysis	analysis	NOUN
fumecheng-14015	161	21	chamber	chamber	NOUN
fumecheng-14015	161	22	took	take	VERB
fumecheng-14015	161	23	approximately	approximately	ADV
fumecheng-14015	161	24	15	15	NUM
fumecheng-14015	161	25	min	min	NOUN
fumecheng-14015	161	26	,	,	PUNCT
fumecheng-14015	161	27	during	during	ADP
fumecheng-14015	161	28	which	which	PRON
fumecheng-14015	161	29	928	928	NUM
fumecheng-14015	161	30	s.	s.	PROPN
fumecheng-14015	161	31	choi	choi	PROPN
fumecheng-14015	161	32	,	,	PUNCT
fumecheng-14015	161	33	c.	c.	PROPN
fumecheng-14015	161	34	chen	chen	PROPN
fumecheng-14015	161	35	,	,	PUNCT
fumecheng-14015	161	36	b.	b.	PROPN
fumecheng-14015	161	37	hwang	hwang	PROPN
fumecheng-14015	161	38	time	time	PROPN
fumecheng-14015	161	39	residual	residual	ADJ
fumecheng-14015	161	40	gases	gas	NOUN
fumecheng-14015	161	41	like	like	ADP
fumecheng-14015	161	42	o₂	o₂	PROPN
fumecheng-14015	161	43	,	,	PUNCT
fumecheng-14015	161	44	h₂	h₂	PROPN
fumecheng-14015	161	45	,	,	PUNCT
fumecheng-14015	161	46	and	and	CCONJ
fumecheng-14015	161	47	o	o	NOUN
fumecheng-14015	161	48	could	could	AUX
fumecheng-14015	161	49	be	be	AUX
fumecheng-14015	161	50	generated	generate	VERB
fumecheng-14015	161	51	.	.	PUNCT
fumecheng-14015	162	1	however	however	ADV
fumecheng-14015	162	2	,	,	PUNCT
fumecheng-14015	162	3	auger	auger	NOUN
fumecheng-14015	162	4	analysis	analysis	NOUN
fumecheng-14015	162	5	confirmed	confirm	VERB
fumecheng-14015	162	6	that	that	SCONJ
fumecheng-14015	162	7	these	these	DET
fumecheng-14015	162	8	gases	gas	NOUN
fumecheng-14015	162	9	had	have	VERB
fumecheng-14015	162	10	a	a	DET
fumecheng-14015	162	11	minimal	minimal	ADJ
fumecheng-14015	162	12	impact	impact	NOUN
fumecheng-14015	162	13	on	on	ADP
fumecheng-14015	162	14	the	the	DET
fumecheng-14015	162	15	surface	surface	NOUN
fumecheng-14015	162	16	.	.	PUNCT
fumecheng-14015	163	1	fig	fig	NOUN
fumecheng-14015	163	2	.	.	PUNCT
fumecheng-14015	164	1	3	3	NUM
fumecheng-14015	164	2	schematic	schematic	ADJ
fumecheng-14015	164	3	view	view	NOUN
fumecheng-14015	164	4	of	of	ADP
fumecheng-14015	164	5	surface	surface	NOUN
fumecheng-14015	164	6	activated	activate	VERB
fumecheng-14015	164	7	bonding	bonding	NOUN
fumecheng-14015	164	8	machine	machine	NOUN
fumecheng-14015	164	9	the	the	DET
fumecheng-14015	164	10	bond	bond	NOUN
fumecheng-14015	164	11	strength	strength	NOUN
fumecheng-14015	164	12	,	,	PUNCT
fumecheng-14015	164	13	a	a	DET
fumecheng-14015	164	14	key	key	ADJ
fumecheng-14015	164	15	measure	measure	NOUN
fumecheng-14015	164	16	of	of	ADP
fumecheng-14015	164	17	bonding	bonding	NOUN
fumecheng-14015	164	18	quality	quality	NOUN
fumecheng-14015	164	19	,	,	PUNCT
fumecheng-14015	164	20	was	be	AUX
fumecheng-14015	164	21	assessed	assess	VERB
fumecheng-14015	164	22	,	,	PUNCT
fumecheng-14015	164	23	and	and	CCONJ
fumecheng-14015	164	24	the	the	DET
fumecheng-14015	164	25	tensile	tensile	NOUN
fumecheng-14015	164	26	strength	strength	NOUN
fumecheng-14015	164	27	was	be	AUX
fumecheng-14015	164	28	found	find	VERB
fumecheng-14015	164	29	to	to	PART
fumecheng-14015	164	30	exceed	exceed	VERB
fumecheng-14015	164	31	6.47	6.47	NUM
fumecheng-14015	164	32	mpa	mpa	NOUN
fumecheng-14015	164	33	,	,	PUNCT
fumecheng-14015	164	34	with	with	ADP
fumecheng-14015	164	35	fractures	fracture	NOUN
fumecheng-14015	164	36	occurring	occur	VERB
fumecheng-14015	164	37	in	in	ADP
fumecheng-14015	164	38	the	the	DET
fumecheng-14015	164	39	bulk	bulk	NOUN
fumecheng-14015	164	40	or	or	CCONJ
fumecheng-14015	164	41	glue	glue	NOUN
fumecheng-14015	164	42	.	.	PUNCT
fumecheng-14015	165	1	this	this	PRON
fumecheng-14015	165	2	demonstrates	demonstrate	VERB
fumecheng-14015	165	3	that	that	SCONJ
fumecheng-14015	165	4	cu	cu	PROPN
fumecheng-14015	165	5	-	-	PUNCT
fumecheng-14015	165	6	cu	cu	PROPN
fumecheng-14015	165	7	bonding	bonding	NOUN
fumecheng-14015	165	8	at	at	ADP
fumecheng-14015	165	9	room	room	NOUN
fumecheng-14015	165	10	temperature	temperature	NOUN
fumecheng-14015	165	11	can	can	AUX
fumecheng-14015	165	12	be	be	AUX
fumecheng-14015	165	13	successfully	successfully	ADV
fumecheng-14015	165	14	achieved	achieve	VERB
fumecheng-14015	165	15	using	use	VERB
fumecheng-14015	165	16	an	an	DET
fumecheng-14015	165	17	ar	ar	NOUN
fumecheng-14015	165	18	ion	ion	NOUN
fumecheng-14015	165	19	beam	beam	NOUN
fumecheng-14015	165	20	during	during	ADP
fumecheng-14015	165	21	the	the	DET
fumecheng-14015	165	22	sab	sab	PROPN
fumecheng-14015	165	23	process	process	NOUN
fumecheng-14015	165	24	.	.	PUNCT
fumecheng-14015	166	1	shigetou	shigetou	VERB
fumecheng-14015	166	2	et	et	PROPN
fumecheng-14015	166	3	al	al	PROPN
fumecheng-14015	166	4	.	.	PUNCT
fumecheng-14015	167	1	[	[	X
fumecheng-14015	167	2	65	65	NUM
fumecheng-14015	167	3	]	]	PUNCT
fumecheng-14015	167	4	demonstrated	demonstrate	VERB
fumecheng-14015	167	5	the	the	DET
fumecheng-14015	167	6	successful	successful	ADJ
fumecheng-14015	167	7	bonding	bonding	NOUN
fumecheng-14015	167	8	of	of	ADP
fumecheng-14015	167	9	6	6	NUM
fumecheng-14015	167	10	µm	µm	NUM
fumecheng-14015	167	11	-	-	PUNCT
fumecheng-14015	167	12	pitch	pitch	NOUN
fumecheng-14015	167	13	bumpless	bumpless	NOUN
fumecheng-14015	167	14	cu	cu	PROPN
fumecheng-14015	167	15	electrodes	electrode	VERB
fumecheng-14015	167	16	using	use	VERB
fumecheng-14015	167	17	the	the	DET
fumecheng-14015	167	18	sab	sab	PROPN
fumecheng-14015	167	19	method	method	NOUN
fumecheng-14015	167	20	;	;	PUNCT
fumecheng-14015	167	21	their	their	PRON
fumecheng-14015	167	22	technique	technique	NOUN
fumecheng-14015	167	23	also	also	ADV
fumecheng-14015	167	24	facilitated	facilitate	VERB
fumecheng-14015	167	25	bonding	bonding	NOUN
fumecheng-14015	167	26	of	of	ADP
fumecheng-14015	167	27	20	20	NUM
fumecheng-14015	167	28	µm	µm	NOUN
fumecheng-14015	167	29	-	-	PUNCT
fumecheng-14015	167	30	pitch	pitch	NOUN
fumecheng-14015	167	31	au	au	ADJ
fumecheng-14015	167	32	microbumps	microbump	NOUN
fumecheng-14015	167	33	at	at	ADP
fumecheng-14015	167	34	room	room	NOUN
fumecheng-14015	167	35	temperature	temperature	NOUN
fumecheng-14015	167	36	[	[	X
fumecheng-14015	167	37	66	66	NUM
fumecheng-14015	167	38	]	]	PUNCT
fumecheng-14015	167	39	.	.	PUNCT
fumecheng-14015	168	1	3.2	3.2	NUM
fumecheng-14015	168	2	.	.	PUNCT
fumecheng-14015	168	3	enhanced	enhance	VERB
fumecheng-14015	168	4	mechanical	mechanical	ADJ
fumecheng-14015	168	5	bonding	bonding	NOUN
fumecheng-14015	168	6	strength	strength	NOUN
fumecheng-14015	168	7	by	by	ADP
fumecheng-14015	168	8	chemical	chemical	ADJ
fumecheng-14015	168	9	pretreatment	pretreatment	NOUN
fumecheng-14015	168	10	the	the	DET
fumecheng-14015	168	11	formation	formation	NOUN
fumecheng-14015	168	12	of	of	ADP
fumecheng-14015	168	13	cuo	cuo	PROPN
fumecheng-14015	168	14	is	be	AUX
fumecheng-14015	168	15	inevitable	inevitable	ADJ
fumecheng-14015	168	16	during	during	ADP
fumecheng-14015	168	17	cu	cu	PROPN
fumecheng-14015	168	18	-	-	PUNCT
fumecheng-14015	168	19	cu	cu	PROPN
fumecheng-14015	168	20	bonding	bonding	NOUN
fumecheng-14015	168	21	[	[	X
fumecheng-14015	168	22	67	67	NUM
fumecheng-14015	168	23	-	-	SYM
fumecheng-14015	168	24	70	70	NUM
fumecheng-14015	168	25	]	]	PUNCT
fumecheng-14015	168	26	,	,	PUNCT
fumecheng-14015	168	27	especially	especially	ADV
fumecheng-14015	168	28	at	at	ADP
fumecheng-14015	168	29	high	high	ADJ
fumecheng-14015	168	30	bonding	bonding	NOUN
fumecheng-14015	168	31	temperatures	temperature	NOUN
fumecheng-14015	168	32	.	.	PUNCT
fumecheng-14015	169	1	cu	cu	PROPN
fumecheng-14015	169	2	is	be	AUX
fumecheng-14015	169	3	highly	highly	ADV
fumecheng-14015	169	4	susceptible	susceptible	ADJ
fumecheng-14015	169	5	to	to	ADP
fumecheng-14015	169	6	oxidation	oxidation	NOUN
fumecheng-14015	169	7	,	,	PUNCT
fumecheng-14015	169	8	with	with	ADP
fumecheng-14015	169	9	an	an	DET
fumecheng-14015	169	10	oxide	oxide	NOUN
fumecheng-14015	169	11	layer	layer	NOUN
fumecheng-14015	169	12	over	over	ADP
fumecheng-14015	169	13	1	1	NUM
fumecheng-14015	169	14	nm	nm	ADV
fumecheng-14015	169	15	thick	thick	NOUN
fumecheng-14015	169	16	formed	form	VERB
fumecheng-14015	169	17	in	in	ADP
fumecheng-14015	169	18	less	less	ADJ
fumecheng-14015	169	19	than	than	ADP
fumecheng-14015	169	20	1	1	NUM
fumecheng-14015	169	21	h	h	NOUN
fumecheng-14015	169	22	of	of	ADP
fumecheng-14015	169	23	exposure	exposure	NOUN
fumecheng-14015	169	24	[	[	X
fumecheng-14015	169	25	71	71	NUM
fumecheng-14015	169	26	]	]	PUNCT
fumecheng-14015	169	27	.	.	PUNCT
fumecheng-14015	170	1	although	although	SCONJ
fumecheng-14015	170	2	several	several	ADJ
fumecheng-14015	170	3	methods	method	NOUN
fumecheng-14015	170	4	have	have	AUX
fumecheng-14015	170	5	been	be	AUX
fumecheng-14015	170	6	proposed	propose	VERB
fumecheng-14015	170	7	to	to	PART
fumecheng-14015	170	8	remove	remove	VERB
fumecheng-14015	170	9	this	this	DET
fumecheng-14015	170	10	oxide	oxide	NOUN
fumecheng-14015	170	11	layer	layer	NOUN
fumecheng-14015	171	1	[	[	X
fumecheng-14015	171	2	72	72	NUM
fumecheng-14015	171	3	-	-	SYM
fumecheng-14015	171	4	75	75	NUM
fumecheng-14015	171	5	]	]	PUNCT
fumecheng-14015	171	6	,	,	PUNCT
fumecheng-14015	171	7	they	they	PRON
fumecheng-14015	171	8	are	be	AUX
fumecheng-14015	171	9	primarily	primarily	ADV
fumecheng-14015	171	10	limited	limit	VERB
fumecheng-14015	171	11	to	to	PART
fumecheng-14015	171	12	wafer	wafer	VERB
fumecheng-14015	171	13	-	-	PUNCT
fumecheng-14015	171	14	to	to	ADP
fumecheng-14015	171	15	-	-	PUNCT
fumecheng-14015	171	16	wafer	wafer	NOUN
fumecheng-14015	171	17	bonding	bonding	NOUN
fumecheng-14015	171	18	,	,	PUNCT
fumecheng-14015	171	19	highlighting	highlight	VERB
fumecheng-14015	171	20	the	the	DET
fumecheng-14015	171	21	need	need	NOUN
fumecheng-14015	171	22	for	for	ADP
fumecheng-14015	171	23	new	new	ADJ
fumecheng-14015	171	24	techniques	technique	NOUN
fumecheng-14015	171	25	.	.	PUNCT
fumecheng-14015	172	1	consequently	consequently	ADV
fumecheng-14015	172	2	,	,	PUNCT
fumecheng-14015	172	3	various	various	ADJ
fumecheng-14015	172	4	approaches	approach	NOUN
fumecheng-14015	172	5	have	have	AUX
fumecheng-14015	172	6	been	be	AUX
fumecheng-14015	172	7	explored	explore	VERB
fumecheng-14015	172	8	to	to	PART
fumecheng-14015	172	9	remove	remove	VERB
fumecheng-14015	172	10	the	the	DET
fumecheng-14015	172	11	oxide	oxide	NOUN
fumecheng-14015	172	12	layer	layer	NOUN
fumecheng-14015	172	13	before	before	ADP
fumecheng-14015	172	14	bonding	bonding	NOUN
fumecheng-14015	172	15	.	.	PUNCT
fumecheng-14015	173	1	exposure	exposure	NOUN
fumecheng-14015	173	2	of	of	ADP
fumecheng-14015	173	3	the	the	DET
fumecheng-14015	173	4	surface	surface	NOUN
fumecheng-14015	173	5	to	to	ADP
fumecheng-14015	173	6	various	various	ADJ
fumecheng-14015	173	7	contaminants	contaminant	NOUN
fumecheng-14015	173	8	,	,	PUNCT
fumecheng-14015	173	9	as	as	ADV
fumecheng-14015	173	10	well	well	ADV
fumecheng-14015	173	11	as	as	ADP
fumecheng-14015	173	12	the	the	DET
fumecheng-14015	173	13	oxide	oxide	NOUN
fumecheng-14015	173	14	film	film	NOUN
fumecheng-14015	173	15	,	,	PUNCT
fumecheng-14015	173	16	is	be	AUX
fumecheng-14015	173	17	not	not	PART
fumecheng-14015	173	18	good	good	ADJ
fumecheng-14015	173	19	for	for	ADP
fumecheng-14015	173	20	bonding	bond	VERB
fumecheng-14015	173	21	quality	quality	NOUN
fumecheng-14015	173	22	as	as	SCONJ
fumecheng-14015	173	23	it	it	PRON
fumecheng-14015	173	24	causes	cause	VERB
fumecheng-14015	173	25	voids	voids	NOUN
fumecheng-14015	173	26	.	.	PUNCT
fumecheng-14015	174	1	so	so	ADV
fumecheng-14015	174	2	chemical	chemical	ADJ
fumecheng-14015	174	3	pretreatment	pretreatment	NOUN
fumecheng-14015	174	4	of	of	ADP
fumecheng-14015	174	5	cu	cu	PROPN
fumecheng-14015	174	6	surfaces	surface	NOUN
fumecheng-14015	174	7	is	be	AUX
fumecheng-14015	174	8	employed	employ	VERB
fumecheng-14015	174	9	prior	prior	ADV
fumecheng-14015	174	10	to	to	ADP
fumecheng-14015	174	11	bonding	bonding	NOUN
fumecheng-14015	174	12	or	or	CCONJ
fumecheng-14015	174	13	film	film	NOUN
fumecheng-14015	174	14	growth	growth	NOUN
fumecheng-14015	174	15	to	to	PART
fumecheng-14015	174	16	remove	remove	VERB
fumecheng-14015	174	17	native	native	ADJ
fumecheng-14015	174	18	oxides	oxide	NOUN
fumecheng-14015	174	19	and	and	CCONJ
fumecheng-14015	174	20	organic	organic	ADJ
fumecheng-14015	174	21	contaminants	contaminant	NOUN
fumecheng-14015	174	22	and	and	CCONJ
fumecheng-14015	174	23	to	to	PART
fumecheng-14015	174	24	smooth	smooth	VERB
fumecheng-14015	174	25	calendering	calender	VERB
fumecheng-14015	174	26	induced	induced	ADJ
fumecheng-14015	174	27	roughness	roughness	NOUN
fumecheng-14015	174	28	.	.	PUNCT
fumecheng-14015	175	1	for	for	ADP
fumecheng-14015	175	2	example	example	NOUN
fumecheng-14015	175	3	,	,	PUNCT
fumecheng-14015	175	4	agents	agent	NOUN
fumecheng-14015	175	5	such	such	ADJ
fumecheng-14015	175	6	as	as	ADP
fumecheng-14015	175	7	ammonium	ammonium	NOUN
fumecheng-14015	175	8	persulfate	persulfate	NOUN
fumecheng-14015	175	9	or	or	CCONJ
fumecheng-14015	175	10	acetic	acetic	ADJ
fumecheng-14015	175	11	acid	acid	NOUN
fumecheng-14015	175	12	improve	improve	VERB
fumecheng-14015	175	13	surface	surface	NOUN
fumecheng-14015	175	14	cleanliness	cleanliness	NOUN
fumecheng-14015	175	15	and	and	CCONJ
fumecheng-14015	175	16	planarity	planarity	NOUN
fumecheng-14015	175	17	,	,	PUNCT
fumecheng-14015	175	18	thereby	thereby	ADV
fumecheng-14015	175	19	promoting	promote	VERB
fumecheng-14015	175	20	uniform	uniform	ADJ
fumecheng-14015	175	21	nucleation	nucleation	NOUN
fumecheng-14015	175	22	,	,	PUNCT
fumecheng-14015	175	23	enlarging	enlarge	VERB
fumecheng-14015	175	24	effective	effective	ADJ
fumecheng-14015	175	25	contact	contact	NOUN
fumecheng-14015	175	26	area	area	NOUN
fumecheng-14015	175	27	,	,	PUNCT
fumecheng-14015	175	28	and	and	CCONJ
fumecheng-14015	175	29	reducing	reduce	VERB
fumecheng-14015	175	30	interfacial	interfacial	ADJ
fumecheng-14015	175	31	resistance	resistance	NOUN
fumecheng-14015	175	32	and	and	CCONJ
fumecheng-14015	175	33	voiding	voiding	NOUN
fumecheng-14015	175	34	.	.	PUNCT
fumecheng-14015	176	1	process	process	NOUN
fumecheng-14015	176	2	conditions	condition	NOUN
fumecheng-14015	176	3	must	must	AUX
fumecheng-14015	176	4	avoid	avoid	VERB
fumecheng-14015	176	5	overetching	overetche	VERB
fumecheng-14015	176	6	that	that	PRON
fumecheng-14015	176	7	can	can	AUX
fumecheng-14015	176	8	introduce	introduce	VERB
fumecheng-14015	176	9	pits	pit	NOUN
fumecheng-14015	176	10	[	[	X
fumecheng-14015	176	11	76	76	NUM
fumecheng-14015	176	12	]	]	PUNCT
fumecheng-14015	176	13	.	.	PUNCT
fumecheng-14015	177	1	fig	fig	NOUN
fumecheng-14015	177	2	.	.	PUNCT
fumecheng-14015	178	1	4	4	NUM
fumecheng-14015	178	2	is	be	AUX
fumecheng-14015	178	3	a	a	DET
fumecheng-14015	178	4	scanning	scan	VERB
fumecheng-14015	178	5	electron	electron	NOUN
fumecheng-14015	178	6	microscopy	microscopy	NOUN
fumecheng-14015	178	7	(	(	PUNCT
fumecheng-14015	178	8	sem	sem	NOUN
fumecheng-14015	178	9	)	)	PUNCT
fumecheng-14015	178	10	image	image	NOUN
fumecheng-14015	178	11	showing	show	VERB
fumecheng-14015	178	12	the	the	DET
fumecheng-14015	178	13	differences	difference	NOUN
fumecheng-14015	178	14	before	before	ADP
fumecheng-14015	178	15	and	and	CCONJ
fumecheng-14015	178	16	after	after	ADP
fumecheng-14015	178	17	two	two	NUM
fumecheng-14015	178	18	chemical	chemical	ADJ
fumecheng-14015	178	19	pretreatments	pretreatment	NOUN
fumecheng-14015	178	20	(	(	PUNCT
fumecheng-14015	178	21	ap	ap	NOUN
fumecheng-14015	178	22	:	:	PUNCT
fumecheng-14015	178	23	ammonium	ammonium	NOUN
fumecheng-14015	178	24	persulfate	persulfate	NOUN
fumecheng-14015	178	25	,	,	PUNCT
fumecheng-14015	178	26	aa	aa	INTJ
fumecheng-14015	178	27	:	:	PUNCT
fumecheng-14015	178	28	acetic	acetic	ADJ
fumecheng-14015	178	29	acid	acid	NOUN
fumecheng-14015	178	30	)	)	PUNCT
fumecheng-14015	178	31	on	on	ADP
fumecheng-14015	178	32	a	a	DET
fumecheng-14015	178	33	single	single	ADJ
fumecheng-14015	178	34	slide	slide	NOUN
fumecheng-14015	178	35	.	.	PUNCT
fumecheng-14015	179	1	the	the	DET
fumecheng-14015	179	2	top	top	PROPN
fumecheng-14015	179	3	row	row	NOUN
fumecheng-14015	179	4	cu	cu	PROPN
fumecheng-14015	179	5	-	-	PUNCT
fumecheng-14015	179	6	cu	cu	PROPN
fumecheng-14015	179	7	mechanical	mechanical	ADJ
fumecheng-14015	179	8	bonding	bonding	NOUN
fumecheng-14015	179	9	for	for	ADP
fumecheng-14015	179	10	3d	3d	NOUN
fumecheng-14015	179	11	integration	integration	NOUN
fumecheng-14015	179	12	of	of	ADP
fumecheng-14015	179	13	the	the	DET
fumecheng-14015	179	14	next	next	ADJ
fumecheng-14015	179	15	generation	generation	NOUN
fumecheng-14015	179	16	electronic	electronic	ADJ
fumecheng-14015	179	17	chips	chip	NOUN
fumecheng-14015	179	18	...	...	PUNCT
fumecheng-14015	179	19	929	929	NUM
fumecheng-14015	179	20	(	(	PUNCT
fumecheng-14015	179	21	a	a	X
fumecheng-14015	179	22	–	–	PUNCT
fumecheng-14015	179	23	c	c	NOUN
fumecheng-14015	179	24	)	)	PUNCT
fumecheng-14015	179	25	shows	show	VERB
fumecheng-14015	179	26	the	the	DET
fumecheng-14015	179	27	surface	surface	NOUN
fumecheng-14015	179	28	of	of	ADP
fumecheng-14015	179	29	the	the	DET
fumecheng-14015	179	30	pretreated	pretreate	VERB
fumecheng-14015	179	31	cu	cu	PROPN
fumecheng-14015	179	32	foil	foil	NOUN
fumecheng-14015	179	33	itself	itself	PRON
fumecheng-14015	179	34	,	,	PUNCT
fumecheng-14015	179	35	while	while	SCONJ
fumecheng-14015	179	36	the	the	DET
fumecheng-14015	179	37	bottom	bottom	NOUN
fumecheng-14015	179	38	row	row	NOUN
fumecheng-14015	179	39	(	(	PUNCT
fumecheng-14015	179	40	d	d	NOUN
fumecheng-14015	179	41	–	–	PUNCT
fumecheng-14015	179	42	f	f	X
fumecheng-14015	179	43	)	)	PUNCT
fumecheng-14015	179	44	shows	show	VERB
fumecheng-14015	179	45	the	the	DET
fumecheng-14015	179	46	graphene	graphene	NOUN
fumecheng-14015	179	47	surface	surface	NOUN
fumecheng-14015	179	48	grown	grow	VERB
fumecheng-14015	179	49	on	on	ADP
fumecheng-14015	179	50	each	each	DET
fumecheng-14015	179	51	cu	cu	NOUN
fumecheng-14015	179	52	foil	foil	NOUN
fumecheng-14015	179	53	.	.	PUNCT
fumecheng-14015	180	1	as	as	SCONJ
fumecheng-14015	180	2	shown	show	VERB
fumecheng-14015	180	3	in	in	ADP
fumecheng-14015	180	4	fig	fig	NOUN
fumecheng-14015	180	5	.	.	PUNCT
fumecheng-14015	181	1	4	4	NUM
fumecheng-14015	181	2	(	(	PUNCT
fumecheng-14015	181	3	a	a	NOUN
fumecheng-14015	181	4	)	)	PUNCT
fumecheng-14015	181	5	,	,	PUNCT
fumecheng-14015	181	6	untreated	untreated	ADJ
fumecheng-14015	181	7	cu	cu	PROPN
fumecheng-14015	181	8	foil	foil	NOUN
fumecheng-14015	181	9	exhibits	exhibit	VERB
fumecheng-14015	181	10	distinct	distinct	ADJ
fumecheng-14015	181	11	stripe	stripe	NOUN
fumecheng-14015	181	12	patterns	pattern	NOUN
fumecheng-14015	181	13	and	and	CCONJ
fumecheng-14015	181	14	poor	poor	ADJ
fumecheng-14015	181	15	flatness	flatness	NOUN
fumecheng-14015	181	16	due	due	ADP
fumecheng-14015	181	17	to	to	ADP
fumecheng-14015	181	18	marks	mark	NOUN
fumecheng-14015	181	19	from	from	ADP
fumecheng-14015	181	20	the	the	DET
fumecheng-14015	181	21	commercial	commercial	ADJ
fumecheng-14015	181	22	calendering	calendering	NOUN
fumecheng-14015	181	23	process	process	NOUN
fumecheng-14015	181	24	.	.	PUNCT
fumecheng-14015	182	1	(	(	PUNCT
fumecheng-14015	182	2	b	b	X
fumecheng-14015	182	3	)	)	PUNCT
fumecheng-14015	182	4	pretreatment	pretreatment	NOUN
fumecheng-14015	182	5	with	with	ADP
fumecheng-14015	182	6	ap	ap	PROPN
fumecheng-14015	182	7	reduces	reduce	VERB
fumecheng-14015	182	8	the	the	DET
fumecheng-14015	182	9	stripe	stripe	NOUN
fumecheng-14015	182	10	patterns	pattern	NOUN
fumecheng-14015	182	11	,	,	PUNCT
fumecheng-14015	182	12	significantly	significantly	ADV
fumecheng-14015	182	13	improving	improve	VERB
fumecheng-14015	182	14	flatness	flatness	NOUN
fumecheng-14015	182	15	,	,	PUNCT
fumecheng-14015	182	16	but	but	CCONJ
fumecheng-14015	182	17	in	in	ADP
fumecheng-14015	182	18	areas	area	NOUN
fumecheng-14015	182	19	where	where	SCONJ
fumecheng-14015	182	20	the	the	DET
fumecheng-14015	182	21	oxide	oxide	NOUN
fumecheng-14015	182	22	layer	layer	NOUN
fumecheng-14015	182	23	is	be	AUX
fumecheng-14015	182	24	not	not	PART
fumecheng-14015	182	25	sufficiently	sufficiently	ADV
fumecheng-14015	182	26	dense	dense	ADJ
fumecheng-14015	182	27	,	,	PUNCT
fumecheng-14015	182	28	the	the	DET
fumecheng-14015	182	29	solution	solution	NOUN
fumecheng-14015	182	30	directly	directly	ADV
fumecheng-14015	182	31	etches	etch	VERB
fumecheng-14015	182	32	the	the	DET
fumecheng-14015	182	33	cu	cu	PROPN
fumecheng-14015	182	34	itself	itself	PRON
fumecheng-14015	182	35	,	,	PUNCT
fumecheng-14015	182	36	resulting	result	VERB
fumecheng-14015	182	37	in	in	ADP
fumecheng-14015	182	38	small	small	ADJ
fumecheng-14015	182	39	particles	particle	NOUN
fumecheng-14015	182	40	/	/	SYM
fumecheng-14015	182	41	protrusions	protrusion	NOUN
fumecheng-14015	182	42	on	on	ADP
fumecheng-14015	182	43	the	the	DET
fumecheng-14015	182	44	surface	surface	NOUN
fumecheng-14015	182	45	.	.	PUNCT
fumecheng-14015	183	1	(	(	PUNCT
fumecheng-14015	183	2	c	c	X
fumecheng-14015	183	3	)	)	PUNCT
fumecheng-14015	183	4	pretreatment	pretreatment	NOUN
fumecheng-14015	183	5	with	with	ADP
fumecheng-14015	183	6	aa	aa	PROPN
fumecheng-14015	183	7	results	result	NOUN
fumecheng-14015	183	8	in	in	ADP
fumecheng-14015	183	9	milder	milder	ADJ
fumecheng-14015	183	10	etching	etching	NOUN
fumecheng-14015	183	11	compared	compare	VERB
fumecheng-14015	183	12	to	to	ADP
fumecheng-14015	183	13	ap	ap	PROPN
fumecheng-14015	183	14	,	,	PUNCT
fumecheng-14015	183	15	avoiding	avoid	VERB
fumecheng-14015	183	16	direct	direct	ADJ
fumecheng-14015	183	17	etching	etching	NOUN
fumecheng-14015	183	18	of	of	ADP
fumecheng-14015	183	19	the	the	DET
fumecheng-14015	183	20	cu	cu	NOUN
fumecheng-14015	183	21	substrate	substrate	NOUN
fumecheng-14015	183	22	,	,	PUNCT
fumecheng-14015	183	23	thereby	thereby	ADV
fumecheng-14015	183	24	achieving	achieve	VERB
fumecheng-14015	183	25	better	well	ADJ
fumecheng-14015	183	26	flatness	flatness	NOUN
fumecheng-14015	183	27	without	without	ADP
fumecheng-14015	183	28	small	small	ADJ
fumecheng-14015	183	29	protrusions	protrusion	NOUN
fumecheng-14015	183	30	.	.	PUNCT
fumecheng-14015	184	1	in	in	ADP
fumecheng-14015	184	2	summary	summary	NOUN
fumecheng-14015	184	3	,	,	PUNCT
fumecheng-14015	184	4	surface	surface	NOUN
fumecheng-14015	184	5	flatness	flatness	NOUN
fumecheng-14015	184	6	follows	follow	VERB
fumecheng-14015	184	7	the	the	DET
fumecheng-14015	184	8	order	order	NOUN
fumecheng-14015	184	9	of	of	ADP
fumecheng-14015	184	10	aa	aa	PROPN
fumecheng-14015	184	11	treatment	treatment	PROPN
fumecheng-14015	184	12	>	>	X
fumecheng-14015	184	13	ap	ap	PROPN
fumecheng-14015	184	14	treatment	treatment	NOUN
fumecheng-14015	184	15	>	>	X
fumecheng-14015	184	16	untreated	untreated	ADJ
fumecheng-14015	184	17	.	.	PUNCT
fumecheng-14015	185	1	(	(	PUNCT
fumecheng-14015	185	2	d	d	X
fumecheng-14015	185	3	)	)	PUNCT
fumecheng-14015	185	4	graphene	graphene	NOUN
fumecheng-14015	185	5	grown	grow	VERB
fumecheng-14015	185	6	on	on	ADP
fumecheng-14015	185	7	untreated	untreated	ADJ
fumecheng-14015	185	8	cu	cu	PROPN
fumecheng-14015	185	9	shows	show	VERB
fumecheng-14015	185	10	numerous	numerous	ADJ
fumecheng-14015	185	11	white	white	ADJ
fumecheng-14015	185	12	spot	spot	NOUN
fumecheng-14015	185	13	like	like	ADP
fumecheng-14015	185	14	impurities	impurity	NOUN
fumecheng-14015	185	15	,	,	PUNCT
fumecheng-14015	185	16	which	which	PRON
fumecheng-14015	185	17	are	be	AUX
fumecheng-14015	185	18	interpreted	interpret	VERB
fumecheng-14015	185	19	as	as	ADP
fumecheng-14015	185	20	particles	particle	NOUN
fumecheng-14015	185	21	formed	form	VERB
fumecheng-14015	185	22	by	by	ADP
fumecheng-14015	185	23	the	the	DET
fumecheng-14015	185	24	melting	melting	NOUN
fumecheng-14015	185	25	and	and	CCONJ
fumecheng-14015	185	26	aggregation	aggregation	NOUN
fumecheng-14015	185	27	of	of	ADP
fumecheng-14015	185	28	cu	cu	PROPN
fumecheng-14015	185	29	surface	surface	NOUN
fumecheng-14015	185	30	oxides	oxide	NOUN
fumecheng-14015	185	31	during	during	ADP
fumecheng-14015	185	32	the	the	DET
fumecheng-14015	185	33	growth	growth	NOUN
fumecheng-14015	185	34	and	and	CCONJ
fumecheng-14015	185	35	cooling	cool	VERB
fumecheng-14015	185	36	process	process	NOUN
fumecheng-14015	185	37	.	.	PUNCT
fumecheng-14015	186	1	(	(	PUNCT
fumecheng-14015	186	2	e	e	NOUN
fumecheng-14015	186	3	)	)	PUNCT
fumecheng-14015	186	4	graphene	graphene	NOUN
fumecheng-14015	186	5	grown	grow	VERB
fumecheng-14015	186	6	on	on	ADP
fumecheng-14015	186	7	ap	ap	PROPN
fumecheng-14015	186	8	pretreated	pretreate	VERB
fumecheng-14015	186	9	cu	cu	PROPN
fumecheng-14015	186	10	shows	show	VERB
fumecheng-14015	186	11	a	a	DET
fumecheng-14015	186	12	reduction	reduction	NOUN
fumecheng-14015	186	13	in	in	ADP
fumecheng-14015	186	14	the	the	DET
fumecheng-14015	186	15	number	number	NOUN
fumecheng-14015	186	16	of	of	ADP
fumecheng-14015	186	17	white	white	ADJ
fumecheng-14015	186	18	particles	particle	NOUN
fumecheng-14015	186	19	,	,	PUNCT
fumecheng-14015	186	20	confirming	confirm	VERB
fumecheng-14015	186	21	the	the	DET
fumecheng-14015	186	22	oxide	oxide	NOUN
fumecheng-14015	186	23	removal	removal	NOUN
fumecheng-14015	186	24	effect	effect	NOUN
fumecheng-14015	186	25	,	,	PUNCT
fumecheng-14015	186	26	but	but	CCONJ
fumecheng-14015	186	27	they	they	PRON
fumecheng-14015	186	28	are	be	AUX
fumecheng-14015	186	29	still	still	ADV
fumecheng-14015	186	30	scattered	scatter	VERB
fumecheng-14015	186	31	.	.	PUNCT
fumecheng-14015	187	1	(	(	PUNCT
fumecheng-14015	187	2	f	f	X
fumecheng-14015	187	3	)	)	PUNCT
fumecheng-14015	187	4	graphene	graphene	NOUN
fumecheng-14015	187	5	grown	grow	VERB
fumecheng-14015	187	6	on	on	ADP
fumecheng-14015	187	7	aa	aa	PROPN
fumecheng-14015	187	8	pretreated	pretreate	VERB
fumecheng-14015	187	9	cu	cu	PROPN
fumecheng-14015	187	10	has	have	VERB
fumecheng-14015	187	11	a	a	DET
fumecheng-14015	187	12	very	very	ADV
fumecheng-14015	187	13	smooth	smooth	ADJ
fumecheng-14015	187	14	surface	surface	NOUN
fumecheng-14015	187	15	with	with	ADP
fumecheng-14015	187	16	extremely	extremely	ADV
fumecheng-14015	187	17	few	few	ADJ
fumecheng-14015	187	18	impurities	impurity	NOUN
fumecheng-14015	187	19	,	,	PUNCT
fumecheng-14015	187	20	making	make	VERB
fumecheng-14015	187	21	it	it	PRON
fumecheng-14015	187	22	the	the	DET
fumecheng-14015	187	23	cleanest	clean	ADJ
fumecheng-14015	187	24	of	of	ADP
fumecheng-14015	187	25	the	the	DET
fumecheng-14015	187	26	three	three	NUM
fumecheng-14015	187	27	in	in	ADP
fumecheng-14015	187	28	terms	term	NOUN
fumecheng-14015	187	29	of	of	ADP
fumecheng-14015	187	30	surface	surface	NOUN
fumecheng-14015	187	31	cleanliness	cleanliness	NOUN
fumecheng-14015	187	32	.	.	PUNCT
fumecheng-14015	188	1	in	in	ADP
fumecheng-14015	188	2	summary	summary	NOUN
fumecheng-14015	188	3	,	,	PUNCT
fumecheng-14015	188	4	fig	fig	NOUN
fumecheng-14015	188	5	.	.	PUNCT
fumecheng-14015	189	1	4	4	NUM
fumecheng-14015	190	1	illustrates	illustrate	VERB
fumecheng-14015	190	2	the	the	DET
fumecheng-14015	190	3	effect	effect	NOUN
fumecheng-14015	190	4	of	of	ADP
fumecheng-14015	190	5	pretreatment	pretreatment	NOUN
fumecheng-14015	190	6	agents	agent	NOUN
fumecheng-14015	190	7	on	on	ADP
fumecheng-14015	190	8	cu	cu	PROPN
fumecheng-14015	190	9	surface	surface	NOUN
fumecheng-14015	190	10	flatness	flatness	NOUN
fumecheng-14015	190	11	and	and	CCONJ
fumecheng-14015	190	12	oxide	oxide	NOUN
fumecheng-14015	190	13	removal	removal	NOUN
fumecheng-14015	190	14	,	,	PUNCT
fumecheng-14015	190	15	and	and	CCONJ
fumecheng-14015	190	16	how	how	SCONJ
fumecheng-14015	190	17	these	these	DET
fumecheng-14015	190	18	results	result	NOUN
fumecheng-14015	190	19	directly	directly	ADV
fumecheng-14015	190	20	impact	impact	VERB
fumecheng-14015	190	21	graphene	graphene	NOUN
fumecheng-14015	190	22	surface	surface	NOUN
fumecheng-14015	190	23	cleanliness	cleanliness	NOUN
fumecheng-14015	190	24	,	,	PUNCT
fumecheng-14015	190	25	as	as	SCONJ
fumecheng-14015	190	26	shown	show	VERB
fumecheng-14015	190	27	intuitively	intuitively	ADV
fumecheng-14015	190	28	by	by	ADP
fumecheng-14015	190	29	sem	sem	PROPN
fumecheng-14015	190	30	.	.	PUNCT
fumecheng-14015	191	1	aa	aa	PROPN
fumecheng-14015	191	2	produces	produce	VERB
fumecheng-14015	191	3	the	the	DET
fumecheng-14015	191	4	most	most	ADV
fumecheng-14015	191	5	uniform	uniform	ADJ
fumecheng-14015	191	6	and	and	CCONJ
fumecheng-14015	191	7	clean	clean	PROPN
fumecheng-14015	191	8	cu	cu	PROPN
fumecheng-14015	191	9	/	/	SYM
fumecheng-14015	191	10	graphene	graphene	NOUN
fumecheng-14015	191	11	surface	surface	NOUN
fumecheng-14015	191	12	,	,	PUNCT
fumecheng-14015	191	13	while	while	SCONJ
fumecheng-14015	191	14	ap	ap	PROPN
fumecheng-14015	191	15	is	be	AUX
fumecheng-14015	191	16	effective	effective	ADJ
fumecheng-14015	191	17	but	but	CCONJ
fumecheng-14015	191	18	leaves	leave	VERB
fumecheng-14015	191	19	some	some	DET
fumecheng-14015	191	20	overetching	overetching	ADJ
fumecheng-14015	191	21	and	and	CCONJ
fumecheng-14015	191	22	residual	residual	ADJ
fumecheng-14015	191	23	particles	particle	NOUN
fumecheng-14015	191	24	.	.	PUNCT
fumecheng-14015	192	1	through	through	ADP
fumecheng-14015	192	2	this	this	DET
fumecheng-14015	192	3	study	study	NOUN
fumecheng-14015	192	4	,	,	PUNCT
fumecheng-14015	192	5	we	we	PRON
fumecheng-14015	192	6	can	can	AUX
fumecheng-14015	192	7	understand	understand	VERB
fumecheng-14015	192	8	why	why	SCONJ
fumecheng-14015	192	9	chemical	chemical	NOUN
fumecheng-14015	192	10	pretreatment	pretreatment	NOUN
fumecheng-14015	192	11	is	be	AUX
fumecheng-14015	192	12	applied	apply	VERB
fumecheng-14015	192	13	to	to	ADP
fumecheng-14015	192	14	metal	metal	NOUN
fumecheng-14015	192	15	surfaces	surface	NOUN
fumecheng-14015	192	16	.	.	PUNCT
fumecheng-14015	193	1	fig	fig	NOUN
fumecheng-14015	193	2	.	.	PUNCT
fumecheng-14015	194	1	4	4	NUM
fumecheng-14015	194	2	sem	sem	NOUN
fumecheng-14015	194	3	of	of	ADP
fumecheng-14015	194	4	(	(	PUNCT
fumecheng-14015	194	5	a	a	DET
fumecheng-14015	194	6	)	)	PUNCT
fumecheng-14015	194	7	pristine	pristine	ADJ
fumecheng-14015	194	8	copper	copper	NOUN
fumecheng-14015	194	9	foil	foil	NOUN
fumecheng-14015	194	10	without	without	ADP
fumecheng-14015	194	11	pre	pre	NOUN
fumecheng-14015	194	12	-	-	NOUN
fumecheng-14015	194	13	treatment	treatment	NOUN
fumecheng-14015	194	14	;	;	PUNCT
fumecheng-14015	194	15	(	(	PUNCT
fumecheng-14015	194	16	b	b	X
fumecheng-14015	194	17	)	)	PUNCT
fumecheng-14015	194	18	copper	copper	NOUN
fumecheng-14015	194	19	foil	foil	NOUN
fumecheng-14015	194	20	treated	treat	VERB
fumecheng-14015	194	21	with	with	ADP
fumecheng-14015	194	22	ap	ap	PROPN
fumecheng-14015	194	23	solution	solution	NOUN
fumecheng-14015	194	24	;	;	PUNCT
fumecheng-14015	194	25	(	(	PUNCT
fumecheng-14015	194	26	c	c	X
fumecheng-14015	194	27	)	)	PUNCT
fumecheng-14015	194	28	copper	copper	NOUN
fumecheng-14015	194	29	foil	foil	NOUN
fumecheng-14015	194	30	treated	treat	VERB
fumecheng-14015	194	31	with	with	ADP
fumecheng-14015	194	32	aa	aa	NOUN
fumecheng-14015	194	33	solution	solution	NOUN
fumecheng-14015	194	34	;	;	PUNCT
fumecheng-14015	194	35	(	(	PUNCT
fumecheng-14015	194	36	d	d	X
fumecheng-14015	194	37	)	)	PUNCT
fumecheng-14015	194	38	graphene	graphene	NOUN
fumecheng-14015	194	39	grown	grow	VERB
fumecheng-14015	194	40	on	on	ADP
fumecheng-14015	194	41	pristine	pristine	ADJ
fumecheng-14015	194	42	copper	copper	NOUN
fumecheng-14015	194	43	foil	foil	NOUN
fumecheng-14015	194	44	without	without	ADP
fumecheng-14015	194	45	pre	pre	NOUN
fumecheng-14015	194	46	-	-	NOUN
fumecheng-14015	194	47	treatment	treatment	NOUN
fumecheng-14015	194	48	;	;	PUNCT
fumecheng-14015	194	49	(	(	PUNCT
fumecheng-14015	194	50	e	e	NOUN
fumecheng-14015	194	51	)	)	PUNCT
fumecheng-14015	194	52	graphene	graphene	NOUN
fumecheng-14015	194	53	grown	grow	VERB
fumecheng-14015	194	54	on	on	ADP
fumecheng-14015	194	55	copper	copper	NOUN
fumecheng-14015	194	56	foil	foil	NOUN
fumecheng-14015	194	57	treated	treat	VERB
fumecheng-14015	194	58	with	with	ADP
fumecheng-14015	194	59	ap	ap	PROPN
fumecheng-14015	194	60	solution	solution	NOUN
fumecheng-14015	194	61	;	;	PUNCT
fumecheng-14015	194	62	(	(	PUNCT
fumecheng-14015	194	63	f	f	X
fumecheng-14015	194	64	)	)	PUNCT
fumecheng-14015	194	65	graphene	graphene	NOUN
fumecheng-14015	194	66	grown	grow	VERB
fumecheng-14015	194	67	on	on	ADP
fumecheng-14015	194	68	copper	copper	NOUN
fumecheng-14015	194	69	foil	foil	NOUN
fumecheng-14015	194	70	treated	treat	VERB
fumecheng-14015	194	71	with	with	ADP
fumecheng-14015	194	72	aa	aa	NOUN
fumecheng-14015	194	73	solution	solution	NOUN
fumecheng-14015	194	74	[	[	X
fumecheng-14015	194	75	76	76	NUM
fumecheng-14015	194	76	]	]	X
fumecheng-14015	194	77	jangam	jangam	PROPN
fumecheng-14015	194	78	et	et	PROPN
fumecheng-14015	194	79	al	al	PROPN
fumecheng-14015	194	80	.	.	PUNCT
fumecheng-14015	195	1	[	[	X
fumecheng-14015	195	2	77	77	NUM
fumecheng-14015	195	3	]	]	PUNCT
fumecheng-14015	195	4	introduced	introduce	VERB
fumecheng-14015	195	5	a	a	DET
fumecheng-14015	195	6	method	method	NOUN
fumecheng-14015	195	7	that	that	PRON
fumecheng-14015	195	8	used	use	VERB
fumecheng-14015	195	9	formic	formic	NOUN
fumecheng-14015	195	10	acid	acid	NOUN
fumecheng-14015	195	11	to	to	PART
fumecheng-14015	195	12	eliminate	eliminate	VERB
fumecheng-14015	195	13	the	the	DET
fumecheng-14015	195	14	oxide	oxide	NOUN
fumecheng-14015	195	15	layer	layer	NOUN
fumecheng-14015	195	16	.	.	PUNCT
fumecheng-14015	196	1	fig	fig	NOUN
fumecheng-14015	196	2	.	.	PUNCT
fumecheng-14015	197	1	5	5	NUM
fumecheng-14015	197	2	depicts	depict	VERB
fumecheng-14015	197	3	an	an	DET
fumecheng-14015	197	4	integrated	integrate	VERB
fumecheng-14015	197	5	apparatus	apparatus	NOUN
fumecheng-14015	197	6	that	that	PRON
fumecheng-14015	197	7	both	both	PRON
fumecheng-14015	197	8	generates	generate	VERB
fumecheng-14015	197	9	formic	formic	ADJ
fumecheng-14015	197	10	acid	acid	NOUN
fumecheng-14015	197	11	(	(	PUNCT
fumecheng-14015	197	12	hcooh	hcooh	ADJ
fumecheng-14015	197	13	)	)	PUNCT
fumecheng-14015	197	14	vapor	vapor	NOUN
fumecheng-14015	197	15	and	and	CCONJ
fumecheng-14015	197	16	provides	provide	VERB
fumecheng-14015	197	17	a	a	DET
fumecheng-14015	197	18	treatment	treatment	NOUN
fumecheng-14015	197	19	/	/	SYM
fumecheng-14015	197	20	bonding	bonding	NOUN
fumecheng-14015	197	21	chamber	chamber	NOUN
fumecheng-14015	197	22	for	for	ADP
fumecheng-14015	197	23	cu	cu	PROPN
fumecheng-14015	197	24	films	film	NOUN
fumecheng-14015	197	25	.	.	PUNCT
fumecheng-14015	198	1	in	in	ADP
fumecheng-14015	198	2	this	this	DET
fumecheng-14015	198	3	setup	setup	NOUN
fumecheng-14015	198	4	,	,	PUNCT
fumecheng-14015	198	5	nitrogen	nitrogen	NOUN
fumecheng-14015	198	6	is	be	AUX
fumecheng-14015	198	7	930	930	NUM
fumecheng-14015	198	8	s.	s.	PROPN
fumecheng-14015	198	9	choi	choi	PROPN
fumecheng-14015	198	10	,	,	PUNCT
fumecheng-14015	198	11	c.	c.	PROPN
fumecheng-14015	198	12	chen	chen	PROPN
fumecheng-14015	198	13	,	,	PUNCT
fumecheng-14015	198	14	b.	b.	PROPN
fumecheng-14015	198	15	hwang	hwang	PROPN
fumecheng-14015	198	16	passed	pass	VERB
fumecheng-14015	198	17	through	through	ADP
fumecheng-14015	198	18	a	a	DET
fumecheng-14015	198	19	reservoir	reservoir	NOUN
fumecheng-14015	198	20	of	of	ADP
fumecheng-14015	198	21	concentrated	concentrated	ADJ
fumecheng-14015	198	22	formic	formic	ADJ
fumecheng-14015	198	23	acid	acid	NOUN
fumecheng-14015	198	24	(	(	PUNCT
fumecheng-14015	198	25	98	98	NUM
fumecheng-14015	198	26	%	%	NOUN
fumecheng-14015	198	27	hcooh	hcooh	ADJ
fumecheng-14015	198	28	)	)	PUNCT
fumecheng-14015	198	29	to	to	PART
fumecheng-14015	198	30	create	create	VERB
fumecheng-14015	198	31	a	a	DET
fumecheng-14015	198	32	dilute	dilute	NOUN
fumecheng-14015	198	33	vapor	vapor	NOUN
fumecheng-14015	198	34	stream	stream	NOUN
fumecheng-14015	198	35	,	,	PUNCT
fumecheng-14015	198	36	approximately	approximately	ADV
fumecheng-14015	198	37	1	1	NUM
fumecheng-14015	198	38	%	%	NOUN
fumecheng-14015	198	39	hcooh	hcooh	ADJ
fumecheng-14015	198	40	in	in	ADP
fumecheng-14015	198	41	99	99	NUM
fumecheng-14015	198	42	%	%	NOUN
fumecheng-14015	198	43	n₂	n₂	NOUN
fumecheng-14015	198	44	,	,	PUNCT
fumecheng-14015	198	45	which	which	PRON
fumecheng-14015	198	46	is	be	AUX
fumecheng-14015	198	47	delivered	deliver	VERB
fumecheng-14015	198	48	to	to	ADP
fumecheng-14015	198	49	the	the	DET
fumecheng-14015	198	50	chamber	chamber	NOUN
fumecheng-14015	198	51	designed	design	VERB
fumecheng-14015	198	52	for	for	ADP
fumecheng-14015	198	53	surface	surface	NOUN
fumecheng-14015	198	54	treatment	treatment	NOUN
fumecheng-14015	198	55	and	and	CCONJ
fumecheng-14015	198	56	subsequent	subsequent	ADJ
fumecheng-14015	198	57	bonding	bonding	NOUN
fumecheng-14015	198	58	.	.	PUNCT
fumecheng-14015	199	1	the	the	DET
fumecheng-14015	199	2	cu	cu	PROPN
fumecheng-14015	199	3	sample	sample	NOUN
fumecheng-14015	199	4	is	be	AUX
fumecheng-14015	199	5	mounted	mount	VERB
fumecheng-14015	199	6	on	on	ADP
fumecheng-14015	199	7	a	a	DET
fumecheng-14015	199	8	heated	heated	ADJ
fumecheng-14015	199	9	stage	stage	NOUN
fumecheng-14015	199	10	;	;	PUNCT
fumecheng-14015	199	11	prior	prior	ADV
fumecheng-14015	199	12	to	to	ADP
fumecheng-14015	199	13	dosing	dosing	NOUN
fumecheng-14015	199	14	,	,	PUNCT
fumecheng-14015	199	15	the	the	DET
fumecheng-14015	199	16	chamber	chamber	NOUN
fumecheng-14015	199	17	is	be	AUX
fumecheng-14015	199	18	evacuated	evacuate	VERB
fumecheng-14015	199	19	to	to	ADP
fumecheng-14015	199	20	~5	~5	ADJ
fumecheng-14015	199	21	pa	pa	PROPN
fumecheng-14015	199	22	and	and	CCONJ
fumecheng-14015	199	23	the	the	DET
fumecheng-14015	199	24	sample	sample	NOUN
fumecheng-14015	199	25	temperature	temperature	NOUN
fumecheng-14015	199	26	is	be	AUX
fumecheng-14015	199	27	raised	raise	VERB
fumecheng-14015	199	28	to	to	ADP
fumecheng-14015	199	29	200	200	NUM
fumecheng-14015	199	30	°	°	NOUN
fumecheng-14015	199	31	c	c	NOUN
fumecheng-14015	199	32	to	to	PART
fumecheng-14015	199	33	establish	establish	VERB
fumecheng-14015	199	34	a	a	DET
fumecheng-14015	199	35	low	low	ADJ
fumecheng-14015	199	36	oxygen	oxygen	NOUN
fumecheng-14015	199	37	environment	environment	NOUN
fumecheng-14015	199	38	and	and	CCONJ
fumecheng-14015	199	39	activate	activate	VERB
fumecheng-14015	199	40	surface	surface	NOUN
fumecheng-14015	199	41	chemistry	chemistry	NOUN
fumecheng-14015	200	1	[	[	X
fumecheng-14015	200	2	78	78	NUM
fumecheng-14015	200	3	]	]	PUNCT
fumecheng-14015	200	4	.	.	PUNCT
fumecheng-14015	201	1	once	once	ADV
fumecheng-14015	201	2	the	the	DET
fumecheng-14015	201	3	mixed	mixed	ADJ
fumecheng-14015	201	4	hcooh	hcooh	ADJ
fumecheng-14015	201	5	/	/	SYM
fumecheng-14015	201	6	n₂	n₂	NOUN
fumecheng-14015	201	7	stream	stream	NOUN
fumecheng-14015	201	8	enters	enter	VERB
fumecheng-14015	201	9	the	the	DET
fumecheng-14015	201	10	chamber	chamber	NOUN
fumecheng-14015	201	11	and	and	CCONJ
fumecheng-14015	201	12	impinges	impinge	VERB
fumecheng-14015	201	13	on	on	ADP
fumecheng-14015	201	14	the	the	DET
fumecheng-14015	201	15	heated	heated	ADJ
fumecheng-14015	201	16	cu	cu	PROPN
fumecheng-14015	201	17	surface	surface	NOUN
fumecheng-14015	201	18	,	,	PUNCT
fumecheng-14015	201	19	gas	gas	NOUN
fumecheng-14015	201	20	phase	phase	NOUN
fumecheng-14015	201	21	hcooh	hcooh	VERB
fumecheng-14015	201	22	adsorbs	adsorb	VERB
fumecheng-14015	201	23	and	and	CCONJ
fumecheng-14015	201	24	dissociates	dissociate	NOUN
fumecheng-14015	201	25	to	to	PART
fumecheng-14015	201	26	form	form	VERB
fumecheng-14015	201	27	surface	surface	NOUN
fumecheng-14015	201	28	formate	formate	NOUN
fumecheng-14015	201	29	and	and	CCONJ
fumecheng-14015	201	30	hydrogen	hydrogen	NOUN
fumecheng-14015	201	31	species	specie	NOUN
fumecheng-14015	201	32	;	;	PUNCT
fumecheng-14015	201	33	near	near	ADP
fumecheng-14015	201	34	200	200	NUM
fumecheng-14015	201	35	°	°	NOUN
fumecheng-14015	201	36	c	c	NOUN
fumecheng-14015	201	37	the	the	DET
fumecheng-14015	201	38	formate	formate	NOUN
fumecheng-14015	201	39	further	further	ADJ
fumecheng-14015	201	40	decomposes	decompose	NOUN
fumecheng-14015	201	41	to	to	PART
fumecheng-14015	201	42	release	release	VERB
fumecheng-14015	201	43	co₂	co₂	NOUN
fumecheng-14015	201	44	and	and	CCONJ
fumecheng-14015	201	45	atomic	atomic	ADJ
fumecheng-14015	201	46	hydrogen	hydrogen	NOUN
fumecheng-14015	201	47	.	.	PUNCT
fumecheng-14015	202	1	the	the	DET
fumecheng-14015	202	2	generated	generate	VERB
fumecheng-14015	202	3	hydrogen	hydrogen	NOUN
fumecheng-14015	202	4	reduces	reduce	VERB
fumecheng-14015	202	5	native	native	ADJ
fumecheng-14015	202	6	copper	copper	NOUN
fumecheng-14015	202	7	oxides	oxide	NOUN
fumecheng-14015	202	8	to	to	ADP
fumecheng-14015	202	9	metallic	metallic	PROPN
fumecheng-14015	202	10	cu	cu	PROPN
fumecheng-14015	202	11	with	with	ADP
fumecheng-14015	202	12	evolution	evolution	NOUN
fumecheng-14015	202	13	of	of	ADP
fumecheng-14015	202	14	co₂	co₂	NOUN
fumecheng-14015	202	15	and	and	CCONJ
fumecheng-14015	202	16	h₂o	h₂o	NOUN
fumecheng-14015	202	17	,	,	PUNCT
fumecheng-14015	202	18	thereby	thereby	ADV
fumecheng-14015	202	19	restoring	restore	VERB
fumecheng-14015	202	20	a	a	DET
fumecheng-14015	202	21	bondable	bondable	ADJ
fumecheng-14015	202	22	surface	surface	NOUN
fumecheng-14015	202	23	.	.	PUNCT
fumecheng-14015	203	1	the	the	DET
fumecheng-14015	203	2	volatile	volatile	ADJ
fumecheng-14015	203	3	byproducts	byproduct	NOUN
fumecheng-14015	203	4	are	be	AUX
fumecheng-14015	203	5	continuously	continuously	ADV
fumecheng-14015	203	6	removed	remove	VERB
fumecheng-14015	203	7	through	through	ADP
fumecheng-14015	203	8	the	the	DET
fumecheng-14015	203	9	exhaust	exhaust	NOUN
fumecheng-14015	203	10	,	,	PUNCT
fumecheng-14015	203	11	and	and	CCONJ
fumecheng-14015	203	12	—	—	PUNCT
fumecheng-14015	203	13	using	use	VERB
fumecheng-14015	203	14	the	the	DET
fumecheng-14015	203	15	same	same	ADJ
fumecheng-14015	203	16	apparatus	apparatus	NOUN
fumecheng-14015	203	17	shown	show	VERB
fumecheng-14015	203	18	in	in	ADP
fumecheng-14015	203	19	fig	fig	NOUN
fumecheng-14015	203	20	.	.	PUNCT
fumecheng-14015	204	1	5	5	NUM
fumecheng-14015	204	2	—	—	PUNCT
fumecheng-14015	204	3	the	the	DET
fumecheng-14015	204	4	treated	treat	VERB
fumecheng-14015	204	5	surfaces	surface	NOUN
fumecheng-14015	204	6	are	be	AUX
fumecheng-14015	204	7	subsequently	subsequently	ADV
fumecheng-14015	204	8	brought	bring	VERB
fumecheng-14015	204	9	into	into	ADP
fumecheng-14015	204	10	contact	contact	NOUN
fumecheng-14015	204	11	and	and	CCONJ
fumecheng-14015	204	12	bonded	bond	VERB
fumecheng-14015	204	13	at	at	ADP
fumecheng-14015	204	14	200	200	NUM
fumecheng-14015	204	15	°	°	NOUN
fumecheng-14015	204	16	c	c	NOUN
fumecheng-14015	204	17	under	under	ADP
fumecheng-14015	204	18	load	load	NOUN
fumecheng-14015	204	19	.	.	PUNCT
fumecheng-14015	205	1	this	this	DET
fumecheng-14015	205	2	technique	technique	NOUN
fumecheng-14015	205	3	allowed	allow	VERB
fumecheng-14015	205	4	for	for	ADP
fumecheng-14015	205	5	localized	localized	ADJ
fumecheng-14015	205	6	cleaning	cleaning	NOUN
fumecheng-14015	205	7	,	,	PUNCT
fumecheng-14015	205	8	completing	complete	VERB
fumecheng-14015	205	9	the	the	DET
fumecheng-14015	205	10	process	process	NOUN
fumecheng-14015	205	11	in	in	ADP
fumecheng-14015	205	12	less	less	ADJ
fumecheng-14015	205	13	than	than	ADP
fumecheng-14015	205	14	10	10	NUM
fumecheng-14015	205	15	s	s	NOUN
fumecheng-14015	205	16	,	,	PUNCT
fumecheng-14015	205	17	thereby	thereby	ADV
fumecheng-14015	205	18	enhancing	enhance	VERB
fumecheng-14015	205	19	the	the	DET
fumecheng-14015	205	20	overall	overall	ADJ
fumecheng-14015	205	21	efficiency	efficiency	NOUN
fumecheng-14015	205	22	.	.	PUNCT
fumecheng-14015	206	1	these	these	DET
fumecheng-14015	206	2	reactions	reaction	NOUN
fumecheng-14015	206	3	occurred	occur	VERB
fumecheng-14015	206	4	between	between	ADP
fumecheng-14015	206	5	100	100	NUM
fumecheng-14015	206	6	and	and	CCONJ
fumecheng-14015	206	7	150	150	NUM
fumecheng-14015	206	8	°	°	NOUN
fumecheng-14015	206	9	c	c	NOUN
fumecheng-14015	206	10	,	,	PUNCT
fumecheng-14015	206	11	when	when	SCONJ
fumecheng-14015	206	12	formic	formic	PROPN
fumecheng-14015	206	13	acid	acid	PROPN
fumecheng-14015	206	14	reacted	react	VERB
fumecheng-14015	206	15	with	with	ADP
fumecheng-14015	206	16	the	the	DET
fumecheng-14015	206	17	cuo	cuo	PROPN
fumecheng-14015	206	18	layer	layer	NOUN
fumecheng-14015	206	19	to	to	PART
fumecheng-14015	206	20	produce	produce	VERB
fumecheng-14015	206	21	copper	copper	NOUN
fumecheng-14015	206	22	formate	formate	NOUN
fumecheng-14015	206	23	and	and	CCONJ
fumecheng-14015	206	24	vapor	vapor	NOUN
fumecheng-14015	206	25	.	.	PUNCT
fumecheng-14015	207	1	above	above	ADP
fumecheng-14015	207	2	200	200	NUM
fumecheng-14015	207	3	°	°	NOUN
fumecheng-14015	207	4	c	c	NOUN
fumecheng-14015	207	5	,	,	PUNCT
fumecheng-14015	207	6	copper	copper	NOUN
fumecheng-14015	207	7	formate	formate	NOUN
fumecheng-14015	207	8	decomposed	decompose	VERB
fumecheng-14015	207	9	into	into	ADP
fumecheng-14015	207	10	co₂	co₂	NOUN
fumecheng-14015	207	11	and	and	CCONJ
fumecheng-14015	207	12	h₂	h₂	PROPN
fumecheng-14015	207	13	gas	gas	NOUN
fumecheng-14015	207	14	,	,	PUNCT
fumecheng-14015	207	15	leaving	leave	VERB
fumecheng-14015	207	16	behind	behind	ADP
fumecheng-14015	207	17	pure	pure	ADJ
fumecheng-14015	207	18	cu	cu	PROPN
fumecheng-14015	207	19	metal	metal	NOUN
fumecheng-14015	207	20	.	.	PUNCT
fumecheng-14015	208	1	after	after	SCONJ
fumecheng-14015	208	2	the	the	DET
fumecheng-14015	208	3	oxide	oxide	NOUN
fumecheng-14015	208	4	was	be	AUX
fumecheng-14015	208	5	removed	remove	VERB
fumecheng-14015	208	6	,	,	PUNCT
fumecheng-14015	208	7	cu	cu	PROPN
fumecheng-14015	208	8	-	-	PUNCT
fumecheng-14015	208	9	cu	cu	PROPN
fumecheng-14015	208	10	bonding	bonding	NOUN
fumecheng-14015	208	11	was	be	AUX
fumecheng-14015	208	12	performed	perform	VERB
fumecheng-14015	208	13	at	at	ADP
fumecheng-14015	208	14	240	240	NUM
fumecheng-14015	208	15	°	°	ADP
fumecheng-14015	208	16	c	c	NOUN
fumecheng-14015	208	17	for	for	ADP
fumecheng-14015	208	18	5	5	NUM
fumecheng-14015	208	19	s	s	NOUN
fumecheng-14015	208	20	,	,	PUNCT
fumecheng-14015	208	21	resulting	result	VERB
fumecheng-14015	208	22	in	in	ADP
fumecheng-14015	208	23	excellent	excellent	ADJ
fumecheng-14015	208	24	bonding	bonding	NOUN
fumecheng-14015	208	25	with	with	ADP
fumecheng-14015	208	26	an	an	DET
fumecheng-14015	208	27	average	average	ADJ
fumecheng-14015	208	28	shear	shear	NOUN
fumecheng-14015	208	29	strength	strength	NOUN
fumecheng-14015	208	30	of	of	ADP
fumecheng-14015	208	31	over	over	ADP
fumecheng-14015	208	32	150	150	NUM
fumecheng-14015	208	33	mpa	mpa	NOUN
fumecheng-14015	208	34	[	[	X
fumecheng-14015	208	35	78	78	NUM
fumecheng-14015	208	36	]	]	PUNCT
fumecheng-14015	208	37	.	.	PUNCT
fumecheng-14015	209	1	fig	fig	NOUN
fumecheng-14015	209	2	.	.	PUNCT
fumecheng-14015	210	1	5	5	NUM
fumecheng-14015	210	2	schematic	schematic	ADJ
fumecheng-14015	210	3	of	of	ADP
fumecheng-14015	210	4	formic	formic	ADJ
fumecheng-14015	210	5	acid	acid	PROPN
fumecheng-14015	210	6	vapor	vapor	NOUN
fumecheng-14015	210	7	generation	generation	NOUN
fumecheng-14015	210	8	and	and	CCONJ
fumecheng-14015	210	9	cu	cu	PROPN
fumecheng-14015	210	10	sample	sample	NOUN
fumecheng-14015	210	11	treatment	treatment	NOUN
fumecheng-14015	210	12	/	/	SYM
fumecheng-14015	210	13	bonding	bonding	NOUN
fumecheng-14015	210	14	machine	machine	NOUN
fumecheng-14015	210	15	.	.	PUNCT
fumecheng-14015	211	1	reproduced	reproduce	VERB
fumecheng-14015	211	2	from	from	ADP
fumecheng-14015	211	3	[	[	X
fumecheng-14015	211	4	78	78	NUM
fumecheng-14015	211	5	]	]	PUNCT
fumecheng-14015	211	6	in	in	ADP
fumecheng-14015	211	7	addition	addition	NOUN
fumecheng-14015	211	8	to	to	ADP
fumecheng-14015	211	9	formic	formic	ADJ
fumecheng-14015	211	10	acid	acid	NOUN
fumecheng-14015	211	11	,	,	PUNCT
fumecheng-14015	211	12	other	other	ADJ
fumecheng-14015	211	13	acids	acid	NOUN
fumecheng-14015	211	14	such	such	ADJ
fumecheng-14015	211	15	as	as	ADP
fumecheng-14015	211	16	sulfuric	sulfuric	NOUN
fumecheng-14015	211	17	[	[	X
fumecheng-14015	211	18	79	79	NUM
fumecheng-14015	211	19	]	]	PUNCT
fumecheng-14015	211	20	,	,	PUNCT
fumecheng-14015	211	21	acetic	acetic	ADJ
fumecheng-14015	211	22	[	[	X
fumecheng-14015	211	23	80	80	NUM
fumecheng-14015	211	24	]	]	PUNCT
fumecheng-14015	211	25	,	,	PUNCT
fumecheng-14015	211	26	citric	citric	NOUN
fumecheng-14015	211	27	[	[	X
fumecheng-14015	211	28	81	81	NUM
fumecheng-14015	211	29	]	]	PUNCT
fumecheng-14015	211	30	,	,	PUNCT
fumecheng-14015	211	31	hydrochloric	hydrochloric	X
fumecheng-14015	211	32	[	[	X
fumecheng-14015	211	33	74	74	NUM
fumecheng-14015	211	34	,	,	PUNCT
fumecheng-14015	211	35	75	75	NUM
fumecheng-14015	211	36	]	]	PUNCT
fumecheng-14015	211	37	,	,	PUNCT
fumecheng-14015	211	38	and	and	CCONJ
fumecheng-14015	211	39	fluorine	fluorine	NOUN
fumecheng-14015	211	40	-	-	PUNCT
fumecheng-14015	211	41	containing	contain	VERB
fumecheng-14015	211	42	plasma	plasma	NOUN
fumecheng-14015	211	43	[	[	X
fumecheng-14015	211	44	65	65	NUM
fumecheng-14015	211	45	,	,	PUNCT
fumecheng-14015	211	46	82	82	NUM
fumecheng-14015	211	47	]	]	PUNCT
fumecheng-14015	211	48	have	have	AUX
fumecheng-14015	211	49	been	be	AUX
fumecheng-14015	211	50	used	use	VERB
fumecheng-14015	211	51	to	to	PART
fumecheng-14015	211	52	remove	remove	VERB
fumecheng-14015	211	53	oxide	oxide	NOUN
fumecheng-14015	211	54	layers	layer	NOUN
fumecheng-14015	211	55	.	.	PUNCT
fumecheng-14015	212	1	however	however	ADV
fumecheng-14015	212	2	,	,	PUNCT
fumecheng-14015	212	3	the	the	DET
fumecheng-14015	212	4	use	use	NOUN
fumecheng-14015	212	5	of	of	ADP
fumecheng-14015	212	6	acidic	acidic	ADJ
fumecheng-14015	212	7	solutions	solution	NOUN
fumecheng-14015	212	8	is	be	AUX
fumecheng-14015	212	9	not	not	PART
fumecheng-14015	212	10	always	always	ADV
fumecheng-14015	212	11	suitable	suitable	ADJ
fumecheng-14015	212	12	for	for	ADP
fumecheng-14015	212	13	complementary	complementary	ADJ
fumecheng-14015	212	14	metal	metal	NOUN
fumecheng-14015	212	15	oxide	oxide	NOUN
fumecheng-14015	212	16	semiconductor	semiconductor	NOUN
fumecheng-14015	212	17	(	(	PUNCT
fumecheng-14015	212	18	cmos	cmos	NOUN
fumecheng-14015	212	19	)	)	PUNCT
fumecheng-14015	212	20	devices	device	NOUN
fumecheng-14015	212	21	.	.	PUNCT
fumecheng-14015	213	1	in	in	ADP
fumecheng-14015	213	2	the	the	DET
fumecheng-14015	213	3	cmos	cmos	PROPN
fumecheng-14015	213	4	industry	industry	NOUN
fumecheng-14015	213	5	,	,	PUNCT
fumecheng-14015	213	6	acidic	acidic	ADJ
fumecheng-14015	213	7	solutions	solution	NOUN
fumecheng-14015	213	8	are	be	AUX
fumecheng-14015	213	9	generally	generally	ADV
fumecheng-14015	213	10	avoided	avoid	VERB
fumecheng-14015	213	11	because	because	SCONJ
fumecheng-14015	213	12	they	they	PRON
fumecheng-14015	213	13	may	may	AUX
fumecheng-14015	213	14	negatively	negatively	ADV
fumecheng-14015	213	15	affect	affect	VERB
fumecheng-14015	213	16	the	the	DET
fumecheng-14015	213	17	device	device	NOUN
fumecheng-14015	213	18	performance	performance	NOUN
fumecheng-14015	213	19	and	and	CCONJ
fumecheng-14015	213	20	reliability	reliability	NOUN
fumecheng-14015	213	21	.	.	PUNCT
fumecheng-14015	214	1	cu	cu	PROPN
fumecheng-14015	214	2	-	-	PUNCT
fumecheng-14015	214	3	cu	cu	PROPN
fumecheng-14015	214	4	mechanical	mechanical	ADJ
fumecheng-14015	214	5	bonding	bonding	NOUN
fumecheng-14015	214	6	for	for	ADP
fumecheng-14015	214	7	3d	3d	NOUN
fumecheng-14015	214	8	integration	integration	NOUN
fumecheng-14015	214	9	of	of	ADP
fumecheng-14015	214	10	the	the	DET
fumecheng-14015	214	11	next	next	ADJ
fumecheng-14015	214	12	generation	generation	NOUN
fumecheng-14015	214	13	electronic	electronic	ADJ
fumecheng-14015	214	14	chips	chip	NOUN
fumecheng-14015	214	15	...	...	PUNCT
fumecheng-14015	214	16	931	931	NUM
fumecheng-14015	214	17	3.3	3.3	NUM
fumecheng-14015	214	18	.	.	PUNCT
fumecheng-14015	215	1	cu	cu	PROPN
fumecheng-14015	215	2	-	-	PUNCT
fumecheng-14015	215	3	cu	cu	PROPN
fumecheng-14015	215	4	mechanical	mechanical	ADJ
fumecheng-14015	215	5	bonding	bonding	NOUN
fumecheng-14015	215	6	by	by	ADP
fumecheng-14015	215	7	passivation	passivation	NOUN
fumecheng-14015	215	8	3.3.1	3.3.1	NUM
fumecheng-14015	215	9	.	.	PUNCT
fumecheng-14015	215	10	pd	pd	PROPN
fumecheng-14015	215	11	and	and	CCONJ
fumecheng-14015	215	12	sn	sn	PROPN
fumecheng-14015	215	13	passivation	passivation	NOUN
fumecheng-14015	215	14	to	to	PART
fumecheng-14015	215	15	enhance	enhance	VERB
fumecheng-14015	215	16	mechanical	mechanical	ADJ
fumecheng-14015	215	17	reliability	reliability	NOUN
fumecheng-14015	215	18	of	of	ADP
fumecheng-14015	215	19	cu	cu	PROPN
fumecheng-14015	215	20	-	-	PROPN
fumecheng-14015	215	21	cu	cu	PROPN
fumecheng-14015	215	22	bonding	bonding	NOUN
fumecheng-14015	215	23	as	as	SCONJ
fumecheng-14015	215	24	mentioned	mention	VERB
fumecheng-14015	215	25	earlier	early	ADV
fumecheng-14015	215	26	,	,	PUNCT
fumecheng-14015	215	27	acidic	acidic	ADJ
fumecheng-14015	215	28	substances	substance	NOUN
fumecheng-14015	215	29	such	such	ADJ
fumecheng-14015	215	30	as	as	ADP
fumecheng-14015	215	31	acetic	acetic	ADJ
fumecheng-14015	215	32	acid	acid	NOUN
fumecheng-14015	215	33	can	can	AUX
fumecheng-14015	215	34	remove	remove	VERB
fumecheng-14015	215	35	the	the	DET
fumecheng-14015	215	36	cuo	cuo	PROPN
fumecheng-14015	215	37	film	film	NOUN
fumecheng-14015	215	38	,	,	PUNCT
fumecheng-14015	215	39	but	but	CCONJ
fumecheng-14015	215	40	they	they	PRON
fumecheng-14015	215	41	also	also	ADV
fumecheng-14015	215	42	etch	etch	VERB
fumecheng-14015	215	43	the	the	DET
fumecheng-14015	215	44	cu	cu	NOUN
fumecheng-14015	215	45	layer	layer	NOUN
fumecheng-14015	215	46	,	,	PUNCT
fumecheng-14015	215	47	making	make	VERB
fumecheng-14015	215	48	the	the	DET
fumecheng-14015	215	49	removal	removal	NOUN
fumecheng-14015	215	50	of	of	ADP
fumecheng-14015	215	51	the	the	DET
fumecheng-14015	215	52	oxide	oxide	NOUN
fumecheng-14015	215	53	layer	layer	NOUN
fumecheng-14015	215	54	difficult	difficult	ADJ
fumecheng-14015	215	55	to	to	PART
fumecheng-14015	215	56	control	control	VERB
fumecheng-14015	215	57	[	[	X
fumecheng-14015	215	58	80	80	NUM
fumecheng-14015	215	59	,	,	PUNCT
fumecheng-14015	215	60	83	83	NUM
fumecheng-14015	215	61	]	]	PUNCT
fumecheng-14015	215	62	.	.	PUNCT
fumecheng-14015	216	1	to	to	PART
fumecheng-14015	216	2	address	address	VERB
fumecheng-14015	216	3	this	this	DET
fumecheng-14015	216	4	issue	issue	NOUN
fumecheng-14015	216	5	,	,	PUNCT
fumecheng-14015	216	6	many	many	ADJ
fumecheng-14015	216	7	researchers	researcher	NOUN
fumecheng-14015	216	8	have	have	AUX
fumecheng-14015	216	9	focused	focus	VERB
fumecheng-14015	216	10	not	not	PART
fumecheng-14015	216	11	only	only	ADV
fumecheng-14015	216	12	on	on	ADP
fumecheng-14015	216	13	removing	remove	VERB
fumecheng-14015	216	14	the	the	DET
fumecheng-14015	216	15	oxide	oxide	NOUN
fumecheng-14015	216	16	layer	layer	NOUN
fumecheng-14015	216	17	from	from	ADP
fumecheng-14015	216	18	preoxidized	preoxidized	ADJ
fumecheng-14015	216	19	cu	cu	NOUN
fumecheng-14015	216	20	surfaces	surface	NOUN
fumecheng-14015	216	21	but	but	CCONJ
fumecheng-14015	216	22	also	also	ADV
fumecheng-14015	216	23	on	on	ADP
fumecheng-14015	216	24	preventing	prevent	VERB
fumecheng-14015	216	25	further	further	ADJ
fumecheng-14015	216	26	oxidation	oxidation	NOUN
fumecheng-14015	217	1	[	[	X
fumecheng-14015	217	2	84	84	NUM
fumecheng-14015	217	3	-	-	SYM
fumecheng-14015	217	4	87	87	NUM
fumecheng-14015	217	5	]	]	PUNCT
fumecheng-14015	217	6	.	.	PUNCT
fumecheng-14015	218	1	the	the	DET
fumecheng-14015	218	2	passivation	passivation	NOUN
fumecheng-14015	218	3	method	method	NOUN
fumecheng-14015	218	4	allows	allow	VERB
fumecheng-14015	218	5	bonding	bonding	NOUN
fumecheng-14015	218	6	at	at	ADP
fumecheng-14015	218	7	lower	low	ADJ
fumecheng-14015	218	8	temperatures	temperature	NOUN
fumecheng-14015	218	9	,	,	PUNCT
fumecheng-14015	218	10	eliminating	eliminate	VERB
fumecheng-14015	218	11	the	the	DET
fumecheng-14015	218	12	need	need	NOUN
fumecheng-14015	218	13	for	for	ADP
fumecheng-14015	218	14	sputtering	sputter	VERB
fumecheng-14015	218	15	deposition	deposition	NOUN
fumecheng-14015	218	16	and	and	CCONJ
fumecheng-14015	218	17	vacuum	vacuum	NOUN
fumecheng-14015	218	18	bonding	bonding	NOUN
fumecheng-14015	218	19	,	,	PUNCT
fumecheng-14015	218	20	thereby	thereby	ADV
fumecheng-14015	218	21	offering	offer	VERB
fumecheng-14015	218	22	a	a	DET
fumecheng-14015	218	23	more	more	ADV
fumecheng-14015	218	24	efficient	efficient	ADJ
fumecheng-14015	218	25	and	and	CCONJ
fumecheng-14015	218	26	costeffective	costeffective	ADJ
fumecheng-14015	218	27	solution	solution	NOUN
fumecheng-14015	218	28	.	.	PUNCT
fumecheng-14015	219	1	however	however	ADV
fumecheng-14015	219	2	,	,	PUNCT
fumecheng-14015	219	3	previous	previous	ADJ
fumecheng-14015	219	4	studies	study	NOUN
fumecheng-14015	219	5	that	that	PRON
fumecheng-14015	219	6	used	use	VERB
fumecheng-14015	219	7	passivation	passivation	NOUN
fumecheng-14015	219	8	for	for	ADP
fumecheng-14015	219	9	research	research	NOUN
fumecheng-14015	219	10	purposes	purpose	NOUN
fumecheng-14015	219	11	primarily	primarily	ADV
fumecheng-14015	219	12	relied	rely	VERB
fumecheng-14015	219	13	on	on	ADP
fumecheng-14015	219	14	sputtered	sputter	VERB
fumecheng-14015	219	15	cu	cu	PROPN
fumecheng-14015	219	16	for	for	ADP
fumecheng-14015	219	17	bonding	bonding	NOUN
fumecheng-14015	219	18	[	[	X
fumecheng-14015	219	19	84	84	NUM
fumecheng-14015	219	20	,	,	PUNCT
fumecheng-14015	219	21	88	88	NUM
fumecheng-14015	219	22	]	]	PUNCT
fumecheng-14015	219	23	.	.	PUNCT
fumecheng-14015	220	1	sputtered	sputter	VERB
fumecheng-14015	220	2	films	film	NOUN
fumecheng-14015	220	3	tend	tend	VERB
fumecheng-14015	220	4	to	to	PART
fumecheng-14015	220	5	have	have	VERB
fumecheng-14015	220	6	a	a	DET
fumecheng-14015	220	7	lower	low	ADJ
fumecheng-14015	220	8	roughness	roughness	NOUN
fumecheng-14015	220	9	and	and	CCONJ
fumecheng-14015	220	10	higher	high	ADJ
fumecheng-14015	220	11	uniformity	uniformity	NOUN
fumecheng-14015	220	12	than	than	ADP
fumecheng-14015	220	13	those	those	PRON
fumecheng-14015	220	14	formed	form	VERB
fumecheng-14015	220	15	by	by	ADP
fumecheng-14015	220	16	other	other	ADJ
fumecheng-14015	220	17	deposition	deposition	NOUN
fumecheng-14015	220	18	techniques	technique	NOUN
fumecheng-14015	220	19	.	.	PUNCT
fumecheng-14015	221	1	despite	despite	SCONJ
fumecheng-14015	221	2	this	this	PRON
fumecheng-14015	221	3	,	,	PUNCT
fumecheng-14015	221	4	pd	pd	PROPN
fumecheng-14015	221	5	passivation	passivation	NOUN
fumecheng-14015	221	6	stands	stand	VERB
fumecheng-14015	221	7	out	out	ADP
fumecheng-14015	221	8	because	because	SCONJ
fumecheng-14015	221	9	of	of	ADP
fumecheng-14015	221	10	its	its	PRON
fumecheng-14015	221	11	stable	stable	ADJ
fumecheng-14015	221	12	electrical	electrical	ADJ
fumecheng-14015	221	13	performance	performance	NOUN
fumecheng-14015	221	14	,	,	PUNCT
fumecheng-14015	221	15	reliability	reliability	NOUN
fumecheng-14015	221	16	at	at	ADP
fumecheng-14015	221	17	low	low	ADJ
fumecheng-14015	221	18	temperatures	temperature	NOUN
fumecheng-14015	221	19	,	,	PUNCT
fumecheng-14015	221	20	and	and	CCONJ
fumecheng-14015	221	21	ability	ability	NOUN
fumecheng-14015	221	22	to	to	PART
fumecheng-14015	221	23	resist	resist	VERB
fumecheng-14015	221	24	corrosion	corrosion	NOUN
fumecheng-14015	221	25	and	and	CCONJ
fumecheng-14015	221	26	degradation	degradation	NOUN
fumecheng-14015	221	27	.	.	PUNCT
fumecheng-14015	222	1	tsai	tsai	PROPN
fumecheng-14015	222	2	et	et	PROPN
fumecheng-14015	222	3	al	al	PROPN
fumecheng-14015	222	4	.	.	PUNCT
fumecheng-14015	223	1	[	[	X
fumecheng-14015	223	2	89	89	NUM
fumecheng-14015	223	3	]	]	PUNCT
fumecheng-14015	223	4	used	use	VERB
fumecheng-14015	223	5	pd	pd	NOUN
fumecheng-14015	223	6	passivation	passivation	NOUN
fumecheng-14015	223	7	to	to	PART
fumecheng-14015	223	8	overcome	overcome	VERB
fumecheng-14015	223	9	the	the	DET
fumecheng-14015	223	10	challenges	challenge	NOUN
fumecheng-14015	223	11	of	of	ADP
fumecheng-14015	223	12	cu	cu	PROPN
fumecheng-14015	223	13	oxidation	oxidation	NOUN
fumecheng-14015	223	14	and	and	CCONJ
fumecheng-14015	223	15	facilitated	facilitate	VERB
fumecheng-14015	223	16	cu	cu	PROPN
fumecheng-14015	223	17	-	-	PUNCT
fumecheng-14015	223	18	cu	cu	PROPN
fumecheng-14015	223	19	bonding	bonding	NOUN
fumecheng-14015	223	20	at	at	ADP
fumecheng-14015	223	21	reduced	reduce	VERB
fumecheng-14015	223	22	temperatures	temperature	NOUN
fumecheng-14015	223	23	.	.	PUNCT
fumecheng-14015	224	1	in	in	ADP
fumecheng-14015	224	2	their	their	PRON
fumecheng-14015	224	3	approach	approach	NOUN
fumecheng-14015	224	4	,	,	PUNCT
fumecheng-14015	224	5	a	a	DET
fumecheng-14015	224	6	50	50	NUM
fumecheng-14015	224	7	nm	nm	NOUN
fumecheng-14015	224	8	ti	ti	NOUN
fumecheng-14015	224	9	layer	layer	NOUN
fumecheng-14015	224	10	and	and	CCONJ
fumecheng-14015	224	11	200	200	NUM
fumecheng-14015	224	12	nm	nm	ADJ
fumecheng-14015	224	13	cu	cu	NOUN
fumecheng-14015	224	14	seed	seed	NOUN
fumecheng-14015	224	15	layer	layer	NOUN
fumecheng-14015	224	16	were	be	AUX
fumecheng-14015	224	17	initially	initially	ADV
fumecheng-14015	224	18	deposited	deposit	VERB
fumecheng-14015	224	19	onto	onto	ADP
fumecheng-14015	224	20	a	a	DET
fumecheng-14015	224	21	si	si	NOUN
fumecheng-14015	224	22	wafer	wafer	NOUN
fumecheng-14015	224	23	.	.	PUNCT
fumecheng-14015	225	1	a	a	DET
fumecheng-14015	225	2	2	2	NUM
fumecheng-14015	225	3	µm	µm	NOUN
fumecheng-14015	225	4	photoresist	photoresist	NOUN
fumecheng-14015	225	5	layer	layer	NOUN
fumecheng-14015	225	6	was	be	AUX
fumecheng-14015	225	7	then	then	ADV
fumecheng-14015	225	8	coated	coat	VERB
fumecheng-14015	225	9	and	and	CCONJ
fumecheng-14015	225	10	patterned	pattern	VERB
fumecheng-14015	225	11	on	on	ADP
fumecheng-14015	225	12	the	the	DET
fumecheng-14015	225	13	seed	seed	NOUN
fumecheng-14015	225	14	layer	layer	NOUN
fumecheng-14015	225	15	,	,	PUNCT
fumecheng-14015	225	16	followed	follow	VERB
fumecheng-14015	225	17	by	by	ADP
fumecheng-14015	225	18	electroplating	electroplate	VERB
fumecheng-14015	225	19	to	to	PART
fumecheng-14015	225	20	form	form	VERB
fumecheng-14015	225	21	the	the	DET
fumecheng-14015	225	22	cu	cu	NOUN
fumecheng-14015	225	23	redistribution	redistribution	NOUN
fumecheng-14015	225	24	layer	layer	NOUN
fumecheng-14015	225	25	(	(	PUNCT
fumecheng-14015	225	26	rdl	rdl	NOUN
fumecheng-14015	225	27	)	)	PUNCT
fumecheng-14015	225	28	.	.	PUNCT
fumecheng-14015	226	1	after	after	SCONJ
fumecheng-14015	226	2	another	another	DET
fumecheng-14015	226	3	lithography	lithography	NOUN
fumecheng-14015	226	4	process	process	NOUN
fumecheng-14015	226	5	to	to	PART
fumecheng-14015	226	6	enhance	enhance	VERB
fumecheng-14015	226	7	the	the	DET
fumecheng-14015	226	8	photoresist	photoresist	NOUN
fumecheng-14015	226	9	,	,	PUNCT
fumecheng-14015	226	10	a	a	DET
fumecheng-14015	226	11	10	10	NUM
fumecheng-14015	226	12	µm	µm	NOUN
fumecheng-14015	226	13	photoresist	photoresist	NOUN
fumecheng-14015	226	14	layer	layer	NOUN
fumecheng-14015	226	15	was	be	AUX
fumecheng-14015	226	16	applied	apply	VERB
fumecheng-14015	226	17	and	and	CCONJ
fumecheng-14015	226	18	patterned	pattern	VERB
fumecheng-14015	226	19	for	for	ADP
fumecheng-14015	226	20	cu	cu	PROPN
fumecheng-14015	226	21	pillar	pillar	NOUN
fumecheng-14015	226	22	micro	micro	ADJ
fumecheng-14015	226	23	bumps	bump	NOUN
fumecheng-14015	226	24	,	,	PUNCT
fumecheng-14015	226	25	and	and	CCONJ
fumecheng-14015	226	26	5	5	NUM
fumecheng-14015	226	27	µm	µm	ADP
fumecheng-14015	226	28	high	high	ADJ
fumecheng-14015	226	29	cu	cu	PROPN
fumecheng-14015	226	30	pillars	pillar	NOUN
fumecheng-14015	226	31	were	be	AUX
fumecheng-14015	226	32	electroplated	electroplate	VERB
fumecheng-14015	226	33	.	.	PUNCT
fumecheng-14015	227	1	the	the	DET
fumecheng-14015	227	2	wafer	wafer	NOUN
fumecheng-14015	227	3	was	be	AUX
fumecheng-14015	227	4	then	then	ADV
fumecheng-14015	227	5	cleaned	clean	VERB
fumecheng-14015	227	6	with	with	ADP
fumecheng-14015	227	7	dilute	dilute	NOUN
fumecheng-14015	227	8	sulfuric	sulfuric	NOUN
fumecheng-14015	227	9	acid	acid	NOUN
fumecheng-14015	227	10	to	to	PART
fumecheng-14015	227	11	remove	remove	VERB
fumecheng-14015	227	12	the	the	DET
fumecheng-14015	227	13	surface	surface	NOUN
fumecheng-14015	227	14	oxides	oxide	NOUN
fumecheng-14015	227	15	on	on	ADP
fumecheng-14015	227	16	the	the	DET
fumecheng-14015	227	17	cu	cu	PROPN
fumecheng-14015	227	18	pillars	pillar	NOUN
fumecheng-14015	227	19	,	,	PUNCT
fumecheng-14015	227	20	and	and	CCONJ
fumecheng-14015	227	21	a	a	DET
fumecheng-14015	227	22	10	10	NUM
fumecheng-14015	227	23	nm	nm	ADJ
fumecheng-14015	227	24	pd	pd	NOUN
fumecheng-14015	227	25	passivation	passivation	NOUN
fumecheng-14015	227	26	layer	layer	NOUN
fumecheng-14015	227	27	was	be	AUX
fumecheng-14015	227	28	deposited	deposit	VERB
fumecheng-14015	227	29	to	to	PART
fumecheng-14015	227	30	prevent	prevent	VERB
fumecheng-14015	227	31	reoxidation	reoxidation	NOUN
fumecheng-14015	227	32	.	.	PUNCT
fumecheng-14015	228	1	the	the	DET
fumecheng-14015	228	2	bonding	bonding	NOUN
fumecheng-14015	228	3	process	process	NOUN
fumecheng-14015	228	4	was	be	AUX
fumecheng-14015	228	5	carried	carry	VERB
fumecheng-14015	228	6	out	out	ADP
fumecheng-14015	228	7	at	at	ADP
fumecheng-14015	228	8	1.91	1.91	NUM
fumecheng-14015	228	9	mpa	mpa	NOUN
fumecheng-14015	228	10	and	and	CCONJ
fumecheng-14015	228	11	150	150	NUM
fumecheng-14015	228	12	°	°	NOUN
fumecheng-14015	228	13	c	c	NOUN
fumecheng-14015	228	14	for	for	ADP
fumecheng-14015	228	15	50	50	NUM
fumecheng-14015	228	16	min	min	NOUN
fumecheng-14015	228	17	,	,	PUNCT
fumecheng-14015	228	18	with	with	ADP
fumecheng-14015	228	19	an	an	DET
fumecheng-14015	228	20	operating	operating	NOUN
fumecheng-14015	228	21	pressure	pressure	NOUN
fumecheng-14015	228	22	of	of	ADP
fumecheng-14015	228	23	7	7	NUM
fumecheng-14015	228	24	×	×	PROPN
fumecheng-14015	228	25	10⁻³	10⁻³	PROPN
fumecheng-14015	228	26	torr	torr	NOUN
fumecheng-14015	228	27	and	and	CCONJ
fumecheng-14015	228	28	base	base	NOUN
fumecheng-14015	228	29	pressure	pressure	NOUN
fumecheng-14015	228	30	of	of	ADP
fumecheng-14015	228	31	1	1	NUM
fumecheng-14015	228	32	×	×	NOUN
fumecheng-14015	228	33	10⁻⁶	10⁻⁶	NUM
fumecheng-14015	228	34	torr	torr	NOUN
fumecheng-14015	228	35	,	,	PUNCT
fumecheng-14015	228	36	without	without	ADP
fumecheng-14015	228	37	additional	additional	ADJ
fumecheng-14015	228	38	surface	surface	NOUN
fumecheng-14015	228	39	treatments	treatment	NOUN
fumecheng-14015	228	40	.	.	PUNCT
fumecheng-14015	229	1	the	the	DET
fumecheng-14015	229	2	structure	structure	NOUN
fumecheng-14015	229	3	with	with	ADP
fumecheng-14015	229	4	ti	ti	NOUN
fumecheng-14015	229	5	passivation	passivation	NOUN
fumecheng-14015	229	6	exhibited	exhibit	VERB
fumecheng-14015	229	7	a	a	DET
fumecheng-14015	229	8	noncontact	noncontact	ADJ
fumecheng-14015	229	9	resistance	resistance	NOUN
fumecheng-14015	229	10	of	of	ADP
fumecheng-14015	229	11	7	7	NUM
fumecheng-14015	229	12	×	×	NOUN
fumecheng-14015	229	13	10⁻⁴	10⁻⁴	NUM
fumecheng-14015	229	14	ω·cm²	ω·cm²	NOUN
fumecheng-14015	229	15	,	,	PUNCT
fumecheng-14015	229	16	while	while	SCONJ
fumecheng-14015	229	17	the	the	DET
fumecheng-14015	229	18	structure	structure	NOUN
fumecheng-14015	229	19	with	with	ADP
fumecheng-14015	229	20	pd	pd	NOUN
fumecheng-14015	229	21	passivation	passivation	NOUN
fumecheng-14015	229	22	showed	show	VERB
fumecheng-14015	229	23	significantly	significantly	ADV
fumecheng-14015	229	24	lower	low	ADJ
fumecheng-14015	229	25	resistance	resistance	NOUN
fumecheng-14015	229	26	at	at	ADP
fumecheng-14015	229	27	2	2	NUM
fumecheng-14015	229	28	×	×	NOUN
fumecheng-14015	229	29	10⁻⁷	10⁻⁷	NUM
fumecheng-14015	229	30	ω·cm²	ω·cm²	NOUN
fumecheng-14015	229	31	.	.	PUNCT
fumecheng-14015	230	1	reliability	reliability	NOUN
fumecheng-14015	230	2	tests	test	NOUN
fumecheng-14015	230	3	confirmed	confirm	VERB
fumecheng-14015	230	4	that	that	SCONJ
fumecheng-14015	230	5	the	the	DET
fumecheng-14015	230	6	pd	pd	PROPN
fumecheng-14015	230	7	passivated	passivate	VERB
fumecheng-14015	230	8	material	material	NOUN
fumecheng-14015	230	9	offered	offer	VERB
fumecheng-14015	230	10	a	a	DET
fumecheng-14015	230	11	high	high	ADJ
fumecheng-14015	230	12	resistance	resistance	NOUN
fumecheng-14015	230	13	to	to	ADP
fumecheng-14015	230	14	temperature	temperature	NOUN
fumecheng-14015	230	15	and	and	CCONJ
fumecheng-14015	230	16	humidity	humidity	NOUN
fumecheng-14015	230	17	degradation	degradation	NOUN
fumecheng-14015	230	18	[	[	X
fumecheng-14015	230	19	89	89	NUM
fumecheng-14015	230	20	]	]	PUNCT
fumecheng-14015	230	21	.	.	PUNCT
fumecheng-14015	231	1	kung	kung	PROPN
fumecheng-14015	231	2	et	et	PROPN
fumecheng-14015	231	3	al	al	PROPN
fumecheng-14015	231	4	.	.	PUNCT
fumecheng-14015	232	1	[	[	X
fumecheng-14015	232	2	90	90	NUM
fumecheng-14015	232	3	]	]	PUNCT
fumecheng-14015	232	4	addressed	address	VERB
fumecheng-14015	232	5	cu	cu	PROPN
fumecheng-14015	232	6	surface	surface	NOUN
fumecheng-14015	232	7	oxidation	oxidation	NOUN
fumecheng-14015	232	8	and	and	CCONJ
fumecheng-14015	232	9	height	height	NOUN
fumecheng-14015	232	10	nonuniformity	nonuniformity	NOUN
fumecheng-14015	232	11	by	by	ADP
fumecheng-14015	232	12	introducing	introduce	VERB
fumecheng-14015	232	13	a	a	DET
fumecheng-14015	232	14	thin	thin	ADJ
fumecheng-14015	232	15	sn	sn	NOUN
fumecheng-14015	232	16	passivation	passivation	NOUN
fumecheng-14015	232	17	layer	layer	NOUN
fumecheng-14015	232	18	atop	atop	ADP
fumecheng-14015	232	19	electroplated	electroplate	VERB
fumecheng-14015	232	20	cu	cu	PROPN
fumecheng-14015	232	21	and	and	CCONJ
fumecheng-14015	232	22	then	then	ADV
fumecheng-14015	232	23	employing	employ	VERB
fumecheng-14015	232	24	lowtemperature	lowtemperature	NOUN
fumecheng-14015	232	25	,	,	PUNCT
fumecheng-14015	232	26	low	low	ADJ
fumecheng-14015	232	27	-	-	PUNCT
fumecheng-14015	232	28	pressure	pressure	NOUN
fumecheng-14015	232	29	thermo	thermo	NOUN
fumecheng-14015	232	30	-	-	PUNCT
fumecheng-14015	232	31	compression	compression	NOUN
fumecheng-14015	232	32	to	to	PART
fumecheng-14015	232	33	enable	enable	VERB
fumecheng-14015	232	34	direct	direct	ADJ
fumecheng-14015	232	35	cu	cu	PROPN
fumecheng-14015	232	36	-	-	PROPN
fumecheng-14015	232	37	cu	cu	PROPN
fumecheng-14015	232	38	bonding	bonding	NOUN
fumecheng-14015	232	39	without	without	ADP
fumecheng-14015	232	40	cmp	cmp	PROPN
fumecheng-14015	232	41	.	.	PUNCT
fumecheng-14015	233	1	sn	sn	PROPN
fumecheng-14015	233	2	’s	’s	PART
fumecheng-14015	233	3	low	low	ADJ
fumecheng-14015	233	4	melting	melting	NOUN
fumecheng-14015	233	5	point	point	NOUN
fumecheng-14015	233	6	(	(	PUNCT
fumecheng-14015	233	7	232	232	NUM
fumecheng-14015	233	8	°	°	NOUN
fumecheng-14015	233	9	c	c	NOUN
fumecheng-14015	233	10	)	)	PUNCT
fumecheng-14015	233	11	and	and	CCONJ
fumecheng-14015	233	12	high	high	ADJ
fumecheng-14015	233	13	deformability	deformability	NOUN
fumecheng-14015	233	14	allow	allow	VERB
fumecheng-14015	233	15	it	it	PRON
fumecheng-14015	233	16	to	to	PART
fumecheng-14015	233	17	conformally	conformally	ADV
fumecheng-14015	233	18	bridge	bridge	VERB
fumecheng-14015	233	19	pad	pad	NOUN
fumecheng-14015	233	20	-	-	PUNCT
fumecheng-14015	233	21	to	to	ADP
fumecheng-14015	233	22	-	-	PUNCT
fumecheng-14015	233	23	pad	pad	NOUN
fumecheng-14015	233	24	topography	topography	NOUN
fumecheng-14015	233	25	,	,	PUNCT
fumecheng-14015	233	26	thereby	thereby	ADV
fumecheng-14015	233	27	accommodating	accommodate	VERB
fumecheng-14015	233	28	surface	surface	NOUN
fumecheng-14015	233	29	roughness	roughness	NOUN
fumecheng-14015	233	30	and	and	CCONJ
fumecheng-14015	233	31	pillar	pillar	NOUN
fumecheng-14015	233	32	height	height	NOUN
fumecheng-14015	233	33	mismatch	mismatch	NOUN
fumecheng-14015	233	34	while	while	SCONJ
fumecheng-14015	233	35	promoting	promote	VERB
fumecheng-14015	233	36	intimate	intimate	ADJ
fumecheng-14015	233	37	metallic	metallic	ADJ
fumecheng-14015	233	38	contact	contact	NOUN
fumecheng-14015	233	39	.	.	PUNCT
fumecheng-14015	234	1	the	the	DET
fumecheng-14015	234	2	process	process	NOUN
fumecheng-14015	234	3	flow	flow	VERB
fumecheng-14015	234	4	comprised	comprise	VERB
fumecheng-14015	234	5	sputtering	sputter	VERB
fumecheng-14015	234	6	a	a	DET
fumecheng-14015	234	7	50	50	NUM
fumecheng-14015	234	8	nm	nm	DET
fumecheng-14015	234	9	ti	ti	NOUN
fumecheng-14015	234	10	adhesion	adhesion	NOUN
fumecheng-14015	234	11	layer	layer	NOUN
fumecheng-14015	234	12	and	and	CCONJ
fumecheng-14015	234	13	a	a	DET
fumecheng-14015	234	14	300	300	NUM
fumecheng-14015	234	15	nm	nm	ADJ
fumecheng-14015	234	16	cu	cu	NOUN
fumecheng-14015	234	17	seed	seed	NOUN
fumecheng-14015	234	18	on	on	ADP
fumecheng-14015	234	19	si	si	NOUN
fumecheng-14015	234	20	,	,	PUNCT
fumecheng-14015	234	21	electroplating	electroplate	VERB
fumecheng-14015	234	22	~5	~5	NOUN
fumecheng-14015	234	23	µm	µm	ADP
fumecheng-14015	234	24	cu	cu	PROPN
fumecheng-14015	234	25	,	,	PUNCT
fumecheng-14015	234	26	and	and	CCONJ
fumecheng-14015	234	27	depositing	deposit	VERB
fumecheng-14015	234	28	sn	sn	NOUN
fumecheng-14015	234	29	at	at	ADP
fumecheng-14015	234	30	controlled	control	VERB
fumecheng-14015	234	31	thicknesses	thickness	NOUN
fumecheng-14015	234	32	of	of	ADP
fumecheng-14015	234	33	1	1	NUM
fumecheng-14015	234	34	µm	µm	NOUN
fumecheng-14015	234	35	,	,	PUNCT
fumecheng-14015	234	36	800	800	NUM
fumecheng-14015	234	37	nm	nm	NOUN
fumecheng-14015	234	38	,	,	PUNCT
fumecheng-14015	234	39	and	and	CCONJ
fumecheng-14015	234	40	600	600	NUM
fumecheng-14015	234	41	nm	nm	NOUN
fumecheng-14015	234	42	as	as	ADP
fumecheng-14015	234	43	the	the	DET
fumecheng-14015	234	44	principal	principal	ADJ
fumecheng-14015	234	45	variable	variable	NOUN
fumecheng-14015	234	46	.	.	PUNCT
fumecheng-14015	235	1	after	after	ADP
fumecheng-14015	235	2	acetone	acetone	NOUN
fumecheng-14015	235	3	and	and	CCONJ
fumecheng-14015	235	4	50	50	NUM
fumecheng-14015	235	5	vol%	vol%	NOUN
fumecheng-14015	235	6	hcl	hcl	PROPN
fumecheng-14015	235	7	cleans	clean	NOUN
fumecheng-14015	235	8	,	,	PUNCT
fumecheng-14015	235	9	wafers	wafer	NOUN
fumecheng-14015	235	10	were	be	AUX
fumecheng-14015	235	11	bonded	bond	VERB
fumecheng-14015	235	12	in	in	ADP
fumecheng-14015	235	13	~10⁻²	~10⁻²	NUM
fumecheng-14015	235	14	torr	torr	ADJ
fumecheng-14015	235	15	ambient	ambient	NOUN
fumecheng-14015	235	16	with	with	ADP
fumecheng-14015	235	17	a	a	DET
fumecheng-14015	235	18	40	40	NUM
fumecheng-14015	235	19	°	°	NOUN
fumecheng-14015	235	20	c	c	NOUN
fumecheng-14015	235	21	min⁻¹	min⁻¹	NOUN
fumecheng-14015	235	22	ramp	ramp	NOUN
fumecheng-14015	235	23	,	,	PUNCT
fumecheng-14015	235	24	1	1	NUM
fumecheng-14015	235	25	min	min	NOUN
fumecheng-14015	235	26	dwell	dwell	NOUN
fumecheng-14015	235	27	at	at	ADP
fumecheng-14015	235	28	the	the	DET
fumecheng-14015	235	29	target	target	NOUN
fumecheng-14015	235	30	temperature	temperature	NOUN
fumecheng-14015	235	31	,	,	PUNCT
fumecheng-14015	235	32	and	and	CCONJ
fumecheng-14015	235	33	1–2	1–2	DET
fumecheng-14015	235	34	mpa	mpa	NOUN
fumecheng-14015	235	35	applied	apply	VERB
fumecheng-14015	235	36	pressure	pressure	NOUN
fumecheng-14015	235	37	,	,	PUNCT
fumecheng-14015	235	38	followed	follow	VERB
fumecheng-14015	235	39	by	by	ADP
fumecheng-14015	235	40	n₂	n₂	NOUN
fumecheng-14015	235	41	purge	purge	NOUN
fumecheng-14015	235	42	cooling	cooling	NOUN
fumecheng-14015	235	43	.	.	PUNCT
fumecheng-14015	236	1	two	two	NUM
fumecheng-14015	236	2	temperature	temperature	NOUN
fumecheng-14015	236	3	windows	window	NOUN
fumecheng-14015	236	4	were	be	AUX
fumecheng-14015	236	5	emphasized	emphasize	VERB
fumecheng-14015	236	6	:	:	PUNCT
fumecheng-14015	236	7	220	220	NUM
fumecheng-14015	236	8	°	°	NUM
fumecheng-14015	236	9	c	c	X
fumecheng-14015	236	10	(	(	PUNCT
fumecheng-14015	236	11	solid	solid	ADJ
fumecheng-14015	236	12	sn	sn	NOUN
fumecheng-14015	236	13	,	,	PUNCT
fumecheng-14015	236	14	minimizing	minimize	VERB
fumecheng-14015	236	15	collateral	collateral	ADJ
fumecheng-14015	236	16	reflow	reflow	NOUN
fumecheng-14015	236	17	risks	risk	NOUN
fumecheng-14015	236	18	)	)	PUNCT
fumecheng-14015	236	19	and	and	CCONJ
fumecheng-14015	236	20	250	250	NUM
fumecheng-14015	236	21	°	°	NOUN
fumecheng-14015	236	22	c	c	NOUN
fumecheng-14015	236	23	(	(	PUNCT
fumecheng-14015	236	24	transient	transient	ADJ
fumecheng-14015	236	25	liquid	liquid	ADJ
fumecheng-14015	236	26	assisted	assist	VERB
fumecheng-14015	236	27	flow	flow	NOUN
fumecheng-14015	236	28	,	,	PUNCT
fumecheng-14015	236	29	maximizing	maximize	VERB
fumecheng-14015	236	30	gap	gap	NOUN
fumecheng-14015	236	31	fill	fill	NOUN
fumecheng-14015	236	32	and	and	CCONJ
fumecheng-14015	236	33	planarity	planarity	NOUN
fumecheng-14015	236	34	compensation	compensation	NOUN
fumecheng-14015	236	35	)	)	PUNCT
fumecheng-14015	236	36	.	.	PUNCT
fumecheng-14015	237	1	fig	fig	NOUN
fumecheng-14015	237	2	.	.	PUNCT
fumecheng-14015	238	1	6	6	NUM
fumecheng-14015	238	2	(	(	PUNCT
fumecheng-14015	238	3	b	b	NOUN
fumecheng-14015	238	4	)	)	PUNCT
fumecheng-14015	238	5	establishes	establish	VERB
fumecheng-14015	238	6	the	the	DET
fumecheng-14015	238	7	governing	govern	VERB
fumecheng-14015	238	8	defect	defect	NOUN
fumecheng-14015	238	9	formation	formation	NOUN
fumecheng-14015	238	10	mechanism	mechanism	NOUN
fumecheng-14015	238	11	when	when	SCONJ
fumecheng-14015	238	12	sn	sn	PROPN
fumecheng-14015	238	13	is	be	AUX
fumecheng-14015	238	14	insufficient	insufficient	ADJ
fumecheng-14015	238	15	to	to	PART
fumecheng-14015	238	16	fully	fully	ADV
fumecheng-14015	238	17	mediate	mediate	VERB
fumecheng-14015	238	18	roughness	roughness	NOUN
fumecheng-14015	238	19	during	during	ADP
fumecheng-14015	238	20	intermetallic	intermetallic	ADJ
fumecheng-14015	238	21	growth	growth	NOUN
fumecheng-14015	238	22	.	.	PUNCT
fumecheng-14015	239	1	as	as	SCONJ
fumecheng-14015	239	2	sn	sn	PROPN
fumecheng-14015	239	3	is	be	AUX
fumecheng-14015	239	4	consumed	consume	VERB
fumecheng-14015	239	5	,	,	PUNCT
fumecheng-14015	239	6	scalloped	scalloped	ADJ
fumecheng-14015	239	7	cu₆sn₅	cu₆sn₅	NOUN
fumecheng-14015	239	8	and	and	CCONJ
fumecheng-14015	239	9	smoother	smooth	ADJ
fumecheng-14015	239	10	cu₃sn	cu₃sn	ADJ
fumecheng-14015	239	11	emerge	emerge	VERB
fumecheng-14015	239	12	at	at	ADP
fumecheng-14015	239	13	the	the	DET
fumecheng-14015	239	14	reaction	reaction	NOUN
fumecheng-14015	239	15	front	front	NOUN
fumecheng-14015	239	16	;	;	PUNCT
fumecheng-14015	239	17	if	if	SCONJ
fumecheng-14015	239	18	the	the	DET
fumecheng-14015	239	19	residual	residual	ADJ
fumecheng-14015	239	20	sn	sn	PROPN
fumecheng-14015	239	21	thickness	thickness	NOUN
fumecheng-14015	239	22	is	be	AUX
fumecheng-14015	239	23	too	too	ADV
fumecheng-14015	239	24	small	small	ADJ
fumecheng-14015	239	25	,	,	PUNCT
fumecheng-14015	239	26	the	the	DET
fumecheng-14015	239	27	opposing	opposing	ADJ
fumecheng-14015	239	28	intermetallic	intermetallic	ADJ
fumecheng-14015	239	29	compound	compound	NOUN
fumecheng-14015	239	30	(	(	PUNCT
fumecheng-14015	239	31	imc	imc	PROPN
fumecheng-14015	239	32	)	)	PUNCT
fumecheng-14015	239	33	surfaces	surface	NOUN
fumecheng-14015	239	34	first	first	ADJ
fumecheng-14015	239	35	touch	touch	NOUN
fumecheng-14015	239	36	at	at	ADP
fumecheng-14015	239	37	asperities	asperity	NOUN
fumecheng-14015	239	38	,	,	PUNCT
fumecheng-14015	239	39	concentrating	concentrate	VERB
fumecheng-14015	239	40	load	load	NOUN
fumecheng-14015	239	41	locally	locally	ADV
fumecheng-14015	239	42	and	and	CCONJ
fumecheng-14015	239	43	leaving	leave	VERB
fumecheng-14015	239	44	low	low	ADJ
fumecheng-14015	239	45	pressure	pressure	NOUN
fumecheng-14015	239	46	regions	region	NOUN
fumecheng-14015	239	47	that	that	PRON
fumecheng-14015	239	48	preserve	preserve	VERB
fumecheng-14015	239	49	micron	micron	NOUN
fumecheng-14015	239	50	scale	scale	NOUN
fumecheng-14015	239	51	gaps	gap	NOUN
fumecheng-14015	239	52	.	.	PUNCT
fumecheng-14015	240	1	this	this	DET
fumecheng-14015	240	2	“	"	PUNCT
fumecheng-14015	240	3	sn	sn	PROPN
fumecheng-14015	240	4	depletion	depletion	NOUN
fumecheng-14015	240	5	→	→	SYM
fumecheng-14015	240	6	roughness	roughness	NOUN
fumecheng-14015	240	7	amplification	amplification	NOUN
fumecheng-14015	240	8	→	→	SYM
fumecheng-14015	240	9	stress	stress	NOUN
fumecheng-14015	240	10	concentration	concentration	NOUN
fumecheng-14015	240	11	”	"	PUNCT
fumecheng-14015	240	12	pathway	pathway	NOUN
fumecheng-14015	240	13	explains	explain	VERB
fumecheng-14015	240	14	932	932	NUM
fumecheng-14015	240	15	s.	s.	PROPN
fumecheng-14015	240	16	choi	choi	PROPN
fumecheng-14015	240	17	,	,	PUNCT
fumecheng-14015	240	18	c.	c.	PROPN
fumecheng-14015	240	19	chen	chen	PROPN
fumecheng-14015	240	20	,	,	PUNCT
fumecheng-14015	240	21	b.	b.	PROPN
fumecheng-14015	240	22	hwang	hwang	PROPN
fumecheng-14015	240	23	the	the	DET
fumecheng-14015	240	24	observed	observe	VERB
fumecheng-14015	240	25	transition	transition	NOUN
fumecheng-14015	240	26	from	from	ADP
fumecheng-14015	240	27	isolated	isolated	ADJ
fumecheng-14015	240	28	microvoids	microvoid	NOUN
fumecheng-14015	240	29	to	to	ADP
fumecheng-14015	240	30	extended	extend	VERB
fumecheng-14015	240	31	unbonded	unbonded	ADJ
fumecheng-14015	240	32	lines	line	NOUN
fumecheng-14015	240	33	and	and	CCONJ
fumecheng-14015	240	34	large	large	ADJ
fumecheng-14015	240	35	voids	voids	NOUN
fumecheng-14015	240	36	in	in	ADP
fumecheng-14015	240	37	thin	thin	ADJ
fumecheng-14015	240	38	sn	sn	PROPN
fumecheng-14015	240	39	regimes	regime	NOUN
fumecheng-14015	240	40	.	.	PUNCT
fumecheng-14015	241	1	experimentally	experimentally	ADV
fumecheng-14015	241	2	,	,	PUNCT
fumecheng-14015	241	3	800	800	NUM
fumecheng-14015	241	4	nm	nm	NOUN
fumecheng-14015	241	5	sn	sn	NOUN
fumecheng-14015	241	6	at	at	ADP
fumecheng-14015	241	7	220	220	NUM
fumecheng-14015	241	8	°	°	NOUN
fumecheng-14015	241	9	c	c	NOUN
fumecheng-14015	241	10	even	even	ADV
fumecheng-14015	241	11	under	under	ADP
fumecheng-14015	241	12	2	2	NUM
fumecheng-14015	241	13	mpa	mpa	NOUN
fumecheng-14015	241	14	produced	produce	VERB
fumecheng-14015	241	15	large	large	ADJ
fumecheng-14015	241	16	voids	voids	NOUN
fumecheng-14015	241	17	attributable	attributable	ADJ
fumecheng-14015	241	18	to	to	ADP
fumecheng-14015	241	19	early	early	ADJ
fumecheng-14015	241	20	rough	rough	ADJ
fumecheng-14015	241	21	imc	imc	PROPN
fumecheng-14015	241	22	contact	contact	NOUN
fumecheng-14015	241	23	,	,	PUNCT
fumecheng-14015	241	24	whereas	whereas	SCONJ
fumecheng-14015	241	25	250	250	NUM
fumecheng-14015	241	26	°	°	NOUN
fumecheng-14015	241	27	c	c	NOUN
fumecheng-14015	241	28	promoted	promote	VERB
fumecheng-14015	241	29	more	more	ADV
fumecheng-14015	241	30	complete	complete	ADJ
fumecheng-14015	241	31	imc	imc	NOUN
fumecheng-14015	241	32	formation	formation	NOUN
fumecheng-14015	241	33	and	and	CCONJ
fumecheng-14015	241	34	improved	improve	VERB
fumecheng-14015	241	35	integrity	integrity	NOUN
fumecheng-14015	241	36	but	but	CCONJ
fumecheng-14015	241	37	remained	remain	VERB
fumecheng-14015	241	38	thickness	thickness	NOUN
fumecheng-14015	241	39	limited	limit	VERB
fumecheng-14015	241	40	for	for	ADP
fumecheng-14015	241	41	gap	gap	NOUN
fumecheng-14015	241	42	accommodation	accommodation	NOUN
fumecheng-14015	241	43	.	.	PUNCT
fumecheng-14015	242	1	at	at	ADP
fumecheng-14015	242	2	600	600	NUM
fumecheng-14015	242	3	nm	nm	PROPN
fumecheng-14015	242	4	sn	sn	NOUN
fumecheng-14015	242	5	,	,	PUNCT
fumecheng-14015	242	6	residual	residual	ADJ
fumecheng-14015	242	7	micro	micro	ADJ
fumecheng-14015	242	8	gaps	gap	NOUN
fumecheng-14015	242	9	persisted	persist	VERB
fumecheng-14015	242	10	at	at	ADP
fumecheng-14015	242	11	both	both	DET
fumecheng-14015	242	12	temperatures	temperature	NOUN
fumecheng-14015	242	13	despite	despite	SCONJ
fumecheng-14015	242	14	raising	raise	VERB
fumecheng-14015	242	15	pressure	pressure	NOUN
fumecheng-14015	242	16	to	to	ADP
fumecheng-14015	242	17	2	2	NUM
fumecheng-14015	242	18	mpa	mpa	NOUN
fumecheng-14015	242	19	,	,	PUNCT
fumecheng-14015	242	20	underscoring	underscore	VERB
fumecheng-14015	242	21	the	the	DET
fumecheng-14015	242	22	need	need	NOUN
fumecheng-14015	242	23	for	for	ADP
fumecheng-14015	242	24	a	a	DET
fumecheng-14015	242	25	minimum	minimum	ADJ
fumecheng-14015	242	26	sn	sn	NOUN
fumecheng-14015	242	27	budget	budget	NOUN
fumecheng-14015	242	28	to	to	PART
fumecheng-14015	242	29	suppress	suppress	VERB
fumecheng-14015	242	30	roughness	roughness	NOUN
fumecheng-14015	242	31	induced	induce	VERB
fumecheng-14015	242	32	defects	defect	NOUN
fumecheng-14015	242	33	.	.	PUNCT
fumecheng-14015	243	1	fig	fig	NOUN
fumecheng-14015	243	2	.	.	PUNCT
fumecheng-14015	244	1	6	6	NUM
fumecheng-14015	244	2	schematic	schematic	ADJ
fumecheng-14015	244	3	of	of	ADP
fumecheng-14015	244	4	(	(	PUNCT
fumecheng-14015	244	5	a	a	X
fumecheng-14015	244	6	)	)	PUNCT
fumecheng-14015	244	7	the	the	DET
fumecheng-14015	244	8	cu	cu	PROPN
fumecheng-14015	244	9	-	-	PUNCT
fumecheng-14015	244	10	to	to	ADP
fumecheng-14015	244	11	-	-	PUNCT
fumecheng-14015	244	12	cu	cu	NOUN
fumecheng-14015	244	13	direct	direct	ADJ
fumecheng-14015	244	14	bonding	bonding	NOUN
fumecheng-14015	244	15	using	use	VERB
fumecheng-14015	244	16	sn	sn	PROPN
fumecheng-14015	244	17	as	as	ADP
fumecheng-14015	244	18	the	the	DET
fumecheng-14015	244	19	passivation	passivation	NOUN
fumecheng-14015	244	20	layer	layer	NOUN
fumecheng-14015	244	21	and	and	CCONJ
fumecheng-14015	244	22	(	(	PUNCT
fumecheng-14015	244	23	b	b	NOUN
fumecheng-14015	244	24	)	)	PUNCT
fumecheng-14015	244	25	imc	imc	NOUN
fumecheng-14015	244	26	formation	formation	NOUN
fumecheng-14015	244	27	and	and	CCONJ
fumecheng-14015	244	28	microstructure	microstructure	ADJ
fumecheng-14015	244	29	evolution	evolution	NOUN
fumecheng-14015	244	30	of	of	ADP
fumecheng-14015	244	31	the	the	DET
fumecheng-14015	244	32	cu	cu	PROPN
fumecheng-14015	244	33	-	-	PROPN
fumecheng-14015	244	34	sn	sn	PROPN
fumecheng-14015	244	35	bonding	bonding	NOUN
fumecheng-14015	244	36	when	when	SCONJ
fumecheng-14015	244	37	sn	sn	PROPN
fumecheng-14015	244	38	is	be	AUX
fumecheng-14015	244	39	not	not	PART
fumecheng-14015	244	40	thick	thick	ADJ
fumecheng-14015	244	41	enough	enough	ADV
fumecheng-14015	244	42	quantitatively	quantitatively	ADV
fumecheng-14015	244	43	,	,	PUNCT
fumecheng-14015	244	44	the	the	DET
fumecheng-14015	244	45	most	most	ADV
fumecheng-14015	244	46	robust	robust	ADJ
fumecheng-14015	244	47	condition	condition	NOUN
fumecheng-14015	244	48	was	be	AUX
fumecheng-14015	244	49	1	1	NUM
fumecheng-14015	244	50	µm	µm	ADP
fumecheng-14015	244	51	sn	sn	PROPN
fumecheng-14015	244	52	bonded	bond	VERB
fumecheng-14015	244	53	at	at	ADP
fumecheng-14015	244	54	250	250	NUM
fumecheng-14015	244	55	°	°	ADP
fumecheng-14015	244	56	c	c	NOUN
fumecheng-14015	244	57	and	and	CCONJ
fumecheng-14015	244	58	1	1	NUM
fumecheng-14015	244	59	mpa	mpa	NOUN
fumecheng-14015	244	60	,	,	PUNCT
fumecheng-14015	244	61	yielding	yield	VERB
fumecheng-14015	244	62	~0.9	~0.9	NUM
fumecheng-14015	244	63	%	%	NOUN
fumecheng-14015	244	64	areal	areal	NOUN
fumecheng-14015	244	65	void	void	VERB
fumecheng-14015	244	66	fraction	fraction	NOUN
fumecheng-14015	244	67	with	with	ADP
fumecheng-14015	244	68	~13	~13	PRON
fumecheng-14015	244	69	%	%	NOUN
fumecheng-14015	244	70	unbonded	unbonded	ADJ
fumecheng-14015	244	71	length	length	NOUN
fumecheng-14015	244	72	.	.	PUNCT
fumecheng-14015	245	1	under	under	ADP
fumecheng-14015	245	2	otherwise	otherwise	ADV
fumecheng-14015	245	3	comparable	comparable	ADJ
fumecheng-14015	245	4	settings	setting	NOUN
fumecheng-14015	245	5	,	,	PUNCT
fumecheng-14015	245	6	1	1	NUM
fumecheng-14015	245	7	µm	µm	ADP
fumecheng-14015	245	8	sn	sn	PROPN
fumecheng-14015	245	9	at	at	ADP
fumecheng-14015	245	10	220	220	NUM
fumecheng-14015	245	11	°	°	NOUN
fumecheng-14015	245	12	c	c	NOUN
fumecheng-14015	245	13	(	(	PUNCT
fumecheng-14015	245	14	1	1	NUM
fumecheng-14015	245	15	mpa	mpa	NOUN
fumecheng-14015	245	16	)	)	PUNCT
fumecheng-14015	245	17	and	and	CCONJ
fumecheng-14015	245	18	800	800	NUM
fumecheng-14015	245	19	nm	nm	NOUN
fumecheng-14015	245	20	at	at	ADP
fumecheng-14015	245	21	250	250	NUM
fumecheng-14015	245	22	°	°	NOUN
fumecheng-14015	245	23	c	c	NOUN
fumecheng-14015	245	24	(	(	PUNCT
fumecheng-14015	245	25	2	2	NUM
fumecheng-14015	245	26	mpa	mpa	NOUN
fumecheng-14015	245	27	)	)	PUNCT
fumecheng-14015	245	28	both	both	PRON
fumecheng-14015	245	29	produced	produce	VERB
fumecheng-14015	245	30	~1.5	~1.5	X
fumecheng-14015	245	31	%	%	NOUN
fumecheng-14015	245	32	voiding	void	VERB
fumecheng-14015	245	33	with	with	ADP
fumecheng-14015	245	34	~20–25	~20–25	NUM
fumecheng-14015	245	35	%	%	NOUN
fumecheng-14015	245	36	unbonded	unbonded	ADJ
fumecheng-14015	245	37	length	length	NOUN
fumecheng-14015	245	38	,	,	PUNCT
fumecheng-14015	245	39	while	while	SCONJ
fumecheng-14015	245	40	the	the	DET
fumecheng-14015	245	41	worst	bad	ADJ
fumecheng-14015	245	42	case—800	case—800	NOUN
fumecheng-14015	245	43	nm	nm	PRON
fumecheng-14015	245	44	sn	sn	NOUN
fumecheng-14015	245	45	at	at	ADP
fumecheng-14015	245	46	220	220	NUM
fumecheng-14015	245	47	°	°	ADP
fumecheng-14015	245	48	c	c	NOUN
fumecheng-14015	245	49	and	and	CCONJ
fumecheng-14015	245	50	2	2	NUM
fumecheng-14015	245	51	mpa	mpa	NOUN
fumecheng-14015	245	52	—	—	PUNCT
fumecheng-14015	245	53	exhibited	exhibit	VERB
fumecheng-14015	245	54	~4.7	~4.7	NUM
fumecheng-14015	245	55	%	%	NOUN
fumecheng-14015	245	56	voiding	voiding	ADJ
fumecheng-14015	245	57	and	and	CCONJ
fumecheng-14015	245	58	~37.5	~37.5	ADJ
fumecheng-14015	245	59	%	%	NOUN
fumecheng-14015	245	60	unbonded	unbonded	ADJ
fumecheng-14015	245	61	length	length	NOUN
fumecheng-14015	245	62	due	due	ADP
fumecheng-14015	245	63	to	to	ADP
fumecheng-14015	245	64	the	the	DET
fumecheng-14015	245	65	large	large	ADJ
fumecheng-14015	245	66	void	void	ADJ
fumecheng-14015	245	67	mechanism	mechanism	NOUN
fumecheng-14015	245	68	highlighted	highlight	VERB
fumecheng-14015	245	69	in	in	ADP
fumecheng-14015	245	70	fig	fig	NOUN
fumecheng-14015	245	71	.	.	PUNCT
fumecheng-14015	246	1	6	6	NUM
fumecheng-14015	246	2	(	(	PUNCT
fumecheng-14015	246	3	b	b	NOUN
fumecheng-14015	246	4	)	)	PUNCT
fumecheng-14015	246	5	.	.	PUNCT
fumecheng-14015	247	1	surface	surface	NOUN
fumecheng-14015	247	2	planarization	planarization	NOUN
fumecheng-14015	247	3	strongly	strongly	ADV
fumecheng-14015	247	4	mitigated	mitigate	VERB
fumecheng-14015	247	5	these	these	DET
fumecheng-14015	247	6	fig	fig	NOUN
fumecheng-14015	247	7	.	.	PUNCT
fumecheng-14015	248	1	6	6	NUM
fumecheng-14015	248	2	(	(	PUNCT
fumecheng-14015	248	3	b	b	NOUN
fumecheng-14015	248	4	)	)	PUNCT
fumecheng-14015	248	5	type	type	NOUN
fumecheng-14015	248	6	defects	defect	NOUN
fumecheng-14015	248	7	:	:	PUNCT
fumecheng-14015	248	8	the	the	DET
fumecheng-14015	248	9	rms	rm	NOUN
fumecheng-14015	248	10	(	(	PUNCT
fumecheng-14015	248	11	rq	rq	NOUN
fumecheng-14015	248	12	)	)	PUNCT
fumecheng-14015	248	13	of	of	ADP
fumecheng-14015	248	14	cu	cu	PROPN
fumecheng-14015	248	15	surface	surface	NOUN
fumecheng-14015	248	16	roughness	roughness	NOUN
fumecheng-14015	248	17	dropped	drop	VERB
fumecheng-14015	248	18	from	from	ADP
fumecheng-14015	248	19	~22	~22	NOUN
fumecheng-14015	248	20	nm	nm	INTJ
fumecheng-14015	248	21	(	(	PUNCT
fumecheng-14015	248	22	as	as	SCONJ
fumecheng-14015	248	23	plated	plate	VERB
fumecheng-14015	248	24	)	)	PUNCT
fumecheng-14015	248	25	to	to	ADP
fumecheng-14015	248	26	~1.3	~1.3	PROPN
fumecheng-14015	248	27	nm	nm	ADJ
fumecheng-14015	248	28	(	(	PUNCT
fumecheng-14015	248	29	polish	polish	NOUN
fumecheng-14015	248	30	+	+	CCONJ
fumecheng-14015	248	31	cmp	cmp	NOUN
fumecheng-14015	248	32	)	)	PUNCT
fumecheng-14015	248	33	and	and	CCONJ
fumecheng-14015	248	34	peak	peak	NOUN
fumecheng-14015	248	35	-	-	PUNCT
fumecheng-14015	248	36	to	to	ADP
fumecheng-14015	248	37	-	-	PUNCT
fumecheng-14015	248	38	valley	valley	NOUN
fumecheng-14015	248	39	height	height	NOUN
fumecheng-14015	248	40	variation	variation	NOUN
fumecheng-14015	248	41	from	from	ADP
fumecheng-14015	248	42	~0.96	~0.96	PROPN
fumecheng-14015	248	43	µm	µm	NOUN
fumecheng-14015	248	44	to	to	ADP
fumecheng-14015	248	45	~0.28	~0.28	SYM
fumecheng-14015	248	46	µm	µm	NOUN
fumecheng-14015	248	47	,	,	PUNCT
fumecheng-14015	248	48	driving	drive	VERB
fumecheng-14015	248	49	,	,	PUNCT
fumecheng-14015	248	50	for	for	ADP
fumecheng-14015	248	51	example	example	NOUN
fumecheng-14015	248	52	,	,	PUNCT
fumecheng-14015	248	53	the	the	DET
fumecheng-14015	248	54	800	800	NUM
fumecheng-14015	248	55	nm/220	nm/220	ADP
fumecheng-14015	248	56	°	°	NOUN
fumecheng-14015	248	57	c	c	NOUN
fumecheng-14015	248	58	case	case	NOUN
fumecheng-14015	248	59	from	from	ADP
fumecheng-14015	248	60	~4.8	~4.8	NUM
fumecheng-14015	248	61	%	%	NOUN
fumecheng-14015	248	62	voiding	voiding	ADJ
fumecheng-14015	248	63	and	and	CCONJ
fumecheng-14015	248	64	~37.3	~37.3	ADJ
fumecheng-14015	248	65	%	%	NOUN
fumecheng-14015	248	66	unbonded	unbonde	VERB
fumecheng-14015	248	67	length	length	NOUN
fumecheng-14015	248	68	down	down	ADV
fumecheng-14015	248	69	to	to	ADP
fumecheng-14015	248	70	~0.3	~0.3	NUM
fumecheng-14015	248	71	%	%	NOUN
fumecheng-14015	248	72	and	and	CCONJ
fumecheng-14015	248	73	~7.35	~7.35	NUM
fumecheng-14015	248	74	%	%	NOUN
fumecheng-14015	248	75	,	,	PUNCT
fumecheng-14015	248	76	respectively	respectively	ADV
fumecheng-14015	248	77	;	;	PUNCT
fumecheng-14015	248	78	800	800	NUM
fumecheng-14015	248	79	nm/250	nm/250	VERB
fumecheng-14015	248	80	°	°	PROPN
fumecheng-14015	248	81	c	c	PROPN
fumecheng-14015	248	82	then	then	ADV
fumecheng-14015	248	83	cu	cu	PROPN
fumecheng-14015	248	84	-	-	PROPN
fumecheng-14015	248	85	cu	cu	PROPN
fumecheng-14015	248	86	mechanical	mechanical	ADJ
fumecheng-14015	248	87	bonding	bonding	NOUN
fumecheng-14015	248	88	for	for	ADP
fumecheng-14015	248	89	3d	3d	NOUN
fumecheng-14015	248	90	integration	integration	NOUN
fumecheng-14015	248	91	of	of	ADP
fumecheng-14015	248	92	the	the	DET
fumecheng-14015	248	93	next	next	ADJ
fumecheng-14015	248	94	generation	generation	NOUN
fumecheng-14015	248	95	electronic	electronic	ADJ
fumecheng-14015	248	96	chips	chip	NOUN
fumecheng-14015	248	97	...	...	PUNCT
fumecheng-14015	248	98	933	933	NUM
fumecheng-14015	248	99	met	meet	VERB
fumecheng-14015	248	100	targets	target	NOUN
fumecheng-14015	248	101	even	even	ADV
fumecheng-14015	248	102	at	at	ADP
fumecheng-14015	248	103	1	1	NUM
fumecheng-14015	248	104	mpa	mpa	NOUN
fumecheng-14015	248	105	,	,	PUNCT
fumecheng-14015	248	106	and	and	CCONJ
fumecheng-14015	248	107	600	600	NUM
fumecheng-14015	248	108	nm/250	nm/250	VERB
fumecheng-14015	248	109	°	°	PROPN
fumecheng-14015	248	110	c/2	c/2	PART
fumecheng-14015	248	111	mpa	mpa	PROPN
fumecheng-14015	248	112	became	become	VERB
fumecheng-14015	248	113	acceptable	acceptable	ADJ
fumecheng-14015	248	114	.	.	PUNCT
fumecheng-14015	249	1	cross	cross	ADJ
fumecheng-14015	249	2	-	-	ADJ
fumecheng-14015	249	3	sectional	sectional	ADJ
fumecheng-14015	249	4	transmission	transmission	NOUN
fumecheng-14015	249	5	electron	electron	NOUN
fumecheng-14015	249	6	microscopy	microscopy	NOUN
fumecheng-14015	249	7	(	(	PUNCT
fumecheng-14015	249	8	tem	tem	NOUN
fumecheng-14015	249	9	)	)	PUNCT
fumecheng-14015	249	10	further	far	ADV
fumecheng-14015	249	11	supports	support	VERB
fumecheng-14015	249	12	the	the	DET
fumecheng-14015	249	13	microstructural	microstructural	ADJ
fumecheng-14015	249	14	soundness	soundness	NOUN
fumecheng-14015	249	15	:	:	PUNCT
fumecheng-14015	249	16	at	at	ADP
fumecheng-14015	249	17	1	1	NUM
fumecheng-14015	249	18	µm/250	µm/250	NUM
fumecheng-14015	249	19	°	°	NOUN
fumecheng-14015	249	20	c/1	c/1	X
fumecheng-14015	249	21	mpa/1	mpa/1	PROPN
fumecheng-14015	249	22	min	min	PROPN
fumecheng-14015	249	23	,	,	PUNCT
fumecheng-14015	249	24	a	a	DET
fumecheng-14015	249	25	cu	cu	PROPN
fumecheng-14015	249	26	/	/	SYM
fumecheng-14015	249	27	cu₆sn₅/cu₃sn	cu₆sn₅/cu₃sn	NOUN
fumecheng-14015	249	28	/	/	SYM
fumecheng-14015	249	29	cu₆sn₅/cu	cu₆sn₅/cu	PROPN
fumecheng-14015	249	30	stack	stack	NOUN
fumecheng-14015	249	31	formed	form	VERB
fumecheng-14015	249	32	without	without	ADP
fumecheng-14015	249	33	interfacial	interfacial	ADJ
fumecheng-14015	249	34	flaws	flaw	NOUN
fumecheng-14015	249	35	;	;	PUNCT
fumecheng-14015	249	36	at	at	ADP
fumecheng-14015	249	37	800	800	NUM
fumecheng-14015	249	38	nm/250	nm/250	VERB
fumecheng-14015	249	39	°	°	PROPN
fumecheng-14015	249	40	c/2	c/2	PROPN
fumecheng-14015	249	41	mpa	mpa	PROPN
fumecheng-14015	249	42	,	,	PUNCT
fumecheng-14015	249	43	the	the	DET
fumecheng-14015	249	44	imcs	imcs	NOUN
fumecheng-14015	249	45	converted	convert	VERB
fumecheng-14015	249	46	fully	fully	ADV
fumecheng-14015	249	47	to	to	PART
fumecheng-14015	249	48	cu₃sn	cu₃sn	ADJ
fumecheng-14015	249	49	with	with	ADP
fumecheng-14015	249	50	clean	clean	PROPN
fumecheng-14015	249	51	cu	cu	PROPN
fumecheng-14015	249	52	-	-	PUNCT
fumecheng-14015	249	53	cu₃sn	cu₃sn	VERB
fumecheng-14015	249	54	interfaces	interface	NOUN
fumecheng-14015	249	55	,	,	PUNCT
fumecheng-14015	249	56	consistent	consistent	ADJ
fumecheng-14015	249	57	with	with	ADP
fumecheng-14015	249	58	literature	literature	NOUN
fumecheng-14015	249	59	reported	report	VERB
fumecheng-14015	249	60	high	high	ADJ
fumecheng-14015	249	61	shear	shear	NOUN
fumecheng-14015	249	62	strengths	strength	NOUN
fumecheng-14015	249	63	for	for	ADP
fumecheng-14015	249	64	cu	cu	PROPN
fumecheng-14015	249	65	/	/	SYM
fumecheng-14015	249	66	cu₃sn	cu₃sn	VERB
fumecheng-14015	249	67	/	/	SYM
fumecheng-14015	249	68	cu	cu	NOUN
fumecheng-14015	249	69	joints	joint	NOUN
fumecheng-14015	250	1	[	[	X
fumecheng-14015	250	2	90	90	NUM
fumecheng-14015	250	3	]	]	PUNCT
fumecheng-14015	250	4	.	.	PUNCT
fumecheng-14015	251	1	this	this	DET
fumecheng-14015	251	2	study	study	NOUN
fumecheng-14015	251	3	demonstrates	demonstrate	VERB
fumecheng-14015	251	4	that	that	SCONJ
fumecheng-14015	251	5	transient	transient	ADJ
fumecheng-14015	251	6	liquid	liquid	NOUN
fumecheng-14015	251	7	assisted	assist	VERB
fumecheng-14015	251	8	bonding	bonding	NOUN
fumecheng-14015	251	9	with	with	ADP
fumecheng-14015	251	10	≥1	≥1	PROPN
fumecheng-14015	251	11	µm	µm	NOUN
fumecheng-14015	251	12	sn	sn	PROPN
fumecheng-14015	251	13	achieves	achieve	VERB
fumecheng-14015	251	14	high	high	ADJ
fumecheng-14015	251	15	-	-	PUNCT
fumecheng-14015	251	16	quality	quality	NOUN
fumecheng-14015	251	17	cu	cu	PROPN
fumecheng-14015	251	18	-	-	PUNCT
fumecheng-14015	251	19	cu	cu	PROPN
fumecheng-14015	251	20	interconnects	interconnect	NOUN
fumecheng-14015	251	21	at	at	ADP
fumecheng-14015	251	22	250	250	NUM
fumecheng-14015	251	23	°	°	ADP
fumecheng-14015	251	24	c	c	NOUN
fumecheng-14015	251	25	and	and	CCONJ
fumecheng-14015	251	26	1	1	NUM
fumecheng-14015	251	27	mpa	mpa	NOUN
fumecheng-14015	251	28	within	within	ADP
fumecheng-14015	251	29	1	1	NUM
fumecheng-14015	251	30	min	min	NOUN
fumecheng-14015	251	31	,	,	PUNCT
fumecheng-14015	251	32	without	without	ADP
fumecheng-14015	251	33	cmp	cmp	PROPN
fumecheng-14015	251	34	.	.	PUNCT
fumecheng-14015	252	1	a	a	DET
fumecheng-14015	252	2	prudent	prudent	ADJ
fumecheng-14015	252	3	caveat	caveat	NOUN
fumecheng-14015	252	4	is	be	AUX
fumecheng-14015	252	5	that	that	SCONJ
fumecheng-14015	252	6	the	the	DET
fumecheng-14015	252	7	optimization	optimization	NOUN
fumecheng-14015	252	8	relies	rely	VERB
fumecheng-14015	252	9	primarily	primarily	ADV
fumecheng-14015	252	10	on	on	ADP
fumecheng-14015	252	11	structural	structural	ADJ
fumecheng-14015	252	12	metrics	metric	NOUN
fumecheng-14015	252	13	(	(	PUNCT
fumecheng-14015	252	14	voiding	void	VERB
fumecheng-14015	252	15	,	,	PUNCT
fumecheng-14015	252	16	unbonded	unbonded	ADJ
fumecheng-14015	252	17	length	length	NOUN
fumecheng-14015	252	18	,	,	PUNCT
fumecheng-14015	252	19	tem	tem	PROPN
fumecheng-14015	252	20	)	)	PUNCT
fumecheng-14015	252	21	;	;	PUNCT
fumecheng-14015	252	22	for	for	ADP
fumecheng-14015	252	23	process	process	NOUN
fumecheng-14015	252	24	window	window	NOUN
fumecheng-14015	252	25	definition	definition	NOUN
fumecheng-14015	252	26	in	in	ADP
fumecheng-14015	252	27	product	product	NOUN
fumecheng-14015	252	28	settings	setting	NOUN
fumecheng-14015	252	29	,	,	PUNCT
fumecheng-14015	252	30	complementary	complementary	ADJ
fumecheng-14015	252	31	electrical	electrical	ADJ
fumecheng-14015	252	32	contact	contact	NOUN
fumecheng-14015	252	33	resistance	resistance	NOUN
fumecheng-14015	252	34	and	and	CCONJ
fumecheng-14015	252	35	long	long	ADJ
fumecheng-14015	252	36	-	-	PUNCT
fumecheng-14015	252	37	term	term	NOUN
fumecheng-14015	252	38	reliability	reliability	NOUN
fumecheng-14015	252	39	under	under	ADP
fumecheng-14015	252	40	coupled	couple	VERB
fumecheng-14015	252	41	thermo	thermo	NOUN
fumecheng-14015	252	42	-	-	PUNCT
fumecheng-14015	252	43	humidity	humidity	NOUN
fumecheng-14015	252	44	and	and	CCONJ
fumecheng-14015	252	45	thermal	thermal	ADJ
fumecheng-14015	252	46	cycling	cycling	NOUN
fumecheng-14015	252	47	loads	load	NOUN
fumecheng-14015	252	48	should	should	AUX
fumecheng-14015	252	49	be	be	AUX
fumecheng-14015	252	50	quantified	quantify	VERB
fumecheng-14015	252	51	under	under	ADP
fumecheng-14015	252	52	the	the	DET
fumecheng-14015	252	53	same	same	ADJ
fumecheng-14015	252	54	conditions	condition	NOUN
fumecheng-14015	252	55	.	.	PUNCT
fumecheng-14015	253	1	in	in	ADP
fumecheng-14015	253	2	summary	summary	NOUN
fumecheng-14015	253	3	,	,	PUNCT
fumecheng-14015	253	4	the	the	DET
fumecheng-14015	253	5	use	use	NOUN
fumecheng-14015	253	6	of	of	ADP
fumecheng-14015	253	7	pd	pd	PROPN
fumecheng-14015	253	8	and	and	CCONJ
fumecheng-14015	253	9	sn	sn	PROPN
fumecheng-14015	253	10	as	as	ADP
fumecheng-14015	253	11	a	a	DET
fumecheng-14015	253	12	passivation	passivation	NOUN
fumecheng-14015	253	13	layer	layer	NOUN
fumecheng-14015	253	14	significantly	significantly	ADV
fumecheng-14015	253	15	reduced	reduce	VERB
fumecheng-14015	253	16	the	the	DET
fumecheng-14015	253	17	contact	contact	NOUN
fumecheng-14015	253	18	resistance	resistance	NOUN
fumecheng-14015	253	19	,	,	PUNCT
fumecheng-14015	253	20	resulting	result	VERB
fumecheng-14015	253	21	in	in	ADP
fumecheng-14015	253	22	superior	superior	ADJ
fumecheng-14015	253	23	electrical	electrical	ADJ
fumecheng-14015	253	24	properties	property	NOUN
fumecheng-14015	253	25	suitable	suitable	ADJ
fumecheng-14015	253	26	for	for	ADP
fumecheng-14015	253	27	interconnect	interconnect	NOUN
fumecheng-14015	253	28	applications	application	NOUN
fumecheng-14015	253	29	.	.	PUNCT
fumecheng-14015	254	1	these	these	DET
fumecheng-14015	254	2	studies	study	NOUN
fumecheng-14015	254	3	demonstrated	demonstrate	VERB
fumecheng-14015	254	4	that	that	SCONJ
fumecheng-14015	254	5	pd	pd	PROPN
fumecheng-14015	254	6	and	and	CCONJ
fumecheng-14015	254	7	sn	sn	PROPN
fumecheng-14015	254	8	passivation	passivation	NOUN
fumecheng-14015	254	9	facilitates	facilitate	VERB
fumecheng-14015	254	10	high	high	ADJ
fumecheng-14015	254	11	-	-	PUNCT
fumecheng-14015	254	12	quality	quality	NOUN
fumecheng-14015	254	13	cu	cu	PROPN
fumecheng-14015	254	14	-	-	PUNCT
fumecheng-14015	254	15	cu	cu	PROPN
fumecheng-14015	254	16	bonding	bonding	NOUN
fumecheng-14015	254	17	at	at	ADP
fumecheng-14015	254	18	low	low	ADJ
fumecheng-14015	254	19	temperatures	temperature	NOUN
fumecheng-14015	254	20	with	with	ADP
fumecheng-14015	254	21	stable	stable	ADJ
fumecheng-14015	254	22	electrical	electrical	ADJ
fumecheng-14015	254	23	performance	performance	NOUN
fumecheng-14015	254	24	,	,	PUNCT
fumecheng-14015	254	25	making	make	VERB
fumecheng-14015	254	26	it	it	PRON
fumecheng-14015	254	27	ideal	ideal	ADJ
fumecheng-14015	254	28	for	for	ADP
fumecheng-14015	254	29	low	low	ADJ
fumecheng-14015	254	30	-	-	PUNCT
fumecheng-14015	254	31	thermal	thermal	ADJ
fumecheng-14015	254	32	-	-	PUNCT
fumecheng-14015	254	33	budget	budget	NOUN
fumecheng-14015	254	34	applications	application	NOUN
fumecheng-14015	254	35	in	in	ADP
fumecheng-14015	254	36	3d	3d	NUM
fumecheng-14015	254	37	integration	integration	NOUN
fumecheng-14015	254	38	.	.	PUNCT
fumecheng-14015	255	1	3.3.2	3.3.2	X
fumecheng-14015	255	2	.	.	PUNCT
fumecheng-14015	255	3	au	au	NOUN
fumecheng-14015	255	4	passivation	passivation	NOUN
fumecheng-14015	255	5	and	and	CCONJ
fumecheng-14015	255	6	cr	cr	NOUN
fumecheng-14015	255	7	/	/	SYM
fumecheng-14015	255	8	au	au	NOUN
fumecheng-14015	255	9	passivation	passivation	NOUN
fumecheng-14015	255	10	in	in	ADP
fumecheng-14015	255	11	addition	addition	NOUN
fumecheng-14015	255	12	to	to	ADP
fumecheng-14015	255	13	pd	pd	NOUN
fumecheng-14015	255	14	passivation	passivation	NOUN
fumecheng-14015	255	15	,	,	PUNCT
fumecheng-14015	255	16	we	we	PRON
fumecheng-14015	255	17	explored	explore	VERB
fumecheng-14015	255	18	cu	cu	PROPN
fumecheng-14015	255	19	-	-	PUNCT
fumecheng-14015	255	20	cu	cu	PROPN
fumecheng-14015	255	21	bonding	bonding	NOUN
fumecheng-14015	255	22	using	use	VERB
fumecheng-14015	255	23	au	au	ADJ
fumecheng-14015	255	24	passivation	passivation	NOUN
fumecheng-14015	255	25	.	.	PUNCT
fumecheng-14015	256	1	the	the	DET
fumecheng-14015	256	2	key	key	ADJ
fumecheng-14015	256	3	advantage	advantage	NOUN
fumecheng-14015	256	4	of	of	ADP
fumecheng-14015	256	5	au	au	ADJ
fumecheng-14015	256	6	passivation	passivation	NOUN
fumecheng-14015	256	7	is	be	AUX
fumecheng-14015	256	8	that	that	SCONJ
fumecheng-14015	256	9	it	it	PRON
fumecheng-14015	256	10	enables	enable	VERB
fumecheng-14015	256	11	bonding	bonding	NOUN
fumecheng-14015	256	12	at	at	ADP
fumecheng-14015	256	13	a	a	DET
fumecheng-14015	256	14	lower	low	ADJ
fumecheng-14015	256	15	temperature	temperature	NOUN
fumecheng-14015	256	16	than	than	ADP
fumecheng-14015	256	17	pd	pd	NOUN
fumecheng-14015	256	18	passivation	passivation	NOUN
fumecheng-14015	256	19	,	,	PUNCT
fumecheng-14015	256	20	while	while	SCONJ
fumecheng-14015	256	21	improving	improve	VERB
fumecheng-14015	256	22	the	the	DET
fumecheng-14015	256	23	electrical	electrical	ADJ
fumecheng-14015	256	24	properties	property	NOUN
fumecheng-14015	256	25	and	and	CCONJ
fumecheng-14015	256	26	providing	provide	VERB
fumecheng-14015	256	27	excellent	excellent	ADJ
fumecheng-14015	256	28	bonding	bonding	NOUN
fumecheng-14015	256	29	strength	strength	NOUN
fumecheng-14015	256	30	in	in	ADP
fumecheng-14015	256	31	tensile	tensile	NOUN
fumecheng-14015	256	32	tests	test	NOUN
fumecheng-14015	256	33	.	.	PUNCT
fumecheng-14015	257	1	moreover	moreover	ADV
fumecheng-14015	257	2	,	,	PUNCT
fumecheng-14015	257	3	au	au	ADP
fumecheng-14015	257	4	passivation	passivation	NOUN
fumecheng-14015	257	5	can	can	AUX
fumecheng-14015	257	6	be	be	AUX
fumecheng-14015	257	7	applied	apply	VERB
fumecheng-14015	257	8	directly	directly	ADV
fumecheng-14015	257	9	at	at	ADP
fumecheng-14015	257	10	both	both	CCONJ
fumecheng-14015	257	11	the	the	DET
fumecheng-14015	257	12	wafer	wafer	NOUN
fumecheng-14015	257	13	and	and	CCONJ
fumecheng-14015	257	14	chip	chip	NOUN
fumecheng-14015	257	15	levels	level	NOUN
fumecheng-14015	257	16	.	.	PUNCT
fumecheng-14015	258	1	however	however	ADV
fumecheng-14015	258	2	,	,	PUNCT
fumecheng-14015	258	3	one	one	NUM
fumecheng-14015	258	4	drawback	drawback	NOUN
fumecheng-14015	258	5	is	be	AUX
fumecheng-14015	258	6	the	the	DET
fumecheng-14015	258	7	formation	formation	NOUN
fumecheng-14015	258	8	of	of	ADP
fumecheng-14015	258	9	imcs	imcs	NOUN
fumecheng-14015	258	10	during	during	ADP
fumecheng-14015	258	11	bonding	bonding	NOUN
fumecheng-14015	258	12	,	,	PUNCT
fumecheng-14015	258	13	which	which	PRON
fumecheng-14015	258	14	exhibit	exhibit	VERB
fumecheng-14015	258	15	poor	poor	ADJ
fumecheng-14015	258	16	electrical	electrical	ADJ
fumecheng-14015	258	17	properties	property	NOUN
fumecheng-14015	258	18	,	,	PUNCT
fumecheng-14015	258	19	low	low	ADJ
fumecheng-14015	258	20	structural	structural	ADJ
fumecheng-14015	258	21	stability	stability	NOUN
fumecheng-14015	258	22	,	,	PUNCT
fumecheng-14015	258	23	and	and	CCONJ
fumecheng-14015	258	24	require	require	VERB
fumecheng-14015	258	25	large	large	ADJ
fumecheng-14015	258	26	bump	bump	NOUN
fumecheng-14015	258	27	pitches	pitch	NOUN
fumecheng-14015	258	28	,	,	PUNCT
fumecheng-14015	258	29	negatively	negatively	ADV
fumecheng-14015	258	30	affecting	affect	VERB
fumecheng-14015	258	31	the	the	DET
fumecheng-14015	258	32	bonding	bonding	NOUN
fumecheng-14015	258	33	process	process	NOUN
fumecheng-14015	258	34	.	.	PUNCT
fumecheng-14015	259	1	there	there	PRON
fumecheng-14015	259	2	are	be	VERB
fumecheng-14015	259	3	two	two	NUM
fumecheng-14015	259	4	methods	method	NOUN
fumecheng-14015	259	5	for	for	ADP
fumecheng-14015	259	6	passivating	passivate	VERB
fumecheng-14015	259	7	ag	ag	PROPN
fumecheng-14015	259	8	or	or	CCONJ
fumecheng-14015	259	9	au	au	ADP
fumecheng-14015	259	10	:	:	PUNCT
fumecheng-14015	259	11	one	one	PRON
fumecheng-14015	259	12	uses	use	VERB
fumecheng-14015	259	13	sputtering	sputter	VERB
fumecheng-14015	259	14	and	and	CCONJ
fumecheng-14015	259	15	an	an	DET
fumecheng-14015	259	16	e	e	NOUN
fumecheng-14015	259	17	-	-	NOUN
fumecheng-14015	259	18	beam	beam	NOUN
fumecheng-14015	259	19	[	[	X
fumecheng-14015	259	20	91	91	NUM
fumecheng-14015	259	21	]	]	PUNCT
fumecheng-14015	259	22	,	,	PUNCT
fumecheng-14015	259	23	and	and	CCONJ
fumecheng-14015	259	24	the	the	DET
fumecheng-14015	259	25	other	other	ADJ
fumecheng-14015	259	26	uses	use	VERB
fumecheng-14015	259	27	a	a	DET
fumecheng-14015	259	28	metal	metal	NOUN
fumecheng-14015	259	29	capping	capping	NOUN
fumecheng-14015	259	30	layer	layer	NOUN
fumecheng-14015	259	31	on	on	ADP
fumecheng-14015	259	32	top	top	NOUN
fumecheng-14015	259	33	of	of	ADP
fumecheng-14015	259	34	rdl	rdl	NOUN
fumecheng-14015	259	35	+	+	CCONJ
fumecheng-14015	259	36	low	low	ADJ
fumecheng-14015	259	37	-	-	PUNCT
fumecheng-14015	259	38	temperature	temperature	NOUN
fumecheng-14015	259	39	tcb	tcb	NOUN
fumecheng-14015	260	1	[	[	X
fumecheng-14015	260	2	92	92	NUM
fumecheng-14015	260	3	,	,	PUNCT
fumecheng-14015	260	4	93	93	NUM
fumecheng-14015	260	5	]	]	PUNCT
fumecheng-14015	260	6	.	.	PUNCT
fumecheng-14015	261	1	liu	liu	PROPN
fumecheng-14015	261	2	et	et	PROPN
fumecheng-14015	261	3	al	al	PROPN
fumecheng-14015	261	4	.	.	PUNCT
fumecheng-14015	262	1	[	[	X
fumecheng-14015	262	2	92	92	NUM
fumecheng-14015	262	3	]	]	PUNCT
fumecheng-14015	262	4	proposed	propose	VERB
fumecheng-14015	262	5	using	use	VERB
fumecheng-14015	262	6	au	au	ADV
fumecheng-14015	262	7	as	as	ADP
fumecheng-14015	262	8	a	a	DET
fumecheng-14015	262	9	passivation	passivation	NOUN
fumecheng-14015	262	10	material	material	NOUN
fumecheng-14015	262	11	.	.	PUNCT
fumecheng-14015	263	1	they	they	PRON
fumecheng-14015	263	2	conducted	conduct	VERB
fumecheng-14015	263	3	bonding	bonding	NOUN
fumecheng-14015	263	4	at	at	ADP
fumecheng-14015	263	5	a	a	DET
fumecheng-14015	263	6	low	low	ADJ
fumecheng-14015	263	7	temperature	temperature	NOUN
fumecheng-14015	263	8	of	of	ADP
fumecheng-14015	263	9	150	150	NUM
fumecheng-14015	263	10	°	°	NOUN
fumecheng-14015	263	11	c	c	NOUN
fumecheng-14015	263	12	for	for	ADP
fumecheng-14015	263	13	30	30	NUM
fumecheng-14015	263	14	min	min	NOUN
fumecheng-14015	263	15	under	under	ADP
fumecheng-14015	263	16	a	a	DET
fumecheng-14015	263	17	vacuum	vacuum	NOUN
fumecheng-14015	263	18	of	of	ADP
fumecheng-14015	263	19	0.01	0.01	NUM
fumecheng-14015	263	20	torr	torr	NOUN
fumecheng-14015	263	21	through	through	ADP
fumecheng-14015	263	22	tcb	tcb	PROPN
fumecheng-14015	263	23	.	.	PUNCT
fumecheng-14015	264	1	during	during	ADP
fumecheng-14015	264	2	bonding	bonding	NOUN
fumecheng-14015	264	3	,	,	PUNCT
fumecheng-14015	264	4	cu	cu	PROPN
fumecheng-14015	264	5	diffused	diffuse	VERB
fumecheng-14015	264	6	through	through	ADP
fumecheng-14015	264	7	the	the	DET
fumecheng-14015	264	8	au	au	ADJ
fumecheng-14015	264	9	layer	layer	NOUN
fumecheng-14015	264	10	to	to	ADP
fumecheng-14015	264	11	the	the	DET
fumecheng-14015	264	12	bonding	bonding	NOUN
fumecheng-14015	264	13	interface	interface	NOUN
fumecheng-14015	264	14	,	,	PUNCT
fumecheng-14015	264	15	forming	form	VERB
fumecheng-14015	264	16	a	a	DET
fumecheng-14015	264	17	strong	strong	ADJ
fumecheng-14015	264	18	bond	bond	NOUN
fumecheng-14015	264	19	.	.	PUNCT
fumecheng-14015	265	1	no	no	DET
fumecheng-14015	265	2	imcs	imcs	NOUN
fumecheng-14015	265	3	were	be	AUX
fumecheng-14015	265	4	observed	observe	VERB
fumecheng-14015	265	5	,	,	PUNCT
fumecheng-14015	265	6	probably	probably	ADV
fumecheng-14015	265	7	because	because	SCONJ
fumecheng-14015	265	8	of	of	ADP
fumecheng-14015	265	9	the	the	DET
fumecheng-14015	265	10	difficulty	difficulty	NOUN
fumecheng-14015	265	11	in	in	ADP
fumecheng-14015	265	12	nucleation	nucleation	NOUN
fumecheng-14015	265	13	at	at	ADP
fumecheng-14015	265	14	low	low	ADJ
fumecheng-14015	265	15	temperatures	temperature	NOUN
fumecheng-14015	265	16	.	.	PUNCT
fumecheng-14015	266	1	the	the	DET
fumecheng-14015	266	2	mechanical	mechanical	ADJ
fumecheng-14015	266	3	strength	strength	NOUN
fumecheng-14015	266	4	was	be	AUX
fumecheng-14015	266	5	evaluated	evaluate	VERB
fumecheng-14015	266	6	via	via	ADP
fumecheng-14015	266	7	a	a	DET
fumecheng-14015	266	8	pull	pull	NOUN
fumecheng-14015	266	9	test	test	NOUN
fumecheng-14015	266	10	,	,	PUNCT
fumecheng-14015	266	11	which	which	PRON
fumecheng-14015	266	12	revealed	reveal	VERB
fumecheng-14015	266	13	a	a	DET
fumecheng-14015	266	14	bonding	bonding	NOUN
fumecheng-14015	266	15	strength	strength	NOUN
fumecheng-14015	266	16	of	of	ADP
fumecheng-14015	266	17	0.94	0.94	NUM
fumecheng-14015	266	18	mpa	mpa	NOUN
fumecheng-14015	266	19	,	,	PUNCT
fumecheng-14015	266	20	indicating	indicate	VERB
fumecheng-14015	266	21	a	a	DET
fumecheng-14015	266	22	high	high	ADJ
fumecheng-14015	266	23	-	-	PUNCT
fumecheng-14015	266	24	quality	quality	NOUN
fumecheng-14015	266	25	bond	bond	NOUN
fumecheng-14015	266	26	.	.	PUNCT
fumecheng-14015	267	1	the	the	DET
fumecheng-14015	267	2	electrical	electrical	ADJ
fumecheng-14015	267	3	performance	performance	NOUN
fumecheng-14015	267	4	was	be	AUX
fumecheng-14015	267	5	also	also	ADV
fumecheng-14015	267	6	excellent	excellent	ADJ
fumecheng-14015	267	7	,	,	PUNCT
fumecheng-14015	267	8	with	with	ADP
fumecheng-14015	267	9	a	a	DET
fumecheng-14015	267	10	noncontact	noncontact	ADJ
fumecheng-14015	267	11	resistance	resistance	NOUN
fumecheng-14015	267	12	of	of	ADP
fumecheng-14015	267	13	approximately	approximately	ADV
fumecheng-14015	267	14	10⁻⁸	10⁻⁸	NUM
fumecheng-14015	267	15	ω·cm²	ω·cm²	NOUN
fumecheng-14015	267	16	,	,	PUNCT
fumecheng-14015	267	17	regardless	regardless	ADV
fumecheng-14015	267	18	of	of	ADP
fumecheng-14015	267	19	the	the	DET
fumecheng-14015	267	20	contact	contact	NOUN
fumecheng-14015	267	21	size	size	NOUN
fumecheng-14015	267	22	.	.	PUNCT
fumecheng-14015	268	1	liu	liu	PROPN
fumecheng-14015	268	2	et	et	PROPN
fumecheng-14015	268	3	al	al	PROPN
fumecheng-14015	268	4	.	.	PUNCT
fumecheng-14015	269	1	[	[	X
fumecheng-14015	269	2	93	93	NUM
fumecheng-14015	269	3	]	]	PUNCT
fumecheng-14015	269	4	discovered	discover	VERB
fumecheng-14015	269	5	that	that	SCONJ
fumecheng-14015	269	6	a	a	DET
fumecheng-14015	269	7	cr	cr	ADP
fumecheng-14015	269	8	wetting	wet	VERB
fumecheng-14015	269	9	layer	layer	NOUN
fumecheng-14015	269	10	between	between	ADP
fumecheng-14015	269	11	the	the	DET
fumecheng-14015	269	12	rdl	rdl	NOUN
fumecheng-14015	269	13	and	and	CCONJ
fumecheng-14015	269	14	au	au	NOUN
fumecheng-14015	269	15	passivation	passivation	NOUN
fumecheng-14015	269	16	layer	layer	NOUN
fumecheng-14015	269	17	reduced	reduce	VERB
fumecheng-14015	269	18	the	the	DET
fumecheng-14015	269	19	bonding	bonding	NOUN
fumecheng-14015	269	20	temperature	temperature	NOUN
fumecheng-14015	269	21	to	to	ADP
fumecheng-14015	269	22	70	70	NUM
fumecheng-14015	269	23	°	°	NOUN
fumecheng-14015	269	24	c	c	NOUN
fumecheng-14015	269	25	.	.	PUNCT
fumecheng-14015	270	1	they	they	PRON
fumecheng-14015	270	2	found	find	VERB
fumecheng-14015	270	3	that	that	SCONJ
fumecheng-14015	270	4	bonding	bonding	NOUN
fumecheng-14015	270	5	could	could	AUX
fumecheng-14015	270	6	be	be	AUX
fumecheng-14015	270	7	completed	complete	VERB
fumecheng-14015	270	8	in	in	ADP
fumecheng-14015	270	9	15	15	NUM
fumecheng-14015	270	10	min	min	NOUN
fumecheng-14015	270	11	at	at	ADP
fumecheng-14015	270	12	100	100	NUM
fumecheng-14015	270	13	°	°	ADP
fumecheng-14015	270	14	c	c	NOUN
fumecheng-14015	270	15	for	for	ADP
fumecheng-14015	270	16	wafer	wafer	NOUN
fumecheng-14015	270	17	-	-	PUNCT
fumecheng-14015	270	18	level	level	NOUN
fumecheng-14015	270	19	applications	application	NOUN
fumecheng-14015	270	20	and	and	CCONJ
fumecheng-14015	270	21	in	in	ADP
fumecheng-14015	270	22	180	180	NUM
fumecheng-14015	270	23	s	s	NOUN
fumecheng-14015	270	24	at	at	ADP
fumecheng-14015	270	25	70	70	NUM
fumecheng-14015	270	26	°	°	ADP
fumecheng-14015	270	27	c	c	NOUN
fumecheng-14015	270	28	for	for	ADP
fumecheng-14015	270	29	chiplevel	chiplevel	NOUN
fumecheng-14015	270	30	applications	application	NOUN
fumecheng-14015	270	31	.	.	PUNCT
fumecheng-14015	271	1	aes	aes	PROPN
fumecheng-14015	271	2	confirmed	confirm	VERB
fumecheng-14015	271	3	the	the	DET
fumecheng-14015	271	4	diffusion	diffusion	NOUN
fumecheng-14015	271	5	of	of	ADP
fumecheng-14015	271	6	cu	cu	PROPN
fumecheng-14015	271	7	atoms	atom	NOUN
fumecheng-14015	271	8	from	from	ADP
fumecheng-14015	271	9	the	the	DET
fumecheng-14015	271	10	cr	cr	NOUN
fumecheng-14015	271	11	wetting	wet	VERB
fumecheng-14015	271	12	layer	layer	NOUN
fumecheng-14015	271	13	to	to	ADP
fumecheng-14015	271	14	the	the	DET
fumecheng-14015	271	15	bonding	bonding	NOUN
fumecheng-14015	271	16	surface	surface	NOUN
fumecheng-14015	271	17	.	.	PUNCT
fumecheng-14015	272	1	for	for	ADP
fumecheng-14015	272	2	comparison	comparison	NOUN
fumecheng-14015	272	3	,	,	PUNCT
fumecheng-14015	272	4	atomic	atomic	ADJ
fumecheng-14015	272	5	force	force	NOUN
fumecheng-14015	272	6	microscopy	microscopy	NOUN
fumecheng-14015	272	7	(	(	PUNCT
fumecheng-14015	272	8	afm	afm	PROPN
fumecheng-14015	272	9	)	)	PUNCT
fumecheng-14015	272	10	was	be	AUX
fumecheng-14015	272	11	used	use	VERB
fumecheng-14015	272	12	to	to	PART
fumecheng-14015	272	13	measure	measure	VERB
fumecheng-14015	272	14	the	the	DET
fumecheng-14015	272	15	rms	rm	NOUN
fumecheng-14015	272	16	surface	surface	NOUN
fumecheng-14015	272	17	roughness	roughness	NOUN
fumecheng-14015	272	18	of	of	ADP
fumecheng-14015	272	19	various	various	ADJ
fumecheng-14015	272	20	samples	sample	NOUN
fumecheng-14015	272	21	,	,	PUNCT
fumecheng-14015	272	22	including	include	VERB
fumecheng-14015	272	23	cu	cu	PROPN
fumecheng-14015	272	24	surfaces	surface	NOUN
fumecheng-14015	272	25	with	with	ADP
fumecheng-14015	272	26	2	2	NUM
fumecheng-14015	272	27	nm	nm	NOUN
fumecheng-14015	272	28	cr	cr	NOUN
fumecheng-14015	272	29	and	and	CCONJ
fumecheng-14015	272	30	8	8	NUM
fumecheng-14015	272	31	nm	nm	NOUN
fumecheng-14015	272	32	au	au	ADJ
fumecheng-14015	272	33	layers	layer	NOUN
fumecheng-14015	272	34	,	,	PUNCT
fumecheng-14015	272	35	cu	cu	PROPN
fumecheng-14015	272	36	surfaces	surface	NOUN
fumecheng-14015	272	37	with	with	ADP
fumecheng-14015	272	38	10	10	NUM
fumecheng-14015	272	39	nm	nm	ADJ
fumecheng-14015	272	40	au	au	ADJ
fumecheng-14015	272	41	layers	layer	NOUN
fumecheng-14015	272	42	,	,	PUNCT
fumecheng-14015	272	43	and	and	CCONJ
fumecheng-14015	272	44	cu	cu	PROPN
fumecheng-14015	272	45	rdls	rdl	VERB
fumecheng-14015	272	46	.	.	PUNCT
fumecheng-14015	273	1	the	the	DET
fumecheng-14015	273	2	rms	rm	NOUN
fumecheng-14015	273	3	values	value	NOUN
fumecheng-14015	273	4	were	be	AUX
fumecheng-14015	273	5	3.2	3.2	NUM
fumecheng-14015	273	6	nm	nm	NOUN
fumecheng-14015	273	7	for	for	ADP
fumecheng-14015	273	8	cu	cu	PROPN
fumecheng-14015	273	9	,	,	PUNCT
fumecheng-14015	273	10	2.75	2.75	NUM
fumecheng-14015	273	11	nm	nm	NOUN
fumecheng-14015	273	12	for	for	ADP
fumecheng-14015	273	13	cu	cu	PROPN
fumecheng-14015	273	14	/	/	SYM
fumecheng-14015	273	15	au	au	PROPN
fumecheng-14015	273	16	,	,	PUNCT
fumecheng-14015	273	17	and	and	CCONJ
fumecheng-14015	273	18	2.55	2.55	NUM
fumecheng-14015	273	19	nm	nm	NOUN
fumecheng-14015	273	20	for	for	ADP
fumecheng-14015	273	21	cr	cr	PROPN
fumecheng-14015	273	22	/	/	SYM
fumecheng-14015	273	23	au	au	PROPN
fumecheng-14015	273	24	.	.	PUNCT
fumecheng-14015	274	1	these	these	DET
fumecheng-14015	274	2	findings	finding	NOUN
fumecheng-14015	274	3	demonstrated	demonstrate	VERB
fumecheng-14015	274	4	that	that	SCONJ
fumecheng-14015	274	5	the	the	DET
fumecheng-14015	274	6	cr	cr	PROPN
fumecheng-14015	274	7	/	/	SYM
fumecheng-14015	274	8	au	au	NOUN
fumecheng-14015	274	9	layer	layer	NOUN
fumecheng-14015	274	10	resulted	result	VERB
fumecheng-14015	274	11	in	in	ADP
fumecheng-14015	274	12	a	a	DET
fumecheng-14015	274	13	more	more	ADV
fumecheng-14015	274	14	uniform	uniform	ADJ
fumecheng-14015	274	15	surface	surface	NOUN
fumecheng-14015	274	16	roughness	roughness	NOUN
fumecheng-14015	274	17	,	,	PUNCT
fumecheng-14015	274	18	thereby	thereby	ADV
fumecheng-14015	274	19	improving	improve	VERB
fumecheng-14015	274	20	the	the	DET
fumecheng-14015	274	21	bonding	bonding	NOUN
fumecheng-14015	274	22	quality	quality	NOUN
fumecheng-14015	274	23	and	and	CCONJ
fumecheng-14015	274	24	minimizing	minimize	VERB
fumecheng-14015	274	25	voids	void	NOUN
fumecheng-14015	274	26	.	.	PUNCT
fumecheng-14015	275	1	scanning	scan	VERB
fumecheng-14015	275	2	acoustic	acoustic	ADJ
fumecheng-14015	275	3	tomography	tomography	NOUN
fumecheng-14015	275	4	and	and	CCONJ
fumecheng-14015	275	5	sem	sem	PROPN
fumecheng-14015	275	6	further	far	ADV
fumecheng-14015	275	7	confirmed	confirm	VERB
fumecheng-14015	275	8	the	the	DET
fumecheng-14015	275	9	superior	superior	ADJ
fumecheng-14015	275	10	bonding	bond	VERB
fumecheng-14015	275	11	quality	quality	NOUN
fumecheng-14015	275	12	of	of	ADP
fumecheng-14015	275	13	the	the	DET
fumecheng-14015	275	14	passivated	passivate	VERB
fumecheng-14015	275	15	layer	layer	NOUN
fumecheng-14015	275	16	,	,	PUNCT
fumecheng-14015	275	17	compared	compare	VERB
fumecheng-14015	275	18	with	with	ADP
fumecheng-14015	275	19	that	that	PRON
fumecheng-14015	275	20	of	of	ADP
fumecheng-14015	275	21	the	the	DET
fumecheng-14015	275	22	layers	layer	NOUN
fumecheng-14015	275	23	without	without	ADP
fumecheng-14015	275	24	passivation	passivation	NOUN
fumecheng-14015	275	25	.	.	PUNCT
fumecheng-14015	276	1	934	934	NUM
fumecheng-14015	276	2	s.	s.	PROPN
fumecheng-14015	276	3	choi	choi	PROPN
fumecheng-14015	276	4	,	,	PUNCT
fumecheng-14015	276	5	c.	c.	PROPN
fumecheng-14015	276	6	chen	chen	PROPN
fumecheng-14015	276	7	,	,	PUNCT
fumecheng-14015	276	8	b.	b.	PROPN
fumecheng-14015	276	9	hwang	hwang	PROPN
fumecheng-14015	277	1	a	a	DET
fumecheng-14015	277	2	chip	chip	NOUN
fumecheng-14015	277	3	pull	pull	NOUN
fumecheng-14015	277	4	test	test	NOUN
fumecheng-14015	277	5	was	be	AUX
fumecheng-14015	277	6	conducted	conduct	VERB
fumecheng-14015	277	7	to	to	PART
fumecheng-14015	277	8	assess	assess	VERB
fumecheng-14015	277	9	the	the	DET
fumecheng-14015	277	10	mechanical	mechanical	ADJ
fumecheng-14015	277	11	strength	strength	NOUN
fumecheng-14015	277	12	,	,	PUNCT
fumecheng-14015	277	13	and	and	CCONJ
fumecheng-14015	277	14	revealed	reveal	VERB
fumecheng-14015	277	15	that	that	SCONJ
fumecheng-14015	277	16	the	the	DET
fumecheng-14015	277	17	bonding	bonding	NOUN
fumecheng-14015	277	18	strength	strength	NOUN
fumecheng-14015	277	19	at	at	ADP
fumecheng-14015	277	20	the	the	DET
fumecheng-14015	277	21	wafer	wafer	NOUN
fumecheng-14015	277	22	level	level	NOUN
fumecheng-14015	277	23	exceeded	exceed	VERB
fumecheng-14015	277	24	the	the	DET
fumecheng-14015	277	25	mechanical	mechanical	ADJ
fumecheng-14015	277	26	strength	strength	NOUN
fumecheng-14015	277	27	of	of	ADP
fumecheng-14015	277	28	the	the	DET
fumecheng-14015	277	29	adhesive	adhesive	NOUN
fumecheng-14015	277	30	(	(	PUNCT
fumecheng-14015	277	31	11.89	11.89	NUM
fumecheng-14015	277	32	mpa	mpa	NOUN
fumecheng-14015	277	33	)	)	PUNCT
fumecheng-14015	277	34	,	,	PUNCT
fumecheng-14015	277	35	as	as	SCONJ
fumecheng-14015	277	36	cracks	crack	NOUN
fumecheng-14015	277	37	appeared	appear	VERB
fumecheng-14015	277	38	at	at	ADP
fumecheng-14015	277	39	the	the	DET
fumecheng-14015	277	40	interface	interface	NOUN
fumecheng-14015	277	41	between	between	ADP
fumecheng-14015	277	42	the	the	DET
fumecheng-14015	277	43	fixative	fixative	ADJ
fumecheng-14015	277	44	adhesive	adhesive	NOUN
fumecheng-14015	277	45	and	and	CCONJ
fumecheng-14015	277	46	silicon	silicon	NOUN
fumecheng-14015	277	47	substrate	substrate	NOUN
fumecheng-14015	277	48	.	.	PUNCT
fumecheng-14015	278	1	the	the	DET
fumecheng-14015	278	2	success	success	NOUN
fumecheng-14015	278	3	of	of	ADP
fumecheng-14015	278	4	the	the	DET
fumecheng-14015	278	5	chip	chip	NOUN
fumecheng-14015	278	6	-	-	PUNCT
fumecheng-14015	278	7	level	level	NOUN
fumecheng-14015	278	8	bonding	bonding	NOUN
fumecheng-14015	278	9	,	,	PUNCT
fumecheng-14015	278	10	as	as	ADP
fumecheng-14015	278	11	a	a	DET
fumecheng-14015	278	12	function	function	NOUN
fumecheng-14015	278	13	of	of	ADP
fumecheng-14015	278	14	temperature	temperature	NOUN
fumecheng-14015	278	15	and	and	CCONJ
fumecheng-14015	278	16	time	time	NOUN
fumecheng-14015	278	17	,	,	PUNCT
fumecheng-14015	278	18	is	be	AUX
fumecheng-14015	278	19	presented	present	VERB
fumecheng-14015	278	20	in	in	ADP
fumecheng-14015	278	21	table	table	NOUN
fumecheng-14015	278	22	3	3	NUM
fumecheng-14015	278	23	.	.	PUNCT
fumecheng-14015	278	24	table	table	NOUN
fumecheng-14015	278	25	3	3	NUM
fumecheng-14015	278	26	bonding	bonding	NOUN
fumecheng-14015	278	27	success	success	NOUN
fumecheng-14015	278	28	as	as	ADP
fumecheng-14015	278	29	a	a	DET
fumecheng-14015	278	30	function	function	NOUN
fumecheng-14015	278	31	of	of	ADP
fumecheng-14015	278	32	temperature	temperature	NOUN
fumecheng-14015	278	33	and	and	CCONJ
fumecheng-14015	278	34	time	time	NOUN
fumecheng-14015	279	1	180	180	NUM
fumecheng-14015	279	2	s	s	NUM
fumecheng-14015	279	3	60	60	NUM
fumecheng-14015	279	4	s	s	NOUN
fumecheng-14015	279	5	30	30	NUM
fumecheng-14015	279	6	s	s	NOUN
fumecheng-14015	279	7	15	15	NUM
fumecheng-14015	279	8	s	s	NOUN
fumecheng-14015	279	9	200	200	NUM
fumecheng-14015	279	10	°	°	NOUN
fumecheng-14015	279	11	c	c	NOUN
fumecheng-14015	279	12	success	success	NOUN
fumecheng-14015	279	13	180	180	NUM
fumecheng-14015	279	14	°	°	NOUN
fumecheng-14015	279	15	c	c	NOUN
fumecheng-14015	279	16	success	success	NOUN
fumecheng-14015	279	17	150	150	NUM
fumecheng-14015	279	18	°	°	NOUN
fumecheng-14015	279	19	c	c	NOUN
fumecheng-14015	279	20	success	success	NOUN
fumecheng-14015	279	21	success	success	NOUN
fumecheng-14015	279	22	success	success	NOUN
fumecheng-14015	279	23	120	120	NUM
fumecheng-14015	279	24	°	°	NOUN
fumecheng-14015	279	25	c	c	NOUN
fumecheng-14015	279	26	success	success	NOUN
fumecheng-14015	279	27	success	success	NOUN
fumecheng-14015	279	28	success	success	NOUN
fumecheng-14015	279	29	fail	fail	VERB
fumecheng-14015	279	30	100	100	NUM
fumecheng-14015	279	31	°	°	NOUN
fumecheng-14015	279	32	c	c	NOUN
fumecheng-14015	279	33	success	success	NOUN
fumecheng-14015	279	34	fail	fail	VERB
fumecheng-14015	279	35	70	70	NUM
fumecheng-14015	279	36	°	°	NOUN
fumecheng-14015	279	37	c	c	NOUN
fumecheng-14015	279	38	success	success	NOUN
fumecheng-14015	279	39	fail	fail	VERB
fumecheng-14015	279	40	60	60	NUM
fumecheng-14015	279	41	°	°	NOUN
fumecheng-14015	279	42	c	c	NOUN
fumecheng-14015	279	43	fail	fail	VERB
fumecheng-14015	279	44	despite	despite	SCONJ
fumecheng-14015	279	45	the	the	DET
fumecheng-14015	279	46	cr	cr	NOUN
fumecheng-14015	279	47	wetting	wet	VERB
fumecheng-14015	279	48	layer	layer	NOUN
fumecheng-14015	279	49	,	,	PUNCT
fumecheng-14015	279	50	the	the	DET
fumecheng-14015	279	51	noncontact	noncontact	ADJ
fumecheng-14015	279	52	resistance	resistance	NOUN
fumecheng-14015	279	53	increased	increase	VERB
fumecheng-14015	279	54	to	to	ADP
fumecheng-14015	279	55	approximately	approximately	ADV
fumecheng-14015	279	56	10⁻⁷	10⁻⁷	NUM
fumecheng-14015	279	57	ω·cm²	ω·cm²	NOUN
fumecheng-14015	279	58	at	at	ADP
fumecheng-14015	279	59	supply	supply	NOUN
fumecheng-14015	279	60	currents	current	NOUN
fumecheng-14015	279	61	ranging	range	VERB
fumecheng-14015	279	62	from	from	ADP
fumecheng-14015	279	63	0	0	NUM
fumecheng-14015	279	64	to	to	ADP
fumecheng-14015	279	65	100	100	NUM
fumecheng-14015	279	66	ma	ma	PROPN
fumecheng-14015	279	67	.	.	PUNCT
fumecheng-14015	280	1	additional	additional	ADJ
fumecheng-14015	280	2	tests	test	NOUN
fumecheng-14015	280	3	were	be	AUX
fumecheng-14015	280	4	conducted	conduct	VERB
fumecheng-14015	280	5	to	to	PART
fumecheng-14015	280	6	assess	assess	VERB
fumecheng-14015	280	7	the	the	DET
fumecheng-14015	280	8	mechanical	mechanical	ADJ
fumecheng-14015	280	9	strength	strength	NOUN
fumecheng-14015	280	10	of	of	ADP
fumecheng-14015	280	11	chip	chip	NOUN
fumecheng-14015	280	12	-	-	PUNCT
fumecheng-14015	280	13	level	level	NOUN
fumecheng-14015	280	14	bonding	bonding	NOUN
fumecheng-14015	280	15	with	with	ADP
fumecheng-14015	280	16	au	au	NOUN
fumecheng-14015	280	17	and	and	CCONJ
fumecheng-14015	280	18	cr	cr	X
fumecheng-14015	280	19	/	/	SYM
fumecheng-14015	280	20	au	au	NOUN
fumecheng-14015	280	21	passivation	passivation	NOUN
fumecheng-14015	280	22	layers	layer	NOUN
fumecheng-14015	280	23	at	at	ADP
fumecheng-14015	280	24	200	200	NUM
fumecheng-14015	280	25	and	and	CCONJ
fumecheng-14015	280	26	120	120	NUM
fumecheng-14015	280	27	°	°	NOUN
fumecheng-14015	280	28	c	c	NOUN
fumecheng-14015	280	29	,	,	PUNCT
fumecheng-14015	280	30	as	as	SCONJ
fumecheng-14015	280	31	presented	present	VERB
fumecheng-14015	280	32	in	in	ADP
fumecheng-14015	280	33	table	table	NOUN
fumecheng-14015	280	34	4	4	NUM
fumecheng-14015	280	35	.	.	PUNCT
fumecheng-14015	280	36	table	table	NOUN
fumecheng-14015	280	37	4	4	NUM
fumecheng-14015	280	38	bonding	bonding	NOUN
fumecheng-14015	280	39	strength	strength	NOUN
fumecheng-14015	280	40	of	of	ADP
fumecheng-14015	280	41	au	au	ADP
fumecheng-14015	280	42	and	and	CCONJ
fumecheng-14015	280	43	cr	cr	X
fumecheng-14015	280	44	/	/	SYM
fumecheng-14015	280	45	au	au	NOUN
fumecheng-14015	280	46	passivation	passivation	NOUN
fumecheng-14015	280	47	at	at	ADP
fumecheng-14015	280	48	200	200	NUM
fumecheng-14015	280	49	°	°	NOUN
fumecheng-14015	280	50	c	c	NOUN
fumecheng-14015	280	51	and	and	CCONJ
fumecheng-14015	280	52	120	120	NUM
fumecheng-14015	280	53	°	°	NOUN
fumecheng-14015	280	54	c	c	NOUN
fumecheng-14015	280	55	passivation	passivation	NOUN
fumecheng-14015	280	56	parameter	parameter	NOUN
fumecheng-14015	280	57	(	(	PUNCT
fumecheng-14015	280	58	temperature	temperature	NOUN
fumecheng-14015	280	59	/	/	SYM
fumecheng-14015	280	60	time	time	NOUN
fumecheng-14015	280	61	)	)	PUNCT
fumecheng-14015	280	62	force	force	NOUN
fumecheng-14015	280	63	(	(	PUNCT
fumecheng-14015	280	64	mpa	mpa	PROPN
fumecheng-14015	280	65	)	)	PUNCT
fumecheng-14015	280	66	au	au	ADP
fumecheng-14015	280	67	200	200	NUM
fumecheng-14015	280	68	°	°	NOUN
fumecheng-14015	280	69	c/180	c/180	PROPN
fumecheng-14015	280	70	s	s	PART
fumecheng-14015	280	71	4.69	4.69	NUM
fumecheng-14015	280	72	au	au	ADP
fumecheng-14015	281	1	120	120	NUM
fumecheng-14015	281	2	°	°	NOUN
fumecheng-14015	281	3	c/180	c/180	PROPN
fumecheng-14015	281	4	s	s	PART
fumecheng-14015	281	5	1.19	1.19	NUM
fumecheng-14015	281	6	cr	cr	NOUN
fumecheng-14015	281	7	/	/	SYM
fumecheng-14015	281	8	au	au	PROPN
fumecheng-14015	281	9	200	200	NUM
fumecheng-14015	281	10	°	°	NOUN
fumecheng-14015	281	11	c/180	c/180	PROPN
fumecheng-14015	281	12	s	s	PROPN
fumecheng-14015	281	13	5.11	5.11	NUM
fumecheng-14015	281	14	cr	cr	NOUN
fumecheng-14015	281	15	/	/	SYM
fumecheng-14015	281	16	au	au	PROPN
fumecheng-14015	281	17	120	120	NUM
fumecheng-14015	281	18	°	°	PROPN
fumecheng-14015	281	19	c/180	c/180	PROPN
fumecheng-14015	281	20	s	s	PART
fumecheng-14015	281	21	1.75	1.75	NUM
fumecheng-14015	281	22	as	as	SCONJ
fumecheng-14015	281	23	shown	show	VERB
fumecheng-14015	281	24	in	in	ADP
fumecheng-14015	281	25	table	table	NOUN
fumecheng-14015	281	26	4	4	NUM
fumecheng-14015	281	27	,	,	PUNCT
fumecheng-14015	281	28	the	the	DET
fumecheng-14015	281	29	bonding	bonding	NOUN
fumecheng-14015	281	30	strengths	strength	NOUN
fumecheng-14015	281	31	of	of	ADP
fumecheng-14015	281	32	chips	chip	NOUN
fumecheng-14015	281	33	with	with	ADP
fumecheng-14015	281	34	cr	cr	PRON
fumecheng-14015	281	35	/	/	SYM
fumecheng-14015	281	36	au	au	NOUN
fumecheng-14015	281	37	passivation	passivation	NOUN
fumecheng-14015	281	38	are	be	AUX
fumecheng-14015	281	39	superior	superior	ADJ
fumecheng-14015	281	40	to	to	ADP
fumecheng-14015	281	41	those	those	PRON
fumecheng-14015	281	42	of	of	ADP
fumecheng-14015	281	43	the	the	DET
fumecheng-14015	281	44	chips	chip	NOUN
fumecheng-14015	281	45	with	with	ADP
fumecheng-14015	281	46	au	au	ADJ
fumecheng-14015	281	47	passivation	passivation	NOUN
fumecheng-14015	281	48	at	at	ADP
fumecheng-14015	281	49	both	both	CCONJ
fumecheng-14015	281	50	200	200	NUM
fumecheng-14015	281	51	and	and	CCONJ
fumecheng-14015	281	52	120	120	NUM
fumecheng-14015	281	53	°	°	NOUN
fumecheng-14015	281	54	c	c	NOUN
fumecheng-14015	281	55	.	.	PUNCT
fumecheng-14015	282	1	this	this	PRON
fumecheng-14015	282	2	demonstrates	demonstrate	VERB
fumecheng-14015	282	3	that	that	SCONJ
fumecheng-14015	282	4	cr	cr	NOUN
fumecheng-14015	282	5	wetting	wet	VERB
fumecheng-14015	282	6	and	and	CCONJ
fumecheng-14015	282	7	au	au	VERB
fumecheng-14015	282	8	passivation	passivation	NOUN
fumecheng-14015	282	9	can	can	AUX
fumecheng-14015	282	10	improve	improve	VERB
fumecheng-14015	282	11	the	the	DET
fumecheng-14015	282	12	surface	surface	NOUN
fumecheng-14015	282	13	roughness	roughness	NOUN
fumecheng-14015	282	14	,	,	PUNCT
fumecheng-14015	282	15	enhance	enhance	VERB
fumecheng-14015	282	16	the	the	DET
fumecheng-14015	282	17	bonding	bonding	NOUN
fumecheng-14015	282	18	quality	quality	NOUN
fumecheng-14015	282	19	,	,	PUNCT
fumecheng-14015	282	20	and	and	CCONJ
fumecheng-14015	282	21	ensure	ensure	VERB
fumecheng-14015	282	22	strong	strong	ADJ
fumecheng-14015	282	23	mechanical	mechanical	ADJ
fumecheng-14015	282	24	performance	performance	NOUN
fumecheng-14015	282	25	at	at	ADP
fumecheng-14015	282	26	both	both	CCONJ
fumecheng-14015	282	27	the	the	DET
fumecheng-14015	282	28	chip	chip	NOUN
fumecheng-14015	282	29	and	and	CCONJ
fumecheng-14015	282	30	wafer	wafer	NOUN
fumecheng-14015	282	31	levels	level	NOUN
fumecheng-14015	282	32	.	.	PUNCT
fumecheng-14015	283	1	thus	thus	ADV
fumecheng-14015	283	2	,	,	PUNCT
fumecheng-14015	283	3	we	we	PRON
fumecheng-14015	283	4	can	can	AUX
fumecheng-14015	283	5	conclude	conclude	VERB
fumecheng-14015	283	6	that	that	PRON
fumecheng-14015	283	7	au	au	ADV
fumecheng-14015	283	8	and	and	CCONJ
fumecheng-14015	283	9	cr	cr	X
fumecheng-14015	283	10	/	/	SYM
fumecheng-14015	283	11	au	au	NOUN
fumecheng-14015	283	12	passivation	passivation	NOUN
fumecheng-14015	283	13	not	not	PART
fumecheng-14015	283	14	only	only	ADV
fumecheng-14015	283	15	protects	protect	VERB
fumecheng-14015	283	16	cu	cu	PROPN
fumecheng-14015	283	17	from	from	ADP
fumecheng-14015	283	18	oxidation	oxidation	NOUN
fumecheng-14015	283	19	prior	prior	ADV
fumecheng-14015	283	20	to	to	ADP
fumecheng-14015	283	21	bonding	bonding	NOUN
fumecheng-14015	283	22	at	at	ADP
fumecheng-14015	283	23	ultralow	ultralow	ADJ
fumecheng-14015	283	24	temperatures	temperature	NOUN
fumecheng-14015	283	25	but	but	CCONJ
fumecheng-14015	283	26	also	also	ADV
fumecheng-14015	283	27	facilitates	facilitate	VERB
fumecheng-14015	283	28	cu	cu	NOUN
fumecheng-14015	283	29	diffusion	diffusion	NOUN
fumecheng-14015	283	30	to	to	ADP
fumecheng-14015	283	31	the	the	DET
fumecheng-14015	283	32	bonding	bonding	NOUN
fumecheng-14015	283	33	surface	surface	NOUN
fumecheng-14015	283	34	.	.	PUNCT
fumecheng-14015	284	1	in	in	ADP
fumecheng-14015	284	2	particular	particular	ADJ
fumecheng-14015	284	3	,	,	PUNCT
fumecheng-14015	284	4	cr	cr	PART
fumecheng-14015	284	5	/	/	SYM
fumecheng-14015	284	6	au	au	NOUN
fumecheng-14015	284	7	passivation	passivation	NOUN
fumecheng-14015	284	8	enhances	enhance	VERB
fumecheng-14015	284	9	the	the	DET
fumecheng-14015	284	10	surface	surface	NOUN
fumecheng-14015	284	11	roughness	roughness	NOUN
fumecheng-14015	284	12	,	,	PUNCT
fumecheng-14015	284	13	further	far	ADV
fumecheng-14015	284	14	improving	improve	VERB
fumecheng-14015	284	15	the	the	DET
fumecheng-14015	284	16	bonding	bonding	NOUN
fumecheng-14015	284	17	quality	quality	NOUN
fumecheng-14015	284	18	.	.	PUNCT
fumecheng-14015	285	1	lee	lee	PROPN
fumecheng-14015	285	2	et	et	PROPN
fumecheng-14015	285	3	al	al	PROPN
fumecheng-14015	285	4	.	.	PUNCT
fumecheng-14015	286	1	[	[	X
fumecheng-14015	286	2	91	91	NUM
fumecheng-14015	286	3	]	]	PUNCT
fumecheng-14015	286	4	reported	report	VERB
fumecheng-14015	286	5	a	a	DET
fumecheng-14015	286	6	representative	representative	ADJ
fumecheng-14015	286	7	example	example	NOUN
fumecheng-14015	286	8	of	of	ADP
fumecheng-14015	286	9	low	low	ADJ
fumecheng-14015	286	10	-	-	PUNCT
fumecheng-14015	286	11	temperature	temperature	NOUN
fumecheng-14015	286	12	cu	cu	PROPN
fumecheng-14015	286	13	-	-	PUNCT
fumecheng-14015	286	14	cu	cu	PROPN
fumecheng-14015	286	15	hybrid	hybrid	ADJ
fumecheng-14015	286	16	bonding	bonding	NOUN
fumecheng-14015	286	17	enabled	enable	VERB
fumecheng-14015	286	18	by	by	ADP
fumecheng-14015	286	19	noble	noble	ADJ
fumecheng-14015	286	20	-	-	PUNCT
fumecheng-14015	286	21	metal	metal	NOUN
fumecheng-14015	286	22	passivation	passivation	NOUN
fumecheng-14015	286	23	nanolayers	nanolayer	NOUN
fumecheng-14015	286	24	,	,	PUNCT
fumecheng-14015	286	25	specifically	specifically	ADV
fumecheng-14015	286	26	au	au	VERB
fumecheng-14015	286	27	and	and	CCONJ
fumecheng-14015	286	28	ag	ag	PROPN
fumecheng-14015	286	29	,	,	PUNCT
fumecheng-14015	286	30	deposited	deposit	VERB
fumecheng-14015	286	31	on	on	ADP
fumecheng-14015	286	32	cu	cu	PROPN
fumecheng-14015	286	33	pads	pad	NOUN
fumecheng-14015	286	34	for	for	ADP
fumecheng-14015	286	35	cu	cu	PROPN
fumecheng-14015	286	36	/	/	SYM
fumecheng-14015	286	37	sio₂	sio₂	PROPN
fumecheng-14015	286	38	hybrid	hybrid	ADJ
fumecheng-14015	286	39	bonding	bonding	NOUN
fumecheng-14015	286	40	applications	application	NOUN
fumecheng-14015	286	41	.	.	PUNCT
fumecheng-14015	287	1	in	in	ADP
fumecheng-14015	287	2	their	their	PRON
fumecheng-14015	287	3	process	process	NOUN
fumecheng-14015	287	4	,	,	PUNCT
fumecheng-14015	287	5	~12	~12	VERB
fumecheng-14015	287	6	nm	nm	ADV
fumecheng-14015	287	7	au	au	ADV
fumecheng-14015	287	8	and	and	CCONJ
fumecheng-14015	287	9	~15	~15	PUNCT
fumecheng-14015	287	10	nm	nm	PRON
fumecheng-14015	287	11	ag	ag	PROPN
fumecheng-14015	287	12	were	be	AUX
fumecheng-14015	287	13	formed	form	VERB
fumecheng-14015	287	14	by	by	ADP
fumecheng-14015	287	15	e	e	NOUN
fumecheng-14015	287	16	-	-	NOUN
fumecheng-14015	287	17	beam	beam	ADJ
fumecheng-14015	287	18	evaporation	evaporation	NOUN
fumecheng-14015	287	19	on	on	ADP
fumecheng-14015	287	20	1	1	NUM
fumecheng-14015	287	21	µm	µm	ADP
fumecheng-14015	287	22	cu	cu	PROPN
fumecheng-14015	287	23	films	film	NOUN
fumecheng-14015	287	24	,	,	PUNCT
fumecheng-14015	287	25	with	with	ADP
fumecheng-14015	287	26	the	the	DET
fumecheng-14015	287	27	nanolayers	nanolayer	NOUN
fumecheng-14015	287	28	acting	act	VERB
fumecheng-14015	287	29	simultaneously	simultaneously	ADV
fumecheng-14015	287	30	as	as	ADP
fumecheng-14015	287	31	oxidation	oxidation	NOUN
fumecheng-14015	287	32	barriers	barrier	NOUN
fumecheng-14015	287	33	and	and	CCONJ
fumecheng-14015	287	34	diffusion	diffusion	NOUN
fumecheng-14015	287	35	mediators	mediator	NOUN
fumecheng-14015	287	36	during	during	ADP
fumecheng-14015	287	37	bonding	bonding	NOUN
fumecheng-14015	287	38	at	at	ADP
fumecheng-14015	287	39	180	180	NUM
fumecheng-14015	287	40	°	°	NOUN
fumecheng-14015	287	41	c	c	NOUN
fumecheng-14015	287	42	followed	follow	VERB
fumecheng-14015	287	43	by	by	ADP
fumecheng-14015	287	44	annealing	anneal	VERB
fumecheng-14015	287	45	at	at	ADP
fumecheng-14015	287	46	200	200	NUM
fumecheng-14015	287	47	°	°	NOUN
fumecheng-14015	287	48	c	c	X
fumecheng-14015	287	49	.	.	PUNCT
fumecheng-14015	287	50	fig	fig	NOUN
fumecheng-14015	287	51	.	.	PUNCT
fumecheng-14015	288	1	7	7	NUM
fumecheng-14015	288	2	(	(	PUNCT
fumecheng-14015	288	3	d	d	NOUN
fumecheng-14015	288	4	)	)	PUNCT
fumecheng-14015	288	5	in	in	ADP
fumecheng-14015	288	6	their	their	PRON
fumecheng-14015	288	7	work	work	NOUN
fumecheng-14015	288	8	schematically	schematically	NOUN
fumecheng-14015	288	9	illustrates	illustrate	VERB
fumecheng-14015	288	10	the	the	DET
fumecheng-14015	288	11	heating	heating	NOUN
fumecheng-14015	288	12	test	test	NOUN
fumecheng-14015	288	13	used	use	VERB
fumecheng-14015	288	14	to	to	PART
fumecheng-14015	288	15	quantify	quantify	VERB
fumecheng-14015	288	16	diffusion	diffusion	NOUN
fumecheng-14015	288	17	between	between	ADP
fumecheng-14015	288	18	the	the	DET
fumecheng-14015	288	19	passivation	passivation	NOUN
fumecheng-14015	288	20	metal	metal	NOUN
fumecheng-14015	288	21	(	(	PUNCT
fumecheng-14015	288	22	au	au	ADJ
fumecheng-14015	288	23	or	or	CCONJ
fumecheng-14015	288	24	ag	ag	PROPN
fumecheng-14015	288	25	)	)	PUNCT
fumecheng-14015	288	26	and	and	CCONJ
fumecheng-14015	288	27	cu	cu	PROPN
fumecheng-14015	288	28	.	.	PUNCT
fumecheng-14015	289	1	a	a	DET
fumecheng-14015	289	2	ti	ti	NOUN
fumecheng-14015	289	3	adhesion	adhesion	NOUN
fumecheng-14015	289	4	layer	layer	NOUN
fumecheng-14015	289	5	is	be	AUX
fumecheng-14015	289	6	first	first	ADV
fumecheng-14015	289	7	sputtered	sputter	VERB
fumecheng-14015	289	8	on	on	ADP
fumecheng-14015	289	9	thermally	thermally	ADV
fumecheng-14015	289	10	oxidized	oxidize	VERB
fumecheng-14015	289	11	si	si	NOUN
fumecheng-14015	289	12	,	,	PUNCT
fumecheng-14015	289	13	followed	follow	VERB
fumecheng-14015	289	14	by	by	ADP
fumecheng-14015	289	15	a	a	DET
fumecheng-14015	289	16	1	1	NUM
fumecheng-14015	289	17	µm	µm	ADP
fumecheng-14015	289	18	cu	cu	NOUN
fumecheng-14015	289	19	film	film	NOUN
fumecheng-14015	289	20	,	,	PUNCT
fumecheng-14015	289	21	on	on	ADP
fumecheng-14015	289	22	top	top	NOUN
fumecheng-14015	289	23	of	of	ADP
fumecheng-14015	289	24	which	which	PRON
fumecheng-14015	289	25	a	a	DET
fumecheng-14015	289	26	nanometer	nanometer	NOUN
fumecheng-14015	289	27	-	-	PUNCT
fumecheng-14015	289	28	scale	scale	NOUN
fumecheng-14015	289	29	au	au	NOUN
fumecheng-14015	289	30	or	or	CCONJ
fumecheng-14015	289	31	ag	ag	PROPN
fumecheng-14015	289	32	layer	layer	NOUN
fumecheng-14015	289	33	is	be	AUX
fumecheng-14015	289	34	evaporated	evaporate	VERB
fumecheng-14015	289	35	.	.	PUNCT
fumecheng-14015	290	1	this	this	DET
fumecheng-14015	290	2	stack	stack	NOUN
fumecheng-14015	290	3	is	be	AUX
fumecheng-14015	290	4	then	then	ADV
fumecheng-14015	290	5	subjected	subject	VERB
fumecheng-14015	290	6	to	to	ADP
fumecheng-14015	290	7	isothermal	isothermal	ADJ
fumecheng-14015	290	8	heating	heating	NOUN
fumecheng-14015	290	9	at	at	ADP
fumecheng-14015	290	10	25	25	NUM
fumecheng-14015	290	11	,	,	PUNCT
fumecheng-14015	290	12	100	100	NUM
fumecheng-14015	290	13	,	,	PUNCT
fumecheng-14015	290	14	150	150	NUM
fumecheng-14015	290	15	,	,	PUNCT
fumecheng-14015	290	16	and	and	CCONJ
fumecheng-14015	290	17	200	200	NUM
fumecheng-14015	290	18	°	°	NOUN
fumecheng-14015	290	19	c	c	NOUN
fumecheng-14015	290	20	for	for	ADP
fumecheng-14015	290	21	1	1	NUM
fumecheng-14015	290	22	h	h	NOUN
fumecheng-14015	290	23	,	,	PUNCT
fumecheng-14015	290	24	and	and	CCONJ
fumecheng-14015	290	25	the	the	DET
fumecheng-14015	290	26	evolution	evolution	NOUN
fumecheng-14015	290	27	of	of	ADP
fumecheng-14015	290	28	the	the	DET
fumecheng-14015	290	29	surface	surface	NOUN
fumecheng-14015	290	30	chemistry	chemistry	NOUN
fumecheng-14015	290	31	and	and	CCONJ
fumecheng-14015	290	32	depth	depth	NOUN
fumecheng-14015	290	33	profile	profile	NOUN
fumecheng-14015	290	34	of	of	ADP
fumecheng-14015	290	35	au	au	PROPN
fumecheng-14015	290	36	/	/	SYM
fumecheng-14015	290	37	ag	ag	PROPN
fumecheng-14015	290	38	,	,	PUNCT
fumecheng-14015	290	39	cu	cu	PROPN
fumecheng-14015	290	40	,	,	PUNCT
fumecheng-14015	290	41	and	and	CCONJ
fumecheng-14015	290	42	o	o	NOUN
fumecheng-14015	290	43	is	be	AUX
fumecheng-14015	290	44	analyzed	analyze	VERB
fumecheng-14015	290	45	by	by	ADP
fumecheng-14015	290	46	x	x	NOUN
fumecheng-14015	290	47	-	-	NOUN
fumecheng-14015	290	48	ray	ray	NOUN
fumecheng-14015	290	49	photoelectron	photoelectron	PROPN
fumecheng-14015	290	50	cu	cu	PROPN
fumecheng-14015	290	51	-	-	PROPN
fumecheng-14015	290	52	cu	cu	PROPN
fumecheng-14015	290	53	mechanical	mechanical	ADJ
fumecheng-14015	290	54	bonding	bonding	NOUN
fumecheng-14015	290	55	for	for	ADP
fumecheng-14015	290	56	3d	3d	NOUN
fumecheng-14015	290	57	integration	integration	NOUN
fumecheng-14015	290	58	of	of	ADP
fumecheng-14015	290	59	the	the	DET
fumecheng-14015	290	60	next	next	ADJ
fumecheng-14015	290	61	generation	generation	NOUN
fumecheng-14015	290	62	electronic	electronic	ADJ
fumecheng-14015	290	63	chips	chip	NOUN
fumecheng-14015	290	64	...	...	PUNCT
fumecheng-14015	290	65	935	935	NUM
fumecheng-14015	290	66	spectroscopy	spectroscopy	NOUN
fumecheng-14015	290	67	(	(	PUNCT
fumecheng-14015	290	68	xps	xps	PROPN
fumecheng-14015	290	69	)	)	PUNCT
fumecheng-14015	290	70	and	and	CCONJ
fumecheng-14015	290	71	tem	tem	PROPN
fumecheng-14015	290	72	.	.	PUNCT
fumecheng-14015	291	1	through	through	ADP
fumecheng-14015	291	2	this	this	DET
fumecheng-14015	291	3	protocol	protocol	NOUN
fumecheng-14015	291	4	,	,	PUNCT
fumecheng-14015	291	5	lee	lee	PROPN
fumecheng-14015	291	6	et	et	PROPN
fumecheng-14015	291	7	al	al	PROPN
fumecheng-14015	291	8	.	.	PUNCT
fumecheng-14015	292	1	[	[	X
fumecheng-14015	292	2	91	91	NUM
fumecheng-14015	292	3	]	]	PUNCT
fumecheng-14015	292	4	extract	extract	NOUN
fumecheng-14015	292	5	diffusion	diffusion	NOUN
fumecheng-14015	292	6	activation	activation	NOUN
fumecheng-14015	292	7	energies	energy	NOUN
fumecheng-14015	292	8	for	for	ADP
fumecheng-14015	292	9	both	both	DET
fumecheng-14015	292	10	au↔cu	au↔cu	NOUN
fumecheng-14015	292	11	and	and	CCONJ
fumecheng-14015	292	12	ag↔cu	ag↔cu	NOUN
fumecheng-14015	292	13	,	,	PUNCT
fumecheng-14015	292	14	showing	show	VERB
fumecheng-14015	292	15	that	that	SCONJ
fumecheng-14015	292	16	au	au	ADP
fumecheng-14015	292	17	diffuses	diffuse	VERB
fumecheng-14015	292	18	more	more	ADV
fumecheng-14015	292	19	readily	readily	ADV
fumecheng-14015	292	20	into	into	ADP
fumecheng-14015	292	21	cu	cu	PROPN
fumecheng-14015	292	22	than	than	ADP
fumecheng-14015	292	23	cu	cu	PROPN
fumecheng-14015	292	24	into	into	ADP
fumecheng-14015	292	25	au	au	PROPN
fumecheng-14015	292	26	,	,	PUNCT
fumecheng-14015	292	27	whereas	whereas	SCONJ
fumecheng-14015	292	28	for	for	ADP
fumecheng-14015	292	29	ag	ag	PROPN
fumecheng-14015	292	30	–	–	PUNCT
fumecheng-14015	292	31	cu	cu	NOUN
fumecheng-14015	292	32	the	the	DET
fumecheng-14015	292	33	opposite	opposite	ADJ
fumecheng-14015	292	34	trend	trend	NOUN
fumecheng-14015	292	35	holds	hold	VERB
fumecheng-14015	292	36	.	.	PUNCT
fumecheng-14015	293	1	these	these	DET
fumecheng-14015	293	2	data	datum	NOUN
fumecheng-14015	293	3	position	position	NOUN
fumecheng-14015	293	4	au	au	ADJ
fumecheng-14015	293	5	and	and	CCONJ
fumecheng-14015	293	6	ag	ag	PROPN
fumecheng-14015	293	7	nanolayers	nanolayer	NOUN
fumecheng-14015	293	8	as	as	ADP
fumecheng-14015	293	9	tunable	tunable	ADJ
fumecheng-14015	293	10	passivation	passivation	NOUN
fumecheng-14015	293	11	/	/	SYM
fumecheng-14015	293	12	diffusion	diffusion	NOUN
fumecheng-14015	293	13	layers	layer	NOUN
fumecheng-14015	293	14	that	that	PRON
fumecheng-14015	293	15	enable	enable	VERB
fumecheng-14015	293	16	solid	solid	ADJ
fumecheng-14015	293	17	-	-	PUNCT
fumecheng-14015	293	18	state	state	NOUN
fumecheng-14015	293	19	interdiffusion	interdiffusion	NOUN
fumecheng-14015	293	20	at	at	ADP
fumecheng-14015	293	21	≤200	≤200	PROPN
fumecheng-14015	293	22	°	°	PROPN
fumecheng-14015	293	23	c	c	PROPN
fumecheng-14015	293	24	while	while	SCONJ
fumecheng-14015	293	25	maintaining	maintain	VERB
fumecheng-14015	293	26	cu	cu	PROPN
fumecheng-14015	293	27	surface	surface	NOUN
fumecheng-14015	293	28	protection	protection	NOUN
fumecheng-14015	293	29	during	during	ADP
fumecheng-14015	293	30	the	the	DET
fumecheng-14015	293	31	pre	pre	ADJ
fumecheng-14015	293	32	-	-	ADJ
fumecheng-14015	293	33	bond	bond	ADJ
fumecheng-14015	293	34	steps	step	NOUN
fumecheng-14015	293	35	.	.	PUNCT
fumecheng-14015	294	1	fig	fig	NOUN
fumecheng-14015	294	2	.	.	PUNCT
fumecheng-14015	295	1	7	7	NUM
fumecheng-14015	295	2	(	(	PUNCT
fumecheng-14015	295	3	d	d	NOUN
fumecheng-14015	295	4	)	)	PUNCT
fumecheng-14015	295	5	focuses	focus	VERB
fumecheng-14015	295	6	specifically	specifically	ADV
fumecheng-14015	295	7	on	on	ADP
fumecheng-14015	295	8	the	the	DET
fumecheng-14015	295	9	cu	cu	PROPN
fumecheng-14015	295	10	-	-	PROPN
fumecheng-14015	295	11	cu	cu	PROPN
fumecheng-14015	295	12	bonding	bonding	NOUN
fumecheng-14015	295	13	interface	interface	NOUN
fumecheng-14015	295	14	when	when	SCONJ
fumecheng-14015	295	15	an	an	DET
fumecheng-14015	295	16	au	au	ADJ
fumecheng-14015	295	17	nanolayer	nanolayer	NOUN
fumecheng-14015	295	18	is	be	AUX
fumecheng-14015	295	19	employed	employ	VERB
fumecheng-14015	295	20	as	as	ADP
fumecheng-14015	295	21	the	the	DET
fumecheng-14015	295	22	passivation	passivation	NOUN
fumecheng-14015	295	23	layer	layer	NOUN
fumecheng-14015	295	24	.	.	PUNCT
fumecheng-14015	296	1	sem	sem	PROPN
fumecheng-14015	296	2	and	and	CCONJ
fumecheng-14015	296	3	tem	tem	PROPN
fumecheng-14015	296	4	observations	observation	NOUN
fumecheng-14015	296	5	reveal	reveal	VERB
fumecheng-14015	296	6	a	a	DET
fumecheng-14015	296	7	porous	porous	ADJ
fumecheng-14015	296	8	au	au	ADJ
fumecheng-14015	296	9	nanolayer	nanolayer	NOUN
fumecheng-14015	296	10	at	at	ADP
fumecheng-14015	296	11	the	the	DET
fumecheng-14015	296	12	bonding	bonding	NOUN
fumecheng-14015	296	13	interface	interface	NOUN
fumecheng-14015	296	14	,	,	PUNCT
fumecheng-14015	296	15	with	with	ADP
fumecheng-14015	296	16	the	the	DET
fumecheng-14015	296	17	dark	dark	ADJ
fumecheng-14015	296	18	contrast	contrast	NOUN
fumecheng-14015	296	19	region	region	NOUN
fumecheng-14015	296	20	corresponding	correspond	VERB
fumecheng-14015	296	21	to	to	ADP
fumecheng-14015	296	22	cu	cu	PROPN
fumecheng-14015	296	23	together	together	ADV
fumecheng-14015	296	24	with	with	ADP
fumecheng-14015	296	25	oxygen	oxygen	NOUN
fumecheng-14015	296	26	that	that	PRON
fumecheng-14015	296	27	was	be	AUX
fumecheng-14015	296	28	introduced	introduce	VERB
fumecheng-14015	296	29	prior	prior	ADV
fumecheng-14015	296	30	to	to	ADP
fumecheng-14015	296	31	bonding	bonding	NOUN
fumecheng-14015	296	32	,	,	PUNCT
fumecheng-14015	296	33	and	and	CCONJ
fumecheng-14015	296	34	a	a	DET
fumecheng-14015	296	35	bright	bright	ADJ
fumecheng-14015	296	36	narrow	narrow	ADJ
fumecheng-14015	296	37	band	band	NOUN
fumecheng-14015	296	38	associated	associate	VERB
fumecheng-14015	296	39	with	with	ADP
fumecheng-14015	296	40	au	au	PROPN
fumecheng-14015	296	41	along	along	ADP
fumecheng-14015	296	42	the	the	DET
fumecheng-14015	296	43	interface	interface	NOUN
fumecheng-14015	296	44	.	.	PUNCT
fumecheng-14015	297	1	the	the	DET
fumecheng-14015	297	2	accompanying	accompanying	ADJ
fumecheng-14015	297	3	energy	energy	NOUN
fumecheng-14015	297	4	dispersive	dispersive	ADJ
fumecheng-14015	297	5	spectroscopy	spectroscopy	NOUN
fumecheng-14015	297	6	(	(	PUNCT
fumecheng-14015	297	7	eds	ed	NOUN
fumecheng-14015	297	8	)	)	PUNCT
fumecheng-14015	297	9	line	line	NOUN
fumecheng-14015	297	10	scan	scan	NOUN
fumecheng-14015	297	11	in	in	ADP
fumecheng-14015	297	12	fig	fig	NOUN
fumecheng-14015	297	13	.	.	PUNCT
fumecheng-14015	297	14	7	7	NUM
fumecheng-14015	297	15	(	(	PUNCT
fumecheng-14015	297	16	d	d	NOUN
fumecheng-14015	297	17	)	)	PUNCT
fumecheng-14015	297	18	demonstrates	demonstrate	VERB
fumecheng-14015	297	19	a	a	DET
fumecheng-14015	297	20	pronounced	pronounced	ADJ
fumecheng-14015	297	21	oxygen	oxygen	NOUN
fumecheng-14015	297	22	peak	peak	NOUN
fumecheng-14015	297	23	localized	localize	VERB
fumecheng-14015	297	24	at	at	ADP
fumecheng-14015	297	25	the	the	DET
fumecheng-14015	297	26	au	au	PROPN
fumecheng-14015	297	27	/	/	SYM
fumecheng-14015	297	28	cu	cu	PROPN
fumecheng-14015	297	29	interface	interface	NOUN
fumecheng-14015	297	30	,	,	PUNCT
fumecheng-14015	297	31	indicating	indicate	VERB
fumecheng-14015	297	32	that	that	SCONJ
fumecheng-14015	297	33	oxygen	oxygen	NOUN
fumecheng-14015	297	34	contamination	contamination	NOUN
fumecheng-14015	297	35	was	be	AUX
fumecheng-14015	297	36	already	already	ADV
fumecheng-14015	297	37	present	present	ADJ
fumecheng-14015	297	38	at	at	ADP
fumecheng-14015	297	39	the	the	DET
fumecheng-14015	297	40	au	au	PROPN
fumecheng-14015	297	41	–	–	PUNCT
fumecheng-14015	297	42	cu	cu	NOUN
fumecheng-14015	297	43	interface	interface	NOUN
fumecheng-14015	297	44	before	before	ADP
fumecheng-14015	297	45	bonding	bonding	NOUN
fumecheng-14015	297	46	and	and	CCONJ
fumecheng-14015	297	47	that	that	SCONJ
fumecheng-14015	297	48	the	the	DET
fumecheng-14015	297	49	porous	porous	ADJ
fumecheng-14015	297	50	morphology	morphology	NOUN
fumecheng-14015	297	51	of	of	ADP
fumecheng-14015	297	52	the	the	DET
fumecheng-14015	297	53	au	au	PROPN
fumecheng-14015	297	54	nanolayer	nanolayer	NOUN
fumecheng-14015	297	55	allowed	allow	VERB
fumecheng-14015	297	56	limited	limited	ADJ
fumecheng-14015	297	57	oxygen	oxygen	NOUN
fumecheng-14015	297	58	ingress	ingress	NOUN
fumecheng-14015	297	59	without	without	ADP
fumecheng-14015	297	60	forming	form	VERB
fumecheng-14015	297	61	bulk	bulk	ADJ
fumecheng-14015	297	62	intermetallics	intermetallic	NOUN
fumecheng-14015	297	63	.	.	PUNCT
fumecheng-14015	298	1	nonetheless	nonetheless	ADV
fumecheng-14015	298	2	,	,	PUNCT
fumecheng-14015	298	3	after	after	ADP
fumecheng-14015	298	4	bonding	bonding	NOUN
fumecheng-14015	298	5	and	and	CCONJ
fumecheng-14015	298	6	annealing	annealing	NOUN
fumecheng-14015	298	7	,	,	PUNCT
fumecheng-14015	298	8	au	au	X
fumecheng-14015	298	9	is	be	AUX
fumecheng-14015	298	10	largely	largely	ADV
fumecheng-14015	298	11	diffused	diffuse	VERB
fumecheng-14015	298	12	into	into	ADP
fumecheng-14015	298	13	cu	cu	PROPN
fumecheng-14015	298	14	,	,	PUNCT
fumecheng-14015	298	15	and	and	CCONJ
fumecheng-14015	298	16	the	the	DET
fumecheng-14015	298	17	interface	interface	NOUN
fumecheng-14015	298	18	is	be	AUX
fumecheng-14015	298	19	filled	fill	VERB
fumecheng-14015	298	20	predominantly	predominantly	ADV
fumecheng-14015	298	21	with	with	ADP
fumecheng-14015	298	22	cu	cu	PROPN
fumecheng-14015	298	23	and	and	CCONJ
fumecheng-14015	298	24	o	o	NOUN
fumecheng-14015	298	25	residues	residue	NOUN
fumecheng-14015	298	26	rather	rather	ADV
fumecheng-14015	298	27	than	than	ADP
fumecheng-14015	298	28	a	a	DET
fumecheng-14015	298	29	distinct	distinct	ADJ
fumecheng-14015	298	30	au	au	ADJ
fumecheng-14015	298	31	layer	layer	NOUN
fumecheng-14015	298	32	.	.	PUNCT
fumecheng-14015	299	1	from	from	ADP
fumecheng-14015	299	2	the	the	DET
fumecheng-14015	299	3	viewpoint	viewpoint	NOUN
fumecheng-14015	299	4	of	of	ADP
fumecheng-14015	299	5	metal	metal	NOUN
fumecheng-14015	299	6	passivation	passivation	NOUN
fumecheng-14015	299	7	engineering	engineering	NOUN
fumecheng-14015	299	8	(	(	PUNCT
fumecheng-14015	299	9	e.g.	e.g.	ADV
fumecheng-14015	299	10	,	,	PUNCT
fumecheng-14015	299	11	au	au	PROPN
fumecheng-14015	299	12	/	/	SYM
fumecheng-14015	299	13	ag	ag	PROPN
fumecheng-14015	299	14	/	/	SYM
fumecheng-14015	299	15	cr	cr	PROPN
fumecheng-14015	299	16	passivation	passivation	NOUN
fumecheng-14015	299	17	schemes	scheme	NOUN
fumecheng-14015	299	18	in	in	ADP
fumecheng-14015	299	19	cu	cu	PROPN
fumecheng-14015	299	20	hybrid	hybrid	ADJ
fumecheng-14015	299	21	bonding	bonding	NOUN
fumecheng-14015	299	22	)	)	PUNCT
fumecheng-14015	299	23	,	,	PUNCT
fumecheng-14015	299	24	fig	fig	NOUN
fumecheng-14015	299	25	.	.	PUNCT
fumecheng-14015	299	26	7	7	NUM
fumecheng-14015	299	27	shows	show	VERB
fumecheng-14015	299	28	that	that	SCONJ
fumecheng-14015	299	29	an	an	DET
fumecheng-14015	299	30	ultrathin	ultrathin	NOUN
fumecheng-14015	299	31	au	au	NOUN
fumecheng-14015	299	32	passivation	passivation	NOUN
fumecheng-14015	299	33	nanolayer	nanolayer	NOUN
fumecheng-14015	299	34	can	can	AUX
fumecheng-14015	299	35	both	both	PRON
fumecheng-14015	299	36	suppress	suppress	VERB
fumecheng-14015	299	37	cu	cu	NOUN
fumecheng-14015	299	38	oxidation	oxidation	NOUN
fumecheng-14015	299	39	sufficiently	sufficiently	ADV
fumecheng-14015	299	40	for	for	ADP
fumecheng-14015	299	41	lowtemperature	lowtemperature	NOUN
fumecheng-14015	299	42	bonding	bonding	NOUN
fumecheng-14015	299	43	and	and	CCONJ
fumecheng-14015	299	44	participate	participate	VERB
fumecheng-14015	299	45	in	in	ADP
fumecheng-14015	299	46	controlled	control	VERB
fumecheng-14015	299	47	interdiffusion	interdiffusion	NOUN
fumecheng-14015	299	48	,	,	PUNCT
fumecheng-14015	299	49	while	while	SCONJ
fumecheng-14015	299	50	the	the	DET
fumecheng-14015	299	51	porous	porous	ADJ
fumecheng-14015	299	52	nature	nature	NOUN
fumecheng-14015	299	53	and	and	CCONJ
fumecheng-14015	299	54	oxygen	oxygen	NOUN
fumecheng-14015	299	55	uptake	uptake	NOUN
fumecheng-14015	299	56	at	at	ADP
fumecheng-14015	299	57	the	the	DET
fumecheng-14015	299	58	interface	interface	NOUN
fumecheng-14015	299	59	must	must	AUX
fumecheng-14015	299	60	be	be	AUX
fumecheng-14015	299	61	carefully	carefully	ADV
fumecheng-14015	299	62	managed	manage	VERB
fumecheng-14015	299	63	to	to	PART
fumecheng-14015	299	64	optimize	optimize	VERB
fumecheng-14015	299	65	mechanical	mechanical	ADJ
fumecheng-14015	299	66	strength	strength	NOUN
fumecheng-14015	299	67	and	and	CCONJ
fumecheng-14015	299	68	interfacial	interfacial	ADJ
fumecheng-14015	299	69	cleanliness	cleanliness	NOUN
fumecheng-14015	299	70	.	.	PUNCT
fumecheng-14015	300	1	fig	fig	NOUN
fumecheng-14015	300	2	.	.	PUNCT
fumecheng-14015	301	1	7	7	NUM
fumecheng-14015	301	2	(	(	PUNCT
fumecheng-14015	301	3	a	a	PRON
fumecheng-14015	301	4	)	)	PUNCT
fumecheng-14015	301	5	fe	fe	NOUN
fumecheng-14015	301	6	-	-	NOUN
fumecheng-14015	301	7	sem	sem	NOUN
fumecheng-14015	301	8	and	and	CCONJ
fumecheng-14015	301	9	(	(	PUNCT
fumecheng-14015	301	10	b	b	X
fumecheng-14015	301	11	)	)	PUNCT
fumecheng-14015	301	12	tem	tem	PROPN
fumecheng-14015	301	13	analysis	analysis	NOUN
fumecheng-14015	301	14	results	result	NOUN
fumecheng-14015	301	15	of	of	ADP
fumecheng-14015	301	16	a	a	DET
fumecheng-14015	301	17	bonded	bond	VERB
fumecheng-14015	301	18	wafer	wafer	NOUN
fumecheng-14015	301	19	using	use	VERB
fumecheng-14015	301	20	an	an	DET
fumecheng-14015	301	21	ag	ag	PROPN
fumecheng-14015	301	22	passivation	passivation	NOUN
fumecheng-14015	301	23	nanolayer	nanolayer	NOUN
fumecheng-14015	301	24	and	and	CCONJ
fumecheng-14015	301	25	(	(	PUNCT
fumecheng-14015	301	26	c	c	X
fumecheng-14015	301	27	)	)	PUNCT
fumecheng-14015	301	28	eds	ed	NOUN
fumecheng-14015	301	29	scanning	scan	VERB
fumecheng-14015	301	30	results	result	NOUN
fumecheng-14015	301	31	and	and	CCONJ
fumecheng-14015	301	32	(	(	PUNCT
fumecheng-14015	301	33	d	d	NOUN
fumecheng-14015	301	34	)	)	PUNCT
fumecheng-14015	301	35	schematic	schematic	ADJ
fumecheng-14015	301	36	diagram	diagram	NOUN
fumecheng-14015	301	37	of	of	ADP
fumecheng-14015	301	38	au	au	X
fumecheng-14015	301	39	and	and	CCONJ
fumecheng-14015	301	40	ag	ag	PROPN
fumecheng-14015	301	41	passivation	passivation	NOUN
fumecheng-14015	301	42	on	on	ADP
fumecheng-14015	301	43	cu	cu	PROPN
fumecheng-14015	301	44	[	[	X
fumecheng-14015	301	45	91	91	NUM
fumecheng-14015	301	46	]	]	SYM
fumecheng-14015	301	47	936	936	NUM
fumecheng-14015	301	48	s.	s.	PROPN
fumecheng-14015	301	49	choi	choi	PROPN
fumecheng-14015	301	50	,	,	PUNCT
fumecheng-14015	301	51	c.	c.	PROPN
fumecheng-14015	301	52	chen	chen	PROPN
fumecheng-14015	301	53	,	,	PUNCT
fumecheng-14015	301	54	b.	b.	PROPN
fumecheng-14015	301	55	hwang	hwang	PROPN
fumecheng-14015	301	56	3.4	3.4	NUM
fumecheng-14015	301	57	.	.	PUNCT
fumecheng-14015	302	1	cu	cu	PROPN
fumecheng-14015	302	2	-	-	PUNCT
fumecheng-14015	302	3	cu	cu	PROPN
fumecheng-14015	302	4	mechanical	mechanical	ADJ
fumecheng-14015	302	5	bonding	bonding	NOUN
fumecheng-14015	302	6	using	use	VERB
fumecheng-14015	302	7	cu	cu	PROPN
fumecheng-14015	302	8	(	(	PUNCT
fumecheng-14015	302	9	111	111	NUM
fumecheng-14015	302	10	)	)	PUNCT
fumecheng-14015	302	11	surface	surface	NOUN
fumecheng-14015	302	12	of	of	ADP
fumecheng-14015	302	13	nt	not	PART
fumecheng-14015	302	14	-	-	ADJ
fumecheng-14015	302	15	cu	cu	NOUN
fumecheng-14015	302	16	several	several	ADJ
fumecheng-14015	302	17	studies	study	NOUN
fumecheng-14015	302	18	have	have	AUX
fumecheng-14015	302	19	shown	show	VERB
fumecheng-14015	302	20	that	that	SCONJ
fumecheng-14015	302	21	cu	cu	PROPN
fumecheng-14015	302	22	diffusion	diffusion	NOUN
fumecheng-14015	302	23	on	on	ADP
fumecheng-14015	302	24	the	the	DET
fumecheng-14015	302	25	(	(	PUNCT
fumecheng-14015	302	26	111	111	NUM
fumecheng-14015	302	27	)	)	PUNCT
fumecheng-14015	302	28	surface	surface	NOUN
fumecheng-14015	302	29	is	be	AUX
fumecheng-14015	302	30	the	the	DET
fumecheng-14015	302	31	most	most	ADV
fumecheng-14015	302	32	favorable	favorable	ADJ
fumecheng-14015	302	33	for	for	ADP
fumecheng-14015	302	34	cu	cu	PROPN
fumecheng-14015	302	35	-	-	PUNCT
fumecheng-14015	302	36	cu	cu	PROPN
fumecheng-14015	302	37	bonding	bonding	NOUN
fumecheng-14015	303	1	[	[	X
fumecheng-14015	303	2	94	94	NUM
fumecheng-14015	303	3	-	-	SYM
fumecheng-14015	303	4	100	100	NUM
fumecheng-14015	303	5	]	]	PUNCT
fumecheng-14015	303	6	.	.	PUNCT
fumecheng-14015	304	1	the	the	DET
fumecheng-14015	304	2	development	development	NOUN
fumecheng-14015	304	3	of	of	ADP
fumecheng-14015	304	4	nt	nt	NOUN
fumecheng-14015	304	5	-	-	NOUN
fumecheng-14015	304	6	cu	cu	NOUN
fumecheng-14015	304	7	through	through	ADP
fumecheng-14015	304	8	electrodeposition	electrodeposition	NOUN
fumecheng-14015	304	9	facilitates	facilitate	VERB
fumecheng-14015	304	10	cu	cu	PROPN
fumecheng-14015	304	11	-	-	PUNCT
fumecheng-14015	304	12	cu	cu	PROPN
fumecheng-14015	304	13	bonding	bonding	NOUN
fumecheng-14015	304	14	at	at	ADP
fumecheng-14015	304	15	temperatures	temperature	NOUN
fumecheng-14015	304	16	below	below	ADP
fumecheng-14015	304	17	250	250	NUM
fumecheng-14015	304	18	°	°	NOUN
fumecheng-14015	304	19	c	c	NOUN
fumecheng-14015	304	20	by	by	ADP
fumecheng-14015	304	21	producing	produce	VERB
fumecheng-14015	304	22	cu	cu	NOUN
fumecheng-14015	304	23	films	film	NOUN
fumecheng-14015	304	24	dominated	dominate	VERB
fumecheng-14015	304	25	by	by	ADP
fumecheng-14015	304	26	(	(	PUNCT
fumecheng-14015	304	27	111)-oriented	111)-oriented	ADJ
fumecheng-14015	304	28	grains	grain	NOUN
fumecheng-14015	304	29	,	,	PUNCT
fumecheng-14015	304	30	which	which	PRON
fumecheng-14015	304	31	exhibit	exhibit	VERB
fumecheng-14015	304	32	the	the	DET
fumecheng-14015	304	33	highest	high	ADJ
fumecheng-14015	304	34	surface	surface	NOUN
fumecheng-14015	304	35	diffusivity	diffusivity	NOUN
fumecheng-14015	305	1	[	[	X
fumecheng-14015	305	2	101	101	NUM
fumecheng-14015	305	3	]	]	PUNCT
fumecheng-14015	305	4	.	.	PUNCT
fumecheng-14015	306	1	table	table	NOUN
fumecheng-14015	306	2	5	5	NUM
fumecheng-14015	306	3	illustrates	illustrate	VERB
fumecheng-14015	306	4	that	that	SCONJ
fumecheng-14015	306	5	the	the	DET
fumecheng-14015	306	6	(	(	PUNCT
fumecheng-14015	306	7	111	111	NUM
fumecheng-14015	306	8	)	)	PUNCT
fumecheng-14015	306	9	surface	surface	NOUN
fumecheng-14015	306	10	has	have	VERB
fumecheng-14015	306	11	a	a	DET
fumecheng-14015	306	12	diffusion	diffusion	NOUN
fumecheng-14015	306	13	coefficient	coefficient	NOUN
fumecheng-14015	306	14	three	three	NUM
fumecheng-14015	306	15	to	to	PART
fumecheng-14015	306	16	four	four	NUM
fumecheng-14015	306	17	orders	order	NOUN
fumecheng-14015	306	18	of	of	ADP
fumecheng-14015	306	19	magnitude	magnitude	NOUN
fumecheng-14015	306	20	higher	high	ADJ
fumecheng-14015	306	21	than	than	ADP
fumecheng-14015	306	22	that	that	PRON
fumecheng-14015	306	23	of	of	ADP
fumecheng-14015	306	24	the	the	DET
fumecheng-14015	306	25	other	other	ADJ
fumecheng-14015	306	26	orientations	orientation	NOUN
fumecheng-14015	306	27	.	.	PUNCT
fumecheng-14015	307	1	this	this	DET
fumecheng-14015	307	2	higher	high	ADJ
fumecheng-14015	307	3	diffusivity	diffusivity	NOUN
fumecheng-14015	307	4	allows	allow	VERB
fumecheng-14015	307	5	for	for	ADP
fumecheng-14015	307	6	lower	low	ADJ
fumecheng-14015	307	7	bonding	bonding	NOUN
fumecheng-14015	307	8	temperatures	temperature	NOUN
fumecheng-14015	307	9	on	on	ADP
fumecheng-14015	307	10	the	the	DET
fumecheng-14015	307	11	(	(	PUNCT
fumecheng-14015	307	12	111	111	NUM
fumecheng-14015	307	13	)	)	PUNCT
fumecheng-14015	307	14	surface	surface	NOUN
fumecheng-14015	307	15	.	.	PUNCT
fumecheng-14015	308	1	a	a	DET
fumecheng-14015	308	2	(	(	PUNCT
fumecheng-14015	308	3	111	111	NUM
fumecheng-14015	308	4	)	)	PUNCT
fumecheng-14015	308	5	orientation	orientation	NOUN
fumecheng-14015	308	6	for	for	ADP
fumecheng-14015	308	7	nt	not	PART
fumecheng-14015	308	8	-	-	PUNCT
fumecheng-14015	308	9	cu	cu	NOUN
fumecheng-14015	308	10	can	can	AUX
fumecheng-14015	308	11	be	be	AUX
fumecheng-14015	308	12	achieved	achieve	VERB
fumecheng-14015	308	13	through	through	ADP
fumecheng-14015	308	14	electroplating	electroplate	VERB
fumecheng-14015	308	15	or	or	CCONJ
fumecheng-14015	308	16	sputtering	sputtering	NOUN
fumecheng-14015	308	17	.	.	PUNCT
fumecheng-14015	309	1	for	for	ADP
fumecheng-14015	309	2	example	example	NOUN
fumecheng-14015	309	3	,	,	PUNCT
fumecheng-14015	309	4	a	a	DET
fumecheng-14015	309	5	97	97	NUM
fumecheng-14015	309	6	%	%	NOUN
fumecheng-14015	309	7	(	(	PUNCT
fumecheng-14015	309	8	111)-oriented	111)-oriented	PROPN
fumecheng-14015	309	9	cu	cu	NOUN
fumecheng-14015	309	10	film	film	NOUN
fumecheng-14015	309	11	was	be	AUX
fumecheng-14015	309	12	fabricated	fabricate	VERB
fumecheng-14015	309	13	by	by	ADP
fumecheng-14015	309	14	sequentially	sequentially	ADV
fumecheng-14015	309	15	sputtering	sputter	VERB
fumecheng-14015	309	16	a	a	DET
fumecheng-14015	309	17	100	100	NUM
fumecheng-14015	309	18	nm	nm	ADV
fumecheng-14015	309	19	thick	thick	ADJ
fumecheng-14015	309	20	ti	ti	NOUN
fumecheng-14015	309	21	adhesion	adhesion	NOUN
fumecheng-14015	309	22	layer	layer	NOUN
fumecheng-14015	309	23	and	and	CCONJ
fumecheng-14015	309	24	200	200	NUM
fumecheng-14015	309	25	nm	nm	ADV
fumecheng-14015	309	26	thick	thick	ADJ
fumecheng-14015	309	27	cu	cu	PROPN
fumecheng-14015	309	28	film	film	NOUN
fumecheng-14015	309	29	onto	onto	ADP
fumecheng-14015	309	30	an	an	DET
fumecheng-14015	309	31	8	8	NUM
fumecheng-14015	309	32	-	-	PUNCT
fumecheng-14015	309	33	inch	inch	NOUN
fumecheng-14015	309	34	si	si	NOUN
fumecheng-14015	309	35	wafer	wafer	NOUN
fumecheng-14015	309	36	using	use	VERB
fumecheng-14015	309	37	an	an	DET
fumecheng-14015	309	38	oerlikon	oerlikon	ADJ
fumecheng-14015	309	39	cluster	cluster	NOUN
fumecheng-14015	309	40	line	line	NOUN
fumecheng-14015	309	41	300	300	NUM
fumecheng-14015	309	42	.	.	PUNCT
fumecheng-14015	310	1	however	however	ADV
fumecheng-14015	310	2	,	,	PUNCT
fumecheng-14015	310	3	the	the	DET
fumecheng-14015	310	4	large	large	ADJ
fumecheng-14015	310	5	-	-	PUNCT
fumecheng-14015	310	6	scale	scale	NOUN
fumecheng-14015	310	7	production	production	NOUN
fumecheng-14015	310	8	of	of	ADP
fumecheng-14015	310	9	(	(	PUNCT
fumecheng-14015	310	10	111)-oriented	111)-oriented	PROPN
fumecheng-14015	310	11	cu	cu	PROPN
fumecheng-14015	310	12	remains	remain	VERB
fumecheng-14015	310	13	challenging	challenge	VERB
fumecheng-14015	310	14	.	.	PUNCT
fumecheng-14015	311	1	to	to	PART
fumecheng-14015	311	2	address	address	VERB
fumecheng-14015	311	3	this	this	DET
fumecheng-14015	311	4	issue	issue	NOUN
fumecheng-14015	311	5	,	,	PUNCT
fumecheng-14015	311	6	the	the	DET
fumecheng-14015	311	7	(	(	PUNCT
fumecheng-14015	311	8	111)-oriented	111)-oriente	VERB
fumecheng-14015	311	9	single	single	ADJ
fumecheng-14015	311	10	-	-	PUNCT
fumecheng-14015	311	11	crystal	crystal	NOUN
fumecheng-14015	311	12	cu	cu	PROPN
fumecheng-14015	311	13	surface	surface	NOUN
fumecheng-14015	311	14	can	can	AUX
fumecheng-14015	311	15	be	be	AUX
fumecheng-14015	311	16	replaced	replace	VERB
fumecheng-14015	311	17	with	with	ADP
fumecheng-14015	311	18	a	a	DET
fumecheng-14015	311	19	highly	highly	ADV
fumecheng-14015	311	20	(	(	PUNCT
fumecheng-14015	311	21	111)-oriented	111)-oriente	VERB
fumecheng-14015	311	22	polycrystalline	polycrystalline	NOUN
fumecheng-14015	311	23	cu	cu	PROPN
fumecheng-14015	311	24	thin	thin	ADJ
fumecheng-14015	311	25	film	film	NOUN
fumecheng-14015	311	26	.	.	PUNCT
fumecheng-14015	312	1	table	table	NOUN
fumecheng-14015	312	2	5	5	NUM
fumecheng-14015	312	3	calculated	calculate	VERB
fumecheng-14015	312	4	cu	cu	PROPN
fumecheng-14015	312	5	surface	surface	NOUN
fumecheng-14015	312	6	diffusivity	diffusivity	NOUN
fumecheng-14015	312	7	on	on	ADP
fumecheng-14015	312	8	(	(	PUNCT
fumecheng-14015	312	9	111	111	NUM
fumecheng-14015	312	10	)	)	PUNCT
fumecheng-14015	312	11	,	,	PUNCT
fumecheng-14015	312	12	(	(	PUNCT
fumecheng-14015	312	13	100	100	NUM
fumecheng-14015	312	14	)	)	PUNCT
fumecheng-14015	312	15	,	,	PUNCT
fumecheng-14015	312	16	and	and	CCONJ
fumecheng-14015	312	17	(	(	PUNCT
fumecheng-14015	312	18	110	110	NUM
fumecheng-14015	312	19	)	)	PUNCT
fumecheng-14015	312	20	planes	plane	NOUN
fumecheng-14015	312	21	at	at	ADP
fumecheng-14015	312	22	various	various	ADJ
fumecheng-14015	312	23	temperatures	temperature	NOUN
fumecheng-14015	312	24	ranging	range	VERB
fumecheng-14015	312	25	from	from	ADP
fumecheng-14015	312	26	150	150	NUM
fumecheng-14015	312	27	to	to	PART
fumecheng-14015	312	28	300	300	NUM
fumecheng-14015	312	29	°	°	NOUN
fumecheng-14015	312	30	c	c	NOUN
fumecheng-14015	312	31	dsurf／temp	dsurf／temp	NOUN
fumecheng-14015	312	32	.	.	PUNCT
fumecheng-14015	313	1	(	(	PUNCT
fumecheng-14015	313	2	cm2	cm2	PROPN
fumecheng-14015	313	3	/	/	SYM
fumecheng-14015	313	4	s	s	NOUN
fumecheng-14015	313	5	)	)	PUNCT
fumecheng-14015	313	6	(	(	PUNCT
fumecheng-14015	313	7	111	111	NUM
fumecheng-14015	313	8	)	)	PUNCT
fumecheng-14015	313	9	(	(	PUNCT
fumecheng-14015	313	10	100	100	NUM
fumecheng-14015	313	11	)	)	PUNCT
fumecheng-14015	313	12	(	(	PUNCT
fumecheng-14015	313	13	110	110	NUM
fumecheng-14015	313	14	)	)	PUNCT
fumecheng-14015	314	1	300	300	NUM
fumecheng-14015	314	2	°	°	ADJ
fumecheng-14015	314	3	c	c	NOUN
fumecheng-14015	314	4	1.51×10	1.51×10	NUM
fumecheng-14015	314	5	-	-	SYM
fumecheng-14015	314	6	5	5	NUM
fumecheng-14015	314	7	1.48×10	1.48×10	NUM
fumecheng-14015	314	8	-	-	SYM
fumecheng-14015	314	9	8	8	NUM
fumecheng-14015	314	10	1.55×10	1.55×10	NUM
fumecheng-14015	314	11	-	-	SYM
fumecheng-14015	314	12	9	9	NUM
fumecheng-14015	314	13	250	250	NUM
fumecheng-14015	314	14	°	°	NOUN
fumecheng-14015	314	15	c	c	NOUN
fumecheng-14015	314	16	1.22×10	1.22×10	NUM
fumecheng-14015	314	17	-	-	SYM
fumecheng-14015	314	18	5	5	NUM
fumecheng-14015	314	19	4.74×10	4.74×10	NUM
fumecheng-14015	314	20	-	-	SYM
fumecheng-14015	314	21	9	9	NUM
fumecheng-14015	314	22	3.56×10	3.56×10	NUM
fumecheng-14015	314	23	-	-	SYM
fumecheng-14015	314	24	10	10	NUM
fumecheng-14015	314	25	200	200	NUM
fumecheng-14015	314	26	°	°	NOUN
fumecheng-14015	314	27	c	c	NOUN
fumecheng-14015	314	28	9.42×10	9.42×10	NUM
fumecheng-14015	314	29	-	-	SYM
fumecheng-14015	314	30	6	6	NUM
fumecheng-14015	314	31	1.19×10	1.19×10	NUM
fumecheng-14015	314	32	-	-	SYM
fumecheng-14015	314	33	9	9	NUM
fumecheng-14015	314	34	5.98×10	5.98×10	NUM
fumecheng-14015	314	35	-	-	SYM
fumecheng-14015	314	36	11	11	NUM
fumecheng-14015	314	37	150	150	NUM
fumecheng-14015	314	38	°	°	NOUN
fumecheng-14015	314	39	c	c	ADP
fumecheng-14015	314	40	6.85×10	6.85×10	NUM
fumecheng-14015	314	41	-	-	SYM
fumecheng-14015	314	42	6	6	NUM
fumecheng-14015	314	43	2.15×10	2.15×10	NUM
fumecheng-14015	314	44	-	-	SYM
fumecheng-14015	314	45	10	10	NUM
fumecheng-14015	314	46	6.61×10	6.61×10	NUM
fumecheng-14015	314	47	-	-	SYM
fumecheng-14015	314	48	12	12	NUM
fumecheng-14015	314	49	for	for	ADP
fumecheng-14015	314	50	successful	successful	ADJ
fumecheng-14015	314	51	direct	direct	ADJ
fumecheng-14015	314	52	cu	cu	PROPN
fumecheng-14015	314	53	-	-	PROPN
fumecheng-14015	314	54	cu	cu	PROPN
fumecheng-14015	314	55	bonding	bonding	NOUN
fumecheng-14015	314	56	,	,	PUNCT
fumecheng-14015	314	57	at	at	ADP
fumecheng-14015	314	58	least	least	ADV
fumecheng-14015	314	59	one	one	NUM
fumecheng-14015	314	60	surface	surface	NOUN
fumecheng-14015	314	61	must	must	AUX
fumecheng-14015	314	62	be	be	AUX
fumecheng-14015	314	63	(	(	PUNCT
fumecheng-14015	314	64	111	111	NUM
fumecheng-14015	314	65	)	)	PUNCT
fumecheng-14015	314	66	oriented	orient	VERB
fumecheng-14015	314	67	.	.	PUNCT
fumecheng-14015	315	1	the	the	DET
fumecheng-14015	315	2	bonding	bonding	NOUN
fumecheng-14015	315	3	proceeds	proceed	VERB
fumecheng-14015	315	4	more	more	ADV
fumecheng-14015	315	5	efficiently	efficiently	ADV
fumecheng-14015	315	6	if	if	SCONJ
fumecheng-14015	315	7	both	both	DET
fumecheng-14015	315	8	cu	cu	NOUN
fumecheng-14015	315	9	surfaces	surface	NOUN
fumecheng-14015	315	10	are	be	AUX
fumecheng-14015	315	11	aligned	align	VERB
fumecheng-14015	315	12	along	along	ADP
fumecheng-14015	315	13	the	the	DET
fumecheng-14015	315	14	<	<	NOUN
fumecheng-14015	315	15	111	111	NUM
fumecheng-14015	315	16	>	>	SYM
fumecheng-14015	315	17	axis	axis	NOUN
fumecheng-14015	316	1	[	[	X
fumecheng-14015	316	2	101	101	NUM
fumecheng-14015	316	3	]	]	PUNCT
fumecheng-14015	316	4	.	.	PUNCT
fumecheng-14015	317	1	researchers	researcher	NOUN
fumecheng-14015	317	2	have	have	AUX
fumecheng-14015	317	3	bonded	bond	VERB
fumecheng-14015	317	4	nt	nt	ADJ
fumecheng-14015	317	5	-	-	PUNCT
fumecheng-14015	317	6	cu	cu	NOUN
fumecheng-14015	317	7	pieces	piece	NOUN
fumecheng-14015	317	8	to	to	PART
fumecheng-14015	317	9	randomly	randomly	VERB
fumecheng-14015	317	10	oriented	orient	VERB
fumecheng-14015	317	11	cu	cu	NOUN
fumecheng-14015	317	12	pieces	piece	NOUN
fumecheng-14015	317	13	at	at	ADP
fumecheng-14015	317	14	different	different	ADJ
fumecheng-14015	317	15	temperatures	temperature	NOUN
fumecheng-14015	317	16	to	to	PART
fumecheng-14015	317	17	study	study	VERB
fumecheng-14015	317	18	void	void	ADJ
fumecheng-14015	317	19	formation	formation	NOUN
fumecheng-14015	317	20	.	.	PUNCT
fumecheng-14015	318	1	bonding	bond	VERB
fumecheng-14015	318	2	at	at	ADP
fumecheng-14015	318	3	150	150	NUM
fumecheng-14015	318	4	°	°	ADP
fumecheng-14015	318	5	c	c	NOUN
fumecheng-14015	318	6	for	for	ADP
fumecheng-14015	318	7	1	1	NUM
fumecheng-14015	318	8	h	h	NOUN
fumecheng-14015	318	9	results	result	NOUN
fumecheng-14015	318	10	in	in	ADP
fumecheng-14015	318	11	voids	voids	NOUN
fumecheng-14015	318	12	,	,	PUNCT
fumecheng-14015	318	13	but	but	CCONJ
fumecheng-14015	318	14	void	void	VERB
fumecheng-14015	318	15	formation	formation	NOUN
fumecheng-14015	318	16	is	be	AUX
fumecheng-14015	318	17	significantly	significantly	ADV
fumecheng-14015	318	18	reduced	reduce	VERB
fumecheng-14015	318	19	at	at	ADP
fumecheng-14015	318	20	200	200	NUM
fumecheng-14015	318	21	°	°	NOUN
fumecheng-14015	318	22	c	c	NOUN
fumecheng-14015	318	23	for	for	ADP
fumecheng-14015	318	24	30	30	NUM
fumecheng-14015	318	25	min	min	NOUN
fumecheng-14015	318	26	or	or	CCONJ
fumecheng-14015	318	27	250	250	NUM
fumecheng-14015	318	28	°	°	NOUN
fumecheng-14015	318	29	c	c	NOUN
fumecheng-14015	318	30	for	for	ADP
fumecheng-14015	318	31	10	10	NUM
fumecheng-14015	318	32	min	min	NOUN
fumecheng-14015	318	33	.	.	PROPN
fumecheng-14015	318	34	ebsd	ebsd	PROPN
fumecheng-14015	318	35	was	be	AUX
fumecheng-14015	318	36	used	use	VERB
fumecheng-14015	318	37	to	to	PART
fumecheng-14015	318	38	confirm	confirm	VERB
fumecheng-14015	318	39	the	the	DET
fumecheng-14015	318	40	orientations	orientation	NOUN
fumecheng-14015	318	41	of	of	ADP
fumecheng-14015	318	42	the	the	DET
fumecheng-14015	318	43	bonded	bond	VERB
fumecheng-14015	318	44	materials	material	NOUN
fumecheng-14015	318	45	.	.	PUNCT
fumecheng-14015	319	1	the	the	DET
fumecheng-14015	319	2	tensile	tensile	NOUN
fumecheng-14015	319	3	strengths	strength	NOUN
fumecheng-14015	319	4	of	of	ADP
fumecheng-14015	319	5	five	five	NUM
fumecheng-14015	319	6	2×2	2×2	NUM
fumecheng-14015	319	7	cm²	cm²	NOUN
fumecheng-14015	319	8	samples	sample	NOUN
fumecheng-14015	319	9	of	of	ADP
fumecheng-14015	319	10	97	97	NUM
fumecheng-14015	319	11	%	%	NOUN
fumecheng-14015	319	12	(	(	PUNCT
fumecheng-14015	319	13	111)-oriented	111)-oriented	PROPN
fumecheng-14015	319	14	cu	cu	PROPN
fumecheng-14015	319	15	films	film	NOUN
fumecheng-14015	319	16	bonded	bond	VERB
fumecheng-14015	319	17	at	at	ADP
fumecheng-14015	319	18	200	200	NUM
fumecheng-14015	319	19	°	°	NOUN
fumecheng-14015	319	20	c	c	NOUN
fumecheng-14015	319	21	for	for	ADP
fumecheng-14015	319	22	1	1	NUM
fumecheng-14015	319	23	h	h	NOUN
fumecheng-14015	319	24	were	be	AUX
fumecheng-14015	319	25	tested	test	VERB
fumecheng-14015	319	26	.	.	PUNCT
fumecheng-14015	320	1	three	three	NUM
fumecheng-14015	320	2	of	of	ADP
fumecheng-14015	320	3	the	the	DET
fumecheng-14015	320	4	five	five	NUM
fumecheng-14015	320	5	samples	sample	NOUN
fumecheng-14015	320	6	demonstrated	demonstrate	VERB
fumecheng-14015	320	7	tensile	tensile	NOUN
fumecheng-14015	320	8	strengths	strength	NOUN
fumecheng-14015	320	9	above	above	ADP
fumecheng-14015	320	10	4.3	4.3	NUM
fumecheng-14015	320	11	mpa	mpa	NOUN
fumecheng-14015	320	12	,	,	PUNCT
fumecheng-14015	320	13	while	while	SCONJ
fumecheng-14015	320	14	the	the	DET
fumecheng-14015	320	15	remaining	remain	VERB
fumecheng-14015	320	16	two	two	NUM
fumecheng-14015	320	17	showed	show	VERB
fumecheng-14015	320	18	fracture	fracture	NOUN
fumecheng-14015	320	19	strengths	strength	NOUN
fumecheng-14015	320	20	of	of	ADP
fumecheng-14015	320	21	2.7	2.7	NUM
fumecheng-14015	320	22	and	and	CCONJ
fumecheng-14015	320	23	1.3	1.3	NUM
fumecheng-14015	320	24	mpa	mpa	NOUN
fumecheng-14015	320	25	,	,	PUNCT
fumecheng-14015	320	26	confirming	confirm	VERB
fumecheng-14015	320	27	good	good	ADJ
fumecheng-14015	320	28	tensile	tensile	NOUN
fumecheng-14015	320	29	strength	strength	NOUN
fumecheng-14015	320	30	.	.	PUNCT
fumecheng-14015	321	1	shie	shie	VERB
fumecheng-14015	321	2	et	et	PROPN
fumecheng-14015	321	3	al	al	PROPN
fumecheng-14015	321	4	.	.	PUNCT
fumecheng-14015	322	1	[	[	X
fumecheng-14015	322	2	102	102	NUM
fumecheng-14015	322	3	]	]	PUNCT
fumecheng-14015	322	4	reported	report	VERB
fumecheng-14015	322	5	that	that	SCONJ
fumecheng-14015	322	6	cu	cu	PROPN
fumecheng-14015	322	7	-	-	PUNCT
fumecheng-14015	322	8	cu	cu	PROPN
fumecheng-14015	322	9	bonding	bonding	NOUN
fumecheng-14015	322	10	can	can	AUX
fumecheng-14015	322	11	be	be	AUX
fumecheng-14015	322	12	achieved	achieve	VERB
fumecheng-14015	322	13	at	at	ADP
fumecheng-14015	322	14	300	300	NUM
fumecheng-14015	322	15	°	°	NOUN
fumecheng-14015	322	16	c	c	NOUN
fumecheng-14015	322	17	in	in	ADP
fumecheng-14015	322	18	only	only	ADV
fumecheng-14015	322	19	10	10	NUM
fumecheng-14015	322	20	s	s	NOUN
fumecheng-14015	322	21	by	by	ADP
fumecheng-14015	322	22	employing	employ	VERB
fumecheng-14015	322	23	nt	not	PART
fumecheng-14015	322	24	-	-	NOUN
fumecheng-14015	322	25	cu	cu	NOUN
fumecheng-14015	322	26	with	with	ADP
fumecheng-14015	322	27	a	a	DET
fumecheng-14015	322	28	<	<	NOUN
fumecheng-14015	322	29	111	111	NUM
fumecheng-14015	322	30	>	>	X
fumecheng-14015	322	31	orientation	orientation	NOUN
fumecheng-14015	322	32	.	.	PUNCT
fumecheng-14015	323	1	the	the	DET
fumecheng-14015	323	2	nt	nt	PROPN
fumecheng-14015	323	3	-	-	PUNCT
fumecheng-14015	323	4	cu	cu	NOUN
fumecheng-14015	323	5	microstructure	microstructure	NOUN
fumecheng-14015	323	6	provides	provide	VERB
fumecheng-14015	323	7	both	both	CCONJ
fumecheng-14015	323	8	excellent	excellent	ADJ
fumecheng-14015	323	9	mechanical	mechanical	ADJ
fumecheng-14015	323	10	properties	property	NOUN
fumecheng-14015	323	11	and	and	CCONJ
fumecheng-14015	323	12	strong	strong	ADJ
fumecheng-14015	323	13	resistance	resistance	NOUN
fumecheng-14015	323	14	to	to	ADP
fumecheng-14015	323	15	electromigration	electromigration	NOUN
fumecheng-14015	323	16	.	.	PUNCT
fumecheng-14015	324	1	in	in	ADP
fumecheng-14015	324	2	their	their	PRON
fumecheng-14015	324	3	study	study	NOUN
fumecheng-14015	324	4	,	,	PUNCT
fumecheng-14015	324	5	30-µm	30-µm	PROPN
fumecheng-14015	324	6	-	-	PUNCT
fumecheng-14015	324	7	diameter	diameter	NOUN
fumecheng-14015	324	8	nt	nt	ADJ
fumecheng-14015	324	9	-	-	PUNCT
fumecheng-14015	324	10	cu	cu	NOUN
fumecheng-14015	324	11	bumps	bump	NOUN
fumecheng-14015	324	12	were	be	AUX
fumecheng-14015	324	13	electrodeposited	electrodeposite	VERB
fumecheng-14015	324	14	on	on	ADP
fumecheng-14015	324	15	8	8	NUM
fumecheng-14015	324	16	-	-	PUNCT
fumecheng-14015	324	17	inch	inch	NOUN
fumecheng-14015	324	18	wafers	wafer	NOUN
fumecheng-14015	324	19	,	,	PUNCT
fumecheng-14015	324	20	planarized	planarize	VERB
fumecheng-14015	324	21	by	by	ADP
fumecheng-14015	324	22	cmp	cmp	PROPN
fumecheng-14015	324	23	to	to	ADP
fumecheng-14015	324	24	a	a	DET
fumecheng-14015	324	25	surface	surface	NOUN
fumecheng-14015	324	26	roughness	roughness	NOUN
fumecheng-14015	324	27	of	of	ADP
fumecheng-14015	324	28	rq	rq	NOUN
fumecheng-14015	324	29	≈	≈	PROPN
fumecheng-14015	324	30	5	5	NUM
fumecheng-14015	324	31	nm	nm	NOUN
fumecheng-14015	324	32	,	,	PUNCT
fumecheng-14015	324	33	and	and	CCONJ
fumecheng-14015	324	34	de	de	VERB
fumecheng-14015	324	35	-	-	VERB
fumecheng-14015	324	36	oxidized	oxidized	ADJ
fumecheng-14015	324	37	in	in	ADP
fumecheng-14015	324	38	a	a	DET
fumecheng-14015	324	39	citric	citric	ADJ
fumecheng-14015	324	40	-	-	PUNCT
fumecheng-14015	324	41	acid	acid	NOUN
fumecheng-14015	324	42	solution	solution	NOUN
fumecheng-14015	324	43	for	for	ADP
fumecheng-14015	324	44	30	30	NUM
fumecheng-14015	324	45	s	s	NOUN
fumecheng-14015	324	46	,	,	PUNCT
fumecheng-14015	324	47	followed	follow	VERB
fumecheng-14015	324	48	by	by	ADP
fumecheng-14015	324	49	chip	chip	NOUN
fumecheng-14015	324	50	-	-	PUNCT
fumecheng-14015	324	51	to	to	ADP
fumecheng-14015	324	52	-	-	PUNCT
fumecheng-14015	324	53	chip	chip	NOUN
fumecheng-14015	324	54	bonding	bonding	NOUN
fumecheng-14015	324	55	in	in	ADP
fumecheng-14015	324	56	n₂	n₂	NOUN
fumecheng-14015	324	57	at	at	ADP
fumecheng-14015	324	58	300	300	NUM
fumecheng-14015	324	59	°	°	ADP
fumecheng-14015	324	60	c	c	NOUN
fumecheng-14015	324	61	under	under	ADP
fumecheng-14015	324	62	an	an	DET
fumecheng-14015	324	63	applied	apply	VERB
fumecheng-14015	324	64	pressure	pressure	NOUN
fumecheng-14015	324	65	of	of	ADP
fumecheng-14015	324	66	approximately	approximately	ADV
fumecheng-14015	324	67	90	90	NUM
fumecheng-14015	324	68	mpa	mpa	NOUN
fumecheng-14015	324	69	.	.	PUNCT
fumecheng-14015	325	1	under	under	ADP
fumecheng-14015	325	2	these	these	DET
fumecheng-14015	325	3	conditions	condition	NOUN
fumecheng-14015	325	4	,	,	PUNCT
fumecheng-14015	325	5	the	the	DET
fumecheng-14015	325	6	bonding	bonding	NOUN
fumecheng-14015	325	7	interface	interface	NOUN
fumecheng-14015	325	8	after	after	ADP
fumecheng-14015	325	9	a	a	DET
fumecheng-14015	325	10	10	10	NUM
fumecheng-14015	325	11	s	s	NOUN
fumecheng-14015	325	12	process	process	NOUN
fumecheng-14015	325	13	was	be	AUX
fumecheng-14015	325	14	nearly	nearly	ADV
fumecheng-14015	325	15	void	void	ADJ
fumecheng-14015	325	16	-	-	PUNCT
fumecheng-14015	325	17	free	free	ADJ
fumecheng-14015	325	18	;	;	PUNCT
fumecheng-14015	325	19	most	most	ADJ
fumecheng-14015	325	20	of	of	ADP
fumecheng-14015	325	21	the	the	DET
fumecheng-14015	325	22	(	(	PUNCT
fumecheng-14015	325	23	111)-oriented	111)-oriente	VERB
fumecheng-14015	325	24	nt	nt	ADJ
fumecheng-14015	325	25	-	-	PUNCT
fumecheng-14015	325	26	cu	cu	NOUN
fumecheng-14015	325	27	grains	grain	NOUN
fumecheng-14015	325	28	were	be	AUX
fumecheng-14015	325	29	preserved	preserve	VERB
fumecheng-14015	325	30	,	,	PUNCT
fumecheng-14015	325	31	and	and	CCONJ
fumecheng-14015	325	32	only	only	ADV
fumecheng-14015	325	33	limited	limited	ADJ
fumecheng-14015	325	34	detwinning	detwinning	NOUN
fumecheng-14015	325	35	was	be	AUX
fumecheng-14015	325	36	observed	observe	VERB
fumecheng-14015	325	37	near	near	ADP
fumecheng-14015	325	38	the	the	DET
fumecheng-14015	325	39	passivation	passivation	NOUN
fumecheng-14015	325	40	openings	opening	NOUN
fumecheng-14015	325	41	.	.	PUNCT
fumecheng-14015	326	1	single	single	ADJ
fumecheng-14015	326	2	-	-	PUNCT
fumecheng-14015	326	3	joint	joint	ADJ
fumecheng-14015	326	4	resistance	resistance	NOUN
fumecheng-14015	326	5	measurements	measurement	NOUN
fumecheng-14015	326	6	using	use	VERB
fumecheng-14015	326	7	kelvin	kelvin	PROPN
fumecheng-14015	326	8	structures	structure	NOUN
fumecheng-14015	326	9	yielded	yield	VERB
fumecheng-14015	326	10	low	low	ADJ
fumecheng-14015	326	11	values	value	NOUN
fumecheng-14015	326	12	of	of	ADP
fumecheng-14015	326	13	approximately	approximately	ADV
fumecheng-14015	326	14	4.4–4.9	4.4–4.9	NUM
fumecheng-14015	326	15	mω	mω	NOUN
fumecheng-14015	326	16	with	with	ADP
fumecheng-14015	326	17	only	only	ADJ
fumecheng-14015	326	18	weak	weak	ADJ
fumecheng-14015	326	19	dependence	dependence	NOUN
fumecheng-14015	326	20	on	on	ADP
fumecheng-14015	326	21	bonding	bonding	NOUN
fumecheng-14015	326	22	time	time	NOUN
fumecheng-14015	326	23	in	in	ADP
fumecheng-14015	326	24	the	the	DET
fumecheng-14015	326	25	range	range	NOUN
fumecheng-14015	326	26	of	of	ADP
fumecheng-14015	326	27	10–60	10–60	PROPN
fumecheng-14015	326	28	s.	s.	NOUN
fumecheng-14015	326	29	these	these	DET
fumecheng-14015	326	30	findings	finding	NOUN
fumecheng-14015	326	31	indicate	indicate	VERB
fumecheng-14015	326	32	that	that	SCONJ
fumecheng-14015	326	33	the	the	DET
fumecheng-14015	326	34	high	high	ADJ
fumecheng-14015	326	35	surface	surface	NOUN
fumecheng-14015	326	36	diffusivity	diffusivity	NOUN
fumecheng-14015	326	37	of	of	ADP
fumecheng-14015	326	38	cu	cu	PROPN
fumecheng-14015	326	39	(	(	PUNCT
fumecheng-14015	326	40	111	111	NUM
fumecheng-14015	326	41	)	)	PUNCT
fumecheng-14015	326	42	at	at	ADP
fumecheng-14015	326	43	300	300	NUM
fumecheng-14015	326	44	°	°	NOUN
fumecheng-14015	326	45	c	c	NOUN
fumecheng-14015	326	46	plays	play	VERB
fumecheng-14015	326	47	a	a	DET
fumecheng-14015	326	48	dominant	dominant	ADJ
fumecheng-14015	326	49	role	role	NOUN
fumecheng-14015	326	50	in	in	ADP
fumecheng-14015	326	51	enabling	enable	VERB
fumecheng-14015	326	52	rapid	rapid	ADJ
fumecheng-14015	326	53	bonding	bonding	NOUN
fumecheng-14015	326	54	and	and	CCONJ
fumecheng-14015	326	55	that	that	SCONJ
fumecheng-14015	326	56	reliable	reliable	ADJ
fumecheng-14015	326	57	cu	cu	PROPN
fumecheng-14015	326	58	-	-	PROPN
fumecheng-14015	326	59	cu	cu	PROPN
fumecheng-14015	326	60	joints	joint	NOUN
fumecheng-14015	326	61	can	can	AUX
fumecheng-14015	326	62	be	be	AUX
fumecheng-14015	326	63	realized	realize	VERB
fumecheng-14015	326	64	even	even	ADV
fumecheng-14015	326	65	when	when	SCONJ
fumecheng-14015	326	66	the	the	DET
fumecheng-14015	326	67	(	(	PUNCT
fumecheng-14015	326	68	111)oriented	111)oriente	VERB
fumecheng-14015	326	69	surface	surface	NOUN
fumecheng-14015	326	70	fraction	fraction	NOUN
fumecheng-14015	326	71	of	of	ADP
fumecheng-14015	326	72	the	the	DET
fumecheng-14015	326	73	bumps	bump	NOUN
fumecheng-14015	326	74	is	be	AUX
fumecheng-14015	326	75	as	as	ADV
fumecheng-14015	326	76	low	low	ADJ
fumecheng-14015	326	77	as	as	ADP
fumecheng-14015	326	78	about	about	ADP
fumecheng-14015	326	79	40	40	NUM
fumecheng-14015	326	80	%	%	NOUN
fumecheng-14015	326	81	.	.	PUNCT
fumecheng-14015	327	1	cu	cu	PROPN
fumecheng-14015	327	2	-	-	PUNCT
fumecheng-14015	327	3	cu	cu	PROPN
fumecheng-14015	327	4	mechanical	mechanical	ADJ
fumecheng-14015	327	5	bonding	bonding	NOUN
fumecheng-14015	327	6	for	for	ADP
fumecheng-14015	327	7	3d	3d	NOUN
fumecheng-14015	327	8	integration	integration	NOUN
fumecheng-14015	327	9	of	of	ADP
fumecheng-14015	327	10	the	the	DET
fumecheng-14015	327	11	next	next	ADJ
fumecheng-14015	327	12	generation	generation	NOUN
fumecheng-14015	327	13	electronic	electronic	ADJ
fumecheng-14015	327	14	chips	chip	NOUN
fumecheng-14015	327	15	...	...	PUNCT
fumecheng-14015	328	1	937	937	NUM
fumecheng-14015	328	2	lu	lu	NOUN
fumecheng-14015	328	3	et	et	PROPN
fumecheng-14015	328	4	al	al	PROPN
fumecheng-14015	328	5	.	.	PUNCT
fumecheng-14015	329	1	[	[	X
fumecheng-14015	329	2	103	103	NUM
fumecheng-14015	329	3	]	]	PUNCT
fumecheng-14015	329	4	fabricated	fabricate	VERB
fumecheng-14015	329	5	approximately	approximately	ADV
fumecheng-14015	329	6	6	6	NUM
fumecheng-14015	329	7	μm	μm	NUM
fumecheng-14015	329	8	-	-	PUNCT
fumecheng-14015	329	9	thick	thick	ADJ
fumecheng-14015	329	10	nt	nt	PROPN
fumecheng-14015	329	11	-	-	ADJ
fumecheng-14015	329	12	cu	cu	NOUN
fumecheng-14015	329	13	films	film	NOUN
fumecheng-14015	329	14	with	with	ADP
fumecheng-14015	329	15	a	a	DET
fumecheng-14015	329	16	strong	strong	ADJ
fumecheng-14015	329	17	(	(	PUNCT
fumecheng-14015	329	18	111	111	NUM
fumecheng-14015	329	19	)	)	PUNCT
fumecheng-14015	329	20	texture	texture	NOUN
fumecheng-14015	329	21	by	by	ADP
fumecheng-14015	329	22	electroplating	electroplate	VERB
fumecheng-14015	329	23	on	on	ADP
fumecheng-14015	329	24	a	a	DET
fumecheng-14015	329	25	(	(	PUNCT
fumecheng-14015	329	26	111)-oriented	111)-oriented	PROPN
fumecheng-14015	329	27	cu	cu	NOUN
fumecheng-14015	329	28	seed	seed	NOUN
fumecheng-14015	329	29	layer	layer	NOUN
fumecheng-14015	329	30	followed	follow	VERB
fumecheng-14015	329	31	by	by	ADP
fumecheng-14015	329	32	cmp	cmp	PROPN
fumecheng-14015	329	33	,	,	PUNCT
fumecheng-14015	329	34	and	and	CCONJ
fumecheng-14015	329	35	then	then	ADV
fumecheng-14015	329	36	introduced	introduce	VERB
fumecheng-14015	329	37	an	an	DET
fumecheng-14015	329	38	epoxy	epoxy	NOUN
fumecheng-14015	329	39	-	-	PUNCT
fumecheng-14015	329	40	induced	induce	VERB
fumecheng-14015	329	41	surface	surface	NOUN
fumecheng-14015	329	42	modification	modification	NOUN
fumecheng-14015	329	43	to	to	PART
fumecheng-14015	329	44	obtain	obtain	VERB
fumecheng-14015	329	45	an	an	DET
fumecheng-14015	329	46	epoxy	epoxy	NOUN
fumecheng-14015	329	47	-	-	PUNCT
fumecheng-14015	329	48	treated	treat	VERB
fumecheng-14015	329	49	nanotwinned	nanotwinned	PROPN
fumecheng-14015	329	50	cu	cu	PROPN
fumecheng-14015	329	51	(	(	PUNCT
fumecheng-14015	329	52	ent	ent	PROPN
fumecheng-14015	329	53	-	-	PUNCT
fumecheng-14015	329	54	cu	cu	NOUN
fumecheng-14015	329	55	)	)	PUNCT
fumecheng-14015	329	56	structure	structure	NOUN
fumecheng-14015	329	57	.	.	PUNCT
fumecheng-14015	330	1	as	as	SCONJ
fumecheng-14015	330	2	shown	show	VERB
fumecheng-14015	330	3	in	in	ADP
fumecheng-14015	330	4	fig	fig	NOUN
fumecheng-14015	330	5	.	.	PUNCT
fumecheng-14015	331	1	8	8	NUM
fumecheng-14015	331	2	,	,	PUNCT
fumecheng-14015	331	3	ebsd	ebsd	NOUN
fumecheng-14015	331	4	and	and	CCONJ
fumecheng-14015	331	5	grain	grain	NOUN
fumecheng-14015	331	6	-	-	PUNCT
fumecheng-14015	331	7	size	size	NOUN
fumecheng-14015	331	8	analyses	analysis	NOUN
fumecheng-14015	331	9	indicate	indicate	VERB
fumecheng-14015	331	10	that	that	SCONJ
fumecheng-14015	331	11	the	the	DET
fumecheng-14015	331	12	as	as	ADV
fumecheng-14015	331	13	-	-	PUNCT
fumecheng-14015	331	14	deposited	deposit	VERB
fumecheng-14015	331	15	nt	nt	PROPN
fumecheng-14015	331	16	-	-	PUNCT
fumecheng-14015	331	17	cu	cu	NOUN
fumecheng-14015	331	18	exhibits	exhibit	VERB
fumecheng-14015	331	19	a	a	DET
fumecheng-14015	331	20	columnar	columnar	ADJ
fumecheng-14015	331	21	nanotwinned	nanotwinne	VERB
fumecheng-14015	331	22	microstructure	microstructure	NOUN
fumecheng-14015	331	23	with	with	ADP
fumecheng-14015	331	24	a	a	DET
fumecheng-14015	331	25	highly	highly	ADV
fumecheng-14015	331	26	(	(	PUNCT
fumecheng-14015	331	27	111)oriented	111)oriented	ADJ
fumecheng-14015	331	28	surface	surface	NOUN
fumecheng-14015	331	29	,	,	PUNCT
fumecheng-14015	331	30	whereas	whereas	SCONJ
fumecheng-14015	331	31	after	after	ADP
fumecheng-14015	331	32	repeated	repeat	VERB
fumecheng-14015	331	33	thermal	thermal	ADJ
fumecheng-14015	331	34	cycling	cycling	NOUN
fumecheng-14015	331	35	in	in	ADP
fumecheng-14015	331	36	contact	contact	NOUN
fumecheng-14015	331	37	with	with	ADP
fumecheng-14015	331	38	an	an	DET
fumecheng-14015	331	39	epoxy	epoxy	NOUN
fumecheng-14015	331	40	the	the	DET
fumecheng-14015	331	41	entcu	entcu	PROPN
fumecheng-14015	331	42	develops	develop	VERB
fumecheng-14015	331	43	a	a	DET
fumecheng-14015	331	44	dual	dual	ADJ
fumecheng-14015	331	45	-	-	PUNCT
fumecheng-14015	331	46	layer	layer	NOUN
fumecheng-14015	331	47	structure	structure	NOUN
fumecheng-14015	331	48	in	in	ADP
fumecheng-14015	331	49	which	which	PRON
fumecheng-14015	331	50	the	the	DET
fumecheng-14015	331	51	top	top	NOUN
fumecheng-14015	331	52	~1	~1	ADJ
fumecheng-14015	331	53	μm	μm	NUM
fumecheng-14015	331	54	is	be	AUX
fumecheng-14015	331	55	transformed	transform	VERB
fumecheng-14015	331	56	into	into	ADP
fumecheng-14015	331	57	a	a	DET
fumecheng-14015	331	58	finegrained	finegraine	VERB
fumecheng-14015	331	59	,	,	PUNCT
fumecheng-14015	331	60	randomly	randomly	ADV
fumecheng-14015	331	61	oriented	orient	VERB
fumecheng-14015	331	62	layer	layer	NOUN
fumecheng-14015	331	63	with	with	ADP
fumecheng-14015	331	64	an	an	DET
fumecheng-14015	331	65	average	average	ADJ
fumecheng-14015	331	66	grain	grain	NOUN
fumecheng-14015	331	67	size	size	NOUN
fumecheng-14015	331	68	of	of	ADP
fumecheng-14015	331	69	about	about	ADV
fumecheng-14015	331	70	0.2	0.2	NUM
fumecheng-14015	331	71	μm	μm	NUM
fumecheng-14015	331	72	,	,	PUNCT
fumecheng-14015	331	73	while	while	SCONJ
fumecheng-14015	331	74	the	the	DET
fumecheng-14015	331	75	underlying	underlying	ADJ
fumecheng-14015	331	76	nt	nt	PROPN
fumecheng-14015	331	77	-	-	PUNCT
fumecheng-14015	331	78	cu	cu	NOUN
fumecheng-14015	331	79	retains	retain	VERB
fumecheng-14015	331	80	its	its	PRON
fumecheng-14015	331	81	strong	strong	ADJ
fumecheng-14015	331	82	(	(	PUNCT
fumecheng-14015	331	83	111	111	NUM
fumecheng-14015	331	84	)	)	PUNCT
fumecheng-14015	331	85	texture	texture	NOUN
fumecheng-14015	331	86	.	.	PUNCT
fumecheng-14015	332	1	using	use	VERB
fumecheng-14015	332	2	these	these	DET
fumecheng-14015	332	3	films	film	NOUN
fumecheng-14015	332	4	for	for	ADP
fumecheng-14015	332	5	cu	cu	PROPN
fumecheng-14015	332	6	-	-	PUNCT
fumecheng-14015	332	7	cu	cu	PROPN
fumecheng-14015	332	8	tcb	tcb	PROPN
fumecheng-14015	332	9	in	in	ADP
fumecheng-14015	332	10	the	the	DET
fumecheng-14015	332	11	temperature	temperature	NOUN
fumecheng-14015	332	12	range	range	NOUN
fumecheng-14015	332	13	of	of	ADP
fumecheng-14015	332	14	200–300	200–300	NUM
fumecheng-14015	332	15	°	°	NOUN
fumecheng-14015	332	16	c	c	NOUN
fumecheng-14015	332	17	,	,	PUNCT
fumecheng-14015	332	18	lu	lu	PROPN
fumecheng-14015	332	19	et	et	NOUN
fumecheng-14015	332	20	al	al	PROPN
fumecheng-14015	332	21	.	.	PUNCT
fumecheng-14015	333	1	[	[	X
fumecheng-14015	333	2	103	103	NUM
fumecheng-14015	333	3	]	]	PUNCT
fumecheng-14015	333	4	found	find	VERB
fumecheng-14015	333	5	that	that	SCONJ
fumecheng-14015	333	6	in	in	ADP
fumecheng-14015	333	7	the	the	DET
fumecheng-14015	333	8	conventional	conventional	ADJ
fumecheng-14015	333	9	nt	nt	PROPN
fumecheng-14015	333	10	-	-	PUNCT
fumecheng-14015	333	11	cu	cu	NOUN
fumecheng-14015	333	12	joints	joint	NOUN
fumecheng-14015	333	13	the	the	DET
fumecheng-14015	333	14	bonding	bonding	NOUN
fumecheng-14015	333	15	interface	interface	NOUN
fumecheng-14015	333	16	remains	remain	VERB
fumecheng-14015	333	17	largely	largely	ADV
fumecheng-14015	333	18	intact	intact	ADJ
fumecheng-14015	333	19	even	even	ADV
fumecheng-14015	333	20	at	at	ADP
fumecheng-14015	333	21	300	300	NUM
fumecheng-14015	333	22	°	°	NOUN
fumecheng-14015	333	23	c	c	NOUN
fumecheng-14015	333	24	,	,	PUNCT
fumecheng-14015	333	25	as	as	SCONJ
fumecheng-14015	333	26	evidenced	evidence	VERB
fumecheng-14015	333	27	in	in	ADP
fumecheng-14015	333	28	fig	fig	NOUN
fumecheng-14015	333	29	.	.	PUNCT
fumecheng-14015	334	1	8	8	NUM
fumecheng-14015	334	2	(	(	PUNCT
fumecheng-14015	334	3	a	a	NOUN
fumecheng-14015	334	4	)	)	PUNCT
fumecheng-14015	334	5	,	,	PUNCT
fumecheng-14015	334	6	where	where	SCONJ
fumecheng-14015	334	7	only	only	ADV
fumecheng-14015	334	8	a	a	DET
fumecheng-14015	334	9	mildly	mildly	ADV
fumecheng-14015	334	10	zigzagged	zigzagged	ADJ
fumecheng-14015	334	11	but	but	CCONJ
fumecheng-14015	334	12	still	still	ADV
fumecheng-14015	334	13	distinct	distinct	ADJ
fumecheng-14015	334	14	boundary	boundary	NOUN
fumecheng-14015	334	15	is	be	AUX
fumecheng-14015	334	16	observed	observe	VERB
fumecheng-14015	334	17	with	with	ADP
fumecheng-14015	334	18	limited	limited	ADJ
fumecheng-14015	334	19	grain	grain	NOUN
fumecheng-14015	334	20	penetration	penetration	NOUN
fumecheng-14015	334	21	across	across	ADP
fumecheng-14015	334	22	the	the	DET
fumecheng-14015	334	23	interface	interface	NOUN
fumecheng-14015	334	24	.	.	PUNCT
fumecheng-14015	335	1	fig	fig	NOUN
fumecheng-14015	335	2	.	.	PUNCT
fumecheng-14015	336	1	8	8	NUM
fumecheng-14015	336	2	microstructures	microstructure	NOUN
fumecheng-14015	336	3	of	of	ADP
fumecheng-14015	336	4	initial	initial	ADJ
fumecheng-14015	336	5	cu	cu	PROPN
fumecheng-14015	336	6	films	film	NOUN
fumecheng-14015	336	7	.	.	PUNCT
fumecheng-14015	337	1	(	(	PUNCT
fumecheng-14015	337	2	a	a	X
fumecheng-14015	337	3	)	)	PUNCT
fumecheng-14015	337	4	plane	plane	NOUN
fumecheng-14015	337	5	-	-	PUNCT
fumecheng-14015	337	6	view	view	NOUN
fumecheng-14015	337	7	scanning	scan	VERB
fumecheng-14015	337	8	ion	ion	NOUN
fumecheng-14015	337	9	microscopy	microscopy	NOUN
fumecheng-14015	337	10	(	(	PUNCT
fumecheng-14015	337	11	sim	sim	ADJ
fumecheng-14015	337	12	)	)	PUNCT
fumecheng-14015	337	13	image	image	NOUN
fumecheng-14015	337	14	of	of	ADP
fumecheng-14015	337	15	nt	nt	NOUN
fumecheng-14015	337	16	-	-	NOUN
fumecheng-14015	337	17	cu	cu	NOUN
fumecheng-14015	337	18	.	.	PUNCT
fumecheng-14015	338	1	(	(	PUNCT
fumecheng-14015	338	2	b	b	X
fumecheng-14015	338	3	)	)	PUNCT
fumecheng-14015	338	4	plane	plane	NOUN
fumecheng-14015	338	5	-	-	PUNCT
fumecheng-14015	338	6	view	view	NOUN
fumecheng-14015	338	7	ebsd	ebsd	NOUN
fumecheng-14015	338	8	oim	oim	NOUN
fumecheng-14015	338	9	image	image	NOUN
fumecheng-14015	338	10	of	of	ADP
fumecheng-14015	338	11	nt	nt	NOUN
fumecheng-14015	338	12	-	-	NOUN
fumecheng-14015	338	13	cu	cu	NOUN
fumecheng-14015	338	14	.	.	PUNCT
fumecheng-14015	339	1	(	(	PUNCT
fumecheng-14015	339	2	c	c	X
fumecheng-14015	339	3	)	)	PUNCT
fumecheng-14015	339	4	distribution	distribution	NOUN
fumecheng-14015	339	5	of	of	ADP
fumecheng-14015	339	6	grain	grain	NOUN
fumecheng-14015	339	7	sizes	size	NOUN
fumecheng-14015	339	8	for	for	ADP
fumecheng-14015	339	9	the	the	DET
fumecheng-14015	339	10	grains	grain	NOUN
fumecheng-14015	339	11	in	in	ADP
fumecheng-14015	339	12	(	(	PUNCT
fumecheng-14015	339	13	b	b	NOUN
fumecheng-14015	339	14	)	)	PUNCT
fumecheng-14015	339	15	.	.	PUNCT
fumecheng-14015	340	1	(	(	PUNCT
fumecheng-14015	340	2	d	d	X
fumecheng-14015	340	3	)	)	PUNCT
fumecheng-14015	340	4	plane	plane	NOUN
fumecheng-14015	340	5	-	-	PUNCT
fumecheng-14015	340	6	view	view	NOUN
fumecheng-14015	340	7	sim	sim	ADJ
fumecheng-14015	340	8	image	image	NOUN
fumecheng-14015	340	9	of	of	ADP
fumecheng-14015	340	10	ent	ent	NOUN
fumecheng-14015	340	11	-	-	PUNCT
fumecheng-14015	340	12	cu	cu	PROPN
fumecheng-14015	340	13	.	.	PUNCT
fumecheng-14015	341	1	(	(	PUNCT
fumecheng-14015	341	2	e	e	NOUN
fumecheng-14015	341	3	)	)	PUNCT
fumecheng-14015	341	4	plane	plane	NOUN
fumecheng-14015	341	5	-	-	PUNCT
fumecheng-14015	341	6	view	view	NOUN
fumecheng-14015	341	7	ebsd	ebsd	NOUN
fumecheng-14015	341	8	oim	oim	NOUN
fumecheng-14015	341	9	image	image	NOUN
fumecheng-14015	341	10	of	of	ADP
fumecheng-14015	341	11	ent	ent	NOUN
fumecheng-14015	341	12	-	-	PUNCT
fumecheng-14015	341	13	cu	cu	PROPN
fumecheng-14015	341	14	.	.	PUNCT
fumecheng-14015	342	1	(	(	PUNCT
fumecheng-14015	342	2	f	f	X
fumecheng-14015	342	3	)	)	PUNCT
fumecheng-14015	342	4	distribution	distribution	NOUN
fumecheng-14015	342	5	of	of	ADP
fumecheng-14015	342	6	grain	grain	NOUN
fumecheng-14015	342	7	sizes	size	NOUN
fumecheng-14015	342	8	for	for	ADP
fumecheng-14015	342	9	the	the	DET
fumecheng-14015	342	10	grains	grain	NOUN
fumecheng-14015	342	11	in	in	ADP
fumecheng-14015	342	12	(	(	PUNCT
fumecheng-14015	342	13	e	e	NOUN
fumecheng-14015	342	14	)	)	PUNCT
fumecheng-14015	343	1	[	[	X
fumecheng-14015	343	2	103	103	NUM
fumecheng-14015	343	3	]	]	AUX
fumecheng-14015	343	4	in	in	ADP
fumecheng-14015	343	5	contrast	contrast	NOUN
fumecheng-14015	343	6	,	,	PUNCT
fumecheng-14015	343	7	the	the	DET
fumecheng-14015	343	8	ent	ent	PROPN
fumecheng-14015	343	9	-	-	PUNCT
fumecheng-14015	343	10	cu	cu	PROPN
fumecheng-14015	343	11	joints	joint	NOUN
fumecheng-14015	343	12	exhibit	exhibit	AUX
fumecheng-14015	343	13	pronounced	pronounce	VERB
fumecheng-14015	343	14	abnormal	abnormal	ADJ
fumecheng-14015	343	15	grain	grain	NOUN
fumecheng-14015	343	16	growth	growth	NOUN
fumecheng-14015	343	17	originating	originate	VERB
fumecheng-14015	343	18	from	from	ADP
fumecheng-14015	343	19	the	the	DET
fumecheng-14015	343	20	fine	fine	ADV
fumecheng-14015	343	21	-	-	PUNCT
fumecheng-14015	343	22	grained	grain	VERB
fumecheng-14015	343	23	interfacial	interfacial	ADJ
fumecheng-14015	343	24	layer	layer	NOUN
fumecheng-14015	343	25	;	;	PUNCT
fumecheng-14015	343	26	fig	fig	NOUN
fumecheng-14015	343	27	.	.	PUNCT
fumecheng-14015	344	1	9	9	NUM
fumecheng-14015	344	2	(	(	PUNCT
fumecheng-14015	344	3	b	b	NOUN
fumecheng-14015	344	4	)	)	PUNCT
fumecheng-14015	344	5	demonstrates	demonstrate	VERB
fumecheng-14015	344	6	that	that	SCONJ
fumecheng-14015	344	7	large	large	ADJ
fumecheng-14015	344	8	grains	grain	NOUN
fumecheng-14015	344	9	extend	extend	VERB
fumecheng-14015	344	10	into	into	ADP
fumecheng-14015	344	11	both	both	DET
fumecheng-14015	344	12	cu	cu	PROPN
fumecheng-14015	344	13	films	film	NOUN
fumecheng-14015	344	14	and	and	CCONJ
fumecheng-14015	344	15	effectively	effectively	ADV
fumecheng-14015	344	16	consume	consume	VERB
fumecheng-14015	344	17	the	the	DET
fumecheng-14015	344	18	original	original	ADJ
fumecheng-14015	344	19	cu	cu	PROPN
fumecheng-14015	344	20	-	-	PUNCT
fumecheng-14015	344	21	cu	cu	PROPN
fumecheng-14015	344	22	interface	interface	NOUN
fumecheng-14015	344	23	,	,	PUNCT
fumecheng-14015	344	24	leading	lead	VERB
fumecheng-14015	344	25	to	to	ADP
fumecheng-14015	344	26	an	an	DET
fumecheng-14015	344	27	almost	almost	ADV
fumecheng-14015	344	28	interface	interface	NOUN
fumecheng-14015	344	29	-	-	PUNCT
fumecheng-14015	344	30	free	free	ADJ
fumecheng-14015	344	31	microstructure	microstructure	NOUN
fumecheng-14015	344	32	after	after	ADP
fumecheng-14015	344	33	bonding	bonding	NOUN
fumecheng-14015	344	34	at	at	ADP
fumecheng-14015	344	35	300	300	NUM
fumecheng-14015	344	36	°	°	NOUN
fumecheng-14015	344	37	c	c	NOUN
fumecheng-14015	344	38	.	.	PUNCT
fumecheng-14015	345	1	these	these	DET
fumecheng-14015	345	2	observations	observation	NOUN
fumecheng-14015	345	3	imply	imply	VERB
fumecheng-14015	345	4	that	that	SCONJ
fumecheng-14015	345	5	merely	merely	ADV
fumecheng-14015	345	6	exposing	expose	VERB
fumecheng-14015	345	7	a	a	DET
fumecheng-14015	345	8	fully	fully	ADV
fumecheng-14015	345	9	(	(	PUNCT
fumecheng-14015	345	10	111)-oriented	111)-oriented	ADJ
fumecheng-14015	345	11	nt	nt	ADJ
fumecheng-14015	345	12	-	-	PUNCT
fumecheng-14015	345	13	cu	cu	NOUN
fumecheng-14015	345	14	surface	surface	NOUN
fumecheng-14015	345	15	is	be	AUX
fumecheng-14015	345	16	insufficient	insufficient	ADJ
fumecheng-14015	345	17	for	for	ADP
fumecheng-14015	345	18	interface	interface	NOUN
fumecheng-14015	345	19	elimination	elimination	NOUN
fumecheng-14015	345	20	,	,	PUNCT
fumecheng-14015	345	21	and	and	CCONJ
fumecheng-14015	345	22	that	that	SCONJ
fumecheng-14015	345	23	only	only	ADV
fumecheng-14015	345	24	when	when	SCONJ
fumecheng-14015	345	25	a	a	DET
fumecheng-14015	345	26	highly	highly	ADV
fumecheng-14015	345	27	defective	defective	ADJ
fumecheng-14015	345	28	,	,	PUNCT
fumecheng-14015	345	29	high	high	ADJ
fumecheng-14015	345	30	grain	grain	NOUN
fumecheng-14015	345	31	-	-	PUNCT
fumecheng-14015	345	32	boundary	boundary	NOUN
fumecheng-14015	345	33	-	-	PUNCT
fumecheng-14015	345	34	energy	energy	NOUN
fumecheng-14015	345	35	fine	fine	ADV
fumecheng-14015	345	36	-	-	PUNCT
fumecheng-14015	345	37	grained	grain	VERB
fumecheng-14015	345	38	surface	surface	NOUN
fumecheng-14015	345	39	layer	layer	NOUN
fumecheng-14015	345	40	is	be	AUX
fumecheng-14015	345	41	introduced	introduce	VERB
fumecheng-14015	345	42	on	on	ADP
fumecheng-14015	345	43	top	top	NOUN
fumecheng-14015	345	44	of	of	ADP
fumecheng-14015	345	45	a	a	DET
fumecheng-14015	345	46	(	(	PUNCT
fumecheng-14015	345	47	111)-textured	111)-textured	NUM
fumecheng-14015	345	48	nanotwinned	nanotwinned	ADJ
fumecheng-14015	345	49	underlayer	underlayer	NOUN
fumecheng-14015	345	50	,	,	PUNCT
fumecheng-14015	345	51	as	as	SCONJ
fumecheng-14015	345	52	characterized	characterize	VERB
fumecheng-14015	345	53	in	in	ADP
fumecheng-14015	345	54	fig	fig	NOUN
fumecheng-14015	345	55	.	.	PUNCT
fumecheng-14015	346	1	938	938	NUM
fumecheng-14015	346	2	s.	s.	PROPN
fumecheng-14015	346	3	choi	choi	PROPN
fumecheng-14015	346	4	,	,	PUNCT
fumecheng-14015	346	5	c.	c.	PROPN
fumecheng-14015	346	6	chen	chen	PROPN
fumecheng-14015	346	7	,	,	PUNCT
fumecheng-14015	346	8	b.	b.	PROPN
fumecheng-14015	346	9	hwang	hwang	PROPN
fumecheng-14015	346	10	9	9	NUM
fumecheng-14015	346	11	,	,	PUNCT
fumecheng-14015	346	12	can	can	AUX
fumecheng-14015	346	13	the	the	DET
fumecheng-14015	346	14	interface	interface	NOUN
fumecheng-14015	346	15	-	-	PUNCT
fumecheng-14015	346	16	free	free	ADJ
fumecheng-14015	346	17	cu	cu	PROPN
fumecheng-14015	346	18	-	-	PUNCT
fumecheng-14015	346	19	cu	cu	PROPN
fumecheng-14015	346	20	joint	joint	ADJ
fumecheng-14015	346	21	structure	structure	NOUN
fumecheng-14015	346	22	observed	observe	VERB
fumecheng-14015	346	23	in	in	ADP
fumecheng-14015	346	24	fig	fig	NOUN
fumecheng-14015	346	25	.	.	PUNCT
fumecheng-14015	347	1	9	9	NUM
fumecheng-14015	347	2	be	be	AUX
fumecheng-14015	347	3	achieved	achieve	VERB
fumecheng-14015	347	4	at	at	ADP
fumecheng-14015	347	5	relatively	relatively	ADV
fumecheng-14015	347	6	low	low	ADJ
fumecheng-14015	347	7	temperatures	temperature	NOUN
fumecheng-14015	347	8	.	.	PUNCT
fumecheng-14015	348	1	the	the	DET
fumecheng-14015	348	2	(	(	PUNCT
fumecheng-14015	348	3	111)-based	111)-based	PROPN
fumecheng-14015	348	4	cu	cu	PROPN
fumecheng-14015	348	5	-	-	PROPN
fumecheng-14015	348	6	cu	cu	PROPN
fumecheng-14015	348	7	bonding	bonding	NOUN
fumecheng-14015	348	8	route	route	NOUN
fumecheng-14015	348	9	demonstrated	demonstrate	VERB
fumecheng-14015	348	10	by	by	ADP
fumecheng-14015	348	11	lu	lu	PROPN
fumecheng-14015	348	12	et	et	PROPN
fumecheng-14015	348	13	al	al	PROPN
fumecheng-14015	348	14	.	.	PUNCT
fumecheng-14015	349	1	[	[	X
fumecheng-14015	349	2	103	103	NUM
fumecheng-14015	349	3	]	]	PUNCT
fumecheng-14015	349	4	therefore	therefore	ADV
fumecheng-14015	349	5	offers	offer	VERB
fumecheng-14015	349	6	the	the	DET
fumecheng-14015	349	7	advantage	advantage	NOUN
fumecheng-14015	349	8	of	of	ADP
fumecheng-14015	349	9	maintaining	maintain	VERB
fumecheng-14015	349	10	a	a	DET
fumecheng-14015	349	11	reliable	reliable	ADJ
fumecheng-14015	349	12	(	(	PUNCT
fumecheng-14015	349	13	111)-oriented	111)-oriente	VERB
fumecheng-14015	349	14	nt	nt	PROPN
fumecheng-14015	349	15	-	-	PUNCT
fumecheng-14015	349	16	cu	cu	NOUN
fumecheng-14015	349	17	backbone	backbone	NOUN
fumecheng-14015	349	18	for	for	ADP
fumecheng-14015	349	19	current	current	ADJ
fumecheng-14015	349	20	conduction	conduction	NOUN
fumecheng-14015	349	21	while	while	SCONJ
fumecheng-14015	349	22	eliminating	eliminate	VERB
fumecheng-14015	349	23	the	the	DET
fumecheng-14015	349	24	bonding	bonding	NOUN
fumecheng-14015	349	25	interface	interface	NOUN
fumecheng-14015	349	26	without	without	ADP
fumecheng-14015	349	27	noble	noble	ADJ
fumecheng-14015	349	28	-	-	PUNCT
fumecheng-14015	349	29	metal	metal	NOUN
fumecheng-14015	349	30	interlayers	interlayer	NOUN
fumecheng-14015	349	31	,	,	PUNCT
fumecheng-14015	349	32	but	but	CCONJ
fumecheng-14015	349	33	it	it	PRON
fumecheng-14015	349	34	also	also	ADV
fumecheng-14015	349	35	suffers	suffer	VERB
fumecheng-14015	349	36	from	from	ADP
fumecheng-14015	349	37	the	the	DET
fumecheng-14015	349	38	requirement	requirement	NOUN
fumecheng-14015	349	39	of	of	ADP
fumecheng-14015	349	40	a	a	DET
fumecheng-14015	349	41	still	still	ADV
fumecheng-14015	349	42	relatively	relatively	ADV
fumecheng-14015	349	43	high	high	ADJ
fumecheng-14015	349	44	bonding	bonding	NOUN
fumecheng-14015	349	45	temperature	temperature	NOUN
fumecheng-14015	349	46	around	around	ADP
fumecheng-14015	349	47	300	300	NUM
fumecheng-14015	349	48	°	°	NOUN
fumecheng-14015	349	49	c	c	NOUN
fumecheng-14015	349	50	,	,	PUNCT
fumecheng-14015	349	51	increased	increase	VERB
fumecheng-14015	349	52	process	process	NOUN
fumecheng-14015	349	53	complexity	complexity	NOUN
fumecheng-14015	349	54	due	due	ADP
fumecheng-14015	349	55	to	to	ADP
fumecheng-14015	349	56	epoxy	epoxy	ADJ
fumecheng-14015	349	57	thermal	thermal	ADJ
fumecheng-14015	349	58	cycling	cycling	NOUN
fumecheng-14015	349	59	and	and	CCONJ
fumecheng-14015	349	60	additional	additional	ADJ
fumecheng-14015	349	61	cmp	cmp	NOUN
fumecheng-14015	349	62	,	,	PUNCT
fumecheng-14015	349	63	and	and	CCONJ
fumecheng-14015	349	64	partial	partial	ADJ
fumecheng-14015	349	65	loss	loss	NOUN
fumecheng-14015	349	66	of	of	ADP
fumecheng-14015	349	67	the	the	DET
fumecheng-14015	349	68	(	(	PUNCT
fumecheng-14015	349	69	111	111	NUM
fumecheng-14015	349	70	)	)	PUNCT
fumecheng-14015	349	71	texture	texture	NOUN
fumecheng-14015	349	72	at	at	ADP
fumecheng-14015	349	73	the	the	DET
fumecheng-14015	349	74	immediate	immediate	ADJ
fumecheng-14015	349	75	bonding	bonding	NOUN
fumecheng-14015	349	76	surface	surface	NOUN
fumecheng-14015	349	77	.	.	PUNCT
fumecheng-14015	350	1	fig	fig	NOUN
fumecheng-14015	350	2	.	.	PUNCT
fumecheng-14015	351	1	9	9	NUM
fumecheng-14015	351	2	cross	cross	ADJ
fumecheng-14015	351	3	-	-	ADJ
fumecheng-14015	351	4	sectional	sectional	ADJ
fumecheng-14015	351	5	sem	sem	NOUN
fumecheng-14015	351	6	images	image	NOUN
fumecheng-14015	351	7	after	after	ADP
fumecheng-14015	351	8	bonding	bond	VERB
fumecheng-14015	351	9	at	at	ADP
fumecheng-14015	351	10	300	300	NUM
fumecheng-14015	351	11	°	°	ADP
fumecheng-14015	351	12	c	c	NOUN
fumecheng-14015	351	13	for	for	ADP
fumecheng-14015	351	14	1	1	NUM
fumecheng-14015	351	15	h	h	NOUN
fumecheng-14015	351	16	:	:	PUNCT
fumecheng-14015	351	17	(	(	PUNCT
fumecheng-14015	351	18	a	a	X
fumecheng-14015	351	19	)	)	PUNCT
fumecheng-14015	351	20	nt	not	PART
fumecheng-14015	351	21	-	-	PUNCT
fumecheng-14015	351	22	cu	cu	NOUN
fumecheng-14015	351	23	;	;	PUNCT
fumecheng-14015	351	24	(	(	PUNCT
fumecheng-14015	351	25	b	b	X
fumecheng-14015	351	26	)	)	PUNCT
fumecheng-14015	351	27	ent	ent	NOUN
fumecheng-14015	351	28	-	-	PUNCT
fumecheng-14015	351	29	cu	cu	NOUN
fumecheng-14015	351	30	[	[	X
fumecheng-14015	351	31	103	103	NUM
fumecheng-14015	351	32	]	]	SYM
fumecheng-14015	351	33	4	4	NUM
fumecheng-14015	351	34	.	.	X
fumecheng-14015	351	35	conclusion	conclusion	NOUN
fumecheng-14015	351	36	this	this	DET
fumecheng-14015	351	37	review	review	NOUN
fumecheng-14015	351	38	explored	explore	VERB
fumecheng-14015	351	39	the	the	DET
fumecheng-14015	351	40	various	various	ADJ
fumecheng-14015	351	41	factors	factor	NOUN
fumecheng-14015	351	42	influencing	influence	VERB
fumecheng-14015	351	43	cu	cu	PROPN
fumecheng-14015	351	44	-	-	PROPN
fumecheng-14015	351	45	cu	cu	PROPN
fumecheng-14015	351	46	mechanical	mechanical	ADJ
fumecheng-14015	351	47	bonding	bonding	NOUN
fumecheng-14015	351	48	and	and	CCONJ
fumecheng-14015	351	49	provided	provide	VERB
fumecheng-14015	351	50	a	a	DET
fumecheng-14015	351	51	detailed	detailed	ADJ
fumecheng-14015	351	52	analysis	analysis	NOUN
fumecheng-14015	351	53	of	of	ADP
fumecheng-14015	351	54	the	the	DET
fumecheng-14015	351	55	fundamental	fundamental	ADJ
fumecheng-14015	351	56	principles	principle	NOUN
fumecheng-14015	351	57	governing	govern	VERB
fumecheng-14015	351	58	these	these	DET
fumecheng-14015	351	59	effects	effect	NOUN
fumecheng-14015	351	60	.	.	PUNCT
fumecheng-14015	352	1	the	the	DET
fumecheng-14015	352	2	key	key	ADJ
fumecheng-14015	352	3	parameters	parameter	NOUN
fumecheng-14015	352	4	affecting	affect	VERB
fumecheng-14015	352	5	cu	cu	PROPN
fumecheng-14015	352	6	-	-	PUNCT
fumecheng-14015	352	7	cu	cu	PROPN
fumecheng-14015	352	8	bonding	bonding	NOUN
fumecheng-14015	352	9	were	be	AUX
fumecheng-14015	352	10	identified	identify	VERB
fumecheng-14015	352	11	as	as	ADP
fumecheng-14015	352	12	the	the	DET
fumecheng-14015	352	13	thickness	thickness	NOUN
fumecheng-14015	352	14	of	of	ADP
fumecheng-14015	352	15	the	the	DET
fumecheng-14015	352	16	bonding	bonding	NOUN
fumecheng-14015	352	17	layer	layer	NOUN
fumecheng-14015	352	18	,	,	PUNCT
fumecheng-14015	352	19	grain	grain	NOUN
fumecheng-14015	352	20	size	size	NOUN
fumecheng-14015	352	21	,	,	PUNCT
fumecheng-14015	352	22	temperature	temperature	NOUN
fumecheng-14015	352	23	,	,	PUNCT
fumecheng-14015	352	24	and	and	CCONJ
fumecheng-14015	352	25	surface	surface	NOUN
fumecheng-14015	352	26	roughness	roughness	NOUN
fumecheng-14015	352	27	.	.	PUNCT
fumecheng-14015	353	1	increasing	increase	VERB
fumecheng-14015	353	2	the	the	DET
fumecheng-14015	353	3	cu	cu	PROPN
fumecheng-14015	353	4	thickness	thickness	NOUN
fumecheng-14015	353	5	was	be	AUX
fumecheng-14015	353	6	found	find	VERB
fumecheng-14015	353	7	to	to	PART
fumecheng-14015	353	8	enhance	enhance	VERB
fumecheng-14015	353	9	the	the	DET
fumecheng-14015	353	10	bonding	bonding	NOUN
fumecheng-14015	353	11	energy	energy	NOUN
fumecheng-14015	353	12	because	because	SCONJ
fumecheng-14015	353	13	of	of	ADP
fumecheng-14015	353	14	changes	change	NOUN
fumecheng-14015	353	15	in	in	ADP
fumecheng-14015	353	16	the	the	DET
fumecheng-14015	353	17	surface	surface	NOUN
fumecheng-14015	353	18	microstructure	microstructure	NOUN
fumecheng-14015	353	19	that	that	PRON
fumecheng-14015	353	20	depend	depend	VERB
fumecheng-14015	353	21	on	on	ADP
fumecheng-14015	353	22	the	the	DET
fumecheng-14015	353	23	thickness	thickness	NOUN
fumecheng-14015	353	24	;	;	PUNCT
fumecheng-14015	353	25	these	these	DET
fumecheng-14015	353	26	changes	change	NOUN
fumecheng-14015	353	27	were	be	AUX
fumecheng-14015	353	28	examined	examine	VERB
fumecheng-14015	353	29	in	in	ADP
fumecheng-14015	353	30	detail	detail	NOUN
fumecheng-14015	353	31	by	by	ADP
fumecheng-14015	353	32	introducing	introduce	VERB
fumecheng-14015	353	33	artificial	artificial	ADJ
fumecheng-14015	353	34	voids	void	NOUN
fumecheng-14015	353	35	and	and	CCONJ
fumecheng-14015	353	36	performing	perform	VERB
fumecheng-14015	353	37	subsequent	subsequent	ADJ
fumecheng-14015	353	38	theoretical	theoretical	ADJ
fumecheng-14015	353	39	analyses	analysis	NOUN
fumecheng-14015	353	40	.	.	PUNCT
fumecheng-14015	354	1	in	in	ADP
fumecheng-14015	354	2	addition	addition	NOUN
fumecheng-14015	354	3	,	,	PUNCT
fumecheng-14015	354	4	grain	grain	NOUN
fumecheng-14015	354	5	refinement	refinement	NOUN
fumecheng-14015	354	6	was	be	AUX
fumecheng-14015	354	7	shown	show	VERB
fumecheng-14015	354	8	to	to	PART
fumecheng-14015	354	9	suppress	suppress	VERB
fumecheng-14015	354	10	microcrack	microcrack	NOUN
fumecheng-14015	354	11	formation	formation	NOUN
fumecheng-14015	354	12	and	and	CCONJ
fumecheng-14015	354	13	propagation	propagation	NOUN
fumecheng-14015	354	14	,	,	PUNCT
fumecheng-14015	354	15	thereby	thereby	ADV
fumecheng-14015	354	16	improving	improve	VERB
fumecheng-14015	354	17	the	the	DET
fumecheng-14015	354	18	bonding	bonding	NOUN
fumecheng-14015	354	19	performance	performance	NOUN
fumecheng-14015	354	20	,	,	PUNCT
fumecheng-14015	354	21	while	while	SCONJ
fumecheng-14015	354	22	higher	high	ADJ
fumecheng-14015	354	23	bonding	bonding	NOUN
fumecheng-14015	354	24	and	and	CCONJ
fumecheng-14015	354	25	annealing	anneal	VERB
fumecheng-14015	354	26	temperatures	temperature	NOUN
fumecheng-14015	354	27	promoted	promote	VERB
fumecheng-14015	354	28	atomic	atomic	ADJ
fumecheng-14015	354	29	diffusion	diffusion	NOUN
fumecheng-14015	354	30	and	and	CCONJ
fumecheng-14015	354	31	accelerated	accelerate	VERB
fumecheng-14015	354	32	bond	bond	NOUN
fumecheng-14015	354	33	formation	formation	NOUN
fumecheng-14015	354	34	.	.	PUNCT
fumecheng-14015	355	1	with	with	ADP
fumecheng-14015	355	2	regard	regard	NOUN
fumecheng-14015	355	3	to	to	ADP
fumecheng-14015	355	4	surface	surface	NOUN
fumecheng-14015	355	5	roughness	roughness	NOUN
fumecheng-14015	355	6	,	,	PUNCT
fumecheng-14015	355	7	the	the	DET
fumecheng-14015	355	8	bonding	bonding	NOUN
fumecheng-14015	355	9	quality	quality	NOUN
fumecheng-14015	355	10	improved	improve	VERB
fumecheng-14015	355	11	as	as	SCONJ
fumecheng-14015	355	12	the	the	DET
fumecheng-14015	355	13	roughness	roughness	NOUN
fumecheng-14015	355	14	decreased	decrease	VERB
fumecheng-14015	355	15	and	and	CCONJ
fumecheng-14015	355	16	the	the	DET
fumecheng-14015	355	17	true	true	ADJ
fumecheng-14015	355	18	contact	contact	NOUN
fumecheng-14015	355	19	area	area	NOUN
fumecheng-14015	355	20	increased	increase	VERB
fumecheng-14015	355	21	,	,	PUNCT
fumecheng-14015	355	22	but	but	CCONJ
fumecheng-14015	355	23	beyond	beyond	ADP
fumecheng-14015	355	24	a	a	DET
fumecheng-14015	355	25	critical	critical	ADJ
fumecheng-14015	355	26	condition	condition	NOUN
fumecheng-14015	355	27	void	void	VERB
fumecheng-14015	355	28	formation	formation	NOUN
fumecheng-14015	355	29	degraded	degrade	VERB
fumecheng-14015	355	30	the	the	DET
fumecheng-14015	355	31	bonding	bonding	NOUN
fumecheng-14015	355	32	strength	strength	NOUN
fumecheng-14015	355	33	.	.	PUNCT
fumecheng-14015	356	1	various	various	ADJ
fumecheng-14015	356	2	methods	method	NOUN
fumecheng-14015	356	3	for	for	ADP
fumecheng-14015	356	4	achieving	achieve	VERB
fumecheng-14015	356	5	low	low	ADJ
fumecheng-14015	356	6	-	-	PUNCT
fumecheng-14015	356	7	temperature	temperature	NOUN
fumecheng-14015	356	8	bonding	bonding	NOUN
fumecheng-14015	356	9	,	,	PUNCT
fumecheng-14015	356	10	such	such	ADJ
fumecheng-14015	356	11	as	as	ADP
fumecheng-14015	356	12	sab	sab	ADJ
fumecheng-14015	356	13	,	,	PUNCT
fumecheng-14015	356	14	passivation	passivation	NOUN
fumecheng-14015	356	15	,	,	PUNCT
fumecheng-14015	356	16	and	and	CCONJ
fumecheng-14015	356	17	chemical	chemical	NOUN
fumecheng-14015	356	18	pretreatment	pretreatment	NOUN
fumecheng-14015	356	19	,	,	PUNCT
fumecheng-14015	356	20	have	have	AUX
fumecheng-14015	356	21	been	be	AUX
fumecheng-14015	356	22	widely	widely	ADV
fumecheng-14015	356	23	studied	study	VERB
fumecheng-14015	356	24	to	to	PART
fumecheng-14015	356	25	improve	improve	VERB
fumecheng-14015	356	26	the	the	DET
fumecheng-14015	356	27	cu	cu	PROPN
fumecheng-14015	356	28	-	-	PUNCT
fumecheng-14015	356	29	cu	cu	PROPN
fumecheng-14015	356	30	bonding	bonding	NOUN
fumecheng-14015	356	31	quality	quality	NOUN
fumecheng-14015	356	32	,	,	PUNCT
fumecheng-14015	356	33	and	and	CCONJ
fumecheng-14015	356	34	the	the	DET
fumecheng-14015	356	35	advantages	advantage	NOUN
fumecheng-14015	356	36	,	,	PUNCT
fumecheng-14015	356	37	disadvantages	disadvantage	NOUN
fumecheng-14015	356	38	,	,	PUNCT
fumecheng-14015	356	39	and	and	CCONJ
fumecheng-14015	356	40	characteristics	characteristic	NOUN
fumecheng-14015	356	41	of	of	ADP
fumecheng-14015	356	42	these	these	DET
fumecheng-14015	356	43	techniques	technique	NOUN
fumecheng-14015	356	44	are	be	AUX
fumecheng-14015	356	45	summarized	summarize	VERB
fumecheng-14015	356	46	in	in	ADP
fumecheng-14015	356	47	table	table	NOUN
fumecheng-14015	356	48	6	6	NUM
fumecheng-14015	356	49	.	.	PUNCT
fumecheng-14015	357	1	at	at	ADP
fumecheng-14015	357	2	the	the	DET
fumecheng-14015	357	3	same	same	ADJ
fumecheng-14015	357	4	time	time	NOUN
fumecheng-14015	357	5	,	,	PUNCT
fumecheng-14015	357	6	the	the	DET
fumecheng-14015	357	7	high	high	ADJ
fumecheng-14015	357	8	oxidation	oxidation	NOUN
fumecheng-14015	357	9	tendency	tendency	NOUN
fumecheng-14015	357	10	of	of	ADP
fumecheng-14015	357	11	cu	cu	PROPN
fumecheng-14015	357	12	continues	continue	VERB
fumecheng-14015	357	13	to	to	PART
fumecheng-14015	357	14	impose	impose	VERB
fumecheng-14015	357	15	severe	severe	ADJ
fumecheng-14015	357	16	constraints	constraint	NOUN
fumecheng-14015	357	17	on	on	ADP
fumecheng-14015	357	18	the	the	DET
fumecheng-14015	357	19	available	available	ADJ
fumecheng-14015	357	20	thermal	thermal	ADJ
fumecheng-14015	357	21	budget	budget	NOUN
fumecheng-14015	357	22	,	,	PUNCT
fumecheng-14015	357	23	giving	give	VERB
fumecheng-14015	357	24	rise	rise	NOUN
fumecheng-14015	357	25	to	to	ADP
fumecheng-14015	357	26	issues	issue	NOUN
fumecheng-14015	357	27	such	such	ADJ
fumecheng-14015	357	28	as	as	ADP
fumecheng-14015	357	29	wafer	wafer	NOUN
fumecheng-14015	357	30	deformation	deformation	NOUN
fumecheng-14015	357	31	,	,	PUNCT
fumecheng-14015	357	32	increased	increase	VERB
fumecheng-14015	357	33	integration	integration	NOUN
fumecheng-14015	357	34	complexity	complexity	NOUN
fumecheng-14015	357	35	,	,	PUNCT
fumecheng-14015	357	36	and	and	CCONJ
fumecheng-14015	357	37	limited	limited	ADJ
fumecheng-14015	357	38	compatibility	compatibility	NOUN
fumecheng-14015	357	39	with	with	ADP
fumecheng-14015	357	40	front	front	ADJ
fumecheng-14015	357	41	end	end	NOUN
fumecheng-14015	357	42	device	device	NOUN
fumecheng-14015	357	43	structures	structure	NOUN
fumecheng-14015	357	44	.	.	PUNCT
fumecheng-14015	358	1	future	future	ADJ
fumecheng-14015	358	2	progress	progress	NOUN
fumecheng-14015	358	3	toward	toward	ADP
fumecheng-14015	358	4	more	more	ADV
fumecheng-14015	358	5	reliable	reliable	ADJ
fumecheng-14015	358	6	and	and	CCONJ
fumecheng-14015	358	7	manufacturable	manufacturable	PROPN
fumecheng-14015	358	8	cu	cu	PROPN
fumecheng-14015	358	9	-	-	PROPN
fumecheng-14015	358	10	cu	cu	PROPN
fumecheng-14015	358	11	joints	joint	NOUN
fumecheng-14015	358	12	will	will	AUX
fumecheng-14015	358	13	therefore	therefore	ADV
fumecheng-14015	358	14	depend	depend	VERB
fumecheng-14015	358	15	on	on	ADP
fumecheng-14015	358	16	the	the	DET
fumecheng-14015	358	17	combined	combine	VERB
fumecheng-14015	358	18	optimization	optimization	NOUN
fumecheng-14015	358	19	of	of	ADP
fumecheng-14015	358	20	microstructure	microstructure	ADJ
fumecheng-14015	358	21	design	design	NOUN
fumecheng-14015	358	22	(	(	PUNCT
fumecheng-14015	358	23	including	include	VERB
fumecheng-14015	358	24	grain	grain	NOUN
fumecheng-14015	358	25	size	size	NOUN
fumecheng-14015	358	26	,	,	PUNCT
fumecheng-14015	358	27	preferred	preferred	ADJ
fumecheng-14015	358	28	orientation	orientation	NOUN
fumecheng-14015	358	29	,	,	PUNCT
fumecheng-14015	358	30	and	and	CCONJ
fumecheng-14015	358	31	thickness	thickness	NOUN
fumecheng-14015	358	32	)	)	PUNCT
fumecheng-14015	358	33	,	,	PUNCT
fumecheng-14015	358	34	surface	surface	NOUN
fumecheng-14015	358	35	engineering	engineering	NOUN
fumecheng-14015	358	36	(	(	PUNCT
fumecheng-14015	358	37	including	include	VERB
fumecheng-14015	358	38	roughness	roughness	NOUN
fumecheng-14015	358	39	and	and	CCONJ
fumecheng-14015	358	40	oxide	oxide	NOUN
fumecheng-14015	358	41	control	control	NOUN
fumecheng-14015	358	42	)	)	PUNCT
fumecheng-14015	358	43	,	,	PUNCT
fumecheng-14015	358	44	and	and	CCONJ
fumecheng-14015	358	45	thermo	thermo	NOUN
fumecheng-14015	358	46	-	-	PUNCT
fumecheng-14015	358	47	mechanical	mechanical	ADJ
fumecheng-14015	358	48	loading	loading	NOUN
fumecheng-14015	358	49	paths	path	NOUN
fumecheng-14015	358	50	,	,	PUNCT
fumecheng-14015	358	51	particularly	particularly	ADV
fumecheng-14015	358	52	under	under	ADP
fumecheng-14015	358	53	low	low	ADJ
fumecheng-14015	358	54	-	-	PUNCT
fumecheng-14015	358	55	temperature	temperature	NOUN
fumecheng-14015	358	56	and	and	CCONJ
fumecheng-14015	358	57	cu	cu	PROPN
fumecheng-14015	358	58	-	-	PROPN
fumecheng-14015	358	59	cu	cu	PROPN
fumecheng-14015	358	60	mechanical	mechanical	ADJ
fumecheng-14015	358	61	bonding	bonding	NOUN
fumecheng-14015	358	62	for	for	ADP
fumecheng-14015	358	63	3d	3d	NOUN
fumecheng-14015	358	64	integration	integration	NOUN
fumecheng-14015	358	65	of	of	ADP
fumecheng-14015	358	66	the	the	DET
fumecheng-14015	358	67	next	next	ADJ
fumecheng-14015	358	68	generation	generation	NOUN
fumecheng-14015	358	69	electronic	electronic	ADJ
fumecheng-14015	358	70	chips	chip	NOUN
fumecheng-14015	358	71	...	...	PUNCT
fumecheng-14015	359	1	939	939	NUM
fumecheng-14015	359	2	fine	fine	ADJ
fumecheng-14015	359	3	-	-	PUNCT
fumecheng-14015	359	4	pitch	pitch	NOUN
fumecheng-14015	359	5	conditions	condition	NOUN
fumecheng-14015	359	6	.	.	PUNCT
fumecheng-14015	360	1	in	in	ADP
fumecheng-14015	360	2	addition	addition	NOUN
fumecheng-14015	360	3	,	,	PUNCT
fumecheng-14015	360	4	practical	practical	ADJ
fumecheng-14015	360	5	implementation	implementation	NOUN
fumecheng-14015	360	6	in	in	ADP
fumecheng-14015	360	7	high	high	ADJ
fumecheng-14015	360	8	-	-	PUNCT
fumecheng-14015	360	9	throughput	throughput	NOUN
fumecheng-14015	360	10	3d	3d	NUM
fumecheng-14015	360	11	integration	integration	NOUN
fumecheng-14015	360	12	will	will	AUX
fumecheng-14015	360	13	require	require	VERB
fumecheng-14015	360	14	chemistries	chemistry	NOUN
fumecheng-14015	360	15	that	that	PRON
fumecheng-14015	360	16	are	be	AUX
fumecheng-14015	360	17	compatible	compatible	ADJ
fumecheng-14015	360	18	with	with	ADP
fumecheng-14015	360	19	cmos	cmos	NOUN
fumecheng-14015	360	20	processing	processing	NOUN
fumecheng-14015	360	21	,	,	PUNCT
fumecheng-14015	360	22	scalable	scalable	ADJ
fumecheng-14015	360	23	cu	cu	PROPN
fumecheng-14015	360	24	architectures	architecture	NOUN
fumecheng-14015	360	25	dominated	dominate	VERB
fumecheng-14015	360	26	by	by	ADP
fumecheng-14015	360	27	the	the	DET
fumecheng-14015	360	28	(	(	PUNCT
fumecheng-14015	360	29	111	111	NUM
fumecheng-14015	360	30	)	)	PUNCT
fumecheng-14015	360	31	orientation	orientation	NOUN
fumecheng-14015	360	32	or	or	CCONJ
fumecheng-14015	360	33	based	base	VERB
fumecheng-14015	360	34	on	on	ADP
fumecheng-14015	360	35	nanocrystalline	nanocrystalline	PROPN
fumecheng-14015	360	36	cu	cu	PROPN
fumecheng-14015	360	37	,	,	PUNCT
fumecheng-14015	360	38	and	and	CCONJ
fumecheng-14015	360	39	robust	robust	ADJ
fumecheng-14015	360	40	inline	inline	NOUN
fumecheng-14015	360	41	metrology	metrology	NOUN
fumecheng-14015	360	42	and	and	CCONJ
fumecheng-14015	360	43	defect	defect	VERB
fumecheng-14015	360	44	screening	screen	VERB
fumecheng-14015	360	45	schemes	scheme	NOUN
fumecheng-14015	360	46	for	for	ADP
fumecheng-14015	360	47	interfacial	interfacial	ADJ
fumecheng-14015	360	48	voids	void	NOUN
fumecheng-14015	360	49	and	and	CCONJ
fumecheng-14015	360	50	failures	failure	NOUN
fumecheng-14015	360	51	related	relate	VERB
fumecheng-14015	360	52	to	to	ADP
fumecheng-14015	360	53	surface	surface	NOUN
fumecheng-14015	360	54	roughness	roughness	NOUN
fumecheng-14015	360	55	.	.	PUNCT
fumecheng-14015	361	1	the	the	DET
fumecheng-14015	361	2	continued	continue	VERB
fumecheng-14015	361	3	development	development	NOUN
fumecheng-14015	361	4	of	of	ADP
fumecheng-14015	361	5	such	such	ADJ
fumecheng-14015	361	6	cu	cu	PROPN
fumecheng-14015	361	7	-	-	PUNCT
fumecheng-14015	361	8	cu	cu	PROPN
fumecheng-14015	361	9	bonding	bonding	NOUN
fumecheng-14015	361	10	strategies	strategy	NOUN
fumecheng-14015	361	11	under	under	ADP
fumecheng-14015	361	12	a	a	DET
fumecheng-14015	361	13	low	low	ADJ
fumecheng-14015	361	14	thermal	thermal	ADJ
fumecheng-14015	361	15	budget	budget	NOUN
fumecheng-14015	361	16	is	be	AUX
fumecheng-14015	361	17	essential	essential	ADJ
fumecheng-14015	361	18	to	to	PART
fumecheng-14015	361	19	fully	fully	ADV
fumecheng-14015	361	20	exploit	exploit	VERB
fumecheng-14015	361	21	ultra	ultra	ADJ
fumecheng-14015	361	22	-	-	ADJ
fumecheng-14015	361	23	high	high	ADJ
fumecheng-14015	361	24	-	-	PUNCT
fumecheng-14015	361	25	density	density	NOUN
fumecheng-14015	361	26	interconnects	interconnect	NOUN
fumecheng-14015	361	27	in	in	ADP
fumecheng-14015	361	28	next	next	ADJ
fumecheng-14015	361	29	-	-	PUNCT
fumecheng-14015	361	30	generation	generation	NOUN
fumecheng-14015	361	31	three	three	NUM
fumecheng-14015	361	32	-	-	PUNCT
fumecheng-14015	361	33	dimensional	dimensional	ADJ
fumecheng-14015	361	34	integration	integration	NOUN
fumecheng-14015	361	35	,	,	PUNCT
fumecheng-14015	361	36	where	where	SCONJ
fumecheng-14015	361	37	very	very	ADV
fumecheng-14015	361	38	high	high	ADJ
fumecheng-14015	361	39	input	input	NOUN
fumecheng-14015	361	40	and	and	CCONJ
fumecheng-14015	361	41	output	output	NOUN
fumecheng-14015	361	42	density	density	NOUN
fumecheng-14015	361	43	,	,	PUNCT
fumecheng-14015	361	44	power	power	NOUN
fumecheng-14015	361	45	efficiency	efficiency	NOUN
fumecheng-14015	361	46	,	,	PUNCT
fumecheng-14015	361	47	and	and	CCONJ
fumecheng-14015	361	48	long	long	ADJ
fumecheng-14015	361	49	-	-	PUNCT
fumecheng-14015	361	50	term	term	NOUN
fumecheng-14015	361	51	reliability	reliability	NOUN
fumecheng-14015	361	52	must	must	AUX
fumecheng-14015	361	53	be	be	AUX
fumecheng-14015	361	54	satisfied	satisfied	ADJ
fumecheng-14015	361	55	at	at	ADP
fumecheng-14015	361	56	the	the	DET
fumecheng-14015	361	57	same	same	ADJ
fumecheng-14015	361	58	time	time	NOUN
fumecheng-14015	361	59	.	.	PUNCT
fumecheng-14015	362	1	table	table	NOUN
fumecheng-14015	362	2	6	6	NUM
fumecheng-14015	362	3	comparison	comparison	NOUN
fumecheng-14015	362	4	of	of	ADP
fumecheng-14015	362	5	cu	cu	PROPN
fumecheng-14015	362	6	-	-	PUNCT
fumecheng-14015	362	7	cu	cu	PROPN
fumecheng-14015	362	8	bonding	bonding	NOUN
fumecheng-14015	362	9	methods	method	NOUN
fumecheng-14015	362	10	bonding	bond	VERB
fumecheng-14015	362	11	method	method	NOUN
fumecheng-14015	362	12	bonding	bond	VERB
fumecheng-14015	362	13	temperature	temperature	NOUN
fumecheng-14015	362	14	advantages	advantage	NOUN
fumecheng-14015	362	15	disadvantages	disadvantage	VERB
fumecheng-14015	362	16	reference	reference	NOUN
fumecheng-14015	362	17	sab	sab	VERB
fumecheng-14015	362	18	200	200	NUM
fumecheng-14015	362	19	°	°	NOUN
fumecheng-14015	362	20	c	c	X
fumecheng-14015	362	21	-250	-250	PROPN
fumecheng-14015	362	22	°	°	PROPN
fumecheng-14015	362	23	c	c	NOUN
fumecheng-14015	362	24	high	high	ADJ
fumecheng-14015	362	25	bonding	bonding	NOUN
fumecheng-14015	362	26	quality	quality	NOUN
fumecheng-14015	362	27	without	without	ADP
fumecheng-14015	362	28	toxic	toxic	ADJ
fumecheng-14015	362	29	chemical	chemical	NOUN
fumecheng-14015	362	30	cleaning	clean	VERB
fumecheng-14015	362	31	uhv	uhv	NOUN
fumecheng-14015	362	32	environment	environment	NOUN
fumecheng-14015	362	33	low	low	ADJ
fumecheng-14015	362	34	throughput	throughput	PROPN
fumecheng-14015	362	35	complex	complex	ADJ
fumecheng-14015	362	36	process	process	NOUN
fumecheng-14015	362	37	[	[	X
fumecheng-14015	362	38	60	60	NUM
fumecheng-14015	362	39	-	-	SYM
fumecheng-14015	362	40	64	64	NUM
fumecheng-14015	362	41	]	]	PUNCT
fumecheng-14015	362	42	chemical	chemical	NOUN
fumecheng-14015	362	43	pretreatment	pretreatment	NOUN
fumecheng-14015	362	44	250	250	NUM
fumecheng-14015	363	1	°	°	ADP
fumecheng-14015	363	2	c	c	NOUN
fumecheng-14015	363	3	-300	-300	NUM
fumecheng-14015	363	4	°	°	ADP
fumecheng-14015	363	5	c	c	NOUN
fumecheng-14015	363	6	low	low	ADJ
fumecheng-14015	363	7	cost	cost	NOUN
fumecheng-14015	363	8	only	only	ADV
fumecheng-14015	363	9	wafer	wafer	NOUN
fumecheng-14015	363	10	–	–	PUNCT
fumecheng-14015	363	11	wafer	wafer	NOUN
fumecheng-14015	363	12	bonding	bonding	NOUN
fumecheng-14015	363	13	low	low	ADJ
fumecheng-14015	363	14	bonding	bonding	NOUN
fumecheng-14015	363	15	quality	quality	NOUN
fumecheng-14015	363	16	[	[	X
fumecheng-14015	363	17	65	65	NUM
fumecheng-14015	363	18	,	,	PUNCT
fumecheng-14015	363	19	74	74	NUM
fumecheng-14015	363	20	,	,	PUNCT
fumecheng-14015	363	21	75	75	NUM
fumecheng-14015	363	22	,	,	PUNCT
fumecheng-14015	363	23	77	77	NUM
fumecheng-14015	363	24	,	,	PUNCT
fumecheng-14015	363	25	80	80	NUM
fumecheng-14015	363	26	-	-	SYM
fumecheng-14015	363	27	82	82	NUM
fumecheng-14015	363	28	]	]	PUNCT
fumecheng-14015	363	29	pd	pd	NOUN
fumecheng-14015	363	30	passivation	passivation	NOUN
fumecheng-14015	363	31	150	150	NUM
fumecheng-14015	363	32	°	°	NOUN
fumecheng-14015	363	33	c	c	NOUN
fumecheng-14015	363	34	high	high	ADJ
fumecheng-14015	363	35	bonding	bonding	NOUN
fumecheng-14015	363	36	quality	quality	NOUN
fumecheng-14015	363	37	,	,	PUNCT
fumecheng-14015	363	38	high	high	ADJ
fumecheng-14015	363	39	electrical	electrical	ADJ
fumecheng-14015	363	40	performance	performance	NOUN
fumecheng-14015	363	41	and	and	CCONJ
fumecheng-14015	363	42	reliability	reliability	NOUN
fumecheng-14015	363	43	limited	limit	VERB
fumecheng-14015	363	44	application	application	NOUN
fumecheng-14015	363	45	hard	hard	ADJ
fumecheng-14015	363	46	to	to	PART
fumecheng-14015	363	47	control	control	VERB
fumecheng-14015	363	48	surface	surface	NOUN
fumecheng-14015	363	49	roughness	roughness	NOUN
fumecheng-14015	363	50	[	[	X
fumecheng-14015	363	51	89	89	NUM
fumecheng-14015	363	52	]	]	PUNCT
fumecheng-14015	363	53	au	au	PROPN
fumecheng-14015	363	54	,	,	PUNCT
fumecheng-14015	363	55	cr	cr	PRON
fumecheng-14015	363	56	/	/	SYM
fumecheng-14015	363	57	au	au	NOUN
fumecheng-14015	363	58	passivation	passivation	NOUN
fumecheng-14015	363	59	120	120	NUM
fumecheng-14015	363	60	°	°	NOUN
fumecheng-14015	363	61	c	c	NOUN
fumecheng-14015	363	62	very	very	ADV
fumecheng-14015	363	63	low	low	ADJ
fumecheng-14015	363	64	bonding	bonding	NOUN
fumecheng-14015	363	65	temperature	temperature	NOUN
fumecheng-14015	363	66	,	,	PUNCT
fumecheng-14015	363	67	high	high	ADJ
fumecheng-14015	363	68	electrical	electrical	ADJ
fumecheng-14015	363	69	performance	performance	NOUN
fumecheng-14015	363	70	high	high	ADJ
fumecheng-14015	363	71	reliability	reliability	NOUN
fumecheng-14015	363	72	imc	imc	NOUN
fumecheng-14015	363	73	formation	formation	NOUN
fumecheng-14015	364	1	[	[	X
fumecheng-14015	364	2	92	92	NUM
fumecheng-14015	364	3	,	,	PUNCT
fumecheng-14015	364	4	93	93	NUM
fumecheng-14015	364	5	]	]	PUNCT
fumecheng-14015	364	6	(	(	PUNCT
fumecheng-14015	364	7	111	111	NUM
fumecheng-14015	364	8	)	)	PUNCT
fumecheng-14015	364	9	oriented	orient	VERB
fumecheng-14015	364	10	nt	nt	PROPN
fumecheng-14015	364	11	-	-	PUNCT
fumecheng-14015	364	12	cu	cu	ADJ
fumecheng-14015	364	13	150	150	NUM
fumecheng-14015	364	14	°	°	PROPN
fumecheng-14015	364	15	c	c	NOUN
fumecheng-14015	364	16	-300	-300	NUM
fumecheng-14015	364	17	°	°	PROPN
fumecheng-14015	364	18	c	c	PROPN
fumecheng-14015	364	19	high	high	PROPN
fumecheng-14015	364	20	cmos	cmos	PROPN
fumecheng-14015	364	21	compatibility	compatibility	NOUN
fumecheng-14015	364	22	limitation	limitation	NOUN
fumecheng-14015	364	23	of	of	ADP
fumecheng-14015	364	24	fine	fine	ADJ
fumecheng-14015	364	25	-	-	PUNCT
fumecheng-14015	364	26	pitch	pitch	NOUN
fumecheng-14015	364	27	cu	cu	PROPN
fumecheng-14015	364	28	bump	bump	NOUN
fumecheng-14015	364	29	structure	structure	NOUN
fumecheng-14015	364	30	[	[	X
fumecheng-14015	364	31	101	101	NUM
fumecheng-14015	364	32	,	,	PUNCT
fumecheng-14015	364	33	102	102	NUM
fumecheng-14015	364	34	]	]	PUNCT
fumecheng-14015	364	35	acknowledgement	acknowledgement	NOUN
fumecheng-14015	364	36	:	:	PUNCT
fumecheng-14015	364	37	this	this	DET
fumecheng-14015	364	38	research	research	NOUN
fumecheng-14015	364	39	was	be	AUX
fumecheng-14015	364	40	supported	support	VERB
fumecheng-14015	364	41	by	by	ADP
fumecheng-14015	364	42	grdc	grdc	PROPN
fumecheng-14015	364	43	(	(	PUNCT
fumecheng-14015	364	44	global	global	ADJ
fumecheng-14015	364	45	research	research	PROPN
fumecheng-14015	364	46	development	development	NOUN
fumecheng-14015	364	47	center	center	NOUN
fumecheng-14015	364	48	)	)	PUNCT
fumecheng-14015	364	49	cooperative	cooperative	ADJ
fumecheng-14015	364	50	hub	hub	NOUN
fumecheng-14015	364	51	program	program	NOUN
fumecheng-14015	364	52	through	through	ADP
fumecheng-14015	364	53	the	the	DET
fumecheng-14015	364	54	national	national	PROPN
fumecheng-14015	364	55	research	research	PROPN
fumecheng-14015	364	56	foundation	foundation	PROPN
fumecheng-14015	364	57	of	of	ADP
fumecheng-14015	364	58	korea	korea	PROPN
fumecheng-14015	364	59	(	(	PUNCT
fumecheng-14015	364	60	nrf	nrf	NOUN
fumecheng-14015	364	61	)	)	PUNCT
fumecheng-14015	364	62	funded	fund	VERB
fumecheng-14015	364	63	by	by	ADP
fumecheng-14015	364	64	the	the	DET
fumecheng-14015	364	65	ministry	ministry	PROPN
fumecheng-14015	364	66	of	of	ADP
fumecheng-14015	364	67	science	science	PROPN
fumecheng-14015	364	68	and	and	CCONJ
fumecheng-14015	364	69	ict	ict	PROPN
fumecheng-14015	364	70	(	(	PUNCT
fumecheng-14015	364	71	msit	msit	PROPN
fumecheng-14015	364	72	)	)	PUNCT
fumecheng-14015	364	73	(	(	PUNCT
fumecheng-14015	364	74	rs-2023	rs-2023	NOUN
fumecheng-14015	364	75	-	-	PUNCT
fumecheng-14015	364	76	00257595	00257595	NUM
fumecheng-14015	364	77	)	)	PUNCT
fumecheng-14015	364	78	.	.	PUNCT
fumecheng-14015	365	1	references	reference	NOUN
fumecheng-14015	365	2	1	1	NUM
fumecheng-14015	365	3	.	.	PUNCT
fumecheng-14015	366	1	zhao	zhao	PROPN
fumecheng-14015	366	2	,	,	PUNCT
fumecheng-14015	366	3	g.	g.	PROPN
fumecheng-14015	366	4	,	,	PUNCT
fumecheng-14015	366	5	song	song	NOUN
fumecheng-14015	366	6	,	,	PUNCT
fumecheng-14015	366	7	c.	c.	PROPN
fumecheng-14015	366	8	,	,	PUNCT
fumecheng-14015	366	9	wu	wu	PROPN
fumecheng-14015	366	10	,	,	PUNCT
fumecheng-14015	366	11	b.	b.	PROPN
fumecheng-14015	366	12	,	,	PUNCT
fumecheng-14015	366	13	2024	2024	NUM
fumecheng-14015	366	14	,	,	PUNCT
fumecheng-14015	366	15	3d	3d	NUM
fumecheng-14015	366	16	integrated	integrate	VERB
fumecheng-14015	366	17	circuit	circuit	NOUN
fumecheng-14015	366	18	(	(	PUNCT
fumecheng-14015	366	19	3d	3d	PROPN
fumecheng-14015	366	20	ic	ic	NOUN
fumecheng-14015	366	21	)	)	PUNCT
fumecheng-14015	366	22	technology	technology	NOUN
fumecheng-14015	366	23	and	and	CCONJ
fumecheng-14015	366	24	its	its	PRON
fumecheng-14015	366	25	applications	application	NOUN
fumecheng-14015	366	26	,	,	PUNCT
fumecheng-14015	366	27	journal	journal	NOUN
fumecheng-14015	366	28	of	of	ADP
fumecheng-14015	366	29	industrial	industrial	ADJ
fumecheng-14015	366	30	engineering	engineering	NOUN
fumecheng-14015	366	31	and	and	CCONJ
fumecheng-14015	366	32	applied	apply	VERB
fumecheng-14015	366	33	science	science	NOUN
fumecheng-14015	366	34	,	,	PUNCT
fumecheng-14015	366	35	2(4	2(4	NUM
fumecheng-14015	366	36	)	)	PUNCT
fumecheng-14015	366	37	,	,	PUNCT
fumecheng-14015	366	38	pp	pp	ADJ
fumecheng-14015	366	39	.	.	PUNCT
fumecheng-14015	367	1	60	60	NUM
fumecheng-14015	367	2	-	-	SYM
fumecheng-14015	367	3	65	65	NUM
fumecheng-14015	367	4	.	.	NOUN
fumecheng-14015	368	1	2	2	X
fumecheng-14015	368	2	.	.	X
fumecheng-14015	368	3	agarwal	agarwal	PROPN
fumecheng-14015	368	4	,	,	PUNCT
fumecheng-14015	368	5	r.	r.	PROPN
fumecheng-14015	368	6	,	,	PUNCT
fumecheng-14015	368	7	cheng	cheng	PROPN
fumecheng-14015	368	8	,	,	PUNCT
fumecheng-14015	368	9	p.	p.	PROPN
fumecheng-14015	368	10	,	,	PUNCT
fumecheng-14015	368	11	shah	shah	NOUN
fumecheng-14015	368	12	,	,	PUNCT
fumecheng-14015	368	13	p.	p.	PROPN
fumecheng-14015	368	14	,	,	PUNCT
fumecheng-14015	368	15	wilkerson	wilkerson	PROPN
fumecheng-14015	368	16	,	,	PUNCT
fumecheng-14015	368	17	b.	b.	PROPN
fumecheng-14015	368	18	,	,	PUNCT
fumecheng-14015	368	19	swaminathan	swaminathan	ADV
fumecheng-14015	368	20	,	,	PUNCT
fumecheng-14015	368	21	r.	r.	PROPN
fumecheng-14015	368	22	,	,	PUNCT
fumecheng-14015	368	23	wuu	wuu	PROPN
fumecheng-14015	368	24	,	,	PUNCT
fumecheng-14015	368	25	j.	j.	PROPN
fumecheng-14015	368	26	,	,	PUNCT
fumecheng-14015	368	27	mandalapu	mandalapu	PROPN
fumecheng-14015	368	28	,	,	PUNCT
fumecheng-14015	368	29	c.	c.	PROPN
fumecheng-14015	368	30	,	,	PUNCT
fumecheng-14015	368	31	2022	2022	NUM
fumecheng-14015	368	32	,	,	PUNCT
fumecheng-14015	368	33	3d	3d	NUM
fumecheng-14015	368	34	packaging	packaging	NOUN
fumecheng-14015	368	35	for	for	ADP
fumecheng-14015	368	36	heterogeneous	heterogeneous	ADJ
fumecheng-14015	368	37	integration	integration	NOUN
fumecheng-14015	368	38	,	,	PUNCT
fumecheng-14015	368	39	proc	proc	NOUN
fumecheng-14015	368	40	.	.	PUNCT
fumecheng-14015	369	1	2022	2022	NUM
fumecheng-14015	369	2	ieee	ieee	PROPN
fumecheng-14015	369	3	72nd	72nd	NUM
fumecheng-14015	369	4	electronic	electronic	ADJ
fumecheng-14015	369	5	components	component	NOUN
fumecheng-14015	369	6	and	and	CCONJ
fumecheng-14015	369	7	technology	technology	NOUN
fumecheng-14015	369	8	conference	conference	NOUN
fumecheng-14015	369	9	(	(	PUNCT
fumecheng-14015	369	10	ectc	ectc	PROPN
fumecheng-14015	369	11	)	)	PUNCT
fumecheng-14015	369	12	,	,	PUNCT
fumecheng-14015	369	13	san	san	PROPN
fumecheng-14015	369	14	diego	diego	PROPN
fumecheng-14015	369	15	,	,	PUNCT
fumecheng-14015	369	16	usa	usa	PROPN
fumecheng-14015	369	17	,	,	PUNCT
fumecheng-14015	369	18	pp	pp	PROPN
fumecheng-14015	369	19	.	.	PUNCT
fumecheng-14015	369	20	1103	1103	NUM
fumecheng-14015	369	21	-	-	SYM
fumecheng-14015	369	22	1107	1107	NUM
fumecheng-14015	369	23	.	.	PUNCT
fumecheng-14015	370	1	3	3	X
fumecheng-14015	370	2	.	.	X
fumecheng-14015	370	3	lee	lee	PROPN
fumecheng-14015	370	4	,	,	PUNCT
fumecheng-14015	370	5	s.	s.	PROPN
fumecheng-14015	370	6	,	,	PUNCT
fumecheng-14015	370	7	jee	jee	PROPN
fumecheng-14015	370	8	,	,	PUNCT
fumecheng-14015	370	9	y.	y.	PROPN
fumecheng-14015	370	10	,	,	PUNCT
fumecheng-14015	370	11	park	park	NOUN
fumecheng-14015	370	12	,	,	PUNCT
fumecheng-14015	370	13	s.	s.	PROPN
fumecheng-14015	370	14	,	,	PUNCT
fumecheng-14015	370	15	lee	lee	PROPN
fumecheng-14015	370	16	,	,	PUNCT
fumecheng-14015	370	17	s.	s.	PROPN
fumecheng-14015	370	18	,	,	PUNCT
fumecheng-14015	370	19	hwang	hwang	PROPN
fumecheng-14015	370	20	,	,	PUNCT
fumecheng-14015	370	21	b.	b.	PROPN
fumecheng-14015	370	22	,	,	PUNCT
fumecheng-14015	370	23	jo	jo	PROPN
fumecheng-14015	370	24	,	,	PUNCT
fumecheng-14015	370	25	g.	g.	PROPN
fumecheng-14015	370	26	,	,	PUNCT
fumecheng-14015	370	27	lee	lee	PROPN
fumecheng-14015	370	28	,	,	PUNCT
fumecheng-14015	370	29	c.	c.	PROPN
fumecheng-14015	370	30	,	,	PUNCT
fumecheng-14015	370	31	park	park	NOUN
fumecheng-14015	370	32	,	,	PUNCT
fumecheng-14015	370	33	j.	j.	PROPN
fumecheng-14015	370	34	,	,	PUNCT
fumecheng-14015	370	35	jang	jang	PROPN
fumecheng-14015	370	36	,	,	PUNCT
fumecheng-14015	370	37	a.	a.	PROPN
fumecheng-14015	370	38	,	,	PUNCT
fumecheng-14015	370	39	jung	jung	PROPN
fumecheng-14015	370	40	,	,	PUNCT
fumecheng-14015	370	41	h.	h.	PROPN
fumecheng-14015	370	42	,	,	PUNCT
fumecheng-14015	370	43	kim	kim	PROPN
fumecheng-14015	370	44	,	,	PUNCT
fumecheng-14015	370	45	i.	i.	PROPN
fumecheng-14015	370	46	,	,	PUNCT
fumecheng-14015	370	47	kang	kang	PROPN
fumecheng-14015	370	48	,	,	PUNCT
fumecheng-14015	370	49	d.	d.	PROPN
fumecheng-14015	370	50	,	,	PUNCT
fumecheng-14015	370	51	baek	baek	PROPN
fumecheng-14015	370	52	,	,	PUNCT
fumecheng-14015	370	53	s.	s.	PROPN
fumecheng-14015	370	54	,	,	PUNCT
fumecheng-14015	370	55	kim	kim	PROPN
fumecheng-14015	370	56	,	,	PUNCT
fumecheng-14015	370	57	d.w	d.w	PROPN
fumecheng-14015	370	58	.	.	PROPN
fumecheng-14015	370	59	,	,	PUNCT
fumecheng-14015	370	60	kang	kang	PROPN
fumecheng-14015	370	61	,	,	PUNCT
fumecheng-14015	370	62	u.	u.	PROPN
fumecheng-14015	370	63	,	,	PUNCT
fumecheng-14015	370	64	2022	2022	NUM
fumecheng-14015	370	65	,	,	PUNCT
fumecheng-14015	370	66	a	a	DET
fumecheng-14015	370	67	study	study	NOUN
fumecheng-14015	370	68	on	on	ADP
fumecheng-14015	370	69	memory	memory	NOUN
fumecheng-14015	370	70	stack	stack	NOUN
fumecheng-14015	370	71	process	process	NOUN
fumecheng-14015	370	72	by	by	ADP
fumecheng-14015	370	73	hybrid	hybrid	ADJ
fumecheng-14015	370	74	copper	copper	NOUN
fumecheng-14015	370	75	bonding	bonding	NOUN
fumecheng-14015	370	76	(	(	PUNCT
fumecheng-14015	370	77	hcb	hcb	PROPN
fumecheng-14015	370	78	)	)	PUNCT
fumecheng-14015	370	79	technology	technology	NOUN
fumecheng-14015	370	80	,	,	PUNCT
fumecheng-14015	370	81	proc	proc	NOUN
fumecheng-14015	370	82	.	.	PUNCT
fumecheng-14015	371	1	2022	2022	NUM
fumecheng-14015	371	2	ieee	ieee	PROPN
fumecheng-14015	371	3	72nd	72nd	NUM
fumecheng-14015	371	4	electronic	electronic	ADJ
fumecheng-14015	371	5	components	component	NOUN
fumecheng-14015	371	6	and	and	CCONJ
fumecheng-14015	371	7	technology	technology	NOUN
fumecheng-14015	371	8	conference	conference	NOUN
fumecheng-14015	371	9	(	(	PUNCT
fumecheng-14015	371	10	ectc	ectc	PROPN
fumecheng-14015	371	11	)	)	PUNCT
fumecheng-14015	371	12	,	,	PUNCT
fumecheng-14015	371	13	san	san	PROPN
fumecheng-14015	371	14	diego	diego	PROPN
fumecheng-14015	371	15	,	,	PUNCT
fumecheng-14015	371	16	usa	usa	PROPN
fumecheng-14015	371	17	,	,	PUNCT
fumecheng-14015	371	18	pp	pp	PROPN
fumecheng-14015	371	19	.	.	PUNCT
fumecheng-14015	371	20	1085	1085	NUM
fumecheng-14015	371	21	-	-	SYM
fumecheng-14015	371	22	1089	1089	NUM
fumecheng-14015	371	23	.	.	PUNCT
fumecheng-14015	372	1	4	4	X
fumecheng-14015	372	2	.	.	X
fumecheng-14015	372	3	light	light	ADJ
fumecheng-14015	372	4	,	,	PUNCT
fumecheng-14015	372	5	d.	d.	PROPN
fumecheng-14015	372	6	,	,	PUNCT
fumecheng-14015	372	7	faraci	faraci	PROPN
fumecheng-14015	372	8	,	,	PUNCT
fumecheng-14015	372	9	a.	a.	PROPN
fumecheng-14015	372	10	,	,	PUNCT
fumecheng-14015	372	11	fjelstad	fjelstad	NOUN
fumecheng-14015	372	12	,	,	PUNCT
fumecheng-14015	372	13	j.	j.	PROPN
fumecheng-14015	372	14	,	,	PUNCT
fumecheng-14015	372	15	1998	1998	NUM
fumecheng-14015	372	16	,	,	PUNCT
fumecheng-14015	372	17	chip	chip	NOUN
fumecheng-14015	372	18	-	-	PUNCT
fumecheng-14015	372	19	size	size	NOUN
fumecheng-14015	372	20	package	package	NOUN
fumecheng-14015	372	21	technology	technology	NOUN
fumecheng-14015	372	22	for	for	ADP
fumecheng-14015	372	23	semiconductors	semiconductor	NOUN
fumecheng-14015	372	24	,	,	PUNCT
fumecheng-14015	372	25	microwave	microwave	NOUN
fumecheng-14015	372	26	journal	journal	PROPN
fumecheng-14015	372	27	,	,	PUNCT
fumecheng-14015	372	28	41(5	41(5	NUM
fumecheng-14015	372	29	)	)	PUNCT
fumecheng-14015	372	30	,	,	PUNCT
fumecheng-14015	372	31	pp	pp	PROPN
fumecheng-14015	372	32	.	.	PUNCT
fumecheng-14015	373	1	280	280	NUM
fumecheng-14015	373	2	-	-	SYM
fumecheng-14015	373	3	288	288	NUM
fumecheng-14015	373	4	.	.	PUNCT
fumecheng-14015	374	1	940	940	NUM
fumecheng-14015	374	2	s.	s.	PROPN
fumecheng-14015	374	3	choi	choi	PROPN
fumecheng-14015	374	4	,	,	PUNCT
fumecheng-14015	374	5	c.	c.	PROPN
fumecheng-14015	374	6	chen	chen	PROPN
fumecheng-14015	374	7	,	,	PUNCT
fumecheng-14015	374	8	b.	b.	PROPN
fumecheng-14015	374	9	hwang	hwang	PROPN
fumecheng-14015	374	10	5	5	NUM
fumecheng-14015	374	11	.	.	PUNCT
fumecheng-14015	375	1	chen	chen	PROPN
fumecheng-14015	375	2	,	,	PUNCT
fumecheng-14015	375	3	k.n	k.n	PROPN
fumecheng-14015	375	4	.	.	PROPN
fumecheng-14015	375	5	,	,	PUNCT
fumecheng-14015	375	6	tan	tan	PROPN
fumecheng-14015	375	7	,	,	PUNCT
fumecheng-14015	375	8	c.s	c.s	PROPN
fumecheng-14015	375	9	.	.	PROPN
fumecheng-14015	375	10	,	,	PUNCT
fumecheng-14015	375	11	2011	2011	NUM
fumecheng-14015	375	12	,	,	PUNCT
fumecheng-14015	375	13	integration	integration	NOUN
fumecheng-14015	375	14	schemes	scheme	NOUN
fumecheng-14015	375	15	and	and	CCONJ
fumecheng-14015	375	16	enabling	enable	VERB
fumecheng-14015	375	17	technologies	technology	NOUN
fumecheng-14015	375	18	for	for	ADP
fumecheng-14015	375	19	three	three	NUM
fumecheng-14015	375	20	-	-	PUNCT
fumecheng-14015	375	21	dimensional	dimensional	ADJ
fumecheng-14015	375	22	integrated	integrated	ADJ
fumecheng-14015	375	23	circuits	circuit	NOUN
fumecheng-14015	375	24	,	,	PUNCT
fumecheng-14015	375	25	iet	iet	PROPN
fumecheng-14015	375	26	computers	computer	NOUN
fumecheng-14015	375	27	and	and	CCONJ
fumecheng-14015	375	28	digital	digital	ADJ
fumecheng-14015	375	29	techniques	technique	NOUN
fumecheng-14015	375	30	,	,	PUNCT
fumecheng-14015	375	31	5(3	5(3	NUM
fumecheng-14015	375	32	)	)	PUNCT
fumecheng-14015	375	33	,	,	PUNCT
fumecheng-14015	375	34	pp	pp	ADP
fumecheng-14015	375	35	.	.	PUNCT
fumecheng-14015	375	36	160	160	NUM
fumecheng-14015	375	37	-	-	SYM
fumecheng-14015	375	38	168	168	NUM
fumecheng-14015	375	39	.	.	PUNCT
fumecheng-14015	376	1	6	6	NUM
fumecheng-14015	376	2	.	.	X
fumecheng-14015	376	3	ni	ni	PROPN
fumecheng-14015	376	4	,	,	PUNCT
fumecheng-14015	376	5	t.	t.	PROPN
fumecheng-14015	376	6	,	,	PUNCT
fumecheng-14015	376	7	yang	yang	PROPN
fumecheng-14015	376	8	,	,	PUNCT
fumecheng-14015	376	9	z.	z.	PROPN
fumecheng-14015	376	10	,	,	PUNCT
fumecheng-14015	376	11	chang	chang	PROPN
fumecheng-14015	376	12	,	,	PUNCT
fumecheng-14015	376	13	h.	h.	PROPN
fumecheng-14015	376	14	,	,	PUNCT
fumecheng-14015	376	15	zhang	zhang	PROPN
fumecheng-14015	376	16	,	,	PUNCT
fumecheng-14015	376	17	x.	x.	PROPN
fumecheng-14015	376	18	,	,	PUNCT
fumecheng-14015	376	19	lu	lu	PROPN
fumecheng-14015	376	20	,	,	PUNCT
fumecheng-14015	376	21	l.	l.	PROPN
fumecheng-14015	376	22	,	,	PUNCT
fumecheng-14015	376	23	yan	yan	PROPN
fumecheng-14015	376	24	,	,	PUNCT
fumecheng-14015	376	25	a.	a.	PROPN
fumecheng-14015	376	26	,	,	PUNCT
fumecheng-14015	376	27	huang	huang	PROPN
fumecheng-14015	376	28	,	,	PUNCT
fumecheng-14015	376	29	z.	z.	PROPN
fumecheng-14015	376	30	,	,	PUNCT
fumecheng-14015	376	31	wen	wen	PROPN
fumecheng-14015	376	32	,	,	PUNCT
fumecheng-14015	376	33	x.	x.	NOUN
fumecheng-14015	376	34	,	,	PUNCT
fumecheng-14015	376	35	2021	2021	NUM
fumecheng-14015	376	36	,	,	PUNCT
fumecheng-14015	376	37	a	a	DET
fumecheng-14015	376	38	novel	novel	ADJ
fumecheng-14015	376	39	tdma	tdma	NOUN
fumecheng-14015	376	40	-	-	PUNCT
fumecheng-14015	376	41	based	base	VERB
fumecheng-14015	376	42	fault	fault	NOUN
fumecheng-14015	376	43	tolerance	tolerance	NOUN
fumecheng-14015	376	44	technique	technique	NOUN
fumecheng-14015	376	45	for	for	ADP
fumecheng-14015	376	46	the	the	DET
fumecheng-14015	376	47	tsvs	tsvs	NOUN
fumecheng-14015	376	48	in	in	ADP
fumecheng-14015	376	49	3d	3d	NUM
fumecheng-14015	376	50	-	-	PUNCT
fumecheng-14015	376	51	ics	ics	NOUN
fumecheng-14015	376	52	using	use	VERB
fumecheng-14015	376	53	honeycomb	honeycomb	NOUN
fumecheng-14015	376	54	topology	topology	NOUN
fumecheng-14015	376	55	,	,	PUNCT
fumecheng-14015	376	56	ieee	ieee	NOUN
fumecheng-14015	376	57	transactions	transaction	NOUN
fumecheng-14015	376	58	on	on	ADP
fumecheng-14015	376	59	emerging	emerge	VERB
fumecheng-14015	376	60	topics	topic	NOUN
fumecheng-14015	376	61	in	in	ADP
fumecheng-14015	376	62	computing	computing	NOUN
fumecheng-14015	376	63	,	,	PUNCT
fumecheng-14015	376	64	9(2	9(2	NUM
fumecheng-14015	376	65	)	)	PUNCT
fumecheng-14015	376	66	,	,	PUNCT
fumecheng-14015	376	67	pp	pp	ADJ
fumecheng-14015	376	68	.	.	PUNCT
fumecheng-14015	377	1	724	724	NUM
fumecheng-14015	377	2	-	-	SYM
fumecheng-14015	377	3	734	734	NUM
fumecheng-14015	377	4	.	.	PUNCT
fumecheng-14015	378	1	7	7	X
fumecheng-14015	378	2	.	.	X
fumecheng-14015	378	3	koester	koester	NOUN
fumecheng-14015	378	4	,	,	PUNCT
fumecheng-14015	378	5	s.	s.	PROPN
fumecheng-14015	378	6	,	,	PUNCT
fumecheng-14015	378	7	young	young	ADJ
fumecheng-14015	378	8	,	,	PUNCT
fumecheng-14015	378	9	a.	a.	PROPN
fumecheng-14015	378	10	,	,	PUNCT
fumecheng-14015	378	11	yu	yu	PROPN
fumecheng-14015	378	12	,	,	PUNCT
fumecheng-14015	378	13	r.	r.	PROPN
fumecheng-14015	378	14	,	,	PUNCT
fumecheng-14015	378	15	purushothaman	purushothaman	NOUN
fumecheng-14015	378	16	,	,	PUNCT
fumecheng-14015	378	17	s.	s.	PROPN
fumecheng-14015	378	18	,	,	PUNCT
fumecheng-14015	378	19	chen	chen	PROPN
fumecheng-14015	378	20	,	,	PUNCT
fumecheng-14015	378	21	k.-n	k.-n	PROPN
fumecheng-14015	378	22	.	.	PUNCT
fumecheng-14015	378	23	,	,	PUNCT
fumecheng-14015	378	24	la	la	PROPN
fumecheng-14015	378	25	tulipe	tulipe	PROPN
fumecheng-14015	378	26	,	,	PUNCT
fumecheng-14015	378	27	d.	d.	PROPN
fumecheng-14015	378	28	,	,	PUNCT
fumecheng-14015	378	29	narender	narender	PROPN
fumecheng-14015	378	30	,	,	PUNCT
fumecheng-14015	378	31	r.	r.	PROPN
fumecheng-14015	378	32	,	,	PUNCT
fumecheng-14015	378	33	shi	shi	PROPN
fumecheng-14015	378	34	,	,	PUNCT
fumecheng-14015	378	35	l.	l.	PROPN
fumecheng-14015	378	36	,	,	PUNCT
fumecheng-14015	378	37	wordeman	wordeman	PROPN
fumecheng-14015	378	38	,	,	PUNCT
fumecheng-14015	378	39	m.	m.	NOUN
fumecheng-14015	378	40	,	,	PUNCT
fumecheng-14015	378	41	sprogis	sprogis	NOUN
fumecheng-14015	378	42	,	,	PUNCT
fumecheng-14015	378	43	e.	e.	PROPN
fumecheng-14015	378	44	,	,	PUNCT
fumecheng-14015	378	45	2008	2008	NUM
fumecheng-14015	378	46	,	,	PUNCT
fumecheng-14015	378	47	wafer	wafer	NOUN
fumecheng-14015	378	48	-	-	PUNCT
fumecheng-14015	378	49	level	level	NOUN
fumecheng-14015	378	50	3d	3d	NUM
fumecheng-14015	378	51	integration	integration	NOUN
fumecheng-14015	378	52	technology	technology	NOUN
fumecheng-14015	378	53	,	,	PUNCT
fumecheng-14015	378	54	ibm	ibm	PROPN
fumecheng-14015	378	55	journal	journal	NOUN
fumecheng-14015	378	56	of	of	ADP
fumecheng-14015	378	57	research	research	NOUN
fumecheng-14015	378	58	and	and	CCONJ
fumecheng-14015	378	59	development	development	NOUN
fumecheng-14015	378	60	,	,	PUNCT
fumecheng-14015	378	61	52(6	52(6	NOUN
fumecheng-14015	378	62	)	)	PUNCT
fumecheng-14015	378	63	,	,	PUNCT
fumecheng-14015	378	64	pp	pp	ADP
fumecheng-14015	378	65	.	.	PUNCT
fumecheng-14015	379	1	583	583	NUM
fumecheng-14015	379	2	-	-	SYM
fumecheng-14015	379	3	597	597	NUM
fumecheng-14015	379	4	.	.	NOUN
fumecheng-14015	379	5	8	8	NUM
fumecheng-14015	379	6	.	.	PUNCT
fumecheng-14015	380	1	peng	peng	PROPN
fumecheng-14015	380	2	,	,	PUNCT
fumecheng-14015	380	3	l.	l.	PROPN
fumecheng-14015	380	4	,	,	PUNCT
fumecheng-14015	380	5	li	li	PROPN
fumecheng-14015	380	6	,	,	PUNCT
fumecheng-14015	380	7	h.	h.	PROPN
fumecheng-14015	380	8	,	,	PUNCT
fumecheng-14015	380	9	lim	lim	PROPN
fumecheng-14015	380	10	,	,	PUNCT
fumecheng-14015	380	11	d.	d.	PROPN
fumecheng-14015	380	12	,	,	PUNCT
fumecheng-14015	380	13	gao	gao	PROPN
fumecheng-14015	380	14	,	,	PUNCT
fumecheng-14015	380	15	s.	s.	PROPN
fumecheng-14015	380	16	,	,	PUNCT
fumecheng-14015	380	17	tan	tan	PROPN
fumecheng-14015	380	18	,	,	PUNCT
fumecheng-14015	380	19	c.	c.	PROPN
fumecheng-14015	380	20	,	,	PUNCT
fumecheng-14015	380	21	2011	2011	NUM
fumecheng-14015	380	22	,	,	PUNCT
fumecheng-14015	380	23	high	high	ADJ
fumecheng-14015	380	24	-	-	PUNCT
fumecheng-14015	380	25	density	density	NOUN
fumecheng-14015	380	26	3	3	NUM
fumecheng-14015	380	27	-	-	PUNCT
fumecheng-14015	380	28	d	d	NOUN
fumecheng-14015	380	29	interconnect	interconnect	NOUN
fumecheng-14015	380	30	of	of	ADP
fumecheng-14015	380	31	cu	cu	PROPN
fumecheng-14015	380	32	–	–	PUNCT
fumecheng-14015	380	33	cu	cu	PROPN
fumecheng-14015	380	34	contacts	contact	NOUN
fumecheng-14015	380	35	with	with	ADP
fumecheng-14015	380	36	enhanced	enhanced	ADJ
fumecheng-14015	380	37	contact	contact	NOUN
fumecheng-14015	380	38	resistance	resistance	NOUN
fumecheng-14015	380	39	by	by	ADP
fumecheng-14015	380	40	self	self	NOUN
fumecheng-14015	380	41	-	-	PUNCT
fumecheng-14015	380	42	assembled	assemble	VERB
fumecheng-14015	380	43	monolayer	monolayer	NOUN
fumecheng-14015	380	44	(	(	PUNCT
fumecheng-14015	380	45	sam	sam	PROPN
fumecheng-14015	380	46	)	)	PUNCT
fumecheng-14015	380	47	passivation	passivation	NOUN
fumecheng-14015	380	48	,	,	PUNCT
fumecheng-14015	380	49	ieee	ieee	NOUN
fumecheng-14015	380	50	transactions	transaction	NOUN
fumecheng-14015	380	51	on	on	ADP
fumecheng-14015	380	52	electron	electron	NOUN
fumecheng-14015	380	53	devices	device	NOUN
fumecheng-14015	380	54	,	,	PUNCT
fumecheng-14015	380	55	58(8	58(8	NUM
fumecheng-14015	380	56	)	)	PUNCT
fumecheng-14015	380	57	,	,	PUNCT
fumecheng-14015	380	58	pp	pp	ADJ
fumecheng-14015	380	59	.	.	PUNCT
fumecheng-14015	380	60	2500	2500	NUM
fumecheng-14015	380	61	-	-	SYM
fumecheng-14015	380	62	2506	2506	NUM
fumecheng-14015	380	63	.	.	PUNCT
fumecheng-14015	381	1	9	9	NUM
fumecheng-14015	381	2	.	.	X
fumecheng-14015	381	3	bae	bae	PROPN
fumecheng-14015	381	4	,	,	PUNCT
fumecheng-14015	381	5	j.y	j.y	PROPN
fumecheng-14015	381	6	.	.	PROPN
fumecheng-14015	381	7	,	,	PUNCT
fumecheng-14015	381	8	kim	kim	PROPN
fumecheng-14015	381	9	,	,	PUNCT
fumecheng-14015	381	10	m.-s	m.-s	PROPN
fumecheng-14015	381	11	.	.	PROPN
fumecheng-14015	381	12	,	,	PUNCT
fumecheng-14015	381	13	lee	lee	PROPN
fumecheng-14015	381	14	,	,	PUNCT
fumecheng-14015	381	15	h.m	h.m	PROPN
fumecheng-14015	381	16	.	.	PROPN
fumecheng-14015	381	17	,	,	PUNCT
fumecheng-14015	381	18	lee	lee	PROPN
fumecheng-14015	381	19	,	,	PUNCT
fumecheng-14015	381	20	s.g	s.g	PROPN
fumecheng-14015	381	21	.	.	PROPN
fumecheng-14015	381	22	,	,	PUNCT
fumecheng-14015	381	23	lee	lee	PROPN
fumecheng-14015	381	24	,	,	PUNCT
fumecheng-14015	381	25	y.-w	y.-w	PROPN
fumecheng-14015	381	26	.	.	PROPN
fumecheng-14015	381	27	,	,	PUNCT
fumecheng-14015	381	28	moon	moon	PROPN
fumecheng-14015	381	29	,	,	PUNCT
fumecheng-14015	381	30	j.t	j.t	PROPN
fumecheng-14015	381	31	.	.	PROPN
fumecheng-14015	381	32	,	,	PUNCT
fumecheng-14015	381	33	hong	hong	PROPN
fumecheng-14015	381	34	,	,	PUNCT
fumecheng-14015	381	35	w.s	w.s	PROPN
fumecheng-14015	381	36	.	.	PROPN
fumecheng-14015	381	37	,	,	PUNCT
fumecheng-14015	381	38	2023	2023	NUM
fumecheng-14015	381	39	,	,	PUNCT
fumecheng-14015	381	40	bonding	bond	VERB
fumecheng-14015	381	41	property	property	NOUN
fumecheng-14015	381	42	of	of	ADP
fumecheng-14015	381	43	middle	middle	ADJ
fumecheng-14015	381	44	temperature	temperature	NOUN
fumecheng-14015	381	45	sn	sn	PROPN
fumecheng-14015	381	46	-	-	PUNCT
fumecheng-14015	381	47	ag	ag	ADJ
fumecheng-14015	381	48	-	-	PROPN
fumecheng-14015	381	49	cu	cu	PROPN
fumecheng-14015	381	50	solder	solder	NOUN
fumecheng-14015	381	51	ball	ball	NOUN
fumecheng-14015	381	52	joint	joint	NOUN
fumecheng-14015	381	53	of	of	ADP
fumecheng-14015	381	54	ball	ball	NOUN
fumecheng-14015	381	55	grid	grid	PROPN
fumecheng-14015	381	56	array	array	PROPN
fumecheng-14015	381	57	package	package	NOUN
fumecheng-14015	381	58	,	,	PUNCT
fumecheng-14015	381	59	journal	journal	NOUN
fumecheng-14015	381	60	of	of	ADP
fumecheng-14015	381	61	welding	welding	NOUN
fumecheng-14015	381	62	and	and	CCONJ
fumecheng-14015	381	63	joining	join	VERB
fumecheng-14015	381	64	,	,	PUNCT
fumecheng-14015	381	65	41(5	41(5	NUM
fumecheng-14015	381	66	)	)	PUNCT
fumecheng-14015	381	67	,	,	PUNCT
fumecheng-14015	381	68	pp	pp	PROPN
fumecheng-14015	381	69	.	.	PUNCT
fumecheng-14015	382	1	379	379	NUM
fumecheng-14015	382	2	-	-	SYM
fumecheng-14015	382	3	386	386	NUM
fumecheng-14015	382	4	.	.	PUNCT
fumecheng-14015	383	1	10	10	NUM
fumecheng-14015	383	2	.	.	X
fumecheng-14015	384	1	zhang	zhang	PROPN
fumecheng-14015	384	2	,	,	PUNCT
fumecheng-14015	384	3	s.	s.	PROPN
fumecheng-14015	384	4	,	,	PUNCT
fumecheng-14015	384	5	kim	kim	PROPN
fumecheng-14015	384	6	,	,	PUNCT
fumecheng-14015	384	7	s.-h	s.-h	NOUN
fumecheng-14015	384	8	.	.	PROPN
fumecheng-14015	384	9	,	,	PUNCT
fumecheng-14015	384	10	kim	kim	PROPN
fumecheng-14015	384	11	,	,	PUNCT
fumecheng-14015	384	12	t.-w	t.-w	PROPN
fumecheng-14015	384	13	.	.	PROPN
fumecheng-14015	384	14	,	,	PUNCT
fumecheng-14015	384	15	kim	kim	PROPN
fumecheng-14015	384	16	,	,	PUNCT
fumecheng-14015	384	17	y.-s	y.-	NOUN
fumecheng-14015	384	18	.	.	PUNCT
fumecheng-14015	384	19	,	,	PUNCT
fumecheng-14015	384	20	paik	paik	PROPN
fumecheng-14015	384	21	,	,	PUNCT
fumecheng-14015	384	22	k.-w	k.-w	PROPN
fumecheng-14015	384	23	.	.	PROPN
fumecheng-14015	384	24	,	,	PUNCT
fumecheng-14015	384	25	2014	2014	NUM
fumecheng-14015	384	26	,	,	PUNCT
fumecheng-14015	384	27	a	a	DET
fumecheng-14015	384	28	study	study	NOUN
fumecheng-14015	384	29	on	on	ADP
fumecheng-14015	384	30	the	the	DET
fumecheng-14015	384	31	solder	solder	NOUN
fumecheng-14015	384	32	ball	ball	NOUN
fumecheng-14015	384	33	size	size	NOUN
fumecheng-14015	384	34	and	and	CCONJ
fumecheng-14015	384	35	content	content	NOUN
fumecheng-14015	384	36	effects	effect	NOUN
fumecheng-14015	384	37	of	of	ADP
fumecheng-14015	384	38	solder	solder	NOUN
fumecheng-14015	384	39	acfs	acfs	NOUN
fumecheng-14015	384	40	for	for	ADP
fumecheng-14015	384	41	flex	flex	ADJ
fumecheng-14015	384	42	-	-	PUNCT
fumecheng-14015	384	43	on	on	ADP
fumecheng-14015	384	44	-	-	PUNCT
fumecheng-14015	384	45	board	board	NOUN
fumecheng-14015	384	46	assembly	assembly	NOUN
fumecheng-14015	384	47	applications	application	NOUN
fumecheng-14015	384	48	using	use	VERB
fumecheng-14015	384	49	ultrasonic	ultrasonic	ADJ
fumecheng-14015	384	50	bonding	bonding	NOUN
fumecheng-14015	384	51	,	,	PUNCT
fumecheng-14015	384	52	ieee	ieee	NOUN
fumecheng-14015	384	53	transactions	transaction	NOUN
fumecheng-14015	384	54	on	on	ADP
fumecheng-14015	384	55	components	component	NOUN
fumecheng-14015	384	56	,	,	PUNCT
fumecheng-14015	384	57	packaging	packaging	NOUN
fumecheng-14015	384	58	and	and	CCONJ
fumecheng-14015	384	59	manufacturing	manufacturing	NOUN
fumecheng-14015	384	60	technology	technology	NOUN
fumecheng-14015	384	61	,	,	PUNCT
fumecheng-14015	384	62	5(1	5(1	NUM
fumecheng-14015	384	63	)	)	PUNCT
fumecheng-14015	384	64	,	,	PUNCT
fumecheng-14015	385	1	pp	pp	ADP
fumecheng-14015	385	2	.	.	PUNCT
fumecheng-14015	386	1	9	9	NUM
fumecheng-14015	386	2	-	-	SYM
fumecheng-14015	386	3	14	14	NUM
fumecheng-14015	386	4	.	.	PUNCT
fumecheng-14015	387	1	11	11	NUM
fumecheng-14015	387	2	.	.	PUNCT
fumecheng-14015	388	1	noguchi	noguchi	PROPN
fumecheng-14015	388	2	,	,	PUNCT
fumecheng-14015	388	3	k.	k.	PROPN
fumecheng-14015	388	4	,	,	PUNCT
fumecheng-14015	388	5	ikeda	ikeda	PROPN
fumecheng-14015	388	6	,	,	PUNCT
fumecheng-14015	388	7	m.	m.	NOUN
fumecheng-14015	388	8	,	,	PUNCT
fumecheng-14015	388	9	shimizu	shimizu	PROPN
fumecheng-14015	388	10	,	,	PUNCT
fumecheng-14015	388	11	i.	i.	PROPN
fumecheng-14015	388	12	,	,	PUNCT
fumecheng-14015	388	13	kawamura	kawamura	PROPN
fumecheng-14015	388	14	,	,	PUNCT
fumecheng-14015	388	15	y.	y.	PROPN
fumecheng-14015	388	16	,	,	PUNCT
fumecheng-14015	388	17	ohno	ohno	PROPN
fumecheng-14015	388	18	,	,	PUNCT
fumecheng-14015	388	19	y.	y.	PROPN
fumecheng-14015	388	20	,	,	PUNCT
fumecheng-14015	388	21	2001	2001	NUM
fumecheng-14015	388	22	,	,	PUNCT
fumecheng-14015	388	23	effect	effect	NOUN
fumecheng-14015	388	24	of	of	ADP
fumecheng-14015	388	25	cooling	cool	VERB
fumecheng-14015	388	26	rate	rate	NOUN
fumecheng-14015	388	27	on	on	ADP
fumecheng-14015	388	28	microstructure	microstructure	NOUN
fumecheng-14015	388	29	and	and	CCONJ
fumecheng-14015	388	30	strength	strength	NOUN
fumecheng-14015	388	31	properties	property	NOUN
fumecheng-14015	388	32	of	of	ADP
fumecheng-14015	388	33	tin	tin	NOUN
fumecheng-14015	388	34	-	-	PUNCT
fumecheng-14015	388	35	silver	silver	NOUN
fumecheng-14015	388	36	-	-	PUNCT
fumecheng-14015	388	37	copper	copper	NOUN
fumecheng-14015	388	38	solder	solder	NOUN
fumecheng-14015	388	39	ball	ball	NOUN
fumecheng-14015	388	40	bonding	bonding	NOUN
fumecheng-14015	388	41	,	,	PUNCT
fumecheng-14015	388	42	materials	material	NOUN
fumecheng-14015	388	43	transactions	transaction	NOUN
fumecheng-14015	388	44	,	,	PUNCT
fumecheng-14015	388	45	42(5	42(5	NUM
fumecheng-14015	388	46	)	)	PUNCT
fumecheng-14015	388	47	,	,	PUNCT
fumecheng-14015	388	48	pp	pp	ADJ
fumecheng-14015	388	49	.	.	PUNCT
fumecheng-14015	389	1	761	761	NUM
fumecheng-14015	389	2	-	-	SYM
fumecheng-14015	389	3	768	768	NUM
fumecheng-14015	389	4	.	.	PUNCT
fumecheng-14015	390	1	12	12	NUM
fumecheng-14015	390	2	.	.	PUNCT
fumecheng-14015	391	1	hua	hua	PROPN
fumecheng-14015	391	2	zhong	zhong	PROPN
fumecheng-14015	391	3	,	,	PUNCT
fumecheng-14015	391	4	c.	c.	PROPN
fumecheng-14015	391	5	,	,	PUNCT
fumecheng-14015	391	6	yi	yi	PROPN
fumecheng-14015	391	7	,	,	PUNCT
fumecheng-14015	391	8	s.	s.	PROPN
fumecheng-14015	391	9	,	,	PUNCT
fumecheng-14015	391	10	1999	1999	NUM
fumecheng-14015	391	11	,	,	PUNCT
fumecheng-14015	391	12	solder	solder	NOUN
fumecheng-14015	391	13	joint	joint	ADJ
fumecheng-14015	391	14	reliability	reliability	NOUN
fumecheng-14015	391	15	of	of	ADP
fumecheng-14015	391	16	plastic	plastic	ADJ
fumecheng-14015	391	17	ball	ball	NOUN
fumecheng-14015	391	18	grid	grid	NOUN
fumecheng-14015	391	19	array	array	NOUN
fumecheng-14015	391	20	packages	package	NOUN
fumecheng-14015	391	21	,	,	PUNCT
fumecheng-14015	391	22	soldering	soldering	NOUN
fumecheng-14015	391	23	and	and	CCONJ
fumecheng-14015	391	24	surface	surface	NOUN
fumecheng-14015	391	25	mount	mount	PROPN
fumecheng-14015	391	26	technology	technology	NOUN
fumecheng-14015	391	27	,	,	PUNCT
fumecheng-14015	391	28	11(1	11(1	NUM
fumecheng-14015	391	29	)	)	PUNCT
fumecheng-14015	391	30	,	,	PUNCT
fumecheng-14015	391	31	pp	pp	PROPN
fumecheng-14015	391	32	.	.	PUNCT
fumecheng-14015	392	1	44	44	NUM
fumecheng-14015	392	2	-	-	SYM
fumecheng-14015	392	3	48	48	NUM
fumecheng-14015	392	4	.	.	PUNCT
fumecheng-14015	393	1	13	13	NUM
fumecheng-14015	393	2	.	.	PUNCT
fumecheng-14015	394	1	kim	kim	PROPN
fumecheng-14015	394	2	,	,	PUNCT
fumecheng-14015	394	3	j.-w	j.-w	PROPN
fumecheng-14015	394	4	.	.	PROPN
fumecheng-14015	394	5	,	,	PUNCT
fumecheng-14015	394	6	kim	kim	PROPN
fumecheng-14015	394	7	,	,	PUNCT
fumecheng-14015	394	8	d.-g	d.-g	PROPN
fumecheng-14015	394	9	.	.	PUNCT
fumecheng-14015	394	10	,	,	PUNCT
fumecheng-14015	394	11	jung	jung	PROPN
fumecheng-14015	394	12	,	,	PUNCT
fumecheng-14015	394	13	s.-b	s.-b	PROPN
fumecheng-14015	394	14	.	.	PROPN
fumecheng-14015	394	15	,	,	PUNCT
fumecheng-14015	394	16	2005	2005	NUM
fumecheng-14015	394	17	,	,	PUNCT
fumecheng-14015	394	18	mechanical	mechanical	ADJ
fumecheng-14015	394	19	strength	strength	NOUN
fumecheng-14015	394	20	test	test	NOUN
fumecheng-14015	394	21	method	method	NOUN
fumecheng-14015	394	22	for	for	ADP
fumecheng-14015	394	23	solder	solder	NOUN
fumecheng-14015	394	24	ball	ball	NOUN
fumecheng-14015	394	25	joint	joint	NOUN
fumecheng-14015	394	26	in	in	ADP
fumecheng-14015	394	27	bga	bga	PROPN
fumecheng-14015	394	28	package	package	NOUN
fumecheng-14015	394	29	,	,	PUNCT
fumecheng-14015	394	30	metals	metal	NOUN
fumecheng-14015	394	31	and	and	CCONJ
fumecheng-14015	394	32	materials	material	NOUN
fumecheng-14015	394	33	international	international	ADJ
fumecheng-14015	394	34	,	,	PUNCT
fumecheng-14015	394	35	11(2	11(2	NUM
fumecheng-14015	394	36	)	)	PUNCT
fumecheng-14015	394	37	,	,	PUNCT
fumecheng-14015	394	38	pp	pp	PROPN
fumecheng-14015	394	39	.	.	PUNCT
fumecheng-14015	395	1	121	121	NUM
fumecheng-14015	395	2	-	-	SYM
fumecheng-14015	395	3	129	129	NUM
fumecheng-14015	395	4	.	.	PUNCT
fumecheng-14015	396	1	14	14	NUM
fumecheng-14015	396	2	.	.	PUNCT
fumecheng-14015	397	1	lee	lee	PROPN
fumecheng-14015	397	2	,	,	PUNCT
fumecheng-14015	397	3	t.-k	t.-k	PROPN
fumecheng-14015	397	4	.	.	PUNCT
fumecheng-14015	397	5	,	,	PUNCT
fumecheng-14015	397	6	ma	ma	PROPN
fumecheng-14015	397	7	,	,	PUNCT
fumecheng-14015	397	8	h.	h.	PROPN
fumecheng-14015	397	9	,	,	PUNCT
fumecheng-14015	397	10	liu	liu	PROPN
fumecheng-14015	397	11	,	,	PUNCT
fumecheng-14015	397	12	k.-c	k.-c	PROPN
fumecheng-14015	397	13	.	.	PUNCT
fumecheng-14015	397	14	,	,	PUNCT
fumecheng-14015	397	15	xue	xue	PROPN
fumecheng-14015	397	16	,	,	PUNCT
fumecheng-14015	397	17	j.	j.	PROPN
fumecheng-14015	397	18	,	,	PUNCT
fumecheng-14015	397	19	2010	2010	NUM
fumecheng-14015	397	20	,	,	PUNCT
fumecheng-14015	397	21	impact	impact	NOUN
fumecheng-14015	397	22	of	of	ADP
fumecheng-14015	397	23	isothermal	isothermal	ADJ
fumecheng-14015	397	24	aging	aging	NOUN
fumecheng-14015	397	25	on	on	ADP
fumecheng-14015	397	26	long	long	ADJ
fumecheng-14015	397	27	-	-	PUNCT
fumecheng-14015	397	28	term	term	NOUN
fumecheng-14015	397	29	reliability	reliability	NOUN
fumecheng-14015	397	30	of	of	ADP
fumecheng-14015	397	31	fine	fine	ADJ
fumecheng-14015	397	32	-	-	PUNCT
fumecheng-14015	397	33	pitch	pitch	NOUN
fumecheng-14015	397	34	ball	ball	NOUN
fumecheng-14015	397	35	grid	grid	NOUN
fumecheng-14015	397	36	array	array	NOUN
fumecheng-14015	397	37	packages	package	NOUN
fumecheng-14015	397	38	with	with	ADP
fumecheng-14015	397	39	sn	sn	PROPN
fumecheng-14015	397	40	-	-	PUNCT
fumecheng-14015	397	41	ag	ag	ADJ
fumecheng-14015	397	42	-	-	PROPN
fumecheng-14015	397	43	cu	cu	PROPN
fumecheng-14015	397	44	solder	solder	NOUN
fumecheng-14015	397	45	interconnects	interconnect	NOUN
fumecheng-14015	397	46	:	:	PUNCT
fumecheng-14015	397	47	surface	surface	NOUN
fumecheng-14015	397	48	finish	finish	NOUN
fumecheng-14015	397	49	effects	effect	NOUN
fumecheng-14015	397	50	,	,	PUNCT
fumecheng-14015	397	51	journal	journal	NOUN
fumecheng-14015	397	52	of	of	ADP
fumecheng-14015	397	53	electronic	electronic	ADJ
fumecheng-14015	397	54	materials	material	NOUN
fumecheng-14015	397	55	,	,	PUNCT
fumecheng-14015	397	56	39(10	39(10	NUM
fumecheng-14015	397	57	)	)	PUNCT
fumecheng-14015	397	58	,	,	PUNCT
fumecheng-14015	397	59	pp	pp	ADJ
fumecheng-14015	397	60	.	.	PUNCT
fumecheng-14015	398	1	2564	2564	NUM
fumecheng-14015	398	2	-	-	SYM
fumecheng-14015	398	3	2573	2573	NUM
fumecheng-14015	398	4	.	.	PUNCT
fumecheng-14015	399	1	15	15	NUM
fumecheng-14015	399	2	.	.	PUNCT
fumecheng-14015	399	3	lee	lee	PROPN
fumecheng-14015	399	4	,	,	PUNCT
fumecheng-14015	399	5	c.-b	c.-b	PROPN
fumecheng-14015	399	6	.	.	PROPN
fumecheng-14015	399	7	,	,	PUNCT
fumecheng-14015	399	8	jung	jung	PROPN
fumecheng-14015	399	9	,	,	PUNCT
fumecheng-14015	399	10	s.-b	s.-b	PROPN
fumecheng-14015	399	11	.	.	PROPN
fumecheng-14015	399	12	,	,	PUNCT
fumecheng-14015	399	13	shin	shin	PROPN
fumecheng-14015	399	14	,	,	PUNCT
fumecheng-14015	399	15	y.-e	y.-e	PROPN
fumecheng-14015	399	16	.	.	PROPN
fumecheng-14015	399	17	,	,	PUNCT
fumecheng-14015	399	18	shur	shur	PROPN
fumecheng-14015	399	19	,	,	PUNCT
fumecheng-14015	399	20	c.-c	c.-c	PROPN
fumecheng-14015	399	21	.	.	PROPN
fumecheng-14015	399	22	,	,	PUNCT
fumecheng-14015	399	23	2002	2002	NUM
fumecheng-14015	399	24	,	,	PUNCT
fumecheng-14015	399	25	effect	effect	NOUN
fumecheng-14015	399	26	of	of	ADP
fumecheng-14015	399	27	isothermal	isothermal	ADJ
fumecheng-14015	399	28	aging	aging	NOUN
fumecheng-14015	399	29	on	on	ADP
fumecheng-14015	399	30	ball	ball	NOUN
fumecheng-14015	399	31	shear	shear	NOUN
fumecheng-14015	399	32	strength	strength	NOUN
fumecheng-14015	399	33	in	in	ADP
fumecheng-14015	399	34	bga	bga	PROPN
fumecheng-14015	399	35	joints	joint	NOUN
fumecheng-14015	399	36	with	with	ADP
fumecheng-14015	399	37	sn-3.5	sn-3.5	PROPN
fumecheng-14015	399	38	ag-0.75	ag-0.75	PROPN
fumecheng-14015	399	39	cu	cu	PROPN
fumecheng-14015	399	40	solder	solder	NOUN
fumecheng-14015	399	41	,	,	PUNCT
fumecheng-14015	399	42	materials	material	NOUN
fumecheng-14015	399	43	transactions	transaction	NOUN
fumecheng-14015	399	44	,	,	PUNCT
fumecheng-14015	399	45	43(8	43(8	NOUN
fumecheng-14015	399	46	)	)	PUNCT
fumecheng-14015	399	47	,	,	PUNCT
fumecheng-14015	399	48	pp	pp	PROPN
fumecheng-14015	399	49	.	.	PUNCT
fumecheng-14015	400	1	1858	1858	NUM
fumecheng-14015	400	2	-	-	SYM
fumecheng-14015	400	3	1863	1863	NUM
fumecheng-14015	400	4	.	.	PUNCT
fumecheng-14015	401	1	16	16	NUM
fumecheng-14015	401	2	.	.	PUNCT
fumecheng-14015	401	3	lee	lee	PROPN
fumecheng-14015	401	4	,	,	PUNCT
fumecheng-14015	401	5	t.-k	t.-k	PROPN
fumecheng-14015	401	6	.	.	PUNCT
fumecheng-14015	401	7	,	,	PUNCT
fumecheng-14015	401	8	zhou	zhou	PROPN
fumecheng-14015	401	9	,	,	PUNCT
fumecheng-14015	401	10	b.	b.	PROPN
fumecheng-14015	401	11	,	,	PUNCT
fumecheng-14015	401	12	blair	blair	PROPN
fumecheng-14015	401	13	,	,	PUNCT
fumecheng-14015	401	14	l.	l.	PROPN
fumecheng-14015	401	15	,	,	PUNCT
fumecheng-14015	401	16	liu	liu	PROPN
fumecheng-14015	401	17	,	,	PUNCT
fumecheng-14015	401	18	k.-c	k.-c	PROPN
fumecheng-14015	401	19	.	.	PUNCT
fumecheng-14015	401	20	,	,	PUNCT
fumecheng-14015	401	21	bieler	bieler	PROPN
fumecheng-14015	401	22	,	,	PUNCT
fumecheng-14015	401	23	t.r	t.r	PROPN
fumecheng-14015	401	24	.	.	PROPN
fumecheng-14015	401	25	,	,	PUNCT
fumecheng-14015	401	26	2010	2010	NUM
fumecheng-14015	401	27	,	,	PUNCT
fumecheng-14015	401	28	sn	sn	PROPN
fumecheng-14015	401	29	-	-	PUNCT
fumecheng-14015	401	30	ag	ag	ADJ
fumecheng-14015	401	31	-	-	PROPN
fumecheng-14015	401	32	cu	cu	PROPN
fumecheng-14015	401	33	solder	solder	NOUN
fumecheng-14015	401	34	joint	joint	ADJ
fumecheng-14015	401	35	microstructure	microstructure	NOUN
fumecheng-14015	401	36	and	and	CCONJ
fumecheng-14015	401	37	orientation	orientation	NOUN
fumecheng-14015	401	38	evolution	evolution	NOUN
fumecheng-14015	401	39	as	as	ADP
fumecheng-14015	401	40	a	a	DET
fumecheng-14015	401	41	function	function	NOUN
fumecheng-14015	401	42	of	of	ADP
fumecheng-14015	401	43	position	position	NOUN
fumecheng-14015	401	44	and	and	CCONJ
fumecheng-14015	401	45	thermal	thermal	ADJ
fumecheng-14015	401	46	cycles	cycle	NOUN
fumecheng-14015	401	47	in	in	ADP
fumecheng-14015	401	48	ball	ball	NOUN
fumecheng-14015	401	49	grid	grid	NOUN
fumecheng-14015	401	50	arrays	array	VERB
fumecheng-14015	401	51	using	use	VERB
fumecheng-14015	401	52	orientation	orientation	NOUN
fumecheng-14015	401	53	imaging	imaging	NOUN
fumecheng-14015	401	54	microscopy	microscopy	NOUN
fumecheng-14015	401	55	,	,	PUNCT
fumecheng-14015	401	56	journal	journal	NOUN
fumecheng-14015	401	57	of	of	ADP
fumecheng-14015	401	58	electronic	electronic	ADJ
fumecheng-14015	401	59	materials	material	NOUN
fumecheng-14015	401	60	,	,	PUNCT
fumecheng-14015	401	61	39	39	NUM
fumecheng-14015	401	62	,	,	PUNCT
fumecheng-14015	401	63	pp	pp	ADJ
fumecheng-14015	401	64	.	.	PUNCT
fumecheng-14015	402	1	2588	2588	NUM
fumecheng-14015	402	2	-	-	SYM
fumecheng-14015	402	3	2597	2597	NUM
fumecheng-14015	402	4	.	.	PUNCT
fumecheng-14015	403	1	17	17	NUM
fumecheng-14015	403	2	.	.	PUNCT
fumecheng-14015	403	3	gain	gain	NOUN
fumecheng-14015	403	4	,	,	PUNCT
fumecheng-14015	403	5	a.k	a.k	PROPN
fumecheng-14015	403	6	.	.	PROPN
fumecheng-14015	403	7	,	,	PUNCT
fumecheng-14015	403	8	chan	chan	PROPN
fumecheng-14015	403	9	,	,	PUNCT
fumecheng-14015	403	10	y.c	y.c	PROPN
fumecheng-14015	403	11	.	.	PROPN
fumecheng-14015	403	12	,	,	PUNCT
fumecheng-14015	403	13	yung	yung	PROPN
fumecheng-14015	403	14	,	,	PUNCT
fumecheng-14015	403	15	w.k	w.k	PROPN
fumecheng-14015	403	16	.	.	PROPN
fumecheng-14015	403	17	,	,	PUNCT
fumecheng-14015	403	18	2009	2009	NUM
fumecheng-14015	403	19	,	,	PUNCT
fumecheng-14015	403	20	effect	effect	NOUN
fumecheng-14015	403	21	of	of	ADP
fumecheng-14015	403	22	nano	nano	NOUN
fumecheng-14015	403	23	ni	ni	PROPN
fumecheng-14015	403	24	additions	addition	NOUN
fumecheng-14015	403	25	on	on	ADP
fumecheng-14015	403	26	the	the	DET
fumecheng-14015	403	27	structure	structure	NOUN
fumecheng-14015	403	28	and	and	CCONJ
fumecheng-14015	403	29	properties	property	NOUN
fumecheng-14015	403	30	of	of	ADP
fumecheng-14015	403	31	sn–9zn	sn–9zn	PROPN
fumecheng-14015	403	32	and	and	CCONJ
fumecheng-14015	403	33	sn	sn	PROPN
fumecheng-14015	403	34	–	–	PUNCT
fumecheng-14015	403	35	zn–3bi	zn–3bi	PROPN
fumecheng-14015	403	36	solders	solder	NOUN
fumecheng-14015	403	37	in	in	ADP
fumecheng-14015	403	38	au	au	PROPN
fumecheng-14015	403	39	/	/	SYM
fumecheng-14015	403	40	ni	ni	ADJ
fumecheng-14015	403	41	/	/	SYM
fumecheng-14015	403	42	cu	cu	PROPN
fumecheng-14015	403	43	ball	ball	NOUN
fumecheng-14015	403	44	grid	grid	PROPN
fumecheng-14015	403	45	array	array	PROPN
fumecheng-14015	403	46	packages	package	NOUN
fumecheng-14015	403	47	,	,	PUNCT
fumecheng-14015	403	48	materials	material	NOUN
fumecheng-14015	403	49	science	science	NOUN
fumecheng-14015	403	50	and	and	CCONJ
fumecheng-14015	403	51	engineering	engineering	NOUN
fumecheng-14015	403	52	:	:	PUNCT
fumecheng-14015	403	53	b	b	X
fumecheng-14015	403	54	,	,	PUNCT
fumecheng-14015	403	55	162(2	162(2	NUM
fumecheng-14015	403	56	)	)	PUNCT
fumecheng-14015	403	57	,	,	PUNCT
fumecheng-14015	403	58	pp	pp	ADP
fumecheng-14015	403	59	.	.	PUNCT
fumecheng-14015	404	1	92	92	NUM
fumecheng-14015	404	2	-	-	SYM
fumecheng-14015	404	3	98	98	NUM
fumecheng-14015	404	4	.	.	PUNCT
fumecheng-14015	405	1	18	18	NUM
fumecheng-14015	405	2	.	.	PUNCT
fumecheng-14015	406	1	tsukamoto	tsukamoto	PROPN
fumecheng-14015	406	2	,	,	PUNCT
fumecheng-14015	406	3	h.	h.	PROPN
fumecheng-14015	406	4	,	,	PUNCT
fumecheng-14015	406	5	nishimura	nishimura	PROPN
fumecheng-14015	406	6	,	,	PUNCT
fumecheng-14015	406	7	t.	t.	PROPN
fumecheng-14015	406	8	,	,	PUNCT
fumecheng-14015	406	9	suenaga	suenaga	NOUN
fumecheng-14015	406	10	,	,	PUNCT
fumecheng-14015	406	11	s.	s.	PROPN
fumecheng-14015	406	12	,	,	PUNCT
fumecheng-14015	406	13	mcdonald	mcdonald	PROPN
fumecheng-14015	406	14	,	,	PUNCT
fumecheng-14015	406	15	s.d	s.d	PROPN
fumecheng-14015	406	16	.	.	PROPN
fumecheng-14015	406	17	,	,	PUNCT
fumecheng-14015	406	18	sweatman	sweatman	PROPN
fumecheng-14015	406	19	,	,	PUNCT
fumecheng-14015	406	20	k.w	k.w	PROPN
fumecheng-14015	406	21	.	.	PROPN
fumecheng-14015	406	22	,	,	PUNCT
fumecheng-14015	406	23	nogita	nogita	PROPN
fumecheng-14015	406	24	,	,	PUNCT
fumecheng-14015	406	25	k.	k.	PROPN
fumecheng-14015	406	26	,	,	PUNCT
fumecheng-14015	406	27	2011	2011	NUM
fumecheng-14015	406	28	,	,	PUNCT
fumecheng-14015	406	29	the	the	DET
fumecheng-14015	406	30	influence	influence	NOUN
fumecheng-14015	406	31	of	of	ADP
fumecheng-14015	406	32	solder	solder	NOUN
fumecheng-14015	406	33	composition	composition	NOUN
fumecheng-14015	406	34	on	on	ADP
fumecheng-14015	406	35	the	the	DET
fumecheng-14015	406	36	impact	impact	NOUN
fumecheng-14015	406	37	strength	strength	NOUN
fumecheng-14015	406	38	of	of	ADP
fumecheng-14015	406	39	lead	lead	NOUN
fumecheng-14015	406	40	-	-	PUNCT
fumecheng-14015	406	41	free	free	ADJ
fumecheng-14015	406	42	solder	solder	NOUN
fumecheng-14015	406	43	ball	ball	NOUN
fumecheng-14015	406	44	grid	grid	PROPN
fumecheng-14015	406	45	array	array	PROPN
fumecheng-14015	406	46	joints	joint	NOUN
fumecheng-14015	406	47	,	,	PUNCT
fumecheng-14015	406	48	microelectronics	microelectronic	NOUN
fumecheng-14015	406	49	reliability	reliability	NOUN
fumecheng-14015	406	50	,	,	PUNCT
fumecheng-14015	406	51	51(3	51(3	NUM
fumecheng-14015	406	52	)	)	PUNCT
fumecheng-14015	406	53	,	,	PUNCT
fumecheng-14015	406	54	pp	pp	ADJ
fumecheng-14015	406	55	.	.	PUNCT
fumecheng-14015	407	1	657	657	NUM
fumecheng-14015	407	2	-	-	SYM
fumecheng-14015	407	3	667	667	NUM
fumecheng-14015	407	4	.	.	PUNCT
fumecheng-14015	408	1	19	19	NUM
fumecheng-14015	408	2	.	.	PUNCT
fumecheng-14015	409	1	liu	liu	PROPN
fumecheng-14015	409	2	,	,	PUNCT
fumecheng-14015	409	3	d.	d.	PROPN
fumecheng-14015	409	4	,	,	PUNCT
fumecheng-14015	409	5	chen	chen	PROPN
fumecheng-14015	409	6	,	,	PUNCT
fumecheng-14015	409	7	p.-c	p.-c	PROPN
fumecheng-14015	409	8	.	.	PUNCT
fumecheng-14015	409	9	,	,	PUNCT
fumecheng-14015	409	10	liu	liu	PROPN
fumecheng-14015	409	11	,	,	PUNCT
fumecheng-14015	409	12	y.-w	y.-w	PROPN
fumecheng-14015	409	13	.	.	PROPN
fumecheng-14015	409	14	,	,	PUNCT
fumecheng-14015	409	15	hu	hu	PROPN
fumecheng-14015	409	16	,	,	PUNCT
fumecheng-14015	409	17	h.-w	h.-w	PROPN
fumecheng-14015	409	18	.	.	PROPN
fumecheng-14015	409	19	,	,	PUNCT
fumecheng-14015	409	20	chen	chen	PROPN
fumecheng-14015	409	21	,	,	PUNCT
fumecheng-14015	409	22	k.-n	k.-n	PROPN
fumecheng-14015	409	23	.	.	PROPN
fumecheng-14015	409	24	,	,	PUNCT
fumecheng-14015	409	25	2021	2021	NUM
fumecheng-14015	409	26	,	,	PUNCT
fumecheng-14015	409	27	low	low	ADJ
fumecheng-14015	409	28	-	-	PUNCT
fumecheng-14015	409	29	temperature	temperature	NOUN
fumecheng-14015	409	30	(	(	PUNCT
fumecheng-14015	409	31	70	70	NUM
fumecheng-14015	409	32	°	°	NUM
fumecheng-14015	409	33	c	c	X
fumecheng-14015	409	34	)	)	PUNCT
fumecheng-14015	409	35	cu	cu	PROPN
fumecheng-14015	409	36	-	-	PUNCT
fumecheng-14015	409	37	to	to	ADP
fumecheng-14015	409	38	-	-	PUNCT
fumecheng-14015	409	39	cu	cu	NOUN
fumecheng-14015	409	40	direct	direct	ADJ
fumecheng-14015	409	41	bonding	bonding	NOUN
fumecheng-14015	409	42	by	by	ADP
fumecheng-14015	409	43	capping	cap	VERB
fumecheng-14015	409	44	metal	metal	NOUN
fumecheng-14015	409	45	layers	layer	NOUN
fumecheng-14015	409	46	,	,	PUNCT
fumecheng-14015	409	47	ieee	ieee	NOUN
fumecheng-14015	409	48	electron	electron	NOUN
fumecheng-14015	409	49	device	device	NOUN
fumecheng-14015	409	50	letters	letter	NOUN
fumecheng-14015	409	51	,	,	PUNCT
fumecheng-14015	409	52	42(10	42(10	PROPN
fumecheng-14015	409	53	)	)	PUNCT
fumecheng-14015	409	54	,	,	PUNCT
fumecheng-14015	409	55	pp	pp	PROPN
fumecheng-14015	409	56	.	.	PUNCT
fumecheng-14015	409	57	1524	1524	NUM
fumecheng-14015	409	58	-	-	SYM
fumecheng-14015	409	59	1527	1527	NUM
fumecheng-14015	409	60	.	.	PUNCT
fumecheng-14015	410	1	20	20	NUM
fumecheng-14015	410	2	.	.	X
fumecheng-14015	411	1	wang	wang	PROPN
fumecheng-14015	411	2	,	,	PUNCT
fumecheng-14015	411	3	p.j	p.j	PROPN
fumecheng-14015	411	4	.	.	PROPN
fumecheng-14015	411	5	,	,	PUNCT
fumecheng-14015	411	6	lee	lee	PROPN
fumecheng-14015	411	7	,	,	PUNCT
fumecheng-14015	411	8	c.c	c.c	PROPN
fumecheng-14015	411	9	.	.	PROPN
fumecheng-14015	411	10	,	,	PUNCT
fumecheng-14015	411	11	2009	2009	NUM
fumecheng-14015	411	12	,	,	PUNCT
fumecheng-14015	411	13	silver	silver	ADJ
fumecheng-14015	411	14	joints	joint	NOUN
fumecheng-14015	411	15	between	between	ADP
fumecheng-14015	411	16	silicon	silicon	NOUN
fumecheng-14015	411	17	chips	chip	NOUN
fumecheng-14015	411	18	and	and	CCONJ
fumecheng-14015	411	19	copper	copper	NOUN
fumecheng-14015	411	20	substrates	substrate	NOUN
fumecheng-14015	411	21	made	make	VERB
fumecheng-14015	411	22	by	by	ADP
fumecheng-14015	411	23	direct	direct	ADJ
fumecheng-14015	411	24	bonding	bonding	NOUN
fumecheng-14015	411	25	at	at	ADP
fumecheng-14015	411	26	low	low	ADJ
fumecheng-14015	411	27	temperature	temperature	NOUN
fumecheng-14015	411	28	,	,	PUNCT
fumecheng-14015	411	29	ieee	ieee	NOUN
fumecheng-14015	411	30	transactions	transaction	NOUN
fumecheng-14015	411	31	on	on	ADP
fumecheng-14015	411	32	components	component	NOUN
fumecheng-14015	411	33	and	and	CCONJ
fumecheng-14015	411	34	packaging	packaging	NOUN
fumecheng-14015	411	35	technologies	technology	NOUN
fumecheng-14015	411	36	,	,	PUNCT
fumecheng-14015	411	37	33(1	33(1	NUM
fumecheng-14015	411	38	)	)	PUNCT
fumecheng-14015	411	39	,	,	PUNCT
fumecheng-14015	411	40	pp	pp	PROPN
fumecheng-14015	411	41	.	.	PUNCT
fumecheng-14015	412	1	10	10	NUM
fumecheng-14015	412	2	-	-	SYM
fumecheng-14015	412	3	15	15	NUM
fumecheng-14015	412	4	.	.	PUNCT
fumecheng-14015	413	1	21	21	NUM
fumecheng-14015	413	2	.	.	PUNCT
fumecheng-14015	414	1	wang	wang	PROPN
fumecheng-14015	414	2	,	,	PUNCT
fumecheng-14015	414	3	p.j	p.j	PROPN
fumecheng-14015	414	4	.	.	PROPN
fumecheng-14015	414	5	,	,	PUNCT
fumecheng-14015	414	6	kim	kim	PROPN
fumecheng-14015	414	7	,	,	PUNCT
fumecheng-14015	414	8	j.s	j.s	PROPN
fumecheng-14015	414	9	.	.	PROPN
fumecheng-14015	414	10	,	,	PUNCT
fumecheng-14015	414	11	lee	lee	PROPN
fumecheng-14015	414	12	,	,	PUNCT
fumecheng-14015	414	13	c.c	c.c	PROPN
fumecheng-14015	414	14	.	.	PROPN
fumecheng-14015	414	15	,	,	PUNCT
fumecheng-14015	414	16	2008	2008	NUM
fumecheng-14015	414	17	,	,	PUNCT
fumecheng-14015	414	18	direct	direct	ADJ
fumecheng-14015	414	19	silver	silver	NOUN
fumecheng-14015	414	20	to	to	ADP
fumecheng-14015	414	21	copper	copper	NOUN
fumecheng-14015	414	22	bonding	bonding	NOUN
fumecheng-14015	414	23	process	process	NOUN
fumecheng-14015	414	24	,	,	PUNCT
fumecheng-14015	414	25	journal	journal	NOUN
fumecheng-14015	414	26	of	of	ADP
fumecheng-14015	414	27	electronic	electronic	ADJ
fumecheng-14015	414	28	packaging	packaging	NOUN
fumecheng-14015	414	29	,	,	PUNCT
fumecheng-14015	414	30	130(4	130(4	NUM
fumecheng-14015	414	31	)	)	PUNCT
fumecheng-14015	414	32	,	,	PUNCT
fumecheng-14015	414	33	045001	045001	NUM
fumecheng-14015	414	34	.	.	PUNCT
fumecheng-14015	415	1	22	22	NUM
fumecheng-14015	415	2	.	.	PUNCT
fumecheng-14015	415	3	wu	wu	PROPN
fumecheng-14015	415	4	,	,	PUNCT
fumecheng-14015	415	5	j.	j.	PROPN
fumecheng-14015	415	6	,	,	PUNCT
fumecheng-14015	415	7	lee	lee	PROPN
fumecheng-14015	415	8	,	,	PUNCT
fumecheng-14015	415	9	c.c	c.c	PROPN
fumecheng-14015	415	10	.	.	PROPN
fumecheng-14015	415	11	,	,	PUNCT
fumecheng-14015	415	12	2019	2019	NUM
fumecheng-14015	415	13	,	,	PUNCT
fumecheng-14015	415	14	low	low	ADJ
fumecheng-14015	415	15	-	-	PUNCT
fumecheng-14015	415	16	temperature	temperature	NOUN
fumecheng-14015	415	17	ag	ag	PROPN
fumecheng-14015	415	18	-	-	PUNCT
fumecheng-14015	415	19	ag	ag	ADJ
fumecheng-14015	415	20	direct	direct	ADJ
fumecheng-14015	415	21	bonding	bonding	NOUN
fumecheng-14015	415	22	technology	technology	NOUN
fumecheng-14015	415	23	for	for	ADP
fumecheng-14015	415	24	advanced	advanced	ADJ
fumecheng-14015	415	25	chip	chip	NOUN
fumecheng-14015	415	26	-	-	PUNCT
fumecheng-14015	415	27	package	package	NOUN
fumecheng-14015	415	28	interconnection	interconnection	NOUN
fumecheng-14015	415	29	,	,	PUNCT
fumecheng-14015	415	30	proc	proc	NOUN
fumecheng-14015	415	31	.	.	PUNCT
fumecheng-14015	416	1	2019	2019	NUM
fumecheng-14015	416	2	ieee	ieee	NOUN
fumecheng-14015	416	3	69th	69th	ADJ
fumecheng-14015	416	4	electronic	electronic	ADJ
fumecheng-14015	416	5	components	component	NOUN
fumecheng-14015	416	6	and	and	CCONJ
fumecheng-14015	416	7	technology	technology	NOUN
fumecheng-14015	416	8	conference	conference	NOUN
fumecheng-14015	416	9	(	(	PUNCT
fumecheng-14015	416	10	ectc	ectc	PROPN
fumecheng-14015	416	11	)	)	PUNCT
fumecheng-14015	416	12	,	,	PUNCT
fumecheng-14015	416	13	las	las	PROPN
fumecheng-14015	416	14	vegas	vegas	PROPN
fumecheng-14015	416	15	,	,	PUNCT
fumecheng-14015	416	16	usa	usa	PROPN
fumecheng-14015	416	17	,	,	PUNCT
fumecheng-14015	416	18	pp	pp	PROPN
fumecheng-14015	416	19	.	.	PUNCT
fumecheng-14015	417	1	2302	2302	NUM
fumecheng-14015	417	2	-	-	SYM
fumecheng-14015	417	3	2308	2308	NUM
fumecheng-14015	417	4	.	.	PUNCT
fumecheng-14015	418	1	23	23	NUM
fumecheng-14015	418	2	.	.	X
fumecheng-14015	418	3	fang	fang	PROPN
fumecheng-14015	418	4	,	,	PUNCT
fumecheng-14015	418	5	j.-p	j.-p	PROPN
fumecheng-14015	418	6	.	.	PROPN
fumecheng-14015	418	7	,	,	PUNCT
fumecheng-14015	418	8	cai	cai	PROPN
fumecheng-14015	418	9	,	,	PUNCT
fumecheng-14015	418	10	j.	j.	PROPN
fumecheng-14015	418	11	,	,	PUNCT
fumecheng-14015	418	12	wang	wang	PROPN
fumecheng-14015	418	13	,	,	PUNCT
fumecheng-14015	418	14	q.	q.	PROPN
fumecheng-14015	418	15	,	,	PUNCT
fumecheng-14015	418	16	zheng	zheng	PROPN
fumecheng-14015	418	17	,	,	PUNCT
fumecheng-14015	418	18	k.	k.	PROPN
fumecheng-14015	418	19	,	,	PUNCT
fumecheng-14015	418	20	zhou	zhou	PROPN
fumecheng-14015	418	21	,	,	PUNCT
fumecheng-14015	418	22	y.-k	y.-k	PROPN
fumecheng-14015	418	23	.	.	PUNCT
fumecheng-14015	418	24	,	,	PUNCT
fumecheng-14015	418	25	geng	geng	PROPN
fumecheng-14015	418	26	,	,	PUNCT
fumecheng-14015	418	27	z.-t	z.-t	NOUN
fumecheng-14015	418	28	.	.	PUNCT
fumecheng-14015	418	29	,	,	PUNCT
fumecheng-14015	418	30	2022	2022	NUM
fumecheng-14015	418	31	,	,	PUNCT
fumecheng-14015	418	32	low	low	ADJ
fumecheng-14015	418	33	-	-	PUNCT
fumecheng-14015	418	34	temperature	temperature	NOUN
fumecheng-14015	418	35	au	au	NOUN
fumecheng-14015	418	36	-	-	PUNCT
fumecheng-14015	418	37	au	au	ADJ
fumecheng-14015	418	38	bonding	bonding	NOUN
fumecheng-14015	418	39	using	use	VERB
fumecheng-14015	418	40	ag	ag	PROPN
fumecheng-14015	418	41	nanoparticles	nanoparticle	NOUN
fumecheng-14015	418	42	as	as	ADP
fumecheng-14015	418	43	intermediate	intermediate	ADJ
fumecheng-14015	418	44	for	for	ADP
fumecheng-14015	418	45	die	die	VERB
fumecheng-14015	418	46	attachment	attachment	NOUN
fumecheng-14015	418	47	in	in	ADP
fumecheng-14015	418	48	power	power	NOUN
fumecheng-14015	418	49	device	device	NOUN
fumecheng-14015	418	50	packaging	packaging	NOUN
fumecheng-14015	418	51	,	,	PUNCT
fumecheng-14015	418	52	applied	apply	VERB
fumecheng-14015	418	53	surface	surface	NOUN
fumecheng-14015	418	54	science	science	NOUN
fumecheng-14015	418	55	,	,	PUNCT
fumecheng-14015	418	56	593	593	NUM
fumecheng-14015	418	57	,	,	PUNCT
fumecheng-14015	418	58	153436	153436	NUM
fumecheng-14015	418	59	.	.	PUNCT
fumecheng-14015	419	1	24	24	NUM
fumecheng-14015	419	2	.	.	PUNCT
fumecheng-14015	419	3	wu	wu	PROPN
fumecheng-14015	419	4	,	,	PUNCT
fumecheng-14015	419	5	j.	j.	PROPN
fumecheng-14015	419	6	,	,	PUNCT
fumecheng-14015	419	7	huo	huo	PROPN
fumecheng-14015	419	8	,	,	PUNCT
fumecheng-14015	419	9	y.	y.	PROPN
fumecheng-14015	419	10	,	,	PUNCT
fumecheng-14015	419	11	lee	lee	PROPN
fumecheng-14015	419	12	,	,	PUNCT
fumecheng-14015	419	13	c.c	c.c	PROPN
fumecheng-14015	419	14	.	.	PROPN
fumecheng-14015	419	15	,	,	PUNCT
fumecheng-14015	419	16	2018	2018	NUM
fumecheng-14015	419	17	,	,	PUNCT
fumecheng-14015	419	18	direct	direct	ADJ
fumecheng-14015	419	19	ag	ag	PROPN
fumecheng-14015	419	20	-	-	PUNCT
fumecheng-14015	419	21	ag	ag	PROPN
fumecheng-14015	419	22	bonding	bonding	NOUN
fumecheng-14015	419	23	by	by	ADP
fumecheng-14015	419	24	in	in	ADP
fumecheng-14015	419	25	situ	situ	ADJ
fumecheng-14015	419	26	reduction	reduction	NOUN
fumecheng-14015	419	27	of	of	ADP
fumecheng-14015	419	28	surface	surface	NOUN
fumecheng-14015	419	29	oxides	oxide	NOUN
fumecheng-14015	419	30	for	for	ADP
fumecheng-14015	419	31	advanced	advanced	ADJ
fumecheng-14015	419	32	chippackage	chippackage	NOUN
fumecheng-14015	419	33	interconnection	interconnection	NOUN
fumecheng-14015	419	34	,	,	PUNCT
fumecheng-14015	419	35	materialia	materialia	ADV
fumecheng-14015	419	36	,	,	PUNCT
fumecheng-14015	419	37	4	4	NUM
fumecheng-14015	419	38	,	,	PUNCT
fumecheng-14015	419	39	pp	pp	ADJ
fumecheng-14015	419	40	.	.	PUNCT
fumecheng-14015	420	1	417	417	NUM
fumecheng-14015	420	2	-	-	SYM
fumecheng-14015	420	3	422	422	NUM
fumecheng-14015	420	4	.	.	PUNCT
fumecheng-14015	421	1	25	25	NUM
fumecheng-14015	421	2	.	.	PUNCT
fumecheng-14015	422	1	karimi	karimi	PROPN
fumecheng-14015	422	2	,	,	PUNCT
fumecheng-14015	422	3	m.	m.	NOUN
fumecheng-14015	422	4	,	,	PUNCT
fumecheng-14015	422	5	tomkowski	tomkowski	NOUN
fumecheng-14015	422	6	,	,	PUNCT
fumecheng-14015	422	7	t.	t.	PROPN
fumecheng-14015	422	8	,	,	PUNCT
fumecheng-14015	422	9	vidali	vidali	PROPN
fumecheng-14015	422	10	,	,	PUNCT
fumecheng-14015	422	11	g.	g.	PROPN
fumecheng-14015	422	12	,	,	PUNCT
fumecheng-14015	422	13	biham	biham	INTJ
fumecheng-14015	422	14	,	,	PUNCT
fumecheng-14015	422	15	o.	o.	NOUN
fumecheng-14015	422	16	,	,	PUNCT
fumecheng-14015	422	17	1995	1995	NUM
fumecheng-14015	422	18	,	,	PUNCT
fumecheng-14015	422	19	diffusion	diffusion	NOUN
fumecheng-14015	422	20	of	of	ADP
fumecheng-14015	422	21	cu	cu	PROPN
fumecheng-14015	422	22	on	on	ADP
fumecheng-14015	422	23	cu	cu	PROPN
fumecheng-14015	422	24	surfaces	surface	NOUN
fumecheng-14015	422	25	,	,	PUNCT
fumecheng-14015	422	26	physical	physical	ADJ
fumecheng-14015	422	27	review	review	NOUN
fumecheng-14015	422	28	b	b	PROPN
fumecheng-14015	422	29	,	,	PUNCT
fumecheng-14015	422	30	52(7	52(7	NUM
fumecheng-14015	422	31	)	)	PUNCT
fumecheng-14015	422	32	,	,	PUNCT
fumecheng-14015	422	33	pp	pp	ADJ
fumecheng-14015	422	34	.	.	PUNCT
fumecheng-14015	423	1	5364	5364	NUM
fumecheng-14015	423	2	-	-	SYM
fumecheng-14015	423	3	5374	5374	NUM
fumecheng-14015	423	4	.	.	PUNCT
fumecheng-14015	424	1	26	26	NUM
fumecheng-14015	424	2	.	.	PUNCT
fumecheng-14015	424	3	sørensen	sørensen	NOUN
fumecheng-14015	424	4	,	,	PUNCT
fumecheng-14015	424	5	m.r	m.r	PROPN
fumecheng-14015	424	6	.	.	PROPN
fumecheng-14015	424	7	,	,	PUNCT
fumecheng-14015	424	8	mishin	mishin	PROPN
fumecheng-14015	424	9	,	,	PUNCT
fumecheng-14015	424	10	y.	y.	NOUN
fumecheng-14015	424	11	,	,	PUNCT
fumecheng-14015	424	12	voter	voter	PROPN
fumecheng-14015	424	13	,	,	PUNCT
fumecheng-14015	424	14	a.f	a.f	PROPN
fumecheng-14015	424	15	.	.	PROPN
fumecheng-14015	424	16	,	,	PUNCT
fumecheng-14015	424	17	2000	2000	NUM
fumecheng-14015	424	18	,	,	PUNCT
fumecheng-14015	424	19	diffusion	diffusion	NOUN
fumecheng-14015	424	20	mechanisms	mechanism	NOUN
fumecheng-14015	424	21	in	in	ADP
fumecheng-14015	424	22	cu	cu	PROPN
fumecheng-14015	424	23	grain	grain	NOUN
fumecheng-14015	424	24	boundaries	boundary	NOUN
fumecheng-14015	424	25	,	,	PUNCT
fumecheng-14015	424	26	physical	physical	ADJ
fumecheng-14015	424	27	review	review	PROPN
fumecheng-14015	424	28	b	b	PROPN
fumecheng-14015	424	29	,	,	PUNCT
fumecheng-14015	424	30	62(6	62(6	NOUN
fumecheng-14015	424	31	)	)	PUNCT
fumecheng-14015	424	32	,	,	PUNCT
fumecheng-14015	424	33	pp	pp	ADP
fumecheng-14015	424	34	.	.	PUNCT
fumecheng-14015	425	1	3658	3658	NUM
fumecheng-14015	425	2	-	-	SYM
fumecheng-14015	425	3	3673	3673	NUM
fumecheng-14015	425	4	.	.	PUNCT
fumecheng-14015	426	1	27	27	NUM
fumecheng-14015	426	2	.	.	X
fumecheng-14015	427	1	bai	bai	PROPN
fumecheng-14015	427	2	,	,	PUNCT
fumecheng-14015	427	3	x.-m	x.-m	PROPN
fumecheng-14015	427	4	.	.	PUNCT
fumecheng-14015	427	5	,	,	PUNCT
fumecheng-14015	427	6	vernon	vernon	PROPN
fumecheng-14015	427	7	,	,	PUNCT
fumecheng-14015	427	8	l.j	l.j	PROPN
fumecheng-14015	427	9	.	.	PROPN
fumecheng-14015	427	10	,	,	PUNCT
fumecheng-14015	427	11	hoagland	hoagland	PROPN
fumecheng-14015	427	12	,	,	PUNCT
fumecheng-14015	427	13	r.g	r.g	PROPN
fumecheng-14015	427	14	.	.	PROPN
fumecheng-14015	427	15	,	,	PUNCT
fumecheng-14015	427	16	voter	voter	PROPN
fumecheng-14015	427	17	,	,	PUNCT
fumecheng-14015	427	18	a.f	a.f	PROPN
fumecheng-14015	427	19	.	.	PROPN
fumecheng-14015	427	20	,	,	PUNCT
fumecheng-14015	427	21	nastasi	nastasi	PROPN
fumecheng-14015	427	22	,	,	PUNCT
fumecheng-14015	427	23	m.	m.	NOUN
fumecheng-14015	427	24	,	,	PUNCT
fumecheng-14015	427	25	uberuaga	uberuaga	PROPN
fumecheng-14015	427	26	,	,	PUNCT
fumecheng-14015	427	27	b.p	b.p	PROPN
fumecheng-14015	427	28	.	.	PROPN
fumecheng-14015	427	29	,	,	PUNCT
fumecheng-14015	427	30	2012	2012	NUM
fumecheng-14015	427	31	,	,	PUNCT
fumecheng-14015	427	32	role	role	NOUN
fumecheng-14015	427	33	of	of	ADP
fumecheng-14015	427	34	atomic	atomic	ADJ
fumecheng-14015	427	35	structure	structure	NOUN
fumecheng-14015	427	36	on	on	ADP
fumecheng-14015	427	37	grain	grain	NOUN
fumecheng-14015	427	38	boundary	boundary	ADJ
fumecheng-14015	427	39	-	-	PUNCT
fumecheng-14015	427	40	defect	defect	NOUN
fumecheng-14015	427	41	interactions	interaction	NOUN
fumecheng-14015	427	42	in	in	ADP
fumecheng-14015	427	43	cu	cu	PROPN
fumecheng-14015	427	44	,	,	PUNCT
fumecheng-14015	427	45	physical	physical	ADJ
fumecheng-14015	427	46	review	review	PROPN
fumecheng-14015	427	47	b	b	X
fumecheng-14015	427	48	—	—	PUNCT
fumecheng-14015	427	49	condensed	condense	VERB
fumecheng-14015	427	50	matter	matter	NOUN
fumecheng-14015	427	51	and	and	CCONJ
fumecheng-14015	427	52	materials	material	NOUN
fumecheng-14015	427	53	physics	physic	NOUN
fumecheng-14015	427	54	,	,	PUNCT
fumecheng-14015	427	55	85(21	85(21	NUM
fumecheng-14015	427	56	)	)	PUNCT
fumecheng-14015	427	57	,	,	PUNCT
fumecheng-14015	427	58	214103	214103	NUM
fumecheng-14015	427	59	.	.	PUNCT
fumecheng-14015	428	1	cu	cu	PROPN
fumecheng-14015	428	2	-	-	PUNCT
fumecheng-14015	428	3	cu	cu	PROPN
fumecheng-14015	428	4	mechanical	mechanical	ADJ
fumecheng-14015	428	5	bonding	bonding	NOUN
fumecheng-14015	428	6	for	for	ADP
fumecheng-14015	428	7	3d	3d	NOUN
fumecheng-14015	428	8	integration	integration	NOUN
fumecheng-14015	428	9	of	of	ADP
fumecheng-14015	428	10	the	the	DET
fumecheng-14015	428	11	next	next	ADJ
fumecheng-14015	428	12	generation	generation	NOUN
fumecheng-14015	428	13	electronic	electronic	ADJ
fumecheng-14015	428	14	chips	chip	NOUN
fumecheng-14015	428	15	...	...	PUNCT
fumecheng-14015	428	16	941	941	NUM
fumecheng-14015	428	17	28	28	NUM
fumecheng-14015	428	18	.	.	PUNCT
fumecheng-14015	429	1	peng	peng	PROPN
fumecheng-14015	429	2	,	,	PUNCT
fumecheng-14015	429	3	l.	l.	PROPN
fumecheng-14015	429	4	,	,	PUNCT
fumecheng-14015	429	5	lim	lim	PROPN
fumecheng-14015	429	6	,	,	PUNCT
fumecheng-14015	429	7	d.	d.	PROPN
fumecheng-14015	429	8	,	,	PUNCT
fumecheng-14015	429	9	zhang	zhang	PROPN
fumecheng-14015	429	10	,	,	PUNCT
fumecheng-14015	429	11	l.	l.	PROPN
fumecheng-14015	429	12	,	,	PUNCT
fumecheng-14015	429	13	li	li	PROPN
fumecheng-14015	429	14	,	,	PUNCT
fumecheng-14015	429	15	h.	h.	PROPN
fumecheng-14015	429	16	,	,	PUNCT
fumecheng-14015	429	17	tan	tan	PROPN
fumecheng-14015	429	18	,	,	PUNCT
fumecheng-14015	429	19	c.s	c.s	PROPN
fumecheng-14015	429	20	.	.	PROPN
fumecheng-14015	429	21	,	,	PUNCT
fumecheng-14015	429	22	2012	2012	NUM
fumecheng-14015	429	23	,	,	PUNCT
fumecheng-14015	429	24	effect	effect	NOUN
fumecheng-14015	429	25	of	of	ADP
fumecheng-14015	429	26	prebonding	prebonde	VERB
fumecheng-14015	429	27	anneal	anneal	NOUN
fumecheng-14015	429	28	on	on	ADP
fumecheng-14015	429	29	the	the	DET
fumecheng-14015	429	30	microstructure	microstructure	ADJ
fumecheng-14015	429	31	evolution	evolution	NOUN
fumecheng-14015	429	32	and	and	CCONJ
fumecheng-14015	429	33	cu	cu	PROPN
fumecheng-14015	429	34	–	–	PUNCT
fumecheng-14015	429	35	cu	cu	NOUN
fumecheng-14015	429	36	diffusion	diffusion	NOUN
fumecheng-14015	429	37	bonding	bonding	NOUN
fumecheng-14015	429	38	quality	quality	NOUN
fumecheng-14015	429	39	for	for	ADP
fumecheng-14015	429	40	three	three	NUM
fumecheng-14015	429	41	-	-	PUNCT
fumecheng-14015	429	42	dimensional	dimensional	ADJ
fumecheng-14015	429	43	integration	integration	NOUN
fumecheng-14015	429	44	,	,	PUNCT
fumecheng-14015	429	45	journal	journal	NOUN
fumecheng-14015	429	46	of	of	ADP
fumecheng-14015	429	47	electronic	electronic	ADJ
fumecheng-14015	429	48	materials	material	NOUN
fumecheng-14015	429	49	,	,	PUNCT
fumecheng-14015	429	50	41	41	NUM
fumecheng-14015	429	51	,	,	PUNCT
fumecheng-14015	429	52	pp	pp	ADJ
fumecheng-14015	429	53	.	.	PUNCT
fumecheng-14015	429	54	2567	2567	NUM
fumecheng-14015	429	55	-	-	SYM
fumecheng-14015	429	56	2572	2572	NUM
fumecheng-14015	429	57	.	.	PUNCT
fumecheng-14015	430	1	29	29	NUM
fumecheng-14015	430	2	.	.	X
fumecheng-14015	431	1	utsumi	utsumi	PROPN
fumecheng-14015	431	2	,	,	PUNCT
fumecheng-14015	431	3	j.	j.	PROPN
fumecheng-14015	431	4	,	,	PUNCT
fumecheng-14015	431	5	ichiyanagi	ichiyanagi	PROPN
fumecheng-14015	431	6	,	,	PUNCT
fumecheng-14015	431	7	y.	y.	NOUN
fumecheng-14015	431	8	,	,	PUNCT
fumecheng-14015	431	9	2014	2014	NUM
fumecheng-14015	431	10	,	,	PUNCT
fumecheng-14015	431	11	effect	effect	NOUN
fumecheng-14015	431	12	of	of	ADP
fumecheng-14015	431	13	bonding	bond	VERB
fumecheng-14015	431	14	pressure	pressure	NOUN
fumecheng-14015	431	15	on	on	ADP
fumecheng-14015	431	16	the	the	DET
fumecheng-14015	431	17	strength	strength	NOUN
fumecheng-14015	431	18	of	of	ADP
fumecheng-14015	431	19	cu	cu	PROPN
fumecheng-14015	431	20	/	/	SYM
fumecheng-14015	431	21	cu	cu	PROPN
fumecheng-14015	431	22	direct	direct	ADJ
fumecheng-14015	431	23	bonding	bonding	NOUN
fumecheng-14015	431	24	by	by	ADP
fumecheng-14015	431	25	surface	surface	NOUN
fumecheng-14015	431	26	activated	activate	VERB
fumecheng-14015	431	27	method	method	NOUN
fumecheng-14015	431	28	,	,	PUNCT
fumecheng-14015	431	29	ieej	ieej	NOUN
fumecheng-14015	431	30	transactions	transaction	NOUN
fumecheng-14015	431	31	on	on	ADP
fumecheng-14015	431	32	sensors	sensor	NOUN
fumecheng-14015	431	33	and	and	CCONJ
fumecheng-14015	431	34	micromachines	micromachine	NOUN
fumecheng-14015	431	35	,	,	PUNCT
fumecheng-14015	431	36	134(9	134(9	NUM
fumecheng-14015	431	37	)	)	PUNCT
fumecheng-14015	431	38	,	,	PUNCT
fumecheng-14015	431	39	pp	pp	PROPN
fumecheng-14015	431	40	.	.	PUNCT
fumecheng-14015	431	41	284	284	NUM
fumecheng-14015	431	42	-	-	SYM
fumecheng-14015	431	43	289	289	NUM
fumecheng-14015	431	44	.	.	PUNCT
fumecheng-14015	431	45	30	30	NUM
fumecheng-14015	431	46	.	.	PUNCT
fumecheng-14015	432	1	takagi	takagi	PROPN
fumecheng-14015	432	2	,	,	PUNCT
fumecheng-14015	432	3	h.	h.	PROPN
fumecheng-14015	432	4	,	,	PUNCT
fumecheng-14015	432	5	maeda	maeda	PROPN
fumecheng-14015	432	6	,	,	PUNCT
fumecheng-14015	432	7	r.	r.	PROPN
fumecheng-14015	432	8	,	,	PUNCT
fumecheng-14015	432	9	chung	chung	PROPN
fumecheng-14015	432	10	,	,	PUNCT
fumecheng-14015	432	11	t.r	t.r	PROPN
fumecheng-14015	432	12	.	.	PROPN
fumecheng-14015	432	13	,	,	PUNCT
fumecheng-14015	432	14	hosoda	hosoda	PROPN
fumecheng-14015	432	15	,	,	PUNCT
fumecheng-14015	432	16	n.	n.	NOUN
fumecheng-14015	432	17	,	,	PUNCT
fumecheng-14015	432	18	suga	suga	PROPN
fumecheng-14015	432	19	,	,	PUNCT
fumecheng-14015	432	20	t.	t.	PROPN
fumecheng-14015	432	21	,	,	PUNCT
fumecheng-14015	432	22	1998	1998	NUM
fumecheng-14015	432	23	,	,	PUNCT
fumecheng-14015	432	24	effect	effect	NOUN
fumecheng-14015	432	25	of	of	ADP
fumecheng-14015	432	26	surface	surface	NOUN
fumecheng-14015	432	27	roughness	roughness	NOUN
fumecheng-14015	432	28	on	on	ADP
fumecheng-14015	432	29	room	room	NOUN
fumecheng-14015	432	30	-	-	PUNCT
fumecheng-14015	432	31	temperature	temperature	NOUN
fumecheng-14015	432	32	wafer	wafer	NOUN
fumecheng-14015	432	33	bonding	bonding	NOUN
fumecheng-14015	432	34	by	by	ADP
fumecheng-14015	432	35	ar	ar	PROPN
fumecheng-14015	432	36	beam	beam	PROPN
fumecheng-14015	432	37	surface	surface	NOUN
fumecheng-14015	432	38	activation	activation	NOUN
fumecheng-14015	432	39	,	,	PUNCT
fumecheng-14015	432	40	japanese	japanese	ADJ
fumecheng-14015	432	41	journal	journal	NOUN
fumecheng-14015	432	42	of	of	ADP
fumecheng-14015	432	43	applied	applied	ADJ
fumecheng-14015	432	44	physics	physics	NOUN
fumecheng-14015	432	45	,	,	PUNCT
fumecheng-14015	432	46	37(7	37(7	NUM
fumecheng-14015	432	47	)	)	PUNCT
fumecheng-14015	432	48	,	,	PUNCT
fumecheng-14015	432	49	pp	pp	ADJ
fumecheng-14015	432	50	.	.	PUNCT
fumecheng-14015	433	1	4197	4197	NUM
fumecheng-14015	433	2	-	-	SYM
fumecheng-14015	433	3	4203	4203	NUM
fumecheng-14015	433	4	.	.	PUNCT
fumecheng-14015	434	1	31	31	NUM
fumecheng-14015	434	2	.	.	PUNCT
fumecheng-14015	434	3	gondcharton	gondcharton	NOUN
fumecheng-14015	434	4	,	,	PUNCT
fumecheng-14015	434	5	p.	p.	NOUN
fumecheng-14015	434	6	,	,	PUNCT
fumecheng-14015	434	7	imbert	imbert	PROPN
fumecheng-14015	434	8	,	,	PUNCT
fumecheng-14015	434	9	b.	b.	PROPN
fumecheng-14015	434	10	,	,	PUNCT
fumecheng-14015	434	11	benaissa	benaissa	PROPN
fumecheng-14015	434	12	,	,	PUNCT
fumecheng-14015	434	13	l.	l.	PROPN
fumecheng-14015	434	14	,	,	PUNCT
fumecheng-14015	434	15	verdier	verdier	NOUN
fumecheng-14015	434	16	,	,	PUNCT
fumecheng-14015	434	17	m.	m.	NOUN
fumecheng-14015	434	18	,	,	PUNCT
fumecheng-14015	434	19	2015	2015	NUM
fumecheng-14015	434	20	,	,	PUNCT
fumecheng-14015	434	21	copper	copper	NOUN
fumecheng-14015	434	22	-	-	PUNCT
fumecheng-14015	434	23	copper	copper	NOUN
fumecheng-14015	434	24	direct	direct	ADJ
fumecheng-14015	434	25	bonding	bonding	NOUN
fumecheng-14015	434	26	:	:	PUNCT
fumecheng-14015	434	27	impact	impact	NOUN
fumecheng-14015	434	28	of	of	ADP
fumecheng-14015	434	29	grain	grain	NOUN
fumecheng-14015	434	30	size	size	NOUN
fumecheng-14015	434	31	,	,	PUNCT
fumecheng-14015	434	32	proc	proc	NOUN
fumecheng-14015	434	33	.	.	PROPN
fumecheng-14015	434	34	2015	2015	NUM
fumecheng-14015	434	35	ieee	ieee	NOUN
fumecheng-14015	434	36	international	international	ADJ
fumecheng-14015	434	37	interconnect	interconnect	NOUN
fumecheng-14015	434	38	technology	technology	NOUN
fumecheng-14015	434	39	conference	conference	NOUN
fumecheng-14015	434	40	and	and	CCONJ
fumecheng-14015	434	41	2015	2015	NUM
fumecheng-14015	434	42	ieee	ieee	NOUN
fumecheng-14015	434	43	materials	material	NOUN
fumecheng-14015	434	44	for	for	ADP
fumecheng-14015	434	45	advanced	advanced	ADJ
fumecheng-14015	434	46	metallization	metallization	NOUN
fumecheng-14015	434	47	conference	conference	NOUN
fumecheng-14015	434	48	(	(	PUNCT
fumecheng-14015	434	49	iitc	iitc	NOUN
fumecheng-14015	434	50	/	/	SYM
fumecheng-14015	434	51	mam	mam	PROPN
fumecheng-14015	434	52	)	)	PUNCT
fumecheng-14015	434	53	,	,	PUNCT
fumecheng-14015	434	54	grenoble	grenoble	PROPN
fumecheng-14015	434	55	,	,	PUNCT
fumecheng-14015	434	56	france	france	PROPN
fumecheng-14015	434	57	,	,	PUNCT
fumecheng-14015	434	58	pp	pp	X
fumecheng-14015	434	59	.	.	PUNCT
fumecheng-14015	435	1	229	229	NUM
fumecheng-14015	435	2	-	-	SYM
fumecheng-14015	435	3	232	232	NUM
fumecheng-14015	435	4	.	.	PUNCT
fumecheng-14015	436	1	32	32	NUM
fumecheng-14015	436	2	.	.	PUNCT
fumecheng-14015	437	1	timoshevskii	timoshevskii	VERB
fumecheng-14015	437	2	,	,	PUNCT
fumecheng-14015	437	3	v.	v.	ADV
fumecheng-14015	437	4	,	,	PUNCT
fumecheng-14015	437	5	ke	ke	PROPN
fumecheng-14015	437	6	,	,	PUNCT
fumecheng-14015	437	7	y.	y.	PROPN
fumecheng-14015	437	8	,	,	PUNCT
fumecheng-14015	437	9	guo	guo	PROPN
fumecheng-14015	437	10	,	,	PUNCT
fumecheng-14015	437	11	h.	h.	PROPN
fumecheng-14015	437	12	,	,	PUNCT
fumecheng-14015	437	13	gall	gall	PROPN
fumecheng-14015	437	14	,	,	PUNCT
fumecheng-14015	437	15	d.	d.	PROPN
fumecheng-14015	437	16	,	,	PUNCT
fumecheng-14015	437	17	2008	2008	NUM
fumecheng-14015	437	18	,	,	PUNCT
fumecheng-14015	437	19	the	the	DET
fumecheng-14015	437	20	influence	influence	NOUN
fumecheng-14015	437	21	of	of	ADP
fumecheng-14015	437	22	surface	surface	NOUN
fumecheng-14015	437	23	roughness	roughness	NOUN
fumecheng-14015	437	24	on	on	ADP
fumecheng-14015	437	25	electrical	electrical	ADJ
fumecheng-14015	437	26	conductance	conductance	NOUN
fumecheng-14015	437	27	of	of	ADP
fumecheng-14015	437	28	thin	thin	PROPN
fumecheng-14015	437	29	cu	cu	PROPN
fumecheng-14015	437	30	films	film	NOUN
fumecheng-14015	437	31	:	:	PUNCT
fumecheng-14015	437	32	an	an	DET
fumecheng-14015	437	33	ab	ab	PROPN
fumecheng-14015	437	34	initio	initio	PROPN
fumecheng-14015	437	35	study	study	PROPN
fumecheng-14015	437	36	,	,	PUNCT
fumecheng-14015	437	37	journal	journal	NOUN
fumecheng-14015	437	38	of	of	ADP
fumecheng-14015	437	39	applied	applied	ADJ
fumecheng-14015	437	40	physics	physics	NOUN
fumecheng-14015	437	41	,	,	PUNCT
fumecheng-14015	437	42	103(11	103(11	NUM
fumecheng-14015	437	43	)	)	PUNCT
fumecheng-14015	437	44	,	,	PUNCT
fumecheng-14015	437	45	113705	113705	NUM
fumecheng-14015	437	46	.	.	PUNCT
fumecheng-14015	438	1	33	33	NUM
fumecheng-14015	438	2	.	.	PUNCT
fumecheng-14015	439	1	ke	ke	PROPN
fumecheng-14015	439	2	,	,	PUNCT
fumecheng-14015	439	3	y.	y.	PROPN
fumecheng-14015	439	4	,	,	PUNCT
fumecheng-14015	439	5	zahid	zahid	PROPN
fumecheng-14015	439	6	,	,	PUNCT
fumecheng-14015	439	7	f.	f.	PROPN
fumecheng-14015	439	8	,	,	PUNCT
fumecheng-14015	439	9	timoshevskii	timoshevskii	PROPN
fumecheng-14015	439	10	,	,	PUNCT
fumecheng-14015	439	11	v.	v.	PROPN
fumecheng-14015	439	12	,	,	PUNCT
fumecheng-14015	439	13	xia	xia	PROPN
fumecheng-14015	439	14	,	,	PUNCT
fumecheng-14015	439	15	k.	k.	PROPN
fumecheng-14015	439	16	,	,	PUNCT
fumecheng-14015	439	17	gall	gall	PROPN
fumecheng-14015	439	18	,	,	PUNCT
fumecheng-14015	439	19	d.	d.	PROPN
fumecheng-14015	439	20	,	,	PUNCT
fumecheng-14015	439	21	guo	guo	PROPN
fumecheng-14015	439	22	,	,	PUNCT
fumecheng-14015	439	23	h.	h.	PROPN
fumecheng-14015	439	24	,	,	PUNCT
fumecheng-14015	439	25	2009	2009	NUM
fumecheng-14015	439	26	,	,	PUNCT
fumecheng-14015	439	27	resistivity	resistivity	NOUN
fumecheng-14015	439	28	of	of	ADP
fumecheng-14015	439	29	thin	thin	PROPN
fumecheng-14015	439	30	cu	cu	PROPN
fumecheng-14015	439	31	films	film	NOUN
fumecheng-14015	439	32	with	with	ADP
fumecheng-14015	439	33	surface	surface	NOUN
fumecheng-14015	439	34	roughness	roughness	NOUN
fumecheng-14015	439	35	,	,	PUNCT
fumecheng-14015	439	36	physical	physical	ADJ
fumecheng-14015	439	37	review	review	NOUN
fumecheng-14015	439	38	b	b	X
fumecheng-14015	439	39	—	—	PUNCT
fumecheng-14015	439	40	condensed	condense	VERB
fumecheng-14015	439	41	matter	matter	NOUN
fumecheng-14015	439	42	and	and	CCONJ
fumecheng-14015	439	43	materials	material	NOUN
fumecheng-14015	439	44	physics	physic	NOUN
fumecheng-14015	439	45	,	,	PUNCT
fumecheng-14015	439	46	79(15	79(15	PROPN
fumecheng-14015	439	47	)	)	PUNCT
fumecheng-14015	439	48	,	,	PUNCT
fumecheng-14015	439	49	155406	155406	NUM
fumecheng-14015	439	50	.	.	PUNCT
fumecheng-14015	440	1	34	34	NUM
fumecheng-14015	440	2	.	.	PUNCT
fumecheng-14015	441	1	zuo	zuo	PROPN
fumecheng-14015	441	2	,	,	PUNCT
fumecheng-14015	441	3	y.	y.	PROPN
fumecheng-14015	441	4	,	,	PUNCT
fumecheng-14015	441	5	shen	shen	PROPN
fumecheng-14015	441	6	,	,	PUNCT
fumecheng-14015	441	7	j.	j.	PROPN
fumecheng-14015	441	8	,	,	PUNCT
fumecheng-14015	441	9	xie	xie	PROPN
fumecheng-14015	441	10	,	,	PUNCT
fumecheng-14015	441	11	j.	j.	PROPN
fumecheng-14015	441	12	,	,	PUNCT
fumecheng-14015	441	13	xiang	xiang	PROPN
fumecheng-14015	441	14	,	,	PUNCT
fumecheng-14015	441	15	l.	l.	PROPN
fumecheng-14015	441	16	,	,	PUNCT
fumecheng-14015	441	17	2018	2018	NUM
fumecheng-14015	441	18	,	,	PUNCT
fumecheng-14015	441	19	influence	influence	NOUN
fumecheng-14015	441	20	of	of	ADP
fumecheng-14015	441	21	cu	cu	PROPN
fumecheng-14015	441	22	micro	micro	PROPN
fumecheng-14015	441	23	/	/	SYM
fumecheng-14015	441	24	nano	nano	NOUN
fumecheng-14015	441	25	-	-	PUNCT
fumecheng-14015	441	26	particles	particle	NOUN
fumecheng-14015	441	27	mixture	mixture	NOUN
fumecheng-14015	441	28	and	and	CCONJ
fumecheng-14015	441	29	surface	surface	NOUN
fumecheng-14015	441	30	roughness	roughness	NOUN
fumecheng-14015	441	31	on	on	ADP
fumecheng-14015	441	32	the	the	DET
fumecheng-14015	441	33	shear	shear	NOUN
fumecheng-14015	441	34	strength	strength	NOUN
fumecheng-14015	441	35	of	of	ADP
fumecheng-14015	441	36	cu	cu	PROPN
fumecheng-14015	441	37	-	-	PROPN
fumecheng-14015	441	38	cu	cu	PROPN
fumecheng-14015	441	39	joints	joint	NOUN
fumecheng-14015	441	40	,	,	PUNCT
fumecheng-14015	441	41	journal	journal	NOUN
fumecheng-14015	441	42	of	of	ADP
fumecheng-14015	441	43	materials	material	NOUN
fumecheng-14015	441	44	processing	processing	NOUN
fumecheng-14015	441	45	technology	technology	NOUN
fumecheng-14015	441	46	,	,	PUNCT
fumecheng-14015	441	47	257	257	NUM
fumecheng-14015	441	48	,	,	PUNCT
fumecheng-14015	441	49	pp	pp	ADJ
fumecheng-14015	441	50	.	.	PUNCT
fumecheng-14015	442	1	250	250	NUM
fumecheng-14015	442	2	-	-	SYM
fumecheng-14015	442	3	256	256	NUM
fumecheng-14015	442	4	.	.	NOUN
fumecheng-14015	442	5	35	35	NUM
fumecheng-14015	442	6	.	.	PUNCT
fumecheng-14015	443	1	chen	chen	PROPN
fumecheng-14015	443	2	,	,	PUNCT
fumecheng-14015	443	3	s.	s.	PROPN
fumecheng-14015	443	4	,	,	PUNCT
fumecheng-14015	443	5	ke	ke	PROPN
fumecheng-14015	443	6	,	,	PUNCT
fumecheng-14015	443	7	f.	f.	PROPN
fumecheng-14015	443	8	,	,	PUNCT
fumecheng-14015	443	9	zhou	zhou	PROPN
fumecheng-14015	443	10	,	,	PUNCT
fumecheng-14015	443	11	m.	m.	NOUN
fumecheng-14015	443	12	,	,	PUNCT
fumecheng-14015	443	13	bai	bai	PROPN
fumecheng-14015	443	14	,	,	PUNCT
fumecheng-14015	443	15	y.	y.	PROPN
fumecheng-14015	443	16	,	,	PUNCT
fumecheng-14015	443	17	2007	2007	NUM
fumecheng-14015	443	18	,	,	PUNCT
fumecheng-14015	443	19	atomistic	atomistic	ADJ
fumecheng-14015	443	20	investigation	investigation	NOUN
fumecheng-14015	443	21	of	of	ADP
fumecheng-14015	443	22	the	the	DET
fumecheng-14015	443	23	effects	effect	NOUN
fumecheng-14015	443	24	of	of	ADP
fumecheng-14015	443	25	temperature	temperature	NOUN
fumecheng-14015	443	26	and	and	CCONJ
fumecheng-14015	443	27	surface	surface	NOUN
fumecheng-14015	443	28	roughness	roughness	NOUN
fumecheng-14015	443	29	on	on	ADP
fumecheng-14015	443	30	diffusion	diffusion	NOUN
fumecheng-14015	443	31	bonding	bonding	NOUN
fumecheng-14015	443	32	between	between	ADP
fumecheng-14015	443	33	cu	cu	PROPN
fumecheng-14015	443	34	and	and	CCONJ
fumecheng-14015	443	35	al	al	PROPN
fumecheng-14015	443	36	,	,	PUNCT
fumecheng-14015	443	37	acta	acta	PROPN
fumecheng-14015	443	38	materialia	materialia	PROPN
fumecheng-14015	443	39	,	,	PUNCT
fumecheng-14015	443	40	55(9	55(9	NUM
fumecheng-14015	443	41	)	)	PUNCT
fumecheng-14015	443	42	,	,	PUNCT
fumecheng-14015	443	43	pp	pp	PROPN
fumecheng-14015	443	44	.	.	PUNCT
fumecheng-14015	443	45	3169	3169	NUM
fumecheng-14015	443	46	-	-	SYM
fumecheng-14015	443	47	3175	3175	NUM
fumecheng-14015	443	48	.	.	PUNCT
fumecheng-14015	444	1	36	36	NUM
fumecheng-14015	444	2	.	.	X
fumecheng-14015	445	1	tian	tian	ADJ
fumecheng-14015	445	2	,	,	PUNCT
fumecheng-14015	445	3	y.	y.	PROPN
fumecheng-14015	445	4	,	,	PUNCT
fumecheng-14015	445	5	gao	gao	PROPN
fumecheng-14015	445	6	,	,	PUNCT
fumecheng-14015	445	7	s.	s.	PROPN
fumecheng-14015	445	8	,	,	PUNCT
fumecheng-14015	445	9	zhao	zhao	PROPN
fumecheng-14015	445	10	,	,	PUNCT
fumecheng-14015	445	11	l.	l.	PROPN
fumecheng-14015	445	12	,	,	PUNCT
fumecheng-14015	445	13	lu	lu	PROPN
fumecheng-14015	445	14	,	,	PUNCT
fumecheng-14015	445	15	s.	s.	PROPN
fumecheng-14015	445	16	,	,	PUNCT
fumecheng-14015	445	17	pippan	pippan	PROPN
fumecheng-14015	445	18	,	,	PUNCT
fumecheng-14015	445	19	r.	r.	PROPN
fumecheng-14015	445	20	,	,	PUNCT
fumecheng-14015	445	21	zhang	zhang	PROPN
fumecheng-14015	445	22	,	,	PUNCT
fumecheng-14015	445	23	z.	z.	PROPN
fumecheng-14015	445	24	,	,	PUNCT
fumecheng-14015	445	25	tsuji	tsuji	PROPN
fumecheng-14015	445	26	,	,	PUNCT
fumecheng-14015	445	27	n.	n.	NOUN
fumecheng-14015	445	28	,	,	PUNCT
fumecheng-14015	445	29	2018	2018	NUM
fumecheng-14015	445	30	,	,	PUNCT
fumecheng-14015	445	31	remarkable	remarkable	ADJ
fumecheng-14015	445	32	transitions	transition	NOUN
fumecheng-14015	445	33	of	of	ADP
fumecheng-14015	445	34	yield	yield	NOUN
fumecheng-14015	445	35	behavior	behavior	NOUN
fumecheng-14015	445	36	and	and	CCONJ
fumecheng-14015	445	37	lüders	lüder	VERB
fumecheng-14015	445	38	deformation	deformation	NOUN
fumecheng-14015	445	39	in	in	ADP
fumecheng-14015	445	40	pure	pure	ADJ
fumecheng-14015	445	41	cu	cu	NOUN
fumecheng-14015	445	42	by	by	ADP
fumecheng-14015	445	43	changing	change	VERB
fumecheng-14015	445	44	grain	grain	NOUN
fumecheng-14015	445	45	sizes	size	NOUN
fumecheng-14015	445	46	,	,	PUNCT
fumecheng-14015	445	47	scripta	scripta	PROPN
fumecheng-14015	445	48	materialia	materialia	PROPN
fumecheng-14015	445	49	,	,	PUNCT
fumecheng-14015	445	50	142	142	NUM
fumecheng-14015	445	51	,	,	PUNCT
fumecheng-14015	445	52	pp	pp	ADJ
fumecheng-14015	445	53	.	.	PUNCT
fumecheng-14015	446	1	88	88	NUM
fumecheng-14015	446	2	-	-	SYM
fumecheng-14015	446	3	91	91	NUM
fumecheng-14015	446	4	.	.	PUNCT
fumecheng-14015	447	1	37	37	NUM
fumecheng-14015	447	2	.	.	PUNCT
fumecheng-14015	448	1	murakami	murakami	NOUN
fumecheng-14015	448	2	,	,	PUNCT
fumecheng-14015	448	3	m.	m.	NOUN
fumecheng-14015	448	4	,	,	PUNCT
fumecheng-14015	448	5	moriyama	moriyama	NOUN
fumecheng-14015	448	6	,	,	PUNCT
fumecheng-14015	448	7	m.	m.	NOUN
fumecheng-14015	448	8	,	,	PUNCT
fumecheng-14015	448	9	tsukimoto	tsukimoto	NOUN
fumecheng-14015	448	10	,	,	PUNCT
fumecheng-14015	448	11	s.	s.	PROPN
fumecheng-14015	448	12	,	,	PUNCT
fumecheng-14015	448	13	ito	ito	PROPN
fumecheng-14015	448	14	,	,	PUNCT
fumecheng-14015	448	15	k.	k.	PROPN
fumecheng-14015	448	16	,	,	PUNCT
fumecheng-14015	448	17	2005	2005	NUM
fumecheng-14015	448	18	,	,	PUNCT
fumecheng-14015	448	19	grain	grain	NOUN
fumecheng-14015	448	20	growth	growth	NOUN
fumecheng-14015	448	21	mechanism	mechanism	NOUN
fumecheng-14015	448	22	of	of	ADP
fumecheng-14015	448	23	cu	cu	PROPN
fumecheng-14015	448	24	thin	thin	ADJ
fumecheng-14015	448	25	films	film	NOUN
fumecheng-14015	448	26	,	,	PUNCT
fumecheng-14015	448	27	materials	material	NOUN
fumecheng-14015	448	28	transactions	transaction	NOUN
fumecheng-14015	448	29	,	,	PUNCT
fumecheng-14015	448	30	46(7	46(7	NOUN
fumecheng-14015	448	31	)	)	PUNCT
fumecheng-14015	448	32	,	,	PUNCT
fumecheng-14015	448	33	pp	pp	ADP
fumecheng-14015	448	34	.	.	PUNCT
fumecheng-14015	449	1	1737	1737	NUM
fumecheng-14015	449	2	-	-	SYM
fumecheng-14015	449	3	1740	1740	NUM
fumecheng-14015	449	4	.	.	PUNCT
fumecheng-14015	450	1	38	38	NUM
fumecheng-14015	450	2	.	.	PUNCT
fumecheng-14015	451	1	jhan	jhan	PROPN
fumecheng-14015	451	2	,	,	PUNCT
fumecheng-14015	451	3	j.-j	j.-j	PROPN
fumecheng-14015	451	4	.	.	PROPN
fumecheng-14015	451	5	,	,	PUNCT
fumecheng-14015	451	6	wataya	wataya	PROPN
fumecheng-14015	451	7	,	,	PUNCT
fumecheng-14015	451	8	k.	k.	PROPN
fumecheng-14015	451	9	,	,	PUNCT
fumecheng-14015	451	10	nishikawa	nishikawa	PROPN
fumecheng-14015	451	11	,	,	PUNCT
fumecheng-14015	451	12	h.	h.	PROPN
fumecheng-14015	451	13	,	,	PUNCT
fumecheng-14015	451	14	chen	chen	PROPN
fumecheng-14015	451	15	,	,	PUNCT
fumecheng-14015	451	16	c.-m	c.-m	NOUN
fumecheng-14015	451	17	.	.	PUNCT
fumecheng-14015	451	18	,	,	PUNCT
fumecheng-14015	451	19	2022	2022	NUM
fumecheng-14015	451	20	,	,	PUNCT
fumecheng-14015	451	21	electrodeposition	electrodeposition	NOUN
fumecheng-14015	451	22	of	of	ADP
fumecheng-14015	451	23	nanocrystalline	nanocrystalline	PROPN
fumecheng-14015	451	24	cu	cu	PROPN
fumecheng-14015	451	25	for	for	ADP
fumecheng-14015	451	26	cu	cu	PROPN
fumecheng-14015	451	27	-	-	PUNCT
fumecheng-14015	451	28	cu	cu	PROPN
fumecheng-14015	451	29	direct	direct	ADJ
fumecheng-14015	451	30	bonding	bonding	NOUN
fumecheng-14015	451	31	,	,	PUNCT
fumecheng-14015	451	32	journal	journal	NOUN
fumecheng-14015	451	33	of	of	ADP
fumecheng-14015	451	34	the	the	DET
fumecheng-14015	451	35	taiwan	taiwan	PROPN
fumecheng-14015	451	36	institute	institute	PROPN
fumecheng-14015	451	37	of	of	ADP
fumecheng-14015	451	38	chemical	chemical	PROPN
fumecheng-14015	451	39	engineers	engineer	NOUN
fumecheng-14015	451	40	,	,	PUNCT
fumecheng-14015	451	41	132	132	NUM
fumecheng-14015	451	42	,	,	PUNCT
fumecheng-14015	451	43	104127	104127	NUM
fumecheng-14015	451	44	.	.	PUNCT
fumecheng-14015	452	1	39	39	NUM
fumecheng-14015	452	2	.	.	PUNCT
fumecheng-14015	453	1	rebhan	rebhan	PROPN
fumecheng-14015	453	2	,	,	PUNCT
fumecheng-14015	453	3	b.	b.	PROPN
fumecheng-14015	453	4	,	,	PUNCT
fumecheng-14015	453	5	hingerl	hingerl	PROPN
fumecheng-14015	453	6	,	,	PUNCT
fumecheng-14015	453	7	k.	k.	PROPN
fumecheng-14015	453	8	,	,	PUNCT
fumecheng-14015	453	9	2015	2015	NUM
fumecheng-14015	453	10	,	,	PUNCT
fumecheng-14015	453	11	physical	physical	ADJ
fumecheng-14015	453	12	mechanisms	mechanism	NOUN
fumecheng-14015	453	13	of	of	ADP
fumecheng-14015	453	14	copper	copper	NOUN
fumecheng-14015	453	15	-	-	PUNCT
fumecheng-14015	453	16	copper	copper	NOUN
fumecheng-14015	453	17	wafer	wafer	NOUN
fumecheng-14015	453	18	bonding	bonding	NOUN
fumecheng-14015	453	19	,	,	PUNCT
fumecheng-14015	453	20	journal	journal	NOUN
fumecheng-14015	453	21	of	of	ADP
fumecheng-14015	453	22	applied	applied	ADJ
fumecheng-14015	453	23	physics	physic	NOUN
fumecheng-14015	453	24	,	,	PUNCT
fumecheng-14015	453	25	118(13	118(13	NUM
fumecheng-14015	453	26	)	)	PUNCT
fumecheng-14015	453	27	,	,	PUNCT
fumecheng-14015	453	28	135301	135301	NUM
fumecheng-14015	453	29	.	.	PUNCT
fumecheng-14015	454	1	40	40	NUM
fumecheng-14015	454	2	.	.	PUNCT
fumecheng-14015	455	1	nieh	nieh	PROPN
fumecheng-14015	455	2	,	,	PUNCT
fumecheng-14015	455	3	t.	t.	PROPN
fumecheng-14015	455	4	,	,	PUNCT
fumecheng-14015	455	5	wadsworth	wadsworth	PROPN
fumecheng-14015	455	6	,	,	PUNCT
fumecheng-14015	455	7	j.	j.	PROPN
fumecheng-14015	455	8	,	,	PUNCT
fumecheng-14015	455	9	1991	1991	NUM
fumecheng-14015	455	10	,	,	PUNCT
fumecheng-14015	455	11	hall	hall	NOUN
fumecheng-14015	455	12	-	-	PUNCT
fumecheng-14015	455	13	petch	petch	NOUN
fumecheng-14015	455	14	relation	relation	NOUN
fumecheng-14015	455	15	in	in	ADP
fumecheng-14015	455	16	nanocrystalline	nanocrystalline	ADJ
fumecheng-14015	455	17	solids	solid	NOUN
fumecheng-14015	455	18	,	,	PUNCT
fumecheng-14015	455	19	scripta	scripta	PROPN
fumecheng-14015	455	20	metallurgica	metallurgica	VERB
fumecheng-14015	455	21	et	et	PROPN
fumecheng-14015	455	22	materialia	materialia	PROPN
fumecheng-14015	455	23	,	,	PUNCT
fumecheng-14015	455	24	25(4	25(4	NOUN
fumecheng-14015	455	25	)	)	PUNCT
fumecheng-14015	455	26	,	,	PUNCT
fumecheng-14015	455	27	pp	pp	PROPN
fumecheng-14015	455	28	.	.	PUNCT
fumecheng-14015	456	1	955	955	NUM
fumecheng-14015	456	2	-	-	SYM
fumecheng-14015	456	3	958	958	NUM
fumecheng-14015	456	4	.	.	NOUN
fumecheng-14015	457	1	41	41	NUM
fumecheng-14015	457	2	.	.	PUNCT
fumecheng-14015	458	1	kao	kao	PROPN
fumecheng-14015	458	2	,	,	PUNCT
fumecheng-14015	458	3	y.-j	y.-j	PROPN
fumecheng-14015	458	4	.	.	PROPN
fumecheng-14015	458	5	,	,	PUNCT
fumecheng-14015	458	6	li	li	PROPN
fumecheng-14015	458	7	,	,	PUNCT
fumecheng-14015	458	8	y.-j	y.-j	PROPN
fumecheng-14015	458	9	.	.	PROPN
fumecheng-14015	458	10	,	,	PUNCT
fumecheng-14015	458	11	shen	shen	NOUN
fumecheng-14015	458	12	,	,	PUNCT
fumecheng-14015	458	13	y.-a	y.-a	PROPN
fumecheng-14015	458	14	.	.	PROPN
fumecheng-14015	458	15	,	,	PUNCT
fumecheng-14015	458	16	chen	chen	PROPN
fumecheng-14015	458	17	,	,	PUNCT
fumecheng-14015	458	18	c.-m	c.-m	NOUN
fumecheng-14015	458	19	.	.	PUNCT
fumecheng-14015	458	20	,	,	PUNCT
fumecheng-14015	458	21	2023	2023	NUM
fumecheng-14015	458	22	,	,	PUNCT
fumecheng-14015	458	23	significant	significant	ADJ
fumecheng-14015	458	24	hall	hall	NOUN
fumecheng-14015	458	25	–	–	PUNCT
fumecheng-14015	458	26	petch	petch	NOUN
fumecheng-14015	458	27	effect	effect	NOUN
fumecheng-14015	458	28	in	in	ADP
fumecheng-14015	458	29	micro	micro	ADJ
fumecheng-14015	458	30	-	-	ADJ
fumecheng-14015	458	31	nanocrystalline	nanocrystalline	ADJ
fumecheng-14015	458	32	electroplated	electroplate	VERB
fumecheng-14015	458	33	copper	copper	NOUN
fumecheng-14015	458	34	controlled	control	VERB
fumecheng-14015	458	35	by	by	ADP
fumecheng-14015	458	36	sps	sps	PROPN
fumecheng-14015	458	37	concentration	concentration	NOUN
fumecheng-14015	458	38	,	,	PUNCT
fumecheng-14015	458	39	scientific	scientific	ADJ
fumecheng-14015	458	40	reports	report	NOUN
fumecheng-14015	458	41	,	,	PUNCT
fumecheng-14015	458	42	13(1	13(1	NUM
fumecheng-14015	458	43	)	)	PUNCT
fumecheng-14015	458	44	,	,	PUNCT
fumecheng-14015	458	45	428	428	NUM
fumecheng-14015	458	46	.	.	X
fumecheng-14015	458	47	42	42	NUM
fumecheng-14015	458	48	.	.	PUNCT
fumecheng-14015	459	1	somekawa	somekawa	PROPN
fumecheng-14015	459	2	,	,	PUNCT
fumecheng-14015	459	3	h.	h.	PROPN
fumecheng-14015	459	4	,	,	PUNCT
fumecheng-14015	459	5	watanabe	watanabe	PROPN
fumecheng-14015	459	6	,	,	PUNCT
fumecheng-14015	459	7	h.	h.	PROPN
fumecheng-14015	459	8	,	,	PUNCT
fumecheng-14015	459	9	higashi	higashi	PROPN
fumecheng-14015	459	10	,	,	PUNCT
fumecheng-14015	459	11	k.	k.	PROPN
fumecheng-14015	459	12	,	,	PUNCT
fumecheng-14015	459	13	2003	2003	NUM
fumecheng-14015	459	14	,	,	PUNCT
fumecheng-14015	459	15	the	the	DET
fumecheng-14015	459	16	grain	grain	NOUN
fumecheng-14015	459	17	size	size	NOUN
fumecheng-14015	459	18	dependence	dependence	NOUN
fumecheng-14015	459	19	on	on	ADP
fumecheng-14015	459	20	diffusion	diffusion	NOUN
fumecheng-14015	459	21	bonding	bonding	NOUN
fumecheng-14015	459	22	behavior	behavior	NOUN
fumecheng-14015	459	23	in	in	ADP
fumecheng-14015	459	24	superplastic	superplastic	ADJ
fumecheng-14015	459	25	mg	mg	PROPN
fumecheng-14015	459	26	alloys	alloy	NOUN
fumecheng-14015	459	27	,	,	PUNCT
fumecheng-14015	459	28	materials	material	NOUN
fumecheng-14015	459	29	transactions	transaction	NOUN
fumecheng-14015	459	30	,	,	PUNCT
fumecheng-14015	459	31	44(4	44(4	NOUN
fumecheng-14015	459	32	)	)	PUNCT
fumecheng-14015	459	33	,	,	PUNCT
fumecheng-14015	459	34	pp	pp	PROPN
fumecheng-14015	459	35	.	.	PUNCT
fumecheng-14015	460	1	496	496	NUM
fumecheng-14015	460	2	-	-	SYM
fumecheng-14015	460	3	503	503	NUM
fumecheng-14015	460	4	.	.	NUM
fumecheng-14015	461	1	43	43	NUM
fumecheng-14015	461	2	.	.	PUNCT
fumecheng-14015	462	1	kamiya	kamiya	PROPN
fumecheng-14015	462	2	,	,	PUNCT
fumecheng-14015	462	3	s.	s.	PROPN
fumecheng-14015	462	4	,	,	PUNCT
fumecheng-14015	462	5	shishido	shishido	NOUN
fumecheng-14015	462	6	,	,	PUNCT
fumecheng-14015	462	7	n.	n.	NOUN
fumecheng-14015	462	8	,	,	PUNCT
fumecheng-14015	462	9	watanabe	watanabe	PROPN
fumecheng-14015	462	10	,	,	PUNCT
fumecheng-14015	462	11	s.	s.	PROPN
fumecheng-14015	462	12	,	,	PUNCT
fumecheng-14015	462	13	sato	sato	PROPN
fumecheng-14015	462	14	,	,	PUNCT
fumecheng-14015	462	15	h.	h.	PROPN
fumecheng-14015	462	16	,	,	PUNCT
fumecheng-14015	462	17	koiwa	koiwa	PROPN
fumecheng-14015	462	18	,	,	PUNCT
fumecheng-14015	462	19	k.	k.	PROPN
fumecheng-14015	462	20	,	,	PUNCT
fumecheng-14015	462	21	omiya	omiya	PROPN
fumecheng-14015	462	22	,	,	PUNCT
fumecheng-14015	462	23	m.	m.	NOUN
fumecheng-14015	462	24	,	,	PUNCT
fumecheng-14015	462	25	nishida	nishida	PROPN
fumecheng-14015	462	26	,	,	PUNCT
fumecheng-14015	462	27	m.	m.	NOUN
fumecheng-14015	462	28	,	,	PUNCT
fumecheng-14015	462	29	suzuki	suzuki	PROPN
fumecheng-14015	462	30	,	,	PUNCT
fumecheng-14015	462	31	t.	t.	PROPN
fumecheng-14015	462	32	,	,	PUNCT
fumecheng-14015	462	33	nakamura	nakamura	NOUN
fumecheng-14015	462	34	,	,	PUNCT
fumecheng-14015	462	35	t.	t.	PROPN
fumecheng-14015	462	36	,	,	PUNCT
fumecheng-14015	462	37	nokuo	nokuo	NOUN
fumecheng-14015	462	38	,	,	PUNCT
fumecheng-14015	462	39	t.	t.	PROPN
fumecheng-14015	462	40	,	,	PUNCT
fumecheng-14015	462	41	2013	2013	NUM
fumecheng-14015	462	42	,	,	PUNCT
fumecheng-14015	462	43	grain	grain	NOUN
fumecheng-14015	462	44	-	-	PUNCT
fumecheng-14015	462	45	scale	scale	NOUN
fumecheng-14015	462	46	adhesion	adhesion	NOUN
fumecheng-14015	462	47	strength	strength	NOUN
fumecheng-14015	462	48	mapping	mapping	NOUN
fumecheng-14015	462	49	of	of	ADP
fumecheng-14015	462	50	copper	copper	NOUN
fumecheng-14015	462	51	wiring	wiring	NOUN
fumecheng-14015	462	52	structures	structure	NOUN
fumecheng-14015	462	53	in	in	ADP
fumecheng-14015	462	54	integrated	integrated	ADJ
fumecheng-14015	462	55	circuits	circuit	NOUN
fumecheng-14015	462	56	,	,	PUNCT
fumecheng-14015	462	57	surface	surface	NOUN
fumecheng-14015	462	58	and	and	CCONJ
fumecheng-14015	462	59	coatings	coating	NOUN
fumecheng-14015	462	60	technology	technology	NOUN
fumecheng-14015	462	61	,	,	PUNCT
fumecheng-14015	462	62	215	215	NUM
fumecheng-14015	462	63	,	,	PUNCT
fumecheng-14015	462	64	pp	pp	ADJ
fumecheng-14015	462	65	.	.	PUNCT
fumecheng-14015	463	1	280	280	NUM
fumecheng-14015	463	2	-	-	SYM
fumecheng-14015	463	3	284	284	NUM
fumecheng-14015	463	4	.	.	PUNCT
fumecheng-14015	464	1	44	44	NUM
fumecheng-14015	464	2	.	.	PUNCT
fumecheng-14015	464	3	gui	gui	PROPN
fumecheng-14015	464	4	,	,	PUNCT
fumecheng-14015	464	5	c.	c.	PROPN
fumecheng-14015	464	6	,	,	PUNCT
fumecheng-14015	464	7	elwenspoek	elwenspoek	NOUN
fumecheng-14015	464	8	,	,	PUNCT
fumecheng-14015	464	9	m.	m.	NOUN
fumecheng-14015	464	10	,	,	PUNCT
fumecheng-14015	464	11	tas	tas	PROPN
fumecheng-14015	464	12	,	,	PUNCT
fumecheng-14015	464	13	n.	n.	NOUN
fumecheng-14015	464	14	,	,	PUNCT
fumecheng-14015	464	15	gardeniers	gardenier	NOUN
fumecheng-14015	464	16	,	,	PUNCT
fumecheng-14015	464	17	j.g	j.g	PROPN
fumecheng-14015	464	18	.	.	PROPN
fumecheng-14015	464	19	,	,	PUNCT
fumecheng-14015	464	20	1999	1999	NUM
fumecheng-14015	464	21	,	,	PUNCT
fumecheng-14015	464	22	the	the	DET
fumecheng-14015	464	23	effect	effect	NOUN
fumecheng-14015	464	24	of	of	ADP
fumecheng-14015	464	25	surface	surface	NOUN
fumecheng-14015	464	26	roughness	roughness	NOUN
fumecheng-14015	464	27	on	on	ADP
fumecheng-14015	464	28	direct	direct	ADJ
fumecheng-14015	464	29	wafer	wafer	NOUN
fumecheng-14015	464	30	bonding	bonding	NOUN
fumecheng-14015	464	31	,	,	PUNCT
fumecheng-14015	464	32	journal	journal	NOUN
fumecheng-14015	464	33	of	of	ADP
fumecheng-14015	464	34	applied	applied	ADJ
fumecheng-14015	464	35	physics	physic	NOUN
fumecheng-14015	464	36	,	,	PUNCT
fumecheng-14015	464	37	85(10	85(10	NUM
fumecheng-14015	464	38	)	)	PUNCT
fumecheng-14015	464	39	,	,	PUNCT
fumecheng-14015	464	40	pp	pp	ADJ
fumecheng-14015	464	41	.	.	PUNCT
fumecheng-14015	465	1	7448	7448	NUM
fumecheng-14015	465	2	-	-	SYM
fumecheng-14015	465	3	7454	7454	NUM
fumecheng-14015	465	4	.	.	PUNCT
fumecheng-14015	466	1	45	45	NUM
fumecheng-14015	466	2	.	.	PUNCT
fumecheng-14015	466	3	budhe	budhe	PROPN
fumecheng-14015	466	4	,	,	PUNCT
fumecheng-14015	466	5	s.	s.	PROPN
fumecheng-14015	466	6	,	,	PUNCT
fumecheng-14015	466	7	ghumatkar	ghumatkar	NOUN
fumecheng-14015	466	8	,	,	PUNCT
fumecheng-14015	466	9	a.	a.	NOUN
fumecheng-14015	466	10	,	,	PUNCT
fumecheng-14015	466	11	birajdar	birajdar	PROPN
fumecheng-14015	466	12	,	,	PUNCT
fumecheng-14015	466	13	n.	n.	NOUN
fumecheng-14015	466	14	,	,	PUNCT
fumecheng-14015	466	15	banea	banea	NOUN
fumecheng-14015	466	16	,	,	PUNCT
fumecheng-14015	466	17	m.	m.	NOUN
fumecheng-14015	466	18	,	,	PUNCT
fumecheng-14015	466	19	2015	2015	NUM
fumecheng-14015	466	20	,	,	PUNCT
fumecheng-14015	466	21	effect	effect	NOUN
fumecheng-14015	466	22	of	of	ADP
fumecheng-14015	466	23	surface	surface	NOUN
fumecheng-14015	466	24	roughness	roughness	NOUN
fumecheng-14015	466	25	using	use	VERB
fumecheng-14015	466	26	different	different	ADJ
fumecheng-14015	466	27	adherend	adherend	NOUN
fumecheng-14015	466	28	materials	material	NOUN
fumecheng-14015	466	29	on	on	ADP
fumecheng-14015	466	30	the	the	DET
fumecheng-14015	466	31	adhesive	adhesive	ADJ
fumecheng-14015	466	32	bond	bond	NOUN
fumecheng-14015	466	33	strength	strength	NOUN
fumecheng-14015	466	34	,	,	PUNCT
fumecheng-14015	466	35	applied	apply	VERB
fumecheng-14015	466	36	adhesion	adhesion	NOUN
fumecheng-14015	466	37	science	science	NOUN
fumecheng-14015	466	38	,	,	PUNCT
fumecheng-14015	466	39	3	3	NUM
fumecheng-14015	466	40	,	,	PUNCT
fumecheng-14015	466	41	20	20	NUM
fumecheng-14015	466	42	.	.	NOUN
fumecheng-14015	466	43	46	46	NUM
fumecheng-14015	466	44	.	.	PUNCT
fumecheng-14015	467	1	shigetou	shigetou	PROPN
fumecheng-14015	467	2	,	,	PUNCT
fumecheng-14015	467	3	a.	a.	NOUN
fumecheng-14015	467	4	,	,	PUNCT
fumecheng-14015	467	5	itoh	itoh	NOUN
fumecheng-14015	467	6	,	,	PUNCT
fumecheng-14015	467	7	t.	t.	PROPN
fumecheng-14015	467	8	,	,	PUNCT
fumecheng-14015	467	9	suga	suga	PROPN
fumecheng-14015	467	10	,	,	PUNCT
fumecheng-14015	467	11	t.	t.	PROPN
fumecheng-14015	467	12	,	,	PUNCT
fumecheng-14015	467	13	2005	2005	NUM
fumecheng-14015	467	14	,	,	PUNCT
fumecheng-14015	467	15	direct	direct	ADJ
fumecheng-14015	467	16	bonding	bonding	NOUN
fumecheng-14015	467	17	of	of	ADP
fumecheng-14015	467	18	cmp	cmp	PROPN
fumecheng-14015	467	19	-	-	PUNCT
fumecheng-14015	467	20	cu	cu	PROPN
fumecheng-14015	467	21	films	film	NOUN
fumecheng-14015	467	22	by	by	ADP
fumecheng-14015	467	23	surface	surface	NOUN
fumecheng-14015	467	24	activated	activate	VERB
fumecheng-14015	467	25	bonding	bonding	NOUN
fumecheng-14015	467	26	(	(	PUNCT
fumecheng-14015	467	27	sab	sab	ADJ
fumecheng-14015	467	28	)	)	PUNCT
fumecheng-14015	467	29	method	method	NOUN
fumecheng-14015	467	30	,	,	PUNCT
fumecheng-14015	467	31	journal	journal	NOUN
fumecheng-14015	467	32	of	of	ADP
fumecheng-14015	467	33	materials	material	NOUN
fumecheng-14015	467	34	science	science	NOUN
fumecheng-14015	467	35	,	,	PUNCT
fumecheng-14015	467	36	40(12	40(12	NUM
fumecheng-14015	467	37	)	)	PUNCT
fumecheng-14015	467	38	,	,	PUNCT
fumecheng-14015	467	39	pp	pp	ADP
fumecheng-14015	467	40	.	.	PUNCT
fumecheng-14015	468	1	3149	3149	NUM
fumecheng-14015	468	2	-	-	SYM
fumecheng-14015	468	3	3154	3154	NUM
fumecheng-14015	468	4	.	.	PUNCT
fumecheng-14015	469	1	47	47	NUM
fumecheng-14015	469	2	.	.	PUNCT
fumecheng-14015	469	3	fick	fick	PROPN
fumecheng-14015	469	4	,	,	PUNCT
fumecheng-14015	469	5	a.	a.	NOUN
fumecheng-14015	469	6	,	,	PUNCT
fumecheng-14015	469	7	1855	1855	NUM
fumecheng-14015	469	8	,	,	PUNCT
fumecheng-14015	469	9	on	on	ADP
fumecheng-14015	469	10	liquid	liquid	ADJ
fumecheng-14015	469	11	diffusion	diffusion	NOUN
fumecheng-14015	469	12	,	,	PUNCT
fumecheng-14015	469	13	the	the	DET
fumecheng-14015	469	14	london	london	PROPN
fumecheng-14015	469	15	,	,	PUNCT
fumecheng-14015	469	16	edinburgh	edinburgh	PROPN
fumecheng-14015	469	17	,	,	PUNCT
fumecheng-14015	469	18	and	and	CCONJ
fumecheng-14015	469	19	dublin	dublin	PROPN
fumecheng-14015	469	20	philosophical	philosophical	PROPN
fumecheng-14015	469	21	magazine	magazine	NOUN
fumecheng-14015	469	22	and	and	CCONJ
fumecheng-14015	469	23	journal	journal	NOUN
fumecheng-14015	469	24	of	of	ADP
fumecheng-14015	469	25	science	science	NOUN
fumecheng-14015	469	26	,	,	PUNCT
fumecheng-14015	469	27	10(63	10(63	NUM
fumecheng-14015	469	28	)	)	PUNCT
fumecheng-14015	469	29	,	,	PUNCT
fumecheng-14015	469	30	pp	pp	PROPN
fumecheng-14015	469	31	.	.	PUNCT
fumecheng-14015	470	1	30	30	NUM
fumecheng-14015	470	2	-	-	SYM
fumecheng-14015	470	3	39	39	NUM
fumecheng-14015	470	4	.	.	PUNCT
fumecheng-14015	471	1	48	48	NUM
fumecheng-14015	471	2	.	.	PUNCT
fumecheng-14015	472	1	jang	jang	PROPN
fumecheng-14015	472	2	,	,	PUNCT
fumecheng-14015	472	3	e.-j	e.-j	PROPN
fumecheng-14015	472	4	.	.	PROPN
fumecheng-14015	472	5	,	,	PUNCT
fumecheng-14015	472	6	kim	kim	PROPN
fumecheng-14015	472	7	,	,	PUNCT
fumecheng-14015	472	8	j.-w	j.-w	PROPN
fumecheng-14015	472	9	.	.	PROPN
fumecheng-14015	472	10	,	,	PUNCT
fumecheng-14015	472	11	kim	kim	PROPN
fumecheng-14015	472	12	,	,	PUNCT
fumecheng-14015	472	13	b.	b.	PROPN
fumecheng-14015	472	14	,	,	PUNCT
fumecheng-14015	472	15	matthias	matthias	PROPN
fumecheng-14015	472	16	,	,	PUNCT
fumecheng-14015	472	17	t.	t.	PROPN
fumecheng-14015	472	18	,	,	PUNCT
fumecheng-14015	472	19	park	park	NOUN
fumecheng-14015	472	20	,	,	PUNCT
fumecheng-14015	472	21	y.-b	y.-b	PROPN
fumecheng-14015	472	22	.	.	PROPN
fumecheng-14015	472	23	,	,	PUNCT
fumecheng-14015	472	24	2011	2011	NUM
fumecheng-14015	472	25	,	,	PUNCT
fumecheng-14015	472	26	annealing	anneal	VERB
fumecheng-14015	472	27	temperature	temperature	NOUN
fumecheng-14015	472	28	effect	effect	NOUN
fumecheng-14015	472	29	on	on	ADP
fumecheng-14015	472	30	the	the	DET
fumecheng-14015	472	31	cu	cu	PROPN
fumecheng-14015	472	32	-	-	PROPN
fumecheng-14015	472	33	cu	cu	PROPN
fumecheng-14015	472	34	bonding	bonding	NOUN
fumecheng-14015	472	35	energy	energy	NOUN
fumecheng-14015	472	36	for	for	ADP
fumecheng-14015	472	37	3d	3d	PROPN
fumecheng-14015	472	38	-	-	PUNCT
fumecheng-14015	472	39	ic	ic	NOUN
fumecheng-14015	472	40	integration	integration	NOUN
fumecheng-14015	472	41	,	,	PUNCT
fumecheng-14015	472	42	metals	metal	NOUN
fumecheng-14015	472	43	and	and	CCONJ
fumecheng-14015	472	44	materials	material	NOUN
fumecheng-14015	472	45	international	international	ADJ
fumecheng-14015	472	46	,	,	PUNCT
fumecheng-14015	472	47	17(1	17(1	NUM
fumecheng-14015	472	48	)	)	PUNCT
fumecheng-14015	472	49	,	,	PUNCT
fumecheng-14015	472	50	pp	pp	PROPN
fumecheng-14015	472	51	.	.	PUNCT
fumecheng-14015	473	1	105	105	NUM
fumecheng-14015	473	2	-	-	SYM
fumecheng-14015	473	3	109	109	NUM
fumecheng-14015	473	4	.	.	NUM
fumecheng-14015	473	5	49	49	NUM
fumecheng-14015	473	6	.	.	PUNCT
fumecheng-14015	474	1	jang	jang	PROPN
fumecheng-14015	474	2	,	,	PUNCT
fumecheng-14015	474	3	e.-j	e.-j	PROPN
fumecheng-14015	474	4	.	.	PROPN
fumecheng-14015	474	5	,	,	PUNCT
fumecheng-14015	474	6	pfeiffer	pfeiffer	PROPN
fumecheng-14015	474	7	,	,	PUNCT
fumecheng-14015	474	8	s.	s.	PROPN
fumecheng-14015	474	9	,	,	PUNCT
fumecheng-14015	474	10	kim	kim	PROPN
fumecheng-14015	474	11	,	,	PUNCT
fumecheng-14015	474	12	b.-o	b.-o	NOUN
fumecheng-14015	474	13	.	.	PUNCT
fumecheng-14015	474	14	,	,	PUNCT
fumecheng-14015	474	15	matthias	matthias	PROPN
fumecheng-14015	474	16	,	,	PUNCT
fumecheng-14015	474	17	t.	t.	PROPN
fumecheng-14015	474	18	,	,	PUNCT
fumecheng-14015	474	19	hyun	hyun	PROPN
fumecheng-14015	474	20	,	,	PUNCT
fumecheng-14015	474	21	s.-m	s.-m	PROPN
fumecheng-14015	474	22	.	.	PROPN
fumecheng-14015	474	23	,	,	PUNCT
fumecheng-14015	474	24	lee	lee	PROPN
fumecheng-14015	474	25	,	,	PUNCT
fumecheng-14015	474	26	h.-j	h.-j	PROPN
fumecheng-14015	474	27	.	.	PROPN
fumecheng-14015	474	28	,	,	PUNCT
fumecheng-14015	474	29	park	park	PROPN
fumecheng-14015	474	30	,	,	PUNCT
fumecheng-14015	474	31	y.-b	y.-b	PROPN
fumecheng-14015	474	32	.	.	PROPN
fumecheng-14015	474	33	,	,	PUNCT
fumecheng-14015	474	34	2008	2008	NUM
fumecheng-14015	474	35	,	,	PUNCT
fumecheng-14015	474	36	effect	effect	NOUN
fumecheng-14015	474	37	of	of	ADP
fumecheng-14015	474	38	postannealing	postanneale	VERB
fumecheng-14015	474	39	conditions	condition	NOUN
fumecheng-14015	474	40	on	on	ADP
fumecheng-14015	474	41	interfacial	interfacial	ADJ
fumecheng-14015	474	42	adhesion	adhesion	NOUN
fumecheng-14015	474	43	energy	energy	NOUN
fumecheng-14015	474	44	of	of	ADP
fumecheng-14015	474	45	cu	cu	PROPN
fumecheng-14015	474	46	-	-	PROPN
fumecheng-14015	474	47	cu	cu	PROPN
fumecheng-14015	474	48	bonding	bonding	NOUN
fumecheng-14015	474	49	for	for	ADP
fumecheng-14015	474	50	3	3	NUM
fumecheng-14015	474	51	-	-	SYM
fumecheng-14015	474	52	d	d	NOUN
fumecheng-14015	474	53	ic	ic	NOUN
fumecheng-14015	474	54	integration	integration	NOUN
fumecheng-14015	474	55	,	,	PUNCT
fumecheng-14015	474	56	korean	korean	ADJ
fumecheng-14015	474	57	journal	journal	NOUN
fumecheng-14015	474	58	of	of	ADP
fumecheng-14015	474	59	materials	material	NOUN
fumecheng-14015	474	60	research	research	NOUN
fumecheng-14015	474	61	,	,	PUNCT
fumecheng-14015	474	62	18(4	18(4	NUM
fumecheng-14015	474	63	)	)	PUNCT
fumecheng-14015	474	64	,	,	PUNCT
fumecheng-14015	474	65	pp	pp	ADP
fumecheng-14015	474	66	.	.	PUNCT
fumecheng-14015	475	1	204	204	NUM
fumecheng-14015	475	2	-	-	SYM
fumecheng-14015	475	3	209	209	NUM
fumecheng-14015	475	4	.	.	PUNCT
fumecheng-14015	476	1	50	50	NUM
fumecheng-14015	476	2	.	.	X
fumecheng-14015	477	1	chiang	chiang	PROPN
fumecheng-14015	477	2	,	,	PUNCT
fumecheng-14015	477	3	p.-h	p.-h	PROPN
fumecheng-14015	477	4	.	.	PUNCT
fumecheng-14015	477	5	,	,	PUNCT
fumecheng-14015	477	6	liang	liang	PROPN
fumecheng-14015	477	7	,	,	PUNCT
fumecheng-14015	477	8	s.-y	s.-y	NOUN
fumecheng-14015	477	9	.	.	PUNCT
fumecheng-14015	477	10	,	,	PUNCT
fumecheng-14015	477	11	song	song	NOUN
fumecheng-14015	477	12	,	,	PUNCT
fumecheng-14015	477	13	j.-m	j.-m	PROPN
fumecheng-14015	477	14	.	.	PROPN
fumecheng-14015	477	15	,	,	PUNCT
fumecheng-14015	477	16	huang	huang	PROPN
fumecheng-14015	477	17	,	,	PUNCT
fumecheng-14015	477	18	s.-k	s.-k	PROPN
fumecheng-14015	477	19	.	.	PUNCT
fumecheng-14015	477	20	,	,	PUNCT
fumecheng-14015	477	21	chiu	chiu	PROPN
fumecheng-14015	477	22	,	,	PUNCT
fumecheng-14015	477	23	y.-t	y.-t	NOUN
fumecheng-14015	477	24	.	.	PUNCT
fumecheng-14015	477	25	,	,	PUNCT
fumecheng-14015	477	26	hung	hung	PROPN
fumecheng-14015	477	27	,	,	PUNCT
fumecheng-14015	477	28	c.-p	c.-p	PROPN
fumecheng-14015	477	29	.	.	PROPN
fumecheng-14015	477	30	,	,	PUNCT
fumecheng-14015	477	31	2017	2017	NUM
fumecheng-14015	477	32	,	,	PUNCT
fumecheng-14015	477	33	enhanced	enhance	VERB
fumecheng-14015	477	34	cu	cu	PROPN
fumecheng-14015	477	35	-	-	PUNCT
fumecheng-14015	477	36	to	to	ADP
fumecheng-14015	477	37	-	-	PUNCT
fumecheng-14015	477	38	cu	cu	NOUN
fumecheng-14015	477	39	direct	direct	ADJ
fumecheng-14015	477	40	bonding	bonding	NOUN
fumecheng-14015	477	41	by	by	ADP
fumecheng-14015	477	42	controlling	control	VERB
fumecheng-14015	477	43	surface	surface	NOUN
fumecheng-14015	477	44	physical	physical	ADJ
fumecheng-14015	477	45	properties	property	NOUN
fumecheng-14015	477	46	,	,	PUNCT
fumecheng-14015	477	47	japanese	japanese	ADJ
fumecheng-14015	477	48	journal	journal	NOUN
fumecheng-14015	477	49	of	of	ADP
fumecheng-14015	477	50	applied	applied	ADJ
fumecheng-14015	477	51	physics	physics	NOUN
fumecheng-14015	477	52	,	,	PUNCT
fumecheng-14015	477	53	56(3	56(3	NOUN
fumecheng-14015	477	54	)	)	PUNCT
fumecheng-14015	477	55	,	,	PUNCT
fumecheng-14015	477	56	035503	035503	NUM
fumecheng-14015	477	57	.	.	PUNCT
fumecheng-14015	478	1	51	51	NUM
fumecheng-14015	478	2	.	.	PUNCT
fumecheng-14015	479	1	lin	lin	PROPN
fumecheng-14015	479	2	,	,	PUNCT
fumecheng-14015	479	3	p.-f	p.-f	PROPN
fumecheng-14015	479	4	.	.	PUNCT
fumecheng-14015	479	5	,	,	PUNCT
fumecheng-14015	479	6	tran	tran	PROPN
fumecheng-14015	479	7	,	,	PUNCT
fumecheng-14015	479	8	d.-p	d.-p	PROPN
fumecheng-14015	479	9	.	.	PROPN
fumecheng-14015	479	10	,	,	PUNCT
fumecheng-14015	479	11	liu	liu	PROPN
fumecheng-14015	479	12	,	,	PUNCT
fumecheng-14015	479	13	h.-c	h.-c	PROPN
fumecheng-14015	479	14	.	.	PUNCT
fumecheng-14015	479	15	,	,	PUNCT
fumecheng-14015	479	16	li	li	PROPN
fumecheng-14015	479	17	,	,	PUNCT
fumecheng-14015	479	18	y.-y	y.-y	PROPN
fumecheng-14015	479	19	.	.	PROPN
fumecheng-14015	479	20	,	,	PUNCT
fumecheng-14015	479	21	chen	chen	PROPN
fumecheng-14015	479	22	,	,	PUNCT
fumecheng-14015	479	23	c.	c.	PROPN
fumecheng-14015	479	24	,	,	PUNCT
fumecheng-14015	479	25	2022	2022	NUM
fumecheng-14015	479	26	,	,	PUNCT
fumecheng-14015	479	27	interfacial	interfacial	ADJ
fumecheng-14015	479	28	characterization	characterization	NOUN
fumecheng-14015	479	29	of	of	ADP
fumecheng-14015	479	30	low	low	ADJ
fumecheng-14015	479	31	-	-	PUNCT
fumecheng-14015	479	32	temperature	temperature	NOUN
fumecheng-14015	479	33	cuto	cuto	NOUN
fumecheng-14015	479	34	-	-	PUNCT
fumecheng-14015	479	35	cu	cu	NOUN
fumecheng-14015	479	36	direct	direct	ADJ
fumecheng-14015	479	37	bonding	bonding	NOUN
fumecheng-14015	479	38	with	with	ADP
fumecheng-14015	479	39	chemical	chemical	ADJ
fumecheng-14015	479	40	mechanical	mechanical	ADJ
fumecheng-14015	479	41	planarized	planarize	VERB
fumecheng-14015	479	42	nanotwinned	nanotwinned	ADJ
fumecheng-14015	479	43	cu	cu	PROPN
fumecheng-14015	479	44	films	film	NOUN
fumecheng-14015	479	45	,	,	PUNCT
fumecheng-14015	479	46	materials	material	NOUN
fumecheng-14015	479	47	,	,	PUNCT
fumecheng-14015	479	48	15(3	15(3	NUM
fumecheng-14015	479	49	)	)	PUNCT
fumecheng-14015	479	50	,	,	PUNCT
fumecheng-14015	479	51	937	937	NUM
fumecheng-14015	479	52	.	.	PUNCT
fumecheng-14015	480	1	52	52	NUM
fumecheng-14015	480	2	.	.	PUNCT
fumecheng-14015	481	1	li	li	PROPN
fumecheng-14015	481	2	,	,	PUNCT
fumecheng-14015	481	3	j.	j.	PROPN
fumecheng-14015	481	4	,	,	PUNCT
fumecheng-14015	481	5	cheng	cheng	PROPN
fumecheng-14015	481	6	,	,	PUNCT
fumecheng-14015	481	7	c.	c.	PROPN
fumecheng-14015	481	8	,	,	PUNCT
fumecheng-14015	481	9	shi	shi	PROPN
fumecheng-14015	481	10	,	,	PUNCT
fumecheng-14015	481	11	t.	t.	PROPN
fumecheng-14015	481	12	,	,	PUNCT
fumecheng-14015	481	13	fan	fan	PROPN
fumecheng-14015	481	14	,	,	PUNCT
fumecheng-14015	481	15	j.	j.	PROPN
fumecheng-14015	481	16	,	,	PUNCT
fumecheng-14015	481	17	yu	yu	PROPN
fumecheng-14015	481	18	,	,	PUNCT
fumecheng-14015	481	19	x.	x.	PROPN
fumecheng-14015	481	20	,	,	PUNCT
fumecheng-14015	481	21	cheng	cheng	PROPN
fumecheng-14015	481	22	,	,	PUNCT
fumecheng-14015	481	23	s.	s.	PROPN
fumecheng-14015	481	24	,	,	PUNCT
fumecheng-14015	481	25	liao	liao	PROPN
fumecheng-14015	481	26	,	,	PUNCT
fumecheng-14015	481	27	g.	g.	PROPN
fumecheng-14015	481	28	,	,	PUNCT
fumecheng-14015	481	29	tang	tang	PROPN
fumecheng-14015	481	30	,	,	PUNCT
fumecheng-14015	481	31	z.	z.	PROPN
fumecheng-14015	481	32	,	,	PUNCT
fumecheng-14015	481	33	2016	2016	NUM
fumecheng-14015	481	34	,	,	PUNCT
fumecheng-14015	481	35	surface	surface	NOUN
fumecheng-14015	481	36	effect	effect	NOUN
fumecheng-14015	481	37	induced	induce	VERB
fumecheng-14015	481	38	cu	cu	PROPN
fumecheng-14015	481	39	-	-	PUNCT
fumecheng-14015	481	40	cu	cu	PROPN
fumecheng-14015	481	41	bonding	bonding	NOUN
fumecheng-14015	481	42	by	by	ADP
fumecheng-14015	481	43	cu	cu	PROPN
fumecheng-14015	481	44	nanosolder	nanosolder	PROPN
fumecheng-14015	481	45	paste	paste	NOUN
fumecheng-14015	481	46	,	,	PUNCT
fumecheng-14015	481	47	materials	material	NOUN
fumecheng-14015	481	48	letters	letter	NOUN
fumecheng-14015	481	49	,	,	PUNCT
fumecheng-14015	481	50	184(5	184(5	NUM
fumecheng-14015	481	51	)	)	PUNCT
fumecheng-14015	481	52	,	,	PUNCT
fumecheng-14015	481	53	pp	pp	ADP
fumecheng-14015	481	54	.	.	PUNCT
fumecheng-14015	482	1	193	193	NUM
fumecheng-14015	482	2	-	-	SYM
fumecheng-14015	482	3	196	196	NUM
fumecheng-14015	482	4	.	.	PUNCT
fumecheng-14015	483	1	53	53	NUM
fumecheng-14015	483	2	.	.	PUNCT
fumecheng-14015	483	3	park	park	PROPN
fumecheng-14015	483	4	,	,	PUNCT
fumecheng-14015	483	5	c.	c.	PROPN
fumecheng-14015	483	6	,	,	PUNCT
fumecheng-14015	483	7	yang	yang	PROPN
fumecheng-14015	483	8	,	,	PUNCT
fumecheng-14015	483	9	d.-y	d.-y	PROPN
fumecheng-14015	483	10	.	.	PUNCT
fumecheng-14015	483	11	,	,	PUNCT
fumecheng-14015	483	12	1996	1996	NUM
fumecheng-14015	483	13	,	,	PUNCT
fumecheng-14015	483	14	a	a	DET
fumecheng-14015	483	15	study	study	NOUN
fumecheng-14015	483	16	of	of	ADP
fumecheng-14015	483	17	void	void	ADJ
fumecheng-14015	483	18	crushing	crush	VERB
fumecheng-14015	483	19	in	in	ADP
fumecheng-14015	483	20	large	large	ADJ
fumecheng-14015	483	21	forgings	forging	NOUN
fumecheng-14015	484	1	i	i	PRON
fumecheng-14015	484	2	:	:	PUNCT
fumecheng-14015	484	3	bonding	bonding	NOUN
fumecheng-14015	484	4	mechanism	mechanism	NOUN
fumecheng-14015	484	5	and	and	CCONJ
fumecheng-14015	484	6	estimation	estimation	NOUN
fumecheng-14015	484	7	model	model	NOUN
fumecheng-14015	484	8	for	for	ADP
fumecheng-14015	484	9	bonding	bonding	NOUN
fumecheng-14015	484	10	efficiency	efficiency	NOUN
fumecheng-14015	484	11	,	,	PUNCT
fumecheng-14015	484	12	journal	journal	NOUN
fumecheng-14015	484	13	of	of	ADP
fumecheng-14015	484	14	materials	material	NOUN
fumecheng-14015	484	15	processing	processing	NOUN
fumecheng-14015	484	16	technology	technology	NOUN
fumecheng-14015	484	17	,	,	PUNCT
fumecheng-14015	484	18	57(1	57(1	PROPN
fumecheng-14015	484	19	-	-	SYM
fumecheng-14015	484	20	2	2	NUM
fumecheng-14015	484	21	)	)	PUNCT
fumecheng-14015	484	22	,	,	PUNCT
fumecheng-14015	484	23	pp	pp	ADP
fumecheng-14015	484	24	.	.	PUNCT
fumecheng-14015	485	1	129	129	NUM
fumecheng-14015	485	2	-	-	SYM
fumecheng-14015	485	3	140	140	NUM
fumecheng-14015	485	4	.	.	PUNCT
fumecheng-14015	486	1	54	54	NUM
fumecheng-14015	486	2	.	.	PUNCT
fumecheng-14015	487	1	kim	kim	PROPN
fumecheng-14015	487	2	,	,	PUNCT
fumecheng-14015	487	3	h.	h.	PROPN
fumecheng-14015	487	4	,	,	PUNCT
fumecheng-14015	487	5	kim	kim	PROPN
fumecheng-14015	487	6	,	,	PUNCT
fumecheng-14015	487	7	j.	j.	PROPN
fumecheng-14015	487	8	,	,	PUNCT
fumecheng-14015	487	9	kim	kim	PROPN
fumecheng-14015	487	10	,	,	PUNCT
fumecheng-14015	487	11	y.	y.	PROPN
fumecheng-14015	487	12	,	,	PUNCT
fumecheng-14015	487	13	seo	seo	NOUN
fumecheng-14015	487	14	,	,	PUNCT
fumecheng-14015	487	15	s.-k	s.-k	PROPN
fumecheng-14015	487	16	.	.	PUNCT
fumecheng-14015	487	17	,	,	PUNCT
fumecheng-14015	487	18	jo	jo	PROPN
fumecheng-14015	487	19	,	,	PUNCT
fumecheng-14015	487	20	c.	c.	PROPN
fumecheng-14015	487	21	,	,	PUNCT
fumecheng-14015	487	22	kim	kim	PROPN
fumecheng-14015	487	23	,	,	PUNCT
fumecheng-14015	487	24	d.-w	d.-w	PROPN
fumecheng-14015	487	25	.	.	PUNCT
fumecheng-14015	487	26	,	,	PUNCT
fumecheng-14015	487	27	2022	2022	NUM
fumecheng-14015	487	28	,	,	PUNCT
fumecheng-14015	487	29	process	process	NOUN
fumecheng-14015	487	30	and	and	CCONJ
fumecheng-14015	487	31	design	design	NOUN
fumecheng-14015	487	32	optimization	optimization	NOUN
fumecheng-14015	487	33	for	for	ADP
fumecheng-14015	487	34	hybrid	hybrid	ADJ
fumecheng-14015	487	35	cu	cu	NOUN
fumecheng-14015	487	36	bonding	bonding	NOUN
fumecheng-14015	487	37	void	void	NOUN
fumecheng-14015	487	38	,	,	PUNCT
fumecheng-14015	487	39	proc	proc	NOUN
fumecheng-14015	487	40	.	.	PUNCT
fumecheng-14015	488	1	2022	2022	NUM
fumecheng-14015	488	2	ieee	ieee	PROPN
fumecheng-14015	488	3	72nd	72nd	NUM
fumecheng-14015	488	4	electronic	electronic	ADJ
fumecheng-14015	488	5	components	component	NOUN
fumecheng-14015	488	6	and	and	CCONJ
fumecheng-14015	488	7	technology	technology	NOUN
fumecheng-14015	488	8	conference	conference	NOUN
fumecheng-14015	488	9	(	(	PUNCT
fumecheng-14015	488	10	ectc	ectc	PROPN
fumecheng-14015	488	11	)	)	PUNCT
fumecheng-14015	488	12	,	,	PUNCT
fumecheng-14015	488	13	san	san	PROPN
fumecheng-14015	488	14	diego	diego	PROPN
fumecheng-14015	488	15	,	,	PUNCT
fumecheng-14015	488	16	usa	usa	PROPN
fumecheng-14015	488	17	,	,	PUNCT
fumecheng-14015	488	18	pp	pp	PROPN
fumecheng-14015	488	19	.	.	PUNCT
fumecheng-14015	489	1	194	194	NUM
fumecheng-14015	489	2	-	-	SYM
fumecheng-14015	489	3	197	197	NUM
fumecheng-14015	489	4	.	.	PUNCT
fumecheng-14015	490	1	942	942	NUM
fumecheng-14015	490	2	s.	s.	PROPN
fumecheng-14015	490	3	choi	choi	PROPN
fumecheng-14015	490	4	,	,	PUNCT
fumecheng-14015	490	5	c.	c.	PROPN
fumecheng-14015	490	6	chen	chen	PROPN
fumecheng-14015	490	7	,	,	PUNCT
fumecheng-14015	490	8	b.	b.	PROPN
fumecheng-14015	490	9	hwang	hwang	PROPN
fumecheng-14015	490	10	55	55	NUM
fumecheng-14015	490	11	.	.	PUNCT
fumecheng-14015	491	1	cao	cao	PROPN
fumecheng-14015	491	2	,	,	PUNCT
fumecheng-14015	491	3	t.-s	t.-s	PROPN
fumecheng-14015	491	4	.	.	PUNCT
fumecheng-14015	491	5	,	,	PUNCT
fumecheng-14015	491	6	mazière	mazière	PROPN
fumecheng-14015	491	7	,	,	PUNCT
fumecheng-14015	491	8	m.	m.	NOUN
fumecheng-14015	491	9	,	,	PUNCT
fumecheng-14015	491	10	danas	dana	NOUN
fumecheng-14015	491	11	,	,	PUNCT
fumecheng-14015	491	12	k.	k.	PROPN
fumecheng-14015	491	13	,	,	PUNCT
fumecheng-14015	491	14	besson	besson	PROPN
fumecheng-14015	491	15	,	,	PUNCT
fumecheng-14015	491	16	j.	j.	PROPN
fumecheng-14015	491	17	,	,	PUNCT
fumecheng-14015	491	18	2015	2015	NUM
fumecheng-14015	491	19	,	,	PUNCT
fumecheng-14015	491	20	a	a	DET
fumecheng-14015	491	21	model	model	NOUN
fumecheng-14015	491	22	for	for	ADP
fumecheng-14015	491	23	ductile	ductile	NOUN
fumecheng-14015	491	24	damage	damage	NOUN
fumecheng-14015	491	25	prediction	prediction	NOUN
fumecheng-14015	491	26	at	at	ADP
fumecheng-14015	491	27	low	low	ADJ
fumecheng-14015	491	28	stress	stress	NOUN
fumecheng-14015	491	29	triaxialities	triaxialitie	NOUN
fumecheng-14015	491	30	incorporating	incorporate	VERB
fumecheng-14015	491	31	void	void	ADJ
fumecheng-14015	491	32	shape	shape	NOUN
fumecheng-14015	491	33	change	change	NOUN
fumecheng-14015	491	34	and	and	CCONJ
fumecheng-14015	491	35	void	void	ADJ
fumecheng-14015	491	36	rotation	rotation	NOUN
fumecheng-14015	491	37	,	,	PUNCT
fumecheng-14015	491	38	international	international	ADJ
fumecheng-14015	491	39	journal	journal	NOUN
fumecheng-14015	491	40	of	of	ADP
fumecheng-14015	491	41	solids	solid	NOUN
fumecheng-14015	491	42	and	and	CCONJ
fumecheng-14015	491	43	structures	structure	NOUN
fumecheng-14015	491	44	,	,	PUNCT
fumecheng-14015	491	45	63(3	63(3	NUM
fumecheng-14015	491	46	)	)	PUNCT
fumecheng-14015	491	47	,	,	PUNCT
fumecheng-14015	491	48	pp	pp	PROPN
fumecheng-14015	491	49	.	.	PUNCT
fumecheng-14015	492	1	240	240	NUM
fumecheng-14015	492	2	-	-	SYM
fumecheng-14015	492	3	263	263	NUM
fumecheng-14015	492	4	.	.	PUNCT
fumecheng-14015	493	1	56	56	NUM
fumecheng-14015	493	2	.	.	X
fumecheng-14015	494	1	zhang	zhang	PROPN
fumecheng-14015	494	2	,	,	PUNCT
fumecheng-14015	494	3	c.	c.	PROPN
fumecheng-14015	494	4	,	,	PUNCT
fumecheng-14015	494	5	li	li	PROPN
fumecheng-14015	494	6	,	,	PUNCT
fumecheng-14015	494	7	h.	h.	PROPN
fumecheng-14015	494	8	,	,	PUNCT
fumecheng-14015	494	9	li	li	PROPN
fumecheng-14015	494	10	,	,	PUNCT
fumecheng-14015	494	11	m.	m.	NOUN
fumecheng-14015	494	12	,	,	PUNCT
fumecheng-14015	494	13	2016	2016	NUM
fumecheng-14015	494	14	,	,	PUNCT
fumecheng-14015	494	15	detailed	detailed	ADJ
fumecheng-14015	494	16	evolution	evolution	NOUN
fumecheng-14015	494	17	mechanism	mechanism	NOUN
fumecheng-14015	494	18	of	of	ADP
fumecheng-14015	494	19	interfacial	interfacial	ADJ
fumecheng-14015	494	20	void	void	ADJ
fumecheng-14015	494	21	morphology	morphology	NOUN
fumecheng-14015	494	22	in	in	ADP
fumecheng-14015	494	23	diffusion	diffusion	NOUN
fumecheng-14015	494	24	bonding	bonding	NOUN
fumecheng-14015	494	25	,	,	PUNCT
fumecheng-14015	494	26	journal	journal	NOUN
fumecheng-14015	494	27	of	of	ADP
fumecheng-14015	494	28	materials	material	NOUN
fumecheng-14015	494	29	science	science	NOUN
fumecheng-14015	494	30	and	and	CCONJ
fumecheng-14015	494	31	technology	technology	NOUN
fumecheng-14015	494	32	,	,	PUNCT
fumecheng-14015	494	33	32(3	32(3	NUM
fumecheng-14015	494	34	)	)	PUNCT
fumecheng-14015	494	35	,	,	PUNCT
fumecheng-14015	494	36	pp	pp	ADP
fumecheng-14015	494	37	.	.	PUNCT
fumecheng-14015	495	1	259	259	NUM
fumecheng-14015	495	2	-	-	SYM
fumecheng-14015	495	3	264	264	NUM
fumecheng-14015	495	4	.	.	PUNCT
fumecheng-14015	496	1	57	57	NUM
fumecheng-14015	496	2	.	.	PUNCT
fumecheng-14015	497	1	oh	oh	INTJ
fumecheng-14015	497	2	,	,	PUNCT
fumecheng-14015	497	3	s.-h	s.-h	NOUN
fumecheng-14015	497	4	.	.	PROPN
fumecheng-14015	497	5	,	,	PUNCT
fumecheng-14015	497	6	lee	lee	PROPN
fumecheng-14015	497	7	,	,	PUNCT
fumecheng-14015	497	8	h.-d	h.-d	PROPN
fumecheng-14015	497	9	.	.	PROPN
fumecheng-14015	497	10	,	,	PUNCT
fumecheng-14015	497	11	lee	lee	PROPN
fumecheng-14015	497	12	,	,	PUNCT
fumecheng-14015	497	13	j.-u	j.-u	PROPN
fumecheng-14015	497	14	.	.	PUNCT
fumecheng-14015	497	15	,	,	PUNCT
fumecheng-14015	497	16	park	park	NOUN
fumecheng-14015	497	17	,	,	PUNCT
fumecheng-14015	497	18	s.-h	s.-h	NOUN
fumecheng-14015	497	19	.	.	PUNCT
fumecheng-14015	497	20	,	,	PUNCT
fumecheng-14015	498	1	cho	cho	PROPN
fumecheng-14015	498	2	,	,	PUNCT
fumecheng-14015	498	3	w.-s	w.-	NOUN
fumecheng-14015	498	4	.	.	PROPN
fumecheng-14015	498	5	,	,	PUNCT
fumecheng-14015	498	6	park	park	PROPN
fumecheng-14015	498	7	,	,	PUNCT
fumecheng-14015	498	8	y.-j	y.-j	PROPN
fumecheng-14015	498	9	.	.	PROPN
fumecheng-14015	498	10	,	,	PUNCT
fumecheng-14015	498	11	haag	haag	PROPN
fumecheng-14015	498	12	,	,	PUNCT
fumecheng-14015	498	13	a.	a.	PROPN
fumecheng-14015	498	14	,	,	PUNCT
fumecheng-14015	498	15	watanabe	watanabe	PROPN
fumecheng-14015	498	16	,	,	PUNCT
fumecheng-14015	498	17	s.	s.	PROPN
fumecheng-14015	498	18	,	,	PUNCT
fumecheng-14015	498	19	arnold	arnold	PROPN
fumecheng-14015	498	20	,	,	PUNCT
fumecheng-14015	498	21	m.	m.	NOUN
fumecheng-14015	498	22	,	,	PUNCT
fumecheng-14015	498	23	lee	lee	PROPN
fumecheng-14015	498	24	,	,	PUNCT
fumecheng-14015	498	25	h.-j	h.-j	PROPN
fumecheng-14015	498	26	.	.	PROPN
fumecheng-14015	498	27	,	,	PUNCT
fumecheng-14015	498	28	2024	2024	NUM
fumecheng-14015	498	29	,	,	PUNCT
fumecheng-14015	498	30	thermodynamic	thermodynamic	ADJ
fumecheng-14015	498	31	modeling	modeling	NOUN
fumecheng-14015	498	32	framework	framework	NOUN
fumecheng-14015	498	33	with	with	ADP
fumecheng-14015	498	34	experimental	experimental	ADJ
fumecheng-14015	498	35	investigation	investigation	NOUN
fumecheng-14015	498	36	of	of	ADP
fumecheng-14015	498	37	the	the	DET
fumecheng-14015	498	38	large	large	ADJ
fumecheng-14015	498	39	-	-	PUNCT
fumecheng-14015	498	40	scale	scale	NOUN
fumecheng-14015	498	41	bonded	bond	VERB
fumecheng-14015	498	42	area	area	NOUN
fumecheng-14015	498	43	and	and	CCONJ
fumecheng-14015	498	44	local	local	ADJ
fumecheng-14015	498	45	void	void	NOUN
fumecheng-14015	498	46	in	in	ADP
fumecheng-14015	498	47	cu	cu	PROPN
fumecheng-14015	498	48	-	-	PUNCT
fumecheng-14015	498	49	cu	cu	PROPN
fumecheng-14015	498	50	bonding	bonding	NOUN
fumecheng-14015	498	51	interface	interface	NOUN
fumecheng-14015	498	52	for	for	ADP
fumecheng-14015	498	53	advanced	advanced	ADJ
fumecheng-14015	498	54	semiconductor	semiconductor	NOUN
fumecheng-14015	498	55	packaging	packaging	NOUN
fumecheng-14015	498	56	,	,	PUNCT
fumecheng-14015	498	57	international	international	ADJ
fumecheng-14015	498	58	journal	journal	NOUN
fumecheng-14015	498	59	of	of	ADP
fumecheng-14015	498	60	plasticity	plasticity	NOUN
fumecheng-14015	498	61	,	,	PUNCT
fumecheng-14015	498	62	180	180	NUM
fumecheng-14015	498	63	,	,	PUNCT
fumecheng-14015	498	64	104073	104073	NUM
fumecheng-14015	498	65	.	.	PUNCT
fumecheng-14015	499	1	58	58	NUM
fumecheng-14015	499	2	.	.	PUNCT
fumecheng-14015	500	1	gao	gao	PROPN
fumecheng-14015	500	2	,	,	PUNCT
fumecheng-14015	500	3	x.	x.	PROPN
fumecheng-14015	500	4	,	,	PUNCT
fumecheng-14015	500	5	wang	wang	PROPN
fumecheng-14015	500	6	,	,	PUNCT
fumecheng-14015	500	7	t.	t.	PROPN
fumecheng-14015	500	8	,	,	PUNCT
fumecheng-14015	500	9	kim	kim	PROPN
fumecheng-14015	500	10	,	,	PUNCT
fumecheng-14015	500	11	j.	j.	PROPN
fumecheng-14015	500	12	,	,	PUNCT
fumecheng-14015	500	13	2005	2005	NUM
fumecheng-14015	500	14	,	,	PUNCT
fumecheng-14015	500	15	on	on	ADP
fumecheng-14015	500	16	ductile	ductile	NOUN
fumecheng-14015	500	17	fracture	fracture	NOUN
fumecheng-14015	500	18	initiation	initiation	NOUN
fumecheng-14015	500	19	toughness	toughness	NOUN
fumecheng-14015	500	20	:	:	PUNCT
fumecheng-14015	500	21	effects	effect	NOUN
fumecheng-14015	500	22	of	of	ADP
fumecheng-14015	500	23	void	void	ADJ
fumecheng-14015	500	24	volume	volume	NOUN
fumecheng-14015	500	25	fraction	fraction	NOUN
fumecheng-14015	500	26	,	,	PUNCT
fumecheng-14015	500	27	void	void	ADJ
fumecheng-14015	500	28	shape	shape	NOUN
fumecheng-14015	500	29	and	and	CCONJ
fumecheng-14015	500	30	void	void	ADJ
fumecheng-14015	500	31	distribution	distribution	NOUN
fumecheng-14015	500	32	,	,	PUNCT
fumecheng-14015	500	33	international	international	ADJ
fumecheng-14015	500	34	journal	journal	NOUN
fumecheng-14015	500	35	of	of	ADP
fumecheng-14015	500	36	solids	solid	NOUN
fumecheng-14015	500	37	and	and	CCONJ
fumecheng-14015	500	38	structures	structure	NOUN
fumecheng-14015	500	39	,	,	PUNCT
fumecheng-14015	500	40	42(18	42(18	NOUN
fumecheng-14015	500	41	-	-	SYM
fumecheng-14015	500	42	19	19	NUM
fumecheng-14015	500	43	)	)	PUNCT
fumecheng-14015	500	44	,	,	PUNCT
fumecheng-14015	500	45	pp	pp	PROPN
fumecheng-14015	500	46	.	.	PUNCT
fumecheng-14015	501	1	5097	5097	NUM
fumecheng-14015	501	2	-	-	SYM
fumecheng-14015	501	3	5117	5117	NUM
fumecheng-14015	501	4	.	.	PUNCT
fumecheng-14015	502	1	59	59	NUM
fumecheng-14015	502	2	.	.	PUNCT
fumecheng-14015	502	3	pardoen	pardoen	PROPN
fumecheng-14015	502	4	,	,	PUNCT
fumecheng-14015	502	5	t.	t.	PROPN
fumecheng-14015	502	6	,	,	PUNCT
fumecheng-14015	502	7	hutchinson	hutchinson	PROPN
fumecheng-14015	502	8	,	,	PUNCT
fumecheng-14015	502	9	j.	j.	PROPN
fumecheng-14015	502	10	,	,	PUNCT
fumecheng-14015	502	11	2003	2003	NUM
fumecheng-14015	502	12	,	,	PUNCT
fumecheng-14015	502	13	micromechanics	micromechanic	NOUN
fumecheng-14015	502	14	-	-	PUNCT
fumecheng-14015	502	15	based	base	VERB
fumecheng-14015	502	16	model	model	NOUN
fumecheng-14015	502	17	for	for	ADP
fumecheng-14015	502	18	trends	trend	NOUN
fumecheng-14015	502	19	in	in	ADP
fumecheng-14015	502	20	toughness	toughness	NOUN
fumecheng-14015	502	21	of	of	ADP
fumecheng-14015	502	22	ductile	ductile	NOUN
fumecheng-14015	502	23	metals	metal	NOUN
fumecheng-14015	502	24	,	,	PUNCT
fumecheng-14015	502	25	acta	acta	PROPN
fumecheng-14015	502	26	materialia	materialia	PROPN
fumecheng-14015	502	27	,	,	PUNCT
fumecheng-14015	502	28	51(1	51(1	NUM
fumecheng-14015	502	29	)	)	PUNCT
fumecheng-14015	502	30	,	,	PUNCT
fumecheng-14015	502	31	pp	pp	ADJ
fumecheng-14015	502	32	.	.	PUNCT
fumecheng-14015	503	1	133	133	NUM
fumecheng-14015	503	2	-	-	SYM
fumecheng-14015	503	3	148	148	NUM
fumecheng-14015	503	4	.	.	PUNCT
fumecheng-14015	504	1	60	60	NUM
fumecheng-14015	504	2	.	.	PUNCT
fumecheng-14015	505	1	kim	kim	PROPN
fumecheng-14015	505	2	,	,	PUNCT
fumecheng-14015	505	3	t.	t.	PROPN
fumecheng-14015	505	4	,	,	PUNCT
fumecheng-14015	505	5	howlader	howlader	PROPN
fumecheng-14015	505	6	,	,	PUNCT
fumecheng-14015	505	7	m.	m.	NOUN
fumecheng-14015	505	8	,	,	PUNCT
fumecheng-14015	505	9	itoh	itoh	NOUN
fumecheng-14015	505	10	,	,	PUNCT
fumecheng-14015	505	11	t.	t.	PROPN
fumecheng-14015	505	12	,	,	PUNCT
fumecheng-14015	505	13	suga	suga	PROPN
fumecheng-14015	505	14	,	,	PUNCT
fumecheng-14015	505	15	t.	t.	PROPN
fumecheng-14015	505	16	,	,	PUNCT
fumecheng-14015	505	17	2003	2003	NUM
fumecheng-14015	505	18	,	,	PUNCT
fumecheng-14015	505	19	room	room	NOUN
fumecheng-14015	505	20	temperature	temperature	NOUN
fumecheng-14015	505	21	cu	cu	PROPN
fumecheng-14015	505	22	-	-	PROPN
fumecheng-14015	505	23	cu	cu	PROPN
fumecheng-14015	505	24	direct	direct	ADJ
fumecheng-14015	505	25	bonding	bonding	NOUN
fumecheng-14015	505	26	using	use	VERB
fumecheng-14015	505	27	surface	surface	NOUN
fumecheng-14015	505	28	activated	activate	VERB
fumecheng-14015	505	29	bonding	bonding	NOUN
fumecheng-14015	505	30	method	method	NOUN
fumecheng-14015	505	31	,	,	PUNCT
fumecheng-14015	505	32	journal	journal	NOUN
fumecheng-14015	505	33	of	of	ADP
fumecheng-14015	505	34	vacuum	vacuum	PROPN
fumecheng-14015	505	35	science	science	NOUN
fumecheng-14015	505	36	and	and	CCONJ
fumecheng-14015	505	37	technology	technology	NOUN
fumecheng-14015	505	38	a	a	DET
fumecheng-14015	505	39	:	:	PUNCT
fumecheng-14015	505	40	vacuum	vacuum	NOUN
fumecheng-14015	505	41	,	,	PUNCT
fumecheng-14015	505	42	surfaces	surface	NOUN
fumecheng-14015	505	43	,	,	PUNCT
fumecheng-14015	505	44	and	and	CCONJ
fumecheng-14015	505	45	films	film	NOUN
fumecheng-14015	505	46	,	,	PUNCT
fumecheng-14015	505	47	21(2	21(2	NUM
fumecheng-14015	505	48	)	)	PUNCT
fumecheng-14015	505	49	,	,	PUNCT
fumecheng-14015	505	50	pp	pp	PROPN
fumecheng-14015	505	51	.	.	PUNCT
fumecheng-14015	506	1	449	449	NUM
fumecheng-14015	506	2	-	-	SYM
fumecheng-14015	506	3	453	453	NUM
fumecheng-14015	506	4	.	.	NOUN
fumecheng-14015	507	1	61	61	NUM
fumecheng-14015	507	2	.	.	PUNCT
fumecheng-14015	508	1	shigetou	shigetou	PROPN
fumecheng-14015	508	2	,	,	PUNCT
fumecheng-14015	508	3	a.	a.	NOUN
fumecheng-14015	508	4	,	,	PUNCT
fumecheng-14015	508	5	itoh	itoh	NOUN
fumecheng-14015	508	6	,	,	PUNCT
fumecheng-14015	508	7	t.	t.	PROPN
fumecheng-14015	508	8	,	,	PUNCT
fumecheng-14015	508	9	suga	suga	PROPN
fumecheng-14015	508	10	,	,	PUNCT
fumecheng-14015	508	11	t.	t.	PROPN
fumecheng-14015	508	12	,	,	PUNCT
fumecheng-14015	508	13	2006	2006	NUM
fumecheng-14015	508	14	,	,	PUNCT
fumecheng-14015	508	15	bumpless	bumpless	NOUN
fumecheng-14015	508	16	interconnect	interconnect	NOUN
fumecheng-14015	508	17	of	of	ADP
fumecheng-14015	508	18	ultrafine	ultrafine	NOUN
fumecheng-14015	508	19	cu	cu	PROPN
fumecheng-14015	508	20	electrodes	electrode	NOUN
fumecheng-14015	508	21	by	by	ADP
fumecheng-14015	508	22	surface	surface	NOUN
fumecheng-14015	508	23	activated	activate	VERB
fumecheng-14015	508	24	bonding	bonding	NOUN
fumecheng-14015	508	25	(	(	PUNCT
fumecheng-14015	508	26	sab	sab	ADJ
fumecheng-14015	508	27	)	)	PUNCT
fumecheng-14015	508	28	method	method	NOUN
fumecheng-14015	508	29	,	,	PUNCT
fumecheng-14015	508	30	electronics	electronic	NOUN
fumecheng-14015	508	31	and	and	CCONJ
fumecheng-14015	508	32	communications	communication	NOUN
fumecheng-14015	508	33	in	in	ADP
fumecheng-14015	508	34	japan	japan	PROPN
fumecheng-14015	508	35	(	(	PUNCT
fumecheng-14015	508	36	part	part	PROPN
fumecheng-14015	508	37	ii	ii	PROPN
fumecheng-14015	508	38	:	:	PUNCT
fumecheng-14015	508	39	electronics	electronic	NOUN
fumecheng-14015	508	40	)	)	PUNCT
fumecheng-14015	508	41	,	,	PUNCT
fumecheng-14015	508	42	89(12	89(12	NUM
fumecheng-14015	508	43	)	)	PUNCT
fumecheng-14015	508	44	,	,	PUNCT
fumecheng-14015	508	45	pp	pp	PROPN
fumecheng-14015	508	46	.	.	PUNCT
fumecheng-14015	509	1	34	34	NUM
fumecheng-14015	509	2	-	-	SYM
fumecheng-14015	509	3	42	42	NUM
fumecheng-14015	509	4	.	.	PUNCT
fumecheng-14015	510	1	62	62	NUM
fumecheng-14015	510	2	.	.	PUNCT
fumecheng-14015	510	3	taniyama	taniyama	NOUN
fumecheng-14015	510	4	,	,	PUNCT
fumecheng-14015	510	5	s.	s.	PROPN
fumecheng-14015	510	6	,	,	PUNCT
fumecheng-14015	510	7	wang	wang	PROPN
fumecheng-14015	510	8	,	,	PUNCT
fumecheng-14015	510	9	y.-h	y.-h	PROPN
fumecheng-14015	510	10	.	.	PROPN
fumecheng-14015	510	11	,	,	PUNCT
fumecheng-14015	510	12	fujino	fujino	PROPN
fumecheng-14015	510	13	,	,	PUNCT
fumecheng-14015	510	14	m.	m.	NOUN
fumecheng-14015	510	15	,	,	PUNCT
fumecheng-14015	510	16	suga	suga	PROPN
fumecheng-14015	510	17	,	,	PUNCT
fumecheng-14015	510	18	t.	t.	PROPN
fumecheng-14015	510	19	,	,	PUNCT
fumecheng-14015	510	20	2008	2008	NUM
fumecheng-14015	510	21	,	,	PUNCT
fumecheng-14015	510	22	room	room	NOUN
fumecheng-14015	510	23	temperature	temperature	NOUN
fumecheng-14015	510	24	wafer	wafer	NOUN
fumecheng-14015	510	25	bonding	bonding	NOUN
fumecheng-14015	510	26	using	use	VERB
fumecheng-14015	510	27	surface	surface	NOUN
fumecheng-14015	510	28	activated	activate	VERB
fumecheng-14015	510	29	bonding	bonding	NOUN
fumecheng-14015	510	30	method	method	NOUN
fumecheng-14015	510	31	,	,	PUNCT
fumecheng-14015	510	32	proc	proc	NOUN
fumecheng-14015	510	33	.	.	PROPN
fumecheng-14015	510	34	2008	2008	NUM
fumecheng-14015	511	1	ieee	ieee	PROPN
fumecheng-14015	511	2	9th	9th	ADJ
fumecheng-14015	511	3	vlsi	vlsi	PROPN
fumecheng-14015	511	4	packaging	packaging	NOUN
fumecheng-14015	511	5	workshop	workshop	NOUN
fumecheng-14015	511	6	of	of	ADP
fumecheng-14015	511	7	japan	japan	PROPN
fumecheng-14015	511	8	,	,	PUNCT
fumecheng-14015	511	9	tokyo	tokyo	PROPN
fumecheng-14015	511	10	,	,	PUNCT
fumecheng-14015	511	11	japan	japan	PROPN
fumecheng-14015	511	12	,	,	PUNCT
fumecheng-14015	511	13	pp	pp	ADJ
fumecheng-14015	511	14	.	.	PUNCT
fumecheng-14015	512	1	141	141	NUM
fumecheng-14015	512	2	-	-	SYM
fumecheng-14015	512	3	144	144	NUM
fumecheng-14015	512	4	.	.	PUNCT
fumecheng-14015	513	1	63	63	NUM
fumecheng-14015	513	2	.	.	PUNCT
fumecheng-14015	514	1	liu	liu	PROPN
fumecheng-14015	514	2	,	,	PUNCT
fumecheng-14015	514	3	h.c	h.c	PROPN
fumecheng-14015	514	4	.	.	PROPN
fumecheng-14015	514	5	,	,	PUNCT
fumecheng-14015	514	6	gusak	gusak	PROPN
fumecheng-14015	514	7	,	,	PUNCT
fumecheng-14015	514	8	a.m.	a.m.	ADV
fumecheng-14015	514	9	,	,	PUNCT
fumecheng-14015	514	10	tu	tu	PROPN
fumecheng-14015	514	11	,	,	PUNCT
fumecheng-14015	514	12	k.n	k.n	PROPN
fumecheng-14015	514	13	.	.	PROPN
fumecheng-14015	514	14	,	,	PUNCT
fumecheng-14015	514	15	chen	chen	PROPN
fumecheng-14015	514	16	,	,	PUNCT
fumecheng-14015	514	17	c.	c.	PROPN
fumecheng-14015	514	18	,	,	PUNCT
fumecheng-14015	514	19	2021	2021	NUM
fumecheng-14015	514	20	,	,	PUNCT
fumecheng-14015	514	21	interfacial	interfacial	ADJ
fumecheng-14015	514	22	void	void	ADJ
fumecheng-14015	514	23	ripening	ripening	NOUN
fumecheng-14015	514	24	in	in	ADP
fumecheng-14015	514	25	cu	cu	PROPN
fumecheng-14015	514	26	–	–	PUNCT
fumecheng-14015	514	27	cu	cu	PROPN
fumecheng-14015	514	28	joints	joint	NOUN
fumecheng-14015	514	29	,	,	PUNCT
fumecheng-14015	514	30	materials	material	NOUN
fumecheng-14015	514	31	characterization	characterization	NOUN
fumecheng-14015	514	32	,	,	PUNCT
fumecheng-14015	514	33	181	181	NUM
fumecheng-14015	514	34	,	,	PUNCT
fumecheng-14015	514	35	111459	111459	NUM
fumecheng-14015	514	36	.	.	PUNCT
fumecheng-14015	515	1	64	64	NUM
fumecheng-14015	515	2	.	.	PUNCT
fumecheng-14015	516	1	wang	wang	PROPN
fumecheng-14015	516	2	,	,	PUNCT
fumecheng-14015	516	3	y.	y.	PROPN
fumecheng-14015	516	4	,	,	PUNCT
fumecheng-14015	516	5	huang	huang	PROPN
fumecheng-14015	516	6	,	,	PUNCT
fumecheng-14015	516	7	y.t	y.t	PROPN
fumecheng-14015	516	8	.	.	PROPN
fumecheng-14015	516	9	,	,	PUNCT
fumecheng-14015	516	10	liu	liu	PROPN
fumecheng-14015	516	11	,	,	PUNCT
fumecheng-14015	516	12	y.x	y.x	PROPN
fumecheng-14015	516	13	.	.	PROPN
fumecheng-14015	516	14	,	,	PUNCT
fumecheng-14015	516	15	feng	feng	PROPN
fumecheng-14015	516	16	,	,	PUNCT
fumecheng-14015	516	17	s.p	s.p	PROPN
fumecheng-14015	516	18	.	.	PROPN
fumecheng-14015	516	19	,	,	PUNCT
fumecheng-14015	516	20	huang	huang	PROPN
fumecheng-14015	516	21	,	,	PUNCT
fumecheng-14015	516	22	m.x	m.x	PROPN
fumecheng-14015	516	23	.	.	PROPN
fumecheng-14015	516	24	,	,	PUNCT
fumecheng-14015	516	25	2022	2022	NUM
fumecheng-14015	516	26	,	,	PUNCT
fumecheng-14015	516	27	thermal	thermal	ADJ
fumecheng-14015	516	28	instability	instability	NOUN
fumecheng-14015	516	29	of	of	ADP
fumecheng-14015	516	30	nanocrystalline	nanocrystalline	PROPN
fumecheng-14015	516	31	cu	cu	PROPN
fumecheng-14015	516	32	enables	enable	VERB
fumecheng-14015	516	33	cu	cu	PROPN
fumecheng-14015	516	34	-	-	PUNCT
fumecheng-14015	516	35	cu	cu	ADJ
fumecheng-14015	516	36	direct	direct	ADJ
fumecheng-14015	516	37	bonding	bonding	NOUN
fumecheng-14015	516	38	in	in	ADP
fumecheng-14015	516	39	interconnects	interconnect	NOUN
fumecheng-14015	516	40	at	at	ADP
fumecheng-14015	516	41	low	low	ADJ
fumecheng-14015	516	42	temperature	temperature	NOUN
fumecheng-14015	516	43	,	,	PUNCT
fumecheng-14015	516	44	scripta	scripta	PROPN
fumecheng-14015	516	45	materialia	materialia	PROPN
fumecheng-14015	516	46	,	,	PUNCT
fumecheng-14015	516	47	220	220	NUM
fumecheng-14015	516	48	,	,	PUNCT
fumecheng-14015	516	49	114900	114900	NUM
fumecheng-14015	516	50	.	.	PUNCT
fumecheng-14015	517	1	65	65	NUM
fumecheng-14015	517	2	.	.	PUNCT
fumecheng-14015	518	1	shigetou	shigetou	PROPN
fumecheng-14015	518	2	,	,	PUNCT
fumecheng-14015	518	3	a.	a.	NOUN
fumecheng-14015	518	4	,	,	PUNCT
fumecheng-14015	518	5	itoh	itoh	NOUN
fumecheng-14015	518	6	,	,	PUNCT
fumecheng-14015	518	7	t.	t.	PROPN
fumecheng-14015	518	8	,	,	PUNCT
fumecheng-14015	518	9	sawada	sawada	PROPN
fumecheng-14015	518	10	,	,	PUNCT
fumecheng-14015	518	11	k.	k.	PROPN
fumecheng-14015	518	12	,	,	PUNCT
fumecheng-14015	518	13	suga	suga	PROPN
fumecheng-14015	518	14	,	,	PUNCT
fumecheng-14015	518	15	t.	t.	PROPN
fumecheng-14015	518	16	,	,	PUNCT
fumecheng-14015	518	17	2008	2008	NUM
fumecheng-14015	518	18	,	,	PUNCT
fumecheng-14015	518	19	bumpless	bumpless	NOUN
fumecheng-14015	518	20	interconnect	interconnect	NOUN
fumecheng-14015	518	21	of	of	ADP
fumecheng-14015	518	22	6-µm	6-µm	PROPN
fumecheng-14015	518	23	-	-	PUNCT
fumecheng-14015	518	24	pitch	pitch	NOUN
fumecheng-14015	518	25	cu	cu	PROPN
fumecheng-14015	518	26	electrodes	electrode	NOUN
fumecheng-14015	518	27	at	at	ADP
fumecheng-14015	518	28	room	room	NOUN
fumecheng-14015	518	29	temperature	temperature	NOUN
fumecheng-14015	518	30	,	,	PUNCT
fumecheng-14015	518	31	ieee	ieee	NOUN
fumecheng-14015	518	32	transactions	transaction	NOUN
fumecheng-14015	518	33	on	on	ADP
fumecheng-14015	518	34	advanced	advanced	ADJ
fumecheng-14015	518	35	packaging	packaging	NOUN
fumecheng-14015	518	36	,	,	PUNCT
fumecheng-14015	518	37	31(3	31(3	NUM
fumecheng-14015	518	38	)	)	PUNCT
fumecheng-14015	518	39	,	,	PUNCT
fumecheng-14015	518	40	pp	pp	PROPN
fumecheng-14015	518	41	.	.	PUNCT
fumecheng-14015	519	1	473	473	NUM
fumecheng-14015	519	2	-	-	SYM
fumecheng-14015	519	3	478	478	NUM
fumecheng-14015	519	4	.	.	PUNCT
fumecheng-14015	520	1	66	66	NUM
fumecheng-14015	520	2	.	.	PUNCT
fumecheng-14015	521	1	wang	wang	PROPN
fumecheng-14015	521	2	,	,	PUNCT
fumecheng-14015	521	3	y.-h	y.-h	PROPN
fumecheng-14015	521	4	.	.	PROPN
fumecheng-14015	521	5	,	,	PUNCT
fumecheng-14015	521	6	suga	suga	PROPN
fumecheng-14015	521	7	,	,	PUNCT
fumecheng-14015	521	8	t.	t.	PROPN
fumecheng-14015	521	9	,	,	PUNCT
fumecheng-14015	521	10	2008	2008	NUM
fumecheng-14015	521	11	,	,	PUNCT
fumecheng-14015	521	12	20-µm	20-µm	PROPN
fumecheng-14015	521	13	-	-	PUNCT
fumecheng-14015	521	14	pitch	pitch	NOUN
fumecheng-14015	521	15	au	au	ADJ
fumecheng-14015	521	16	micro	micro	NOUN
fumecheng-14015	521	17	-	-	NOUN
fumecheng-14015	521	18	bump	bump	ADJ
fumecheng-14015	521	19	interconnection	interconnection	NOUN
fumecheng-14015	521	20	at	at	ADP
fumecheng-14015	521	21	room	room	NOUN
fumecheng-14015	521	22	temperature	temperature	NOUN
fumecheng-14015	521	23	in	in	ADP
fumecheng-14015	521	24	ambient	ambient	ADJ
fumecheng-14015	521	25	air	air	NOUN
fumecheng-14015	521	26	,	,	PUNCT
fumecheng-14015	521	27	proc	proc	NOUN
fumecheng-14015	521	28	.	.	PROPN
fumecheng-14015	521	29	2008	2008	NUM
fumecheng-14015	521	30	58th	58th	ADJ
fumecheng-14015	521	31	electronic	electronic	ADJ
fumecheng-14015	521	32	components	component	NOUN
fumecheng-14015	521	33	and	and	CCONJ
fumecheng-14015	521	34	technology	technology	NOUN
fumecheng-14015	521	35	conference	conference	NOUN
fumecheng-14015	521	36	,	,	PUNCT
fumecheng-14015	521	37	lake	lake	PROPN
fumecheng-14015	521	38	buena	buena	PROPN
fumecheng-14015	521	39	vista	vista	PROPN
fumecheng-14015	521	40	,	,	PUNCT
fumecheng-14015	521	41	usa	usa	PROPN
fumecheng-14015	521	42	,	,	PUNCT
fumecheng-14015	521	43	pp	pp	PROPN
fumecheng-14015	521	44	.	.	PUNCT
fumecheng-14015	522	1	944	944	NUM
fumecheng-14015	522	2	-	-	SYM
fumecheng-14015	522	3	949	949	NUM
fumecheng-14015	522	4	.	.	NOUN
fumecheng-14015	523	1	67	67	NUM
fumecheng-14015	523	2	.	.	PUNCT
fumecheng-14015	523	3	barr	barr	PROPN
fumecheng-14015	523	4	,	,	PUNCT
fumecheng-14015	523	5	t.	t.	PROPN
fumecheng-14015	523	6	,	,	PUNCT
fumecheng-14015	523	7	1977	1977	NUM
fumecheng-14015	523	8	,	,	PUNCT
fumecheng-14015	523	9	esca	esca	PROPN
fumecheng-14015	523	10	studies	study	NOUN
fumecheng-14015	523	11	of	of	ADP
fumecheng-14015	523	12	naturally	naturally	ADV
fumecheng-14015	523	13	passivated	passivate	VERB
fumecheng-14015	523	14	metal	metal	NOUN
fumecheng-14015	523	15	foils	foil	NOUN
fumecheng-14015	523	16	,	,	PUNCT
fumecheng-14015	523	17	journal	journal	NOUN
fumecheng-14015	523	18	of	of	ADP
fumecheng-14015	523	19	vacuum	vacuum	PROPN
fumecheng-14015	523	20	science	science	NOUN
fumecheng-14015	523	21	and	and	CCONJ
fumecheng-14015	523	22	technology	technology	NOUN
fumecheng-14015	523	23	,	,	PUNCT
fumecheng-14015	523	24	14(1	14(1	NUM
fumecheng-14015	523	25	)	)	PUNCT
fumecheng-14015	523	26	,	,	PUNCT
fumecheng-14015	523	27	pp	pp	ADP
fumecheng-14015	523	28	.	.	PUNCT
fumecheng-14015	524	1	660	660	NUM
fumecheng-14015	524	2	-	-	SYM
fumecheng-14015	524	3	665	665	NUM
fumecheng-14015	524	4	.	.	PUNCT
fumecheng-14015	525	1	68	68	NUM
fumecheng-14015	525	2	.	.	PUNCT
fumecheng-14015	526	1	iijima	iijima	PROPN
fumecheng-14015	526	2	,	,	PUNCT
fumecheng-14015	526	3	j.	j.	PROPN
fumecheng-14015	526	4	,	,	PUNCT
fumecheng-14015	526	5	lim	lim	PROPN
fumecheng-14015	526	6	,	,	PUNCT
fumecheng-14015	526	7	j.-w	j.-w	PROPN
fumecheng-14015	526	8	.	.	PROPN
fumecheng-14015	526	9	,	,	PUNCT
fumecheng-14015	526	10	hong	hong	PROPN
fumecheng-14015	526	11	,	,	PUNCT
fumecheng-14015	526	12	s.-h	s.-h	NOUN
fumecheng-14015	526	13	.	.	PROPN
fumecheng-14015	526	14	,	,	PUNCT
fumecheng-14015	526	15	suzuki	suzuki	PROPN
fumecheng-14015	526	16	,	,	PUNCT
fumecheng-14015	526	17	s.	s.	PROPN
fumecheng-14015	526	18	,	,	PUNCT
fumecheng-14015	526	19	mimura	mimura	PROPN
fumecheng-14015	526	20	,	,	PUNCT
fumecheng-14015	526	21	k.	k.	PROPN
fumecheng-14015	526	22	,	,	PUNCT
fumecheng-14015	526	23	isshiki	isshiki	PROPN
fumecheng-14015	526	24	,	,	PUNCT
fumecheng-14015	526	25	m.	m.	NOUN
fumecheng-14015	526	26	,	,	PUNCT
fumecheng-14015	526	27	2006	2006	NUM
fumecheng-14015	526	28	,	,	PUNCT
fumecheng-14015	526	29	native	native	ADJ
fumecheng-14015	526	30	oxidation	oxidation	NOUN
fumecheng-14015	526	31	of	of	ADP
fumecheng-14015	526	32	ultra	ultra	ADJ
fumecheng-14015	526	33	high	high	ADJ
fumecheng-14015	526	34	purity	purity	NOUN
fumecheng-14015	526	35	cu	cu	PROPN
fumecheng-14015	526	36	bulk	bulk	NOUN
fumecheng-14015	526	37	and	and	CCONJ
fumecheng-14015	526	38	thin	thin	ADJ
fumecheng-14015	526	39	films	film	NOUN
fumecheng-14015	526	40	,	,	PUNCT
fumecheng-14015	526	41	applied	apply	VERB
fumecheng-14015	526	42	surface	surface	NOUN
fumecheng-14015	526	43	science	science	NOUN
fumecheng-14015	526	44	,	,	PUNCT
fumecheng-14015	526	45	253(5	253(5	NUM
fumecheng-14015	526	46	)	)	PUNCT
fumecheng-14015	526	47	,	,	PUNCT
fumecheng-14015	526	48	pp	pp	ADJ
fumecheng-14015	526	49	.	.	PUNCT
fumecheng-14015	526	50	2825	2825	NUM
fumecheng-14015	526	51	-	-	SYM
fumecheng-14015	526	52	2829	2829	NUM
fumecheng-14015	526	53	.	.	PUNCT
fumecheng-14015	527	1	69	69	NUM
fumecheng-14015	527	2	.	.	PUNCT
fumecheng-14015	528	1	platzman	platzman	NOUN
fumecheng-14015	528	2	,	,	PUNCT
fumecheng-14015	528	3	i.	i.	NOUN
fumecheng-14015	528	4	,	,	PUNCT
fumecheng-14015	528	5	brener	brener	NOUN
fumecheng-14015	528	6	,	,	PUNCT
fumecheng-14015	528	7	r.	r.	PROPN
fumecheng-14015	528	8	,	,	PUNCT
fumecheng-14015	528	9	haick	haick	PROPN
fumecheng-14015	528	10	,	,	PUNCT
fumecheng-14015	528	11	h.	h.	PROPN
fumecheng-14015	528	12	,	,	PUNCT
fumecheng-14015	528	13	tannenbaum	tannenbaum	PROPN
fumecheng-14015	528	14	,	,	PUNCT
fumecheng-14015	528	15	r.	r.	PROPN
fumecheng-14015	528	16	,	,	PUNCT
fumecheng-14015	528	17	2008	2008	NUM
fumecheng-14015	528	18	,	,	PUNCT
fumecheng-14015	528	19	oxidation	oxidation	NOUN
fumecheng-14015	528	20	of	of	ADP
fumecheng-14015	528	21	polycrystalline	polycrystalline	ADJ
fumecheng-14015	528	22	copper	copper	NOUN
fumecheng-14015	528	23	thin	thin	ADJ
fumecheng-14015	528	24	films	film	NOUN
fumecheng-14015	528	25	at	at	ADP
fumecheng-14015	528	26	ambient	ambient	ADJ
fumecheng-14015	528	27	conditions	condition	NOUN
fumecheng-14015	528	28	,	,	PUNCT
fumecheng-14015	528	29	the	the	DET
fumecheng-14015	528	30	journal	journal	NOUN
fumecheng-14015	528	31	of	of	ADP
fumecheng-14015	528	32	physical	physical	ADJ
fumecheng-14015	528	33	chemistry	chemistry	NOUN
fumecheng-14015	528	34	c	c	NOUN
fumecheng-14015	528	35	,	,	PUNCT
fumecheng-14015	528	36	112(4	112(4	NUM
fumecheng-14015	528	37	)	)	PUNCT
fumecheng-14015	528	38	,	,	PUNCT
fumecheng-14015	528	39	pp	pp	ADJ
fumecheng-14015	528	40	.	.	PUNCT
fumecheng-14015	529	1	1101	1101	NUM
fumecheng-14015	529	2	-	-	PUNCT
fumecheng-14015	529	3	1108	1108	NUM
fumecheng-14015	529	4	.	.	PUNCT
fumecheng-14015	530	1	70	70	NUM
fumecheng-14015	530	2	.	.	PUNCT
fumecheng-14015	531	1	li	li	PROPN
fumecheng-14015	531	2	,	,	PUNCT
fumecheng-14015	531	3	j.	j.	PROPN
fumecheng-14015	531	4	,	,	PUNCT
fumecheng-14015	531	5	vizkelethy	vizkelethy	ADJ
fumecheng-14015	531	6	,	,	PUNCT
fumecheng-14015	531	7	g.	g.	PROPN
fumecheng-14015	531	8	,	,	PUNCT
fumecheng-14015	531	9	revesz	revesz	ADJ
fumecheng-14015	531	10	,	,	PUNCT
fumecheng-14015	531	11	p.	p.	PROPN
fumecheng-14015	531	12	,	,	PUNCT
fumecheng-14015	531	13	mayer	mayer	PROPN
fumecheng-14015	531	14	,	,	PUNCT
fumecheng-14015	531	15	j.	j.	PROPN
fumecheng-14015	531	16	,	,	PUNCT
fumecheng-14015	531	17	tu	tu	PROPN
fumecheng-14015	531	18	,	,	PUNCT
fumecheng-14015	531	19	k.-n	k.-n	PROPN
fumecheng-14015	531	20	.	.	PROPN
fumecheng-14015	531	21	,	,	PUNCT
fumecheng-14015	531	22	1991	1991	NUM
fumecheng-14015	531	23	,	,	PUNCT
fumecheng-14015	531	24	oxidation	oxidation	NOUN
fumecheng-14015	531	25	and	and	CCONJ
fumecheng-14015	531	26	reduction	reduction	NOUN
fumecheng-14015	531	27	of	of	ADP
fumecheng-14015	531	28	copper	copper	NOUN
fumecheng-14015	531	29	oxide	oxide	NOUN
fumecheng-14015	531	30	thin	thin	ADJ
fumecheng-14015	531	31	films	film	NOUN
fumecheng-14015	531	32	,	,	PUNCT
fumecheng-14015	531	33	journal	journal	NOUN
fumecheng-14015	531	34	of	of	ADP
fumecheng-14015	531	35	applied	applied	ADJ
fumecheng-14015	531	36	physics	physics	NOUN
fumecheng-14015	531	37	,	,	PUNCT
fumecheng-14015	531	38	69(2	69(2	NOUN
fumecheng-14015	531	39	)	)	PUNCT
fumecheng-14015	531	40	,	,	PUNCT
fumecheng-14015	531	41	pp	pp	PROPN
fumecheng-14015	531	42	.	.	PUNCT
fumecheng-14015	531	43	1020	1020	NUM
fumecheng-14015	531	44	-	-	SYM
fumecheng-14015	531	45	1029	1029	NUM
fumecheng-14015	531	46	.	.	PUNCT
fumecheng-14015	532	1	71	71	NUM
fumecheng-14015	532	2	.	.	PUNCT
fumecheng-14015	532	3	badillo	badillo	PROPN
fumecheng-14015	532	4	-	-	PUNCT
fumecheng-14015	532	5	avila	avila	PROPN
fumecheng-14015	532	6	,	,	PUNCT
fumecheng-14015	532	7	m.	m.	NOUN
fumecheng-14015	532	8	,	,	PUNCT
fumecheng-14015	532	9	castanedo	castanedo	NOUN
fumecheng-14015	532	10	-	-	PUNCT
fumecheng-14015	532	11	perez	perez	PROPN
fumecheng-14015	532	12	,	,	PUNCT
fumecheng-14015	532	13	r.	r.	PROPN
fumecheng-14015	532	14	,	,	PUNCT
fumecheng-14015	532	15	marquez	marquez	PROPN
fumecheng-14015	532	16	-	-	PUNCT
fumecheng-14015	532	17	marin	marin	PROPN
fumecheng-14015	532	18	,	,	PUNCT
fumecheng-14015	532	19	j.	j.	PROPN
fumecheng-14015	532	20	,	,	PUNCT
fumecheng-14015	532	21	guzman	guzman	PROPN
fumecheng-14015	532	22	-	-	PUNCT
fumecheng-14015	532	23	caballero	caballero	PROPN
fumecheng-14015	532	24	,	,	PUNCT
fumecheng-14015	532	25	d.	d.	PROPN
fumecheng-14015	532	26	,	,	PUNCT
fumecheng-14015	532	27	torres	torre	NOUN
fumecheng-14015	532	28	-	-	PUNCT
fumecheng-14015	532	29	delgado	delgado	NOUN
fumecheng-14015	532	30	,	,	PUNCT
fumecheng-14015	532	31	g.	g.	PROPN
fumecheng-14015	532	32	,	,	PUNCT
fumecheng-14015	532	33	2019	2019	NUM
fumecheng-14015	532	34	,	,	PUNCT
fumecheng-14015	532	35	fast	fast	ADJ
fumecheng-14015	532	36	rate	rate	NOUN
fumecheng-14015	532	37	oxidation	oxidation	NOUN
fumecheng-14015	532	38	to	to	ADP
fumecheng-14015	532	39	cu2o	cu2o	PROPN
fumecheng-14015	532	40	at	at	ADP
fumecheng-14015	532	41	room	room	NOUN
fumecheng-14015	532	42	temperature	temperature	NOUN
fumecheng-14015	532	43	of	of	ADP
fumecheng-14015	532	44	metallic	metallic	ADJ
fumecheng-14015	532	45	copper	copper	NOUN
fumecheng-14015	532	46	films	film	NOUN
fumecheng-14015	532	47	produced	produce	VERB
fumecheng-14015	532	48	by	by	ADP
fumecheng-14015	532	49	the	the	DET
fumecheng-14015	532	50	argon	argon	NOUN
fumecheng-14015	532	51	-	-	PUNCT
fumecheng-14015	532	52	plasma	plasma	NOUN
fumecheng-14015	532	53	bombardment	bombardment	NOUN
fumecheng-14015	532	54	of	of	ADP
fumecheng-14015	532	55	cuo	cuo	PROPN
fumecheng-14015	532	56	films	film	NOUN
fumecheng-14015	532	57	,	,	PUNCT
fumecheng-14015	532	58	materials	material	NOUN
fumecheng-14015	532	59	chemistry	chemistry	NOUN
fumecheng-14015	532	60	and	and	CCONJ
fumecheng-14015	532	61	physics	physics	NOUN
fumecheng-14015	532	62	,	,	PUNCT
fumecheng-14015	532	63	236	236	NUM
fumecheng-14015	532	64	,	,	PUNCT
fumecheng-14015	532	65	121759	121759	NUM
fumecheng-14015	532	66	.	.	PUNCT
fumecheng-14015	533	1	72	72	NUM
fumecheng-14015	533	2	.	.	PUNCT
fumecheng-14015	534	1	rebhan	rebhan	PROPN
fumecheng-14015	534	2	,	,	PUNCT
fumecheng-14015	534	3	b.	b.	PROPN
fumecheng-14015	534	4	,	,	PUNCT
fumecheng-14015	534	5	plach	plach	PROPN
fumecheng-14015	534	6	,	,	PUNCT
fumecheng-14015	534	7	t.	t.	PROPN
fumecheng-14015	534	8	,	,	PUNCT
fumecheng-14015	534	9	tollabimazraehno	tollabimazraehno	ADV
fumecheng-14015	534	10	,	,	PUNCT
fumecheng-14015	534	11	s.	s.	PROPN
fumecheng-14015	534	12	,	,	PUNCT
fumecheng-14015	534	13	dragoi	dragoi	PROPN
fumecheng-14015	534	14	,	,	PUNCT
fumecheng-14015	534	15	v.	v.	PROPN
fumecheng-14015	534	16	,	,	PUNCT
fumecheng-14015	534	17	kawano	kawano	PROPN
fumecheng-14015	534	18	,	,	PUNCT
fumecheng-14015	534	19	m.	m.	NOUN
fumecheng-14015	534	20	,	,	PUNCT
fumecheng-14015	534	21	2014	2014	NUM
fumecheng-14015	534	22	,	,	PUNCT
fumecheng-14015	534	23	cu	cu	PROPN
fumecheng-14015	534	24	-	-	PUNCT
fumecheng-14015	534	25	cu	cu	PROPN
fumecheng-14015	534	26	wafer	wafer	NOUN
fumecheng-14015	534	27	bonding	bonding	NOUN
fumecheng-14015	534	28	:	:	PUNCT
fumecheng-14015	534	29	an	an	DET
fumecheng-14015	534	30	enabling	enable	VERB
fumecheng-14015	534	31	technology	technology	NOUN
fumecheng-14015	534	32	for	for	ADP
fumecheng-14015	534	33	three	three	NUM
fumecheng-14015	534	34	-	-	PUNCT
fumecheng-14015	534	35	dimensional	dimensional	ADJ
fumecheng-14015	534	36	integration	integration	NOUN
fumecheng-14015	534	37	,	,	PUNCT
fumecheng-14015	534	38	proc	proc	NOUN
fumecheng-14015	534	39	.	.	PROPN
fumecheng-14015	535	1	2014	2014	NUM
fumecheng-14015	535	2	international	international	ADJ
fumecheng-14015	535	3	conference	conference	NOUN
fumecheng-14015	535	4	on	on	ADP
fumecheng-14015	535	5	electronics	electronic	NOUN
fumecheng-14015	535	6	packaging	packaging	NOUN
fumecheng-14015	535	7	(	(	PUNCT
fumecheng-14015	535	8	icep	icep	PROPN
fumecheng-14015	535	9	)	)	PUNCT
fumecheng-14015	535	10	,	,	PUNCT
fumecheng-14015	535	11	toyama	toyama	PROPN
fumecheng-14015	535	12	,	,	PUNCT
fumecheng-14015	535	13	japan	japan	PROPN
fumecheng-14015	535	14	,	,	PUNCT
fumecheng-14015	535	15	pp	pp	ADJ
fumecheng-14015	535	16	.	.	PUNCT
fumecheng-14015	536	1	475	475	NUM
fumecheng-14015	536	2	-	-	SYM
fumecheng-14015	536	3	479	479	NUM
fumecheng-14015	536	4	.	.	PUNCT
fumecheng-14015	537	1	73	73	NUM
fumecheng-14015	537	2	.	.	PUNCT
fumecheng-14015	538	1	kang	kang	PROPN
fumecheng-14015	538	2	,	,	PUNCT
fumecheng-14015	538	3	s.-g	s.-g	PROPN
fumecheng-14015	538	4	.	.	PROPN
fumecheng-14015	538	5	,	,	PUNCT
fumecheng-14015	538	6	lee	lee	PROPN
fumecheng-14015	538	7	,	,	PUNCT
fumecheng-14015	538	8	j.-e	j.-e	PROPN
fumecheng-14015	538	9	.	.	PUNCT
fumecheng-14015	538	10	,	,	PUNCT
fumecheng-14015	538	11	kim	kim	PROPN
fumecheng-14015	538	12	,	,	PUNCT
fumecheng-14015	538	13	e.-s	e.-s	PROPN
fumecheng-14015	538	14	.	.	PUNCT
fumecheng-14015	538	15	,	,	PUNCT
fumecheng-14015	538	16	lim	lim	PROPN
fumecheng-14015	538	17	,	,	PUNCT
fumecheng-14015	538	18	n.-e	n.-e	PROPN
fumecheng-14015	538	19	.	.	PUNCT
fumecheng-14015	538	20	,	,	PUNCT
fumecheng-14015	538	21	kim	kim	PROPN
fumecheng-14015	538	22	,	,	PUNCT
fumecheng-14015	538	23	s.-h	s.-h	NOUN
fumecheng-14015	538	24	.	.	PROPN
fumecheng-14015	538	25	,	,	PUNCT
fumecheng-14015	538	26	kim	kim	PROPN
fumecheng-14015	538	27	,	,	PUNCT
fumecheng-14015	538	28	s.-d	s.-d	PROPN
fumecheng-14015	538	29	.	.	PUNCT
fumecheng-14015	538	30	,	,	PUNCT
fumecheng-14015	538	31	kim	kim	PROPN
fumecheng-14015	538	32	,	,	PUNCT
fumecheng-14015	538	33	s.e.-k	s.e.-k	NOUN
fumecheng-14015	538	34	.	.	PUNCT
fumecheng-14015	538	35	,	,	PUNCT
fumecheng-14015	538	36	2012	2012	NUM
fumecheng-14015	538	37	,	,	PUNCT
fumecheng-14015	538	38	fabrication	fabrication	NOUN
fumecheng-14015	538	39	and	and	CCONJ
fumecheng-14015	538	40	challenges	challenge	NOUN
fumecheng-14015	538	41	of	of	ADP
fumecheng-14015	538	42	cu	cu	PROPN
fumecheng-14015	538	43	-	-	PUNCT
fumecheng-14015	538	44	to	to	ADP
fumecheng-14015	538	45	-	-	PUNCT
fumecheng-14015	538	46	cu	cu	NOUN
fumecheng-14015	538	47	wafer	wafer	NOUN
fumecheng-14015	538	48	bonding	bonding	NOUN
fumecheng-14015	538	49	,	,	PUNCT
fumecheng-14015	538	50	journal	journal	NOUN
fumecheng-14015	538	51	of	of	ADP
fumecheng-14015	538	52	the	the	DET
fumecheng-14015	538	53	microelectronics	microelectronic	NOUN
fumecheng-14015	538	54	and	and	CCONJ
fumecheng-14015	538	55	packaging	packaging	NOUN
fumecheng-14015	538	56	society	society	NOUN
fumecheng-14015	538	57	,	,	PUNCT
fumecheng-14015	538	58	19(2	19(2	NUM
fumecheng-14015	538	59	)	)	PUNCT
fumecheng-14015	538	60	,	,	PUNCT
fumecheng-14015	538	61	pp	pp	PROPN
fumecheng-14015	538	62	.	.	PUNCT
fumecheng-14015	539	1	29	29	NUM
fumecheng-14015	539	2	-	-	SYM
fumecheng-14015	539	3	33	33	NUM
fumecheng-14015	539	4	.	.	PUNCT
fumecheng-14015	540	1	74	74	NUM
fumecheng-14015	540	2	.	.	PUNCT
fumecheng-14015	541	1	chen	chen	PROPN
fumecheng-14015	541	2	,	,	PUNCT
fumecheng-14015	541	3	k.-n	k.-n	PROPN
fumecheng-14015	541	4	.	.	PUNCT
fumecheng-14015	541	5	,	,	PUNCT
fumecheng-14015	541	6	tan	tan	PROPN
fumecheng-14015	541	7	,	,	PUNCT
fumecheng-14015	541	8	c.	c.	PROPN
fumecheng-14015	541	9	,	,	PUNCT
fumecheng-14015	541	10	fan	fan	PROPN
fumecheng-14015	541	11	,	,	PUNCT
fumecheng-14015	541	12	a.	a.	NOUN
fumecheng-14015	541	13	,	,	PUNCT
fumecheng-14015	541	14	reif	reif	PROPN
fumecheng-14015	541	15	,	,	PUNCT
fumecheng-14015	541	16	r.	r.	PROPN
fumecheng-14015	541	17	,	,	PUNCT
fumecheng-14015	541	18	2005	2005	NUM
fumecheng-14015	541	19	,	,	PUNCT
fumecheng-14015	541	20	copper	copper	NOUN
fumecheng-14015	541	21	bonded	bond	VERB
fumecheng-14015	541	22	layers	layer	VERB
fumecheng-14015	541	23	analysis	analysis	NOUN
fumecheng-14015	541	24	and	and	CCONJ
fumecheng-14015	541	25	effects	effect	NOUN
fumecheng-14015	541	26	of	of	ADP
fumecheng-14015	541	27	copper	copper	NOUN
fumecheng-14015	541	28	surface	surface	NOUN
fumecheng-14015	541	29	conditions	condition	NOUN
fumecheng-14015	541	30	on	on	ADP
fumecheng-14015	541	31	bonding	bond	VERB
fumecheng-14015	541	32	quality	quality	NOUN
fumecheng-14015	541	33	for	for	ADP
fumecheng-14015	541	34	three	three	NUM
fumecheng-14015	541	35	-	-	PUNCT
fumecheng-14015	541	36	dimensional	dimensional	ADJ
fumecheng-14015	541	37	integration	integration	NOUN
fumecheng-14015	541	38	,	,	PUNCT
fumecheng-14015	541	39	journal	journal	NOUN
fumecheng-14015	541	40	of	of	ADP
fumecheng-14015	541	41	electronic	electronic	ADJ
fumecheng-14015	541	42	materials	material	NOUN
fumecheng-14015	541	43	,	,	PUNCT
fumecheng-14015	541	44	34(3	34(3	NUM
fumecheng-14015	541	45	)	)	PUNCT
fumecheng-14015	541	46	,	,	PUNCT
fumecheng-14015	541	47	pp	pp	PROPN
fumecheng-14015	541	48	.	.	PUNCT
fumecheng-14015	541	49	1464	1464	NUM
fumecheng-14015	541	50	-	-	SYM
fumecheng-14015	541	51	1467	1467	NUM
fumecheng-14015	541	52	.	.	PUNCT
fumecheng-14015	542	1	75	75	NUM
fumecheng-14015	542	2	.	.	PUNCT
fumecheng-14015	543	1	chen	chen	PROPN
fumecheng-14015	543	2	,	,	PUNCT
fumecheng-14015	543	3	k.-n	k.-n	PROPN
fumecheng-14015	543	4	.	.	PROPN
fumecheng-14015	543	5	,	,	PUNCT
fumecheng-14015	543	6	fan	fan	PROPN
fumecheng-14015	543	7	,	,	PUNCT
fumecheng-14015	543	8	a.	a.	PROPN
fumecheng-14015	543	9	,	,	PUNCT
fumecheng-14015	543	10	tan	tan	PROPN
fumecheng-14015	543	11	,	,	PUNCT
fumecheng-14015	543	12	c.	c.	NOUN
fumecheng-14015	543	13	,	,	PUNCT
fumecheng-14015	543	14	reif	reif	PROPN
fumecheng-14015	543	15	,	,	PUNCT
fumecheng-14015	543	16	r.	r.	PROPN
fumecheng-14015	543	17	,	,	PUNCT
fumecheng-14015	543	18	2006	2006	NUM
fumecheng-14015	543	19	,	,	PUNCT
fumecheng-14015	543	20	bonding	bond	VERB
fumecheng-14015	543	21	parameters	parameter	NOUN
fumecheng-14015	543	22	of	of	ADP
fumecheng-14015	543	23	blanket	blanket	NOUN
fumecheng-14015	543	24	copper	copper	NOUN
fumecheng-14015	543	25	wafer	wafer	NOUN
fumecheng-14015	543	26	bonding	bonding	NOUN
fumecheng-14015	543	27	,	,	PUNCT
fumecheng-14015	543	28	journal	journal	NOUN
fumecheng-14015	543	29	of	of	ADP
fumecheng-14015	543	30	electronic	electronic	ADJ
fumecheng-14015	543	31	materials	material	NOUN
fumecheng-14015	543	32	,	,	PUNCT
fumecheng-14015	543	33	35(2	35(2	NUM
fumecheng-14015	543	34	)	)	PUNCT
fumecheng-14015	543	35	,	,	PUNCT
fumecheng-14015	543	36	pp	pp	ADJ
fumecheng-14015	543	37	.	.	PUNCT
fumecheng-14015	544	1	230	230	NUM
fumecheng-14015	544	2	-	-	SYM
fumecheng-14015	544	3	234	234	NUM
fumecheng-14015	544	4	.	.	PUNCT
fumecheng-14015	545	1	76	76	NUM
fumecheng-14015	545	2	.	.	PUNCT
fumecheng-14015	546	1	cui	cui	PROPN
fumecheng-14015	546	2	,	,	PUNCT
fumecheng-14015	546	3	n.	n.	PROPN
fumecheng-14015	546	4	,	,	PUNCT
fumecheng-14015	546	5	wang	wang	PROPN
fumecheng-14015	546	6	,	,	PUNCT
fumecheng-14015	546	7	f.	f.	PROPN
fumecheng-14015	546	8	,	,	PUNCT
fumecheng-14015	546	9	ding	ding	NOUN
fumecheng-14015	546	10	,	,	PUNCT
fumecheng-14015	546	11	h.	h.	PROPN
fumecheng-14015	546	12	,	,	PUNCT
fumecheng-14015	546	13	2020	2020	NUM
fumecheng-14015	546	14	,	,	PUNCT
fumecheng-14015	546	15	acetic	acetic	ADJ
fumecheng-14015	546	16	acid	acid	NOUN
fumecheng-14015	546	17	and	and	CCONJ
fumecheng-14015	546	18	ammonium	ammonium	NOUN
fumecheng-14015	546	19	persulfate	persulfate	NOUN
fumecheng-14015	546	20	pre	pre	VERB
fumecheng-14015	546	21	-	-	ADJ
fumecheng-14015	546	22	treated	treat	VERB
fumecheng-14015	546	23	copper	copper	NOUN
fumecheng-14015	546	24	foil	foil	NOUN
fumecheng-14015	546	25	for	for	ADP
fumecheng-14015	546	26	the	the	DET
fumecheng-14015	546	27	improvement	improvement	NOUN
fumecheng-14015	546	28	of	of	ADP
fumecheng-14015	546	29	graphene	graphene	ADJ
fumecheng-14015	546	30	quality	quality	NOUN
fumecheng-14015	546	31	,	,	PUNCT
fumecheng-14015	546	32	sensitivity	sensitivity	NOUN
fumecheng-14015	546	33	and	and	CCONJ
fumecheng-14015	546	34	specificity	specificity	NOUN
fumecheng-14015	546	35	of	of	ADP
fumecheng-14015	546	36	hall	hall	NOUN
fumecheng-14015	546	37	effect	effect	NOUN
fumecheng-14015	546	38	label	label	NOUN
fumecheng-14015	546	39	-	-	PUNCT
fumecheng-14015	546	40	free	free	ADJ
fumecheng-14015	546	41	dna	dna	PROPN
fumecheng-14015	546	42	hybridization	hybridization	NOUN
fumecheng-14015	546	43	detection	detection	NOUN
fumecheng-14015	546	44	,	,	PUNCT
fumecheng-14015	546	45	materials	material	NOUN
fumecheng-14015	546	46	,	,	PUNCT
fumecheng-14015	546	47	13(7	13(7	NUM
fumecheng-14015	546	48	)	)	PUNCT
fumecheng-14015	546	49	,	,	PUNCT
fumecheng-14015	546	50	1784	1784	NUM
fumecheng-14015	546	51	.	.	PUNCT
fumecheng-14015	547	1	77	77	NUM
fumecheng-14015	547	2	.	.	PUNCT
fumecheng-14015	548	1	jangam	jangam	PROPN
fumecheng-14015	548	2	,	,	PUNCT
fumecheng-14015	548	3	s.	s.	PROPN
fumecheng-14015	548	4	,	,	PUNCT
fumecheng-14015	548	5	bajwa	bajwa	PROPN
fumecheng-14015	548	6	,	,	PUNCT
fumecheng-14015	548	7	a.a	a.a	PROPN
fumecheng-14015	548	8	.	.	PROPN
fumecheng-14015	548	9	,	,	PUNCT
fumecheng-14015	548	10	mogera	mogera	NOUN
fumecheng-14015	548	11	,	,	PUNCT
fumecheng-14015	548	12	u.	u.	PROPN
fumecheng-14015	548	13	,	,	PUNCT
fumecheng-14015	548	14	ambhore	ambhore	VERB
fumecheng-14015	548	15	,	,	PUNCT
fumecheng-14015	548	16	p.	p.	NOUN
fumecheng-14015	548	17	,	,	PUNCT
fumecheng-14015	548	18	colosimo	colosimo	NOUN
fumecheng-14015	548	19	,	,	PUNCT
fumecheng-14015	548	20	t.	t.	NOUN
fumecheng-14015	548	21	,	,	PUNCT
fumecheng-14015	548	22	chylak	chylak	ADJ
fumecheng-14015	548	23	,	,	PUNCT
fumecheng-14015	548	24	b.	b.	PROPN
fumecheng-14015	548	25	,	,	PUNCT
fumecheng-14015	548	26	iyer	iyer	PROPN
fumecheng-14015	548	27	,	,	PUNCT
fumecheng-14015	548	28	s.	s.	PROPN
fumecheng-14015	548	29	,	,	PUNCT
fumecheng-14015	548	30	2019	2019	NUM
fumecheng-14015	548	31	,	,	PUNCT
fumecheng-14015	548	32	fine	fine	ADJ
fumecheng-14015	548	33	-	-	PUNCT
fumecheng-14015	548	34	pitch	pitch	NOUN
fumecheng-14015	548	35	(	(	PUNCT
fumecheng-14015	548	36	≤	≤	NUM
fumecheng-14015	548	37	10	10	NUM
fumecheng-14015	548	38	µm	µm	NOUN
fumecheng-14015	548	39	)	)	PUNCT
fumecheng-14015	548	40	direct	direct	PROPN
fumecheng-14015	548	41	cu	cu	PROPN
fumecheng-14015	548	42	-	-	PROPN
fumecheng-14015	548	43	cu	cu	PROPN
fumecheng-14015	548	44	interconnects	interconnect	NOUN
fumecheng-14015	548	45	using	use	VERB
fumecheng-14015	548	46	in	in	ADP
fumecheng-14015	548	47	situ	situ	ADJ
fumecheng-14015	548	48	formic	formic	ADJ
fumecheng-14015	548	49	acid	acid	NOUN
fumecheng-14015	548	50	vapor	vapor	NOUN
fumecheng-14015	548	51	treatment	treatment	NOUN
fumecheng-14015	548	52	,	,	PUNCT
fumecheng-14015	548	53	proc	proc	NOUN
fumecheng-14015	548	54	.	.	PUNCT
fumecheng-14015	549	1	2019	2019	NUM
fumecheng-14015	549	2	ieee	ieee	NOUN
fumecheng-14015	549	3	69th	69th	ADJ
fumecheng-14015	549	4	electronic	electronic	ADJ
fumecheng-14015	549	5	components	component	NOUN
fumecheng-14015	549	6	and	and	CCONJ
fumecheng-14015	549	7	technology	technology	NOUN
fumecheng-14015	549	8	conference	conference	NOUN
fumecheng-14015	549	9	(	(	PUNCT
fumecheng-14015	549	10	ectc	ectc	PROPN
fumecheng-14015	549	11	)	)	PUNCT
fumecheng-14015	549	12	,	,	PUNCT
fumecheng-14015	549	13	las	las	PROPN
fumecheng-14015	549	14	vegas	vegas	PROPN
fumecheng-14015	549	15	,	,	PUNCT
fumecheng-14015	549	16	usa	usa	PROPN
fumecheng-14015	549	17	,	,	PUNCT
fumecheng-14015	549	18	pp	pp	PROPN
fumecheng-14015	549	19	.	.	PUNCT
fumecheng-14015	550	1	620	620	NUM
fumecheng-14015	550	2	-	-	SYM
fumecheng-14015	550	3	627	627	NUM
fumecheng-14015	550	4	.	.	PUNCT
fumecheng-14015	551	1	78	78	NUM
fumecheng-14015	551	2	.	.	X
fumecheng-14015	552	1	yang	yang	PROPN
fumecheng-14015	552	2	,	,	PUNCT
fumecheng-14015	552	3	w.	w.	PROPN
fumecheng-14015	552	4	,	,	PUNCT
fumecheng-14015	552	5	lu	lu	PROPN
fumecheng-14015	552	6	,	,	PUNCT
fumecheng-14015	552	7	y.	y.	PROPN
fumecheng-14015	552	8	,	,	PUNCT
fumecheng-14015	552	9	zhou	zhou	PROPN
fumecheng-14015	552	10	,	,	PUNCT
fumecheng-14015	552	11	c.	c.	PROPN
fumecheng-14015	552	12	,	,	PUNCT
fumecheng-14015	552	13	zhang	zhang	PROPN
fumecheng-14015	552	14	,	,	PUNCT
fumecheng-14015	552	15	j.	j.	PROPN
fumecheng-14015	552	16	,	,	PUNCT
fumecheng-14015	552	17	suga	suga	PROPN
fumecheng-14015	552	18	,	,	PUNCT
fumecheng-14015	552	19	t.	t.	PROPN
fumecheng-14015	552	20	,	,	PUNCT
fumecheng-14015	552	21	2017	2017	NUM
fumecheng-14015	552	22	,	,	PUNCT
fumecheng-14015	552	23	study	study	NOUN
fumecheng-14015	552	24	of	of	ADP
fumecheng-14015	552	25	cu	cu	PROPN
fumecheng-14015	552	26	film	film	NOUN
fumecheng-14015	552	27	surface	surface	NOUN
fumecheng-14015	552	28	treatment	treatment	NOUN
fumecheng-14015	552	29	using	use	VERB
fumecheng-14015	552	30	formic	formic	ADJ
fumecheng-14015	552	31	acid	acid	NOUN
fumecheng-14015	552	32	vapor	vapor	NOUN
fumecheng-14015	552	33	/	/	SYM
fumecheng-14015	552	34	solution	solution	NOUN
fumecheng-14015	552	35	for	for	ADP
fumecheng-14015	552	36	low	low	ADJ
fumecheng-14015	552	37	temperature	temperature	NOUN
fumecheng-14015	552	38	bonding	bonding	NOUN
fumecheng-14015	552	39	,	,	PUNCT
fumecheng-14015	552	40	journal	journal	NOUN
fumecheng-14015	552	41	of	of	ADP
fumecheng-14015	552	42	the	the	DET
fumecheng-14015	552	43	electrochemical	electrochemical	ADJ
fumecheng-14015	552	44	society	society	NOUN
fumecheng-14015	552	45	,	,	PUNCT
fumecheng-14015	552	46	165(4	165(4	NUM
fumecheng-14015	552	47	)	)	PUNCT
fumecheng-14015	552	48	,	,	PUNCT
fumecheng-14015	552	49	h3080	h3080	PROPN
fumecheng-14015	552	50	.	.	PUNCT
fumecheng-14015	552	51	79	79	NUM
fumecheng-14015	552	52	.	.	PUNCT
fumecheng-14015	553	1	huffman	huffman	PROPN
fumecheng-14015	553	2	,	,	PUNCT
fumecheng-14015	553	3	a.	a.	PROPN
fumecheng-14015	553	4	,	,	PUNCT
fumecheng-14015	553	5	lannon	lannon	PROPN
fumecheng-14015	553	6	,	,	PUNCT
fumecheng-14015	553	7	j.	j.	PROPN
fumecheng-14015	553	8	,	,	PUNCT
fumecheng-14015	553	9	lueck	lueck	PROPN
fumecheng-14015	553	10	,	,	PUNCT
fumecheng-14015	553	11	m.	m.	NOUN
fumecheng-14015	553	12	,	,	PUNCT
fumecheng-14015	553	13	gregory	gregory	PROPN
fumecheng-14015	553	14	,	,	PUNCT
fumecheng-14015	553	15	c.	c.	PROPN
fumecheng-14015	553	16	,	,	PUNCT
fumecheng-14015	553	17	temple	temple	PROPN
fumecheng-14015	553	18	,	,	PUNCT
fumecheng-14015	553	19	d.	d.	PROPN
fumecheng-14015	553	20	,	,	PUNCT
fumecheng-14015	553	21	2009	2009	NUM
fumecheng-14015	553	22	,	,	PUNCT
fumecheng-14015	553	23	fabrication	fabrication	NOUN
fumecheng-14015	553	24	and	and	CCONJ
fumecheng-14015	553	25	characterization	characterization	NOUN
fumecheng-14015	553	26	of	of	ADP
fumecheng-14015	553	27	metalto	metalto	NOUN
fumecheng-14015	553	28	-	-	PUNCT
fumecheng-14015	553	29	metal	metal	NOUN
fumecheng-14015	553	30	interconnect	interconnect	NOUN
fumecheng-14015	553	31	structures	structure	NOUN
fumecheng-14015	553	32	for	for	ADP
fumecheng-14015	553	33	3	3	NUM
fumecheng-14015	553	34	-	-	PUNCT
fumecheng-14015	553	35	d	d	NOUN
fumecheng-14015	553	36	integration	integration	NOUN
fumecheng-14015	553	37	,	,	PUNCT
fumecheng-14015	553	38	journal	journal	NOUN
fumecheng-14015	553	39	of	of	ADP
fumecheng-14015	553	40	instrumentation	instrumentation	NOUN
fumecheng-14015	553	41	,	,	PUNCT
fumecheng-14015	553	42	4(03	4(03	NUM
fumecheng-14015	553	43	)	)	PUNCT
fumecheng-14015	553	44	,	,	PUNCT
fumecheng-14015	553	45	p03006	p03006	NOUN
fumecheng-14015	553	46	.	.	PUNCT
fumecheng-14015	553	47	80	80	NUM
fumecheng-14015	553	48	.	.	PUNCT
fumecheng-14015	554	1	jang	jang	PROPN
fumecheng-14015	554	2	,	,	PUNCT
fumecheng-14015	554	3	e.-j	e.-j	PROPN
fumecheng-14015	554	4	.	.	PROPN
fumecheng-14015	554	5	,	,	PUNCT
fumecheng-14015	554	6	hyun	hyun	PROPN
fumecheng-14015	554	7	,	,	PUNCT
fumecheng-14015	554	8	s.	s.	PROPN
fumecheng-14015	554	9	,	,	PUNCT
fumecheng-14015	554	10	lee	lee	PROPN
fumecheng-14015	554	11	,	,	PUNCT
fumecheng-14015	554	12	h.-j	h.-j	PROPN
fumecheng-14015	554	13	.	.	PROPN
fumecheng-14015	554	14	,	,	PUNCT
fumecheng-14015	554	15	park	park	PROPN
fumecheng-14015	554	16	,	,	PUNCT
fumecheng-14015	554	17	y.-b	y.-b	PROPN
fumecheng-14015	554	18	.	.	PROPN
fumecheng-14015	554	19	,	,	PUNCT
fumecheng-14015	554	20	2009	2009	NUM
fumecheng-14015	554	21	,	,	PUNCT
fumecheng-14015	554	22	effect	effect	NOUN
fumecheng-14015	554	23	of	of	ADP
fumecheng-14015	554	24	wet	wet	ADJ
fumecheng-14015	554	25	pretreatment	pretreatment	NOUN
fumecheng-14015	554	26	on	on	ADP
fumecheng-14015	554	27	interfacial	interfacial	ADJ
fumecheng-14015	554	28	adhesion	adhesion	NOUN
fumecheng-14015	554	29	energy	energy	NOUN
fumecheng-14015	554	30	of	of	ADP
fumecheng-14015	554	31	cu	cu	PROPN
fumecheng-14015	554	32	-	-	PUNCT
fumecheng-14015	554	33	cu	cu	PROPN
fumecheng-14015	554	34	thermocompression	thermocompression	NOUN
fumecheng-14015	554	35	bond	bond	NOUN
fumecheng-14015	554	36	for	for	ADP
fumecheng-14015	554	37	3d	3d	PROPN
fumecheng-14015	554	38	ic	ic	PROPN
fumecheng-14015	554	39	packages	package	NOUN
fumecheng-14015	554	40	,	,	PUNCT
fumecheng-14015	554	41	journal	journal	NOUN
fumecheng-14015	554	42	of	of	ADP
fumecheng-14015	554	43	electronic	electronic	ADJ
fumecheng-14015	554	44	materials	material	NOUN
fumecheng-14015	554	45	,	,	PUNCT
fumecheng-14015	554	46	38(7	38(7	NUM
fumecheng-14015	554	47	)	)	PUNCT
fumecheng-14015	554	48	,	,	PUNCT
fumecheng-14015	554	49	pp	pp	ADP
fumecheng-14015	554	50	.	.	PUNCT
fumecheng-14015	554	51	2449	2449	NUM
fumecheng-14015	554	52	-	-	SYM
fumecheng-14015	554	53	2454	2454	NUM
fumecheng-14015	554	54	.	.	PUNCT
fumecheng-14015	555	1	cu	cu	PROPN
fumecheng-14015	555	2	-	-	PUNCT
fumecheng-14015	555	3	cu	cu	PROPN
fumecheng-14015	555	4	mechanical	mechanical	ADJ
fumecheng-14015	555	5	bonding	bonding	NOUN
fumecheng-14015	555	6	for	for	ADP
fumecheng-14015	555	7	3d	3d	NOUN
fumecheng-14015	555	8	integration	integration	NOUN
fumecheng-14015	555	9	of	of	ADP
fumecheng-14015	555	10	the	the	DET
fumecheng-14015	555	11	next	next	ADJ
fumecheng-14015	555	12	generation	generation	NOUN
fumecheng-14015	555	13	electronic	electronic	ADJ
fumecheng-14015	555	14	chips	chip	NOUN
fumecheng-14015	555	15	...	...	PUNCT
fumecheng-14015	555	16	943	943	NUM
fumecheng-14015	555	17	81	81	NUM
fumecheng-14015	555	18	.	.	PUNCT
fumecheng-14015	556	1	swinnen	swinnen	PROPN
fumecheng-14015	556	2	,	,	PUNCT
fumecheng-14015	556	3	b.	b.	PROPN
fumecheng-14015	556	4	,	,	PUNCT
fumecheng-14015	556	5	ruythooren	ruythooren	PROPN
fumecheng-14015	556	6	,	,	PUNCT
fumecheng-14015	556	7	w.	w.	PROPN
fumecheng-14015	556	8	,	,	PUNCT
fumecheng-14015	556	9	de	de	PROPN
fumecheng-14015	556	10	moor	moor	PROPN
fumecheng-14015	556	11	,	,	PUNCT
fumecheng-14015	556	12	p.	p.	PROPN
fumecheng-14015	556	13	,	,	PUNCT
fumecheng-14015	556	14	bogaerts	bogaert	NOUN
fumecheng-14015	556	15	,	,	PUNCT
fumecheng-14015	556	16	l.	l.	PROPN
fumecheng-14015	556	17	,	,	PUNCT
fumecheng-14015	556	18	carbonell	carbonell	PROPN
fumecheng-14015	556	19	,	,	PUNCT
fumecheng-14015	556	20	l.	l.	PROPN
fumecheng-14015	556	21	,	,	PUNCT
fumecheng-14015	556	22	de	de	X
fumecheng-14015	556	23	munck	munck	NOUN
fumecheng-14015	556	24	,	,	PUNCT
fumecheng-14015	556	25	k.	k.	PROPN
fumecheng-14015	556	26	,	,	PUNCT
fumecheng-14015	556	27	eyckens	eycken	NOUN
fumecheng-14015	556	28	,	,	PUNCT
fumecheng-14015	556	29	b.	b.	PROPN
fumecheng-14015	556	30	,	,	PUNCT
fumecheng-14015	556	31	stoukatch	stoukatch	PROPN
fumecheng-14015	556	32	,	,	PUNCT
fumecheng-14015	556	33	s.	s.	PROPN
fumecheng-14015	556	34	,	,	PUNCT
fumecheng-14015	556	35	tezcan	tezcan	PROPN
fumecheng-14015	556	36	,	,	PUNCT
fumecheng-14015	556	37	d.s	d.s	PROPN
fumecheng-14015	556	38	.	.	PROPN
fumecheng-14015	556	39	,	,	PUNCT
fumecheng-14015	556	40	tokei	tokei	PROPN
fumecheng-14015	556	41	,	,	PUNCT
fumecheng-14015	556	42	z.	z.	PROPN
fumecheng-14015	556	43	,	,	PUNCT
fumecheng-14015	556	44	2006	2006	NUM
fumecheng-14015	556	45	,	,	PUNCT
fumecheng-14015	556	46	3d	3d	NUM
fumecheng-14015	556	47	integration	integration	NOUN
fumecheng-14015	556	48	by	by	ADP
fumecheng-14015	556	49	cu	cu	PROPN
fumecheng-14015	556	50	-	-	PUNCT
fumecheng-14015	556	51	cu	cu	PROPN
fumecheng-14015	556	52	thermo	thermo	NOUN
fumecheng-14015	556	53	-	-	PUNCT
fumecheng-14015	556	54	compression	compression	NOUN
fumecheng-14015	556	55	bonding	bonding	NOUN
fumecheng-14015	556	56	of	of	ADP
fumecheng-14015	556	57	extremely	extremely	ADV
fumecheng-14015	556	58	thinned	thin	VERB
fumecheng-14015	556	59	bulk	bulk	ADJ
fumecheng-14015	556	60	-	-	PUNCT
fumecheng-14015	556	61	si	si	NOUN
fumecheng-14015	556	62	die	die	NOUN
fumecheng-14015	556	63	containing	contain	VERB
fumecheng-14015	556	64	10	10	NUM
fumecheng-14015	556	65	µm	µm	ADP
fumecheng-14015	556	66	pitch	pitch	NOUN
fumecheng-14015	556	67	through	through	ADP
fumecheng-14015	556	68	-	-	PUNCT
fumecheng-14015	556	69	si	si	X
fumecheng-14015	556	70	vias	via	NOUN
fumecheng-14015	556	71	,	,	PUNCT
fumecheng-14015	556	72	proc	proc	NOUN
fumecheng-14015	556	73	.	.	PUNCT
fumecheng-14015	557	1	2006	2006	NUM
fumecheng-14015	557	2	international	international	ADJ
fumecheng-14015	557	3	electron	electron	NOUN
fumecheng-14015	557	4	devices	device	NOUN
fumecheng-14015	557	5	meeting	meeting	NOUN
fumecheng-14015	557	6	,	,	PUNCT
fumecheng-14015	557	7	san	san	PROPN
fumecheng-14015	557	8	francisco	francisco	PROPN
fumecheng-14015	557	9	,	,	PUNCT
fumecheng-14015	557	10	usa	usa	PROPN
fumecheng-14015	557	11	,	,	PUNCT
fumecheng-14015	557	12	pp	pp	ADJ
fumecheng-14015	557	13	.	.	PUNCT
fumecheng-14015	558	1	71	71	NUM
fumecheng-14015	558	2	-	-	SYM
fumecheng-14015	558	3	74	74	NUM
fumecheng-14015	558	4	.	.	PUNCT
fumecheng-14015	559	1	82	82	NUM
fumecheng-14015	559	2	.	.	PUNCT
fumecheng-14015	560	1	wang	wang	PROPN
fumecheng-14015	560	2	,	,	PUNCT
fumecheng-14015	560	3	c.	c.	PROPN
fumecheng-14015	560	4	,	,	PUNCT
fumecheng-14015	560	5	suga	suga	PROPN
fumecheng-14015	560	6	,	,	PUNCT
fumecheng-14015	560	7	t.	t.	PROPN
fumecheng-14015	560	8	,	,	PUNCT
fumecheng-14015	560	9	2010	2010	NUM
fumecheng-14015	560	10	,	,	PUNCT
fumecheng-14015	560	11	a	a	DET
fumecheng-14015	560	12	novel	novel	ADJ
fumecheng-14015	560	13	room	room	NOUN
fumecheng-14015	560	14	-	-	PUNCT
fumecheng-14015	560	15	temperature	temperature	NOUN
fumecheng-14015	560	16	wafer	wafer	NOUN
fumecheng-14015	560	17	direct	direct	ADJ
fumecheng-14015	560	18	bonding	bonding	NOUN
fumecheng-14015	560	19	method	method	NOUN
fumecheng-14015	560	20	by	by	ADP
fumecheng-14015	560	21	fluorine	fluorine	NOUN
fumecheng-14015	560	22	containing	contain	VERB
fumecheng-14015	560	23	plasma	plasma	NOUN
fumecheng-14015	560	24	activation	activation	NOUN
fumecheng-14015	560	25	,	,	PUNCT
fumecheng-14015	560	26	proc	proc	NOUN
fumecheng-14015	560	27	.	.	PUNCT
fumecheng-14015	561	1	2010	2010	NUM
fumecheng-14015	561	2	60th	60th	ADJ
fumecheng-14015	561	3	electronic	electronic	ADJ
fumecheng-14015	561	4	components	component	NOUN
fumecheng-14015	561	5	and	and	CCONJ
fumecheng-14015	561	6	technology	technology	NOUN
fumecheng-14015	561	7	conference	conference	NOUN
fumecheng-14015	561	8	(	(	PUNCT
fumecheng-14015	561	9	ectc	ectc	PROPN
fumecheng-14015	561	10	)	)	PUNCT
fumecheng-14015	561	11	,	,	PUNCT
fumecheng-14015	561	12	las	las	PROPN
fumecheng-14015	561	13	vegas	vegas	PROPN
fumecheng-14015	561	14	,	,	PUNCT
fumecheng-14015	561	15	usa	usa	PROPN
fumecheng-14015	561	16	,	,	PUNCT
fumecheng-14015	561	17	pp	pp	PROPN
fumecheng-14015	561	18	.	.	PUNCT
fumecheng-14015	561	19	303	303	NUM
fumecheng-14015	561	20	-	-	SYM
fumecheng-14015	561	21	308	308	NUM
fumecheng-14015	561	22	.	.	PUNCT
fumecheng-14015	561	23	83	83	NUM
fumecheng-14015	561	24	.	.	PUNCT
fumecheng-14015	561	25	suga	suga	PROPN
fumecheng-14015	561	26	,	,	PUNCT
fumecheng-14015	561	27	t.	t.	PROPN
fumecheng-14015	561	28	,	,	PUNCT
fumecheng-14015	561	29	2006	2006	NUM
fumecheng-14015	561	30	,	,	PUNCT
fumecheng-14015	561	31	cu	cu	PROPN
fumecheng-14015	561	32	-	-	PUNCT
fumecheng-14015	561	33	cu	cu	PROPN
fumecheng-14015	561	34	room	room	NOUN
fumecheng-14015	561	35	temperature	temperature	NOUN
fumecheng-14015	561	36	bonding	bonding	NOUN
fumecheng-14015	561	37	–	–	PUNCT
fumecheng-14015	561	38	current	current	ADJ
fumecheng-14015	561	39	status	status	NOUN
fumecheng-14015	561	40	of	of	ADP
fumecheng-14015	561	41	surface	surface	NOUN
fumecheng-14015	561	42	activated	activate	VERB
fumecheng-14015	561	43	bonding	bonding	NOUN
fumecheng-14015	561	44	(	(	PUNCT
fumecheng-14015	561	45	sab	sab	INTJ
fumecheng-14015	561	46	)	)	PUNCT
fumecheng-14015	561	47	,	,	PUNCT
fumecheng-14015	561	48	ecs	ecs	PROPN
fumecheng-14015	561	49	transactions	transaction	NOUN
fumecheng-14015	561	50	,	,	PUNCT
fumecheng-14015	561	51	3(6	3(6	NUM
fumecheng-14015	561	52	)	)	PUNCT
fumecheng-14015	561	53	,	,	PUNCT
fumecheng-14015	561	54	pp	pp	ADP
fumecheng-14015	561	55	.	.	PUNCT
fumecheng-14015	562	1	155	155	NUM
fumecheng-14015	562	2	-	-	SYM
fumecheng-14015	562	3	163	163	NUM
fumecheng-14015	562	4	.	.	PUNCT
fumecheng-14015	563	1	84	84	NUM
fumecheng-14015	563	2	.	.	PUNCT
fumecheng-14015	564	1	hong	hong	PROPN
fumecheng-14015	564	2	,	,	PUNCT
fumecheng-14015	564	3	z.-j	z.-j	PROPN
fumecheng-14015	564	4	.	.	PROPN
fumecheng-14015	564	5	,	,	PUNCT
fumecheng-14015	564	6	liu	liu	PROPN
fumecheng-14015	564	7	,	,	PUNCT
fumecheng-14015	564	8	d.	d.	PROPN
fumecheng-14015	564	9	,	,	PUNCT
fumecheng-14015	564	10	hu	hu	PROPN
fumecheng-14015	564	11	,	,	PUNCT
fumecheng-14015	564	12	h.-w	h.-w	PROPN
fumecheng-14015	564	13	.	.	PUNCT
fumecheng-14015	564	14	,	,	PUNCT
fumecheng-14015	564	15	cho	cho	PROPN
fumecheng-14015	564	16	,	,	PUNCT
fumecheng-14015	564	17	c.-i	c.-i	PROPN
fumecheng-14015	564	18	.	.	PROPN
fumecheng-14015	564	19	,	,	PUNCT
fumecheng-14015	564	20	weng	weng	PROPN
fumecheng-14015	564	21	,	,	PUNCT
fumecheng-14015	564	22	m.-w	m.-w	PROPN
fumecheng-14015	564	23	.	.	PROPN
fumecheng-14015	564	24	,	,	PUNCT
fumecheng-14015	564	25	liu	liu	PROPN
fumecheng-14015	564	26	,	,	PUNCT
fumecheng-14015	564	27	j.-h	j.-h	PROPN
fumecheng-14015	564	28	.	.	PUNCT
fumecheng-14015	564	29	,	,	PUNCT
fumecheng-14015	564	30	chen	chen	PROPN
fumecheng-14015	564	31	,	,	PUNCT
fumecheng-14015	564	32	k.-n	k.-n	PROPN
fumecheng-14015	564	33	.	.	PROPN
fumecheng-14015	564	34	,	,	PUNCT
fumecheng-14015	564	35	2022	2022	NUM
fumecheng-14015	564	36	,	,	PUNCT
fumecheng-14015	564	37	investigation	investigation	NOUN
fumecheng-14015	564	38	of	of	ADP
fumecheng-14015	564	39	bonding	bonding	NOUN
fumecheng-14015	564	40	mechanism	mechanism	NOUN
fumecheng-14015	564	41	for	for	ADP
fumecheng-14015	564	42	low	low	ADJ
fumecheng-14015	564	43	-	-	PUNCT
fumecheng-14015	564	44	temperature	temperature	NOUN
fumecheng-14015	564	45	cu	cu	PROPN
fumecheng-14015	564	46	-	-	PUNCT
fumecheng-14015	564	47	cu	cu	PROPN
fumecheng-14015	564	48	bonding	bonding	NOUN
fumecheng-14015	564	49	with	with	ADP
fumecheng-14015	564	50	passivation	passivation	NOUN
fumecheng-14015	564	51	layer	layer	NOUN
fumecheng-14015	564	52	,	,	PUNCT
fumecheng-14015	564	53	applied	apply	VERB
fumecheng-14015	564	54	surface	surface	NOUN
fumecheng-14015	564	55	science	science	NOUN
fumecheng-14015	564	56	,	,	PUNCT
fumecheng-14015	564	57	592	592	NUM
fumecheng-14015	564	58	,	,	PUNCT
fumecheng-14015	564	59	153243	153243	NUM
fumecheng-14015	564	60	.	.	PUNCT
fumecheng-14015	565	1	85	85	NUM
fumecheng-14015	565	2	.	.	PUNCT
fumecheng-14015	566	1	tan	tan	PROPN
fumecheng-14015	566	2	,	,	PUNCT
fumecheng-14015	566	3	c.s	c.s	PROPN
fumecheng-14015	566	4	.	.	PROPN
fumecheng-14015	566	5	,	,	PUNCT
fumecheng-14015	566	6	lim	lim	PROPN
fumecheng-14015	566	7	,	,	PUNCT
fumecheng-14015	566	8	d.f	d.f	PROPN
fumecheng-14015	566	9	.	.	PROPN
fumecheng-14015	566	10	,	,	PUNCT
fumecheng-14015	566	11	singh	singh	PROPN
fumecheng-14015	566	12	,	,	PUNCT
fumecheng-14015	566	13	s.g	s.g	PROPN
fumecheng-14015	566	14	.	.	PROPN
fumecheng-14015	566	15	,	,	PUNCT
fumecheng-14015	566	16	goulet	goulet	PROPN
fumecheng-14015	566	17	,	,	PUNCT
fumecheng-14015	566	18	s.	s.	PROPN
fumecheng-14015	566	19	,	,	PUNCT
fumecheng-14015	566	20	bergkvist	bergkvist	NOUN
fumecheng-14015	566	21	,	,	PUNCT
fumecheng-14015	566	22	m.	m.	NOUN
fumecheng-14015	566	23	,	,	PUNCT
fumecheng-14015	566	24	2009	2009	NUM
fumecheng-14015	566	25	,	,	PUNCT
fumecheng-14015	566	26	cu	cu	PROPN
fumecheng-14015	566	27	-	-	PUNCT
fumecheng-14015	566	28	cu	cu	PROPN
fumecheng-14015	566	29	diffusion	diffusion	NOUN
fumecheng-14015	566	30	bonding	bonding	NOUN
fumecheng-14015	566	31	enhancement	enhancement	NOUN
fumecheng-14015	566	32	at	at	ADP
fumecheng-14015	566	33	low	low	ADJ
fumecheng-14015	566	34	temperature	temperature	NOUN
fumecheng-14015	566	35	by	by	ADP
fumecheng-14015	566	36	surface	surface	NOUN
fumecheng-14015	566	37	passivation	passivation	NOUN
fumecheng-14015	566	38	using	use	VERB
fumecheng-14015	566	39	self	self	NOUN
fumecheng-14015	566	40	-	-	PUNCT
fumecheng-14015	566	41	assembled	assemble	VERB
fumecheng-14015	566	42	monolayer	monolayer	NOUN
fumecheng-14015	566	43	of	of	ADP
fumecheng-14015	566	44	alkane	alkane	NOUN
fumecheng-14015	566	45	-	-	PUNCT
fumecheng-14015	566	46	thiol	thiol	NOUN
fumecheng-14015	566	47	,	,	PUNCT
fumecheng-14015	566	48	applied	apply	VERB
fumecheng-14015	566	49	physics	physics	NOUN
fumecheng-14015	566	50	letters	letter	NOUN
fumecheng-14015	566	51	,	,	PUNCT
fumecheng-14015	566	52	95(19	95(19	NUM
fumecheng-14015	566	53	)	)	PUNCT
fumecheng-14015	566	54	,	,	PUNCT
fumecheng-14015	566	55	192108	192108	NUM
fumecheng-14015	566	56	.	.	PUNCT
fumecheng-14015	567	1	86	86	NUM
fumecheng-14015	567	2	.	.	PUNCT
fumecheng-14015	568	1	chou	chou	NOUN
fumecheng-14015	568	2	,	,	PUNCT
fumecheng-14015	568	3	t.-c	t.-c	PROPN
fumecheng-14015	568	4	.	.	PROPN
fumecheng-14015	568	5	,	,	PUNCT
fumecheng-14015	568	6	huang	huang	PROPN
fumecheng-14015	568	7	,	,	PUNCT
fumecheng-14015	568	8	s.-y	s.-y	NOUN
fumecheng-14015	568	9	.	.	PUNCT
fumecheng-14015	568	10	,	,	PUNCT
fumecheng-14015	568	11	chen	chen	PROPN
fumecheng-14015	568	12	,	,	PUNCT
fumecheng-14015	568	13	p.-j	p.-j	PROPN
fumecheng-14015	568	14	.	.	PUNCT
fumecheng-14015	568	15	,	,	PUNCT
fumecheng-14015	568	16	hu	hu	PROPN
fumecheng-14015	568	17	,	,	PUNCT
fumecheng-14015	568	18	h.-w	h.-w	PROPN
fumecheng-14015	568	19	.	.	PROPN
fumecheng-14015	568	20	,	,	PUNCT
fumecheng-14015	568	21	liu	liu	PROPN
fumecheng-14015	568	22	,	,	PUNCT
fumecheng-14015	568	23	d.	d.	PROPN
fumecheng-14015	568	24	,	,	PUNCT
fumecheng-14015	568	25	chang	chang	PROPN
fumecheng-14015	568	26	,	,	PUNCT
fumecheng-14015	568	27	c.-w	c.-w	PROPN
fumecheng-14015	568	28	.	.	PROPN
fumecheng-14015	568	29	,	,	PUNCT
fumecheng-14015	568	30	ni	ni	PROPN
fumecheng-14015	568	31	,	,	PUNCT
fumecheng-14015	568	32	t.-h	t.-h	PROPN
fumecheng-14015	568	33	.	.	PUNCT
fumecheng-14015	568	34	,	,	PUNCT
fumecheng-14015	569	1	chen	chen	PROPN
fumecheng-14015	569	2	,	,	PUNCT
fumecheng-14015	569	3	c.-j	c.-j	PROPN
fumecheng-14015	569	4	.	.	PROPN
fumecheng-14015	569	5	,	,	PUNCT
fumecheng-14015	569	6	lin	lin	PROPN
fumecheng-14015	569	7	,	,	PUNCT
fumecheng-14015	569	8	y.-m	y.-m	PROPN
fumecheng-14015	569	9	.	.	PROPN
fumecheng-14015	569	10	,	,	PUNCT
fumecheng-14015	569	11	chang	chang	PROPN
fumecheng-14015	569	12	,	,	PUNCT
fumecheng-14015	569	13	t.-c	t.-c	PROPN
fumecheng-14015	569	14	.	.	PROPN
fumecheng-14015	569	15	,	,	PUNCT
fumecheng-14015	569	16	2020	2020	NUM
fumecheng-14015	569	17	,	,	PUNCT
fumecheng-14015	569	18	electrical	electrical	ADJ
fumecheng-14015	569	19	and	and	CCONJ
fumecheng-14015	569	20	reliability	reliability	NOUN
fumecheng-14015	569	21	investigation	investigation	NOUN
fumecheng-14015	569	22	of	of	ADP
fumecheng-14015	569	23	cu	cu	PROPN
fumecheng-14015	569	24	-	-	PUNCT
fumecheng-14015	569	25	to	to	ADP
fumecheng-14015	569	26	-	-	PUNCT
fumecheng-14015	569	27	cu	cu	NOUN
fumecheng-14015	569	28	bonding	bonding	NOUN
fumecheng-14015	569	29	with	with	ADP
fumecheng-14015	569	30	silver	silver	ADJ
fumecheng-14015	569	31	passivation	passivation	NOUN
fumecheng-14015	569	32	layer	layer	NOUN
fumecheng-14015	569	33	in	in	ADP
fumecheng-14015	569	34	3	3	NUM
fumecheng-14015	569	35	-	-	PUNCT
fumecheng-14015	569	36	d	d	NOUN
fumecheng-14015	569	37	integration	integration	NOUN
fumecheng-14015	569	38	,	,	PUNCT
fumecheng-14015	569	39	ieee	ieee	NOUN
fumecheng-14015	569	40	transactions	transaction	NOUN
fumecheng-14015	569	41	on	on	ADP
fumecheng-14015	569	42	components	component	NOUN
fumecheng-14015	569	43	,	,	PUNCT
fumecheng-14015	569	44	packaging	packaging	NOUN
fumecheng-14015	569	45	and	and	CCONJ
fumecheng-14015	569	46	manufacturing	manufacturing	NOUN
fumecheng-14015	569	47	technology	technology	NOUN
fumecheng-14015	569	48	,	,	PUNCT
fumecheng-14015	569	49	11(1	11(1	NUM
fumecheng-14015	569	50	)	)	PUNCT
fumecheng-14015	569	51	,	,	PUNCT
fumecheng-14015	569	52	pp	pp	ADJ
fumecheng-14015	569	53	.	.	PUNCT
fumecheng-14015	570	1	36	36	NUM
fumecheng-14015	570	2	-	-	SYM
fumecheng-14015	570	3	42	42	NUM
fumecheng-14015	570	4	.	.	PUNCT
fumecheng-14015	571	1	87	87	NUM
fumecheng-14015	571	2	.	.	PUNCT
fumecheng-14015	572	1	panigrahi	panigrahi	NOUN
fumecheng-14015	572	2	,	,	PUNCT
fumecheng-14015	572	3	a.k	a.k	PROPN
fumecheng-14015	572	4	.	.	PROPN
fumecheng-14015	572	5	,	,	PUNCT
fumecheng-14015	572	6	bonam	bonam	NOUN
fumecheng-14015	572	7	,	,	PUNCT
fumecheng-14015	572	8	s.	s.	PROPN
fumecheng-14015	572	9	,	,	PUNCT
fumecheng-14015	572	10	ghosh	ghosh	PROPN
fumecheng-14015	572	11	,	,	PUNCT
fumecheng-14015	572	12	t.	t.	PROPN
fumecheng-14015	572	13	,	,	PUNCT
fumecheng-14015	572	14	singh	singh	PROPN
fumecheng-14015	572	15	,	,	PUNCT
fumecheng-14015	572	16	s.g	s.g	PROPN
fumecheng-14015	572	17	.	.	PROPN
fumecheng-14015	572	18	,	,	PUNCT
fumecheng-14015	572	19	vanjari	vanjari	PROPN
fumecheng-14015	572	20	,	,	PUNCT
fumecheng-14015	572	21	s.r.k	s.r.k	ADV
fumecheng-14015	572	22	.	.	PUNCT
fumecheng-14015	572	23	,	,	PUNCT
fumecheng-14015	572	24	2016	2016	NUM
fumecheng-14015	572	25	,	,	PUNCT
fumecheng-14015	572	26	ultra	ultra	ADJ
fumecheng-14015	572	27	-	-	ADJ
fumecheng-14015	572	28	thin	thin	ADJ
fumecheng-14015	572	29	ti	ti	NOUN
fumecheng-14015	572	30	passivation	passivation	NOUN
fumecheng-14015	572	31	mediated	mediate	VERB
fumecheng-14015	572	32	breakthrough	breakthrough	NOUN
fumecheng-14015	572	33	in	in	ADP
fumecheng-14015	572	34	high	high	ADJ
fumecheng-14015	572	35	quality	quality	NOUN
fumecheng-14015	572	36	cu	cu	PROPN
fumecheng-14015	572	37	-	-	PROPN
fumecheng-14015	572	38	cu	cu	PROPN
fumecheng-14015	572	39	bonding	bonding	NOUN
fumecheng-14015	572	40	at	at	ADP
fumecheng-14015	572	41	low	low	ADJ
fumecheng-14015	572	42	temperature	temperature	NOUN
fumecheng-14015	572	43	and	and	CCONJ
fumecheng-14015	572	44	pressure	pressure	NOUN
fumecheng-14015	572	45	,	,	PUNCT
fumecheng-14015	572	46	materials	material	NOUN
fumecheng-14015	572	47	letters	letter	NOUN
fumecheng-14015	572	48	,	,	PUNCT
fumecheng-14015	572	49	169(1	169(1	NUM
fumecheng-14015	572	50	)	)	PUNCT
fumecheng-14015	572	51	,	,	PUNCT
fumecheng-14015	572	52	pp	pp	PROPN
fumecheng-14015	572	53	.	.	PUNCT
fumecheng-14015	573	1	269	269	NUM
fumecheng-14015	573	2	-	-	SYM
fumecheng-14015	573	3	272	272	NUM
fumecheng-14015	573	4	.	.	PUNCT
fumecheng-14015	574	1	88	88	NUM
fumecheng-14015	574	2	.	.	PUNCT
fumecheng-14015	575	1	lykova	lykova	PROPN
fumecheng-14015	575	2	,	,	PUNCT
fumecheng-14015	575	3	m.	m.	NOUN
fumecheng-14015	575	4	,	,	PUNCT
fumecheng-14015	575	5	panchenko	panchenko	ADJ
fumecheng-14015	575	6	,	,	PUNCT
fumecheng-14015	575	7	i.	i.	NOUN
fumecheng-14015	575	8	,	,	PUNCT
fumecheng-14015	575	9	künzelmann	künzelmann	PROPN
fumecheng-14015	575	10	,	,	PUNCT
fumecheng-14015	575	11	u.	u.	PROPN
fumecheng-14015	575	12	,	,	PUNCT
fumecheng-14015	575	13	reif	reif	PROPN
fumecheng-14015	575	14	,	,	PUNCT
fumecheng-14015	575	15	j.	j.	PROPN
fumecheng-14015	575	16	,	,	PUNCT
fumecheng-14015	575	17	geidel	geidel	NOUN
fumecheng-14015	575	18	,	,	PUNCT
fumecheng-14015	575	19	m.	m.	NOUN
fumecheng-14015	575	20	,	,	PUNCT
fumecheng-14015	575	21	wolf	wolf	PROPN
fumecheng-14015	575	22	,	,	PUNCT
fumecheng-14015	575	23	m.j	m.j	PROPN
fumecheng-14015	575	24	.	.	PROPN
fumecheng-14015	575	25	,	,	PUNCT
fumecheng-14015	575	26	lang	lang	PROPN
fumecheng-14015	575	27	,	,	PUNCT
fumecheng-14015	575	28	k.-d	k.-d	PROPN
fumecheng-14015	575	29	.	.	PROPN
fumecheng-14015	575	30	,	,	PUNCT
fumecheng-14015	575	31	2018	2018	NUM
fumecheng-14015	575	32	,	,	PUNCT
fumecheng-14015	575	33	characterisation	characterisation	NOUN
fumecheng-14015	575	34	of	of	ADP
fumecheng-14015	575	35	cu	cu	PROPN
fumecheng-14015	575	36	/	/	SYM
fumecheng-14015	575	37	cu	cu	PROPN
fumecheng-14015	575	38	bonding	bonding	NOUN
fumecheng-14015	575	39	using	use	VERB
fumecheng-14015	575	40	self	self	NOUN
fumecheng-14015	575	41	-	-	PUNCT
fumecheng-14015	575	42	assembled	assemble	VERB
fumecheng-14015	575	43	monolayer	monolayer	NOUN
fumecheng-14015	575	44	,	,	PUNCT
fumecheng-14015	575	45	soldering	soldering	NOUN
fumecheng-14015	575	46	and	and	CCONJ
fumecheng-14015	575	47	surface	surface	NOUN
fumecheng-14015	575	48	mount	mount	PROPN
fumecheng-14015	575	49	technology	technology	NOUN
fumecheng-14015	575	50	,	,	PUNCT
fumecheng-14015	575	51	30(2	30(2	NUM
fumecheng-14015	575	52	)	)	PUNCT
fumecheng-14015	575	53	,	,	PUNCT
fumecheng-14015	576	1	pp	pp	PROPN
fumecheng-14015	576	2	.	.	PUNCT
fumecheng-14015	577	1	106	106	NUM
fumecheng-14015	577	2	-	-	SYM
fumecheng-14015	577	3	111	111	NUM
fumecheng-14015	577	4	.	.	PUNCT
fumecheng-14015	577	5	89	89	NUM
fumecheng-14015	577	6	.	.	PUNCT
fumecheng-14015	578	1	tsai	tsai	PROPN
fumecheng-14015	578	2	,	,	PUNCT
fumecheng-14015	578	3	y.-c	y.-c	PROPN
fumecheng-14015	578	4	.	.	PROPN
fumecheng-14015	578	5	,	,	PUNCT
fumecheng-14015	578	6	hu	hu	PROPN
fumecheng-14015	578	7	,	,	PUNCT
fumecheng-14015	578	8	h.-w	h.-w	PROPN
fumecheng-14015	578	9	.	.	PROPN
fumecheng-14015	578	10	,	,	PUNCT
fumecheng-14015	578	11	chen	chen	PROPN
fumecheng-14015	578	12	,	,	PUNCT
fumecheng-14015	578	13	k.-n	k.-n	PROPN
fumecheng-14015	578	14	.	.	PROPN
fumecheng-14015	578	15	,	,	PUNCT
fumecheng-14015	578	16	2020	2020	NUM
fumecheng-14015	578	17	,	,	PUNCT
fumecheng-14015	578	18	low	low	ADJ
fumecheng-14015	578	19	temperature	temperature	NOUN
fumecheng-14015	578	20	copper	copper	NOUN
fumecheng-14015	578	21	-	-	PUNCT
fumecheng-14015	578	22	copper	copper	NOUN
fumecheng-14015	578	23	bonding	bonding	NOUN
fumecheng-14015	578	24	of	of	ADP
fumecheng-14015	578	25	non	non	ADJ
fumecheng-14015	578	26	-	-	ADJ
fumecheng-14015	578	27	planarized	planarize	VERB
fumecheng-14015	578	28	copper	copper	NOUN
fumecheng-14015	578	29	pillar	pillar	NOUN
fumecheng-14015	578	30	with	with	ADP
fumecheng-14015	578	31	passivation	passivation	NOUN
fumecheng-14015	578	32	,	,	PUNCT
fumecheng-14015	578	33	ieee	ieee	NOUN
fumecheng-14015	578	34	electron	electron	NOUN
fumecheng-14015	578	35	device	device	NOUN
fumecheng-14015	578	36	letters	letter	NOUN
fumecheng-14015	578	37	,	,	PUNCT
fumecheng-14015	578	38	41(8	41(8	PROPN
fumecheng-14015	578	39	)	)	PUNCT
fumecheng-14015	578	40	,	,	PUNCT
fumecheng-14015	578	41	pp	pp	ADP
fumecheng-14015	578	42	.	.	PUNCT
fumecheng-14015	578	43	1229	1229	NUM
fumecheng-14015	578	44	-	-	SYM
fumecheng-14015	578	45	1232	1232	NUM
fumecheng-14015	578	46	.	.	PUNCT
fumecheng-14015	579	1	90	90	NUM
fumecheng-14015	579	2	.	.	PUNCT
fumecheng-14015	579	3	kung	kung	PROPN
fumecheng-14015	579	4	,	,	PUNCT
fumecheng-14015	579	5	p.-y	p.-y	PROPN
fumecheng-14015	579	6	.	.	PUNCT
fumecheng-14015	579	7	,	,	PUNCT
fumecheng-14015	579	8	huang	huang	PROPN
fumecheng-14015	579	9	,	,	PUNCT
fumecheng-14015	579	10	w.-l	w.-l	PROPN
fumecheng-14015	579	11	.	.	PUNCT
fumecheng-14015	579	12	,	,	PUNCT
fumecheng-14015	579	13	kao	kao	PROPN
fumecheng-14015	579	14	,	,	PUNCT
fumecheng-14015	579	15	c.-l	c.-l	PROPN
fumecheng-14015	579	16	.	.	PUNCT
fumecheng-14015	579	17	,	,	PUNCT
fumecheng-14015	579	18	lin	lin	PROPN
fumecheng-14015	579	19	,	,	PUNCT
fumecheng-14015	579	20	y.-s	y.-s	PROPN
fumecheng-14015	579	21	.	.	PUNCT
fumecheng-14015	579	22	,	,	PUNCT
fumecheng-14015	579	23	hung	hung	PROPN
fumecheng-14015	579	24	,	,	PUNCT
fumecheng-14015	579	25	y.-c	y.-c	PROPN
fumecheng-14015	579	26	.	.	PROPN
fumecheng-14015	579	27	,	,	PUNCT
fumecheng-14015	579	28	kao	kao	PROPN
fumecheng-14015	579	29	,	,	PUNCT
fumecheng-14015	579	30	c.r	c.r	PROPN
fumecheng-14015	579	31	.	.	PROPN
fumecheng-14015	579	32	,	,	PUNCT
fumecheng-14015	579	33	2022	2022	NUM
fumecheng-14015	579	34	,	,	PUNCT
fumecheng-14015	579	35	investigation	investigation	NOUN
fumecheng-14015	579	36	of	of	ADP
fumecheng-14015	579	37	low	low	ADJ
fumecheng-14015	579	38	-	-	PUNCT
fumecheng-14015	579	39	pressure	pressure	NOUN
fumecheng-14015	579	40	sn	sn	NOUN
fumecheng-14015	579	41	-	-	PUNCT
fumecheng-14015	579	42	passivated	passivate	VERB
fumecheng-14015	579	43	cu	cu	PROPN
fumecheng-14015	579	44	-	-	PUNCT
fumecheng-14015	579	45	to	to	ADP
fumecheng-14015	579	46	-	-	PUNCT
fumecheng-14015	579	47	cu	cu	NOUN
fumecheng-14015	579	48	direct	direct	ADJ
fumecheng-14015	579	49	bonding	bonding	NOUN
fumecheng-14015	579	50	in	in	ADP
fumecheng-14015	579	51	3d	3d	PROPN
fumecheng-14015	579	52	integration	integration	NOUN
fumecheng-14015	579	53	,	,	PUNCT
fumecheng-14015	579	54	materials	material	NOUN
fumecheng-14015	579	55	,	,	PUNCT
fumecheng-14015	579	56	15(21	15(21	NUM
fumecheng-14015	579	57	)	)	PUNCT
fumecheng-14015	579	58	,	,	PUNCT
fumecheng-14015	579	59	7783	7783	NUM
fumecheng-14015	579	60	.	.	PUNCT
fumecheng-14015	580	1	91	91	NUM
fumecheng-14015	580	2	.	.	PUNCT
fumecheng-14015	581	1	lee	lee	PROPN
fumecheng-14015	581	2	,	,	PUNCT
fumecheng-14015	581	3	s.	s.	PROPN
fumecheng-14015	581	4	,	,	PUNCT
fumecheng-14015	581	5	park	park	PROPN
fumecheng-14015	581	6	,	,	PUNCT
fumecheng-14015	581	7	s.	s.	PROPN
fumecheng-14015	581	8	,	,	PUNCT
fumecheng-14015	581	9	kim	kim	PROPN
fumecheng-14015	581	10	,	,	PUNCT
fumecheng-14015	581	11	s.e	s.e	PROPN
fumecheng-14015	581	12	.	.	PROPN
fumecheng-14015	581	13	,	,	PUNCT
fumecheng-14015	581	14	2023	2023	NUM
fumecheng-14015	581	15	,	,	PUNCT
fumecheng-14015	581	16	low	low	ADJ
fumecheng-14015	581	17	-	-	PUNCT
fumecheng-14015	581	18	temperature	temperature	NOUN
fumecheng-14015	581	19	diffusion	diffusion	NOUN
fumecheng-14015	581	20	of	of	ADP
fumecheng-14015	581	21	au	au	X
fumecheng-14015	581	22	and	and	CCONJ
fumecheng-14015	581	23	ag	ag	PROPN
fumecheng-14015	581	24	nanolayers	nanolayer	NOUN
fumecheng-14015	581	25	for	for	ADP
fumecheng-14015	581	26	cu	cu	NOUN
fumecheng-14015	581	27	bonding	bonding	NOUN
fumecheng-14015	581	28	,	,	PUNCT
fumecheng-14015	581	29	applied	apply	VERB
fumecheng-14015	581	30	sciences	science	NOUN
fumecheng-14015	581	31	,	,	PUNCT
fumecheng-14015	581	32	14(1	14(1	NUM
fumecheng-14015	581	33	)	)	PUNCT
fumecheng-14015	581	34	,	,	PUNCT
fumecheng-14015	581	35	147	147	NUM
fumecheng-14015	581	36	.	.	PUNCT
fumecheng-14015	581	37	92	92	NUM
fumecheng-14015	581	38	.	.	PUNCT
fumecheng-14015	582	1	liu	liu	PROPN
fumecheng-14015	582	2	,	,	PUNCT
fumecheng-14015	582	3	d.	d.	PROPN
fumecheng-14015	582	4	,	,	PUNCT
fumecheng-14015	582	5	chen	chen	PROPN
fumecheng-14015	582	6	,	,	PUNCT
fumecheng-14015	582	7	p.-c	p.-c	PROPN
fumecheng-14015	582	8	.	.	PUNCT
fumecheng-14015	582	9	,	,	PUNCT
fumecheng-14015	582	10	tsai	tsai	PROPN
fumecheng-14015	582	11	,	,	PUNCT
fumecheng-14015	582	12	y.-c	y.-c	PROPN
fumecheng-14015	582	13	.	.	PROPN
fumecheng-14015	582	14	,	,	PUNCT
fumecheng-14015	582	15	chen	chen	PROPN
fumecheng-14015	582	16	,	,	PUNCT
fumecheng-14015	582	17	k.-n	k.-n	PROPN
fumecheng-14015	582	18	.	.	PROPN
fumecheng-14015	582	19	,	,	PUNCT
fumecheng-14015	582	20	2019	2019	NUM
fumecheng-14015	582	21	,	,	PUNCT
fumecheng-14015	582	22	low	low	ADJ
fumecheng-14015	582	23	temperature	temperature	NOUN
fumecheng-14015	582	24	cu	cu	PROPN
fumecheng-14015	582	25	-	-	PUNCT
fumecheng-14015	582	26	to	to	ADP
fumecheng-14015	582	27	-	-	PUNCT
fumecheng-14015	582	28	cu	cu	NOUN
fumecheng-14015	582	29	direct	direct	ADJ
fumecheng-14015	582	30	bonding	bonding	NOUN
fumecheng-14015	582	31	below	below	ADP
fumecheng-14015	582	32	150	150	NUM
fumecheng-14015	582	33	°	°	NOUN
fumecheng-14015	582	34	c	c	NOUN
fumecheng-14015	582	35	with	with	ADP
fumecheng-14015	582	36	au	au	ADJ
fumecheng-14015	582	37	passivation	passivation	NOUN
fumecheng-14015	582	38	layer	layer	NOUN
fumecheng-14015	582	39	,	,	PUNCT
fumecheng-14015	582	40	proc	proc	NOUN
fumecheng-14015	582	41	.	.	PUNCT
fumecheng-14015	583	1	2019	2019	NUM
fumecheng-14015	583	2	international	international	ADJ
fumecheng-14015	583	3	3d	3d	PROPN
fumecheng-14015	583	4	systems	system	NOUN
fumecheng-14015	583	5	integration	integration	NOUN
fumecheng-14015	583	6	conference	conference	NOUN
fumecheng-14015	583	7	(	(	PUNCT
fumecheng-14015	583	8	3dic	3dic	NOUN
fumecheng-14015	583	9	)	)	PUNCT
fumecheng-14015	583	10	,	,	PUNCT
fumecheng-14015	583	11	sendai	sendai	PROPN
fumecheng-14015	583	12	,	,	PUNCT
fumecheng-14015	583	13	japan	japan	PROPN
fumecheng-14015	583	14	,	,	PUNCT
fumecheng-14015	583	15	9058873	9058873	NUM
fumecheng-14015	583	16	.	.	PUNCT
fumecheng-14015	584	1	93	93	NUM
fumecheng-14015	584	2	.	.	PUNCT
fumecheng-14015	585	1	liu	liu	PROPN
fumecheng-14015	585	2	,	,	PUNCT
fumecheng-14015	585	3	d.	d.	PROPN
fumecheng-14015	585	4	,	,	PUNCT
fumecheng-14015	585	5	chen	chen	PROPN
fumecheng-14015	585	6	,	,	PUNCT
fumecheng-14015	585	7	p.-c	p.-c	PROPN
fumecheng-14015	585	8	.	.	PUNCT
fumecheng-14015	585	9	,	,	PUNCT
fumecheng-14015	585	10	chen	chen	PROPN
fumecheng-14015	585	11	,	,	PUNCT
fumecheng-14015	585	12	k.-n	k.-n	PROPN
fumecheng-14015	585	13	.	.	PROPN
fumecheng-14015	585	14	,	,	PUNCT
fumecheng-14015	585	15	2020	2020	NUM
fumecheng-14015	585	16	,	,	PUNCT
fumecheng-14015	585	17	a	a	DET
fumecheng-14015	585	18	novel	novel	ADJ
fumecheng-14015	585	19	low	low	ADJ
fumecheng-14015	585	20	-	-	PUNCT
fumecheng-14015	585	21	temperature	temperature	NOUN
fumecheng-14015	585	22	cu	cu	PROPN
fumecheng-14015	585	23	-	-	PUNCT
fumecheng-14015	585	24	cu	cu	PROPN
fumecheng-14015	585	25	direct	direct	ADJ
fumecheng-14015	585	26	bonding	bonding	NOUN
fumecheng-14015	585	27	with	with	ADP
fumecheng-14015	585	28	cr	cr	NOUN
fumecheng-14015	585	29	wetting	wet	VERB
fumecheng-14015	585	30	layer	layer	NOUN
fumecheng-14015	585	31	and	and	CCONJ
fumecheng-14015	585	32	au	au	VERB
fumecheng-14015	585	33	passivation	passivation	NOUN
fumecheng-14015	585	34	layer	layer	NOUN
fumecheng-14015	585	35	,	,	PUNCT
fumecheng-14015	585	36	proc	proc	NOUN
fumecheng-14015	585	37	.	.	PROPN
fumecheng-14015	585	38	2020	2020	NUM
fumecheng-14015	585	39	ieee	ieee	PROPN
fumecheng-14015	585	40	70th	70th	ADJ
fumecheng-14015	585	41	electronic	electronic	ADJ
fumecheng-14015	585	42	components	component	NOUN
fumecheng-14015	585	43	and	and	CCONJ
fumecheng-14015	585	44	technology	technology	NOUN
fumecheng-14015	585	45	conference	conference	NOUN
fumecheng-14015	585	46	(	(	PUNCT
fumecheng-14015	585	47	ectc	ectc	PROPN
fumecheng-14015	585	48	)	)	PUNCT
fumecheng-14015	585	49	,	,	PUNCT
fumecheng-14015	585	50	orlando	orlando	PROPN
fumecheng-14015	585	51	,	,	PUNCT
fumecheng-14015	585	52	usa	usa	PROPN
fumecheng-14015	585	53	,	,	PUNCT
fumecheng-14015	585	54	pp	pp	X
fumecheng-14015	585	55	.	.	PUNCT
fumecheng-14015	585	56	1322	1322	NUM
fumecheng-14015	585	57	-	-	SYM
fumecheng-14015	585	58	1327	1327	NUM
fumecheng-14015	585	59	.	.	PUNCT
fumecheng-14015	586	1	94	94	NUM
fumecheng-14015	586	2	.	.	X
fumecheng-14015	587	1	lu	lu	PROPN
fumecheng-14015	587	2	,	,	PUNCT
fumecheng-14015	587	3	l.	l.	PROPN
fumecheng-14015	587	4	,	,	PUNCT
fumecheng-14015	587	5	shen	shen	PROPN
fumecheng-14015	587	6	,	,	PUNCT
fumecheng-14015	587	7	y.	y.	PROPN
fumecheng-14015	587	8	,	,	PUNCT
fumecheng-14015	587	9	chen	chen	PROPN
fumecheng-14015	587	10	,	,	PUNCT
fumecheng-14015	587	11	x.	x.	PROPN
fumecheng-14015	587	12	,	,	PUNCT
fumecheng-14015	587	13	qian	qian	PROPN
fumecheng-14015	587	14	,	,	PUNCT
fumecheng-14015	587	15	l.	l.	PROPN
fumecheng-14015	587	16	,	,	PUNCT
fumecheng-14015	587	17	lu	lu	PROPN
fumecheng-14015	587	18	,	,	PUNCT
fumecheng-14015	587	19	k.	k.	PROPN
fumecheng-14015	587	20	,	,	PUNCT
fumecheng-14015	587	21	2004	2004	NUM
fumecheng-14015	587	22	,	,	PUNCT
fumecheng-14015	587	23	ultrahigh	ultrahigh	NOUN
fumecheng-14015	587	24	strength	strength	NOUN
fumecheng-14015	587	25	and	and	CCONJ
fumecheng-14015	587	26	high	high	ADJ
fumecheng-14015	587	27	electrical	electrical	ADJ
fumecheng-14015	587	28	conductivity	conductivity	NOUN
fumecheng-14015	587	29	in	in	ADP
fumecheng-14015	587	30	copper	copper	NOUN
fumecheng-14015	587	31	,	,	PUNCT
fumecheng-14015	587	32	science	science	NOUN
fumecheng-14015	587	33	,	,	PUNCT
fumecheng-14015	587	34	304(5669	304(5669	NUM
fumecheng-14015	587	35	)	)	PUNCT
fumecheng-14015	587	36	,	,	PUNCT
fumecheng-14015	587	37	pp	pp	ADP
fumecheng-14015	587	38	.	.	PUNCT
fumecheng-14015	588	1	422	422	NUM
fumecheng-14015	588	2	-	-	SYM
fumecheng-14015	588	3	426	426	NUM
fumecheng-14015	588	4	.	.	NOUN
fumecheng-14015	589	1	95	95	NUM
fumecheng-14015	589	2	.	.	PUNCT
fumecheng-14015	590	1	juang	juang	PROPN
fumecheng-14015	590	2	,	,	PUNCT
fumecheng-14015	590	3	j.-y	j.-y	PROPN
fumecheng-14015	590	4	.	.	PUNCT
fumecheng-14015	590	5	,	,	PUNCT
fumecheng-14015	590	6	lu	lu	PROPN
fumecheng-14015	590	7	,	,	PUNCT
fumecheng-14015	590	8	c.-l	c.-l	PROPN
fumecheng-14015	590	9	.	.	PUNCT
fumecheng-14015	590	10	,	,	PUNCT
fumecheng-14015	590	11	chen	chen	PROPN
fumecheng-14015	590	12	,	,	PUNCT
fumecheng-14015	590	13	k.-j	k.-j	PROPN
fumecheng-14015	590	14	.	.	PROPN
fumecheng-14015	590	15	,	,	PUNCT
fumecheng-14015	590	16	chen	chen	PROPN
fumecheng-14015	590	17	,	,	PUNCT
fumecheng-14015	590	18	c.-c.a	c.-c.a	PROPN
fumecheng-14015	590	19	.	.	PROPN
fumecheng-14015	590	20	,	,	PUNCT
fumecheng-14015	590	21	hsu	hsu	PROPN
fumecheng-14015	590	22	,	,	PUNCT
fumecheng-14015	590	23	p.-n	p.-n	PROPN
fumecheng-14015	590	24	.	.	PROPN
fumecheng-14015	590	25	,	,	PUNCT
fumecheng-14015	590	26	chen	chen	PROPN
fumecheng-14015	590	27	,	,	PUNCT
fumecheng-14015	590	28	c.	c.	PROPN
fumecheng-14015	590	29	,	,	PUNCT
fumecheng-14015	590	30	tu	tu	PROPN
fumecheng-14015	590	31	,	,	PUNCT
fumecheng-14015	590	32	k.-n	k.-n	PROPN
fumecheng-14015	590	33	.	.	PROPN
fumecheng-14015	590	34	,	,	PUNCT
fumecheng-14015	590	35	2018	2018	NUM
fumecheng-14015	590	36	,	,	PUNCT
fumecheng-14015	590	37	copper	copper	NOUN
fumecheng-14015	590	38	-	-	PUNCT
fumecheng-14015	590	39	to	to	ADP
fumecheng-14015	590	40	-	-	PUNCT
fumecheng-14015	590	41	copper	copper	NOUN
fumecheng-14015	590	42	direct	direct	ADJ
fumecheng-14015	590	43	bonding	bonding	NOUN
fumecheng-14015	590	44	on	on	ADP
fumecheng-14015	590	45	highly	highly	ADV
fumecheng-14015	590	46	(	(	PUNCT
fumecheng-14015	590	47	111)-oriented	111)-oriente	VERB
fumecheng-14015	590	48	nanotwinned	nanotwinned	ADJ
fumecheng-14015	590	49	copper	copper	NOUN
fumecheng-14015	590	50	in	in	ADP
fumecheng-14015	590	51	no	no	DET
fumecheng-14015	590	52	-	-	PUNCT
fumecheng-14015	590	53	vacuum	vacuum	NOUN
fumecheng-14015	590	54	ambient	ambient	NOUN
fumecheng-14015	590	55	,	,	PUNCT
fumecheng-14015	590	56	scientific	scientific	ADJ
fumecheng-14015	590	57	reports	report	NOUN
fumecheng-14015	590	58	,	,	PUNCT
fumecheng-14015	590	59	8	8	NUM
fumecheng-14015	590	60	,	,	PUNCT
fumecheng-14015	590	61	13910	13910	NUM
fumecheng-14015	590	62	.	.	PUNCT
fumecheng-14015	591	1	96	96	NUM
fumecheng-14015	591	2	.	.	PUNCT
fumecheng-14015	592	1	liu	liu	PROPN
fumecheng-14015	592	2	,	,	PUNCT
fumecheng-14015	592	3	c.-m	c.-m	PROPN
fumecheng-14015	592	4	.	.	PUNCT
fumecheng-14015	592	5	,	,	PUNCT
fumecheng-14015	592	6	lin	lin	PROPN
fumecheng-14015	592	7	,	,	PUNCT
fumecheng-14015	592	8	h.-w	h.-w	PROPN
fumecheng-14015	592	9	.	.	PUNCT
fumecheng-14015	592	10	,	,	PUNCT
fumecheng-14015	592	11	lu	lu	PROPN
fumecheng-14015	592	12	,	,	PUNCT
fumecheng-14015	592	13	c.-l	c.-l	PROPN
fumecheng-14015	592	14	.	.	PUNCT
fumecheng-14015	593	1	,	,	PUNCT
fumecheng-14015	593	2	chen	chen	PROPN
fumecheng-14015	593	3	,	,	PUNCT
fumecheng-14015	593	4	c.	c.	PROPN
fumecheng-14015	593	5	,	,	PUNCT
fumecheng-14015	593	6	2014	2014	NUM
fumecheng-14015	593	7	,	,	PUNCT
fumecheng-14015	593	8	effect	effect	NOUN
fumecheng-14015	593	9	of	of	ADP
fumecheng-14015	593	10	grain	grain	NOUN
fumecheng-14015	593	11	orientations	orientation	NOUN
fumecheng-14015	593	12	of	of	ADP
fumecheng-14015	593	13	cu	cu	NOUN
fumecheng-14015	593	14	seed	seed	NOUN
fumecheng-14015	593	15	layers	layer	NOUN
fumecheng-14015	593	16	on	on	ADP
fumecheng-14015	593	17	the	the	DET
fumecheng-14015	593	18	growth	growth	NOUN
fumecheng-14015	593	19	of	of	ADP
fumecheng-14015	593	20	<	<	X
fumecheng-14015	593	21	111>-oriented	111>-oriente	VERB
fumecheng-14015	593	22	nanotwinned	nanotwinned	PROPN
fumecheng-14015	593	23	cu	cu	PROPN
fumecheng-14015	593	24	,	,	PUNCT
fumecheng-14015	593	25	scientific	scientific	ADJ
fumecheng-14015	593	26	reports	report	NOUN
fumecheng-14015	593	27	,	,	PUNCT
fumecheng-14015	593	28	4	4	NUM
fumecheng-14015	593	29	,	,	PUNCT
fumecheng-14015	593	30	6123	6123	NUM
fumecheng-14015	593	31	.	.	PUNCT
fumecheng-14015	594	1	97	97	NUM
fumecheng-14015	594	2	.	.	PUNCT
fumecheng-14015	595	1	li	li	PROPN
fumecheng-14015	595	2	,	,	PUNCT
fumecheng-14015	595	3	y.-j	y.-j	PROPN
fumecheng-14015	595	4	.	.	PROPN
fumecheng-14015	595	5	,	,	PUNCT
fumecheng-14015	595	6	tu	tu	PROPN
fumecheng-14015	595	7	,	,	PUNCT
fumecheng-14015	595	8	k.-n	k.-n	PROPN
fumecheng-14015	595	9	.	.	PUNCT
fumecheng-14015	595	10	,	,	PUNCT
fumecheng-14015	595	11	chen	chen	PROPN
fumecheng-14015	595	12	,	,	PUNCT
fumecheng-14015	595	13	c.	c.	PROPN
fumecheng-14015	595	14	,	,	PUNCT
fumecheng-14015	595	15	2020	2020	NUM
fumecheng-14015	595	16	,	,	PUNCT
fumecheng-14015	595	17	tensile	tensile	NOUN
fumecheng-14015	595	18	properties	property	NOUN
fumecheng-14015	595	19	of	of	ADP
fumecheng-14015	595	20	<	<	X
fumecheng-14015	595	21	111>-oriented	111>-oriente	VERB
fumecheng-14015	595	22	nanotwinned	nanotwinned	ADJ
fumecheng-14015	595	23	cu	cu	PROPN
fumecheng-14015	595	24	with	with	ADP
fumecheng-14015	595	25	different	different	ADJ
fumecheng-14015	595	26	columnar	columnar	ADJ
fumecheng-14015	595	27	grain	grain	NOUN
fumecheng-14015	595	28	structures	structure	NOUN
fumecheng-14015	595	29	,	,	PUNCT
fumecheng-14015	595	30	materials	material	NOUN
fumecheng-14015	595	31	,	,	PUNCT
fumecheng-14015	595	32	13(6	13(6	PROPN
fumecheng-14015	595	33	)	)	PUNCT
fumecheng-14015	595	34	,	,	PUNCT
fumecheng-14015	595	35	1310	1310	NUM
fumecheng-14015	595	36	.	.	PUNCT
fumecheng-14015	596	1	98	98	NUM
fumecheng-14015	596	2	.	.	PUNCT
fumecheng-14015	597	1	tseng	tseng	PROPN
fumecheng-14015	597	2	,	,	PUNCT
fumecheng-14015	597	3	h.-h	h.-h	PROPN
fumecheng-14015	597	4	.	.	PUNCT
fumecheng-14015	597	5	,	,	PUNCT
fumecheng-14015	597	6	liu	liu	PROPN
fumecheng-14015	597	7	,	,	PUNCT
fumecheng-14015	597	8	h.-c	h.-c	PROPN
fumecheng-14015	597	9	.	.	PUNCT
fumecheng-14015	597	10	,	,	PUNCT
fumecheng-14015	597	11	yu	yu	PROPN
fumecheng-14015	597	12	,	,	PUNCT
fumecheng-14015	597	13	m.-h	m.-h	PROPN
fumecheng-14015	597	14	.	.	PUNCT
fumecheng-14015	597	15	,	,	PUNCT
fumecheng-14015	597	16	ong	ong	PROPN
fumecheng-14015	597	17	,	,	PUNCT
fumecheng-14015	597	18	j.-j	j.-j	PROPN
fumecheng-14015	597	19	.	.	PROPN
fumecheng-14015	597	20	,	,	PUNCT
fumecheng-14015	597	21	tran	tran	PROPN
fumecheng-14015	597	22	,	,	PUNCT
fumecheng-14015	597	23	d.-p	d.-p	PROPN
fumecheng-14015	597	24	.	.	PROPN
fumecheng-14015	597	25	,	,	PUNCT
fumecheng-14015	597	26	chen	chen	PROPN
fumecheng-14015	597	27	,	,	PUNCT
fumecheng-14015	597	28	c.	c.	PROPN
fumecheng-14015	597	29	,	,	PUNCT
fumecheng-14015	597	30	2023	2023	NUM
fumecheng-14015	597	31	,	,	PUNCT
fumecheng-14015	597	32	epitaxial	epitaxial	ADJ
fumecheng-14015	597	33	growth	growth	NOUN
fumecheng-14015	597	34	of	of	ADP
fumecheng-14015	597	35	(	(	PUNCT
fumecheng-14015	597	36	111	111	NUM
fumecheng-14015	597	37	)	)	PUNCT
fumecheng-14015	597	38	nanotwinned	nanotwinned	ADJ
fumecheng-14015	597	39	ag	ag	PROPN
fumecheng-14015	597	40	on	on	ADP
fumecheng-14015	597	41	(	(	PUNCT
fumecheng-14015	597	42	111	111	NUM
fumecheng-14015	597	43	)	)	PUNCT
fumecheng-14015	597	44	nanotwinned	nanotwinned	ADJ
fumecheng-14015	597	45	cu	cu	PROPN
fumecheng-14015	597	46	films	film	NOUN
fumecheng-14015	597	47	for	for	ADP
fumecheng-14015	597	48	low	low	ADJ
fumecheng-14015	597	49	-	-	PUNCT
fumecheng-14015	597	50	temperature	temperature	NOUN
fumecheng-14015	597	51	cu	cu	PROPN
fumecheng-14015	597	52	-	-	PUNCT
fumecheng-14015	597	53	cu	cu	PROPN
fumecheng-14015	597	54	bonding	bonding	NOUN
fumecheng-14015	597	55	,	,	PUNCT
fumecheng-14015	597	56	crystal	crystal	NOUN
fumecheng-14015	597	57	growth	growth	NOUN
fumecheng-14015	597	58	and	and	CCONJ
fumecheng-14015	597	59	design	design	NOUN
fumecheng-14015	597	60	,	,	PUNCT
fumecheng-14015	597	61	23(8	23(8	NUM
fumecheng-14015	597	62	)	)	PUNCT
fumecheng-14015	597	63	,	,	PUNCT
fumecheng-14015	597	64	pp	pp	ADJ
fumecheng-14015	597	65	.	.	PUNCT
fumecheng-14015	598	1	5519	5519	NUM
fumecheng-14015	598	2	-	-	SYM
fumecheng-14015	598	3	5527	5527	NUM
fumecheng-14015	598	4	.	.	PUNCT
fumecheng-14015	599	1	99	99	NUM
fumecheng-14015	599	2	.	.	PUNCT
fumecheng-14015	600	1	tseng	tseng	PROPN
fumecheng-14015	600	2	,	,	PUNCT
fumecheng-14015	600	3	c.-h	c.-h	PROPN
fumecheng-14015	600	4	.	.	PROPN
fumecheng-14015	600	5	,	,	PUNCT
fumecheng-14015	600	6	tseng	tseng	PROPN
fumecheng-14015	600	7	,	,	PUNCT
fumecheng-14015	600	8	i.-h	i.-h	PROPN
fumecheng-14015	600	9	.	.	PROPN
fumecheng-14015	600	10	,	,	PUNCT
fumecheng-14015	600	11	huang	huang	PROPN
fumecheng-14015	600	12	,	,	PUNCT
fumecheng-14015	600	13	y.-p	y.-p	PROPN
fumecheng-14015	600	14	.	.	PROPN
fumecheng-14015	600	15	,	,	PUNCT
fumecheng-14015	600	16	hsu	hsu	PROPN
fumecheng-14015	600	17	,	,	PUNCT
fumecheng-14015	600	18	y.-t	y.-t	PROPN
fumecheng-14015	600	19	.	.	PUNCT
fumecheng-14015	600	20	,	,	PUNCT
fumecheng-14015	600	21	leu	leu	PROPN
fumecheng-14015	600	22	,	,	PUNCT
fumecheng-14015	600	23	j.	j.	PROPN
fumecheng-14015	600	24	,	,	PUNCT
fumecheng-14015	600	25	tu	tu	PROPN
fumecheng-14015	600	26	,	,	PUNCT
fumecheng-14015	600	27	k.-n	k.-n	PROPN
fumecheng-14015	600	28	.	.	PUNCT
fumecheng-14015	600	29	,	,	PUNCT
fumecheng-14015	600	30	chen	chen	PROPN
fumecheng-14015	600	31	,	,	PUNCT
fumecheng-14015	600	32	c.	c.	PROPN
fumecheng-14015	600	33	,	,	PUNCT
fumecheng-14015	600	34	2020	2020	NUM
fumecheng-14015	600	35	,	,	PUNCT
fumecheng-14015	600	36	kinetic	kinetic	ADJ
fumecheng-14015	600	37	study	study	NOUN
fumecheng-14015	600	38	of	of	ADP
fumecheng-14015	600	39	grain	grain	NOUN
fumecheng-14015	600	40	growth	growth	NOUN
fumecheng-14015	600	41	in	in	ADP
fumecheng-14015	600	42	highly	highly	ADV
fumecheng-14015	600	43	(	(	PUNCT
fumecheng-14015	600	44	111)-preferred	111)-preferred	PROPN
fumecheng-14015	600	45	nanotwinned	nanotwinned	ADJ
fumecheng-14015	600	46	copper	copper	NOUN
fumecheng-14015	600	47	films	film	NOUN
fumecheng-14015	600	48	,	,	PUNCT
fumecheng-14015	600	49	materials	material	NOUN
fumecheng-14015	600	50	characterization	characterization	NOUN
fumecheng-14015	600	51	,	,	PUNCT
fumecheng-14015	600	52	168	168	NUM
fumecheng-14015	600	53	,	,	PUNCT
fumecheng-14015	600	54	110545	110545	NUM
fumecheng-14015	600	55	.	.	PUNCT
fumecheng-14015	601	1	100	100	NUM
fumecheng-14015	601	2	.	.	X
fumecheng-14015	602	1	zhao	zhao	NOUN
fumecheng-14015	602	2	,	,	PUNCT
fumecheng-14015	602	3	x.	x.	PROPN
fumecheng-14015	602	4	,	,	PUNCT
fumecheng-14015	602	5	lu	lu	PROPN
fumecheng-14015	602	6	,	,	PUNCT
fumecheng-14015	602	7	c.	c.	PROPN
fumecheng-14015	602	8	,	,	PUNCT
fumecheng-14015	602	9	tieu	tieu	PROPN
fumecheng-14015	602	10	,	,	PUNCT
fumecheng-14015	602	11	a.k	a.k	PROPN
fumecheng-14015	602	12	.	.	PROPN
fumecheng-14015	602	13	,	,	PUNCT
fumecheng-14015	602	14	pei	pei	PROPN
fumecheng-14015	602	15	,	,	PUNCT
fumecheng-14015	602	16	l.	l.	PROPN
fumecheng-14015	602	17	,	,	PUNCT
fumecheng-14015	602	18	zhang	zhang	PROPN
fumecheng-14015	602	19	,	,	PUNCT
fumecheng-14015	602	20	l.	l.	PROPN
fumecheng-14015	602	21	,	,	PUNCT
fumecheng-14015	602	22	cheng	cheng	PROPN
fumecheng-14015	602	23	,	,	PUNCT
fumecheng-14015	602	24	k.	k.	PROPN
fumecheng-14015	602	25	,	,	PUNCT
fumecheng-14015	602	26	huang	huang	PROPN
fumecheng-14015	602	27	,	,	PUNCT
fumecheng-14015	602	28	m.	m.	NOUN
fumecheng-14015	602	29	,	,	PUNCT
fumecheng-14015	602	30	2016	2016	NUM
fumecheng-14015	602	31	,	,	PUNCT
fumecheng-14015	602	32	strengthening	strengthen	VERB
fumecheng-14015	602	33	mechanisms	mechanism	NOUN
fumecheng-14015	602	34	and	and	CCONJ
fumecheng-14015	602	35	dislocation	dislocation	NOUN
fumecheng-14015	602	36	processes	process	NOUN
fumecheng-14015	602	37	in	in	ADP
fumecheng-14015	602	38	<	<	NOUN
fumecheng-14015	602	39	111	111	NUM
fumecheng-14015	602	40	>	>	VERB
fumecheng-14015	602	41	textured	texture	VERB
fumecheng-14015	602	42	nanotwinned	nanotwinned	ADJ
fumecheng-14015	602	43	copper	copper	NOUN
fumecheng-14015	602	44	,	,	PUNCT
fumecheng-14015	602	45	materials	material	NOUN
fumecheng-14015	602	46	science	science	NOUN
fumecheng-14015	602	47	and	and	CCONJ
fumecheng-14015	602	48	engineering	engineering	NOUN
fumecheng-14015	602	49	:	:	PUNCT
fumecheng-14015	602	50	a	a	DET
fumecheng-14015	602	51	,	,	PUNCT
fumecheng-14015	602	52	676	676	NUM
fumecheng-14015	602	53	,	,	PUNCT
fumecheng-14015	602	54	pp	pp	ADJ
fumecheng-14015	602	55	.	.	PUNCT
fumecheng-14015	603	1	474	474	NUM
fumecheng-14015	603	2	-	-	SYM
fumecheng-14015	603	3	486	486	NUM
fumecheng-14015	603	4	.	.	PUNCT
fumecheng-14015	604	1	101	101	NUM
fumecheng-14015	604	2	.	.	PUNCT
fumecheng-14015	605	1	liu	liu	PROPN
fumecheng-14015	605	2	,	,	PUNCT
fumecheng-14015	605	3	c.-m	c.-m	PROPN
fumecheng-14015	605	4	.	.	PUNCT
fumecheng-14015	605	5	,	,	PUNCT
fumecheng-14015	605	6	lin	lin	PROPN
fumecheng-14015	605	7	,	,	PUNCT
fumecheng-14015	605	8	h.-w	h.-w	PROPN
fumecheng-14015	605	9	.	.	PROPN
fumecheng-14015	605	10	,	,	PUNCT
fumecheng-14015	605	11	huang	huang	PROPN
fumecheng-14015	605	12	,	,	PUNCT
fumecheng-14015	605	13	y.-s	y.-s	PROPN
fumecheng-14015	605	14	.	.	PUNCT
fumecheng-14015	605	15	,	,	PUNCT
fumecheng-14015	605	16	chu	chu	PROPN
fumecheng-14015	605	17	,	,	PUNCT
fumecheng-14015	605	18	y.-c	y.-c	PROPN
fumecheng-14015	605	19	.	.	PROPN
fumecheng-14015	605	20	,	,	PUNCT
fumecheng-14015	605	21	chen	chen	PROPN
fumecheng-14015	605	22	,	,	PUNCT
fumecheng-14015	605	23	c.	c.	PROPN
fumecheng-14015	605	24	,	,	PUNCT
fumecheng-14015	605	25	lyu	lyu	NOUN
fumecheng-14015	605	26	,	,	PUNCT
fumecheng-14015	605	27	d.-r	d.-r	NOUN
fumecheng-14015	605	28	.	.	PUNCT
fumecheng-14015	605	29	,	,	PUNCT
fumecheng-14015	605	30	chen	chen	PROPN
fumecheng-14015	605	31	,	,	PUNCT
fumecheng-14015	605	32	k.-n	k.-n	PROPN
fumecheng-14015	605	33	.	.	PUNCT
fumecheng-14015	605	34	,	,	PUNCT
fumecheng-14015	605	35	tu	tu	PROPN
fumecheng-14015	605	36	,	,	PUNCT
fumecheng-14015	605	37	k.-n	k.-n	PROPN
fumecheng-14015	605	38	.	.	PROPN
fumecheng-14015	605	39	,	,	PUNCT
fumecheng-14015	605	40	2015	2015	NUM
fumecheng-14015	605	41	,	,	PUNCT
fumecheng-14015	605	42	lowtemperature	lowtemperature	VERB
fumecheng-14015	605	43	direct	direct	ADJ
fumecheng-14015	605	44	copper	copper	NOUN
fumecheng-14015	605	45	-	-	PUNCT
fumecheng-14015	605	46	to	to	ADP
fumecheng-14015	605	47	-	-	PUNCT
fumecheng-14015	605	48	copper	copper	NOUN
fumecheng-14015	605	49	bonding	bonding	NOUN
fumecheng-14015	605	50	enabled	enable	VERB
fumecheng-14015	605	51	by	by	ADP
fumecheng-14015	605	52	creep	creep	PROPN
fumecheng-14015	605	53	on	on	ADP
fumecheng-14015	605	54	(	(	PUNCT
fumecheng-14015	605	55	111	111	NUM
fumecheng-14015	605	56	)	)	PUNCT
fumecheng-14015	605	57	surfaces	surface	NOUN
fumecheng-14015	605	58	of	of	ADP
fumecheng-14015	605	59	nanotwinned	nanotwinned	PROPN
fumecheng-14015	605	60	cu	cu	PROPN
fumecheng-14015	605	61	,	,	PUNCT
fumecheng-14015	605	62	scientific	scientific	ADJ
fumecheng-14015	605	63	reports	report	NOUN
fumecheng-14015	605	64	,	,	PUNCT
fumecheng-14015	605	65	5	5	NUM
fumecheng-14015	605	66	,	,	PUNCT
fumecheng-14015	605	67	9734	9734	NUM
fumecheng-14015	605	68	.	.	PUNCT
fumecheng-14015	606	1	102	102	NUM
fumecheng-14015	606	2	.	.	PUNCT
fumecheng-14015	606	3	shie	shie	PROPN
fumecheng-14015	606	4	,	,	PUNCT
fumecheng-14015	606	5	k.c	k.c	PROPN
fumecheng-14015	606	6	.	.	PROPN
fumecheng-14015	606	7	,	,	PUNCT
fumecheng-14015	606	8	juang	juang	PROPN
fumecheng-14015	606	9	,	,	PUNCT
fumecheng-14015	606	10	j.-y	j.-y	PROPN
fumecheng-14015	606	11	.	.	PUNCT
fumecheng-14015	606	12	,	,	PUNCT
fumecheng-14015	606	13	chen	chen	PROPN
fumecheng-14015	606	14	,	,	PUNCT
fumecheng-14015	606	15	c.	c.	PROPN
fumecheng-14015	606	16	,	,	PUNCT
fumecheng-14015	606	17	2019	2019	NUM
fumecheng-14015	606	18	,	,	PUNCT
fumecheng-14015	606	19	instant	instant	ADJ
fumecheng-14015	606	20	cu	cu	PROPN
fumecheng-14015	606	21	-	-	PUNCT
fumecheng-14015	606	22	to	to	ADP
fumecheng-14015	606	23	-	-	PUNCT
fumecheng-14015	606	24	cu	cu	NOUN
fumecheng-14015	606	25	direct	direct	ADJ
fumecheng-14015	606	26	bonding	bonding	NOUN
fumecheng-14015	606	27	enabled	enable	VERB
fumecheng-14015	606	28	by	by	ADP
fumecheng-14015	606	29	<	<	X
fumecheng-14015	606	30	111>-oriented	111>-oriente	VERB
fumecheng-14015	606	31	nanotwinned	nanotwinned	ADJ
fumecheng-14015	606	32	cu	cu	PROPN
fumecheng-14015	606	33	bumps	bump	NOUN
fumecheng-14015	606	34	,	,	PUNCT
fumecheng-14015	606	35	japanese	japanese	ADJ
fumecheng-14015	606	36	journal	journal	NOUN
fumecheng-14015	606	37	of	of	ADP
fumecheng-14015	606	38	applied	applied	ADJ
fumecheng-14015	606	39	physics	physic	NOUN
fumecheng-14015	606	40	,	,	PUNCT
fumecheng-14015	606	41	59(5	59(5	NUM
fumecheng-14015	606	42	)	)	PUNCT
fumecheng-14015	606	43	,	,	PUNCT
fumecheng-14015	606	44	pp	pp	ADP
fumecheng-14015	606	45	.	.	PUNCT
fumecheng-14015	607	1	53	53	NUM
fumecheng-14015	607	2	-	-	SYM
fumecheng-14015	607	3	58	58	NUM
fumecheng-14015	607	4	.	.	PUNCT
fumecheng-14015	608	1	103	103	NUM
fumecheng-14015	608	2	.	.	X
fumecheng-14015	609	1	lu	lu	PROPN
fumecheng-14015	609	2	,	,	PUNCT
fumecheng-14015	609	3	t.	t.	PROPN
fumecheng-14015	609	4	,	,	PUNCT
fumecheng-14015	609	5	wang	wang	PROPN
fumecheng-14015	609	6	,	,	PUNCT
fumecheng-14015	609	7	p.	p.	PROPN
fumecheng-14015	609	8	,	,	PUNCT
fumecheng-14015	609	9	cheng	cheng	PROPN
fumecheng-14015	609	10	,	,	PUNCT
fumecheng-14015	609	11	y.	y.	PROPN
fumecheng-14015	609	12	,	,	PUNCT
fumecheng-14015	609	13	yen	yen	NOUN
fumecheng-14015	609	14	,	,	PUNCT
fumecheng-14015	609	15	y.	y.	PROPN
fumecheng-14015	609	16	,	,	PUNCT
fumecheng-14015	609	17	wu	wu	PROPN
fumecheng-14015	609	18	,	,	PUNCT
fumecheng-14015	609	19	s.	s.	PROPN
fumecheng-14015	609	20	,	,	PUNCT
fumecheng-14015	609	21	2024	2024	NUM
fumecheng-14015	609	22	,	,	PUNCT
fumecheng-14015	609	23	enhanced	enhance	VERB
fumecheng-14015	609	24	nanotwinned	nanotwinned	ADJ
fumecheng-14015	609	25	copper	copper	NOUN
fumecheng-14015	609	26	bonding	bonding	NOUN
fumecheng-14015	609	27	through	through	ADP
fumecheng-14015	609	28	epoxyinduced	epoxyinduce	VERB
fumecheng-14015	609	29	copper	copper	NOUN
fumecheng-14015	609	30	surface	surface	NOUN
fumecheng-14015	609	31	modification	modification	NOUN
fumecheng-14015	609	32	,	,	PUNCT
fumecheng-14015	609	33	nanomaterials	nanomaterial	NOUN
fumecheng-14015	609	34	,	,	PUNCT
fumecheng-14015	609	35	14(9	14(9	NUM
fumecheng-14015	609	36	)	)	PUNCT
fumecheng-14015	609	37	,	,	PUNCT
fumecheng-14015	609	38	771	771	NUM
fumecheng-14015	609	39	.	.	PUNCT