Journal of large-scale research facilities, 2, A60 (2016) http://dx.doi.org/10.17815/jlsrf-2-106 Published: 14.03.2016 FEI Helios NanoLab 400S FIB-SEM Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons (ER-C), Forschungszentrum Jülich and RWTH Aachen * Instrument O�cer: - Doris Meertens, Ernst Ruska-Centre, Jülich Research Centre, 52425 Jülich, Germany, phone: ++49.2461.61.3910, e-mail: d.meertens@fz-juelich.de Deputy Instrument O�cer: - Maximilian Kruth, Ernst Ruska-Centre, Jülich Research Centre, 52425 Jülich, Germany, phone: ++49.2461.61.2418, e-mail: m.kruth@fz-juelich.de General Management: - Dr. Karsten Tillmann, Ernst Ruska-Centre, Jülich Research Centre, 52425 Jülich, Germany, phone: ++49.2461.61.1438, e-mail: k.tillmann@fz-juelich.de Abstract: The FEI Helios NanoLab 400S FIB-SEM is one of the world’s most advanced DualBeam™ fo- cused ion beam (FIB) platforms for transmission electron microscopy (TEM) sample preparation, scan- ning electron microscopy (SEM) imaging and analysis in semiconductor failure analysis, process devel- opment and process control. The FEI Helios NanoLab 400S FIB-SEM combines an Elstar™ electron col- umn for high-resolution and high-contrast imaging with a high-performance SidewinderM ion column for fast and precise cross sectioning. The FEI Helios NanoLab™ 400S is optimised for high through- put high-resolution S/TEM sample preparation, SEM imaging and energy dispersive X-ray analysis. Its exclusive FlipStage™ and in situ STEM detector can �ip from sample preparation to STEM imaging in seconds without breaking vacuum or exposing the sample to the environment. Platinum gas chemistry is the preferred metal deposition when a high deposition rate and precision of the deposition are re- quired. Carbon deposition can be chosen as well. The system additionally allows for spatially resolved compositional analysis using the attached EDAX Genesis XM 4i X-ray microanalysis system. *Cite article as: Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons. (2016). FEI Helios NanoLab 400S FIB-SEM. Journal of large-scale research facilities, 2, A60. http://dx.doi.org/10.17815/jlsrf-2-106 1 http://jlsrf.org/ http://dx.doi.org/10.17815/jlsrf-2-106 http://dx.doi.org/10.17815/jlsrf-2-106 https://creativecommons.org/licenses/by/4.0/ Journal of large-scale research facilities, 2, A60 (2016) http://dx.doi.org/10.17815/jlsrf-2-106 1 System Overview Figure 1: FEI Helios NanoLab™ 400S FIB-SEM (photograph by courtesy of FEI company). 2 Typical Applications and Limitations of Use The con�guration of the FEI Helios NanoLab 400S allows a variety of advanced imaging and preparation techniques to be applied to wide bunch of solid state materials. These techniques include TEM sample preparation (normal- and backside milling) without breaking the vacuum, STEM imaging on thin TEM samples, needle preparation for tomography, plan-view preparation and the preparation of lamellas on heating chips for TEM annealing experiments. The FEI Helios NanoLab 400S is not intended for the investigation of aqueous, ferromagnetic or or- ganic samples without further discussions with both of the instruments o�cers and the ER-C general management. 3 Basic Electron and Ion Optics Set-up • Elstar UHR immersion lens FE-SEM column • electron gun with Schottky thermal �eld emitter • Sidewinder ion column • gallium liquid ion source 2 http://dx.doi.org/10.17815/jlsrf-2-106 https://creativecommons.org/licenses/by/4.0/ http://dx.doi.org/10.17815/jlsrf-2-106 Journal of large-scale research facilities, 2, A60 (2016) 4 Electron and Ion Optics Speci�cations • electron landing voltage 350 V ... 30 kV • ion landing voltage 500 V . . . 30 kV • magni�cation range 25 ... 650 k • image processor 4096 x 3536 pixel • electron beam resolution @ optimum distance 0.8 nm 30kV (STEM) • electron beam resolution @ optimum distance 0.9 nm 15kV • electron beam resolution @ optimum distance 1.4 nm 1kV • electron probe current ≤ 22 nA • ion beam resolution coincident point 5 nm 30kV • ion beam current 1.5 pA – 21 nA 5 Detectors • Elstar in-lens SE detector (TLD-SE) • Elstar in-lens BSE detector (TLD-BSE) • Everhardt-Thornley external SE-detector (ETD) • external secondary electron and secondary ion detector (CDEM) • retractable STEM detector BF/ DF / HAADF • electron or ion beam current measurement 6 Specimen Stages and Sample Loading • high precision 5-axis motorised stage • XY movements: 150 mm piezo-driven • Z movement: 10 mm motorised • tilt: -10° to +60° • rotation: n x 360° (endless) piezo-driven • FlipStageTM for integrated TEM sample preparation and STEM imaging • OmniprobeTM Auto Probe 200 in situ sample lift-out system • loadlock for fast sample transfer 3 http://dx.doi.org/10.17815/jlsrf-2-106 https://creativecommons.org/licenses/by/4.0/ Journal of large-scale research facilities, 2, A60 (2016) http://dx.doi.org/10.17815/jlsrf-2-106 7 Gas Injection System • platinum deposition • carbon deposition 8 Energy Dispersive X-ray System • EDAX Genesis Integration Kit • Genesis XM 4i motorised SUTW Detector 4 http://dx.doi.org/10.17815/jlsrf-2-106 https://creativecommons.org/licenses/by/4.0/ System Overview Typical Applications and Limitations of Use Basic Electron and Ion Optics Set-up Electron and Ion Optics Specifications Detectors Specimen Stages and Sample Loading Gas Injection System Energy Dispersive X-ray System