Journal of large-scale research facilities, 2, A76 (2016) http://dx.doi.org/10.17815/jlsrf-2-140 Published: 09.06.2016 DESY NanoLab Deutsches Elektronen Synchrotron (DESY) * Instrument Scientists: - Heshmat Noei, DESY, Notkestr. 85, D-22607 Hamburg, heshmat.noei@desy.de - Vedran Vonk, DESY, Notkestr. 85, D-22607 Hamburg, vedran.vonk@desy.de - Thomas F. Keller, DESY, 22607 Hamburg, and Fachbereich Physik, Universität Hamburg, D-20355 Hamburg, thomas.keller@desy.de - Ralf Röhlsberger, DESY, 22607 Hamburg, and Fachbereich Physik, Universität Hamburg, D-20355 Hamburg, ralf.roehlsberger@desy.de - Andreas Stierle, DESY, 22607 Hamburg, and Fachbereich Physik, Universität Hamburg, D-20355 Hamburg, andreas.stierle@desy.de Abstract: The DESY NanoLab is a facility providing access to nano-characterization, nano-structuring and nano-synthesis techniques which are complementary to the advanced X-ray techniques available at DESY’s light sources. It comprises state-of-the art scanning probe microscopy and focused ion beam manufacturing, as well as surface sensitive spectroscopy techniques for chemical analysis. Specialized laboratory X-ray di�raction setups are available for a successful sample pre-characterization before the precious synchrotron beamtimes. Future upgrades will include as well instrumentation to characterize magnetic properties. 1 Introduction Today’s third generation and future di�raction limited synchrotron radiation facilities allow experi- ments with nano-focused X-ray beams such as single object nano di�raction and imaging (Hoppe et al., 2013; Pfeifer et al., 2006). These demanding experiments require involved pre- and post-experimental sample preparation and characterization with complementary techniques. The DESY Nanolaboratory (DESY NanoLab) is a facility providing photon science user access to advanced nano-characterization, nano-structuring and nano-synthesis techniques which are complementary to the advanced X-ray tech- niques available at DESY’s light sources. A special focus is on the reproducible transfer of individ- ual nano objects from the DESY NanoLab microscopes to the beamlines and vice versa. The scien- ti�c instrumentation of the DESY NanoLab is being continuously extended. Currently, an ultrahigh *Cite article as: Deutsches Elektronen Synchrotron (DESY). (2016). DESY NanoLab. Journal of large-scale research facil- ities, 2, A76. http://dx.doi.org/10.17815/jlsrf-2-140 1 http://jlsrf.org/ http://dx.doi.org/10.17815/jlsrf-2-140 http://dx.doi.org/10.17815/jlsrf-2-140 https://creativecommons.org/licenses/by/4.0/ Journal of large-scale research facilities, 2, A76 (2016) http://dx.doi.org/10.17815/jlsrf-2-140 vacuum (UHV) setup for surface preparation and nanoparticle growth is available that combines sur- face science techniques such as X-ray photoemission spectroscopy (XPS), re�ection-absorption infrared spectroscopy (UHV-RAIRS) and ultra high vacuum scanning tunneling and atomic force microscopy (STM/AFM). In addition, an X-ray di�raction laboratory is operational, which allows specular re�ec- tivity and grazing incidence X-ray di�raction measurements on a routine basis using sealed tube Mo and Cu X-ray sources and parabolic multilayer optics. A high resolution �eld emission scanning elec- tron microscope (FE-SEM) is available for users, as well as a dual electron and focused ion beam (FIB) for high precision sample structuring. Magnetic sample characterization will be possible in the fu- ture by a Kerr microscope and a physical properties measurement system (PPMS), as well as magnetic force microscopy (MFM). Access to DESY NanoLab instrumentation is possible via submission of a re- search proposal for a combined access to the DESY NanoLab and the DESY light sources PETRA III or FLASH via DOOR (DESY online o�ce for research with photons: https://door.desy.de/door/). Within this framework, DESY NanoLab currently o�ers the instrumentation presented here in the areas of surface spectroscopy, X-ray di�raction, high resolution microscopy and magnetic characterization. 2 Surface spectroscopy and sample preparation 2.1 Ultra-high vacuum system for sample preparation Our ultra-high vacuum (UHV) apparatus consists of a tunnel chamber connected to the load-lock, growth or preparation chamber, re�ection-absorption infrared spectroscopy (RAIRS), X-ray photoelec- tron spectroscopy (XPS), and scanning tunneling and atomic force microscopy (STM). This allows car- rying out sample cleaning, modi�cation, metal (oxide) deposition and characterization under UHV chamber without exposing it into air. The preparation chamber has the following characteristics: • Base pressure of 10−11 mbar, ion getter pump, turbo molecular pump and titanium sublimation pump • Sample heating up to 1500 K by thermal and e-beam heating • Combined low energy electron di�raction (LEED)- Auger system • Electron beam evaporators • Sputter gun for sample surface cleaning • Thermal cracker for oxygen and hydrogen • 1-inch molybdenum sample holder with an optimal sample size of 10 x 10 mm2 • Back-pack sample holders for transferring diverse sample holders to di�erent systems in the UHV lab (STM/AFM, XPS) • Gas dosing system (Ar, O2, C2H4, CO, H2, ...) 2.2 Ultra-high vacuum-re�ection absorption IR spectroscopy (UHV-RAIRS) We operate an ultrahigh vacuum (UHV) apparatus to which a state of the art vacuum IR spectrometer is connected (Bruker, VERTEX 80v). The powerful design allows carrying out re�ection-absorption infrared spectroscopy (RAIRS) experiments at grazing incidence on well-de�ned metal and oxide single crystal surfaces in a wide pressure range from UHV to ambient condition and temperature range from 110 K to 1000 K. The unique feature of our IR apparatus is the entirely evacuated optical path to avoid background signals from gas phase species. 2.2.1 Speci�cations: • External MCT detector for RAIRS measurements on well-ordered solid surfaces. • Internal DTG detector for Fourier-transform IR spectroscopy (FTIRS) on powder samples. • In-situ measurements at variable pressure range: 10−10 mbar < p < 1 bar. • In-situ measurements at variable temperature range: 110 K (liquid N2 cooling). < T < 1000 K • Gas dosing system 2 http://dx.doi.org/10.17815/jlsrf-2-140 https://creativecommons.org/licenses/by/4.0/ http://dx.doi.org/10.17815/jlsrf-2-140 Journal of large-scale research facilities, 2, A76 (2016) Figure 1: Multi method UHV lab as part of the DESY Nanolab. 2.3 X-ray photoelectron spectroscopy (XPS) XPS is performed by bombarding a sample with mono-energetic X-rays, causing core-level photoelec- trons to be ejected from the sample. The binding energy and intensity of a photoelectron peak provide information about elemental identity, chemical state, and concentration within the probed volume. The XPS signal arises from two to about twenty atomic layers in depth from the surface, depending on the material, the energy of the photoelectrons concerned, and the electron exit angle with respect to the surface. 2.3.1 Information obtained by XPS • Quantitative chemical elemental analysis of surfaces • Chemical or electronic state of each element in the surface • Surface contaminations and adsorbates • Surface core level shifts • Homogeneity of elemental composition across the top surface • Homogeneity of elemental composition as a function of depth (pro�ling by ion beam etching) 2.3.2 Speci�cations: • Variable temperature range: 100 K < T < 1000 K (liquid N2 cooling). • Variable pressure range: 10−10 mbar < p < 10−4 mbar. • PHOIBOS 150 2D-DLD Elevated Pressure Energy Analyzer equipped with di�erential pumping system • Laser pointer for sample positioning and alignment • Monochromatic X-ray source FOCUS 500 equipped with di�erential pumping system. • Flood gun FG 15/40. • Mono-energetic Al Ka • Ion source for sample surface cleaning • Programmed depth pro�ling sputter gun • Fast entry load lock 3 http://dx.doi.org/10.17815/jlsrf-2-140 https://creativecommons.org/licenses/by/4.0/ Journal of large-scale research facilities, 2, A76 (2016) http://dx.doi.org/10.17815/jlsrf-2-140 3 X-ray Di�raction The Desy NanoLab operates two independent X-ray scattering set-ups. One is dedicated to X-ray re�ec- tivity measurements, the other to surface sensitive X-ray di�raction in a variety of geometries. Each measurement station is located inside a radiation proof lead hutch equipped with a door interlock, thereby resembling a typical synchrotron beamline. Both di�ractometers can handle relatively large sample environments, which can be as large as 600 mm diameter and weigh up to 50 kg. In this way, the X-ray di�raction stations allow for carrying out experiments, which are very similar to those done at the synchrotron beamline. The symbiosis of experiment control, sample environment and appropri- ate access to reciprocal space, results in the ability to perform in-situ and operando X-ray scattering studies in the lab. This can be used for complementary studies or to optimally prepare for precious beamtimes at the synchrotron and in some special cases even replace those experiments. Additionally, the X-ray stations serve as excellent training sites for students, who get accustomed with setting up and controlling dedicated experiments exactly in the same way as they will have to do it at the synchrotron. Re�ectometer Di�ractometer Anode material Mo Cu Max. power (kW) 3.0 0.05 Size e-beam spot (mm2) 12 x 0.4 0.04 x 0.04 Focusing 1D 2D X-ray beam size on sample (HxV, mm2) 10 x 0.6∗ 0.25 x 0.25 X-ray beam divergence (HxV, mrad2) 14 x 0.4∗ 5 x 5 Distance optics-sample position (mm) 1000 650 Photon �ux at the sample position 107 3 x 108 Table 1: Characteristics of the two X-ray setups. ∗Horizontally the beam is unfocused and its size and divergence are determined by a slit between the source and sample. 3.1 Re�ectometer The re�ectometer uses a vertical scattering geometry, i.e. the sample surface lies horizontal in the lab frame. Five motions, of which 3 rotations and 2 translations are used to align the surface normal in the lab frame. Typical θ -2θ scans are performed. Two pairs of tungsten slits provide a collimator system on the detector arm, thereby allowing to optimizing the resolution and reducing the background to a minimum. Table 1 shows the beam characteristics. Figure 2 (left) shows a typical result of a re�ectivity measurement performed on an approximately 15 nm thin iridium �lm grown on a sapphire substrate. The dynamical range of the setup is 7-8 orders of magnitude. 3.2 Di�ractometer A large 6-circle di�ractometer allows for several scattering geometries. The most common one used is for samples with a well-de�ned face, such as polished single crystal substrates or thin �lms, with their surface mounted horizontally in the lab frame (Lohmeier & Vlieg, 1993). In particular, the di�rac- tometer is suited for measurements with a �xed angle of incidence with respect to the sample surface, which is bene�cial for the signal-to-background ratio when measuring surface sensitive crystal trunca- tion rods. There are two rotations and 3 translations available to align the surface normal of the sample parallel to the omega rotation axis. In Figure 2 (right) (1,0) crystal truncation rod data (solid points) of an Ir(111) single crystal surface are shown. 4 http://dx.doi.org/10.17815/jlsrf-2-140 https://creativecommons.org/licenses/by/4.0/ http://dx.doi.org/10.17815/jlsrf-2-140 Journal of large-scale research facilities, 2, A76 (2016) Figure 2: Left: X-ray re�ectivity data (open symbols) and �t (solid line) of an approximately 15nm thin Ir �lm on a Al2O3(0001) substrate using Mo Kα radiation. Right:(1,0) CTR of an Ir(111) single crystal obtained in air (�lled circles) and theoretical �t (solid line) (Vlieg, 2000). Inset: Rocking scan at L=2.8. A simulation of the experimental intensity variation with di�raction index is shown as well (solid curve). The inset shows a rocking curve close to the minimum of the CTR at L=2.8 and indicates that the di�raction signal from the surface is signi�cantly higher than the background. 3.3 Control software and detectors Both di�raction set-ups are controlled by the program SPEC, which is a software distribution coming with di�erent solutions regarding di�erent scattering geometries and angle calculations (www.certif.com). Since this program is widespread among the di�erent synchrotron communities, there are many pos- sibilities for hardware integration and control. In parallel, a Tango device server is used, which o�ers a great deal of �exibility towards hardware control of apparatus that is not directly supported by SPEC. Since the detector arms are relatively large and the software allows for the implementation of many di�erent hardware solutions, many di�erent types of detectors can be used. Currently, the re�ectome- ter is equipped with a point detector (Cyberstar, NaI(Tl) scintillator) and is foreseen to be also run with a strip detector (Dectris, Mythen). Through the Desy photon science detector loan pool, it is possible to obtain other systems, like a 2D pixel photon counter (Dectris, Pilatus 100K). 4 Microscopy & Nanostructuring The DESY NanoLab provides state of the art microscopy instrumentation for real space imaging of mate- rials surfaces adjusted to meet the demands of potential users of the X-ray light sources on the campus. Several types of microscopes are available, including a high resolution �eld emission scanning elec- tron microscope (HR FE-SEM), a variable temperature ultra-high vacuum scanning tunneling/atomic force microscope (UHV STM/AFM) permitting a UHV sample transfer within the UHV cluster at DESY NanoLab, and a high resolution AFM for operation under ambient conditions. This equipment is com- plemented by a dual beam (FIB) instrument combining a focused ion beam and an electron beam. The FIB permits a sample nano-structuring as, e.g., slicing for transmission analysis using both, X-rays and electrons, and also iterative milling and imaging to obtain 3D tomographic structural and elemental information. Furthermore, an optical microscope is available. 4.1 Scanning electron microscopy (SEM) SEM instrument: The HR FE-SEM is a FEI Nova Nano SEM 450 instrument. Its compact shape permits highest lateral resolution in various imaging modes. Several detectors sensitive to topographic and chemical contrast 5 http://dx.doi.org/10.17815/jlsrf-2-140 https://creativecommons.org/licenses/by/4.0/ Journal of large-scale research facilities, 2, A76 (2016) http://dx.doi.org/10.17815/jlsrf-2-140 permit to obtain complementary information from the sample surfaces. While standard operation is in re�ection, thin sections of a sample, membranes, or small objects on membrane carriers can be analyzed using a retractable scanning transmission electron microscopy (STEM) detector. Chemical contrast can be obtained by electron dispersive spectroscopy (EDS). Fig. 3 shows a view inside the SEM chamber with the pole shoe and sample holders on top of the sample translation stage. The gas injection needle used for electron beam assisted deposition of metalorganic precursors facilitates to write markers close to regions of interest, which in a subsequent step can be used for re-localization at other nano-instruments. An arbitrary marker shape is possible via a bitmap import, see, e.g., Figure 3. Figure 3: Chamber-view inside the SEM with pole shoe, gas injection needle and sample table. IR-CCD camera permits to track the sample position. 4.1.1 Speci�cations: • Field emission gun with Schottky �eld emitter • High voltage 200 V - 30 kV, landing energy 20 V - 30 kV • Beam current up to 200 nA • Lateral resolution 0.8 nm at 30 kV, with the STEM detector; 1.0 nm at 15 kV and 1.4 nm at 1 kV using the secondary electron trough lens detector, (TLD–SE) and 3.5 nm at 100 V (directional back scatter detector, DBS) • Imaging in high-vacuum and low-vacuum is possible • Translation stage permitting a lateral sample movement of 110 mm × 110 mm • Navigation and pattering software • Beam deceleration option to analyze isolating sample surfaces • Dynamical tilt • Gas injection system to write Pt based markers on sample surfaces via electron assisted deposition • Plasma cleaner 4.1.2 Detectors: • Secondary electron (SE) Everhart-Thornley detector (ETD) • High resolution through-lens detector for tunable SE and BE ratio (TLD) 6 http://dx.doi.org/10.17815/jlsrf-2-140 https://creativecommons.org/licenses/by/4.0/ http://dx.doi.org/10.17815/jlsrf-2-140 Journal of large-scale research facilities, 2, A76 (2016) • Lens-mounted concentric backscatter detector (CBSD) • High resolution STEM detector for transmission analysis of thin sample slices, membranes, and membrane supported micro- and nano-objects • X-Max 150 EDS silicon drift detector for elemental analysis, energy resolution 127 eV @ Mn Kα (Oxford Instruments) • Low vacuum backscatter detector (LVD) Figure 4: DESY logo written by electron beam assisted deposition of platinum on a silicon wafer surface. 4.2 Variable temperature ultra-high vacuum scanning tunneling (STM) / atomic force mi- croscope (AFM) 1. UHV AFM/STM instrument: The variable temperature ultra-high vacuum STM/AFM is an Omicron VT instrument connected to the UHV cluster at DESY NanoLab, permitting a direct sample transfer under UHV conditions throughout the cluster with its preparation, deposition and characterization tools (see section 2.1). It provides atomic resolution in the lateral and vertical dimension. 2. Speci�cations: • Variable temperature range: 100 K < T < 500 K (liquid N2, option for He cooling) • Resolution in vertical z-direction (as speci�ed by the manufacturer): < 0.01 nm • Range of tunneling current: 1 pA – 330 nA. Gap voltage: ± 5 mV – 10 V • True pA current STM • dI/dV spectroscopy • Beam de�ection AFM • QPlus sensor based AFM using a modi�ed quartz tuning fork • Range of piezoelectric stage (x/y/z): 10 µm × 10 µm × 1.5 µm • Range of coarse movement of translation stage (x/y/z): 10 mm × 10 mm ×10 mm • Optical microscope for probe navigation, resolution < 10 µm) • Base pressure: 5 × 10−11 mbar • Load lock • In-situ tip exchange • Possibility of in-situ evaporation. 3. Modes of operation: • STM/AFM mode • STM tunneling spectroscopy • High resolution quartz tuning fork AFM • Magnetic force microscopy (MFM) option 7 http://dx.doi.org/10.17815/jlsrf-2-140 https://creativecommons.org/licenses/by/4.0/ Journal of large-scale research facilities, 2, A76 (2016) http://dx.doi.org/10.17815/jlsrf-2-140 • Electrostatic force microscopy option • Kelvin probe microscopy option. 4.3 Atomic microscope (AFM) 1. AFM instrument: The AFM is a CP-II instrument from Digital Instruments. It provides easy access to nano- and microscale surface topography of conducting and non-conducting materials. Fig. 5 shows the instrument inside the home-made acoustic isolation chamber. Varies modes of operations permit to obtain additional local surface information as, e.g., mechanical properties, friction forces or the electrical conductivity. 2. Speci�cations: • High resolution piezoelectric scanner (lateral scan range 5 µm × 5 µm, height range 2.5 µm), with a lateral / vertical resolution of 0.0013 Å / 0.009 Å, (digital analogue conversion, DAC, as speci�ed by the manufacturer) • Large area piezoelectric scanner (lateral scan range 90 µm × 90 µm, height range 7.5 µm) • Laser diode and position-sensitive photodetector • Optical microscope for laser and sample alignment • Microscope stage with translation stage permitting a coarse sample alignment (8 mm × 8 mm) • Home-built acoustic isolation chamber • Anti-vibration system • ProScan data acquisition and image processing software 3. Modes of operation: • Contact mode • Non-contact / intermittent (tapping) mode • Lateral-force / friction mode • STM mode. Figure 5: AFM instrument at DESY NanoLab. 8 http://dx.doi.org/10.17815/jlsrf-2-140 https://creativecommons.org/licenses/by/4.0/ http://dx.doi.org/10.17815/jlsrf-2-140 Journal of large-scale research facilities, 2, A76 (2016) 5 Instrumentation for Micro- and Nanoscale Magnetism The past decades have witnessed an enormous progress in the preparation of magnetic nanostructures, together with the development of methods for their characterization. Highly brilliant X-ray sources continue to provide a signi�cant impact in this �eld as they allow to probe spin dynamics and elec- tronic correlations on relevant temporal and spatial scales with elemental speci�ty. It is the goal of the instrumentation provided by the DESY NanoLab to facilitate a thorough understanding of magnetic properties from atomic to macroscopic length scales by o�ering advanced lab-based methods for mag- netic characterization in concert with the high-resolution X-ray scattering and spectroscopic methods at the DESY photon sources. To realize this, it is planned to equip the DESY NanoLab with two versatile instruments: A system for precision measurement of physical properties constitutes an advanced and widely-used toolbox for magnetic and transport measurements in modern condensed matter laboratories. It provides options for magnetometry like vibrating sample magnetometry (VSM) and AC-susceptibility, thermal measurements like heat capacity and thermotransport as well as electro-transport measurements like DC resistivity. All these measurements can be performed in external �elds up to 14 T and within a tem- perature range of 1.9 K – 400 K, thus matching the experimental conditions provided by cryomagnet systems available at PETRA III beamlines. An ultra-high sensitivity magneto-optical Kerr e�ect magnetometer shall provide laser-based Kerr mag- netometry and near video-rate Kerr microscopy in a single instrument. Such an instrument will be a powerful tool for studies in spintronics, magnetoelectronics, GMR/TMR structures, and thin �lm mag- netism with spotsizes/spatial resolution as small as 2 µ m which matches the X-ray spot sizes provided by many of the KB mirror systems at PETRA III. Combined with the coordinate transfer system estab- lished in the DESY NanoLab, it will be possible to address the same sample spots with the magneto- optical techniques of this instrument and the X-ray methods at PETRA III. 6 Summary In summary, the DESY NanoLab provides a versatile platform for DESY photon science users for in depth sample nano-characterization by spectroscopy, microscopy, magnetism and X-ray di�raction around beamtimes, thereby providing methods complementary to the techniques available at the DESY photon science facilities. For the future operation of fourth generation synchrotron radiation sources with highly improved nano-focusing capabilities such a complementary approach will be highly ben- e�cial. References Hoppe, R., Reinhardt, J., Hofmann, G., Patommel, J., Grunwaldt, J.-D., Damsgaard, C. D., . . . Schroer, C. G. (2013). High-resolution chemical imaging of gold nanoparticles using hard X-ray ptychography. Applied Physics Letters, 102(20). http://dx.doi.org/10.1063/1.4807020 Lohmeier, M., & Vlieg, E. (1993). Angle calculations for a six-circle surface X-ray di�ractometer. Journal of Applied Crystallography, 26(5), 706–716. http://dx.doi.org/10.1107/S0021889893004868 Pfeifer, M. A., Williams, G. J., Vartanyants, I. A., Harder, R., & Robinson, I. K. (2006). Three-dimensional mapping of a deformation �eld inside a nanocrystal. Nature, 442, 63-66. http://dx.doi.org/10.1038/nature04867 Vlieg, E. (2000). ROD: a program for surface X-ray crystallography. Journal of Applied Crystallography, 33(2), 401–405. http://dx.doi.org/10.1107/S0021889899013655 9 http://dx.doi.org/10.17815/jlsrf-2-140 http://dx.doi.org/10.1063/1.4807020 http://dx.doi.org/10.1107/S0021889893004868 http://dx.doi.org/10.1038/nature04867 http://dx.doi.org/10.1107/S0021889899013655 https://creativecommons.org/licenses/by/4.0/ Introduction Surface spectroscopy and sample preparation Ultra-high vacuum system for sample preparation Ultra-high vacuum-reflection absorption IR spectroscopy (UHV-RAIRS) Specifications: X-ray photoelectron spectroscopy (XPS) Information obtained by XPS Specifications: X-ray Diffraction Reflectometer Diffractometer Control software and detectors Microscopy & Nanostructuring Scanning electron microscopy (SEM) Specifications: Detectors: Variable temperature ultra-high vacuum scanning tunneling (STM) / atomic force microscope (AFM) Atomic microscope (AFM) Instrumentation for Micro- and Nanoscale Magnetism Summary